201131318 六、發明說明： 【發明所屬之技術領域】 本發明係關於—種曝光裝置，係驅動由光電結晶材料 所構成之開關元件來生成既定之明暗圖案，將該明暗圖案 曝光於被曝光體上；更詳細地說，係關於一種曝光裝置， 將曝光位置以類比方式控制以謀求提升曝光圖案之定位精 度。 【先前技術】 習知之此種曝光裝置’係使得光電結晶材料所構成複 數開關兀件於二維平面内排列以所具有之圖案產生器來生 成既定之圖案，將該圖案對於在一方向搬運中之被曝光體 進㈣光’上述圖案產生器，係使得複數開關元件在與被 曝=搬=方向呈正交之方向以既定間距配置n 線狀 之歼^列’於被曝光體搬運方向上以既定間隔配置複 數歹f使㈣接之開關元件顺此在與被曝光體搬運方 内呈父之方向錯開既定量來配置（例如參見特開2007 _ 310251號公報）。 但是，於此種習知之曝光裝置，由於曝光位置之解析 能力係取決於開關元件之端面尺寸（像素尺寸）以及開關 元件列在與被曝光體搬運方向呈正交方向上的偏移量，故 為了提高曝光位置之解析能力，必須縮小像素尺寸且儘量 減少開關元件列在與被曝光體搬運方向呈正交方向上之偏 移量，有圖案產生器之製造變得困難且零件成本辦 【發明内容】 曰 关。 201131318 是以，本發明為了處理此種問題點，其目的在於提供 一種曝光裝置，係將曝光位置以類比方式控制而謀求 曝光圖案之定位精度。 @ 為了達成上述目的，本發明之曝光裝置曝光裴置，具 備有：光束點生成機構，係接收光源光而生成以既定間^ ，互錯開至少排列2列之複數光束點；光掃描機構，係使 知該複數光束點於該等排列方向分別於既定範圍内進行往 返掃描；圖案產生器’係藉由將複數開關元件加以開啟、 關閉驅動，來對該光源光進行光調變而生纽定之明暗圖 案，該複數開關元件係由角柱狀光電結晶材料所構成，曰以 中心軸分觸齊於該減光絲之往返㈣巾心的方式配 置，在與該中心軸平行之對向面設置有一對電極；以及投 影透鏡’縣該明暗圖案投影於被#光體上；且該各開^ 7G件在該光束點之掃描方向之寬度係較該光束點在同方向 之寬度為大。 、藉由此種構成，係以光束點生成機構接收光源光而生 成以既定間隔相互錯開之排列至少2列之複數光束點，利 ，，掃描機構使複數光束點在其等之排列方向上分別於既 =乾圍内往返掃描，並利用圖案產生器使其中心軸分別對 A於上述複數光束點之往返掃描中心來配置，藉由在與該 令心軸平行之對向面設置有—對電極之角柱狀光電結晶： 枓所構成之複數開關元件受到開啟、關閉驅動，來對光源 光進行光調變而生成既定之明暗圖案，以投影透鏡將此明 暗圖案投影於被曝光體上。於此種情況下，將各開關元件 4 201131318 在光束點掃描方向之寬度設定為大於光束點於同方向上之 寬度，讓光束點掃描開關元件上，並藉由控制開關元件之 驅動時機來將被曝光體上之明暗圖案位置以類比方式控 制。從而，藉由控制開關元件之驅動時機，則利用複數開 關元件作光調變而形成於被曝光體上之明暗圖案的位置能 以類比方式控制。藉此，即使是具有複數開關元件至少排 列2列之簡單構成的圖案產生器，亦可提高曝光圖案之定 位精度並降低裝置之製造成本。 此外，前述光束點生成機構為具有複數聚光透鏡於平 面内排列之微透鏡列。藉此，以具有於平面内排列複數聚 光透鏡之微透鏡列生成複數光束點。從而，可將光源光聚 光生成光束點，可提高光源光之利用效率。因此，可減低 所使用之光源的功率，可減輕光源之負擔。 再者，前述光束點生成機構係具有複數開口於平面内 排列之光罩。藉此，以具有複數開口於平面内排列之光罩 來生成複數光束點。從而，可藉由使用光微影技術所形成 之光罩來生成複數光束點。因此，能以高精度來形成此複 數光束點之形狀以及位置，可更為提高曝光圖案之定位精 度。 此外，前述光掃描機構係於方型塊狀之光電結晶材料 的對向側面使得既定寬度之一對帶狀電極，以其長邊中心 軸與該側面之長寬其中一者之中心轴成為既定角度的方式 傾斜形成，光可通過該一對電極間。藉此，因光掃描機構 係於方型塊狀之光電結晶材料的對向側面使得既定寬度之 201131318 對▼狀電極，以其長邊中心軸與該側面之長寬其中一者 之中心軸成為既^角度的方式傾斜形成 ，光可通過該一對 電極間^故以此光掃描機構讓複數光束點分別於既定範圍 内在返知插。從而，能以驅動電壓來控制光束點之掃描。 因此要事先取得開關元件上之光束點位置與驅動電壓 之相關’元件上之光束點位置可從驅動電壓得知， 機能以驅動電壓來控制。 此外’刚述被曝光體係於與該光束點之掃描方向呈大 致正父=向上連續移動。藉此，一邊使得被曝光體於與光 束點之掃&方向呈大致正交方向上連續移動—邊進行曝 光。從而，可一邊連續移動被曝光體一邊進行曝光，可縮 短曝光製程之生產時間。 【實施方式】 以下’依據所附圖式詳細說明本發明之實施形態。圖 1係顯示本發明之曝光装置之實施形態之示意圖。此曝光 裝置’係驅動由光電結晶材料所構成之開關元件來生成既 定之明暗圖案，將該明暗圖案曝光於被曝光體上者；具備： 搬運機構1、曝光光學單元2、攝像機構3、以及控制機構 4 °以下’針對被曝光體為濾色片基板之情況作說明。 圖2係本發明之曝光裝置所使用之濾色片基板$之俯 視圖。此濾色片基板5係黑矩陣（具備矩陣狀之可穿透光之 複數像素6)形成於透明玻璃基板表面所得者。 於上述搬運機構1，塗佈有既定彩色光阻劑之濾色片 基板5係載置於平台7上面朝一方向（圖1所示箭頭a方 6 201131318 被連’搬運，藉由例如馬達與齒輪等組合所構成之銘 移動平台7。或是，亦可於平台7表面々 平衡而讓=及^° ’使得4體之喷輪出以及吸引力達到 下淮色片基板5於平台7上處在上浮既定量的狀能 板5 St此外’於搬運機構1設有用以測量遽色片： 之移動距離的位置感應器（圖示省略）。 光學g =運機構1上妓有曝光鮮單元2。此曝光 之曝朵Φ係將光源光L1加以光調變而生成既定明暗圖案 得^色2 ’將該曝光光L 2照射於濾色片基板5表面而使 之行進土板5之對應像素6上的彩色光阻劑曝光；於光 成:構=自二游側依順序具備：光源裝置8、光束點生 九扣描機構10、圖案產生器11、以及投影透鏡 丄2 0 昭 处’上述光源裝置8,乃對於後述光束點生成機構9 i有具有均勻亮度分布之光源光1^之平行光者，構成上具 •放射紫外線之雷射光源、將此雷射光源所放射之光 #、、、/的光束徑加以放大之擴束器、使得經放大光束徑之 二“ Li的亮度分布均勻化之例如光學積分器、以及將亮 又刀布均勻化之光源光L】調整為平行光之聚光透鏡。 此外’上述光束點生成機構9，乃接收光源光Ll而朝 與圖 1 φ r前碩A所示基板搬運方向呈正交方向以排列間距 一1相互錯開至少排列2列而生成複數光束點者，具體而 "如圖3所示般讓複數聚光透鏡13於透明基板14表面 〇士排列成2列而成為微透鏡列。此種情況下，2列透鏡 7 201131318 列u之間隔係設定為W2。此外，於各聚光透鏡i3周圍形 成有遮光膜16，可遮斷光之穿透。 再者’上述光掃描機構10係使得由上述光束點生成機 構9=生成之複數光束點在與基板搬運方向（箭頭A方向） 之正交方向（上述複數聚光透鏡13之排列方向 進行往返掃描者，如圖4(a)所示般係二 之-對材枓17的對向側面i7a ’使得具有既定寬度 、帶狀電極18以其長邊中心軸與上述側面丨％之長寬 過該:成門為既定角度的方式傾斜形成，讓光通 € 之間。於此種情況下，若對兩電極18間 施加電场’則由兩電極18所挾持之部分的光電 17的折射率合轡仆，品认_ 日日材枓 仙邱、 化而於该兩電極18所挾持之部分盥苴 4==7b)產生折射率差。從而，光源二 此折射率差而於上述界面17b被折射H若 述;面率之差上述電極18間的電場變化來改變上 機構1。所射出之光源光自光掃插 光束點19於後述開關开杜^以既疋之擺動角9作擺動， 箭頭B、C方向進行往返掃^參見圖5)上會朝同圖所示 圖案（曝光光L )，且士 1進行光调變而生成既定之明暗 數開關元件21 ί如/圖4^柱狀光電結晶材料所構成之複 _心軸分別對齊複數先束點19之往返掃描的二= 8 201131318 中以前頭B、C所示之杏未 頭A所示基板搬運方向的掃描方向（圖1中以箭 互錯開排列配置成2列：二方向）上以排列間距％相 一 、 J與上述光束點19之掃描方向（箭 二A 一方對應之寬度W3 (於本實施形態中係以W3 ΙΛ7! 較光束點19在同方向之寬度1來得 大，與光束點之掃描方向平行之側面對向对—f = 20。此外，2列開關元杜 才電極 當於光束點生成機構9之12二孤之中心線間距離係相 w2。此外，圖案產生琴^ =鏡列15的中心線間距離 23，其具備上述複數開關件組裝體 於光掃描機構1。之入射 偏光板24，係近接配置 配置於開關元件組裝體23 偏光板25，係近接 兩個偏光板24、25係、配m ^面。於此種情況下， (crossed nicols)。 錢光軸相互正交之偏光正交 以此方式構成之圖案 。 即，如圖6所示般，通過== 係以下述方式動作 之光源光L,於偏光板24 m ,成機構9之聚光透! 之光源光Ll於偏光板24 ===機構9之聚光透： 元件21之人Μη 成為直線偏光之後，係如 -妒山射端面2la。於此種情、戈了 i射入開闕 不奴，當開關元件21之 清况下’如同圖（a) 兀件21係成為 ° 破施加電壓之時 的偏波面不會4=，通過開闕元件2】内/ 亦 鏡13 的偏波面不會旋 ，通2 .，…「V〈直娩Μ 21b所射出之 〃而，自開關元件2〗之射扁光 呈正交，直綠直線偏先的偏波面相對於偏先板出則端面 另一方、、’复偏光會被此偏光板25所遮斯。之偏料 ^，如圖6⑴所示般，若對於開闕元件21 9 201131318 之電極20施加既定之電壓將開關元件21加以開啟驅動， 則通過該開關元件21内之直線偏光的偏波面會作90°旋 轉。從而，自開關元件21之射出側端面2lb所射出之直線 偏光的偏波面，係與偏光板25之偏光軸一致，直線偏光會 通過偏光板25。如此般，圖案產生器11可使得複數開關元 件21對應於既定之圖案進行開啟、關閉驅動，以生成經明 暗式光調變之曝光光L2並加以射出。 其次，針對上述開關元件組裝體23之形成方法參照圖 7作說明。 首先，於圖7 (a)所示之光電結晶材料所構成長方條 狀板材26之一面，如同圖（b)所示般，使用切割機於其 長軸平行地形成深度D之溝槽27，相對於長邊中心軸對稱 地形成寬度W5之一對凸部28。此時，兩凸部28之中心線 間隔係設定為間隔W2。 其次，如圖7 (c)所示般，於與上述一對凸部28的長 軸平行之兩側面以及溝槽27之底面部以公知技術形成導 電膜29。 接著，如同圖（d)所示般，使用刀片之片厚為W3( = WJ之切割機，於上述一對凸部28的短軸方向以寬度W3 (W3> W5)、間距2W3來形成深度較上述溝槽27之深度D 為深之分離溝槽30，將一對凸部28作複數分割來形成複 數開關元件21。此時，於同圖（d)中，對於右側凸部28 使得切割機之刀片朝箭頭E方向移動來分割右側凸部2 8之 後，對於左側凸部28使得切割機之刀片朝箭頭F方向移動 201131318 而保賴右側凸部28之鄰接之分離 側凸部28部分來分割左側凸部2 〇間相對應之左 元件21彼此錯開而排列為2列之 \ ，形成複數開關 此種情況下，若以於長軸方向延伸之^件㈣體23。於 之導電膜29作為接地電極端子，則^槽27的底面部 對電極20，開關元件纽裝體23在長邊開關元件21之一 成為接地電極。 心軸側之電極20 圖8係顯示上述開關元件組襞體幻 說明圖。如同圖所示般，針對於圖7 (c之其他形成方法之 之平行於長軸之侧面以及溝槽27之^所示—對凸部28 29的光電結晶材料之長方“板材26&2形成有導電膜 上述-對凸部28以斜向方式形成深 用切割機來對於 度D來得深之分離溝槽30，將一對凸上述溝槽27之深 此時，藉由適當設定一對凸部28之中、28分割為複數份。 28 基板移動方向（前頭A方向）觀看’可使得鄰接之開關元 件21之端部21c如同圖以虛線所示般重疊。藉此，當濾色 片基板5於圖1中沿箭頭A方向移動並進行曝光之際，藉 由於基板移動方向前後存在之開關元件21之端部21c進行 重複曝光，町避免於曝光圖案之一部份產生未曝光部之問 題。於此種情況下，如圖8所示般，由於開關元件21之端 部21c受到斜向切除，該端部21c所造成之平均曝光量會 成為以直角形成之端部21c之情況卞的，光量的一半。從 而，藉由上述重複曝光得到既定之溱光量’而進行既定深 201131318 度之曝光。因此，可避免因重複曝光所致過度曝光之問題。 此外’上述投影透鏡12係將上述圖案產生器11所生 成之明暗圖案縮小投影於濾色片基板5面上，構成上包含 成像透鏡31與物透鏡μ ^ 朝基板搬運方向（箭頭A方向）在上述曝光光學單元 2之前方侧設有攝像機構3。此攝像機構3係對濾色片基板 5表面進行攝像者，於基板搬運方向之大致正交方向上有 多數之受光兀件排列成一直線狀成為線狀攝像機，如圖9 所示般’相對於開關元件組裝體23當中朝基板搬運方向位 於内側之開關元件列22a之中心軸係離開距離L來配置 著。此種情況下，開關元件組裝體23與攝像機構3係相互 定位配置，開關元件组裝體23之開關元件21A係與攝像 機構3之長邊中心軸上之位置xi〜&對應，開關元件21B 係與位置&〜&對應，開關元件21C係與位置χ3〜χ4對應， 開關元件21D係與位置χ4〜χ5對應，開關元件2ιε係與位 置h〜&對應’開關元件21F係與位置&〜&對應。