TW201239119A - Evaporation apparatus - Google Patents

Abstract

An evaporation apparatus including a substrate vehicle, at least one movable evaporation source and at least one movable mask. A substrate is carried by the substrate vehicle. The movable evaporation source is disposed under the substrate. On the substrate, an evaporation range of the movable evaporation source is smaller than a dimension of the substrate. The movable mask is disposed between the substrate and the movable evaporation source, wherein the movable mask has a patterned aperture, and a coverage of the movable mask is greater than or substantially equal to the evaporation range of the movable evaporation source.

Description

υ / 37111twf.doc/I 201239119 VI. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a type of steaming equipment, and is capable of feeding on a large-sized substrate (4); Prior Art] Recently, environmental awareness has risen, and it has the advantages of low consumption, good lightness, high enamel and other superior characteristics. The use efficiency is high. The agricultural device includes a liquid crystal display device and electricity (4). It is a self-illuminating display device. The group "can save the manufacturing cost of the backlight module as well as the back; energy consumed. In addition, due to the characteristics of the organic electro-excitation device, such as no 匕, high response speed, etc., the organic electric device has been reduced to a flat display device with both performance and ring axis. Electromechanical excitation light display device = organic electroluminescence excitation layer, cathode and other film layers are fabricated on the substrate = including = 2] 'organic electro-excitation layer and cathode multi-collection - mask matching: ·, plated square production" The size of the scale of the series (4) usually needs to be the same size. As the substrate continues to move toward a large size, the size of the mask required for the hot-dip process is also increased. However, a large-size mask is difficult to fabricate, resulting in a manufacturing cost burden. This large size mask has insufficient structural strength, and the side of the gravity is drooping.

201239119 37111twf.doc/I and other issues, therefore, how to develop one of the focuses of this field. The vapor deposition process is performed on the size substrate, which is actually [inspective content]. The device is provided with a thin gauge, and (4) a plate-plating device is provided on a large-sized substrate, which includes a substrate carrier, at least a carrier substrate, and can be moved. Mask. The substrate carrier is adapted to have a small vapor deposition range on the substrate; the earthmoving vapor deposition source is apertured and movable, wherein the movable mask has a patterning evaporation on the substrate. The shielding range is greater than or equal to the movable steam source. One less steaming equipment' includes a substrate carrier, a plate, and a multi-mask. The substrate carrier is adapted to carry a movable movable recording source on a substrate between the base source and the substrate, and the 1°° mask is disposed in the movable surface of the movable steaming I /, and each of the masks has a pattern Open the hole and surround each mask. ',, or equal to the vapor deposition range of the movable vapor source on the substrate, and the combination of the moving f source and the movable mask, or the area of the source and the plurality of masks respectively The difference is that the A-plate phase II is not required because the movable mask is different from the size mask of each mask, so the present invention can effectively reduce the movable mask and the 4

. The above and other objects, features, and advantages of the present invention will be made apparent by the appended claims. [Embodiment] [First Embodiment] Fig. 1D is a schematic view of a vapor deposition apparatus according to a first embodiment of the present invention. Fig. 2 is a side elevational view showing the vapor deposition apparatus of the first embodiment of the present invention. Referring to FIG. 1A and FIG. 2, the vapor deposition apparatus 1 of the present embodiment includes a substrate carrier 110, a movable vapor deposition source 12A, and a movable mask 13A. The substrate carrier 110 is adapted to carry a substrate SUB, and the movable evaporation source 120 is located below the substrate SUB, and the recording range A2 of the movable evaporation source 12 on the substrate is smaller than the size of the substrate UB. The movable mask 13 is disposed between the movable vapor deposition source 12G and the substrate SUB, wherein the movable cover has a patterned opening 130a, and the shielding A1 of the movable mask 130 is greater than or equal to the movable evaporation source 120. Steam A2 on the substrate SUB. It should be noted that the shape of the shielding range A1 is the same as that of the vaporizing range A2. For example, in the example of the shielding range A1 and the evaporation range, the substrate can be divided into a plurality of array rows. The area = HA3' and the movable mask 13G has - corresponding to each mineral film i°3〇cn/^ 13%卩 and the surrounding area of the 13Gb of the ring-effect area A1: 彳^ The outer f defines a movable cover The mask A3##tL of the cover 130 is π-side, and the respective coating areas on the substrate SUB are mutually wired, but this is not limited thereto. Finance, each membrane area A3

