CN105416973B - Base plate transfer device and substrate expose side method - Google Patents
Base plate transfer device and substrate expose side method Download PDFInfo
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- CN105416973B CN105416973B CN201510718566.2A CN201510718566A CN105416973B CN 105416973 B CN105416973 B CN 105416973B CN 201510718566 A CN201510718566 A CN 201510718566A CN 105416973 B CN105416973 B CN 105416973B
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- substrate
- locating dowel
- edge
- delivery platform
- base plate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G13/00—Roller-ways
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0214—Articles of special size, shape or weigh
- B65G2201/022—Flat
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention provides a kind of base plate transfer device and substrate and exposes side method.The base plate transfer device is provided with first, second in the top of delivery platform (1) and exposes side module (21,22), first, second locating dowel (31,32) is provided with the lower section of delivery platform (1), first, second locating dowel (31,32) can be coordinated in the transmit process of substrate (4), the edge of substrate (4) is exposed by first, second exposure side module (21,22), to remove the photoresistance of substrate (4) edge residual, without one exposure side machine of extra purchase, board cost is saved.The substrate exposes side method, pass through be arranged in base plate transfer device first, second mutual cooperation for exposing side module (21,22) and first, second locating dowel (31,32), realization carries out exposure side while substrate (4) are transmitted to substrate (4), the photoresistance of substrate (4) edge residual is removed, saves board cost.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of base plate transfer device and substrate to expose side method.
Background technology
In display technology field, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as display (Organic Light Emitting Diode, OLED) progressively substitute CRT monitor, extensively
It is applied to LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or notebook computer screen etc. generally.
By taking LCD display panel as an example, its structure is by a colored filter substrate (Color Filter, CF), one thin
Film transistor array base palte (Thin Film Transistor Array Substrate, TFT Array Substrate) with
And one the liquid crystal layer being configured between two substrates (Liquid Crystal Layer) formed, operation principle is by TFT bases
Plate controls the rotation of the liquid crystal molecule of liquid crystal layer with applying driving voltage on CF substrates, and the light of backlight module is reflected
Produce picture.In the manufacturing process of LCD display panel and OLED display panel, lithographic process can be often used：Specially exist
The surface for scribbling photoresist places mask plate, and then substrate is exposed using exposure machine, and exposure machine is super by opening
High-pressure mercury-vapor lamp sends UV ultraviolet lights, the image information on mask plate is transferred on the substrate surface for scribbling photoresist, base
In the pattern of mask plate, photoresist has the part being exposed and the part not being exposed；Developer solution is recycled to enter photoresist
Row development, you can remove the part that is exposed of photoresist, retain the part that photoresist is not exposed, or remove photoresist not by
The part of exposure, retain the part that photoresist is exposed, so that photoresist forms required figure；Finally it is etched,
Corresponding pattern is formed on substrate.
In lithographic process, the edge of substrate often has photoresistance (i.e. photoresist) residual, typically can be by exposing side
Machine is exposed to the edge of substrate, and the photoresistance of residual is removed.Side machine is exposed generally to be separately provided in production line, and
Expose side machine price costly, this has resulted in the rising of board cost.
The content of the invention
It is an object of the invention to provide a kind of base plate transfer device, can be realized while being transmitted to substrate pair
The edge of substrate is exposed, to remove the photoresistance of substrate edge residual, without one exposure side machine of extra purchase, section
Save board cost.
Another object of the present invention is to provide a kind of substrate to expose side method, can realize while substrate is transmitted to base
Plate carries out exposure side, removes the photoresistance of substrate edge residual, saves board cost.
To achieve the above object, the present invention provides a kind of base plate transfer device, including delivery platform, relative flat located at transmission
First, second above platform both sides expose side module and along the direction of transfer interval of delivery platform below the delivery platform the
First, the second locating dowel；
The delivery platform is used to transmit substrate；The substrate has first, second, third, fourth edge, and described first
Edge is relative with the 4th edge and direction of transfer with delivery platform is vertical, and the second edge is relative with the 3rd edge, and with
The direction of transfer of delivery platform is consistent；There is residual photoresistance to be exposed on first, second, third, fourth edge；
First locating dowel is between first, second exposure side module；First, second locating dowel can be relative to
Delivery platform rise and fall；Size of the distance between described first, second locating dowel with substrate in the transmission direction is mutually fitted
Should；
When substrate is rested against at the first locating dowel, the first edge of substrate is positioned at first, second lower section for exposing side module；
When delivery platform drives substrate to be moved by the first locating dowel to the second locating dowel, second, third edge of substrate passes through respectively
Cross the lower section of first, second exposure side module；When substrate is rested against at the second locating dowel, the 4th edge of substrate positioned at first,
Second exposes the lower section of side module；Side module is exposed to the of substrate by first, second in the transmit process of substrate so as to realize
First, second, third, the residual photoresistance at the 4th edge is exposed.