此外， 平台7下側之對向於攝像機構3之攝像位置設有圖示省略 之照明機構’可對渡色片基板5之上述攝像位置進行照明 以利用攝像機構3進行基板表面之攝像。 設置有與上述搬運機構i、光掃描機構1〇、圖案產生 器11之開關7G件組裝體23、以及攝像機構3作電連接之 制機構4。此控制機構4係、將各構成要素加以適切地驅動二 如圖10所示般，具備有圖像處理部33、運算部^ 體35、搬運機構，鶴㈣H 36、光掃描機翻動控= 12 201131318 37、開關元件驅動控制器38、以及控制部39。 此處’上述圖像處理部33係對於由攝像機構3所取得 之濾色片基板5之像素6之一維圖像進行處理，檢測亮度 心支之位置，將該位置作為像素6之邊緣部位置來檢測。 此外，上述運算部34係基於搬運機構丨之位置感應器 的輸出來算出濾色片基板5之移動距離，對後述開關元件 驅動控制38發出驅動指令，使得渡色片基板$移動相當於 ，，述5己憶體35所事先設定保存之攝像機構3與開關元件 組裝體23之各開關元件列22a，22b之間的距離[、（[ + W2)。 再者，上述記憶體35係事先保存雷射光源之功率、攝 ^機構3與開關元件組裝體23之各開關元件列22a，22b間 離L、（L+W2)等初期設定值之數據，並暫時保存運 ^ 34《運算結果以及由圖像處理部33賴測之像素6 的邊緣部位置數據。 此外，上述搬運機構驅動控制器36係驅動搬運機構1 、查姨動機構使#平台7沿圖1中箭頭A方向以—定速度來 運續移動。 再者上述光掃描機構驅動控制器37係對於光掃描機 才焉 10 中區| 、、固u所示鋸齒狀驅動訊號，使得於光掃描機構 被γ狀電極a所挾持之部分與其他部分之間的界面 所毛生之折射率差在既定範圍内作連續性變化，而使 t自光巧機構丨。所射出之雷射光之光束點19於既定範 内進打往返掃描。此種情況下，由於光束點19之掃描速 13 201131318 度取決於上述鑛齒狀驅動訊號之反覆周期，故控制驅動^ 號之反覆周期使得光束點19之掃描速度與搬運機構！之平 台7的移動速度（等同於遽色片基板5之移動速度 同步。此外，光束點19之掃描速度通常係設定為在濟色片· 移動距離w5(W5f__元件21於基板搬運方 向之寬度）或比距離％更短之距離之間進行一次往返。此 束點19之雜速度相對_、色片基 降、μ^又係设定為非常快。此外，係將驅動訊號下 制成上升速度的1G倍’以使得光束點19之返回 τ描逮度成為前進掃描速度之大致10倍。 所值此1 卜，。上述開關元件軸控制38係接收自運算部34 邊缘ί位it令而依序讀取保存於記憶體35之像素6的 組妒俨Μ 進仃開啟、關閉驅動）送訊給開關元件 行心h於此種,|#況下，關元件_控们8係於進 訊號送19之前進掃描期間將開啟、關閉驅動 期間二二於光束點19之返回掃描 驅動係扮演將上述各要素加以適切地 針對此種構成之曝光裝置之動作作說明。 位、载置於:=无定:色光阻劑之遽色片基板5定 e . 歲構1之平台7上之既定位置。之後，一 開關作動’由控制機構4之搬運機構驅動控制器36 201131318 搬職構丨便起動，从片 前頭向以-定速度受到搬運。 所不 置，濾皮搬運到達攝像機構3之攝像仅 攝像圖像心像機構3作攝像，此-維< 時，於圖3 之圖像處理部33受到圖像處理。ί 向（箭頭A方向）之正上=攝，像在基板搬運方 既定臨界值而急變之位置檢變化，將亮度超過 部。 排切素6 (亮部）之邊緣 具體而言，如圖12 (a)所千 被搬運，像素6在基板搬運方向=:―旦濾色片基板5 攝像位置，此時依據所攝像之機構3之 上之像素6 (亮部）之邊緣部的=像而檢測出例如線Pl 此位置數據被保存於記憶體35。 二X:；^:x二.’ 定成每隔兩個像辛6 (真邻）、種清况下’右事先设 诼I 1冗0P)進行檢測，則可盔視位於相 ^ 之鄰接的兩個像素队間之其他色（例如 綠藍）之像素6G、6B。 一=片基板5於圖12(a)中沿箭頭A方向被搬運， 二1與開關元件組裝體23之開關元件列22a中心轴 對^ ’線？1上之既定位置係受該開關元件列瓜之各開關 兀件21作選擇性曝光。亦即，線匕上之位置間、 位置X4與x9間、以及位置Xl2與χ]3間係分別由開關元件 21C、21E、21K擔當進行曝光。此種情況下，開關元件加 在光束點19正在掃描位置X8與々間之過程中受到開關元 201131318 #_#制38之控啟驅動。同樣地，開關元件 21Ε在光束點19正在掃描位置〜與&間之過程中被開啟 驅動’開關元件21Κ在光束點19正在掃描位置h與 間被開啟驅動。藉此’如同圖中繪有交叉影線所示般，像 素6R上之位置〜與Χ3間、位置&與&間以及位置^與 x13間之區域受到曝光。此時，關元件列瓜之開關元件 21A、21G、21I、21M受到關閉驅動。此外，開關元件21 上之光束點19之位置係和光掃描機構1()之雷射光束的擺 動角:相關、該雷射光束之擺動角θ係與光掃描機構驅動 控制益37之驅動訊號電屋相關。從而，開關元件21上之 光束點19之位置可從上述驅動訊號電壓得知。 π之後;_一邊使得光束點19往返掃描一邊與上述同樣地 使得開關元件列22a之各開關元件21受到驅動，對於以一 疋速度移動中之濾色片基板5實行曝光。此外，此曝光於 圖12(a)中係基於圖像數據(於線&在與箭頭A為相反方 向上漸次錯開距離相等於濾色片基板5於光束點19進行— 次往返之間所移動之距離之位置所攝像者）來驅動上述各 開關元件21而進行。 此外，如圖12 (b)所示般，一旦濾色片基板5移動 使付線P!與開關元件列22b之中心軸對齊，則線p〗上之既 定位置會因該開關元件列22b之各開關元件21B、21D、 21F、21H、21J、21L·受到選擇性曝光。亦即，線Ρι上之 位置X4與X5間、位置心〇與Xu間、以及位置χ】3與心]間 係和前述同樣分別由開關元件21D、21J、21L擔當進行曝 201131318 光。此時，’開關元件21B、21F、21H受到關閉驅動。 另一方面，開關元件列22a之各開關元件21係自記慎 體35讀取出相對於線Pi在與箭頭A呈相反方向上錯開w 之線P2上的像素6R之邊緣部之位置數據而由開關元件驅 動控制38所驅動。此外，線I上之像素6R之位置々與 X4間係利用開關元件21C而被曝光，像素6R之位置Xu ^ Xi3間係利用開關元件21Κ而被曝光。此時，開關元件2ΐΑ、 21E、21G、21J、21Μ受到關閉驅動。 之後，一邊對於以一定速度移動中之濾色片基板5使 知光束點19往返掃描一邊以開關元件列22a對像素6玟上 之既定位置先行作曝光，且以開關元件列22b補齊開關元 件列22a之各開關元件21間的部分進行曝光。藉此，如圖 13中描繪成交又影線所示般’像素6R上受到曝光而形 既=之曝光圖案40。如本實施形態般，當光束點之掃描速 度遠咼於濾色片基板5之移動速度的情況下，如圖13所示 般，可平順地形成相對於基板搬運方向呈斜向交叉之曝光 圖案之邊緣部或圓形之曝光圖案之邊緣部。此外，由於旯 板搬運方向之正交方向的光束點之照射位置能以類比方^ 進订控制’故有別於習知之數位控制，可進行更緻密之圖 案曝光。 此外，於上述實施形態中，係針對開關元件組裝體Μ 以2列之開關元件列22a、创來構成之情況作了說明，惟 本發明不限於此，亦能以2列之開關元件列咖、22b作為 1組而將複數組於基板搬運方向上以既定間距排列配置。 17 201131318 藉:’濾色片基板5之像素6上的區域能以複數組 重曝光，可降低 為：列惟:::光束點生成機構9 生成機構9柯為在平面内_有^^^纽 "帶狀電極心邊= :者=成為既定角度的方式傾斜形成之情上： =惟’光掃描機構1〇亦可為例如電磁制 種^ 件、要可使㈣光隸返掃财無論何 種皆可。 Η此^於以上之說日种’係針對被曝光體域色片基 ，之情況作了描述，惟本發明不限於此，被曝光體亦可 為例如電路基板等任何物。 【圖式簡單說明】 圖1係顯示本發明之曝光裝置之實施形態之示意圖。 圖2係顯示上述實施形態所使用之濾色片基板之一構 成例之俯視圖。 、圖3係顯示本發明之曝光裝置之光束點生成機構之-構成例之圖’（a)為俯視圖，（b)為前視圖。 圖4係顯示本發明之曝光裝置之光掃描機構之一構成 例之® ’（a)係立體圖，（b)係⑷之〇箭頭視圖。 201131318 圖5係顯示本發明之曝光裝置之開關元件組襞體之一 構成例之俯視圖。 圖6係顯示上述開關元件組裝體之各開關元件的動作 之說明圖，（a)係顯示關閉驅動狀態，⑴係顯示開啟驅 動狀態。 θ 7 ( a )〜（d )係說明上述開關元件組裝體之形 法之製程圖。 上述開關元件_體之其他形成方法之說 明圖’顯不攻終製程。 像機發明之曝光裝置之開關元件組裝體與攝 像機構之位置關係之說明圖。 方塊=⑺係顯示本發明之曝光裝置之控制機構之構成的 明圖 圖⑴系顯示驅動上述光掃描機構之驅動訊 就波形之說 之曝光動作 之說=2)a)、(b)係顯示本發明之曝光裝置 之曝光圖案一例 、圖13係顯示以上述曝光動作所形成 之說明圖。 【主要元件符錄說明】 1 搬運機構 2 曝光光學單元 3 攝像機構 4 控制機構 19 201131318 5 濾色片基板 6,6R，6G，6B 像素 7 平台 8 光源裝置 9 光束點生成機構 10 光掃描機構 11 圖案產生器 12 投影透鏡 13 聚光透鏡 14 透明基板 15 透鏡列 16 遮光膜 17 光電結晶材料 17a,17b 界面 18 帶狀電極 19 光束點 20 電極 21 開關元件 21a 入射側端面 21b 射出側端面 21A-21M 開關元件 22a,22b 開關元件列 23 開關元件組裝體 24,25 偏光板 201131318 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 板材 溝槽 凸部 導電膜 分離溝槽 成像透鏡 物透鏡 圖像處理部 運算部 記憶體 搬運機構驅動控制器 光掃描機構驅動控制器 開關元件驅動控制器 控制部 曝光圖案 21201131318 VI. Description of the Invention: [Technical Field] The present invention relates to an exposure apparatus for driving a switching element composed of a photoelectrically crystallized material to generate a predetermined light and dark pattern, and exposing the light and dark pattern to an object to be exposed More specifically, regarding an exposure apparatus, the exposure position is controlled in an analogous manner in order to improve the positioning accuracy of the exposure pattern. [Prior Art] The prior art such exposure apparatus is such that a plurality of switch elements formed of a photoelectrically crystallized material are arranged in a two-dimensional plane to have a pattern generator to generate a predetermined pattern for carrying in a direction. The exposed object enters (four) light 'the pattern generator, such that the plurality of switching elements are arranged in a direction orthogonal to the direction of being exposed = the direction in which the n-line is arranged at a predetermined pitch in the direction in which the object to be exposed is conveyed The plurality of 开关fs are arranged at a predetermined interval so that the (four)-connected switching elements are arranged in a predetermined amount in the direction of the parent to be exposed (see, for example, JP-A-2007-310251). However, in such a conventional exposure