TW201223995A - Polyester film and method for producing same - Google Patents
Polyester film and method for producing same Download PDFInfo
- Publication number
- TW201223995A TW201223995A TW100131060A TW100131060A TW201223995A TW 201223995 A TW201223995 A TW 201223995A TW 100131060 A TW100131060 A TW 100131060A TW 100131060 A TW100131060 A TW 100131060A TW 201223995 A TW201223995 A TW 201223995A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- polyester film
- ring
- dicarboxylic acid
- heat
- Prior art date
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- 229920006267 polyester film Polymers 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- -1 diol compound Chemical class 0.000 claims abstract description 98
- 229920001225 polyester resin Polymers 0.000 claims abstract description 22
- 239000004645 polyester resin Substances 0.000 claims abstract description 22
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 19
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 16
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 13
- 239000002243 precursor Substances 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 238000012360 testing method Methods 0.000 claims description 31
- 230000009477 glass transition Effects 0.000 claims description 28
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 claims description 28
- 239000003963 antioxidant agent Substances 0.000 claims description 27
- 229920000642 polymer Polymers 0.000 claims description 26
- 230000003078 antioxidant effect Effects 0.000 claims description 21
- 150000002009 diols Chemical class 0.000 claims description 16
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 15
- 230000014759 maintenance of location Effects 0.000 claims description 15
- 239000002253 acid Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- 229910052698 phosphorus Inorganic materials 0.000 claims description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 7
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000011593 sulfur Substances 0.000 claims description 7
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 239000002530 phenolic antioxidant Substances 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- JHFAEUICJHBVHB-UHFFFAOYSA-N 1h-indol-2-ol Chemical group C1=CC=C2NC(O)=CC2=C1 JHFAEUICJHBVHB-UHFFFAOYSA-N 0.000 claims 1
- NLMQHXUGJIAKTH-UHFFFAOYSA-N 4-hydroxyindole Chemical class OC1=CC=CC2=C1C=CN2 NLMQHXUGJIAKTH-UHFFFAOYSA-N 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 51
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 7
- 230000008569 process Effects 0.000 abstract description 6
- 230000008602 contraction Effects 0.000 abstract description 3
- 238000006068 polycondensation reaction Methods 0.000 abstract description 3
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 239000010408 film Substances 0.000 description 200
- 210000004027 cell Anatomy 0.000 description 67
- 229920001577 copolymer Polymers 0.000 description 66
- 239000010410 layer Substances 0.000 description 59
- 230000001681 protective effect Effects 0.000 description 38
- 229920005989 resin Polymers 0.000 description 35
- 239000011347 resin Substances 0.000 description 35
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 30
- 239000000758 substrate Substances 0.000 description 26
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 19
- 239000000047 product Substances 0.000 description 18
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 13
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 12
- 239000000945 filler Substances 0.000 description 12
- 150000002894 organic compounds Chemical group 0.000 description 12
- 230000008859 change Effects 0.000 description 11
- 230000007062 hydrolysis Effects 0.000 description 11
- 238000006460 hydrolysis reaction Methods 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 238000011049 filling Methods 0.000 description 9
- 239000002985 plastic film Substances 0.000 description 9
- 229920006255 plastic film Polymers 0.000 description 9
- 239000000654 additive Substances 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 239000006096 absorbing agent Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 238000001125 extrusion Methods 0.000 description 7
- 239000012948 isocyanate Substances 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 239000011342 resin composition Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000009998 heat setting Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- OWQPOVKKUWUEKE-UHFFFAOYSA-N 1,2,3-benzotriazine Chemical compound N1=NN=CC2=CC=CC=C21 OWQPOVKKUWUEKE-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 5
- 239000012964 benzotriazole Substances 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000003475 lamination Methods 0.000 description 5
- 229920001634 Copolyester Polymers 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 4
- 229910052797 bismuth Inorganic materials 0.000 description 4
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 229910052707 ruthenium Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000000052 vinegar Substances 0.000 description 4
- 235000021419 vinegar Nutrition 0.000 description 4
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 210000003850 cellular structure Anatomy 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 125000004956 cyclohexylene group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 239000012760 heat stabilizer Substances 0.000 description 3
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 3
- WNLRTRBMVRJNCN-UHFFFAOYSA-N hexanedioic acid Natural products OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 2
- CTMHWPIWNRWQEG-UHFFFAOYSA-N 1-methylcyclohexene Chemical compound CC1=CCCCC1 CTMHWPIWNRWQEG-UHFFFAOYSA-N 0.000 description 2
- OMOASQRFVYVGSY-UHFFFAOYSA-H C(C1=CC(C(=O)[O-])=CC=C1)(=O)[O-].[Bi+3].C(C1=CC(C(=O)[O-])=CC=C1)(=O)[O-].C(C1=CC(C(=O)[O-])=CC=C1)(=O)[O-].[Bi+3] Chemical compound C(C1=CC(C(=O)[O-])=CC=C1)(=O)[O-].[Bi+3].C(C1=CC(C(=O)[O-])=CC=C1)(=O)[O-].C(C1=CC(C(=O)[O-])=CC=C1)(=O)[O-].[Bi+3] OMOASQRFVYVGSY-UHFFFAOYSA-H 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- LUSFFPXRDZKBMF-UHFFFAOYSA-N [3-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCCC(CO)C1 LUSFFPXRDZKBMF-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid group Chemical group C(C1=CC=CC=C1)(=O)O WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 2
- VNGOYPQMJFJDLV-UHFFFAOYSA-N dimethyl benzene-1,3-dicarboxylate Chemical compound COC(=O)C1=CC=CC(C(=O)OC)=C1 VNGOYPQMJFJDLV-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 238000002309 gasification Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920005990 polystyrene resin Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- JNDXHCPXIVLGCS-UHFFFAOYSA-N (2,3,4,5-tetramethylphenyl)methanol Chemical compound CC1=CC(CO)=C(C)C(C)=C1C JNDXHCPXIVLGCS-UHFFFAOYSA-N 0.000 description 1
- XBZYWSMVVKYHQN-MYPRUECHSA-N (4as,6as,6br,8ar,9r,10s,12ar,12br,14bs)-10-hydroxy-2,2,6a,6b,9,12a-hexamethyl-9-[(sulfooxy)methyl]-1,2,3,4,4a,5,6,6a,6b,7,8,8a,9,10,11,12,12a,12b,13,14b-icosahydropicene-4a-carboxylic acid Chemical compound C1C[C@H](O)[C@@](C)(COS(O)(=O)=O)[C@@H]2CC[C@@]3(C)[C@]4(C)CC[C@@]5(C(O)=O)CCC(C)(C)C[C@H]5C4=CC[C@@H]3[C@]21C XBZYWSMVVKYHQN-MYPRUECHSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- SEKSWDGNGZWLDU-UHFFFAOYSA-N 1,1,2,2-tetramethylcyclohexane Chemical compound CC1(C)CCCCC1(C)C SEKSWDGNGZWLDU-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- XYXJKPCGSGVSBO-UHFFFAOYSA-N 1,3,5-tris[(4-tert-butyl-3-hydroxy-2,6-dimethylphenyl)methyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C)=C1CN1C(=O)N(CC=2C(=C(O)C(=CC=2C)C(C)(C)C)C)C(=O)N(CC=2C(=C(O)C(=CC=2C)C(C)(C)C)C)C1=O XYXJKPCGSGVSBO-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- JPEWDCTZJFUITH-UHFFFAOYSA-N 1-methoxydecane Chemical compound CCCCCCCCCCOC JPEWDCTZJFUITH-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- QVRKMMIMMYQZHF-UHFFFAOYSA-N 2,2,3-triethoxyoxane Chemical compound C(C)OC1C(OCCC1)(OCC)OCC QVRKMMIMMYQZHF-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- NEOZDUDLYDUOTE-UHFFFAOYSA-N 2,3,5,6-tetramethylterephthalic acid Chemical compound CC1=C(C)C(C(O)=O)=C(C)C(C)=C1C(O)=O NEOZDUDLYDUOTE-UHFFFAOYSA-N 0.000 description 1
- OLFNXLXEGXRUOI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2-phenylpropan-2-yl)phenol Chemical compound C=1C(N2N=C3C=CC=CC3=N2)=C(O)C(C(C)(C)C=2C=CC=CC=2)=CC=1C(C)(C)C1=CC=CC=C1 OLFNXLXEGXRUOI-UHFFFAOYSA-N 0.000 description 1
- FDSYTWVNUJTPMA-UHFFFAOYSA-N 2-[3,9-bis(carboxymethyl)-3,6,9,15-tetrazabicyclo[9.3.1]pentadeca-1(15),11,13-trien-6-yl]acetic acid Chemical compound C1N(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC2=CC=CC1=N2 FDSYTWVNUJTPMA-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
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- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- ZWPWUVNMFVVHHE-UHFFFAOYSA-N terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1.OC(=O)C1=CC=C(C(O)=O)C=C1 ZWPWUVNMFVVHHE-UHFFFAOYSA-N 0.000 description 1
- WOZVHXUHUFLZGK-UHFFFAOYSA-N terephthalic acid dimethyl ester Natural products COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 1
- NQAVPKIJZCHUNS-UHFFFAOYSA-N tetradecylcyclohexane Chemical compound CCCCCCCCCCCCCCC1CCCCC1 NQAVPKIJZCHUNS-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920006345 thermoplastic polyamide Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-VIFPVBQESA-N trimethoxy-[3-[[(2r)-oxiran-2-yl]methoxy]propyl]silane Chemical compound CO[Si](OC)(OC)CCCOC[C@H]1CO1 BPSIOYPQMFLKFR-VIFPVBQESA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 150000003648 triterpenes Chemical group 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/16—Dicarboxylic acids and dihydroxy compounds
- C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
- C08G63/181—Acids containing aromatic rings
- C08G63/183—Terephthalic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/16—Dicarboxylic acids and dihydroxy compounds
- C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
- C08G63/199—Acids or hydroxy compounds containing cycloaliphatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/049—Protective back sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Materials Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Photovoltaic Devices (AREA)
- Polyesters Or Polycarbonates (AREA)
Abstract
Description
201223995 六、發明說明: 【發明所屬之技術領域j 技術領域 本發明係有關於一種聚s曰膜(特別是对熱性聚醋膜)及 其製造方法。 C 前^:系好;}| 背景技術 近年來,於電子機器、半導體、太陽電池等領域中, 被稱為塑膠膜與金屬箔之積層技術、對塑膠膜的蒸鍍技術 或濺鍍技術、塑膠膜與陶瓷之積層技術、各種樹脂對塑膠 膜之塗布技術或積層技術之複合化技術係十分繁盛且有 複雜化的傾向。所得到的積層品等複合體係有直接作為製 品使用的情況,亦有將從該複合體上將塑膠膜(即所謂的製 程膜(脫模膜))剝離、去除而得到者作為製品使用的情況。 如此,塑膠膜的用途係涉及多種方面。 在複合化之際,一般而言會有很多對塑膠膜賦予熱的 情形,且賦予更高溫度的情形係逐漸增加。此外,隨著近 年來南性能化的需求,塑膠膜被要求要有的耐熱性係變得 很嚴格例如,不只是塑膠膜的耐熱變形性,連有關於因 熱所造成的尺寸變化之行為特性(耐熱尺寸穩定性)亦為重 要因子* 一般已知有將聚醯亞胺樹脂膜作為耐熱性基材膜。然 而’聚醯亞賴脂麟_熱性優S,㈣於其價格高而 有It濟性的問題,因此已有進行了較低價的聚㈣之研究。 201223995 雖然已知將聚對苯二甲酸乙二酿(ΡΕτ)膜作為聚醋 膜,但由於其不具有可充分對應近年來積層技術等複合化 技術般程度的财熱性,而產生了各種問題。具體而言,由 於在金屬層之積層時會因熱而引起在基材膜上的熔融變 形,因此對基材膜要求要有良好的耐熱變形性。即便具有 良好的耐熱變形性,由於在因熱而在基材膜產生尺寸變動 (熱膨脹及/或熱收縮)’就會在積層體全體產生翹曲,因此 對基材膜要求要有良好的耐熱尺寸穩定性。再者,由於因 為熱會降低基材膜的強度’因此要求要有良好的耐熱強度 穩定性。 其他聚酯膜材料,已知有使由1>4_環己烷二甲醇所構成 的二醇成分與由對苯二甲酸及間苯二甲酸所構成的二羧酸 成分進行聚縮合而成的聚酯(所謂的pCTA)(例如專利文獻 1)。然而’與PET膜相同地,單獨使用pcTA膜仍無法得到 足夠的对熱性。 習知技術文獻 專利文獻 專利文獻1 :曰本專利特開2008-227203號公報 t發明内容3 發明概要 發明欲解決的課題 本發明之目的在於提供一種耐熱尺寸穩定性及耐熱變 形性非常優異,且耐熱強度穩定性經改善的聚酯膜及其製 造方法。 201223995 用以解決課題之手段 至少 本發明係有關於一種二軸配向聚酯犋, 、巴含"有ί 使二醇成分及二減成分進行雜合; 其中二醇成分包含以通式⑴表示的二醇化合物. 【化1】 。 '201223995 VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a polys(R) film (particularly to a thermal polyester film) and a method of producing the same. C Before ^: is good;}| Background technology In recent years, in the fields of electronic equipment, semiconductors, solar cells, etc., it is called the lamination technology of plastic film and metal foil, the vapor deposition technology of plastic film or sputtering technology, The lamination technology of plastic film and ceramics, the coating technology of various resins to plastic film or the composite technology of laminated technology are very prosperous and complicated. In the case where the composite system such as the laminated product is used as a product, the plastic film (so-called process film (release film)) is peeled off and removed from the composite, and the product is used as a product. . As such, the use of plastic film involves a variety of aspects. At the time of compositing, there are generally many cases where heat is imparted to the plastic film, and the case of giving higher temperatures is gradually increased. In addition, with the demand for performance in the south in recent years, the heat resistance of the plastic film is required to be strict, for example, not only the heat deformation resistance of the plastic film, but also the behavioral characteristics of the dimensional change due to heat. (heat-resistant dimensional stability) is also an important factor * It is generally known that a polyimide film is used as a heat-resistant base film. However, the 'Poly 醯 赖 麟 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 201223995 Although it is known that a polyethylene terephthalate film is used as a polyester film, it has various problems because it does not have a degree of richness that can sufficiently correspond to a composite technique such as a laminate technique in recent years. Specifically, since the molten layer is deformed on the base film due to heat when the metal layer is laminated, it is required to have good heat deformation resistance to the base film. Even if it has good heat deformation resistance, warpage occurs in the entire laminate due to dimensional changes (thermal expansion and/or heat shrinkage) in the substrate film due to heat. Therefore, it is required to have good heat resistance to the substrate film. Dimensional stability. Further, since heat is required to lower the strength of the substrate film, it is required to have good heat resistance stability. Other polyester film materials are known to be obtained by polycondensing a diol component composed of 1 > 4_cyclohexanedimethanol with a dicarboxylic acid component composed of terephthalic acid and isophthalic acid. Polyester (so-called pCTA) (for example, Patent Document 1). However, as with the PET film, sufficient heat resistance could not be obtained by using the pcTA film alone. SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION The object of the present invention is to provide a heat-resistant dimensional stability and heat deformation resistance which are excellent, and A polyester film having improved heat resistance stability and a method for producing the same. 201223995 means for solving the problem at least the present invention relates to a biaxial alignment polyester crucible, a bacon " having a mixture of a diol component and a diminishing component; wherein the diol component comprises a formula (1) The diol compound. [Chemical 1]. '
(I) (式中,環Α為環己炫環或苯環;nU〇〜4之整數;Ri係選自 於由氫原子及碳原子數1〜3之烷基所構成之群,且告“為 2〜4之整數時,該2〜4個1^係各自獨立地選自於該群^ η二 二羧酸成分包含通式(II)表示的二羧醆化合物: 【化2】(I) (wherein, the ring is a cyclohexene ring or a benzene ring; an integer of nU〇~4; and Ri is selected from the group consisting of a hydrogen atom and an alkyl group having 1 to 3 carbon atoms, and "When it is an integer of 2 to 4, the 2 to 4 groups are each independently selected from the group consisting of the dicarboxylic acid component represented by the formula (II): [Chemical 2]
(Π) (式中’在環Α為環己烧環時,環Β為苯環;在環Α為苯環時, 環Β為環己烧環;η2為〇〜4之整數;R2係選自於由氫原子及 碳原子數卜3之烷基所構成之群,且當!!2為2〜4之整數時, 該2〜4個R2係各自獨立地選自於該群;2個汉3係各自獨立為 氫原子或碳原子數1〜3之烧基); 在拉伸何重5gf及升溫速度1 〇°c /分鐘的條件下從5〇。〇 升溫至100°C後的熱膨脹率之絶對值係在50ppm/°C以下; 於150°C之熱收縮率的絶對值係小於2.0%。 201223995 本發明亦有關於一種聚酯膜的製造方法,其係在製造 含有前述聚酯樹脂的前驅物膜之後,對該前驅物犋實^ 少包含二軸延伸處理之熱處理步驟。 發明效果 本發明之聚酯膜之耐熱尺寸穩定性及耐熱變形性非常 優異’且具有良好的耐熱強度穩定性。 圖式簡單說明 【第1圖】關於本案之基礎申請案(日本專利特% 2〇10-19252〇號案)之發明的一實施形態之太陽電池模級 背面保護片的截面圖。 態 【第2圖】關於本案之基礎申請案之發明的一實施形 之太陽電池模組的概略截面圖。 【第3圖】表示對關於本案之基礎申請案的實施例!、 及比較例1〜3之膜進行壓力鍋試驗中的拉伸強度保持率 經時變化之圖表。 【第4圖】表示對關於本案之基礎申請案的實施例1、2 及比較例1〜3之膜進行壓力鍋試驗中的拉伸伸度保持率之 經時變化的圖表。 【第5圖】表示關於本案之基礎申請案的實施例丨、2及 比較例2之膜的X光繞射結果之圖。 【實施方式:J 用以實施發明之形態 關於本發明之聚酯膜係含有特定聚酯樹脂之二轴配向 膜》二軸配向係指,在該臈的面内方向中,構成該膜的聚 201223995 合物分子主要以相異的2方向(較佳為呈略直角的2方向)配 向之意,且可藉由例如後述的二軸延伸來達成。於本發明 中,藉由將包含特定聚酯樹脂之膜作成二軸配向膜,可比 未進行二軸配向的膜更為展現非常優異的对熱尺寸穩定性 及耐熱變形性,且可使耐熱強度穩定性提升。 本說明書中,对熱尺寸穩定性係指即便將膜加熱,仍 可充分防止膜之膨脹及收縮的膜特性之意。 而才熱變形性係指即便將膜加熱,仍可充分防止膜之溶 融變形的膜特性之意。 耐熱強度穩定性係指即便將膜加熱,仍可充分防止膜 強度之降低的膜特性之意。 <聚酯樹脂> 本發明之聚酯膜所含有的特定聚酯樹脂(以下,單純稱 作「聚酯樹脂A」),係至少使二醇成分與二羧酸成分進行 聚縮合而成的聚酯樹脂,且二醇成分包含以下列通式(I)表 示的二醇化合物,而二羧酸成分包含以下列通式(II)表示的 二羧酸化合物。 (二醇成分) 【化3】(Π) (In the formula, when the ring is a cyclohexane ring, the ring is a benzene ring; when the ring is a benzene ring, the ring is a ring of a ring; η2 is an integer of 〇~4; R2 is selected From the group consisting of a hydrogen atom and an alkyl group having a carbon number of 3, and when !! 2 is an integer of 2 to 4, the 2 to 4 R2 systems are each independently selected from the group; The Han 3 series are each independently a hydrogen atom or a carbon atom having a carbon number of 1 to 3); 5 f is obtained under conditions of a tensile weight of 5 gf and a temperature rising rate of 1 〇 ° c /min.绝对 The absolute value of the coefficient of thermal expansion after heating to 100 ° C is 50 ppm / ° C or less; the absolute value of the heat shrinkage at 150 ° C is less than 2.0%. 201223995 The present invention also relates to a method for producing a polyester film which comprises a heat treatment step comprising a biaxial stretching treatment after the precursor film containing the polyester resin is produced. EFFECT OF THE INVENTION The polyester film of the present invention is excellent in heat-resistant dimensional stability and heat-resistant deformability and has good heat-resistant strength stability. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a solar cell module-level back surface protective sheet according to an embodiment of the invention of the present invention (Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Fig. 2] A schematic cross-sectional view of a solar battery module according to an embodiment of the invention of the basic application of the present invention. [Fig. 3] shows an embodiment of the basic application regarding the case! And the film of Comparative Examples 1 to 3 was subjected to a graph showing the change in tensile strength in the pressure cooker test over time. [Fig. 4] Fig. 4 is a graph showing changes with time in the tensile elongation retention rate in the pressure cooker test of the films of Examples 1 and 2 and Comparative Examples 1 to 3 of the basic application of the present application. Fig. 5 is a view showing the results of X-ray diffraction of the films of Examples 丨, 2 and Comparative Example 2 of the basic application of the present application. [Embodiment: J is a mode for carrying out the invention. The polyester film of the present invention contains a biaxial alignment film of a specific polyester resin", and a biaxial alignment means a polymer which constitutes the film in the in-plane direction of the crucible The 201223995 compound molecule is mainly oriented in two different directions (preferably two directions at a slightly right angle), and can be achieved by, for example, biaxial stretching as described later. In the present invention, by forming a film containing a specific polyester resin as a biaxial alignment film, it is possible to exhibit very excellent thermal dimensional stability and heat deformation resistance, and heat resistance strength, compared to a film which is not subjected to biaxial alignment. Increased stability. In the present specification, the thermal dimensional stability means the film property which can sufficiently prevent the expansion and contraction of the film even if the film is heated. The thermal deformability means that the film characteristics of the film can be sufficiently prevented from being melted and deformed even if the film is heated. The heat-resistant strength stability means a film property which can sufficiently prevent a decrease in film strength even if the film is heated. <Polyester Resin> The specific polyester resin (hereinafter simply referred to as "polyester resin A") contained in the polyester film of the present invention is obtained by at least condensing a diol component and a dicarboxylic acid component. The polyester resin, and the diol component contains a diol compound represented by the following formula (I), and the dicarboxylic acid component contains a dicarboxylic acid compound represented by the following formula (II). (diol component) [Chemical 3]
