CN102477526A - Shell and manufacture method thereof - Google Patents

Shell and manufacture method thereof Download PDF

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Publication number
CN102477526A
CN102477526A CN2010105531545A CN201010553154A CN102477526A CN 102477526 A CN102477526 A CN 102477526A CN 2010105531545 A CN2010105531545 A CN 2010105531545A CN 201010553154 A CN201010553154 A CN 201010553154A CN 102477526 A CN102477526 A CN 102477526A
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China
Prior art keywords
magnesium
housing
layer
alloy substrate
color layers
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CN2010105531545A
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Chinese (zh)
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CN102477526B (en
Inventor
张新倍
陈文荣
蒋焕梧
陈正士
张满喜
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Youo Industrial Materials (langfang) Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN201010553154.5A priority Critical patent/CN102477526B/en
Publication of CN102477526A publication Critical patent/CN102477526A/en
Application granted granted Critical
Publication of CN102477526B publication Critical patent/CN102477526B/en
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Abstract

The invention provides a shell, which comprises a magnesium or magnesium alloy substrate, and a magnesium silicide layer and a color layer formed orderly on the magnesium or magnesium alloy substrate. The color layer is a corrosion-resistant electric insulating layer. The shell has good corrosion resistant performance and decorative appearance. The invention further provides a manufacture method of the shell, comprising the steps of: providing the magnesium or magnesium alloy substrate; forming the magnesium silicide layer on the magnesium or magnesium alloy substrate by magnetic sputtering; and forming the color layer on the magnesium silicide layer by magnetic sputtering.

