TW201313929A - Coated articles and method for making the same - Google Patents

Coated articles and method for making the same Download PDF

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Publication number
TW201313929A
TW201313929A TW100135127A TW100135127A TW201313929A TW 201313929 A TW201313929 A TW 201313929A TW 100135127 A TW100135127 A TW 100135127A TW 100135127 A TW100135127 A TW 100135127A TW 201313929 A TW201313929 A TW 201313929A
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Taiwan
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layer
target
coating
bonding layer
substrate
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TW100135127A
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Chinese (zh)
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Cheng-Shi Chen
Cong Li
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Hon Hai Prec Ind Co Ltd
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Abstract

A coated article is provided which includes a substrate, a anodic oxide film deposited on the substrate, a bonding layer deposited on the anodic oxide film and a vacuum coating layer deposited on the anodic oxide film. The bonding layer is Ti layer or Cr layer. The vacuum coating layer is silicon dioxide layer or aluminium oxide layer. The coated article present a bumpy and high level of brightness appearance. Method for making the coated article is also provided.

Description

鍍膜件及其製造方法Coating member and manufacturing method thereof

本發明涉及一種鍍膜件及其製造方法。The invention relates to a coated member and a method of manufacturing the same.

習知技術,採用陽極氧化處理的方式在鋁或鋁合金表面形成一陽極氧化膜,在一定程度上可改善鋁或鋁合金基體的硬度、耐磨性、耐腐蝕性及裝飾性,但陽極氧化膜存在表面粗糙、暗啞的缺點。Conventional technology, anodizing treatment is used to form an anodized film on the surface of aluminum or aluminum alloy, which can improve the hardness, wear resistance, corrosion resistance and decoration of aluminum or aluminum alloy matrix to some extent, but anodizing The film has the disadvantage of being rough and dull.

採用噴塗的方式於陽極氧化膜上噴塗一透明油漆層,可改善陽極氧化處理產品表面的觸感;但噴塗過程中容易產生積漆、油漆層厚度不均等不良現象,且噴塗形成的塗層厚度較厚,如此將導致陽極氧化膜的顏色發生偏差、光澤度下降。此外,噴塗工藝易於造成環境污染。用真空鍍膜方式代替噴塗形成一透明狀的真空鍍膜層可解決上述技術問題,但由於陽極氧化膜與真空鍍膜層之間存在較大的內應力,易於導致膜層發生開裂、剝落等現象。Spraying a transparent paint layer on the anodized film can improve the touch of the surface of the anodized product; however, the paint process, the thickness of the paint layer are uneven, and the thickness of the coating formed by spraying is easy to occur during the spraying process. Thicker, this will result in a deviation in the color of the anodized film and a decrease in gloss. In addition, the spraying process is prone to environmental pollution. The vacuum coating method is used instead of spraying to form a transparent vacuum coating layer to solve the above technical problem. However, due to the large internal stress between the anodized film and the vacuum coating layer, cracking and peeling of the film layer are likely to occur.

鑒於此,本發明提供一種可解決上述問題的鍍膜件。In view of this, the present invention provides a coated member that can solve the above problems.

另外,本發明還提供一種上述鍍膜件的製造方法。Further, the present invention provides a method of manufacturing the above-mentioned coated member.

一種鍍膜件,包括基體、依次形成於基體上的陽極氧化膜、結合層及真空鍍膜層,所述結合層為鈦層或鉻層,所述真空鍍膜層為二氧化矽層或氧化鋁層。A coated member comprises a substrate, an anodized film sequentially formed on the substrate, a bonding layer and a vacuum coating layer, wherein the bonding layer is a titanium layer or a chromium layer, and the vacuum coating layer is a ceria layer or an aluminum oxide layer.

一種鍍膜件的製造方法,其包括如下步驟:A method of manufacturing a coated member, comprising the steps of:

提供基體;Providing a substrate;

藉由陽極氧化處理的方式,在該基體的表面形成陽極氧化膜;Forming an anodized film on the surface of the substrate by anodizing;

對所述陽極氧化膜表面進行拋光處理;Polishing the surface of the anodized film;

採用真空鍍膜法,以鈦靶或鉻靶為靶材,在拋光後的陽極氧化膜上形成結合層,所述結合層為鈦層或鉻層;Using a vacuum coating method, using a titanium target or a chromium target as a target, forming a bonding layer on the polished anodized film, the bonding layer being a titanium layer or a chromium layer;

採用真空鍍膜法,以矽靶或鋁靶為靶材,以氧氣為反應氣體,在結合層上形成真空鍍膜層,該真空鍍膜層為二氧化矽層或氧化鋁層。The vacuum coating method is adopted, and a vacuum target layer is formed on the bonding layer by using a ruthenium target or an aluminum target as a target and oxygen as a reaction gas, and the vacuum coating layer is a ruthenium dioxide layer or an aluminum oxide layer.

