201226615 六、發明說明： 【發明所屬之技術領威】 [0001] 本發明涉及一種殻體及其製造方法。 C先前技術3 剛A空舰技術（PVD)係-種非常環保的成膜技術。以真 空錢膜的方式所形成的膜層具有高硬度、高耐磨性、良 好的化學穩定性、與基體結合牢固以及亮麗的金屬外觀 等優點，因此真空鍍膜在鋁、鋁合金及不銹鋼等金屬基 材表面裝飾性處理領域的應用麵來越廣。 [0003] 然而，由於鋁或鋁合金的標準電極電位很低，與PVD鍍層 ，如ΤιΝ層、CrN層的電位差較大，且pVD鍍層本身不可 避免的會存在微小的孔隙，如針孔、裂紋，致使鋁或鋁 合金基體易於發生微電池腐蝕。因此，直接於鋁或鋁合 金基體表面鍍覆所述TiN層、CrN層並不能有效提高所述 鋁或鋁合金基體的耐腐蝕性能，同時該pVD鍍層本身也會 發生異色、稅落等現象，難以維持良好的裝飾外觀。 【發明内容】 [0004] 鑒於此，提供一種具有良好的耐腐蝕性及裝飾性外觀的 殼體。 [0005] 另外，還提供—種上述殼體的製造方法。 [0006] 一種殼體’包括鋁或鋁合金基體、依次形成於鋁或鋁合 金基體上的防腐蝕層和色彩層，所述防腐蚀層為矽層。 [0007] 一種殼體的製造方法，包括以下步驟： [0008] 099146474 提供銘或結合金基體；在該鋁或鋁合金基體上磁控濺射 表單編號A0101 第3頁/共13頁 0992079888-0 201226615 形成防腐蝕層，該防腐蝕層為矽層；在該上磁控濺射形 成色彩層。 [0009] [0010] [0011] [0012] [0013] [0014] [0015] 099146474 所述殼體的製造方法，通過磁控濺射法依次於鋁或鋁合 金基體上形成防腐蝕層及具有裝飾性的色彩層。該防腐 蝕層為一矽層，其以磁控濺射技術形成，具有更緻密的 超細微結構，其陶瓷材料的絕緣性能可減缓電偶腐蝕速 率，其可以減緩基體與色彩層之間形成的微電池腐蝕， 在控制在一定厚度的情況下，其可以降低腐蝕性氣氛的 濃度，有利於色彩層附著力的改善，避免所述色彩層發 生異色、脫落等失效現象，從而使該殼體經長時間使用 後仍具有較好的裝飾性外觀。 【實施方式】 請參閱圖1，本發明一較佳實施例的殼體10包括鋁或鋁合 金基體11、依次形成於該鋁或鋁合金基體11上的防腐蝕 層防腐蝕層13、色彩層15。該殼體10可以為3C電子產品 的殼體，也可為工業、建築用件及汽車等交通工具的零 部件等。 所述防腐蝕層13為矽層，其厚度為3〜10//m。 在所述的色彩層15上還可以磁控濺射一色彩層，所述色 彩層15為Ti-N層，其厚度為1.0〜3.0/^。 可以理解，所述色彩層15還可以為Cr-N或其他具有裝飾 性的色彩層。 所述防腐蝕層13、色彩層15可通過磁控濺射法形成。 本發明一較佳實施例的製造所述殼體1 0的方法主要包括 表單編號A0101 第4頁/共13頁 0992079888-0 201226615 [0016] [0017]Ο [0018] Ο [0019] 如下步驟： 提供紹或鋁合金基體11，並對鋁或鋁合金基體11依次進 行研磨及電解拋光。電解拋光後，再依次用去離子水和 無水乙醇對該鋁或鋁合金基體11表面進行擦拭。再將擦 拭後的叙或鋁合金基體11放入盛裝有丙酮溶液的超聲波 清洗器中進行震動清洗，以除去鋁或鋁合金基體11表面 的雜質和油污等。清洗完畢後吹幹備用。 對經上述處理後的鋁或鋁合金基體u的表面進行氬氣電 聚清洗’進一步去除鋁或鋁合金基體11表面的油污，以 改善鋁或鋁合金基體11表香鐵焦象熏層的韓合力。 提供—鍍膜機100，鍍膜機100包括一鍍膜室20，該鑛膜 至20内設有轉架（未圖示）’將鋁或鋁合金基體丨丨固定 於轉架上，轉架帶動鋁或鋁合金基體η沿圓形軌跡21運 行’且紹或鋁合金基體11在沿軌跡21運行時亦自轉。在 該鑛膜室20側壁上安裝二靶材22，諸上靶材2 2關於轨跡 21的中心相對稱。在二靶材22的兩端設有氣源通道24， 該氣源通道24吹出氣體粒子轟擊相應的靶材的表面，以 使乾材表面濺射出粒子《當鋁或鋁合金基體U通過二乾 材22之間時，將鍵上二把材22表面濺射的粒子，完成磁 控濺射過程。 該電漿清洗的具體操作及工藝參數可為：對該锻膜室2〇 進行抽真空處理至本底真空度為丨.〇xl〇-3Pa，以 250〜500sccm (標準狀態毫升/分鐘）的流量向鍍膜室2〇 中通入純度為99. 999%的氬氣，於鋁或鋁合金基體η上 099146474 表單編號A0101 第5頁/共13頁 0992079888-0 201226615 施加- 300〜-800V的偏壓，對銘或紹合金基體11表面進行 電漿清洗，電漿清洗時間為3〜1 0miη。 [0020] 在對鋁或鋁合金基體11進行電漿清洗後，於該鋁或鋁合 金基體11上形成防腐姓層13。該防腐餘層13為一碎層’ 以氬氣為工作氣體，調節氬氣流量為1 00~200seem，設 置佔空比為30〜50%，於鋁或鋁合金基體11上施加- 50 — 1 00V的偏壓，並加熱鍍膜室至100~150°C，選擇矽 為靶材，設置其功率為2~8kw，沉積防腐蝕層13。沉積防 腐蝕層13的時間為90~180min，防腐蝕層13的厚度為 3〜1 0 // m。 [0021] 形成所述防腐蝕層13後，在該腐蝕層13上形成色彩層15 ，形成該色彩層15的具體操作及工藝參數如下：關閉所 述矽靶的電源，開啟已置於所述鍍膜機内的一靶材電源 ，該靶材可為鈥靶或鉻靶，設置其功率為8〜10kw，保持 上述氬氣的流量不變，並向链膜室内通入流量為 20~170sccm的反應氣體Ιι氣，沉積色彩層15。沉積色彩 層的時間為20~30min，該色彩層15可為Ti-N膜層或Cr-N膜詹，色彩層15的厚度為1.0〜3. Ogm。 [0022] 以下結合具體實施例對殼體10的製備方法及殼體10進行 說明： [0023] 實施例1 [0024] 電漿清洗：氬氣流量為280sccm，金屬基體11的偏壓為-300V，電漿清洗的時間為9分鐘； [0025] 減鑛防腐餘層1 3 :通入氬氣1 00seem，開啟石夕耙，設置 099146474 表單編號A0101 第6頁/共]3頁 0992079888-0 201226615 矽靶功率為2kw，設置鋁或鋁合金基體11的偏壓為-50V ，沉積100分鐘； [0026] 形成色彩層15 :該靶材可為鈦靶或鉻靶，設置其功率為 8kw，保持上述氬氣的流量不變，並向鍍膜室内通入流量 為60sccm的反應氣體氮氣，沉積色彩層15。沉積色彩層 的時間為20min，該色彩層15可為Ti-N膜層或Cr-N膜層 ，色彩層15的厚度為1.0/zm。 [0027] 實施例2 [0028] 電漿清洗：氬氣流量為300sccm，金屬基體11的偏壓為-400V，電漿清洗的時間為9分鐘；201226615 VI. Description of the Invention: [Technical Leadership of the Invention] [0001] The present invention relates to a casing and a method of manufacturing the same. C Prior Art 3 Just A Airship Technology (PVD) is a very environmentally friendly film forming technology. The film formed by the vacuum film has the advantages of high hardness, high wear resistance, good chemical stability, firm bonding with the substrate, and a beautiful metallic