環A上的2個羥甲基可為1,2-取代、1,3-取代或1,4-取代之關 201223995 係,且以1,3-取代或1,4-取代之關係為佳,又以1,4-取代之 關係最佳。 nl為0〜4之整數,且以0或1為佳,又以0更佳。 R1係選自於由氫原子及碳原子數1〜3之烷基所構成之 群。該烷基之具體例可舉例如曱基、乙基、異丙基及正丙 基。R1係以氫原子或曱基為佳,又以氫原子更佳。當nl為 2〜4之整數時,該2〜4個R1係各自獨立選自於前述群,且較 佳係同時為氫原子。 以通式⑴表示的二醇化合物之具體例可舉例如以通式 (la)表示的環己烷系二醇化合物及以通式(lb)表示的苯系二 醇化合物。較佳為環己烷系二醇化合物。 【化4】The two methylol groups on ring A may be 1,2-substituted, 1,3-substituted or 1,4-substituted, 201223995, and preferably have a relationship of 1,3-substituted or 1,4-substituted. And the relationship with 1,4- substitution is the best. Nl is an integer of 0 to 4, and preferably 0 or 1, and more preferably 0. R1 is selected from the group consisting of a hydrogen atom and an alkyl group having 1 to 3 carbon atoms. Specific examples of the alkyl group include a mercapto group, an ethyl group, an isopropyl group and a n-propyl group. R1 is preferably a hydrogen atom or a sulfhydryl group, and more preferably a hydrogen atom. When n1 is an integer of 2 to 4, the 2 to 4 R1 systems are each independently selected from the above group, and the preferred one is a hydrogen atom at the same time. Specific examples of the diol compound represented by the formula (1) include a cyclohexane-based diol compound represented by the formula (la) and a benzene-based diol compound represented by the formula (lb). A cyclohexane diol compound is preferred. 【化4】
【化5】 hoch2[化5] hoch2
(la) (lb) 式(la)及(lb)中,nl及R1係與式(I)中相同。 以通式(la)表示的環己烷系二醇化合物係通式(I)中環A 為環己烷環之二醇化合物。其具體例可舉例如:1,2-環己烷 二曱醇、1,3-環己烷二甲醇、1,4-環己烷二甲醇、1,2-雙(羥 基甲基)-3,4,5,6-四曱基-環己烷、1,3-雙(羥基甲基)-2,4,5,6- 201223995 四甲基-環己烷、1,4-雙(羥基甲基)-2,3,5,6-四曱基-環己烷 等。係以1,3-環己烷二甲醇、1,4-環己烷二曱醇為佳,又以 1,4-環己烷二甲醇更佳。 以通式(lb)表示的苯系二醇化合物係通式(I)中環A為 苯環之二醇化合物。其具體例可舉例如:1,2-雙(羥基曱基) 苯、_ 1,3-雙(羥基曱基)苯、1,4-雙(羥基曱基)苯、1,2-雙(羥基 甲基)-3,4,5,6-四甲基-苯、1,3-雙(羥基甲基)-2,4,5,6-四曱基-苯1,4-雙(羥基曱基)-2,3,5,6-四曱基-苯)等。係以1,3-雙(羥 基甲基)苯、1,4-雙(羥基甲基)苯為佳,又以1,4-雙(羥基曱基) 苯更佳。 除了以前述通式(I)表示的二醇化合物以外,二醇成分 亦可含有其他二醇化合物。其他二醇化合物係可使用作為 聚酯膜原料使用的二醇化合物,而可舉例如:乙二醇、1,2-丙二醇、1,3-丙二醇、新戊二醇、1,2-丁二醇、1,3-丁二醇、 2,3-丁二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、二乙二 醇、三乙二醇、聚烷二醇等脂肪族二醇化合物及2,2-雙(4·-/3··羥基乙氧苯基)丙烷等二苯基系二醇化合物。 從耐熱尺寸穩定性、耐熱變形性、成本、擠壓成形性 及結晶性(延伸性)的觀點來看,在以前述通式(I)表示的二醇 化合物之中,聚酯樹脂A之二醇成分係以包含前述通式(I) 中環A上的2個羥甲基為1,4 -取代關係之1,4 -二醇化合物為 佳,且以僅由該1,4-二醇化合物(特別是1,4-環己烷二甲醇) 所構成更佳。 從耐熱尺寸穩定性、耐熱變形性、成本、擠壓成形性 201223995 及結晶性(延伸性)的觀點來看,以前述通式(i)表示的二醇化 合物相對於全二醇成分之含有比例以在50莫耳%以上為 佳,且以在80莫耳%以上更佳,並以在95莫耳%以上最佳。 二醇成分可包含2種以上前述通式(I)表示的二醇化合物,此 時,其等之合計含有比例只要是在前述範圍内即可。 除了前述二醇成分以外,聚酯樹脂A亦可含有例如:三 羥曱基甲烷、三羥甲基乙烷、三羥曱基丙烷、新戊四醇、 甘油、己三醇等3官能以上之多元醇成分來作為構成單體。 3官能以上之多元醇成分相對於全醇類成分之含有比 例通常在50莫耳%以下,且以20莫耳%以下為佳。 (二羧酸成分) 【化6】(la) (lb) In the formulas (la) and (lb), nl and R1 are the same as in the formula (I). The cyclohexane-based diol compound represented by the formula (1) is a diol compound in which the ring A in the formula (I) is a cyclohexane ring. Specific examples thereof include 1,2-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanedimethanol, and 1,2-bis(hydroxymethyl)-3. ,4,5,6-tetradecyl-cyclohexane, 1,3-bis(hydroxymethyl)-2,4,5,6-201223995 tetramethyl-cyclohexane, 1,4-bis(hydroxyl Methyl)-2,3,5,6-tetradecyl-cyclohexane, and the like. It is preferably 1,3-cyclohexanedimethanol or 1,4-cyclohexanedodecanol, more preferably 1,4-cyclohexanedimethanol. The benzene-based diol compound represented by the formula (lb) is a diol compound in which the ring A in the formula (I) is a benzene ring. Specific examples thereof include 1,2-bis(hydroxyindenyl)benzene, 1,3-1,3-bis(hydroxyindenyl)benzene, 1,4-bis(hydroxyindenyl)benzene, and 1,2-double ( Hydroxymethyl)-3,4,5,6-tetramethyl-benzene, 1,3-bis(hydroxymethyl)-2,4,5,6-tetradecyl-benzene 1,4-bis(hydroxyl) Mercapto)-2,3,5,6-tetradecyl-benzene) and the like. Preferably, 1,3-bis(hydroxymethyl)benzene, 1,4-bis(hydroxymethyl)benzene is preferred, and 1,4-bis(hydroxyindenyl)benzene is more preferred. The diol component may contain other diol compounds in addition to the diol compound represented by the above formula (I). As the other diol compound, a diol compound used as a raw material of the polyester film can be used, and examples thereof include ethylene glycol, 1,2-propylene glycol, 1,3-propanediol, neopentyl glycol, and 1,2-butylene. Alcohol, 1,3-butanediol, 2,3-butanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, diethylene glycol, triethylene glycol An aliphatic diol compound such as an alcohol or a polyalkylene glycol; and a diphenyl diol compound such as 2,2-bis(4·-/3··hydroxyethoxyphenyl)propane. From the viewpoints of heat resistance dimensional stability, heat deformation resistance, cost, extrusion moldability, and crystallinity (extensibility), among the diol compounds represented by the above formula (I), the polyester resin A The alcohol component is preferably a 1,4-diol compound having a 1,4 -substituted relationship in which two methylol groups on the ring A in the above formula (I) are used, and only the 1,4-diol compound is used. (especially 1,4-cyclohexanedimethanol) is more preferred. The ratio of the diol compound represented by the above formula (i) to the total diol component is from the viewpoints of heat resistance dimensional stability, heat deformation resistance, cost, extrusion moldability 201223995, and crystallinity (extensibility). It is preferably 50 mol% or more, more preferably 80 mol% or more, and most preferably 95 mol% or more. The diol component may contain two or more kinds of the diol compounds represented by the above formula (I). In this case, the total content of the diols may be within the above range. In addition to the diol component, the polyester resin A may contain, for example, a trifunctional or higher functional group such as trishydroxymethane, trimethylolethane, trihydroxymethylpropane, neopentyl alcohol, glycerin or hexanetriol. The polyol component is used as a constituent monomer. The content of the trifunctional or higher polyhydric alcohol component relative to the total alcohol component is usually 50 mol% or less, and preferably 20 mol% or less. (dicarboxylic acid component)
式(II)中,在環A為環己烷環時’環B為苯環;在環A為 苯環時,環B為環己烷環。環B上的2個-COOR3基係1,2-取 代、1,3-取代或1,4-取代之關係,且以1,3-取代或1,4-取代之 關係為佳,又以1,4-取代之關係更佳。 n2S〇〜4之整數,且以0或1為佳,又以0更佳。 R2係選自於由氫原子及碳原子數1〜3之烷基所構成之 群。該烷基之具體例可列舉如與在R1之說明段落中例示者 相同的烷基。R2係以氫原子或甲基為佳,又以氫原子更佳。 且當n2為2〜4之整數時,該2〜4個R2係各自獨立選自於前述 10 201223995 群,且以同時為氫原子為佳。 2個R3係各自獨立為氫原子或碳原子數1〜3之烷基。該 烷基之具體例可列舉與在R1之說明段落中例示者相同的烷 基。R3係以各自獨立為氫原子或曱基為佳,又以同時為氫 原子更佳。 以通式(II)表示的二羧酸化合物之具體例可舉例如:以 通式(Ila)表示的苯系二羧酸化合物及以通式(lib)表示的環 己烷系二羧酸化合物。較佳為苯系二羧酸化合物。 【化7】 r3oocIn the formula (II), when the ring A is a cyclohexane ring, the ring B is a benzene ring; and when the ring A is a benzene ring, the ring B is a cyclohexane ring. The two -COOR3 groups on ring B are 1,2-substituted, 1,3-substituted or 1,4-substituted, and preferably have a relationship of 1,3-substituted or 1,4-substituted. The relationship of 1,4-substitution is better. An integer of n2S〇~4, preferably 0 or 1, and more preferably 0. R2 is selected from the group consisting of a hydrogen atom and an alkyl group having 1 to 3 carbon atoms. Specific examples of the alkyl group include the same alkyl groups as those exemplified in the description of R1. R2 is preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom. And when n2 is an integer of 2 to 4, the 2 to 4 R2 systems are each independently selected from the group of 10 201223995, and it is preferably a hydrogen atom at the same time. Each of the two R3 groups is independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. Specific examples of the alkyl group include the same alkyl groups as those exemplified in the description of R1. R3 is preferably each independently a hydrogen atom or a ruthenium group, and more preferably a hydrogen atom at the same time. Specific examples of the dicarboxylic acid compound represented by the formula (II) include a benzene-based dicarboxylic acid compound represented by the formula (Ila) and a cyclohexane-based dicarboxylic acid compound represented by the formula (lib). . A benzene-based dicarboxylic acid compound is preferred. [7] r3ooc
(Ila) 【化8】 r3ooc(Ila) [化8] r3ooc
(Hb) 式(Ila)及(lib)中,n2、R2及R3係與在式(II)中相同。 以通式(Ila)表示的苯系二羧酸化合物係通式(II)中環B 為苯環的二羧酸化合物。其具體例可舉例如:對苯二甲酸、 間苯二曱酸、臨苯二曱酸、5-第三丁基間苯二曱酸、鄰苯 二甲酸、4,4-聯苯二羧酸、4,4-聯苯颯二羧酸、對苯二曱酸 甲酯、間苯二曱酸甲酯、鄰苯二甲酸曱酯、1,2-二羧基 -3:,4:,5,6-四甲基-苯、1,3-二羧基-2,4,5,6-四曱基-苯、1,4-二 羧基-2,3,5,6-四甲基-苯等。較佳為對苯二甲酸、對苯二曱 201223995 酸甲酯、間苯二甲酸、間苯二甲酸曱醋。 以通式(iib)表示的環己烷系二羧酸化合物係通式(ιι) 中環B為環己烧環的二魏化合物。其具體例可舉例如: 1,2-¾己烧二鼓酸、1,3-環己烧二缓酸、ι,4_學己尸幾^ 丨,2-二縣-3,4,5,6-四曱基-環己烷、U_二竣基二:6:甲 基環己燒、1,4-二缓基-2,3,5’6-四甲基.環己貌等。較佳為 1,4-環己烧二鲮酸。 除了以前述通式(H)表示的二羧酸化合物之外_ . Λ 成分可含有其他二羧酸化合物。其他二羧酸化合物可使用 作為聚酯膜原料使用的二羧酸化合物,可舉例如· 1 * 羧酸、1’5-萘二羧酸、2,6-萘二羧酸)等萘系二羧酸化4合:: Μ'-二苯基二羧酸、4,4’-二苯基醚二羧酸、4,4,_二苯美礙一 羧酸等二苯基系二羧酸化合物、己二酸、 土 ^癸二酸等脂肪族 二叛酸化合物。 從咐熱尺寸穩定性、耐熱變形性、成本、擠壓成形性 及結晶性(延伸性)的觀點來看,在以前述通式(11)表示的一 羧酸化合物之中,聚醋樹脂Α之二_成分係以包含 式m中環B上的2個_C00R3基為M.取代關係之14·二叛酸 ^勿為^且以包含該^_化合物及前述通綱 I:佳:個,R3基為1,3_取代關係之仏二賴化合 3 堇由认二雜简^^^ =(特別是間苯二甲酸㈣ 及好尺相技、雜變形性、成本、擠壓成形性 日日延伸性)的觀點來看,以前述通式(II)表示的二缓(Hb) In the formulae (Ila) and (lib), n2, R2 and R3 are the same as in the formula (II). The benzene-based dicarboxylic acid compound represented by the formula (Ila) is a dicarboxylic acid compound in which the ring B in the formula (II) is a benzene ring. Specific examples thereof include terephthalic acid, isophthalic acid, phthalic acid, 5-tert-butylisophthalic acid, phthalic acid, and 4,4-biphenyldicarboxylic acid. , 4,4-biphenylpyrene dicarboxylic acid, methyl terephthalate, methyl isophthalate, decyl phthalate, 1,2-dicarboxy-3:, 4:, 5, 6-tetramethyl-benzene, 1,3-dicarboxy-2,4,5,6-tetradecyl-benzene, 1,4-dicarboxy-2,3,5,6-tetramethyl-benzene, etc. . Preferred are terephthalic acid, p-benzoquinone 201223995 methyl ester, isophthalic acid, isophthalic acid vinegar. The cyclohexane-based dicarboxylic acid compound represented by the formula (iib) is a diwei compound in which the ring B in the formula (ι) is a cyclohexane ring. Specific examples thereof include, for example, 1,2-3⁄4 of burnt dibutyl acid, 1,3-cyclohexanal acid, ι, 4_学己尸^ 丨, 2-二县-3,4,5 , 6-tetradecyl-cyclohexane, U-dimercapto 2: 6: methylcyclohexene, 1,4-disulfo-2,3,5'6-tetramethyl, cyclohexene, etc. . Preferred is 1,4-cyclohexanaldicarboxylic acid. In addition to the dicarboxylic acid compound represented by the above formula (H), the Λ component may contain other dicarboxylic acid compounds. As the other dicarboxylic acid compound, a dicarboxylic acid compound used as a raw material of the polyester film can be used, and examples thereof include a naphthalene system such as a 1*carboxylic acid, a 1'5-naphthalenedicarboxylic acid, or a 2,6-naphthalenedicarboxylic acid. Carboxylation 4-inclusion: Diphenyl-based dicarboxylic acid compounds such as Μ'-diphenyldicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, 4,4,-diphenyliso-monocarboxylic acid An adipic acid compound such as adipic acid or earth oxalic acid. From the viewpoint of heat dimensional stability, heat deformation resistance, cost, extrusion moldability, and crystallinity (extensibility), among the monocarboxylic acid compounds represented by the above formula (11), the polyacetate resin The second component is composed of two _C00R3 groups on the ring B in the formula m, which are M. in the substitution relationship of 14·2 oxo acid ^, and includes the compound and the above-mentioned general formula I: The R3 group is 1,3_substitution relationship, the 仏2 化 3 堇 认 认 认 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( From the viewpoint of daily extensibility, the second formula represented by the above formula (II)
12 201223995 酸化合物相對於全二羧酸成分之含有比例以在50莫耳%以 上為佳,且以在80莫耳%以上更佳,並以在95莫耳%以上最 佳。在二羧酸成分包含2種以上以前述通式(II)表示的二羧 酸化合物時,料之合計含纽⑽要是在前述範圍内即 〇 除了前述二羧酸成分之外,聚酯樹脂八亦可含有一元羧 酸成分及/或3官能以上之多元羧酸成分作為構成單體。 又,聚酯樹脂A以具有40〜250。(:(特別是川〜細艽沁玻 璃轉移溫度為佳。 原料樹脂之玻璃轉移溫度可基於jISK7121進行測量。 又’聚酯樹脂A以具有180~350°C(特別是2〇〇〜300。〇 之熔點為佳。 熔點可基於JIS K7121進行測量。 聚酯樹脂A可藉由眾所皆知的方法使前述單體成分進 行聚縮合來製造,亦可由市售品獲得。 聚酯樹脂A之市售品可舉例如:共聚酯 (copolyester) 13319(Eastman 公司製)等。共聚酯 (copolyester) 13319(Eastman公司製)係 l,4-環己烷二甲醇與 對苯二曱酸及間笨二曱酸之聚縮合物。 於5^1曰膜中’ 旨樹脂A亦可在前述範圍内含有2種以 上單體組成、玻璃轉移溫度、熔點及/或羧基末端濃度不同 的之聚酯樹脂A。 雖然除了前述聚酯樹脂A之外,本發明之聚酯膜亦可含 有其他聚合物’但從更為提升耐熱尺寸穩定性及耐熱變形 13 201223995 性的觀點來看,《膜中的聚合物成分以僅由前述聚_ 脂A構成為佳。 從更為提升⑲尺寸狀性叫—料的觀點來 看’聚酯樹脂A相對於聚酯膜中聚合物虑八 X刀之含有比例以在 60重量%以上為佳,且以在8〇重量%以 工炅佳,又以為1〇〇 重量%最佳。 在不會對耐熱尺寸穩定性及财熱變形性等性能或製膜 性造成不良影響的範圍内,亦可在聚喂棋中含有例如聚 ^苯二甲酸乙二S旨卿)、聚對苯二甲酸丁二酿㈣、聚 奈一甲酸乙一酯(PEN)、聚對苯二曱酸= 脂;聚麵亞胺、聚笨硫峻、聚鍵石風、=甲酷等«樹 物。 聚本醚等其他聚合 <添加劑> 除了前述聚合物以外,聚醋膜亦可 外線吸收劑、著色劑、光穩定劑、潤有:氧化劑、紫 難燃劑等添加劑1耐細±之_ 、,晶成核劑、 有抗氧化劑。從耐候性的觀點來看;旨膜較佳係含 外線吸收劑》 眾知骐較佳係含有紫 抗氧化劑可使用聚酯 可舉例如:酚系抗氧化劑、、二乍為抗氧化劑使用者’ 等。 化劑、硫系抗氧化劑 酚系抗氧化劑為含有 迄今在聚酷膜領域t Θ架的有機化合物,且可使用 機化合物。酚“、、酚系抗氣化劑使用的含酚骨架有 “氣化劑係可由市售品獲得。12 201223995 The content ratio of the acid compound to the total dicarboxylic acid component is preferably 50 mol% or more, more preferably 80 mol% or more, and most preferably 95 mol% or more. When the dicarboxylic acid component contains two or more kinds of the dicarboxylic acid compound represented by the above formula (II), the total content of the catalyst (10) is in the above range, that is, the above-mentioned dicarboxylic acid component is removed, and the polyester resin is eight. A monocarboxylic acid component and/or a trifunctional or higher polycarboxylic acid component may be contained as a constituent monomer. Further, the polyester resin A has a thickness of 40 to 250. (: (especially the transfer temperature of the 〜~ fine 艽沁 glass is preferred. The glass transition temperature of the raw resin can be measured based on jISK7121. The polyester resin A has a temperature of 180 to 350 ° C (especially 2 〇〇 to 300). The melting point of ruthenium is preferably measured. The melting point can be measured based on JIS K7121. The polyester resin A can be produced by polycondensation of the above monomer component by a well-known method, or can be obtained from a commercially available product. Commercially available products are, for example, copolyester 13319 (manufactured by Eastman Co., Ltd.), etc. Copolyester 13319 (manufactured by Eastman Co., Ltd.) is 1, 4-cyclohexanedimethanol and terephthalic acid and A polycondensate of a stearic acid. In the 5^1 曰 film, the resin A may contain two or more kinds of monomer compositions, glass transition temperatures, melting points, and/or carboxyl terminal concentrations in the above range. Ester Resin A. Although the polyester film of the present invention may contain other polymers in addition to the aforementioned polyester resin A, it is in the film from the viewpoint of further improving heat-resistant dimensional stability and heat-resistant deformation 13 201223995. Polymer component to be only from the aforementioned poly-lipid A is preferable. From the viewpoint of further improving the size of the 19-size material, it is preferable that the ratio of the polyester resin A to the polymer of the polyester film is 80% by weight or more, and It is best to use 8% by weight, and it is best to use 1% by weight. In the range that does not adversely affect the properties such as heat-resistant dimensional stability and heat distortion, or film forming properties, The poly-feeding chess contains, for example, poly(ethylene bromide), polybutylene terephthalate (four), polyethylene natriate (PEN), poly-terephthalic acid = fat; Amine, polystyrene, polychlorite, =Aku, etc. «Trees. Other polymerizations such as polyethers<Additives> In addition to the aforementioned polymers, the polyester film may also be an external absorbent, a colorant, or a light. Stabilizers, moisturizing agents: oxidizing agents, purple flame retardants and other additives 1 resistance to fine ± _, crystal nucleating agent, with antioxidants. From the point of view of weather resistance; the film is preferably containing external absorbents It is preferred to use a purple antioxidant to use a polyester, for example, a phenolic antioxidant, and an antimony The user's agent, the sulfur-based antioxidant, the phenol-based antioxidant is an organic compound containing a truss in the field of poly-films, and an organic compound can be used. The phenol ", phenol-based anti-gasification agent is used. The phenol skeleton has a "gasification agent" which is commercially available.