apparatus, since the resolution of the exposure position depends on the end face size (pixel size) of the switching element and the offset of the switching element in the direction orthogonal to the direction in which the object to be exposed is transported, In order to improve the resolution of the exposure position, it is necessary to reduce the pixel size and minimize the amount of shift of the switching elements in the direction orthogonal to the direction in which the object to be exposed is transported, and the manufacture of the pattern generator becomes difficult and the cost of the parts is invented. Content] Shaoguan. In order to deal with such a problem, the present invention aims to provide an exposure apparatus which controls the exposure position in an analogous manner to achieve the positioning accuracy of the exposure pattern. In order to achieve the above object, the exposure apparatus of the present invention is characterized in that: the beam spot generating means is configured to receive the light source light and generate a plurality of beam spots which are arranged at least two columns in a predetermined interval; the optical scanning mechanism is Obtaining that the plurality of beam spots are respectively reciprocally scanned within the predetermined range in the array direction; the pattern generator is configured to light-modulate the light source by turning on and off the plurality of switching elements to generate a neon a light-dark pattern, the plurality of switching elements are formed of a prismatic photoelectric crystal material, and the central axis is arranged to be in contact with the round-trip (four) core of the light-reducing wire, and a counter surface parallel to the central axis is disposed The counter electrode; and the projection lens 'the county's light and dark pattern is projected on the light body; and the width of the respective 7G pieces in the scanning direction of the beam spot is larger than the width of the beam spot in the same direction. According to this configuration, the beam spot generating means receives the light source light to generate a plurality of beam spots arranged at at least two columns at a predetermined interval, and the scanning means separates the plurality of beam spots in the direction in which they are arranged. Sweeping in and out of the dry circumference, and using a pattern generator to arrange the central axis thereof to the center of the reciprocal scanning of the plurality of beam points, respectively, by providing a pair on the opposite side parallel to the mandrel The columnar photo-crystal of the electrode: The plurality of switching elements formed by 枓 are turned on and off to light-modulate the light source light to generate a predetermined light-dark pattern, and the projection lens projects the light-dark pattern onto the object to be exposed. In this case, the width of each switching element 4 201131318 in the scanning direction of the beam spot is set to be larger than the width of the beam point in the same direction, so that the beam spot is scanned on the switching element, and by controlling the driving timing of the switching element, The position of the light and dark patterns on the exposed body is controlled in an analogous manner. Therefore, by controlling the driving timing of the switching elements, the position of the light and dark pattern formed on the object to be exposed by the light switching of the plurality of switching elements can be controlled in an analogous manner. Thereby, even in the case of a pattern generator having a simple configuration in which the plurality of switching elements are arranged in at least two columns, the positioning accuracy of the exposure pattern can be improved and the manufacturing cost of the apparatus can be reduced. Further, the beam spot generating means is a microlens array having a plurality of collecting lenses arranged in a plane. Thereby, a plurality of beam spots are generated by a microlens array having a plurality of condenser lenses arranged in a plane. Thereby, the light source light can be condensed to generate a beam spot, which can improve the utilization efficiency of the light source light. Therefore, the power of the light source used can be reduced, and the burden on the light source can be reduced. Further, the beam spot generating mechanism has a plurality of masks that are arranged in a plane. Thereby, a plurality of beam spots are generated by a reticle having a plurality of openings arranged in a plane. Thus, a plurality of beam spots can be generated by using a photomask formed by photolithography. Therefore, the shape and position of the complex beam spot can be formed with high precision, and the positioning accuracy of the exposure pattern can be further improved. Further, the optical scanning mechanism is formed on the opposite side surface of the square-shaped photovoltaic crystal material such that one of the predetermined widths of the strip-shaped electrode is defined by the central axis of one of the long-side central axis and the length of the side surface. The angle is formed obliquely, and light can pass between the pair of electrodes. Therefore, since the optical scanning mechanism is attached to the opposite side of the square-shaped photovoltaic crystal material, the 201131318 pair of the electrode having the predetermined width is formed by the central axis of one of the long-side central axis and the length of the side surface. The angle is formed obliquely, and the light can pass through the pair of electrodes. Therefore, the