TW201237560A - Light irradiation device - Google Patents

Light irradiation device Download PDF

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Publication number
TW201237560A
TW201237560A TW100137555A TW100137555A TW201237560A TW 201237560 A TW201237560 A TW 201237560A TW 100137555 A TW100137555 A TW 100137555A TW 100137555 A TW100137555 A TW 100137555A TW 201237560 A TW201237560 A TW 201237560A
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TW
Taiwan
Prior art keywords
light
amount
illuminance
processing unit
lamp
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TW100137555A
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Chinese (zh)
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TWI463272B (en
Inventor
Shigenori Nakata
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Ushio Electric Inc
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Priority claimed from JP2010266415A external-priority patent/JP5234091B2/en
Priority claimed from JP2011043804A external-priority patent/JP5541198B2/en
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW201237560A publication Critical patent/TW201237560A/en
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Publication of TWI463272B publication Critical patent/TWI463272B/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The subject of the present invention is to provide a light irradiation device configured of a plurality of discharge lamps disposed in alignment in a prescribed direction, capable of identifying a discharge lamp in which an abnormality occurs and discriminating the abnormal state, and capable of confirming a normal operating state of the device. To solve the problem, the light irradiation device is equipped with light source elements (21) disposed in alignment and composed of discharge lamps and a reflector. The light source elements (21) are turned on at the same time so as to emit light beams from the light source elements (21) into a light illumination area of a light illumination portion (1). A diffusion plate (55) is disposed in the light illumination area to diffuse and further irradiate the light beams from the light source elements (21). Moreover, a photo sensor (60) is disposed to detect light quantity distribution of a diffusion sporadic light reflected by the diffusion plate (55). A signal detected by the photo sensor (60) is transmitted to an image processing unit (7). The image processing unit (7) converts illumination distribution on the diffusion plate (55) into illumination distribution of the light illumination area for being displayed on a display portion. Further, if the illumination of a specific lamp is lowered, the specific lamp with the lowered illumination outputs an alarm signal so as to increase power supply to the specific lamp thereby compensating the variation of the light quantity distribution.

Description

201237560 六、發明說明： 【發明所屬之技術領域】 本發明係關於例如於半導體裝置或液晶顯示裝置或者 圖案化相位差薄膜的製造工程等中爲了形成線狀圖案所使 用之光照射裝置，且將使用短弧型放電燈之複數光源元件 並排於一方向並同時點燈，進行曝光處理的光照射裝置中 ，具備可瞬時檢測從複數光源元件放射之光線的照度分布 之光檢測器的光照射裝置，尤其，關於可依據該光檢測器 來顯示照射區域之照度分布及積算光量分布，又，可使光 線的照度分布均一化的光照射裝置者。 【先前技術】 例如，於半導體裝置或液晶顯示裝置或者圖案化相位 差薄膜的製造中，爲了形成線狀圖案而進行曝光處理，於 此曝光處理中，爲了藉由對被照射物，廣範圍照射紫外光 等的活性能量線而提升量產性，通常檢討使用具備長弧型 放電燈的光照射裝置。 但是，在長弧型放電燈中難以於燈長邊方向中照射相 互平行之光線，故產生難以獲得忠於遮罩圖案且解析度高 的圖案之問題。又，根據液晶面板的大型化及生產效率的 提升等之觀點，有照射區域大面積化的要求。 先前，對應放電燈大型化而大面積化’但是’有製造 技術上的問題，實現其以上之放電燈的大型化越來越困難 -5- 201237560 對於此種要求，提案有使用小型短弧型放電燈 複數光源元件的光照射裝置。 然而，於此種光照射裝置中，因各放電燈具有 壽命的個體差別，難以將各放電燈的照度維持率保 一，對於爲了確保在製造線上之高信賴性及穩定之 來說，需要進行各放電燈之照度及照度分布（光量 的監控，均一地保持照度。 如此，於使用短弧型放電燈而並排複數光源元 照射裝置中，測定各放電燈之照度的方法係例如圖 示，提案有將從由複數放電燈101-a及反射鏡ι〇ι_ 成之複數光源部1 〇〇放射之光線（紫外線）藉由 102重疊之後，從開口於折返反射鏡1〇3的一部分 部103-a透射一部分，並藉由照度測定裝置107測 法。 爲了測定各光源單元101的照度，在使光源部 燈時，一邊1次使1個光源單元1 01消燈，一邊測 源單元的照度，並將照度資訊記錄於記憶手段1 06-1 在此方法中，可測定各光源單元1 0 1的照度値 文獻1 )。 然而，在此種方法中，僅測定從積光器1 0 2射 數放電燈1 〇 1 - a所致之合成光的照度（所謂整體的 布被平均化之値），無法獲得光照射裝置所致之光 域之正確的照度分布，故無法適用於形成線狀圖案 射裝置。 而並排 照度及 持爲均 生產性 分布） 件的光 27所 b所構 積光器 之透光 定的方 100消 定各光 )0 (專利 出之複 照度分 照射區 的光照 -6- 201237560 又’於曝光處理中，即使在任一放電燈的照度降低之 狀況’也僅檢測出合成光的照度降低，故無法特定發生異 常之放電燈。 又’於使用短弧型放電燈而並排複數光源元件的光照 射裝置中’作爲測定照度分布的方法，公知有圖2 8所示 之方法。如同圖所示，將光感測器115配置於XYZ平台 117上’在測定時一邊於照明系單元lll-a並排之方向掃 描光感測器1 1 5 —邊測定照度。然後，可藉由測定照度的 變化’測定照明光學系1 1 1的照度分布（專利文獻2 )。 又’公知有藉由對應各放電燈而設置照度測定手段， 測定各放電燈的照度，藉由，檢測出放電燈的照度降低等 之異常的方法。 依據此種方法，例如，因長時間的使用而任一放電燈 的照度經時性降低時，可特定發生問題的放電燈，但是， 藉由各照度測定手段來測定的是在某特定處之照度（從特 定光源輝點放射，在反射鏡的特定處反射之値），就算配 置與燈光源相同數量程度的照度測定手段，也無法獲得光 照射裝置所致之光照射區域之正確的照度分布，故會產生 以下問題。亦即，參照圖7來說明的話，例如，於任一放 電燈產生因對構成放電燈之電極施加外力而變形等的要因 ’放電燈的光軸偏離之現象時，該放電燈所致之光照射區 域會移位至鄰接於該放電燈之放電燈所致之光照射區域側 ’實際的照度分布成爲圖7中虛線所示之曲線。由圖7可 知，發生問題之放電燈的照度變化之影響，在鄰接於該放 201237560 電燈之放電燈所致之光照射區域也會產生，故例如儘管於 該鄰接之放電燈的紫外線之光量本身沒有變化，藉由對應 該放電燈的照度測定手段所測定之照度會表示比初始値還 低或增加之値。然而，在前述的方法中，因爲在測定各放 電燈所致之光線的重疊區域之位置並未有照度測定手段， 故無法正確判別此種放電燈之異常的狀態。爲此，依據各 照度測定手段所致之測定結果，例如以使放電燈的照度增 加或降低之方式進行放電燈的點燈控制時，反而會使照度 分布不均一。 又，於將短弧型放電燈排列於一方向的光照射裝置中 ，尤其於藉由往正交於光照射區域的長邊方向相對掃描被 照射物（工件）來處理的製程中，例如就算僅有些微部分 ，只要有照度降低之部分的話就會產生條紋狀的不均，故 涵蓋長邊方向全域，確認在細微測定節距的照度分布及積 算光量分布非常重要。 另一方面，在使用長弧型放電燈之印刷物的乾燥硬化 之用途中，根據光線從1條電弧產生與來自各發散角較大 之寬廣的寬度方向之光線重疊之狀況，長邊方向的照度分 布事實上不會產生局部變動，故先前並不算是問題。因此 ，在長弧型放電燈中，於其長邊方向的數個地方程度，取 得積算光量資料即可。但是，在將短弧型放電燈複數並排 於一方向的光照射裝置中，如前述般，僅在長邊方向的數 個地方程度取得積算光量資料並不足夠。 於將短弧型放電燈複數並排於一方向的光照射裝置中 -8- 201237560 ，爲了涵蓋長邊方向全域來確認在細微測定節距的照度分 布及積算光量分布，也考慮密接配置多數照度測定手段》 但是，此時不僅成本會增加，也會有各受光元件的汙染問 題及紫外線所致之劣化速度'溫度上升時之感度變化的特 性（溫度係數）之各體差，故也產生難以長期間進行照度 分布測定之問題。 如上所述，爲了形成線狀圖案而使用之複數放電燈並 排配設於所定方向的光照射裝置中，詳細的照度分布測定 首次成爲技術上的大課題。但是，實際上也未有可高信賴 性檢測出各放電燈的照度及照度分布之方法。 〔先前技術文獻〕 〔專利文獻〕 〔專利文獻1〕日本特開2010-034293號公報 〔專利文獻2〕日本特開平1 0-284401號公報 【發明內容】 〔發明所欲解決之課題〕 專利文獻1的測定方法係利用照度測定裝置〗07來檢 測出加算複數光源單元1 0 1的光線之値。爲此，對於爲了 測定個別光源單元之値來說，在使光源部1 〇〇消燈時，必 須一邊1次使1個光源單元消燈一邊記錄照度的變動。 在裝置作動時’無法測定各照度單元的照度，在測定 時必須先使照明系單元測定，測定需耗費時間。又，在此 方法中僅使用積光器等製作2次光源的光學系有效。 -9 - 201237560 在專利文獻2的方法中，在使照明光學系1 1 1點燈之 狀態下，可利用使光感測器1 1 5進行掃描，測定XYZ平 台117上的照度分布。 所以，在進行測定時，必須從χγΖ平台1 1 7上去除 基板116。在基板爲薄膜狀時，因爲無法容易去除，故照 度測定僅限於交換薄膜狀的基板時等。 因此，在裝置動作之間無法進行測定，檢測裝置動作 中的異常而無法控制照度分布。 又，在一邊使1個光感測器1 1 5掃描一邊進行測定的 方法中，在測定詳細的照度分布時，必須增加測定點數， 故非常耗時。進而於測定中光感測器1 1 5會暴露於照明光 源之較強光線下，所以光感測器的溫度會上升。光感測器 會因溫度而測定感度產生變化，故無法進行正確之照度分 布的測定。 對於爲了測定正確之照度分布來說，必須讓光感測器 在相同溫度下同時測定。 進而，使用短弧型放電燈而並排複數光源元件的光照 射裝置之狀況中，照度降低的原因係不僅個別光源元件的 照度降低，有任意光源元件照度不降低之狀態下，光軸對 於其他光源元件偏離之狀況。 此時，爲了使降低之照度回復，使投入至放電燈之電 流値增加的話，會成爲照度分布會惡化、放電燈的壽命減 少、裝置故障的原因。 爲此’不僅進行照度分布的測定，以測定結果爲基準 10- 201237560 來掌握照度的變動原因，可依據此進行適切對應爲佳。 本發明係有鑒於前述情況所發明者，於作爲光源將複 數短弧型放電燈並排於所定方向的光照射裝置中，可總括 檢測出從各光源元件放射之光線的照度分布之變動，並且 可判別並顯示亮度降低的放電燈等，進行產生問題的放電 燈之特定及異常之狀態，可確認裝置的正常動作狀態。又 ，提供於光照射區域中照度分布變動時，可謀求照度之均 一化的光照射區域。 〔用以解決課題之手段〕 本發明的光照射裝置，其特徵爲具備： 光射出部，係具有由短弧型的放電燈，及以包圍該放 電燈之方式配置，且反射來自該放電燈之光線的反射器所 構成之光源元件複數並排配置於一方向的光源元件列；及 光檢測元件陣列，係檢測各放電燈所致之光到達區域 之來自複數測定處的擴散光之光量。 於本發明的光照射裝置中，構成爲前述測定處之擴散 光係經由成像光學元件而藉由前述光檢測元件陣列被檢測 出。 又，於本發明的光照射裝置中，構成爲擴散板係可自 由進退地設置於從前述光射出部射出之光線的光路徑；該 擴散板的光擴散面之擴散光的光量藉由前述光檢測元件陣 列被檢測出。 又進而，於本發明的光照射裝置中，構成爲設置有在 -11 - 201237560 動作時位於從前述光射出部射出之光線的光路徑上，將來 自該光射出部之光線加以遮光的光閘構件：前述擴散板係 設置於該光閘構件之光照射面上。 又進而，於本發明的光照射裝置中，構成爲具備聚光 構件，係將來自前述光射出部之光線聚光成延伸於一方向 之線狀》 又進而，於本發明的光照射裝置中，構成爲具備：反 射構件，係使來自前述光射出部之光線中所定波長範圍的 光線反射，且施加有使該波長範圍以外之光線透射的波長 選擇塗層； 於來自前述光射出部之光線透射該反射構件之透射光 的光到達區域上，設置有擴散板，來自該擴散板之擴散光 藉由前述光檢測元件陣列被檢測出。 於本發明中，藉由將由短弧型放電燈及以包圍該放電 燈之方式配置，反射來自該放電燈之光線的反射器所構成 的光源元件並排於一方向並同時點燈，將來自前述光源元 件的光線照射至光照射區域，進行曝光處理等的光照射裝 置中，設置配置於來自該光源元件之光線的光到達區域， 且使來自該光源元件之光線擴散並加以放射的擴散手段， 並且設置並排用以檢測以該擴散手段反射之擴散散亂光之 光量（光強度）的複數光檢測元件的光量檢測手段。 前述光量檢測手段，係將從前述光源元件射出，以擴 散手段反射之擴散散亂光加以受光，但是，在光量檢測手 段的各位置檢測出之光量（光強度）因爲對光量檢測手段 -12- 201237560 之光線的射入角度、擴散板的反射特性等，不一定會正確 反映於從前述光源元件射出之光線被照射之光照射區域上 的各位置之照度。例如，即使是相同強度的散亂光，相對 於從光量檢測手段正面射入之散亂光，傾斜射入至光量檢 測手段之光的散亂光被測定出較低。 在此，在本發明中，設置將前述光量檢測手段上的各 位置中被檢測出之光量，與從光源元件射出之光線被照射 的光照射區域之各位置之照度建立對應，並將光量檢測手 段上的各位置之光量，轉換成表示該光照射區域的各位置 之照度變動的訊號的手段。 藉此，藉由前述光量檢測手段的輸出，可獲得相當於 光照射區域之照度分布的訊號，可檢測出照度分布的變動 〇 再者，照度係表示照射至光照射區域等之光線的亮度 的物理量。進行測定的光檢測元件的大小有限制，例如， 在將長方形的光檢測元件以長邊與搬送方向平行之方式配 置來進行測定時’被測定之量也有稱爲積算光量等以其他 名稱稱呼之狀況，但是’在本說明書中將表示以光檢測元 件測定之亮度的物理量總稱表記爲照度。 將光量檢測手段上的各位置之光量，轉換成表示光照 射區域的各位置之照度變動的訊號之處理係例如可如以下 所述般進行》 •預先準備用以將光量檢測手段上的各位置之光量，轉換 成表示光照射區域之各位置的照度之訊號的轉換比率資料 -13- 201237560 ，使用此轉換比率資料，根據光量檢測手段上的各位置之 該擴散散亂光的光量，計算出表示光照射區域之各位置的 照度變動之訊號。 •將使光源元件列的放電燈初次點燈時所檢測出之光量檢 測手段上的各位置之光量，作爲基準光量資料而保存，根 據光量檢測手段上的各位置之該擴散散亂光的光量與前述 基準光量資料，計算出表示光照射區域之各位置的照度變 動之訊號。 可藉由顯示並輸出如此檢測出之照度分布的變動，監 視從複數光源元件放射之光線的照度分布之變動。又，根 據前述照度分布的變動，檢測出從特定光源元件照射之光 線的照度降低之狀況時，例如利用使供給給該光源元件的 放電燈之電力增加，可彌補照度的降低。 作爲前述擴散手段，於前述光源元件與光照射裝置之 間的光路徑中設置擴散光線並加以反射的擴散元件亦可， 但是，在裝置動作之間也欲檢測照度分布的變動時，作爲 擴散手段而利用設置於前述光路徑中的遮罩等，又，將設 置於前述光路徑中之聚光構件等的光學元件設爲冷光鏡， 於該冷光鏡的背面側設置擴散手段，利用擴散手段使透射 冷光鏡之光線擴散，導引至光量檢測手段亦可。 依據以上所述，於本發明中，如以下所述來解決前述 課題。 (1 ) 一種光照射裝置，係具備：光射出部，係具有由短 弧型的放電燈，及以包圍此放電燈之方式配置，且反射來 -14- 201237560 自該放電燈之光線的反射器所構成 置於一方向的光源元件列；擴散手 源元件之光線的光到達區域，且使 擴散並加以放射；光量檢測手段， 段之擴散散亂光加以受光，並檢測 亂光的光量之複數光檢測元件；及 前述光量檢測手段的輸出；於前述 換處理部，係將前述光量檢測手段 前述光源元件射出之光線的光照射 ，並將藉由光量檢測手段所檢測出 成表示該光照射區域的各位置之光 表示藉由前述轉換處理部所得之光 量變動的訊號的手段。 (2) 於前述（1)中，前述畫像處 理手段，係將表示藉由前述轉換處 訊號，與光照射區域的位置建立對 元。 (3) 於前述（1) (2)中，於前 光量變動監視手段，係監視表示藉 之光照射區域的各位置之光量變動 段，係用以控制從電源裝置供給給 源元件的放電燈點燈之電力；前述 在藉由表示前述光照射區域之各位 檢測出光源元件中特定光源元件的 之光源元件複數並排配 段，係配置於來自各光 來自該光源元件之光線 係具備將來自該擴散手 出受光各處之該擴散散 畫像處理單元，係處理 畫像處理單元設置：轉 上的各位置，與照射從 區域之各位置建立對應 之各位置的光量，轉換 量變動的訊號；及輸出 照射區域的各位置之光 理單元係設置：顯示處 理部所得之光量變動的 應並加以顯示於顯示單 述畫像處理單元設置： 由前述轉換處理部所得 的訊號；及供電控制手 各光源元件用以使各光 光量變動監視手段，係 置的光量變動之訊號， 放電燈之光量降低時， -15- 201237560 藉由前述供電控制手段來控制供給用以使各光源元件.的放 電燈點燈之電力的前述電源裝置，使供給給前述光量降低 之放電燈的電力增大，來使該放電燈的光量增加。 (4) 於前述（1) (2) (3)中，前述畫像處理單元係具 有：記憶體，係儲存用以將光量檢測手段上的各位置之光 量’轉換成表示該光照射區域之各位置的光量之訊號的轉 換比率資料；前述轉換處理部，係從前述記憶體讀入轉換 比率資料，根據前述光量檢測手段上的各處之該擴散散亂 光之光量，與儲存於前述記憶體之轉換比率資料，計算出 表示光照射區域之各位置的光量變動之訊號。 (5) 於前述（1) (2) (3)中，前述畫像處理單元係具 有：記憶體，係作爲基準光量資料，儲存使該光照射裝置 之光源元件列的放電燈初次點燈時所檢測出之光量檢測手 段上的各位置之光量；前述轉換處理部，係根據前述光量 檢測手段上的各位置之該擴散散亂光的光量，與儲存於前 述記憶體之基準光量資料，計算出表示光照射區域之各位 置的光量變動之訊號。 〔發明的效果〕 依據本發明的光照射裝置，可獲得以下效果。 (1)藉由構成爲具備檢測各放電燈所致之光到達區域之 複數測定處個別的擴散光之光量的光檢測元件陣列，藉由 該光檢測元件陣列，取得光射出部所致之光到達區域之光 源元件的排列方向之照度分布及積算光量分布、以及關於 -16- 201237560 各放電燈的照度之資料。然後，依據取得之資料，檢測出 構成光源元件列之任一放電燈產生照度降低等異常時，可 正確特定產生問題的放電燈，並且可判別照度降低或光軸 偏離等之異常狀態’故可確實確認光照射裝置的正常動作 狀態。 (2 )設置使來自光源元件之光線擴散並加以放射的擴散 手段’並利用光量檢測手段檢測出該擴散手段上的各處之 擴散散亂光之光量，將光量檢測手段上的各位置之光量， 轉換成表示該光照射區域之各位置之照度變動的訊號並加 以輸出’故可不需如先前技術般，一邊1次使1個光源消 燈一邊觀察照度的變動，不需使光感測器進行掃.描，即可 同時監視從複數光源元件放射之光線的照度分布之變動。 爲此，可一邊進行對於被處理物的光照射處理，一邊 進行各放電燈之點燈狀態的監視，在檢測出任一放電燈的 異常時，可使生產線停止，迅速採取交換放電燈等之措施 ，可進行有效率的設備動作。 又，藉由將表示光照射區域之各位置的照度變動之訊 號，與光照射區域的位置建立對應並顯示於顯示單元，可 監視哪個光源元件的光量降低等。 (3 )設置監視表示光照射區域的各位置之照度變動的訊 號之光量變動監視手段，藉由表示光照射區域的各位置之 照度變動的訊號，檢測出光源元件中特定光源元件的放電 燈之照度降低時，使供給給該放電燈的電力增大，彌補照 度的降低，藉此，防止光源裝置的照度降低等之性能降低 -17- 201237560 ，可防止不良品的大量產生。 (4)設置用以將光量檢側手段上的各位置之光量，轉換 成該光照射區域之各位置的照度之訊號的轉換比率資料， 根據光量檢測手段上各處之該擴散散亂光的光量與儲存於 前述記億體的轉換比率資料，計算出表示光照射區域之各 位置的照度變動之訊號，藉此，可比較簡單地取得表示光 照射區域之各位置的照度變動之訊號。 (5 )作爲基準光量資料，儲存在使光照射裝置之光源元 件列的放電燈初次點燈時所檢測出之光量檢測手段上的各 位置之光量，根據光量檢測手段上各處之擴散散亂光的光 量與儲存於前述記憶體的基準光量資料，計算出表示光照 射裝置之各位置的照度變動之訊號，藉此，相較於使光源 元件列的放電燈初次點燈時的照度分布，可掌握照度分布 變動了哪種程度》又，可易於檢測出光源元件之照度的降 低及光源元件之光軸的偏離等，可準確判斷燈或燈單元交 換之必要性的有無及時機。 【實施方式】 以下，針對本發明的實施形態，進行詳細說明。 圖1係揭示本發明實施例之光照射裝置的整體之槪略 構造的圖，圖2係以A-A線切斷圖1之光照射裝置的側面 剖面圖。又，圖3係從聚光構件40的背面側透視光源側 ’觀看圖2所示之光照射部的圖。 本發明的光照射裝置係例如爲了製造圖案化相位差薄 -18 - 201237560 膜所使用者，如圖1所示，由具備聚光構件40的光射出 部10、具備將來自光射出部10之光線整形成條紋狀之遮 罩45的光照射部1、畫像處理單元7、對光照射部1的燈 供給電力的電源部9所構成。於遮罩45的下側，如圖2 所示，設置有搬送手段50，藉由搬送手段50搬送被照射 物W，對被照射物W照射從光照射部1射出之光線。 再者，於圖1、2，用以測定照度分布的擴散板55被 插入於遮罩45的光射入側，關於此於後說明。 前述光射出部1 0係由複數個例如3個以上的光源元 件2 1所成的光源元件列20，與將來自此光源元件列20之 光線聚光成延伸於光源元件2 1並排之一方向的線狀的聚 光構件40，配置於例如由鋁所成的燈室1 1內所構成。 於聚光構件40的下方，形成有沿著聚光構件40的長 邊方向而延伸於一方向的光射出用開口 12A，又，於形成 該光射出用開口 1 2A之下壁的聚光構件40之背面側的位 置’形成有使在從後述之光射出部1 〇射出之光線被照射 的光到達區域反射之擴散散亂光射入至燈室1 1內的擴散 光射入用開口 1 2 B。然後’例如由石英玻璃所構成的窗板 構件13以覆盖光射出用開口 12A之方式設置。 於光射出部1 〇 ’光源元件2 1以並排於一方向（於圖 2中垂直於紙面之方向。以下，也將此方向稱爲「X方向 」。）之方式配置’藉由該等來構成光源元件列20。光源 元件列2 0之各光源元件2 1係具有短弧型放電燈3 〇、以包 圍此放電燈3 0之方式配置’反射來自該放電燈3 〇之光線 -19- 201237560 的反射器22。 作爲放電燈3 0，係可使用例如具有圖4所示之構造， 例如以高效率放射例如波長270〜450nm之紫外光的超高 壓水銀燈。此放電燈3 0係具備具有形成放電空間S之例 如球形狀的發光部32及連續於此發光部32兩端的桿狀之 封止部33的發光管31，於發光管31內，以沿著其管軸而 相互對向之方式對向配置一對的電極35，並且封入水銀、 稀有氣體及鹵素。然後，各電極35係經由於封止部33中 被氣密地埋設的金屬箔3 6，連接於外部導線3 7。於此種 放電燈3 0中，一對的電極3 5間的電極間距離例如爲0.5 〜2.0111111，水銀的封入量例如爲0.08~0.30111£/111爪3。 反射器22係藉由具有以其光軸C爲中心的旋轉拋物 面狀之光反射面23的拋物面鏡所構成，該反射器22係以 其光軸C位於放電燈30之發光管31的管軸上，且其焦點 F位於放電燈30之電極35間的亮點之方式配置，在此狀 態下，藉由固定構件，固定於放電燈30。 聚光構件40係藉由具有垂直於X方向之剖面爲拋物 線狀的光反射面41，沿著X方向延伸的柱面拋物面鏡所 構成，在垂直於光源元件列20之各反射器22的光軸C之 光射出面的前方，以其焦點位於被照射物W的表面上之 方式配置。 此聚光構件40係例如施加僅使目標之波長的光線反 射，使不需要之波長的光線透射之波長選擇塗層的冷光鏡 亦可。 -20- 201237560 遮罩45係X方向之長條矩形的板狀者，於聚光構件 40的下方，沿著對於該當聚光構件40所致之反射光的光 軸L垂直之平面進行配置。此遮罩45係以分別往垂直於 X方向的方向（於圖2中爲左右方向。以下，將此方向稱 爲「Y方向」。）延伸之線狀的多數遮光部及多數透光部 於X方向交互並排之方式配置。 被照射物w係例如如圖2所示，藉由搬送手段5 0被 搬送至Y方向，遮罩45係對於被照射物W離間而設置。 遮罩45與被照射物W之間的最小間隔係例如爲50〜 1 000μιη ° 又，遮罩45與被照射物W之間的間隔係隨著該被照 射物W被搬送至Υ方向而變動，故射入遮罩45之來自聚 光構件40的光線的有效照射寬度係考慮遮罩45與被照射 物W之間的間隔之允許變動値及滾筒5 1的半徑，在可能 範圍內設定較小爲佳。此係以下理由所致。在搬送被照射 物W，通過遮罩45的正下區域時，被照射物W與遮罩45 之間的間隔係首先隨著被照射物W往Υ方向移動而變小 ，到達遮罩45之中央位置的正下之後，隨著被照射物W 往Υ方向移動而變大，但是，最小有效照射寬度越大，間 隔的變動幅度也越大，故無法形成忠於遮罩45的圖案且 局解析度的圖案。 具體來說，在將遮罩45與被照射物W之間的間隔之 允許變動値設爲a，將滾筒5 1的半徑設爲r時，有效照射 寬度d可藉由d = / {r2 - (r-a) 2 }x2來求出。於此計算式 -21 - 201237560 中，理論上，必須考慮被照射物W的厚度，但是，被 射物W的厚度係相較於滾筒5 1的半徑，非常地小，故 以無視。舉出具體範例的話，在遮罩45與被照射物W 間的間隔之允許變動値a爲5 0 μιη，滾筒5 1的半徑r 3 0 0mm時，有效照射寬度d爲約1 1mm以下爲佳。所以 將來自前述之光射出部1〇之短弧型的各放電燈30的放 光，藉由各反射器22及聚光構件40聚光成往X方向延 之線狀，有助於使光線聚光於有效照射寬度d的範圍內 進而，促使形成忠於遮罩45的圖案且高解析度的圖案。 此實施形態的光照射裝置之搬送手段50係具有接 被照射物W而搬送該被照射物W的滾筒51。具體來說 滾筒51係以接觸被照射物W之處位於遮罩45的正下 置之方式，該當滾筒51的旋轉軸（省略圖示）往X方 延伸之姿勢配置，藉由該滾筒51旋轉，被照射物W被 送至Y方向。 在被照射物爲薄膜狀者時，因爲搬送手段50具有 觸被照射物W而搬送該被照射物W的滾筒51，故藉由 少滾筒51的偏心，可將遮罩45與接觸滾筒51之薄膜 的被照射物W之間的間隔維持爲一定。 再者，藉由於滾筒51設置水冷機構，即使對被照 物W照射高照度的紫外光之狀況，也可藉由接觸被照 物W的滾筒5 1來冷卻被照射物W，故可防止被照射物 的收縮等之變形。 在此實施形態的光照射裝置中，擴散板5 5可自由 照 可 之 爲 ， 射 伸 觸 > 位 向 搬 接 減 狀 射 射 W 進 •22- 201237560 退地設置於使從光射出部ι〇射出之光線擴散反射的光路 徑上，具體來說，設置於聚光構件40與遮罩45之間的光 路徑上。擴散板5 5在對被照射物W進行光照射處理時， 從來自光射出部10之光線的光路徑上退避，並且在進行 後述之各放電燈3 0的點燈狀態之監視動作（各放電燈的 照度測定、照度分布測定）時，藉由未圖示之驅動機構， 於來自光射出部10之光線的光路徑上，以沿著對於聚光 構件40所致之反射光的光軸L垂直的平面配置之方式移 動（參照圖1、圖2的擴散板55)。 此種擴散板55係使用例如波長270〜450nm之紫外光 的擴散反射率爲90%以上者爲佳，例如可使用燒結氟樹脂 粒子者或包含硫酸鋇等之透射率較低之遮光物質的光擴散 層形成於基材上所構成者等。 又，塗佈或含有混合以紫外線激發且主要發出可視光 之螢光體的擴散板因爲對於入射光也具有良好擴散性且可 有效率地發光，所以也適合。 在本發明的第2實施例中，監視光照射區域之照度分 布時，於從光射出部10射出之光線的光到達區域，插入 擴散板55。 本發明係設置取得從光射出部1 0射出之光線的光到 達區域之光強度分布像，依據藉由進行適切的畫像處理所 得之X方向之照度分布，監視各放電燈3 0之點燈狀態的 監視手段。 此實施形態之光照射裝置的監視手段，係藉由配置於 -23- 201237560 燈室1 1內的光感測器60、形成於燈室1 1的擴散光射入用 開口 1 2B、成像光學元件、藉由利用對藉由光感測器60 所得之畫像資料進行畫像處理，取得照度分布的畫像處理 裝置所構成。 如圖3所示，於聚光構件40的背面側，設置有將來 自該擴散板5 5的擴散散亂光加以受光，內藏具備檢測出 受光之各處之該擴散散亂光的光量之複數光檢測元件的身 爲光量檢測手段之光檢測元件陣列的光感測器60，又，於 形成於燈室1 1的擴散光射入用開口 1 2B，設置有針孔板 等的成像光學元件65，插入擴散板55的話，從光射出部 1 〇射出之光線係以擴散板55反射，其擴散散亂光係藉由 前述成像光學元件65成像於光感測器60上。 以光感測器60檢測出之訊號係被送至圖1所示之畫 像處理單元7。 畫像處理單元7係將利用前述光感測器60檢測出之 訊號轉換爲配置被照射物W之光照射裝置的照度分布訊 號所對應之訊號，例如於顯示裝置顯示照度分布訊號，在 特定燈的照度降低時輸出警報訊號。又，構成光源元件列 20之特定光源元件2 1因劣化等而照度降低時，例如控制 光源元件2 1的電源部9，增加對該光源元件2 1的供給電 力，彌補照度降低。又，例如因燈的光軸偏離等的原因而 照度分布變動時，輸出警報等。 光檢測元件陣列61係例如以圖5之CCD線感測器（ 1維線感測器）所構成，檢測出並排於擴散板55上的光擴 -24- 201237560 散面55之X方向的複數測定處（Pi、P2.....Pn-1、Pn )個別的擴散光（R1、R2.....Rn-1、Rn )之光量，對 應該測定處（P 1、P2.....Pn-1、Pn )個別的複數光檢測 元件（受光元件）排列於X方向所成者。具體來說，例如 ，使用針對1個放電燈，對應光照射區域之3處以上的測 定處之光檢測元件排列於X方向所成者（針對1個放電燈 所致之光照射區域，具有3像素以上的解析度者）爲佳， 實際上，例如，以數十個光源元件2 1構成光源元件列20 時，光檢測元件陣列61係使用具有500〜2000像素或其 以上的解析度者。 在1維的光檢測元件陣列中，未求出積算光量，但是 ，只要光檢測元件的受光面相對於搬送方像爲較長的長方 形形狀的話，計測値則爲積算光量。 光檢測元件陣列受光部的尺寸之一例，係各像素的尺 寸爲高數mm，寬數十μιη時，高度爲數mm，寬度爲數十 mm。爲此，在圖5中，爲了易於理解，僅記載P1〜Pn與 代表點，但是，實際上，擴散光於各點中即使於掃描方像 具有有限的寬度，也可充分正確地測定掃描時的積算光量 〇 光感測器60所致之擴散光的可檢測範圍（照度的可 測定範圍）之大小，係可藉由成像光學元件與光感測器60 的離開距離及光檢測元件陣列60之X方向的長度來進行 調整。 光感測器60整體的視野角（光感測器60之受光面[Technical Field] The present invention relates to a light irradiation device used for forming a line pattern in, for example, a semiconductor device or a liquid crystal display device or a manufacturing process of a patterned retardation film, and A light irradiation device including a photodetector capable of instantaneously detecting an illuminance distribution of light emitted from a plurality of light source elements, in a light irradiation device that performs exposure processing using a plurality of light source elements of a short arc type discharge lamp in one direction and simultaneously lighting In particular, the light illuminating device which can display the illuminance distribution of the irradiation region and the integrated light amount distribution according to the photodetector, and which can uniformize the illuminance distribution of the light. [Prior Art] For example, in the manufacture of a semiconductor device, a liquid crystal display device, or a patterned retardation film, exposure processing is performed in order to form a linear pattern, and in this exposure processing, a wide range of irradiation is performed for the object to be irradiated. The active energy ray such as ultraviolet light enhances mass productivity, and a light irradiation device having a long arc discharge lamp is generally reviewed. However, in the long arc type discharge lamp, it is difficult to illuminate mutually parallel light rays in the longitudinal direction of the lamp, so that it is difficult to obtain a pattern having a high resolution with a mask pattern. In addition, there is a demand for a large area of the irradiation area in view of the increase in the size of the liquid crystal panel and the improvement in production efficiency. In the past, it has become more difficult to increase the size of the discharge lamp by increasing the size of the discharge lamp. However, it is difficult to increase the size of the discharge lamp. - 201237560 For this requirement, the proposal uses a small short arc type. A light irradiation device for a plurality of light source elements of a discharge lamp. However, in such a light irradiation device, it is difficult to maintain the illuminance maintenance rate of each discharge lamp because of the individual difference in the life of each discharge lamp, and it is necessary to ensure high reliability and stability on the manufacturing line. The illuminance and illuminance distribution of each discharge lamp (the monitoring of the amount of light maintains the illuminance uniformly. Thus, in the case of using a short arc type discharge lamp and a plurality of light source element irradiation devices, the method of measuring the illuminance of each discharge lamp is, for example, a plan, a proposal The light (ultraviolet light) radiated from the plurality of light source units 1 by the plurality of discharge lamps 101-a and the mirrors ι〇ι_ is overlapped by 102, and then opened from a part 103 of the folding mirror 1〇3. a part of the transmission is measured by the illuminance measuring device 107. In order to measure the illuminance of each of the light source units 101, when the light source unit is turned on, the illuminance of the source unit is measured while the light source unit 101 is turned off once. The illuminance information is recorded in the memory means 1 06-1. In this method, the illuminance of each light source unit 1 0 1 can be measured 値 Document 1). However, in this method, only the illuminance of the combined light due to the illuminating lamp 1 21 discharge lamp 1 〇1 - a (the so-called overall cloth is averaged) is measured, and the light irradiation device cannot be obtained. The correct illuminance distribution of the resulting optical domain is not suitable for forming a linear patterning device. The side-by-side illuminance and the light-production of the light-emitting device are all set to 100%. Further, in the exposure processing, even if the illuminance of any of the discharge lamps is lowered, only the illuminance of the combined light is detected to be lowered, so that it is not possible to specify the discharge lamp that is abnormal. Further, the short-arc type discharge lamp is used to arrange the plural light sources side by side. In the light irradiation device of the device, 'the method shown in Fig. 28 is known as a method of measuring the illuminance distribution. As shown in the figure, the photo sensor 115 is disposed on the XYZ stage 117. Lll-a scans the photosensor 1 1 5 - the illuminance is measured side by side. Then, the illuminance distribution of the illumination optical system 11 1 can be measured by measuring the change in illuminance (Patent Document 2). An illuminance measuring means is provided for each discharge lamp, and the illuminance of each discharge lamp is measured, and an abnormality such as a decrease in illuminance of the discharge lamp is detected. According to such a method, for example, due to long-term use. When the illuminance of any of the discharge lamps is lowered with time, the discharge lamp in which the problem occurs can be specified. However, the illuminance at a specific place is measured by each illuminance measuring means (radiation from a specific source, at the mirror In the case of illuminance measurement at the same level as the lamp light source, the correct illuminance distribution of the light irradiation region by the light irradiation device cannot be obtained, and the following problem