本發明對所述陽極氧化膜進行拋光處理,且所述結合層及真空鍍膜層均為無色透明狀,使所述鍍膜件在呈現陽極氧化處理的外觀的同時呈現出高的光澤度。所述結合層的形成可提高所述真空鍍膜層與陽極氧化膜之間的結合力,進而避免所述陽極氧化膜與真空鍍膜層直接結合而導致真空鍍膜層發生開裂、剝落等現象。所述真空鍍膜層本身具有良好的硬度及耐磨性,可增強所述鍍膜件的硬度及耐磨性。此外,該鍍膜件的製造方法較為環保且良率較好。In the present invention, the anodized film is polished, and the bonding layer and the vacuum coating layer are both colorless and transparent, so that the coated member exhibits high gloss while exhibiting an anodized appearance. The formation of the bonding layer can improve the bonding force between the vacuum coating layer and the anodized film, thereby avoiding the phenomenon that the vacuum coating layer is cracked and peeled off by directly bonding the anodized film and the vacuum coating layer. The vacuum coating layer itself has good hardness and wear resistance, and can enhance the hardness and wear resistance of the coated member. In addition, the method of manufacturing the coated member is environmentally friendly and has a good yield.

請參閱圖1,本發明一較佳實施例的鍍膜件10包括基體11、依次形成於基體11上的陽極氧化膜13、結合層15及真空鍍膜層17。該鍍膜件10可為電子裝置外殼,亦可為鐘錶外殼、金屬衛浴件、建築用件及汽車零部件。Referring to FIG. 1, a coated member 10 according to a preferred embodiment of the present invention includes a substrate 11, an anodized film 13 sequentially formed on the substrate 11, a bonding layer 15, and a vacuum coating layer 17. The coating member 10 can be an electronic device casing, and can also be a watch case, a metal bathroom piece, a building part, and an automobile part.

所述基體11的材質為可為鋁、鋁合金、鎂、鎂合金或其他可以進行陽極氧化處理的金屬。The material of the base 11 may be aluminum, aluminum alloy, magnesium, magnesium alloy or other metal that can be anodized.

所述陽極氧化膜13表面形成有複數凸起131。A plurality of protrusions 131 are formed on the surface of the anodized film 13.

所述結合層15用以提高所述陽極氧化膜13與後續膜層之間的結合力。所述結合層15為鈦(Ti)層或鉻(Cr)層。所述結合層15的厚度為15~40nm。The bonding layer 15 serves to increase the bonding force between the anodized film 13 and the subsequent film layer. The bonding layer 15 is a titanium (Ti) layer or a chromium (Cr) layer. The bonding layer 15 has a thickness of 15 to 40 nm.

所述真空鍍膜層17用以提高所述鍍膜件10的硬度及耐磨性。所述真空鍍膜層17為二氧化矽(SiO2)層或氧化鋁(Al2O3)層。所述真空鍍膜層17的厚度為1~1.8μm。The vacuum coating layer 17 is used to improve the hardness and wear resistance of the coated member 10. The vacuum coating layer 17 is a cerium oxide (SiO 2 ) layer or an aluminum oxide (Al 2 O 3 ) layer. The vacuum plating layer 17 has a thickness of 1 to 1.8 μm.

所述結合層15及真空鍍膜層17均為無色透明狀。所述結合層15及真空鍍膜層17均藉由磁控濺射或真空蒸鍍等真空鍍膜的方式形成。The bonding layer 15 and the vacuum coating layer 17 are both colorless and transparent. Both the bonding layer 15 and the vacuum plating layer 17 are formed by vacuum plating such as magnetron sputtering or vacuum evaporation.

本發明鍍膜件10的製造方法包括以下步驟:The manufacturing method of the coated member 10 of the present invention comprises the following steps:

提供基體11,該基體11的材質可為鋁、鋁合金、鎂、鎂合金或其他可以進行陽極氧化處理的金屬。A substrate 11 is provided. The material of the substrate 11 may be aluminum, aluminum alloy, magnesium, magnesium alloy or other metal that can be anodized.

