201218266 六、發明說明： 【發明所屬之技術領娀】 [0001] 相關申請案之交互參照 [0002] 本申請案於此主張併入參照於西元2010年1〇月28曰在韓 國智慧財產局申請’案號為No· 10-2010-01 06208之韓 國專利申請案的完整内容之優先權效益。 [0003] 此處本揭露係關於一種蝕刻裝置。 【先前技術】 0 [0004] 平板顯示器係包含由石夕氧化物所構成的玻璃基板。因為 玻璃基板為平板顯示器中最重的部件，所以許多研究的 進行係為了發展重量更輕的玻璃基板，以提供更輕更薄 的平板顯示器。 [0005] 其中減輕玻璃基板重量的代表性方法可為縮減玻璃基板 厚度。為了做到這點，蝕刻後的玻璃基板應為平整 (smooth)的。換言之，因為若使用厚度不均勻的玻璃基 板可能會造成平板顯示器之影像品質的瑕疵，所以玻璃 ^ 基板的均齊度（uni f ormi ty )在縮減玻璃基板厚度時是很 重要的。 【發明内容】 [0006] 本實施例之一態樣係直接關於一種玻璃基板蝕刻裝置， 其能夠均勻有效率地蝕刻玻璃基板。 [0007] 依據本發明之一實施例’提供一種能夠蝕刻玻璃基板的 玻璃基板餘刻裝置。所述玻璃基板#刻裝置包含：配置 以貯存钱刻液的液槽、於液槽中並配置以接收水平置於 10013909^^'^ A〇101 第3頁/共26頁 1013011427-0 201218266 其上的玻璃基板的第一平板、以及於液槽中面對第一平 板並配置在第一平板的一側上以製造蝕刻液流動的循環 〇〇 早元。 [0008] [0009] [0010] [0011] [0012] [0013] [0014] 揭環單元可包含面對第一平板的第二平板以及於第二平 板之頂側或底側的旋轉刀片。 第—平板和第二平板在平面視角上可具有圓形形狀。 循壤單元係可進一步包含配置以控制第二平板的驅動單 元。驅動單元係可配置以調整第一平板和第二平板之間 的距離及調整第二平板的旋轉速率。 坡壤基板姓刻裝置係可進一步包含於液槽的侧壁上並鄰 近第一平板且配置以量測玻璃基板的厚度的感測元件、 以及配置以接收來自感測元件的訊號並提供驅動訊號到 驅動單元的控制單元。 玻璃基板餘刻裝置可進—步包含集液管（c〇1 lecting Pipe) ’其係連接到液槽的底側以排放蝕刻液。從玻璃基 板所#刻之材料或顆粒係可藉由蝕刻液的流動而收集到 集液管。 玻璃基板㈣裝置係可進—步包含配置以控制在集液管 中蚀刻液之〃U_動的換流閥（valve)、配置以在蚀刻液通過 換流閥後從⑽j液中移除材料或顆粒的過滤器、配置以 供應#刻液到液槽的供液管、以及配置以在餘刻液通過 過滤器後隸_傳輸到供液管的液槽系。 循裒單S係可配置相對於第—平板水平移動以產生敍刻 10013909^^^ A〇101 第4頁/ 共26頁 1013011427-0 201218266 液的流動。 [0015] 循環單元係可包含配置以控制主體和附著於主體可水平 移動之刀片的操作的驅動早元。驅動單元可配置以調敫 第一平被和主體之間的距離及主體的水平速率。 [0016] 第一平杈在平面視角上係可具有長方形形狀。 [_依據本發狀另—實_，—種麵基板*财置，其 包含配置以貯存蝕刻液之液槽（Vessel)及於液槽中並配 置以接收水平置於其上的玻璃基板之平板。平板係可配 置以旋轉而促使（induce)蝕刻液的流動。 _]玻璃基板仙裝置係可進-步包含配置以控制平板的驅 動單元。驅動單元可配置以控制平板㈣直移動和旋轉 速率。 [0019] 玻璃基板蝕刻裝置可進一步包含感測元件，其係置於液 槽的侧壁上且鄰近於平板，並配置以量測玻璃基板的厚 度；以及控制單元，其係配置以接收來自感測元件的訊 號並提供驅動訊號到驅動單元。 [0020] 依據本發明之另一實施例，一種玻璃基板蝕刻裝置，其 包含配置以貯存蝕刻液的液槽（vessel)和於液槽中並配 置以接收其上的玻璃基板的第一平板。玻璃基板可具有 平行於第一平板的一侧的主平面、以及於液槽中並配置 在第一平板的該侧上以產生蝕刻液的流動的循環單元。 【實施方式】 [0021] 以下將參考附圖對本發明之例示性實施例進行更詳細的 描述。然而，本發明係可以用不同的形式實施，且不應 1013011427-0 画390#單编號A0101 第5頁/共26頁 201218266 绘釋為受本說明書之實施例所限制。相反地，這些實施 例的提供係使得本揭露徹底而完整，並可對所屬技術領 域具有通常知識者完全地傳達本發明的範疇。 [0022] 纟說明曰中’應當理解當一個元件被稱為“在另一個元 件之上”時，其係可以直接置於另一個元件之上，或可 有-個或多個中介元件插置其間。在圖中，相同的參考 符號係全用以代表相同的元件。 [0023] 在坑B月書中’實施例將參照例示性剖面圖和透祝圖而闡 述。因此’實施例中所圖示之形狀係可依據製造技術和/ 或允許的誤差以進行修改。 _]其應了解較雖然使用如第—m等字詞來钦 述不同的7〇件，但是這些元件並不受限於這些字詞。這 些字詞僅是絲區別—元件與另-個S件。在此所闡述 和列舉之實施例係包含其互補實施例。 [0025] 在此所使用以解釋實施例之賴不_錄制本發明。 單數型態的名詞係可包含複數·，除非特別相反地表201218266 VI. Description of the Invention: [Technical Profile of the Invention] [0001] Cross-Reference of Related Applications [0002] This application is hereby incorporated by reference in the Korean Intellectual Property Office of the Korean Government in January, 2010. The priority benefit of the entire content of the Korean Patent Application No. 10-2010-01 06208. [0003] The disclosure herein relates to an etching apparatus. [Prior Art] 0 [0004] A flat panel display includes a glass substrate composed of a stone oxide. Since glass substrates are the heaviest components in flat panel displays, many studies have been conducted to develop lighter weight glass substrates to provide lighter and thinner flat panel displays. A representative method in which the weight of the glass substrate is reduced may be to reduce the thickness of the glass substrate. In order to do this, the etched glass substrate should be smooth. In other words, since the use of a glass substrate having an uneven thickness may cause image quality of the flat panel display, the uniformity of the glass substrate is important in reducing the thickness of the glass substrate. SUMMARY OF THE INVENTION [0006] One aspect of the present embodiment relates directly to a glass substrate etching apparatus capable of uniformly and efficiently etching a glass substrate. According to an embodiment of the present invention, a glass substrate remnant device capable of etching a glass substrate is provided. The glass substrate #etching device comprises: a liquid tank configured to store money engraving liquid, disposed in the liquid tank, and configured to receive horizontally at 10013909^^'^A〇101, page 3/26 pages, 1013011427-0 201218266 The first flat plate of the upper glass substrate and the first flat plate facing the liquid plate and disposed on one side of the first flat plate to produce a circulation of the etching liquid. [0012] [0014] The unwinding unit may include a second flat plate facing the first flat plate and a rotary blade on a top side or a bottom side of the second flat plate. The first plate and the second plate may have a circular shape in a plan view. The orbiting unit may further comprise a drive unit configured to control the second plate. The drive unit is configurable to adjust the distance between the first plate and the second plate and to adjust the rate of rotation of the second plate. The slope substrate substrate device may further include a sensing element on the sidewall of the liquid tank adjacent to the first plate and configured to measure the thickness of the glass substrate, and configured to receive the signal from the sensing element and provide a driving signal To the