Described first, second light source for exposing side module is mercury vapor lamp.
The delivery platform includes spaced and parallel several rotating shafts and is respectively arranged on more in several rotating shafts
Individual roller.
First, second locating dowel is respectively between two adjacent rotating shafts.
First, second locating dowel respectively connects a cylinder, is controlled by the cylinder in first, second locating dowel
Rise and decline.
The present invention also provides a kind of substrate and exposes side method, comprises the following steps：
Step 1, provide a base plate transfer device and substrate；
The base plate transfer device includes delivery platform, the relative first, second exposure side above delivery platform both sides
Module and first, second locating dowel along the direction of transfer interval of delivery platform below delivery platform；
First locating dowel is between first, second exposure side module；First, second locating dowel can be relative to
Delivery platform rise and fall；Size of the distance between described first, second locating dowel with substrate in the transmission direction is mutually fitted
Should；
The substrate has first, second, third, fourth edge, the first edge it is relative with the 4th edge and with biography
Send the direction of transfer of platform vertical, the second edge is relative with the 3rd edge and direction of transfer with delivery platform is consistent；Institute
Stating has residual photoresistance to be exposed on first, second, third, fourth edge；
Step 2, the substrate is positioned on the delivery platform and transmitted, and control the first locating dowel to rise；
Step 3, the substrate are stopped by the first locating dowel, rest against at the first locating dowel, control first expose side module or
Second exposure side module is exposed to the first edge of substrate；
After step 4, the exposure of the first edge of the substrate, the first locating dowel of control declines, and delivery platform continues to pass
Substrate is sent, second, third edge of substrate is exposed by first, second exposure side module respectively in transmit process, and
The second locating dowel is controlled to rise；
Step 5, second, third edge exposure of the substrate finish, and substrate is stopped by the second locating dowel, rests against second
At locating dowel, control first exposes the module when module or second expose and the 4th edge of substrate is exposed；
Step 6, the 4th edge exposure of the substrate finish, and the second locating dowel of control declines, and will be exposed by delivery platform
Substrate behind side is sent to next processing procedure.
Described first, second light source for exposing side module is mercury vapor lamp.
The delivery platform includes spaced and parallel several rotating shafts and is respectively arranged on more in several rotating shafts
Individual roller.
First, second locating dowel is respectively between two adjacent rotating shafts.
First, second locating dowel respectively connects a cylinder, is controlled by the cylinder in first, second locating dowel
Rise and decline.
Beneficial effects of the present invention：A kind of base plate transfer device provided by the invention, the is provided with the top of delivery platform
First, second exposes side module, is provided with first, second locating dowel in the lower section of delivery platform, can coordinate in the transmit process of substrate
First, second locating dowel, the edge of substrate is exposed by first, second exposure side module, to remove substrate surrounding
The photoresistance of margin residual, without one exposure side machine of extra purchase, save board cost.A kind of substrate provided by the invention exposes side side
Method, it is real by be arranged in base plate transfer device first, second mutual cooperation for exposing side module and first, second locating dowel
Exposure side is carried out to substrate while transmission substrate now, removes the photoresistance of substrate edge residual, saves board cost.
Brief description of the drawings
In order to be further understood that the feature of the present invention and technology contents, refer to below in connection with the detailed of the present invention
Illustrate and accompanying drawing, however accompanying drawing only provide with reference to and explanation use, be not used for being any limitation as the present invention.
In accompanying drawing,
Fig. 1 is the structural representation of the base plate transfer device of the present invention；
Fig. 2 is the schematic top plan view of the substrate on side to be exposed；
Fig. 3 is the schematic diagram that the substrate of the base plate transfer device of the present invention exposes the step 3 of side method；
Fig. 4 is the schematic diagram that the substrate of the base plate transfer device of the present invention exposes the step 5 of side method.
Embodiment
Further to illustrate the technological means and its effect of the invention taken, below in conjunction with being preferable to carry out for the present invention
Example and its accompanying drawing are described in detail.
Fig. 1, Fig. 2 are referred to, present invention firstly provides a kind of base plate transfer device, including delivery platform 1, relative be located to pass
First, second above the both sides of platform 1 is sent to expose side module 21,22 and put down along the direction of transfer interval of delivery platform 1 located at transmission
First, second locating dowel 31,32 of the lower section of platform 1.
