201240737 六、發明說明： 【發明所屬之技術領域】 本發明係關於用於平顯示器製造程序之塗饰機，尤其是 關於能以微波偵測塗佈流體中之氣泡的塗佈機。 【先前技術】 在平顯示器(例如液晶顯示器(LCD))的製造程序中，塗 佈機係一種塗佈密封劑或液晶到基板上的裝置。塗佈機利用 具有喷嘴的塗佈頭單元塗佈密封劑或液晶到基板上，其中基 板係位於托台上。 ~ ^ 塗佈機在改變基板與喷嘴間之相對位置時形成密封劑 圖案或液晶層到基板上。 當塗佈機塗佈密封劑或液晶時，在密封劑或液晶中可形 成氣泡。一般而言，平顯示器製造程序需要非常精確控制塗 佈到基板上之密封劑或液晶的量。然而，形成於密封劑或液 晶中的氣泡會造成缺陷產品，且不能達到非常精確的塗佈量 控制。因此，在平顯示器製造程序中要求密封劑或液晶中不 能有氣泡。再者，若氣泡形成於密封劑或液晶中，則應確實 偵測到氣泡而不會製造出缺陷產品。 " 根據傳統偵測塗佈之密封劑或液晶中之氣泡的方法，首 先塗佈密封劑或液晶到基板上，然後用相機或掃描器檢視基 板上流體的塗佈狀態。然而，因為是使用掃描器或相機，所 以傳統方法僅可目測基板上的氣泡。根據傳統方法，難以精 確偵測有好氣泡量塗佈縣板上，以及塗佈不夠多少密封 201240737 。再者’根據傳統方法，不可能在塗佈密封劑或 偵測氣泡，因為使用掃描器或相機的制程3 或液晶之程序後執行。因為相同的原因，不 免的、遲整個製造程序。再者，即使流 成，也要執行使用掃描器或相機的偵測程序。/ 、心； 【發明内容】 本發明之一目的在於提供一種在密封劑或液晶塗 佈耘序中即時偵測氣泡的塗佈機。 ，發明之另一目的在於提供一種不僅能偵測流體中存 在的氣泡還能精確量測氣泡尺寸而_製造的產品是否 良的塗佈機。 + 之位目的在於提供—雜細氣泡塗到基板 本發明之目的不限於上述，熟此技藝者可由以下說明書 中了解本發明的其他目的。 _根據本發明之一實施例，提供一種塗佈機包含塗佈頭單 元，其包含用於塗佈流體於基板上的喷嘴；以及氣泡偵測單 =，其根據物理量的改變偵測流體中之氣泡，其中氣泡偵測 單元朝塗佈頭單元中的流體發射微波，且微波通過塗佈頭單 元中的流體造成物理量的改變。 於此，氣泡偵測單元可包含：產生器，其產生微波並發 201240737 射微波到紐、電壓制計，其量測微波發射刺流體周圍 之第-點及第二關之電驗、以及4貞測器，藉由比較第— 點及第二點間的電壓差，偵測流體中的氣泡。 置 同時’產生ϋ可設置在產生器能發射微波到喷嘴之 位 於此，聽侧單元可包含位在喷嘴周圍㈣ 體及第二塊體，其中產生器可提供於第—塊體及/或第二= 體’且第-點可位在第-塊體中，而第二點可位在第二塊 中。 再者，產生器可黏接到噴嘴之外表面。 或者，第一塊體及/或第二塊體可黏接到喷嘴之外表面。 產生器之底部及喷嘴之底部可位在相同平面。 同時，氣泡偵測單元可包含第三塊體，其包含可讓 插入之孔洞，其中產生II仰在制關，且第—點及 點可位在孔洞周圍以彼此面對。 — 於此，噴嘴之外表面可黏接到孔洞之内表面。 或者’產生器可黏接到喷嘴之外表面。 再者，產生器之底部及喷嘴之底部可位在相同平面。 201240737 〇π根據本發明之另一實施例，塗佈頭單元可更包含支托 裔，用於連接喷嘴與含有流體之注射器，且產生器可設置在 能讓產生器發射微波到支托器之位置。 於此’氣泡偵測單元可包含位在支托器周圍附近的 塊體及第二塊體’其中產生器可提供 =，且第-點可位在第一塊體中，而第二點可位在 再者，產生器可黏接到支托器之外表面。 或者’第-塊體及/或第二塊體可黏制支托器之外表 器之内徑 再者，第一塊體及/或第二塊體可提供在支托 為固定的範圍。 第-靜又一實施例，氣泡偵測單元可包含 ，二塊體’其包含可讓支㈣插人之孔洞，其中產生器可位 孔洞周圍，且第-點及第二點可設置在孔洞周圍以彼此面 於此’支托ϋ之外表面可轉到制之内表面。 或者，產生器可黏接到支托器之外表面。 再者第二塊财提供在支托_之内㈣固定的範圍。 201240737 同時，根據本發明又一實施例，塗佈機可更包含··驅動 單元，其用於改變基板及塗佈頭單元間之相對位置；以及位 置計算部件，其用於計算基板及塗佈頭單元之間在由x軸 及y軸所定義之χγ座標系統上的相對座標，以控制基板及 塗佈頭單元間藉由驅動單元改變的相對位置，其中位置計算 部件利用基板及塗佈頭單元間之相對座標，計算基板上氣泡 偵測單元所偵測到之氣泡塗佈的位置。 於此 备氣泡偵測皁元偵測氣泡時，驅動單元可移動塗 佈頭單元到位置計算部件所計算之氣泡塗佈到基板的位 ，’且塗佈鮮元更可塗佈-體積量的趙騎應在摘測到 氣泡之時刻之座標位置附近，該體積量等於所偵測到之 的體積。 ” 於此，塗佈頭單元可更包含檢視器，其中檢視器檢視對 應在债測到氣泡之時狀座標位置附近之流體的塗°佈狀態。 B曰 同時’流體可為液 或者，流體可為用在基板上的黏膠。 【實施方式】 於後’參考成為本說明書之一部分的伴隨圖式說明 明實施例。 口同時，在本發明實施例中，元件、功能塊或裝置/手段 可由一個或多個子元件所構成。元件所執行之電的、電子的 201240737 或機械的魏可實縣各觀子或麵元件的形式，例如電 子電路、频電路、特殊應用積體f路(ASIQ，且可分開實 施或整合兩個或兩個以上的形式實施。 再者’根據本發明實施例之塗佈機可應用於各種精密裝 置’例如半導體製妓置及伟示H製造裝置。 於後’參考圖式說明本發明之實施例。 圖 圖1為根據本發明實施例說明如何偵測氣泡之示意 參考圖1’在讓流體通過之喷附近提供微波產生器 W。微波產生器w發射微波到喷嘴N中的流體，而使微波 充滿流體所在之空間巾。微波產生器W所發射之微波的波 長範圍可從1mm至lm。 般而δ，微波具有以下特性。第一、微波可通過介電 質。第=、微波通過介電質時，部分的微波能量被介電質吸 收。換言之，會使微波原本所含的能量減少。第三、微波會 在不同介電常數的兩種不同物質間之邊界反射。 由於上述的微波特性，當微波通過介電質時，會改變微 波原本具有的微波物理量，例如能量、電壓、功率及電場。 ”電吊數為物質的本質屬性。舉例而言，空氣的介電常 數與其他物質的介電常數彼此不同（例如^的 而流體的介電常數=μ)。因此，#微^^ = 微波通過流體時的物理量改變彼此不同。更詳細而言，當微 201240737 波通過僅由流體填充且無氣泡的空間時的物理量改變(如圖 1上半部所示）以及微波通過由流體填充且有氣泡的空間時 的物理量改變，這兩者彼此不同。 因此，可利用上述微波的特性偵測流體中的氣泡。再 者’不僅可侧流體中是否有氣泡存在，更可偵測流體中氣 泡的尺寸。由於微波通過流體的物理量係根據流體中氣泡的 尺寸改變’所以可藉由量測微波通過流體之物理量改變計算 氣泡的尺寸。 可藉由各種方式量測物理量的改變。根據本發明之一實 施例’可使用量職波所填空間之兩關的電壓差之方法。 參考圖1 ’可藉由量測微波發射到的流體附近之第一點 P1與，二點P2 _電壓差’量測氣泡是否存在及氣泡的尺 V f—fP1及第二點P2可為喷嘴N之外表面上的任意 點。為何量難料部區域任意狀賴的原因在於很難量 中任意點的電壓。因此，為了更精確偵職泡的存在 丄U的尺寸’電壓量測點應盡可能的靠近流體。因此原 ϋ P1與第二點ρ2可選擇是在喷嘴N的外表面上， 以最小化其他物質可插置於其中之空間。 屮，點Ρ1及第二點Ρ2間的電壓差可自以下式(1)導 赴表示在第—點P1的電壓’❿Vp2表示在第二 點P2的電壓。 …不 式⑴： 9 201240737 VP1 ~ Vp2 = E · ds 於此，E表示電場，而ds表示位移。 同時，微波的傳播速度可顯示如式(2)。 式(2): C=— C〇 於此’ ε表示流體的介電常數，c表示微波在流體中的 傳播速度’而C〇表示光的速度。假設微波的傳播速度為已 知，則可計算流體在某截面的厚度。然後，可利用積分計算 流體的體積。透過此方式，可計算流體的體積與氣泡的尺寸。 圖2及圖3為顯示根據本發明實施例之塗佈機之圖式。 參考圖2、圖3a及圖3b，根據本發明一實施例之塗佈 機包含塗佈頭單元100及氣泡偵測單元200。塗佈頭單元1〇〇 包含噴嘴。流體L透過噴嘴11〇塗佈到基板3〇〇上。 根據本發明一實施例之塗佈機可包含框架4〇〇、塗佈頭 單元支撐框架500以及托台600。 同時’如有需要’塗佈頭單元100可更包括含有流體L 的〉主射器130以及用於連接注射器130與喷嘴11〇的支托器 120。圖3a顯示塗佈頭單元100包含噴嘴11〇、支托器12〇 以及注射器130的結構。上述結構一般應用於塗佈黏膠到基 201240737 板上的塗佈機。 然而，本發明不限於此。舉例而言，可 130’而從流體儲槽直接透過喷嘴則塗佈流體l到基板^ 上。再者’可以不収托n⑼，而直接連接喷嘴ιι〇盥注 射器130。 〃 此外，當流體為液晶時，亦可為圖3b所示的結構。 參考圖3b，塗佈頭單元1〇〇可包含喷嘴11〇、液晶瓶 140以及泵模組150。液晶瓶140中的液晶可藉由泵模組15〇 的運作而透過喷嘴110滴落到基板上。 ” 然而，本發明不限於此。此外，塗佈頭單元1〇〇可架構 成噴墨式，其中喷嘴110具有噴塗液晶的喷墨式喷頭。再 者’可以不用液晶瓶140，而從液晶槽直接提供液晶到喷嘴 110。 氣泡偵測單元200發射微波到塗佈頭單元100中的流體 L。氣泡偵測單元200可基於微波通過流體L之改變的物理 量偵測流體L中的氣泡。如何偵測氣泡的基本原理及其例示 的偵測方法如上所說明。 - 如圖3所示，氣泡偵測早元200可設置在塗佈頭單元 100之喷嘴110周圍。於此案例中，可偵測到流體將要塗佈 到基板300上之範圍中的氣泡，而可更精確地偵測氣泡。 於後，更詳細說明氣泡偵測單元200。 201240737 圖4為顯示根據本發明實施例之氣泡偵測單元2〇〇之例 示結構圖。圖4顯示根據本發明實施例使用上述微波之氣泡 偵，單元200之例示結構，其中量測流體周圍任意兩點間的 電壓差而進行氣泡的偵測。 參考圖4，氣泡偵測單元200包含產生器210，其用於 產生微波並發射微波到流體L、電壓量測計220，其量測微 波發射到的流體L周圍之第一點pi及第二點p2之間的電 壓差、以及偵測器230 ’其藉由比較第一點pi及第二點p2 之間的電壓差，偵測流體L中的氣泡。 產生器210可設置在產生器210能發射微波到喷嘴11〇 之位置。為何發射微波到嘴嘴11()的原因在於偵測正要塗佈 到基板300之流體中的氣泡，如上所述。 再者，產生器210可黏接到喷嘴110之外表面。透過此 =式，可最小化微波填充的空間中除了流體外的物質，而提 高氣泡偵測的精確性及準確性。 電壓$測器220量測微波發射到的流體l周圍之第一點 P1及第二點P2間的電壓差。第一點ρι及第二點p2可位於 喷嘴110之周圍，以彼此面對。如上所述，如此可最小化除 了流體L外可能插置於微波所填空間中的物質’而提高氣泡 偵測的精確性及準破性。 於後，詳細說明根據本發明之一例示實施例之氣泡债 單元200的結構。 、 12 201240737 圖5為顯示根據本發明實施例之氣泡偵測單元200之例 示結構圖。 參考圖5，氣泡偵測單元2〇〇包含第一塊體250及第二 塊體260。噴嘴11〇可插置於第一塊體250及第二塊體260 之，。