TW201223758A - Curable resin composition for anti-static layer, optical film, polarizer and display panel - Google Patents
Curable resin composition for anti-static layer, optical film, polarizer and display panel Download PDFInfo
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- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
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- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
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- B32B27/00—Layered products comprising a layer of synthetic resin
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- B32—LAYERED PRODUCTS
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- B32B27/00—Layered products comprising a layer of synthetic resin
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- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
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- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
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- G—PHYSICS
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/21—Anti-static
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/418—Refractive
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- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- C08L2201/00—Properties
- C08L2201/04—Antistatic
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
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Abstract
Description
201223758 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種設置於液晶顯示器(LCD,Liquid201223758 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a liquid crystal display (LCD, Liquid)
Crystal Display)、陰極管顯示裝置(CRT,Cathode-ray Tube) 或電裝顯示器(PDP,Plasma Display Panel)等顯示器(影像顯 示裝置)之前面之具有抗靜電層的光學薄膜及該抗靜電層用 之組成物’以及使用該光學薄膜之偏光板及顯示面板。 【先前技術】 於上述之顯示器中,通常於最表面設置有包含具有抗反射 性、硬塗性或抗靜電性等各種功能之層的光學薄膜。另外, 於本說明書中’有時將硬塗僅稱為「HC」。 作為此種光學薄膜的功能層之一,已知有用於賦予抗靜電 性之抗靜電層。該抗靜電層錢由添力場_錄之氧化錫 (剔,誕麵7 TW)或推雜有錫之氧化_0, 遞· Tin 0xide)等金屬氧化物系的導電性超微粒子古八 子型導電性組成钱喊㈣系導電材料等抗靜電劑: 成(例如專利絲丨)。於使贱純靜電劑之情 使所需之抗靜電性與光學雜(低霧值或高,’為 並存,藉由形成含有抗靜電劑之〇1 i 先線透過率) 來賦予所需之功能。 ·〜㈣左右的薄膜層 又,於上述之顯示 X Ί、判絲貝不器之与 一 硬度,以使其於處理時不受損傷1 °,#顯示面賦弓 ,於專利文獻1中浪 100124540 4 201223758 示有如下之光學薄膜之構成:於三醋酸纖維素(以下,有時 僅稱為「TAC(Triacetyl Cellulose)」基材上設置薄膜之防靜 電層,並於該抗靜電層上設置HC層。 然而,由於抗靜電層係薄膜,因此存在如下之問題:層中 所包含之季戊四醇三丙烯酸酯(以下,有時僅稱為 「PETA(Pentaerythritol triacrylate)」或二季戊四醇六丙烯酸 酯(以下,有時僅稱為「DPHA(Di-Pentaerythritol hexaacrylate)」之類的黏合劑成分及抗靜電劑的量有限,進 而容易造成與鄰接於該抗靜電層之HC層之密接性不足。 於以基材/抗靜電層/HC層為基本構成之光學薄膜中,係 有抗靜電層與HC層之間的界面、及抗靜電層與基材之間的 界面’在各個界面存在密接性之問題。 於抗靜電層與HC層之間的界面上,抗靜電層與HC層各 自之反應性基進行交聯鍵結而密接,但同時要求抗靜電層發 揮抗靜電性能。於抗靜電劑為金屬氧化物之情形時,為了抗 ’電層發揮抗靜電性能’抗靜電劑之微粒子彼此必需密接, 因此添加大量之抗靜電劑,但存在霧值增加、或全光線透過 之清’兄。然而’若重視光學特性而減少金屬氧化物之 里,則抗靜電性能難以發揮。又,若增加抗靜電劑之量,則 存在於抗靜電層與鄰接層之界面上黏合劑成分之量不足,抗Optical film having an antistatic layer in front of a display (video display device) such as a cathode display device (CRT) or a cathode display panel (PDP, Plasma Display Panel) and the antistatic layer The composition 'and the polarizing plate and the display panel using the optical film. [Prior Art] In the above display, an optical film including a layer having various functions such as antireflection, hard coat or antistatic property is usually provided on the outermost surface. In addition, in the present specification, hard coating is sometimes referred to simply as "HC". As one of the functional layers of such an optical film, an antistatic layer for imparting antistatic properties is known. The antistatic layer is made of a metal oxide-based conductive ultrafine particle, such as tin oxide (tick, 7 TW) or oxidized with tin _0, hand · Tin 0xide. Conductive composition of money shouting (four) is an antistatic agent such as conductive materials: into (for example, patent silk). In order to make the required antistatic property and optical impurities (low fog value or high, 'coexistence, by forming a first line transmittance of antimony containing antistatic agent) to give the desired Features. ·~ (4) The film layer of about (4) is displayed in the above-mentioned X Ί, 丝 贝 不 与 与 与 与 与 与 与 , , , , , , , 硬度 硬度 硬度 硬度 硬度 硬度 硬度 硬度 硬度 硬度 硬度 硬度 硬度 # # # # # # # # # 100124540 4 201223758 The following is an optical film structure in which an antistatic layer of a film is provided on a cellulose triacetate (hereinafter sometimes referred to as a "TAC (Triacetyl Cellulose)" substrate, and is disposed on the antistatic layer. However, the antistatic layer-based film has the following problems: pentaerythritol triacrylate (hereinafter, sometimes referred to as "PETA (Pentaerythritol triacrylate)" or dipentaerythritol hexaacrylate (hereinafter referred to as "PETA (Pentaerythritol triacrylate)" In some cases, the amount of the binder component and the antistatic agent, which are simply referred to as "DPHA (Di-Pentaerythritol hexaacrylate)", is limited, and the adhesion to the HC layer adjacent to the antistatic layer is likely to be insufficient. The material/antistatic layer/HC layer is an optical film having a basic structure, and the interface between the antistatic layer and the HC layer and the interface between the antistatic layer and the substrate are intimate at each interface. The interface between the antistatic layer and the HC layer is crosslinked and bonded to each other by the reactive groups of the antistatic layer and the HC layer, but at the same time, the antistatic layer is required to exhibit antistatic properties. In the case of metal oxides, in order to resist the antistatic property of the 'electric layer,' the microparticles of the antistatic agent must be in close contact with each other, so a large amount of antistatic agent is added, but there is an increase in the haze value or the transmission of the whole light. 'If the optical properties are emphasized and the metal oxide is reduced, the antistatic performance is difficult to exert. Further, if the amount of the antistatic agent is increased, the amount of the binder component at the interface between the antistatic layer and the adjacent layer is insufficient.
靜電層與鄰接層之密接性變差之可能性。然而,若重視密接 性而減少么M 主屬氧化物之®,則抗靜電性能難以發揮。 100124540 5 201223758 於抗靜電劑為四級銨鹽之情形時,為了抗靜電層發揮抗靜 電性能’層内必需存在量比黏合劑更多之四級銨鹽。或者, 四級銨鹽必需集中存在於抗靜電層之與HC層鄰接的界面 附近。然而’於此種情形時,存在如下之可能性:存在於界 面附近之四級銨鹽阻礙抗靜電層與HC層之密接,在抗靜電 層與鄰接之HC層的界面上黏合劑成分(具有提高與HC層之 交聯密度之反應性基的成分)之量不足,抗靜電層與鄰接之 HC層的密接性變差。然而,若重視密接性而減少四級錄鹽 之量,則抗靜電性能會惡化。 為了使抗靜電性與密接性並存,可考慮單純地增多 PETA(季戊四醇三丙烯酸酯)或DPHA(二季戊四醇六丙烯酸 醋)之類的黏合劑成分之量的方法’但若增多此種黏合劑成 分之量,則抗靜電層之膜厚增厚,伴隨於此,存在抗靜電層 之捲曲(㈣)變大之問題’以及分散於抗靜電層中之昂責二 抗靜電劑的使用量亦增加’而導致成本增加之問題。又,為 了提高密接性’可考慮增加黏合劑巾之具有反舰基之成分 的方法’但如上所述,為了顯現抗靜電性能而有必要之抗靜 電劑之量,黏合劑之量有限制,因此難以採用該方法。 又,如上所述,因作為薄膜之抗靜電層之層中所包含的黏 合劑成分與抗靜電心總量有限,若欲減少婦電劑之使 用量,相應地增加黏合劑成分之使用量來提高抗靜電層| HC層之密接性,則存在抗靜電劑<_⑽少而導致抗靜 100124540 6 201223758 電性能降低之問題。 另一方面,於抗靜電層與基材之間的界面上,為了使抗靜 電層密接於基材,需要使抗靜電層之組成物之黏合劑成分滲 透至基材内,且在基材與抗靜電層之界面上,滲透至基材内 之黏合劑成分與形成抗靜電層之黏合劑成分硬化結合。 於抗靜電劑為四級銨鹽之情形時,已知先前為了提高耐久 性或抗靜電性而使用分子量較大之四級銨鹽。然而,若四級 銨鹽之分子量較大,則抗靜電層之組成物之黏合劑成分難以 滲透至基材内,因此為了獲得抗靜電層與基材之密接性,必 需使用大量之滲透性溶劑、或使用可渗透至基材内之分子量 較小之黏合劑。然而,於該情形時,存在抗靜電層與HC層 之界面之密接性變差的問題。 又,先前已知有藉由使用滲透性溶劑而可防止干擾條紋、 且可使外觀變得良好之技術,但若使用滲透性溶劑,則有時 於基材内亦會形成新的界面,除上述之密接性惡化以外,亦 有產生干擾條紋且外觀變差之問題。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2009-086660號公報 【發明内容】 (發明所欲解決之問題) 本發明係為了解決上述問題而完成之發明,其第一目的在 100124540 7 201223758 於提供一種抗靜電層用硬化性樹脂組成物,該抗靜電層用硬 化性樹脂組成物可形成光學特性及外觀良好、抗靜電性充 分、且與鄰接之HC層及TAC基材之密接性優異的抗靜電 層。 又,本發明之第二目的在於提供一種光學薄膜’其具有使 用上述組成物所形成之抗靜電層,且灰塵附著防止性優異。 又,本發明之第三目的在於提供一種偏光板’其具有上述 光學薄膜。 又,本發明之第四目的在於提供一種顯示面板’其具有上 述光學薄膜。 (解決問題之手段) 本發明者等人進行了努力研究,結果得知’若作為抗靜電 層之組成物中所包含之黏合劑成分、且用於提面與鄰接之 HC層之交聯密度並獲得密接性的PETA或DPHA之類的分 子量為900以下之分子量比較小之黏合劑成分,可大致全部 滲透至TAC基材中,或者根據黏合劑成分自TAC基材之屬 於與HC層之界面的表面向TAC基材無HC層之背面的深 度方向之渗透程度,結果黏合劑成分偏存於基材中,基材上 之抗靜電層中所包含之黏合劑成分減少,在HC層與抗靜電 層之界面進行反應之成分不足’因此有時無法充分獲得抗靜 電層與HC層之密接性。又,亦得知:若渗透至TAC基材 内部之部分並非以梯度形式滲透,而是渗透之材料全部一樣 100124540 8 201223758 地渗透至TAC基㈣之㈣深度,· 基材内形成點 。透層而於基材内產生新的界面,且產生干擾條紋等 而導致外觀惡化。 . 目此,本發明者等人發現:藉由將㈣射所包含之抗靜 ‘ _、屬神轉透至TAC歸或Wit至TAC基材之黏The possibility that the adhesion between the electrostatic layer and the adjacent layer is deteriorated. However, if the importance of adhesion is reduced and the main oxide of M is reduced, antistatic performance is difficult to exert. 100124540 5 201223758 In the case where the antistatic agent is a quaternary ammonium salt, antistatic properties are exerted for the antistatic layer. There must be more quaternary ammonium salts in the layer than the binder. Alternatively, the quaternary ammonium salt must be concentrated in the vicinity of the interface of the antistatic layer adjacent to the HC layer. However, in such a case, there is a possibility that the quaternary ammonium salt present in the vicinity of the interface hinders the adhesion between the antistatic layer and the HC layer, and the binder component at the interface between the antistatic layer and the adjacent HC layer (having The amount of the component which increases the reactivity of the crosslinking layer with the HC layer is insufficient, and the adhesion between the antistatic layer and the adjacent HC layer is deteriorated. However, if the importance of adhesion is reduced and the amount of salt recorded at the fourth level is reduced, the antistatic property is deteriorated. In order to coexist the antistatic property and the adhesion, a method of simply increasing the amount of the binder component such as PETA (pentaerythritol triacrylate) or DPHA (dipentaerythritol hexaacrylate) may be considered, but if such a binder component is added The amount of the antistatic layer is increased, and the curl of the antistatic layer ((4)) becomes large, and the amount of the antistatic agent dispersed in the antistatic layer is also increased. 'There is a problem of increased costs. Further, in order to improve the adhesion, a method of increasing the composition of the adhesive towel having an anti-ship base may be considered. However, as described above, the amount of the antistatic agent necessary to exhibit antistatic properties is limited. It is therefore difficult to adopt this method. Further, as described above, since the total amount of the binder component and the antistatic core contained in the layer of the antistatic layer as the film is limited, if the amount of the epoxy resin is to be reduced, the amount of the binder component is increased accordingly. Increasing the adhesion of the antistatic layer | HC layer, there is a problem that the antistatic agent <_(10) is small, resulting in a decrease in electrical performance of antistatic 100124540 6 201223758. On the other hand, at the interface between the antistatic layer and the substrate, in order to adhere the antistatic layer to the substrate, it is necessary to infiltrate the binder component of the composition of the antistatic layer into the substrate, and in the substrate and At the interface of the antistatic layer, the binder component that penetrates into the substrate hardens and bonds with the binder component that forms the antistatic layer. In the case where the antistatic agent is a quaternary ammonium salt, it is known to use a quaternary ammonium salt having a relatively large molecular weight in order to improve durability or antistatic property. However, if the molecular weight of the quaternary ammonium salt is large, the binder component of the composition of the antistatic layer is difficult to penetrate into the substrate, and therefore, in order to obtain the adhesion between the antistatic layer and the substrate, it is necessary to use a large amount of the permeable solvent. Or use a binder of a lower molecular weight that can penetrate into the substrate. However, in this case, there is a problem that the adhesion between the interface of the antistatic layer and the HC layer is deteriorated. Further, it has been known that a barrier resin can be prevented by using a permeable solvent, and the appearance can be improved. However, when a permeable solvent is used, a new interface may be formed in the substrate. In addition to the above-described deterioration in adhesion, there is also a problem that interference fringes are generated and the appearance is deteriorated. [Prior Art Document] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-086660 (Summary of the Invention) The present invention has been made to solve the above problems, and the first OBJECTIVE OF THE INVENTION The present invention provides a curable resin composition for an antistatic layer which is excellent in optical properties and appearance, has excellent antistatic properties, and is adjacent to the HC layer and the TAC group. An antistatic layer excellent in the adhesion of the material. Further, a second object of the present invention is to provide an optical film which has an antistatic layer formed using the above composition and which is excellent in dust adhesion prevention property. Further, a third object of the present invention is to provide a polarizing plate which has the above optical film. Further, a fourth object of the present invention is to provide a display panel 'which has the above optical film. (Means for Solving the Problem) The inventors of the present invention conducted an effort to study, and as a result, have found that 'the binder component contained in the composition of the antistatic layer is used for the crosslinking density of the surface and the adjacent HC layer. And obtaining a binder component having a relatively small molecular weight of 900 or less, such as PETA or DPHA, which can be substantially infiltrated into the TAC substrate, or from the interface of the TAC substrate and the HC layer according to the binder component. The surface penetrates to the depth of the back side of the TAC substrate without the HC layer, and as a result, the binder component is biased in the substrate, and the binder component contained in the antistatic layer on the substrate is reduced, and the HC layer and the anti- The interface at the interface of the electrostatic layer is insufficient in the reaction. Therefore, the adhesion between the antistatic layer and the HC layer may not be sufficiently obtained. Further, it is also known that if the portion penetrated into the inside of the TAC substrate does not penetrate in a gradient form, the infiltrated material is all the same. 100124540 8 201223758 The ground penetrates to the depth of the (4) of the TAC base (4), and a point is formed in the substrate. A new interface is created in the substrate through the layer, and interference fringes and the like are generated to cause deterioration in appearance. Therefore, the inventors of the present invention found that the anti-static _ _, the genus is transfused to the TAC or the Wit to the TAC substrate by the (4) shot.