control unit of the drive unit. The glass substrate re-engraving device may further comprise a liquid collecting tube (c〇1 lecting pipe) which is connected to the bottom side of the liquid tank to discharge the etching liquid. The material or particle system engraved from the glass substrate can be collected into the collecting pipe by the flow of the etching liquid. The glass substrate (4) device can further include a valve that is configured to control the etchant in the sump, and is configured to remove material from the (10)j liquid after the etchant passes through the converter valve. Or a filter of particles, configured to supply a liquid supply pipe that is inscribed into the liquid tank, and a liquid tank that is configured to be transported to the liquid supply pipe after the residual liquid passes through the filter. The cycle S-series can be configured to move horizontally relative to the first plate to produce a quotation. 10013909^^^ A〇101 Page 4 / Total 26 pages 1013011427-0 201218266 Liquid flow. [0015] The circulation unit may include a drive early element configured to control the operation of the body and the blade attached to the body that is horizontally movable. The drive unit is configurable to adjust the distance between the first level and the body and the horizontal rate of the body. [0016] The first flat ridge may have a rectangular shape in a plan view. [_ According to the present invention, the surface substrate* includes a liquid tank (Vessel) configured to store an etching liquid and is disposed in the liquid tank and configured to receive a glass substrate horizontally placed thereon. flat. The plate system can be configured to rotate to induce the flow of the etchant. The _] glass substrate device can further include a drive unit configured to control the slab. The drive unit can be configured to control the flat (4) straight movement and rotation rate. [0019] The glass substrate etching apparatus may further include a sensing element disposed on a sidewall of the liquid tank and adjacent to the flat plate, and configured to measure a thickness of the glass substrate; and a control unit configured to receive the sense The signal of the component is measured and a drive signal is supplied to the drive unit. In accordance with another embodiment of the present invention, a glass substrate etching apparatus includes a first plate that is configured to store a etchant and a first plate that is disposed in the bath and configured to receive the glass substrate thereon. The glass substrate may have a main plane parallel to one side of the first flat plate, and a circulation unit disposed in the liquid bath and disposed on the side of the first flat plate to generate a flow of the etching liquid. [Embodiment] [0021] Exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. However, the invention may be embodied in different forms and should not be construed as being limited by the embodiments of the present specification. </ RTI> </ RTI> 390# single number A0101 page 5 of 26 201218266. Rather, these embodiments are provided so that this disclosure is thorough and complete, and the scope of the invention is fully conveyed by those of ordinary skill in the art. [0022] In the description, it should be understood that when an element is referred to as "above" another element, it can be placed directly on the other element or can be interposed with one or more intervening elements. In the meantime. In the figures, the same reference numerals are used to represent the same elements. [0023] The embodiment of the present invention will be explained with reference to an exemplary cross-sectional view and a plan view. Thus, the shapes illustrated in the embodiments may be modified in accordance with manufacturing techniques and/or permissible errors. _] It should be understood that although different words such as the first-m are used to describe different items, these elements are not limited to these words. These words are only silk differences - components and another - S pieces. The embodiments set forth and enumerated herein include complementary embodiments thereof. [0025] The invention is used herein to explain embodiments. A singular form of a noun may include a plural number unless specifically stated to the contrary