由於這樣的氣泡偵測單元200結構，可輕易地額外設 置氣泡價測單元200到傳統沒有氣泡偵測單元200的塗佈 機。亦即，氣泡偵測單元200可設置在傳統塗佈機，使得塗 佈機的噴嘴110可插置於第一塊體250及第二塊體260所形 成的空間中。 於圖5中，氣泡偵測單元2〇〇之第一塊體250及第二塊 體260架構成u形。然而，本發明不限於此。氣泡偵測單 元200的結構可架構成氣泡偵測單元2〇〇可輕易設置到任何 塗佈機的各種形式。 舉例而言，氣泡偵測單元200之第一塊體250及第二塊 體260可位在喷嘴11〇之周圍附近’並不是u形而是使第一 塊體250及第一塊體260彼此分開。或者，第一塊體250及 第二塊體260可利用彈簧架構成一對鉗件，而使第一塊體 250及第二塊體260夾住喷嘴11〇。 產生器210可設置於第一塊體250或第二塊體26〇其中 之一，或6又置於兩者中。電壓量測計220量測雷懕的第一赴 P1及第二點P2可分別位在第一塊體250及第二塊體26〇中。 第一塊體250及/或第二塊體260可黏接到噴嘴11〇之 外表面。再者，第一點P1及/或第二點P2可位於喷嘴11〇 13 201240737 的外表面上。此結構提高氣泡偵測的精確性及準確性。 實施例之氣泡偵測單元，與喷 ”if::單元200可設置在喷嘴110，以该測正要塗佈 喷嘴:::的：平，偵測單元，的底部及 及喷;之產生一的底部 200 J月根據本發明另一例示實施例之氣泡债測單元 構。圖7為顯示根據本發明另—實施例之 發明另二會二丨〇之另一例不結構圖’而圖8為顯示根據本 係圖。 歹,之氣泡债測單元200與喷嘴110間之結構關201240737 VI. Description of the Invention: [Technical Field] The present invention relates to a coating machine for a flat display manufacturing process, and more particularly to a coater capable of detecting bubbles in a coating fluid by microwave. [Prior Art] In the manufacturing process of a flat display such as a liquid crystal display (LCD), the applicator is a device for applying a sealant or liquid crystal onto a substrate. The coater applies a sealant or liquid crystal to the substrate using a coating head unit having a nozzle, wherein the substrate is placed on the pallet. ~ ^ The coater forms a sealant pattern or liquid crystal layer onto the substrate when changing the relative position between the substrate and the nozzle. When the coater applies a sealant or a liquid crystal, bubbles may be formed in the sealant or liquid crystal. In general, flat display manufacturing procedures require very precise control of the amount of encapsulant or liquid crystal applied to the substrate. However, bubbles formed in the sealant or liquid crystal cause defective products and cannot achieve very precise coating amount control. Therefore, no air bubbles are required in the sealant or liquid crystal in the flat display manufacturing process. Further, if bubbles are formed in the sealant or the liquid crystal, the bubbles should be surely detected without producing a defective product. " According to the traditional method of detecting the applied sealant or bubbles in the liquid crystal, first apply a sealant or liquid crystal to the substrate, and then use a camera or scanner to check the coating state of the fluid on the substrate. However, since a scanner or a camera is used, the conventional method can only visually detect air bubbles on the substrate. According to the traditional method, it is difficult to accurately detect the amount of good bubbles coated on the county plate, and the coating is not enough to seal 201240737. Furthermore, according to the conventional method, it is impossible to apply a sealant or to detect air bubbles because the process of using the scanner or camera process 3 or liquid crystal is performed. For the same reason, the entire manufacturing process is inevitable. Furthermore, even if it is integrated, a detection program using a scanner or a camera is executed. SUMMARY OF THE INVENTION An object of the present invention is to provide a coater for detecting bubbles instantaneously in a sealant or liquid crystal coating process. Another object of the invention is to provide a coater which is capable of detecting not only bubbles present in a fluid but also accurately measuring the size of the bubbles. The purpose of the present invention is to provide a multi-cell bubble to the substrate. The object of the present invention is not limited to the above, and other objects of the present invention will be apparent to those skilled in the art from the following description. According to an embodiment of the present invention, there is provided a coater comprising a coating head unit including a nozzle for coating a fluid on a substrate; and a bubble detection sheet = which detects the fluid in accordance with a change in physical quantity The bubble, wherein the bubble detecting unit emits microwaves toward the fluid in the coating head unit, and the microwave causes a change in the physical quantity by the fluid in the coating head unit. In this case, the bubble detecting unit may include: a generator that generates a microwave and a 201240737 microwave to a voltage meter, and a meter that measures the first point and the second level around the microwave emitting thorn fluid, and 4贞The detector detects bubbles in the fluid by comparing the voltage difference between the first point and the second point. At the same time, the 'production ϋ can be set at the generator to emit microwaves to the nozzle located here, the listening side unit can include a body around the nozzle (four) body and a second block, wherein the generator can be provided in the first block and/or the