CN102477526B - Shell and manufacture method thereof - Google Patents
Shell and manufacture method thereof Download PDFInfo
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- CN102477526B CN102477526B CN201010553154.5A CN201010553154A CN102477526B CN 102477526 B CN102477526 B CN 102477526B CN 201010553154 A CN201010553154 A CN 201010553154A CN 102477526 B CN102477526 B CN 102477526B
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- magnesium
- layer
- alloy substrate
- housing
- color layers
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Abstract
The invention provides a shell, which comprises a magnesium or magnesium alloy substrate, and a magnesium silicide layer and a color layer formed orderly on the magnesium or magnesium alloy substrate. The color layer is a corrosion-resistant electric insulating layer. The shell has good corrosion resistant performance and decorative appearance. The invention further provides a manufacture method of the shell, comprising the steps of: providing the magnesium or magnesium alloy substrate; forming the magnesium silicide layer on the magnesium or magnesium alloy substrate by magnetic sputtering; and forming the color layer on the magnesium silicide layer by magnetic sputtering.
Description
Technical field
The present invention relates to a kind of housing and manufacture method thereof.
Background technology
Vacuum coating technology (PVD) is the film technique of a unusual environmental protection.The rete formed in the mode of vacuum plating have high rigidity, high-wearing feature, good chemical stability, with matrix in conjunction with advantages such as firm and beautiful metal appearances, therefore vacuum plating is more and more wider in the application of the ornamental process field of metallic substrate surface such as aluminium, aluminium alloy, magnesium, magnesium alloy and stainless steel.
But, because magnesium or the most obvious shortcoming of magnesium alloy are corrosion-resistant differences, and inevitably there is small hole in PVD decorative coating itself, therefore, directly in magnesium or magnesium alloy matrix surface plating such as TiN layer, TiNO layer, TiCN layer, CrN layer, CrNO layer, CrCN layer or other there is the PVD decorative coating of erosion resistance, effectively can not prevent described magnesium or magnesium alloy substrate generation galvanic corrosion, simultaneously this PVD decorative coating itself also can occur heterochromatic, the phenomenon such as come off.
Summary of the invention
Given this, provide a kind of and there is good erosion resistance and the housing of decorative appearance.
In addition, a kind of manufacture method of above-mentioned housing is also provided.
A kind of housing, comprise magnesium or magnesium alloy substrate, be formed at magnesium silicide layer on this magnesium or magnesium alloy substrate and color layers successively, this color layers is the electric insulation layer with Corrosion Protection, and the thickness of described magnesium silicide layer is 300 ~ 1000nm.
A manufacture method for housing, comprises the following steps:
Magnesium or magnesium alloy substrate are provided;
On this magnesium or magnesium alloy substrate, magnetron sputtering forms magnesium silicide layer;
On this magnesium silicide layer, magnetron sputtering forms color layers, and this color layers is the electric insulation layer with Corrosion Protection.
The housing formed through above-mentioned manufacture method has good erosion resistance, major cause has following 3 points: (1) due to described color layers be electric insulation layer, make housing not easily form the negative electrode and positive electrode occurred required for galvanic corrosion, thus improve the erosion resistance of housing; (2) between the Mg-Si phase in described magnesium silicide layer and MAGNESIUM METAL, there is good mutual diffusion, not only can strengthen the bonding force between magnesium silicide layer and magnesium or magnesium alloy substrate, also can improve the compactness of described magnesium silicide layer, corrosive gases/liquid so can be hindered to magnesium silicide layer internal divergence, thus improve the erosion resistance of described housing; (3) because Mg-Si phase itself has good erosion resistance, can further improve the erosion resistance of described housing.
In addition, due to the raising of described housing corrosion resistance nature, and this color layers itself has Corrosion Protection, therefore can avoid that color layers is heterochromatic, the generation of the failure phenomenon such as to come off, thus makes this housing still have good decorative appearance after long-time use.
Accompanying drawing explanation
Fig. 1 is the sectional view of the housing of present pre-ferred embodiments.
Main element nomenclature
Housing 10
Magnesium or magnesium alloy substrate 11
Magnesium silicide layer 13
Color layers 15
Titanium dioxide layer 151
Silicon dioxide layer 153
Embodiment
Refer to Fig. 1, the housing 10 of a preferred embodiment of the present invention comprises magnesium or magnesium alloy substrate 11, is formed at magnesium silicide (Mg on this magnesium or magnesium alloy substrate 11 successively
2si) layer 13 and color layers 15.This housing 10 can be the housing of 3C electronic product, also can be the component etc. of rims of spectacle, the vehicles such as building appliance and automobile etc.
