JP5282979B2 - Exposure equipment - Google Patents

Description

  The present invention relates to an exposure apparatus that generates a predetermined light / dark pattern by driving a switching element made of an electro-optic crystal material, and exposes the light / dark pattern on an object to be exposed. Specifically, the exposure position is controlled in an analog manner. The present invention relates to an exposure apparatus that attempts to improve exposure pattern positioning accuracy.

  In this type of conventional exposure apparatus, a predetermined pattern is generated by a pattern generator having a plurality of switching elements made of electro-optic crystal material arranged in a two-dimensional plane, and the pattern is applied to an object being conveyed in one direction. The pattern generator includes a plurality of switching elements arranged in a straight line at a predetermined pitch in a direction orthogonal to the conveyance direction of the object to be exposed, in the conveyance direction of the object to be exposed. A plurality of rows are arranged at predetermined intervals, and adjacent switching element rows are arranged by being shifted by a predetermined amount in a direction orthogonal to the conveyance direction of the object to be exposed (see, for example, Patent Document 1).

JP 2007-310251 A

  However, in such a conventional exposure apparatus, since the resolution of the exposure position is determined by the end face size (pixel size) of the switching element and the shift amount of the switching element array in the direction orthogonal to the conveyance direction of the exposure object, In order to increase the position resolution, the pixel size must be reduced and the amount of shifting of the switching element array in the direction orthogonal to the conveying direction of the object to be exposed must be reduced. There was a fear.

  Accordingly, an object of the present invention is to provide an exposure apparatus that addresses such problems and attempts to improve the positioning accuracy of the exposure pattern by controlling the exposure position in an analog manner.

  In order to achieve the above object, an exposure apparatus according to the present invention comprises a beam spot generating means for receiving a light source light and staggering at least two rows at predetermined intervals to generate a plurality of beam spots, and the plurality of beam spots. Optical scanning means for reciprocating scanning within a predetermined range in the arrangement direction of each of the plurality of beam spots, the center axis of each of the plurality of beam spots being arranged so as to coincide with each other, and a pair of opposed surfaces parallel to the central axis. A plurality of switching elements made of a prismatic electro-optic crystal material provided with electrodes are turned on and off to light-modulate the light source light to generate a predetermined light-dark pattern, and to cover the light-dark pattern A projection lens that projects onto an exposure body, and sets the width of the beam spot in the scanning direction of each switching element to the beam spot. It is made larger than the width of the.

  With such a configuration, a plurality of beam spots are generated by receiving the light source light from the beam spot generating means and arranged in at least two rows alternately at a predetermined interval, and the plurality of beam spots are arranged in the arrangement direction by the optical scanning means. A prismatic shape in which a reciprocating scan is performed within a predetermined range, and a pattern generator is arranged so that the center axis coincides with the center of the reciprocating scan of the plurality of beam spots, and a pair of electrodes are provided on opposing surfaces parallel to the central axis. A plurality of switching elements made of the electro-optic crystal material are turned on / off to modulate light source light to generate a predetermined light / dark pattern, and the light / dark pattern is projected onto the object to be exposed by the projection lens. In this case, the width of the beam spot in the scanning direction of each switching element is made larger than the width of the beam spot in the same direction, the beam spot is scanned on the switching element, and the drive timing of the switching element is controlled to thereby expose the object to be exposed. The position of the upper light / dark pattern is controlled in an analog manner.

  The beam spot generation means is a microlens array having a plurality of condensing lenses arranged in a plane. Accordingly, a plurality of beam spots are generated by a microlens array having a plurality of condensing lenses arranged in a plane.

  Further, the beam spot generating means is a photomask having a plurality of openings arranged in a plane. Thereby, a plurality of beam spots are generated by a photomask having a plurality of openings arranged in a plane.