first Two = body ' and the first point can be in the first block, and the second point can be in the second block. Furthermore, the generator can be attached to the outer surface of the nozzle. Alternatively, the first block and/or the second block can be bonded to the outer surface of the nozzle. The bottom of the generator and the bottom of the nozzle can be in the same plane. Meanwhile, the bubble detecting unit may include a third block including a hole into which the insertion is made, wherein the II edge is formed, and the first point and the point may be positioned around the hole to face each other. — Here, the outer surface of the nozzle can be bonded to the inner surface of the hole. Or the generator can be attached to the outer surface of the nozzle. Furthermore, the bottom of the generator and the bottom of the nozzle can be in the same plane. 201240737 〇π According to another embodiment of the present invention, the coating head unit may further comprise a supporter for connecting the nozzle to the syringe containing the fluid, and the generator may be arranged to allow the generator to emit microwaves to the holder. position. The 'bubble detecting unit may include a block located near the supporter and a second block' where the generator can provide =, and the first point can be located in the first block, and the second point can be In addition, the generator can be attached to the outer surface of the holder. Alternatively, the 'the first block and/or the second block may be attached to the inner diameter of the external device of the holder. Further, the first block and/or the second block may be provided in a range in which the support is fixed. In another embodiment, the bubble detecting unit may include: a two-body body that includes a hole for allowing a branch (four) to be inserted, wherein the generator is located around the hole, and the first point and the second point are set in the hole The surfaces around the sides of the support can be turned to the inner surface of the system. Alternatively, the generator can be attached to the outer surface of the holder. In addition, the second piece of money is provided within the fixed range of support (4). 201240737 Meanwhile, according to still another embodiment of the present invention, the coater may further include a driving unit for changing a relative position between the substrate and the coating head unit, and a position calculating unit for calculating the substrate and coating The relative coordinates between the head units on the χγ coordinate system defined by the x-axis and the y-axis, to control the relative position of the substrate and the coating head unit by the driving unit, wherein the position calculating part utilizes the substrate and the coating head The relative coordinates between the cells are used to calculate the position of the bubble coating detected by the bubble detecting unit on the substrate. When the bubble detecting soap element detects the bubble, the driving unit can move the coating head unit to the position calculated by the position calculating component to apply the bubble to the substrate, and the coated fresh element can be coated-volume amount. Zhao Qi should be near the coordinate position at the moment when the bubble is measured, and the volume is equal to the detected volume. Wherein, the coating head unit may further comprise a viewer, wherein the viewer views the state of the coating corresponding to the fluid near the position of the bubble when the debt is measured. B曰 At the same time, the fluid may be liquid or fluid. The adhesive is used on the substrate. [Embodiment] Hereinafter, the embodiment will be described with reference to the accompanying drawings which are part of the specification. At the same time, in the embodiment of the present invention, the component, the functional block or the device/mechanism can be One or more sub-elements consisting of electrical, electronic 201240737 or mechanical Wei Ke Shi County forms of face or surface components, such as electronic circuits, frequency circuits, special application integrated circuits (ASIQ, and The two or more forms are separately implemented or integrated. Further, the coating machine according to the embodiment of the present invention can be applied to various precision devices such as a semiconductor device and a display H manufacturing device. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic illustration of how to detect bubbles in accordance with an embodiment of the present invention. FIG. 1 'provides microwave generation in the vicinity of a jet through which a fluid passes. W. The microwave generator w emits the microwave to the fluid in the nozzle N, and the microwave is filled with the space towel where the fluid is located. The microwave emitted by the microwave generator W can range from 1 mm to lm. Generally, δ, the microwave has the following characteristics First, the microwave can pass through the dielectric. When the microwave passes through the dielectric, part of the microwave energy is absorbed by the dielectric. In other words, the energy originally contained in the microwave is reduced. Third, the microwave will be different. The boundary reflection between two different substances of dielectric constant. Due to the above microwave characteristics, when microwaves pass through the dielectric, the microwave physical quantities originally possessed by the microwave, such as energy, voltage, power and electric field, are changed. The essential properties of a substance. For example, the dielectric constant of air differs from the dielectric constant of other substances (for example, the dielectric constant of a fluid = μ). Therefore, #微^^ = the physical quantity of the microwave as it passes through the fluid The changes are different from each other. In more detail, when the micro 201240737 wave passes through a space filled only by fluid and without bubbles, the physical quantity changes (as shown in the upper half of Figure 1) and the microwave passes. The physical quantity changes when the fluid is filled and has a space of bubbles, which are different from each other. Therefore, the characteristics of the microwave can be used to detect bubbles in the fluid. Furthermore, it is possible to detect not only the presence of bubbles in the side fluid but also the detection. The size of the bubble in the fluid. Since the physical quantity of the microwave through the fluid changes according to the size of the bubble in the fluid, the size of the bubble can be calculated by measuring the physical change of the microwave by the measurement of the physical quantity of the fluid. The change of the physical quantity can be measured by various means. One embodiment of the present invention can use a method of measuring the voltage difference between two levels of space filled by the occupational wave. Referring to FIG. 1 'the first point P1 and the second point P2 _ near the fluid emitted by the microwave can be measured. The voltage difference 'measures the presence or absence of the bubble and the ruler V f-fP1 and the second point P2 of the bubble can be any point on the outer surface of the nozzle N. The reason why the amount of the difficult portion is arbitrarily depends on the difficulty of any amount Point voltage. Therefore, in order to more accurately detect the presence of bubbles, the size of the ’U's voltage measurement point should be as close as possible to the fluid. Thus, the original ϋ P1 and the second point ρ2 can be selected on the outer surface of the nozzle N to minimize the space in which other substances can be inserted.屮, the voltage difference between the point Ρ1 and the second point Ρ2 can be derived from the following equation (1) to indicate that the voltage at the first point P1 ❿Vp2 indicates the voltage at the second point P2. ...not (1): 9 201240737 VP1 ~ Vp2 = E · ds where E is the electric field and ds is the displacement. At the same time, the propagation speed of the microwave can be expressed as in equation (2). Formula (2): C = - C 〇 where ' ε denotes the dielectric constant of the fluid, c denotes the propagation speed of the microwave in the fluid ' and C 〇 denotes the speed of the light. Assuming that the propagation speed of the microwave is known, the thickness of the fluid in a certain section can be calculated. The volume of the fluid can then be calculated using the integral. In this way, the volume of the fluid and the size of the bubble can be calculated. 2 and 3 are views showing a coater according to an embodiment of the present invention. Referring to Figures 2, 3a and 3b, a coater according to an embodiment of the present invention includes a coating head unit 100 and a bubble detecting unit 200. The coating head unit 1A contains a nozzle. The fluid L is applied to the substrate 3 through the nozzle 11 . The coater according to an embodiment of the present invention may include a frame 4, a coating head unit support frame 500, and a pallet 600. At the same time, the coating head unit 100 may further include a main emitter 130 containing a fluid L and a holder 120 for connecting the syringe 130 and the nozzle 11A, as needed. Fig. 3a shows the structure of the coating head unit 100 including the nozzle 11A, the holder 12A, and the syringe 130. The above structure is generally applied to a coater for applying a glue to a base 201240737. However, the invention is not limited thereto. For example, fluid 1 can be applied to the substrate from the fluid reservoir directly through the nozzle. Furthermore, it is possible to directly connect the nozzle 119 to the injector 130 without receiving n(9). 