JP2009290169A - Method for manufacturing oscillator - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an oscillator, in which a terminal point of etching is easily detected and oscillation characteristics of the formed oscillator is easily and surely maintained constant, and a wet etching device. <P>SOLUTION: The oscillator 112 is formed on a substrate 111 in etchant 102 by wet etching, and when the oscillator 112 having target oscillation characteristics is completely formed, the wet etching is stopped. In order to detect a stop point of the wet etching, an oscillation state of the oscillator 112 excited by an excitation means 104 with respect to the target number of oscillations is detected at least once in the etchant 102 by a detection means 105. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

The present invention relates to a method for manufacturing a vibrator by wet etching, a wet etching apparatus for forming a vibrator by wet etching, and the like.

In processing a vibrator by wet etching, detection of the end point of etching is an important technical matter. For the detection of the end point in wet etching, conventionally, a method based on time management or a method in which a thickness sensor 51 is provided as shown in FIG. 7A and the etching process is performed while monitoring the thickness of the etched portion of the semiconductor wafer 41 is known. (See Patent Document 1). In FIG. 7A, k is a predetermined measurement point, B is a light beam such as infrared rays, 41a is a lower surface such as a circuit surface, 41b is an etching surface, 42a is a recess, and 43 is a mask.

On the other hand, as a method of etching while monitoring the operation characteristics of the object to be etched, a method as shown in FIG. 7B is known (see Patent Document 2). In this technique, in a dry etching apparatus having a dry etching means 1 and a housing 4, the crystal resonator 2 is arranged so as to be etched under the same conditions as the material to be etched 5. The film thickness control device 3 monitors the frequency of the crystal unit 2 during the etching operation, obtains the weight removed from the crystal unit 2 based on the change in the frequency, and when this reaches a predetermined value Stop etching.
JP 2001-144068 Japanese Unexamined Patent Publication No. 2007-115939

However, in the technique of Patent Document 1, only the thickness of the etched portion is monitored during the etching process. In addition, the technique of Patent Document 1 can indirectly monitor the etching amount of the material to be etched and control the amount to be constant, but controls the resonance frequency when the material to be etched is a vibrator. It is not easy to do.

In view of the above problems, the method for manufacturing a vibrator of the present invention includes a first step of forming a vibrator on a substrate in an etching solution by wet etching, and a second step of stopping the wet etching. Further, the vibrator is excited between the first step and the second step, and a vibration state with respect to a target frequency of the excited vibrator is detected at least once in the etching solution. And a third step.

In view of the above problems, the wet etching apparatus of the present invention includes an etching tank for holding an etching solution, excitation means for exciting an object to be etched, and detection means. The detection means detects a vibration state of the object to be etched that is excited in the etching solution by the excitation means.

According to the present invention, when an oscillator is formed by processing an object to be etched by wet etching, the vibration state of the object to be etched excited in the etching solution is detected. Therefore, the end point of etching can be easily determined by detecting the target vibration state, and the vibration characteristics of the formed vibrator, in particular, the resonance frequency of the vibrator can be easily maintained with high accuracy. Can do.

A basic embodiment of a method for manufacturing a vibrator of the present invention includes a first step of forming a vibrator on a substrate in an etching solution by wet etching, and a second step of stopping the wet etching. . Then, between the first step and the second step, the vibrator is excited, and a vibration state with respect to a target frequency such as an amplitude of the excited vibrator and a resonance frequency is etched. A third step of detecting at least once in the liquid; As a result, the vibration state of the vibrator can be detected while etching is in progress, and even if the thickness of the substrate varies and the vibration characteristics of the vibrator cannot be controlled even if the etching amount is controlled to be constant. It is easy to keep the vibration characteristics of the vibrator uniform. Then, etching can be performed so that the vibrator is in a resonance state at a target frequency.

More specifically, in the third step, the vibration state of the vibrator is detected by using excitation means for exciting the vibrator and detection means for detecting the vibration state of the vibrator by the excitation means. . In the second step, the wet etching is stopped when it is detected in the third step that the vibrator is in a resonance state at a target frequency. Accordingly, the vibration state can be detected by actually vibrating the vibrator in the etching solution, and the etching can be reliably stopped when the vibrator is in a resonance state at a target frequency.