The delivery platform 1 is used to transmit substrate 4.The substrate 4 have first, second, third, fourth edge 41,42,
43rd, 44, the first edge 41 and the 4th edge 44 is relative and, the second edge vertical with the direction of transfer of delivery platform 1
42 is relative and consistent with the direction of transfer of delivery platform 1 with the 3rd edge 43；First, second, third, fourth edge 41,
42nd, there is residual photoresistance to be exposed on 43,44.
First locating dowel 31 is between first, second exposure side module 21,22；First, second locating dowel 31,
32 can be relative to the rise and fall of delivery platform 1.First, second locating dowel 31, the distance between 32 is passing with substrate 4
The size on direction is sent to be adapted.
Specifically, when substrate 4 is rested against at the first locating dowel 31, the first edge 41 of substrate 4 exposes positioned at first, second
The lower section of side module 21,22；When delivery platform 1 drives substrate 4 to be moved by the first locating dowel 31 to the second locating dowel 32, base
Second, third edge 42,43 of plate 4 is respectively by first, second lower section for exposing side module 21,22；When substrate 4 rests against second
When at locating dowel 32, the 4th edge 44 of substrate 4 is positioned at first, second lower section for exposing side module 21,22；So as to realize in substrate
In 4 transmit process by first, second expose 21,22 pairs of substrates 4 of side module first, second, third, fourth edge 41,42,
43rd, 44 residual photoresistance is exposed.
Specifically, described first, second light source for exposing side module 21,22 is mercury vapor lamp, can send UV ultraviolet lights pair
Photoresistance is exposed.
Specifically, the delivery platform 1 includes spaced and parallel several rotating shafts 11 and is respectively arranged on described several
Multiple rollers 12 in rotating shaft 11.First, second locating dowel 31,32 is respectively between two adjacent rotating shafts 11.
Specifically, first, second locating dowel 31,32 respectively connects a cylinder (not shown), is controlled by the cylinder
First, second locating dowel 31,32 rise and fall.
Aforesaid substrate conveyer is provided with first, second in the top of delivery platform 1 and exposes side module 21,22, flat in transmission
The lower section of platform 1 is provided with first, second locating dowel 31,32, can coordinate in the transmit process of substrate 4 first, second locating dowel 31,
32, it is exposed by the edge of first, second exposure 21,22 pairs of substrates 4 of side module, it is residual to remove the edge of substrate 4
The photoresistance stayed, without one exposure side machine of extra purchase, save board cost.
Fig. 3, Fig. 4 are referred to, with reference to Fig. 1 and Fig. 2, the present invention also provides a kind of substrate and exposes side method, comprises the following steps：
Step 1, provide a base plate transfer device as shown in Figure 1 and substrate 4 as shown in Figure 2.
The base plate transfer device includes delivery platform 1, relative first, second exposure above the both sides of delivery platform 1
Side module 21,22 and along the direction of transfer interval of delivery platform 1 located at the lower section of delivery platform 1 first, second locating dowel 31,
32。
First locating dowel 31 is between first, second exposure side module 21,22；First, second locating dowel 31,
32 can be relative to the rise and fall of delivery platform 1；First, second locating dowel 31, the distance between 32 is passing with substrate 4
The size on direction is sent to be adapted.
The substrate 4 has first, second, third, fourth edge 41,42,43,44, the first edge 41 and the 4th
Edge 44 is relative and vertical with the direction of transfer of delivery platform 1, and the edge 43 of second edge 42 and the 3rd is with respect to and with transmission
The direction of transfer of platform 1 is consistent；There is residual to be exposed on first, second, third, fourth edge 41,42,43,44
Photoresistance.
Step 2, the substrate 4 is positioned on delivery platform 1 and transmitted, and control the first locating dowel 31 to rise.
Step 3, as shown in figure 3, the substrate 4 is stopped by the first locating dowel 31, rest against at the first locating dowel 31, control
First exposes the module 22 when module 21 or second exposes is exposed to the first edge 41 of substrate 4.
After step 4, the exposure of the first edge 41 of the substrate 4, the first locating dowel 31 of control declines, delivery platform 1
Continue to transmit substrate 4, exposed respectively by first, second in second, third of 21,22 pairs of substrates 4 of module in transmit process
Edge 42,43 is exposed, and controls the second locating dowel 32 to rise.
