TWI596009B - Housing and method for making the housing - Google Patents

Description

Housing and method of manufacturing same

The present invention relates to an outer casing and a method of manufacturing the same, and more particularly to an outer casing having a transparent film formed on its surface and a method of manufacturing the same.

With the rapid evolution of technology, 3C products and automotive electronics products such as mobile phones and personal computers have developed rapidly. The high-gloss, high-brightness, diversified outer casings and metallic appearance products on the market are generally favored by consumers. . In order to make the electronic product exhibit good brightness and smoothness, a transparent film is usually formed on the surface of the electronic product by a conventional manufacturing process such as spraying. However, these conventional manufacturing processes are complicated, and the manufactured transparent film has a low finish, poor wear resistance, and a short service life.

In view of the above, it is necessary to provide a case in which a transparent film of high light and high brightness is formed on the surface.

In addition, it is also necessary to provide a method of manufacturing the above casing.

An outer casing comprising a substrate and a transparent film formed on the surface of the substrate, the transparent film comprising a primer layer, a transition layer formed on the surface of the primer layer, and a transparent layer formed on the surface of the transition layer, the primer layer being a chromium layer, The transition layer is a chromium carbide layer, and the transparent layer is a layer of tantalum formed on the surface of the substrate. The transition layer is formed on the surface of the underlayer, and the transparent layer is formed on the surface of the transition layer.

A method for manufacturing a casing, comprising the steps of: providing a substrate; using a chromium target as a target, sputtering a substrate on the surface of the substrate by magnetron sputtering, the underlayer is a chromium layer; and the chromium target is used as a target The reaction gas acetylene is introduced, and the transition layer is sputtered on the surface of the underlayer by magnetron sputtering. The transition layer is a chromium carbide layer; the target is used as a target, and the surface of the transition layer is sputtered by magnetron sputtering. A transparent layer is plated, and the transparent layer is a layer of germanium.

The invention adopts a special target material combination and a new PVD coating process to prepare an outer shell having a transparent film, the transparent film having high brightness, so that the surface of the outer casing has high brightness and smoothness. In addition, the bottom layer, the transition layer and the transparent layer are sequentially sputtered on the surface of the substrate by magnetron sputtering, and the layer-to-layer transition between the layers is better, and no obvious stress is generated inside the film layer. When subjected to external force, the transparent film It is not easily damaged, and it can exhibit good hardness and wear resistance, which prolongs the service life of the outer casing.

100‧‧‧ Shell

20‧‧‧Substrate

10‧‧‧Transparent film

13‧‧‧ playing the bottom layer

15‧‧‧Transition layer

17‧‧‧ transparent layer

200‧‧‧Vacuum Coating Machine

21‧‧‧ coating room

23‧‧‧Chromium target

24‧‧‧ target

25‧‧‧Track

300‧‧‧vacuum pump

1 is a cross-sectional view of a housing in accordance with a preferred embodiment of the present invention.

2 is a top plan view of a vacuum coating machine in accordance with a preferred embodiment of the present invention.

Referring to Figure 1, the present invention provides a preferred embodiment of a housing 100 that can be used in 3C electronics or automotive electronics. The outer casing 100 includes a substrate 20 and a transparent film 10, which is colorless and transparent. The transparent film 10 includes a primer layer 13 formed on the surface of the substrate 20, a transition layer 15 formed on the surface of the primer layer 13, and a transparent layer 17 formed on the surface of the transition layer 15.

The material of the substrate 20 can be metal, plastic or ceramic.

The underlayer 13 is a metal chromium layer having a thickness of 0.1-0.3 μm, and the underlayer 13 functions to increase the adhesion of the film layer.

The transition layer 15 is a chromium carbide layer having a thickness of 0.2 to 0.4 μm, and the transition layer 15 can enhance the adhesion of the transparent layer 17.

The transparent layer 17 is a ruthenium layer having a thickness of 0.1 to 0.3 μm. Since the transparent layer 17 contains only germanium atoms, its transparency is good.

In the present invention, the magnetron sputtering method is used, firstly, metal chromium is sputtered on the surface of the substrate 20 as the underlayer 13, and then the transition layer 15 is sputtered on the surface of the underlayer 13, and finally the transparent layer 17 is sputtered on the transition layer 15. The layer-to-layer transition between the layers is better, and the bonding between the layers is better, and no obvious stress is generated inside the film. Therefore, when subjected to external force, the transparent film 10 is not easily broken, and can exhibit good hardness and wear resistance. Sex.

The underlayer 13 is a metal chromium layer having transparency; the transition layer 15 is a CrC layer, and the thickness is small, and does not affect the transparency of the transparent film 10; the transparent layer 17 contains only germanium atoms, and has a higher The transparency and the surface of the transparent layer 17 are flat, so that the transparent film 10 has a high transparency, so that the surface of the outer casing 100 exhibits high brightness and smoothness.

