TWI468540B - Housing and method for making the same - Google Patents

Housing and method for making the same Download PDF

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TWI468540B
TWI468540B TW99139286A TW99139286A TWI468540B TW I468540 B TWI468540 B TW I468540B TW 99139286 A TW99139286 A TW 99139286A TW 99139286 A TW99139286 A TW 99139286A TW I468540 B TWI468540 B TW I468540B
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magnesium
layer
alloy substrate
magnesium alloy
casing
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TW99139286A
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TW201221676A (en
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Hsin Pei Chang
wen rong Chen
Huan Wu Chiang
Cheng Shi Chen
xiao-qiang Chen
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Hon Hai Prec Ind Co Ltd
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Description

殼體及其製作方法Housing and manufacturing method thereof

本發明涉及一種殼體及其製造方法。The present invention relates to a housing and a method of manufacturing the same.

真空鍍膜技術(PVD)係一種非常環保的成膜技術。以真空鍍膜的方式所形成的膜層具有高硬度、高耐磨性、良好的化學穩定性、與基體結合牢固以及亮麗的金屬外觀等優點,因此真空鍍膜在鎂、鎂合金及不銹鋼等金屬基材表面裝飾性處理領域的應用越來越廣。Vacuum coating technology (PVD) is a very environmentally friendly film forming technology. The film formed by vacuum coating has the advantages of high hardness, high wear resistance, good chemical stability, strong bonding with the substrate and a beautiful metallic appearance. Therefore, the vacuum coating is applied to metal bases such as magnesium, magnesium alloy and stainless steel. The application of decorative surface treatment is becoming more and more extensive.

然而,由於鎂或鎂合金的標準電極電位很低,且PVD裝飾性塗層本身不可避免的會存在微小的孔隙,如針孔、裂紋,並且鎂及鎂合金基體會發生微電池腐蝕作用,形成很大的膜-基電位差,加快了微電池的腐蝕速率,因此,直接於鎂或鎂合金基體表面鍍覆諸如TiN層、TiN層、CrN層等具有色彩的PVD裝飾性塗層,不能有效防止所述鎂或鎂合金基體發生電化學腐蝕,同時該PVD裝飾性塗層本身也會發生異色、脫落等現象。However, since the standard electrode potential of magnesium or magnesium alloy is very low, and the PVD decorative coating itself inevitably has tiny pores, such as pinholes, cracks, and magnesium and magnesium alloy substrates may cause micro-cell corrosion, forming A large membrane-base potential difference accelerates the corrosion rate of the microbattery. Therefore, plating a PVD decorative coating such as a TiN layer, a TiN layer, or a CrN layer directly on the surface of the magnesium or magnesium alloy substrate cannot effectively prevent it. The magnesium or magnesium alloy substrate undergoes electrochemical corrosion, and the PVD decorative coating itself may also undergo coloring, falling off, and the like.

鑒於此,提供一種具有良好的耐腐蝕性及裝飾性外觀的殼體。In view of this, a housing having a good corrosion resistance and a decorative appearance is provided.

另外,還提供一種上述殼體的製造方法。In addition, a method of manufacturing the above casing is also provided.

一種殼體,包括鎂或鎂合金基體,形成於該鎂或鎂合金基體表面的防腐蝕層,及形成於防腐蝕層表面的色彩層,所述防腐蝕層包括依次形成於鎂或鎂合金基體表面的鎂層和氧化鎂層。A casing comprising a magnesium or magnesium alloy substrate, an anticorrosive layer formed on a surface of the magnesium or magnesium alloy substrate, and a color layer formed on a surface of the anticorrosive layer, the anticorrosive layer comprising a magnesium or magnesium alloy substrate sequentially formed The magnesium layer and the magnesium oxide layer on the surface.

一種殼體的製造方法,包括以下步驟:A method of manufacturing a housing, comprising the steps of:

提供鎂或鎂合金基體;Providing a magnesium or magnesium alloy matrix;

在該鎂或鎂合金基體上磁控濺射防腐蝕層,所述防腐蝕層包括依次形成於鎂或鎂合金基體表面的鎂層和氧化鎂層;Magnetron sputtering an anti-corrosion layer on the magnesium or magnesium alloy substrate, the anti-corrosion layer comprising a magnesium layer and a magnesium oxide layer sequentially formed on a surface of the magnesium or magnesium alloy substrate;

在該防腐蝕層上磁控濺射色彩層。A color layer is magnetron sputtered on the anti-corrosion layer.