The frequency of the excitation can be set to coincide with the target frequency and to be constant. In this case, since the vibrator is always excited at the target frequency and constantly vibrates at the target frequency, the detecting means does not need to detect the vibration frequency of the vibrator and the amplitude of the vibrator is maximum. Then, it can be determined that the vibrator is in a resonance state at the target frequency. Therefore, the etching can be stopped more accurately and easily.

The frequency of the excitation can be set so as to include the target frequency and change periodically. In this case, a change in the resonance frequency of the vibrator can be detected at any time during etching, and the progress of the etching of the vibrator can be detected. Therefore, etching can be performed when it can be determined that the vibrator has entered the resonance state at the target frequency. Can be stopped. Therefore, the etching can be stopped more accurately and easily.

The excitation energy can be transmitted to the vibrator using the etching solution as a medium. In this case, the vibrator and the etching liquid can be vibrated simultaneously, and the etching liquid can be stirred, so that the vibrator can be etched with higher accuracy and in a shorter time.

The excitation energy can be transmitted to the vibrator by using a support portion that supports the vibrator as a medium. In this case, the vibration can be efficiently transmitted to the vibrator without being affected by the flow of the etching solution, and the vibration amplitude of the vibrator can be further increased. High accuracy and ease.

An alkaline solution can be used as the etchant. By processing the vibrator using an alkaline solution, high-precision processing by crystal anisotropic etching becomes possible, so that the vibrator can be etched more accurately and easily.

As the etching solution, a mixed acid containing hydrofluoric acid and nitric acid can be used. By processing the vibrator using a mixed acid containing hydrofluoric acid and nitric acid, the vibrator can be processed in a shorter time by taking advantage of the relatively fast etching speed of the mixed acid. Therefore, the vibrator can be provided at a lower cost.

Using a wet etching apparatus having an etching tank for holding an etching solution, excitation means for exciting an object to be etched, and detection means for detecting a vibration state of the object to be etched excited in the etching solution by the excitation means Thus, the vibrator can be formed. With such an etching apparatus, it is possible to easily and inexpensively provide a vibrator having higher performance and good vibration characteristics.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

(First embodiment)
An etching apparatus 100 using a first embodiment of a method for manufacturing a vibrator according to the present invention will be described with reference to the drawings. 1-1 (a) is a front view, and FIG. 1-1 (b) is a cross-sectional view along AA ′ in FIG. 1-1 (a).

A substrate 111 having an etching mask with a predetermined pattern is immersed in an etching solution 102 filled in an etching bath 101 while being supported by a support portion 103. The substrate 111 is, for example, a silicon substrate. As the etchant 102, for example, a mixed acid containing hydrofluoric acid and nitric acid is used. If a combination of silicon, hydrofluoric acid, and mixed acid containing nitric acid is used, the etching rate is relatively fast, and for example, the vibrator 112 having a configuration as shown in FIG. 1-1 (a) can be processed in a shorter time. . Since the vibrator 112 can be processed in a large amount in a short time, the vibrator 112 can be manufactured at a lower cost. The size of the diaphragm of the vibrator 112 supported by the support via the elastic support portion (the length in the direction perpendicular to the vibration axis formed by the elastic support portion) is, for example, about 5 mm. Since the substrate is made of silicon, the vibrator can be manufactured by wet etching at a lower cost.