  Furthermore, the optical scanning means includes a pair of strip-shaped electrodes having a predetermined width on opposite side surfaces of the rectangular block-shaped electro-optic crystal material, and a longitudinal central axis thereof and a central axis of one of the vertical and horizontal sides of the side surface having a predetermined angle. Are formed so that light passes between the pair of electrodes. As a result, a pair of band-shaped electrodes having a predetermined width are inclined on the opposite side surfaces of the square block-shaped electro-optic crystal material so that the longitudinal central axis thereof and the vertical or horizontal central axis of the side surface form a predetermined angle. A plurality of beam spots are reciprocally scanned within a predetermined range by an optical scanning means formed and configured to allow light to pass between the pair of electrodes.

  The object to be exposed is continuously moved in a direction substantially orthogonal to the scanning direction of the beam spot. Thus, exposure is performed while continuously moving the object to be exposed in a direction substantially orthogonal to the beam spot scanning direction.

  According to the first aspect of the invention, since the width of the beam spot in the scanning direction of the switching element is larger than the width of the beam spot in the same direction, the beam spot can be scanned on the switching element. it can. Therefore, by controlling the driving timing of the switching elements, the position of the light / dark pattern formed on the object to be exposed by light modulation by the plurality of switching elements can be controlled in an analog manner. Thus, even with a simple pattern generator having a plurality of switching elements arranged in at least two rows, the exposure pattern positioning accuracy can be improved and the manufacturing cost of the apparatus can be reduced.

  Moreover, according to the invention which concerns on Claim 2, light source light can be condensed and a beam spot can be produced | generated, and the utilization efficiency of light source light can be improved. Therefore, the power of the light source to be used can be reduced, and the burden on the light source can be reduced.

  Furthermore, according to the invention which concerns on Claim 3, a several beam spot can be produced | generated by the photomask formed using the photolithographic technique. Therefore, the shape and position of the plurality of beam spots can be formed with high accuracy, and the positioning accuracy of the exposure pattern can be further improved.

  Furthermore, according to the fourth aspect of the invention, the beam spot scanning can be controlled by the drive voltage. Therefore, if the correlation between the position of the beam spot on the switching element and the driving voltage is taken in advance, the position of the beam spot on the switching element can be known by the driving voltage, and the driving timing of the switching element is controlled by the driving voltage. can do.

  And according to the invention which concerns on Claim 5, it can expose while moving a to-be-exposed body continuously, and can shorten the tact of an exposure process.

It is a schematic diagram which shows embodiment of the exposure apparatus by this invention. It is a top view which shows the example of 1 structure of the color filter board | substrate used for the said embodiment. It is a figure which shows one structural example of the beam spot production | generation means of the exposure apparatus of this invention, (a) is a top view, (b) is a front view. It is a figure which shows one structural example of the optical scanning means of the exposure apparatus of this invention, (a) is a perspective view, (b) is an O arrow view of (a). It is a top view which shows one structural example of the switching element assembly of the exposure apparatus of this invention. It is explanatory drawing which shows operation | movement of each switching element of the said switching element assembly, (a) shows an OFF drive state, (b) has shown the ON drive state. It is process drawing explaining the formation method of the said switching element assembly. It is explanatory drawing which shows the other formation method of the said switching element assembly, and has shown the last process. It is explanatory drawing which shows the positional relationship of the switching element assembly and imaging means of the exposure apparatus of this invention. It is a block diagram which shows the structure of the control means of the exposure apparatus of this invention. It is explanatory drawing which shows the drive signal waveform which drives the said optical scanning means. It is explanatory drawing which shows the exposure operation | movement by the exposure apparatus of this invention. It is explanatory drawing which shows an example of the exposure pattern formed by the said exposure operation | movement.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a schematic view showing an embodiment of an exposure apparatus according to the present invention. The exposure apparatus drives a switching element made of an electro-optic crystal material to generate a predetermined light / dark pattern, and exposes the light / dark pattern on an object to be exposed. The conveying means 1, the exposure optical unit 2, An imaging unit 3 and a control unit 4 are provided. Hereinafter, a case where the object to be exposed is a color filter substrate will be described.