occurs. In the case where the discharge lamp is deformed by an external force applied to the electrode constituting the discharge lamp, for example, when the optical axis of the discharge lamp is deviated, the light irradiation region due to the discharge lamp is shifted to The actual illuminance distribution on the light-irradiated area side of the discharge lamp adjacent to the discharge lamp is a curve indicated by a broken line in Fig. 7. As can be seen from Fig. 7, the influence of the illuminance change of the discharge lamp in question is adjacent to The light irradiation area caused by the discharge lamp of the 201237560 electric lamp is also generated, so that for example, although the amount of ultraviolet light of the adjacent discharge lamp does not change itself, The illuminance measured by the illuminance measuring means for the discharge lamp may indicate a lower or higher enthalpy than the initial enthalpy. However, in the aforementioned method, since the position of the overlapping area of the light caused by each discharge lamp is not present, According to the illuminance measuring means, the abnormal state of the discharge lamp cannot be accurately determined. Therefore, according to the measurement result by each illuminance measuring means, for example, the lighting control of the discharge lamp is performed such that the illuminance of the discharge lamp is increased or decreased. In addition, the illuminance distribution is not uniform. In addition, in the light irradiation device in which the short arc type discharge lamps are arranged in one direction, in particular, the objects to be irradiated are scanned relative to each other in the longitudinal direction orthogonal to the light irradiation region ( In the process of processing the workpiece, for example, even if there is only a slight part, if there is a portion with reduced illuminance, streaky unevenness will occur, so that the entire length direction is covered, and the illuminance distribution and the integrated light amount at the fine pitch are confirmed. Distribution is very important. On the other hand, in the use of the drying and hardening of the printed matter using the long-arc discharge lamp, the illuminance in the long-side direction is generated by the fact that the light is caused to overlap with the light having a wide width direction from each of the divergence angles. The distribution does not in fact cause local changes, so it was not a problem before. Therefore, in the long arc type discharge lamp, the accumulated light amount data can be obtained in a plurality of places in the longitudinal direction. However, in the light irradiation device in which the short arc type discharge lamps are plurally arranged in one direction, as described above, it is not sufficient to obtain the integrated light amount data only in a plurality of places in the longitudinal direction. In the light irradiation device in which the short-arc type discharge lamps are arranged in parallel in one direction, -8-201237560, in order to cover the entire area of the long-side direction, it is confirmed that the illuminance distribution and the integrated light amount distribution at the fine measurement pitch are also considered, and the illuminance configuration is also considered to be the most illuminance measurement. Means: However, at this time, not only the cost will increase, but also the contamination problem of each light-receiving element and the deterioration rate of the ultraviolet light, the characteristic of the sensitivity change (temperature coefficient) when the temperature rises, and it is difficult to grow. The problem of measuring the illuminance distribution is performed during the period. As described above, in order to form a linear pattern in which a plurality of discharge lamps are arranged in parallel in a light irradiation device of a predetermined direction, detailed illuminance distribution measurement has become a technical problem for the first time. However, in practice, there is no method for detecting the illuminance and illuminance distribution of each discharge lamp with high reliability. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Laid-Open Patent Publication No. 2010-034293 (Patent Document 2) Japanese Laid-Open Patent Publication No. Hei No. Hei. In the measurement method of 1, the illuminance measuring device 07 is used to detect the ray of the light of the complex light source unit 10 1 . For this reason, in order to measure the individual light source units, when the light source unit 1 is turned off, it is necessary to record the fluctuation of the illuminance while the one light source unit is turned off once. When the device is activated, the illuminance of each illuminance unit cannot be measured. It is necessary to measure the illumination unit before measurement, and it takes time to measure. Further, in this method, it is effective to use only an optical system that produces a secondary light source such as an optical stencil. -9 - 201237560 In the method of Patent Document 2, the illuminance distribution on the XYZ stage 117 can be measured by scanning the photosensor 1 15 in a state where the illumination optical system 1 1 1 is turned on. Therefore, when performing the measurement, the substrate 116 must be removed from the χγΖ platform 1 1 7 . When the substrate is in the form of a film, since it cannot be easily removed, the illuminance measurement is limited to the case of exchanging a film-form substrate. Therefore, measurement is impossible between the operation of the device, and an abnormality in the operation of the detection device is not detected, and the illuminance distribution cannot be controlled. Further, in the method of measuring while scanning one photosensor 1 15 , it is necessary to increase the number of measurement points when measuring the detailed illuminance distribution, which is very time consuming. Further, in the measurement, the photo sensor 115 is exposed to the strong light of the illumination source, so the temperature of the photo sensor rises. The light sensor measures the sensitivity due to the temperature, so the measurement of the correct illumination distribution cannot be performed. In order to determine the correct illuminance distribution, the photosensor must be measured simultaneously at the same temperature. Further, in the case of a light irradiation device in which a plurality of light source elements are arranged in parallel using a short arc type discharge lamp, the reason why the illuminance is lowered is that not only the illuminance of the individual light source elements is lowered, but also the illuminance of any of the light source elements is not lowered, and the optical axis is for other light sources. The condition of component deviation. At this time, in order to restore the reduced illuminance and increase the current input to the discharge lamp, the illuminance distribution is deteriorated, the life of the discharge lamp is reduced, and the device is malfunctioning. For this reason, not only the measurement of the illuminance distribution but also the measurement result is used as a reference 10-201237560 to grasp the cause of the change in the illuminance, and it is preferable to perform the appropriate correspondence based on this. According to the present invention, in the light irradiation device in which a plurality of short arc type discharge lamps are arranged side by side in a predetermined direction as a light source, fluctuations in illuminance distribution of light beams emitted from the respective light source elements can be collectively detected, and A discharge lamp or the like having a reduced brightness is determined and displayed, and the state of the discharge lamp causing the problem and the state of the abnormality are determined, and the normal operation state of the device can be confirmed. Further, when the illuminance distribution is changed in the light irradiation region, it is possible to obtain a light irradiation region in which the illuminance is uniform. [Means for Solving the Problem] The light irradiation device of the present invention includes: a light emitting portion having a short arc type discharge lamp and arranged to surround the discharge lamp, and reflecting from the discharge lamp The light source elements formed by the reflectors of the light rays are arranged side by side in a plurality of light source element rows arranged in one direction; and the light detecting element array detects the amount of light of the diffused light from the plurality of measurement areas in the light reaching region of each of the discharge lamps. In the light irradiation device of the present invention, the diffused light of the measurement portion is detected by the array of photodetecting elements via the imaging optical element. Further, in the light irradiation device of the present invention, the diffusing plate is configured to be movable in a light path of the light emitted from the light emitting portion, and the light amount of the diffused light on the light diffusing surface of the diffusing plate is configured by the light. An array of detection elements is detected. Further, in the light-emitting device of the present invention, the light-shielding device that shields light from the light-emitting portion when the light is emitted from the light-emitting portion during the operation of -11 - 201237560 is provided Member: The diffusing plate is disposed on a light-irradiating surface of the shutter member. Further, in the light irradiation device of the present invention, the light absorbing member is configured to condense light from the light emitting portion into a line extending in one direction, and further, in the light irradiation device of the present invention. The reflection member is configured to reflect light of a predetermined wavelength range of the light from the light emitting portion, and to apply a wavelength selective coating that transmits light outside the wavelength range; and the light from the light emitting portion A light diffusing plate is disposed on the light reaching region of the transmitted light transmitted through the reflecting member, and the diffused light from the diffusing plate is detected by the array of the light detecting elements. In the present invention, by arranging a short arc type discharge lamp and arranging the discharge lamp, the light source element formed by the reflector reflecting the light from the discharge lamp is arranged in one direction and simultaneously lit, from the foregoing A light irradiation device that irradiates light to a light-irradiating region and performs exposure processing or the like, and provides a diffusion means for diffusing and radiating light from the light source element in a light reaching region of the light source from the light source element. Further, a light amount detecting means for detecting a plurality of light detecting elements of the amount of light (light intensity) of the diffused scattered light reflected by the diffusing means is disposed side by side. The light amount detecting means emits light by diffusing scattered light which is emitted from the light source element and reflected by the diffusion means, but the amount of light (light intensity) detected at each position of the light amount detecting means is determined by the light amount detecting means -12- The incident angle of the light of 201237560, the reflection characteristic of the diffusing plate, and the like are not necessarily accurately reflected in the illuminance at each position on the light irradiation region where the light emitted from the light source element is irradiated. For example, even if the scattered light of the same intensity is scattered with respect to the scattered light incident from the front side of the light amount detecting means, the scattered light of the light incident on the light amount detecting means is measured to be low. Here, in the present invention, the amount of light detected at each position on the light amount detecting means is set to correspond to the illuminance of each position of the light irradiation region to which the light emitted from the light source element is irradiated, and the light amount is detected. The amount of light at each position on the means is converted into a means for indicating a signal of illuminance variation at each position of the light-irradiated area. Thereby, the signal corresponding to the illuminance distribution of the light irradiation region can be obtained by the output of the light amount detecting means, and the fluctuation of the illuminance distribution can be detected. Further, the illuminance indicates the brightness of the light irradiated to the light irradiation region or the like. Physical quantity. The size of the photodetecting element to be measured is limited. For example, when the rectangular photodetecting element is arranged such that the long side and the transporting direction are parallel to each other, the measured amount is also referred to as an integrated light amount and the like. The condition, but in the present specification, the physical quantity indicating the brightness measured by the photodetecting element is collectively referred to as illuminance. The processing for converting the light amount at each position on the light amount detecting means into a signal indicating the illuminance fluctuation of each position of the light irradiation region can be performed, for example, as follows: • Preparing each position on the light amount detecting means in advance The amount of light is converted into a conversion ratio data of the illuminance indicating each position of the light irradiation region-13 - 201237560, and the conversion ratio data is used to calculate the amount of the diffused light at each position on the light amount detecting means. A signal indicating the change in illuminance at each position of the light irradiation region. • The amount of light at each position on the light amount detecting means detected when the discharge lamp of the light source element row is first turned on is stored as the reference light amount data, and the amount of the diffused light is scattered according to each position on the light amount detecting means. With the reference light amount data, a signal indicating the illuminance change at each position of the light irradiation region is calculated. The fluctuation of the illuminance distribution of the light emitted from the plurality of light source elements can be monitored by displaying and outputting the variation of the illuminance distribution thus detected. Further, when it is detected that the illuminance of the light beam irradiated from the specific light source element is lowered according to the fluctuation of the illuminance distribution, for example, by increasing the electric power of the discharge lamp supplied to the light source element, the illuminance can be compensated for. As the diffusion means, a diffusion element that diffuses light and reflects the light path between the light source element and the light irradiation device may be provided. However, when the device is operated to detect a change in the illuminance distribution, the diffusion means is used as a diffusion means. Further, an optical element such as a condensing member provided in the optical path is used as a cold mirror by a mask or the like provided in the optical path, and a diffusion means is provided on the back side of the cold mirror, and diffusion means is used. The light transmitted through the cold mirror is diffused and guided to the light amount detecting means. As described above, in the present invention, the above problems are solved as described below. (1) A light-irradiating device comprising: a light-emitting portion having a short-arc type discharge lamp and a reflection of the light from the discharge lamp arranged to surround the discharge lamp; The device constitutes a light source element row disposed in one direction; the light of the light diffusing the hand source element reaches the region, and is diffused and radiated; the light quantity detecting means, the diffusion of the segment diffuses the light to receive the light, and detects the amount of light of the chaotic light a plurality of light detecting elements; and an output of the light amount detecting means; wherein the light processing means irradiates light of the light emitted from the light source element by the light amount detecting means, and detects the light irradiation by the light amount detecting means The light at each position of the area indicates a means for changing the amount of light obtained by the conversion processing unit. (2) In the above (1), the image processing means indicates that the position of the light irradiation region is established by the conversion signal. (3) In the above (1) and (2), the front light amount fluctuation monitoring means monitors the light amount fluctuation section indicating each position of the light irradiation region, and controls the discharge lamp point supplied from the power supply device to the source element. In the electric power of the lamp, the plurality of light source elements that detect the specific light source elements in the light source element are arranged in a row, and the light source from the light source element is provided with the light source from the light source element. The diffused image processing unit is disposed in the light receiving and receiving unit, and is configured to process the image processing unit: each position of the turn-on, and a signal for illuminating each position corresponding to each position of the region, a signal of a change in the amount of conversion; and an output illumination The light management unit at each position of the area is provided with a display of the change in the amount of light obtained by the processing unit and displayed on the display single image processing unit: the signal obtained by the conversion processing unit; and the light source control unit When the light amount fluctuation monitoring means sets the signal of the amount of light to be changed, and the amount of light of the discharge lamp decreases, -15-20 1237560 by the aforementioned power supply control means to control the supply to make each light source component. The power supply device that discharges the power of the lamp lights increases the amount of electric power supplied to the discharge lamp having a reduced amount of light to increase the amount of light of the discharge lamp. (4) In the above (1), (2), (3), the image processing unit includes: a memory for storing a light amount 'at each position on the light amount detecting means to indicate each of the light irradiation regions The conversion ratio data of the signal of the position light amount; the conversion processing unit reads the conversion ratio data from the memory, and stores the amount of the scattered scattered light in the light amount detecting means and stores the memory in the memory The conversion ratio data is used to calculate a signal indicating the change in the amount of light at each position of the light irradiation region. (5) In the above (1), (2), (3), the image processing unit includes a memory, which is used as a reference light amount data, and stores a discharge lamp for causing the light source element row of the light irradiation device to be lighted for the first time. The amount of light at each position on the detected light amount detecting means is calculated based on the amount of the diffused scattered light at each position on the light amount detecting means and the reference light amount data stored in the memory. A signal indicating a change in the amount of light at each position of the light irradiation region. [Effects of the Invention] According to the light irradiation device of the present invention, the following effects can be obtained. (1) A light detecting element array configured to detect a light amount of individual diffused light at a plurality of light reaching regions determined by respective discharge lamps, and the light detecting portion array obtains light caused by the light emitting portion The illuminance distribution and the integrated light quantity distribution of