示。“包括（include)，，、“包含（c卿rise)”、Ί 括（including)” 或‘‘治人, · ·、，， 包含（comPrising)，，的意義係 明特性、區域、固定數字、牛驟 r _ 〜双予、步驟、程序、兀件和/或構卡 ’但非排除其他特性、萨 田〜虹a ^ h域、固定數字、步驟'程序、 元件和/或構件。 ]^圖係依據本發明之第—實施财，㈣_玻璃基板 頁/共26頁 125之玻璃基㈣難置⑽的示意圖。第2圖係依據本發 。曰月之第-實施例中，破壤基板姓刻裝置1〇〇中的液槽ιι〇 1〇〇13909Ϊ^單編號 A0101 第 101301142 201218266 [0027] Ο [0028] Ο [0029] [0030] 以及第一平板120和第二平板132之詳細透視圖。第3圖係 依據本發明之第一實施例中，第二平板132和旋轉刀片 135之詳示圖。 參考第1圖到第3圖，玻璃基板蝕刻裝置100包含：配置以 貯存蝕刻液115的液槽110、設置於液槽110中以水平放 置玻璃基板125於其上的第一平板120 (即玻璃基板125 具有放置以面對或背對或平行於第一平板120的頂側的主 平面）、以及設置於液槽110中使蝕刻液115在第一平板 120的頂侧上循環流動的循環單元130。 玻璃基板125可藉由真空黏著方式而置於第一平板120上 。複數個玻璃基板125係可以同樣的方式而提供於第一平 板120上。在此情況下’因為複數個玻璃基板125厚度的 縮減係發生在相同時間或同時發生，所以可降低製造成 本。蝕刻液115可包含氟化鹽、硫酸鹽、亞硝酸鹽、磺酸 鹽、氫氟酸、硫酸、和/或硝酸◊蝕刻液115可加熱以增 加蝕刻速率。玻璃基板125係可為如觸控螢幕面板的顯示 器使用。 循環單元130可包含面對第一平板12〇的第二平板132、 以及置於第二平板132背面（例如，面對第一平板120的一 側）的旋轉刀片135。當由上往下看時，第一和第二平板 120和132可具有圓形形狀。液槽11〇可具有圓柱體形狀 〇 循環單元130可進一步包含用以控制第二平板132的驅動 單元138。驅動單元138可垂直地移動第二平板132。第 10013909^單編號 Α0101 第7頁/共26頁 1013011427-0 201218266 一和第二平板12〇和132之間的距離l可藉由垂直地移動第 二平板1 32而進行調整。驅動單元138可控制第二平板 132的旋轉速率。旋轉刀片135係可產生渦流（v〇rtex flow)使得玻璃基板丨25上之蝕刻液115的流動可受到所 述渦流的影響。 [0031] [0032] 驅動單元138可藉由控制第二平板132的垂直移動和旋轉 速率而調整玻璃基板125的蝕刻速率。驅動單元138可藉 著使用旋轉刀片135而產生姓刻液115的定速流動以餘刻 玻璃基板125的侧邊。Show. “include,”, “include”, “including” or “the person, · ·,,, include (comPrising), the meaning of the meaning, area, fixed number , cattle, r _ ~ double, steps, procedures, components and / or construction card 'but not excluded other characteristics, Sakata ~ rainbow a ^ h domain, fixed numbers, steps 'programs, components and / or components. The figure is based on the first embodiment of the present invention, (iv) _ glass substrate page / a total of 26 pages 125 glass base (four) difficult (10) schematic. Figure 2 is based on this issue. In the first embodiment of the month of the month, the liquid groove in the first-order device of the ground-breaking substrate is ι 〇 〇 〇〇 Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ 单 单 单 单 单 Ϊ Ϊ Ϊ 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 301 [0028] A detailed perspective view of the first plate 120 and the second plate 132. Fig. 3 is a detailed view of the second flat plate 132 and the rotary blade 135 in the first embodiment of the present invention. Referring to FIGS. 1 to 3, the glass substrate etching apparatus 100 includes: a liquid tank 110 configured to store the etching liquid 115, and a first flat plate 120 (ie, glass) disposed in the liquid tank 110 to horizontally place the glass substrate 125 thereon. The substrate 125 has a main plane placed to face or face away from or parallel to the top side of the first flat plate 120, and a circulation unit disposed in the liquid bath 110 to circulate the etchant 115 on the top side of the first flat plate 120 130. The glass substrate 125 can be placed on the first flat plate 120 by vacuum bonding. A plurality of glass substrates 125 can be provided on the first flat plate 120 in the same manner. In this case, since the reduction in the thickness of the plurality of glass substrates 125 occurs at the same time or simultaneously, the manufacturing cost can be reduced. The etchant 115 may comprise a fluoride salt, a sulfate, a nitrite, a sulfonate, a hydrofluoric acid, a sulfuric acid, and/or a cerium nitrate etchant 115 which may be heated to increase the etch rate. The glass substrate 125 can be used as a display such as a touch screen panel. The circulation unit 130 may include a second flat plate 132 facing the first flat plate 12A, and a rotary blade 135 placed on the back side of the second flat plate 132 (for example, facing one side of the first flat plate 120). The first and second plates 120 and 132 may have a circular shape when viewed from the top. The liquid tank 11A may have a cylindrical shape. The circulation unit 130 may further include a driving unit 138 for controlling the second flat plate 132. The driving unit 138 can vertically move the second flat plate 132. No. 10013909^Single number Α0101 Page 7 of 26 1013011427-0 201218266 The distance l between the first and second plates 12A and 132 can be adjusted by vertically moving the second plate 1 32. The drive unit 138 can control the rate of rotation of the second plate 132. The rotating blade 135 is capable of generating a vortex flow so that the flow of the etching liquid 115 on the glass substrate 25 can be affected by the eddy current. [0032] The driving unit 138 can adjust the etching rate of the glass substrate 125 by controlling the vertical movement and the rotation rate of the second flat plate 132. The drive unit 138 can generate a constant velocity flow of the surname 115 by using the rotary blade 135 to engrave the side of the glass substrate 125.
玻璃基板蝕刻裝置1〇〇可進一步包含設置於液槽丨1〇的侧 壁上並位於鄰近於第一平板12〇的位置，以量測破螭基名 125厚度的感測元件140。感測元件14〇可為雷射感測元 件。感測元件140可藉由提供訊號到玻璃基板125並接收 或量測）從玻璃基板125所反射回來的訊號，以量剛玻璃 基板125的厚度。玻璃基板蝕刻裝置1〇〇係可進—步包令 配置以接收來自感測元件140的訊號，並發射驅動訊:: 驅動單元138的控制單元145。蚀刻（或蚀刻掉）之破璃違 板125厚度可藉由使用感測元件14〇量測，且驅動單元 138的速率係可藉由使用控制單元145的驅動訊號而^ 。玻璃基板125可藉由使用感測元件14〇、驅動單元^ 和控制單元145而蚀刻到很小的厚度，例如，大約〇 米。當玻璃基板125具有很小的厚度時，藉著使用 板125就可能縮減顯示器（如觸控螢幕面 71又日日顒开 或有機電激發光裝置）的厚度和重量。玻縣板⑻因 有很小的厚度而可彎曲（或具可撓性）^舉例而言， 第8頁/共26頁 讓39(^單編號Α〇101 1013011427-0 201218266 基板125係可作為可撓式顯示器使用。 [0033] 玻璃基板蝕刻裝置1〇〇係可進一步包含配置以供應蝕刻液 11 5到液槽110的供液管丨6〇、連接到液槽11〇的底部以由 此排放蝕刻液115的集液管175、以及形成於第一平板 120和液槽110之間的排放孔丨5〇。排放孔150係可通過第 一平板120而形成。通過供液管16〇所供應之蝕刻液115 係可藉由循環單元130而循環流動，並且通過排放孔150 而流到集液管175。玻璃基板125可由於蝕刻液11 5的流 動而蝕刻。此稱為“流體流動研磨”。 