將基體11進行預處理。該預處理包括分別用去離子水和無水乙醇對基體11表面進行擦拭、以及用丙酮溶液對基體11進行超聲波清洗等步驟。The substrate 11 is pretreated. The pretreatment includes steps of wiping the surface of the substrate 11 with deionized water and absolute ethanol, and ultrasonically cleaning the substrate 11 with an acetone solution.

藉由陽極氧化處理的方式,在該基體11的表面形成陽極氧化膜13,並對該陽極氧化膜13進行常規的染色及封孔處理。所述陽極氧化膜13表面形成有複數凸起131。該陽極氧化處理的條件為:以含有180-220g/L的硫酸水溶液為電解液,所述電解液溫度為19-21℃,陽極氧化處理時間為20-40min,電流密度為1-1.5A/m2An anodized film 13 is formed on the surface of the substrate 11 by anodizing, and the anodized film 13 is subjected to conventional dyeing and sealing treatment. A plurality of protrusions 131 are formed on the surface of the anodized film 13. The anodizing treatment is carried out under the following conditions: an aqueous solution containing 180-220 g/L of sulfuric acid as the electrolyte, the temperature of the electrolyte is 19-21 ° C, the anodizing time is 20-40 min, and the current density is 1-1.5 A/ m 2 .

對經上述處理後的基體11進行拋光處理,以提高所述陽極氧化膜13表面的光澤度,改善傳統陽極氧化膜暗啞的缺點。提供一拋光機(未圖示),所述拋光機包括一布輪,將含有氧化鋁粉末的懸浮狀水溶液塗覆在該布輪上,對所述陽極氧化膜13的表面進行拋光,拋光的時間為30~50min。可以理解的,根據實際生產需要,可以對拋光處理的拋光液組分、拋光時間等參數進行調整。The substrate 11 subjected to the above treatment is subjected to a polishing treatment to improve the glossiness of the surface of the anodized film 13, and to improve the disadvantage of the conventional anodized film being dull. A polishing machine (not shown) is provided, the polishing machine comprising a cloth wheel, a suspension aqueous solution containing alumina powder is coated on the cloth wheel, and the surface of the anodized film 13 is polished and polished. The time is 30~50min. It can be understood that the polishing slurry composition, polishing time and other parameters can be adjusted according to actual production needs.

結合參閱圖2,提供一真空鍍膜機100,該真空鍍膜機100包括一鍍膜室20及連接於鍍膜室20的一真空泵30,真空泵30用以對鍍膜室20抽真空。該鍍膜室20內設有轉架(未圖示)、相對設置的二第一靶材22及相對設置的二第二靶材23。轉架帶動基體11沿圓形的軌跡21公轉,且基體11在沿軌跡21公轉時亦自轉。每一第一靶材22及每一第二靶材23的兩端均設有氣源通道24,氣體經該氣源通道24進入所述鍍膜室20中。其中,所述第一靶材22為鈦靶或鉻靶;所述第二靶材23為矽靶或鋁靶。Referring to FIG. 2, a vacuum coater 100 is provided. The vacuum coater 100 includes a coating chamber 20 and a vacuum pump 30 connected to the coating chamber 20. The vacuum pump 30 is used to evacuate the coating chamber 20. The coating chamber 20 is provided with a turret (not shown), two first targets 22 opposed to each other, and two second targets 23 disposed opposite each other. The turret drives the base body 11 to revolve along a circular trajectory 21, and the base body 11 also rotates when revolving along the trajectory 21. A gas source passage 24 is disposed at each end of each of the first target 22 and each of the second targets 23, and the gas enters the coating chamber 20 through the gas source passage 24. Wherein, the first target 22 is a titanium target or a chromium target; and the second target 23 is a tantalum target or an aluminum target.

採用磁控濺射鍍膜法,在所述陽極氧化膜13上濺射一結合層15。所述結合層15為鈦層或鉻。濺鍍該結合層15在所述真空鍍膜機100中進行。開啟第一靶材22,並設定第一靶材22的功率為6~15kw;以氬氣為工作氣體,調節氬氣的流量為100~300sccm。濺鍍時,對基體11施加-100~-300V的偏壓,並加熱所述鍍膜室20至溫度為10~200℃(即鍍膜溫度為10~200℃),鍍膜時間為5~10min。A bonding layer 15 is sputtered on the anodized film 13 by magnetron sputtering. The bonding layer 15 is a titanium layer or chromium. Sputtering the bonding layer 15 is performed in the vacuum coater 100. The first target 22 is turned on, and the power of the first target 22 is set to 6 to 15 kW; and the flow rate of the argon gas is adjusted to be 100 to 300 sccm using argon as a working gas. During sputtering, a bias voltage of -100 to -300 V is applied to the substrate 11, and the coating chamber 20 is heated to a temperature of 10 to 200 ° C (ie, a coating temperature of 10 to 200 ° C), and the coating time is 5 to 10 minutes.