appearance. Therefore, the vacuum coating is applied to metals such as aluminum, aluminum alloy and stainless steel. The wider application of the surface of the substrate surface decorative treatment. [0003] However, since the standard electrode potential of aluminum or aluminum alloy is very low, the potential difference with the PVD plating layer, such as the Τι layer and the CrN layer, is large, and the pVD plating itself inevitably has minute pores such as pinholes and cracks. , causing the aluminum or aluminum alloy substrate to be susceptible to microbattery corrosion. Therefore, plating the TiN layer and the CrN layer directly on the surface of the aluminum or aluminum alloy substrate does not effectively improve the corrosion resistance of the aluminum or aluminum alloy substrate, and the pVD coating itself may also have a phenomenon of heterochromaticity, taxation, and the like. It is difficult to maintain a good decorative appearance. SUMMARY OF THE INVENTION [0004] In view of the above, a housing having good corrosion resistance and decorative appearance is provided. Further, a method of manufacturing the above casing is also provided. A housing 'includes an aluminum or aluminum alloy substrate, an anti-corrosion layer and a color layer sequentially formed on an aluminum or aluminum alloy substrate, and the anti-corrosion layer is a tantalum layer. [0007] A method of manufacturing a housing, comprising the steps of: [0008] 099146474 providing an inscription or bonding gold substrate; magnetron sputtering on the aluminum or aluminum alloy substrate form number A0101 page 3 / total 13 page 0992079888-0 201226615 forms an anti-corrosion layer which is a layer of germanium; magnetron sputtering forms a color layer thereon. [0012] [0015] [0015] [0015] 099146474 The manufacturing method of the casing, sequentially forming an anti-corrosion layer on the aluminum or aluminum alloy substrate by magnetron sputtering method and having [0012] Decorative color layer. The anti-corrosion layer is a germanium layer formed by magnetron sputtering technology, and has a denser ultra-fine structure, and the insulating property of the ceramic material can reduce the galvanic corrosion rate, which can slow the formation between the substrate and the color layer. The micro-battery corrosion can reduce the concentration of the corrosive atmosphere under the control of a certain thickness, which is beneficial to the improvement of the adhesion of the color layer, avoiding the occurrence of color, falling off and the like of the color layer, thereby making the shell It still has a good decorative appearance after long-term use. [Embodiment] Referring to Figure 1, a housing 10 according to a preferred embodiment of the present invention includes an aluminum or aluminum alloy substrate 11, an anti-corrosion layer 13 and a color layer which are sequentially formed on the aluminum or aluminum alloy substrate 11. 