201239119 1 37111twf.doc/I may also be adjacent to each other (not shown), the number of movable vapor deposition sources 12〇 is the same as the number of movable masks 130, and the number of coating areas A3 is coat; movable, cover The number of no. In the present embodiment, the number of the coating regions Α3 is, for example, six, and the number of the movable vapor deposition sources 12〇 and the number of the movable masks are, for example, one, but not limited thereto. - In order to smoothly evaporate all the film areas Α3 on the substrate SUB, the movable stage source m and the movable mask need to move synchronously under the substrate. In detail, the movable vapor deposition source 12G moves a plurality of times along the movement path P1 and sequentially stays under each of the plating sheets A3, and the movable mask 13G moves along the movement miscellaneous P2 a plurality of times and each of the membrane areas A3 Below, and the movable mask 13〇 is always maintained above the vaporizable source m for line inspection. In other words, whenever the movable steam source 12〇 and the movable mask 130 move below a mining membrane area A3, the movable money source 120 and the movable mask 13〇 are temporarily moved, 1 Zone A3 is steamed. After the evaporation of a certain coating d A3 is completed, the movable steaming _ 120 and the movable mask 13 = the moving path P2 are moved again below the lower - film area 5, and the next coating area A3 is steamed. S==No on the substrate, the film area A3 is not in the same plating but is steamed at a plurality of time points, so the size of the movable reduction source m-axis surface 13 must be equal. For example, 'J shoulders, violently and each: the membrane area ― is quite a real need to apply _ can be a shaft wire 3512 0 inch can be smaller than the size of the substrate SUB, so 130 feet J eight prisoner this implementation The case does not face the conventional 6

07 37111twf.d〇c/I 201239119 The problem (such as insufficient structural strength, gravity movement by 120 steps. (P2) on the substrate _ below the same 'the present invention does not limit the movable evaporation source 120 and the movable speaker ί有为u形路#, this field has the usual knowledge i ...: "Multi-dynamic therapy money source, 120 and two modified to move back shape path (P3, P4), as shown in Figure 1B 1C and FIG. 1D, the steaming apparatus 100 of the present embodiment has the same number of covers, the source=120, and the plurality of movable covers. The read and the movable cover (10) cover: two; The number of the source 120 and the movable concealer = diameter (P5, P5, P6, P6,) == and the number of movable masks 13G are both two, and the movable mask m is along the line -L Shape path (P7 = synchronous movement under the substrate SUB. It is worth noting that the aforementioned if t invention, the field has the general knowledge of the size of the substrate SUB and other design requirements, moderately change the movable evaporation source 120 and The moving path of the movable mask 13〇. When multiple splicing sources 12G and multiple movable masks are selected

201239119, 37111twf.doc/I 13〇 When the deposition area A3 on the substrate SUB is vapor-deposited, the time required for the evaporation process can be shortened, and the throughput can be improved. [Second Embodiment] Figs. 3A to 3B are schematic views of a vapor deposition apparatus according to a second embodiment of the present invention, and Fig. 4 is a side elevational view showing the vapor deposition apparatus of the second embodiment of the present invention. Referring to FIG. 3A and FIG. 4, the vapor deposition apparatus 100 of the present embodiment includes a substrate carrier 110, at least one movable evaporation source 120, and a plurality of masks 13'. The substrate carrier 110 is adapted to carry a substrate SUB, and the movable evaporation source 120 is located below the substrate SUB, and the evaporation range A2 of the movable evaporation source 120 on the substrate SUB is smaller than the size of the substrate SUB. The mask 130 is disposed between the movable evaporation source 120 and the substrate SUB, wherein each of the masks 130 ′ has a patterned opening 13 〇 a, and each of the masks 13 〇 has a shielding range A1 greater than or equal to the movable The vapor deposition source 120 has a vapor deposition range A2 on the substrate SUB. It is to be noted that the shape of the shielding range A1 is similar to the shape of the evaporation range A2. For example, the shielding range A1 and the evaporation range VIII are both rectangular ranges. In this embodiment, the substrate SUB can be divided into a plurality of arrays of mineral film areas A3 ′ arranged in an array, each of which is 13 〇, corresponding to each, the effective area 13Qb of the membrane area A3 and the surrounding effective area 13Qb The peripheral area 130c' and the outer edge of the peripheral area 13〇b define the respective masks (10), and the extent Ab can be clearly seen from FIG. 4, and the respective key film products A3 on the substrate SUB are separated from each other, but Not limited to this. In other words, each of the bell-shaped regions A3 may also be adjacent to each other (not shown), the number of movable distilled mineral sources 12〇 is less than the number of the masks 130, and the number of the coating regions A3 is equal to the number of the materials 13〇. 8 201239119

One.....U7 37llltwf.doc/I is the same amount. In the present embodiment, the number of the movable vapor deposition sources 12 is, for example, one, and the number of the coating regions A3 and the masks 130 is, for example, six. In order to smoothly carry out the evaporation of all the bond film areas A3 on the substrate SUB, the movable vapor deposition source 120 needs to move under the substrate SUB. In detail, the movable vapor deposition source 120 is moved a plurality of times along the movement path P9 and sequentially stays under the respective coating areas A3 (i.e., different masks no) to facilitate the evaporation. In other words, each time the movable vapor deposition source 12 is moved below a & membrane region A3, the movable vapor deposition source 12A temporarily stops moving, and the coating region A3 is vapor-deposited. After the vapor deposition is completed in a certain coating zone A3, the movable vapor deposition source 120 is again moved along the movement path P9 below the next coating zone A3, and the next coating zone A3 is vapor-deposited. In view of the above, since the different coating regions A3 on the substrate SUB are not vapor-deposited at the time point, but are separately worn at a plurality of time points, the size of the vapor deposition source 丨2〇 and the scale 13G can be moved without It is equivalent to the size measured by the substrate. For example, the movable steam _ 12G and the mask η size only need to be equal to or equal to the area of each coating area A3. Since the movable steam _12 〇 and the mask 13 size used in the embodiment can be Because of the size of the substrate SUB, the present embodiment does not know the problem of large-size materials (such as the problem of drooping and the like).

