201212783 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種殼體及其製作方法’特別涉及一種鎂或 鎂合金殼體及其製作方法。 【先前技術】201212783 VI. Description of the Invention: [Technical Field] The present invention relates to a casing and a method of fabricating the same, and particularly to a magnesium or magnesium alloy casing and a method of fabricating the same. [Prior Art]
[0002] 鎂或鎂合金由於質量輕、散熱性佳、電磁遮罩性好等優 點，廣泛應用於3C產品的殼體、汽車及航空等領域。但 鎂或錢合金最明顯的缺點係对腐姓差，暴露於自然環境 中會引起表面快速腐餘。 [0003] 提高鎂或鎂合金殼碰耐腐蝕性的方法通常係在其表面形 成保護性的塗層。傳統的陽板„氧化、路酸鹽轉化膜技術 及電鑛等在鎮或鎮合金表面形成保護性塗層的方法存在 生產工藝複雜、效率低、環境污染嚴重等缺點。 [0004] 磁控濺射技術近年來被廣泛應用於在鎂或鎂合金殼體表 面形成保護性塗層《然而，虫衿磁控濺射技術本身的特 點’以該方法形成的_護性塗層無法_全填充鎂或鎂人 金殼體表面的裂紋、孔洞等，因而對鎂或鎂合金殼體耐 腐餘性能的提高有限。 【發明内容】 [0005]鑒於此，提供一種具有較好的耐腐蝕性的鎂或鎂合金的 殼體。 [0006] 另外，還提供一種上述殼體的製作方法。 [0007] 帛⑨體’包括錤或_合金基U、依次形成於該錢或鎂 合金基體上的鉬層及氧離子注入膜，所述氧離子注入膜 099130546 表單編號Α0101 第3頁/共1〇頁 0992053604-0 201212783 中主要含有過飽和相的三氧化二铭。 [0008] [0009] [0010] [0011] [0012] [0013] [0014] [0015] [0016] [0017] 一種殼體的製作方法，其包括如下步驟： 提供錢或鎮合金基體； 於該鎂或鎂合金基體的表面磁控濺射鋁層； 於該鋁層上注入氧離子，形成主要含有過飽和相三氧化 一铭的乳離子注入膜。 本發明殼體的製作方法在錤或鎂合金基體上磁控賤射形 成鋁層，再於該鋁層上形成氧離子注入膜/該鋁層與氧 離子注入膜組成的複合膜層顯著地提高了所述殼體的耐 腐蝕性，且該製作工藝簡單、幾乎無環境污染。 【實施方式】 請參閱圖1，本發明一較佳實施例的殼體1〇包括一鎂或鎂 合金基體11、依次形成於該鎂或鎂合金基體丨丨表面的一 鋁層15及一氧離子注入膜17。所述鋁層15的厚度為 〇· 5〜1 · 0 以 m。 該殼體10還包括形成於該鎂或鎂合金基體丨丨與鋁層15之 間的一錫層13。所述錫層13的厚度為2〇〇~6〇〇nm。 所述氧離子注入膜1 7主要含有過飽和相三氧化二鋁 (Al2〇3)。 所述设體10的製作方法主要包括如下步驟： 提供一鎂或鎂合金基體u，該鎂或鎂合金基體n可藉由 沖壓成型得到，其具有待製得的殼體10的結構。 099130546 表單編號A0101 第4頁/共10頁 0992053604-0 201212783 圆將所述鎮或鎮合金基體u-放入盛裝有乙醇及/或丙剩溶液 的超聲mut進行魏耗，叫絲或鎂合金基 體η表面的雜質和油污。清洗完畢後烘乾備用^ 剛再對鎮或鎮合金基體u的表面進行電聚清洗，進一步去 除鎂或鎂合金基體11表面的油污，以改善鎂或鎂合金基 體11表面與後續塗層的結合力。對鎂或鎂合金基體二 表面進行電漿清洗的方法包括如下步驟：將鎂或鎂合金 基體11放入一真空鍍膜機（圖未示）的真空室内的工件 Cl 架上，抽真空該真空室至真空度為8.0xl〇-3pa，以 300〜60〇sccln (標举狀態毫升/分鐘）的流量向真空室内 通入純度為99. 999%的氬氣（工作氣體），於鎂或鎂合金 基體11上施加-300〜-800V的偏壓，對鎂或錢合金基體u 面進行電漿π洗，清洗時間為3~l〇min。所述真空錢膜 機除可用以進行電漿清洗外，還可用以多弧離子鍍膜處 理、磁控賤射鍍膜處理以及離子注入處理。 … [剩十采用磁控漱射的方式在鎂或鎖合金基體11表面依次形成 錫層13及—鋁層15。形成該錫層13及鋁層15的具體操 作方法及工藝參數為：在所述電激清洗完成後，調節氬 氣"丨1量至100〜300sccm，加熱所述真空室至50~180°C ( 即機射>益度為5〇〜ι8〇〇 ;開啟已置於所述真空锻膜機 中的一锡舞的電源，並設定其功率為5〜10kw，於鎂或鎂 合金基體11上施加_50〜_3〇〇v的偏壓，沉積錫層13。沉 積該錫層13的時間為30〜60min。形成所述錫層13後，關 閉所述錫乾的電源，開啟一銘乾的電源，設置其功率為 5〜1〇kW ’沉積所述鋁層15 ’沉積該鋁層15的時間為 099130546 表單編號A0101 第5頁/共1〇頁 0992053604-0 201212783 30〜90mi η。 [0021] 由於金屬錫具有低溫快擴散性的特點，所述錫層13的形 成可增強所述鋁層15與鎂或鎂合金基體11的結合力，同 時可降低鎂或鎂合金基體11表面的孔隙缺陷，從而提高 所述鎂或鎂合金基體11的耐腐蝕性。 [0022] 完成所述鋁層15的沉積後，於該鋁層15表面注入氧離子 ，形成一氧離子注入膜17。 [0023] 所述的注入氧離子的過程為：將鍍覆有所述錫層13及鋁 層15的鎂或鎂合金基體11置於所述真空鍍膜機的真空室 中，該鍍膜機的離子源將氧氣進行電離，並經高壓電場 加速成具有幾萬甚至幾百萬電子伏特能量的氧離子束， 射入銘層15的表面，與銘層15表層中及其表面的原子或 分子發生一系列的物理、化學反應，最終於該鋁層15的 表面沉積形成一主要含有過飽和相αι2〇3的氧離子注入膜 17。由於金屬鋁的氧化體積比係數大於1，形成的過飽和 相ΑΙ^Ο。使氧離子注入膜17具有較好的緻密性，從而進一 步提高所述鎂或鎂合金基體11的耐腐蝕性。 [0024] 本實施例中注入所述氧離子的參數為：真空室的真空度 為3. 0xl0_8Pa，氧氣純度為99. 99%，離子源功率為 0.5〜5kw，工作氣壓為0.8〜8.0Pa，注入時間為 30〜120miη。 [0025] 本發明較佳實施方式的殼體10的製造方法，在鎂或鎂合 金基體11上依次形成一錫層13及一鋁層15，再於該鋁層 15上形成一氧離子注入膜17。該錫層13、鋁層15及氧離 099130546 表單編號Α0101 第6頁/共10頁 0992053604-0 201212783 體的耐 子注入膜17組成的複合膜層顯著地提高 _ J W迷鼓 腐蝕性，且該製造工藝簡單、幾乎無環境污染。