15. The casing 10 may be a casing of a 3C electronic product, or may be a component of a vehicle such as an industrial, a building, or an automobile. The anti-corrosion layer 13 is a layer of tantalum and has a thickness of 3 to 10 //m. A color layer can also be magnetron sputtered on the color layer 15, and the color layer 15 is a Ti-N layer having a thickness of 1.0 to 3.0/^. It will be appreciated that the color layer 15 may also be a Cr-N or other decorative color layer. The anti-corrosion layer 13 and the color layer 15 can be formed by a magnetron sputtering method. The method for manufacturing the housing 10 according to a preferred embodiment of the present invention mainly includes a form number A0101, a fourth page, a total of 13 pages, 0992079888-0, 201226615, [0017] [0018] Ο [0019] The following steps: The aluminum or aluminum alloy substrate 11 is provided, and the aluminum or aluminum alloy substrate 11 is sequentially ground and electrolytically polished. After electrolytic polishing, the surface of the aluminum or aluminum alloy substrate 11 was wiped with deionized water and absolute ethanol in this order. Further, the wiped aluminum alloy substrate 11 is placed in an ultrasonic cleaner containing an acetone solution for vibration cleaning to remove impurities and oil stains on the surface of the aluminum or aluminum alloy substrate 11. After cleaning, blow dry and set aside. The surface of the aluminum or aluminum alloy substrate u subjected to the above treatment is subjected to argon gas polymerization cleaning to further remove the oil stain on the surface of the aluminum or aluminum alloy substrate 11 to improve the heat of the surface of the aluminum or aluminum alloy substrate 11 by the like. Provided by a coating machine 100, the coating machine 100 comprises a coating chamber 20, wherein the film is provided with a turret (not shown) 20 to fix the aluminum or aluminum alloy base 于 on the turret, and the turret drives the aluminum or The aluminum alloy substrate η runs along a circular path 21 and the aluminum alloy substrate 11 also rotates as it travels along the track 21. Two targets 22 are mounted on the side wall of the film chamber 20, and the upper targets 22 are symmetrical with respect to the center of the track 21. At both ends of the two targets 22, a gas source passage 24 is provided, and the gas source passage 24 blows out gas particles to bombard the surface of the corresponding target, so that the surface of the dry material is sputtered with particles "When the aluminum or aluminum alloy matrix U passes through the dry When the material 22 is between, the particles sputtered on the surface of the two materials 22 are bonded to the magnetron sputtering process. The specific operation and process parameters of the plasma cleaning may be: evacuating the forging chamber 2〇 to a background vacuum of 丨.〇xl〇-3Pa, at 250~500sccm (standard state ML/min) The flow rate is 99.59% argon gas into the coating chamber 2, on the aluminum or aluminum alloy substrate η 099146474 Form No. A0101 Page 5 / Total 13 Page 0992079888-0 201226615 Application - 300~-800V Pressing, the surface of the Ming or Shao alloy substrate 11 is plasma-cleaned, and the plasma cleaning time is 3~1 0miη. [0020] After the aluminum or aluminum alloy substrate 11 is subjected to plasma cleaning, an anticorrosive layer 13 is formed on the aluminum or aluminum alloy substrate 11. The anti-corrosion layer 13 is a fragmented layer of argon gas as a working gas, the argon gas flow rate is adjusted to be 100 to 200 seem, the duty ratio is set to 30 to 50%, and the aluminum or aluminum alloy substrate 11 is applied - 50 - 1 00V bias, and heat