the arrangement direction of the light source elements in the arrival area, and the illuminance of each discharge lamp of -16-201237560. Then, based on the obtained data, when it is detected that any of the discharge lamps constituting the light source element row has an abnormality such as a decrease in illuminance, the discharge lamp that can cause the problem can be accurately specified, and the abnormal state such as the illuminance reduction or the optical axis deviation can be determined. It is confirmed that the normal operation state of the light irradiation device is confirmed. (2) a diffusing means for diffusing and radiating light from the light source element is provided, and the amount of light of the diffused scattered light in each of the diffusing means is detected by the light amount detecting means, and the amount of light at each position on the light amount detecting means is set The signal is converted into a signal indicating the change in the illuminance at each position of the light-irradiated area, so that it is not necessary to change the illuminance while one light source is turned off once as in the prior art, and the light sensor is not required to be used. Carry out the sweep. By scanning, it is possible to simultaneously monitor the variation of the illuminance distribution of the light emitted from the complex light source elements. Therefore, it is possible to monitor the lighting state of each of the discharge lamps while performing the light irradiation treatment on the workpiece, and when the abnormality of any of the discharge lamps is detected, the production line can be stopped, and the discharge lamp can be quickly taken. For efficient equipment action. Further, by reflecting the signal indicating the illuminance at each position of the light irradiation region in association with the position of the light irradiation region and displaying it on the display unit, it is possible to monitor which light source element has a reduced light amount or the like. (3) A light amount fluctuation monitoring means for monitoring a signal indicating a change in illuminance at each position of the light irradiation region is provided, and a discharge lamp indicating a specific light source element in the light source element is detected by a signal indicating illuminance variation at each position of the light irradiation region When the illuminance is lowered, the electric power supplied to the discharge lamp is increased to compensate for the decrease in illuminance, thereby preventing the performance of the light source device from deteriorating, such as a decrease in performance, -17-201237560, and it is possible to prevent a large amount of defective products from being generated. (4) a conversion ratio data for converting the light amount at each position on the light amount detecting side means into the illuminance of each position of the light irradiation area, and the diffused scattered light according to the light amount detecting means The light amount and the conversion ratio data stored in the above-mentioned celestial body calculate a signal indicating the illuminance change at each position of the light irradiation region, whereby the signal indicating the illuminance variation at each position of the light irradiation region can be relatively easily obtained. (5) As the reference light amount data, the amount of light stored at each position on the light amount detecting means detected when the discharge lamp of the light source element row of the light irradiation device is first turned on is diffused and scattered according to the light amount detecting means. The amount of light and the reference light amount data stored in the memory calculate a signal indicating the change in illuminance at each position of the light irradiation device, whereby the illuminance distribution when the discharge lamp of the light source element row is first turned on is obtained. It is possible to grasp the degree to which the illuminance distribution has changed. Further, it is possible to easily detect the decrease in the illuminance of the light source element and the deviation of the optical axis of the light source element, and to accurately determine whether or not the necessity of the lamp or the lamp unit exchange is necessary. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the overall schematic configuration of a light irradiation device according to an embodiment of the present invention, and Fig. 2 is a side sectional view showing the light irradiation device of Fig. 1 taken along line A-A. In addition, Fig. 3 is a view of the light irradiation portion shown in Fig. 2 as seen from the back side of the condensing member 40. In the light irradiation device of the present invention, for example, in order to manufacture a film of the patterned retardation film -18 - 201237560, as shown in FIG. 1, the light emitting portion 10 including the light collecting member 40 and the light emitting portion 10 are provided. The light illuminating unit 1 and the image processing unit 7 that form the stripe-shaped mask 45 and the power supply unit 9 that supplies electric power to the lamps of the light illuminating unit 1 are formed. On the lower side of the mask 45, as shown in Fig. 2, a transporting means 50 is provided, and the irradiated object W is transported by the transporting means 50, and the irradiated object W is irradiated with the light emitted from the light irradiating section 1. Further, in Figs. 1 and 2, the diffusion plate 55 for measuring the illuminance distribution is inserted into the light incident side of the mask 45, which will be described later. The light emitting portion 10 is a light source element row 20 formed of a plurality of, for example, three or more light source elements 21, and condenses light from the light source element row 20 to extend in a direction of the light source element 2 1 side by side. The linear concentrating member 40 is disposed, for example, in a lamp chamber 1 1 made of aluminum. Below the concentrating member 40, a light-emitting opening 12A extending in one direction along the longitudinal direction of the condensing member 40, and a concentrating member forming the lower wall of the light-emitting opening 1 2A are formed. The position "on the back side of the 40" is formed with the diffused light entering opening 1 for causing the diffused scattered light reflected by the light reaching region irradiated by the light emitted from the light emitting portion 1 to be described later to enter the lamp chamber 1 1 2 B. Then, for example, the louver member 13 composed of quartz glass is provided so as to cover the light-emitting opening 12A. In the light emitting portion 1 〇 'the light source element 2 1 is arranged side by side in a direction (in the direction perpendicular to the plane of the paper in Fig. 2, and this direction is also referred to as "X direction" below). The light source element row 20 is formed. Each of the light source elements 2 1 of the light source element array 20 has a short arc type discharge lamp 3 〇, and a reflector 22 for reflecting the light -19-201237560 from the discharge lamp 3 is disposed so as to surround the discharge lamp 30. As the discharge lamp 30, for example, an ultrahigh pressure mercury lamp having a configuration shown in Fig. 4, for example, ultraviolet light having a wavelength of 270 to 450 nm, for example, can be emitted with high efficiency. The discharge lamp 30 includes an arc tube 31 having a spherical light-emitting portion 32 forming a discharge space S and a rod-shaped sealing portion 33 continuous at both ends of the light-emitting portion 32, and is disposed along the arc tube 31. A pair of electrodes 35 are disposed opposite to each other with the tube axis facing each other, and mercury, a rare gas, and a halogen are sealed. Then, each electrode 35 is connected to the external lead 37 via a metal foil 36 that is hermetically embedded in the sealing portion 33. In the discharge lamp 30, the distance between the electrodes of the pair of electrodes 35 is, for example, 0. 5 ~ 2. 0111111, the amount of mercury enclosed is, for example, 0. 08~0. 30111 £ / 111 claws 3. The reflector 22 is constituted by a parabolic mirror having a paraboloidal light reflecting surface 23 centered on its optical axis C, the reflector 22 having its optical axis C located at the tube axis of the arc tube 31 of the discharge lamp 30. The focus F is placed on the bright spot between the electrodes 35 of the discharge lamp 30, and in this state, it is fixed to the discharge lamp 30 by a fixing member. The concentrating member 40 is constituted by a cylindrical parabolic mirror extending in the X direction by a light reflecting surface 41 having a parabolic shape perpendicular to the X direction, and light of each of the reflectors 22 perpendicular to the light source element array 20. The front side of the light exit surface of the axis C is disposed such that its focus is on the surface of the object W to be irradiated. The condensing member 40 is, for example, a cold mirror which applies a wavelength selective coating which reflects only light of a target wavelength and transmits light of an unnecessary wavelength. -20- 201237560 The mask 45 is a rectangular plate shape in the X direction, and is disposed below the condensing member 40 along a plane perpendicular to the optical axis L of the reflected light from the condensing member 40. The mask 45 is a linear majority of the light-shielding portion and the plurality of light-transmitting portions extending in a direction perpendicular to the X direction (the left-right direction in FIG. 2, hereinafter, the direction is referred to as "Y-direction"). The X direction is configured side by side. For example, as shown in Fig. 2, the object to be irradiated w is transported to the Y direction by the transport means 50, and the mask 45 is provided for the object W to be separated from each other. The minimum interval between the mask 45 and the object W to be irradiated is, for example, 50 to 1 000 μm, and the interval between the mask 45 and the object to be irradiated W changes as the object W is conveyed to the x direction. Therefore, the effective illumination width of the light from the concentrating member 40 that enters the mask 45 is determined by the allowable variation of the interval between the mask 45 and the object W and the radius of the drum 51, and is set within a possible range. Small is better. This is due to the following reasons. When the irradiated object W is transported through the direct area of the mask 45, the interval between the irradiated object W and the mask 45 first becomes smaller as the irradiated object W moves in the x-direction, and reaches the mask 45. After the center position is immediately below, the object W becomes larger as the object W moves in the x direction. However, the larger the minimum effective irradiation width, the larger the variation range of the interval, so that the pattern loyal to the mask 45 cannot be formed and the analysis is performed. Degree pattern. Specifically, when the allowable variation 间隔 of the interval between the mask 45 and the object to be irradiated W is a, and the radius of the drum 5 1 is r, the effective irradiation width d can be obtained by d = / {r2 - (ra) 2 }x2 to find. In the calculation formula -21 - 201237560, in theory, the thickness of the object to be irradiated W must be considered. However, the thickness of the object to be irradiated W is extremely small compared to the radius of the drum 51, so that it is ignored. When the specific example is given, the allowable variation 间隔a of the gap between the mask 45 and the object W to be irradiated is 50 μm, and when the radius of the drum 5 1 is r 3 0 0 mm, the effective irradiation width d is preferably about 1 mm or less. . Therefore, the light emitted from each of the short-arc-shaped discharge lamps 30 from the light-emitting portion 1 is condensed by the reflectors 22 and the condensing member 40 to form a line extending in the X direction, contributing to the light. Converging in the range of the effective irradiation width d further promotes the formation of a high-resolution pattern loyal to the pattern of the mask 45. The conveying means 50 of the light irradiation device of this embodiment has a drum 51 that receives the irradiated object W and transports the irradiated object W. Specifically, the drum 51 is disposed so as to be in contact with the object W, and is disposed immediately below the mask 45. The rotation axis (not shown) of the drum 51 is disposed to extend toward the X side, and the drum 51 is rotated by the drum 51. The irradiated object W is sent to the Y direction. When the object to be irradiated is in the form of a film, since the conveying means 50 has the drum 51 that conveys the object W by touching the object W, the mask 45 and the contact roller 51 can be separated by the eccentricity of the roller 51. The interval between the irradiated objects W of the film is maintained constant. Further, since the water cooling mechanism is provided by the drum 51, even if the object W is irradiated with high-intensity ultraviolet light, the irradiated object W can be cooled by the roller 51 contacting the object W, so that it can be prevented from being Deformation of the contraction of the illuminant or the like. In the light-irradiating apparatus of this embodiment, the diffusing plate 55 can be freely illuminated, and the projecting touch can be moved to the lower side. The light path that the emitted light diffuses and reflects is specifically disposed on the light path between the light collecting member 40 and the mask 45. When the object to be irradiated W is subjected to light irradiation treatment, the diffusion plate 5 5 is evacuated from the light path of the light from the light emitting portion 10, and monitors the lighting state of each of the discharge lamps 30 to be described later (each discharge) In the measurement of the illuminance of the lamp and the measurement of the illuminance distribution, the optical axis L of the reflected light to the light collecting member 40 is formed on the light path of the light from the light emitting portion 10 by a driving mechanism (not shown). The vertical plane arrangement moves (see the diffusion plate 55 of FIGS. 1 and 2). It is preferable that the diffusing plate 55 has a diffuse reflectance of, for example, ultraviolet light having a wavelength of 270 to 450 nm of 90% or more. For example, a sintered fluororesin particle or a light containing a light-shielding substance having a low transmittance such as barium sulfate can be used. The diffusion layer is formed on the substrate and the like. Further, a diffusion plate which is coated or contains a phosphor which is excited by ultraviolet rays and mainly emits visible light is also suitable because it has good diffusibility for incident light and can efficiently emit light. In the second embodiment of the present invention, when the illuminance distribution of the light irradiation region is monitored, the diffusing plate 55 is inserted into the light reaching region of the light emitted from the light emitting portion 10. According to the present invention, the light intensity distribution image of the light reaching region of the light emitted from the light emitting portion 10 is obtained, and the lighting state of each of the discharge lamps 30 is monitored in accordance with the illuminance distribution in the X direction obtained by performing the appropriate image processing. Means of surveillance. The monitoring means of the light irradiation device of this embodiment is a light sensor 60 disposed in the lamp chamber 1 1 of -23-201237560, a diffused light incident opening 1 2B formed in the lamp chamber 1 1 , and an imaging optics. The element is constituted by an image processing device that obtains an illuminance distribution by performing image processing on the image data obtained by the photo sensor 60. As shown in FIG. 3, on the back side of the condensing member 40, diffused scattered light from the diffusing plate 55 is received and received, and the amount of light having the diffused scattered light in each of the received light is detected. The photodetector 60 of the photodetecting element array of the light detecting means is a photoreceptor of the photodetecting element array of the light detecting means, and is provided with an imaging optics such as a pinhole plate in the diffused light incident opening 1 2B formed in the lamp chamber 11. When the element 65 is inserted into the diffusing plate 55, the light emitted from the light emitting portion 1 is reflected by the diffusing plate 55, and the diffused light is imaged by the imaging optical element 65 on the photo sensor 60. The signal detected by the photo sensor 60 is sent to the image processing unit 7 shown in Fig. 1. The image processing unit 7 converts the signal detected by the photo sensor 60 into a signal corresponding to the illuminance distribution signal of the light illuminating device in which the illuminating object W is disposed, for example, the display device displays the illuminance distribution signal at a specific lamp. The alarm signal is output when the illuminance is lowered. When the illuminance of the specific light source element 21 constituting the light source element row 20 is lowered due to deterioration or the like, for example, the power supply unit 9 of the light source element 21 is controlled to increase the supply power to the light source element 21 to compensate for the decrease in illuminance. Further, for example, when the illuminance distribution changes due to the deviation of the optical axis of the lamp or the like, an alarm or the like is output. The photodetecting element array 61 is configured, for example, by a CCD line sensor (a one-dimensional line sensor) of FIG. 5, and detects a plurality of X-directions of the optical extension--24-201237560 surface 55 which is arranged side by side on the diffusion plate 55. Measurement area (Pi, P2. . . . . Pn-1, Pn) individual diffused light (R1, R2. . . . . The amount of light of Rn-1, Rn) should be measured (P 1 , P2. . . . . Pn-1, Pn) The individual complex photodetecting elements (light receiving elements) are arranged in the X direction. Specifically, for example, one of the light detecting elements corresponding to three or more measurement areas corresponding to the light irradiation area is arranged in the X direction (for a light irradiation area by one discharge lamp, there are 3) In the case where the light source element array 20 is constituted by tens of light source elements 21, for example, the light detecting element array 61 has a resolution of 500 to 2000 pixels or more. In the one-dimensional photodetection element array, the integrated light amount is not obtained. However, if the light-receiving surface of the photodetecting element has a long rectangular shape with respect to the transporting image, the measurement 値 is the integrated light amount. As an example of the size of the light-receiving element array light-receiving portion, the size of each pixel is a height of several mm, and when the width is several tens of μm, the height is several mm and the width is several tens of mm. Therefore, in FIG. 5, for the sake of easy understanding, only P1 to Pn and representative points are described. However, in actuality, even if the scanned image has a limited width at each point, the scanning time can be sufficiently accurately measured. The measurable range (measured range of illuminance) of the diffused light by the integrated light amount photo-sensing sensor 60 is the distance from the imaging optical element and the photo sensor 60 and the photodetecting element array 60 The length in the X direction is adjusted. The viewing angle of the entire photo sensor 60 (the light receiving surface of the photo sensor 60)

S -25- 201237560 601的法線，與來自X方向之最外面的測定處P1之擴 光R1的光路徑所成角度）Θ係例如60°以下爲佳，更理 爲45°以下。藉此，可確實檢測出擴散板55所致之擴散The normal line of S-25-201237560 601 is at an angle to the light path of the light-exposure R1 from the outermost measurement portion P1 in the X direction. For example, 60° or less is preferable, and more preferably 45° or less. Thereby, the diffusion caused by the diffusion plate 55 can be surely detected.