Described Mg
2the thickness of Si layer 13 is 300 ~ 1000nm.
Described color layers 15 is for having the electric insulation layer of Corrosion Protection.This color layers comprises and is formed at Mg successively
2titanium dioxide (TiO on Si layer 13
2) layer 151 and silicon-dioxide (SiO
2) layer 153.This TiO
2the thickness of layer 151 is 50 ~ 150nm, this SiO
2the thickness of layer 153 is 50 ~ 150nm.
Described Mg
2si layer 13 and color layers 15 are all by magnetron sputtering method formation of deposits.Be appreciated that described Mg
2si layer 13 and color layers 15 are also formed by other Vacuum Coating methods such as arc ion plating method, evaporation coating methods.
The method of the described housing 10 of manufacture of a preferred embodiment of the present invention mainly comprises the steps:
Magnesium or magnesium alloy substrate 11 are provided, and magnesium or magnesium alloy substrate 11 are ground and electropolishing successively.After electropolishing, then with deionized water and dehydrated alcohol, wiping is carried out to this magnesium or magnesium alloy substrate 11 surface successively.Again the magnesium after wiping or magnesium alloy substrate 11 are put into the ultrasonic cleaner being loaded with acetone soln and carry out vibrations cleaning, to remove the impurity on magnesium or magnesium alloy substrate 11 surface and greasy dirt etc.Dry up for subsequent use after cleaning.
Argon plasma cleaning is carried out to the surface of the magnesium after above-mentioned process or magnesium alloy substrate 11, removes the greasy dirt on magnesium or magnesium alloy substrate 11 surface further, to improve the bonding force of magnesium or magnesium alloy substrate 11 surface and follow-up coating.Concrete operations and the processing parameter of this plasma clean can be: adopt a medium frequency magnetron sputtering coating equipment (not shown), put on the work rest of the coating chamber of this coating equipment by magnesium or magnesium alloy substrate 11, vacuumizing process to vacuum tightness to this coating chamber is 8.0 × 10
-3pa, with 250 ~ 500sccm(standard state ml/min) flow in coating chamber, pass into the argon gas that purity is 99.999%, on magnesium or magnesium alloy substrate 11, apply the bias voltage of-500 ~-800V, carry out plasma clean to magnesium or magnesium alloy substrate 11 surface, scavenging period is 3 ~ 10min.
After plasma clean is carried out to magnesium or magnesium alloy substrate 11, on this magnesium or magnesium alloy substrate 11, form Mg
2si layer 13.Form this Mg
2concrete operations and the processing parameter of Si layer 13 are as follows: take argon gas as working gas, adjustment argon flow amount is 150 ~ 300sccm, arranging dutycycle is 30% ~ 70%, the bias voltage of-50 ~-300V is applied on magnesium or magnesium alloy substrate 11, and heating film-coated room to 50 ~ 150 DEG C (namely sputter temperature is 50 ~ 150 DEG C); Open the magnesium silicide (Mg be installed in this coating equipment
2si) power supply of target, arranging its power is 5 ~ 10kw, deposition Mg
2si layer 13.Deposit this Mg
2the time of Si layer 13 is 30 ~ 120min.
Form described Mg
2after Si layer 13, on this magnesium or magnesium alloy substrate 11, form color layers 15, this color layers 15 comprises and is formed at this Mg successively
2tiO on Si layer 13
2layer 151 and SiO
2layer 153.Formed described color layers 15 concrete operations and processing parameter as follows:
Close the power supply of described magnesium silicide target, take oxygen as reactant gases, the oxygen that flow is 10 ~ 80sccm is passed in coating chamber, keep the flow of described argon gas, put on the bias voltage of magnesium or magnesium alloy substrate 11 and sputter temperature constant, open the power supply being installed on titanium (Ti) target in described coating chamber, arranging its power is 5 ~ 10kw, in described Mg
2depositing Ti O on Si layer 13
2layer 151.Deposit this TiO
2the time of layer 151 is 2 ~ 30min.