  FIG. 2 is a plan view of the color filter substrate 5 used in the exposure apparatus of the present invention. This color filter substrate 5 is formed by forming a black matrix provided with a plurality of pixels 6 transmitting light in a matrix on the surface of a transparent glass substrate.

  The transport means 1 is configured to place the color filter substrate 5 coated with a predetermined color resist on the upper surface of the stage 7 and continuously transport it in one direction (the direction of arrow A shown in FIG. 1). The stage 7 is moved by a moving mechanism configured by combining a gear and the like. Alternatively, the surface of the stage 7 is provided with a gas outlet and suction port, and the color filter substrate 5 is transported in a state where it floats on the stage 7 by a predetermined amount by balancing the gas jet output and suction force. May be. The transport unit 1 is provided with a position sensor (not shown) for measuring the moving distance of the color filter substrate 5.

An exposure optical unit 2 is provided above the conveying means 1. The exposure optical unit 2 modulates the light source light L ₁ to generate exposure light L ₂ having a predetermined light / dark pattern, and irradiates the surface of the color filter substrate 5 with the exposure light L ₂ . The color resist on the corresponding pixel 6 is exposed, and the light source device 8, the beam spot generating means 9, the optical scanning means 10, the pattern generator 11, and the projection lens 12 are arranged from the upstream side in the light traveling direction. Prepare in order.

Here, the light source device 8 irradiates the beam spot generating means 9 described later with the parallel light of the light source light L ₁ having a uniform luminance distribution. The light source device 8 emits ultraviolet light and the laser light source emits the light. a beam expander for enlarging the source light L ₁ of the light flux diameter which is, with, for example photo integrator beam diameter causes uniform the luminance distribution of the source light L ₁ that has been enlarged, the source light L ₁ that the luminance distribution is uniformized And a condenser lens that converts the light into parallel light.

Further, the beam spot generating means 9 receives the light source light L ₁ and alternately arranges a plurality of beam spots in at least two rows with an arrangement pitch W ₁ in a direction orthogonal to the substrate transport direction indicated by the arrow A in FIG. Specifically, as shown in FIG. 3, a microlens array having a plurality of condensing lenses 13 arranged on the surface of a transparent substrate 14 in, for example, two rows. In this case, the interval between the _two lens rows 15 is set to W2. In addition, a light shielding film 16 is formed around each condenser lens 13 to block light transmission.

Furthermore, the optical scanning means 10 respectively has a plurality of beam spots generated by the beam spot generation means 9 in a direction (arrangement direction of the plurality of condenser lenses 13) orthogonal to the substrate transport direction (arrow A direction). As shown in FIG. 4 (a), a pair of strip-shaped electrodes 18 having a predetermined width are formed on the opposing side surface 17a of the square block-shaped electro-optic crystal material 17 as shown in FIG. The side surface 17a is formed so as to be inclined with respect to one of the vertical and horizontal central axes so that light passes between the pair of electrodes 18. In this case, when an electric field is applied between both electrodes 18, the refractive index of the portion of the electro-optic crystal material 17 sandwiched between the two electrodes 18 changes, and the portion sandwiched between the two electrodes 18 and the other portion are changed. A difference in refractive index occurs at (interface 17b). Therefore, the source light L ₁ in accordance with the refractive index difference is refracted at the interface 17b. Therefore, when the electric field between the electrodes 18 of the optical scanning means 10 is changed to change the refractive index difference at the interface 17b, the light source light L ₁ emitted from the optical scanning means 10 as shown in FIG. Is swung at a predetermined deflection angle θ, and the beam spot 19 reciprocally scans in the directions of arrows B and C shown in FIG.

