201225796 六、發明說明： 【發明所屬之技術領域】 [刪1] 本發明涉及一種殼體及其製造方法。 C先前技術] [〇〇〇2]真空鍍膜技術（PVD)係一個非常環保的成膜技術。以真 空鍍膜的方式所形成的膜層具有高硬度、高耐磨性、良 好的化學穩定性、與基體結合牢固以及亮麗的金屬外觀 專優點，因此真空鐘膜在銘、铭合金、錤、鎂合金及不 ^ 銹鋼等金屬基材表面裝飾性處理領域的應用越來越廣。201225796 VI. Description of the Invention: [Technical Field to Which the Invention Is Ascribed] [Deleted 1] The present invention relates to a casing and a method of manufacturing the same. C Prior Art] [〇〇〇2] Vacuum Coating Technology (PVD) is a very environmentally friendly film forming technology. The film formed by vacuum coating has high hardness, high wear resistance, good chemical stability, strong bonding with the substrate and a beautiful metallic appearance. Therefore, the vacuum film is in Ming, Ming alloy, niobium and magnesium. The application of surface treatment of metal substrates such as alloys and stainless steel is becoming more and more widespread.
[0003] 然而，由於鋁或鋁合金最明顯的缺點係耐腐蝕差，且PVD 裝飾性塗層本身不可避免的會存在微小的孔隙’因此， 直接於鋁或鋁合金基體表面鍍覆諸如TiN層、TiN0層、[0003] However, the most obvious disadvantage of aluminum or aluminum alloys is poor corrosion resistance, and the PVD decorative coating itself inevitably has tiny pores. Therefore, plating directly on the surface of the aluminum or aluminum alloy substrate such as TiN layer , TiN0 layer,
TiCN層、CrN層、CrN0層、CrCN層或其他具有耐腐蝕性 的PVD裝飾性塗層，不能有效防止所述岛或鋁合金基體發 生電化學腐蝕’同時該PVD裝飾性塗層本身亦會發生異色 、脫落等現象。 〇 【發明内容】 [0004] 鑒於此，提供一種具有良好的耐腐蝕性及装飾性外觀的 殼體。 [0005] 另外，還提供一種上述殼體的製造方法。 [0006] —種殼體，包括鋁或鋁合金基體、依次形成於該鋁或鋁 合金基體上的紹層及顏色層，該顏色層為具有防腐钱性 能的電絕緣層。 [0007] —種殼體的製造方法，包括以下步驟： 099142710 表單编號A0101 第3頁/共1〇頁 0992074051-0 201225796 [0008] 提供鋁或鋁合金基體； [0009] 於該鋁或鋁合金基體上磁控濺射形成鋁層； [0010] 於該鋁層上磁控濺射形成顏色層，該顏色層為具有防腐 蝕性能的電絕緣層。 [0011] 本發明形成的所述顏色層為絕緣層，可使殼體不易形成 發生電化學腐蝕所需要的陰極與陽極，從而提高了殼體 的耐腐蝕性；所述鋁層的形成可避免鋁或鋁合金基體與 藉由顏色層的孔隙向膜層内擴散的腐蝕性氣體和/或液體 直接接觸而發生第二相腐蝕；因此所述鋁層與顏色層形 成的複合層可顯著提高所述鋁或鋁合金基體的耐腐蝕性 。此外，所述顏色層還可使所述殼體具有良好的裝飾性 【實施方式】 [0012] 請參閱圖1，本發明一較佳實施例的殼體10包括鋁或鋁合 金基體11、依次形成於該鋁或鋁合金基體11上的鋁層13 及顏色層15。該殼體10可為3C電子產品的殼體，亦可為 眼鏡邊框、建築用件及汽車等交通工具的零部件等。 [0013] 所述鋁層13的厚度為2~5//m。 [0014] 所述顏色層1 5為具有防腐蝕性能的電絕緣層。該顏色層 15包括依次形成於鋁層13上的二氧化鈦（Ti〇2)層151及 二氧化矽（Si〇2)層153。該1^〇2層151的厚度為 50〜1.50nm，該Si〇9層1 53的厚度為50〜1 50nm。 [0015] 所述鋁層13及顏色層15均可藉由磁控濺射法沉積形成。 可以理解，所述鋁層1 3及顏色層1 5還可藉由電漿鍍膜法 099142710 表單編號A0101 第4頁/共10頁 099 201225796 [0016] [0017] ❹ [0018] ❾ [0019] 、蒸發鍍膜法等其他真空鍍膜法形成。 本發明一較佳實施例的製造所述殼體10的方法主要包括 如下步驟： 提供紹或鋁合金基體11，並對鋁或鋁合金基體11依次進 行研磨及電解拋光。電解拋光後’再依次用去離子水和 無水乙醇對該鋁或鋁合金基體11表面進行擦拭。再將擦 拭後的鋁或鋁合金基體11放入盛裝有丙酮溶液的超聲波 清洗器中進行震動清洗’以除去鋁或鋁合金基體11表面 的雜質和油污等。清洗完畢後吹幹備用。 ..:.... .. 對經上述處理後的鋁或鋁合金基體11的表面進行電漿清 洗’進一步去除鋁或鋁合金基體表丨面的海污，以改善 鋁或鋁合金基體11表面與後續塗層的結合力。該電漿清 洗的具體操作及工藝參數可為：採用一中頻磁控濺射鍍 膜機（圖未示），將鋁或鋁合金基體11放入該鍍膜機的 鑛膜室内的工件架上，對該鍍膜室進行抽真空處理至真 空度為8. Oxl〇_3Pa，以250〜500sccm (標準狀態毫升/ 分鐘）的流量向鍍膜室中通入钝度為99. 999%的氬氣，於 鋁或鋁合金基體11上施加_500〜- 800V的偏壓，對鋁或鋁 合金基體11表面進行電漿清洗，清洗時間為3〜iOniin。 在對鋁或鋁合金基體11進行電漿清洗後，於該鋁或鋁合 金基體11上形成銘層13。形成該鋁層13的具體操作及工 藝參數如下：以氬氣為工作氣體，調節氬氣流量為 150〜300SCCm，設置佔空比為30%~70%，於鋁或鋁合金 基體11上施加-50〜-300V的偏壓’設置所述工件架的公 099142710 表單編號A0101 第5 f/共10頁 0992074051-0 201225796 轉速度為 0· 5〜3rpm (revolution per minute，轉/分 鐘），並加熱鍍膜室至50~15(TC (即濺射溫度為50〜150 °C);開啟已安裝於該鍍膜機内的鋁靶的電源，設置其 功率為5 ~ 1 0 k w，沉積|g層1 3。沉積該铭層1 3的時間為 20〜60mino [0020] 由於鋁的電極電位與鋁合金相當，所述鋁層13不易與鋁 或鋁合金基體11發生電偶腐蝕；此外，所述鋁層13的形 成不僅可提高所述鋁或鋁合金基體11的抗單點腐蝕的性 能，還可避免鋁或鋁合金基體11與藉由所述顏色層15向 膜層内擴散的腐蝕性氣體和/或液體直接接觸而發生第二 相腐蝕，如此可顯著提高所述鋁或鋁合金基體11的耐腐 餘性。 [0021] 形成所述鋁層13後，於該鋁或鋁合金基體11上形成顏色 層15，該顏色層15包括依次形成於該鋁層13上的TiO層 2 151及Si〇2層153。