light scanning mechanism allows the plurality of beam spots to be inserted into the predetermined range. Thereby, the scanning of the beam spot can be controlled with the driving voltage. Therefore, it is necessary to obtain in advance the position of the beam spot on the switching element and the driving voltage. The position of the beam spot on the component can be known from the driving voltage, and the function can be controlled by the driving voltage. Further, the exposure system is described as being substantially normal to the scanning direction of the beam spot and continuously moving upward. Thereby, exposure is performed while continuously moving the object to be exposed in a direction substantially perpendicular to the sweep direction of the beam spot. Therefore, exposure can be performed while continuously moving the object to be exposed, and the production time of the exposure process can be shortened. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail based on the drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing an embodiment of an exposure apparatus of the present invention. The exposure device 'drives a switching element composed of a photoelectrically crystallized material to generate a predetermined light and dark pattern, and exposes the light and dark pattern to the object to be exposed; and includes: a transport mechanism 1, an exposure optical unit 2, an imaging mechanism 3, and The control mechanism 4 ° or less 'will describe the case where the object to be exposed is a color filter substrate. Figure 2 is a top plan view of a color filter substrate $ used in the exposure apparatus of the present invention. The color filter substrate 5 is a black matrix (a plurality of pixels 6 having a matrix of light transmissive light) formed on the surface of a transparent glass substrate. In the transport mechanism 1 described above, the color filter substrate 5 coated with a predetermined color photoresist is placed on the upper surface of the stage 7 in a direction (the arrow a 6 201131318 shown in FIG. 1 is connected) by, for example, a motor and a gear. The combination of the movement of the platform 7 or the surface of the platform 7 can be balanced and let = and ^ ° 'make the 4 body of the wheel and the attraction reaches the lower layer of the substrate 5 on the platform 7 The position sensor (not shown) for measuring the moving distance of the enamel film is provided on the transport mechanism 1 in the above-mentioned floating mechanism. The optical g=the transport mechanism 1 has the exposure fresh unit 2 The exposure Φ of the exposure is to modulate the light source L1 to generate a predetermined light and dark pattern. The exposure light L 2 is irradiated onto the surface of the color filter substrate 5 to make it correspond to the corresponding pixel of the soil plate 5. The color photoresist on 6 is exposed; in the light: structure = from the second side in sequence: light source device 8, beam point nine button mechanism 10, pattern generator 11, and projection lens 丄 2 0 The light source device 8 has uniformity with respect to the beam spot generating mechanism 9 i which will be described later. The light source of the light source of the light distribution is composed of a laser beam emitting ultraviolet light, and a beam expander for amplifying the beam diameter of the light #, , , / emitted by the laser light source, so as to be amplified The second beam path "the luminance distribution of Li is uniformed, for example, the optical integrator, and the source light L that homogenizes the bright knives" is adjusted to a condensing lens of parallel light. Further, the above beam spot generating mechanism 9 receives The light source light L1 is arranged in a direction orthogonal to the substrate transport direction shown in FIG. 1 φ r front A, at an arrangement pitch of 1 and at least two columns are arranged to generate a plurality of beam points, specifically as shown in FIG. The plurality of condensing lenses 13 are arranged in two rows on the surface of the transparent substrate 14 to form a microlens array. In this case, the interval between the two rows of lenses 7 201131318 is set to W2. Further, for each condensing lens i3 A light-shielding film 16 is formed around the light-shielding film 16 to block the penetration of light. Further, the light scanning mechanism 10 causes the plurality of beam spots generated by the beam spot generating means 9 to be positive in the substrate transport direction (arrow A direction). Direction of exchange The direction in which the condensing lens 13 is arranged is reciprocated, as shown in Fig. 4(a), the opposite side i7a' of the counter 枓 17 has a predetermined width, and the strip electrode 18 has its long side central axis. The length of the side surface 丨% is wider than this: the door is formed obliquely to a predetermined angle, and the light is passed between the two. In this case, if an electric field is applied between the two electrodes 18, the two electrodes 18 are The refractive index of the photo-electricity 17 of the holding portion is combined with the servant, and the refractive index difference is generated by the 盥苴4==7b) which is held by the two electrodes 18. This difference in refractive index is refracted at the interface 17b as described above. The difference in the area ratio changes the electric field between the electrodes 18 to change the upper mechanism 1. The light source light emitted from the light sweeping beam point 19 is oscillated by the swing angle 9 of the switch described later, and the arrow