As shown in FIG. 1-1 (b), the detecting means 105 is disposed in the etching tank 101, and detects at least one of the frequency and amplitude of the vibrator 112 in the etching solution. Further, the excitation means 104 is disposed on the support portion 103. The excitation means 104 excites the vibrator 112 by vibrating. That is, the excitation means 104 transmits vibration to the vibrator 112 using the support portion 103 that supports the vibrator 112 as a medium. The vibration direction of the excitation means 104 is set to a direction for exciting the vibrator 112 more efficiently. For example, when the vibrator 112 is torsionally vibrated, it is preferable to apply a torsional motion around the torsional vibration axis (for example, an axis along the line AA ′ in FIG. 1-1 (a)) to the vibrator 112. If the vibrator 112 is torsionally vibrated, the amplitude of the torsional motion of the vibrator 112 can be made larger than that of other vibration modes. Therefore, the detection unit 105 can detect the vibration state of the vibrator 112 with higher accuracy and ease. Thus, when the support portion 103 applies reciprocating vibration around the axis of the elastic support portion, the torsional vibration of the vibrator 112 can be efficiently generated, and the vibrator 112 is in a resonance state at a target frequency. Large torsional vibration. Thereby, this resonance state can be reliably detected. In this embodiment, the frequency of the excitation means 104 is the etching stop frequency f _s , and the frequency is between 1000 Hz and 20000 Hz, for example. The etching stop frequency f _{s, which} is the target frequency, is theoretically simulated based on, for example, the resonance frequency of the final target that the vibrator 112 should finally have by attaching a magnet or the like to the vibrator 112. It can ask for.

Next, a method for detecting the frequency and amplitude by the detecting means 105 will be described. FIG. 1-2 (a) shows the configuration of the detection means 105 of the present embodiment. The detection means 105 includes a light source 105a and a photodetector 105b. The light source 105a and the photodetector 105b are disposed so as to form an angle θ _D with respect to the vibrator 112 in the etching solution 102. Laser light is irradiated from the light source 105a toward the vibrator 112, and the laser light reflected by the vibrator 112 enters the photodetector 105b. When the laser beam from the light source 105a is set so as to be perpendicularly incident on the diaphragm of the vibrator 112 when in the neutral position as shown in FIG. In 2 (a), the laser beam enters the photodetector 105b when the angle θ _D / 2 is swung to the left. By using a light source and a light detector as detection means, it is possible to detect the vibration state of the vibrator more accurately and easily.

FIG. 1-2 (b) is a graph showing the relationship between the vibration state of the vibrator 112 and the output of the photodetector 105b. Here, θ _A is the amplitude (amplitude angle) of the vibrator 112, θ _D is the angle formed by the light source 105a and the photodetector 105b, T is the vibration period of the vibrator 112, and T _S is the laser beam of the photodetector 105b. Transit time. T _L is the time for the laser beam to pass outside the photodetector 105b (left side of the photodetector 105b in Fig. 1-2 (a)), and T _R is the inside of the photodetector 105b (Fig. 1). -2 (a) represents the time required to pass the photodetector 105b). When laser light enters the photodetector 105b, the output of the photodetector 105b changes. When T _S is sufficiently small (this is normally satisfied), the frequency f and amplitude θ _A of the vibrator 112 can be expressed by the following equations (1-1) and (1-2), respectively. Therefore, if it is desired to obtain the vibration frequency and amplitude of the vibrator 112, the detection means calculates the vibration frequency and amplitude from the time signal detected by the photodetector 105b and the equations (1-1) and (1-2). Can be detected.

A method for detecting a resonance state and a method for stopping etching by the detecting means 105 of the vibrator 112 in the etching solution 102 in this embodiment will be described. FIG. 2A is a graph showing the time change (here, constant) of the vibration frequency of the excitation means 104 of this embodiment, and FIG. 2B shows the time change of the resonance frequency of the vibrator 112 during etching. It is a graph. FIG. 2 (c) is a graph showing the change over time of the amplitude of the vibrator 112 during the etching. Although FIGS. 2 (a) the excitation means 104 is representative As for continuing operation in the above f _s, or in the manner that the intermittent operation in the above f _s. In the etching process, for example, after the vibrator 112 is formed on the substrate 111 to an appropriate position, the vibrator 112 is excited by the excitation means 104 and vibrates. Since the vibrator 112 is excited by the excitation means 104, it vibrates at the same frequency as that of the excitation means 104. In this embodiment, since the excitation means 104 vibrates at the etching stop frequency f _s , the vibration frequency of the vibrator 112 is always equal to the etching stop frequency f _s . However, when the resonance frequency of the vibrator 112 and the etching stop frequency f _s that change as shown in FIG. 2B are greatly different, the amplitude of the vibrator 112 is extremely small (see FIG. 2C).