14 201223995 紛系抗氧化劑之市售品可舉例如:SumilizerGA-80(住 友化學公司製)、Adeka Stab AO-60、Adeka Stab AO-330(皆 為 ADEKA 公司製)、irgan〇x 245(Basf 公司製)、Cyanox 1790(CYTEC公司製)等。 構系抗氧化劑係含有磷原子的有機化合物,可使用迄 今於聚醋膜領域中作為磷系抗氧化劑使用的含磷原子有機 化合物。磷系抗氧化劑係可由市售品獲得。 磷系抗氧化劑之市售品可舉例如:SumiHzer Gp(住友 化學公司製)、Adeka Stab PEP-36(ADEKA 公司製)、 Irgafos38、Irgafosl68(皆為BASF公司製)等。 硫系抗氧化劑係含有硫原子的有機化合物,可使用迄 今於聚賴領域巾作為硫系抗氧化劑使㈣含硫原子有機 化合物。硫系抗氧化劑係可由市售品獲得。 硫系抗氧化劑之市售品可舉例如:S— MB(住友 化干a司製)、八3〇!^8136八0-4128(八0£1<:八公司製)等。 從顯性的觀點來看,抗氧化劑之含有比例以相對於 聚S曰膜中的聚合物成分狀…〜5q重量%(特別是g.〇2〜3 〇 重量%)為佳。在含有2種以上抗氧化劑時,其等之合計量只 要是在前述範圍内即可。 從更為提升耐熱性的觀點來看,紛系抗氧化劑、破系 抗氧化劑及⑽抗氧化劑以各自相對聚合物成分含有 0·05〜2·0重量%,特別是0.1〜1.0為佳。 紫外線吸收劑可使用可在聚醋膜領域中作為紫外線吸 收劑使用者’而可舉例如:科啊系紫外線吸收劑、三 15 201223995 咬系紫外線吸收劑、苯并三㈣料線吸收劑等。 苯并十并系紫外線吸收劑係含有苯并啊骨架的有機 化合物’且可使用迄今於聚賴領域中作為苯并啊系紫 外線吸收劑使用之含苯并啊㈣有機化合物。苯并啊 系紫外線吸收劑係可由市售品獲得。 苯并十㈣紫外線吸收劑之市售品可舉例如:cy_b UV-3638(CYTEC公司製)等。 三啩系紫外線吸收劑係含有三哜骨架的有機化合物, 且可使用迄今於聚酯膜領域中作為三畊系紫外線吸收劑使 用之含二》井骨架有機化合物。三讲系紫外線吸收劑係可由 市售品獲得。 三畊系紫外線吸收劑之市售品可舉例如:Tinuvin 1577ED、Tinuvin 479(皆為BASF公司製)等。 苯并三唑系紫外線吸收劑係含有苯并三唑骨架的有機 化合物,且可使用迄今於聚酯膜領域中作為苯并三唑系紫 外線吸收劑使用的含苯并三唑骨架有機化合物。苯并三唑 系紫外線吸收劑係可由市售品獲得。 苯并三唑系紫外線吸收劑之市售品可舉例如: Sumisorb 250(住友化學公司製)、Adeka Stab LA-31(ADEKA 公司製)、Tinuvin 234(BASF公司製)等。 紫外線吸收劑之含有比例相對於聚酯膜中聚合物成分 為0.1〜2.0重量%,且特別是以0.15〜1.5重量%為佳。在含有 2種以上紫外線吸收劑時,其等之合計量只要是在前述範圍 内即可。14 201223995 Commercial products of various antioxidants include, for example, Sumilizer GA-80 (manufactured by Sumitomo Chemical Co., Ltd.), Adeka Stab AO-60, Adeka Stab AO-330 (all manufactured by ADEKA), and irgan〇x 245 (Basf Corporation) System), Cyanox 1790 (manufactured by CYTEC), etc. The structure antioxidant is an organic compound containing a phosphorus atom, and a phosphorus atom-containing organic compound which has been used as a phosphorus-based antioxidant in the field of a polyacetate film can be used. Phosphorus-based antioxidants are commercially available. Commercial products of the phosphorus-based antioxidants include, for example, SumiHzer Gp (manufactured by Sumitomo Chemical Co., Ltd.), Adeka Stab PEP-36 (manufactured by Adeka Co., Ltd.), Irgafos 38, and Irgafosl 68 (all manufactured by BASF Corporation). The sulfur-based antioxidant is an organic compound containing a sulfur atom, and it is possible to use (4) a sulfur atom-containing organic compound as a sulfur-based antioxidant. The sulfur-based antioxidant is commercially available. The commercial product of the sulfur-based antioxidant may, for example, be S-MB (manufactured by Sumitomo Ryokan Co., Ltd.), 八三〇, ^8136 八0-4128 (eight-eight-feet 1 <: manufactured by the company). From a dominant point of view, the antioxidant content is preferably in the form of ~5 5% by weight (particularly g. 〇 2 to 3 〇% by weight) based on the polymer component in the poly sulfonium film. When two or more kinds of antioxidants are contained, the total amount of the antioxidants may be within the above range. From the viewpoint of further improving heat resistance, it is preferred that the antioxidant, the breaking antioxidant, and the (10) antioxidant are contained in the respective relative polymer components in an amount of from 0.05 to 2.0% by weight, particularly preferably from 0.1 to 1.0. The ultraviolet absorber can be used as a user of the ultraviolet absorber in the field of the polyacetate film, and examples thereof include a UV absorber, a urethane absorber, a benzotri(4) feed absorber, and the like. The benzo-deuterated ultraviolet absorber is an organic compound containing a benzo- skeletal structure and can be used as a benzo-containing (tetra) organic compound which has hitherto been used as a benzoic ultraviolet absorber in the field of poly- lys. Benzophenone UV absorbers are commercially available. A commercially available product of the benzotriazine (IV) ultraviolet absorber is exemplified by cy_b UV-3638 (manufactured by CYTEC Co., Ltd.). The triterpenoid ultraviolet absorber is an organic compound containing a triterpene skeleton, and a two-dimensional well skeleton organic compound which has hitherto been used as a three-till ultraviolet absorber in the field of polyester film can be used. The third lecture is that the ultraviolet absorber can be obtained from commercially available products. Commercial products of the three-pigmented ultraviolet absorber include, for example, Tinuvin 1577ED and Tinuvin 479 (all manufactured by BASF Corporation). The benzotriazole-based ultraviolet absorber is an organic compound containing a benzotriazole skeleton, and a benzotriazole-containing skeleton organic compound which has hitherto been used as a benzotriazole-based ultraviolet absorber in the field of polyester film can be used. The benzotriazole-based ultraviolet absorber can be obtained from a commercially available product. Commercial products of the benzotriazole-based ultraviolet absorber include, for example, Sumisorb 250 (manufactured by Sumitomo Chemical Co., Ltd.), Adeka Stab LA-31 (manufactured by Adeka Co., Ltd.), and Tinuvin 234 (manufactured by BASF Corporation). The content of the ultraviolet absorber is 0.1 to 2.0% by weight, and particularly preferably 0.15 to 1.5% by weight based on the polymer component in the polyester film. When two or more types of ultraviolet absorbers are contained, the total amount of the ultraviolet absorbers may be within the above range.
16 201223995 著色劑可使用可在聚略膜領域中使用的任意顔料及染 料。只要疋可達成本發明目#,著色_含有比例就無特 別限制’且以例如相對於聚合物成分之重量%較適宜。 <聚酯膜之製造方法> 本發明之聚酯膜可藉由以下方法製造。 舉例而言’以規定的比例將前述聚S旨樹脂A以及依所希 望含有的其他聚合物及添加劑混合⑽融、混練而製造前 驅物膜後,對所得到的前驅物膜實施至少包含二軸延伸處 理之熱處理步驟。 前驅物膜之製造方法可採用眾所皆知的方法。例如, 可藉由二轴擠壓機將由所希望的成分構成的混合物溶融、 混練,並藉由T型模具擠壓混練物後,進行冷卻即可。 前驅物膜之厚度並無特別限制,可舉例如100〜2000" m ’且以120〜l〇〇0//m為佳。 熱處理步驟係至少進行二軸延伸處理之步驟,通常是 在軸延伸處理後進行熱固定處理。藉由熱處理步驟可使 膜的熱膨脹率及熱收縮率之絶對值減少。 二軸延伸處理可實行對MD方向及TD方向同時進行延 伸的同時二軸延伸,或是可實行在MD方向或TD方向其中 一方向上進行延伸後,在其他方向進行延伸的逐次二轴延 伸。較佳係進行同時二軸延伸。此係因為,進行過同時二 軸延伸的膜比進行過逐次二轴延伸的膜更能提升耐熱尺寸 穩定性。另一方面,即便以一軸延伸替代二軸延伸,仍無 法得到所希望的耐熱尺寸穩定性。於本說明書中,MD方向 17 201223995 係指所謂的流動方向'從擠壓機拉取前驅物膜的方向(縱方 向)之意。TD方向則是指所謂的寬度方向’且相對於該md 方向的垂直方向之意。 在進行二軸延伸時,雖然只要是可達成本發明之目 的,延伸倍率及延伸溫度就無特別限制,但以設在以下範 圍為佳。此係因為可更進一步提升耐熱尺寸穩定性。 延伸倍率係在MD方向及TD方向上皆在2.〇倍以上且不 會產生斷裂的範圍内,且特別是以2 〇〜5 〇為佳,且以2 3〜$ 〇 倍更佳。MD方向及TD方向上之延伸倍率以近似者較佳。 具體而言,在令MD方向上之延伸倍率為PMD,且令td方 向上之延伸倍率為PTD時,「Ptd_Pmd」係以_〇 5〜+ 〇 5為佳, 且以-〇·3〜+0.3更佳。再者,MD方向上之延伸倍率係基於 即將進行延伸前的MD方向長度之倍率。TD方向上之延伸 倍率係基於即將進行延伸前的TD方向長度之倍率。 藉由將延伸倍率調整在前述範圍内,可控制熱膨脹 率。舉例而言,若使規定方向上的延伸倍率増大,該方向 上的熱膨脹率之值就會變小。 在令構成該膜的聚合物成分之玻璃轉移溫度為丁訃(。〇 時’延伸溫度係在Tgp以上、Tgp + 3〇t以下,且從更為提 升耐熱尺寸穩定性的觀點來看,係以在Tgp°c以上、Tgp + 25t以下為佳。再者,延伸溫度係進魏伸之環境氣體溫 度。在聚合物成分由2種以上之聚合物構成時,聚合物成分 之TgP係各聚合物之玻璃轉移溫度乘以該聚合物的含有比 例而得之值的和。 201223995 4a由將延伸溫度調整在前述範圍内,可控制熱膨脹率 之減少幅度。舉例而言,若降低延伸溫度,則熱膨脹率之 值就會變小。 熱固定處理係藉由將延伸膜保持在延伸溫度以上之溫 度.來固定聚合物分子配向之處理。熱固定溫度在令構成 該膜的聚合物成分的玻璃轉移溫度為TgP(t)、熔點為 脚抑嫩⑪域以上、Mpp以下,且從更為提升耐執 尺寸穩定性及耐熱變形性的觀點來看,16 201223995 Colorants can use any pigments and dyes that can be used in the field of polycrystalline films. The coloring_content ratio is not particularly limited as long as it can reach the cost of the invention, and is preferably, for example, relative to the weight % of the polymer component. <Method for Producing Polyester Film> The polyester film of the present invention can be produced by the following method. For example, after the precursor film is produced by mixing and kneading the above-mentioned poly-S resin A and other polymers and additives which are desirably contained in a predetermined ratio, at least a two-axis is applied to the obtained precursor film. The heat treatment step of the extension treatment. The method for producing the precursor film can be carried out by a well-known method. For example, a mixture composed of a desired component can be melted and kneaded by a biaxial extruder, and the kneaded product can be extruded by a T-die and then cooled. The thickness of the precursor film is not particularly limited, and is, for example, 100 to 2000 " m ' and preferably 120 to 1 〇〇0//m. The heat treatment step is a step of performing at least a biaxial stretching treatment, usually a heat setting treatment after the shaft stretching treatment. The absolute value of the thermal expansion coefficient and the thermal shrinkage rate of the film can be reduced by the heat treatment step. The two-axis extension processing may perform simultaneous biaxial stretching for extending the MD direction and the TD direction simultaneously, or may perform a two-axis extension extending in the other direction after extending in one of the MD direction or the TD direction. Preferably, simultaneous biaxial stretching is performed. This is because the film which has undergone simultaneous biaxial stretching can improve the heat-resistant dimensional stability more than the film which has been subjected to the secondary biaxial stretching. On the other hand, even if the one-axis extension is substituted for the two-axis extension, the desired heat-resistant dimensional stability cannot be obtained. In the present specification, the MD direction 17 201223995 refers to the so-called flow direction 'in the direction in which the precursor film is drawn from the extruder (longitudinal direction). The TD direction means the so-called width direction ' and the vertical direction with respect to the md direction. In the case of performing the biaxial stretching, the stretching ratio and the stretching temperature are not particularly limited as long as they are cost-effective, but it is preferably set in the following range. This is because the heat-resistant dimensional stability can be further improved. The stretching ratio is in the range of 2.〇 times or more and does not cause breakage in the MD direction and the TD direction, and particularly preferably 2 〇 5 5 ,, and more preferably 2 3 〜 〇 倍 times. The stretching ratio in the MD direction and the TD direction is preferably approximated. Specifically, when the stretching magnification in the MD direction is PMD and the stretching ratio in the td direction is PTD, "Ptd_Pmd" is preferably _〇5 to + 〇5, and -〇·3~+ 0.3 is better. Further, the stretching magnification in the MD direction is based on the magnification of the length in the MD direction immediately before the extension. The extension in the TD direction is based on the magnification of the length in the TD direction immediately before the extension. The thermal expansion rate can be controlled by adjusting the stretching ratio within the aforementioned range. For example, if the stretching ratio in the predetermined direction is made large, the value of the coefficient of thermal expansion in this direction becomes small. When the glass transition temperature of the polymer component constituting the film is 讣 讣 (the 延伸 ' 'extension temperature is Tgp or more, Tgp + 3 〇 t or less, and from the viewpoint of further improving the heat-resistant dimensional stability, It is preferably Tgp°c or more and Tgp+25t or less. Further, the extension temperature is the ambient gas temperature of Weishen. When the polymer component is composed of two or more kinds of polymers, the polymer component is TgP-based polymer. The sum of the values obtained by multiplying the glass transition temperature by the content ratio of the polymer. 201223995 4a, by adjusting the extension temperature within the above range, the reduction in the coefficient of thermal expansion can be controlled. For example, if the elongation temperature is lowered, the thermal expansion is performed. The value of the rate is reduced. The heat setting treatment fixes the alignment of the polymer molecules by maintaining the stretching film at a temperature above the extension temperature. The heat setting temperature is the glass transition temperature of the polymer component constituting the film. It is TgP(t), the melting point is 11 or more in the range of the foot, and the Mpp is below, and from the viewpoint of further improving the dimensional stability and heat deformation resistance,
上、MPp-2〇t^T。再者,熱固定溫度係 U 境氣體溫度。在聚合物成分由2種以上之聚合盖保持之環 合物成分之各聚合物之炼點乘以該聚聚 例而得之值的和。 物的3有比 藉由將熱固定溫度調整在前述範圍内 率絶對值的減少幅度。舉例而言,若提高_ ^制熱收縮 熱收縮率絶對值的減少幅度會變大。〜固定溫度’則 ^定處理係可實施在維持二觀伸處 «下進賴較之鮮式_定,亦之張力的 時地使該張力鬆他來進行熱固定的鬆他絲^該處理同 可實施在維持該張力來進行熱固定(第】熱固^或者亦 力鬆他來進行熱較(第2熱固定)的複合式’使該張 實施鬆他式_定。在以前述住__眘"1定。較佳為 時’熱料溫度皆設定在前述範圍内/〜熱固定處理 以前述鬆弛式《合式進彳處理時 率絶對值的減低、獻寸穩定性及对熱變形性= 201223995 θ升以及膜的平坦性等觀點來看鬆弛倍率在MD方向及 TD方向上皆以ο』]〇〇倍為佳,且以ο υ]⑻倍更佳並 以〇.90〜〇.95倍最佳。MD方向及TD方向上之鬆弛倍率以近 似=較佳。具體而言,在令MD方向上之鬆弛倍率為qmd, • D方向上之备弛倍率為pQtd時,「QTD-QMD」係以-0.1〜 + 0.1為佳,且以-0.05〜+0.05更佳,又以_〇 〇2〜+0.02最佳。 再者,MD方向上之鬆弛倍率係基於剛延伸後的MD方向長 度之倍率。TD方向上之鬆弛倍率係基於剛延伸後的TD方向 長度之倍率。 藉由將鬆弛倍率調整於前述範圍内可控制熱收縮率絶 對值的減少幅度。舉例而言,若減低規定方向上的鬆弛倍 率,則該方向上之熱收縮率絶對值的減少幅度會變大。 <聚酯犋> 本發明之聚酯膜之厚度並無特別限制,且可例如 10〜15〇//m ’並以12〜125#m為佳。 本發明之聚酯膜可表現顯著優異的耐熱尺寸穩定性及 耐熱變形性。結果,若以本發明之聚㈣為例,使用來作 為積層㈣熱膜’即便在高溫條件下於額上進行積層 時,仍可充分防止翹曲、熔融變形等。 關於财熱尺寸穩定性,詳言之,本發明之聚醋膜例如 其熱膨脹率及熱收縮率係分別在特定範圍内。 具體而言,在拉伸荷重5gf及升溫速度1(rc/分鐘的條件 下從5〇t升溫至HKTC時的熱膨脹率之值係在5〇ppm/t以 下,且以45ppm/t:以下’且以4〇ppm/t以下更佳。熱膨賬Up, MPp-2〇t^T. Furthermore, the heat setting temperature is the U ambient gas temperature. The sum of the values obtained by multiplying the melting point of each polymer of the polymer component held by the polymer cover by two or more polymer caps by the polymerization example. The ratio of the object 3 is reduced by the absolute value of the rate by adjusting the heat setting temperature within the aforementioned range. For example, if the _^ heat shrinkage shrinkage heat shrinkage rate is reduced, the absolute value will decrease. ~Fixed temperature' then the treatment system can be implemented in the maintenance of the two-extension of the lower part of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The same can be implemented to maintain the tension to perform heat fixation (the first) heat fixation or to loosen the heat (the second heat fixation) of the composite type to make the sheet loosely set. __ caution "1. It is preferred that the 'hot material temperature is set within the above range / ~ heat fixation treatment with the above-mentioned slack type "combined type of processing rate, the absolute value of the reduction, stability and heat The deformability = 201223995 θ liter and the flatness of the film, etc., the relaxation magnification is preferably ο 〇〇 〇〇 MD in the MD direction and the TD direction, and is preferably ο υ ( (8) times and 〇. 90 〜 95.95 times optimal. The relaxation ratio in the MD direction and the TD direction is approximately = preferably. Specifically, when the relaxation magnification in the MD direction is qmd, and • the relaxation ratio in the D direction is pQtd, QTD-QMD is preferably -0.1 to +0.1, and is preferably -0.05 to +0.05, and is preferably _〇〇2 to +0.02. Further, MD side The relaxation magnification is based on the magnification of the length in the MD direction immediately after stretching. The relaxation magnification in the TD direction is based on the magnification of the length in the TD direction just after stretching. The thermal shrinkage rate can be controlled by adjusting the relaxation ratio within the above range. For example, if the relaxation ratio in the predetermined direction is reduced, the decrease in the absolute value of the thermal shrinkage ratio in the direction becomes large. <Polyester 犋> Thickness of the polyester film of the present invention It is not particularly limited, and may be, for example, 10 to 15 Å/m' and preferably 12 to 125 #m. The polyester film of the present invention can exhibit remarkably excellent heat-resistant dimensional stability and heat deformation resistance. The poly(4) of the present invention is used as a laminated (four) hot film to sufficiently prevent warpage, melt deformation, and the like even when laminated on the forehead under high temperature conditions. Regarding the dimensional stability of the heat, in detail, The polyester film of the present invention has a thermal expansion coefficient and a heat shrinkage ratio, respectively, in a specific range, for example, when the temperature is raised from 5 〇t to HKTC under the conditions of a tensile load of 5 gf and a temperature increase rate of 1 (rc/min). Thermal expansion rate Based at 45ppm / t in 5〇ppm / t following, and: less' and more preferably at 4〇ppm / t or less account thermal expansion.