形成所雜轉色層15的的具體操作及工 藝參數如下： 丨 ; ：：：：·. , ： [0022] 關閉所述鋁靶材的電源，以氧氣為反應氣體，向鍍膜室 内通入流量為10~80sccm的氧氣，保持所述氬氣的流量 、施加於鋁或鋁合金基體11的偏壓及濺射溫度不變，開 啟已安裝於所述鍍膜室内鈦（Ti )靶的電源，設置其功 率為5~10kw，於所述鋁層13上沉積TiO層151。沉積該 L· 14〇2層151的時間為2〜30min。 [0023] 形成該1^〇2層151後，保持所述氬氣的流量、氧氣的流量 、施加於鋁或鋁合金基體11的偏壓及濺射溫度不變，開 099142710 表單編號A0101 第6頁/共10頁 0992074051-0 201225796 啟已安裝於鍍膜室内的矽（Si)靶的電源，設置其功率 為5〜10kw，於所述1^〇2層151上沉積^〇2層153。沉積 該3丨〇2層153的時間為2〜30min。 [0024] [0025] Ο [0026] [0027] Ο [0028] [0029] [0030] [0031] [0032] [0033] 由於所述Ti〇2層151及Si、層153為電絕緣層，使殼體“ 不易形成發生電化學腐蝕所需要的陰極與陽極，從而提 高了殼體1 〇的财腐钮性。 對所述殼體10進行了阶中性鹽W濃度為5%)測 試。測試結果表明，該㈣1()在心、賴才出現腐姓現 象。可見，該殼體10具有良好的耐腐蝕性。 : ...... . 此外，在保證具有較好的耐腐蝕性的同時，還可藉由對 反應氣體氧氣的流量及沉積時間的控制來改變顏色層15 的成分，從而使顏色層15呈現出綠色、藍色、黃色及紅 色等顏色以及上述顏色的過渡顏色，最終使所述殼體10 具有良好的裝飾性外觀。 【圖式簡單說明】 圖1為本發明較佳實施例的殼體的剖視圖。 【主要元件符號說明】 殼體：10 鋁或鋁合金基體：11 鋁層：13 顏色層：15 二氧化欽層：151 二氧化矽層：153 099142710 表單編號A0101 0992074051-0TiCN layer, CrN layer, CrN0 layer, CrCN layer or other PVD decorative coating with corrosion resistance cannot effectively prevent electrochemical corrosion of the island or aluminum alloy substrate. At the same time, the PVD decorative coating itself also occurs. Different colors, shedding, etc. SUMMARY OF THE INVENTION [0004] In view of the above, a housing having a good corrosion resistance and a decorative appearance is provided. Further, a method of manufacturing the above casing is also provided. A casing comprising an aluminum or aluminum alloy substrate, a layer and a color layer sequentially formed on the aluminum or aluminum alloy substrate, the color layer being an electrically insulating layer having anti-corrosive properties. [0007] A method of manufacturing a casing, comprising the steps of: 099142710 Form No. A0101 Page 3 / Total 1 page 0992074051-0 201225796 [0008] Providing an aluminum or aluminum alloy substrate; [0009] Magnetron sputtering on the alloy substrate forms an aluminum layer; [0010] Magnetron sputtering is performed on the aluminum layer to form a color layer, which is an electrically insulating layer having corrosion resistance. [0011] The color layer formed by the invention is an insulating layer, which can make the casing less likely to form the cathode and the anode required for electrochemical corrosion, thereby improving the corrosion resistance of the casing; the formation of the aluminum layer can be avoided The aluminum or aluminum alloy substrate is in direct contact with the corrosive gas and/or liquid diffused into the film layer by the pores of the color layer to cause second phase corrosion; therefore, the composite layer formed by the aluminum layer and the color layer can significantly improve the The corrosion resistance of the aluminum or aluminum alloy substrate. In addition, the color layer can also make the housing have good decorative performance. [0012] Referring to FIG. 1, a housing 10 according to a preferred embodiment of the present invention includes an aluminum or aluminum alloy substrate 11 in turn. An aluminum layer 13 and a color layer 15 are formed on the aluminum or aluminum alloy substrate 11. The casing 10 may be a casing of a 3C electronic product, or may be a frame of a eyeglass, a building component, or a component of a vehicle such as an automobile. [0013] The aluminum layer 13 has a thickness of 2 to 5 / / m. [0014] The color layer 15 is an electrically insulating layer having anti-corrosion