[0002] Magnesium or magnesium alloys are widely used in the housing, automotive, and aerospace industries of 3C products due to their advantages of light weight, good heat dissipation, and good electromagnetic shielding properties. However, the most obvious shortcomings of magnesium or money alloys are poor rot, which can cause rapid surface rot when exposed to the natural environment. [0003] A method of increasing the corrosion resistance of a magnesium or magnesium alloy shell is generally to form a protective coating on its surface. Traditional methods such as oxidation, acid salt conversion coating technology and electric ore forming protective coating on the surface of town or town alloy have the disadvantages of complicated production process, low efficiency and serious environmental pollution. [0004] Magnetron splashing In recent years, radiation technology has been widely used to form protective coatings on the surface of magnesium or magnesium alloy casings. However, the characteristics of the magnetron sputtering technology itself are not able to form a protective coating. Or cracks, holes, etc. on the surface of the magnesium alloy shell, and thus the improvement of the corrosion resistance of the magnesium or magnesium alloy shell is limited. [0005] In view of the above, a magnesium having good corrosion resistance is provided. Or a casing of a magnesium alloy. [0006] In addition, a method of manufacturing the above-described casing is also provided. [0007] The body 9 includes a bismuth or an alloy base U, and a molybdenum layer sequentially formed on the money or magnesium alloy substrate. And oxygen ion implantation membrane, the oxygen ion implantation membrane 099130546 Form No. Α0101 Page 3 / Total 1 page 0992053604-0 201212783 The third oxidation of the supersaturated phase. [0008] [0009] [0011] [0011 [0014] [0014] [0014] [0017] [0017] A method of manufacturing a housing, comprising the steps of: providing a money or a town alloy substrate; magnetron sputtering an aluminum layer on a surface of the magnesium or magnesium alloy substrate; injecting the aluminum layer Oxygen ions form a milk ion implantation membrane mainly containing a supersaturated phase of trioxide. The method for fabricating the shell of the present invention is magnetron-controlled on a tantalum or magnesium alloy substrate to form an aluminum layer, and then an oxygen ion implantation is formed on the aluminum layer. The composite film layer composed of the film/the aluminum layer and the oxygen ion implantation film remarkably improves the corrosion resistance of the casing, and the manufacturing process is simple and almost free of environmental pollution. [Embodiment] Referring to FIG. 1, the present invention A housing 1 of a preferred embodiment includes a magnesium or magnesium alloy substrate 11, an aluminum layer 15 sequentially formed on the surface of the magnesium or magnesium alloy substrate, and an oxygen ion implantation film 17. The aluminum layer 15 The thickness is 〇·5 〜1 · 0 in m. The casing 10 further includes a tin layer 13 formed between the magnesium or magnesium alloy base 丨丨 and the aluminum layer 15. The thickness of the tin layer 13 is 2 〇. 