A method for preparing a housing 100 according to a preferred embodiment of the present invention includes the following steps: Referring to FIG. 2, a vacuum coating machine 200 is provided, which includes a coating chamber 21 and a vacuum pump 30 connected to the coating chamber 21 for vacuum pump 30. The vacuum is applied to the coating chamber 21. A rotating frame (not shown), a chrome target 23, and a target 24 are provided in the coating chamber 21. The turret drives the substrate 20 to revolve along a circular trajectory 25, and the substrate 20 also rotates as it revolves along the trajectory 25.

The substrate 20 is provided, and the material of the substrate 20 can be any one of metal, plastic and ceramic.

The substrate 20 is subjected to surface pretreatment. The surface pretreatment may include conventional steps of cleaning and polishing the substrate 20, and the pretreated substrate 20 is dried and then fixed on a rotating frame in the coating chamber 21. .

The vacuum pump was turned on, the vacuum pump 300 was turned on, and the coating chamber 21 was evacuated to 5 × 10 ^-2 Pa.

The target was washed, and a working gas of argon was introduced. The flow rate of the argon gas was 100 standard milliliters per minute (sccm), and the target was washed for 15 minutes at a constant power of 5 KW.

The coating chamber 21 was evacuated and heated, and the temperature of the coating chamber 21 was set to 200 ° C, and the vacuum pump 300 was used to draw a high vacuum to 5 × 10 ^-3 Pa.

High-voltage argon ion glow cleaning, the temperature of the coating chamber 21 is 120 ° C, the negative bias voltage is set to 1300 V, and the working gas argon gas is introduced to clean the surface of the substrate 20.

The chrome target 23 is used as a target, and the underlayer 13 is sputtered on the surface of the substrate 20 after cleaning by magnetron sputtering. The chrome target 23 uses a radio frequency power source. When sputtering, the chrome target 23 is turned on and the power is set to 8-15 KW, the working gas argon gas is introduced, the argon gas flow rate is 100-150 sccm, and the indoor temperature of the coating chamber 21 is 120-180 ° C. The negative bias applied to the substrate 20 is 100-250 V, and the coating time is 5-10 min.

With the chromium target 23 as a target, the transition layer 15 is sputtered on the surface of the underlayer 13 by magnetron sputtering. The chrome target 23 uses an RF power source. When sputtering, the chrome target 23 is turned on and the power is set to 6-12 KW. The working gas argon gas and the reaction gas acetylene are introduced into the coating chamber 21, and the argon gas flow rate is 80-140 sccm, and the acetylene flow rate is performed. The temperature in the chamber 21 is 100-150 ° C, the negative bias applied to the substrate 20 is 200-300 V, and the coating time is 40-50 min. Since the amount of acetylene is small, it will not affect the transparency of the transparent film 10. Brightness; with the target 24 as the target, the transparent layer 17 is sputtered on the surface of the transition layer 15 by magnetron sputtering. The target 24 uses an RF power source. When the sputtering is performed, the target 24 is turned on, and the power is set to 4-8 KW. The working gas is argon gas, the flow rate of the argon gas is 50-135 sccm, and the indoor temperature of the coating chamber 21 is 90-120 ° C. The negative bias applied to the substrate 20 is 200-400 V, and the coating time is 20-40 min.

The invention will now be specifically described by way of examples.

Example 1

The material of the substrate 20 used in this embodiment is stainless steel 316.

Sputtering primer layer 13: The power of the chromium target 23 was 8 kw, the flow rate of argon gas was 100 sccm, the temperature in the coating chamber 21 at the time of coating was 170 ° C, the negative bias applied to the substrate 20 was 100 v, and the coating time was 5 min.

Sputtering transition layer 15: the power of the chromium target 23 is 6 kw, the flow rate of argon gas is 110 sccm, the flow rate of acetylene is 55 sccm, the temperature in the coating chamber 21 during coating is 160 ° C, and the negative bias applied to the substrate 20 is 200 v. The coating time is 40 min.

The transparent layer 17 was sputtered: the power of the target 24 was 6 kw, the flow rate of argon gas was 125 sccm, the temperature in the coating chamber 21 at the time of coating was 130 ° C, the negative bias applied to the substrate 20 was 300 v, and the coating time was 20 min.

Example 2

The material of the substrate 20 used in this embodiment is SUS304.

Sputtering primer layer 13: the power of the chromium target 23 is 10 kW, the flow rate of argon gas is 110 sccm, the temperature in the coating chamber 21 during coating is 175 ° C, and the negative bias applied to the substrate 20 is 150 volts. The coating time is 8 min.

Sputtering transition layer 15: the power of the chromium target 23 is 7 kW, the flow rate of argon gas is 120 sccm, the flow rate of acetylene is 60 sccm, the temperature in the coating chamber 21 at the time of coating is 165 ° C, and the negative bias voltage applied to the substrate 20 is 250 volts. The coating time was 45 min.

The transparent layer 17 was sputtered: the power of the target 24 was 5.5 kW, the flow rate of argon gas was 120 sccm, the temperature in the coating chamber 21 at the time of coating was 125 ° C, the negative bias applied to the substrate 20 was 350 V, and the coating time was 25 min.

Example 3

The material of the substrate 20 used in this embodiment is stainless steel 314.