所述殼體的製造方法,通過磁控濺射法依次於鎂或鎂合金基體上形成防腐蝕層及具有裝飾性的色彩層。所述防腐蝕層包括依次形成於鎂或鎂合金基體表面的鎂層和氧化鎂層,當殼體處於腐蝕性介質中時,由於所述利用鎂與鎂合金之間的電位差小,減緩了殼體發生微電池腐蝕的速率,從而提高了殼體的耐腐蝕性。在所述殼體防腐蝕性提高的同時,還可避免所述色彩層發生異色、脫落等失效現象,從而使該殼體經長時間使用後仍具有較好的裝飾性外觀。In the method of manufacturing the casing, an anti-corrosion layer and a decorative color layer are sequentially formed on the magnesium or magnesium alloy substrate by magnetron sputtering. The anti-corrosion layer comprises a magnesium layer and a magnesium oxide layer which are sequentially formed on the surface of the magnesium or magnesium alloy substrate. When the shell is in a corrosive medium, the shell is slowed down due to the small potential difference between the magnesium and the magnesium alloy. The rate at which the microbial corrosion occurs in the body increases the corrosion resistance of the casing. While the corrosion resistance of the casing is improved, the color layer may be prevented from being colored, falling off, etc., so that the casing has a good decorative appearance after being used for a long time.

請參閱圖1,本發明一較佳實施例的殼體10包括鎂或鎂合金基體11、依次形成於該鎂或鎂合金基體11上的防腐蝕層13及色彩層15。該殼體10可以為3C電子產品的殼體,也可為工業、建築用件及汽車等交通工具的零部件等。Referring to FIG. 1, a housing 10 according to a preferred embodiment of the present invention includes a magnesium or magnesium alloy substrate 11, an anti-corrosion layer 13 and a color layer 15 sequentially formed on the magnesium or magnesium alloy substrate 11. The casing 10 may be a casing of a 3C electronic product, or may be a component of a vehicle such as an industrial, a building, or an automobile.

所述防腐蝕層13包括鎂層131和氧化鎂層133,所述鎂層131形成於基體11的表面,所述氧化鎂層133形成於鎂層131的表面。所述鎂層131的厚度為1.0~3.0μm;所述氧化鎂層133的厚度為0.5~1.0μm。The anti-corrosion layer 13 includes a magnesium layer 131 formed on the surface of the substrate 11 and a magnesium oxide layer 133 formed on the surface of the magnesium layer 131. The magnesium layer 131 has a thickness of 1.0 to 3.0 μm; and the magnesium oxide layer 133 has a thickness of 0.5 to 1.0 μm.

所述色彩層15為Ti-N層,其厚度為1.0~3.0μm。可以理解,所述色彩層15還可以為Cr-N層或其他具有裝飾性的膜層。The color layer 15 is a Ti-N layer having a thickness of 1.0 to 3.0 μm. It can be understood that the color layer 15 can also be a Cr-N layer or other decorative film layer.

本發明一較佳實施例的製造所述殼體10的方法主要包括如下步驟:The method for manufacturing the housing 10 according to a preferred embodiment of the present invention mainly includes the following steps:

提供鎂或鎂合金基體11,並對鎂或鎂合金基體11依次進行研磨及電解拋光。電解拋光後,再依次用去離子水和無水乙醇對該鎂或鎂合金基體11表面進行擦拭。再將擦拭後的鎂或鎂合金基體11放入盛裝有丙酮溶液的超聲波清洗器中進行震動清洗,以除去鎂或鎂合金基體11表面的雜質和油污等。清洗完畢後吹幹備用。A magnesium or magnesium alloy substrate 11 is provided, and the magnesium or magnesium alloy substrate 11 is sequentially ground and electrolytically polished. After electrolytic polishing, the surface of the magnesium or magnesium alloy substrate 11 is wiped with deionized water and absolute ethanol in this order. Further, the wiped magnesium or magnesium alloy substrate 11 is placed in an ultrasonic cleaner containing an acetone solution for vibration cleaning to remove impurities, oil stains, and the like on the surface of the magnesium or magnesium alloy substrate 11. After cleaning, blow dry and set aside.