Description

Housing and method of manufacture thereof
Technical field
The present invention relates to a kind of housing and method of manufacture thereof.
Background technology
Vacuum coating technology (PVD) is a very film technique of environmental protection.With the formed rete of the mode of vacuum plating have high firmness, high-wearing feature, good chemicalstability, with matrix bond firmly and advantage such as bright metal appearance, so vacuum plating is more and more wider in the application of the ornamental process field of metallic substrate surface such as aluminium, duraluminum, magnesium, magnesiumalloy and stainless steel.
Yet; Because the significant disadvantages of magnesium or magnesiumalloy is corrosion-resistant poor; And inevitably can there be micro pores in itself the PVD decorative coating, therefore, directly has the PVD decorative coating of erosion resistance in magnesium or magnesium alloy matrix surface plating such as TiN layer, TiNO layer, TiCN layer, CrN layer, CrNO layer, CrCN layer or other; Can not effectively prevent said magnesium or magnesium alloy substrate generation galvanic corrosion, simultaneously this PVD decorative coating itself also can take place heterochromatic, phenomenon such as come off.
Summary of the invention
Given this, a kind of housing with good anti-corrosion and decorative appearance is provided.
A kind of method of manufacture of above-mentioned housing also is provided in addition.
A kind of housing comprises magnesium or magnesium alloy substrate, is formed at magnesium silicide layer and color layers on this magnesium or the magnesium alloy substrate successively, and this color layers is the electric insulation layer with Corrosion Protection.
A kind of method of manufacture of housing may further comprise the steps:
Magnesium or magnesium alloy substrate are provided;
Magnetron sputtering forms the magnesium silicide layer on this magnesium or magnesium alloy substrate;
Magnetron sputtering forms color layers on this magnesium silicide layer, and this color layers is the electric insulation layer with Corrosion Protection.
The housing that forms through above-mentioned method of manufacture has good anti-corrosion; Major cause has following 3 points: (1) is because said color layers is an electric insulation layer; Make housing be difficult for forming needed negative electrode of galvanic corrosion and anode take place, thereby improved the erosion resistance of housing; (2) Mg-Si in the said magnesium silicide layer has good mutual diffusion property mutually and between the MAGNESIUM METAL 99; Not only can strengthen the bonding force between magnesium silicide layer and magnesium or the magnesium alloy substrate; Also can improve the compactness of said magnesium silicide layer; So can hinder corrosive gases/liquid to magnesium silicide layer internal divergence, thereby improve the erosion resistance of said housing; (3) because Mg-Si itself has erosion resistance preferably mutually, can further improve the erosion resistance of said housing.
In addition, because the raising of said housing corrosion resistance nature, and this color layers itself has Corrosion Protection, can avoid therefore that color layers is heterochromatic, the generation of failure phenomenon such as come off, thereby makes this housing after long-time use, still have decorative appearance preferably.
Description of drawings
Fig. 1 is the sectional view of the housing of preferred embodiment of the present invention.
The main element nomenclature
Housing 10
Magnesium or magnesium alloy substrate 11
Magnesium silicide layer 13
Color layers 15
Titanium dioxide layer 151
Silicon dioxide layer 153
Embodiment
See also Fig. 1, the housing 10 of the present invention's one preferred embodiment comprises magnesium or magnesium alloy substrate 11, is formed at magnesium silicide (Mg on this magnesium or the magnesium alloy substrate 11 successively 2Si) layer 13 and color layers 15.This housing 10 can be the housing of 3C electronic product, also can be the component of the vehicles such as rims of spectacle, building appliance and automobile etc.
Said Mg 2The thickness of Si layer 13 is 300~1000nm.
Said color layers 15 is for having the electric insulation layer of Corrosion Protection.This color layers comprises and is formed at Mg successively 2Titanium oxide (TiO on the Si layer 13 2) layer 151 and silicon-dioxide (SiO 2) layer 153.This TiO 2The thickness of layer 151 is 50~150nm, this SiO 2The thickness of layer 153 is 50~150nm.
Said Mg 2Si layer 13 and color layers 15 all can be passed through the magnetron sputtering method formation of deposits.Be appreciated that said Mg 2Si layer 13 and color layers 15 also can be passed through other Vacuum Coating methods such as arc ion plating method, evaporation coating method and form.
The method of the said housing 10 of manufacturing of the present invention's one preferred embodiment mainly comprises the steps:
Magnesium or magnesium alloy substrate 11 are provided, and magnesium or magnesium alloy substrate 11 are ground and electropolishing successively.Behind the electropolishing, with deionized water and absolute ethyl alcohol this magnesium or magnesium alloy substrate 11 surfaces are carried out wiping successively again.Again the magnesium after the wiping or magnesium alloy substrate 11 are put into the ultrasonic cleaner that is loaded with acetone soln and shake cleaning, with the impurity of removing magnesium or magnesium alloy substrate 11 surfaces and greasy dirt etc.Dry up subsequent use after cleaning finishes.
Argon plasma is carried out on the surface of magnesium after above-mentioned processing or magnesium alloy substrate 11 clean, further remove the greasy dirt on magnesium or magnesium alloy substrate 11 surfaces, to improve magnesium or magnesium alloy substrate 11 surfaces and follow-up coating's adhesion.Concrete operations and processing parameter that this plasma body cleans can be: adopt a medium frequency magnetron sputtering coating equipment (figure does not show); Magnesium or magnesium alloy substrate 11 are put on the work rest of coating chamber of this coating equipment, to this coating chamber vacuumize handle to vacuum tightness be 8.0 * 10 -3Pa; In coating chamber, feeding purity with the flow of 250~500sccm (standard state ml/min) is 99.999% argon gas; On magnesium or magnesium alloy substrate 11, apply-500~-bias voltage of 800V, magnesium or magnesium alloy substrate 11 surfaces are carried out plasma clean, scavenging period is 3~10min.
After magnesium or magnesium alloy substrate 11 are carried out plasma clean, on this magnesium or magnesium alloy substrate 11, form Mg 2Si layer 13.Form this Mg 2The concrete operations and the processing parameter of Si layer 13 are following: be working gas with the argon gas; Regulating argon flow amount is 150~300s ccm; It is 30%~70% that dutycycle is set; On magnesium or magnesium alloy substrate 11, apply-50~-bias voltage of 300V, and heating coating chamber to 50~150 ℃ (being that sputter temperature is 50~150); Open the magnesium silicide (Mg that has been installed in this coating equipment 2Si) power supply of target, it is 5~10kw that its power is set, deposition Mg 2Si layer 13.Deposit this Mg 2The time of Si layer 13 is 30~120min.
Form said Mg 2Behind the Si layer 13, on this magnesium or magnesium alloy substrate 11, form color layers 15, this color layers 15 comprises and is formed at this Mg successively 2TiO on the Si layer 13 2 Layer 151 and SiO 2Layer 153.Form said color layers 15 concrete operations and processing parameter following:
Close the power supply of said magnesium silicide target; With oxygen is reactant gases; In coating chamber, feeding flow is the oxygen of 10~80sccm, keep said argon gas flow, put on magnesium or magnesium alloy substrate 11 bias voltage and sputter temperature constant, open the power supply that has been installed on titanium (Ti) target in the said coating chamber; It is 5~10kw that its power is set, in said Mg 2Depositing Ti O on the Si layer 13 2Layer 151.Deposit this TiO 2The time of layer 151 is 2~30min.
Form this TiO 2Behind the layer 151, keep flow, the oxygen of said argon gas flow, put on magnesium or magnesium alloy substrate 11 bias voltage and sputter temperature constant, open the power supply that has been installed on silicon (Si) target in the coating chamber, it is 5~10kw that its power is set, in said TiO 2Deposit SiO on the layer 151 2Layer 153.Deposit this SiO 2The time of layer 153 is 2~30min.
The housing 10 that forms through above-mentioned method of manufacture has good anti-corrosion, and major cause has following 3 points: (1) is because said TiO 2 Layer 151 and SiO 2 Layer 153 is an insulation layer, makes housing 10 be difficult for forming needed negative electrode of galvanic corrosion and anode take place, thereby improved the erosion resistance of housing 10; (2) said Mg 2Mg-Si in the Si layer 13 has good mutual diffusion property mutually and between the MAGNESIUM METAL 99, not only can strengthen Mg 2Bonding force between Si layer 13 and magnesium or the magnesium alloy substrate 11 also can improve said Mg 2The compactness of Si layer 13 so can hinder corrosive gases/liquid to Mg 2Si layer 13 internal divergence, thus the erosion resistance of said housing 10 improved; (3) said Mg-Si itself has erosion resistance preferably mutually, can further improve the erosion resistance of said housing 10.
In addition; Because the raising of said housing 10 corrosion resistance natures; Therefore and this color layers 15 itself has non-corrosibility, can avoid that color layers is 15 heterochromatic, the generation of failure phenomenon such as come off, thereby makes this housing 10 after long-time use, still have decorative appearance preferably.
In addition; When guaranteeing to have preferably bonding force, erosion resistance; Also can change the composition of color layers 15 through control to the flow of reactant gases oxygen and depositing time; Thereby make color layers 15 demonstrate the intermediate color of colors such as green, blueness, yellow and redness and above-mentioned color, to enrich the decorative appearance of said housing 10.