〃 In addition, when the fluid is liquid crystal, it may be the structure shown in Fig. 3b. Referring to FIG. 3b, the coating head unit 1A may include a nozzle 11A, a liquid crystal bottle 140, and a pump module 150. The liquid crystal in the liquid crystal bottle 140 can be dropped onto the substrate through the nozzle 110 by the operation of the pump module 15A. However, the present invention is not limited thereto. In addition, the coating head unit 1 can constitute an ink jet type, wherein the nozzle 110 has an ink jet type spray head which sprays liquid crystal. Further, the liquid crystal bottle 140 can be omitted from the liquid crystal. The slot directly supplies liquid crystal to the nozzle 110. The bubble detecting unit 200 emits microwaves to the fluid L in the coating head unit 100. The bubble detecting unit 200 can detect bubbles in the fluid L based on the changed physical quantity of the microwave through the fluid L. The basic principle of detecting bubbles and the exemplary detection method are as described above. - As shown in Fig. 3, the bubble detection early element 200 can be disposed around the nozzle 110 of the coating head unit 100. In this case, detectable The bubble is detected in the range in which the fluid is to be applied to the substrate 300, and the bubble can be detected more accurately. Hereinafter, the bubble detecting unit 200 will be described in more detail. 201240737 FIG. 4 is a view showing bubble detection according to an embodiment of the present invention. An exemplary structural diagram of the measuring unit 2A. Fig. 4 shows an exemplary structure of the bubble detecting unit 200 using the above microwave according to an embodiment of the present invention, wherein the voltage difference between any two points around the fluid is measured. Referring to Figure 4, the bubble detecting unit 200 includes a generator 210 for generating microwaves and emitting microwaves to the fluid L, a voltage measuring instrument 220, which measures the first around the fluid L to which the microwave is emitted. The voltage difference between the point pi and the second point p2, and the detector 230' detect the bubble in the fluid L by comparing the voltage difference between the first point pi and the second point p2. It is disposed at a position where the generator 210 can emit microwaves to the nozzle 11A. The reason why the microwave is emitted to the nozzle 11() is to detect bubbles in the fluid to be applied to the substrate 300, as described above. The device 210 can be adhered to the outer surface of the nozzle 110. Through this formula, the material other than the fluid in the microwave-filled space can be minimized, and the accuracy and accuracy of the bubble detection can be improved. a voltage difference between the first point P1 and the second point P2 around the fluid 1 to which the microwave is emitted. The first point ρι and the second point p2 may be located around the nozzle 110 to face each other. As described above, the minimum In addition to the fluid L, it may be inserted into the space filled by the microwave 'Improve the accuracy and quasi-breaking property of bubble detection. Hereinafter, the structure of the bubble debt unit 200 according to an exemplary embodiment of the present invention will be described in detail. 12 201240737 FIG. 5 is a view showing bubble detection according to an embodiment of the present invention. Referring to FIG. 5, the bubble detecting unit 2 includes a first block 250 and a second block 260. The nozzle 11A can be inserted into the first block 250 and the second block 260. Because of the structure of the bubble detecting unit 200, the bubble measuring unit 200 can be additionally additionally provided to the conventional coating machine without the bubble detecting unit 200. That is, the bubble detecting unit 200 can be disposed in the conventional coating. The nozzle 110 of the coater can be inserted into the space formed by the first block 250 and the second block 260. In Fig. 5, the first block 250 and the second block 260 of the bubble detecting unit 2 constitute a u-shape. However, the invention is not limited thereto. The structure of the bubble detecting unit 200 can be configured to form various forms of the bubble detecting unit 2 which can be easily set to any coater. For example, the first block 250 and the second block 260 of the bubble detecting unit 200 can be located near the circumference of the nozzle 11 ' 'not u-shaped but the first block 250 