B and C directions are swept back and forth. See FIG. 5) and the pattern shown in the same figure ( Exposure light L), and the light modulation of the gentleman 1 to generate a predetermined light and dark number switching element 21 ί / / Figure 4 ^ columnar photoelectric crystal material composed of the complex _ mandrel respectively aligned with the complex first beam point 19 round-trip scanning 2 = 8 201131318 In the previous paragraphs B and C, the apricots shown in the head A showed the scanning direction of the substrate transport direction (in FIG. 1 , the arrows are arranged in a row and arranged in two rows: two directions). J is the scanning direction of the beam spot 19 (the width W3 corresponding to the arrow A side (in the present embodiment, W3 ΙΛ7! is larger than the width 1 of the beam spot 19 in the same direction, and is parallel to the scanning direction of the beam spot). The side opposite pair - f = 20. In addition, the two columns of switching elements are the phase w2 of the center line of the beam of the beam point generating mechanism 9. In addition, the pattern produces the center of the mirror = 15 a line-to-line distance 23, comprising the above-mentioned plurality of switch device assemblies in the optical scanning mechanism 1 The incident polarizing plate 24 is disposed in close proximity to the polarizing plate 25 of the switching element assembly 23, and is adjacent to the two polarizing plates 24 and 25, and is provided with an m^ plane. In this case, (crossed nicols). The polarized light whose axes are orthogonal to each other is orthogonal to the pattern formed in this manner. That is, as shown in Fig. 6, the light source light L that is operated by == in the following manner is concentrated on the polarizing plate 24 m by the mechanism 9 ! The source light L1 is polarized on the polarizing plate 24 === mechanism 9: The person Μη of the component 21 becomes a linear polarized light, and the end face 2la is like a mountain. In this case, the i shoots into the opening. No slave, when the switching element 21 is in the condition of 'as in the figure (a), the element 21 becomes °, the deflection surface when the voltage is applied is not 4 =, and the polarization surface of the inside/the mirror 13 is passed through the opening element 2] It will not rotate, pass 2 ., ... "V < 直 Μ b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b b The other side of the end face, 'the complex polarized light will be obscured by the polarizing plate 25. The biasing material ^, as shown in Fig. 6 (1), if for the opening element 21 9 2011 When the electrode 20 of 31318 applies a predetermined voltage to turn on and off the switching element 21, the deflecting surface of the linearly polarized light passing through the switching element 21 is rotated by 90. Thus, the straight line from the exit side end surface 2lb of the switching element 21 The polarized surface of the polarized light is aligned with the polarizing axis of the polarizing plate 25, and the linearly polarized light passes through the polarizing plate 25. Thus, the pattern generator 11 allows the plurality of switching elements 21 to be turned on and off corresponding to a predetermined pattern to generate a The light and dark light is modulated by the exposure light L2 and emitted. Next, a method of forming the above-described switching element assembly 23 will be described with reference to Fig. 7 . First, on one side of the rectangular strip-shaped plate material 26 formed of the photoelectrically crystallized material shown in Fig. 7(a), as shown in Fig. (b), the groove 27 of the depth D is formed in parallel on the long axis thereof using a cutter. One of the widths W5 is formed symmetrically with respect to the central axis of the long side. At this time, the center line interval of the two convex portions 28 is set to the interval W2. Next, as shown in Fig. 7(c), the conductive film 29 is formed by a known technique on both side faces parallel to the long axis of the pair of convex portions 28 and the bottom surface portion of the groove 27. Next, as shown in Fig. (d), a cutting machine having a blade thickness of W3 (= WJ) is used to form a depth in the minor axis direction of the pair of convex portions 28 with a width W3 (W3 > W5) and a pitch of 2W3. The separation groove 30 is deeper than the depth D of the groove 27, and the pair of convex portions 28 are divided into plural numbers to form the plurality of switching elements 21. At this time, in the same figure (d), the cutting is performed for the right convex portion 28. After the blade of the machine moves in the direction of the arrow E to divide the right convex portion 28, the left convex portion 28 causes the blade of the cutter to move in the direction of the arrow F 201131318 and the portion of the adjacent side convex portion 28 adjacent to the right convex portion 28 is retained. The left side elements 21 corresponding to the left side convex portion 2 are shifted from each other and arranged in two columns, forming a plurality of switches. In this case, if the element (four) body 23 extends in the long axis direction, the conductive film 29 is formed thereon. As the ground electrode terminal, the bottom surface portion of the groove 27 is opposite to the electrode 20, and the switching element housing 23 is a ground electrode in one of the long side switching elements 21. The electrode 20 on the spindle side Fig. 8 shows the above-described switching element group body Magical illustration. As shown in the figure, for Figure 7 (c The other forming method