As etching of the vibrator 112 proceeds, the size or shape of the vibrator 112 changes, and the resonance frequency of the vibrator 112 changes as shown in FIG. As time approaches the t _s, as shown in FIG. 2 (b) and (c), the difference between the resonant frequency and the frequency f _s of the exciting unit 104 of the oscillator 112 decreases, the amplitude of the oscillator 112 To increase. At time t _s , the resonance frequency of the vibrator 112 matches the etching stop frequency f _s, and the amplitude of the vibrator 112 reaches a maximum value A _max . This is a characteristic of the resonance frequency. Therefore, based on this characteristic, when the amplitude of the vibrator 112 reaches the maximum value A _max , the detection unit 105 determines that the vibrator 112 is in a resonance state at the etching stop frequency f _s and stops the etching. . In the present embodiment, the detecting means 105 can detect and detect the amplitude of the vibrator 112 by the time detected by the photodetector 105b and the above equation (1-2). In the present embodiment, since the frequency f of the vibrator 112 is known to be constant, it can be easily determined with high accuracy that the vibrator is in a resonance state when the amplitude is monitored and becomes maximum.

In order to stop the etching, for example, the substrate 111 supported by the support portion 103 is quickly lifted from the etching solution 102 and cleaned by some means. Thus, by measuring the amplitude of the vibrator 112 without directly measuring the resonance frequency of the vibrator 112, the resonance frequency of the vibrator 112 to be manufactured can be made equal to the etching stop frequency f _s .

With the above manufacturing method, a vibrator having a predetermined resonance frequency can be reliably manufactured even when the thickness of the substrate 111 varies.

In the present embodiment, the vibrator is vibrated in the etching solution, the vibration state is detected, and the time when the resonance state is reached is set as the etching end point. By detecting the end point by such a method, it is not necessary to take out the object to be etched from the etching solution during the etching in order to confirm the progress of the etching, and the degree of progress of the etching achieved can be eliminated. Therefore, the etching process can be simplified, and the etching accuracy can be improved.

(Second embodiment)
An etching apparatus 200 using a second embodiment of a method for manufacturing a vibrator according to the present invention will be described with reference to the drawings. FIG. 3 (a) is a front view, and FIG. 3 (b) is a BB ′ sectional view in FIG. 3 (a). The basic configuration is almost the same as that of the first embodiment described above, and the same reference numerals are given to the parts having the same functions.

In the present embodiment, a plurality of vibrators 112 are formed on the substrate 111. The excitation means 104 is disposed in the etching tank 101. The excitation means 104 transmits vibration to the etchant 102 by vibrating, and the vibrator 112 vibrates by transmitting vibration from the etchant 102 to the vibrator 112. That is, the excitation means 104 transmits vibration to the vibrator 112 using the etching solution 102 as a medium. By arranging the excitation means 104 and the vibrator 112 to be detected as close as possible, the vibration of the excitation means 104 can be transmitted to the vibrator 112 more efficiently, and the vibrator 112 can be made more efficient. Can be excited with a larger amplitude. Further, the etching solution 102 in the vicinity of the vibrator 112 can be stirred more effectively, and etching can be promoted. When the thickness is uniform on the same substrate 111, etching of the plurality of vibrators 112 can be controlled by detecting the vibration state of one vibrator 112 in the same substrate as a representative. As the excitation means 104, a speaker that outputs sound waves or vibration waves having an appropriate frequency can be used.

Next, a method for detecting a vibration state by the detection means 105 disposed opposite to the excitation means 104 with the appropriate vibrator 112 of the substrate 111 supported by the support portion 103 interposed therebetween will be described. FIG. 4 (a) is a graph showing the time change of the vibration frequency of the excitation means 104, the horizontal axis indicates time, and the vertical axis indicates the frequency. FIG. 4B is a graph showing the vibration frequency of the vibrator 112 in one cycle, where the horizontal axis represents time and the vertical axis represents the vibration frequency of the vibrator 112. FIG. 4C is a graph showing the amplitude of the vibration state in one cycle of the vibrator 112. The horizontal axis shows time, and the vertical axis shows the amplitude of the vibrator 112. As shown in FIG. 4 (a), in the present embodiment, the frequency of the exciting unit 104 is changed with a period T, (n is a natural number, 0 ≦ t _a <T) time t = nT + t _a represents the The frequency of the excitation means 104 can be expressed by the following equation (2).

