201139056 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種於加工玻璃基板時保持玻璃基板之玻 璃基板之保持用膜體、及玻璃基板之研磨方法。 【先前技術】 應用於液晶顯示器之玻璃基板之表面之微小凹凸或起伏 會導致影像產生畸變。因此，藉由研磨裝置去除該微小凹 凸或起伏，藉此加工為具有所需之平坦度之玻璃基板。作 為此種研磨裝置’本案申請人於專利文獻1中揭示有如下研 磨裝置：使由研磨頭所保持之玻璃基板抵壓至貼附於研磨 壓盤上之研磨墊，並且使研磨壓盤及研磨頭相對旋轉而對 玻璃基板進行研磨。又，於專利文獻1之研磨裝置中，藉由 使設置於研磨頭之自吸附型之保持用膜體吸附並保持玻璃 基板’而將玻璃基板設置於研磨頭上。 最近’伴隨著液晶顯示器用之玻璃基板之大型化，用以 使該玻璃基板吸附保持於研磨頭上之保持用膜體之尺寸亦 趨於大型化。該保持用膜體係藉由多孔質性之自吸附型片 經由雙面接著片貼附於背板而構成’且於該自吸附型片上 吸附並保持玻璃基板。 於對被稱為G10之尺寸（3130 mmx2880 mm)之母玻璃基 板進行研磨加工之情形時，當製造保持該尺寸之玻璃基板 之保持用膜體時，可利用現有之製造設備製造與其對應之 尺寸之自吸附型片或背板之製品。然而，存在如下問題： 將自吸附型片接著於背板之雙面接著片無法藉由現有之製 155095.doc 201139056 造設備而作為單一制品來製造，於製造時必需進行新設備 投資，從而使製造成本增大。 雙面接著片包含在聚對苯二曱酸乙二酯等基材之兩表面 上塗佈接著劑而成之黏著層。至於上述基材而言，利用現 有之製造設備亦可製造上述G10尺寸者。然而，就接著劑之 塗佈裝置而言，因塗佈面積相當大而導致利用現有之設備 無法應對》 因此，先前至少使用2片現有之尺寸之雙面接著片將自吸 附型片接著保持於背板上。 作為自吸附型片，可例示如專利文獻2所示般作為由聚胺 基曱酸酯樹脂所形成之軟質塑膠片之聚胺基曱酸醋片。專 利文獻2之聚胺基曱酸酯片係如下者，即於其表面層上形成 微孔’且使表面層含有水等液體，藉此利用滲入表面層之 微孔之液體之表面張力而使研磨墊接著於研磨壓盤。由於 亦可藉由該聚胺基甲酸酯片而自吸附並保持玻璃基板，故 而該聚胺基曱酸酯片用作自吸附型片。 然而，於使用複數片雙面接者片之先前之保持用膜體 中，難以無間隙地貼附鄰接之雙面接著片之端部彼此。 圖8表示自吸附型片1經由2片雙面接著片2a、2B貼合於 背板3上，且於自吸附型片1上吸附並保持玻璃基板〇之保持 用膜體6之剖面圖。若以將雙面接著片2A、2B之端部彼此 部分重疊之方式進行接著以無間隙地貼附鄰接之雙面接著 片2A、2B之端部彼此，則該重疊之部分成為凸狀，該凸狀 經由自吸附型片1轉印至玻璃基板G而成為凸狀部4。若於轉 155095.doc 201139056 印有凸狀部4之狀態下對玻璃基板㈣行研磨，則於研磨後 之玻璃基板G中，成為該凸狀部4之部分如圖9所示般相反地 顯現為凹狀部4A，故而存在損及加工表面之平坦性、玻璃 基板G之品質（平坦度）降低之問題。 為解決以上問題，必需如圖1〇所示般使保持用膜體6具有 厚度方向之間隙（A)與面方向之間隙（B)，以將大型之玻璃 基板研磨為所需之平坦度。 作為具有間隙（A、B)之保持用膜體，考慮有下述構成之 保持用膜體。 如圖11所不，藉由於同一面内以特定間隙（A，、B，）使用複 數片小尺寸之保持用膜體6、6而形成大尺寸之保持用膜體 7 〇 如圖I2所示，藉由將自吸附型片i設為單一製品，並於同 一面内以特定間隙（Απ、B，，)使用複數片雙面接著片2C、2D 而形成大尺寸之保持用膜體8。 如圖13所示，藉由設為如下構成而形成大尺寸之保持用 膜體9:將自吸附型片丄設為單一製品，於同一面内以特定 間隙（A"’、B’’’）使用複數片雙面接著片2E、2F，且使2片重 豐並且使上下2片之各雙面接著片2£、21?間之間隙（Α，,,、Β,,，） 於雙面接著片之積層方向上不重疊。 先前技術文獻 專利文獻 專利文獻1 :曰本專利特開2004_122351號公報 專利文獻2:曰本專利特開2007-7824號公報 155095.doc 201139056 【發明内容】 發明所欲解決之問題 然而’於圖11所示之保持用膜體7中，鑒於製作誤差而難 以縮小間隙（B’）。由此，保持用膜體7中存在相當於保持用 膜體7之厚度之較大間隙（A1)與間隙（B，），故而如圖14所示 般在與該間隙（Α·、B·)之位置對應之玻璃基板上會明顯地顯 現凸狀部4B。由此’於該保持用膜體7中，難以提高研磨後 之玻璃基板之品質。 又，鑒於圖12所示之保持用膜體8之間隙較圖^所示 之保持用膜體7之間隙（A’）僅小相當於自吸附型片1之厚度 之製作誤差’亦難以縮小間隙（B，，）。又，因研磨時玻璃基 板與研磨墊之摩擦阻力導致自吸附型片1於面方向上伸 展，故而間隙（B")會增大。由此，即便為該保持用獏體8， 亦會於玻璃基板上明顯地顯現上述凸狀部4B(參照圖14), 故而難以提高研磨後之玻璃基板之品質。 圖13所示之保持用膜體9藉由將2片重疊配置之雙面接著 片2E、2F之各自之基材2G、2H之強度，可將自吸附型片j 之面方向之伸展抑制得小於圖12中所示之保持用膜體8。然 而，若如圖13所示般將2片雙面接著片2E、2F重疊，貝個 間隙（A ")之相加值成為圖12之保持用膜體之間隙（A'·)之2 倍，又，鑒於製作誤差而亦難以縮小間隙（B"，）。因此，即 便為該保持用獏體9亦難以提高研磨後之玻璃基板之品質。 本發明係鑒於此種情況而完成者，其目的在於提供—種 可提高研磨後之玻璃基板之品質的玻璃基板之保持用膜 155095.doc 201139056 體、及玻璃基板之研磨方法。 解決問題之技術手段 本發明提供一種玻璃基板之保持用膜體，其係自吸附型 片經由雙面接著片貼附於背板而構成，並且於上述自吸附 型片上吸附並保持玻璃基板者，上述雙面接著片包含片狀 之基材與該基材之兩表面所具有之黏著層，上述黏著層於 上述基材之同一面内具有特定之間隙；上述基材之兩表面 所具有之黏著層間之間隙於黏著層之積層方向上不重疊。 根據本發明之保持用膜體，可藉由與自吸附型片同尺寸 之雙面接著片之基材抑制研磨加工時之自吸附型片之面方 向之伸展。又，本發明之保持用膜體之間隙（B·"，）與上述圖 12、圖13之保持用膜體8、9之間隙（B"、Β·Μ)大致相同◦然 而’由於本發明之保持用膜體之間隙（Α，，，，）僅相當於基材之 兩表面所具有之黏著層之厚度，故而大幅小於圖^〜圖Η 之保持用膜體7〜9之間隙（Α，)〜(Αη，）。由此，根據本發明之 保持用膜體’與保持„體7〜9相比可提高研磨後之玻璃基 板之品質。 由该保持用膜體保持而研磨之玻璃基板因轉印有上述間 隙而被研磨，&而於其表面上形成有凸狀部、然而，根據 本發明之保持用膜體，由於上述基材之兩表面所具有之黏 著層間之上述間隙於黏著層之積層方向上不重疊，故而可 抑制間隙之轉印量。由此，根據本發明，可將形成於玻璃 土板表面之凸狀之南度抑制得較低，故而研磨後之玻璃 基板之品質進一步提高。 155095.doc 201139056 本發明係以吸附並保持大型玻璃基板之保持用膜體為對 象。因此，本發明之1片自吸附型片及雙面接著片之基材為 可應對大型玻璃基板之尺寸者。又，雙面接著片之黏著層 為可利用現有之塗佈裝置進行塗佈之最大尺寸以下。 又’根據本發明’上述玻璃基板之尺寸較佳為 3130(mm)x2880(mm)以上。即’由本發明之保持用膜體保 持被稱為G10尺寸之尺寸以上之尺寸的玻璃基板而對該玻 璃基板進行研磨。 又’根據本發明’上述保持用膜體之尺寸較佳為 3200(mm)x3000(mm)以上《為保持上述G10尺寸以上之玻璃 基板，較佳為使用具有3200(mm)x3000(mm)以上之尺寸之 保持用膜體。 本發明為達成上述目的而提供一種玻璃基板之研磨方 法’其包含：藉由本發明之玻璃基板之保持用膜體吸附並 保持玻璃基板’將該玻璃基板之被研磨面抵壓至研磨墊而 將玻璃基板之被研磨面研磨為所需之平坦度。藉此，根據 本發明，可提高研磨後之玻璃基板之品質。 發明之效果 根據本發明，可提高研磨後之玻璃基板之品質。 【實施方式】 以下，按照隨附圖式對本發明之玻璃基板之保持用膜 體、及玻璃基板之研磨方法之較佳實施形態進行說明。 圖1表示應用實施形態之玻璃基板之保持用膜體的玻璃 基板之研磨裝置1〇之立體圖。又，圖2中表示表現研磨裝置 155095.doc 201139056 10之要部構造之放大剖面圖。 研磨裝置10係將製造為矩形狀之母玻璃基板（例如，一邊 為313〇111111><288〇111111(010尺寸）以上，厚度為〇.7 111111)0之被 研磨面A研磨為液晶顯示器用玻璃基板所需之平坦度之研 磨裝置。研磨裝置10包含經由保持用膜體12而於其下表面 保持玻璃基板G之研磨頭14、以及經由鋁製之板16而於其上 表面保持研磨墊18之研磨台20。母玻璃基板（以下，稱為玻 璃基板）G係由包含具有自吸附作用之支撐材等之保持用膜 體12保持’並且藉由研磨頭】4將被研磨面a抵壓至研磨塾 18。其結果’於玻璃基板g中，將被研磨面a研磨為所需之 平坦度。為吸附並保持上述尺寸之大型玻璃基板G，保持用 膜體12較佳為具有3200(mm)x3000(mm)以上之尺寸。再 者’關於保持用膜體12之詳細構造將於下文敍述。 於研磨中，如圖2所示，由貫通形成於研磨台2〇與板16 之多個漿料供給孔22A、22B…自研磨墊18之下表面側供給 氧化鈽水溶液等研磨漿料。藉此，研磨墊18成為由研磨聚 料浸潰之狀態。於該狀態下對玻璃基板G進行研磨β毁料供 給孔22Α、22Β…緊密且均勻地形成於研磨台2〇與板16。因 此，對研磨墊18均勻地供給研磨漿料。再者，作為研磨墊 18 ’例如使用發泡聚胺基曱酸酯型或麂皮型者，且貼合於 板16。研磨墊18亦可為單一構成，但由於其尺寸與玻續基 板G之尺寸對應而亦較大，故而亦可將複數片分割墊加以組 合而作為1片研磨墊18。進而，於研磨台2〇貫通形成有多個 抽及孔24Α、24Β…，該等抽吸孔24·Α、24Β…經由閥門而連 155095.doc 201139056 接於未圖示之抽吸泵。