'•合劑成分之特定分子量的丙稀酸胺基甲酸醋、及滲透至TAC 基材之黏合龍州官能單體)設定為蚊之關,可形成 具有充分之抗靜電性,並且與HC層及tac基材之密接性 優異的k靜電層’作為光學馳整體,可獲得優異之灰塵附 著防止性能,從而完成本發明。 即,解決上述問題之本發明之抗靜電層用硬化性樹脂組成 物之特徵在於包含: (A)抗靜電劑, ⑻於1分子中具有2個以上之光硬化性基、且分子量為 900以下之多官能單體,以及 ()於1刀子中具有6個以上之丙稀酿基及/或甲基丙稀酿 基、且重量平均分子量為1000〜11000之丙烯酸胺基甲酸 酯, 該(A)相對於該(a)、(B)及(C)之總量之比例為1〜30質量 %,且 該(C)相對於該(B)及(C)之總量之比例為質量0/〇。 藉由將抗靜電劑(A)之比例設為上述範圍,使用上述組成 100124540 〇 201223758 物所形成之膜厚為丨〜5从以之抗靜電層具有充分的抗靜電 性,即便於在其上積層HC層而形成光學薄膜之情形時,亦 確保充分之灰塵附著防止性。 先則,抗靜電層之膜厚係因光學性能及透明性,而按 〜1 左右之薄膜設置,但若為此種薄膜層,為了賦予抗 靜電性,必需將層内之組成物之大部分設為抗靜電性材料, 因此無法添加足夠量之具有為了顯現與基材或其上方之層 之密接性所必需的反應性基之某些黏合劑。因此,於本案 中,使膜厚變厚至某種程度,並確保抗靜電層與鄰接層之密 接性’故可充分地使抗靜電性材料以外之具有反應性基之黏 合劑成分的添加變得可能。 又,藉由將丙烯酸胺基曱酸酯(c)相對於多官能單體(B)與 丙烯酸胺基曱酸酯(C)之總量之比例設為上述範圍,即便於 TAC基材上自taC基材側起依序形成抗靜電層及hc片, 亦因丙烯酸胺基曱賴(C)不滲透至TA c基材内或二 官能單體⑻更不㈣透至TAC基材内,故藉由丙烯酸胺^ 甲酸酯(C)而可獲得抗靜電層與HC層之充分之密接性,土 由於多官能單體(B)滲透至TAC基材内,因此亦可獲得抗^ 電層與TAC基材之密接性。 於本發明之抗靜電層用硬化性樹脂組成物中,就抑制抗靜 電劑朝TAC基材之渗透且塗佈性優異而言,較佳為抗靜電’ 劑(A)係重量平均分子量為1000〜50〇〇〇之四級銨鹽。 100124540 10 201223758 於本發明之抗靜電層用硬化性樹脂組成物中,就提高多官 月έ早體(B)及丙稀酸胺基甲知 ®曰(C)之作用之觀點而言,較佳 為進一步包含(D)滲透性溶劑及(E)非滲透性溶劑。 於本發明之抗靜電層用硬化性樹脂組成物中,亦可將上述 '抗靜電層用硬化性樹脂組成物之臈厚為1〜5//111之硬化物 : 的表面電阻值設為未滿1Χ1012Ω/□。藉由將抗靜電層用硬化 性樹脂組成物之硬化物(亦即抗靜電層)設為此種抗靜電性 能,於抗靜電層上積層5〜15 之硬塗層而成之光學薄膜 a 可發揮灰塵附著防止性。 再者,表面電阻值係指如下之值:於TAC基材上形成上 述抗靜電層用硬化性樹脂組成物之膜厚為1〜5#m之硬化 物(抗靜電層),然後利用高電阻率計(三菱化學Analytech(股) 製造,商品名:Hiresta IP MCP-HT260),於施加電壓1000 v、 狐度25 C、濕度40%調濕24小時之條件下,對該硬化物表 面進行測定所得之值。 本發明之光學薄膜係於三醋酸纖維素基材之一面側,自該 ’三醋酸纖維素基材側起鄰接設置膜厚為1〜5/zm之抗靜電 層及硬塗層而成者,其特徵在於,該抗靜電層包含上述抗靜 電層用硬化性樹脂組成物之硬化物,上述多官能單體(B)係 參透至5亥二醋酸纖維素基材之抗靜電層側之养面附近的區 域並硬化。 ° 於TAC基;,, 何之一面側,自TAC基材側起設置有膜厚為i 100124540 11 201223758 〜5/zm之抗靜電層及HC層的本發明之光學薄膜,因抗靜 電層包含上述抗靜電層用硬化性樹脂組成物之硬化物,而具 有充分之灰塵附著防止性。進而,HC層與抗靜電層之密接 性變得優異。又,藉由多官能單體(B)滲透至TAC基材之抗'• The specific molecular weight of the mixture component of the amino acid uric acid acetate, and the adhesion of the Longzhou functional monomer penetrated to the TAC substrate) is set to the mosquito level, which can form sufficient antistatic properties, and with the HC layer and The k-electrostatic layer of the tac substrate excellent in adhesion can be obtained as an optical unit, and excellent dust adhesion prevention performance can be obtained, thereby completing the present invention. In other words, the curable resin composition for an antistatic layer of the present invention which solves the above-mentioned problems is characterized by comprising: (A) an antistatic agent, (8) having two or more photocurable groups in one molecule, and having a molecular weight of 900 or less. a polyfunctional monomer, and () an urethane urethane having 6 or more propylene and/or methyl propylene groups in a knives and having a weight average molecular weight of 1000 to 11,000, A) The ratio of the total amount of the (a), (B), and (C) is 1 to 30% by mass, and the ratio of the (C) to the total amount of the (B) and (C) is the mass 0/〇. By setting the ratio of the antistatic agent (A) to the above range, the film thickness of the above composition 100124540 〇201223758 is 丨~5, from which the antistatic layer has sufficient antistatic property, even on it. When the HC layer is laminated to form an optical film, sufficient dust adhesion prevention property is also ensured. First, the film thickness of the antistatic layer is set by a film of about 〜1 due to optical properties and transparency, but in the case of such a film layer, in order to impart antistatic properties, it is necessary to make most of the composition in the layer. Since it is an antistatic material, it is not possible to add a sufficient amount of some adhesive agent having a reactive group necessary for exhibiting adhesion to a substrate or a layer above it. Therefore, in the present invention, the film thickness is increased to a certain extent, and the adhesion between the antistatic layer and the adjacent layer is ensured, so that the addition of the binder component having a reactive group other than the antistatic material can be sufficiently changed. It is possible. Further, by setting the ratio of the amino phthalic acid acrylate (c) to the total amount of the polyfunctional monomer (B) and the amino phthalic acid acrylate (C) to the above range, even on the TAC substrate The antistatic layer and the hc sheet are sequentially formed on the side of the taC substrate, and also because the acrylamide-based (C) does not penetrate into the TA c substrate or the difunctional monomer (8) does not (4) penetrate into the TAC substrate. By the acrylamide (C), sufficient adhesion between the antistatic layer and the HC layer can be obtained, and since the polyfunctional monomer (B) penetrates into the TAC substrate, an anti-electrostatic layer can also be obtained. Adhesion to the TAC substrate. In the curable resin composition for an antistatic layer of the present invention, it is preferred that the antistatic agent (A) has a weight average molecular weight of 1000 in terms of suppressing penetration of the antistatic agent into the TAC substrate and excellent coatability. Quaternary ammonium salt of ~50〇〇〇. 100124540 10 201223758 In the curable resin composition for an antistatic layer of the present invention, in terms of enhancing the action of the poly (A) sinensis (B) and the succinic acid amide (C) It is further preferred to further comprise (D) a osmotic solvent and (E) a non-permeable solvent. In the curable resin composition for an antistatic layer of the present invention, the surface resistivity of the hardened material having a thickness of 1 to 5//111 of the curable resin composition for an antistatic layer may be set to be Full 1Χ1012Ω/□. An optical film a obtained by laminating a hard coat layer of 5 to 15 on an antistatic layer by using a cured product (that is, an antistatic layer) of a curable resin composition for an antistatic layer as such an antistatic property Play against dust adhesion. In addition, the surface resistance value is a value obtained by forming a cured product (antistatic layer) having a thickness of 1 to 5 #m on the TAC substrate and forming a curable resin composition for an antistatic layer, and then using a high resistance. The meter (manufactured by Mitsubishi Chemical Analytech Co., Ltd., trade name: Hiresta IP MCP-HT260), the surface of the cured product was measured under the conditions of a voltage of 1000 v, a degree of foxing of 25 C, and a humidity of 40% for 24 hours. The value obtained. The optical film of the present invention is formed on one side of a cellulose triacetate substrate, and an antistatic layer and a hard coat layer having a film thickness of 1 to 5/zm are provided adjacent to the 'triacetate cellulose substrate side. The antistatic layer includes a cured product of the curable resin composition for an antistatic layer, and the polyfunctional monomer (B) is permeable to the antistatic layer side of the 5 cc cellulose diacetate substrate. The nearby area is hardened. An optical film of the present invention having an antistatic layer and an HC layer having a film thickness of i 100124540 11 201223758 〜5/zm from the side of the TAC substrate, on the side of the TAC; The cured product of the curable resin composition for an antistatic layer has sufficient dust adhesion prevention property. Further, the adhesion between the HC layer and the antistatic layer is excellent. Moreover, the resistance of the polyfunctional monomer (B) to the TAC substrate
靜電層側之界面側的區域並硬化’亦可獲得抗靜電層與TAC 基材之密接性❶作為光學薄膜整體,可獲得優異之灰塵附著 防止性能。 於本發明之光學薄膜之較佳之態樣中,亦可將上述硬塗 層、上述抗靜電層及上述三醋酸纖維素基材間之方格密接性 试驗的谘接率定為9〇〜1〇〇%,且將於溫度3〇°c、濕度40% 下,以每小時500 w/m2之光量照射紫外線192小時後的該 密接率定為80〜1〇〇〇/。。 再者所明方格也、接性5式驗(Cr〇ss cut Adhesion Test)之密 接率,係扣針對於溫度25°C、濕度40%下調濕24小時後的 光學溥膜,依據JIS K5400之方格試驗(Cr〇ss Cut Test)方 法,於硬塗層面上以i mm間隔橫豎分別切入u條縫隙來 製作1〇〇個方格,將Nichiban(股)製造之Cell〇tape(註冊商 標)貼附於方格上後,迅速將其於9〇。之方向拉伸而使其剝 離,並根據下述基準所算出之未剝落而殘留之方格的比例。 捃接率(%)—(未剝落之方格數/合計方格數1〇〇)χ1〇〇 於本發明之光學薄膜之較佳之態樣中,亦可作成於硬塗層 之與抗靜電層相反側之面上進—步設置低折射率層的構成。 100124540 12 201223758 於本發明之光學薄膜之較佳之態樣中,亦可將硬塗層作為 含有電離放射線硬化性樹脂之組成物的硬化物。 本發明之偏光板之特徵在於’於光學薄膜之三醋酸纖維素 基材侧設置有偏光片。 本發明之顯示面板之特徵在於,於光學薄膜之三醋酸纖維 素基材側配置有顯示器。 (發明效果) 藉由使以上述特定之比例含有抗靜電劑、多官能單體 (B)及丙烯酸胺基曱酸酯(C)之組成物硬化而形成為膜厚 5 /zm的抗靜電層,即便為於TAC基材上自TAC基材側起 具有抗靜電層及HC層之層構成,亦可獲得充分之灰塵附著 防止性,且可獲得抗靜電層與TAC基材及HC層之密接性 良好的光學薄膜。又,以上述特定之比例含有該抗靜電劑 (A)、多官能單體(B)及丙烯酸胺基甲酸酯(c)之組成物,係 可較佳地用於形成具有此種特性之光學薄膜中所使用的抗 靜電層。 【實施方式】 以下,對本發明之抗靜電層用硬化性樹脂組成物(以下, 有時僅稱為「抗靜㈣賴成物」)、光學該錢使用該 光學薄膜之偏光板及顯示面板加以說明。 於本發明中’(曱基)丙烯醯基表示丙烯醯基及/或甲基丙烯 醯基,(曱基)丙烯酸酯表示丙烯酸酯及/或甲基丙烯酸酯。 100124540 13 201223758 本發明之光不僅包括可見光以及紫外線及χ射線等非可 見區域之波長之電磁波’亦包括如電子束之粒子束及統稱為 電磁波與粒子束之放射線或電離放射線。 於本發明十,所謂「硬塗層」,係指於JIS Κ56〇〇_5部999) 中規定之錯筆硬度試驗(4.9Ν負荷)中顯示「Η」以上之硬度 者。 又 再者,關於薄膜及月材,於JIS_K69〇〇中之定義,片材係 指較薄且通料厚度比長度及寬度小之平坦製品,薄膜係指 厚度與長度及寬度相比極小、且最A厚度被任意限^之較薄 之平坦製品,其通常以捲之㈣供給。因此,片材中厚度特 别薄者可稱為薄膜,但由於片材與薄膜之邊界並不清楚,難 2明確地加以區分,因此於本發明中’包括厚度較厚者及較 薄者兩者之含義,均定義為「薄膜」。 於本發明中,樹脂係除了單體或寡聚物以外,亦包含聚合 物之概念,其係指硬化後成為抗靜電層或Hc層等其他功能 層之基質的成分。 、 於本發明中,所謂分子量,於具有分子量分佈之情形時, 係指作為於THF(Tetrahydrofuran,四氫呋喃)溶劑中藉由凝 勝 /夕透層析法(GPC,Gel Permeation Chromatograph)所測定 之聚笨乙烯換算值的重量平均分子量,於不具有分子量分佈 之情形時,係指化合物本身之分子量。 於本暫明中’所δ胃微粒子之平均粒徑,於組成物中之微粒 100124540 201223758 之情形時,係指使用日機裝(股)製造之Microtrac粒度分析 計所測定的值,於硬化膜中之微粒子之情形時’係指藉由穿 透式電子顯微鏡(TEM,Transmission electron microscopy)照 片所觀察之硬化膜之剖面的10個粒子之平均值。 於本發明中,所謂滲透,係指使TAC基材溶解或膨潤。 於本發明中,所謂固形份,係指去除溶劑之成分。 (抗靜電層用硬化性樹脂組成物) 本發明之抗靜電層用硬化性樹脂組成物之特徵在於包含: (A) 抗靜電劑, (B) 於1分子中具有2個以上之光硬化性基、且分子量為 900以下之多官能單體,以及 (C) 於1分子中具有6個以上之(曱基)丙稀醜基、且重量平 均分子量為1000〜11000之丙烯酸胺基甲酸g旨, 該(A)相對於該(A)、(B)及(C)之總量之比例為1〜3〇質量 %,且 該(C)相對於該(B)及(C)之總量之比例為1〜4〇質量%。 藉由將抗靜電劑(A)之比例設為上述範圍,抗靜電層可賦 予抗靜電性’且較於在膜厚為之抗靜電層上形 成HC層之情形時’亦確保充分之灰塵附著防止性 又,藉由將丙烯酸胺基甲酸酯(C)相對於多官能單體(b)及 丙烯酸胺基甲酸酯(C)之總量之比例設為上述矿圍 #於 TAC基材上自TAC基材側起依序形成抗靜電:、二於 100124540 15 201223758 則因丙_絲甲_(咐會渗透至TAC基材内,或相較 於多官能單體⑼更不易滲透至TAC基材内,故於抗靜電層 與HC層之界面上亦存在兩烯酸胺基曱酸醋⑹,丙稀酸胺 基曱酸s旨(C)所具有之(甲基)⑽醯基與hc層中之反應性 基硬化結合,藉此可獲得抗靜電層與hc層之充分之密接 性。 - 進而,多官能單體(B)適度滲透至TAC基材内(並非一樣 地渗透至相同深度’而是以梯度形式滲透),TAc基材中所 存在之已滲透之多官能單體(B)的反應性基(光硬化性基)係 與抗靜電層+所存在之彡官能單體(B)之反應性基及丙稀酸 胺基甲酸酯(c)之反應性基((曱基)丙烯醯基)硬化結合,因此 亦可獲得抗靜電層與TAC基材之密接性。 以下’針對作為本發明之抗靜電層用組成物之必需成分的 上述抗靜電劑(A)、多官能單體(B)及丙烯酸胺基曱酸酯 (C)、以及可視需要而適當含有之其他成分加以說明。 (A :抗靜電劑) 抗靜電劑(A)係對作為抗靜電層用組成物之硬化膜之抗靜 電層或光學薄膜賦予導電性來防止帶電,並具有賦予防止灰 塵或塵土附著,或因帶電而產生步驟内不良之性質(亦即抗 靜電性)之作用的成分。 作為抗靜電劑(A),可使用先前公知之抗靜電劑,並無特 別限定。 100124540 16 201223758 例如可列舉專利文獻1中所記載之四級銨鹽等陽離子性 化合物、磺酸鹽基等陰離子性化合物、胺基酸系等之兩性化 合物、胺基醇系等之非離子性化合物、有機金屬化合物及金 屬螯合物化合物、以及將該等化合物高分子量化而成之化合 物、聚合性化合物、平均1次粒徑為1〜l〇〇nm之氧化銦錫 (ITO)等導電性超微粒子、以及脂肪族共軛系之聚乙炔等高 分子型導電性組成物。 於本發明之抗靜電層用硬化性樹脂組成物中,就抑制抗靜 電劑(A)朝TAC基材之滲透、且塗佈性優異而言,較佳為抗 靜電劑(A)係重量平均分子量為1〇〇〇〜50000之四級銨鹽。 若超過上述上限’則組成物之塗佈性惡化,若低於上述下 限’則抗靜電劑容易滲出至抗靜電層之與HC層之界面上, 而有抗靜電層與HC層之密接性惡化的可能性。 先前’抗靜電層之膜厚係因光學性能及透明性,以〇1〜1 //m左右之薄膜設置,但若為此種薄膜層,則為了賦予抗靜 電性’必需將層内之組成物之大部分設為抗靜電性材料,因 雜以添加足夠量之具有為了顯現與基材或其上方之層之 密接性所必需的反應性基之樹脂組成物。因此,於本發明 中字膜厚叹為1〜5μηι,較先前更厚,並確保抗靜電層與 鄰^層之密接性,因此可充分地使抗靜電性材料以外之具有 反…、性基的樹脂組成物 理雄的县姘、失丄 文付了此。因Μ厚增加,故較 、口之抗靜電劑選擇透明性較高之材料。於該方 100124540 17 201223758 面’較佳為透明性高於無機材料之有機材料,進而,有機材 料之中’著色極少之四級銨鹽最合適。當使用四級敍鹽時, 於透明性基材為TAC之情形時,可使光學薄膜整體之全光 線透過率變成90%以上,就此點而言亦較佳。又,亦可使霧 值變成0.5%以下。全光線透過率可依據jIS Κ7361(1997), 藉由村上色彩技術研究所製造之ΗΜ150等來測定,霧值可 依據JIS Κ7136(2000),藉由村上色彩技術研究所製造之 ΗΜ150等來測定。 進而,就藉由HC層與黏合劑成分之交聯反應來提高抗靜 電層與HC層之密接性方面而言’較佳為該四級銨鹽具有光 硬化性基。光硬化性基較佳為聚合性不飽和基,更佳為電離 放射線硬化性不飽和基。作為其具體例,可列舉(曱基)丙烯 醯基、(甲基)丙烯醯氧基、乙烯基及烯丙基等具有乙烯性不 飽和鍵之基以及環氧基等。 作為此種重量平均分子量為1〇〇〇〜50000之四級錄鹽之 市售品’例如可列舉三菱化學(股)製造之商品名Η6ΐ〇〇,以 及新中村化學工業(股)製造之商品名Uniresin AS-10/Μ、The region on the interface side of the electrostatic layer side is hardened. Also, the adhesion between the antistatic layer and the TAC substrate can be obtained as the entire optical film, and excellent dust adhesion preventing performance can be obtained. In a preferred aspect of the optical film of the present invention, the adhesion ratio of the hard coat layer, the antistatic layer, and the triacetylcellulose substrate may be set to 9 〇. 1密%, and the adhesion rate after ultraviolet light irradiation for 192 hours at a temperature of 500 w/m 2 at a temperature of 3 ° C and a humidity of 40% was set to 80 to 1 〇〇〇 /. . Furthermore, the adhesion rate of the Cr方ss cut Adhesion Test is the same as that of the Cr〇ss cut Adhesion Test. The optical film is adjusted for 24 hours at a temperature of 25 ° C and a humidity of 40%, according to JIS K5400. The Cr〇ss Cut Test method, which cuts into the u-slots at intervals of 1 mm on the surface of the hard-coated layer to make 1 square, and manufactures Cell〇tape (registered by Nichiban). After the trademark is attached to the square, it is quickly placed at 9 inches. The ratio of the squares which were stretched and peeled off in the direction and which were not peeled off according to the following criteria. The splicing rate (%) - (the number of squares without flaking / the total number of squares 1 〇〇) χ 1 〇〇 in the preferred aspect of the optical film of the present invention, can also be used for hard coating and antistatic The configuration of the low refractive index layer is stepwise set on the opposite side of the layer. 100124540 12 201223758 In a preferred aspect of the optical film of the present invention, the hard coat layer may be used as a cured product containing a composition of an ionizing radiation curable resin. The polarizing plate of the present invention is characterized in that a polarizer is provided on the side of the cellulose triacetate substrate of the optical film. The display panel of the present invention is characterized in that a display is disposed on the cellulose acetate substrate side of the optical film. (Effect of the Invention) An antistatic layer having a film thickness of 5 /zm is formed by curing a composition containing an antistatic agent, a polyfunctional monomer (B), and an amino phthalic acid acrylate (C) in the above specific ratio. Even if it is a layer structure having an antistatic layer and an HC layer from the TAC substrate side on the TAC substrate, sufficient dust adhesion prevention property can be obtained, and an antistatic layer can be obtained in close contact with the TAC substrate and the HC layer. A good optical film. Further, the composition containing the antistatic agent (A), the polyfunctional monomer (B) and the urethane acrylate (c) in the above specific ratio can be preferably used for forming such a characteristic. An antistatic layer used in optical films. [Embodiment] Hereinafter, the curable resin composition for an antistatic layer of the present invention (hereinafter, simply referred to as "anti-static (four)-based material)", and the polarizing plate and display panel using the optical film for optical use are used. Description. In the present invention, the '(fluorenyl) acrylonitrile group means an acryl fluorenyl group and/or a methacryl fluorenyl group, and the (mercapto) acrylate means an acrylate and/or a methacrylate. 100124540 13 201223758 The light of the present invention includes not only visible light but also electromagnetic waves of wavelengths of non-visible regions such as ultraviolet rays and xenon rays. Also, it includes particle beams such as electron beams and radiation or ionizing radiation collectively referred to as electromagnetic waves and particle beams. In the tenth aspect of the present invention, the term "hard-coating layer" means a hardness of "Η" or more in the erroneous pen hardness test (4.9 Ν load) specified in JIS Κ 56〇〇 _5 999). Further, regarding the definition of the film and the moon material, in the definition of JIS_K69, the sheet means a flat product which is thin and has a thickness smaller than the length and the width, and the film means that the thickness is extremely small compared with the length and the width, and The flattened article having the thinnest A thickness is arbitrarily limited, which is usually supplied in the form of a roll (four). Therefore, the thickness of the sheet is particularly thin, which may be referred to as a film. However, since the boundary between the sheet and the film is not clear, it is difficult to distinguish clearly. Therefore, in the present invention, both the thicker and the thinner are included. The meaning is defined as "film". In the present invention, the resin includes a polymer in addition to a monomer or an oligomer, and means a component which becomes a matrix of an antistatic layer or another functional layer such as an Hc layer after curing. In the present invention, the molecular weight, when it has a molecular weight distribution, refers to a polycondensation as determined by GPC (Gel Permeation Chromatograph) in a solvent of THF (Tetrahydrofuran). The weight average molecular weight of the stupid ethylene equivalent value, when it does not have a molecular weight distribution, means the molecular weight of the compound itself. In the present case, the average particle size of the δ gastric microparticles in the case of the particles 100124540 201223758 in the composition refers to the value measured by the Microtrac particle size analyzer manufactured by Nikkei Co., Ltd. in the cured film. In the case of the microparticles in the middle, it means the average of 10 particles of the cross section of the cured film observed by a transmission electron microscopy (TEM) photograph. In the present invention, the term "permeation" means that the TAC substrate is dissolved or swollen. In the present invention, the solid portion means a component from which a solvent is removed. (The curable resin composition for an antistatic layer) The curable resin composition for an antistatic layer of the present invention is characterized by comprising: (A) an antistatic agent, and (B) having two or more photocuring properties in one molecule. a polyfunctional monomer having a molecular weight of 900 or less, and (C) an amino amide having a weight average molecular weight of 1,000 to 11,000 and having a weight average molecular weight of 1,000 to 11,000 The ratio of the (A) to the total amount of the (A), (B), and (C) is 1 to 3 % by mass, and the total amount of the (C) relative to the (B) and (C) The ratio is 1 to 4% by mass. By setting the ratio of the antistatic agent (A) to the above range, the antistatic layer can impart antistatic property and also ensure sufficient dust adhesion when the HC layer is formed on the antistatic layer having a film thickness. Preventiveness, by setting the ratio of the urethane urethane (C) to the total amount of the polyfunctional monomer (b) and the urethane acrylate (C) as the above-mentioned TBI substrate Antistatic is formed sequentially from the side of the TAC substrate: 2, 100124540 15 201223758, due to the infiltration of the crucible into the TAC substrate, or the penetration of the TAC to the TAC compared to the polyfunctional monomer (9). In the substrate, the octadecanoic acid vinegar (6) is also present at the interface between the antistatic layer and the HC