Furthermore, the pattern generator 11 is controlled by the control means 4 (see FIG. 10), which will be described later, and modulates the light source light L ₁ to generate a predetermined light / dark pattern (exposure light L ₂ ). As shown in FIG. 5B, the center axis is aligned with the center of the reciprocating scanning of the plurality of beam spots 19, and the scanning direction of the beam spot 19 indicated by arrows B and C in FIG. 5 (indicated by the arrow A in FIG. 1). A width W ₃ (in the present embodiment) corresponding to the scanning direction (arrow B, C direction) of the beam spot 19 is arranged in two rows alternately at an arrangement pitch W ₁ in the direction orthogonal to the substrate transport direction. , W ₃ = W ₁ ) is formed larger than the width W ₄ of the beam spot 19 in the same direction, and a prism having a pair of electrodes 20 facing the side surface parallel to the scanning direction of the beam spot 19. And a plurality of switching elements 21 made of an electro-optic crystal material. The distance between the center lines of the two switching element arrays 22 a and 22 b is equal to the distance W ₂ between the center lines of the two lens arrays 15 of the beam spot generating means 9. The pattern generator 11 includes a switching element assembly 23 including the plurality of switching elements 21, a deflection plate 24 disposed in the vicinity of the incident-side end face of the optical scanning unit 10, and an emission of the switching element assembly 23. And a deflecting plate 25 arranged close to the side end surface. In this case, the two deflection plates 24 and 25 are arranged in a crossed Nicol arrangement in which the deflection axes are orthogonal to each other.

The pattern generator 11 configured as described above operates as follows. That is, as shown in FIG. 6, the light source light L _{1 that} has passed through the condenser lens 13 of the beam spot generating unit 9 is linearly polarized by the deflecting plate 24 and then enters the incident side end face 21 a of the switching element 21. . In this case, as shown in FIG. 5A, when no voltage is applied to the electrode 20 of the switching element 21, the switching element 21 is driven to turn off, and the polarization plane of the linearly polarized light passing through the switching element 21 is rotated. Not. Therefore, the polarization plane of the linearly polarized light emitted from the emission side end face 21 b of the switching element 21 is orthogonal to the deflection axis of the deflection plate 25, and the linearly polarized light is blocked by the deflection plate 25.

On the other hand, as shown in FIG. 6B, when a predetermined voltage is applied to the electrode 20 of the switching element 21 to turn on the switching element 21, the polarization plane of linearly polarized light passing through the switching element 21 is 90 °. It is rotated. Therefore, the polarization plane of the linearly polarized light emitted from the emission side end face 21 b of the switching element 21 coincides with the deflection axis of the deflection plate 25, and the linearly polarized light passes through the deflection plate 25. Thus, the pattern generator 11, by driving on and off according to the plurality of switching elements 21 in a predetermined pattern, can be injected to generate the exposure light L ₂ which is optically modulated light and dark.

Next, a method for forming the switching element assembly 23 will be described with reference to FIG.
First, on a surface of a strip-shaped plate material 26 made of an electro-optic crystal material as shown in FIG. 7A, a dicing saw is used, as shown in FIG. the grooves 27 are formed of, forming a pair of projecting portions 28 having a width W ₅ symmetrically to the longitudinal central axis. At this time, the center line spacing biconvex portion 28 is a distance W _2.

Next, as shown in FIG. 7C, a conductive film 29 is formed on both side surfaces parallel to the long axis of the pair of convex portions 28 and the bottom surface portion of the groove 27 by a known technique.
Subsequently, as shown in FIG. 6D, a width W ₃ (W ₃ >) is set in the short axis direction of the pair of convex portions 28 using a dicing saw having a blade tooth thickness of W ₃ (= W ₁ ). W ₅ ), the separation grooves 30 deeper than the depth D of the grooves 27 are formed at a pitch 2W ₃ , and the pair of convex portions 28 are divided into a plurality of pieces to form a plurality of switching elements 21. At this time, in FIG. 4D, after the blade of the dicing saw is moved in the direction of arrow E with respect to the right convex portion 28 to divide the right convex portion 28, the blade of the dicing saw is moved to the left convex portion 28. Moving in the direction of arrow F, the left convex portion 28 is divided, leaving a portion of the left convex portion 28 between the adjacent separation grooves 30 of the right convex portion 28. Thereby, the switching element assembly 23 in which the plurality of switching elements 21 are alternately arranged in two rows is formed. In this case, assuming that the conductive film 29 on the bottom surface of the central groove 27 extending in the major axis direction is a ground electrode terminal, the pair of electrodes 20 of each switching element 21 is the electrode 20 on the longitudinal central axis side of the switching element assembly 23. Becomes the ground electrode.