properties. The color layer 15 includes a titanium oxide (Ti 2 ) layer 151 and a ceria (Si 2 ) layer 153 which are sequentially formed on the aluminum layer 13. The 1 〇 2 layer 151 has a thickness of 50 to 1.50 nm, and the Si 〇 9 layer 153 has a thickness of 50 to 150 nm. [0015] The aluminum layer 13 and the color layer 15 may each be formed by magnetron sputtering deposition. It can be understood that the aluminum layer 13 and the color layer 15 can also be subjected to plasma plating method 099142710 Form No. A0101 Page 4 / Total 10 Pages 099 201225796 [0017] [0018] ❾ [0019] It is formed by another vacuum coating method such as an evaporation coating method. The method of manufacturing the housing 10 according to a preferred embodiment of the present invention mainly comprises the steps of: providing a base material 11 of an aluminum alloy or aluminum alloy and sequentially polishing and electropolishing the aluminum or aluminum alloy substrate 11. After the electrolytic polishing, the surface of the aluminum or aluminum alloy substrate 11 was wiped again with deionized water and absolute ethanol. Further, the wiped aluminum or aluminum alloy substrate 11 is placed in an ultrasonic cleaner containing an acetone solution for vibration cleaning to remove impurities, oil, and the like on the surface of the aluminum or aluminum alloy substrate 11. After cleaning, blow dry and set aside. ..:..... Performing plasma cleaning on the surface of the aluminum or aluminum alloy substrate 11 after the above treatment to further remove the sea surface of the aluminum or aluminum alloy substrate surface to improve the aluminum or aluminum alloy substrate 11 The adhesion of the surface to the subsequent coating. The specific operation and process parameters of the plasma cleaning may be: using an intermediate frequency magnetron sputtering coating machine (not shown), the aluminum or aluminum alloy substrate 11 is placed on the workpiece holder of the coating chamber of the coating machine. The argon gas having a bluntness of 99.999% is introduced into the coating chamber at a flow rate of 250 to 500 sccm (standard cc/min) at a vacuum of 8. Oxl 〇 _3Pa. A surface of the aluminum or aluminum alloy substrate 11 is subjected to plasma cleaning by applying a bias voltage of _500 to -800 V on the aluminum or aluminum alloy substrate 11, and the cleaning time is 3 to iOniin. After the aluminum or aluminum alloy substrate 11 is subjected to plasma cleaning, an inscription layer 13 is formed on the aluminum or aluminum alloy substrate 11. The specific operation and process parameters for forming the aluminum layer 13 are as follows: argon gas is used as the working gas, the argon gas flow rate is adjusted to 150 to 300 SCCm, the duty ratio is set to 30% to 70%, and the aluminum or aluminum alloy substrate 11 is applied - 50~-300V bias' set the workpiece holder of the public 099142710 Form No. A0101 No. 5 f/ Total 10 pages 0992074051-0 201225796 Rotation speed is 0·5~3rpm (revolution per minute, rpm) and heated The coating chamber is 50~15 (TC (that is, the sputtering temperature is 50~150 °C); the power supply of the aluminum target installed in the coating machine is turned on, and the power is set to 5 ~ 10 kw, and the layer of deposition | g is 1 3 The time for depositing the layer 13 is 20 to 