Ο [0034] Ο [0035] 玻璃基板蝕刻裝置1〇〇係可進一步包含配置以控制集液管 175中蝕刻液115流動的換流閥172、配置在蝕刻液11 5通 過換流閥172後淨化蝕刻液115的過濾器174、以及配置 將過濾器174淨化過的蝕刻液11 5傳送到供液管160的液 槽泵176 °藉由過濾器174可移除蝕刻液115中自玻璃基 板125蝕刻的材料或顆粒127。蝕刻液115可經由集液管 175、過濾器174、液槽泵176及供液管160而循環。換言 之，蝕刻液115係可再利用。 第4圖係依據本發明之第二實施例中，用以蝕刻玻璃基板 225之玻璃基板蝕刻裝置200的示意圖。為了簡潔敘述之 目的，與第一實施例中的第1圖到第3圖相同之敘述將不 再重複。 [0036] 參考第4圖，依據本發明之第二實施例，玻璃基板蝕刻裝 置200係包含：配置以貯存蝕刻液215的液槽210、設置 於液槽210中以水平置放玻璃基板225於其上的第一平板 100139091^^^ Α〇101 第9頁/共26頁 1013011427-0 201218266 [0037] [0038] [0039] [0040] [0041] 220、以及設置於液槽21〇中在第一平板22〇的底側上使 姓刻液215循環流動的循環單元2 3 〇。 玻璃基板225係可藉由真空黏著方式而置於第-平板220 上。玻璃基板225係可藉由真空黏著方式而置於第一平板 220背面上⑷如’面對循環單元230的一側）。玻璃基板 225係可為如觸控螢幕面板的顯示器使用。 循環單元230係可包含面對第—平板220的第二平板232 及設置於第二平板232的頂側（例如，面對第_平板22〇的 一侧）的旋轉刀片235。當由上往下看時，第一和第二平 板220和232係可具有圓形形狀。液槽21〇係可具有圓柱 體形狀。 循％單7〇230係可進-步包含控制第二平板232的驅動單 兀238。驅動單元238係可垂直地移動第二平板232。第 一和第二平板220和232之間的距離L可藉由垂直地移動第 二平板232而進行調整。驅動單元238可控制第二平板 232的旋轉速率。 驅動單元238可藉由控制第二平板232的垂直移動和旋轉 速率而調整玻璃基板225的蝕刻速率。藉著蝕刻液215的 流動可蝕刻玻璃基板225暴露於蝕刻液215的側邊。 玻璃基板蝕刻裝置200進一步包含設置於液槽21〇的側壁 上，並位於鄰近第一平板220的位置以量測玻璃基板225 厚度的感測元件240。感測元件240可為雷射感測元件。 感測元件240可藉由提供訊號到破璃基板225並接收（或量 測）所反射的訊號以量測玻璃基板225的厚度。玻璃基板 100139091^單編號 A〇101 第10頁/共26頁 1013011427-0 201218266 蚀刻裝置2 G 0係可進-步包絲置以減來自感測元件 240的訊號並發射驅動訊號到驅動單元238的控制單元 245。蝕刻（或蝕刻掉）的玻璃基板225厚度可藉由使用感 測疋件240所量測，且驅動單元238的速率係可藉由使用 控制單元245的驅動訊號而調整。 [0042] Ο [0043] 玻璃基板蝕刻裝置2〇〇係可進一步包含；配置以供應蝕刻 液215到液槽210的供液管26〇、連接到液槽21〇的底側並 由此排放蝕刻液215的集液管275、以及形成於第二平板 232和液槽210之間的排放孔25〇。排放孔25〇可通過第二 平板232而形成。 玻璃基板蝕刻裝置200係可進一步包含配置以控制集液管 Ο [0044] 275中蝕刻液215流動的換流閥272、配置在蝕刻液215通 過換流閥272後淨化姓刻液215的過濾器274、以及配置 將過渡器274淨化過的餘刻液215傳送到供液管26Q的液 槽栗276。藉由過濾器274可從蝕刻液215中移除自玻璃 基板225蝕刻的材料或顆粒227。蝕刻液21 5可經由集液 管275、過濾器274、液槽泵276及供液管26〇而循環。換 言之，蝕刻液215係可再利用。 第5圖係依據本發明之第三實施例中，用以蝕刻玻璃基板 325之玻璃基板蚀刻裝置300的示意圖。第6圖係依據本發 明之第三實施例中，玻璃基板姓刻裝置3〇〇的液槽310、 第一平板320和循環單元330之詳示圖。為了簡潔敘述之 目的，與第一實施例中的第1圖到第3圖相同之敘述將不 再重複。 扉_产單編號 A0101 第11頁/共26頁 1013011427-0 201218266 [〇〇45]參考第5圖和第6圖，依據本發明之第三實施例，玻璃基 板餘刻裝置300係包含.配置以貯存飯刻液3丨5的液槽 31〇、設置於液槽310中以水平置放玻璃基板325於其上 的第一平板320、以及設置於液槽310中在第一平板320 的頂側上（例如，面對循環單元330的一侧）使得蝕刻液 循環流動的循環單元330。 [0046] 玻鴇基板325係可藉由真空黏著方式而置於第一平板320 上。玻璃基板325係可藉由真空黏著方式而置於第一平板 32〇頂侧上。玻璃基板325係可為如觸控螢幕面板的顯示 器使用。 [0047] 循環單元330係可包含設置於第一平板320上方的主體 332、以及設置於主體332的背面（例如，面對第一平板 320的一側）可水平移動的刀片335。當由上往下看時，第 —平板320係可具有長方形形狀。 [0048] 循環單元330係可進一步包含控制主體332移動的驅動單 元338。驅動單元338係可垂直地移動主體332。第一平 板320和主體332之間的距離L可藉由垂直地移動主體332 而進行調整。驅動單元338可進一步控制主體332的水平 移動速率。 [_] 驅動單元338可藉由控制主體332垂直和水平的移動而調 整玻璃基板325的蝕刻速率。藉著蝕刻液315的流動係可 蝕刻玻璃基板325之暴露側。 [0050] 玻璃基板蝕刻裝置300係進一步包含設置於液槽310的側 壁上’並位於鄰近第一平板320的位置以量測玻璃基板 100139G9I*單編號 A〇101 第12頁/共26頁 1013011427-0 201218266 325厚度的感測元件340。感測元件340可為雷射感測元 件。感測元件340可藉由提供訊號到玻璃基板325並接收（ 或量測）由玻璃基板325所反射的訊號以量測玻璃基板325 的厚度。玻璃基板蝕刻裝置300係可進一步包含配置以接 收來自感測元件340的訊號並發射驅動訊號到驅動單元 338的控制單元345。蝕刻（或蝕刻掉）之玻璃基板325厚 度係可藉由使用感測元件340所量測，且驅動單元338的 速率係可藉由使用控制單元345的驅動訊號而調整。 [0051] Ο 玻璃基板蝕刻裝置300係可進一步包含；配置以供應蝕刻 液315到液槽310的供液管360、連接到液槽310的底部並 由此排放蝕刻液315的集液管375、以及形成於第一平板 320和液槽310之間的排放孔350。排放孔350係可通過第 一平板320而形成。 [0052] Ο 玻璃基板蝕刻裝置300係可進一步包含配置以控制集液管 375中蝕刻液31 5流動的換流閥372、配置在蝕刻液31 5通 過換流閥372後淨化蝕刻液315的過濾器374、以及配置 將過濾器374淨化過的蝕刻液31 5傳送到供液管360的液 槽泵376。藉由過濾器374以移除蝕刻液315中自玻璃基 板325蝕刻的材料或顆粒327。餘刻液315可經由集液管 375、過濾器374、液槽泵376及供液管360而循環。換言 之，蝕刻液315係可再利用。 [0053] 依據本發明之第三實施例，玻璃基板蝕刻裝置3〇〇係可將 玻璃基板325蝕刻到很小的厚度。此外，因為玻璃基板蝕 刻裝置300係包含可垂直移動的循環單元330，所以玻璃 基板3 2 5可均勻地蚀刻成相同的厚度。 1001390#單編號 Α〇101 第13頁/共26頁 1013011427-0 201218266 [0054] [0055] [0056] [0057] [0058] [0059] 第7圖係依據本發明之第四實施例中，用以蝕刻玻璃基板 之玻璃基板蝕刻裝置400的示意圖。 參考第7圖，依據本發明之第四實施例，玻璃基板蝕刻裝 置400係包含··配置以貯存蝕刻液415的液槽41〇、以及 设置於液槽410中以水平置放玻璃基板425於其上的平板 420。平板420可旋轉以產生蝕刻液415的流動（例如，相 對流（a relative flow))。 玻璃基板425係可藉由真空黏著方式而置於平板42〇上。 玻璃基板425係可藉由真空黏著方式而置於平板42〇頂側 上。玻璃基板425係可為如觸控螢幕面板的顯示器使用。 玻璃基板蝕刻裝置400係可進一步包含配置以控制平板 420的堪動單元430。驅動單元430可控制平板42〇的旋轉 速率。驅動單元430係可垂直地移動平板42〇。 驅動單元430可藉由控制平板42〇的垂直移動和旋轉速率 而調整玻璃基板425的蝕刻速率。藉著蝕刻液415的流動（ 例如，相對流（a relative flow))可蝕刻玻璃基板425 之暴露侧。 玻璃基板蝕刻裝置400可進一步包含設置於液槽41〇的侧 壁上，並位於鄰近平板420的位置以量測玻璃基板425厚 度的感測元件440。感測元件44〇可為雷射感測元件。玻 璃基板蝕刻裝置400係可進一步包含配置以接收來自感測 元件440的訊號並發射驅動訊號到驅動單元43〇的控制單 元445。蝕刻（或蝕刻掉）的玻璃基板425厚度係可藉由使 用感測元件440所量測，且驅動單元43〇的速率係可藉由 100139091^單編號 A〇101 第14頁/共26頁 1013011427-0 201218266 [0060] [0061] Ο [0062]The glass substrate etching apparatus 1 may further include a sensing element 140 disposed on a side wall of the liquid tank 丨1〇 and located adjacent to the first flat plate 12〇 to measure the thickness of the broken base name 125. Sensing element 14A can be a laser sensing element. The sensing component 140 can measure the thickness of the glass substrate 125 by providing a signal to the glass substrate 125 and receiving or measuring the signal reflected from the glass substrate 125. The glass substrate etching apparatus 1 can be configured to receive the signal from the sensing element 140 and transmit the driving signal: the control unit 145 of the driving unit 138. The thickness of the etched (or etched away) slab 125 can be measured by using the sensing element 14 and the rate of the drive unit 138 can be obtained by using the drive signal of the control unit 145. The glass substrate 125 can be etched to a small thickness