FIG. 8 is an explanatory view showing another method for forming the switching element assembly 23. As shown in FIG. 7, a strip-shaped plate material 26 of electro-optic crystal material in which a conductive film 29 is formed on the side surface parallel to the long axis of the pair of convex portions 28 and the bottom surface portion of the groove 27 shown in FIG. On the other hand, a dicing saw is used to form a separating groove 30 having a depth deeper than the depth D of the groove 27 with respect to the pair of convex portions 28, and the pair of convex portions 28 are divided into a plurality of portions. At this time, by appropriately setting the inclination angle φ relative to the longitudinal axis of the center line spacing W ₂ and the separation grooves of the pair of convex portions 28 of the pair of convex portions 28, as viewed in the substrate moving direction (arrow A direction) The end portions 21c of the adjacent switching elements 21 can be overlapped as shown by broken lines in the same drawing. As a result, when the color filter substrate 5 is exposed while moving in the direction of arrow A in FIG. 1, overexposure is performed by the end 21c of the switching element 21 existing ahead of the substrate moving direction, and one exposure pattern is obtained. The problem that an unexposed part occurs in the part can be avoided. In this case, as shown in FIG. 8, since the end 21c of the switching element 21 is cut obliquely, the average exposure by the end 21c is half of the exposure by the end 21c formed at a right angle. Become. Therefore, a predetermined exposure amount is obtained by the above-described overlap exposure, and exposure with a predetermined depth is performed. Therefore, the problem of overexposure due to overexposure can be avoided.

  The projection lens 12 projects the light / dark pattern generated by the pattern generator 11 on the color filter substrate 5 in a reduced scale, and includes an imaging lens 31 and an objective lens 32. .

An imaging unit 3 is provided on the front side of the exposure optical unit 2 in the substrate transport direction (arrow A direction). This imaging means 3 is for imaging the surface of the color filter substrate 5 and is a line camera having a large number of light receiving elements arranged in a straight line substantially orthogonal to the substrate transport direction. As shown in FIG. 23 is arranged at a distance L from the central axis of the switching element row 22a on the front side in the substrate transport direction. In this case, the switching element assembly 23 and the imaging means 3 are positioned and arranged with respect to each other, and the switching element 21A of the switching element assembly 23 corresponds to the positions x _{1 to} x ₂ on the longitudinal center axis of the imaging means 3. and, the switching element 21B corresponds to the position _x 2 ~x _3, the switching element 21C corresponds to the position _x 3 ~x _4, corresponding to the switching element 21D is positioned _x 4 ~x _5, the switching element 21E is the position x ₅ corresponds to ~x _6, switching element 21F is made to correspond to the position _x 6 ~x _7. An illumination unit (not shown) is provided on the lower side of the stage 7 so as to face the imaging position of the imaging unit 3, and the imaging position of the color filter substrate 5 is illuminated to illuminate the surface of the substrate by the imaging unit 3. Imaging is possible.

  A control unit 4 is provided in electrical connection with the transport unit 1, the optical scanning unit 10, the switching element assembly 23 of the pattern generator 11, and the imaging unit 3. This control means 4 drives each component appropriately, and as shown in FIG. 10, the image processing part 33, the calculating part 34, the memory 35, the conveyance means drive controller 36, and the optical scanning means. A drive controller 37, a switching element drive controller 38, and a control unit 39 are provided.