因此，藉由打開上述閥門，而將抽 吸系之抽吸力傳輸至抽吸孔24A、24B".，故而將板16吸附 保持於研磨台20之上表面。藉由關閉上述閥門而解除抽吸 泵之抽吸力，故而可於進行研磨墊18之維護、更換時將研 磨墊18與板16—併自研磨台20卸除。 如圖1所示於研磨頭14之上部中央固定有主軸26,於該主 轴2 6上連結有旋轉/升降裝置2 8。旋轉/升降裝置2 8藉由總括 控制研磨裝置10整體之控制部30而控制適於玻璃基板 研磨之轉速及下降動作（抵壓力）。 圖3中表示實施形態之保持用膜體12之立體圖，圖4中表 示將背板36卸除之實施形態之保持用膜體12之剖面圖。 又，圖5表示於實施形態之保持用膜體12上吸附保持有玻璃 基板G之剖面圖。 如圖4所示，保持用膜體12係1片自吸附型片3 2經由配置 於同一面内之1片雙面接著片34貼附於圖3之鋁製背板刊而 構成。如圖5所示般於該自吸附型片32上吸附並保持玻璃基 板G。 自吸附型片32為如專利文獻2中所揭示之由聚胺基曱酸酯 樹脂所形成之聚胺基甲酸酯片，其厚度較佳為約M〜15mm。 該聚胺基甲酸酯片可藉由於其表面層上形成微孔，且使表 面層含有水4液體，而利用渗入表面層之微孔之液體之表 面張力吸附並保持玻璃基板G。 雙面接著片34包含聚對苯二甲酸乙二酶（pet，[Technical Field] The present invention relates to a film body for holding a glass substrate for holding a glass substrate when a glass substrate is processed, and a method for polishing the glass substrate. [Prior Art] The slight irregularities or undulations on the surface of a glass substrate applied to a liquid crystal display cause distortion of the image. Therefore, the minute projections or undulations are removed by the grinding device, thereby being processed into a glass substrate having a desired flatness. As such a polishing apparatus, the applicant of the present invention discloses a polishing apparatus that presses a glass substrate held by a polishing head against a polishing pad attached to a polishing platen, and causes the polishing platen and the polishing. The glass substrate is ground by relative rotation. Further, in the polishing apparatus of Patent Document 1, the glass substrate is placed on the polishing head by adsorbing and holding the glass substrate ' by the self-adsorption type holding film body provided in the polishing head. Recently, as the size of the glass substrate for liquid crystal displays has increased, the size of the film for holding which is used to adsorb and hold the glass substrate on the polishing head has also increased in size. This film system for holding is formed by attaching a porous self-adsorbing sheet to a back sheet via a double-sided sheet, and adsorbing and holding the glass substrate on the self-adsorbing sheet. When the mother glass substrate of the size of G10 (3130 mmx2880 mm) is polished, when the film body for holding the glass substrate of this size is manufactured, the size of the film can be made by using the existing manufacturing equipment. Self-adhesive sheet or back sheet product. However, there are the following problems: The double-sided adhesive sheet of the self-adsorbing sheet followed by the back sheet cannot be manufactured as a single product by the existing equipment manufactured by 155095.doc 201139056, and a new equipment investment is required at the time of manufacture, thereby Manufacturing costs increase. The double-sided adhesive sheet comprises an adhesive layer formed by applying an adhesive to both surfaces of a substrate such as polyethylene terephthalate. As for the above substrate, the above G10 size can also be manufactured by using the existing manufacturing equipment. However, in the case of a coating device for an adhesive agent, it is impossible to cope with the existing equipment due to a relatively large coating area. Therefore, at least two sheets of the existing size of the double-sided adhesive sheet are used to hold the self-adsorbing sheet at the same time. On the back panel. As the self-adsorbing sheet, a polyamine-based vinegar sheet which is a soft plastic sheet formed of a polyamino phthalate resin as shown in Patent Document 2 can be exemplified. The polyamino phthalate sheet of Patent Document 2 is such that a micropore is formed on the surface layer thereof and the surface layer contains a liquid such as water, whereby the surface tension of the liquid which penetrates the micropores of the surface layer is utilized. The polishing pad is then applied to the abrasive platen. Since the glass substrate can also be self-adsorbed and held by the polyurethane sheet, the polyaminophthalate sheet is used as a self-adsorbing sheet. However, in the prior film body for holding a plurality of double-sided fastener sheets, it is difficult to attach the end portions of the adjacent double-sided back sheets to each other without a gap. Fig. 8 is a cross-sectional view showing the film body 6 for holding the self-adsorbing