and the first block 260 are mutually separate. Alternatively, the first block 250 and the second block 260 may constitute a pair of pliers members by a spring holder, and the first block 250 and the second block 260 may be sandwiched by the nozzles 11'. The generator 210 can be disposed in one of the first block 250 or the second block 26, or 6 in both. The first measurement P1 and the second point P2 of the voltage measuring device 220 for measuring the thunder are respectively located in the first block 250 and the second block 26〇. The first block 250 and/or the second block 260 can be bonded to the outer surface of the nozzle 11 . Furthermore, the first point P1 and/or the second point P2 may be located on the outer surface of the nozzle 11〇 13 201240737. This structure improves the accuracy and accuracy of bubble detection. The bubble detecting unit of the embodiment, and the spray "if:: unit 200" may be disposed at the nozzle 110, so as to apply the nozzle:::: flat, detecting unit, bottom and spray; Bottom 200 J month according to another exemplary embodiment of the present invention, a bubble debt measuring unit structure. Fig. 7 is a view showing another example of the second embodiment of the invention according to another embodiment of the present invention. According to the diagram, the structure between the bubble debt measuring unit 200 and the nozzle 110 is shown.
27〇 n〇^LJ 點p2可位於噴嘴110之外表面上。弟點P1及第一 201240737 如圖6所示，氣泡偵測單元200的底部(即讓噴嘴11〇 插入之孔洞240的底部)及噴嘴110之底部可架構成位在相 同平面。透過這樣的結構，可偵測正要塗佈到基板3〇〇之流 體中的氣泡。 截至目前主要說明氣泡偵測單元2〇〇設置到塗佈頭單 元100之噴嘴110以偵測正要塗佈到基板3〇〇之流體中之氣 泡的結構。然而，在某些實例中，可能難以裝設氣泡偵測單 元200到喷嘴110。一般而言，氣泡偵測單元2〇〇發射微波 島要10-11 mm之农小範圍。然而，某些具有喷嘴的塗膠機， 其長度比10 mm還短。於這樣的情況中，較佳不將氣泡偵 測單元200設置在喷嘴11〇周圍。 因此，於此案例中，較佳不將氣泡偵測單元2〇〇設置在 噴嘴110周圍而是設置在支托器120周圍。於後，說明將氣 泡偵測單元200設置在支托器12〇周圍的例示結構。 圖9及圖10為顯示根據本發明另一實施例之氣泡偵測 單元200及支托器120之例示結構圖。 參考圖9，氣泡偵測單元2〇〇之第一塊體25〇及第二塊 體260可形成U形，且支托器12〇可插置在第一塊體25〇 及第一塊體260之間。氡泡债測單元2〇〇之產生器21〇可設 置在產生器210能發射微波到支托器12〇之位置。 再者’如本發明前述實施例般’產生器210可設置在第 一塊體250或第二塊體26〇其中之一，或設置在兩個塊體 中。電壓量測計220量測電壓的第一點P1及第二點p2可分 201240737 別位在第一塊體250及第二塊體260中。 第一塊體250及/或第二塊體260可黏接到支托器12〇 的外表面。再者，第一點P1及/或第二點P2可位在支托器 120的外表面上。此結構提高氣泡债測的精確性及準確性。 同時’第一塊體250及/或第二塊體260可設置在支托 器120之内徑為固定的範圍d。此結構提高氣泡偵測的精確 性及準確性。 根據本發明之另一實施例，如圖1〇所示，氣泡偵測單 元200可包含第三塊體270，其包含可讓支托器12〇插入之 孔洞240。於此，孔洞240可位在支托器12〇之内徑為固定 的範圍d。 再者’孔洞240的内表面可架構成黏接到支托器12〇的 外表面。如上所述，這樣的結構最小化微波填充的空間中除 了流體L外的物質，而提高氣泡偵測的精確性及準確性❶產 生微波的產生器210可位在孔洞240之周圍。產生器21〇可 架構成黏接到支托器120的外表面。量測電壓的第一點 及第二點P 2可設置在孔洞240之周圍以彼此面對。更佳地， 第一點P1及第二點P2可位於支托器12〇的外表面上。 於後’說明根據本發明之—啦實施例具有氣泡偵 元200進行氣泡偵測之塗佈機的運作。 圖11為顯示根據本發明又一實施例之塗佈機之結構 圖。參考圖1卜根據本發明另一實施例之塗佈機除了塗佈 201240737 頭單元100及氣泡偵測單元200 位置計算部件800。 還可包含驅動單元700以及 架 驅動單元700可藉由移動托台 500改變基板300及塗佈頭單元 600或塗佈頭單元支撐框 100間之相對位置。 位置計算部件_ T計算基板·及塗佈頭單元ι〇〇之 間在由X滅Υ軸収義之χγ鋪統上的補座標， 以控制基板300及塗佈頭單元1〇〇間藉由驅動單元7〇〇 的相對位置。 ”位置計算部件800可即時計算並儲存基板3⑻及塗佈頭 早=100間代表相對位置的座標。舉例而言，當氣泡债測單 則到氣泡時，位置計算部件卿可提供此刻基板 300及塗佈頭單元廳間的相對座標。塗佈頭單元⑽ 動到基板300上塗佈具有氣泡之流體的位置。 藉此，財嘴m塗佈㈣體UG達職板前通常 紅姆間。因此原由’在氣泡偵測單元2_測氣泡時 兰座標/、氧泡實際塗到基板綱時的座標之間會存在誤 f ΐ ’可透過量職從喷嘴11G塗佈賴到達基板 η、間之實驗，制此誤差。使用上述實驗所得的時間 4丁父正，可计算氣泡實際塗到基板300的實際位置。 户产再ΐ力上所述’氣泡偵測單元施不僅可傾測氣泡的 : 逛可汁算氣泡的尺寸。因此，氣泡偵測單元2〇〇可 ^塗流體L少於正常應塗的量。藉由使用所塗流體少於^ 书之计鼻量，塗佈頭單元1〇〇移動到氣泡所塗的位置，並額 201240737 外塗佈所計算的流體量。 ^ 貞測單元2 g g偵測氣泡時，堪動單元 (即氣泡塗⑽㈣的位置 的）’而塗佈頭單元腦更塗佈 體檟里H到對應在偵測 附近’該體積量等於所偵測到之氣泡的體積^㈣ ^這樣的方式，可即時_趙在紐上塗佈不佳並 Γ、佈額外的流體。再者，可節省整個製造時間。再者， Ϊ =時侧職泡’可嗜略使崎_或相機侧氣泡的 額外檢視程序，因此可增加製造程序的效率。再者，若所偵 測到的氣泡尺寸小到不會破壞產品料，則可料氣泡。因 此，可增加整個製造速度。 同時，可提供額外檢視程序以達到更精確又精準的氣泡 偵測。於後，說明根據本發明又一實施例提供額外檢視程序 時之塗佈機的結構。 圖12為顯示根據本發明又一實施例之塗佈機之結構 圖。 參考圖12，根據本發明又一實施例，塗作頭單元ι〇〇 可更包含檢視器290。檢視器290可位於喷嘴11〇的侧邊。 檢視器290檢視對應在氣泡偵測單元200偵測到氣泡之 時刻之座標的位置附近之流體的塗佈狀態。當然檢視器290 可檢視在完成塗佈流體L到基板300的程序後流體L沿著 201240737 的塗佈狀態。檢視器290可即時檢視氣泡且更 精確地檢查偵測位置上流體的塗佈狀態。 明。說明書巾’已參特定例示考實施例說明本發 本發明申請專利範騎提出之較廣義的精神與 ==琳_修改。因此，瓣及圖式僅做為 【圖式簡單說明】 之目的及特徵結合伴_式與實補的說明將 更清楚了解，其中： 圖1為根據本發明實施舰明如何制氣紅示意圖； 圖2為顯示根據本發明實施例之塗佈機之圖式； 圖 及圖313為顯示根據本發明實施例之塗佈機之圖 式； ，4 4顯示根據本發明實施例之塗佈機之氣泡憤 7L 200之例示結構圖； -^ Λ f顯碰據本發明實闕之塗賊之氣泡债測單 70 200之例示結構圖； # 1 1 Λ p/l，示根據本發明實施例之氣泡偵測單元200與噴 嘴110間之綠構關係圖； 圖，頌示根據本發明另一實施例之氣泡偵測單元200 之另一例不結構圖； 盘暗=2示根據本發明另一實施例之氣細則單元200 ，、噴嘴間之結構關係圖； 圖9及®! 10為顯示根據本發明另—實施狀氣泡制 201240737 單元200及支托器120之例示結構圖； 圖11為顯示根據本發明又一實施例之塗佈機之結構 圖；以及 圖12為顯示根據本發明又一實施例之塗佈機之結構 圖。 