by using the sensing element 14A, the driving unit, and the control unit 145, for example, about 〇. When the glass substrate 125 has a small thickness, it is possible to reduce the thickness and weight of the display (e.g., the touch screen surface 71 or the organic electroluminescent device) by using the board 125. The glass plate (8) is bendable (or flexible) because of its small thickness. For example, page 8 of 26 allows for 39 (^ single number Α〇101 1013011427-0 201218266 substrate 125 series can be used as The flexible substrate display is used. [0033] The glass substrate etching apparatus 1 may further include a liquid supply tube 6 configured to supply the etching liquid 11 5 to the liquid tank 110, and connected to the bottom of the liquid tank 11〇 to thereby A liquid collecting pipe 175 that discharges the etching liquid 115, and a discharge hole 〇5〇 formed between the first flat plate 120 and the liquid tank 110. The discharge hole 150 is formed by the first flat plate 120. The liquid supply pipe 16 is passed through The supplied etching liquid 115 can be circulated by the circulation unit 130 and flowed through the discharge hole 150 to the liquid collection tube 175. The glass substrate 125 can be etched due to the flow of the etching liquid 115. This is called "fluid flow grinding". [0035] The glass substrate etching apparatus 1 may further include a converter valve 172 configured to control the flow of the etching liquid 115 in the liquid collection tube 175, and disposed in the etching liquid 115 through the converter valve 172. Filter 174 for post-purifying etchant 115, and configuration will filter 174 The purified etchant 11 5 is transferred to the tank pump 176 of the liquid supply tube 160. The material or particles 127 etched from the glass substrate 125 in the etchant 115 can be removed by the filter 174. The etchant 115 can be passed through the sump 175, the filter 174, the liquid tank pump 176 and the liquid supply tube 160 are circulated. In other words, the etching liquid 115 can be reused. Fig. 4 is a glass for etching the glass substrate 225 according to the second embodiment of the present invention. A schematic view of the substrate etching apparatus 200. For the sake of brevity of description, the same description as the first to third figures in the first embodiment will not be repeated. [0036] Referring to FIG. 4, a second embodiment according to the present invention will be described. For example, the glass substrate etching apparatus 200 includes a liquid tank 210 configured to store the etching liquid 215, and a first flat plate 100139091^^^ Α〇101 which is disposed in the liquid tank 210 to horizontally place the glass substrate 225 thereon. Pages / 26 pages 1013011427-0 201218266 [0037] [0040] [0041] 220, and disposed in the liquid tank 21 在 on the bottom side of the first flat plate 22 使 cycle the surname 215 The circulating unit of flow 2 3 〇. The glass substrate 225 can be vacuum bonded Placed on the - plate 220 on the glass substrate 225 by a vacuum-based adhesive may be placed ⑷ manner as the first side plate on the rear surface 220 'facing circulating unit 230). The glass substrate 225 can be used as a display such as a touch screen panel. The circulation unit 230 may include a second flat plate 232 facing the first plate 220 and a rotary blade 235 disposed on a top side of the second flat plate 232 (for example, a side facing the first plate 22A). The first and second plates 220 and 232 may have a circular shape when viewed from the top. The liquid tank 21 can have a cylindrical shape. The drive unit 238, which controls the second plate 232, can be included in the step by step. The driving unit 238 can vertically move the second flat plate 232. The distance L between the first and second plates 220 and 232 can be adjusted by vertically moving the second plate 232. The drive unit 238 can control the rate of rotation of the second plate 232. The driving unit 238 can adjust the etching rate of the glass substrate 225 by controlling the vertical movement and the rotation rate of the second flat plate 232. The glass substrate 225 is exposed to the side of the etching liquid 215 by the flow of the etching liquid 215. The glass substrate etching apparatus 200 further includes a sensing element 240 disposed on a sidewall of the liquid tank 21〇 and located adjacent to the first flat plate 220 to measure the thickness of the glass substrate 225. Sensing element 240 can be a laser sensing element. The sensing component 240 can measure the thickness of the glass substrate 225 by providing a signal to the glass substrate 225 and receiving (or measuring) the reflected signal. Glass substrate 100139091^Single number A〇101 Page 10/Total 26 page 1013011427-0 201218266 Etching device 2 G 0 can be inserted into the step to reduce the signal from the sensing element 240 and emit the driving