sheet 1 adhered to the back sheet 3 via the two double-sided sheets 2a and 2B, and adsorbing and holding the glass substrate 自 on the self-adsorbing sheet 1. When the end portions of the double-sided adhesive sheets 2A and 2B are partially overlapped with each other, and the end portions of the adjacent double-sided adhesive sheets 2A and 2B are attached to each other without a gap, the overlapping portions become convex. The convex shape is transferred to the glass substrate G via the self-adsorption sheet 1 to become the convex portion 4 . When the glass substrate (four) is polished in a state in which the convex portion 4 is printed in the state of 155095.doc 201139056, the portion of the convex portion 4 which is formed in the polished glass substrate G is reversed as shown in FIG. Since it is the concave portion 4A, there is a problem that the flatness of the machined surface is deteriorated and the quality (flatness) of the glass substrate G is lowered. In order to solve the above problem, the film body 6 for holding has a gap (A) in the thickness direction and a gap (B) in the surface direction as shown in Fig. 1A to polish the large-sized glass substrate to a desired flatness. As the film for holding having the gaps (A, B), a film body for holding having the following configuration is considered. As shown in Fig. 11, a large-sized holding film body 7 is formed by using a plurality of small-sized holding film bodies 6, 6 in a specific gap (A, B,) in the same plane, as shown in Fig. By using the self-adsorbing sheet i as a single product and using a plurality of double-sided back sheets 2C and 2D in a specific gap (Απ, B,) in the same plane, a large-sized holding film body 8 is formed. As shown in Fig. 13, a large-sized holding film body 9 is formed by forming a self-adhesive sheet into a single product and having a specific gap in the same plane (A"', B''' Using a plurality of double-sided backing sheets 2E, 2F, and making the two sheets heavy and making the gap between the upper and lower two sheets 2, 21, (2, 21) The lamination of the face-to-face sheets does not overlap. CITATION LIST Patent Literature Patent Literature 1: Patent Application Publication No. 2004-122351 Patent Document 2: Japanese Patent Laid-Open Publication No. 2007-7824 No. 155095.doc 201139056 SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, FIG. 11 In the film body 7 for holding shown, it is difficult to reduce the gap (B') in view of manufacturing errors. As a result, the holding film body 7 has a large gap (A1) and a gap (B,) corresponding to the thickness of the film body 7 for holding, and therefore, as shown in FIG. 14, the gap (Α·, B·) The convex portion 4B is clearly visible on the glass substrate corresponding to the position. Therefore, in the film body 7 for holding, it is difficult to improve the quality of the glass substrate after polishing. Further, in view of the fact that the gap between the film body 8 for holding shown in Fig. 12 is smaller than the gap (A') of the film body 7 for holding shown in Fig. 2, it is difficult to reduce the manufacturing error of the thickness of the self-adsorbing film 1. Clearance (B,,). Further, since the frictional resistance between the glass substrate and the polishing pad during polishing causes the self-adsorbing sheet 1 to extend in the surface direction, the gap (B") increases. Thereby, even in the holding body 8, the convex portion 4B (see FIG. 14) is apparently formed on the glass substrate, so that it is difficult to improve the quality of the polished glass substrate. The holding film body 9 shown in Fig. 13 can suppress the stretching of the surface of the self-adsorbing sheet j by the strength of the base materials 2G and 2H of the double-sided back sheets 2E and 2F which are arranged in two sheets. It is smaller than the film body 8 for holding shown in Fig. 12 . However, as shown in Fig. 13, the two double-sided sheets 2E and 2F are overlapped, and the added value of the bay gaps (A ") becomes the gap (A'·) of the film body for holding of Fig. 12 In addition, it is difficult to narrow the gap (B",) in view of production errors. Therefore, it is difficult to improve the quality of the polished glass substrate even for the holding body 