Step 5, as shown in figure 4, the substrate 4 second, third edge 42,43 exposure finish, substrate 4 by second positioning
Post 32 stops, and rests against at the second locating dowel 32, control first expose when module 21 or second exposes module 22 to the 4th of substrate 4
Edge 44 is exposed.
The 4th edge 44 exposure of step 6, the substrate 4 finishes, and the second locating dowel 32 of control declines, and passes through delivery platform
Substrate 4 behind exposure side is sent to next processing procedure by 1.
Specifically, described first, second light source for exposing side module 21,22 is mercury vapor lamp, can send UV ultraviolet lights pair
Photoresistance is exposed.
Specifically, the delivery platform 1 includes spaced and parallel several rotating shafts 11 and is respectively arranged on described several
Multiple rollers 12 in rotating shaft 11.First, second locating dowel 31,32 is respectively between two adjacent rotating shafts 11.
Specifically, each one cylinder of connection of first, second locating dowel 31,32, by the cylinder control it is described first,
Second locating dowel 31,32 rise and fall.
Aforesaid substrate exposes side method, exposes side module 21,22 and the by be arranged in base plate transfer device first, second
First, the mutual cooperation of the second locating dowel 31,32, realize and carry out exposure side to substrate 4 while substrate 4 are transmitted, remove substrate 4 four
The photoresistance of circumferential edges residual, saves board cost.
In summary, base plate transfer device of the invention, it is provided with first, second in the top of delivery platform and exposes side module,
First, second locating dowel is provided with the lower section of delivery platform, first, second locating dowel can be coordinated in the transmit process of substrate,
The edge of substrate is exposed by first, second exposure side module, to remove the photoresistance of substrate edge residual, nothing
One exposure side machine of extra purchase is needed, saves board cost.The substrate of the present invention exposes side method, by being arranged on base plate transfer device
In first, second mutual cooperation for exposing side module and first, second locating dowel, realize and substrate entered while substrate is transmitted
Row exposes side, removes the photoresistance of substrate edge residual, saves board cost.
It is described above, for the person of ordinary skill of the art, can be with technique according to the invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the appended right of the present invention
It is required that protection domain.
Claims (10)
1. a kind of base plate transfer device, it is characterised in that including delivery platform (1), relatively above delivery platform (1) both sides
First, second expose side module (21,22) and along the direction of transfer interval of delivery platform (1) below the delivery platform (1)
First, second locating dowel (31,32)；
The delivery platform (1) is used to transmit substrate (4)；The substrate (4) have first, second, third, fourth edge (41,
42nd, 43,44), the first edge (41) is relative with the 4th edge (44) and, institute vertical with the direction of transfer of delivery platform (1)
It is relative and consistent with the direction of transfer of delivery platform (1) with the 3rd edge (43) to state second edge (42)；Described first, second,
There is residual photoresistance to be exposed on three, the 4th edges (41,42,43,44)；
First locating dowel (31) is between first, second exposure side module (21,22)；First, second locating dowel
(31,32) can be relative to delivery platform (1) rise and fall；The distance between described first, second locating dowel (31,32) with
The size of substrate (4) in the transmission direction is adapted；
When substrate (4) rests against the first locating dowel (31) place, the first edge (41) of substrate (4) exposes side positioned at first, second
The lower section of module (21,22)；When delivery platform (1) drives substrate (4) to pass through the first locating dowel (31) to the second locating dowel (32)
When mobile, second, third edge (42,43) of substrate (4) is respectively by first, second lower section for exposing side module (21,22)；When
When substrate (4) rests against the second locating dowel (32) place, the 4th edge (44) of substrate (4) exposes side module positioned at first, second
The lower section of (21,22)；So as to realize in the transmit process of substrate (4), side module (21,22) is exposed to base by first, second
Residual photoresistance on first, second, third, fourth edge (41,42,43,44) of plate (4) is exposed.
2. base plate transfer device as claimed in claim 1, it is characterised in that described first, second exposes side module (21,22)
Light source is mercury vapor lamp.
3. base plate transfer device as claimed in claim 1, it is characterised in that the delivery platform (1) include it is spaced and
Parallel several rotating shafts (11) and the multiple rollers (12) being respectively arranged on several rotating shafts (11).
4. base plate transfer device as claimed in claim 3, it is characterised in that first, second locating dowel (31,32) is respectively
Between two adjacent rotating shafts (11).
5. base plate transfer device as claimed in claim 1, it is characterised in that first, second locating dowel (31,32) respectively connects
A cylinder is connect, first, second locating dowel (the 31,32) rise and fall are controlled by the cylinder.