  Here, the image processing unit 33 processes the one-dimensional image of the pixel 6 of the color filter substrate 5 acquired by the imaging unit 3 to detect a position where the luminance changes suddenly, and the position of the edge of the pixel 6 is detected. This is detected as the position.

The computing unit 34 calculates the moving distance of the color filter substrate 5 based on the output of the position sensor of the transport means 1, and the color filter substrate 5 is preset and stored in a memory 35 described later. When a distance equal to the distance L, (L + W ₂ ) between the imaging means 3 and each switching element row 22a, 22b of the switching element assembly 23 is moved, a drive command is issued to a switching element drive controller 38 described later. Yes.

Further, the memory 35 stores in advance data of initial setting values such as the power of the laser light source and the distances L, (L + W ₂ ) between the imaging means 3 and the switching element arrays 22a, 22b of the switching element assembly 23. In addition, the calculation result in the calculation unit 34 and the position data of the edge of the pixel 6 detected by the image processing unit 33 are temporarily stored.

  The transport means drive controller 36 drives the moving mechanism of the transport means 1 to continuously move the stage 7 at a constant speed in the direction of arrow A in FIG.

Further, the optical scanning means drive controller 37 transmits a sawtooth drive signal shown in FIG. 11 to the optical scanning means 10, so that the portion between the band-like electrode 18 of the optical scanning means 10 and the other portion is between. The refractive index difference generated at the interface 17b is continuously changed within a predetermined range, and the beam spot 19 of the laser beam emitted from the optical scanning means 10 is reciprocated within the predetermined range. In this case, since the scanning speed of the beam spot 19 depends on the repetition period of the sawtooth drive signal, the repetition period of the drive signal is controlled to set the scanning speed of the beam spot 19 to the moving speed of the stage 7 of the transport means 1. (Same as the moving speed of the color filter substrate 5). Note that the scanning speed of the beam spot 19 is normally one round trip while the color filter substrate 5 travels a distance W ₅ (W ₅ is equal to the width of the switching element 21 in the substrate transport direction) or a distance shorter than that. Is set as follows. In the present embodiment, the scanning speed of the beam spot 19 is set sufficiently higher than the moving speed of the color filter substrate 5. Further, the falling speed of the drive signal is controlled to be 10 times the rising speed so that the scanning speed of the beam spot 19 in the backward path is approximately 10 times the scanning speed in the forward path.

Furthermore, the switching element drive controller 38 receives the drive command transmitted from the calculation unit 34 and sequentially reads the position data of the edge of the pixel 6 stored in the memory 35, and each switching element corresponding to the position data. A drive signal for driving the on / off of the motor 21 is transmitted to the switching element assembly 23. In this case, the switching element driving controller 38 transmits an on / off driving signal to the switching element assembly 23 during the forward scanning period of the beam spot 19 that performs reciprocating scanning, and transmits an off driving signal during the backward scanning period of the beam spot 19. It is like that.
The control unit 39 is a CPU that mediates the respective elements so as to be driven appropriately.

Next, the operation of the exposure apparatus configured as described above will be described.
First, the color filter substrate 5 coated with a predetermined color resist is positioned and placed at a predetermined position on the stage 7 of the transport means 1. Thereafter, when the activation switch is turned on, the conveyance means 1 is activated under the control of the conveyance means drive controller 36 of the control means 4, and the color filter substrate 5 is conveyed at a constant speed in the direction of arrow A shown in FIG.

  When the color filter substrate 5 is conveyed and reaches the imaging position of the imaging means 3, the surface of the color filter substrate 5 is imaged by the imaging means 3, and this one-dimensional captured image is subjected to image processing in the image processing unit 33 of the control means 4. Is done. At this time, in the image processing unit 33, the luminance change in the direction orthogonal to the substrate transport direction (arrow A direction) of the captured image is checked, and the pixel 6 (bright portion) indicates the position where the luminance has suddenly changed beyond a predetermined threshold. Detect as the edge.