Form this TiO
2after layer 151, keep the flow of the flow of described argon gas, oxygen, put on the bias voltage of magnesium or magnesium alloy substrate 11 and sputter temperature constant, open the power supply being installed on silicon (Si) target in coating chamber, arranging its power is 5 ~ 10kw, in described TiO
2layer 151 deposits SiO
2layer 153.Deposit this SiO
2the time of layer 153 is 2 ~ 30min.
The housing 10 formed through above-mentioned manufacture method has good erosion resistance, and major cause has following 3 points: (1) is due to described TiO
2layer 151 and SiO
2layer 153 is insulation layer, makes housing 10 not easily form the negative electrode and positive electrode occurred required for galvanic corrosion, thus improves the erosion resistance of housing 10; (2) described Mg
2between Mg-Si phase in Si layer 13 and MAGNESIUM METAL, there is good mutual diffusion, not only can strengthen Mg
2bonding force between Si layer 13 and magnesium or magnesium alloy substrate 11, also can improve described Mg
2the compactness of Si layer 13, so can hinder corrosive gases/liquid to Mg
2si layer 13 internal divergence, thus the erosion resistance improving described housing 10; (3) described Mg-Si phase itself has good erosion resistance, can further improve the erosion resistance of described housing 10.
In addition, due to the raising of described housing 10 corrosion resistance nature, and this color layers 15 itself has non-corrosibility, therefore can avoid that color layers 15 is heterochromatic, the generation of the failure phenomenon such as to come off, thus make this housing 10 still have good decorative appearance after using for a long time.
In addition, while guarantee has good bonding force, erosion resistance, also by changing the composition of color layers 15 to the flow of reactant gases oxygen and the control of depositing time, thus make color layers 15 present the intermediate color of green, blueness, yellow and the color such as red and above-mentioned color, to enrich the decorative appearance of described housing 10.
Claims (7)
1. a housing, the color layers comprising magnesium or magnesium alloy substrate and be formed on this magnesium or magnesium alloy substrate, it is characterized in that: this color layers is the electric insulation layer with Corrosion Protection, this housing also comprises and is formed at described magnesium or the magnesium silicide layer between magnesium alloy substrate and color layers, described color layers comprises and is formed at titanium dioxide layer on magnesium silicide layer and silicon dioxide layer successively, and the thickness of described magnesium silicide layer is 300 ~ 1000nm.
2. housing as claimed in claim 1, it is characterized in that: the thickness of titanium dioxide layer is 50 ~ 150nm, the thickness of described silicon dioxide layer is 50 ~ 150nm.
3. housing as claimed in claim 1, is characterized in that: described magnesium silicide layer and color layers are formed with magnetron sputtering embrane method, arc ion plating method or evaporation coating method.
4. a manufacture method for housing, comprises the following steps:
Magnesium or magnesium alloy substrate are provided;
On this magnesium or magnesium alloy substrate, magnetron sputtering forms magnesium silicide layer;
On this magnesium silicide layer, magnetron sputtering forms color layers, and this color layers is the electric insulation layer with Corrosion Protection, and color layers described in magnetron sputtering comprises the step sputtering titanium dioxide layer and silicon dioxide layer successively.
5. the manufacture method of housing as claimed in claim 4, it is characterized in that: described in magnetron sputtering, magnesium silicide layer realizes as follows: take argon gas as working gas, its flow is 150 ~ 300sccm, arranging dutycycle is 30% ~ 70%, on magnesium or magnesium alloy substrate, apply the bias voltage of-50 ~-300V, with magnesium silicide target for target, arranging its power is 5 ~ 10kw, sputter temperature is 50 ~ 150 DEG C, and sputtering time is 30 ~ 120min.
6. the manufacture method of housing as claimed in claim 4, it is characterized in that: magnetron sputtering forms described titanium dioxide layer and realizes as follows: take argon gas as working gas, its flow is 150 ~ 300sccm, take oxygen as reactant gases, its flow is 10 ~ 80sccm, applies the bias voltage of-50 ~-180V in magnesium or magnesium alloy substrate, with titanium target for target, arranging its power is 5 ~ 10kw, and sputter temperature is 50 ~ 150 DEG C, and sputtering time is 2 ~ 30min.