layer, and the (meth)(10) fluorenyl group of (C) The reactive group in the hc layer is hardened, whereby sufficient adhesion between the antistatic layer and the hc layer can be obtained. Further, the polyfunctional monomer (B) is moderately infiltrated into the TAC substrate (not the same as the same. The depth 'is penetrated in a gradient form), the reactive group of the infiltrated polyfunctional monomer (B) present in the TAc substrate (photohardening) The base is bonded to the antistatic layer + the reactive group of the oxime functional monomer (B) present and the reactive group of the urethane urethane (c) ((fluorenyl) propylene sulfhydryl group), Therefore, the adhesion between the antistatic layer and the TAC substrate can be obtained. The following "antistatic agent (A), polyfunctional monomer (B), and acrylamide as the essential components of the composition for an antistatic layer of the present invention. The phthalic acid ester (C) and other components which are appropriately contained as needed are described. (A: antistatic agent) The antistatic agent (A) is an antistatic layer of a cured film which is a composition for an antistatic layer or The optical film imparts conductivity to prevent electrification, and has a function of imparting a function of preventing dust or dust from adhering or causing a defect in the step (that is, antistatic property) due to charging. As the antistatic agent (A), it can be used. The antistatic agent is not particularly limited. For example, a cationic compound such as a quaternary ammonium salt described in Patent Document 1, an anionic compound such as a sulfonate group, or an amino acid system may be mentioned. Compound, amino alcohol a nonionic compound, an organometallic compound, a metal chelate compound, a compound obtained by polymerizing the compound, a polymerizable compound, and an indium tin oxide having an average primary particle diameter of 1 to 1 nm. A conductive polymer composition such as a conductive ultrafine particle such as (ITO) or a polyacetylene of an aliphatic conjugated type. The antistatic agent (A) is inhibited in the curable resin composition for an antistatic layer of the present invention. It is preferable that the antistatic agent (A) is a quaternary ammonium salt having a weight average molecular weight of from 1 Å to 50,000 when it penetrates into the TAC substrate and is excellent in coatability. The coating property is deteriorated, and if it is less than the above lower limit, the antistatic agent easily bleeds out to the interface between the antistatic layer and the HC layer, and the adhesion between the antistatic layer and the HC layer may be deteriorated. In the past, the film thickness of the antistatic layer was set by a film of about 1 to 1 //m due to optical properties and transparency, but in the case of such a film layer, it is necessary to impart an antistatic property. Most of the materials are made of an antistatic material, and a resin composition having a sufficient amount of a reactive group necessary for exhibiting adhesion to a substrate or a layer above it is mixed. Therefore, in the present invention, the thickness of the word film is 1 to 5 μm, which is thicker than before, and ensures the adhesion between the antistatic layer and the adjacent layer, so that the antistatic material can be sufficiently made to have an anti-static material. The resin constituting the physics of the county, the loss of the text paid this. Due to the increase in thickness, the antistatic agent of the mouth is selected to have a higher transparency. In the case of the side 100124540 17 201223758, the surface is preferably an organic material having higher transparency than the inorganic material, and further, the quaternary ammonium salt having a very small coloration among the organic materials is most suitable. When the four-stage salt is used, when the transparent substrate is TAC, the total light transmittance of the entire optical film can be made 90% or more, which is also preferable. Further, the haze value can be made 0.5% or less. The total light transmittance can be measured by 村150, manufactured by Murakami Color Research Institute, according to JIS Κ 7361 (1997), and the haze value can be measured by 村150 manufactured by Murakami Color Technology Research Institute according to JIS Κ7136 (2000). Further, in terms of improving the adhesion between the antistatic layer and the HC layer by the crosslinking reaction between the HC layer and the binder component, it is preferred that the quaternary ammonium salt has a photocurable group. The photocurable group is preferably a polymerizable unsaturated group, more preferably an ionizing radiation curable unsaturated group. Specific examples thereof include a group having an ethylenically unsaturated bond such as a (fluorenyl) acryl fluorenyl group, a (meth) acryloxy group, a vinyl group, and an allyl group, and an epoxy group. As a commercial product of the fourth-order salt having a weight average molecular weight of from 1 to 50,000, for example, the product name of the product manufactured by Mitsubishi Chemical Corporation, and the product manufactured by Shin-Nakamura Chemical Industry Co., Ltd. Uniresin AS-10/Μ,
Uniresin AS-12/M、Uniresin AS-15/M 及 Uniresin ASH26 等。 於抗靜電層用組成物中,相對於抗靜電劑(A)與後述之多 官能單體(B)及丙烯酸胺基曱酸酯(Q之總量,含有丨〜%質 量%之抗靜電劑(A)。 若抗靜電劑(A)之比例相對於上述總量(a + b + c)未滿i 100124540 18 201223758 質量%’則無法獲得充分之抗靜電性能。又,若抗靜電劑(A) 之比例相對於上述總量(A + B + C)超過30質量%,則抗靜電 層用組成物中之多官能單體(B)及丙烯酸胺基曱酸酯(C)之 比例減少,無法獲得抗靜電層與鄰接於該層之TAC基材或 HC層之充分的密接性。 抗靜電劑(A)之比例相對於上述總量(A + B + C)為1〜30 質量% ’但較佳為5〜20質量%。 (B :多官能單體) 多官能單體(B)係硬化後成為抗靜電層基質之黏合劑成分 之一’且為1分子中具有2個以上之光硬化性基之分子量為 900以下的單體。其係分子量較小且藉由為多官能而有助於 提高抗靜電層内或與鄰接於抗靜電層之HC層之交聯密 度,俾提昇密接性的成分。又,多官能單體藉由其至少一部 分滲透至TAC基材内並硬化’而亦有助於提昇抗靜電層與 TAC基材之密接性。 若多官能單體(B)之分子量超過900,則朝TAC基材之渗 透性下降’而有無法獲得抗靜電層與TAC基材之充分密接 性的可能性。 多官能單體(B)之分子量只要為900以下即可,但就使多 官能單體(B)適度地朝TAC基材滲透,並使抗靜電層與HC 層之密接性及抗靜電性(表面電阻值)高度地並存之觀點而 言’多官能單體(B)之分子量較佳為230以上,更佳為29〇 100124540 19 201223758 以上。若分子量小於230,則多官能單體⑻朝TAC基材之 滲透並不適度,會有全部滲透至一樣之深度而產生新的界面 之情況,且有於其界面所反射之光與在抗靜電層與層之 界面所反射之光、或於HC層表面所反射之光之間產生光干 擾’並產生干擾條紋而導致外觀惡化之可能性。 作為多官能單體(B),可使用一種或兩種以上。 多官能單體(B)之光硬化性基係為了形成交聯結構而為2 個以上,較佳為具有3個以上,更佳為具有5個以上。若為 3個以上’則容易獲得抗靜電層與η c層及Ta c基材之充分 岔接性。作為光硬化性基,可列舉與抗靜電劑中所列舉之光 硬化性基相同者。 作為多官能單體(B) ’例如可列舉季戊四醇三(甲基)丙烯酸 酯、二季戊四醇六(曱基)丙浠酸酯、二季戊四醇五(曱基)丙 烯酸酯、三羥f基丙烷三(曱基)丙烯酸酯及三羥曱基丙烷六 (甲基)丙烯酸酯以及該等之改質體。 再者,作為改質體’可列舉EO(Ethylene oxide,環氧乙烷) 改質體、PO(Propylene oxide,環氧丙烧)改質體、 CL(Caprolactone,己内酯)改質體及異三聚氰酸改質體等。 於上述多官能單體中’就硬化反應性之觀點而言,與甲基 丙烯醯相比,光硬化性基為丙烯醯基更佳。 作為多官能單體(B),尤其可較佳地使用二季戊四醇五丙 烯酸 S旨(DPPA ’ Di-Pentaerythritol pentaacrylate)、二季戊四 100124540 20 201223758 醇六丙烯酸酯(DPHA)。 於本發明之抗靜電層用組成物中,夕^ 夕S能單體(B)滿万μ 述抗靜電劑之含有比例,且相對於多6α 、夕&月b單體(Β)與後述之 丙烯酸胺基曱酸酯(C)之總量為60〜9 ^ ^ 9質ι%。若未 質量。/。’則無法獲得抗靜電層與Hc層及Μ基材之充 密接性。又,若超過99質量%,則Μ酸胺基甲酸^ 比例較少’無法獲得抗靜電層與HC屛 ’之充分之密接性。 (C :丙烯酸胺基曱酸酯) 丙烯酸胺基甲酸醋(C)係硬化後成為抗靜電層基質的黏合 劑成分之-,其i分子中具有6個以上之(甲基)丙烯酿基, 且重量平均分子量為1GGG〜1!_,較佳為麵〜1〇〇〇〇, 更佳為1000〜5000。 藉由重量平均分子量為1_〜U_,塗佈性良好,不滲 透至TAC基材内,或相較於多官能單體(B)更不易滲透至 TAC基材内,容易控制滲透,且確實地存在於整個抗靜電 層中。 於抗靜電劑(A)為四級銨鹽之情形時,作為該化合物之性 質,與親水性化合物之相容性較佳。因此,若抗靜電層中之 黏合劑為具有OH基之化合物(PETA、ΡΕΊΤΑ(季戊四醇四丙 烯酸酯)、DPPA(二季戊四醇五丙烯酸酯)等),則抗靜電劑過 度分散於整個層中’而無法獲得抗靜電性。已知DPHA於 結構式上不含ΟΗ基’但通常於合成上難以形成ι〇〇%之6 100124540 21 201223758 官能,因此實際上係與5官能或4官能部分之混合化合物, 由於通常所市售之_係殘留有〇H基之化合物,故而°益法 獲得較佳之抗靜電性。 可控制該分散性者_於疏水性樹脂之丙_胺基甲酸 醋(Q。藉纽丙_胺基甲_旨(〇存在於整個層中,时 靜電劑⑷為讀㈣“情科,可確實地㈣抗靜電 於層内過度分散、或在與HC之界面方向渗出之情況。容易 於HC界面方向渗出之原因在於,如上所述,因四級錄鹽喜 歡親水性,故隸靜電層積層並魏時,於其表面存在二 氣,與5亥空氣中之水分發生反應而滲出。 而且’藉由具有6個以上之(曱基)丙稀醯基,有助於提高 抗靜電層内或與鄰接於抗靜電層之Hc層中之反應性基的 交聯密度’喊昇抗靜電層與沉層之密接性。X,由於提 南滲透至TAC基材之抗靜t層之多官能單體⑻的反應性 基、與抗靜電層中所存在之丙烯酸胺基甲㈣⑹之(甲基) 丙烯醯基或多官能單體的反躲基之交聯密度,故而丙稀酸 胺基曱動旨(c)亦有助於提昇抗靜電層與TAC基材之密接 性。於自密接性方面來看之情形時’不添加丙烯酸胺基甲酸 酷(C)’只要除抗靜電賴寧外係具有大量反應性基之多官 月b單體(B)即可’但為了如上述般控制抗靜電劑(A)於抗靜電 層内之變動’若僅為多官能單體⑻,則難以控制,為了抗 靜電劑(A)不分散,f要疏水性且具有大量反應性基之丙稀 100124540 22 201223758 酸胺基曱酸酯(c)。 又’含有丙烯酸胺基甲酸酯(c)係對於抑制捲曲(想曲)之產 生亦有效。 若丙烯酸胺基甲酸酯(C)之重量平均分子量未滿1〇〇〇,則Uniresin AS-12/M, Uniresin AS-15/M and Uniresin ASH26, etc. In the antistatic layer composition, the antistatic agent (A) and the polyfunctional monomer (B) and the urethane phthalate (the total amount of Q) are contained in an antistatic agent (A). (A) If the ratio of the antistatic agent (A) is less than the above total amount (a + b + c) less than i 100124540 18 201223758 mass %', sufficient antistatic properties cannot be obtained. When the ratio of A) exceeds 30% by mass based on the total amount (A + B + C), the ratio of the polyfunctional monomer (B) and the amino phthalic acid acrylate (C) in the antistatic layer composition is reduced. The sufficient adhesion between the antistatic layer and the TAC substrate or the HC layer adjacent to the layer is not obtained. The ratio of the antistatic agent (A) is 1 to 30% by mass based on the total amount (A + B + C) 'But it is preferably 5 to 20% by mass. (B: polyfunctional monomer) The polyfunctional monomer (B) is one of the binder components of the antistatic layer matrix after curing, and has two or more in one molecule. a photocurable group having a molecular weight of 900 or less, which has a small molecular weight and is useful for enhancing the antistatic layer or adjacent to it by being multifunctional. The crosslink density of the HC layer of the electrostatic layer, the component that enhances the adhesion. Moreover, the polyfunctional monomer penetrates into the TAC substrate and hardens by at least a portion thereof, and also contributes to the improvement of the antistatic layer and the TAC substrate. When the molecular weight of the polyfunctional monomer (B) exceeds 900, the permeability to the TAC substrate is lowered, and there is a possibility that sufficient adhesion between the antistatic layer and the TAC substrate is not obtained. The molecular weight of (B) may be 900 or less, but the polyfunctional monomer (B) is appropriately infiltrated into the TAC substrate, and the adhesion between the antistatic layer and the HC layer and the antistatic property (surface resistance value) are obtained. From the viewpoint of high coexistence, the molecular weight of the polyfunctional monomer (B) is preferably 230 or more, more preferably 29 〇 100124540 19 201223758 or more. If the molecular weight is less than 230, the polyfunctional monomer (8) penetrates into the TAC substrate. And it is uncomfortable, and all will penetrate to the same depth to create a new interface, and the light reflected at the interface and the light reflected at the interface between the antistatic layer and the layer, or reflected on the surface of the HC layer Optical interference between the light' and interference The polyfunctional monomer (B) may be used alone or in combination of two or more kinds. The photocurable group of the polyfunctional monomer (B) is two or more in order to form a crosslinked structure. It is preferable to have three or more, and more preferably five or more. If it is three or more ', it is easy to obtain sufficient entanglement of the antistatic layer with the η c layer and the Ta c substrate. The same as the photocurable group exemplified in the antistatic agent. Examples of the polyfunctional monomer (B)' include pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(indenyl)propionate, and Pentaerythritol penta(indenyl) acrylate, trihydroxyf-propane tris(mercapto) acrylate, and trishydroxypropyl propane hexa(meth) acrylate and such modified bodies. Further, examples of the modified body include an EO (Ethylene oxide) modified body, a PO (Propylene oxide) modified body, and a CL (Caprolactone, caprolactone) modified body. Isocyanuric acid modified body, etc. From the viewpoint of the hardening reactivity in the above polyfunctional monomer, the photocurable group is more preferably an acrylonitrile group than the methacrylic acid. As the polyfunctional monomer (B), in particular, dipentaerythritol pentaacrylate (DPPA' Di-Pentaerythritol pentaacrylate), dipentaerythritol 100124540 20 201223758 alcohol hexaacrylate (DPHA) can be preferably used. In the composition for an antistatic layer of the present invention, the content of the antistatic agent is as described above, and the ratio of the antistatic agent is relatively high, and is relatively large relative to 6α, 夕 & The total amount of the urethane phthalic acid ester (C) described later is 60 to 9 ^ ^ 9 mass%. If not quality. /. The adhesion between the antistatic layer and the Hc layer and the tantalum substrate could not be obtained. When the amount is more than 99% by mass, the ratio of the amic acid amide is less. The sufficient adhesion between the antistatic layer and the HC ’ ' is not obtained. (C: Amino phthalic acid acrylate) Amino acid carboxylic acid vinegar (C) is a binder component which becomes a matrix of an antistatic layer after hardening, and has 6 or more (meth)acrylic groups in the i molecule. Further, the weight average molecular weight is 1 GGG 〜1!_, preferably from 1 to 1 Å, more preferably from 1,000 to 5,000. By controlling the weight average molecular weight to be 1_~U_, the coating property is good, does not penetrate into the TAC substrate, or is more difficult to penetrate into the TAC substrate than the polyfunctional monomer (B), and it is easy to control the permeation, and surely Present in the entire antistatic layer. When the antistatic agent (A) is a quaternary ammonium salt, the compatibility with the hydrophilic compound is preferred as the nature of the compound. Therefore, if the binder in the antistatic layer is a compound having an OH group (PETA, pentaerythritol tetraacrylate, DPPA (dipentaerythritol pentaacrylate), etc.), the antistatic agent is excessively dispersed throughout the layer' Antistatic properties are not available. DPHA is known to be structurally free of sulfhydryl groups but is generally difficult to form on the synthesis. 6 100124540 21 201223758 is a functional group, and thus is actually a mixed compound with a 5- or 4-functional moiety, as it is usually commercially available. The compound of the 〇H group remains, so that the antistatic property is better. The dispersible person can be controlled _ in the hydrophobic resin of propyl-amino formate vinegar (Q. 纽 丙 胺 胺 胺 _ 旨 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电 静电It is true that (4) antistatic is excessively dispersed in the layer or oozes in the direction of the interface with HC. The reason why it is easy to ooze out in the direction of the HC interface is that, as described above, since the quaternary salt is like hydrophilicity, it is electrostatic. When the layer is layered, there is two gas on the surface, which reacts with the moisture in the air of 5 hai, and oozes out. And by having more than 6 (fluorenyl) acrylonitrile groups, it helps to improve the antistatic layer. The adhesion density of the reactive group in the Hc layer adjacent to or adjacent to the antistatic layer 'sends the adhesion between the antistatic layer and the sink layer. X, due to the penetration of the antistatic layer of the TAC substrate The reactive group of the functional monomer (8) and the cross-linking density of the (meth)acryloyl group or the polyfunctional monomer of the amino acid group (4) (6) present in the antistatic layer, and thus the amino acid group of the acrylic acid曱 (c) also helps to improve the adhesion between the antistatic layer and the TAC substrate. When you look at it, 'do not add acrylamide (C)' as long as it has a large amount of reactive groups in addition to antistatic ruthenium (B), but in order to control antistatic as described above. The variation of the agent (A) in the antistatic layer is difficult to control if it is only the polyfunctional monomer (8), and the propylene which is hydrophobic and has a large amount of reactive groups for the antistatic agent (A) is not dispersed 100124540 22 201223758 Acid amide phthalate (c). Also containing urethane acrylate (c) is also effective for suppressing the generation of curl (what is desired). If the weight average molecular weight of urethane amide (C) Less than 1〇〇〇, then
存在如下之可能性:丙烯酸胺基曱酸酯(c)容易滲透至TAC 基材内’過度滲透至TAC基材内,導致抗靜電層與HC層 之界面之丙烯醯基減少,難以獲得抗靜電層與HC層之密接 性。 若丙烯酸胺基甲酸酯(C)之重量平均分子量超過iiooo, 則存在塗佈性惡化之可能性。 只要丙烯酸胺基甲酸酯(〇具有6個以上之(曱基)丙烯醯 基,則亦可含有電離放射線硬化性不飽和基等其他交聯反應 性之官能基。(甲基)丙烯醯基只要合計具有6個以上之丙烯 酿基與甲基丙烯醯基即可,可僅具有丙烯醯基,亦可僅具有 曱基丙烯醯基。 作為本發明之丙烯酸胺基曱酸酯(C),只要具有胺基曱酸 醋鍵(-NH-C0-0-)、具有6個以上之(甲基)丙烯醯基、且為 上述重量平均分子量,則並無特別限定。作為丙烯酸胺基甲 酸@旨((:),較佳為製成塗膜時光透過之透光性者,亦可根據 要求性能等而適當採用屬於藉由以紫外線或電子束所代表 之電離放射線而硬化之樹脂的電離放射線硬化性丙烯酸胺 基甲酸酯、其他公知之丙烯酸胺基曱酸酯等。 100124540 23 201223758 作為上述丙烯酸胺基曱酸酯之市售品,例如可列舉專利文 獻1中所記載之日本合成化學工業(股)製造之商品名 UV1700B、根上工業(股)製造之商品名UN3320HS、荒川化 學工業(股)製造之商品名BS577以及新中村化學工業(股)努There is a possibility that the amino phthalic acid acrylate (c) easily penetrates into the TAC substrate and is excessively infiltrated into the TAC substrate, resulting in a decrease in the propylene sulfhydryl group at the interface between the antistatic layer and the HC layer, and it is difficult to obtain antistatic properties. The adhesion between the layer and the HC layer. If the weight average molecular weight of the urethane acrylate (C) exceeds iiooo, there is a possibility that the coatability is deteriorated. As long as the urethane urethane (the fluorene has 6 or more (fluorenyl) acrylonitrile groups, it may contain other crosslinking reactive functional groups such as ionizing radiation curable unsaturated groups. (Methyl) acrylonitrile group As long as it has a total of six or more propylene ketone groups and a methacryl oxime group, it may have only an acryloyl group or may have only a fluorenyl fluorenyl group. As the acrylamide phthalate (C) of the present invention, It is not particularly limited as long as it has an amino phthalic acid vinegar bond (-NH-C0-0-), has 6 or more (meth) acrylonitrile groups, and has the above weight average molecular weight. ((:), preferably a light-transmitting light which is transmitted through a coating film, and an ionizing radiation which is a resin which is hardened by ionizing radiation represented by ultraviolet rays or electron beams, may be appropriately used depending on required properties and the like. A curable urethane urethane, another known urethane phthalate, etc. 100124540 23 201223758 The commercially available product of the above-mentioned urethane phthalate is, for example, a Japanese synthetic chemical described in Patent Document 1. The trade name of the company (shares) is manufactured by UV1700B, the brand name of the company manufactured by Gensei Industrial Co., Ltd., and the brand name of the company is BS577, which is manufactured by Arakawa Chemical Industry Co., Ltd., and the new Nakamura Chemical Industry Co., Ltd.