the coating chamber to 100~150 °C, select 矽 as the target, set its power to 2~8kw, deposit anti-corrosion layer 13. The time for depositing the anticorrosive layer 13 is 90 to 180 min, and the thickness of the anticorrosive layer 13 is 3 to 10 // m. [0021] After the anti-corrosion layer 13 is formed, a color layer 15 is formed on the etching layer 13. The specific operation and process parameters for forming the color layer 15 are as follows: the power of the target is turned off, and the opening is placed in the A target power source in the coating machine, the target material may be a bismuth target or a chromium target, and the power is set to 8~10kw, the flow rate of the argon gas is kept constant, and a flow rate of 20~170sccm is introduced into the chain film chamber. The gas is Ι gas, and a color layer 15 is deposited. Ogm。 The color layer 15 may be a Ti-N film layer or a Cr-N film, the thickness of the color layer 15 is 1.0~3. Ogm. [0022] Hereinafter, a method of manufacturing the casing 10 and a casing 10 will be described with reference to specific embodiments: [0023] Example 1 [0024] Plasma cleaning: argon gas flow rate is 280 sccm, and metal substrate 11 bias voltage is -300 V , plasma cleaning time is 9 minutes; [0025] reduction of anti-corrosion residual layer 13: argon into the 00seem, open Shi Xiyu, set 099146474 Form No. A0101 Page 6 / total] 3 pages 0992079888-0 201226615 The target power is 2kw, the bias voltage of the aluminum or aluminum alloy substrate 11 is set to -50V, and deposition is performed for 100 minutes; [0026] The color layer 15 is formed: the target may be a titanium target or a chromium target, and the power is set to 8kw, keeping The flow rate of the above argon gas was constant, and a reaction gas nitrogen gas having a flow rate of 60 sccm was introduced into the coating chamber to deposit a color layer 15. The time for depositing the color layer is 20 min. The color layer 15 may be a Ti-N film layer or a Cr-N film layer, and the color layer 15 has a thickness of 1.0/zm. [0028] Example 2 [0028] plasma cleaning: argon gas flow rate is 300sccm, metal substrate 11 bias is -400V, plasma cleaning time is 9 minutes;
[0029] 濺鍍防腐蝕層13 :通入氬氣200sccm，開啟矽靶，設置 矽靶功率為5kw，設置鋁或鋁合金基體11的偏壓為-100V ，沉積80分鐘； [0030] 形成色彩層15 :該靶材可為鈦靶或鉻靶，設置其功率為 9kw，保持上述氬氣的流量不變，並向鍍膜室内通入流量 為8Osccm的反應氣體氮氣，沉積色彩層15。沉積色彩層 的時間為30min，該色彩層15可為Ti-N膜層或Cr-N膜層 ，色彩層15的厚度為1.5//m。 [0031] 實施例3 [0032] 電漿清洗：氬氣流量為450sccm，金屬基體11的偏壓為-500V，電漿清洗的時間為9分鐘； [0033] 錢鍍防腐#層1 3 :以石夕乾為乾材，通入氬氣1 50sccm， 開啟矽靶，設置矽靶功率為2kw，設置鋁或鋁合金基體11 099146474 表單編號 A0101 第 7 頁/共 13 頁 0992079888-0 201226615 的偏壓為-150V，沉積10〇分鐘， [0034] [0035] [0036] [0037] [0038] [0039] 形成色彩層15 :該靶材可 1 Qk , __ 或鉻％，設置其功率為 保持上述氬氣的流量不 旦& 1〇 ^ 並向鍍膜室内通入流 Ια的反應氣體氮氣，沉積色彩層15。沉積色 /曰的時間為20min，s亥色彩層15可為Ti N膜層或Cr N 膜層’色彩層15的厚度為1. 2"m。 所述成懸1 〇的製造方法，通過磁控濺射法依次於鋁或鋁 合金基缴11上形成防腐蝕層13及具有裝飾性的色彩層15 ° 3玄防腐蚀層13為一矽層，其能很好地起到一個過渡結 合作用’使該色彩層15與鋁或鋁合金基體11更穩定地結 ............ 人 + + s °該防腐蝕層為一矽層13，其以磁控濺射技術形成， 具有更緻密的超細微結構，其靡資材料的絕緣性能可減 緩電偶腐敍速率，其可以減緩基體11與色彩層15之間形 成的微電池腐蝕作用，在控制在一定厚度的情況下，其 可以降低腐姓性氣氛的濃度，有利於色彩層附著力的改 善’避免所述色彩層15發生異色、脫落等失效現象，從 而使該毅體10經長時間使用後仍具有較好的裝飾性外觀 【圖式簡單說明】 圖1為本發明較佳實施方式殼體的剖視示意圖。 