Q 又，各光檢測元件之感度係因應擴散光（Rl、R2、 、Rn-1、Rn)相對於光檢測元件的射入方向來調整。 成像光學元件65係例如使用藉由將較薄之金屬板 以蝕刻，開孔加工之針孔板。針孔板的開口徑係例如 φ 50μιη 〜φ ΙΟΟΟμπι，厚度係例如 ΙΟΟμπι 〜ΙΟΟΟμπι。又 於玻璃蒸鍍鉻膜，利用蝕刻於鉻膜形成針孔者亦可。 於前述光照射裝置中，從光射出部10射出之光線 經由遮罩45，照射至被照射物W ^亦即，在光射出部 中，從構成光源元件列20的放電燈30放射之光線，係 反射器22的光反射面23反射，成爲沿著該反射器22 光軸C之平行光，從光射出部朝向聚光構件40射出。 平行光係以聚光構件40的光反射面4 1往下方反射，從 射出用開口 1 2 A，一邊被聚光成延伸於X方向之線狀， 邊射入至遮罩45 (此時，擴散板55並未插入）。此時 射入至遮罩45之光線係於X方向中爲平行光。 然後，射入至遮罩45之光線利用遮光部及透光部 整形成條紋狀，並照射至被照射物W，藉此，於被照射 W之滾筒51接觸之處的表面，形成對應遮罩45的遮光 及透光部的圖案之條紋狀的光照射區域，並利用被照射 W藉由搬送手段50被搬送往Y方向，對於該被照射物 散 想 光 加 係 10 以 的 此 光Q Further, the sensitivity of each photodetecting element is adjusted in accordance with the incident direction of the diffused light (R1, R2, Rn-1, Rn) with respect to the photodetecting element. The imaging optical element 65 is, for example, a pinhole plate which is opened by etching a thin metal plate by etching. The opening diameter of the pinhole plate is, for example, φ 50 μmη to φ ΙΟΟΟμπι, and the thickness is, for example, ΙΟΟμπι ～ΙΟΟΟμπι. Further, it is also possible to form a pinhole by etching a chromium film on a glass. In the light irradiation device, the light emitted from the light emitting portion 10 is irradiated to the object W, that is, the light emitted from the discharge lamp 30 constituting the light source element row 20 in the light emitting portion through the mask 45. The light reflecting surface 23 of the reflector 22 reflects the parallel light along the optical axis C of the reflector 22, and is emitted from the light emitting portion toward the light collecting member 40. The parallel light is reflected downward by the light reflecting surface 41 of the condensing member 40, and is incident on the mask 45 while being condensed into a line extending in the X direction from the opening for opening 1 2 A (at this time, The diffusion plate 55 is not inserted). At this time, the light incident on the mask 45 is parallel light in the X direction. Then, the light incident on the mask 45 is formed into a stripe shape by the light shielding portion and the light transmitting portion, and is irradiated onto the object W to be irradiated, thereby forming a corresponding mask on the surface where the roller 51 to be irradiated contacts the surface. The stripe-shaped light-irradiating region of the light-shielding and light-transmitting portion pattern of 45 is transported to the Y direction by the transporting means 50 by the irradiation W, and the light is applied to the irradiated object by the light 10

被 物 部 物 W -26- 201237560 ，進行所需要的光照射處理。 另一方面’例如在開始檢測時及1天的作業結束時等 ’監視光射出部1 0之各放電燈30的照度及光照射區域之 照度分布之狀況中’擴散板55藉由未圖示之驅動機構， 插入配置於聚光構件40與遮罩45之間的光路徑上，從光 射出部1 0射出之光線照射至擴散板5 5。 此時，照射至擴散板55之光線係平行於X方向之光 線’於光擴散面55A上，形成帶狀的光照射區域LA。照 射至擴散板55之光線係如圖5所示，以光擴散面55a擴 散反射，來自各測定處（PI、P2.....Pn-1、Pn)的擴散 光經由成像光學元件65，於光感測器60的受光面601上 對應各測定處的受像位置（Dl、D2.....Dn-1、Dn )， 作爲光照射區域LA之1維的光強度分布像而成像。然後 ，藉由光檢測元件陣列6 1的各光檢測元件，檢測出對應 之各測定處之擴散光的光量（照度），對於藉此所得之畫 像資料，藉由畫像處理手段，進行適切的畫像處理，取得 光照射區域LA之X方向的照度分布。 構成光源元件列20之放電燈30全部爲點燈初始狀態 時，如圖6的實線A所示，可獲得照度的峰値與底値之差 較小的照度分布。亦即，重疊各光源元件21的光線所致 之光照射區域，各光源元件2 1的光線所致之光照射區域 之照度C的峰値位置相互不同，故光射出部1 0整體的照 度分布爲均一値。 前述，進行前述之各放電燈30的點燈狀態之監視動 -27- 201237560 作，獲得圖6的虛線所示之照度分布時，根據從左邊第2 個放電燈已劣化，可判斷該放電燈所致之光照射區域的照 度降低。 又例如，進行前述各放電燈30的點燈狀態之監視動 作’獲得圖7的虛線所示之照度分布時，檢測出某些異常 ，藉此，採取交換放電燈30等的措施。 如上所述，依據本發明，藉由構成爲具備檢測出各放 電燈30所致之在光擴散面55A的光照射區域之複數測定 處的擴散光之光量，對應該測定處之複數光檢測元件排列 於X方向之光檢測元件陣列6 1，對於以光感測器60取得 之畫像資料，進行適切的畫像處理，藉此，針對光照射區 域之X方向的照度分布或積算光量分布已及各放電燈30 的照度，取得詳細的資料。然後，依據取得之資料，檢測 出任一放電燈30產生照度降低等異常時，可正確特定產 生問題的放電燈，並且可判別照度降低或光軸偏離等之異 常狀態，故可確實確認光照射裝置的正常動作狀態。 又，各光檢測元件係在1個光檢測元件陣列的封裝內 ，溫度等的條件幾近相同，故較難受到各光檢測元件之間 的經時感度差的影響。進而，因不需要個別準備各光檢測 元件的配線纜線及放大電路，故儘管可進行詳細的分布測 定，也可將成本抑制爲較低。 又，構成爲於放電燈3 0之點燈狀態的監視動作中， 將擴散板5 5插入配置於從光射出部1 0射出之光線的光路 徑上，檢測出在光擴散面55A之擴散光的光量之構造，因 -28- 201237560 爲擴散板5 5具有將射入之光線控制爲一定大小的 射率者，可藉由光感測器60確實檢測出擴散光， 結果上可獲得高信賴性。 進而，因爲光感測器60固定於燈室11，故光 60與光源元件列20的位置關係被固定，不需要繁 學調整。 又，依據此實施形態的光照射裝置，光源元件 點光源之短弧型放電燈30，將由該放電燈30與具 拋物面狀之光反射面23的反射器22所構成之複數 件21以沿著一方向（X方向）並排之方式配置所 源元件列20，構成光射出部1 0，故從各光源元件： 放電燈3 0放射之光線，藉由該光源元件2 1之各反 ，於光源元件2 1並排之一方向成爲平行之光線， 來自聚光構件40之光源於遮罩45的透光部，對於 向正交或略正交而射入並透射。所以，防止或抑制 罩45的遮光部正下之被照射物W的區域被照射光 果，可形成忠於遮罩45的圖案且高解析度的圖案。 以上，已針對本發明的實施形態進行說明，但 發明不限定於前述之實施形態者，可施加各種變更 3中，已揭示使用1個光感測器60之狀況，但是， 數光感測器60，進行比使用1個光感測器60時還 之區域的照度分布亦可。 圖8係複數光檢測元件陣列並排於X方向之方 之構造的範例，只要是此種構造的話，針對X方向 擴散反 在檢測 感測器 雜的光 2 1爲 有旋轉 光源元 成的光 21之各 射器22 藉此， 其面方 位於遮 線，結 是，本 。在圖 使用複 要寬廣 式配置 的寬廣 -29 - 201237560 區域’即可高信賴性地獲得各放電燈的照度及光照射區域 的照度分布。 在圖8的範例中，於前述實施形態的光照射裝置中， 於燈室1 1內，各個例如由CCD線感測器所成的第1光感 測器60A與第2光感測器60B並排於X方向而配置。其 他構造係與圖3所示之光照射裝置相同，於相同者附加相 同符號。 再者，在此構造中，第1光感測器60A與第2光感測 器60B係可檢測範圍不重複而進行並排配置，如圖8所示 ，以可檢測範圍的一部分重複之方式並排配置中任一皆可 ，但是，根據迴避第1光感測器60A與第2光感測器60B 的感度之個體差所致之照度分布的不均產生，在檢測結果 上獲得高信賴性，構成爲第1光感測器60A與第2光感測 器60B的可檢測範圍的一部分重複之方式並排配置爲佳。 又，光檢測元件陣列係不限定於複數光檢測元件並排 排列於X方向之1維線感測器，使用複數光檢測元件排列 成2維之例如CCD區域感測器（2維區域感測器）亦可。 於作爲光檢測元件陣列而使用2維區域感測器的構造 者中，如圖9所示，來自擴散板55的光擴散面55A上之 各測定處（P11，…，Pnl，…Plm’…’ Pnm)的擴散光 ，藉由成像光學元件65，於光感測器60的受光面601上 之對應各測定處（PI 1，…，Pnl ’…Plm，…，Pnm )的 各受像位置（Dll’…’ Dnl，…Dim’…’ Dnm) ’可將 ’光照射區域LA整體之光強度分布加以總括攝像，故例如 -30- 201237560 即使放電燈於光源元件並排之χ方向以外的方向，產生光 學軸偏離之狀況，也可特定產生異常的放電燈。 又，例如對於液晶面板用之平板狀的玻璃基板等的被 照射物，形成線狀之圖案的構造之狀況中，不需要將來自 光源元件列之光線藉由聚光構件而聚光成線狀來進行照射 ，構成爲將來自光源元件列之光線藉由適切的反射構件反 射而作爲相互平行於X方向與γ方向之光線來進行照射 (形成帶狀的光照射區域）的構造亦可，但是，於此種構 造中，藉由作爲光檢測元件陣列而使用2維區域感測器， 可確實獲得前述效果。 作爲光檢測元件陣列6 1 ’使用2維區域感測器的話’ 如圖9所示，也可檢測出Y方向的光量分布（Dkl〜Dkm (k=l〜η)之光強度分布），藉由針對Υ方向來積算光 量分布，可求出被照射物之搬送方向的積算光量。 又進而，監視手段係不需要爲配置於構成光射出部之 燈室內的構造，如圖1 〇所示’構成爲固定於光照射裝置 的框體來設置於構成光射出部10之燈室11的外部之構造 亦可。 在圖1 0的範例中，例如藉由具備2維區域感測器之 光檢測元件陣列6 1、將擴散板5 5的光擴散面之擴散光成 像於光檢測元件陣列6 1的成像透鏡6 6 (成像光學元件） 所構成，並依據藉由光檢測元件陣列61所取得之畫像資 料，取得光射出部1 0所致之光照射區域之Χ方向及Υ方 向的照度分布。 -31 - 201237560 又進而，於本發明的光照射裝置中，構成爲設置有在 動作時位於從光射出部射出之光線的光路徑上，將來自該 光射出部之光線加以遮光的光閘構件的構造之狀況中，可 設爲於該光閘構件之光照射面上，設置擴散板的構造。 在以上內容，已針對藉由檢測出目標之波長的紫外光 之光到達區域（例如擴散板上的光照射區域）之擴散光， 取得各放電燈的照度及光照射區域之照度分布的構造進行 說明，但是，構成爲藉由檢測出於被照射物的處理中不需 要之可視光或紅外光的擴散光，取得各放電燈的照度及光 照射區域之照度分布的構造亦可。 於圖1 1，揭示檢測出透射聚光構件40A之可視光或 紅外光的擴散散亂光時的構造例。於聚光構件40A，施加 反射被照射物的處理所需之波長的紫外光（270〜340nm) ，並使其以外波長之光線（例如近紫外光及可視光）透射 的波長選擇塗層。於聚光構件40A的背面側，在透射該聚 光構件40A之來自光射出部10的透射光之光路徑上，將 使該透射光擴散反射的擴散板56，以光擴散面朝向斜上方 之方向，對於透射光的光軸傾斜之狀態設置。然後，光擴 散面上之複數測定處的各擴散光之光量，係經由成像光學 元件65而利用光感測器60檢測出。再者，針對與圖1乃 至圖3的光照射裝置相同之構造構件，附加相同符號。 在此實施形態的光照射裝置中所使用之擴散板56係 例如波長3 50nm〜700nm之可視光的擴散反射率爲90%以 上者。 -32- 201237560 然後’在任一放電燈產生異常時，不僅目標之波長的 紫外光’例如可視光也產生照度降低，根據照度降低的程 度係外光及可視光任一皆表不相同傾向，即使前述構造 的光照射裝置，也可獲得與上述之實施形態的光照射裝置 相同的效果。又’因爲可一邊進行光源元件列20之各放 電燈3 0的點燈狀態之監視動作，一邊進行對於被照射物 W的光照射處理，在使裝置動作之間也可檢測出照度分布 的變動。在檢測出任一放電燈的異常時，可迅速採取使生 產線停止，交換放電燈等的措施。 又，在此構造之狀況中，也可將光檢測元件陣列的封 裝配置於易於冷卻的場所，也沒有各光檢測元件間的溫度 係數之差所致之感度差的影響，也易於進行維護。進而， 因不需要個別準備各受光元件（光檢測元件）的配線纜線 及放大電路，故儘管可進行詳細的分布測定，也可將成本 抑制爲較低。 又，即使於此種構造的光照射裝置中，並不需要將來 自光射出部10之光線藉由聚光構件40A聚光成線狀而加 以照射的構造，構成爲使用適切的反射構件來代替聚光構 件40A，將來自光射出部1 0的光線藉由該反射構件反射 而作爲平行於X方向及Y方向之平行光來進行照射（形 成帶狀的光照射區域）的構造亦可。 又進而，於本發明的光照射裝置中，不需要具備擴散 板的構造，例如圖12所示，構成爲從被照射物W的表面 或遮罩45的表面擴散反射之擴散光（散亂光）係經由針 -33- 201237560 孔板等的成像光學元件6 5，藉由光感測器60檢測的構造 亦可。 依據此種構造，可一邊進行光源元件列20之各放電The object part W -26- 201237560 performs the required light irradiation treatment. On the other hand, for example, in the case where the illuminance of each of the discharge lamps 30 of the light emitting unit 10 and the illuminance distribution of the light irradiation region are monitored, for example, at the start of the detection and at the end of the one-day operation, the 'diffusion plate 55' is not shown. The driving mechanism is inserted into the light path disposed between the light collecting member 40 and the mask 45, and the light emitted from the light emitting portion 10 is irradiated to the diffusion plate 55. At this time, the light irradiated to the diffusing plate 55 is parallel to the light line 'in the X direction' on the light diffusing surface 55A to form a strip-shaped light irradiation region LA. The light that is incident on the diffusion plate 55 is diffused and reflected by the light diffusion surface 55a as shown in FIG. 5, and the diffused light from each measurement point (PI, P2.....Pn-1, Pn) passes through the imaging optical element 65. The image receiving positions (D1, D2, . . . Dn-1, Dn) corresponding to the respective measurement positions on the light receiving surface 601 of the photo sensor 60 are imaged as a one-dimensional light intensity distribution image of the light irradiation region LA. Then, by the light detecting elements of the photodetecting element array 61, the amount of light (illuminance) of the diffused light corresponding to each measurement site is detected, and the image data thus obtained is subjected to image processing means. The illuminance distribution in the X direction of the light irradiation region LA is obtained by the treatment. When all of the discharge lamps 30 constituting the light source element row 20 are in the initial lighting state, as shown by the solid line A in Fig. 6, an illuminance distribution in which the difference between the peak 値 and the bottom illuminance of the illuminance is small can be obtained. In other words, the light irradiation region due to the light of the light source elements 21 is superimposed, and the peaks of the illuminance C of the light irradiation region due to the light of each of the light source elements 21 are different from each other, so that the illuminance distribution of the entire light emitting portion 10 is different. For uniformity. In the above, when the illumination state of each of the discharge lamps 30 is monitored, -27-201237560 is obtained, and when the illuminance distribution shown by the broken line in Fig. 6 is obtained, the discharge lamp can be judged based on the deterioration of the second discharge lamp from the left side. The illuminance of the light-irradiated area is reduced. Further, for example, when the illumination operation of the lighting state of each of the discharge lamps 30 is performed, the illuminance distribution indicated by the broken line in Fig. 7 is obtained, and some abnormality is detected, whereby the discharge lamp 30 or the like is taken. As described above, according to the present invention, the complex light detecting element corresponding to the measurement portion is configured by the light amount of the diffused light at the plurality of measurement portions of the light irradiation region of the light diffusing surface 55A due to the detection of each of the discharge lamps 30. The photodetecting element array 161 arranged in the X direction performs appropriate image processing on the image data obtained by the photo sensor 60, whereby the illuminance distribution or the integrated light amount distribution in the X direction of the light irradiation region is The illuminance of the discharge lamp 30 is obtained in detail. Then, when it is detected that any of the discharge lamps 30 has an abnormality such as a decrease in illuminance, it is possible to accurately identify the discharge lamp that has a problem, and to determine an abnormal state such as a decrease in illuminance or an deviation of the optical axis, so that the light irradiation device can be surely confirmed. Normal operating state. Further, since each of the photodetecting elements is housed in a package of one photodetecting element array, conditions such as temperature are almost the same, and it is difficult to be affected by the difference in temporal sensitivity between the photodetecting elements. Further, since it is not necessary to separately prepare the cable and the amplifying circuit of each photodetecting element, the cost can be kept low even though detailed distribution measurement can be performed. Further, in the monitoring operation of the lighting state of the discharge lamp 30, the diffusion plate 55 is inserted into the light path of the light emitted from the light emitting portion 10, and the diffused light on the light diffusing surface 55A is detected. The structure of the amount of light, because -28-201237560 is a diffuser plate 5 5 has the ability to control the incident light to a certain size, and the light sensor 60 can detect the diffused light, and the result is high reliability. Sex. Further, since the photo sensor 60 is fixed to the lamp chamber 11, the positional relationship between the light 60 and the light source element row 20 is fixed, and no complicated adjustment is required. Further, according to the light irradiation device of this embodiment, the short arc type discharge lamp 30 of the light source element point light source has a plurality of members 21 composed of the discharge lamp 30 and the reflector 22 having the parabolic light reflecting surface 23 along The source element row 20 is arranged side by side in one direction (X direction) to form the light emitting portion 10, so that the light emitted from each of the light source elements: the discharge lamp 30 is reflected by the light source element 2 1 The elements 2 1 are arranged in parallel in one direction, and the light source from the light collecting member 40 is incident on the light transmitting portion of the mask 45 for orthogonal or slightly orthogonal directions. Therefore, it is possible to prevent or suppress the irradiation of the region of the object W under the light-shielding portion of the cover 45, and to form a pattern having a high resolution in the pattern of the mask 45. Although the embodiment of the present invention has been described above, the present invention is not limited to the above-described embodiment, and various changes can be applied. In the case where one photo sensor 60 is used, the photosensor is disclosed. 60. It is also possible to perform an illuminance distribution in a region other than when one photo sensor 60 is used. Fig. 8 is an example of a configuration in which a plurality of photodetecting element arrays are arranged side by side in the X direction. As long as such a configuration, the light 2 in the X direction is opposite to the detecting sensor, and the light 21 is a rotating light source. The respective emitters 22 are thereby located on the occlusion line, and the knot is the present. In the figure, the illuminance of each discharge lamp and the illuminance distribution of the light-irradiated area can be obtained with high reliability by using the wide -29 - 201237560 area of the wide-width configuration. In the example of FIG. 8, in the light irradiation device of the above-described embodiment, the first photo sensor 60A and the second photo sensor 60B each formed by, for example, a CCD line sensor in the lamp chamber 1 1 Configured side by side in the X direction. The other structures are the same as those of the light irradiation device shown in Fig. 3, and the same symbols are attached to the same. Further, in this configuration, the first photosensor 60A and the second photo sensor 60B are arranged side by side without repeating the detectable range, and are arranged side by side in a manner in which a part of the detectable range is repeated as shown in FIG. Any one of the configurations may be used. However, the unevenness of the illuminance distribution due to the individual difference of the sensitivity of the first photosensor 60A and the second photosensor 60B is avoided, and high reliability is obtained in the detection result. It is preferable that the first photo sensor 60A and the second photo sensor 60B are overlapped in a part of the detectable range. Further, the photodetecting element array is not limited to a one-dimensional line sensor in which the plurality of photodetecting elements are arranged side by side in the X direction, and the plurality of photodetecting elements are arranged in two dimensions, for example, a CCD area sensor (2-dimensional area sensor) ) Yes. In the constructor using the two-dimensional area sensor as the photodetecting element array, as shown in FIG. 9, each measurement point (P11, ..., Pn1, ... Plm' from the light diffusing surface 55A of the diffusing plate 55 is used. The diffused light of 'Pnm' is imaged by the imaging optical element 65 on the light receiving surface 601 of the photosensor 60 at each of the respective measurement positions (PI 1, . . . , Pnl '...Plm, . . . , Pnm ) ( Dll'...'Dnl,...Dim'...' Dnm) 'The light intensity distribution of the whole light irradiation area LA can be collectively imaged, so for example, -30-201237560 even if the discharge lamp is in a direction other than the direction in which the light source elements are arranged side by side, In the case where the optical axis is deviated, it is also possible to specify a discharge lamp that generates an abnormality. In the case of a structure in which a linear pattern is formed on an object to be irradiated such as a flat glass substrate for a liquid crystal panel, it is not necessary to condense the light from the light source element row into a line by the condensing member. In order to illuminate, the light from the light source element row is reflected by a suitable reflecting member, and is irradiated as light rays parallel to the X direction and the γ direction (forming a strip-shaped light irradiation region). In such a configuration, by using a two-dimensional area sensor as an array of photodetecting elements, the aforementioned effects can be surely obtained. As shown in Fig. 9, as the light detecting element array 6 1 'is a two-dimensional area sensor, as shown in Fig. 9, the light intensity distribution in the Y direction (the light intensity distribution of Dk1 to Dkm (k = 1 to η)) can be detected. By integrating the light amount distribution with respect to the x-direction, the integrated light amount in the conveyance direction of the object to be irradiated can be obtained. Further, the monitoring means does not need to be disposed in the lamp chamber constituting the light emitting portion, and is disposed in the housing of the light emitting portion 10 as shown in FIG. The external structure can also be. In the example of FIG. 10, the image forming lens 6 of the light detecting element array 61 is imaged by, for example, the light detecting element array 61 having the two-dimensional area sensor, and the diffused light of the light diffusing surface of the diffusing plate 55. 