造之商品名 U15HA、U15H、U9HA、U9H、U6HA 及 U6H 等。 於本發明之抗靜電層用組成物中,丙烯酸胺基甲酸酯(c) 係滿足上述抗靜電劑之含有比例,且相對於上述多官能單體 (B)與丙烯酸胺基甲酸酯(c)之總量為質量%。若未滿 1質量%,則無法獲得抗靜電層與HC層之充分密接性。又,The trade names are U15HA, U15H, U9HA, U9H, U6HA and U6H. In the antistatic layer composition of the present invention, the urethane acrylate (c) satisfies the content ratio of the above antistatic agent, and is relative to the above polyfunctional monomer (B) and urethane acrylate ( c) The total amount is % by mass. If it is less than 1% by mass, sufficient adhesion between the antistatic layer and the HC layer cannot be obtained. also,
若超過40質量%’貝q多官能單體⑻之比例較少,無法獲得 抗靜電層與TAC基材之充分密接性。 X 丙烯酸胺基曱酸醋(c)之比例係相對於上述總量(b 1〜4〇質量%,但較佳為5〜3〇質量%。 如此,藉由黏合劑中之多官能單體⑻、丙烯酸胺基甲酸 醋(Q之比例適當,抗靜電劑⑷既不會於抗靜電層内過度分 散’亦不會滲出’可於層内以可發揮抗靜電性之程度集中存 在。正因為其為該組成,抗靜電層之表©電轉才能夠成為 未滿 1χ1〇12 Ω/口。 ’ ^抗靜電層用組成物中,除上述⑷、⑻及(C)成分以外, 視需要亦可含有適當之溶劑及聚合起始劑。以下,對該等其 他成分力σ以說明。 '、 100124540 24 201223758 (溶劑) 作為心劑,可使用專利文獻〗中所記載之丙酮等酮系溶 &卜乙酸甲s旨等s旨系、溶劑、乙腈等含氮系溶劑、甲基乙二醇 . 等一.系溶劑、THF等醚系溶劑、二氯甲烷等鹵化烴溶劑 及甲基賽路蘇卓二醇喊系溶劑等渗透性溶劑。 作為參透性溶劑’較佳為選自由乙酸甲酯、乙酸乙酯、乙 酸丁酉曰、曱基乙基酮、曱基異丁基酮(MIBK,MethylIs〇butyl Ketone)及環己酮所組成之群組中的至少一種。 又,亦可使用丙二醇單甲基醚(PGME,Pr〇pylene Glyc〇1 Monomethyl Ether)、正丙醇、異丙醇、正丁醇、第二丁醇、 異丁醇及第三丁醇等非滲透性溶劑。 上述溶劑可單獨地使用一種,亦可將兩種以上混合來使 用。 於本發明之抗靜電層用組成物中,就推測藉由使用滲透性 溶劑’可促進上述多官能單體(B)朝TAC基材之滲透、提昇 抗靜電層與TAC基材之密接性而言,較佳為使用滲透性溶 劑。 又,於本發明之抗靜電層用組成物中,就推測藉由使用非 滲透性溶劑,可抑制上述丙烯酸胺基甲酸酯((:)朝tac基材 之滲透、提昇抗靜電層與HC層之密接性而言,較佳為使用 非滲透性溶劑。 因此,於本發明之抗靜電層用組成物中,於溶劑為一種之 100124540 25 201223758 情形時’較佳為使用參透溶劑,但於兩種以上溶劑之情形 時,最佳為將料性_與轉扯,組合❹。其原因 在於,雖然即便係-種溶劑(僅渗透溶•亦可#由_酸 胺基甲酸自旨⑹之分子量來控鄉透,將滲透性溶劑與非 渗透性溶娜合使用可更容㈣_ 一,喊得使用組成 物之抗靜電層之穩定的性能。 於將滲透性溶劑與非滲透性溶劑組合使用之情形時,較佳 為其質量比為滲透性溶劑:非滲透性溶劑=1〇〇:〇〜5〇:5〇, 較佳為90 : U)〜5() : 50,且相對於抗靜電制組成物之總 固形份100質量份為30〜500質量份。 (聚合起始劑) 聚合起始劑係開始或促進上述黏合劑成分(B)之交聯反應 之成分,視需要可適當地選擇使用先前公知之自由基及陽離 子聚合起始劑等。作為自由基聚合起始劑,例如可較佳地使 用Ciba Japan(股)製造之商品名Irgacurel84(l-羥基-環己基-苯基-酮)。於使用聚合起始劑之情形時,其含量相對於抗靜 電層用組成物之總固形份之合計質量,較佳為0.4〜2.0質量 %。藉由如上述般將抗靜電層用組成物中所使用之聚合起始 劑之量設為HC層中所使用之聚合起始劑之量的1/10〜 1/2,可使抗靜電層之反應性基大量殘留。藉此,反應難以 進行,故亦防止捲曲之產生。 (抗靜電層用硬化性樹脂組成物之製備) 100124540 26 201223758 上述抗靜電層用硬化性樹脂組成物可藉由使上述(A)、(b) 及(C)成分混合分散於溶劑中而獲得。又,即便無溶劑,上 述(A)、(B)或(C)成分仍具有充分之流動性之情形時,亦可 無溶劑。混合分散可使用塗料振盪機或珠磨機等公知之方 法。 於本發明之抗靜電層用硬化性樹脂組成物中,藉由將抗靜 電劑(A)設為上述範圍’亦可使上述抗靜電層用硬化性樹脂 組成物之膜厚為1〜5/zm之硬化物的表面電阻值未滿 1x 10 Ω/□。藉由使抗靜電層為此種抗靜電性能,即便積層 膜厚比較厚之HC層,亦可於整個光學薄膜中發揮優異之灰 塵附著防止性能。 若抗靜電層之膜厚未滿1V m,則為了維持相同之表面電 阻而必需增加作為抗靜電劑之四級銨鹽之量,但於該情形 時’存在抗靜電劑之反應性基減少,抗靜電層與He層之密 接惡化之可能性。 若抗靜電層之膜厚超過5/im,則表面電阻容易表現,但 存在產生捲曲、成本升高、處理性惡化之可能性。 進而’於抗靜電層用組成物中’藉由使抗靜電劑(A)相對 於抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸醋(c)之 總量為5〜20質量%,且使丙烯酸胺基曱酸酯(c)相對於多 官能單體(B)及丙烯酸胺基甲酸酯(c)之總量為5〜3〇質量 %’除了可獲得充分之抗靜電性以外’亦可獲得光學薄膜之 100124540 27 201223758 饮接性對於紫外線(uv)之優異的耐久性。 (光學薄膜) 本發明之光學薄膜係於三醋酸纖維素基材之一面側,自該 三醋酸纖維素基材側起鄰接地設置膜厚為1〜5 之抗靜 電層及硬塗層而成者,其特徵在於,該抗靜電層包含上= 靜電層用硬化性樹脂組成物之硬化物,且上述多官能單體二 渗透至三醋酸纖維素基材之抗靜電層側之界面側的區 硬化。 ^ 即便係於TAC基材之—面側自TAC基材侧起設置膜厚為 1〜5" m之抗靜電層、及Hc層的光學薄膜,藉由抗靜電層 包含上述抗靜電層用硬化性樹脂組成物之硬化物,仍可成為 具有充分之灰塵附著防止性,並且Hc層與抗靜電層之密接 性優異者。又’藉岐多官能單體⑻滲透至TAC基材之抗 靜電層側之界關的區域並硬化,亦可獲得抗靜電層與tac 基材之密接性。作為光學薄膜整體,可獲得優異之灰塵附著 防止性能。 於本發明之光學薄膜之較佳之形態中,藉由使抗靜電層由 上述抗靜電層用組成物之硬化物形成,亦可使光學薄膜之上 述硬塗層、上述抗靜電層及上述三醋酸纖維素基材間之方格 咎接性S式驗的岔接率為9〇〜1〇〇%,且使於溫度、濕度 40%下以每小時5〇〇 w/m2之光量照射192小時紫外線後(以 下’有時僅稱為「耐紫外線(Uv,ultraviolet)試驗後」)之該 100124540 28 201223758 密接率為80〜100%。 該密接率表示HC層、抗靜電層及TAC基材之密接,即 抗靜電層與HC層間之密接及抗靜電層與TAC基材間之密 接性。 於習知之具有不含丙烯酸胺基曱酸酯(C)’主要僅含有多 官能單體(B)作為黏合劑之組成物,或即便含有丙烯酸胺基 曱酸酯(C)亦未以特定之比例含有抗靜電劑(A)、多官能單體 (B)及丙烯酸胺基曱酸酯(〇之組成物的硬化物所構成之抗 靜電層之光學薄膜中,抗靜電層與TAC基材間之密接雖良 好’但抗靜電層與HC層間之密接並不充分。如此,於抗靜 電層與HC層間之密接性並不充分之情形時,若進行密接性 試驗’則抗靜電層與TAC基材間雖不產生剝離,但抗靜電 層與HC層之間會產生剝離而剝落。於抗靜電層與TAc基 材間之密接並不充分之情形時,抗靜電層與TAC基材間會 產生剝離而剝落。因此’作為光學薄膜,為了獲得優異之密 接性,需要抗靜電層與HC層間之密接及抗靜電層與TAC 基材間之密接。 藉由使上述抗靜電層用組成物硬化而形成抗靜電層,膜厚 為1〜5#m之抗靜電層與Hc層間之密接及抗靜電層與 TAC基材間之密接優異,作為光學薄膜整體顯現優異之密 接性。尤其’該密接性於耐―雜後較顯^本發明之光 學溥膜於耐UV試驗後亦顯現優異之密接性。 100124540 29 201223758 圖1係表示本發明之光學薄膜之層構成之一例的示意 圖办於―酉日酉欠纖維素基材10之一面側,依序鄰接地設置有 抗靜電層20及硬塗層圖2係表示本發明之光學薄膜之 曰冓成之另例的示意圖。在與圖1相同之光學薄膜之硬塗 層上進而設置有低折射率層40。 、以下’對作為本㈣之光學賴之必需構成要素的三醋酸 纖維素基材、抗靜電層及硬塗層,暨可視需要而適當設置之 高折射率層、t折射率層、低折射率層、防眩層及防污層等 其他層加以說明。 (二醋酸纖維素基材) 本發明中所使用之三醋酸纖維素基材係透光性較高之三 醋酸纖維素薄膜,且只要為滿足可㈣光學薄狀透光性基 材之物性|,職無特靠定,可適當_擇❹先前公知 之硬塗薄膜或光學薄膜之TAC基材。 可見光區域380〜780nm中之TAC基材之平均透光率較 佳為80%以上,特佳為90%以上。再者,透光率之測定係 採用使用紫外可見分光光度計(例如島津製作所(股)製造之 商品名UV-3100PC),於室溫、大氣中所測定之值。 可對TAC基材實施皂化處理或設置底塗層等表面處理。 又,可添加抗靜電劑等添加劑。 TAC基材之厚度並無特別限定’通常為3〇〜2〇〇以爪,較 佳為40〜200 // m。 30 100124540 201223758 (抗靜電層) 本發明之抗靜電層係丄 承由上述抗靜電層用硬化性樹脂纟且点 物之硬化物所構成,腺戶 '' 喝尽為1〜5/zm。若膜厚薄於1 則無法獲得充分之抗靜雷 呀霉性能,無法充分地添加為了確保盥 其他層之密接性而必需 y 而之黏合劑。若厚於5 // m,則由於抗 靜電劑若未以某種程度緊密地存在於層關無法發揮性 能’故而抗靜電層之棬曲變大,因此加工性惡化,若膜厚進 -步Μ厚’則所包含之抗靜電劑等之量增加’成本增加。 作為抗靜電層之性能,表面電阻較佳為未滿1χΐ〇ΐ2 β/ □,更佳為Ιχίο11 Ω/□以下、進而為1χ1〇ιο Ω/□以下。只 要抗靜電層之表面f阻I好,積層有HC層之光學薄膜的灰 塵附著防止性可更良好。 (硬塗層) 硬塗層係於JIS K5600-5-4(1999)中規定之鉛筆硬度試驗 (4.9N負荷)中,顯示「H」以上之硬度的層,且對本發明之 光學薄膜賦予硬度。 HC層包含硬塗層用組成物之硬化物,可使用先前公知之 硬塗層’亦可為包含僅含黏合劑成分之硬塗層用組成物的硬 化物者,另外,亦可於組成物中含有上述抗靜電層用組成物 中所列舉之聚合起始劑等。為了提高HC層之硬度等,亦可 含有先前公知之賦予硬度之成分,例如日本專利特開 2008-165040號公報中記載之具有與黏合劑成分之交聯反應 100124540 31 201223758 性的反應性二氧化矽微粒子。 作為具體例’可藉由將含有電離放射線硬化性樹脂作為透 明樹脂之樹脂组成物塗佈於透明基材上,並使該樹脂組成物 中所包含之單體、寡聚物及預聚物交聯及/或聚合而形成HC 層。 作為透明樹脂,較佳為電離放射線硬化性樹脂,作為單 奴券聚物及預聚物之官能基,較佳為電離放射線聚合性之 官能基,其中較佳為光聚合性官能基。藉由該官能基與抗靜 電層用樹脂組成物中之丙烯酸胺基甲酸酯(c)之反應性基硬 化結合,可獲得抗靜電層與HC層之充分之密接性。 作為光聚合性官能基,可列舉(甲基)丙稀酿基、乙稀基、 苯乙烯基、烯丙基等不飽和聚合性官能基等。 又’作為預聚物及寡聚物,可列舉(曱基)丙烯酸胺基曱酸 酉曰聚知(甲基)丙烯酸醋、環氧(甲基)丙稀酸醋等丙稀酸醋、 不飽和聚酯、環氧樹脂等。 作為單體’可列舉苯乙稀、α-曱基苯乙烯等苯乙烯系單 (曱基)丙烯酸曱酉曰、(曱基)丙稀酸乙基己醋、季戊四 醇(曱基)㈣酸S旨、季細醇三㈣则義、季戍四醇 四(曱基)丙烯酸S旨、季戊四醇乙氧基四(曱基)丙稀酸醋、二 =戊四醇,、(曱基)丙嫦酸g旨、二季戊四醇五(曱基)丙稀酸 知—沒曱基丙院三(曱基)丙埽酸醋、三經曱基丙烧乙氧基 三(甲基)丙稀酸錯、甘油丙氧基三丙稀酸醋、二-三經甲基丙 100124540 32 201223758 烷四丙烯酸酯、聚乙二醇二(曱基)丙烯酸酯、雙酚F之EO 改質二(曱基)丙烯酸酯、雙酚A之EO改質二(曱基)丙烯酸 酯、異三聚氰酸EO改質二(甲基)丙烯酸酯、異三聚氰酸EO 改質三(曱基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、三羥 曱基丙烷PO改質三(甲基)丙烯酸酯、三羥曱基丙烷EO改 質三(曱基)丙烯酸酯、二-三羥曱基丙烷四(曱基)丙烯酸酯等 丙烯酸系單體,三羥曱基丙烷三硫代乙醇酸酯、三羥曱基丙 烷三硫代丙醇鹽、季戊四醇四硫甘醇等分子中具有2個以上 之硫醇基的多元醇化合物,又,具有2個以上之不飽和鍵之 (曱基)丙烯酸胺基曱酸酯或聚酯(曱基)丙烯酸酯等。 尤其,就提高交聯密度、獲得抗損傷性之觀點而言,較佳 為多官能丙烯酸酯單體,其中,季戊四醇三(曱基)丙烯酸 酯、季戊四醇四(曱基)丙烯酸酯、二季戊四醇六(甲基)丙烯 酸酯、二季戊四醇五(曱基)丙烯酸酯因與抗靜電層之密接良 好、鉛筆硬度亦良好而更佳。又,於該等單體中混合胺基甲 酸酯多官能丙烯酸酯等寡聚物成分亦可使硬度變得良好,並 且使聚合收縮減少,可良好地形成防止捲曲或裂痕之性能, 故較佳。 於此種樹脂組成物中,亦可為了提昇硬度而含有二氧化矽 等無機微粒子等。又,為了使與樹脂組成物之相容性變佳, 可進行有機表面處理,亦可具有反應性基。 又,作為黏合劑,亦可將聚合物添加至上述樹脂組成物中 100124540 33 201223758 來使用。作為聚合物,例如可列舉聚甲基丙歸酸甲酯 (PMMA * Polymethyl Methacrylate),^ I^m^^(CAP ,If the proportion of the polyfunctional monomer (8) exceeds 40% by mass, the sufficient adhesion between the antistatic layer and the TAC substrate cannot be obtained. The ratio of the X-acrylic acid amide vinegar (c) is relative to the above total amount (b 1 to 4% by mass, but preferably 5 to 3% by mass. Thus, by the polyfunctional monomer in the binder (8) Acrylic acid carboxylic acid vinegar (Q ratio is appropriate, antistatic agent (4) will not be excessively dispersed in the antistatic layer 'and will not ooze out' can be concentrated in the layer to the extent that it can exert antistatic properties. It is this composition, and the surface of the antistatic layer can be turned into less than 1χ1〇12 Ω/□. ' ^ Antistatic layer composition, in addition to the above components (4), (8) and (C), A suitable solvent and a polymerization initiator are contained. Hereinafter, the other components are described by force σ. ', 100124540 24 201223758 (solvent) As a cardiac agent, a ketone-based solution such as acetone described in the patent document can be used. Acetic acid, such as a solvent, a nitrogen-containing solvent such as acetonitrile, methyl glycol, etc., a solvent, an ether solvent such as THF, a halogenated hydrocarbon solvent such as dichloromethane, and methyl sulfus The diol is a osmotic solvent such as a solvent. The permeating solvent is preferably selected from the group consisting of At least one of the group consisting of methyl acetate, ethyl acetate, butyl acetate, mercaptoethyl ketone, decyl isobutyl ketone (MIBK, MethylIs〇butyl Ketone) and cyclohexanone. Non-permeable solvents such as propylene glycol monomethyl ether (PGME, Pr〇pylene Glyc® Monomethyl Ether), n-propanol, isopropanol, n-butanol, second butanol, isobutanol and tert-butanol are used. The solvent may be used singly or in combination of two or more. In the composition for an antistatic layer of the present invention, it is presumed that the above polyfunctional monomer (B) can be promoted by using a permeable solvent. It is preferable to use a permeable solvent in order to infiltrate the TAC substrate and improve the adhesion between the antistatic layer and the TAC substrate. Further, in the composition for an antistatic layer of the present invention, it is presumed that non-permeability is used. The solvent can suppress the penetration of the urethane urethane ((:) toward the tac substrate and improve the adhesion between the antistatic layer and the HC layer, and it is preferred to use a non-permeable solvent. Therefore, in the present invention In the composition for antistatic layer, the solvent is a kind of 1001 24540 25 201223758 In the case of 'preferably using a seepage solvent, but in the case of two or more solvents, it is best to combine the materiality_ with the twisting and twisting. The reason is that even if it is a solvent (only infiltration) Solvents can also be controlled by the molecular weight of the amino acid (6), and the permeability of the solvent can be more compatible with the non-permeable solution. (4) _ One, shouting the stability of the antistatic layer using the composition When the osmotic solvent is used in combination with the non-permeable solvent, the mass ratio is preferably a permeable solvent: non-permeable solvent = 1 〇〇: 〇 〜 5 〇: 5 〇, preferably 90: U) to 5 (): 50, and is 30 to 500 parts by mass based on 100 parts by mass of the total solid content of the antistatic composition. (Polymerization Initiator) The polymerization initiator is a component which starts or promotes the crosslinking reaction of the above-mentioned binder component (B), and if necessary, a conventionally known radical and cationic polymerization initiator or the like can be appropriately selected and used. As the radical polymerization initiator, for example, Irgacurel 84 (l-hydroxy-cyclohexyl-phenyl-ketone) manufactured by Ciba Japan Co., Ltd. can be preferably used. In the case of using a polymerization initiator, the content thereof is preferably from 0.4 to 2.0% by mass based on the total mass of the total solid content of the composition for the antistatic layer. The antistatic layer can be obtained by setting the amount of the polymerization initiator used in the composition for an antistatic layer to 1/10 to 1/2 of the amount of the polymerization initiator used in the HC layer as described above. The reactive groups remain in large amounts. Thereby, the reaction is difficult to carry out, so that the occurrence of curling is also prevented. (Preparation of a curable resin composition for an antistatic layer) 100124540 26 201223758 The curable resin composition for an antistatic layer can be obtained by mixing and dispersing the above components (A), (b) and (C) in a solvent. . Further, even if the above (A), (B) or (C) component has sufficient fluidity without a solvent, it may be solvent free. A well-known method such as a paint shaker or a bead mill can be used for the mixed dispersion. In the curable resin composition for an antistatic layer of the present invention, the film thickness of the curable resin composition for an antistatic layer can be made 1 to 5/ by setting the antistatic agent (A) to the above range. The surface resistance of the cured product of zm is less than 1 x 10 Ω/□. By making the antistatic layer have such an antistatic property, even if the HC layer having a relatively thick film thickness is laminated, excellent dust adhesion prevention performance can be exhibited in the entire optical film. If the film thickness of the antistatic layer is less than 1 V m, it is necessary to increase the amount of the quaternary ammonium salt as the antistatic agent in order to maintain the same surface resistance. However, in this case, the reactive group of the antistatic agent is reduced. The possibility that the adhesion between the antistatic layer and the He layer deteriorates. When the film thickness of the antistatic layer exceeds 5/im, the surface resistance is likely to be expressed, but there is a possibility that curling occurs, the cost increases, and the handleability deteriorates. Further, 'in the composition for antistatic layer', the total amount of the antistatic agent (A) relative to the antistatic agent (A), the polyfunctional monomer (B), and the amino acrylate acrylate (c) is 5 〜20% by mass, and the total amount of the amino phthalic acid acrylate (c) relative to the polyfunctional monomer (B) and the urethane acrylate (c) is 5 to 3 〇 mass%' except that sufficient In addition to the antistatic property, the optical film can also be obtained. 