20 201223995 率之值於MD方向及TD方向任一方向上皆在前述範圍内。 若熱膨脹率之值過大,耐熱尺寸穩定性會降低,而無法充 分防止翹曲。本發明之聚酯膜之熱膨脹率通常為+ $〜+ 50PPmrc ’ 且以 + 10〜+ 45ppm/t 為佳,又以 + 1〇〜+ 4〇ρ_ °C更佳。 關於熱膨脹率,從能更為充分地防止翹曲的觀點來 看,較佳地,熱膨脹率在MD方向與TD方向之差的值以在 30PPm/t以下為佳,又以2〇ppm/r以下更佳,且又以1〇卯^ C以下更佳’並以5ppm/°C以下最佳。 本說明書中,熱膨脹率係以使縱向成為垂直方向的方 式懸吊試驗片(2mmx25mm),且在該試驗片的下端施加 5gi/2mm寬度之拉伸荷重,並以升溫速度1〇1/分將環境氣 體溫度從5G°C升溫至時的熱膨脹率。熱膨脹率係針對 拉伸方向在MD方向時及拉伸方向在TD方向時進行測量, 具體而言係藉由後述方法測量。 於150°C的熱收縮率之絶對值係小於2 〇%,且以小於 0.9%為佳,並以小於〇.5%更佳。熱收縮率之絶對值於md 方向及TD方向任-方向上皆在前述範圍内。若減縮率之 絶對值過大’耐熱財敎性會降低,特無法充分防止 麵曲。 關於熱收縮率,從能更為充分地防幼曲的觀點來 ’触_在_方向與TD方向之差的絶對值 以在1.5W為佳,又以1%以下更佳,且又以㈣以下更 佳,並以0.2%以下最佳。 21 201223995 本說明書中,熱收縮率係於環境氣體溫度15(rc下將試 驗片(200mmX200mm)放置30分鐘時在1^1)方向及TD方向各 方向之熱收縮率,具體而言係藉由後述方法測量。熱收縮 率之值的正值係、指收縮之意,負值則指膨脹之意。再者, 熱收縮率之絶對值小於2.0%係指純縮率之值大於_2〇% 且小於+ 2.0%之意。 關於而懷變形性,具體而言,本發明之聚醋膜之玻璃 轉移溫度係在丨賊以上,特別是在测t以上,且以在22〇 °C以上為佳,並以在23〇。(:以上更佳。 本發明之聚醋膜在其製造過程中,特別是在包含前述 -轴延伸處理及熱g)定處理之熱處理步驟的前後,膜之玻 填轉移溫度係上升贼以上、特収上升_以上,且以 上升100。。以上為佳’並以上昇13〇t以上更佳。 ▲再者’作為積層使用的聚能膜之玻璃轉移溫度雖通常 至300 C左右,但並未特別限定於此。又玻璃轉移溫度 上升/皿度雖问至250 C左右,但並未特別限定於此。 又,本發明之聚醋膜具有良好的耐熱強度穩定性。例 如相較於二軸延伸前的前驅物膜,耐熱強度穩定性會有改 善特別疋’在聚醋膜含有抗氧化劑時,可展現顯著優異 的ί熱強度穩疋性。具體而言,於本發明之聚酉旨膜中,在 20 〇 C之烘相試驗⑽小時後的拉伸強度保持率係達成5 % 乂上且以達成5〇%以上為佳,並以達成8〇%以上更佳。再 者’、於本發明中’基於二轴配向膜中前述聚S旨樹脂Α所特有 的刀子行為’雜伸強度保持率係大於·%,且亦有成為20 201223995 The value of the rate is within the above range in either the MD direction or the TD direction. If the value of the coefficient of thermal expansion is too large, the dimensional stability of heat resistance is lowered, and warpage cannot be sufficiently prevented. The polyester film of the present invention has a thermal expansion coefficient of usually + $ to + 50 ppmrc' and is preferably + 10 to + 45 ppm/t, more preferably + 1 〇 to + 4 〇 ρ _ °C. With respect to the coefficient of thermal expansion, from the viewpoint of more sufficiently preventing warpage, the value of the difference between the MD direction and the TD direction of the coefficient of thermal expansion is preferably 30 ppm/t or less, and 2 〇 ppm/r. The following is more preferable, and is preferably 1 〇卯 ^ C or less and preferably 5 ppm / ° C or less. In the present specification, the coefficient of thermal expansion is such that the test piece (2 mm x 25 mm) is suspended so that the longitudinal direction is perpendicular, and a tensile load of 5 g / 2 mm width is applied to the lower end of the test piece, and the temperature rise rate is 1 〇 1 / min. The rate of thermal expansion when the ambient gas temperature is raised from 5 G ° C. The coefficient of thermal expansion is measured in the case where the stretching direction is in the MD direction and the stretching direction is in the TD direction, and is specifically measured by the method described later. The absolute value of the heat shrinkage at 150 ° C is less than 2 %, and preferably less than 0.9%, and more preferably less than 〇.5%. The absolute value of the heat shrinkage rate is within the aforementioned range in the md direction and the TD direction in any direction. If the absolute value of the reduction ratio is too large, the heat-resistant property will be lowered, and the surface curvature will not be sufficiently prevented. Regarding the heat shrinkage rate, the absolute value of the difference between the _ direction and the TD direction from the viewpoint of more adequate prevention of the koji is preferably 1.5 W, more preferably 1% or less, and (4) The following is better, and the best is below 0.2%. 21 201223995 In this specification, the heat shrinkage rate is based on the ambient heat temperature 15 (the test piece (200mm×200mm) is placed in the 1^1) direction and the TD direction in the direction of the TD direction, specifically The method is measured as described later. The positive value of the value of the heat shrinkage rate means the contraction, and the negative value means the meaning of the expansion. Furthermore, the absolute value of the heat shrinkage ratio of less than 2.0% means that the value of the pure shrinkage ratio is greater than _2〇% and less than +2.0%. Regarding the deformability, specifically, the glass transition temperature of the polyester film of the present invention is above the thief, especially at t or more, and preferably at 22 ° C or higher, and at 23 Torr. (The above is more preferable. In the manufacturing process of the polyester film of the present invention, particularly before and after the heat treatment step including the aforementioned -axial stretching treatment and heat treatment), the glass transition temperature of the film rises above the thief, The special increase is above _, and is increased by 100. . The above is better than the increase of 13〇t or more. ▲ In addition, the glass transition temperature of the concentrating film used as a laminate is usually about 300 C, but is not particularly limited thereto. Further, although the glass transition temperature rises and the degree of the dish is about 250 C, it is not particularly limited thereto. Further, the polyester film of the present invention has good heat strength stability. For example, the heat-resistant strength stability may be improved compared to the precursor film before the biaxial stretching. When the polyester film contains an antioxidant, it exhibits remarkable excellent heat strength and stability. Specifically, in the polythene film of the present invention, the tensile strength retention rate after the drying phase test at 20 〇C is 5% 乂 and preferably 5% or more, and is achieved. More than 8〇% is better. Further, in the present invention, the knife behavior of the above-mentioned polystyrene resin crucible in the biaxial alignment film is more than %%, and it is also
22 201223995 150%左右的情況。 朴烘箱試驗個於評定膜之耐熱耐久性之加速試驗,且 係藉由後述方法進行。22 201223995 About 150% of the situation. The Pu oven test was conducted to evaluate the heat resistance durability of the film, and was carried out by the method described later.
拉伸強度保持率係於20代環境氣體之烘箱⑽㈣ 試驗之膜放置謂小時後朗得之”妓㈣於該試驗 前的拉伸強度之保持率。拉伸強度保持率係基於JIS K7127,1999測里,且係針對拉伸方向為md方向時及td方 向時的平均值’具體而言係藉由後述方法進行。 本發明之聚酯膜作為耐熱膜係十分有用。 耐熱膜係指例如為了在50°C以上(特別是在ιοοχ:以上) 之南溫條件下使用’且即便在該高溫條件下,亦被要求要 有耐熱尺寸穩定性、耐熱變形性及耐熱強度穩定性等耐熱 性(特別是耐熱尺寸穩定性及耐熱變形性)之膜。耐熱膜可舉 例如:積層用耐熱膜、脫模用耐熱膜、黏貼用耐熱膜等。 積層用耐熱膜係指為了在本身的表面上積層其他層而 使用的膜,且因為在積層時會暴露在高溫條件下而需要有 耐熱性之膜。其他層可舉例如:金屬層、陶瓷層、樹脂層 等。 積層用耐熱膜在作為例如:製造電子機器等可撓性印 刷基板時所使用的基材膜、製造可撓性太陽電池時所使用 的基材膜等係十分有用。 具體而言,例如在將本發明之聚酯膜作為印刷基板的 基材膜使用時,藉由乾燥積層法、蒸鍍法或濺鍍法等,且 例如在7 0〜200 °C之高溫條件下於該膜上形成配線用金屬 23 201223995 層°即便在如此的用途中,本發明之聚酯膜由於可充分防 止尺寸變動、強度降低及變形,因此可充分防止積層體之 趣曲’亦可充分防止該膜與金屬層之剝離。 脫模用耐熱膜係易被稱作所謂的製程膜之膜》脫模用 耐熱膜係指’藉由在該膜上形成其他層而作為該其他層之 支持層或保護層來利用,且在最後會被剝離、去除之膜。 亦有在该膜與其他層之間設置矽層之脫模層的情形。由於 在其他層的形成步驟或其後的步驟中會加熱, 因此為了防 止尺寸變動、強度降低及變形,脫模用耐熱膜必須要有耐 熱性。 脫模用耐熱膜在作為例如樹脂膜形成用製程膜、陶竞 薄膜形成用製程膜、金屬薄膜形成用製程膜等係十分有用。 黏貼用耐熱膜在作為例如使用於70〜200。(:之高溫條件 下的黏著膠帶之基材膜係十分有用。 具體而言’在例如將本發明之聚酯膜作為耐熱用黏著 膠帶之基材膜使用時,本發明之聚酯膜由於可防止尺寸變 動、強度降低及變形,因此可充分防止貼合品之勉曲、黏 著膠帶之剝離等。 實施例 實施例/比較例 藉由二轴擠壓機在樹脂溫度31〇。(:熔融由表1所記載的 成分所構成之混合物,且進行混練,並在以T塑模異擠壓混 練物後進行冷卻,而得到前驅物膜。以表1所記載的延伸條 件對前驅物膜進行延伸及熱固定。熱固定係以規定的溫度The tensile strength retention rate is based on the 20th generation ambient gas oven (10). (4) The test film is placed after the hour of the test. The retention of the tensile strength before the test. The tensile strength retention rate is based on JIS K7127, 1999. In the measurement, the average value in the case where the stretching direction is the md direction and the td direction is specifically performed by the method described later. The polyester film of the present invention is very useful as a heat resistant film system. It is used under the south temperature condition of 50 ° C or higher (especially at ιοοχ: above) and is required to have heat resistance such as heat resistance dimensional stability, heat deformation resistance and heat strength stability even under such high temperature conditions ( The heat-resistant film is, for example, a heat-resistant film for laminate, a heat-resistant film for mold release, a heat-resistant film for adhesion, etc. The heat-resistant film for laminate is used to laminate a layer on its own surface. A film used for the other layer, and a film having heat resistance is required because it is exposed to high temperature conditions during lamination. Examples of the other layer include a metal layer, a ceramic layer, a resin layer, and the like. The film is useful as, for example, a substrate film used in the production of a flexible printed circuit board such as an electronic device, a substrate film used in the production of a flexible solar cell, etc. Specifically, for example, the present invention is When the polyester film is used as a base film of a printed substrate, a wiring metal 23 is formed on the film by a dry buildup method, a vapor deposition method, a sputtering method, or the like, for example, at a high temperature of 70 to 200 °C. 201223995 Layers Even in such applications, the polyester film of the present invention can sufficiently prevent dimensional changes, strength reduction, and deformation, so that the film can be sufficiently prevented from being detached from the metal layer. The heat-resistant film for mold release is easily referred to as a film of a so-called process film. The heat-resistant film for mold release means that it is used as a support layer or a protective layer of the other layer by forming another layer on the film. The film which will be peeled off and removed at the end. There is also a case where a release layer of a ruthenium layer is provided between the film and other layers. Since it is heated in the formation step of the other layer or the subsequent steps, in order to prevent dimensional change The heat-resistant film for mold release is required to have heat resistance. The heat-resistant film for mold release is useful as, for example, a process film for forming a resin film, a process film for forming a ceramic film, and a process film for forming a metal film. The heat-resistant film for adhesion is very useful as a base film of an adhesive tape used for, for example, 70 to 200. (In particular, the polyester film of the present invention is used as a base for heat-resistant adhesive tape. When the film is used, the polyester film of the present invention can prevent the dimensional change, the strength from being lowered, and the deformation, so that the warpage of the bonded product, the peeling of the adhesive tape, and the like can be sufficiently prevented. Embodiment Examples/Comparative Examples by the two axes The extruder was at a resin temperature of 31 Torr. (: A mixture of the components described in Table 1 was melted, kneaded, and the kneaded product was separately extruded in a T mold, and then cooled to obtain a precursor film. The precursor film was stretched and heat-set by the extension conditions described in Table 1. Thermal fixing at a specified temperature
24 201223995 及鬆弛倍率進行鬆弛式熱固定。 同時二軸延伸係於MD方向及TD方向進行同時延伸。 逐次二軸延伸係於MD方向進行延伸後,於TD方向進 行延伸。 一軸延伸係僅於MD方向進行延伸。 PCTA係使用共聚醋i3319(Eastman公司製,ι,4-環己烧 二曱醇與對苯二曱酸及間苯二曱酸與之聚縮合物,Tg92 °C,.熔點285。〇。 PET係使用聚對苯二甲酸乙二酯(Mni5000、Tg75°C、 炼點265°C、末端羧基濃度30當量/ton)。 熱膨脹率 熱膨脹率係使用熱機械測量裝置(Q400EM ; TA INSTRUMENTS公司),以使該試驗片之縱向成為垂直方向 的方式懸吊試驗片(膜;2mmx25mm),且於該試驗片之下端 施加5gf/2mm寬度之拉伸荷重。其後,以升溫速度1〇它/分 鐘將環境氣體溫度升溫,並將從50°C至100°C的尺寸變化換 舁成每1°C的變化量,而測量熱膨脹率熱膨脹率係於妆 伸方向為MD方向及TD方向的情形進行測量。 ◎ ; R^.OppmA:(最佳); 〇;40ppm/°C <RiS45ppm/°C (佳); △ ; 45ppm/°C <ΙΚ50ρριη/°(:(實用上無問題); X ; 50ppm/°C <Ri(實用上有問題)。 熱收縮率 首先’以分別平行於MD方向及TD方向且互以中點相 25 201223995 交的方式將長度150mm的2條直線描繪在試驗片(膜; 200mmx200mm)上。於標準狀態(溫度23°Cx濕度50%)放置 該試驗片2小時,並於其後測量試驗前的直線之長度。接 著,在設定成150°C之環境氣體的熱風循環式烘箱内,以支 持著一角的懸掛狀態放置30分鐘後,取出並於標準狀態放 置冷卻2小時。其後,測量各方向的直線之長度,且求得試 驗前的長度變化量,並求得熱收縮率R2作為相對於該試驗 前的長度之變化量的比例。關於熱收縮率R2,正值係指經 收縮之意。 ◎ ; R2<7)絶對值 <0.5°/。(最佳); 〇;0_5%SR2(?)絶對值 <0.9%(佳); △ ; 0.9%SR2(7)絶對值<2.0%(實用上無問題); X ; 2_0°/〇SR2C7)絶對值(實用上有問題)。 積層後之魅曲 評定將膜與鋁箔貼合後之翹曲。詳言之,叠合鋁箔(厚 度20 // m)/胺基曱酸酯系接著劑(固形部分為3g/m2)/各膜, 且於70°C及l〇kgf/cm2進行熱壓5分鐘,而得到樣品(尺寸: 50mmx50mm)。放置冷卻後,目視判斷樣品上產生的翹> 曲。 ◎:完全未觀察到麵曲; △:雖然觀察到些微翹曲但實用上無問題;及 X :明顯觀察到翹曲。 膜之玻璃轉移溫度(TMA)24 201223995 and relaxation rate for loose heat setting. At the same time, the two-axis extension is simultaneously extended in the MD direction and the TD direction. The successive two-axis extensions are extended in the MD direction and then extended in the TD direction. The one-axis extension extends only in the MD direction. PCTA is a copolymerized vinegar i3319 (manufactured by Eastman Co., Ltd., i, 4-cyclohexanol didecyl alcohol and terephthalic acid and isophthalic acid with a polycondensate, Tg92 ° C, melting point 285. 