9. The present invention has been made in view of such circumstances, and an object thereof is to provide a method for polishing a glass substrate which can improve the quality of a glass substrate after polishing, and a method for polishing a glass substrate. Means for Solving the Problems The present invention provides a film substrate for holding a glass substrate, which is formed by attaching a self-adhesive sheet to a back sheet via a double-sided sheet, and adsorbing and holding the glass substrate on the self-adsorbing sheet. The double-sided adhesive sheet comprises an adhesive layer on a surface of the substrate and the two surfaces of the substrate, wherein the adhesive layer has a specific gap in the same surface of the substrate; the two surfaces of the substrate have adhesion The gap between the layers does not overlap in the lamination direction of the adhesive layer. According to the film for holding of the present invention, the surface of the self-adhesive sheet during the polishing process can be prevented from being stretched by the base material of the double-sided back sheet of the same size as the self-adsorbing sheet. Further, the gap (B·") of the film body for holding of the present invention is substantially the same as the gap (B", Β·Μ) of the film bodies 8 and 9 for holding in Figs. 12 and 13 described above. The gap (Α,,,) of the film for holding of the invention is only equivalent to the thickness of the adhesive layer on both surfaces of the substrate, and is therefore substantially smaller than the gap between the film bodies 7 to 9 for holding (Fig. Α,)~(Αη,). Therefore, the film body for holding according to the present invention can improve the quality of the glass substrate after polishing in comparison with the holding of the bodies 7 to 9. The glass substrate which is held by the film for holding by the film is transferred by the gap. Being polished, & and having a convex portion formed on the surface thereof, however, according to the film body for holding of the present invention, since the gap between the adhesive layers of the two surfaces of the substrate is not in the lamination direction of the adhesive layer Since the overlap is performed, the amount of transfer of the gap can be suppressed. Therefore, according to the present invention, the southness of the convex shape formed on the surface of the glass earth plate can be suppressed to be low, so that the quality of the polished glass substrate is further improved. Doc 201139056 The present invention is directed to a film for holding and holding a large-sized glass substrate. Therefore, the substrate of the self-adsorbing sheet and the double-sided sheet of the present invention is capable of coping with the size of a large glass substrate. The adhesive layer of the double-sided adhesive sheet is less than the maximum size that can be coated by the existing coating device. Further, according to the present invention, the size of the glass substrate is preferably 3130 (mm) x 2880 (mm). In the above, the glass substrate which is a size larger than the size of the G10 size is held by the film for holding of the present invention, and the glass substrate is polished according to the present invention. (mm) x 3000 (mm) or more. In order to maintain the glass substrate of the above G10 size or more, it is preferable to use a film for holding having a size of 3200 (mm) x 3000 (mm) or more. The present invention provides a film for achieving the above object. A method for polishing a glass substrate, which comprises: adsorbing and holding a glass substrate by the film holding film for holding a glass substrate of the present invention, and pressing the surface to be polished of the glass substrate to a polishing pad to polish the polished surface of the glass substrate According to the present invention, the quality of the glass substrate after polishing can be improved. According to the present invention, the quality of the glass substrate after polishing can be improved. [Embodiment] Hereinafter, according to the accompanying drawings A preferred embodiment of a method for polishing a glass substrate of the present invention and a method for polishing a glass substrate will be described. Fig. 1 shows a