signal to the driving unit 238 Control unit 245. The thickness of the etched (or etched away) glass substrate 225 can be measured by using the sensing element 240, and the rate of the drive unit 238 can be adjusted by using the drive signal of the control unit 245. [0043] The glass substrate etching apparatus 2 may further include a liquid supply tube 26 that is configured to supply the etching liquid 215 to the liquid tank 210, is connected to the bottom side of the liquid tank 21, and is thus etched and etched. The liquid collection tube 275 of the liquid 215 and the discharge hole 25A formed between the second flat plate 232 and the liquid tank 210. The discharge hole 25A can be formed by the second flat plate 232. The glass substrate etching apparatus 200 may further include a converter valve 272 configured to control the flow of the etching liquid 215 in the header Ο [0044] 275, and a filter configured to purify the surrogate 215 after the etching liquid 215 passes through the converter valve 272. 274. And arranging the residual liquid 215 purified by the transitioner 274 to the liquid tank 276 of the liquid supply pipe 26Q. Material or particles 227 etched from the glass substrate 225 can be removed from the etchant 215 by a filter 274. The etching solution 215 can be circulated through the liquid collection tube 275, the filter 274, the liquid tank pump 276, and the liquid supply tube 26〇. In other words, the etching solution 215 can be reused. Figure 5 is a schematic illustration of a glass substrate etching apparatus 300 for etching a glass substrate 325 in accordance with a third embodiment of the present invention. Fig. 6 is a detailed view of a liquid tank 310, a first flat plate 320, and a circulation unit 330 of the glass substrate surname device 3 in accordance with the third embodiment of the present invention. For the sake of brevity, the same description as in Figs. 1 to 3 of the first embodiment will not be repeated.扉_Bill No. A0101 Page 11/26 Page 1013011427-0 201218266 [〇〇45] Referring to Figures 5 and 6, in accordance with a third embodiment of the present invention, a glass substrate engraving device 300 is included. a first plate 320 on which the rice substrate 3 is placed, a first plate 320 disposed in the liquid tank 310 to horizontally place the glass substrate 325, and a top portion of the first plate 320 disposed in the liquid tank 310. A circulation unit 330 that circulates the etchant liquid on the side (for example, the side facing the circulation unit 330). [0046] The glass substrate 325 can be placed on the first flat plate 320 by vacuum bonding. The glass substrate 325 can be placed on the top side of the first flat plate 32 by vacuum bonding. The glass substrate 325 can be used as a display such as a touch screen panel. [0047] The circulation unit 330 may include a main body 332 disposed above the first flat plate 320, and a blade 335 disposed on the back surface of the main body 332 (for example, a side facing the first flat plate 320) that is horizontally movable. The first plate 320 may have a rectangular shape when viewed from the top. [0048] The cycling unit 330 can further include a drive unit 338 that controls movement of the body 332. The drive unit 338 can vertically move the body 332. The distance L between the first flat plate 320 and the main body 332 can be adjusted by vertically moving the main body 332. The drive unit 338 can further control the horizontal movement rate of the body 332. [_] The driving unit 338 can adjust the etching rate of the glass substrate 325 by controlling the vertical and horizontal movement of the main body 332. The exposed side of the glass substrate 325 can be etched by the flow of the etchant 315. [0050] The glass substrate etching apparatus 300 further includes a position disposed on the sidewall of the liquid tank 310 and located adjacent to the first flat plate 320 to measure the glass substrate 100139G9I* single number A 〇 101 page 12 / total 26 pages 1013011427 - 0 201218266 325 thickness sensing element 340. Sensing element 340 can be a laser sensing element. The sensing component 340 can measure the thickness of the glass substrate 325 by providing a signal to the glass substrate 325 and receiving (or measuring) the signal reflected by the glass substrate 325. The glass substrate etching apparatus 300 can further include a control unit 345 configured to receive signals from the sensing elements 340 and to emit drive signals to the drive unit 338. The thickness of the etched (or etched away) glass substrate 325 can be measured by using the sensing element 340, and the rate of the drive unit 338 can be adjusted by using the drive signal of the control unit 345. [0051] The glass substrate etching apparatus 300 may further include: a liquid supply tube 360 configured to supply the etching liquid 315 to the liquid tank 310, a liquid collection