〇. PET The use of polyethylene terephthalate (Mni5000, Tg75 ° C, refining point 265 ° C, terminal carboxyl concentration 30 equivalent / ton). Thermal expansion rate thermal expansion rate using a thermomechanical measuring device (Q400EM; TA INSTRUMENTS), The test piece (film; 2 mm x 25 mm) was suspended in such a manner that the longitudinal direction of the test piece was perpendicular, and a tensile load of 5 gf / 2 mm width was applied to the lower end of the test piece. Thereafter, it was heated at a rate of 1 〇 / min. The ambient gas temperature is raised, and the dimensional change from 50 ° C to 100 ° C is changed to the amount of change per 1 ° C, and the thermal expansion coefficient is measured in the direction of the MD direction and the TD direction. Measured ◎ ; R^.OppmA: (best); 〇; 40ppm/°C <RiS45ppm/°C (good); △; 45ppm/°C <ΙΚ50ρριη/°(:( practically no problem); X; 50ppm/°C <Ri (practical problem). The heat shrinkage rate is first 'in parallel with the MD direction and Two straight lines of 150 mm in length were drawn on the test piece (film; 200 mm x 200 mm) in the TD direction and at the midpoint phase 25 201223995. The test piece was placed in a standard state (temperature 23 ° C x humidity 50%) for 2 hours. Then, the length of the straight line before the test was measured. Then, in a hot air circulating oven set to an ambient gas of 150 ° C, the suspension was placed in a suspended state for 30 minutes, and then taken out and placed in a standard state for cooling 2 Thereafter, the length of the straight line in each direction is measured, and the amount of change in length before the test is obtained, and the ratio of the heat shrinkage ratio R2 as a change amount with respect to the length before the test is obtained. Regarding the heat shrinkage ratio R2, Positive value refers to the meaning of shrinkage. ◎ ; R2 < 7) absolute value < 0.5 ° / (best); 〇; 0_5% SR2 (?) absolute value < 0.9% (good); △ ; 0.9% SR2 (7) absolute value < 2.0% (practical no problem); X; 2_0 ° / 〇 SR2C7) absolute value (practical problem). The enchantment after lamination is used to evaluate the warpage after bonding the film to the aluminum foil. In detail, laminated aluminum foil (thickness 20 // m) / amine phthalate-based adhesive (solid part is 3g / m2) / each film, and hot pressing at 70 ° C and l 〇 kgf / cm 2 Minutes and samples were obtained (size: 50mm x 50mm). After standing to cool, visually judge the warp produced on the sample. ◎: no facial curvature was observed at all; △: although slight warpage was observed, there was no problem in practical use; and X: warpage was clearly observed. Film glass transition temperature (TMA)
遵循JIS C6481 : 1996「5.17.1 TMA法」測量玻璃轉移 溫度。詳言之,藉由熱機械測量裝置(Q400EM ; TA 26 201223995 INSTRUMENTS公司),於拉伸荷重(5gf/2mm寬度)及升溫速 度io°c/分鐘的條件下將試驗片(膜;2mmx25mm)升溫,而 測量Tg。Tg係於拉伸方向為MD方向及TD方向的情況下測 量,且以其等之平均值來表示。Tg之測量係對最終得到的 膜及即將進行延伸前的膜進行,而求得上昇幅度(。〇。 •最終得到的膜之Tg ◎ : 230°CSTg(最佳); 〇:220$Tg<230°C (佳); △ : 200 $ Tg < 220°C (實用上無問題);及 X : Tg<200〇C。 •上昇幅度 ◎ : 130°C S上昇幅度(最佳); 〇:100$上昇幅度< 13〇。〇(佳); △ : 5〇$上昇幅度<l〇〇t(實用上無問題);及 X :上昇幅度<50°C。 而才熱變形性 將膜(1 OOmmx 100mm)放置在設定成2〇〇t:之環境氣體 的熱風循環式烘箱内1 〇分鐘,此時,目視判斷膜上產生的 變形。 ◎:完全未觀察到變形; △:雖然觀察到些微變形但實用上無問題;及 X:明顯觀察到變形。 耐熱強度穩定性 將試驗片(lOOmmxlOOmm)放置在設定成200°C之環境 27 201223995 氣體的熱風循環式烘箱内100小時。從烘箱取出膜,且測量 拉伸強度,並求得相對於該試驗前的拉伸強度之保持率。 保持率係於拉伸方向為MD方向及TD方向的情況下求得, 且對其等之平均值Μ進行評定。拉伸強度係遵循JIS Κ7127 ; 1999來測量。 ◎ ; 80SMS 100%(最佳); 〇;50SM<80%(佳); △ ; 10SM<50%(實用上無問題); X ; M< 10°/〇(實用上有問題)。 28 201223995 【表1 ss CVj d 监®埋 匝丨丨削The glass transition temperature was measured in accordance with JIS C6481: 1996 "5.17.1 TMA Method". In particular, the test piece (film; 2mm x 25mm) was heated by a thermomechanical measuring device (Q400EM; TA 26 201223995 INSTRUMENTS) under tensile load (5 gf / 2 mm width) and heating rate io ° c / min. And measure Tg. The Tg is measured in the case where the stretching direction is the MD direction and the TD direction, and is expressed by the average value of the same. The measurement of Tg is performed on the finally obtained film and the film immediately before the elongation, and the degree of increase is obtained (.〇. • Tg of the finally obtained film ◎: 230 ° C STg (best); 〇: 220 $ Tg < 230 ° C (good); △ : 200 $ Tg < 220 ° C (no problem in practical use); and X : Tg < 200 〇 C. • Increase in amplitude ◎ : 130 ° CS increase (best); 100$ increase rate <13〇.〇(good); △ : 5〇$ increase rate <l〇〇t (practical problem); and X: increase range <50°C. The film (100 mm x 100 mm) was placed in a hot air circulating oven set to an ambient gas of 2 〇〇t: for 1 minute, at which time the deformation generated on the film was visually judged. ◎: no deformation was observed at all; △: Although slight deformation was observed, there was no problem in practical use; and X: deformation was clearly observed. Heat-resistance stability The test piece (100 mm x 100 mm) was placed in a hot air circulating oven set to 200 ° C in an environment of 27 201223995 gas for 100 hours. The film was taken out from the oven, and the tensile strength was measured, and the tensile strength before the test was determined. The retention rate is obtained in the case where the stretching direction is the MD direction and the TD direction, and the average value 等 of the etc. is evaluated. The tensile strength is measured in accordance with JIS Κ7127; 1999. ◎ ; 80SMS 100 %(best); 〇;50SM<80%(b);△;10SM<50%(practical no problem); X; M<10°/〇(practical problem) 28 201223995 [Table 1 ss CVj d Supervisor® Buried Cutting
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ό 篮患录 叵丨丨渤 ◎ 08l@l◎εει ◎fs —m ◎z'"l+l ◎ s+ ◎9ε+ ◎寸ε+ ~~ 6ΌΧΙ 6.0 G寸-'~ •'ειχod i 09—ovqss !pv 1山d VIOd ΛΛ5 Ml W31 寸丨 ovcss^^pv i αι i αι -οοΐΝίδ (αιχα5) (alx§ (30/—) ss (υο) 29 201223995 產業上之可利用性 本毛月之聚膜係耐熱膜,在作為例如積層用财熱 膜、脫模用耐熱膜、黏貼用耐熱膜等十分有用。 在此將本案之基礎申請案(日本專利特願20ΠΜ92520 號索)之全部内容作為本案說明書之—部分引用如下: 説明書之内容 [發明名稱]對苯二甲酸伸環己基二亞曱醋與間苯 >甲酸伸環己基二亞甲0旨之共聚物膜、太陽電池模組用 保護片及太陽電池模組 [技術領域] 本發明係有關於對苯二甲酸…申環己基二亞甲酷斑 間苯二甲酸Μ·伸環己基二亞曱®旨之共聚物膜、太陽電池模 .组用保護片及太陽電池模組。 [背景技術] 太陽電池發電系統已被期待來作為代替化石燃料之清 潔能量…般而言’於太陽電池發電純巾係錢太陽電 池模組’ 太陽電池模組係以諸封裝來保護經配線成直 列或並列賴個〜數十個太陽電池元件之元件群。太陽電池 模組-般係以白㈣化玻魏蓋其被太陽光直接照射的面 真於其下方配置太陽電池元件群,並以透明的乙烯•乙稀 基•乙酸酯樹脂等填滿間隙,且其背面係成為以耐候性塑 膠材料等片材保護的構成(例如專利文獻1及2)。 太陽電池模組由於是在屋外使用,因此在其構成 '材 質構造等係要求要有足夠的耐久性、耐候性。特別是,對ό 患 患 08 08 08 l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l Ovqss !pv 1山d VIOd ΛΛ5 Ml W31 inch 丨ovcss^^pv i αι i αι -οοΐΝίδ (αιχα5) (alx§ (30/—) ss (υο) 29 201223995 Industrial availability of the month of the month The film-based heat-resistant film is useful as, for example, a thermal film for laminating, a heat-resistant film for mold release, and a heat-resistant film for bonding. The entire contents of the present application (Japanese Patent Application No. 20ΠΜ92520) are hereby incorporated by reference. The description of the specification is as follows: The contents of the manual [Invention name] terephthalic acid cyclohexyl diimide vinegar and m-benzene gt; formic acid cyclohexyl dimethylene 0 copolymer film, solar cell module BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copolymer film of a terephthalic acid, a cyclohexyl dimethylene phthalocyanine, a cyclohexylene diazide®, and a solar cell. A protective film and a solar cell module are used in the mold group. [Background Art] A solar cell power generation system has been expected As a substitute for the clean energy of fossil fuels, the solar cell module is protected by a package to protect the wires in an in-line or in parallel with dozens of solar cells. The component group of the component. The solar cell module is generally made of white (four) chemical glass, and the surface directly irradiated by sunlight is disposed under the solar cell component group, and is transparent ethylene vinyl acetate acetate. The resin or the like is filled with a gap, and the back surface thereof is configured to be protected by a sheet such as a weather resistant plastic material (for example, Patent Documents 1 and 2). Since the solar battery module is used outdoors, it is configured as a material structure. Requires sufficient durability and weather resistance. In particular,
30 201223995 太陽電池模組之保護片(尤其是背面保護片)更要求有耐候 性(其中尤其是耐水解性)。此係因為,經長時間於屋外使用 期間,保護片會因雨等水分而分解、剝離’因此’暴露出 的配線會發生腐蝕而恐會使模組之輸出功率受到影響。 [習知技術文獻] [專利文獻] [專利文獻1 ]日本專利特開2000-243999號公報 [專利文獻2]日本專利特開2008-235603號公報 [發明概要] [發明欲解決之課題] 雖已有研究將各種膜材料作為太陽電池模組用背面保 護片之基材,但並未提供有耐水解性良好的膜材料。 舉例而言,聚對苯二甲酸乙二醋(1>叫膜或聚蔡二甲酸 乙二醋(P EN)難財雜不足,而為在實±無法耐得住 來作為太%電池模組用背面保護片之基材。 於是’本發明的目的在於提供__種耐水解性優異的 膜、使用有該模的太陽電池模_保護片及太陽電池模組。 [用以解決課題之手段] 在本發明人全心研究後,發現到特定對苯二甲酸n 伸環己基一亞甲酯與間苯二甲酸i, 4伸環己基二亞甲萨之 共聚物膜係耐水解性優異,而適合作為太陽電池模組用曰保 護片之基材,從而思及本發明。 不贫明杈供—種對苯二甲酸伸環己基二亞1 間苯一甲11,4_伸環己基二亞甲自旨之共聚物媒,其以 31 201223995 法測得之玻璃轉移溫度在13(^c以上。 又,本發明提供一種對笨二甲酸丨,^伸環己基二亞曱酯 與間苯二甲酸丨,4_伸環己基二亞甲酯之共聚物膜,其以 TMA法測得之玻璃轉移溫度在2〇〇t>c以上。 又,本發明提供一種對苯二甲酸丨,4_伸環己基二亞甲酯 與間苯二曱酸丨,4-伸環己基二亞曱自旨之共聚物膜,其於X光 繞射中在22。$20 $ 24。之範圍内具有最大峰值。 該等對苯二甲酸丨,4-伸環己基二亞曱酯與間苯二甲酸 1,4-伸環己基二亞甲酯之共聚物膜係耐水解性優異。 本發明提供一種太陽電池模組用保護片,其含有至少 一層前述任一種對苯二曱酸M_伸環己基二亞甲酯與間苯 二甲酸1,4·伸環己基二亞?8旨之共聚制4此的太陽電池 模組用保護片係耐水解性優異,且可禁得起太陽電池模組 的長期間使用《太陽電池模組用保護片特別是以作為太陽 電池模組用背面保護片來使用更佳。 本發明提供-種太陽電池模組,其具有包含太陽電池 兀件的填充層、配置於前述填充層之表面的表面保護片, 以及配置於前述填充層背面的背面保護片,其中表面保護 片及背面保護片之至少一者具有上述任一種對苯二甲酸 1,‘伸環己基二亞甲酯與間苯二甲酸丨,4_伸環己基二亞甲酯 之共聚物膜。 [發明效果] 藉由本發明,可提供一種耐水解性優異的膜、太陽電 池模組用保護片及太陽電池用模組。30 201223995 The protective sheet for solar cell modules (especially the back protective sheet) is more weather resistant (especially hydrolysis resistance). This is because, during a long period of use outside the house, the protective sheet is decomposed and peeled off by moisture such as rain. Therefore, the exposed wiring may be corroded and the output power of the module may be affected. [Patent Document 1] [Patent Document 1] Japanese Laid-Open Patent Publication No. 2000-243999 (Patent Document 2) Japanese Patent Laid-Open Publication No. 2008-235603 (Summary of the Invention) [Problems to be Solved by the Invention] Various film materials have been studied as substrates for back protective sheets for solar cell modules, but film materials having good hydrolysis resistance have not been provided. For example, polyethylene terephthalate (1> is called membrane or polychlorinated diacetate (P EN) is difficult to be rich and miscellaneous, but in order to be able to withstand ± as a percentage of battery modules The substrate of the back protective sheet is used. Thus, the object of the present invention is to provide a film excellent in hydrolysis resistance, a solar cell mold using the mold, a protective sheet, and a solar cell module. After intensive research by the present inventors, it was found that a copolymer film of a specific terephthalic acid n-cyclohexyl-methylene ester and isophthalic acid i, 4-cyclohexyldimethacene is excellent in hydrolysis resistance. It is suitable as a substrate for a protective sheet for a solar cell module, and thus considers the present invention. It is not poorly known for the supply of terephthalic acid, cyclohexylenediphenyl, 1 benzophenone, 11, 4, cyclohexyl The copolymer medium of the present invention has a glass transition temperature of 13 (^c or more) as measured by the method of 31 201223995. Further, the present invention provides a bismuth subsynthesis and an isophthalic acid. Copolymer film of bismuth dicarboxylate, 4_cyclohexylene dimethylene methyl ester, the glass transition temperature measured by TMA method is 2 Further, the present invention provides a copolymer film of bismuth terephthalate, 4_cyclohexylene dimethylene methyl ester and bismuth metasilicate, 4-cyclohexylene diazide, It has the largest peak in the X-ray diffraction range of 22. $20 $ 24. The terephthalic acid terephthalate, 4-cyclohexylene dipyridinium ester and isophthalic acid 1,4-cyclohexylene The copolymer film of dimethylene ester is excellent in hydrolysis resistance. The present invention provides a protective sheet for a solar cell module, which comprises at least one layer of any of the above-mentioned terephthalic acid M_cyclohexylene dimethylene ester and isophthalic acid. The copolymer of the dicarboxylic acid 1,4·cyclohexylene di?? 8 is excellent in hydrolysis resistance of the solar cell module, and can be used for a long period of use of the solar cell module. The protective sheet is particularly preferably used as a back protective sheet for a solar cell module. The present invention provides a solar cell module having a filling layer including a solar cell element and surface protection disposed on a surface of the filling layer. a sheet, and a back protective sheet disposed on the back surface of the filling layer, At least one of the middle surface protection sheet and the back surface protection sheet has a copolymer film of any of the above-mentioned terephthalic acid 1, 'cyclohexylene dimethylene methyl ester and bismuth isophthalate, 4_cyclohexylene dimethylene methyl ester [Effect of the Invention] According to the present invention, it is possible to provide a film excellent in hydrolysis resistance, a protective sheet for a solar cell module, and a module for a solar cell.