glass base to which an embodiment is applied. Fig. 2 is an enlarged cross-sectional view showing the structure of the main part of the polishing apparatus 155095.doc 201139056. The polishing apparatus 10 is manufactured in a rectangular shape. The mother glass substrate (for example, a surface of 313〇111111><288〇111111 (010 size) or more and a thickness of 〇.7 111111)0 is polished to the flatness of the glass substrate for liquid crystal display. The polishing apparatus 10 includes a polishing head 14 that holds the glass substrate G on the lower surface thereof via the film body 12 for holding, and a polishing table 20 that holds the polishing pad 18 on the upper surface thereof via the aluminum plate 16. The mother glass substrate (hereinafter referred to as a glass substrate) G is held by the holding film 12 including a support material having a self-adsorption action, and the polishing surface a is pressed against the polishing pad 18 by the polishing head 4. As a result, in the glass substrate g, the surface to be polished a is polished to a desired flatness. In order to adsorb and hold the large-sized glass substrate G of the above size, the holding film body 12 preferably has a size of 3200 (mm) x 3000 (mm) or more. Further, the detailed structure of the film body 12 for holding will be described later. In the polishing, as shown in Fig. 2, a plurality of slurry supply holes 22A, 22B formed in the polishing table 2 and the plate 16 are supplied with a polishing slurry such as a cerium oxide aqueous solution from the lower surface side of the polishing pad 18. Thereby, the polishing pad 18 is in a state of being impregnated with the abrasive. In this state, the glass substrate G is ground and the β-sludge supply holes 22, 22, ... are formed in a close and uniform manner on the polishing table 2 and the plate 16. Therefore, the polishing pad 18 is uniformly supplied with the polishing slurry. Further, as the polishing pad 18', for example, a foamed polyamino phthalate type or a suede type is used, and it is bonded to the sheet 16. The polishing pad 18 may have a single configuration. However, since the size thereof is large corresponding to the size of the glass substrate G, a plurality of spacer pads may be combined to form a single polishing pad 18. Further, a plurality of pumping holes 24, 24, ... are formed in the polishing table 2, and the suction holes 24, Α, 24, ... are connected via a valve 155095.doc 201139056 to a suction pump (not shown). Therefore, by opening the above valve, the suction force of the suction system is transmitted to the suction holes 24A, 24B ", so that the plate 16 is adsorbed and held on the upper surface of the polishing table 20. By closing the valve to release the suction force of the suction pump, the polishing pad 18 and the plate 16 can be removed from the polishing table 20 during maintenance and replacement of the polishing pad 18. A main shaft 26 is fixed to the center of the upper portion of the polishing head 14 as shown in Fig. 1, and a rotary/elevating device 28 is coupled to the main shaft 26. The rotary/elevating device 28 controls the number of rotations and the lowering operation (against pressure) suitable for the polishing of the glass substrate by collectively controlling the control unit 30 of the entire polishing apparatus 10. Fig. 3 is a perspective view showing the holding film body 12 of the embodiment, and Fig. 4 is a cross-sectional view showing the holding film body 12 of the embodiment in which the backing plate 36 is removed. Further, Fig. 5 is a cross-sectional view showing the glass substrate G adsorbed and held on the film body 12 for holding of the embodiment. As shown in Fig. 4, the holding film body 12 is formed by attaching one sheet of the self-adsorbing sheet 3 2 to the aluminum back sheet of Fig. 3 via one sheet of the double-sided sheet 34 disposed in the same plane. The glass substrate G was adsorbed and held on the self-adsorbing sheet 32 as shown in Fig. 5 . The self-adsorption sheet 32 is a polyurethane sheet formed of a polyamino phthalate resin as disclosed in Patent Document 2, and has a thickness of preferably about M 15 mm. The polyurethane sheet can adsorb and hold the glass substrate G by the surface tension of the liquid which penetrates the micropores of the surface layer by forming micropores on the surface layer and causing the surface layer to contain water 4 liquid. The double-sided adhesive sheet 34 comprises polyethylene terephthalate (pet,