對經上述處理後的鎂或鎂合金基體11的表面進行氬氣電漿清洗,進一步去除鎂或鎂合金基體11表面的油污,以改善鎂或鎂合金基體11表面與後續塗層的結合力。該電漿清洗的具體操作及工藝參數可為:將鎂或鎂合金基體11放入一磁控濺射鍍膜機(圖未示)的鍍膜室內,對該鍍膜室進行抽真空處理至真空度為1.0×10-3 Pa,以250~500sccm(標準狀態毫升/分鐘)的流量向鍍膜室中通入純度為99.999%的氬氣,於鎂或鎂合金基體11上施加-300~-800V的偏壓,對鎂或鎂合金基體11表面進行電漿清洗,清洗時間為3~10min。The surface of the magnesium or magnesium alloy substrate 11 subjected to the above treatment is subjected to argon plasma cleaning to further remove the oil stain on the surface of the magnesium or magnesium alloy substrate 11 to improve the adhesion of the surface of the magnesium or magnesium alloy substrate 11 to the subsequent coating. The specific operation and process parameters of the plasma cleaning may be: placing the magnesium or magnesium alloy substrate 11 into a coating chamber of a magnetron sputtering coating machine (not shown), and vacuuming the coating chamber to a vacuum degree of 1.0×10 -3 Pa, argon gas with a purity of 99.999% was introduced into the coating chamber at a flow rate of 250 to 500 sccm (standard state ML/min), and a bias of -300 to -800 V was applied to the magnesium or magnesium alloy substrate 11. Pressing, the surface of the magnesium or magnesium alloy substrate 11 is plasma-cleaned, and the cleaning time is 3 to 10 minutes.

在對鎂或鎂合金基體11進行電漿清洗後,在該鎂或鎂合金基體11上形成防腐蝕層13。首先形成所述防腐蝕層13中的鎂層131。形成該鎂層131的具體操作及工藝參數如下:以氬氣為工作氣體,調節氬氣流量為100~300sccm,設置佔空比為50%~80%,於鎂或鎂合金基體11上施加-50~-100V的偏壓,並加熱鍍膜室至80~120℃(即濺射溫度為80~120℃);選擇鎂為靶材,設置其功率為8~13kw,沉積防腐蝕層13。沉積該防腐蝕層13的時間為30~60min。After the magnesium or magnesium alloy substrate 11 is plasma-cleaned, an anti-corrosion layer 13 is formed on the magnesium or magnesium alloy substrate 11. First, the magnesium layer 131 in the anti-corrosion layer 13 is formed. The specific operation and process parameters for forming the magnesium layer 131 are as follows: argon gas is used as the working gas, the argon gas flow rate is adjusted to 100-300 sccm, the duty ratio is set to 50%-80%, and the magnesium or magnesium alloy substrate 11 is applied - 50~-100V bias, and heat the coating chamber to 80~120°C (ie, the sputtering temperature is 80~120°C); select magnesium as the target, set the power to 8~13kw, and deposit the anti-corrosion layer 13. The time for depositing the anti-corrosion layer 13 is 30 to 60 min.

形成鎂層131後,在該鎂層131上形成氧化鎂層133,以氬氣為濺射氣體,設置氬氣流量為100~300sccm,以氧氣為反應氣體,設置氧氣流量為50~100sccm,設置佔空比為50~80%,對鎂和鎂合金基體11施加-50~-100V的偏壓,並加熱鍍膜室至100~150℃(即濺射溫度為100~150℃);選擇鎂為靶材,設置其功率為5~8kw,沉積氧化鎂層133。沉積氧化鎂層133的時間為20~40min。控制氧化鎂層133的厚度為0.5~1.0μm。After the magnesium layer 131 is formed, a magnesium oxide layer 133 is formed on the magnesium layer 131, and argon gas is used as a sputtering gas, and an argon gas flow rate is set to 100 to 300 sccm, and oxygen gas is used as a reaction gas, and an oxygen flow rate is set to 50 to 100 sccm. The duty ratio is 50-80%, a bias voltage of -50~-100V is applied to the magnesium and magnesium alloy substrate 11, and the coating chamber is heated to 100-150 ° C (ie, the sputtering temperature is 100-150 ° C); The target is set to have a power of 5 to 8 kw and a magnesium oxide layer 133 is deposited. The time for depositing the magnesium oxide layer 133 is 20 to 40 minutes. The thickness of the magnesium oxide layer 133 is controlled to be 0.5 to 1.0 μm.