6. a kind of substrate exposes side method, it is characterised in that comprises the following steps：
Step 1, provide a base plate transfer device and substrate (4)；
The base plate transfer device includes delivery platform (1), relative first, second exposure above delivery platform (1) both sides
Side module (21,22) and first, second positioning along the direction of transfer interval of delivery platform (1) below delivery platform (1)
Post (31,32)；
First locating dowel (31) is between first, second exposure side module (21,22)；First, second locating dowel
(31,32) can be relative to delivery platform (1) rise and fall；The distance between described first, second locating dowel (31,32) with
The size of substrate (4) in the transmission direction is adapted；
The substrate (4) has first, second, third, fourth edge (41,42,43,44), the first edge (41) and the
Four edges (44) are relative and, the second edge (42) and threeth edge (43) phase vertical with the direction of transfer of delivery platform (1)
Pair and it is consistent with the direction of transfer of delivery platform (1)；Have on first, second, third, fourth edge (41,42,43,44)
There is residual photoresistance to be exposed；
Step 2, the substrate (4) is positioned on the delivery platform (1) and transmitted, and controlled in the first locating dowel (31)
Rise；
Step 3, the substrate (4) are stopped by the first locating dowel (31), rest against the first locating dowel (31) place, and control first exposes side
Module (21) or the second exposure side module (22) are exposed to the first edge (41) of substrate (4)；
After step 4, the exposure of the first edge (41) of the substrate (4), the first locating dowel of control (31) declines, delivery platform
(1) continue to transmit substrate (4), expose side module (21,22) to the of substrate (4) by first, second respectively in transmit process
2nd, the 3rd edge (42,43) are exposed, and control the second locating dowel (32) to rise；
Second, third edge (42,43) exposure of step 5, the substrate (4) is finished, and substrate (4) is cut by the second locating dowel (32)
Firmly, the second locating dowel (32) place is rested against, control first exposes when module (21) or second expose module (22) to the of substrate (4)
Four edges (44) are exposed；
The 4th edge (44) exposure of step 6, the substrate (4) finishes, and the second locating dowel of control (32) declines, flat by transmitting
Substrate (4) after exposing side is sent to next processing procedure by platform (1).
7. substrate as claimed in claim 6 exposes side method, it is characterised in that described first, second exposes side module (21,22)
Light source is mercury vapor lamp.
8. substrate as claimed in claim 6 exposes side method, it is characterised in that the delivery platform (1) include it is spaced and
Parallel several rotating shafts (11) and the multiple rollers (12) being respectively arranged on several rotating shafts (11).
9. substrate as claimed in claim 6 exposes side method, it is characterised in that first, second locating dowel (31,32) is respectively
Between two adjacent rotating shafts (11).
10. substrate as claimed in claim 6 exposes side method, it is characterised in that first, second locating dowel (31,32) is each
A cylinder is connected, first, second locating dowel (the 31,32) rise and fall are controlled by the cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510718566.2A CN105416973B (en) | 2015-10-29 | 2015-10-29 | Base plate transfer device and substrate expose side method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510718566.2A CN105416973B (en) | 2015-10-29 | 2015-10-29 | Base plate transfer device and substrate expose side method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105416973A CN105416973A (en) | 2016-03-23 |
| CN105416973B true CN105416973B (en) | 2017-11-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510718566.2A Active CN105416973B (en) | 2015-10-29 | 2015-10-29 | Base plate transfer device and substrate expose side method |
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| CN (1) | CN105416973B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6619762B2 (en) * | 2017-03-27 | 2019-12-11 | 平田機工株式会社 | Manufacturing system and manufacturing method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE8524382U1 (en) * | 1985-08-26 | 1987-08-27 | Klimsch & Co KG, 6000 Frankfurt | Device for double-sided exposure of printed circuit boards |
| KR100965570B1 (en) * | 2005-12-29 | 2010-06-23 | 엘지디스플레이 주식회사 | Apparatus and method for exposing edge of substrate |
| JP5311006B2 (en) * | 2008-07-24 | 2013-10-09 | 凸版印刷株式会社 | Peripheral exposure apparatus and peripheral exposure method |
| CN102897535B (en) * | 2012-10-17 | 2015-01-14 | 深圳市华星光电技术有限公司 | Substrate-conveying system and substrate positioner |
| CN104310059B (en) * | 2014-08-27 | 2017-07-25 | 深圳市华星光电技术有限公司 | Glass substrate to expose side processing procedure and system |
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| Publication number | Publication date |
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| CN105416973A (en) | 2016-03-23 |
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