100124540 27 201223758 The excellent durability of the wettability to ultraviolet rays (uv). (Optical film) The optical film of the present invention is formed on one side of a cellulose triacetate substrate, and an antistatic layer and a hard coat layer having a film thickness of 1 to 5 are provided adjacent to each other from the side of the cellulose triacetate substrate. The antistatic layer includes a cured product of a curable resin composition for an upper surface layer, and the polyfunctional monomer is permeable to a region on the interface side of the antistatic layer side of the triacetylcellulose substrate. hardening. ^ Even if the anti-static layer of the film thickness of 1 to 5 " m and the optical film of the Hc layer are provided on the surface side of the TAC substrate from the side of the TAC substrate, the antistatic layer is cured by the antistatic layer. The cured product of the resin composition can still have sufficient dust adhesion prevention property, and the adhesion between the Hc layer and the antistatic layer is excellent. Further, the polyfunctional monomer (8) is infiltrated into the boundary region of the antistatic layer side of the TAC substrate and hardened, and the adhesion between the antistatic layer and the tac substrate can also be obtained. As the entire optical film, excellent dust adhesion prevention performance can be obtained. In a preferred embodiment of the optical film of the present invention, the antistatic layer may be formed of a cured product of the antistatic layer composition, or the hard coat layer of the optical film, the antistatic layer, and the triacetate may be used. The grid connection between the cellulose substrates is 〇1〇〇1〇〇%, and is irradiated for 192 hours at a temperature of 40% per hour at a temperature of 5 〇〇w/m 2 After the ultraviolet rays (hereinafter referred to as "after UV (Uv) ultraviolet test ("), the 100124540 28 201223758 adhesion rate is 80 to 100%. The adhesion ratio indicates the adhesion between the HC layer, the antistatic layer, and the TAC substrate, that is, the adhesion between the antistatic layer and the HC layer, and the adhesion between the antistatic layer and the TAC substrate. It is conventionally known that the acryl-free phthalic acid ester (C)-containing only the polyfunctional monomer (B) as a binder, or even the amide-based phthalic acid ester (C) is not specified. In an optical film containing an antistatic agent (A), a polyfunctional monomer (B), and an amino phthalic acid acrylate (an antistatic layer composed of a cured product of a ruthenium composition), between the antistatic layer and the TAC substrate Although the adhesion is good, the adhesion between the antistatic layer and the HC layer is not sufficient. Thus, when the adhesion between the antistatic layer and the HC layer is insufficient, the adhesion test is performed, and the antistatic layer and the TAC group are used. Although there is no peeling between the materials, the antistatic layer and the HC layer are peeled off and peeled off. When the adhesion between the antistatic layer and the TAc substrate is insufficient, the antistatic layer and the TAC substrate are generated. Therefore, as an optical film, in order to obtain excellent adhesion, adhesion between the antistatic layer and the HC layer and adhesion between the antistatic layer and the TAC substrate are required. The composition for the antistatic layer is hardened. Forming an antistatic layer with a film thickness of 1 to 5 #m The adhesion between the antistatic layer and the Hc layer and the adhesion between the antistatic layer and the TAC substrate are excellent, and the optical film as a whole exhibits excellent adhesion. In particular, the adhesion is better than that of the optical film of the present invention. Excellent adhesion is also exhibited after the UV resistance test. 100124540 29 201223758 Fig. 1 is a schematic view showing an example of the layer constitution of the optical film of the present invention, which is one side of the side of the cellulose substrate 10, which is sequentially adjacent. The antistatic layer 20 and the hard coat layer are provided. Fig. 2 is a schematic view showing another example of the formation of the optical film of the present invention. The hard coat layer of the optical film similar to that of Fig. 1 is further provided with a low refractive index layer. 40. The following is a "triacetate cellulose substrate, an antistatic layer and a hard coat layer which are essential components of the optical (4), and a high refractive index layer, a t refractive index layer, and a low Other layers such as a refractive index layer, an anti-glare layer, and an anti-staining layer are described. (Diacetate cellulose substrate) The cellulose triacetate substrate used in the present invention is a cellulose triacetate film having high light transmittance. And as long as it is full (4) The physical properties of the optically thin translucent substrate can be appropriately determined, and the TAC substrate of the previously known hard-coated film or optical film can be appropriately selected. The TAC substrate in the visible light region of 380 to 780 nm The average light transmittance is preferably 80% or more, and particularly preferably 90% or more. Further, the light transmittance is measured by using an ultraviolet-visible spectrophotometer (for example, the product name UV-3100PC manufactured by Shimadzu Corporation). The TAC substrate may be subjected to a saponification treatment or a surface treatment such as an undercoat layer. Further, an additive such as an antistatic agent may be added. The thickness of the TAC substrate is not particularly limited 'usually 3〇~2〇〇 claws, preferably 40~200 // m. 30 100124540 201223758 (antistatic layer) The antistatic layer of the present invention is made of the above-mentioned antistatic layer hardening resin and is ordered It consists of hardened matter, and the glandular '' drink is 1~5/zm. If the film thickness is less than 1, a sufficient anti-static property is not obtained, and it is not possible to sufficiently add an adhesive which is necessary to ensure the adhesion of the other layers. If it is thicker than 5 // m, the antistatic agent does not exhibit a certain degree of tightness in the layer and the performance of the antistatic layer becomes large. Therefore, the workability is deteriorated, and if the film thickness is advanced, the film thickness is increased. "Thickness" increases the amount of antistatic agent contained in the 'thickness'. As the performance of the antistatic layer, the surface resistance is preferably less than 1 χΐ〇ΐ 2 β / □, more preferably Ιχίο11 Ω / □ or less, and further 1 χ 1 〇 ιο Ω / □ or less. As long as the surface f resistance I of the antistatic layer is good, the dust adhesion prevention property of the optical film in which the HC layer is laminated can be more excellent. (hard coat layer) The hard coat layer is a layer having a hardness of "H" or more in a pencil hardness test (4.9 N load) prescribed in JIS K5600-5-4 (1999), and imparts hardness to the optical film of the present invention. . The HC layer contains a cured product of a composition for a hard coat layer, and a previously known hard coat layer may be used, or may be a hardened material containing a composition for a hard coat layer containing only a binder component, or may be a composition. The polymerization initiator and the like listed in the composition for an antistatic layer are contained therein. In order to increase the hardness and the like of the HC layer, it is also possible to contain a previously known hardness-imparting component, for example, a reactive oxidizing agent having a crosslinking reaction with a binder component as described in JP-A-2008-165040.矽Microparticles. As a specific example, a resin composition containing an ionizing radiation curable resin as a transparent resin can be applied onto a transparent substrate, and the monomers, oligomers, and prepolymers contained in the resin composition can be mixed. The HC layer is formed by polymerization and/or polymerization. The transparent resin is preferably an ionizing radiation curable resin, and a functional group of the ionomer and the prepolymer is preferably a functional group for ionizing radiation polymerizability, and among them, a photopolymerizable functional group is preferred. By sufficiently bonding the functional group to the reactive group of the urethane urethane (c) in the resin composition for an antistatic layer, sufficient adhesion between the antistatic layer and the HC layer can be obtained. Examples of the photopolymerizable functional group include an unsaturated polymerizable functional group such as a (meth)acrylic acid group, an ethylene group, a styryl group, and an allyl group. Further, as the prepolymer and the oligomer, acrylic acid vinegar such as (meth)acrylic acid ruthenium ruthenate (meth)acrylic acid vinegar or epoxy (meth)acrylic acid vinegar may be mentioned. Saturated polyester, epoxy resin, etc. Examples of the monomer' include styrene-based mono(indenyl)acrylic acid ruthenium, (mercapto)acrylic acid ethylhexanoic acid, and pentaerythritol (fluorenyl) (tetra) acid S such as styrene or α-mercaptostyrene. Quaternary alcohol, tris(4), quaternary tetraol tetra(indenyl)acrylic acid, pentaerythritol ethoxytetrakisyl acrylate vinegar, bis-pentaerythritol, (mercapto) propyl hydrazine Acid g, dipentaerythritol penta (indenyl) acrylic acid known - 曱 曱 丙 丙 三 三 曱 曱 曱 曱 曱 曱 三 三 三 三 三 三 、 、 、 、 、 、 、 、 、 、 、 、 、 Glycerol propoxy triacetic acid vinegar, di-trimethyl methacrylate 100124540 32 201223758 alkane tetraacrylate, polyethylene glycol bis(indenyl) acrylate, bisphenol F EO modified bis(indenyl) acrylic acid Ester, bisphenol A EO modified bis(indenyl) acrylate, isomeric cyanuric acid EO modified di(meth) acrylate, isomeric cyanuric acid EO modified tris(fluorenyl) acrylate, poly Propylene glycol di(meth)acrylate, trihydroxydecylpropane PO modified tris(meth)acrylate, trishydroxypropyl propane EO modified tris(indenyl)acrylate, di-trihydroxyindolyl An acrylic monomer such as an alkane tetra(indenyl)acrylate, or two or more molecules such as trishydroxypropyl propane trithioglycolate, trishydroxypropyl propane trithiopropanolate or pentaerythritol tetrathioethylene glycol The thiol group-containing polyol compound further has (indenyl)acrylic acid amide phthalate or polyester (fluorenyl) acrylate having two or more unsaturated bonds. In particular, from the viewpoint of increasing the crosslinking density and obtaining the damage resistance, a polyfunctional acrylate monomer is preferable, wherein pentaerythritol tri(indenyl)acrylate, pentaerythritol tetrakis(meth)acrylate, dipentaerythritol The (meth) acrylate and dipentaerythritol penta(indenyl) acrylate are more excellent in adhesion to the antistatic layer and good in pencil hardness. Further, by mixing the oligomer component such as a urethane polyfunctional acrylate with the monomers, the hardness can be improved, the polymerization shrinkage can be reduced, and the performance of preventing curling or cracking can be favorably formed. good. In the resin composition, inorganic fine particles such as cerium oxide may be contained in order to increase the hardness. Further, in order to improve the compatibility with the resin composition, it is possible to carry out organic surface treatment or to have a reactive group. Further, as the binder, a polymer may be added to the above resin composition 100124540 33 201223758 for use. As the polymer, for example, PMMA * Polymethyl Methacrylate, ^ I^m^^ (CAP,
Cellulose Acetate Propionate#。藉由添加聚合物可調整 塗液之黏度,藉此有使塗佈變得容易之優點。 又’於上述樹脂組成物中,視需要可添加光自由基聚合起 ; 始劑。較佳之添加量相對於上述樹脂組成物之總固形份:合·· 計=量為0.8〜8.0質量%。作為光自由基聚合起始劑,可使 用苯乙晴、苯偶姻類、二苯基峨、氧化膦類、縮嶋、 蒽酿;類、9-氧硫。山β星類、偶氮化合物等。 作為苯乙酮類,可列舉2,2_二曱氧基苯乙酮、2,2_二乙氧 基苯乙酮、對二甲基苯乙酮、丨_羥基_二甲基苯基酮、卜羥基 -二甲基-對異丙基苯基酮、丨_羥基環己基笨基酮、2_甲基 曱硫基·2·咮琳基笨丙_、2_节基_2_二曱基胺基-叫味淋基 苯基)_丁酮、4-苯氧基二氣苯乙酮、4_第三丁基_二氣笨乙酉同 等,作為苯偶姻類,可列舉苯偶姻、苯偶姻曱醚、笨偶姻乙 _、苯偶姻異㈣、节基二甲基縮酮、苯偶姻料酸醋、笨 偶姻曱苯磺酸酯、苯偶姻曱醚、苯偶姻乙醚等。 _ 又,作為二苯基酮類,可使用二苯基酮、羥基二苯基_、 4-笨曱醯基-4··曱基二苯基硫化物、2,4_二氣二苯基酮、4,4-二氣二苯基酮及對氯二苯基酮、4,4,_二甲基胺基二苯基酮 (来其勒酮)、3,3’,4,4’-四(第三丁基過氧化羰基)二苯基酮等。 又’亦可混合使用光敏劑’作為其具體例,可列舉正丁基 100124540 34 201223758 胺、二乙胺、聚正丁基膦等。 HC:之膜厚只要適當調節即可,例如,只要為卜2〇師即 L ^ ’ 5 Μ.若超過15_則無法獲得優異之灰 • 附者防止性能’若未滿,則硬度變得不足、且密接 ' 性亦變弱。 通常,若積層於抗靜電層上之HC屬變厚,則灰塵附著防 止性能變差’但若為本案之誠及組成物,則可獲得優異之 灰塵附著防止性能。 於本發明之光學薄膜之較佳之實施形態中,即便如抗靜電 層為1〜5/zm、HC層為5〜15_般於抗靜電層上積層有 車乂厚之HC層,光學薄膜亦可獲得充分之灰塵附著防止性 月包、及充分之抗靜電層與He層之密接性。 (其他層) 於本發明之光學薄膜中,在不脫離本發明之主旨之範圍 内於上述HC層之與抗靜電層相反側的面上,亦可為了提 幵光學溥膜之抗反射性、防眩性及防污性等而設置高折射率 層、中折射率層、低折射率層、防眩層及防污層等其他層。 ' (高折射率層及中折射率層) 高折射率層及中折射率層係為了調整本發明之光學薄膜 之反射率而設置的層。於毁置高折射率層之情形時,雖未圖 示’但通常鄰接於低折射率層之TAC基材側而設置。又, 於設置中折射率層之情形時,雖未圖示,但通常自TAC基 100124540 35 201223758 材側起依序設置中折射率層、高折射率層 高折射率層及中折射率層包含主要 人特率層。 =調整贿子核絲的魏物。^H分及折 用抗靜電層賴成物中所列舉之多官能^ 可使 調整用粒子,例如可列舉粒徑為⑽nm ,為折射率 為此種微粒子,可列舉選自由氧化辞(折射率子。作 化鈦(折射率:2·3〜2.7)、二氧化鈽(折射率·· 195) *一氧 化銦(折射率:1.95)、摻録氧化錫(折射率: 摻錫氧 =,87)、氧化錯(折射率:2·組叙縣 具體而言,高折射率層之折射率較佳為15〇〜㈣μ 射率層之折料低於高折射率層之折射率,較 2.00 〇 钓 1.5 高折射率層及中折射率層 為 50〜300 nm。 (低折射率層) 之膜厚只要適當調節即可,較佳 低折射率層包含含有二氧化石夕或氟化錤等折射率較低之 成分及黏合·分之組成物、或者含有偏二氟㈣共聚物等 含氟樹脂之低折射率層用組成物的硬化物,可形成先前公知 之低折射率層。 於用於形成低折射率層的組成物中,為了降低低折射率層 之折射率’亦可含有中空粒子。中空粒子係指具有外殼層且 100124540 36 201223758 被外殼層所包圍之内部為多孔質組織或空洞之粒子。該多孔 質組織或空洞中含有空氣(折射率:1),藉由使低折射率層 含有折射率為1.20〜1.45之中空粒子中,可降低低折射率層 之折射率。中空粒子之平均粒徑較佳為1〜l〇〇nm。中空粒 子可使用先前公知之低折射率層中所使用者,例如可例舉曰 本專利特開2008-165040號公報中所記載之具有空隙的微 粒子。 當上述脂肪酸金屬鹽粒子之個數平均一次粒徑未滿上述 下限時,存在如下之情形:容易產生脂肪酸金屬鹽粒子彼此 之凝聚、或脂肪酸金屬鹽粒子對於著色樹脂粒子之掩埋等不 良情況,對碳粉之印字性能造成不良影響。 另一方面,當上述脂肪酸金屬鹽粒子之個數平均一次粒徑 超過上述上限時,存在如下之情形:脂肪酸金屬鹽粒子易於 自著色樹脂粒子游離(脫離),無法將所需之外添劑之功能(對 碳粉賦予帶電穩定性、及流動性等之功能)充分地賦予至碳 粉粒子,對碳粉之印字性能造成不良影響。 (防眩層) 防眩層包含含有黏合劑成分及防眩劑之防眩層用組成物 之硬化物,黏合劑成分可使用上述抗靜電層用組成物中所列 舉之多官能單體等。 作為防眩劑,可列舉微粒子,例如可列舉苯乙烯顆粒(折 射率為1.59)、三聚氰胺顆粒(折射率為1.57)及丙烯酸顆粒 100124540 37 201223758 (折射率為1.49)等。此種賦予防眩性之微粒子之平均粒徑較 佳為100〜500nm。賦予防眩性之微粒子之含量相對於防眩 層用組成物中所包含之黏合劑成分的總質量,較佳為2〜30 質量%。 (防污層) 根據本發明之較佳之態樣,為了防止光學薄膜最表面之污 潰,可於光學薄臈之與TAC基材相反側的最表面設置防污 層。藉由防污層’可對光學薄膜謀求防污性及耐擦傷性之進 一步的改善。防污層包含含有防污劑及黏合劑成分之防污層 用組成物之硬化物。 防污層用組成物之黏合劑成分可使用先前公知者,例如可 使用上述抗靜電層用組成物中列舉之多官能單體。 防污層用組成物中所包含之防污劑可自公知之均化劑等 防污劑中適當選擇一種或兩種以上來使用。防污劑之含量相 對於防污層用組成物中所包含之黏合劑成分的總質量,較佳 為0.1〜5質量%。 (光學薄臈之製造方法) 作為本發明之光學薄膜的製造方法,若為可獲得上述光學 薄膜之層構成之方法,則並無特別限定,可使用先前公知之 方法。 作為其一例,包括如下步驟:⑴準備三醋酸纖維素基材; (11)準備上述抗靜電層用組成物及硬塗層用組成物;(iii)於該 100124540 38 201223758 TAC基材之—面側塗佈該抗靜電層用組成物來製成塗膜; (IV)對該抗靜電層用組成物之塗膜進行光照射,使其硬化而 形成抗靜電層;(v)於抗靜電層上塗佈該硬塗層用組成物來 製成塗膜;(vi)對該HC層用組成物之塗膜進行光照射,使 其硬化而形成HC層。 此外,亦可於上述(iv)步驟中不使抗靜電層用組成物之塗 膜完全硬化(full cure),而使其半硬化(half cure) ’並於該半 硬化之塗膜上塗佈HC層用組成物來製成塗膜,使該半硬化 之塗膜與HC層用組成物之塗膜合併後進行光照射,然後使 其完全硬化而獲得光學薄膜。藉由如上述般使用半硬化法, 有抗靜電層與HC層之密接性提高之優點。 塗佈方法只要使用先前公知之方法即可,並無特別限定, 可使用凹版塗佈法、旋塗法、浸潰法、喷霧法、斜板式塗佈 法、棒塗法、輥塗法、彎月面塗佈法、快乾印刷法、網版印 刷法及快速塗佈法等各種方法。 光照射主要使用紫外線、可見光、電子束或電離放射線 等。於紫外線硬化之情形時,使用自超高壓水銀燈、高壓水 銀燈、低壓水銀燈、碳弧燈、氙弧燈、金屬由化物燈等之光 線發出的紫外線等。能量射線源之照射量以紫外線波長365 nm下之累計曝光篁计為%〜5〇〇mJ/cm2。半硬化之情形時 之照射量為5〜50mJ/cm2。於除光照射亦進行加熱之情形 時,通常於40°C〜!2〇°C之溫度下進行處理。 100124540 39 201223758 於塗佈抗靜電層用組成物後、且進行光照射前,亦可進行 乾燥。作為乾燥方法’例如可列舉減壓乾燥或加熱乾燥、進 而將該等乾燥加以組合之方法等。又,於以常壓進行乾燥之 情形時,較佳為於30〜ll〇°C下進行乾燥。例如,於使用甲 基乙基酮作為抗靜電層用組成物之溶劑之情形時,可於室溫 〜80°C、較佳為40°C〜70°C之範圍内的溫度下,進行20秒 〜3分鐘、較佳為3〇秒〜1分鐘之乾燥步驟。 HC層或低折射率層等之組成物只要以與上述抗靜電層相 同之方法製備即可。又’於在HC層上設置低折射率層等之 情形時,可使用上述抗靜電層之塗佈方法或硬化方法。 (偏光板) 本發明之偏光板之特徵在於:於上述光學薄膜之三醋酸纖 維素基材侧設置有偏光片。圖3絲示本發明之偏光板之層 構成之-觸示意圖。圖3中所示之偏光板⑽具有光學薄 膜卜及積層有保護薄臈50與偏光層60之偏光片70,且偏 光片70設置於光學薄腺】 _ 、之二醋酸纖維素基材1 〇側。 再者,所謂於光學薄膜 y 、二‘駚纖維素基材側配置有偏光 片’不僅包括獨立地形# 構成光學薄膜之構件兼作t賴及偏W之情形’亦包括 又,於將本發明之偏偏先片之構件之情形。 偏光片側配置顯示吨。_面板之情形時,通常於 再者,關於光學薄腹,丄 、 於只要使用上述光學薄膜即可, 100124540 201223758 故而省略此處之#明 成加以說明。以下’對本發明之偏光板中之其他構 (偏光片) 作為本發明中所使用之偏光片,若為具備蚊之偏光特性 ^並’、’、特別限定’可使用液晶顯示裝置中通常所使用之 偏光片。 ,,於偏光片之形態,若為可長時間保持既定之偏光特性之 =缝無特難定,例如可僅由偏光層構成,亦可為將 呆=與偏光層貼合而成者。於將保護薄膜與偏光層貼合 2㈣’可僅於偏光層之單面上形成保護薄膜,亦可於偏 光層之兩面上形成保護薄膜。 膜使用藉由使破含浸於包含聚乙稀醇之薄 \ 伸而形成有聚乙稀醇舆峡之錯合物者》 :’、、保蠖薄膜’若為可保護上述偏光層、且且 二則並無特別限定。作為保護薄膜之透光性,於 透過率較佳為8。%以上,更佳為9、 攻保遵薄膜之透過率可藉由 明材料之全光透過率的試驗方法)進行測定。Μ(塑膠-透 婦==保Γ膜之樹脂’例如可列舉纖維素衍生物、環 聚對苯m等。其中‘== 生物或環稀煙系樹脂。 《用·.戴肩素何 100124540 201223758 保護薄膜可為包含單-層者,亦可為積層有複數層者。 又’於保㈣膜為積層有複數層者之情料,可積層有同一 組成之複數層,又,亦可積層有具有不同組成之複數層。 又,關於保護薄膜之厚度,若為可使本發明之偏光板之可 撓性處於所需的範_、且藉由與偏光層貼合而可使偏光片 之尺寸變化處於既定之範圍内的範圍,則並無特別限定,但 較佳為5〜20—之範圍内,特佳為15〜⑽爪之範圍 内,更佳為30〜御出之範圍内。若上述厚度薄於5_, 則存在本發明之偏光板之尺寸變倾大的可能性。又,若上 述厚度厚於2叫m,卿如於對本發明之偏光板進行裁勢 加工時’存在加卫屑增加、或裁剪刀之磨損變快的可能性。 保護薄膜可為具有相位差性者。藉由使用具有相位差性之 保護薄膜’存在可使本發明之偏•成為具相示面板 角補償功能者的優點。 作為保護薄膜具有相位差性之態樣,若為可顯現所需之相 :差性之態樣,則並無特別限定。