is parallel to the side surface of the long axis and the groove 27 is shown—the rectangular side of the photoelectrically crystallized material of the convex portion 28 29 is formed with a conductive film as described above and obliquely toward the convex portion 28 In this manner, the separation groove 30 deeper than the degree D is formed by the deep cutting machine, and the depth of the pair of convex grooves 27 is divided into a plurality of portions by appropriately setting the pair of convex portions 28, 28. The substrate moving direction (front A direction) is viewed so that the end portions 21c of the adjacent switching elements 21 are overlapped as shown by broken lines in the figure. Thereby, when the color filter substrate 5 is moved in the direction of the arrow A in FIG. At the time of exposure, by repeating the exposure of the end portion 21c of the switching element 21 which is present before and after the substrate moving direction, the town avoids the problem that an unexposed portion is generated in one portion of the exposure pattern. In this case, as shown in FIG. In general, since the end portion 21c of the switching element 21 is obliquely cut, the average exposure amount caused by the end portion 21c becomes half of the amount of light formed at the right end portion 21c. Thus, by the above repeated exposure Get a predetermined amount of light The exposure of the predetermined depth of 201131318 is performed. Therefore, the problem of overexposure due to repeated exposure can be avoided. Further, the projection lens 12 is configured to reduce and project the light and dark pattern generated by the pattern generator 11 on the surface of the color filter substrate 5. In the above configuration, the imaging lens 31 and the objective lens μ are arranged in the substrate transport direction (arrow A direction) on the side of the exposure optical unit 2, and the imaging mechanism 3 is provided on the surface of the color filter substrate 5. In the substantially orthogonal direction of the substrate conveyance direction, a plurality of light-receiving members are arranged in a line shape to form a linear camera. As shown in FIG. 9, the image is disposed inside the switching element assembly 23 toward the substrate conveyance direction. The central axis of the switching element row 22a is disposed away from the distance L. In this case, the switching element assembly 23 and the imaging unit 3 are positioned to each other, and the switching element 21A of the switching element assembly 23 corresponds to the position xi to the position on the central axis of the long side of the imaging unit 3, and the switching element 21B corresponds to the position &~& the switching element 21C corresponds to the position χ3~χ4, the switching element 21D corresponds to the position χ4~χ5, the switching element 2ιε corresponds to the position h~&the 'switching element 21F is Location &~& Further, an illumination unit θ, which is omitted from the imaging position of the imaging unit 3, on the lower side of the stage 7 is provided to illuminate the imaging position of the color filter substrate 5 to image the surface of the substrate by the imaging unit 3. A mechanism 4 that is electrically connected to the transport mechanism i, the optical scanning mechanism 1A, the switch 7G assembly 23 of the pattern generator 11, and the imaging unit 3 is provided. The control unit 4 is configured to appropriately drive each component. As shown in FIG. 10, the control unit 4 includes an image processing unit 33, a computing unit 35, and a transport mechanism. Crane (four) H 36 and optical scanner flip control = 12 201131318 37. Switching element drive controller 38 and control unit 39. Here, the image processing unit 33 processes the one-dimensional image of the pixel 6 of the color filter substrate 5 obtained by the imaging unit 3, and detects the position of the luminance core, and this position is used as the edge portion of the pixel 6. Location to detect. Further, the calculation unit 34 calculates the moving distance of the color filter substrate 5 based on the output of the position sensor of the transport mechanism ,, and issues a drive command to the switching element drive control 38 to be described later, so that the color filter substrate $ moves by, The distance between the imaging device 3 and the switching element arrays 22a and 22b of the switching element assembly 23 stored in advance in the fifth memory 35 is set to [, ([ + W2). Further, the memory 35 stores data of the initial setting values such as the power of the laser light source and the switching element arrays 22a and 22b of the switching element assembly 23 from the initial setting values such as L and (L+W2). The operation result and the edge portion position data of the pixel 6 measured by the image processing unit 33 are temporarily stored. Further, the transport mechanism drive controller 36 drives the transport mechanism 1 and checks the sway mechanism to move the #platform 7 at a constant speed in the direction of the arrow A in Fig. 1 . Furthermore, the optical scanning mechanism drive controller 37 is configured to perform a zigzag driving signal for the optical scanner in the middle region of the optical scanner, such that the optical scanning mechanism is held by the gamma electrode a and other portions. The refractive index difference between the two interfaces is continuously changed within a predetermined range, and t is caused by the light mechanism. The beam spot 19 of the emitted laser light is scanned back and forth within a