Specifically, as shown in FIG. 12A, when the color filter substrate 5 is transported and the leading end of the pixel 6 in the substrate transport direction reaches the image capturing position of the image capturing means 3, the captured image captured at this time is captured. For example, the positions x ₈ , x ₉ , x ₁₀ , x ₁₁ ... Of the edge of the pixel 6 (bright part) on the line P ₁ are detected, and this position data is stored in the memory 35. In this case, if it is set in advance so that every other pixel 6 (bright part) is detected, other colors (for example, green, blue, etc.) positioned between two adjacent pixels 6R of the same color (for example, red). ) Pixels 6G and 6B can be ignored.

The color filter substrate 5 is conveyed in the direction of arrow A in FIG. 12 (a), the the line P ₁ matches the center axis of the switching element array 22a of the switching device assembly 23, the respective switching elements 21 of the switching element array 22a predetermined position on the line P ₁ is selectively exposed. That is, between the position _x 8, _{x 3} on line _{P 1,} the position _x 4, between _{x 9} and position _{x 12, x 13} between the respective switching element 21C, 21E, 21K is exposed in charge. In this case, the switching element 21C is controlled to be turned on by the switching element drive controller 38 only while the beam spot 19 scans between the positions x ₈ and x ₃ . Similarly, the switching element 21E is turned on for driving while the beam spot 19 is scanning between position _x 4, _{x 9,} the switching element 21K, the beam spot 19 scans between position _{x 12, x 13} It is driven on only while As a result, as shown by cross-hatching in the figure, the region between the positions x ₈ and x ₃ , the position between the positions x ₄ and x ₉ and the position between the positions x ₁₂ and x ₁₃ on the pixel 6R is exposed. At this time, the switching elements 21A, 21G, 21I, and 21M of the switching element row 22a are driven off. The position of the beam spot 19 on the switching element 21 correlates with the deflection angle θ of the laser beam by the optical scanning means 10, and the deflection angle θ of the laser beam correlates with the drive signal voltage by the optical scanning means drive controller 37. To do. Therefore, the position of the beam spot 19 on the switching element 21 can be known from the drive signal voltage.

Thereafter, the switching elements 21 of the switching element array 22a are driven in the same manner as described above while reciprocatingly scanning the beam spot 19, and the color filter substrate 5 moving at a constant speed is exposed. In this exposure, in FIG. 12 (a), the imaging sequential position shifted in the arrow A and the opposite direction by the line P ₁ distance color filter substrate 5 is equal to the distance moved while the beam spot 19 makes one reciprocation This is performed by driving each of the switching elements 21 based on the image data.

Then, as shown in FIG. 12 (b), when the line _{P 1} by moving the color filter substrate 5 matches the central axis of the switching element column 22b, the switching element 21B of the switching element column 22b, 21D, 21F, 21H, 21J, a predetermined position on the line _{P 1} is selectively exposed by 21L. That is, between the position _x 4, _{x 5} on line _{P 1,} the position _{x 10, x 12} and between the position _{x 13, x 11} between the respective switching element 21D in the same manner as described above, 21J, 21L is in charge exposure Is done. At this time, the switching elements 21B, 21F, and 21H are driven off.

On the other hand, the switching elements 21 of the switching element array 22a is the position data of the edges of the arrow A and the direction opposite to W ₂ shifted by the line P ₂ on pixels 6R respect to the line P ₁ is read from the memory 35 switching It is driven by the element drive controller 38. Then, the position between the positions x ₃ and x ₄ of the pixel 6R on the line P ₂ is exposed by the switching element 21C, and the position between the positions x ₁₂ and x _{13 of the} pixel 6R is exposed by the switching element 21K. At this time, the switching elements 21A, 21E, 21G, 21J, and 21M are off-driven.