6 (imaging optical element) is configured to obtain an illuminance distribution in the x direction and the x direction of the light irradiation region by the light emitting portion 10 in accordance with the image data obtained by the photodetecting element array 61. Further, in the light-emitting device of the present invention, the light-shielding member that shields the light from the light-emitting portion in the light path of the light emitted from the light-emitting portion during operation is provided. In the case of the structure, the structure of the diffusing plate may be provided on the light-irradiating surface of the shutter member. In the above, the illuminance of each discharge lamp and the illuminance distribution of the light irradiation region are obtained by the diffused light of the ultraviolet light reaching the region (for example, the light irradiation region on the diffusion plate) of the target wavelength. In addition, the configuration may be such that the illuminance of each of the discharge lamps and the illuminance distribution of the light irradiation region are obtained by detecting the diffused light of visible light or infrared light that is not required for the processing of the object to be irradiated. Fig. 1 shows a configuration example in which the visible light transmitted through the light collecting member 40A or the diffused scattered light of the infrared light is detected. The concentrating member 40A is applied with a wavelength selective coating for transmitting ultraviolet light (270 to 340 nm) of a wavelength required for the treatment of the object to be irradiated, and transmitting light of a wavelength other than the wavelength (for example, near-ultraviolet light and visible light). On the back side of the concentrating member 40A, the diffusing plate 56 that diffuses and reflects the transmitted light is transmitted in a light path of the transmitted light from the light emitting portion 10 of the condensing member 40A, with the light diffusing surface facing obliquely upward. The direction is set for the state in which the optical axis of the transmitted light is tilted. Then, the amount of light of each of the diffused lights at the plurality of measurement surfaces on the light-diffusing surface is detected by the photosensor 60 via the imaging optical element 65. Incidentally, the same components as those of the light irradiation device of Figs. 1 to 3 are denoted by the same reference numerals. The diffusing plate 56 used in the light-emitting device of this embodiment is, for example, a diffuse reflectance of visible light having a wavelength of from 3 to 50 nm to more than 90 nm of 90% or more. -32- 201237560 Then, 'when any discharge lamp is abnormal, not only the ultraviolet light of the target wavelength, such as visible light, but also the illuminance is reduced. According to the degree of illuminance reduction, both external light and visible light are different, even if The light irradiation device of the above-described structure can also obtain the same effects as the light irradiation device of the above-described embodiment. In addition, the light irradiation treatment for the irradiated object W can be performed while monitoring the lighting state of the respective discharge lamps 30 of the light source element array 20, and the variation of the illuminance distribution can be detected between the operation of the apparatus. . When an abnormality of any of the discharge lamps is detected, measures such as stopping the production line and exchanging discharge lamps can be quickly taken. Further, in the case of this configuration, the sealing of the photodetecting element array can be placed in a place where it is easy to cool, and the influence of the difference in temperature coefficient between the photodetecting elements is not affected, and maintenance can be easily performed. Further, since it is not necessary to separately prepare the cable and the amplifying circuit of each of the light receiving elements (photodetecting elements), the cost can be kept low although detailed distribution measurement can be performed. Further, even in the light irradiation device of such a configuration, it is not necessary to illuminate the light from the light-emitting portion 10 by condensing the light collecting member 40A into a linear shape, and it is configured to use a suitable reflecting member instead. The light condensing member 40A may be configured such that the light from the light emitting portion 10 is reflected by the reflecting member and irradiated as parallel light in the X direction and the Y direction (forming a strip-shaped light irradiation region). Further, in the light irradiation device of the present invention, a structure including a diffusion plate is not required. For example, as shown in FIG. 12, the light is diffused and reflected from the surface of the object W or the surface of the mask 45 (scattered light) The structure detected by the photo sensor 60 may be via the imaging optical element 65 such as the needle-33-201237560 orifice plate. According to this configuration, each discharge of the light source element array 20 can be performed while performing

燈3 0的點燈狀態之監視動作，一邊進行對於被照射物W 的光照射處理，故在檢測出任一放電燈的異常時’可迅速 採取使生產線停止，交換放電燈等的措施。 又進而，作爲本發明的光照射裝置中所使用之成像光 學元件，並不限定於針孔板，使用可於光檢測元件陣列上 « ，投影光射出部所致之光到達區域之光強度分布，例如攝 像機透鏡等的透鏡亦可。 又進而，光射出部係構成爲分別延伸於X方向之2個 以上的光源元件列以連結一個光源元件列的光源元件之放 電燈的電極中心點，與最接近該光源元件之其他光源元件 列的光源元件之放電燈的電極中心點之直線，與延伸於X 方向之直線斜交之方式配置的構造亦可。 接著，針對適用於前述構造的光照射裝置，監視光照 射區域之照度分布的變動之畫像處理單元的實施例進行說 明。 圖1 3係揭示本發明第2實施例之光照射裝置的畫像 處理單元的功能區塊圖，圖14係揭示前述畫像處理單元 之處理順序的流程圖。 於圖1 3中，如前述般，從放電燈3 0 (在同圖中將各 燈記載爲L 1〜L5 )放出之光線係以橢圓鏡的反射器22反 射，作爲平行之光線放出。 -34- 201237560 此平行之光線係以聚光構件40反射，照射至擴散板 55上（照射光線之區域係圖中影線部分），以擴散板55 擴散反射。 以擴散板55擴散反射之光線（在圖13中依每個燈記 載爲SL1…SL5 )係藉由內藏於光感測器60之透鏡單元或 針孔板等的成像光學元件65，對應擴散板55上之照度分 布的光量之光線成像於光檢測元件陣列6 1上。再者，作 爲光檢測元件陣列6 1，如前述般可使用2維區域感測器（ C CD )或線感測器，但是，在以下的實施例中，針對使用 2維區域感測器之狀況進行說明。 對應以前述光感測器60檢測出之光量的訊號，係被 送至畫像處理單元7。畫像處理單元7係如圖13所示，由 處理部71、記億部72、顯示部73及警報部74等構成。 於前述記億部7 2，儲存有用以將對應以光感測器6 0 檢測出之光量的訊號與從光源元件21射出之光線被照射 的光照射區域之各位置建立對應的位置建立對應資料72a 光2b對料 該7 、資 示料 2 間 表資7時 爲率料命 換比資壽 轉換値障 量轉限保 光的臨燈 之號動之 置訊變間 位的度時 各動照燈 的變的點 上度値算 段照度積 手之限的 測置之用 檢位動使 量各變之 光的度燈 將域照障 以區示保 用射表可 、 照 ' 應 處理部7 1係具備：針對從光感測器60送來之光量訊 號，進行Y方向（線方向）的光量分布（圖9之Dkl〜 Dkm(k=l〜η)的光強度）之積算處理等的前處理的前 -35- 201237560 處理部7 1 a，和依據記憶於記憶部7 2之位置建立對應資料 72a與轉換比率資料72b，將前述光感測器60之光檢測元 件陣列6 1上的各位置，與從前述光源元件射出之光線被 照射的光照射區域之各位置建立對應，並將光量檢測手段 上的各位置之光量，轉換爲表示該光照射區域的各位置之 照度變動的訊號的轉換處理部71b。又，具有進行比較藉 由該轉換處理部71b轉換之光照射區域的各位置之照度變 動，與記憶於記憶部7 2之照度變動臨限値資料7 2 c等， 監視照度是否變動，並從警報部74輸出警報訊號的照度 變動監視部71c，進而具備：進行於藉由前述轉換處理部 71b轉換之光照射區域的各位置之照度顯示於顯示部73的 處理的顯示處理部71d’與依據從電源部9送來之燈點燈 訊號’監視各燈的點燈時間是否到達儲存於記憶部7 2之 燈保障壽命時間資料72d的時間的點燈時間監視部7 1 e。 在此’針對前述轉換處理部71b之轉換處理進行說明 〇 於前述轉換處理中’進行（1 )將光量檢測手段上的 各位置’與從前述光源元件射出之光線被照射的光照射區 域之各位置建立對應的處理，（2 )將光檢測元件陣列6 J 上的各位置之光量’轉換爲表示該光照射區域的各位置之 照度變動的訊號的處理。以下，針對前述（1) (2)處理 ，更詳係進行說明。 (1 )針對光檢測兀件陣列上的各位置與照射區域的各位 置之建立對應的處理。 -36- 201237560 於記憶部72，儲存有位置建立對應資料 元件陣列6 1上的各位置，與從前述光源元 照射之光照射區域的各位置，藉由參照前述 資料72a而建立對應。 此因，如果不知道光檢測元件陣列61 對應光照射區域的哪個位置的話，則無法正 區域之照度分布。 例如，光檢測元件陣列61的朝向稍微 新各檢測元件（CCD )上的像素位置是對應 域的何處（對應哪個燈的照射位置）的話， 資訊。 各檢測元件（CCD )的像素位置與照射 形（1次函數）的關係，即使知道尺度（斜鸟 所示，不決定相當於Y軸（照射區域位置） 的話，無法明確求出實際的位置。亦即，不 件陣列6 1的哪個位置是哪個燈照射的區域 度降低，進行照度調整時，也無法訂定進行 回授（電力調整）即可。 進而，如前述圖8所示，在並排複數光 寬廣的區域時，重疊部分具體來說對應哪個 話，合計利用複數光感測器所檢測出之光量 取得整體的照度分布。 根據以上的理由，設置將光感測器60 陣列61上之各位置，與從前述光源元件射 72a，光檢測 件射出之光線 位置建立對應 上的各位置是 確測定光照射 偏離時，不更 實際之照射區 會輸出錯誤之 區域位置爲線 _ )，如圖1 5 的截距之參數 知道光檢測元 的話，燈的照 哪個燈的照度 感測器，照射 位置不明確的 資料，也無法 的光檢測元件 出之光線被照 -37- 201237560 射的光照射區域之各位置建立對應的位置建立對應資料 72a爲佳。 再者，也可考慮預先在裝置的出貨時，並測定照度分 布，將光檢測元件陣列6 1上的位置與放電燈3 0的關係建 立對應，不一定要光檢測元件陣列6 1上的位置與照射區 域的位置之對應資訊亦可。 (2)針對將光量檢測手段上的各位置之光量，轉換爲表 示該光照射區域的各位置之照度變動的訊號的處理。 如前述般，射入至光檢測元件陣列6 1之光線，係根 據光線的射入角度及擴散板55的散亂特性等之要因，不 會成爲正確反映光照射區域的照度分布者，例如，相較於 來自光檢測元件陣列正面的擴散散亂光，從傾斜方向射入 之擴散散亂光係即使是相同強度的散亂光，也會計測到較 低的光量。 亦即，擴散板5 5之散亂光的強度因散亂角度不同之 配像角度依存性與對光檢測元件陣列6 1的射入角度之不 同，即使是相同光量，也包含測定値變化之餘弦定律所致 之效果等。 圖16係揭示前述轉換比率資料72b的修正係數之一 例的圖，對於光檢測元件陣列61的射入角度0，大約爲 接近cos 02的係數，表示前述餘弦定律的效果較大時之修 正係數。 對於決定此修正係數來說，例如預先以該光照射裝置 之照射條件，於遮罩、工件面上使用受光器等來測定正確 -38- 201237560 的照度分布，求出與取得之光檢測元件陣列61的輸出訊 號之比率，作成修正係數的表格之方法。 測定係例如離散地進行，各測定點間之値係進行內插 處理來求出。或者，使用配置具有充分長度之棒狀燈的光 源，設定均一的光源條件，求出修正係數之方法亦可。 圖1 7係揭示藉由前述光檢測元件陣列6 1所檢測出之 光量分布，與藉由前述轉換比率資料轉換之後的照度分布 (相當於光照射區域之照度分布）的圖，同圖的橫軸係表 示燈排列長邊方向的位置（位於各燈正面的光照射區域上 之位置），L1〜L11係相當於各燈L1〜L11的照度分布之 峰値位置。.又，縱軸係照度（相對値），藉由前述轉換處 理，利用以同圖的點虛線所示之光檢測元件陣列6 1所檢 測出之光量分布A，係如同圖的實線所示之照度分布B般 修正。 圖18係說明本實施例之前述轉換處理的圖，圖18(a )係揭示藉由光檢測元件陣列61所檢測出之光量資料（A )(光量分布資料）。在此例中，以同圖的圓包圍之區域 中’揭示因燈的照度降低等之理由，照度降低之狀況。又 ，圖18(b)係揭示前述圖16所示之轉換比率資料（B) 前述轉換處理係例如，前述光量資料（A )除以轉換 比率資料（B)，藉由運算（A)/(B)來進行。藉此，如 圖1 8 ( c )所不’可取得對應光照射區域之照度分布的訊 號0 -39- 201237560 藉由進行此種轉換處理，可使燈排列長邊方向的位置 (前述X方向的位置）之照度的大小一致，馬上可掌握照 度降低的部分。 圖14係揭示畫像處理單元7之處理的流程圖，一邊 參照圖13 —邊藉由圖14的流程圖，說明畫像處理單元之 處理。 處理部71係擷取藉由光感測器60檢測出之CCD畫 像（步驟S 1 )，利用前處理部7 1 a如前述般進行線方向（ Y方向）的光量分布之積算處理（步驟S2)。接下來，從 g己憶部72讀入轉換比率資料72b、位置建立對應資料72a ’於轉換處理部7 1 b中如前述般進行轉換處理（步驟s 3 ，S4 )。 接下來’以顯示處理部71d處理利用前述轉換處理部 7 1 b轉換處理之照度分布資料，作爲畫像資料，顯示於顯 示部73 (步驟Μ )。藉此，如前述圖1 8 ( c )所示，顯示 照度分布的變動。 照度變動監視部7 1 c係比較利用前述轉換處理部7 1 b 轉換處理之照度分布資料，與記憶於記憶部72之照度變 動臨限値資料7 2 c ’判定是否有特定燈的照度變動（步驟 S6 ， S7) 〇 圖ό係揭示一部分燈的照度降低時之照度變動的圖， 同圖的橫軸係表示燈排列長邊方向的位置（位於各燈的正 面之光照射區域上的位置），L1、L 2、L 3係相當於各燈 L 1〜L4的照度分布之峰値位置。又，縱軸係照度（相對 -40- 201237560 値），A係表示被檢測出之光量分布資料，B係表示照度 臨限値，C係表示設置於光源元件列2 0之各光源元件21 的各放電燈L1〜L4。 照度變動監視部7 1 c係如圖6所示，比較被轉換處理 之照度分布A與照度臨限値B，如同圖的虛線所示，有照 度降低到低於照度臨限値B的區域時，判斷成爲照度降低 之原因的燈是哪個燈，從警報部74輸出警報訊號（步驟 S 1 1 )。在此例中，因爲可知燈L2的照度降低，作爲警報 訊號，輸出燈L2的照度降低之狀況。 作爲警報訊號，輸出前述照度降低訊號時，光照射裝 置的異常結束，或被消燈。 點燈時間監視部7 1 e係監視從供電給燈L 1〜L5的電 源部9送來之燈L1〜L5的積算點燈時間（步驟S 8 )。然 後，與記億於燈保障壽命時間資料72d的燈保障壽命時間 進行比較，判定積算點燈時間是否到達保障壽命（步驟 S9 )，判定積算點燈時間到達保障壽命時，則從警報部 74輸出燈交換的警報訊號（步驟S10)。藉此，光照射裝 置的動作結束且消燈。 又，積算點燈時間未到達保障壽命的話，在所定區間 時間後回到步驟s 1，重複前述處理。 圖1 9係揭示本發明第3實施例之光照射裝置的畫像 處理單元的功能區塊圖，圖20係揭示前述畫像處理單元 之處理順序的流程圖。 於圖1 9中’光照射部1的構造與圖1 3所示者相同， -41 - 201237560 從放電燈30(在同圖中將各燈記載爲L1〜L5)放出之光 線，係以橢圓鏡的反射器2 2反射，作爲平行光而被放出 之光線係以聚光構件40反射，被照射至擴散板5 5上。以 擴散板5 5擴散反射之光線係藉由內藏於光感測器60之透 鏡單元或針孔板等的成像光學元件65，對應擴散板55上 之照度分布的光線之強度成像於光檢測元件陣列6 1上" 對應以前述光感測器60檢測出之光強度的訊號（光 量），係被送至畫像處理單元7。畫像處理單元7係與前 述圖13所示者相同，由處理部71、記憶部72、顯示部73 及警報部74等構成。 於前述記億部72，儲存有用以將前述光量與光照射區 域之各位置建立對應的位置建立對應資料72a、於光照射 部1的各放電燈3 0之照度未降低之狀態中，藉由光檢測 元件陣列6 1檢測出之光檢測元件陣列6 1上的各位置之身 爲光量資料的基準光量資料72e、表示照度變動之限度値 的照度變動臨限値資料72c、對應可保障燈的使用之積算 點燈時間的燈保障壽命時間資料72d。 前述基準光量資料72e係例如於光照射部1安裝新的 放電燈3 0，將使該放電燈3 0首次點燈時所檢測出之光檢 測元件陣列6 1上的各位置之光量資料，記錄於前述記憶 部72者，將此資料作爲基準光量資料來使用。 處理部71係基本上與圖13所示者相同構造，具備： 針對從光感測器60送來之光量訊號，如前述般進行積算 處理等的前處理的前處理部71a，和依據記憶於記憶部72 -42- 201237560 之位置建立對應資料72a與前述基準光量資料72e，將前 述光感測器60之光檢測元件陣列6 1上的各位置，與從前 述光源元件射出之光線被照射的光照射區域之各位置建立 對應，並將光量檢測手段上的各位置之光量，轉換爲表示 該光照射區域的各位置之照度變動的訊號的轉換處理部 71b ° ， 又’具有進行比較藉由該轉換處理部71b轉換之光照 射區域的各位置之照度變動，與記憶於記憶部72之照度 變動臨限値資料72c等，監視照度是否變動，並從警報部 74輸出警報訊號的照度變動監視部7 i c，進而具備：進行 於藉由前述轉換處理部71b轉換之光照射區域的各位置之 照度顯示於顯示部73的處理的顯示處理部71d，與依據從 電源部9送來之燈點燈訊號，監視各燈的點燈時間是否到 達儲存於記憶部72之燈保障壽命時間資料72d的時間的 點燈時間監視部7 1 e。 於本實施例中，前述轉換處理部71b之轉換處理係如 前述般，進行（1)將光量檢測手段上的各位置，與從前 述光源元件射出之光線被照射的光照射區域之各位置建立 對應的處理，（2 )將光檢測元件陣列6 1上的各位置之光 量’轉換爲表示該光照射區域的各位置之照度變動的訊號 的處理，但是，該（2 )的處理與前述第2實施例不同。 前述（1 )的處理係如前述般，使用位置建立對應資 料72a，進行光檢測元件陣列6 1上的各位置，與從前述光 源元件射出之光線被照射的光照射區域之各位置的建立對 -43- 201237560 應。再者，如前述般，將光檢測元件陣列6 1上的位置與 燈的關係建立對應亦可。 前述（2)的處理在本實施例中如以下所述進行轉換 〇 圖21係說明本實施例之前述轉換處理的圖，圖2 1 ( a )係揭示藉由光檢測元件陣列61所檢測出之光量資料（A )(光強度的分布資料）。在此例中，以同圖的圓包圍之 區域中，揭示因燈的照度降低等之理由，光量降低之狀況 。又，圖21(b)係揭示基準光量資料（B)。 基準光量資料係如前述般，安裝新的放電燈3 〇 ’而將 使該放電燈3 0首次點燈時藉由光檢測元件陣列6 1所檢測 出之光檢測元件陣列61上的各位置之光量，作爲基準資 料而記憶於記憶部72者》 本實施例之轉換處理係例如，前述光量資料（A)除 以基準光量資料（B)，藉由運算（A) / (B)來進行。 藉此，如圖21 ( c )所示，取得對於使放電燈首次點 燈時的光照射區域之照度分布，表示哪個位置的光量降低 哪種程度的訊號，亦即，表示光量的降低之比例的訊號（ 以下，將此訊號稱爲照度維持率）。在同圖中，附加圓的 部分爲照度降低。 如此藉由轉換處理，於燈排列長邊方向的位置（前述 X方向的位置）中，相較於計測基準光量資料的時間點， 可馬上掌握有哪種程度的照度降低。 圖22係揭示照度維持率之變動（照度之降低的比例 -44 - 201237560 )例的圖（模擬結果）’圖2 2 ( a )係揭示特定燈的照度 降低之狀況，圖22(b)係揭示特定燈的光軸偏離之狀況 。再者’同圖橫軸係揭示燈排列長邊方向的位置（位於各 燈的正面之光照射區域上的位置），L1、L2、L3係相當 於各燈L 1〜L4之照度分布的峰値位置。 縱軸係揭示照度維持率、照度（相對値），A係揭示 前述照度維持率資料，實線係揭示照度相較於初始値，降 低到0 · 9爲止之狀況，點虛線係揭示照度相較於初始値， 降低到0.8爲止之狀況》又，C係設置於光源元件列20的 各光源元件21之各放電燈L1〜L4所致之照度。 如圖22 ( a )所示，特定燈的照度降低的話，藉由前 述轉換所得之照度維持率資料A係在對應照度降低之燈的 位置（在此例中爲對應燈L2的位置）降低。藉此，可掌 握是哪個燈的照度降低。 又，特定燈（在此例中爲燈L2 )的光軸傾斜的話， 如圖22 ( b )所示，照度維持率資料會變動。 亦即，在特定燈的照度降低時，如圖22 ( a )所示’ 對應其中心的位置之光量維持率會降低，但是，在燈的光 軸偏離時，因來自相鄰之燈的光量之重疊程度改變’谷部 與峰部以相連之形態出現。 - 尤其谷部與峰部的峰値位置會在與燈中心之正面的位 置不同之偏離處產生。例如，可知照度分布的谷部產生於 L1與L2之間，峰部產生於L2與L3之間。 如上所述，在特定燈的照度降低之狀況與光軸傾斜之 -45- 201237560 狀況中，因爲照度維持率的變動狀態不同’可判別是燈的 照度降低或光軸傾斜。 圖2 0係揭示畫像處理單元7之處理順序的流程圖’ 一邊參照前述圖19 —邊藉由圖20的流程圖，說明畫像處 理單元之處理。再者，本實施例之處理係僅轉換處理與圖 14的流程圖相異，其他處理基本上與圖14相同。 處理部71係擷取藉由光感測器60檢測出之CCD畫 像（步驟S 1 )，利用前處理部7 1 a如前述般進行線方向（ Y方向）的光量分布之積算處理（步驟S2)。 接下來，前進至步驟S3 ’讀入記憶於記憶部72之基 準光量資料72e與位置建立對應資料72a，於轉換處理部 7 1 b中如前述般進行轉換處理（步驟S4 ) » 接著，判定此畫像的擷取是否是安裝新的燈而首次點 燈時之畫像的擷取（步驟S5)，在該畫像的擷取是安裝 新的燈而首次點燈時之畫像的讀取時，將此資料作爲基準 光量資料，保存於記憶部72 (步驟S 1 2 )，在所定區間時 間後，回到步驟S1。 又，在畫像的擷取不是安裝新的燈而首次點燈時之畫 像的擷取時，利用顯示處理部71d處理以前述轉換處理部 7 1 b轉換處理之照度分布資料，作爲畫像資料而顯示於顯 示部73(步驟S6)。藉此，如前述圖21 (c)所示，顯示 照度分布的變動。 照度變動監視部7 1 c係比較利用前述轉換處理部7 1 b 轉換處理之照度分布的變動資料，與記憶於記憶部72之 -46- 201237560 照度變動臨限値資料72c，判定是否有特定燈的照度變動 (步驟 S 7，S 8 )。 照度變動監視部7 1 c係例如圖22 ( a )所示，在有照 度降低的區域時，判定成爲照度降低之原因的燈是哪個燈 ，並從警報部74輸出警報訊號（步驟S13)。在此例中 ，因爲可知燈L2的照度降低，作爲警報訊號，輸出燈L2 的照度降低之狀況。 作爲警報訊號，輸出前述照度降低訊號，在光軸偏離 的程度爲一定値以上時，光照射裝置的異常結束，或被消 燈。 又，照度變動監視部7 1 c係如前述之圖22 ( b )所示 ，照度分布的谷部產生於特定之第1燈L1與第2燈L2之 間，峰部產生第2燈L2與第3燈L3之間時，判定爲燈 L2的光軸偏離，從警報部74輸出警報訊號（步驟S13) ，光照射裝置的異常結束，或被消燈。 點燈時間監視部7 1 e係如前述般，監視從供電給燈 L 1〜L5的電源部9送來之燈L 1〜L5的積算點燈時間（步 驟S9)。然後，與記憶於記憶部72之燈保障壽命時間資 料72d進行比較，判定積算點燈時間是否到達保障壽命（ 步驟S 1 0 )，判定積算點燈時間到達保障壽命時，則從警 報部74輸出燈交換的警報訊號（步驟S11)。藉此，光 照射裝置的動作結束且消燈。又，積算點燈時間未到達保 障壽命的話，在所定區間時間後回到步驟S 1，重複前述 處理。 -47- 201237560 圖23係揭示本發明第4實施例之光照射裝置的畫像 處理單元的功能區塊圖，圖24係揭示前述畫像處理單元 之處理順序的流程圖。本實施例係以於前述圖1 3、圖14 所示之第2實施例中，在特定燈的照度降低時，增加供給 給該燈之電力而使照度分布回復之方式構成者。 於圖23中，光照射部1的構造與圖13所示者相同， 從放電燈30 (在同圖中將各燈記載爲L1〜L5)放出之光 線，係以橢圓鏡的反射器22反射，作爲平行光而被放出 之光線係以聚光構件40反射，被照射至擴散板55上。以 擴散板5 5擴散反射之光線係藉由內藏於光感測器60之透 鏡單元或針孔板等的成像光學元件65，對應擴散板55上 之照度分布的光量成像於光檢測元件陣列6 1上。 對應以前述光感測器60檢測出之光強度的訊號（光 量），係被送至畫像處理單元7。畫像處理單元7係如前 述般’由處理部71、記憶部72、顯示部73、警報部74等 所構成’於前述記憶部72，儲存有前述位置建立對應資料 72a、轉換比率資料72b、照度變動臨限値資料72c、燈保 障壽命時間資料7 2 d。 處理部71係如前述圖13所示，具備前處理部71a、 轉換處理部71b、照度變動監視部71c、顯示處理部71d、 監視各燈的點燈時間是否到達儲存於記億部72之燈保障 壽命時間資料72d的時間的點燈時間監視部7 1 e。 又’在本實施例中，具備利用前述照度變動監視部 7 1 c檢測出特定燈的照度之降低時，增加該燈的電力之方 -48 - 201237560 式控制的供電控制部7 1 f。 供電控制部7 1 f係如果照度的降低在可進 的範圍的話，則控制對燈之電源部9的電源. PS5內之該燈供給電力的電源單元（例如，在 況爲電源單元PS2)，使電力增加。 再者，在照度的降低不在可進行電力調整 照度變動監視部71c係從警報部74輸出照度 〇 除了具有前述供電控制部7 1 f，本實施例 單元的構造與前述圖13所示者相同，各部的 〇 藉由圖24的流程圖，針對本實施例之處 進行說明。再者，除了以在檢測出特定燈的照 ，使該燈的電力增加之方式控制之處，與圖1 同。 處理部71係擷取藉由光感測器60檢測出 像（步驟S 1 )，利用前處理部7 1 a如前述般進 Y方向）的光量分布之積算處理（步驟S2)。 記億部72讀入轉換比率資料72b、位置建立對 ，於轉換處理部71b中如前述般進行轉換處理 ，S4 ) ° 接下來，以顯示處理部71d處理利用前述 7 1 b轉換處理之照度分布資料，作爲畫像資料 示部73 (步驟S5)。藉此，如前述圖18 ( c) 行電力調整 單元 PS1〜 燈L2之狀 的範圍時， 降低的警報 之畫像處理 動作也相同 理部的處理 度之降低時 4的處理相 i之CCD畫 行線方向（ 接下來，從 應資料72a I (步驟S 3 轉換處理部 ’顯示於顯 所不，顯示 -49- 201237560 照度分布的變動。 照度變動監視部7 1 c係比較利用前述轉換處理部7 1 b 轉換處理之照度分布資料，與記憶於記憶部72之照度變 動臨限値資料72c，判定是否有特定燈的照度變動（步驟 S6，S7 )。 照度變動監視部7 1 c係在有照度降低的區域時，判定 成爲照度降低之原因的燈是哪個燈，判定在可進行電力調 整的範圍之照度降低（步驟S11)。在可利用電力調整來 回復照度降低時，前進至步驟S 1 3，控制供電控制部7 1 f 而調整該燈的電力。 此電力調整係例如以利用光感測器60檢測出之光量 分布成爲所希望之分布之方式回授控制電力量亦可，或者 ，記憶相對於照度降低量的電力調整量，因應照度降低量 而使電力增大亦可。 照度的降低不在可利用電力調整來回復的範圍時，則 從警報部74輸出照度降低的警報訊號（步驟S 1 2 )。作 爲瞥報訊號，輸出前述照度降低訊號時，光照射裝置的異 常結束，或被消燈》 又，點燈時間監視部7 1 e係監視燈L 1〜L5的積算點 燈時間（步驟S 8 )，與記億於記憶部72之燈保障壽命時 間資料72d進行比較，判定積算點燈時間是否到達保障壽 命（步驟S9 )，積算點燈時間到達保障壽命時，則從警 報部74輸出燈交換的警報訊號（步驟S 1 0 )。藉此，光 照射裝置的動作結束且消燈。 -50- 201237560 又*積算點燈時間未到達保障壽命的話，在所定區間 時間後回到步驟S 1，重複前述處理。 圖2 5係揭示本發明第5實施例之光照射裝置的畫像 處理單兀的功能區塊圖’圖26係揭不前述畫像處理單元 之處理順序的流程圖。本實施例係以於前述圖1 9、圖2 0 所示之第3實施例中，在特定燈的照度降低時，增加供給 給該燈之電力而使照度分布回復之方式構成者。 於圖25中，光照射部1的構造與圖13所示者相同， 從放電燈30(在同圖中將各燈記載爲L1〜L5)放出之光 線’係以橢圓鏡的反射器22反射，作爲平行光而被放出 之光線係以聚光構件40反射，被照射至擴散板55上。以 擴散板55擴散反射之光線係藉由內藏於光感測器6〇之透 鏡單元或針孔板等的成像光學元件65，對應擴散板55上 之照度分布的光量成像於光檢測元件陣列6 1上。 對應以前述光感測器60檢測出之光強度的訊號（光 量），係被送至畫像處理單元7。畫像處理單元7係與前 述圖19所示者相同，由處理部71、記憶部72、顯示部73 及警報部7_4等構成。 於前述記憶部72，儲存有位置建立對應資料72a、基 準光量資料72e、照度變動臨限値資料72c、燈保障壽命 時間資料7 2 d。 前述基準光量資料72e係前述般例如於光照射部1安 裝新的放電燈3 0，將使該放電燈3 0首次點燈時所檢測出 之光檢測元件陣列61上的各位置之光量資料，記錄於前 -51 - 201237560 述記億部72者，將此資料作爲基準光量資料來使用。 處理部71係基本上與圖19所示者相同構造，具備前 處理部71a、轉換處理部71b、照度變動監視部71c、顯示 處理部7 1 d、監視是否到達燈保障壽命時間資料7 2 d的點 燈時間監視部7 1 e。 又’在本實施例中’如第4實施例所說明般，具備利 用前述照度變動監視部7 1 c檢測出特定燈的照度之降低時 ，增加該燈的電力之方式控制的供電控制部7 1 f。 供電控制部7 1 f係如果照度的降低在可進行電力調整 的範圍的話，則控制對燈之電源部9的電源單元PS1〜 PS5內之該燈供給電力的電源單元（例如，在燈L2之狀 況爲電源單元P S 2 )，使電力增加。 再者，在照度的降低不在可進行電力調整的範圍時， 照度變動監視部7 1 c係從警報部74輸出照度降低的蒈報 〇 除了具有前述供電控制部7 1 f，本實施例之畫像處理 單元的構造與前述圖19所示者相同，各部的動作也相同 〇 圖26係揭示本實施例的畫像處理單元7之處理順序 的流程圖，一邊參照前述圖25 —邊藉由圖26的流程圖， 說明畫像處理單元之處理。再者，除了以在檢測出特定燈 的照度之降低時，使該燈的電力增加之方式控制之處，與 圖20的處理相同。 處理部71係擷取藉由光感測器60檢測出之CCD畫 -52- 201237560 像（步驟SI)，利用前處理部71a進行光量分布的積算處 理（步驟S2)。 接下來，前進至步驟S3，讀入記憶於記憶部72之基 準光量資料72e與位置建立對應資料72a，於轉換處理部 7lb中如前述般進行轉換處理（步驟S4)。 接下來，判定此畫像的擷取是否是安裝新的燈而首次 點燈時之畫像的擷取（步驟S5)，在該畫像的擷取是安 裝新的燈而首次點燈時之畫像的讀取時，將此資料作爲基 準光量資料，保存於記億部72 (步驟S 1 3 )，在所定區間 時間後，回到步驟S1。 又，在畫像的擷取不是安裝新的燈而首次點燈時之畫 像的擷取時，利用顯示處理部71d處理以前述轉換處理部 71b轉換處理之照度分布資料，作爲畫像資料而顯示於顯 示部73(步驟S6)。藉此，如前述圖21(c)所示，顯示 照度分布的變動。 照度變動監視部7 1 c係比較利用前述轉換處理部7 1 b 轉換處理之照度分布的變動資料，與記憶於記億部72之 照度變動臨限値資料72c，判定是否有特定燈的照度變動 (步驟 S7，S8 )。 照度變動監視部7 1 c係在有照度降低的區域時，判定 成爲照度降低之原因的燈是哪個燈，判定在可進行電力調 整的範圍之照度降低（步驟S14)。在可利用電力調整來 回復照度降低時，前進至步驟S 1 5，控制供電控制部7 1 f 而調整該燈的電力。 -53- 201237560 照度的降低不在可利用電力調整來回復的範圍時，則 從警報部74輸出照度降低的警報訊號（步驟S 1 6 )。作 爲警報訊號，輸出前述照度降低訊號時，光照射裝置的異 常結束，或被消燈。 又，光量變動監視部71c係如前述之圖22(b)所說 明般，在判定爲燈的光軸偏離時（步驟S9 )，從警報部 74輸出瞥報訊號（步驟S 1 7 )，光照射裝置的異常結束， 或被消燈。 點燈時間監視部7 1 e係如前述般，監視從供電給燈 L 1〜L 5的電源部9送來之燈L 1〜L 5的積算點燈時間（步 驟S 1 0 )。然後，與記憶於記憶部72之燈保障壽命時間 資料7 2 d進行比較，判定積算點燈時間是否到達保障壽命 (步驟S 1 1 )’判定積算點燈時間到達保障壽命時，則從 普報部74輸出燈交換的警報訊號（步驟S12)。藉此， 光照射裝置的動作結束且消燈。又，積算點燈時間未到達 保障壽命的話’在所定區間時間後回到步驟S 1，重複前 述處理。 在前述實施例的說明中，針對從光感測器60送來之 光量訊號’進行Y方向（線方向）之光量分布的積算處理 ’針對X方向’顯示照度分布的變動，但是，使用進行此 積算處理之前的資料’不僅X方向的照度分布，也顯示γ 方向的照度分布亦可。 具體來說’將X方向、γ方向的照度分布，例如以如 等高線圖之方式來顯示。如此顯示照度分布的話，因爲一 -54- 201237560 眼就可看出整體的狀態，易於確認異常。 又，在前述說明中，作爲光檢測元件陣列6 1，已針對 使用2維區域感測器之狀況進行說明，但是，也可使用前 述圖5所示之線感測器。 作爲光檢測元件陣列6 1使用線感測器時，於前述實 施例的流程圖中，不需要步驟S2的線方向之積分的處理 ，但是，其他處理與前述實施例所說明者相同。 又，在前述實施例中，已針對於照射區域置放擴散板 之狀況進行說明，但是，於螢光板中，使用發明之可視光 之光線亦可，不置放擴散板等而測定來自遮罩的散亂光亦 可。進而，如前述圖1 1所說明般，作爲聚光構件40，使 用冷光鏡，檢測出透射聚光構件40，被照射物的處理不需 要之可視光或紅外光的擴散散亂光，藉此，取得光照射區 域之照度分布亦可。 測定來自遮罩的散亂光時，因場所而反射率變低，測 定精度降低，但是，可一邊進行曝光一邊即時測定。又， 作爲聚光構件，在使用冷光鏡，藉由檢測出透射聚光構件 之可視光或紅外光的擴散散亂光而取得光到達區域之照度 分布時，同樣地也可一邊進行曝光一邊即時測定。 【圖式簡單說明】 〔圖1〕揭示本發明實施例的光照射裝置之槪略構造 的圖。 〔圖2〕揭示以A-A線切斷圖1所示之光照射部的側 -55- 201237560 面剖面圖。 . 〔圖3〕從聚光構件的背面側觀看圖1所示之光照射 部的圖。 〔圖4〕沿著發光管之管軸的剖面圖。 〔圖5〕揭示擴散板上之測定處與線感測器之受像處 的關係的觀念圖。 〔圖6〕揭示特定燈的照度降低時之照度變動的圖。 〔圖7〕揭示特定燈的光軸偏離時之照度變動的圖。 〔圖8〕揭示設置兩個光感測器時之構造例的圖。 〔圖9〕揭示擴散板上之測定處與2維區域感測器之 受像處的關係的觀念圖。 〔圖1 〇〕揭示本發明光照射裝置的其他例之構造槪略 的側面剖面圖。 〔圖11〕於聚光構件背面側設置擴散板，檢測出透射 聚光構件之光線的構造例。 〔圖1 2〕從聚光構件背面側觀看本發明光照射裝置的 其他例之槪略構造的圖。 〔圖1 3〕本發明第2實施例之畫像處理單元的功能區 塊圖。 〔圖14〕揭示本發明第2實施例的畫像處理單元之處 理順序的流程圖。 〔圖1 5〕說明光檢測元件陣列的各檢測元件之像素位 置與照射區域位置的對應關係之一例的圖。 〔圖16〕揭示轉換比率資料（修正係數）之一例的圖 -56- 201237560 〔圖1 7〕揭示藉由光檢測元件陣列所檢測出之光量分 布與藉由前述轉換比率資料所轉換後之照度分布的圖。 〔圖18〕說明第2實施例之轉換處理的圖。 〔圖19〕本發明第3實施例之畫像處理單元的功能區 塊圖。 〔圖20〕揭示本發明第3實施例的畫像處理單元之處 理順序的流程圖。 〔圖21〕說明第3實施例之轉換處理的圖。 〔圖22〕揭示特定燈的照度降低時之照度維持率的圖 〇 〔圖23〕本發明第4實施例之畫像處理單元的功能區 塊圖。 〔圖24〕揭示本發明第4實施例的畫像處理單元之處 理順序的流程圖。 〔圖25〕本發明第5實施例之畫像處理單元的功能區 塊圖。 〔圖26〕揭示本發明第5實施例的畫像處理單元之處 理順序的流程圖。 〔圖27〕揭示先前的光照射裝置之—例的槪略圖。 〔圖28〕揭示先前的光照射裝置之其他例的槪略圖。 【主要元件符號說明】 1 :光照射部 -57- 201237560 7 :畫像處理單元 9 :電源部 1 0 :光射出部 1 1 :燈室 12A :光射出用開口 12B:擴散光射入用開口 1 3 :窗板構件 2 0 :光源元件列 21 :光源元件 22 :反射器 C :光軸 F :焦點 2 3 :光反射面 3 0 :放電燈 S :放電空間 31 :發光管 3 2 :發光部 3 3 :封止部 3 5 :電極 36 :金屬箔 3 7 :外部導線 40 :聚光構件 L :光軸 40A :聚光構件 -58 201237560 4 1 :光反射面 45 :遮罩 5 0 :搬送手段 51 :滾筒 W :被照射物 5 5 :擴散板 5 5 A :光擴散面 LA :光照射區域 5 6 :擴散板 60 :光感測器 6 0 1 :受光面 60A :第1光感測器 60B :第2光感測器 6 1 :光檢測元件陣列 65 :成像光學元件 66 :成像透鏡 7 1 :處理部 7 1 a :前處理部 7 1 b :轉換處理部 7 1 c :照度變動監視部 7 1 d :顯示處理部 7 1 e :點燈時間監視部 7 1 f :供電控制部 72 :記憶部 -59 201237560 72a :位置建立對應資料 72b :轉換比率資料 72c :照度變動臨限値資料 72d :燈保障壽命時間資料 72e :基準光量資料 7 3 :顯示部 74 :警報部 1 0 0 :光源部 1 〇 1 :光源單元 1 0 1 - a :放電燈 1 〇 1 - b :反射鏡 102 :積光器 1 〇 3 :折射反射鏡 1 0 3 - a ·透光部 1 04 :曝光面 105 :點燈電源 105- a :燈控制部 106- a :控制手段 106-b :記憶手段 106-c :照度檢測手段 107 :照度測定裝置 108 :顯示裝置 1 1 1 :照明光學系 1 1 Ι-a :照明系單元 -60 201237560 1 1 2 :照明性能調整器 1 1 3 :遮罩 1 1 4 :投影光學系 114-a:投影系單兀 1 1 5 :光感測器 1 16 :基板 1 17 : XYZ 平台 1 1 8 :控制器In the monitoring operation of the lighting state of the lamp 30, the light irradiation treatment for the object W is performed. Therefore, when an abnormality of any of the discharge lamps is detected, the measures for stopping the production line and exchanging the discharge lamp can be quickly taken. Further, the imaging optical element used in the light irradiation device of the present invention is not limited to the pinhole plate, and the light intensity distribution of the light reaching region by the projection light emitting portion can be used on the photodetecting element array. For example, a lens such as a camera lens may be used. Further, the light emitting portion is configured to extend the electrode center point of the discharge lamp of the light source element in which one or more light source element rows in the X direction are connected to each other, and the other light source element row closest to the light source element The straight line of the electrode center point of the discharge lamp of the light source element may be arranged so as to be oblique to the straight line extending in the X direction. Next, an embodiment of an image processing unit that monitors variations in the illuminance distribution of the illumination area for the light irradiation device applied to the above configuration will be described. Fig. 13 is a functional block diagram showing an image processing unit of the light irradiation device according to the second embodiment of the present invention, and Fig. 14 is a flowchart showing the processing procedure of the image processing unit. In Fig. 13, as described above, the light emitted from the discharge lamp 30 (indicated by the respective lamps as L 1 to L5 in the same figure) is reflected by the reflector 22 of the elliptical mirror, and is emitted as parallel rays. -34- 201237560 This parallel light is reflected by the condensing member 40, and is irradiated onto the diffusing plate 55 (the portion of the region where the illuminating light is applied to the hatching portion), and is diffused and reflected by the diffusing plate 55. The light diffused and reflected by the diffusion plate 55 (described as SL1 to SL5 in each of the lamps in FIG. 13) is diffused by the imaging optical element 65 incorporated in the lens unit or the pinhole plate of the photo sensor 60, and the like. Light rays of the illuminance distribution on the plate 55 are imaged on the photodetecting element array 61. Further, as the photodetecting element array 161, a 2-dimensional area sensor (CCD) or a line sensor can be used as described above, but in the following embodiments, a 2-dimensional area sensor is used. The situation is explained. The signal corresponding to the amount of light detected by the photo sensor 60 is sent to the image processing unit 7. As shown in Fig. 13, the image processing unit 7 is composed of a processing unit 71, a video unit 72, a display unit 73, an alarm unit 74, and the like. In the above-mentioned section, the storage unit is configured to establish a corresponding data in a position corresponding to each position of the light irradiation area in which the light emitted from the light source element 21 is irradiated with the light amount corresponding to the light detected by the light sensor 60. 