形成氧化鎂層133後,在該防腐蝕層13上形成色彩層15,該色彩層15為Ti-N膜層或Cr-N膜層。形成所述Ti-N膜層或Cr-N膜層的具體操作及工藝參數如下:關閉所述鎂靶的電源,開啟已置於所述鍍膜機內的一鈦靶或鉻靶的電源,設置其功率8~10kw,保持上述氬氣的流量不變,並向鍍膜室內通入流量為20~150sccm的反應氣體氮氣,沉積色彩層15。沉積該色彩層15的時間為20~30min。After the magnesium oxide layer 133 is formed, a color layer 15 is formed on the anti-corrosion layer 13, and the color layer 15 is a Ti-N film layer or a Cr-N film layer. The specific operation and process parameters for forming the Ti-N film layer or the Cr-N film layer are as follows: turning off the power of the magnesium target, turning on a power source of a titanium target or a chromium target placed in the coating machine, and setting The power is 8~10kw, the flow rate of the argon gas is kept unchanged, and a reaction gas nitrogen gas having a flow rate of 20 to 150 sccm is introduced into the coating chamber to deposit a color layer 15. The time for depositing the color layer 15 is 20 to 30 minutes.

本發明較佳實施方式的殼體10的製造方法,通過磁控濺射法依次於鎂或鎂合金基體11上形成防腐蝕層13及色彩層15。當殼體10處於腐蝕性介質中時,由於所述防腐蝕層13中的鎂及氧化鎂與鎂或鎂合金基體11之間的電位差小,減緩了殼體10發生微電池腐蝕的速率,從而提高了殼體10的耐腐蝕性。所述殼體10耐腐蝕性提高的同時,還可避免所述色彩層15發生異色、脫落等失效現象,從而使該殼體10經長時間使用後仍具有較好的裝飾性外觀。In the method of manufacturing the casing 10 of the preferred embodiment of the present invention, the anticorrosive layer 13 and the color layer 15 are sequentially formed on the magnesium or magnesium alloy substrate 11 by magnetron sputtering. When the casing 10 is in a corrosive medium, since the potential difference between the magnesium and the magnesium oxide in the anti-corrosion layer 13 and the magnesium or magnesium alloy substrate 11 is small, the rate at which the micro-cell is corroded by the casing 10 is slowed down, thereby The corrosion resistance of the casing 10 is improved. While the corrosion resistance of the casing 10 is improved, the color layer 15 can be prevented from being in a state of discoloration, falling off, etc., so that the casing 10 has a good decorative appearance after being used for a long time.

10...殼體10. . . case

11...鎂或鎂合金基體11. . . Magnesium or magnesium alloy matrix

13...防腐蝕層13. . . Anti-corrosion layer

131...鎂層131. . . Magnesium layer

133...氧化鎂層133. . . Magnesium oxide layer

15...色彩層15. . . Color layer

圖1為本發明較佳實施方式殼體的剖視示意圖。1 is a schematic cross-sectional view of a housing in accordance with a preferred embodiment of the present invention.

10...殼體10. . . case

11...鎂或鎂合金基體11. . . Magnesium or magnesium alloy matrix

13...防腐蝕層13. . . Anti-corrosion layer

131...鎂層131. . . Magnesium layer

133...氧化鎂層133. . . Magnesium oxide layer

15...色彩層15. . . Color layer

Claims (9)