As is clear from Fig. 3A, the movable vapor source 12-turned path P9 moves below the substrate SUB. U == invention does not limit the movable vapor deposition source i2 〇嶋 must be U secret path, the movement path of the plated source 120 in this field is modified to W force 'moving steamed text is the 迂-shaped path (Ρ 10), as shown 3Β

201239119; 37111twf.doc/I 201239119; 37111twf.doc/I The real clock source m disclosed in FIG. 3A and FIG. 3B t is shown, however, this embodiment does not limit the household: = wide movable steaming: original 12 inch Quantity. For example, the movable evaporation source is vapor deposited (e.g., two or more). When the amount of the selection is more than = and the mineral film on the plurality of masks_substrate SUB, the time required for the steaming process can be reduced, thereby increasing the production capacity. Ding continued to send the remaining material shaft to reduce the axial material of the combination of the steam source and the multiple masks, in order to different the substrate: the field test, because the movable fresh and the two masks of each mask are equivalent to the substrate Therefore, the present invention can effectively reduce the difficulty in manufacturing the movable mask and the mask. Although the present invention has been described above by way of a preferred embodiment, it is not intended to limit the invention, and it is to be understood that those skilled in the art can make some modifications and refinements without departing from the spirit of the invention. The protection of the invention is defined by the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A to Fig. 1D are schematic views of an evaporation apparatus according to a first embodiment of the present invention. Fig. 2 is a side elevational view showing the vapor deposition apparatus of the first embodiment of the present invention. 3A to 3B are schematic views of a vapor deposition apparatus according to a second embodiment of the present invention. Fig. 4 is a side elevational view showing the vapor deposition apparatus of the second embodiment of the present invention.

201239119υ/ 37111twf.doc/I [Description of main component symbols] 100, 100': evaporation apparatus 110: substrate carrier 120: movable evaporation source 130: movable mask 130': mask 130a: patterned opening 13 Ob · effective area 130c : peripheral area SUB : substrate A1 : shielding range A2 : evaporation range A3 : coating area P1 to P10 : moving path 11

Claims (1)

37111twf.doc/I 201239119 v 7 VII Patent Application Area 1. An evaporation apparatus comprising: a substrate carrier adapted to carry a substrate; at least one movable evaporation source under the substrate, the movable evaporation The evaporation zone on the substrate is smaller than the size of the substrate; and at least a movable mask disposed between the movable evaporation source and the substrate, wherein the movable mask has a patterned opening, And the shielding range of the movable mask is greater than or equal to the evaporation range of the movable evaporation source on the substrate. 2. The vapor deposition apparatus of claim 1, wherein the number of the movable vapor deposition source is the same as the number of the movable mask, and the movable vapor deposition source and the movable mask are tied to The substrate moves synchronously below. 3. The vapor deposition apparatus according to claim 2, wherein the vaporizable subliminal m-u-shaped path moves synchronously on the side. 4. If you apply for the equipment described in the special _ 2 items, the one that can be moved by Qin Qin Lai can be mixed with the following. 5. For example, please use the special fiber (4) 2 pin-shaped listening device, wherein the number of the movable steam source and the number of the movable mask are multiple. In the first embodiment of the present invention, the movable mask has an area, and the movable mask has an area, and one of the active areas on Tuesday and a periphery around the effective area 00 U σ The outer edge defines the masking range of the movable mask. The vapor deposition apparatus of the sixth aspect of the invention, wherein the movable evaporation source and the movable compartment are respectively movable on the each membrane area 8. The evaporation film device comprises: an evaporation device comprising: ... another substrate carrier adapted to carry an at least-movable steam source, the bit 2 == the chain range is less than the inch = the steaming is performed in each of the masks纟^在五亥 可移* Weiyuan and the substrate, JL ==:= The mask-covering "9·If the steaming range on the patented substrate. Moving the steaming seam 4 is less than the surface secret equipment' Wherein the movable = to = item: the steaming device described, wherein the 11 can be like the Shenjing patent! = the moving under the mask. (4) The equipment described in the item, wherein the cup is the patent scope of the 8th The money-selling apparatus of the item, wherein the effective area of the membrane region and the circumference of the circumference of the effective area are defined by the outer circumference of the effective area J and the outer edge of the peripheral area defines the vane H of each of the masks. Buckle' 4. As claimed in the patent application (4), the steam-bonding device, the number of forging zones in the complex is the same as the number of the masks, and the movable = Hai = moving between the recordings, For each of the platings, respectively = 13