Claims (10)

1. housing; Comprise magnesium or magnesium alloy substrate and be formed at the color layers on this magnesium or the magnesium alloy substrate; It is characterized in that: this color layers is the electric insulation layer with Corrosion Protection, and this housing also comprises the magnesium silicide layer that is formed between said magnesium or magnesium alloy substrate and the color layers.
2. housing as claimed in claim 1 is characterized in that: the thickness of said magnesium silicide layer is 300~1000nm.
3. housing as claimed in claim 1 is characterized in that: said color layers comprises titanium dioxide layer and the silicon dioxide layer that is formed at successively on the magnesium silicide layer.
4. housing as claimed in claim 3 is characterized in that: the thickness of titanium dioxide layer is 50~150nm, and the thickness of said silicon dioxide layer is 50~150nm.
5. housing as claimed in claim 1 is characterized in that: said magnesium silicide layer and color layers form with magnetron sputtering embrane method, arc ion plating method or evaporation coating method.
6. the method for manufacture of a housing may further comprise the steps:
Magnesium or magnesium alloy substrate are provided;
Magnetron sputtering forms the magnesium silicide layer on this magnesium or magnesium alloy substrate;
Magnetron sputtering forms color layers on this magnesium silicide layer, and this color layers is the electric insulation layer with Corrosion Protection.
7. the method for manufacture of housing as claimed in claim 6, it is characterized in that: the said magnesium silicide layer of magnetron sputtering is realized as follows: be working gas with the argon gas, its flow is 150~300sccm; It is 30%~70% that dutycycle is set; On magnesium or magnesium alloy substrate, apply-50~-bias voltage of 300V, be target with the magnesium silicide target, it is 5~10kw that its power is set; Sputter temperature is 50~150 ℃, and sputtering time is 30~120min.
8. the method for manufacture of housing as claimed in claim 6 is characterized in that: the said color layers of magnetron sputtering comprises the step of sputter titanium dioxide layer and silicon dioxide layer successively.
9. the method for manufacture of housing as claimed in claim 8, it is characterized in that: magnetron sputtering forms said titanium dioxide layer and realizes as follows: be working gas with the argon gas, its flow is 150~300sccm; With oxygen is reactant gases, and its flow is 10~80sccm, in magnesium or magnesium alloy substrate apply-50~-bias voltage of 180V; With the titanium target is target; It is 5~10kw that its power is set, and sputter temperature is 50~150 ℃, and sputtering time is 2~30min.
10. the method for manufacture of housing as claimed in claim 9, it is characterized in that: magnetron sputtering forms said silicon dioxide layer and realizes as follows: be working gas with the argon gas, its flow is 150~300sccm; With oxygen is reactant gases, and its flow is 10~80sccm, in magnesium or magnesium alloy substrate apply-50~-bias voltage of 180V; With the silicon target is target; It is 5~10kw that its power is set, and sputter temperature is 50~150 ℃, and sputtering time is 2~30min.
CN201010553154.5A 2010-11-22 2010-11-22 Shell and manufacture method thereof Expired - Fee Related CN102477526B (en)