Polyethylene Terephthalate)等基材μ、以及藉由於基材38 155095.doc 201139056 之兩表面塗佈接著劑而形成之黏著層4〇、42。基材38之厚 度較佳為约75 μιη，黏著層4〇之厚度較佳為約5〇 μιη。再者， 藉由使背板36側之黏著層42之厚度薄於自吸附型片32側之 黏著層40,而可有助於提高玻璃基板G之平坦度。 於圖3〜圖5所示之保持用膜體12中，於1片自吸附型片32 之同一面内配置！片雙面接著片34,雙面接著片34之黏著層 40係具有特定間隙（Sl)而塗佈於基材38上並且黏著層 亦同樣地具有特定間隙⑻）而塗佈於基材38上。而且，使該 等間隙（S i、s2)於黏著層之積層方向上不重疊。該等黏著層 40、42為可利用現有之塗佈裝置進行塗佈之最大尺寸以下。 根據如上所述般構成之保持用膜體丨2，如圖6所示般位於 間隙Sj之自吸附型片32之一部分❿因研磨時之抵壓力 等進入間隙。其結果，在與間隙Si對應之自吸附型片32 之吸附面上產生凹狀部321^因此，吸附保持於該凹狀部32b 之玻璃基板G之一部分Gi呈凸狀變形，且於玻璃基板G之被 研磨面上產生凹狀部5a。若於產生有凹狀部5a之狀態下對 玻璃基板G進行研磨，則該凹狀部5a不會被研磨。因此，如 圖7所不般成為凹狀部5a之部分於研磨後之玻璃基板〇中成 為凸狀部5A。 然而’形成於玻璃基板G表面上之凸狀部5A之高度a與圖 9中所不之先前之凹狀部4八之深度b、及圖14中所示之凸狀 部4B之南度c相比其絕對量變小，故而不會損及玻璃基板〇 之平坦性。 如圖6所示般位於間隙1處之自吸附型片32之一部分32c 155095.doc 201139056 因研磨時之抵壓力等而向進入間隙S2之方向變形。其結 果’在與間隙S2對應之自吸附型片32之吸附面上產生凹狀 部32心因此’吸附保持於該凹狀部32d之玻璃基板〇之一部 分G2呈凸狀變形，於玻璃基板〇之被研磨面上產生凹狀部 5b。若於產生有凹狀部5b之狀態下對玻璃基板G進行研磨， 則凹狀部5b不會被研磨。因此，如圖7所示般成為凹狀部扑 之部分於研磨後之玻璃基板G中成為凸狀部5Ββ 然而’自吸附型片32之一部分32a之變形量小於自吸附型 片32之一部分32c之變形量。其原因在於，由於黏著層4〇之 間隙直接與自吸附型片32之發泡構造部之微孔接觸，以 及該發泡構造部尺寸接近於間隙Sl之尺寸，故而與經由黏 著層40或基材3 8而接觸之間隙S2相比對自吸附型片32之變 形所造成之影響較小。 由此’形成於玻璃基板G表面之凸狀部5B之高度b與凸狀 部5A之高度a及圖9中所示之先前之凹狀部4A之深度b相 比’其絕對量大幅變小《自吸附型片32之一部分32a之變形 量不會損及玻璃基板G之平坦性。 根據貫施形態之保持用膜體12 ’可提高研磨後之玻璃基 板G之品質。 再者’如圖5所示般於保持用膜體12之背板36上設置有片 狀之彈性片材44 ’於該彈性片材44之外周固定有複數個卡 合構件46A、46B...。保持用膜體12係藉由張設彈性片材44 並使該等卡合構件46A、46B...卡合於圖1之研磨頭14之鉤掛 部（未圖示）而安裝於研磨頭14上。 155095.doc 12 201139056 圖4〜圖6中所^之特定間隙1、S2較佳為設定為15±1 5 mm ’更佳為設定為丨.5±1 4_。即，該等實施形態中規定 之特定間隙S!、Sz包含〇，較佳為〇〜3〇 mm。於間隙為〇之 情形時，不會於研磨後之玻璃基板G產生因轉印而導致之凸 狀部5A、5B(參照圖7)’又，若間隙為3 〇mm，則因轉印而 形成於玻璃基板G之凸狀部5A、5B不會對顯示器用玻璃基 板G之品質造成影響。 黏著層40、42之厚度分別較佳為5〇μηι以下，更佳為扣^以 以下，特佳為3 0 μηι以下。 進而，圖4〜圖6中所示之保持用膜體12可藉由與自吸附型 片32為同尺寸之基材38之強度而抑制研磨加工時之自吸附 型片32之面方向之伸展。 另一方面，為將大型玻璃基板研磨加工為所需之平坦 度，而必需如圖10中所說明般使保持用膜體具有厚度方向 之間隙（Α)與面方向之間隙（β)。 因此，如圖4所示般實施形態之保持用膜體12之間隙 (Β"")與圖12、圖π中所示之保持用膜體8、9之間隙（Β，，、 Β )大致相同，但由於實施形態之保持用膜體12之間隙 (Α"")僅相當於基材38之兩表面所具有之黏著層4〇、42之厚 度，故而較圖11〜圖丨3之保持用膜體7、8'9之間隙（Α，)〜(Am) 大幅減小。 由此，根據實施形態之保持用膜體12,與圖11〜圖13中所 示之保持用膜體7、8、9相比可提高研磨後之玻璃基板之品 質。 I55095.doc ·】3· 201139056 已詳細地且參照特定之實施態樣對本發明進行了說明， 但本領域技術人員當明白只要不脫離本發明之精神及範圍 則可添加各種變更或修正。 本申請案係基於2010年3月30曰申請之日本專利申請案 2010-077934者’其内容作為參照而併入本文中。 產業上之可利用性 根據本發明，可提高研磨後之玻璃基板之品質。 【圖式簡單說明】 圖1係應用實施形態之玻璃基板之保持用膜體的玻璃基 板之研磨裝置之立體圖； 圖2係表示實施形態之研磨裝置之要部構造之放大剖面 团 · 圆， 圖3係第1實施形態之保持用膜體之立體圖； 圖4係實施形態之保持用膜體之剖面圖； 圖5係於實施形態之保持用膜體上吸附保持有玻璃基板 之剖面圆； 圖6係藉由具有間隙而貼合之2片雙面接著片將自吸附型 片貼合於背板上之剖面圖； 圖7係形成於玻璃基板之表面之凸狀部之說明圖； 圖8係將2片雙面接著片之端部重疊而將自吸附型片貼合 於背板上之剖面圖； 圖9係形成於玻璃基板之表面之凹狀部之說明圖； 圖1 〇係用以說明保持用膜體之間隙之剖面圖； 圖Π係表示保持用膜體之第1比較例之剖面圖； 155095.doc •14· 201139056 圖12係表示保持用膜體之第2比較例之剖面圖； 圖13係表示保持用膜體之第3比較例之剖面圖；及 圖14係形成於玻璃基板表面之凸狀部之說明圖。 【主要元件符號說明】 自吸附型片 雙面接著片 基材 背板 凸狀部 凹狀部 保持用膜體 研磨裝置 研磨頭 板 研磨墊 研磨台 漿料供給孔 抽吸孔 主軸 旋轉/升降裝置 控制部 自吸附型片32之一部分 黏著層 彈性片材 1、32 2A〜2F、34、34A、34B 2G、2H、38 3 ' 36 4、4B、5A、5B 4A、5a、5b、32b、32d 6 、 7 、 8 、 9 、 12 、 112 、 212 10 14 16 18 20A substrate μ such as Polyethylene Terephthalate), and an adhesive layer 4, 42 formed by coating the surface of the substrate 38 155095.doc 201139056. The thickness of the substrate 38 is preferably about 75 μm, and the thickness of the adhesive layer 4 is preferably about 5 μm. Further, by making the thickness of the adhesive layer 42 on the side of the back sheet 36 thinner than the adhesive layer 40 on the side of the self-adhesive sheet 32, it is possible to contribute to improvement in the flatness of the glass substrate G. In the film body 12 for holding shown in FIG. 3 to FIG. 5, it is disposed in the same plane of one piece of the self-adsorption type sheet 32! The double-sided adhesive sheet 34, the adhesive layer 40 of the double-sided adhesive sheet 34 is coated on the substrate 38 with a specific gap (S1) and the adhesive layer also has a specific gap (8)) and is applied to the substrate 38. . Further, the gaps (S i , s2 ) are not overlapped in the lamination direction of the adhesive layer. The adhesive layers 40 and 42 are not larger than the maximum size that can be applied by a conventional coating device. According to the film body 2 for holding as described above, a part of the self-adhesive sheet 32 located in