7. the manufacture method of housing as claimed in claim 4, it is characterized in that: magnetron sputtering forms described silicon dioxide layer and realizes as follows: take argon gas as working gas, its flow is 150 ~ 300sccm, take oxygen as reactant gases, its flow is 10 ~ 80sccm, applies the bias voltage of-50 ~-180V in magnesium or magnesium alloy substrate, take silicon target as target, arranging its power is 5 ~ 10kw, and sputter temperature is 50 ~ 150 DEG C, and sputtering time is 2 ~ 30min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010553154.5A CN102477526B (en) | 2010-11-22 | 2010-11-22 | Shell and manufacture method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010553154.5A CN102477526B (en) | 2010-11-22 | 2010-11-22 | Shell and manufacture method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102477526A CN102477526A (en) | 2012-05-30 |
| CN102477526B true CN102477526B (en) | 2015-02-04 |
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ID=46090307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010553154.5A Expired - Fee Related CN102477526B (en) | 2010-11-22 | 2010-11-22 | Shell and manufacture method thereof |
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| Country | Link |
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| CN (1) | CN102477526B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105200382B (en) * | 2015-10-27 | 2018-04-13 | 福州大学 | A kind of Ge adulterates Mg2Si base thermal electric films and preparation method thereof |
| CN105568232A (en) * | 2016-02-25 | 2016-05-11 | 李田煌 | Technology for vacuum plating of emerald stainless steel plate |
Citations (6)
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|---|---|---|---|---|
| CN1858296A (en) * | 2006-06-08 | 2006-11-08 | 哈尔滨工业大学 | Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition |
| CN1873050A (en) * | 2005-06-03 | 2006-12-06 | 北京师范大学 | Vacuum tempering method for treating workpieces of ion implanted metal material |
| CN101070592A (en) * | 2007-06-14 | 2007-11-14 | 上海交通大学 | Composite ion-injection surface modification method for copper and its alloy |
| CN101220493A (en) * | 2006-10-16 | 2008-07-16 | 杜克勤 | Surface ceramic method for aluminum, magnesium alloy and product thereof |
| CN101798674A (en) * | 2010-04-15 | 2010-08-11 | 贵州大学 | Process for preparing environment-friendly semiconductor material Mg2Si film by electron beam evaporation method |
| CN201567375U (en) * | 2009-12-28 | 2010-09-01 | 重庆理工大学 | Corrosion-Proof coating on surface of magnesium alloy |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1207441C (en) * | 2002-06-14 | 2005-06-22 | 中国科学院金属研究所 | Method of risisting high-temp. oxidation and heat corrosion for high-temp. alloy |
| JP4686690B2 (en) * | 2004-07-08 | 2011-05-25 | 株式会社東京大学Ｔｌｏ | Magnesium-based composite powder, magnesium-based alloy material, and production method thereof |
| CN101629287B (en) * | 2009-08-17 | 2011-03-23 | 浙江省缙云县三鼎实业有限公司 | Magnesium alloy surface treatment process |
-
2010
- 2010-11-22 CN CN201010553154.5A patent/CN102477526B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1873050A (en) * | 2005-06-03 | 2006-12-06 | 北京师范大学 | Vacuum tempering method for treating workpieces of ion implanted metal material |
| CN1858296A (en) * | 2006-06-08 | 2006-11-08 | 哈尔滨工业大学 | Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition |
| CN101220493A (en) * | 2006-10-16 | 2008-07-16 | 杜克勤 | Surface ceramic method for aluminum, magnesium alloy and product thereof |
| CN101070592A (en) * | 2007-06-14 | 2007-11-14 | 上海交通大学 | Composite ion-injection surface modification method for copper and its alloy |
| CN201567375U (en) * | 2009-12-28 | 2010-09-01 | 重庆理工大学 | Corrosion-Proof coating on surface of magnesium alloy |
| CN101798674A (en) * | 2010-04-15 | 2010-08-11 | 贵州大学 | Process for preparing environment-friendly semiconductor material Mg2Si film by electron beam evaporation method |
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| Publication number | Publication date |
|---|---|
| CN102477526A (en) | 2012-05-30 |
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Effective date of registration: 20170407 Address after: Foxconn C01, 369 South Road, Anci District, Hebei, Langfang Patentee after: Youo industrial materials (Langfang) Co., Ltd. Address before: 518109 Guangdong city of Shenzhen province Baoan District Longhua Town Industrial Zone tabulaeformis tenth East Ring Road No. 2 two Patentee before: Hongfujin Precise Industry (Shenzhen) Co., Ltd. Patentee before: Hon Hai Precision Industry Co., Ltd. |
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Granted publication date: 20150204 Termination date: 20201122 |
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