tube 375 connected to the bottom of the liquid tank 310, and thereby discharging the etching liquid 315, And a discharge hole 350 formed between the first flat plate 320 and the liquid tank 310. The discharge hole 350 is formed by the first flat plate 320. [0052] The glass substrate etching apparatus 300 may further include a converter valve 372 configured to control the flow of the etching liquid 315 in the header 375, and a filter configured to purify the etching liquid 315 after the etching liquid 315 passes through the converter valve 372. The 374 and the etchant 315 configured to purge the filter 374 are transferred to the tank pump 376 of the liquid supply pipe 360. The material or particles 327 etched from the glass substrate 325 in the etchant 315 are removed by a filter 374. The residual liquid 315 can be circulated through the header 375, the filter 374, the tank pump 376, and the supply tube 360. In other words, the etching solution 315 can be reused. According to the third embodiment of the present invention, the glass substrate etching apparatus 3 can etch the glass substrate 325 to a small thickness. Further, since the glass substrate etching apparatus 300 includes the vertically movable circulating unit 330, the glass substrate 325 can be uniformly etched to the same thickness. 1001390#单单Α〇101 page 13/26 page 1013011427-0 201218266 [0055] [0059] [0059] FIG. 7 is a fourth embodiment according to the present invention, A schematic diagram of a glass substrate etching apparatus 400 for etching a glass substrate. Referring to FIG. 7, in accordance with a fourth embodiment of the present invention, a glass substrate etching apparatus 400 includes a liquid tank 41〇 configured to store an etching liquid 415, and a liquid substrate 410 disposed in the liquid tank 410 to horizontally place the glass substrate 425. A flat plate 420 thereon. Plate 420 is rotatable to produce a flow of etchant 415 (e.g., a relative flow). The glass substrate 425 can be placed on the flat plate 42 by vacuum bonding. The glass substrate 425 can be placed on the dome side of the flat plate 42 by vacuum bonding. The glass substrate 425 can be used as a display such as a touch screen panel. The glass substrate etching apparatus 400 can further include a slidable unit 430 configured to control the flat plate 420. The drive unit 430 can control the rotation rate of the plate 42A. The driving unit 430 can vertically move the flat plate 42A. The driving unit 430 can adjust the etching rate of the glass substrate 425 by controlling the vertical movement and the rotation rate of the flat plate 42A. The exposed side of the glass substrate 425 can be etched by the flow of the etchant 415 (e.g., a relative flow). The glass substrate etching apparatus 400 may further include a sensing element 440 disposed on a side wall of the liquid tank 41〇 and located adjacent to the flat plate 420 to measure the thickness of the glass substrate 425. The sensing element 44A can be a laser sensing element. The glass substrate etching apparatus 400 can further include a control unit 445 configured to receive the signal from the sensing element 440 and to emit a driving signal to the driving unit 43A. The thickness of the etched (or etched away) glass substrate 425 can be measured by using the sensing element 440, and the rate of the driving unit 43 can be determined by 100139091^single number A 〇 101 page 14 / total 26 pages 1013011427 -0 201218266 [0062] Ο [0062]
[0063] 使用控制單元445的驅動訊號而調整。 玻璃基板蝕刻裝置400係可進一步包含；配置以供應蝕刻 液415到液槽410的供液管460、連接到液槽410的底部並 由此排放蝕刻液4丨5的集液管475 '以及形成於平板42〇 和液槽410之間的排放孔450。排放孔450係可通過平板 420而形成。 玻璃基板钱刻裝置4 0 0係可進一步包含配置以控制集液管 475中蝕刻液415流動的換流閥472、配置在蝕刻液415通 過換流閥472後淨化蚀刻液415的過濾器474、以及配置 將過濾器474淨化過的#刻液41 5傳送到供液管460的液 槽泵476。藉由過濾器474以移除蝕刻液415中自玻璃基 板425钮刻的材料或顆粒427。#刻液415可經由集液管 475、過濾器474、液槽泵476及供液管460而循環。換言 之，#刻液415係可再利用。 表1顯示依據本發明實施例所得到之玻璃基板的厚度與依 據比較範例所得到之玻璃基板的厚度的比較。在下列表1 中，S1代表比較範例，其中其基板係浸泡在蝕刻液中蝕 刻所得’而S2代表本發明實施例，其中其基板係使用依 據本發明實施例之玻璃基板蝕刻裝置蝕刻所得》 如下列表1所示’依據本發明實施例之基板厚度係可降低 至比較範例之基板厚度的約十分之一。此外，依據本發 明之實施例所製造之基板係具有良好之可撓性及可有約 10公分半徑的曲率。 表1 腿細产單編號删1 第15頁/共26頁 1013011427-0 201218266[0063] The adjustment is performed using the driving signal of the control unit 445. The glass substrate etching apparatus 400 may further include; a liquid supply pipe 460 configured to supply the etching liquid 415 to the liquid tank 410, a liquid collecting pipe 475' connected to the bottom of the liquid tank 410 and thereby discharging the etching liquid 4丨5, and forming A discharge hole 450 between the flat plate 42 and the liquid tank 410. The discharge holes 450 are formed by the flat plate 420. The glass substrate engraving device 400 may further include a converter valve 472 configured to control the flow of the etching liquid 415 in the liquid collection tube 475, a filter 474 disposed to clean the etching liquid 415 after the etching liquid 415 passes through the switching