the gap Sj as shown in Fig. 6 enters the gap due to the pressing force during polishing or the like. As a result, the concave portion 321 is formed on the adsorption surface of the self-adsorption sheet 32 corresponding to the gap Si. Therefore, a portion Gi of the glass substrate G adsorbed and held by the concave portion 32b is convexly deformed, and is on the glass substrate. A concave portion 5a is formed on the surface to be polished of G. When the glass substrate G is polished in a state in which the concave portion 5a is formed, the concave portion 5a is not polished. Therefore, the portion which becomes the concave portion 5a as shown in Fig. 7 becomes the convex portion 5A in the polished glass substrate 〇. However, the height a of the convex portion 5A formed on the surface of the glass substrate G is different from the depth b of the previous concave portion 4 in FIG. 9, and the southness c of the convex portion 4B shown in FIG. Compared with the absolute amount, the flatness of the glass substrate is not impaired. A portion 32c 155095.doc 201139056 of one of the self-adsorbing sheets 32 located at the gap 1 as shown in Fig. 6 is deformed in the direction of entering the gap S2 due to the pressing force or the like at the time of grinding. As a result, the concave portion 32 is formed on the adsorption surface of the self-adsorption sheet 32 corresponding to the gap S2. Therefore, the portion G2 of the glass substrate which is adsorbed and held by the concave portion 32d is convexly deformed, and the glass substrate is deformed. A concave portion 5b is formed on the surface to be polished. When the glass substrate G is polished in a state in which the concave portion 5b is formed, the concave portion 5b is not polished. Therefore, as shown in Fig. 7, the portion which becomes the concave portion is formed into the convex portion 5? in the polished glass substrate G. However, the deformation amount of one portion 32a of the self-adsorption sheet 32 is smaller than the portion 32c of the self-adsorption sheet 32. The amount of deformation. This is because the gap between the adhesive layer 4 is directly in contact with the micropores of the foamed structure portion of the self-adsorbing sheet 32, and the size of the foamed structure portion is close to the size of the gap S1, and thus via the adhesive layer 40 or the base. The gap S2 of the material 38 is less affected by the deformation of the self-adsorbing sheet 32. Thus, the height b of the convex portion 5B formed on the surface of the glass substrate G is significantly smaller than the height a of the convex portion 5A and the depth b of the previous concave portion 4A shown in FIG. The amount of deformation of one portion 32a of the self-adsorption sheet 32 does not impair the flatness of the glass substrate G. The film body 12' for holding according to the conformal form can improve the quality of the glass substrate G after polishing. Further, as shown in FIG. 5, a sheet-like elastic sheet 44' is disposed on the back sheet 36 of the holding film body 12, and a plurality of engaging members 46A, 46B are fixed to the outer periphery of the elastic sheet 44. . . . The holding film body 12 is attached to the polishing head by stretching the elastic sheet 44 and engaging the engaging members 46A, 46B, ... with the hooking portion (not shown) of the polishing head 14 of Fig. 1 14 on. 155095.doc 12 201139056 The specific gaps 1, S2 shown in Figures 4 to 6 are preferably set to 15 ± 1 5 mm ', more preferably set to 丨. 5 ± 1 4_. That is, the specific gaps S! and Sz defined in the embodiments include 〇, preferably 〇3 to 3 mm. When the gap is 〇, the convex portions 5A and 5B (see FIG. 7) due to the transfer are not generated on the glass substrate G after polishing. Further, if the gap is 3 〇 mm, the transfer is caused by the transfer. The convex portions 5A and 5B formed on the glass substrate G do not affect the quality of the glass substrate G for display. The thickness of each of the adhesive layers 40 and 42 is preferably 5 〇 μη or less, more preferably 5% or less, and particularly preferably 30 ηηι or less. Further, the film body 12 for holding shown in FIG. 4 to FIG. 6 can suppress the stretching of the surface of the self-adsorbing