採用磁控濺射鍍膜法,在所述結合層15上濺射一真空鍍膜層17。所述真空鍍膜層17為二氧化矽層或氧化鋁層。開啟第二靶材23,並設定第二靶材23的功率為6~15kw;以氧氣為反應氣體,調節氧氣的流量為50~200sccm,以氬氣為工作氣體,調節氬氣的流量為100~300sccm。濺鍍時,對基體11施加-100~-300V的偏壓,並加熱所述鍍膜室20至溫度為20~200℃(即鍍膜溫度為20~200℃),鍍膜時間為30~40min。A vacuum coating layer 17 is sputtered on the bonding layer 15 by magnetron sputtering. The vacuum coating layer 17 is a ceria layer or an aluminum oxide layer. The second target 23 is turned on, and the power of the second target 23 is set to 6~15kw; the flow rate of the oxygen is adjusted to 50~200sccm by using oxygen as the reaction gas, and the flow rate of the argon gas is adjusted by using argon gas as the working gas. ~300sccm. During sputtering, a bias voltage of -100 to -300 V is applied to the substrate 11, and the coating chamber 20 is heated to a temperature of 20 to 200 ° C (ie, a coating temperature of 20 to 200 ° C), and the coating time is 30 to 40 minutes.

本發明對所述陽極氧化膜13進行拋光處理,且所述結合層15及真空鍍膜層17均為無色透明狀,使所述鍍膜件10在呈現陽極氧化處理的外觀的同時呈現出高的光澤度。所述結合層15的形成可提高所述真空鍍膜層17與陽極氧化膜13之間的結合力,進而避免所述陽極氧化膜13與真空鍍膜層17直接結合而導致真空鍍膜層17發生開裂、剝落等現象。所述真空鍍膜層17本身具有良好的硬度及耐磨性,可增強所述鍍膜件10的硬度及耐磨性。此外,該鍍膜件10的製造方法較為環保且良率較好。In the present invention, the anodized film 13 is polished, and the bonding layer 15 and the vacuum coating layer 17 are both colorless and transparent, so that the coated member 10 exhibits a high gloss while exhibiting an anodized appearance. degree. The formation of the bonding layer 15 can improve the bonding force between the vacuum coating layer 17 and the anodized film 13, thereby preventing the anodized film 13 from directly bonding with the vacuum coating layer 17 to cause cracking of the vacuum coating layer 17, Peeling and other phenomena. The vacuum coating layer 17 itself has good hardness and wear resistance, and can enhance the hardness and wear resistance of the coated member 10. Further, the method of manufacturing the coated member 10 is environmentally friendly and has a good yield.

10...鍍膜件10. . . Coated parts

11...基體11. . . Matrix

13...陽極氧化膜13. . . Anodized film

131...凸起131. . . Bulge

15...結合層15. . . Bonding layer

17...真空鍍膜層17. . . Vacuum coating

100...鍍膜機100. . . Coating machine

20...鍍膜室20. . . Coating chamber

30...真空泵30. . . Vacuum pump

21...軌跡twenty one. . . Trajectory

22...第一靶材twenty two. . . First target

23...第二靶材twenty three. . . Second target

24...氣源通道twenty four. . . Air source channel

圖1係本發明一較佳實施例鍍膜件的剖視圖;1 is a cross-sectional view showing a coated member of a preferred embodiment of the present invention;

圖2係本發明一較佳實施例真空鍍膜機的示意圖。2 is a schematic view of a vacuum coater according to a preferred embodiment of the present invention.

10...鍍膜件10. . . Coated parts

11...基體11. . . Matrix

13...陽極氧化膜13. . . Anodized film

131...凸起131. . . Bulge

15...結合層15. . . Bonding layer

17...真空鍍膜層17. . . Vacuum coating

Claims (10)