Sputtering primer layer 13: The power of the chromium target 23 was 12 kW, the flow rate of argon gas was 135 sccm, the temperature in the coating chamber 21 at the time of coating was 180 ° C, the negative bias voltage applied to the substrate 20 was 220 V, and the coating time was 12 min.

Sputtering transition layer 15: the power of the chromium target 23 is 9 kw, the flow rate of argon gas is 135 sccm, the flow rate of acetylene is 65 sccm, the temperature in the coating chamber 21 at the time of coating is 170 ° C, and the negative bias voltage applied to the substrate 20 is 300 v. The coating time is 50 min.

The transparent layer 17 was sputtered: the power of the target 24 was 7 kw, the flow rate of argon gas was 135 sccm, the temperature in the coating chamber 21 at the time of coating was 115 ° C, the negative bias applied to the substrate 20 was 400 v, and the coating time was 35 min.

The outer casing 100 of the present invention uses a chrome target 23 and a ruthenium target 24 as a target, and uses a magnetron sputtering method to first sputter a metal chrome on the surface of the substrate 20 as a primer layer 13 and then a sputtering transition on the surface of the primer layer 13. Layer 15, finally, the transparent layer 17 is sputtered on the transition layer 15, and the layer-to-layer transition between the layers is better, the surface of the transparent film is flat, and there is no obvious inside the film layer. The force is generated, and when the external force is applied, the transparent film 10 is not easily broken, and the hardness and wear resistance can be exhibited, and the service life is prolonged. The underlayer 13 is a chromium layer having transparency; the transition layer 15 is a CrC layer and has a small thickness and does not affect the transparency of the transparent film; the transparent layer 17 contains only germanium atoms and has high transparency. And the surface of the transparent layer 17 is flat, so the transparent film 10 has a high transparency, so that the surface of the outer casing 100 exhibits high brightness and smoothness.

100‧‧‧ Shell

20‧‧‧Substrate

10‧‧‧Transparent film

13‧‧‧ playing the bottom layer

15‧‧‧Transition layer

17‧‧‧ transparent layer

Claims (9)

An outer casing comprising a substrate and a transparent film formed on the surface of the substrate, the transparent film comprising a primer layer, a transition layer and a transparent layer, wherein the primer layer is a chromium layer, and the transition layer is a chromium carbide layer, The transparent layer is a germanium layer containing only germanium atoms for improving the transparency of the outer shell. The underlayer is formed on the surface of the substrate, and the transition layer is formed on the surface of the underlayer, and the transparent layer is formed in the transition. The surface of the layer. The outer casing according to claim 1 is improved in that the transparent layer has a thickness of 0.1 to 0.3 μm. The outer casing according to claim 1 is improved in that the underlayer has a thickness of 0.1 to 0.3 μm and the transition layer has a thickness of 0.2 to 0.4 μm. The outer casing of claim 1 is improved in that the material of the substrate is metal, plastic or ceramic. A method for manufacturing a casing, comprising the steps of: providing a substrate; using a chromium target as a target, sputtering a substrate on the surface of the substrate by magnetron sputtering, the underlayer is a chromium layer; and the chromium target is used as a target The reaction gas acetylene is introduced, and the transition layer is sputtered on the surface of the underlayer by magnetron sputtering. The transition layer is a chromium carbide layer; the target is used as a target, and the surface of the transition layer is sputtered by magnetron sputtering. The transparent layer is plated, and the transparent layer is a layer of germanium containing only germanium atoms to improve the transparency of the outer shell. The method for manufacturing a casing according to claim 5, wherein the substrate is made of metal, plastic or ceramic. The manufacturing method of the outer casing according to claim 5, wherein the improvement is that the bottom layer is The thickness of the primer layer is 0.1-0.3 μm. The process parameters for preparing the primer layer are as follows: the chromium target uses a radio frequency power source, the chromium target power is 8-15 KW, the argon gas is introduced, the argon gas flow rate is 100-150 sccm, and the indoor temperature of the coating chamber is At 120-180 ° C, the negative bias applied to the substrate is 100-250 V, and the coating time is 5-10 min. The manufacturing method of the outer casing according to claim 5 is improved in that the thickness of the transition layer is 0.2-0.4 μm, and the process parameters for preparing the transition layer are: the chromium target uses an RF power source, and the chromium target power is 6-12KW, argon gas is introduced, the flow rate of argon gas is 80-140sccm, the flow rate of acetylene is 50-75sccm, the indoor temperature of the coating chamber is 100-150°C, and the negative bias voltage applied to the substrate is 200-300V, coating time It is 40-50min. The manufacturing method of the outer casing according to claim 5, wherein the transparent layer is composed of germanium atoms, the transparent layer has a thickness of 0.1-0.3 μm, and the process parameter for preparing the transparent layer is: a target Using RF power supply, the target power is 4-8KW, argon gas is introduced, the flow rate of argon gas is 50-135sccm, the indoor temperature of the coating chamber is 90-120°C, and the negative bias voltage applied to the substrate is 200-400V. The time is 20-40min.