72a light 2b is the material of the 7th, the capital of the material is 2, the time is 7, the rate is changed, the ratio is changed, the life is converted, the obstacle is changed, the limit is fixed, the light is turned, the number is changed, and the time is changed. The change point of the lamp is the upper limit of the illuminance of the segment. The position of the hand is limited. The position of the light is changed. The light of the variable is used to indicate the use of the field. In the first embodiment, the light amount distribution signal from the photo sensor 60 is used to calculate the light amount distribution in the Y direction (line direction) (the light intensity of Dk1 to Dkm (k=l to η) in FIG. 9). The pre-processing-35-201237560 processing unit 7 1 a, and the corresponding data 72a and the conversion ratio data 72b are established based on the position stored in the memory unit 72, and the light detecting element array 6 1 of the photo sensor 60 is disposed. Each position and each position of the light irradiation region where the light emitted from the light source element is irradiated Li corresponding to the light amount of each position and the light detector means, converting each position of illumination is a light irradiation area of the signal variation of the conversion processing section 71b. Further, the illuminance variation at each position of the light irradiation region converted by the conversion processing unit 71b is compared with the illuminance variation threshold data 7 2 c stored in the storage unit 72, and the illuminance is monitored. The illuminance change monitoring unit 71c that outputs the alarm signal is provided in the alarm unit 74, and further includes a display processing unit 71d' and a process for displaying the illuminance at each position of the light irradiation region converted by the conversion processing unit 71b on the display unit 73. The lamp lighting signal "from the power supply unit 9" monitors whether or not the lighting time of each lamp has reached the lighting time monitoring unit 7 1 e stored in the lamp life time data 72d of the storage unit 72. Here, the conversion processing of the conversion processing unit 71b will be described. In the conversion processing, (1) each position of the light amount detecting means and the light irradiation area where the light emitted from the light source element is irradiated is performed. (2) A process of converting the light amount at each position on the photodetecting element array 6 J into a signal indicating the illuminance variation of each position of the light irradiation region. Hereinafter, the above (1) and (2) processes will be described in more detail. (1) A process of establishing correspondence between each position on the photodetection element array and each of the illumination areas. In the memory unit 72, each position on the position-creating correspondence data element array 61 is stored, and each position of the light irradiation area irradiated from the light source element is associated with the reference data 72a. For this reason, if the position of the light detecting element array 61 corresponding to the light irradiation region is not known, the illuminance distribution of the positive region cannot be obtained. For example, the orientation of the photodetecting element array 61 is slightly newer where the pixel position on each detecting element (CCD) is in the corresponding field (corresponding to the irradiation position of which lamp). The relationship between the pixel position of each detection element (CCD) and the illumination pattern (primary function) does not clearly determine the actual position even if the scale (the position corresponding to the Y-axis (irradiation area) is not determined as indicated by the oblique bird. In other words, the position of the array 61 is not reduced by which lamp is irradiated, and when the illuminance is adjusted, the feedback (power adjustment) cannot be determined. Further, as shown in FIG. In the case where a plurality of light-rich areas are overlapped, the overlapping portion specifically corresponds to which one is used, and the total illuminance distribution is obtained by the amount of light detected by the plurality of photo sensors. For the above reasons, the photosensor 60 array 61 is provided. Each position is determined such that each position corresponding to the position of the light emitted from the light source element 72a and the light detecting member is determined to be a measurement of the light irradiation deviation, and the position of the area where the more accurate irradiation area is not output is the line _), such as The parameter of the intercept of Fig. 15 knows the light detecting element, the illuminance sensor of which lamp the lamp is illuminated, the data whose illumination position is not clear, and the light detecting element The light is illuminated the position of the irradiation area -37- of each light emitted 201237560 establishing correspondence information corresponding to the position 72a preferably. Furthermore, it is also conceivable to measure the illuminance distribution at the time of shipment of the device, and to associate the position on the photodetecting element array 61 with the discharge lamp 30, not necessarily on the photodetecting element array 61. Correspondence information between the position and the position of the illumination area is also possible. (2) A process of converting the amount of light at each position on the light amount detecting means into a signal indicating the illuminance variation of each position of the light irradiation region. As described above, the light incident on the photodetecting element array 61 is not a factor that accurately reflects the illuminance distribution of the light irradiation region depending on the factors such as the incident angle of the light and the scattered characteristics of the diffusing plate 55. For example, Compared with the diffused scattered light from the front surface of the photodetecting element array, the diffused scattered light system incident from the oblique direction is a lower amount of light even if it is scattered light of the same intensity. That is, the intensity of the scattered light of the diffuser plate 5 is different from the angle of incidence of the light detecting element array 61 due to the difference in the angle of the image of the scattered angle, and even if the same amount of light is included, the change of the measured flaw is included. The effect caused by the law of cosine. Fig. 16 is a view showing an example of the correction coefficient of the conversion ratio data 72b. The incident angle 0 of the photodetecting element array 61 is approximately a coefficient close to cos 02, and indicates a correction coefficient when the effect of the cosine law is large. In order to determine the correction factor, for example, the illuminance distribution of the correct -38 to 201237560 is measured using a light receiver or the like on the mask or the workpiece surface under the irradiation conditions of the light irradiation device, and the obtained light detecting element array is obtained and obtained. The ratio of the output signal of 61 is a method of creating a table of correction coefficients. The measurement system is performed discretely, for example, and the enthalpy between the measurement points is obtained by performing interpolation processing. Alternatively, a method of arranging a uniform light source condition by setting a light source of a rod-shaped lamp having a sufficient length and obtaining a correction coefficient may be employed. FIG. 1 is a diagram showing the distribution of the light amount detected by the photodetecting element array 61 and the illuminance distribution (corresponding to the illuminance distribution of the light irradiation region) after the conversion ratio data is converted. The axis system indicates the position in the longitudinal direction of the lamp array (the position on the light irradiation region on the front surface of each lamp), and L1 to L11 correspond to the peak position of the illuminance distribution of each of the lamps L1 to L11. . Further, the vertical axis illuminance (relative to 値), by the above-described conversion processing, the light amount distribution A detected by the photodetecting element array 61 shown by the dotted line in the same figure is as shown by the solid line of the figure. The illuminance distribution B is corrected as usual. Fig. 18 is a view for explaining the above-described conversion processing of the present embodiment, and Fig. 18(a) shows the light amount data (A) (light amount distribution data) detected by the photodetecting element array 61. In this example, in the area surrounded by the circle of the same figure, the situation in which the illuminance is lowered due to the decrease in the illuminance of the lamp or the like is revealed. Further, Fig. 18(b) discloses the conversion ratio data (B) shown in Fig. 16 described above. For example, the light amount data (A) is divided by the conversion ratio data (B) by the operation (A)/( B) Come on. Thereby, as shown in FIG. 18(c), the signal of the illuminance distribution corresponding to the light irradiation region can be obtained. 0-39-201237560. By performing such conversion processing, the position of the lamp in the longitudinal direction can be obtained (the aforementioned X direction). The position of the illuminance is the same, and the part with reduced illuminance can be grasped immediately. Fig. 14 is a flowchart showing the processing of the image processing unit 7, and the processing of the image processing unit will be described with reference to Fig. 13 through the flowchart of Fig. 14. The processing unit 71 captures the CCD image detected by the photo sensor 60 (step S1), and performs the integration process of the light amount distribution in the line direction (Y direction) by the preprocessing unit 7 1 a as described above (step S2). ). Next, the conversion ratio data 72b and the position creation corresponding data 72a' are read from the g memory unit 72, and the conversion processing unit 7 1 b performs the conversion processing as described above (steps s 3 and S4). Next, the illuminance distribution data processed by the conversion processing unit 7 1 b is processed by the display processing unit 71d, and displayed as image data on the display unit 73 (step Μ). Thereby, as shown in the above Fig. 18 (c), the variation of the illuminance distribution is displayed. The illuminance change monitoring unit 7 1 c compares the illuminance distribution data converted by the conversion processing unit 7 1 b and the illuminance variation threshold data 7 2 c ' stored in the storage unit 72 to determine whether or not there is a illuminance variation of the specific lamp ( Steps S6 and S7) A diagram showing the illuminance variation when the illuminance of a part of the lamp is lowered, and the horizontal axis of the same figure indicates the position in the longitudinal direction of the lamp array (the position on the light irradiation area on the front side of each lamp) L1, L2, and L3 correspond to the peak position of the illuminance distribution of each of the lamps L1 to L4. Further, the vertical axis illuminance (relative to -40 to 201237560 値), A indicates the detected light amount distribution data, B indicates the illuminance threshold 値, and C indicates the light source elements 21 provided in the light source element array 20 Each of the discharge lamps L1 to L4. As shown in FIG. 6, the illuminance fluctuation monitoring unit 7 1 c compares the illuminance distribution A and the illuminance threshold 値B of the converted process, and as shown by the broken line in the figure, when the illuminance is lowered to a region lower than the illuminance threshold 値B It is determined which lamp is the cause of the decrease in illuminance, and an alarm signal is output from the alarm unit 74 (step S1 1 ). In this example, since it is known that the illuminance of the lamp L2 is lowered, the illuminance of the output lamp L2 is lowered as an alarm signal. When the illumination reduction signal is output as the alarm signal, the light irradiation device is abnormally terminated or is extinguished. The lighting time monitoring unit 7 1 e monitors the integrated lighting time of the lamps L1 to L5 sent from the power supply unit 9 of the power supply lamps L 1 to L5 (step S 8 ). Then, comparing with the lamp support life time of the lamp life time data 72d, it is determined whether the integrated lighting time reaches the guaranteed life (step S9), and when it is determined that the integrated lighting time reaches the guaranteed life, it is output from the alarm unit 74. The lamp exchanged alarm signal (step S10). Thereby, the operation of the light irradiation device is completed and the lamp is extinguished. Further, if the accumulated lighting time does not reach the guaranteed life, the process returns to step s 1 after the predetermined interval time, and the above processing is repeated. Fig. 19 is a functional block diagram showing an image processing unit of the light irradiation device according to the third embodiment of the present invention, and Fig. 20 is a flow chart showing the processing procedure of the image processing unit. In Fig. 19, the structure of the light-irradiating portion 1 is the same as that shown in Fig. 13. -41 - 201237560 The light emitted from the discharge lamp 30 (in the same figure, each lamp is described as L1 to L5) is an ellipse. The reflector 22 of the mirror is reflected, and the light emitted as the parallel light is reflected by the condensing member 40, and is irradiated onto the diffusion plate 55. The light diffused and reflected by the diffusion plate 55 is imaged by the imaging optical element 65 embedded in the lens unit or the pinhole plate of the photo sensor 60, and the intensity of the light corresponding to the illuminance distribution on the diffusion plate 55 is imaged in the light detection. The signal (light amount) corresponding to the light intensity detected by the photo sensor 60 is sent to the image processing unit 7 on the element array 61. The image processing unit 7 is the same as the one shown in Fig. 13 described above, and is composed of a processing unit 71, a storage unit 72, a display unit 73, an alarm unit 74, and the like. In the above-described information, the position information 72a is stored in a state in which the light amount is associated with each position of the light irradiation region, and the illuminance of each of the discharge lamps 30 in the light irradiation unit 1 is not lowered. The position of each position on the photodetecting element array 61 detected by the photodetecting element array 61 is the reference light amount data 72e of the light amount data, the illuminance variation threshold 値 information 72c indicating the illuminance variation limit, and the corresponding securable lamp. The lamp life time data 72d used to calculate the lighting time. The reference light amount data 72e is, for example, a new discharge lamp 30 is attached to the light irradiation unit 1, and the light amount data of each position on the light detecting element array 61 detected when the discharge lamp 30 is first turned on is recorded. In the memory unit 72, this data is used as reference light amount data. The processing unit 71 is basically the same as the one shown in FIG. 13 and includes a preprocessing unit 71a that performs preprocessing such as integration processing on the light amount signal sent from the photo sensor 60 as described above, and The position of the memory unit 72-42-201237560 establishes the correspondence data 72a and the reference light amount data 72e, and the respective positions on the photodetecting element array 61 of the photo sensor 60 and the light emitted from the light source element are irradiated. Corresponding to each position of the light-irradiated area, the amount of light at each position on the light-quantity detecting means is converted into a conversion processing unit 71b° indicating a signal of illuminance variation at each position of the light-irradiated area, and The illuminance variation of each position of the light-irradiated area converted by the conversion processing unit 71b, and the illuminance variation threshold data 72c stored in the storage unit 72, etc., monitor whether or not the illuminance fluctuates, and output an illuminance fluctuation monitoring of the alarm signal from the alarm unit 74. The portion 7 ic further includes a process of displaying the illuminance at each position of the light irradiation region converted by the conversion processing unit 71b on the display unit 73. The display processing unit 71d monitors whether or not the lighting time of each of the lamps reaches the lamp security life time data 72d stored in the storage unit 72 in accordance with the lamp lighting signal sent from the power supply unit 9. e. In the present embodiment, the conversion processing of the conversion processing unit 71b is performed by (1) establishing each position of the light amount detecting means and each position of the light irradiation area to which the light emitted from the light source element is irradiated. Corresponding processing, (2) processing for converting the light amount at each position on the photodetecting element array 61 to a signal indicating the illuminance variation of each position of the light irradiation region, but the processing of (2) and the foregoing 2 different embodiments. As described above, the processing of the position (1) is performed by using the position-creating correspondence data 72a to perform each position on the photodetecting element array 61 and the position of each of the light irradiation regions irradiated with the light emitted from the light source element. -43- 201237560 should be. Further, as described above, the relationship between the position on the photodetecting element array 61 and the lamp may be associated. The processing of the above (2) is converted as described below in the present embodiment. FIG. 21 is a view for explaining the above-described conversion processing of the present embodiment, and FIG. 21 (a) discloses that the light detecting element array 61 detects Light quantity data (A) (light intensity distribution data). In this example, in the region surrounded by the circle of the same figure, the situation in which the amount of light is lowered due to the decrease in the illuminance of the lamp or the like is revealed. Further, Fig. 21(b) discloses the reference light amount data (B). The reference light amount data is as described above, and a new discharge lamp 3 〇' is mounted to make each position on the photodetecting element array 61 detected by the photodetecting element array 61 when the discharge lamp 30 is first turned on. The amount of light is stored in the memory unit 72 as the reference data. The conversion processing of the present embodiment is performed by, for example, dividing the light amount data (A) by the reference light amount data (B) by the calculation (A) / (B). As a result, as shown in FIG. 21(c), the illuminance distribution of the light irradiation region when the discharge lamp is first turned on is obtained, and the signal indicating which level of the light amount is lowered, that is, the ratio of the decrease in the amount of light is obtained. The signal (hereinafter, this signal is called the illuminance maintenance rate). In the same figure, the part of the additional circle is reduced in illumination. By the conversion processing, in the position in the longitudinal direction of the lamp array (the position in the X direction), it is possible to immediately grasp the degree of illuminance reduction compared to the time point at which the reference light amount data is measured. Fig. 22 is a view showing a variation of the illuminance maintenance rate (ratio of the decrease in illuminance - 44 - 201237560) (simulation result). Fig. 2 2 (a) reveals a situation in which the illuminance of a specific lamp is lowered, and Fig. 22 (b) Reveal the condition of the optical axis deviation of a particular lamp. Furthermore, the horizontal axis of the same figure reveals the position of the lamp in the longitudinal direction (the position on the light-irradiated area on the front side of each lamp), and L1, L2, and L3 correspond to the peak of the illuminance distribution of each of the lamps L1 to L4.