〇~6〇〇nm. The oxygen ion implantation membrane 17 mainly contains supersaturation. Al2O3 (Al2〇3) The manufacturing method of the device 10 mainly comprises the following steps: providing a magnesium or magnesium alloy matrix u, which can be obtained by press forming, which has a to-be-made The structure of the obtained casing 10. 099130546 Form No. A0101 Page 4 / Total 10 pages 0992053604-0 201212783 Round the town or town alloy matrix u- into the ultrasonic mut containing ethanol and / or residual solution Consumption, called the surface of the wire or magnesium alloy substrate η impurities and oil stains. Drying after cleaning is completed. The surface of the town or town alloy substrate u is just electro-polymerized to further remove the oil stain on the surface of the magnesium or magnesium alloy substrate 11 to improve the bonding of the surface of the magnesium or magnesium alloy substrate 11 with the subsequent coating. force. The method for plasma cleaning the two surfaces of the magnesium or magnesium alloy substrate comprises the steps of: placing the magnesium or magnesium alloy substrate 11 on a workpiece Cl frame in a vacuum chamber of a vacuum coater (not shown), and vacuuming the vacuum chamber To a vacuum of 8.0xl〇-3pa, a flow rate of 300~60〇sccln (in the nominal state of cc/min) is introduced into the vacuum chamber to a purity of 99.999% argon (working gas) in magnesium or magnesium alloy. A bias of -300 to -800 V is applied to the substrate 11, and the surface of the magnesium or the carbon alloy substrate is subjected to plasma π washing, and the cleaning time is 3 to 10 min. The vacuum film machine can be used for plasma cleaning, multi-arc ion plating treatment, magnetron sputtering coating treatment, and ion implantation treatment. ... [The remaining ten uses a magnetron sputtering method to form a tin layer 13 and an aluminum layer 15 on the surface of the magnesium or lock alloy substrate 11 in this order. The specific operation method and process parameters for forming the tin layer 13 and the aluminum layer 15 are: after the electric cleaning is completed, adjusting the argon gas amount to 100 to 300 sccm, and heating the vacuum chamber to 50 to 180 °. C (ie machine injection) has a benefit of 5〇~ι8〇〇; turn on the power of a tin dance that has been placed in the vacuum forging machine, and set its power to 5~10kw in the magnesium or magnesium alloy matrix Applying a bias voltage of _50~_3〇〇v to deposit a tin layer 13. The time for depositing the tin layer 13 is 30 to 60 min. After the tin layer 13 is formed, the power supply of the tin dry is turned off, and a new one is opened. Dry the power supply, set its power to 5~1〇kW 'deposit the aluminum layer 15' deposit the aluminum layer 15 time is 099130546 Form No. A0101 Page 5 / Total 1 page 0992053604-0 