60 mino. Since the electrode potential of aluminum is equivalent to that of the aluminum alloy, the aluminum layer 13 is not easily galvanic-corroded with the aluminum or aluminum alloy substrate 11; The formation of 13 not only improves the resistance to single-point corrosion of the aluminum or aluminum alloy substrate 11, but also avoids the corrosive gas of the aluminum or aluminum alloy substrate 11 and the diffusion into the film layer by the color layer 15 and/or Or the liquid phase is directly contacted to cause second phase corrosion, which can significantly improve the aluminum or aluminum alloy The corrosion resistance of the gold substrate 11. [0021] After the aluminum layer 13 is formed, a color layer 15 is formed on the aluminum or aluminum alloy substrate 11, and the color layer 15 includes a TiO layer sequentially formed on the aluminum layer 13. 2 151 and Si〇2 layer 153. The specific operation and process parameters for forming the mixed color conversion layer 15 are as follows: 丨; ::::·. , : [0022] Turn off the power of the aluminum target, with oxygen as The reaction gas is supplied with oxygen having a flow rate of 10 to 80 sccm into the coating chamber, and the flow rate of the argon gas, the bias voltage applied to the aluminum or aluminum alloy substrate 11 and the sputtering temperature are maintained, and the opening is installed in the coating chamber. A power source of the titanium (Ti) target is set to have a power of 5 to 10 kW, and a TiO layer 151 is deposited on the aluminum layer 13. The time for depositing the L·14〇2 layer 151 is 2 to 30 min. [0023] After the 层2 layer 151, the flow rate of the argon gas, the flow rate of the oxygen gas, the bias voltage applied to the aluminum or aluminum alloy substrate 11 and the sputtering temperature are kept constant, and the opening number is 099142710. Form No. A0101 Page 6 / 10 pages 0992074051 -0 201225796 Power supply for the 矽(Si) target that has been installed in the coating chamber, set the power to 5~10kw, A layer 2 of 153 is deposited on the layer 2 of 151. The time for depositing the layer 3 of 153 is 2 to 30 min. [0024] [0028] [0028] [0029] [0033] [0033] Since the Ti〇2 layer 151 and the Si and the layer 153 are electrically insulating layers, the casing “is less likely to form a cathode and an anode required for electrochemical corrosion, thereby improving the shell. Body 1 财 财 财 。 。. The casing 10 was subjected to a test for a neutral salt W concentration of 5%. The test results show that the (4) 1 () appears in the heart and Lai. It can be seen that the housing 10 has good corrosion resistance. In addition, while ensuring good corrosion resistance, the composition of the color layer 15 can be changed by controlling the flow rate of the reaction gas oxygen and the deposition time, thereby making the color layer 15 Colors such as green, blue, yellow, and red, and transition colors of the above colors are exhibited, ultimately giving the casing 10 a good decorative appearance. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view of a housing in accordance with a preferred embodiment of the present invention. [Main component symbol description] Housing: 10 Aluminum or aluminum alloy base: 11 Aluminum layer: 13 Color layer: 15 Dioxide layer: 151 Ceria layer: 153 099142710 Form No. A0101 0992074051-0