値 Location. The vertical axis reveals the illuminance maintenance rate and the illuminance (relative 値), and the A system reveals the illuminance maintenance rate data. The solid line reveals that the illuminance is lower than the initial 値, and the situation is reduced to 0.9, and the dotted line reveals the illuminance. At the initial 値, it is reduced to 0. Further, C is an illuminance caused by each of the discharge lamps L1 to L4 of each of the light source elements 21 of the light source element array 20. As shown in Fig. 22 (a), when the illuminance of the specific lamp is lowered, the illuminance maintenance rate data A obtained by the above-described conversion is lowered at the position of the lamp corresponding to the illuminance reduction (in this example, the position corresponding to the lamp L2). Thereby, it is possible to grasp which lamp has reduced illumination. Further, when the optical axis of the specific lamp (in this example, the lamp L2) is inclined, as shown in Fig. 22 (b), the illuminance maintenance rate data fluctuates. That is, when the illuminance of a particular lamp is lowered, as shown in Fig. 22 (a), the light amount maintenance rate corresponding to the position of the center is lowered, but when the optical axis of the lamp is deviated, the amount of light from the adjacent lamp is The degree of overlap changes. 'The valley and the peak appear in a connected form. - In particular, the peak position of the valley and the peak will occur at a different deviation from the front of the center of the lamp. For example, it can be seen that the valley portion of the illuminance distribution is generated between L1 and L2, and the peak portion is generated between L2 and L3. As described above, in the case where the illuminance of the specific lamp is lowered and the inclination of the optical axis is -45 - 201237560, the illuminance maintenance rate is different from the state of change, and it can be judged that the illuminance of the lamp is lowered or the optical axis is inclined. Fig. 20 is a flowchart showing the processing procedure of the image processing unit 7. The processing of the image processing unit will be described with reference to the flowchart of Fig. 20 with reference to Fig. 19 described above. Further, the processing of the present embodiment is only the conversion processing which is different from the flowchart of Fig. 14, and the other processing is basically the same as that of Fig. 14. The processing unit 71 captures the CCD image detected by the photo sensor 60 (step S1), and performs the integration process of the light amount distribution in the line direction (Y direction) by the preprocessing unit 7 1 a as described above (step S2). ). Next, the process proceeds to step S3', and the reference light amount data 72e and the position establishment corresponding data 72a stored in the memory unit 72 are read, and conversion processing is performed in the conversion processing unit 71b as described above (step S4). Is the image captured in the first time when the new lamp is installed (step S5), and the image is captured when the new lamp is installed and the image is read for the first time. The data is stored in the storage unit 72 as the reference light amount data (step S 1 2 ), and after a predetermined interval time, the process returns to step S1. In addition, when the image is captured by the image processing unit 71d, the illuminance distribution data converted by the conversion processing unit 7 1 b is processed by the display processing unit 71d to display the image as the image data. The display unit 73 (step S6). Thereby, as shown in the above-mentioned Fig. 21 (c), the fluctuation of the illuminance distribution is displayed. The illuminance change monitoring unit 7 1 c compares the fluctuation data of the illuminance distribution by the conversion processing unit 7 1 b conversion processing, and the 460 illuminance variation threshold data 72c stored in the storage unit 72 to determine whether or not there is a specific lamp. The illuminance change (step S 7, S 8 ). For example, as shown in Fig. 22 (a), when the illuminance is reduced, the illuminance change monitoring unit 7 1 c determines which lamp is the cause of the decrease in illuminance, and outputs an alarm signal from the alarm unit 74 (step S13). In this example, since it is known that the illuminance of the lamp L2 is lowered, the illuminance of the output lamp L2 is lowered as an alarm signal. As the alarm signal, the illuminance reduction signal is output, and when the degree of deviation of the optical axis is equal to or greater than 値, the light irradiation device is abnormally terminated or is extinguished. Further, as shown in FIG. 22(b), the illuminance fluctuation monitoring unit 7 1 c generates a valley portion of the illuminance distribution between the specific first lamp L1 and the second lamp L2, and generates a second lamp L2 at the peak portion. When the third lamp L3 is in between, it is determined that the optical axis of the lamp L2 is shifted, and an alarm signal is output from the alarm unit 74 (step S13), and the light irradiation device is abnormally terminated or is extinguished. As described above, the lighting time monitoring unit 7 1 e monitors the integrated lighting time of the lamps L 1 to L5 sent from the power supply unit 9 that supplies the lamps L 1 to L5 (step S9). Then, comparing with the lamp life time data 72d stored in the memory unit 72, determining whether or not the integrated lighting time has reached the guaranteed life (step S1 0), and determining that the integrated lighting time reaches the guaranteed life, the alarm unit 74 outputs The lamp exchanged alarm signal (step S11). Thereby, the operation of the light irradiation device is completed and the lamp is extinguished. When the accumulated lighting time has not reached the guaranteed life, the process returns to step S1 after the predetermined interval time, and the above processing is repeated. -47-201237560 Fig. 23 is a functional block diagram showing an image processing unit of the light irradiation device according to the fourth embodiment of the present invention, and Fig. 24 is a flowchart showing the processing procedure of the image processing unit. In the second embodiment shown in Figs. 13 and 14, in the present embodiment, when the illuminance of the specific lamp is lowered, the electric power supplied to the lamp is increased to restore the illuminance distribution. In Fig. 23, the structure of the light-irradiating portion 1 is the same as that shown in Fig. 13, and the light emitted from the discharge lamp 30 (indicated by the respective lamps in the same figure as L1 to L5) is reflected by the reflector 22 of the elliptical mirror. The light emitted as the parallel light is reflected by the condensing member 40 and is irradiated onto the diffusion plate 55. The light diffused and reflected by the diffusion plate 55 is imaged by the imaging optical element 65 embedded in the lens unit or the pinhole plate of the photo sensor 60, and the light amount corresponding to the illuminance distribution on the diffusion plate 55 is imaged on the photodetecting element array. 6 1 on. The signal (light amount) corresponding to the light intensity detected by the photo sensor 60 is sent to the image processing unit 7. The image processing unit 7 is configured by the processing unit 71, the storage unit 72, the display unit 73, the alarm unit 74, and the like as described above. The storage unit 72 stores the position establishment correspondence data 72a, the conversion ratio data 72b, and the illuminance. Change threshold 値 data 72c, lamp support life time data 7 2 d. As shown in FIG. 13, the processing unit 71 includes a preprocessing unit 71a, a conversion processing unit 71b, an illuminance variation monitoring unit 71c, and a display processing unit 71d, and monitors whether or not the lighting time of each lamp reaches the lamp stored in the cell phone 72. The lighting time monitoring unit 7 1 e that guarantees the time of the life time data 72d. Further, in the present embodiment, when the illuminance fluctuation monitoring unit 7 1 c detects the decrease in the illuminance of the specific lamp, the power supply control unit 7 1 f of the type control is added. The power supply control unit 7 1 f controls the power supply to the power supply unit 9 of the lamp if the decrease in illuminance is within the allowable range.  The power supply unit (for example, the power supply unit PS2) to which the lamp is supplied with power in the PS5 increases the power. In addition, the illuminance is not reduced, and the illuminance is not output from the alarm unit 74. The configuration of the unit of the present embodiment is the same as that shown in FIG. The details of each embodiment will be described with reference to the flowchart of FIG. Furthermore, it is the same as FIG. 1 except that the electric power of the lamp is controlled in such a manner as to detect the illumination of the specific lamp. The processing unit 71 captures the integrated processing of the light amount distribution by the photo sensor 60 (step S1) and the Y-direction of the pre-processing unit 7 1 a as described above (step S2). In the conversion processing unit 71b, the conversion processing unit 71b performs conversion processing as described above, and S4) follows. Next, the display processing unit 71d processes the illuminance distribution using the above-described 7 1 b conversion processing. The data is used as the image data display unit 73 (step S5). As a result, when the range of the electric power adjustment unit PS1 to the light L2 is as shown in Fig. 18(c), the image processing operation of the reduced alarm is also the same as the processing degree of the same processing unit. In the line direction (the following is the data 72a I (the step S 3 conversion processing unit is displayed in the display), and the change in the illuminance distribution is displayed in the -49-201237560. The illuminance variation monitoring unit 7 1 c compares and uses the conversion processing unit 7 1 b The illuminance distribution data of the conversion processing and the illuminance variation threshold data 72c stored in the memory unit 72 determine whether or not there is a illuminance variation of the specific lamp (steps S6, S7). The illuminance variation monitoring unit 7 1 c is illuminating. In the case of the reduced area, it is determined which lamp is the cause of the decrease in illuminance, and it is determined that the illuminance in the range in which the electric power can be adjusted is lowered (step S11). When the illuminance is restored by the available electric power adjustment, the process proceeds to step S1 3 . The power supply control unit 7 1 f controls the power of the lamp. This power adjustment is, for example, feedback control in such a manner that the light quantity distribution detected by the photo sensor 60 becomes a desired distribution. The power may be adjusted, or the amount of power adjustment with respect to the amount of illuminance reduction may be increased in accordance with the amount of illuminance reduction. When the decrease in illuminance is not within the range in which the power adjustment is available, the illuminance is output from the alarm unit 74. a reduced alarm signal (step S 1 2 ). When the illumination reduction signal is output as the signal, the light irradiation device is abnormally terminated or is extinguished. Further, the lighting time monitoring unit 7 1 e is a monitoring lamp L 1 The accumulated lighting time of the L5 (step S8) is compared with the lamp life time data 72d of the memory unit 72, and it is determined whether or not the integrated lighting time reaches the guaranteed life (step S9), and the integrated lighting time reaches the guarantee. At the time of the life, the warning signal of the lamp exchange is output from the alarm unit 74 (step S1 0). Thereby, the operation of the light irradiation device is completed and the lamp is extinguished. -50- 201237560 In addition, if the accumulated lighting time does not reach the guaranteed life, After the predetermined interval time, the process returns to step S1, and the above-described process is repeated. Fig. 2 is a functional block diagram showing the image processing unit of the light irradiation device according to the fifth embodiment of the present invention. The flow chart of the processing sequence of the image processing unit is not disclosed. In the third embodiment shown in the above-mentioned FIG. 19 and FIG. 20, when the illuminance of the specific lamp is lowered, the supply to the lamp is increased. In the case of electric power, the illuminance distribution is restored. In Fig. 25, the structure of the light irradiation unit 1 is the same as that shown in Fig. 13, and is discharged from the discharge lamp 30 (in the same figure, each lamp is described as L1 to L5). The light ray is reflected by the reflector 22 of the elliptical mirror, and the light emitted as the parallel light is reflected by the condensing member 40 and is irradiated onto the diffusing plate 55. The light diffused and reflected by the diffusing plate 55 is built in The imaging optical element 65 such as a lens unit or a pinhole plate of the photo sensor 6 is formed on the photodetecting element array 61 by the amount of light corresponding to the illuminance distribution on the diffusing plate 55. The signal (light amount) corresponding to the light intensity detected by the photo sensor 60 is sent to the image processing unit 7. The image processing unit 7 is the same as the one shown in Fig. 19 described above, and is composed of a processing unit 71, a storage unit 72, a display unit 73, an alarm unit 7_4, and the like. The memory unit 72 stores location setting correspondence data 72a, reference light amount data 72e, illuminance variation threshold data 72c, and lamp security life time data 72 d. In the above-described reference light amount data 72e, for example, a new discharge lamp 30 is attached to the light irradiation unit 1, and the light amount data of each position on the photodetecting element array 61 detected when the discharge lamp 30 is first turned on is used. Recorded in the previous -51 - 201237560, the description of 72 people in the Department of Information, the use of this data as reference light data. The processing unit 71 basically has the same structure as that shown in FIG. 19, and includes a preprocessing unit 71a, a conversion processing unit 71b, an illuminance variation monitoring unit 71c, a display processing unit 71d, and whether or not the monitor reaches the lamp life time data 7 2d. The lighting time monitoring unit 7 1 e. In the present embodiment, as described in the fourth embodiment, the power supply control unit 7 that controls the increase in the illuminance of the specific lamp when the illuminance fluctuation monitoring unit 7 1 c detects the decrease in the illuminance of the lamp is provided. 