一種鍍膜件,包括基體及形成於基體表面的陽極氧化膜,其改良在於:所述鍍膜件還包括依次形成於該陽極氧化膜表面的結合層及真空鍍膜層,所述結合層為鈦層或鉻層,所述真空鍍膜層為二氧化矽層或氧化鋁層。A coating member comprising a substrate and an anodized film formed on the surface of the substrate, wherein the coating member further comprises a bonding layer and a vacuum coating layer sequentially formed on the surface of the anodized film, wherein the bonding layer is a titanium layer or A chromium layer, the vacuum coating layer being a ceria layer or an aluminum oxide layer. 如申請專利範圍第1項所述之鍍膜件,其中所述結合層藉由真空鍍膜的方式形成。The coated article of claim 1, wherein the bonding layer is formed by vacuum coating. 如申請專利範圍第1項所述之鍍膜件,其中所述結合層的厚度為15~40nm。The coated article according to claim 1, wherein the bonding layer has a thickness of 15 to 40 nm. 如申請專利範圍第1項所述之鍍膜件,其中所述真空鍍膜層的厚度為1~1.8μm。The coated article according to claim 1, wherein the vacuum coating layer has a thickness of 1 to 1.8 μm. 如申請專利範圍第1項所述之鍍膜件,其中所述結合層為無色透明狀。The coated article of claim 1, wherein the bonding layer is colorless and transparent. 如申請專利範圍第1項所述之鍍膜件,其中所述真空鍍膜層為無色透明狀。The coated article of claim 1, wherein the vacuum coating layer is colorless and transparent. 一種鍍膜件的製造方法,其包括如下步驟:
提供基體;
藉由陽極氧化處理的方式,在該基體的表面形成陽極氧化膜;
對所述陽極氧化膜表面進行拋光處理;
採用真空鍍膜法,以鈦靶或鉻靶為靶材,在拋光後的陽極氧化膜上形成結合層,該結合層為鈦層或鉻層;
採用真空鍍膜法,以矽靶或鋁靶為靶材,以氧氣為反應氣體,在結合層上形成真空鍍膜層,該真空鍍膜層為二氧化矽層或氧化鋁層。
A method of manufacturing a coated member, comprising the steps of:
Providing a substrate;
Forming an anodized film on the surface of the substrate by anodizing;
Polishing the surface of the anodized film;
Using a vacuum coating method, using a titanium target or a chromium target as a target, forming a bonding layer on the polished anodized film, the bonding layer being a titanium layer or a chromium layer;
The vacuum coating method is adopted, and a vacuum target layer is formed on the bonding layer by using a ruthenium target or an aluminum target as a target and oxygen as a reaction gas, and the vacuum coating layer is a ruthenium dioxide layer or an aluminum oxide layer.
如申請專利範圍第7項所述之鍍膜件的製造方法,其中形成所述結合層的方法為:採用磁控濺射鍍膜法,設置鈦靶或鉻靶的功率為6~15kw,以氬氣為工作氣體,氬氣的流量為100~300sccm,施加於基體的偏壓為-100~-300V,鍍膜溫度為10~200℃,鍍膜時間為5~10min。The method for manufacturing a coated member according to claim 7, wherein the method for forming the bonding layer is: using a magnetron sputtering coating method, setting a power of a titanium target or a chromium target to 6 to 15 kW, using argon gas For the working gas, the flow rate of argon gas is 100~300sccm, the bias voltage applied to the substrate is -100~-300V, the coating temperature is 10~200°C, and the coating time is 5~10min. 如申請專利範圍第7項所述之鍍膜件的製造方法,其中形成所述結合層的方法為:採用磁控濺射鍍膜法,設置矽靶或鋁靶的功率為6~15kw,以氧氣為反應氣體,調節氧氣的流量為50~200sccm,以氬氣為工作氣體,氬氣的流量為100~300sccm,施加於基體的偏壓為-100~-300V,鍍膜溫度為10~200℃,鍍膜時間為30~40min。The method for manufacturing a coated member according to claim 7, wherein the method for forming the bonding layer is: using a magnetron sputtering coating method, the power of the target or the aluminum target is set to 6 to 15 kW, and oxygen is used. The reaction gas, the flow rate of adjusting oxygen is 50~200sccm, the working gas of argon gas is used, the flow rate of argon gas is 100~300sccm, the bias voltage applied to the substrate is -100~-300V, the coating temperature is 10~200 °C, coating The time is 30~40min. 如申請專利範圍第7項所述之鍍膜件的製造方法,其中所述拋光處理的工藝為:採用一拋光機,所述拋光機包括一布輪,將含有氧化鋁粉末的懸浮狀水溶液塗覆在該布輪上,對所述陽極氧化膜的表面進行拋光,拋光的時間為30~50min。The method of manufacturing a coated member according to claim 7, wherein the polishing process is: using a polishing machine comprising a cloth wheel to coat a suspension aqueous solution containing alumina powder. On the cloth wheel, the surface of the anodized film is polished, and the polishing time is 30 to 50 minutes.
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