作為此種態樣,例 具有包含單—層之構成,並含有顯現相位^ 先予特性顯現劑,藉此具有相位差性之態樣;以及藉由夏 上述樹脂之保護薄膜上積層有包含具有折射率: 二生之化合物之位相差層的構成,而具有相位差性之能 =發日种,該等之任—態樣均可較佳地使用。心 (顯不面板) 100124540 42 201223758 本發明之顯不面板之特徵在於,於上述光學薄膜之三醋酸 纖維素基材側配置有顯示器。 作為,,、、頁示器 了列舉 LCD、PDP、ELD(Electroluminescent Display ’電場發光顯示器)(有機EL、無機el)、crt、觸控 面板、電子紙、平板電腦(TaWetPers〇nalc〇mputer)等。 本發明之顯不©板亦可用於觸控面板、電子紙、平板% 作為上賴示n之代表狀LCD係透卿,且係具備透 過陡顯不體及自背面照射其之光源裝置而成者。於上述顯示 盗為LCD之情形時,其係於該透過性顯示體之表面上配置 本發明之光學薄膜或具備該光學薄膜之上述偏光板而成者。 作為上述顯示器之另_例之pDp係具備表面玻璃基板、 及與及表面朗基板對向配置且兩者間填充有放電氣體之 月面玻璃基板而成者。於上述顯示器為PDP之情形時,其 亦為於表面麵基板之表面或其前面板(朗基板或薄膜基 板)上具備上述光學薄膜者。 述'員示器亦可為將若施加電壓則發光之硫化鋅、二胺類 <質等t光體蒸鍍於玻璃基板上,並控制施加於基板之電壓 來進行㉝示的ELD裝置’或者將電訊號轉換為光,產生人 艮I見之像的CRT等顯示^。於此情形時,其係於此〇裝 置或CRT之最表面或其前面板之表面上具備上述光學薄膜 而成者。 100124540 43 201223758 [實施例] 以下,列舉實施例更具體地說明本發明。本發明並不受該 等記載限制。 製備具有以下之組成之抗靜電層用組成物1及HC層用組 成物1。 (抗靜電層用組成物1) 抗靜電劑(A):曰本化成(股)製造之商品名 UV-ASHC-01(重量平均分子量為20000,固形份為7〇0/〇,固 形份中四級銨鹽成分為15〇/〇):固形份換算1質量份 多官能單體(B):二季戊四醇六丙烯酸酯(DPHA)(商品名: KAYARAD DPHA,日本化藥(股)製造,6官能,分子量為 578) : 64質量份 丙烯酸胺基曱酸酯(C):荒川化學工業(股)製造之商品名 BS577(6官能,重量平均分子量為ι〇〇〇) : 35質量份 聚合起始劑:Ciba Specialty Chemicals(股)製造之商品名 Irgacurel84(l-羥基環己基苯基酮):1質量份 甲基乙基酮:100質量份 (HC層用組成物1) 二季戊四醇六丙烯酸酯(商品名:KAYARADDPHA,曰本 化藥(股)製造,6官能,分子量為578) : 98質量份 ^^合起始劑.Ciba Specialty Chemicals(股)製造之商品名 Irgacurel84(l-羥基環己基苯基酮):4質量份 100124540 44 201223758 甲基乙基_ : 100質量份 (貫施例 準備厚度為叫m之TAC基材(Fuji Film(股)製造之商品 名TmuL) ’於TAC基材之單面上塗佈所製備之上述抗靜 電層用組成物1 ’並於溫度為70°c之熱供箱中乾燥60秒鐘 使Ί臈中之溶劑蒸發,然後以使累計光量達到50mJ之方 式知射i外線而使塗膜硬化,藉此形成乾燥時之厚度為25 以m的抗靜電層。 繼而’於所獲得之抗靜電層上塗佈所製備之上述硬塗層用 組成物1,與抗靜電層同樣地進行乾燥,然後以使累計光量 達到150mJ之方式照射紫外線而使塗膜硬化,形成乾燥時 之厚度為12 //m的硬塗層,藉此製成於TAC基材之一面 側自TAC基材側起依序具有抗靜電層及硬塗層之光學薄 膜。 又’為了測定抗靜電層之表面電阻值,與上述光學薄膜同 樣地於TAC基材(TF80UL)上進行至形成抗靜電層之步驟為 止’而亦製成於TAC基材之一面側僅具有抗靜電層之積層 體。 (實施例2〜7) 於實施例1中’將抗靜電層用組成物1中所包含之抗靜電 劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量或種類 分別如表1所示般加以替換,除此以外,以與實施例1相同 100124540 45 201223758 之方式IL作光學薄财積層體。再者,實補7巾所使用之 丙稀基甲酸S|(C)為商品名UV-761GB(日本合成製造)。 (比較例1、2) 於實施例1中’將抗靜電層用組成物1中所包含之抗靜電 劑(八)、夕b能單體(B)及丙烯酸胺基曱酸酯〇之量分別如 表1所不般加以替換,除此以外,以與實施例1相同之方式 製作光學薄膜及積層體。 (比較例3) 於實施例1中,作為抗靜電層用組成物1中所包含之多官 能單體(B),使用曰本化藥(股)製造之R128H(單官能,分子 量為222)來代替DPHA,並將抗靜電劑(A)、多官能單體(B) 及丙烯酸胺基曱酸g旨(C)之量分別如表1所示般加以替換, 除此以外,以與實施例1相同之方式製作光學薄膜及積層 體。 (比較例4) 於實施例1中,作為抗靜電層用組成物1中所包含之多官 能單體(B),使用日本化藥(股)製造之DPCA60(6官能,分子 量為1263)來代替DPHA’並將抗靜電劑(A)、多官能單體(B) 及丙烯酸胺基甲酸酯(c)之量分別如表1所示般加以替換, 除此以外,以與實施例1相同之方式製作光學薄膜及積層 體。 (比較例5) 100124540 46 201223758 於實施例1中,作為抗靜電層用組成物丨中所包含之兩嫜 酸胺基曱酸酯(C) ’使用Daicel-Cytec(股)製造之 EBECRYL270(2官能,分子量為15〇〇)來代替BS577,炎将 抗靜電劑(A)、多官能單體⑻及丙烯酸胺基甲酸酯(c)之量 分別如表1所示般加以替換,除此以外,以與實施例丨相同 之方式製作光學薄膜及積層體。 (比較例6) 於實施例1中,作為抗靜電層用組成物1中所包含之丙烯 酸胺基曱酸酯(C) ’使用Daicel-Cytec(股)製造之 EBECRYL5129(6官能,分子量為800)來代替BS577,並將 抗靜電劑(A)、多官能單體及丙烯酸胺基曱酸酯(c)之量 分別如表1所示般加以替換,除此以外,以與實施例1相同 之方式製作光學薄膜及積層體。 (比較例7) 於實施例1中,作為抗靜電層用組成物1中所包含之丙烯 酸胺基曱酸酯(C) ’使用荒川化學工業(股)製造之 BS371MLV(50官能,分子量為20000)來代替BS577,並將 抗靜電劑(A)、多官能單體(B)及丙烯酸胺基曱酸酯(〇之量 分別如表1所示般加以替換,除此以外,以與實施例1相同 之方式製作光學薄膜及積層體。 (比較例8〜11) 於實施例1中’將抗靜電層用組成物1中所包含之抗靜電 100124540 47 201223758 劑(A)、多官能單體(B)及丙烯酸胺基曱酸酯(C)之量分別如 表1所示般加以替換,除此以外,以與實施例1相同之方式 製作光學薄膜及積層體。 (參考例1) 於實施例6中,將抗靜電層用組成物1中所包含之溶劑替 換為僅為非滲透溶劑,除此以外,以與實施例6相同之方式 製作光學薄膜及積層體。 (比較例12) 於實施例3中,將抗靜電層用組成物1中所包含之丙烯酸 胺基曱酸酯(C)替換為己内酯改質二季戊四醇六丙烯酸酯 (商品名:KAYARAD DPCA-60,曰本化藥(股)製造),除此 以外,以與實施例3相同之方式製作光學薄膜及積層體。該 化合物因與DPHA相同之理由而存在親水性傾向。 (參考例2) 於實施例3中,將抗靜電層用組成物1中所包含之抗靜電 劑(A)替換為抗靜電劑(B)(金屬微粒子:ΑΤΟ,商品名: ELCOM V3560,日揮觸媒化成製造),除此以外,以與實施 例3相同之方式製作光學薄膜及積層體。 (參考例3) 於參考例2中,將抗靜電層用組成物1中所包含之抗靜電 劑(Β)的量如表1所示般增多,除此以外,以與參考例2相 同之方式製作光學薄膜及積層體。 100124540 48 201223758 (抗靜電層之表面電阻值之評價) 針對實施例1〜7、比較例1〜12、及參考例1〜3之基材 上積層有抗靜電層之積層體’利用高電阻率計(Mitsubishi Chemical Analytech(股)製造之商品名 Hiresta ιρ MCP-HT260)以施加電壓1000 V測定表面電阻值。將其結果 示於表1。再者,本案中所記載之表面電阻值的單位Ω/□係 指Ω/sq.(每單位面積之電阻)。 (光學薄膜之灰塵附著防止性之評價) 利用聚酯布將實施例及比較例中所製作之包含基材/抗靜 電層/硬塗層之光學積層體的HC層面往返擦栻2〇次,然後 使該擦拭面接近香煙灰並以下述基準評價塵埃附著防止。 〇:灰不.附著,具有灰塵附著防止效果而良好。 Χ:灰大量附著’無灰塵附著防止效果。 (光學薄膜之密接性之評價) 及參考例1〜3之光學 針對實施例1〜7、比較例 薄膜’於溫度坑、濕度40%下調濕24小時後,依據肋 K5400之方格試驗之方法,於硬塗層面上以!咖間隔横賢 ,切入11條縫隙來製作100個方格,將见獅抓(股)= 造之Cdk>tape(註冊商標)貼附於方格上冑,迅速將其於%。 之=向上拉伸而使其_’並根據下述基準來算出密接率。 密接率(%)=(未剝落之方格數/合計方袼數100)x100 又,針對實施例i〜7、比較例Wl2、及參考例卜3的 100124540 49 201223758 光學薄膜,亦求出於溫度25°C、濕度40%下調濕24小時後, 於溫度30°C、濕度40%下以每小時500 W/m2之光量照射紫 外線192小時後的密接率。將耐UV試驗前後之光學薄膜的 密接率之測定結果一併示於表1中。 100124540 50 )/D6 采鹊_ 防止*|JL| 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 X X 〇 X X 〇 〇 〇 X X X 〇 g 耐UV試 驗木1後 TAC/AS/HC 〇 1—^ g ο ••Η § ο ο ο o o o o 〇 o o 〇 ο o o o o .〇 铤 W η 波 謝· 对UV試驗* 1前 〇 ο Ο Ο Ο ο r"H § o o o ο s o o o s TAC/AS 〇 ο Ο ο ο Ο Ο Ο o o o o o o ο ο ο o § o m o o o o W ^ F-i ^ W _喵已 德 < 袒 lxio" 1 2χ109 1 ΙχΙΟ9 1 2xl08 1 1 4χ109 1 1 ΐχίο11 1 5χ1〇" 2xl08 2xl09 | 2xl08 1 ΙχΙΟ12 1 5χ1012 1 | 3xl010 1 1超過ίο13 ΙχΙΟ12 2χ108 2x10s 2xl010 超過1013 超過1013 超過10u 2xl09 抗靜電層溶劑 MEK ΜΕΚ ΜΕΚ ΜΕΚ ΜΕΚ MEK/PGME=50/50 ΜΕΚ MEK MEK MEK MEK MEK MEK ΜΕΚ ΜΕΚ ΜΕΚ MEK MEK PGME MEK MEK MEK am «I ^—s 键E &- 5 装 C/(B+C) ΓΟ 寸 00 Μ Ά o o 寸 00 ΓΟ 卜 o o 抗靜電劑(A) 調配比例(%) A/(A+B+C) 1 < ν〇 Ο fn s ㈧⑼(CR 調配量 (質量份) A/B/C 1/64/35 1 1/95/4 30/46/24 30/69/1 15/70/15 30/46/24 30/46/24 30/0/70 1/99/0 30/46/24 30/46/24 30/46/24 30/46/24 30/46/24 ! 0.6/95.4/4 :35/40/25 30/69.5/0.5 30/40/30 ! 30/46/24 30/46/24 30/46/24 60/40/0 丙烯酸胺基甲酸酯(C) 分子量 1000 1000 1000 1000 1000 1000 11000 1000 未調配 1000 1000 1 1500Π ο g :20000 1000 1000 1000 1000 1000 1263 1000 1000 官能基數 VO ο \〇 ON v〇 v〇 (N 'Ο ν〇 ο v〇 v〇 v〇 v〇 多官能單體(B) 分子量 00 〇〇 00 00 00 00 00 fO 〇〇 CN <N (N | 1263 I 00 1〇 00 l〇 〇〇 00 ΙΟ 00 in 00 tr> 00 00 in oo l〇 OO in oo 官能基數 VC Ό ν〇 \〇 νο v〇 他, •P® < VO ν〇 ν〇 v〇 v〇 VO Ό \D \〇 Ό 抗靜電劑_ (A) _ί < < < C < c < c c < < c < < C <: c c < PQ CQ 1實施例11 ΓΤ施例2 1 1實施例3 1 1實施例4 1 1實施例5 1 |實施例6 1 |實施例7 1 比較例1 |比較例2 1 |比較例3 | 比較例4 比較例5 比較例6 比較例7 比較例8 比較例9 |比較例io| 比較例11 1參考例11 比較例12 1參考例21 1參考例31 5?,ql«^il5-wf#^«w 女 Xfis 怒fr-硪谇遛裝¢¢^¢1--6-華3塯齒&-硪筚智发肊食琪10|绪** _(%0寸妨嗖,〇。0£靶想齿七361某蚝1^^^5/赛0沄哲,【'|#3:鋁笈>11|^1* is 寸CSS2 201223758 (結果之總結) 根據表1 ’實施例卜7中均獲得良好之積層體(抗靜電層) 勺表面電卩值’且光學薄膜之密接性亦良好。又,光學特性及 外觀亦良好。 然而’於tt較例卜2巾,*於抗靜電層驗成物中未包含 多官能單體⑻或_酸胺基甲酸_),故賴耐uv試驗前 之密接率良好,但耐UV試驗後之密接率較差。 於比較例3中,由於多官能單體⑻為單官能,故而未獲得 充分之密接率。 於比較例4中,多官能單體(B)之分子量超過1〇〇〇 ,且密接 率較低,尤其耐UV試驗後之密接率較低。可認為其原因在於: 多官能單體(B)朝TAC基材之滲透不充分,TAC基材與抗靜電 層之密接性變得不充分。 於比較例5中,丙烯酸胺基甲酸酯(C)之官能基數為2而較 少’且密接率較低,尤其耐UV試驗後之密接率較低。可認為 其原因在於:由丙浠酸胺基曱酸酯(C)所引起之交聯較少,抗 靜電層與HC層之密接性變得不充分。 於比較例6中,丙烯酸胺基甲酸酯(C)之分子量未滿1000, 尤其耐UV試驗後之密接率較低。可認為其原因在於:由於丙 烯酸胺基曱酸酯(C)過度滲透至TAC基材内,故而抗靜電層與 HC層之密接性變得不充分。 於比較例7中’丙烯酸胺基曱酸酯(Q之分子量超過10000, 100124540 52 201223758 且密接率祕,尤其耐uv錄後之雜輪低。表面電阻值 亦較高,可認為其相在於:丙職絲甲㈣(C)未完全渗 透至TAC基材内,抗靜電層中之抗靜電劑(A)之相對量變少。 於比較例8中,抗靜電劑(A)之含有比例較少,表面電阻值 變高 於比較例9中,抗靜電劑(A)之含有比例較多,抗靜電性良 好’但由於成為黏合劑之多官能單體⑻及丙烯酸胺基甲酸醋 (C)之量變少’故而於耐清試驗前後密接率較低。 於比較例1G中’由於多官能單體⑻之含有_較多,丙稀 酸胺基甲_(C)之含有比例較少’故而密接率較低,尤其耐 UV試驗後之密接率較低。 於比車乂例11巾’由於丙烯酸胺基曱酸酯(C)之含有比例較 多’多官能單體(B)之含有比例較少,故而耐uv試驗前密接 率良好’但耐…試驗後之密接率較低。 ;多、考例1中’密接率較低,表面電阻值較高。可認為其原 j由於將k靜電層驗成物中之溶劑僅設為被渗透溶 I電層:丙烯酸胺基甲酸醋⑹未充分滲透STAC基材内,抗 月、曰、之抗靜電劑(A)之相對量變少。 曱酸12中,由於未使用作為疏水性賴之_酸胺基 故而四峽鹽過度分散,表面電阻值較高。因此, 亦未獲較_$防止性。 u J 2中,個金屬微粒子作為抗靜電齊卜由於設為可 100124540 53 201223758 獲得與四級兹鹽之情形相同之全光線透過率之水程度的添加 量(相當少),故而表面電阻值較差。 於參考例3申,為了不考慮全光線透過率而獲得必需之抗靜 電性,調配有比參考例2更多之作為抗靜電劑之金屬微粒子, 因此密接性較差。因添加量較多而存在著色,全光線透過率低 於四級銨鹽之情形(88%)、霧值(〇·8%)變高。 對實施例、比較例及參考例之光學薄膜之灰塵附著防止性進 行評價的結果,於積層體之表面電阻值未滿lx1〇i2 Ω/□之情 形時均良好,但於除此以外之情形時,灰大量附著。即,若為 具有較佳之表面電阻值的抗靜電層,則即便於其上積層有Hc 層,亦可對光學薄膜賦予灰塵附著防止性。 【圖式簡單說明】 圖1係表示本發明之光學薄膜之層構成之一例的示意圖。 圖係表示本%曰月之光學薄膜之層構成之另一例的示意圖。 圖3係表示本發明之偏光板的層構成之一例的示意圖。 【主要元件符號說明】 1 ' 2 光學薄膜 10 三醋酸纖維素基材 20 抗靜電層 30 硬塗層 40 低折射率層 50 保護薄膜 100124540 54 201223758 60 70 80 偏光層 偏光片 偏光板 100124540 55Cellulose Acetate Propionate#. The viscosity of the coating liquid can be adjusted by adding a polymer, thereby having the advantage of facilitating coating. Further, in the above resin composition, photo-radical polymerization may be added as needed. The amount of addition is preferably from 0.8 to 8.0% by mass based on the total solid content of the above resin composition. As the photoradical polymerization initiator, phenethyl acetonide, benzoin, diphenyl hydrazine, phosphine oxide, condensate, and brewing can be used; and 9-oxosulfur. Mountain beta stars, azo compounds, etc. Examples of the acetophenones include 2,2-dimethoxyacetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, and hydrazine-hydroxy-dimethyl ketone. , hydroxy-dimethyl-p-isopropyl phenyl ketone, hydrazine-hydroxycyclohexyl phenyl ketone, 2-methyl sulfonyl thiol 2 咮 基 基 笨 _ 、, 2 _ _ _ _ 2 Hydrazinyl------------------------------ Marriage, benzoin oxime ether, stupid banrene _, benzoin hetero (IV), benzyl ketal, benzoin vinegar, stupid sulfonate, benzoin oxime, Benzophene ether and the like. _ Further, as the diphenyl ketone, diphenyl ketone, hydroxydiphenyl _, 4- cuminyl-4· decyl diphenyl sulfide, 2, 4 di gas diphenyl can be used. Ketone, 4,4-dioxadiphenyl ketone and p-chlorodiphenyl ketone, 4,4,-dimethylaminodiphenyl ketone (latine ketone), 3,3',4,4' - Tetrakis(t-butylperoxycarbonyl)diphenyl ketone or the like. Further, a photosensitizer may be used in combination as a specific example thereof, and examples thereof include n-butyl 100124540 34 201223758 amine, diethylamine, poly-n-butylphosphine, and the like. HC: The film thickness can be adjusted as appropriate, for example, as long as it is a 〇2〇 division, that is, L ^ ' 5 Μ. If it exceeds 15 _, excellent ash cannot be obtained. • If the performance is not satisfied, the hardness becomes Insufficient and intimate 'sexuality is also weak. In general, if the HC layer deposited on the antistatic layer is thick, the dust adhesion prevention performance is deteriorated. However, if it is the composition and composition of the present invention, excellent dust adhesion prevention performance can be obtained. In a preferred embodiment of the optical film of the present invention, the optical film is laminated on the antistatic layer even if the antistatic layer is 1 to 5/zm and the HC layer is 5 to 15 A sufficient dust adhesion prevention moon pack and a sufficient adhesion between the antistatic layer and the He layer can be obtained. (Other layer) In the optical film of the present invention, in order to improve the antireflection property of the optical film, the surface of the HC layer opposite to the antistatic layer can be removed from the range of the gist of the present invention. Other layers such as a high refractive index layer, a medium refractive index layer, a low refractive index layer, an antiglare layer, and an antifouling layer are provided for antiglare property and antifouling property. '(High refractive index layer and medium refractive index layer) The high refractive index layer and the medium refractive index layer are layers provided to adjust the reflectance of the optical film of the present invention. In the case where the high refractive index layer is destroyed, it is not shown, but is usually disposed adjacent to the TAC substrate side of the low refractive index layer. Further, in the case where the medium refractive index layer is provided, although not shown, the medium refractive index layer, the high refractive index layer high refractive index layer, and the medium refractive index layer are usually provided in order from the TAC base 100124540 35 201223758 material side. The main person is the rate layer. = Adjust the Weis of the bribe. </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> Titanium (refractive index: 2·3 to 2.7), cerium oxide (refractive index · 195) * indium oxide (refractive index: 1.95), doped tin oxide (refractive index: tin-doped oxygen =, 87), oxidation error (refractive index: 2 · group Syria County, specifically, the refractive index of the high refractive index layer is preferably 15 〇 ~ (four) μ refractive index layer of the refractive index is lower than the refractive index of the high refractive index layer, compared to 2.00 The high-refractive-index layer and the medium-refractive-index layer of the squid 1.5 are 50 to 300 nm. The film thickness of the (low-refractive-index layer) may be appropriately adjusted, and the low-refractive-index layer preferably contains cerium oxide or lanthanum fluoride. A composition having a low refractive index, a composition of a binder, or a cured product of a composition for a low refractive index layer containing a fluorine-containing resin such as a difluoro(tetra) (tetra) copolymer can form a conventionally known low refractive index layer. In the composition for forming the low refractive index layer, in order to lower the refractive index of the low refractive index layer, it may also contain hollow particles. Hollow particle refers to a particle having a shell layer and having a porous structure or a void inside the outer layer surrounded by a shell layer. The porous structure or cavity contains air (refractive index: 1) by making low refraction. The rate layer contains hollow particles having a refractive index of 1.20 to 1.45, and the refractive index of the low refractive index layer can be lowered. The average particle diameter of the hollow particles is preferably from 1 to 10 nm. The hollow particles can use a previously known low refractive index. The user of the layer may, for example, be a fine particle having a void as described in Japanese Laid-Open Patent Publication No. 2008-165040. When the number average primary particle diameter of the fatty acid metal salt particles is less than the lower limit, the following In the case where it is easy to cause agglomeration of the fatty acid metal salt particles or the burying of the fatty acid metal salt particles with the colored resin particles, the printing performance of the carbon powder is adversely affected. On the other hand, when the above-mentioned fatty acid metal salt particles are used When the number average primary particle diameter exceeds the above upper limit, there is a case where the fatty acid metal salt particles are easily self-colored resin particles. When it is separated (disengaged), it is not possible to sufficiently impart the function of the additive (the function of imparting charge stability and fluidity to the toner) to the toner particles, which adversely affects the printing performance of the toner. Antiglare layer) The antiglare layer contains a cured product of a composition for an antiglare layer containing a binder component and an antiglare agent, and the binder component may be a polyfunctional monomer or the like listed in the composition for an antistatic layer. Examples of the antiglare agent include fine particles, and examples thereof include styrene particles (refractive index: 1.59), melamine particles (refractive index: 1.57), and acrylic particles 100124540 37 201223758 (refractive index: 1.49). The average particle diameter of the fine particles is preferably from 100 to 500 nm. The