1 f. The power supply control unit 7 1 f controls the power supply unit that supplies electric power to the lamps in the power supply units PS1 to PS5 of the power supply unit 9 of the lamp when the illuminance is reduced within a range in which the electric power can be adjusted (for example, at the lamp L2) The condition is the power supply unit PS 2 ), which increases the power. In addition, when the illuminance reduction is not in the range in which the power adjustment is possible, the illuminance fluctuation monitoring unit 7 1 c outputs the illuminance reduction report from the alarm unit 74, and the image of the present embodiment is provided in addition to the power supply control unit 71 f. The configuration of the processing unit is the same as that of the above-described FIG. 19, and the operations of the respective units are also the same. FIG. 26 is a flowchart showing the processing procedure of the image processing unit 7 of the present embodiment, with reference to FIG. 25 described above. Flowchart, explaining the processing of the image processing unit. Further, the control is the same as the processing of Fig. 20 except that the electric power of the lamp is controlled to increase when the illuminance of the specific lamp is lowered. The processing unit 71 captures the CCD image-52-201237560 image detected by the photo sensor 60 (step S1), and performs pre-processing unit 71a to integrate the light amount distribution (step S2). Next, the process proceeds to step S3, and the reference light amount data 72e and the position establishment corresponding data 72a stored in the memory unit 72 are read, and conversion processing is performed in the conversion processing unit 7lb as described above (step S4). Next, it is determined whether or not the extraction of the image is the capture of the image when the first lamp is installed (step S5), and the image capture is performed by installing a new lamp and lighting the image for the first time. In the case of taking the time, the data is stored as the reference light amount data in the 100 million portion 72 (step S 13 3 ), and after the predetermined interval time, the process returns to step S1. In addition, when the image is captured by the image processing unit 71d, the illuminance distribution data converted by the conversion processing unit 71b is processed by the display processing unit 71d, and is displayed as an image data. Part 73 (step S6). Thereby, as shown in the above-mentioned Fig. 21 (c), the fluctuation of the illuminance distribution is displayed. The illuminance change monitoring unit 7 1 c compares the fluctuation data of the illuminance distribution by the conversion processing unit 7 1 b conversion processing, and the illuminance variation threshold data 72c stored in the information unit 72 to determine whether or not there is a illuminance variation of the specific lamp. (Steps S7, S8). The illuminance change monitoring unit 7 1 c determines which lamp is the cause of the decrease in illuminance when the illuminance is reduced, and determines that the illuminance in the range in which the power adjustment is possible is lowered (step S14). When the illuminance reduction is restored by the power adjustment, the process proceeds to step S15, and the power supply control unit 7 1f is controlled to adjust the power of the lamp. -53- 201237560 When the decrease in illuminance is not within the range that can be recovered by the power adjustment, the alarm unit 74 outputs an alarm signal indicating that the illuminance is lowered (step S16). As the alarm signal, when the illumination reduction signal is output, the abnormality of the light irradiation device ends or is extinguished. Further, when the light amount fluctuation monitoring unit 71c determines that the optical axis of the lamp has deviated (step S9), the light amount fluctuation monitoring unit 71c outputs a signal to the alarm unit 74 (step S17). The abnormality of the illumination device ends or is extinguished. The lighting time monitoring unit 7 1 e monitors the integrated lighting time of the lamps L 1 to L 5 sent from the power supply unit 9 that supplies the lamps L 1 to L 5 as described above (step S 1 0 ). Then, comparing with the lamp support life time data 7 2 d stored in the memory unit 72, determining whether the integrated lighting time reaches the guaranteed life (step S 1 1 ) 'determining that the integrated lighting time reaches the guaranteed life, then from the general report The portion 74 outputs a lamp exchanged alarm signal (step S12). Thereby, the operation of the light irradiation device is completed and the lamp is extinguished. When the accumulated lighting time has not reached the guaranteed life, the process returns to step S1 after the predetermined interval time, and the above-described processing is repeated. In the description of the foregoing embodiment, the integration process of the light quantity distribution in the Y direction (line direction) from the light amount signal sent from the photo sensor 60 'displays the change of the illuminance distribution for the X direction', but the use of this is performed. The data before the integrated processing 'is not only the illuminance distribution in the X direction but also the illuminance distribution in the γ direction. Specifically, the illuminance distribution in the X direction and the γ direction is displayed, for example, as a contour map. When the illuminance distribution is displayed as such, the overall state can be seen from the eye of -54-201237560, and it is easy to confirm the abnormality. Further, in the above description, the state in which the two-dimensional area sensor is used has been described as the photodetecting element array 161. However, the line sensor shown in Fig. 5 described above may be used. When the line sensor is used as the photodetecting element array 61, the processing of integrating the line direction of the step S2 is not required in the flowchart of the above-described embodiment, but the other processing is the same as that described in the above embodiment. Further, in the above-described embodiment, the case where the diffusion plate is placed in the irradiation region has been described. However, in the fluorescent plate, the light of the visible light of the invention may be used, and the diffusing plate or the like may be placed without measuring the diffusing plate or the like. Scattered light can also be. Further, as described above with reference to Fig. 11, a condensing mirror 40 is used as the condensing member 40, and the condensing collecting member 40 is detected, and the visible light or the diffused light of the infrared light is not required for the processing of the illuminating object. The illuminance distribution of the light irradiation region may be obtained. When the scattered light from the mask is measured, the reflectance is lowered due to the place, and the measurement accuracy is lowered. However, the measurement can be performed immediately while performing the exposure. Further, when the illuminating member is used to detect the illuminance distribution of the light reaching region by detecting the visible light transmitted through the condensing member or the diffused scattered light of the infrared light, the exposure can be performed in the same manner. Determination. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a schematic configuration of a light irradiation device according to an embodiment of the present invention. Fig. 2 is a cross-sectional view showing the side of the light-irradiating portion shown in Fig. 1 taken along line A-A from -55 to 201237560. .  Fig. 3 is a view of the light-irradiating portion shown in Fig. 1 as seen from the back side of the concentrating member. [Fig. 4] A cross-sectional view along the tube axis of the arc tube. Fig. 5 is a conceptual diagram showing the relationship between the measurement site on the diffusion plate and the image of the line sensor. Fig. 6 is a view showing changes in illuminance when the illuminance of a specific lamp is lowered. Fig. 7 is a view showing changes in illuminance when the optical axis of a specific lamp is deviated. FIG. 8 is a view showing a configuration example in the case where two photo sensors are provided. Fig. 9 is a conceptual diagram showing the relationship between the measurement site on the diffusion plate and the image receiving portion of the 2-dimensional area sensor. Fig. 1 is a side cross-sectional view showing a structural outline of another example of the light irradiation device of the present invention. Fig. 11 shows a configuration example in which a diffusing plate is provided on the back side of the condensing member to detect light rays transmitted through the condensing member. [Fig. 1 2] A schematic view showing a schematic configuration of another example of the light irradiation device of the present invention as seen from the back side of the condensing member. [Fig. 13] A functional block diagram of the image processing unit of the second embodiment of the present invention. Fig. 14 is a flow chart showing the procedure of the image processing unit of the second embodiment of the present invention. Fig. 15 is a view showing an example of the correspondence relationship between the pixel position of each detecting element of the photodetecting element array and the position of the irradiation region. FIG. 16 is a diagram showing an example of conversion ratio data (correction coefficient). FIG. 56-201237560 [FIG. 17] discloses the light quantity distribution detected by the light detecting element array and the illuminance converted by the conversion ratio data. Distributed map. Fig. 18 is a view for explaining the conversion processing of the second embodiment. Fig. 19 is a functional block diagram of an image processing unit according to a third embodiment of the present invention. Fig. 20 is a flow chart showing the procedure of the image processing unit of the third embodiment of the present invention. Fig. 21 is a view for explaining the conversion processing of the third embodiment. [Fig. 22] Fig. 23 is a diagram showing the functional area of the image processing unit according to the fourth embodiment of the present invention. Fig. 23 is a view showing the illuminance maintenance rate of the fourth embodiment of the present invention. Fig. 24 is a flow chart showing the procedure of the image processing unit of the fourth embodiment of the present invention. Fig. 25 is a functional block diagram of an image processing unit according to a fifth embodiment of the present invention. Fig. 26 is a flow chart showing the procedure of the image processing unit of the fifth embodiment of the present invention. Fig. 27 is a schematic diagram showing an example of a conventional light irradiation device. Fig. 28 is a schematic diagram showing another example of the conventional light irradiation device. [Description of main component symbols] 1 : Light irradiation unit - 57 - 201237560 7 : Image processing unit 9 : Power supply unit 1 0 : Light emitting unit 1 1 : Lamp chamber 12A : Light exit opening 12B: Diffused light incident opening 1 3: window panel member 20: light source element row 21: light source element 22: reflector C: optical axis F: focus 2 3: light reflecting surface 3 0: discharge lamp S: discharge space 31: light-emitting tube 3 2: light-emitting portion 3 3 : sealing portion 3 5 : electrode 36 : metal foil 3 7 : external lead 40 : concentrating member L : optical axis 40A : concentrating member - 58 201237560 4 1 : light reflecting surface 45 : mask 5 0 : transport Means 51: Roller W: Irradiated object 5 5 : Diffuser plate 5 5 A : Light diffusing surface LA: Light irradiation region 5 6 : Diffuser 60 : Photo sensor 6 0 1 : Light receiving surface 60A : First light sensing 60B: second photosensor 6 1 : photodetecting element array 65 : imaging optical element 66 : imaging lens 7 1 : processing unit 7 1 a : preprocessing unit 7 1 b : conversion processing unit 7 1 c : illuminance variation Monitoring unit 7 1 d : Display processing unit 7 1 e : lighting time monitoring unit 7 1 f : power supply control unit 72 : memory unit - 59 201237560 72a : position establishment correspondence data 72b : conversion ratio data 7 2c : Illumination change threshold 値 Data 72d : Lamp support life time data 72e : Reference light amount data 7 3 : Display unit 74 : Alarm unit 1 0 0 : Light source unit 1 〇 1 : Light source unit 1 0 1 - a : Discharge lamp 1 〇1 - b : Mirror 102 : Light concentrator 1 〇 3 : Refracting mirror 1 0 3 - a · Light transmitting portion 1 04 : Exposure surface 105 : Lighting power supply 105- a : Lamp control unit 106- a : Control Means 106-b: Memory means 106-c: Illuminance detecting means 107: Illuminance measuring means 108: Display means 1 1 1 : Illumination optical system 1 1 Ι-a : Lighting system unit - 60 201237560 1 1 2 : Lighting performance adjuster 1 1 3 : mask 1 1 4 : projection optics 114-a: projection system unit 1 1 5 : photo sensor 1 16 : substrate 1 17 : XYZ platform 1 1 8 : controller

Claims (1)

201237560 七、申請專利範圍： 1. 一種光照射裝置，其特徵爲具備： 光射出部，係具有由短弧型的放電燈，及以包圍該放 電燈之方式配置，且反射來自該放電燈之光線的反射器所 構成之光源元件複數並排配置於一方向的光源元件列；及 光檢測元件陣列，係檢測來自各光源元件之光線的光 到達區域之來自複數測定處的擴散光之光量。 2. 如申請專利範圍第1項所記載之光照射裝置，其 中， 前述測定處之擴散光，係經由成像光學元件而藉由前 述光檢測元件陣列被檢測出。 3. 如申請專利範圍第1項或第2項所記載之光照射 裝置，其中， 擴散板係可自由進退地設置於從前述光射出部射出之 光線的光路徑；該擴散板的光擴散面之擴散光的光量藉由 前述光檢測元件陣列被檢測出。 4. 如申請專利範圍第3項所記載之光照射裝置，其 中， 設置有在動作時位於從前述光射出部射出之光線的光 路徑上，將來自該光射出部之光線加以遮光的光閘構件； 前述擴散板係設置於該光閘構件之光照射面上。 5. 如申請專利範圍第1項或第2項所記載之光照射 裝置，其中，具備： 聚光構件，係將來自前述光射出部之光線聚光成延伸 -62- 201237560 於前述一方向之線狀。 6. 如申請專利範圍第1項或第2項所記載之光照射 裝置，其中，具備： 反射構件，係使來自前述光射出部之光線中所定波長 範圍的光線反射，且施加有使該波長範圍以外之光線透射 的波長選擇塗層； 於來自前述光射出部之光線透射該反射構件之透射光 的光到達區域上，設置有擴散板，來自該擴散板之擴散光 藉由前述光檢測元件陣列被檢測出。 7. 一種光照射裝置，係具備： 光射出部，係具有由短弧型的放電燈，及以包圍此放 電燈之方式配置，且反射來自該放電燈之光線的反射器所 構成之光源元件複數並排配置於一方向的光源元件列； 擴散手段，係配置於來自各光源元件之光線的光到達 區域，且使來自該光源元件之光線擴散並加以放射； 光量檢測手段，係具備將來自該擴散手段之擴散散亂 光加以受光，並檢測出受光各處之該擴散散亂光的光量之 複數光檢測元件；及 畫像處理單元，係處理前述光量檢測手段的輸出； 其特徵爲： 前述畫像處理單元係具備： 轉換處理部，係將前述光量檢測手段上的各位置，與 照射從前述光源元件射出之光線的光照射區域之各位置建 立對應，並將光量檢測手段上的各位置之光量，轉換成表 -63- 201237560 示該光照射區域的各位置之光量變動的訊號；及 輸出表示藉由前述轉換處理部所得之光照射區域的各 位置之光量變動的訊號的手段。 8. 如申請專利範圍第7項所記載之光照射裝置，其 中， 前述光照射裝置係具備顯示單元： 前述畫像處理單元係具備：顯示處理手段，係將表示 藉由前述轉換處理部所得之光量變動的訊號，與光照射區 域的位置建立對應並加以顯示於前述顯示單元。 9. 如申請專利範圍第7項或第8項所記載之光照射 裝置，其中， 前述光照射裝置係具備：電源裝置，係供給用以使光 照射裝置之各光源元件的放電燈點燈之電力； 前述畫像處理單元係更具備： 光量變動監視手段，係監視表示藉由前述轉換處理部 所得之光照射區域的各位置之光量變動的訊號：及 供電控制手段，係用以控制從前述電源裝置供給給各 光源元件之電力； 前述光量變動監視手段，係在藉由表示前述光照射區 域之各位置的光量變動之訊號，檢測出光源元件中特定光 源元件的放電燈之光量降低時，藉由前述供電控制手段來 控制前述電源裝置，使供給給前述光量降低之放電燈的電 力增大，來使該放電燈的光量增加。 10. 如申請專利範圍第7項或第8項所記載之光照射 -64- 201237560 裝置，其中， 前述畫像處理單元係具有：記億體，係儲存用以將前 述光量檢測手段上的各位置之光量，轉換成表示該光照射 區域之各位置的光量之訊號的轉換比率資料； 前述轉換處理部，係從前述記億體讀入轉換比率資料 ，根據前述光量檢測手段上的各處之該擴散散亂光之光量 ，與儲存於前述記憶體之轉換比率資料，計算出表示光照 射區域之各位置的光量變動之訊號。 11·如申請專利範圍第7項或第8項所記載之光照射 裝置，其中， 前述畫像處理單元係具有：記憶體，係作爲基準光量 資料，儲存使該光照射裝置之光源元件列的放電燈初次點 燈時所檢測出之光量檢測手段上的各位置之光量； 前述轉換處理部，係根據前述光量檢測手段上的各處 之該擴散散亂光的光量，與儲存於前述記憶體之基準光量 資料，計算出表示光照射區域之各位置的光量變動之訊號 -65-201237560 VII. Patent application scope: 1. A light irradiation device, comprising: a light emitting portion having a short arc type discharge lamp and configured to surround the discharge lamp, and reflecting from the discharge lamp The light source elements formed by the reflectors of the light rays are arranged side by side in a row of light source elements arranged in one direction; and the array of light detecting elements detects the amount of light of the diffused light from the plurality of measurement areas in the light reaching region of the light rays from the respective light source elements. 2. The light-irradiating device according to claim 1, wherein the diffused light at the measurement site is detected by the imaging optical element via the optical detecting element array. 3. The light-irradiating device according to the first or second aspect of the invention, wherein the diffusing plate is detachably provided in a light path of the light emitted from the light emitting portion; and the light diffusing surface of the diffusing plate The amount of light of the diffused light is detected by the aforementioned array of photodetecting elements. 4. The light-irradiating device according to claim 3, wherein the light-shielding device that shields light from the light-emitting portion by a light path that is located in a light path emitted from the light-emitting portion during operation is provided a member; the diffusing plate is disposed on a light-irradiating surface of the shutter member. 5. The light-irradiating device according to claim 1 or 2, further comprising: a concentrating member that condenses light from the light emitting portion to extend -62-201237560 in one direction Linear. 6. The light-irradiating device according to claim 1 or 2, further comprising: a reflecting member that reflects light of a predetermined wavelength range of light from the light emitting portion and applies the wavelength a wavelength selective coating for transmitting light outside the range; a light diffusing plate is disposed on a light reaching region of the light transmitted from the light emitting portion and transmitted through the reflecting member, and the diffused light from the diffusing plate is passed through the light detecting element The array is detected. A light-irradiating device comprising: a light-emitting portion having a short-arc type discharge lamp; and a light source element configured to surround the discharge lamp and reflecting a light from the discharge lamp a plurality of light source element rows arranged side by side in a plurality of directions; a diffusion means disposed in a light reaching region of the light from each of the light source elements, and diffusing and radiating light from the light source element; the light amount detecting means is provided a plurality of light detecting elements that diffuse scattered light to receive light and detect the amount of light of the diffused scattered light passing through the light; and an image processing unit that processes an output of the light amount detecting means; characterized by: The processing unit includes: a conversion processing unit that associates each position on the light amount detecting means with each position of a light irradiation region that irradiates light emitted from the light source element, and the light amount of each position on the light amount detecting means And converted into Table-63-201237560 to show the signal of the change in the amount of light at each position of the light-irradiated area; And means for outputting a signal indicating a change in the amount of light of each position of the light-irradiated area obtained by the conversion processing unit. 8. The light irradiation device according to claim 7, wherein the light irradiation device includes a display unit: the image processing unit includes: display processing means for indicating the amount of light obtained by the conversion processing unit The changed signal is associated with the position of the light-irradiated area and displayed on the display unit. 9. The light-emitting device according to claim 7 or 8, wherein the light-emitting device includes a power supply device that supplies a discharge lamp for lighting each light source element of the light-irradiating device. Further, the image processing unit further includes: a light amount fluctuation monitoring means for monitoring a signal indicating a change in the light amount at each position of the light irradiation region obtained by the conversion processing unit: and a power supply control means for controlling the power source from the power source The light amount fluctuation monitoring means is configured to detect when the light amount of the discharge lamp of the specific light source element in the light source element is reduced by the signal indicating the change in the light amount at each position of the light irradiation region. The power supply device controls the power supply device to increase the amount of electric power supplied to the discharge lamp having a reduced amount of light, thereby increasing the amount of light of the discharge lamp. 10. The light-irradiation-64-201237560 device according to claim 7 or claim 8, wherein the image processing unit has a memory unit for storing each position on the light amount detecting means. The amount of light is converted into conversion ratio data indicating a signal of the amount of light at each position of the light-irradiated region; and the conversion processing unit reads the conversion ratio data from the plurality of cells, and the light-quantity detecting means The amount of light scattered by the scattered light and the conversion ratio data stored in the memory are used to calculate a signal indicating the change in the amount of light at each position of the light irradiation region. The light irradiation device according to the seventh aspect or the eighth aspect of the invention, wherein the image processing unit has a memory for storing a discharge of a light source element row of the light irradiation device as reference light amount data. The amount of light at each position on the light amount detecting means detected when the lamp is first turned on; the conversion processing unit is stored in the memory based on the amount of the diffused scattered light in each of the light amount detecting means The reference light amount data is used to calculate a signal indicating the change in the amount of light at each position of the light irradiation region-65-
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