For example, f _min is 1000 Hz, f _max is 20000 Hz, and the period T is 10 seconds. Since the vibrator 112 is excited by the excitation means 104, it vibrates at the same frequency as that of the excitation means 104 as shown in FIG. In FIG. 4 (c), when it amplitude of the oscillator 112 is the maximum at time nT + t _1, the frequency of the oscillator 112 is the resonant frequency at that time. The resonance frequency of the vibrator 112 gradually changes as the etching progresses and approaches the etching stop frequency f _s . Thus, the detecting means 105 monitors the resonance frequency with the maximum amplitude in each period, and performs etching when the resonance frequency of the oscillator 112 in a certain period and the etching stop frequency f _s coincide. Stop. The detection of the amplitude and frequency can be performed using the above equations (1-1) and (1-2) based on the time signal from the detection means 105. The etching stop method may be performed as described in the first embodiment.

With the method for detecting a resonance state in the above manufacturing method, a change in the resonance frequency of the vibrator 112 during etching can be detected more accurately, so the resonance frequency of the vibrator 112 reaches the etching stop frequency f _s . It is possible to more reliably stop the etching at that time. Therefore, the resonance frequency of the vibrator after etching can be made more accurate.

(Third embodiment)
An etching apparatus 200 using a third embodiment of a method for manufacturing a vibrator according to the present invention will be described with reference to the drawings. FIG. 3 (a) is a front view, and FIG. 3 (b) is a BB ′ sectional view in FIG. 3 (a). The basic configuration is almost the same as that of the second embodiment described above, and the same reference numerals are given to the parts having the same functions.

In this embodiment, the excitation means 104 transmits vibration to the etching liquid 102 by vibrating, and the vibration 112 is vibrated by transmitting vibration from the etching liquid 102 to the vibrator 112. That is, the excitation means 104 transmits vibration to the vibrator 112 using the etching solution 102 as a medium. Further, the excitation means 104 vibrates at a plurality of frequencies. The detecting means 105 detects the vibration of the etching solution 102. For example, a speaker that outputs sound waves or vibration waves having an appropriate frequency can be used as the excitation means 104, and a microphone that can input sound waves or vibration waves from the excitation means 104 can be used as the detection means 105.

Next, a method for detecting the vibration state of the vibrator 112 using the excitation unit 104 and the detection unit 105 will be described. The vibration energy output from the excitation means 104 is transmitted to the vibrator 112 using the etching solution 102 as a medium. The vibrator 112 receives vibration energy from the etching solution 102 and resonates at a certain resonance frequency. At this time, since the vibrator 112 absorbs vibration energy from the etching liquid 102, the vibration in the resonance frequency band of the vibrator 112 decreases from the vibration of the etching liquid 102. The detection means 105 detects the vibration of the etching solution 102, compares the frequency band output from the excitation means 104 with the detected frequency band, and detects the reduced frequency band as the resonance frequency of the vibrator 112. The resonance frequency of the vibrator 112 detected in this way gradually changes with the progress of etching and approaches the etching stop frequency f _s . In this way, the detection means 105 monitors the resonance frequency of the vibrator 112 and stops etching when the resonance frequency of the vibrator 112 matches the etching stop frequency f _s . The etching stop method may be performed as described in the first embodiment.

With the method for detecting a resonance state in the above manufacturing method, a change in the resonance frequency of the vibrator 112 during etching can be detected more accurately, so the resonance frequency of the vibrator 112 reaches the etching stop frequency f _s . It is possible to more reliably stop the etching at that time. Further, the resonance frequency of the vibrator 112 can be detected even when it is difficult to apply the optical detection means as in the first embodiment and the second embodiment. Therefore, the resonance frequency of the vibrator after etching can be made more accurate.