201212783 30~90mi η. [0021] Since the metal tin has the characteristics of low-temperature fast diffusibility, the formation of the tin layer 13 can enhance the bonding force of the aluminum layer 15 with the magnesium or magnesium alloy substrate 11, and at the same time reduce the surface of the magnesium or magnesium alloy substrate 11. Pore defects, thereby improving the corrosion resistance of the magnesium or magnesium alloy substrate 11. [0022] Completing the aluminum layer 15 After deposition, oxygen ions are implanted into the surface of the aluminum layer 15 to form an oxygen ion implantation film 17. [0023] The process of implanting oxygen ions is: plating the magnesium layer 13 and the aluminum layer 15 of magnesium or A magnesium alloy substrate 11 is placed in a vacuum chamber of the vacuum coater, the ion source of the coater ionizes oxygen and is accelerated by a high voltage electric field into an oxygen ion beam having an energy of tens of thousands or even millions of electron volts. The surface of the layer 15 undergoes a series of physical and chemical reactions with the atoms or molecules in the surface layer of the layer 15 and finally deposits on the surface of the layer 15 to form an oxygen ion implant mainly containing the supersaturated phase αι2〇3. Film 17. Since the oxidation volume ratio coefficient of the metal aluminum is greater than 1, the supersaturated phase is formed, so that the oxygen ion implantation film 17 has better compactness, thereby further improving the corrosion resistance of the magnesium or magnesium alloy substrate 11. [0024] The parameters of the oxygen ion in the present embodiment are: vacuum chamber vacuum is 3. 0xl0_8Pa, oxygen purity is 99. 99%, ion source power is 0.5~5kw, working pressure is 0.8~8.0Pa Injection time The method for manufacturing the casing 10 of the preferred embodiment of the present invention is to sequentially form a tin layer 13 and an aluminum layer 15 on the magnesium or magnesium alloy substrate 11, and then form the aluminum layer 15 thereon. An oxygen ion implantation film 17. The tin layer 13, the aluminum layer 15 and the oxygen ion 099130546 Form No. Α0101 Page 6 / 10 pages 0992053604-0 201212783 The composite film layer composed of the body-resistant injection film 17 is significantly improved _ JW The drum is corrosive, and the manufacturing process is simple and almost free of environmental pollution.
【圖式簡單說明J[Simple diagram of the figure J
[0026] 圖1為本發明較佳實施方式殼體的剖視示音圖 【主要元件符號說明】 [0027] 殼體：1〇 [0028] 鎮或錢合金基體：11 [0029] 錫層：13 [0030] 鋁層：1 5 [0031] 氧離子注入膜：171 is a cross-sectional view of a housing according to a preferred embodiment of the present invention. [Main component symbol description] [0027] Housing: 1〇 [0028] Town or money alloy substrate: 11 [0029] Tin layer: 13 [0030] Aluminum layer: 1 5 [0031] Oxygen ion implantation membrane: 17
099130546 表單蝙號Α0101 第7頁/共10頁 0992053604-0099130546 Form bat number Α0101 Page 7 of 10 0992053604-0