32 201223995 [圖式簡單說明] [第1圖]本發明之一實施形態之太陽電池模組用背 面保護片的截面圖。 [第2圖]本發明之一實施形態之太陽電池模組的概 略截面圖。 [第3圖]表丰對實施例1、2及比較例1~3之膜進行壓 力鍋試驗中的拉伸強度保持率之經時變化的圖表。 [第4圖]對實施例1、2及比較例1〜3之膜進行壓力鍋 試驗中的拉伸伸度保持率之經時變化的圖表。 [第5圖]表示實施例1、2及比較例2之膜的X光繞射 結果之圖。 [用以實施發明的形態] 以下’詳細說明本發明之較佳實施形態。 本實施形態之對苯二曱酸丨,4_伸環己基二亞曱酯與間 苯二曱酸1,4-伸環己基二亞曱酯之共聚物膜,係由包含有對 苯二曱酸1,4-伸環己基二亞甲酯與間苯二曱酸丨,4伸環己基 二亞曱酯之共聚物(以下稱為r共聚物A」)的樹脂組成物所 構成。 對苯二曱酸酯與間苯二甲酸酯之莫耳比雖無特別限 疋’但通吊為99.9 : 0.1〜5〇 : 50,且以99 : 1〜7〇 : 3〇左右更 佳。又,共聚物A之固有黏度(IV值)係以在〇 〇di/g為佳, 且以0_75〜1.0dl/g更佳。IV值係如下述般來求得。亦即,相 對於酚60質量%與ι,ι,2,2-四氣乙烯40質量%之混合溶劑, 以成為0_5g/100ml之濃度的方式使共聚物溶解。使用細管黏 33 201223995 度計,測量在25°C下的溶液於細管黏度計中的落下時間, 令其為ts。又,測量溶劑單獨在細管黏度計中的落下時間, 令其為to。藉由IV值= [ln(ts/to)]/0.5之計算式求得IV值。再 者,「In」表示自然對數的底數。 從更為提高耐水解性的觀點來看,在包含有共聚物A 的樹脂組成物中的共聚物A含有比例以50〜100質量%為 佳,且以60〜100質量%更佳,又以70〜100質量%更佳。 包含有共聚物A的樹脂組成物亦可適宜地包含共聚物 A以外的有機物、無機物及各種添加劑。共聚物A以外的有 機物可列舉:環狀或線狀的共聚物A寡聚物、構成共聚物A 的酸成分或二醇成分之單體及源自其等的低分子量反應 物、共聚物A以外的樹脂及各種添加劑。共聚物A以外的樹 脂可列舉:PET、PBT、PEN、聚萘二甲酸丙二酯、聚萘二 曱酸丁二酯等熱可塑性聚酯、熱硬化性之聚酯、耐綸6、耐 綸66、耐綸11、耐綸12等熱可塑性聚醯胺、聚碳酸酯、聚 縮醛、聚苯乙烯、ABS樹脂、聚胺基曱酸酯、氟樹脂、矽 樹脂、聚苯硫醚樹脂、纖維素、聚苯醚樹脂等及其等之共 聚合樹脂等。 無機物可列舉:玻璃纖維、碳纖維、滑石、雲母、矽 灰石、高嶺土、層狀矽酸鹽、碳酸鈣、二氧化鈦、二氧化 矽等無機填充劑或無機潤滑劑、聚合催化劑殘渣等。 又,添加劑可列舉:有機或無機的染料或顏料、消光 劑、熱穩定劑、難燃劑、抗靜電劑、消泡劑、調色劑、抗 氧化劑、紫外線吸收劑、結晶成核劑、增白劑、潤滑劑、 34 201223995 雜質之捕捉劑、增黏劑、表面調節劑等。其中,以包含熱 穩定劑、低分子量的揮發性雜質之捕捉劑為佳。熱穩定劑 以5價及/或3價的磷化合物或受阻酚系化合物等為佳,低分 子量的揮發性雜質之捕捉劑則以聚醯胺或聚酯醯胺之聚合 物或寡聚物、具有醯胺基或胺基的低分子量化合物等。 本實施形態之共聚物A膜的以D Μ A法測得之玻璃轉移 溫度係在130°C以上。以DMA法測得之玻璃轉移溫度係以 140°C以上為佳,又以150°C以上更佳。以DMA法測得之玻 璃轉移溫度雖未特別設有上限,但通常在200°C以下,且以 在180°C以下為佳,並以在170°C以下更佳,又以在160°C以 下更佳。 DMA法係指以下方法。亦即,以5°C/分鐘的比例使試 驗片從室溫升溫,且使用黏彈性測量裝置測量試驗片的動 態黏彈性及損耗正切,而可從損耗正切的峰值溫度求得玻 璃轉移溫度。再者,測量頻率係1Hz。 又,本實施形態之共聚物A膜的以TMA法測得之玻璃 轉移溫度係在2 00 °C以上。以Τ Μ A法測得之玻璃轉移溫度以 在210°C以上為佳,且以在220°C以上更佳,並以在230°C以 上又更佳,又以在235°C以上最佳。以TMA法測得之玻璃轉 移溫度雖未特別設有上限,但通常在260°C以下,且以在255 它以下為佳,並以在250°C以下更佳,又以在245°C以下更 佳。 TMA法係指以下方法。亦即,以10°C/分鐘的比例使試 驗片從室溫升溫,使用熱分析裝置測量厚度方向的熱膨脹 35 201223995 望:’而作出表示溫度與熱膨脹量的關係之圖表。然後,在 玻璃轉移點前後的曲線上拉出接線,而可從此接線的交點 求出玻璃轉移溫度。 又,本實施形態之共聚物A膜於X光繞射中在22。$2 0 $24°的範圍内具有最大峰值。 本實施形態之共聚物A膜係封水解性優異。雖然並不清 楚有關於本實施形態的共聚物A膜會具有如此特性的理 由,但可舉出其一要因。 有關於上述玻璃轉移溫度及最大峰值之特性,係與本 實施形態之共聚物A膜中共聚物A在某種程度以上的結晶 化有關。又,認為是藉由共聚物A在某種程度以上(結晶度 以在20%以上為佳’且以在30%以上更佳)的結晶化而使耐 水解性變高。 在基於JIS-K7127的測量中,本實施形態之共聚物a膜 的斷裂強度在MD方向、TD方向上皆以在80MPa以上為佳, 且以在90MPa以上更佳,並以在i〇〇MPa以上又更佳。 在基於JIS-K7127的測量中,本實施形態之共聚物a膜 之斷裂伸度在MD方向、TD方向上皆以在150MPa以下為 佳,且以在120MPa以下更佳,並以在8〇MPa以下又更佳。 在基於ASTMD-149的測量中,本實施形態之絶緣破壞 電壓以在90kV/mm以上為佳,且以在丨丨收乂如爪以上更佳, 並以在130kV/mm以上又更佳。 在藉由TMA法(50〜1〇〇。〇的測量中,本實施形態之熱 膨脹係數(CTE)在MD方向、TD方向上皆以在80ppm/°C以下32 201223995 [Brief Description of the Drawings] [Fig. 1] A cross-sectional view of a back surface protective sheet for a solar cell module according to an embodiment of the present invention. Fig. 2 is a schematic cross-sectional view showing a solar battery module according to an embodiment of the present invention. [Fig. 3] A graph showing the change with time in the tensile strength retention ratio in the pressure cooker test of the films of Examples 1 and 2 and Comparative Examples 1 to 3. [Fig. 4] A graph showing changes with time in the tensile elongation retention rate in the pressure cooker test of the films of Examples 1 and 2 and Comparative Examples 1 to 3. [Fig. 5] A graph showing the results of X-ray diffraction of the films of Examples 1, 2 and Comparative Example 2. [Embodiment for Carrying Out the Invention] Hereinafter, preferred embodiments of the present invention will be described in detail. The copolymer film of bismuth subteronium phthalate, 4_cyclohexylene di decylene ester and 1,4-cyclohexylene di decylene phthalate of the present embodiment is composed of p-benzoquinone A resin composition of a copolymer of 1,4-cyclohexylidene dimethylene methyl ester and stilbene stilbene hydride and 4 cyclohexylene di decylene ester (hereinafter referred to as r copolymer A). Although the molar ratio of terephthalic acid ester to isophthalate is not particularly limited, but the hanging is 99.9: 0.1~5〇: 50, and 99: 1~7〇: 3〇 or better. . Further, the intrinsic viscosity (IV value) of the copolymer A is preferably 〇 〇 di / g, and more preferably 0 - 75 to 1.0 dl / g. The IV value was obtained as follows. Namely, the copolymer was dissolved in a mixed solvent of 60% by mass of phenol and 40% by mass of iota, 2,2-tetraethylene, in a concentration of 0-5 g/100 ml. Using a thin tube adhesive 33 201223995 ulometer, measure the drop time of the solution at 25 ° C in the thin tube viscometer, let it be ts. Also, measure the drop time of the solvent alone in the thin tube viscometer, and let it be to. The IV value is obtained by a calculation formula of IV value = [ln(ts/to)]/0.5. Furthermore, "In" represents the base of the natural logarithm. From the viewpoint of further improving hydrolysis resistance, the copolymer A content in the resin composition containing the copolymer A is preferably 50 to 100% by mass, more preferably 60 to 100% by mass, and further preferably 70 to 100% by mass is better. The resin composition containing the copolymer A may suitably contain an organic substance, an inorganic substance, and various additives other than the copolymer A. Examples of the organic substance other than the copolymer A include a cyclic or linear copolymer A oligomer, a monomer constituting the acid component of the copolymer A or a diol component, and a low molecular weight reactant derived therefrom, and a copolymer A. Other resins and various additives. Examples of the resin other than the copolymer A include thermoplastic polyester such as PET, PBT, PEN, propylene naphthalate, and polybutylene naphthalate, thermosetting polyester, nylon 6, and nylon. 66, nylon 11, nylon 12 and other thermoplastic polyamide, polycarbonate, polyacetal, polystyrene, ABS resin, polyamino phthalate, fluororesin, enamel resin, polyphenylene sulfide resin, A copolymerized resin such as cellulose, a polyphenylene ether resin or the like. Examples of the inorganic material include inorganic fillers such as glass fibers, carbon fibers, talc, mica, ashstone, kaolin, layered silicate, calcium carbonate, titanium oxide, and cerium oxide, inorganic lubricants, and polymerization catalyst residues. Further, the additive may be exemplified by an organic or inorganic dye or pigment, a matting agent, a heat stabilizer, a flame retardant, an antistatic agent, an antifoaming agent, a toner, an antioxidant, an ultraviolet absorber, a crystallization nucleating agent, and an increase White agent, lubricant, 34 201223995 Impurity trapping agent, tackifier, surface conditioner, etc. Among them, a trapping agent containing a heat stabilizer and a low molecular weight volatile impurity is preferred. The heat stabilizer is preferably a pentavalent and/or trivalent phosphorus compound or a hindered phenol compound, and the low molecular weight volatile impurity trapping agent is a polymer or oligomer of polyamine or polyesteramine. A low molecular weight compound having a guanamine or amine group or the like. The glass transition temperature of the copolymer A film of the present embodiment measured by the D Μ A method is 130 ° C or higher. The glass transition temperature measured by the DMA method is preferably 140 ° C or more, more preferably 150 ° C or more. Although the glass transition temperature measured by the DMA method is not particularly limited, it is usually below 200 ° C, preferably below 180 ° C, and preferably below 170 ° C, and at 160 ° C. The following is better. The DMA method refers to the following method. That is, the test piece was heated from room temperature at a rate of 5 ° C / minute, and the dynamic viscoelasticity and loss tangent of the test piece were measured using a viscoelasticity measuring device, and the glass transition temperature was obtained from the peak temperature of the loss tangent. Furthermore, the measurement frequency is 1 Hz. Further, the glass transition temperature of the copolymer A film of the present embodiment measured by the TMA method is 200 ° C or higher. The glass transition temperature measured by the Τ Μ A method is preferably above 210 ° C, and more preferably above 220 ° C, and more preferably above 230 ° C, and above 235 ° C. . Although the glass transition temperature measured by the TMA method is not particularly limited, it is usually below 260 ° C, and preferably below 255, and preferably below 250 ° C, and below 245 ° C. Better. The TMA method refers to the following method. That is, the test piece was heated from room temperature at a rate of 10 ° C /min, and the thermal expansion in the thickness direction was measured using a thermal analyzer. A graph showing the relationship between the temperature and the amount of thermal expansion was made. Then, pull out the wire on the curve before and after the glass transfer point, and the glass transition temperature can be obtained from the intersection of the wires. Further, the copolymer A film of the present embodiment was 22 in the X-ray diffraction. The maximum peak is in the range of $2 0 $24°. The copolymer A film of the present embodiment is excellent in hydrolyzability. Although it is not clear that the copolymer A film of the present embodiment has such a property, one of the reasons may be mentioned. The characteristics of the glass transition temperature and the maximum peak are related to the crystallization of the copolymer A in the copolymer A film of the present embodiment to some extent or more. Further, it is considered that the hydrolysis resistance is improved by the crystallization of the copolymer A to a certain extent or more (the crystallinity is preferably 20% or more and more preferably 30% or more). In the measurement based on JIS-K7127, the breaking strength of the copolymer a film of the present embodiment is preferably 80 MPa or more in the MD direction and the TD direction, and more preferably 90 MPa or more, and i MPa. The above is even better. In the measurement based on JIS-K7127, the elongation at break of the copolymer a film of the present embodiment is preferably 150 MPa or less in the MD direction and the TD direction, and more preferably 120 MPa or less, and 8 MPa. The following is even better. In the measurement based on ASTM D-149, the dielectric breakdown voltage of the present embodiment is preferably 90 kV/mm or more, and more preferably, for example, more than a claw, and more preferably 130 kV/mm or more. In the measurement by the TMA method (50 to 1 Torr.), the thermal expansion coefficient (CTE) of the present embodiment is 80 ppm/° C. or less in both the MD direction and the TD direction.
36 201223995 為佳’且以在6〇pPm/°C以下更佳,並以在40ΡΡπιΛ:以下又 更佳。 本實施形態之共聚物Α膜的厚度雖可依太陽電池模組 用背面保護片的厚度及所要求的性能來適當選擇,但以在 10仁m〜500/ζπι為佳,且以在2〇#m〜3〇〇“m更佳並以在 30"m〜200" m又更佳。藉由設在如此的範圍中,膜的製造 會ft彳于谷易,且會提兩強度、剛性而使操作性或後加工性 變得容易。厚度不均勻以在±1〇0/〇以内為佳,且以在土7〇/〇以 内更佳,並以在±5%以内又更佳。 有關於本實施形態之共聚物A膜可藉由以下所述般進 行來製造。 首先’準備擬成為原料的共聚物A樹脂(例如團粒)。共 聚物A樹脂可藉由將丨,4_環己烷二甲醇、對苯二曱酸及間苯 二曱酸以眾所皆知的方法進行聚縮合來製造。又,舉例而 & ’共¾^物A團粒亦有由Eastman公司以例如商品名 「Eastman Copolyester 13319」等在市面上販售。 然後,藉由加熱而熔融共聚物A樹脂,且因應需要來添 加添加劑,而得到包含有共聚物A的樹脂組成物。又,將此 樹脂組成物成形成膜。成形成膜的方法可列舉:藉由在熔 融狀態下以模具擠壓包含有共聚物A之樹脂組成物而成形 的熔融成形法、將以溶劑溶解樹脂組成物而成的溶液塗布 在支持體且於之後使溶劑乾燥之溶液鑄造法等。其等之 中,以生產性、環境適性優異且可以單一步驟得到膜的熔 融成形法最佳。熔融成形法係較佳為使用T型模具或丨型模 37 201223995 具的方式、水冷式及空冷式之充氣法㈣ati〇n)。 =著,藉由延伸經成形的未延伸共聚物八膜,可得到關 於本實施形態之上述共聚物A膜。 延伸條件、延伸方法等並無特別限定,只要是在能獲 得^述玻璃轉移溫度的範圍内及可在χ光繞射中規定的角 度範圍中得到最大峰值之範圍内等適當地調節即可。 舉例而s,延伸方向可為—軸亦可為二軸,但以二軸 為佳。 延伸方法亦無特別限定,可單獨使用或任意組合使用 輥延伸、拉幅機延伸等各種方法。 延伸倍率亦無特別限定。舉例而言,可於MD(machine direction,機器方向)方向設為2倍〜5倍,且於TD(transverse direction,橫向)方向設為2倍〜5倍。 於第1圖顯示本發明之太陽電池模組用背面保護片(以 下,亦有單純稱作「背面保護片」的情況。)之構成的一實 施例。背面保護片11具有在氣體阻障性膜2〇的兩面上積層 具有对熱性的膜基材30、32而成的構成。氣體阻障性膜20 係在基材10單面上設有由無機化合物構成的蒸鑛層12者。 基材10可使用上述共聚物A膜。 於本實施形態使用的具有耐熱性之膜基材3〇、32,只 要是具有耐熱性者即可,且可列舉選自於以下的氟系基 材:聚對苯二甲酸乙二酯(PET)膜或氟乙烯樹脂(pVF)膜、 聚二氟乙烯樹脂(PVDF)膜、三氟化氣化乙烯樹脂(pCTFE) 膜、乙烯•四氟化乙烯共聚物(ETFE)膜、聚四氟乙烯(PTFE) 38 201223995 膜、四氟化乙稀-全敦烧基乙稀基峻共聚物(pfa)模。又, 亦可適當地使用共聚物A臈來作為具有耐熱性的膜基材 30、32。 膜基材30、32之厚度並無特別限定,例如以設為3〜2〇〇 A m為佳,且以設為6〜3 〇 y m更佳。 蒸鍍層12的材料亦無特別限定,可列舉:氧化鋁、氧 化石夕、氧化錫、氧化鎮、氧化辞、料之2種以上之混合物。 蒸鍵層Π之厚度並無特別限定,例如以5〜細為佳,且 以10〜150nm更佳。 積層本實施形態之氣體阻障性膜2〇與具有耐熱性的膜 基材30、32的方法,舉例而言,可採用乾式層合積層方式 來積層。乾式層合祕著劑必財會產生因長期間的屋外 使用使接㈣度劣化W丨起的脫料,並且接著劑不產生 兴變等’而為了對應高耐熱性、耐濕熱性等,而希望使用 可交聯乃至硬化而形成三維網目狀的交聯構造等者來作為 構成接著劑的載劑之主成分的樹脂等。具體而言,構成前 述層合用接著劑層的接著劑較佳係、在硬化劑或交聯劑的存 在下’可藉由由熱或光等構成的反應能量來形成交聯構 造。舉例而5,可在二成分硬化型聚胺基曱酸m妾著劑 等脂肪族系•脂環系異氰_妓芳香族系異氰酸酿等異 氰酸i系之硬化劑或交聯劑的存在下,藉由由熱或光所構 成的反應能量來使層合用接著_成交_造,藉此製造 财熱性、賴性、耐濕熱性等優異的太陽電池模組用背面 保護片。 39 201223995 於前述接著劑中,脂肪族系異氰醆酯可使用例如丨,6_ 六亞甲基二異氰酸酯(HDI);脂環系異氰酸酯可使用例如異 佛酮二異氰酸酯(IPDI);芳香族系異氰酸酯可使用例如甲伸 苯基二異氰酸酯(TDI)、二苯基甲烷二異氰酸酯(]^〇1)、伸 萘基二異氰酸醋(NDI)、聯曱苯胺一異敦酸自旨(T〇Di)、伸苯 二甲基二異氰酸酯(XDI)等。 再者’於前述接著劑中,為了防止紫外線劣化等,可 添加紫外線吸收劑或光穩定劑。其使用量雖依其粒子形 狀、密度等而異,但以約〇.卜10重量%左右為佳。 前述接著劑可藉由例如:輥塗法、凹版觀塗法、吻合 塗布法及其他等塗布法或者印刺法等施用,且其塗布量為 2〜20g/m2(乾燥狀態)左右,且較佳希望在3〜i〇g/m2(乾燥狀 態)之範圍。 如此進行而得的本發明之太陽電池模組用背面保護片 由於具有上述共聚物A膜,故特別於耐水解性優異。因此, 如此的太陽電池用背面保護片可經長期間保護太陽電池且 低價。 再者,太陽電池模組用背面保護片之構成並未限定在 前述構成。 舉例而言,在蒸鍍層12及基材1〇之間,亦可設置用來 提高其等密著性的透明底塗層。透明底塗層之樹脂可列 舉:矽烷偶合劑或其水解物,與聚醇及異氰酸酯化合物之 複合物。 矽烷偶合劑可使用例如:乙基三甲氧矽烷、乙烯基三36 201223995 is better and is better at 6〇pPm/°C, and is better at 40ΡΡπιΛ: below. The thickness of the copolymer ruthenium film of the present embodiment can be appropriately selected depending on the thickness of the back surface protective sheet for a solar cell module and the required performance, but it is preferably 10 Å to 500 ζ πι, and is 2 〇. #m~3〇〇"m is better and is better at 30"m~200" m. By setting it in such a range, the manufacture of the film will be inferior to the valley, and will provide two strengths and rigidity. The operability or the post-processability are made easy. The thickness unevenness is preferably within ±1〇0/〇, and is preferably within 7〇/〇 of the soil, and more preferably within ±5%. The copolymer A film according to the present embodiment can be produced by the following method. First, 'preparation of a copolymer A resin (for example, agglomerates) to be used as a raw material. Copolymer A resin can be obtained by using ruthenium, 4_ ring Hexane dimethanol, terephthalic acid, and isophthalic acid are produced by polycondensation by a well-known method. Further, for example, & 'combined A pellets are also commercially available from Eastman Corporation, for example. The name "Eastman Copolyester 13319" is sold in the market. Then, the copolymer A resin is melted by heating, and if necessary, an additive is added to obtain a resin composition containing the copolymer A. Further, this resin composition was formed into a film. The method of forming a film includes a melt molding method in which a resin composition containing the copolymer A is extruded by a die in a molten state, and a solution obtained by dissolving a resin composition in a solvent is applied to the support. A solution casting method or the like which is followed by drying the solvent. Among them, the melt forming method which is excellent in productivity and environmental suitability and which can obtain a film in a single step is preferable. The melt forming method is preferably a T-die or a 丨-type mold 37 201223995, a water-cooled and air-cooled aeration method (4) ati〇n). The above copolymer A film of the present embodiment can be obtained by stretching the formed unstretched copolymer eight film. The stretching condition, the stretching method, and the like are not particularly limited as long as they are appropriately adjusted