predetermined range. In this case, since the scanning speed of the beam spot 19 is determined by the repetition period of the above-mentioned ore-shaped driving signal, the repetition period of the driving signal is controlled so that the scanning speed of the beam spot 19 and the transport mechanism are! The moving speed of the platform 7 (equivalent to the moving speed of the enamel substrate 5 is synchronized. In addition, the scanning speed of the beam spot 19 is usually set to be in the width of the substrate and the moving distance w5 (W5f__the width of the component 21 in the substrate carrying direction) Or a round trip between the distances shorter than the distance %. The noise speed of the beam point 19 is set to be very fast relative to _, the color base drop, and μ^. In addition, the drive signal is made up. The speed is 1G times' such that the return τ trace of the beam spot 19 becomes approximately 10 times the forward scan speed. The value of the switch element axis control 38 is received from the edge of the operation unit 34. The group of pixels 6 stored in the memory 35 is sequentially read, and the driving is turned on and off, and the signal is sent to the switching element. In this case, the component is controlled. The return scanning drive system that turns on and off the driving period 22 during the pre-scanning period before the signal transmission 19 plays the role of appropriately exposing the above-described elements to the exposure apparatus of such a configuration. Bit, placed on: = no fixed: color photoresist substrate 遽 color plate substrate 5 set e. Year 1 on the platform 7 on the established position. Thereafter, a switch operation is started by the transport mechanism of the control unit 4, which drives the controller 36, 201131318, and is transported from the front of the blade to the fixed speed. When the filter conveyance reaches the imaging mechanism 3, only the captured image cardiograph 3 performs imaging. In this case, the image processing unit 33 of Fig. 3 receives image processing. ί In the direction of (in the direction of the arrow A), the image is changed like the position where the substrate is transported at a predetermined critical value, and the brightness is exceeded. Specifically, the edge of the cut-off element 6 (bright part) is transported as shown in Fig. 12 (a), and the pixel 6 is in the substrate transport direction =: the color filter substrate 5 is photographed, and the mechanism is based on the image. The image of the edge portion of the pixel 6 (bright portion) on the 3 is detected as, for example, the line P1. This position data is stored in the memory 35. Two X:;^:x2.' is determined to be detected every two times like 辛6 (true neighbor), and under the condition of 'right pre-set 诼I 1 redundant 0P. The pixels 6G, 6B of other colors (for example, green and blue) between the two pixel groups. One = sheet substrate 5 is conveyed in the direction of arrow A in Fig. 12 (a), and the center of the switching element row 22a of the switching element assembly 23 is aligned with the center line. The predetermined position on 1 is selectively exposed by the switch members 21 of the switching element. That is, the position between the positions on the turns, the positions X4 and x9, and the positions X1 and χ3 are respectively exposed by the switching elements 21C, 21E, and 21K. In this case, the switching element is applied to the control point of the switch element 201131318 #_#38 during the process of scanning the position X8 between the beam point 19. Similarly, the switching element 21 is turned on during the scanning position between the beam spot 19 and the & drive element 21, and the beam element 19 is turned on while the beam spot 19 is being scanned. Thus, as shown by the cross hatching in the figure, the area between the position ～3, the position && and the position ^ and x13 on the pixel 6R is exposed. At this time, the switching elements 21A, 21G, 21I, 21M of the off-cell elements are turned off. In addition, the position of the beam spot 19 on the switching element 21 is the angle of oscillation of the laser beam of the optical scanning mechanism 1(): the angle of the oscillating angle θ of the laser beam and the driving signal of the optical scanning mechanism driving control House related. Thus, the position of the beam spot 19 on the switching element 21 can be known from the above-mentioned driving signal voltage. After π, while the beam spot 19 is being scanned back and forth, the switching elements 21 of the switching element row 22a are driven in the same manner as described above, and exposure is performed on the color filter substrate 5 which is moving at a speed of one turn. Further, this exposure is based on image data in FIG. 12(a) (between the line & in the opposite direction to the arrow A, the offset distance is equal to the color filter substrate 5 at the beam spot 19) The position of the moving distance is driven by the above-described switching elements 21 to be driven. Further, as shown in FIG. 12(b), once the color filter substrate 5 is moved so that the pay line P! is aligned with the central axis of the switching element row 22b, the predetermined position on the line p is due to the switching element row 22b. Each of the switching elements 21B, 21D, 21F, 21H, 21J, 21L· is selectively exposed. That is, between the positions X4 and X5 on the line Ρ, the position between the heart and the Xu, and the position 33 and the heart, the switching elements 21D, 21J, and 21L are respectively exposed to the light of the 201131318 light. At