一種殼體,包括鎂或鎂合金基體,形成於該鎂或鎂合金基體表面的防腐蝕層,及形成於防腐蝕層表面的色彩層,其改良在於:所述防腐蝕層包括依次形成於鎂或鎂合金基體表面的鎂層和氧化鎂層。A casing comprising a magnesium or magnesium alloy substrate, an anticorrosive layer formed on a surface of the magnesium or magnesium alloy substrate, and a color layer formed on a surface of the anticorrosive layer, wherein the anticorrosive layer comprises a magnesium layer formed in turn Or a magnesium layer and a magnesium oxide layer on the surface of the magnesium alloy substrate. 如申請專利範圍第1項所述之殼體,其中所述鎂層的厚度為1.0~3.0μm。The casing according to claim 1, wherein the magnesium layer has a thickness of 1.0 to 3.0 μm. 如申請專利範圍第1項所述之殼體,其中所述氧化鎂層的厚度為0.5~1.0μm。The casing according to claim 1, wherein the magnesium oxide layer has a thickness of 0.5 to 1.0 μm. 如申請專利範圍第1項所述之殼體,其中所述色彩層為Ti-N層或Cr-N層。The casing of claim 1, wherein the color layer is a Ti-N layer or a Cr-N layer. 如申請專利範圍第1項所述之殼體,其中所述防腐蝕層及色彩層以磁控濺射鍍膜法形成。The casing of claim 1, wherein the anti-corrosion layer and the color layer are formed by a magnetron sputtering coating method. 一種殼體的製造方法,其包括如下步驟:
提供鎂或鎂合金基體;
在該鎂或鎂合金基體上磁控濺射防腐蝕層,所述防腐蝕層包括依次形成於鎂或鎂合金基體表面的鎂層和氧化鎂層;
在該防腐蝕層上磁控濺射色彩層。
A method of manufacturing a housing, comprising the steps of:
Providing a magnesium or magnesium alloy matrix;
Magnetron sputtering an anti-corrosion layer on the magnesium or magnesium alloy substrate, the anti-corrosion layer comprising a magnesium layer and a magnesium oxide layer sequentially formed on a surface of the magnesium or magnesium alloy substrate;
A color layer is magnetron sputtered on the anti-corrosion layer.
如申請專利範圍第6項所述之殼體的製造方法,其中所述磁控濺射鎂層的工藝參數為:以氬氣為工作氣體,其流量為100~300sccm,設置佔空比為50%~80%,於鎂或鎂合金基體上施加-50~-100V的偏壓,以鎂為靶材,設置其功率為8~13kw,濺射溫度為80~120℃,濺射時間為30~60min。The method for manufacturing a casing according to claim 6, wherein the process parameter of the magnetron sputtering magnesium layer is: using argon as a working gas, the flow rate is 100~300 sccm, and the duty ratio is set to 50. %~80%, applying a bias voltage of -50~-100V on the magnesium or magnesium alloy substrate, using magnesium as the target, setting the power to 8~13kw, sputtering temperature 80~120°C, sputtering time 30 ~60min. 如申請專利範圍第6項所述之殼體的製造方法,其中所述磁控濺射氧化鎂層的工藝參數為:設置氬氣流量為100~300sccm,以氧氣為反應氣體,設置氧氣流量為50~100sccm,設置佔空比為50~80%,對基體施加-50~-100V的偏壓,選擇鎂為靶材,設置其功率為5~8kw,沉積氧化鎂層的時間為20~40min。The method for manufacturing a casing according to claim 6, wherein the process parameter of the magnetron sputtering magnesium oxide layer is: setting an argon gas flow rate of 100 to 300 sccm, using oxygen as a reaction gas, and setting the oxygen flow rate to 50~100sccm, set the duty ratio to 50~80%, apply a bias voltage of -50~-100V to the substrate, select magnesium as the target, set the power to 5~8kw, and deposit the magnesium oxide layer for 20~40min. . 如申請專利範圍第6項所述之殼體的製造方法,其中所述磁控濺射色彩層的工藝參數為:開啟一鈦靶或鉻靶的電源,設置其功率為8~10kw,設置氮氣流量為20~150sccm,濺射時間為20~30min。The method for manufacturing a casing according to claim 6, wherein the process parameter of the magnetron sputtering color layer is: turning on a power source of a titanium target or a chromium target, setting a power of 8 to 10 kW, and setting a nitrogen gas. The flow rate is 20~150sccm, and the sputtering time is 20~30min.
TW99139286A 2010-11-16 2010-11-16 Housing and method for making the same TWI468540B (en)

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Publication number Priority date Publication date Assignee Title
US20030150525A1 (en) * 2002-02-11 2003-08-14 Briles Owen M. Corrosion resistant, chromate-free conversion coating for magnesium alloys
TW200630495A (en) * 2005-02-24 2006-09-01 Shyi-Kaan Wu New surface treatment process on magnesium alloy products
TWI327178B (en) * 2004-06-18 2010-07-11 Hon Hai Prec Ind Co Ltd Method for surface treatment of magnesium alloy and product thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030150525A1 (en) * 2002-02-11 2003-08-14 Briles Owen M. Corrosion resistant, chromate-free conversion coating for magnesium alloys
TWI327178B (en) * 2004-06-18 2010-07-11 Hon Hai Prec Ind Co Ltd Method for surface treatment of magnesium alloy and product thereof
TW200630495A (en) * 2005-02-24 2006-09-01 Shyi-Kaan Wu New surface treatment process on magnesium alloy products

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