within a range in which the glass transition temperature can be obtained and a range in which the maximum peak value can be obtained in the angle range defined by the calender diffraction. For example, s, the extending direction may be - the axis may be two axes, but the two axes are preferred. The stretching method is not particularly limited, and various methods such as roll stretching and tenter stretching can be used singly or in any combination. The stretching ratio is also not particularly limited. For example, it can be set to 2 times to 5 times in the MD (machine direction) direction and 2 times to 5 times in the TD (transverse direction) direction. Fig. 1 shows an embodiment of the configuration of the back protective sheet for a solar cell module of the present invention (hereinafter, simply referred to as "back protective sheet"). The back surface protective sheet 11 has a structure in which heat-sensitive film base materials 30 and 32 are laminated on both surfaces of the gas barrier film 2A. The gas barrier film 20 is provided with a vaporized layer 12 composed of an inorganic compound on one surface of the substrate 10. As the substrate 10, the above copolymer A film can be used. The heat-resistant film substrates 3A and 32 used in the present embodiment may be any heat-resistant one, and may be a fluorine-based substrate selected from the group consisting of polyethylene terephthalate (PET). Film or vinyl fluoride resin (pVF) film, polyvinylidene fluoride resin (PVDF) film, trifluorochemical vaporized vinyl resin (pCTFE) film, ethylene tetrafluoroethylene copolymer (ETFE) film, polytetrafluoroethylene (PTFE) 38 201223995 Membrane, tetrafluoroethylene-dibenzopyrene-based copolymer (pfa). Further, the copolymer A crucible may be suitably used as the heat-resistant film substrates 30 and 32. The thickness of the film base materials 30 and 32 is not particularly limited, and is preferably, for example, 3 to 2 Å A m and more preferably 6 to 3 〇 y m . The material of the vapor-deposited layer 12 is not particularly limited, and examples thereof include a mixture of two or more kinds of alumina, oxidized oxide, tin oxide, oxidized town, oxidized product, and material. The thickness of the vapor-bonding layer is not particularly limited, and is preferably 5 to fine, and more preferably 10 to 150 nm. The method of laminating the gas barrier film 2 of the present embodiment and the heat-resistant film substrates 30 and 32 may be, for example, a dry laminate layer method. The dry laminating agent will produce a material that is degraded by the use of the outside of the house for a long period of time, and the binder does not change, and it is desirable to respond to high heat resistance, moist heat resistance, etc. A resin or the like which is a main component of a carrier constituting an adhesive, such as a crosslinked structure in which a three-dimensional mesh shape can be formed by crosslinking or even hardening. Specifically, the adhesive constituting the above-mentioned interlayer adhesive layer is preferably formed by a reaction energy composed of heat, light or the like in the presence of a curing agent or a crosslinking agent to form a crosslinked structure. For example, 5, an isocyanate i-based hardener or cross-linking such as an aliphatic or alicyclic isocyanide-based aromatic isocyanic acid, such as a two-component-curing polyamino phthalic acid m-clay In the presence of the agent, the back surface protective sheet for a solar cell module excellent in heat, properties, moisture resistance, and the like is produced by using the reaction energy composed of heat or light to cause lamination. 39 201223995 In the above-mentioned adhesive, an aliphatic isocyanurate may be, for example, anthracene, 6-hexamethylene diisocyanate (HDI); an alicyclic isocyanate may be, for example, isophorone diisocyanate (IPDI); an aromatic system As the isocyanate, for example, methylphenyl diisocyanate (TDI), diphenylmethane diisocyanate (1), n-naphthyl diisocyanate (NDI), benzalidine-isophthalic acid (T) can be used. 〇Di), benzodimethyl diisocyanate (XDI), and the like. Further, in the above-mentioned adhesive, an ultraviolet absorber or a light stabilizer may be added in order to prevent ultraviolet rays or the like. Although the amount of use varies depending on the particle shape, density, etc., it is preferably about 10% by weight. The above-mentioned adhesive can be applied by, for example, a roll coating method, a gravure coating method, an anastomosis coating method, or the like, a coating method, a printing method, or the like, and the coating amount thereof is about 2 to 20 g/m 2 (dry state), and Good hope is in the range of 3~i〇g/m2 (dry state). The back surface protective sheet for a solar cell module of the present invention thus obtained has the above-mentioned copolymer A film, and is therefore particularly excellent in hydrolysis resistance. Therefore, such a back protective sheet for a solar cell can protect a solar cell for a long period of time and is inexpensive. Further, the configuration of the back protective sheet for a solar cell module is not limited to the above configuration. For example, a transparent undercoat layer for improving the adhesion therebetween may be provided between the vapor deposition layer 12 and the substrate 1A. The resin of the transparent undercoat layer may be exemplified by a decane coupling agent or a hydrolyzate thereof, and a complex of a polyalcohol and an isocyanate compound. As the decane coupling agent, for example, ethyl trimethoxy decane or vinyl three can be used.
40 201223995 甲氧矽烷、氣丙基曱基二甲氧矽烷、τ-氯丙基三曱氧矽 烷、環氧丙氧基丙基三曱氧矽烷、r-甲基丙烯醯氧丙基三 曱氧矽烷、甲基丙烯醯氧丙基曱基二曱氧矽烷等矽烷偶 合或其水解物之1種至2種以上。又,亦有例如r-異氰酸酯 丙基三乙氧矽烷、7-異氰酸酯丙基三甲氧矽烷般包含異氰 酸酯基者;7-毓基丙基三乙氧矽烷般包含巯基者或者τ-胺基丙基三乙氧石夕烧、Τ_胺基丙基三曱氧石夕炫*、N- /3 -(胺 基乙基)-7-胺基丙基三乙氧石夕烧、Τ-苯基胺基丙基三曱氧 矽烷般包含胺基者。此外亦可為如r-環氧丙氧基丙基三甲 氧矽烷或召-(3、4-環氧環己基)乙基三曱氧矽烷等包含環氧 基者或是如乙烯基三曱氧矽烷、乙烯基(/3-曱氧乙氧)矽烷 等於矽烷偶合劑加成醇類等加成有水酸基等者,且可使用 其等之1種至2種以上。 聚醇可適宜地使用例如:使甲基丙烯酸乙酯、甲基丙 烯酸羥基乙酯或曱基丙烯酸羥基丙酯、曱基丙烯酸羥基丁 酯等丙烯酸衍生物單體單獨聚合者,或是添加苯乙烯等其 他單體使其等進行共聚合而成的丙烯酸聚醇等。 異氰酸酯化合物可使用例如:芳香族系之曱伸苯基二 異氰酸酯(TDI)或二苯基甲烷二異氰酸酯(MDI)、脂肪族系 之二甲苯二異氰酸酯(XDI)或六亞甲基二異氰酸酯(HMDI) 等單體類,及其等聚合體或衍生物等,且可使用其等之1種 或2種以上。 透明底塗層之厚度雖無特別限定,但以0.001〜2//m為 佳,且以0.03〜0.5# m更佳。 4140 201223995 methoxy decane, propyl propyl decyl dimethoxy decane, τ-chloropropyl trioxoxane, glycidoxypropyl trioxane, r-methyl propylene oxypropyl trioxane One to two or more kinds of decane coupling such as decane or methacryloxypropyl decyl decyl oxane or a hydrolyzate thereof. Further, there are also, for example, r-isocyanate propyl triethoxy decane, 7-isocyanate propyl trimethoxy decane, including isocyanate groups; 7-mercaptopropyl triethoxy oxane-containing sulfhydryl groups or τ-aminopropyl groups Triethoxylate, Τ-aminopropyltrioxoxalate, N-/3-(aminoethyl)-7-aminopropyltriethoxylate, oxime-phenyl Aminopropyl trioxoxanes generally contain an amine group. Further, it may be an epoxy group such as r-glycidoxypropyltrimethoxysilane or s-(3,4-epoxycyclohexyl)ethyltrioxane or a vinyltrioxane. The decane or the vinyl (/3-methoxyethoxy) decane is equivalent to the addition of a hydrazine coupling agent, an alcohol or the like, and the like, and one or more of them may be used. The polyalcohol can be suitably used, for example, by polymerizing an acrylic acid derivative monomer such as ethyl methacrylate, hydroxyethyl methacrylate or hydroxypropyl methacrylate or hydroxybutyl methacrylate, or adding styrene. An acrylic polyol or the like obtained by copolymerizing other monomers or the like. As the isocyanate compound, for example, an aromatic phenyl diisocyanate (TDI) or diphenylmethane diisocyanate (MDI), an aliphatic xylene diisocyanate (XDI) or hexamethylene diisocyanate (HMDI) can be used. And a monomer, a polymer, a derivative, etc., etc., and one type or two or more types can be used. The thickness of the transparent undercoat layer is not particularly limited, but is preferably 0.001 to 2/m, and more preferably 0.03 to 0.5 #m. 41
X ’於蒸鍍層12及膜基材32之間可進一步設置具有氣 體P且卩查& ^ $性之保護膜層。保護膜層例如可藉由將包含水溶性 鬲分子乃 久·'種以上之金屬烷氧化物或其水解物且將水或水 两亨类員 '見合液作為溶劑之塗布液塗布於蒸鍍層12上來形成。 水〉容性高分子可列舉:聚乙烯基醇、聚乙烯基吡咯啶 ‘粉、曱基纖維素、羧基甲基纖維素、海藻酸鈉等。 金屬烷氧化物可列舉:四乙氧矽烷、三異丙氧鋁等。 , ’亦可於基材10兩面形成蒸鍍層12。此時,亦可對 方之瘃鍍面形成上述透明底塗層或保護膜層。 又’太陽電池模組用背面保護片11亦可不具有膜基材 3〇、32# _ '者或兩者,甚者,亦可僅由上述基材10所構成。 接下來’說明使用有本發明之太陽電池用背面保護片 陽電池模組。第2圖係顯示關於具有本發明之太陽電池 用背Φ信 Μ '、5蔓片之太陽電池模組1〇〇其一實施形態的層構成 之概略截面圖。 組本實施形態之太陽電池模組丨〇 〇係構成為太陽電池模 4用表面保護片6G、表面側填充材層51、配設有配線52之 2光伏打元件的太陽電池元件5G、背面側填充材層53以 11之具有前糾水解性賴基材3〇配置 各,陽電、倾组·之背面側填充㈣洲的構成。對該等 2材,例如可藉由真空吸弓丨等來一體化且利用熱壓合之 壓入去等絲法,來將前述各層絲-體成形體且進行熱 s成形此外’太陽電池模組1⑽亦可裝設例如銘製的框 體(未圖示)。 201223995 構成前述太陽電池模組之通常的太陽電池模組用表面 保護片60,係具有太陽光之穿透性、絶緣性等,並且具有 财候性、财熱性、财光性、对水性、防濕性、防污性及其 他等諸特性,且物理或化學上的強度性、強韌性等優異, 富有極高的耐久性,此外,由於要保護作為光伏打元件之 太陽電池元件,刮痕抗性、衝擊吸收性等必須優異。 具體而言,可使用眾所皆知的玻璃板等,並且可使用 例如:聚醯胺系樹脂(各種耐綸)、聚酯系樹脂、環狀聚烯烴 系樹脂、聚苯乙烯系樹脂、(甲基)丙烯酸系樹脂、聚碳酸酯 系樹脂、縮醛系樹脂及其他等各種樹脂膜乃至片材,此外, 亦可適當地使用共聚物A。前述樹脂之膜乃至片材係可使用 經二軸延伸而成的延伸膜乃至片材。又,該樹脂之膜乃至 片材的厚度只要是對保持強度、剛性、勁度等必要的最低 限厚度即可,若過厚會有使成本上昇的缺點,且若過薄則 強度、剛性、勁度等會降低而較不佳。本實施形態中,從 如前所述的理由來看,樹脂之膜乃至片材的厚度係以 12〜200//m為佳,且以25/_im~150/zm更佳。 積層在構成太陽電池模組的太陽電池模組用表面保護 片60之下的填充材層51,由於係隔著表面保護片60入射太 陽光並穿透其而吸收因此必須具有透明性,又,亦必須具 有表面保護片及背面保護片之接著性。又,為了發揮保持 作為光伏打元件之太陽電池元件的表面之平滑性之功能而 需具有熱可塑性,此外,從保護作為光伏打元件之太陽電 池元件的觀點來看,刮痕抗性、衝擊吸收性等必須要優良。 43 201223995 具體而言,前述填充劑層可使用例如:乙烯-乙酸乙烯 基共聚物、離子聚合物樹脂、乙稀丙烯酸,或酸改質聚稀 烴系樹脂、聚乙烯基丁醛樹脂、矽酮系樹脂、環氧系樹脂、Further, a protective film layer having a gas P and having a property of X can be further disposed between the vapor-deposited layer 12 and the film substrate 32. The protective film layer can be applied to the vapor-deposited layer 12 by, for example, applying a coating liquid containing a water-soluble cerium molecule, a metal alkoxide or a hydrolyzate thereof, and water or water as a solvent. Come up to form. Examples of the water-containing polymer include polyvinyl alcohol, polyvinyl pyrrolidine, powder, sulfhydryl cellulose, carboxymethyl cellulose, and sodium alginate. Examples of the metal alkoxide include tetraethoxysilane, aluminum triisopropoxide, and the like. , the vapor deposition layer 12 may be formed on both surfaces of the substrate 10. At this time, the transparent undercoat layer or the protective film layer may be formed on the plating surface of the square. Further, the back surface protective sheet 11 for a solar cell module may not have the film substrate 3〇, 32#_' or both, or may be composed only of the substrate 10. Next, a back-side protection sheet solar battery module using the solar cell of the present invention will be described. Fig. 2 is a schematic cross-sectional view showing a layer configuration of an embodiment of a solar cell module 1 having a back Φ' and a vine of a solar cell of the present invention. The solar cell module of the present embodiment is configured as a solar cell module 4 surface protection sheet 6G, a front side filler layer 51, and a solar cell element 5G and a back side of the photovoltaic device in which the wiring 52 is disposed. The filler layer 53 has a configuration in which the front side correction-removing property of the substrate 11 is arranged on the substrate 3, and the back side of the anode and the tilting group is filled (four). These two materials can be integrated by, for example, vacuum suction or the like, and the above-mentioned respective layers of the wire-body formed body can be thermally s formed by the press-fitting method. The group 1 (10) can also be provided with, for example, a frame (not shown). 201223995 The surface protection sheet 60 for a solar cell module constituting the solar cell module described above has the transparency of sunlight, insulation, and the like, and has the characteristics of finance, finance, finance, water, and defense. Excellent properties such as wetness, antifouling properties, and other physical and chemical strength, toughness, etc., and extremely high durability. In addition, due to the protection of solar cell components as photovoltaic elements, scratch resistance Sex, shock absorption, etc. must be excellent. Specifically, a well-known glass plate or the like can be used, and for example, a polyamine resin (various nylon), a polyester resin, a cyclic polyolefin resin, or a polystyrene resin can be used. Various resin films or sheets such as a methyl methacrylate resin, a polycarbonate resin, an acetal resin, and the like may be used, and the copolymer A may be suitably used. As the film or even the sheet of the above resin, a stretched film or a sheet which is biaxially stretched can be used. Further, the thickness of the resin film or the sheet may be a minimum thickness required for holding strength, rigidity, stiffness, etc., and if it is too thick, there is a disadvantage that the cost is increased, and if it is too thin, strength, rigidity, and strength are obtained. Stiffness and so on will be lower and less. In the present embodiment, the thickness of the resin film or the sheet is preferably 12 to 200 / / m, and more preferably 25 / _ to 150 / zm. The filler layer 51 laminated under the surface protection sheet 60 for a solar cell module constituting the solar cell module is required to have transparency because it is incident on the surface protection sheet 60 and is absorbed by the sunlight. It is also necessary to have the adhesion of the surface protection sheet and the back surface protection sheet. Further, in order to exhibit the function of maintaining the smoothness of the surface of the solar cell element as a photovoltaic element, it is necessary to have thermoplasticity, and further, from the viewpoint of protecting the solar cell element as a photovoltaic element, scratch resistance and impact absorption Sex and so on must be excellent. 43 201223995 Specifically, the aforementioned filler layer may be, for example, an ethylene-vinyl acetate copolymer, an ionic polymer resin, an ethylene acrylic acid, or an acid-modified poly-saturated resin, a polyvinyl butyral resin, an anthrone. Resin, epoxy resin,