(Fourth embodiment)
A vibrator 300 manufactured using the manufacturing method of the present invention will be described with reference to the drawings. 5 (a) is a front view, FIG. 5 (b) is a CC ′ sectional view, and FIG. 5 (c) is a DD ′ sectional view. The size of the vibrator 300 is, for example, about 15 mm in length, 5 mm in width, and about 0.3 mm in thickness.

In the vibrator 300, the vibration plate 201 is supported by a support body 203 via two torsion springs 202, and is integrally formed by a substrate 211. The substrate 211 is made of single crystal silicon. Since single crystal silicon has excellent mechanical properties such as a large Young's modulus, a small specific gravity, and no plastic deformation, the diaphragm 201 can have a large resonance frequency. Either one of the torsion springs 202 may be used to support the diaphragm 201 in a cantilever manner. A permanent magnet 214 is mounted on the diaphragm 201, and the diaphragm 201 is driven by disposing an electromagnet (not shown) at an appropriate position on the fixed side with respect to the permanent magnet 214. A plurality of permanent magnets 214 may be provided, and the permanent magnets 214 may be mounted on both surfaces of the diaphragm 201. As described above, the etching stop frequency f _s is determined in consideration of the mounting form of such a permanent magnet in advance, so that the final resonance frequency of the vibrator after mounting the permanent magnet is the final target value. Will be set reliably.

Next, a method for manufacturing the vibrator 300 will be described. FIG. 6 is a cross-sectional view showing the steps of the method for manufacturing the vibrator 300. First, silicon nitride 216 is formed on both surfaces of a substrate 211 made of a silicon single crystal (FIG. 6A).

A novolak resist is applied to the surface of the silicon nitride 216 by a thickness of about 1 μm, and a resist mask (not shown) is formed by photolithography. Thereafter, RIE is performed using a fluorine-based gas such as CF ₄ to etch the silicon nitride 216 to form a silicon nitride mask 216, and the resist mask is removed. Similarly, a backside silicon nitride mask 216 is also formed (FIG. 6B).

As described above, the substrate 211 is etched by being immersed in an alkaline aqueous solution, and the diaphragm 201, the torsion spring 202 (not shown in FIG. 6), and the support 203 are formed. In this embodiment, an aqueous potassium hydroxide solution is used. Alkaline aqueous solution such as potassium hydroxide aqueous solution is surrounded by (111) equivalent surface, because the etching rate of (111) equivalent surface of single crystal silicon is slower than other surfaces. A shape can be formed. In this embodiment, by using this feature, the side wall shapes of the diaphragm 201, the torsion spring 202, and the support 203 can be produced (FIG. 6C). The etching stop point is determined as described above. Thereafter, a step of performing isotropic etching slightly using the mixed acid used in the first embodiment (this viscosity is larger than the viscosity of the alkaline aqueous solution) or the like may be performed. In this case, the etching stop point may be determined in this step.

Subsequently, the silicon nitride 216 is removed by RIE using a fluorine-based gas such as CF ₄ (FIG. 6 (d)). In addition, a hard magnetic wire having a diameter of 0.3 mm and a length of 1.8 mm is disposed on the vibration plate 201 and fixed with an adhesive. Further, this is magnetized to form a permanent magnet 114 (FIG. 6 (e)).

In the method for manufacturing a vibrator according to the present invention, the target resonance frequency may be achieved even if the shape of the vibrator is slightly different from an ideal one. The present invention pays attention to this point, and determines the stop point of etching by detecting the vibration state of the vibrator during etching at least once. In this way, it is possible to reliably manufacture a vibrator having a target resonance frequency. Further, according to the manufacturing method of the present invention, even if the realized resonance frequency is slightly different from the target, the difference amount is small, and the target resonance frequency can be easily set by a slight adjustment thereafter. It can be within the adjustable range.