content of the fine particles to which the anti-glare property is applied is preferably 2 to 30% by mass based on the total mass of the binder component contained in the composition for an anti-glare layer. (Antifouling layer) According to a preferred aspect of the present invention, in order to prevent the outermost surface of the optical film from being stained, an antifouling layer may be provided on the outermost surface of the optical thin film opposite to the TAC substrate. The antifouling layer can further improve the antifouling property and the scratch resistance of the optical film. The antifouling layer contains a cured product of an antifouling layer composition containing an antifouling agent and a binder component. As the binder component of the composition for an antifouling layer, a conventionally known one can be used. For example, a polyfunctional monomer exemplified as the composition for an antistatic layer can be used. The antifouling agent to be contained in the antifouling layer composition can be appropriately selected from one or two or more kinds selected from the known antifouling agents such as a leveling agent. The content of the antifouling agent is preferably 0.1 to 5% by mass based on the total mass of the binder component contained in the antifouling layer composition. (Manufacturing Method of Optical Thin Film) The method for producing the optical film of the present invention is not particularly limited as long as it is a layer forming structure of the optical film, and a conventionally known method can be used. As an example, the method includes the steps of: (1) preparing a cellulose triacetate substrate; (11) preparing the composition for an antistatic layer and a composition for a hard coat layer; (iii) the surface of the substrate of the 100124540 38 201223758 TAC; The composition for the antistatic layer is coated on the side to form a coating film; (IV) the coating film of the composition for an antistatic layer is light-irradiated to be cured to form an antistatic layer; (v) an antistatic layer The coating composition for the hard coat layer is applied to form a coating film, and (vi) the coating film of the composition for the HC layer is irradiated with light to be cured to form an HC layer. Further, in the above step (iv), the coating film of the composition for an antistatic layer may not be completely cured, and half cured, and coated on the semi-hardened coating film. The HC layer was coated with a composition to form a coating film, and the semi-cured coating film was combined with the coating film of the HC layer composition, and then subjected to light irradiation, and then completely cured to obtain an optical film. By using the semi-hardening method as described above, there is an advantage that the adhesion between the antistatic layer and the HC layer is improved. The coating method is not particularly limited as long as it is a conventionally known method, and a gravure coating method, a spin coating method, a dipping method, a spray method, a slant plate coating method, a bar coating method, a roll coating method, or the like can be used. Various methods such as meniscus coating method, fast drying printing method, screen printing method, and rapid coating method. Light irradiation mainly uses ultraviolet rays, visible light, electron beams or ionizing radiation. In the case of ultraviolet curing, ultraviolet rays emitted from an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a xenon arc lamp, a metal lamp, or the like are used. The amount of irradiation of the energy ray source is % to 5 〇〇 mJ/cm 2 based on the cumulative exposure ray at an ultraviolet wavelength of 365 nm. In the case of semi-hardening, the irradiation amount is 5 to 50 mJ/cm2. In the case of heating in addition to light irradiation, usually at 40 ° C ~! The treatment is carried out at a temperature of 2 °C. 100124540 39 201223758 It is also possible to dry the composition after applying the antistatic layer and before irradiating with light. The drying method is exemplified by a method of drying under reduced pressure, heating and drying, and drying or the like. Further, in the case of drying at normal pressure, it is preferred to carry out drying at 30 to 11 °C. For example, when methyl ethyl ketone is used as a solvent for the composition for an antistatic layer, it can be carried out at a temperature of from room temperature to 80 ° C, preferably from 40 ° C to 70 ° C. A drying step of from 2 to 3 minutes, preferably from 3 seconds to 1 minute. The composition of the HC layer or the low refractive index layer or the like may be prepared in the same manner as the above antistatic layer. Further, in the case where a low refractive index layer or the like is provided on the HC layer, a coating method or a hardening method of the above antistatic layer can be used. (Polarizing Plate) The polarizing plate of the present invention is characterized in that a polarizing plate is provided on the side of the cellulose triacetate substrate of the optical film. Fig. 3 is a schematic view showing the structure of the layer of the polarizing plate of the present invention. The polarizing plate (10) shown in FIG. 3 has an optical film and a polarizing plate 70 laminated with a protective thin layer 50 and a polarizing layer 60, and the polarizing plate 70 is disposed on an optical thin gland _, bis cellulose acetate substrate 1 〇 side. Further, the arrangement of the polarizer sheet on the side of the optical film y and the bis-cellulose substrate not only includes the independent topography #, and the member constituting the optical film doubles as the case of the bias W and the W is also included in the present invention. The situation of the components of the first piece. The polarizer side configuration shows tons. In the case of the _ panel, it is usually the case that the optical thin film is used, and the above-mentioned optical film is used, and 100124540 201223758 is omitted. In the following, the other configuration (polarizing sheet) of the polarizing plate of the present invention is used as a polarizing film used in the present invention, and is generally used in a liquid crystal display device if it has a polarizing property of mosquitoes. Polarizer. In the form of a polarizer, it is not particularly difficult to maintain a predetermined polarization characteristic for a long period of time. For example, it may be composed of only a polarizing layer, or may be a combination of a bonding layer and a polarizing layer. The protective film and the polarizing layer are bonded to each other. 2 (4) A protective film may be formed only on one surface of the polarizing layer, and a protective film may be formed on both surfaces of the polarizing layer. The film is formed by using a thin film formed by forming a polyethylene compound with a thin layer of polyethylene containing a polyethylene glycol to form a complex: ", a film of the film" can protect the polarizing layer, and The second is not particularly limited. As the light transmittance of the protective film, the transmittance is preferably 8. More than or equal to, more preferably 9, the transmittance of the film can be measured by the test method of the total light transmittance of the material. Μ (plastic-transparent == resin of the film), for example, a cellulose derivative, a cyclic polyparaphenylene m, etc., wherein '== biological or ring-dilute smoke resin. 201223758 The protective film can be a single layer, or a layer with multiple layers. The 'Yubao (4) film is a layer with multiple layers, can be stacked with the same layer of the same layer, or laminated Further, the thickness of the protective film can be such that the flexibility of the polarizing plate of the present invention can be made to a desired degree and the size of the polarizer can be made by laminating with the polarizing layer. The range in which the change is within the predetermined range is not particularly limited, but is preferably in the range of 5 to 20, particularly preferably in the range of 15 to 10, and more preferably in the range of 30 to 10. If the thickness is thinner than 5 _, there is a possibility that the size of the polarizing plate of the present invention becomes large. Further, if the thickness is thicker than 2 m, the cleavage is performed when the polarizing plate of the present invention is subjected to the cutting process. Increased chipping, or the possibility of cutting the scissors to wear faster. If the phase difference is used, the use of the protective film having phase difference can make the bias of the present invention an advantage of the panel angle compensation function. As a phase difference of the protective film, if There is no particular limitation on the appearance of the desired phase: the aspect of the difference. As such a case, the example has a constitution including a single layer, and contains a phase-preferring characteristic developing agent, thereby having a phase difference. a state in which a layer of a phase difference layer having a refractive index: a compound having a refractive index is formed on a protective film of the above-mentioned resin, and having a phase difference property = a daily type, such a state The sample can be preferably used. The core (display panel) 100124540 42 201223758 The display panel of the present invention is characterized in that a display is disposed on the triacetate substrate side of the optical film. Listed as LCD, PDP, ELD (Electroluminescent Display 'Electroluminescent Display') (organic EL, inorganic el), crt, touch panel, electronic paper, tablet (TaWetPers〇nalc〇mputer), etc. The invention can also be used for a touch panel, an electronic paper, a flat panel, as a representative LCD system of the display, and a light source device that transmits the light through the back and the backlight. When the above-described display is stolen as an LCD, the optical film of the present invention or the polarizing plate having the optical film is disposed on the surface of the transparent display body. The pDp is another example of the display. The invention comprises a surface glass substrate and a moon glass substrate which is disposed opposite to the surface of the surface substrate and is filled with a discharge gas therebetween. When the display is a PDP, it is also a surface of the surface substrate. The optical film described above is provided on the front panel (long substrate or film substrate). The 'indicator' may be an ELD device that performs vapor deposition on a glass substrate by applying a voltage such as zinc sulfide, diamines, and the like, and controls the voltage applied to the substrate. Or convert the electrical signal into light, and generate a display such as a CRT such as a human I see image. In this case, the optical film is provided on the surface of the top surface of the crucible or the CRT or the front panel thereof. 100124540 43 201223758 [Examples] Hereinafter, the present invention will be more specifically described by way of examples. The invention is not limited by the description. The composition 1 for an antistatic layer having the following composition and the composition 1 for an HC layer were prepared. (Antistatic layer composition 1) Antistatic agent (A): The product name UV-ASHC-01 manufactured by Sakamoto Kasei Co., Ltd. (weight average molecular weight is 20000, solid content is 7〇0/〇, in solid content) The quaternary ammonium salt component is 15 〇/〇): 1 part by mass of the polyfunctional monomer in the solid content (B): dipentaerythritol hexaacrylate (DPHA) (trade name: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., 6 Functionality, molecular weight: 578): 64 parts by mass of amino phthalic acid acrylate (C): Trade name BS577 (6-functional, weight average molecular weight: ι〇〇〇) manufactured by Arakawa Chemical Industry Co., Ltd.: 35 parts by mass of polymerization Starting agent: trade name Irgacurel 84 (l-hydroxycyclohexyl phenyl ketone) manufactured by Ciba Specialty Chemicals Co., Ltd.: 1 part by mass of methyl ethyl ketone: 100 parts by mass (composition 1 for HC layer) dipentaerythritol hexaacrylate (trade name: KAYARADDPHA, manufactured by Sakamoto Chemical Co., Ltd., 6-member, molecular weight: 578): 98 parts by mass of starting agent. Trade name Irgacurel 84 (l-hydroxycyclohexyl) manufactured by Ciba Specialty Chemicals Co., Ltd. Phenyl ketone): 4 parts by mass 100124540 44 201223758 Methyl ethyl group _ : 100 parts by mass For example, a TAC substrate (manufactured by Fuji Film Co., Ltd., TmuL) having a thickness of m was prepared by applying the above-mentioned composition for antistatic layer 1' prepared on one surface of a TAC substrate at a temperature of 70 Å. The heat of the °c is dried in a box for 60 seconds to evaporate the solvent in the crucible, and then the outer surface of the crucible is made so that the cumulative amount of light reaches 50 mJ to harden the coating film, thereby forming a thickness of 25 m in the dry state. The antistatic layer was coated on the antistatic layer obtained, and the composition 1 for the hard coat layer prepared was dried in the same manner as the antistatic layer, and then irradiated with ultraviolet rays so that the integrated light amount was 150 mJ. The coating film was hardened to form a hard coat layer having a thickness of 12 //m at the time of drying, whereby an optical film having an antistatic layer and a hard coat layer in this order from the side of the TAC substrate on one side of the TAC substrate was prepared. Further, in order to measure the surface resistance value of the antistatic layer, the step of forming the antistatic layer on the TAC substrate (TF80UL) in the same manner as the above optical film is also made to have only one side of the TAC substrate. a laminate of electrostatic layers. (Examples 2 to 7) In Example 1 'The amount or type of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) contained in the composition 1 for the antistatic layer are replaced as shown in Table 1 Except for this, IL was used as an optical thin laminate in the same manner as in Example 1 in the manner of 100124540 45 201223758. Further, the acrylic acid S|(C) used in the actual addition of the towel was a trade name of UV-761 GB (manufactured by Nippon Synthetic Co., Ltd.). (Comparative Examples 1 and 2) In the first embodiment, the amount of the antistatic agent (VIII), the b-functional