valve 472, And a tank pump 476 that delivers the etched liquid 41 5 cleaned by the filter 474 to the liquid supply pipe 460. The material or particles 427 imprinted from the glass substrate 425 in the etchant 415 are removed by a filter 474. The engraving liquid 415 can be circulated through the liquid collection tube 475, the filter 474, the liquid tank pump 476, and the liquid supply tube 460. In other words, #刻液415 is reusable. Table 1 shows a comparison of the thickness of the glass substrate obtained according to the embodiment of the present invention and the thickness of the glass substrate obtained according to the comparative example. In the following Table 1, S1 represents a comparative example in which the substrate is etched in an etching solution and S2 represents an embodiment of the present invention, wherein the substrate is etched using a glass substrate etching apparatus according to an embodiment of the present invention. 1 shows that the thickness of the substrate according to the embodiment of the present invention can be reduced to about one tenth of the thickness of the substrate of the comparative example. Moreover, substrates made in accordance with embodiments of the present invention have good flexibility and can have a curvature of about 10 cm radius. Table 1 Leg detail number 1 delete Page 15 / 26 page 1013011427-0 201218266
灸附之申凊專利範圍係旨在涵蓋任何落於本發明之真正 精神與範所進行之修改、增強、以及其他實施例。 因此’在法律允許的最大程度下，本發明的範疇是由以 下申叫專利範圍及其等效物允許的最廣泛詮釋而決定， 且不應限制或侷限於上述詳細描述。 【圖式簡單說明】 [0066]涵括於本發明之附圖係提供以對本發明的實施例作進— 步的瞭解，且其結合並構成本說明書的一部份。圖示繪 不本發明之例示性實施例，且與闡述一同作為本發明原 則之解釋。於圖中： 第1圖係依據本發明之第一實施例中玻璃基板蝕刻裝置的 示意圖； 第2圖係依據本發明之第一實施例中，玻璃基板触刻裝置 的液槽和平板之詳示圖； 第3圖係依據本發明之第一實施例中，破璃基板蝕刻裝置 100139G9I*1 單編號 A0101 第16頁/共26頁 1013011427-0 201218266 的平板和旋轉刀片之詳示圖； 第4圖係依據本發明之第二實施例中玻璃基板蝕刻裝置的 示意圖； 第5圖係依據本發明之第三實施例中玻璃基板蝕刻裝置的 不意圖， 第6圖係依據本發明之第三實施例中，玻璃基板蝕刻裝置 的液槽、平板和循環單元之詳示圖；以及 第7圖係依據本發明之第四實施例中玻璃基板蝕刻裝置的 示意圖。The scope of the patent application of the moxibustion is intended to cover any modifications, enhancements, and other embodiments of the present invention. Therefore, to the extent permitted by law, the scope of the invention is determined by the broadest interpretation of the scope of the claims and the equivalents thereof, and should not be limited or limited. BRIEF DESCRIPTION OF THE DRAWINGS [0066] The accompanying drawings, which are incorporated in the claims The illustrations are not intended to be illustrative of the principles of the invention. In the drawings: FIG. 1 is a schematic view of a glass substrate etching apparatus according to a first embodiment of the present invention; and FIG. 2 is a detailed view of a liquid tank and a flat plate of a glass substrate touch etching apparatus according to the first embodiment of the present invention. FIG. 3 is a detailed view of a flat plate and a rotary blade of a glass substrate etching apparatus 100139G9I*1 single number A0101 page 16/26 page 1013011427-0 201218266 according to the first embodiment of the present invention; 4 is a schematic view of a glass substrate etching apparatus according to a second embodiment of the present invention; FIG. 5 is a schematic view of a glass substrate etching apparatus according to a third embodiment of the present invention, and FIG. 6 is a third aspect of the present invention. In the embodiment, a detailed view of a liquid tank, a flat plate, and a circulation unit of the glass substrate etching apparatus; and a seventh drawing of the glass substrate etching apparatus according to the fourth embodiment of the present invention.
[0067] Ο 【主要元件符號說明】 100、200、300、400 :玻璃基板蝕刻裝置 110、210、310、410 :液槽 115、215、315、415 :蝕刻液 120、220、320 :第一平板 420 :平板 125、225、325、425 :玻璃基板 127 ' 227 ' 327、427 :材料或顆粒 130、230 ' 330 :循環單元 430 :驅動單元 132、232 :第二平板 332 :主體 135、235 :旋轉刀片 335 :刀片 138、238、338 :驅動單元 140、240、340、440 :感測元件 145、245、345、445 :控制單元 1013011427-0 1001Μ091*單編號Α〇101 第17頁/共26頁 201218266 150、250、350、450 : 4非放iL 160、260、360、460 :供液管 172、272、372、472 :換流閥 174、 274、374、474 :過濾器 175、 275、375、475 :集液管 176、 276、376、476 :液槽泵 L :距離 腿·#單編號A_ 1013011427-0 第18頁/共26頁Ο [Description of main component symbols] 100, 200, 300, 400: glass substrate etching apparatus 110, 210, 310, 410: liquid tanks 115, 215, 315, 415: etching liquids 120, 220, 320: first Plate 420: plate 125, 225, 325, 425: glass substrate 127 '227' 327, 427: material or particles 130, 230' 330: circulation unit 430: drive unit 132, 232: second plate 332: body 135, 235 Rotating blade 335: blade 138, 238, 338: drive unit 140, 240, 340, 440: sensing element 145, 245, 345, 445: control unit 1013011427-0 1001 Μ 091 * single number Α〇 101 page 17 / total 26 pages 201218266 150, 250, 350, 450: 4 non-release iL 160, 260, 360, 460: liquid supply pipes 172, 272, 372, 472: converter valves 174, 274, 374, 474: filters 175, 275 , 375, 475: liquid collection pipe 176, 276, 376, 476: liquid tank pump L: distance leg · #单号 A_ 1013011427-0 Page 18 of 26