It is a figure explaining 1st Embodiment of the manufacturing method of this invention, (a) is a front view, (b) is sectional drawing. BRIEF DESCRIPTION OF THE DRAWINGS It is a figure explaining 1st Embodiment of the manufacturing method of this invention, (a) is a figure which shows the structure of a detection means, (b) is a figure which shows the relationship between the vibration state of a vibrator | oscillator, and the output of a photodetector. . It is a figure explaining the detection of the resonance state and the etching stop method by the detection means in the etching solution of the first embodiment, (a) is a diagram showing the relationship between the frequency of the excitation means and time, (b) The figure which shows the relationship between the resonant frequency of a vibrator | oscillator, and time, (c) is a figure which shows the relationship between the amplitude of a vibrator | oscillator, and time. It is a figure explaining 2nd Embodiment and 3rd Embodiment of the manufacturing method of this invention, (a) is a front view, (b) is sectional drawing. It is a figure explaining the detection of the resonance state by the detection means in the etching solution of the second embodiment and the etching stop method, (a) is a diagram showing the relationship between the frequency of the excitation means and time, (b) is The figure which shows the relationship between the frequency of the vibrator | oscillator in 1 period, and time, (c) is a figure which shows the relationship between the amplitude of the vibrator | oscillator in 1 period, and time. It is a figure explaining the 4th Embodiment of this invention, (a) is a top view, (b) is sectional drawing, (c) is another sectional drawing. Sectional drawing explaining the process of the manufacturing method of the vibrator | oscillator of 4th Embodiment. The figure explaining the background art of this invention.

Explanation of symbols

100, 200: Etching equipment
101: Etching tank
102: Etching solution
103: Support part
104: Excitation means
105: Detection method
105a: Light source (detection means)
105b: Photodetector (detection means)
111, 211: Board
112, 300: Vibrator
201: Diaphragm
202: Torsion spring (elastic support)
203: Support
214: Permanent magnet
216: Silicon nitride

Claims (11)

A first step of forming a vibrator on a substrate in an etching solution by wet etching;
A second step of stopping the wet etching;
A method of manufacturing a vibrator having
The vibrator is excited between the first step and the second step, and a vibration state with respect to a target frequency of the excited vibrator is detected at least once in the etching solution. 3. A method for manufacturing a vibrator comprising the steps of 3. A method for manufacturing the vibrator according to claim 1,
In the third step, using the excitation means for exciting the vibrator and the detection means for detecting the vibration state of the vibrator by the excitation means, the vibration state of the vibrator is detected,
In the second step, the wet etching is stopped when it is detected in the third step that the vibrator is in a resonance state at a target frequency. A method for manufacturing the vibrator according to claim 1 or 2,
The method of manufacturing a vibrator, wherein the excitation frequency is equal to the target frequency and is constant. A method for manufacturing the vibrator according to claim 1 or 2,
The method of manufacturing a vibrator, wherein the excitation frequency includes the target frequency and periodically changes. A method for manufacturing a vibrator according to any one of claims 1 to 4,
The method of manufacturing a vibrator, wherein the excitation energy is transmitted to the vibrator using the etching solution as a medium. A method for manufacturing a vibrator according to any one of claims 1 to 4,
The method of manufacturing a vibrator, wherein the excitation energy is transmitted to the vibrator by using a support portion that supports the vibrator as a medium. A method for manufacturing a vibrator according to any one of claims 1 to 6,
The method for manufacturing a vibrator, wherein the detecting means optically detects a vibration state of the vibrator. A method for manufacturing a vibrator according to any one of claims 1 to 6,
The method for manufacturing a vibrator, wherein the detecting means detects vibration of the etching solution. A method for manufacturing a vibrator according to any one of claims 1 to 8,
A method of manufacturing a vibrator, wherein an alkaline solution is used as the etchant. A method for manufacturing a vibrator according to any one of claims 1 to 8,
A method of manufacturing a vibrator, wherein a mixed acid containing hydrofluoric acid and nitric acid is used as the etchant. An etching tank for holding an etching solution;
Excitation means for exciting the object to be etched;
Detection means for detecting a vibration state of the object to be etched excited in the etching solution by the excitation means;
A wet etching apparatus comprising:

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