(甲基)丙烯酸系樹脂及其他等樹脂之〖種至2種以上之昆A 物。於本實施形態中,為了使耐熱性、耐光性、耐水^二 耐候性等提升,在構成前述填充材層之樹脂中可在不損及 其透明性的範圍任意地添加、混合例如:交聯劑、熱抗氡 化劑、光穩定劑、紫外線吸收劑、光抗氧化劑及其他等添 加劑。再者,在本實施形態中,若考慮到耐光性、耐熱性、 对水性等耐候料性能面及價格面,乙烯·乙酸乙稀基系樹 脂係作為太陽光入射側之填充材之較佳素材。再者,前述 填充材層之厚度係以2〇〇〜1〇〇〇"m為佳,且以35〇〜6〇〇Vm 更佳。 構成太陽電池模組之作為光伏打元件的太陽電池元件 5〇 ’可使用迄今所眾所皆知者,例如:單結㈣型太陽電 池元件夕結晶>5夕型太陽電池元件等結晶石夕太陽電子元 件、由單一接面型或是串列構造型等構成的非晶質矽太陽 電池元件、鎵砰(GaAs)、銦磷(InP)等ΙΙΙ-ν族化合物半導體 太知電子元件、録蹄(CdTe)或銅銦ί西化物(cuinse2)等第 II-VI族化合物半_太陽電子元件、有機太陽電池元件及 其他等。此外,亦可使用薄膜多結晶性妙太陽電池元件、 薄膜微結晶性發太陽電池元件、薄膜結晶砂太陽電池元件 與非晶質砂太陽電池元件之混成元件等。 積層於構成前述太陽電池模組的光伏打元件之下的背 44 201223995 面側填充材層53, 面保護片下的表面侧二積層於别述太陽電池模組用表 有與背面保護片之接著& s 51相同材質者。亦必須要具 件之太陽電池轉”^ ^揮保持作為光伏打元 性’此外’從保護作為光伏卜月、功此必須具有熱可塑 來看,到痕抗性、㈣π、打%件之太陽電池元件的觀點 若藉由前述本發:之=必須要優良。 護月及表面保護片之至少一電池棋組,由於上述背面保(A) type of (meth)acrylic resin and other resins, to two or more kinds of Kun A products. In the present embodiment, in order to improve the heat resistance, the light resistance, the water resistance, the weather resistance, and the like, the resin constituting the filler layer can be arbitrarily added and mixed in a range that does not impair the transparency thereof, for example, cross-linking. Agents, thermal anti-deuteration agents, light stabilizers, UV absorbers, photo-oxidants and other additives. In addition, in the present embodiment, in consideration of the weather resistance performance surface and the price surface such as water resistance, heat resistance, and water resistance, the ethylene-vinyl acetate-based resin is preferable as a filler for the sunlight incident side. . Further, the thickness of the filler layer is preferably 2 〇〇 to 1 〇〇〇 " m, and more preferably 35 〇 to 6 〇〇 Vm. The solar cell element 5〇' which is a photovoltaic cell component constituting a solar cell module can be used as far as is known, for example, a single junction (four) type solar cell element, a crystallization, a 5th solar cell element, etc. A solar electronic component, an amorphous tantalum solar cell element composed of a single junction type or a tandem structure type, a ΙΙΙ-ν compound semiconductor such as gallium germanium (GaAs) or indium phosphorus (InP), and a known electronic component. Group II-VI compound semi-solar electronic components such as hoof (CdTe) or copper indium citrate (cuinse2), organic solar cell elements, and the like. Further, a film polycrystalline solar cell element, a thin film microcrystalline solar cell element, a mixed material of a thin film crystal sand solar cell element and an amorphous sand solar cell element, or the like can be used. The back side 44 201223995 surface side filler layer 53 underlying the photovoltaic element of the solar cell module is laminated, and the surface side of the surface protection sheet is laminated on the surface of the solar cell module and the back surface protection sheet. & s 51 the same material. It is also necessary to have a solar cell to turn "^ ^ 保持 keep as a photovoltaic elemental 'in addition' from the protection as a photovoltaic month, the work must have thermal plasticity, to trace resistance, (four) π, hit the sun The viewpoint of the battery component is as good as the above-mentioned present invention: it must be excellent. At least one battery pack of the moon protection and surface protection sheet, due to the above-mentioned back protection
膜,故背面保護片或表面:護 有使用士述共聚物A 較於使用習知聚對苯納、’7解性高。因此,相 ΐ 夂乙二酯(PET)膜或聚葶二甲酸 ::::情況’一持作為-電二 再者Λ陽電池模組亦不限定於前述構成,而可為各 種構成:舉例而言’背面保護片Η可採用如上述之各種構 成者。若有需要’亦可為具有含太陽電池元件%之填充層、 配置於該填充層表面之表面保護片6 〇、配置於填充層背面 的背面保護片11,且表面保護片6〇及背面保護片u之至少 一者包含上述共聚物A膜者。 [實施例] 以下,舉出實施例及比較例來更為具體說明本發明之 内容。再者,本發明當不受下述實施例所限定。 膜之原料係使用以下樹脂團粗。再者’ PEN係聚萘二 曱酸乙二醋。 ⑴共聚物A(Eastman公司製、商品名:Eastman 45 201223995Membrane, so the back protective sheet or surface: the use of the copolymer A is higher than the use of the conventional poly-p-benzophenone, '7. Therefore, the phase of the bismuth ethylene glycol (PET) film or the polyphthalic acid dicarboxylic acid:::: the case of a holding - the electric two is not limited to the above-mentioned composition, but can be various components: for example In other words, the 'back protection sheet Η can be used as various constituents as described above. If necessary, it may be a filling layer having a solar cell element%, a surface protective sheet 6 disposed on the surface of the filling layer, a back protective sheet 11 disposed on the back surface of the filling layer, and a surface protective sheet 6 and a back surface protection. At least one of the sheets u contains the above copolymer A film. [Examples] Hereinafter, the contents of the present invention will be more specifically described by way of examples and comparative examples. Further, the present invention is not limited by the following examples. The raw materials of the film were thickened using the following resin groups. Furthermore, 'PEN is polyethylene naphthalate. (1) Copolymer A (manufactured by Eastman Co., Ltd., trade name: Eastman 45 201223995
Copolyester 13319) (2) PEN(帝人DuPont膜公司製、商品名:Teonex Q51) (3) 1,4-環己烷二曱醇· 2,2,4,4-四曱基-1,3-環丁二 醇•對本一甲酸聚縮合物(Eastman公司製、商品名:EastmanCopolyester 13319) (2) PEN (manufactured by Teijin DuPont Film Co., Ltd., trade name: Teonex Q51) (3) 1,4-cyclohexanedimethanol · 2,2,4,4-tetradecyl-1,3- Cyclobutanediol • The monocarboxylic acid polycondensate (Eastman, trade name: Eastman)
Tritan Copolyester FX200)(以下稱為「共聚物b」) [實施例1] 藉由熔融擠壓來膜化共聚物A(團粒狀),且再藉由二軸 延伸來得到厚度50//m之延伸共聚物A膜。 [實施例2] 除了改變延伸倍率而令厚度為1〇〇以m之外,與實施例j 相同地進行’而得到厚度100((/111之共聚物A膜。 [比較例1] 藉由熔融擠壓來膜化PEN(團粒狀),且再藉由二軸延伸 來得到厚度25/zm之延伸pen膜。 [比較例2] 藉由熔融擠壓來膜化共聚物A(團粒狀),而得到厚度 110#m之未延伸共聚物八膜。 [比較例3] 藉由熔融擠壓來獏化共聚物B(團粒狀),而得到厚度 100//m之未延伸共聚物B膜。 <各種物性> 對實施例1及2以及比較例卜3之膜測量斷裂強度、斷裂 伸度、玻璃轉移溫度、魅、絶緣破壞電壓、比重及熱膨 脹係數。各測量之測量方法及測量值係示於表2。Tritan Copolyester FX200) (hereinafter referred to as "copolymer b") [Example 1] Copolymerization of copolymer A (agglomerate) by melt extrusion, and further by biaxial stretching to obtain a thickness of 50 / / m The copolymer A film was stretched. [Example 2] A thickness of 100 ((/111 copolymer A film) was obtained in the same manner as in Example j except that the stretching ratio was changed to 1 Å in m. [Comparative Example 1] The PEN (agglomerate) was film-molded by melt extrusion, and an extended pen film having a thickness of 25/zm was obtained by biaxial stretching. [Comparative Example 2] Copolymerization of a copolymer A by a melt extrusion (agglomerate) Thus, an unstretched copolymer eight film having a thickness of 110#m was obtained. [Comparative Example 3] The copolymer B (agglomerate) was deuterated by melt extrusion to obtain an unstretched copolymer B film having a thickness of 100/m. <Various physical properties> The films of Examples 1 and 2 and Comparative Example 3 were measured for breaking strength, elongation at break, glass transition temperature, charm, dielectric breakdown voltage, specific gravity, and thermal expansion coefficient. Measurement methods and measurements of each measurement The value is shown in Table 2.
46 201223995 【表2】 斷裂伸度(%) 玻璃轉移溫度(。〇 熔點(°〇) 絶緣破 (kV/mm) 比重 熱膨脹係數 [50~10QoC](ppm/°C)46 201223995 [Table 2] Elongation at break (%) Glass transition temperature (.〇 Melting point (°〇) Insulation breaking (kV/mm) Specific gravity Thermal expansion coefficient [50~10QoC](ppm/°C)
項目 斷裂強度(MPa) <水解性試驗> 對實施例1及2以及比較例1〜3之膜進行壓力鋼試驗 (120°C、100%RH(相對濕度)、2大氣壓)。對各膜測量5〇小 時後、100小時後、150小時後及200小時後之拉伸強度保持 率及拉伸伸度保持率。結果係示於第3圖及第4圖。相較於 比較例1〜3之膜,實施例1及2之膜的拉伸強度保持率及拉伸 伸度保持率之降低較慢。 <結晶度之測量> 對實施例1、實施例2及比較例2之膜進行藉由CuKa射 線之粉末X光繞射,並進行繞射圖樣之確認及結晶度的計 47 201223995 算。測量方法及測量條件係如下所述。標靶^ Cu、x光賞 電流:40mA、X光管電壓:45kV、掃描範圍:2 θ = 4〜65 、 步長:2 0 = 0.01671。、平均時間/步長:l〇.160s、固定發散 狹縫:1/2。、旋轉速度:每分60旋轉、結晶度解析:赫爾 曼斯(Hermans)法、前處理:無。 X光的入射方向及反射方向所成為的角度2 Θ與繞射強 度之關係係示於第3圖。實施例卜2之膜中雖可在22 ° S 2 6> $24°的範圍内確認到明確且銳利的最大峰值,但在比較例 2之膜則於任一處皆未確認到銳利的峰值,而判明其為非晶 質。又’基於第3圖來求得實施例1及實施例2之膜的結晶 度,係分別為42.8%、39.7%。 又,於實施例1、2中,第二強度的峰值係出現於2(9 = 16〜17°,第三強度的峰值係出現於20 =19〜2〇。。峰值強度 比係第2強度之峰值/最大峰值左右。 [符號說明] 11…太陽電池模組用背面保護片、10…基材、12…蒸 鍵層、20...氣體阻障性膜、3〇、32.·.膜基材、5〇...太陽電 池元件' 51...表面側填充材層、52...配線、53...背面側填 充材層、6G·..太陽電频_表面保護片、刚...太陽電池 模組。 [專利請求範圍之内容] [請求項第1項] 種對苯—甲酸i,4.伸環己基二亞甲醋與間苯二甲酸 ,申*己基_亞甲酿之共聚物膜’其以法測得之玻Item Breaking Strength (MPa) <Hydrolysis Test> The films of Examples 1 and 2 and Comparative Examples 1 to 3 were subjected to a pressure steel test (120 ° C, 100% RH (relative humidity), 2 atm). The tensile strength retention and the tensile elongation retention ratio after 5 hours, 100 hours, 150 hours, and 200 hours were measured for each film. The results are shown in Figures 3 and 4. The film of Examples 1 and 2 had a slower decrease in the tensile strength retention ratio and the tensile elongation retention ratio as compared with the films of Comparative Examples 1 to 3. <Measurement of crystallinity> The films of Example 1, Example 2, and Comparative Example 2 were subjected to powder X-ray diffraction by CuKa ray, and the diffraction pattern was confirmed and the crystallinity was calculated 47 201223995. The measurement method and measurement conditions are as follows. Target ^ Cu, x light reward Current: 40mA, X-ray tube voltage: 45kV, scanning range: 2 θ = 4~65, step size: 2 0 = 0.01671. Average time/step size: l〇.160s, fixed divergence Slot: 1/2. Rotation speed: 60 rotations per minute, crystallinity analysis: Hermans method, pre-treatment: none. The relationship between the angle 2 Θ and the diffraction intensity by the incident direction and the reflection direction of the X-ray is shown in Fig. 3. In the film of Example 2, although a clear and sharp maximum peak was observed in the range of 22 ° S 2 6 > $ 24 °, the film of Comparative Example 2 did not confirm a sharp peak at any position, and It was found to be amorphous. Further, the crystallinity of the films of Example 1 and Example 2 was determined based on Fig. 3, which were 42.8% and 39.7%, respectively. Further, in Examples 1 and 2, the peak of the second intensity appears at 2 (9 = 16 to 17°, and the peak of the third intensity appears at 20 = 19 to 2 〇. The peak intensity ratio is the second intensity. The peak value/maximum peak value. [Symbol description] 11...Solar battery module back protection sheet, 10...substrate, 12...steam key layer, 20...gas barrier film, 3〇, 32.·. Film substrate, 5 〇...solar cell element '51...surface side filler layer, 52...wiring, 53...back side filler layer, 6G·..solor frequency_surface protection sheet , just... solar battery module. [Contents of patent request] [Request item 1] Kind of p-Benzene-formic acid i, 4. Stretched cyclohexyl dimethylene acetonate and isophthalic acid, Shen * Jiji _ The copolymer film of the melon is 'glassy measured by the method
48 201223995 璃轉移溫度在130°C以上。 [請求項第2項] 如請求項第1項之對苯二甲酸M-伸環己基二亞甲酯與 間苯二曱酸1,4-伸環己基二亞甲酯之共聚物膜,其以TMA 法測得之玻璃轉移溫度在200°C以上。 [請求項第3項] 如請求項第1或2項之對苯二甲酸1,4-伸環己基二亞曱 酯與間苯二曱酸1,4-伸環己基二亞曱酯之共聚物膜,係在X 光繞射中,於22° $2 0 $24°之範圍内具有最大峰值。 [請求項第4項] 一種對苯二曱酸1,4-伸環己基二亞甲酯與間苯二甲酸 1,4-伸環己基二亞曱酯之共聚物膜,其以TMA法測得之玻 璃轉移溫度在200°C以上。 [請求項第5項] 如請求項第4項之對苯二曱酸1,4-伸環己基二亞曱酯與 間苯二曱酸1,4-伸環己基二亞甲酯之共聚物膜,係在X光繞 射中,於22° $2 0 $24°之範圍内具有最大峰值。 [請求項第6項] 一種對苯二曱酸1,4-伸環己基二亞曱酯與間苯二甲酸 1,4-伸環己基二亞曱酯之共聚物膜,係在X光繞射中,於22 °$2 0 $24°之範圍内具有最大峰值。 [請求項第7項] 如請求項第1至6項中任一項之對苯二曱酸1,4 -伸環己 基二亞甲酯與間苯二曱酸1,4-伸環己基二亞甲酯之共聚物 49 201223995 膜,其係用於太陽電池模組之表面或背面保護。 [請求項第8項] 一種太陽電池模組用保護片,其包含至少一層如請求 項第1至6項中任一項之對苯二甲酸1>4_伸環己基二亞甲酯 與間苯二曱酸1,4-伸環己基二亞甲酯之共聚物膜。 [請求項第9項] 一種太陽電池模組用背面保護片,其包含至少一層如 請求項第1至6項中任一項之對苯二甲酸M_伸環己基二亞 甲酉曰與間本一曱酸1,4-伸壞己基二亞曱醋之共聚物膜。 [請求項第10項] 一種太陽電池模組,其具有包含太陽電池元件之填充 層、配置於前述填充層表面上的表面保護片、配置於前述 填充層之凌面的背面保護片,且前述表面保護片及前述背 面保護片之至少一者具有如請求項第丨至6項中任一項之對 苯二甲酸1,4-伸環己基二亞甲醋與間苯二甲酸丨,4-伸環己基 二亞曱酯之共聚物膜。 【圖式簡單說明】 【第1圖】關於本案之基礎申請案(日本專利特願 2010-192520號案)之發明的一實施形態之太陽電池模組用 背面保護片的截面圖。 【第2圖】關於本案之基礎中請案之發明的—實施形態 之太陽電池模組的概略截面圖。 【第3圖】表示對關於本案之基礎申請案的實施例卜2 及比較例Η之膜進行動鋼試驗中的拉伸強度保持率之 50 201223995 經時變化之圖表。 【第4圖】表示對關於本案之基礎申請案的實施例i、2 及比較例1〜3之膜進行壓力鍋試驗中的拉伸伸度保持率之 經時變化的圖表。 【第5圖】表示關於本案之基礎申請案的實施例1、2及 比較例2之膜的X光繞射結果之圖。 【主要元件符號說明】 11…太陽電池模組用背面保護片 51…表面側填充材層 10…基材 12…蒸艘層 20…氣體阻障性膜 30、32···膜基材 50...太陽電池元件 52…配線 53…背面側填充材層 60…太陽電池模組用表面保護片 100…太陽電池模組 5148 201223995 The glass transfer temperature is above 130 °C. [Request 2] The copolymer film of M-cyclohexylene dimethylene terephthalate and 1,4-cyclohexylene dimethylene methyl isophthalate as in Item 1 of the claim The glass transition temperature measured by the TMA method is above 200 °C. [item 3 of the request] Copolymerization of 1,4-cyclohexylene dipyridinium terephthalate with 1,4-cyclohexylene dipyridinium isophthalate as claimed in item 1 or 2 of the claim The film, in X-ray diffraction, has the largest peak in the range of 22° $2 0 $24°. [Requirement Item 4] A copolymer film of 1,4-cyclohexylene dimethylene terephthalate and 1,4-cyclohexyl dipyridinium isophthalate, which is measured by TMA method The resulting glass transition temperature is above 200 °C. [item 5 of the request] Copolymer of 1,4-cyclohexylene dipyridinium terephthalate and 1,4-cyclohexylene dimethylene ester of isophthalic acid as in item 4 of the claim The membrane, in X-ray diffraction, has a maximum peak in the range of 22° $2 0 $24°. [Claim Item 6] A copolymer film of 1,4-cyclohexylene dipyridinium terephthalate and 1,4-cyclohexylene dipyridinium isophthalate, which is wrapped in X-rays. Shot with a maximum peak in the range of 22 ° $ 2 0 $ 24 °. [item 7 of the request] 1,4-benzoic acid 1,4 -cyclohexylidene dimethylene phthalate and isophthalic acid 1,4-cyclohexyldiyl as described in any one of claims 1 to 6. Methylene ester copolymer 49 201223995 film, which is used for surface or back protection of solar cell modules. [Claim Item 8] A protective sheet for a solar cell module comprising at least one layer of terephthalic acid 1 > 4_cyclohexylene dimethylene ester according to any one of claims 1 to 6 A copolymer film of 1,4-dicyclohexyl dimethylene phthalate. [Claim Item 9] A back protective sheet for a solar cell module, comprising at least one layer of terephthalic acid M_cyclohexylene dimethylene phthalate or the like according to any one of claims 1 to 6. The present phthalic acid 1,4-stretched copolymer film of hexyl dithylene vinegar. [Claim Item 10] A solar cell module comprising a filling layer including a solar cell element, a surface protection sheet disposed on a surface of the filling layer, and a back surface protective sheet disposed on a surface of the filling layer, and the foregoing At least one of the surface protective sheet and the foregoing back protective sheet has 1,4-cyclohexyl dimethylene phthalate and bismuth isophthalate, as in any one of claims 6 to 4, 4- A copolymer film of cyclohexyldipyridinium ester is stretched. [Brief Description of the Drawings] [Fig. 1] A cross-sectional view of a back protective sheet for a solar cell module according to an embodiment of the invention of the present invention (Japanese Patent Application No. 2010-192520). [Fig. 2] A schematic cross-sectional view of a solar battery module according to an embodiment of the present invention. [Fig. 3] is a graph showing the change of the tensile strength retention rate in the dynamic steel test of the film of Example 2 and the comparative example of the basic application of the present application. [Fig. 4] is a graph showing changes with time in the tensile elongation retention rate in the pressure cooker test of the films of Examples i and 2 and Comparative Examples 1 to 3 of the basic application of the present application. Fig. 5 is a view showing the results of X-ray diffraction of the films of Examples 1, 2 and Comparative Example 2 of the basic application of the present application. [Description of main component symbols] 11... Back surface protective sheet 51 for solar cell module... Surface side filler layer 10... Substrate 12: Steamed layer 20: Gas barrier film 30, 32 · Film substrate 50. .. solar battery element 52... wiring 53... back side filler layer 60... solar cell module surface protection sheet 100... solar battery module 51
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TWI680053B (en) * | 2015-01-10 | 2019-12-21 | 日商三菱化學股份有限公司 | Double-sided metal laminate film |
TWI734682B (en) * | 2015-09-30 | 2021-08-01 | 日商三菱化學股份有限公司 | Metal film laminate film |
TWI849439B (en) * | 2021-06-29 | 2024-07-21 | 南韓商愛思開邁克沃股份有限公司 | Polyester resin composition, polyester film, and flexible flat cable |
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TW201221544A (en) | 2012-06-01 |
WO2012029760A1 (en) | 2012-03-08 |
WO2012029761A1 (en) | 2012-03-08 |
JP5914339B2 (en) | 2016-05-11 |
WO2012029499A1 (en) | 2012-03-08 |
JPWO2012029760A1 (en) | 2013-10-28 |
JPWO2012029761A1 (en) | 2013-10-28 |
TW201229102A (en) | 2012-07-16 |
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