【主要元件符號說明】 100塗佈頭單元 110喷嘴 120支托器 130注射器 140液晶瓶 150泵模組 200氣泡偵測單元 210產生器 220電壓量測計 230偵測器 240孔洞 250第一塊體 260第二塊體 270第三塊體 290檢視器 300基板 400框架 500塗佈頭單元支撐框架 600托台 700驅動單元 20 201240737 800位置計算部件 d 範圍 L 流體 N 喷嘴 P1 第一點 P2 第二點 W 微波產生器27〇 n〇^LJ Point p2 may be located on the outer surface of the nozzle 110. P1 and first 201240737 As shown in Fig. 6, the bottom of the bubble detecting unit 200 (i.e., the bottom of the hole 240 into which the nozzle 11 is inserted) and the bottom of the nozzle 110 can be formed in the same plane. With such a structure, bubbles which are to be applied to the fluid of the substrate 3 can be detected. Up to now, the bubble detecting unit 2 is mainly disposed to the nozzle 110 of the coating head unit 100 to detect the structure of the bubble which is to be applied to the fluid of the substrate 3. However, in some instances, it may be difficult to mount the bubble detecting unit 200 to the nozzle 110. In general, the bubble detecting unit 2 emits a microwave island of 10-11 mm. However, some glue applicators with nozzles are shorter than 10 mm. In such a case, it is preferable not to arrange the bubble detecting unit 200 around the nozzle 11''. Therefore, in this case, it is preferable not to arrange the bubble detecting unit 2 around the nozzle 110 but to surround the holder 120. Hereinafter, an exemplary structure in which the bubble detecting unit 200 is disposed around the holder 12A will be described. 9 and 10 are diagrams showing an exemplary configuration of a bubble detecting unit 200 and a holder 120 according to another embodiment of the present invention. Referring to FIG. 9, the first block 25A and the second block 260 of the bubble detecting unit 2 can be formed into a U shape, and the holder 12 can be inserted into the first block 25 and the first block. Between 260. The generator 21's generator 21 can be disposed at a position where the generator 210 can emit microwaves to the holder 12A. Further, the generator 210 may be disposed in one of the first block 250 or the second block 26 as in the foregoing embodiment of the present invention, or may be disposed in two blocks. The first point P1 and the second point p2 of the voltage measurement by the voltage measuring device 220 can be divided into the first block 250 and the second block 260 by 201240737. The first block 250 and/or the second block 260 can be bonded to the outer surface of the holder 12A. Furthermore, the first point P1 and/or the second point P2 may be located on the outer surface of the holder 120. This structure improves the accuracy and accuracy of bubble measurement. At the same time, the first block 250 and/or the second block 260 may be disposed in a range d in which the inner diameter of the holder 120 is fixed. This structure improves the accuracy and accuracy of bubble detection. In accordance with another embodiment of the present invention, as shown in FIG. 1A, the bubble detecting unit 200 can include a third block 270 that includes a hole 240 into which the holder 12 can be inserted. Here, the hole 240 may be located in a range d in which the inner diameter of the holder 12 is fixed. Further, the inner surface of the hole 240 can be framed to be bonded to the outer surface of the holder 12A. As described above, such a structure minimizes the substance other than the fluid L in the microwave-filled space, and improves the accuracy and accuracy of the bubble detection. The generator 210 generating the microwave can be positioned around the hole 240. The generator 21 frame is configured to be bonded to the outer surface of the holder 120. The first point and the second point P 2 of the measurement voltage may be disposed around the holes 240 to face each other. More preferably, the first point P1 and the second point P2 may be located on the outer surface of the holder 12A. The operation of the coater having the bubble detector 200 for bubble detection according to the present invention will be described hereinafter. Figure 11 is a structural view showing a coater according to still another embodiment of the present invention. Referring to Fig. 1, a coater according to another embodiment of the present invention is coated with a 201240737 head unit 100 and a bubble detecting unit 200 position calculating unit 800. The drive unit 700 and the carriage drive unit 700 can also be included to change the relative position between the substrate 300 and the coating head unit 600 or the coating head unit support frame 100 by moving the pallet 500. The position calculation unit _ T calculates the complement between the substrate and the coating head unit ι 在 on the χ 铺 收 由 由 , , , , , , , , 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制 控制The relative position of unit 7〇〇. The position calculating component 800 can calculate and store the coordinates of the substrate 3 (8) and the coating head as early as possible to represent the relative position. For example, when the bubble is measured to the bubble, the position calculating component can provide the substrate 300 at the moment. The opposite coordinates between the coating head unit chambers. The coating head unit (10) moves to the position on the substrate 300 to apply the fluid having the bubbles. Thereby, the yog m coating (four) body UG is usually between the red rims before the board. 