sheet 32 during the polishing process by the strength of the substrate 38 having the same size as the self-adsorbing sheet 32. . On the other hand, in order to polish a large-sized glass substrate to a desired flatness, it is necessary to have a gap (Α) in the thickness direction and a gap (β) in the surface direction of the film for holding as shown in Fig. 10 . Therefore, the gap between the film body 12 for holding according to the embodiment shown in Fig. 4 (Β"") and the film bodies 8 and 9 for holding film shown in Fig. 12 and Fig. π (Β, 、, Β) The difference is the same, but the gap (Α"") of the film body 12 for holding of the embodiment only corresponds to the thickness of the adhesive layers 4, 42 of the two surfaces of the substrate 38, so that it is compared with Fig. 11 to Fig. 3 The gaps (Α, ) to (Am) of the holding film bodies 7, 8'9 are greatly reduced. Thus, the film body 12 for holding according to the embodiment can improve the quality of the glass substrate after polishing as compared with the film bodies 7, 8, and 9 for holding as shown in Figs. 11 to 13 . The present invention has been described in detail with reference to the specific embodiments thereof, and it will be understood by those skilled in the art that various changes or modifications can be added without departing from the spirit and scope of the invention. The present application is based on Japanese Patent Application No. 2010-077934, filed on March 30, 2010, the content of Industrial Applicability According to the present invention, the quality of the glass substrate after polishing can be improved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a polishing apparatus for a glass substrate to which a film body for holding a glass substrate according to an embodiment is applied; Fig. 2 is an enlarged cross-sectional group and a circle showing a structure of a main part of a polishing apparatus according to an embodiment; 3 is a perspective view of the film body for holding in the first embodiment; FIG. 4 is a cross-sectional view of the film body for holding in the embodiment; FIG. 5 is a cross-sectional circle in which the glass substrate is adsorbed and held on the film body for holding in the embodiment; 6 is a cross-sectional view of the self-adsorbing sheet attached to the back sheet by two double-sided sheets bonded together by a gap; FIG. 7 is an explanatory view of a convex portion formed on the surface of the glass substrate; A cross-sectional view in which the ends of the two double-sided sheets are overlapped to bond the self-adsorbing sheet to the back sheet; FIG. 9 is an explanatory view of the concave portion formed on the surface of the glass substrate; A cross-sectional view showing a gap of the film for holding; FIG. 12 is a cross-sectional view showing a first comparative example of the film for holding; 155095.doc •14·201139056 FIG. 12 shows a second comparative example of the film for holding. Sectional view; Figure 13 shows the first film body for holding 3 is a cross-sectional view of a comparative example; and Fig. 14 is an explanatory view of a convex portion formed on the surface of a glass substrate. [Description of main component symbols] Self-adhesive sheet double-sided backing substrate backing plate convex portion concave portion holding film body polishing device polishing head plate polishing pad polishing table slurry supply hole suction hole spindle rotation/lifting device control Part of the self-adhesive sheet 32 is an adhesive layer elastic sheet 1, 32 2A 2F, 34, 34A, 34B 2G, 2H, 38 3 ' 36 4, 4B, 5A, 5B 4A, 5a, 5b, 32b, 32d 6 , 7, 8, 9, 12, 112, 212 10 14 16 18 20
22A-22F22A-22F
24A-24G 26 28 30 32a、32c 40 ' 42 44 155095.doc •15 201139056 46A ' 46B A a b c24A-24G 26 28 30 32a, 32c 40 ' 42 44 155095.doc •15 201139056 46A ' 46B A a b c
GG
Gi ' G2 S】、S2、A、B、A,、B'、A"、 B"、A'"、B"'、A""、B"" 卡合構件 被研磨面 凸狀部5A之高度Gi ' G2 S】, S2, A, B, A, B', A", B", A'", B" ', A"", B"" engaging members are convexly convex The height of the 5A
凸狀部5B之高度、凹狀部4A 之深度 凸狀部4B之高度 玻璃基板 玻璃基板G之一部分 間隙 155095.doc -16·The height of the convex portion 5B, the depth of the concave portion 4A, the height of the convex portion 4B, the glass substrate, a portion of the glass substrate G, the gap 155095.doc -16·