this time, the 'switching elements 21B, 21F, 21H are driven to be turned off. On the other hand, each of the switching elements 21 of the switching element row 22a reads the position data of the edge portion of the pixel 6R on the line P2 shifted by w from the line Pi in the opposite direction to the arrow A by the caution mechanism 35. The switching element drive control 38 is driven. Further, the position 々 and X4 of the pixel 6R on the line I are exposed by the switching element 21C, and the position Xu ^ Xi3 of the pixel 6R is exposed by the switching element 21 。. At this time, the switching elements 2A, 21E, 21G, 21J, 21A are driven to be turned off. Thereafter, while the beam spot 19 is being reciprocated for the color filter substrate 5 moving at a constant speed, the switching element row 22a is exposed to a predetermined position on the pixel 6A, and the switching element row 22b is used to fill the switching element. A portion between the respective switching elements 21 of the column 22a is exposed. Thereby, the exposure pattern 40 which is exposed to the pixel 6R is exposed as shown by the hatching in Fig. 13 as shown by the hatching. As in the present embodiment, when the scanning speed of the beam spot is farther than the moving speed of the color filter substrate 5, as shown in FIG. 13, the exposure pattern obliquely intersecting with respect to the substrate carrying direction can be smoothly formed. The edge portion or the edge portion of the circular exposure pattern. In addition, since the irradiation position of the beam spot in the orthogonal direction of the pallet conveyance direction can be controlled by analogy, it is different from the conventional digital control, and a denser pattern exposure can be performed. Further, in the above-described embodiment, the switching element assembly 22 has been constructed in two rows of switching element rows 22a, and the present invention is not limited thereto, and it is also possible to use two rows of switching elements. 22b is a group and the complex arrays are arranged at a predetermined pitch in the substrate conveyance direction. 17 201131318 Borrow: 'The area on the pixel 6 of the color filter substrate 5 can be re-exposure in a complex array, which can be reduced to: column only::: beam point generating mechanism 9 generating mechanism 9 is in-plane _ there ^^^ New " strip electrode core = : person = the way to become a fixed angle of inclination: = only 'light scanning mechanism 1 〇 can also be, for example, electromagnetic seed, to enable (four) light to swept back No matter what. The above description has been made with respect to the case of the exposed field color base, but the present invention is not limited thereto, and the exposed object may be anything such as a circuit board. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an embodiment of an exposure apparatus of the present invention. Fig. 2 is a plan view showing an example of a configuration of a color filter substrate used in the above embodiment. Fig. 3 is a view showing a configuration example of a beam spot generating mechanism of the exposure apparatus of the present invention. (a) is a plan view and (b) is a front view. Fig. 4 is a perspective view showing an example of a configuration of one of the optical scanning mechanisms of the exposure apparatus of the present invention, wherein (b) is a perspective view of the arrow (4). 201131318 Fig. 5 is a plan view showing a configuration example of one of the switching element group bodies of the exposure apparatus of the present invention. Fig. 6 is an explanatory view showing the operation of each of the switching elements of the above-described switching element assembly, wherein (a) shows a closed driving state, and (1) shows an open driving state. θ 7 ( a ) to (d ) are process diagrams for explaining the method of the above-described switching element assembly. The above description of the other forming methods of the switching element_body is not a final process. An explanatory view of the positional relationship between the switching element assembly and the image pickup mechanism of the exposure apparatus of the invention. Block = (7) is a plan view showing the configuration of the control means of the exposure apparatus of the present invention (1) showing the exposure operation of the waveform of the drive signal for driving the optical scanning mechanism = 2) a), (b) display An example of the exposure pattern of the exposure apparatus of the present invention, and FIG. 13 is an explanatory view showing the exposure operation. [Description of main components] 1 Transport mechanism 2 Exposure optical unit 3 Camera mechanism 4 Control mechanism 19 201131318 5 Color filter substrate 6, 6R, 6G, 6B Pixel 7 Platform 8 Light source device 9 Beam spot generation mechanism 10 Light scanning mechanism 11 Pattern generator 12 Projection lens 13 Condenser lens 14 Transparent substrate 15 Lens array 16 Light-shielding film 17 Photoelectric crystal material 17a, 17b Interface 18 Strip electrode 19 Beam spot 20 Electrode 21 Switching element 21a Incident side end face 21b Exit side end face 21A-21M Switching element 22a, 22b Switching element row 23 Switching element assembly 24, 25 Polarizing plate 201131318 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 Plate groove convex conductive film separation groove imaging lens lens image Processing unit calculation unit memory transport mechanism drive controller light scanning mechanism drive controller switching element drive controller control unit exposure pattern 21