'In the bubble detection unit 2_ when the bubble is measured, the coordinates of the blue bubble are actually applied to the substrate, and there is an error between the coordinates of the bubble. To make this error, use the time obtained by the above experiment to calculate the actual position of the bubble actually applied to the substrate 300. The bubble detection unit can not only detect the bubble: The size of the bubble can be calculated. Therefore, the bubble detecting unit 2 can reduce the amount of the fluid L to be less than the normal amount to be applied. By using the applied fluid less than the amount of the book, the coating head unit 1〇 〇 Move to the position where the bubble is applied, and the amount is 20 1240737 The amount of fluid calculated by the outer coating. ^ Detecting unit 2 gg detects the bubble, the moving unit (ie the position of the bubble coating (10) (four)) and the coating head unit brain is more coated with the body H to correspond Detecting nearby 'this volume is equal to the volume of the detected bubble ^ (4) ^ This way, you can immediately apply poorly and smear and add extra fluid. In addition, save the entire manufacturing time Furthermore, Ϊ = when the side-bubble 'can be used to make the _ or the camera side bubble additional viewing procedures, thus increasing the efficiency of the manufacturing process. Moreover, if the detected bubble size is small enough to not destroy The product material can be bubbled. Therefore, the entire manufacturing speed can be increased. At the same time, an additional inspection program can be provided to achieve more accurate and accurate bubble detection. Hereinafter, an additional viewing program according to still another embodiment of the present invention will be described. Figure 12 is a structural view showing a coater according to still another embodiment of the present invention. Referring to Figure 12, according to still another embodiment of the present invention, the coat head unit may further include a viewer. 290. Viewer 290 is available The side of the nozzle 11 。. The viewer 290 views the coating state of the fluid corresponding to the position of the coordinate at the time when the bubble detecting unit 200 detects the bubble. Of course, the viewer 290 can view the coating fluid L to the substrate. After the program of 300, the fluid L is along the coating state of 201240737. The viewer 290 can immediately check the bubbles and more accurately check the coating state of the fluid at the detection position. The specification sheet has been referred to the specific example test embodiment. The invention is based on the broader spirit of the invention and the ==lin_modification. Therefore, the flap and the schema are only used as the simple description of the schema, and the description of the companion _ and the real complement will be more BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing how a ship is made into a gas red according to the present invention; FIG. 2 is a view showing a coater according to an embodiment of the present invention; and FIG. 313 is a view showing a coat according to an embodiment of the present invention. Fig. 4 shows an exemplary structural diagram of the bubble anger 7L 200 of the coating machine according to the embodiment of the present invention; -^ 显 f 显 显 据 据 据 70 70 70 70 70 70 70 70 70 Illustrative structure FIG. 1 is a diagram showing a green structure relationship between the bubble detecting unit 200 and the nozzle 110 according to an embodiment of the present invention; FIG. 1 is a view showing a bubble detecting unit 200 according to another embodiment of the present invention. Another example is an unstructured view; the disk darkness = 2 shows a gas rule unit 200 according to another embodiment of the present invention, and a structural relationship diagram between the nozzles; and FIG. 9 and ®! 10 are diagrams showing another embodiment of the bubble system according to the present invention 201240737 FIG. 11 is a structural view showing a coating machine according to still another embodiment of the present invention; and FIG. 12 is a structural view showing a coating machine according to still another embodiment of the present invention. . [Main component symbol description] 100 coating head unit 110 nozzle 120 holder 130 syringe 140 liquid crystal bottle 150 pump module 200 bubble detecting unit 210 generator 220 voltage measuring instrument 230 detector 240 hole 250 first block 260 second block 270 third block 290 viewer 300 substrate 400 frame 500 coating head unit support frame 600 pallet 700 drive unit 20 201240737 800 position calculation component d range L fluid N nozzle P1 first point P2 second point W microwave generator