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CN102477526B CN102477526B (en) 2015-02-04

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105200382A (en) * 2015-10-27 2015-12-30 福州大学 Ge-doped Mg2Si-base thermoelectric film and preparation method thereof
CN105568232A (en) * 2016-02-25 2016-05-11 李田煌 Technology for vacuum plating of emerald stainless steel plate

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1465745A (en) * 2002-06-14 2004-01-07 中国科学院金属研究所 Method of risisting high-temp. oxidation and heat corrosion for high-temp. alloy
CN1858296A (en) * 2006-06-08 2006-11-08 哈尔滨工业大学 Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition
CN1873050A (en) * 2005-06-03 2006-12-06 北京师范大学 Vacuum tempering method for treating workpieces of ion implanted metal material
CN1980760A (en) * 2004-07-08 2007-06-13 株式会社东京大学Tlo Magnesium-base composite powder, magnesium-base alloy material and method for production thereof
CN101070592A (en) * 2007-06-14 2007-11-14 上海交通大学 Composite ion-injection surface modification method for copper and its alloy
CN101220493A (en) * 2006-10-16 2008-07-16 杜克勤 Surface ceramic method for aluminum, magnesium alloy and product thereof
CN101629287A (en) * 2009-08-17 2010-01-20 浙江省缙云县三鼎实业有限公司 Magnesium alloy surface treatment process
CN101798674A (en) * 2010-04-15 2010-08-11 贵州大学 Process for preparing environment-friendly semiconductor material Mg2Si film by electron beam evaporation method
CN201567375U (en) * 2009-12-28 2010-09-01 重庆理工大学 Corrosion-Proof coating on surface of magnesium alloy

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1465745A (en) * 2002-06-14 2004-01-07 中国科学院金属研究所 Method of risisting high-temp. oxidation and heat corrosion for high-temp. alloy
CN1980760A (en) * 2004-07-08 2007-06-13 株式会社东京大学Tlo Magnesium-base composite powder, magnesium-base alloy material and method for production thereof
CN1873050A (en) * 2005-06-03 2006-12-06 北京师范大学 Vacuum tempering method for treating workpieces of ion implanted metal material
CN1858296A (en) * 2006-06-08 2006-11-08 哈尔滨工业大学 Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition
CN101220493A (en) * 2006-10-16 2008-07-16 杜克勤 Surface ceramic method for aluminum, magnesium alloy and product thereof
CN101070592A (en) * 2007-06-14 2007-11-14 上海交通大学 Composite ion-injection surface modification method for copper and its alloy
CN101629287A (en) * 2009-08-17 2010-01-20 浙江省缙云县三鼎实业有限公司 Magnesium alloy surface treatment process
CN201567375U (en) * 2009-12-28 2010-09-01 重庆理工大学 Corrosion-Proof coating on surface of magnesium alloy
CN101798674A (en) * 2010-04-15 2010-08-11 贵州大学 Process for preparing environment-friendly semiconductor material Mg2Si film by electron beam evaporation method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105200382A (en) * 2015-10-27 2015-12-30 福州大学 Ge-doped Mg2Si-base thermoelectric film and preparation method thereof
CN105200382B (en) * 2015-10-27 2018-04-13 福州大学 A kind of Ge adulterates Mg2Si base thermal electric films and preparation method thereof
CN105568232A (en) * 2016-02-25 2016-05-11 李田煌 Technology for vacuum plating of emerald stainless steel plate

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Effective date of registration: 20170407

Address after: Foxconn C01, 369 South Road, Anci District, Hebei, Langfang

Patentee after: Youo industrial materials (Langfang) Co., Ltd.

Address before: 518109 Guangdong city of Shenzhen province Baoan District Longhua Town Industrial Zone tabulaeformis tenth East Ring Road No. 2 two

Patentee before: Hongfujin Precise Industry (Shenzhen) Co., Ltd.

Patentee before: Hon Hai Precision Industry Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20150204

Termination date: 20201122