  Thereafter, a predetermined position on the pixel 6R is exposed in advance by the switching element array 22a while reciprocally scanning the beam spot 19 with respect to the color filter substrate 5 moving at a constant speed, and the switching element array 22b performs the switching element array 22b. The portion between the switching elements 21 of 22a is complemented and exposed. As a result, as shown in FIG. 13 with cross hatching, the pixel 6R is exposed to form a predetermined exposure pattern 40. When the beam spot scanning speed is sufficiently higher than the moving speed of the color filter substrate 5 as in this embodiment, the edge of the exposure pattern that obliquely intersects the substrate transport direction as shown in FIG. Further, the edge of the circular exposure pattern can be formed smoothly. In addition, since the irradiation position of the beam spot in the direction orthogonal to the substrate transport direction can be controlled in an analog manner, a finer pattern exposure can be performed unlike conventional digital control.

  In the above-described embodiment, the case where the switching element assembly 23 is configured by the two switching element arrays 22a and 22b has been described. However, the present invention is not limited to this, and the two switching element arrays 22a. , 22b may be arranged as a set, and a plurality of sets may be arranged at a predetermined pitch in the substrate transport direction. As a result, the area on the pixel 6 of the color filter substrate 5 can be subjected to multiple exposure by the switching elements 21 of the plurality of sets of switching element arrays 22a and 22b, and the power of the laser light source is lowered to reduce the burden on the laser light source. be able to.

  In the above embodiment, the case where the beam spot generating means 9 is a microlens array has been described. However, the present invention is not limited to this, and the beam spot generating means 9 is a photo having a plurality of openings arranged in a plane. It may be a mask.

  Further, in the above-described embodiment, the optical scanning unit 10 has a pair of strip-shaped electrodes 18 having a predetermined width on the opposing side surface 17 a of the square block-shaped electro-optic crystal material 17, and either the longitudinal center axis or the side surface 18 is vertically or horizontally. However, the present invention is not limited to this, and the optical scanning means 10 may be a laser beam such as an electromagnetic actuator or an acousto-optic device. Any device capable of reciprocating scanning may be used.

  In the above description, the case where the object to be exposed is the color filter substrate 5 has been described. However, the present invention is not limited to this, and the object to be exposed may be any circuit board, for example.

5. Color filter substrate (exposed body)
9 ... beam spot generating means 10 ... scanning means 12 ... projection lens 13 ... condenser lens 17 ... electro-optical crystal material 17a ... opposite sides 18, 20 ... electrode 19 ... beam spot 21,21A～21M ... switching element L ₁ ... Light source light L ₂ ... exposure light

Claims (5)

Beam spot generating means for receiving a light source light and generating a plurality of beam spots arranged in at least two rows alternately at predetermined intervals;
An optical scanning means for reciprocally scanning the plurality of beam spots in a predetermined range in their alignment direction;
A plurality of switching elements made of a prismatic electro-optic crystal material, each of which is arranged with its center axis aligned with the center of reciprocal scanning of the plurality of beam spots, and provided with a pair of electrodes on opposing surfaces parallel to the center axis. A pattern generator that modulates the light source light to generate a predetermined light and dark pattern by driving on and off;
A projection lens for projecting the light-dark pattern onto an object to be exposed;
With
An exposure apparatus characterized in that the width of each switching element in the scanning direction of the beam spot is larger than the width of the beam spot in the same direction.   2. The exposure apparatus according to claim 1, wherein the beam spot generating means is a microlens array having a plurality of condensing lenses arranged in a plane.   2. The exposure apparatus according to claim 1, wherein the beam spot generating means is a photomask having a plurality of openings arranged in a plane.   The optical scanning means has a pair of band-shaped electrodes having a predetermined width on opposite side surfaces of the rectangular block-shaped electro-optic crystal material, and a longitudinal central axis thereof and a central axis of one of the vertical and horizontal sides form a predetermined angle. The exposure apparatus according to any one of claims 1 to 3, wherein the exposure apparatus is formed so as to be tilted so that light passes between the pair of electrodes.   The exposure apparatus according to claim 1, wherein the object to be exposed is continuously moved in a direction substantially orthogonal to a scanning direction of the beam spot.

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