TW201132991A - RF anechoic chamber - Google Patents

RF anechoic chamber Download PDF

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Publication number
TW201132991A
TW201132991A TW99108457A TW99108457A TW201132991A TW 201132991 A TW201132991 A TW 201132991A TW 99108457 A TW99108457 A TW 99108457A TW 99108457 A TW99108457 A TW 99108457A TW 201132991 A TW201132991 A TW 201132991A
Authority
TW
Taiwan
Prior art keywords
anechoic chamber
wall
rectangular
wall surface
absorbing material
Prior art date
Application number
TW99108457A
Other languages
English (en)
Chinese (zh)
Other versions
TWI407117B (ko
Inventor
rong-zong Liu
Original Assignee
Emtrek Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Emtrek Technologies Corp filed Critical Emtrek Technologies Corp
Priority to TW99108457A priority Critical patent/TW201132991A/zh
Publication of TW201132991A publication Critical patent/TW201132991A/zh
Application granted granted Critical
Publication of TWI407117B publication Critical patent/TWI407117B/zh

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  • Drying Of Semiconductors (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Aerials With Secondary Devices (AREA)
TW99108457A 2010-03-23 2010-03-23 RF anechoic chamber TW201132991A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99108457A TW201132991A (en) 2010-03-23 2010-03-23 RF anechoic chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW99108457A TW201132991A (en) 2010-03-23 2010-03-23 RF anechoic chamber

Publications (2)

Publication Number Publication Date
TW201132991A true TW201132991A (en) 2011-10-01
TWI407117B TWI407117B (ko) 2013-09-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW99108457A TW201132991A (en) 2010-03-23 2010-03-23 RF anechoic chamber

Country Status (1)

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TW (1) TW201132991A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103364596A (zh) * 2012-03-29 2013-10-23 鸿富锦精密工业（深圳）有限公司 电波暗室

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2574409B2 (ja) * 1988-07-08 1997-01-22 松下電器産業株式会社 Ｅｍｃ試験用電磁波無響室およびそのシールド材
TWI374007B (en) * 2004-03-22 2012-10-01 Toray Industries Electromagnetic wave absorbing sheet material and electromagnetic wave absorbin body using it
TWI318299B (en) * 2007-02-26 2009-12-11 Inventec Appliances Corp Method for simulating measure data of field strengths of electromagnetic waves
CN101425856A (zh) * 2008-06-04 2009-05-06 吴承胜 一种手机测试微型暗室设备
TWM354627U (en) * 2008-07-30 2009-04-11 Champro Technology Co Ltd Laboratory

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103364596A (zh) * 2012-03-29 2013-10-23 鸿富锦精密工业（深圳）有限公司 电波暗室

Also Published As

Publication number Publication date
TWI407117B (ko) 2013-09-01

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