monomer (B), and the amino phthalate oxime contained in the composition 1 for an antistatic layer was used. An optical film and a laminate were produced in the same manner as in Example 1 except that the results were replaced with those in Table 1. (Comparative Example 3) In the first embodiment, as the polyfunctional monomer (B) contained in the composition 1 for an antistatic layer, R128H (monofunctional, molecular weight: 222) manufactured by a sulfonate chemical (stock) was used. In place of DPHA, the amounts of the antistatic agent (A), the polyfunctional monomer (B), and the amino amide amide (C) are replaced as shown in Table 1, respectively, and An optical film and a laminate were produced in the same manner as in Example 1. (Comparative Example 4) In the first embodiment, DPCA60 (6-functional, molecular weight: 1263) manufactured by Nippon Kayaku Co., Ltd. was used as the polyfunctional monomer (B) contained in the composition 1 for an antistatic layer. Instead of DPHA', the amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (c) were replaced as shown in Table 1, respectively. An optical film and a laminate were produced in the same manner. (Comparative Example 5) 100124540 46 201223758 In Example 1, as a composition for an antistatic layer, a bismuth decanoate (C) contained in 丨 'EBECRYL 270 manufactured by Daicel-Cytec Co., Ltd. (2) Functionality, molecular weight of 15 〇〇) instead of BS577, the amount of antistatic agent (A), polyfunctional monomer (8) and urethane acrylate (c) were replaced as shown in Table 1, respectively. An optical film and a laminate were produced in the same manner as in Example 以外. (Comparative Example 6) In Example 1, ECECRYL 5129 (6-functional, molecular weight 800) manufactured by Daicel-Cytec (manufactured by Daicel-Cytec) was used as the amino phthalic acid acrylate (C) contained in the composition 1 for an antistatic layer. In place of BS577, the amounts of the antistatic agent (A), the polyfunctional monomer, and the amino phthalic acid acrylate (c) were replaced as shown in Table 1, except that the same as in Example 1. The optical film and the laminate are produced in this manner. (Comparative Example 7) In the first embodiment, BS371MLV (50-functional, molecular weight 20,000) manufactured by Arakawa Chemical Industry Co., Ltd. was used as the amino phthalic acid acrylate (C) contained in the composition 1 for an antistatic layer. In place of BS577, the antistatic agent (A), the polyfunctional monomer (B), and the amino phthalic acid acrylate (the amounts of hydrazine are replaced as shown in Table 1, respectively, and An optical film and a laminate were produced in the same manner. (Comparative Examples 8 to 11) In the first embodiment, the antistatic 100124540 47 201223758 agent (A) and polyfunctional monomer contained in the composition 1 for an antistatic layer were used. An optical film and a laminate were produced in the same manner as in Example 1 except that the amounts of (B) and the amino phthalic acid acrylate (C) were replaced as shown in Table 1. (Reference Example 1) An optical film and a laminate were produced in the same manner as in Example 6 except that the solvent contained in the composition for the antistatic layer 1 was replaced by a solvent other than the non-permeable solvent. (Comparative Example 12) In Example 3, the amine amide group contained in the composition 1 for the antistatic layer was used. Optically produced in the same manner as in Example 3 except that the ester (C) was replaced with caprolactone-modified dipentaerythritol hexaacrylate (trade name: KAYARAD DPCA-60, manufactured by Sakamoto Chemical Co., Ltd.). Thin film and laminate. This compound has a hydrophilic tendency for the same reason as DPHA. (Reference Example 2) In Example 3, the antistatic agent (A) contained in the composition 1 for an antistatic layer was replaced with An optical film and a laminate were produced in the same manner as in Example 3 except that the antistatic agent (B) (metal fine particles: niobium, trade name: ELCOM V3560, manufactured by Nikko V. Co., Ltd.) was used. (Reference Example 3) In the same manner as in Reference Example 2, an optical film and a laminate were produced in the same manner as in Reference Example 2, except that the amount of the antistatic agent (Β) contained in the composition 1 for the antistatic layer was increased as shown in Table 1. 100124540 48 201223758 (Evaluation of Surface Resistance Value of Antistatic Layer) The laminates having the antistatic layer laminated on the substrates of Examples 1 to 7, Comparative Examples 1 to 12, and Reference Examples 1 to 3 were utilized. Resistivity meter (Mitsubishi Chemical Analytech) The manufactured product name is Hiresta ιρ MCP-HT260), and the surface resistance value is measured at an applied voltage of 1000 V. The results are shown in Table 1. Further, the unit of the surface resistance value described in the present case is Ω/sq. (Resistance per unit area) (Evaluation of dust adhesion prevention property of optical film) HC of the optical laminate including the substrate/antistatic layer/hard coat layer produced in the examples and the comparative examples by using a polyester cloth The layer was wiped back and forth 2 times, and then the wiping surface was brought close to the cigarette ash and the dust adhesion prevention was evaluated on the basis of the following criteria. 〇: Gray does not adhere, and has a dust adhesion preventing effect and is good. Χ: A large amount of ash adheres to the effect of preventing dust adhesion. (Evaluation of Adhesiveness of Optical Film) and Opticals of Reference Examples 1 to 3 For Examples 1 to 7 and Comparative Example Films, after adjusting the temperature in a temperature pit and humidity of 40% for 24 hours, the method of the square test according to the rib K5400 , on the hard coated surface! The coffee is separated by a slash, and 11 slits are cut into 100 squares. The lion (share) = Cdk> tape (registered trademark) is attached to the square, and it is quickly added to the square. = = is stretched upward to make _' and the adhesion ratio is calculated based on the following criteria. Bonding rate (%) = (number of squares not peeled off / total square number of 100) x 100 Further, for the examples i to 7, the comparative example W12, and the reference example 3, 100124540 49 201223758 optical film was also obtained. After adjusting the temperature at 25 ° C and a humidity of 40% for 24 hours, the adhesion rate after irradiation with ultraviolet rays for 192 hours at a temperature of 30 ° C and a humidity of 40% at a light amount of 500 W/m 2 per hour was observed. The measurement results of the adhesion ratio of the optical film before and after the UV resistance test are shown in Table 1. 100124540 50 )/D6 Pick _ Prevent *|JL| 〇〇〇〇〇〇〇〇〇〇XX 〇XX 〇〇〇XXX 〇g UV test wood 1 after TAC/AS/HC 〇1—^ g ο • Η § ο ο ο oooo 〇oo 〇ο oooo .〇铤W η 波谢 · For UV test* 1 前 〇 Ο Ο Ο ο r"H § ooo ο sooos TAC/AS 〇ο Ο ο ο Ο Ο Ο Oooooo ο ο ο o § omoooo W ^ Fi ^ W _ 喵 喵 德 <袒lxio" 1 2χ109 1 ΙχΙΟ9 1 2xl08 1 1 4χ109 1 1 ΐχίο11 1 5χ1〇" 2xl08 2xl09 | 2xl08 1 ΙχΙΟ12 1 5χ1012 1 | 3xl010 1 1 more than ίο13 ΙχΙΟ12 2χ108 2x10s 2xl010 more than 1013 more than 1013 more than 10u 2xl09 antistatic layer solvent MEK ΜΕΚ ΜΕΚ ΜΕΚ ΜΕΚ MEK/PGME=50/50 ΜΕΚ MEK MEK MEK MEK MEK MEK ΜΕΚ ΜΕΚ ΜΕΚ MEK MEK PGME MEK MEK MEK am «I ^ —s key E &- 5 Pack C/(B+C) ΓΟ inch 00 Μ Ά oo 寸 00 ΓΟ oo anti-static agent (A) blending ratio (%) A/(A+B+C) 1 < 〇Ο〇Ο fn s (eight) (9) (CR dosage (parts by mass) A/B /C 1/64/35 1 1/95/4 30/46/24 30/69/1 15/70/15 30/46/24 30/46/24 30/0/70 1/99/0 30/ 46/24 30/46/24 30/46/24 30/46/24 30/46/24 ! 0.6/95.4/4 : 35/40/25 30/69.5/0.5 30/40/30 ! 30/46/ 24 30/46/24 30/46/24 60/40/0 Amino acid acrylate (C) Molecular weight 1000 1000 1000 1000 1000 1000 11000 1000 Unmixed 1000 1000 1 1500Π ο g :20000 1000 1000 1000 1000 1000 1263 1000 1000 Functional Group VO ο \〇ON v〇v〇(N 'Ο ν〇ο v〇v〇v〇v〇Polyfunctional monomer (B) Molecular Weight 00 〇〇00 00 00 00 00 fO 〇〇CN < N (N | 1263 I 00 1〇00 l〇〇〇00 ΙΟ 00 in 00 tr> 00 00 in oo l〇OO in oo Functional base VC Ό ν〇\〇νο v〇他, • P® < VO ν 〇ν〇v〇v〇VO Ό \D \〇Ό Antistatic agent _ (A) _ί <<< C < c < cc << c << C <: cc < PQ CQ 1 Example 11 ΓΤ Example 2 1 1 Example 3 1 1 Example 4 1 1 Example 5 1 | Example 6 1 | Example 7 1 Comparative Example 1 | Comparative Example 2 1 | Comparative Example 3 | Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 Comparative Example 8 Comparative Example 9 | Comparative Example io| Comparative Example 11 1 Reference Example 11 Comparative Example 12 1 Reference Example 21 1 Reference Example 31 5?, ql «^il5-wf#^«w Female Xfis Furious fr-硪谇遛¢¢^¢1--6-华3塯齿&-硪筚智发肊食琪10|绪** _(%0 inch 嗖, 〇. 0£靶想齿七361一蚝1^^^5/赛0沄哲,['|#3: Aluminium 笈>11|^1* is inch CSS2 201223758 (summary of results) According to Table 1 'Example In the case of the seventh layer, a good laminated body (antistatic layer) has a surface electric enthalpy value and the optical film has good adhesion. Moreover, the optical characteristics and appearance are also good. However, 'the tt is more than 2 cases, * does not contain polyfunctional monomer (8) or _ acid amine formic acid in the antistatic layer test, so the adhesion rate before the Lai uv test is good, but the UV resistance test The subsequent bonding rate is poor. In Comparative Example 3, since the polyfunctional monomer (8) was monofunctional, sufficient adhesion was not obtained. In Comparative Example 4, the molecular weight of the polyfunctional monomer (B) exceeded 1 Å, and the adhesion rate was low, and the adhesion rate after the UV resistance test was low. The reason for this is considered to be that the penetration of the polyfunctional monomer (B) into the TAC substrate is insufficient, and the adhesion between the TAC substrate and the antistatic layer is insufficient. In Comparative Example 5, the number of functional groups of the urethane acrylate (C) was 2 and less, and the adhesion rate was low, and the adhesion ratio after the UV test was particularly low. The reason for this is considered to be that the crosslinking caused by the acrylic acid decanoate (C) is small, and the adhesion between the antistatic layer and the HC layer is insufficient. In Comparative Example 6, the molecular weight of the urethane acrylate (C) was less than 1,000, and in particular, the adhesion after the UV resistance test was low. The reason for this is considered to be that the adhesion between the antistatic layer and the HC layer is insufficient due to excessive penetration of the acrylamide phthalate (C) into the TAC substrate. In Comparative Example 7, 'acrylic acid amide phthalate (Q molecular weight exceeds 10000, 100124540 52 201223758 and the adhesion rate is secret, especially after the uv recording is low, the surface resistance is also high, which can be considered as: C (4) (C) did not completely penetrate into the TAC substrate, and the relative amount of the antistatic agent (A) in the antistatic layer became less. In Comparative Example 8, the antistatic agent (A) contained less The surface resistance value was higher than that of Comparative Example 9, the antistatic agent (A) was contained in a large proportion, and the antistatic property was good, but the polyfunctional monomer (8) and the urethane carboxylic acid vinegar (C) which are binders were used. Therefore, the amount of adhesion is low. Therefore, in the comparative example 1G, 'the content of the polyfunctional monomer (8) is large, and the content of the amino acid group A (C) is small. The rate is low, especially after the UV test. The ratio of the polyfunctional monomer (B) is higher than that of the ruthenium case 11 because of the high proportion of the amide phthalate (C). Less, so the adhesion rate before the uv test is good, but the resistance is low after the test. The adhesion rate is low and the surface resistance value is high. It can be considered that the original j is only the solvent in the k electrostatic layer test is set to be permeable to the I electric layer: the acrylic acid carboxylic acid vinegar (6) is not sufficiently penetrated into the STAC substrate. The relative amount of the antistatic agent (A) against the moon and the cockroach is small. In the citric acid 12, the tetragonal salt is excessively dispersed and the surface resistance value is high because the amide acid group which is hydrophobic is not used. Also, it is not more _$ preventive. u J 2, a metal microparticle as an antistatic syrup is set to 100124540 53 201223758 to obtain the same amount of water as the fourth-order salt in the case of the total light transmittance ( In the case of the reference example 3, in order to obtain the necessary antistatic property regardless of the total light transmittance, more metal fine particles as an antistatic agent than the reference example 2 are blended, and thus the adhesion is made. It is inferior in nature. It is colored by the addition amount, and the total light transmittance is lower than that of the quaternary ammonium salt (88%), and the haze value (〇·8%) becomes high. For the examples, comparative examples, and reference examples Evaluation of dust adhesion prevention of optical film As a result, it is good when the surface resistance value of the laminate is less than lx1 〇 i2 Ω/□, but in other cases, the ash is largely attached. That is, if it is an antistatic layer having a preferable surface resistance value. In addition, even if an Hc layer is laminated thereon, it is possible to impart dust adhesion prevention property to the optical film. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an example of a layer structure of an optical film of the present invention. Fig. 3 is a schematic view showing an example of a layer configuration of a polarizing plate of the present invention. [Main element symbol description] 1 ' 2 Optical film 10 Triacetyl cellulose substrate 20 Antistatic layer 30 Hard coating layer 40 Low refractive index layer 50 Protective film 100124540 54 201223758 60 70 80 Polarizing layer polarizer polarizing plate 100124540 55
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KR102406865B1 (en) * | 2017-12-18 | 2022-06-10 | 디아이씨 가부시끼가이샤 | Active energy ray-curable composition, and film using same |
CN108802885A (en) * | 2018-04-23 | 2018-11-13 | 深圳市运宝莱光电科技有限公司 | A kind of electromagnetic shielding polaroid and preparation method |
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