【主要元件符號說明】 殼體：10 鋁或鋁合金基體：U 防腐蝕層：13 099146474 表單蝙號A0101 第8頁/共13頁 0992079888-0 201226615 [0040] [0041] [0042] [0043] - [0044] [0045] [0046] Ο 色彩層：15 鍍膜機：100 鍍膜室：20 真空泵：30 軌跡：21 靶材：22 氣源通道：24 〇 099146474 表單編號Α0101 第9頁/共13頁 0992079888-0[0029] Sputtering anti-corrosion layer 13: argon gas is introduced into 200 sccm, the crucible target is opened, the target power is set to 5 kw, the bias voltage of the aluminum or aluminum alloy substrate 11 is set to -100 V, and deposition is performed for 80 minutes; [0030] Layer 15: The target may be a titanium target or a chromium target, and the power is set to be 9 kw, the flow rate of the argon gas is kept constant, and a reaction gas nitrogen gas having a flow rate of 8 Osccm is introduced into the coating chamber to deposit a color layer 15. The time for depositing the color layer is 30 min. The color layer 15 may be a Ti-N film layer or a Cr-N film layer, and the color layer 15 has a thickness of 1.5/m. [0031] Example 3 [0032] Plasma cleaning: argon gas flow rate is 450 sccm, metal substrate 11 bias voltage is -500 V, plasma cleaning time is 9 minutes; [0033] money plating anti-corrosion #层1 3 : Shi Xiqian is a dry material, argon gas is introduced into the 1 50sccm, the target is turned on, the target power is set to 2kw, and the bias voltage of the aluminum or aluminum alloy substrate 11 099146474 is shown. Form No. A0101 Page 7 of 13 0992079888-0 201226615 Formed as -150V, deposited for 10 minutes, [0036] [0038] [0039] Forming a color layer 15: the target can be 1 Qk, __ or chrome %, setting its power to maintain the above The flow rate of argon gas is not reached & 1 〇 ^ and the reaction gas nitrogen flowing through the flow Ι α is introduced into the coating chamber to deposit a color layer 15 . The thickness of the color layer 15 is 1. 2 " m. The thickness of the color layer 15 is 1. 2 " m. In the manufacturing method of the suspension, the anti-corrosion layer 13 and the decorative color layer 15° 3 of the anti-corrosion layer 13 are sequentially formed on the aluminum or aluminum alloy base 11 by magnetron sputtering. , which can well play a transitional binding effect 'to make the color layer 15 more stable with the aluminum or aluminum alloy substrate 11............ People + + s ° the anti-corrosion layer It is a layer 13 which is formed by magnetron sputtering technology and has a denser ultrafine structure. The insulating property of the material can reduce the symmetry rate of the galvanic couple, which can slow the formation between the substrate 11 and the color layer 15. The corrosion effect of the micro-battery can reduce the concentration of the rot-resistant atmosphere under the control of a certain thickness, which is beneficial to the improvement of the adhesion of the color layer, and avoids the occurrence of coloring, falling off, etc. of the color layer 15, thereby The body 10 has a good decorative appearance after being used for a long time. [Schematic description of the drawings] Fig. 1 is a schematic cross-sectional view of a casing according to a preferred embodiment of the present invention. [Main component symbol description] Housing: 10 Aluminum or aluminum alloy base: U Anti-corrosion layer: 13 099146474 Form bat number A0101 Page 8 / Total 13 page 0992079888-0 201226615 [0040] [0041] [0043] [0046] [0046] 00 Color layer: 15 Coating machine: 100 Coating chamber: 20 Vacuum pump: 30 Track: 21 Target: 22 Air source channel: 24 〇 099146474 Form number Α 0101 Page 9 of 13 0992079888-0