CN112241070B - Large-breadth optical polarization pattern generation device and generation method - Google Patents
Large-breadth optical polarization pattern generation device and generation method Download PDFInfo
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- 230000000737 periodic effect Effects 0.000 description 3
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- 238000010586 diagram Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
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- 238000003860 storage Methods 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
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- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Abstract
The invention discloses a large-breadth optical polarization pattern generation device, which comprises an illumination component, a polarization pattern generation component, a miniature imaging component, an imaging detection and splicing component, which are sequentially connected; the illumination component is used for realizing single polarization collimation uniform surface light spots; the polarization pattern generation part comprises a quarter wave plate and a phase modulator and is used for outputting a polarization pattern; the miniature imaging component is used for miniature the polarization pattern output by the polarization pattern generating component and writing the polarization pattern into the photosensitive material; the imaging detection and splicing component comprises an imaging detection sub-component and a focal length calibration sub-component; the imaging detection subassembly comprises a dual-light-path pattern monitoring imaging assembly and a pattern splicing assembly. The comprehensive optical system, the motion control system and the detection system have the advantages of high precision, arbitrary controllability and high efficiency of single-exposure polarization patterns, large-area optical polarization patterns and the like.
Description
Technical Field
The invention relates to the field of liquid crystal display, in particular to a large-breadth optical polarization pattern generation device and a large-breadth optical polarization pattern generation method.
Background
Liquid crystals have wide applications in the fields of information display, optics, photonics devices, and the like; the liquid crystal can further realize the modulation of amplitude, phase and polarization of light according to the designed orientation arrangement, and plays an important role in the applications, so the orientation arrangement control mode of the liquid crystal becomes a research hotspot of academic and industrial production, and the prior art disclosed at present mainly comprises a rubbing orientation technology and a photo-orientation technology:
patent application No. CN201721714019.8 discloses an alignment layer rubbing device for liquid crystal display screen production; the rubbing alignment is to rub an alignment film of a liquid crystal display with materials such as nylon fibers or cotton linters in a certain direction to change the surface condition of the film and generate uniform anchoring effect on liquid crystal molecules, so that the liquid crystal molecules are uniformly arranged in a certain area between two glass plates of the liquid crystal display at a certain pretilt angle. However, there are the following problems: static electricity is easily generated in the friction process, which can cause the breakdown of the thin film transistor, and because fluff dust is generated in the friction process, cleaning and drying processes must be added after friction, so that the production efficiency is reduced.
Photoalignment is a newly developed non-contact liquid crystal aligning method, which utilizes photosensitive materials to perform oriented photocrosslinking, isomerization or photocleavage reaction under ultraviolet or blue light polarized light irradiation to obtain the required arrangement, and the current photoalignment technologies are divided into four types: mask overlay polarization patterning techniques, periodic liquid crystal alignment techniques obtained by holographic interference methods, dynamic mask photo-alignment techniques based on DMDs, and also polarization alignment techniques based on spatial modulators.
The mask alignment polarization pattern technology has the following problems: the alignment difficulty is too high, and the efficiency is low; the precision is low; the large breadth is difficult to manufacture; the mask is in contact with the photoresist layer on the wafer causing damage.
The periodic liquid crystal orientation technology obtained by the holographic interference method can only realize specific periodic polarization patterns and cannot realize the writing of any polarization patterns.
The polarization orientation technology based on the liquid crystal spatial modulator is a programmable control device capable of modulating the phase and amplitude of incident light, pattern recording of different orientation arrangements of liquid crystals in different selected areas can be realized by single projection orientation, but if an imaging system is an amplification system, the sample size is large, the pixel unit size is also large, and a high-precision polarization pattern cannot be output.
Therefore, a new device and method for outputting polarization pattern with high precision and large width in the field of liquid crystal display is needed.
Disclosure of Invention
In order to solve the problems of the prior art, in one aspect, the invention provides a large-format optical polarization pattern generation device, which comprises an illumination component, a polarization pattern generation component, a miniature imaging component, an imaging detection component and a splicing component which are connected in sequence;
the illumination component is used for realizing single polarization collimation uniform surface light spots;
the polarization pattern generation part comprises a quarter wave plate and a phase modulator and is used for outputting a polarization pattern;
the miniature imaging component is used for miniature the polarization pattern output by the polarization pattern generating component and writing the polarization pattern into the photosensitive material;
the imaging detection and splicing component comprises an imaging detection sub-component and a focal length calibration sub-component;
the focal length calibration subassembly comprises a photosensitive material insensitive normally open light source and a vertical direction correction assembly and is used for correcting the defocusing phenomenon generated by movement; the imaging detection sub-component comprises a double-light-path pattern monitoring imaging component and a pattern splicing component; the pattern splicing assembly is used for splicing the miniature polarization pattern light field.
As a further improvement of the embodiments of the present invention, the illumination means includes a laser, a collimating assembly and a polarizer;
the collimation assembly is used for adjusting a linear light source or a point light source emitted from the laser into a parallel surface light source and outputting the parallel surface light source to the polarized image generation component;
the polarizer is connected with the collimation assembly and is used for controlling the initial polarization direction of light and generating a surface light source with any polarization direction within the range of 0-179 degrees.
As a further improvement of the embodiment of the present invention, the polarization pattern generation section includes an optical rotator and a beam splitter connected in this order;
the optical rotator comprises a quarter-wave plate and a phase modulator which are connected in sequence and used for generating a pattern with any polarization distribution; the phase modulator is connected with the optical splitter;
the beam splitter is coupled to the imaging detector subassembly for projecting the pattern reflected from the photosensitive material into the imaging detector subassembly.
As a further improvement of the embodiment of the present invention, the optical rotator includes a phase modulator and at least one quarter wave plate;
the at least one quarter wave plate comprises a first quarter wave plate;
The first quarter-wave plate is arranged between the phase modulator and the optical splitter;
the phase modulator is a liquid crystal spatial light modulator and is a pixel type phase delayer with adjustable phase difference delta; the liquid crystal fast axis of the phase modulator forms 45 degrees with the fast axis direction of the first quarter-wave plate.
As a further refinement of an embodiment of the present invention, the at least one quarter-wave plate includes a first quarter-wave plate and a second quarter-wave plate;
the first quarter wave plate is arranged between the phase modulator and the optical splitter, and the second quarter wave plate is arranged between the polarizer and the phase modulator;
the direction of the fast axis of the second quarter-wave plate and the direction of the fast axis of the first quarter-wave plate form 90 degrees.
As a further improvement of the embodiment of the present invention, the dual optical path pattern monitoring imaging component includes a first optical path pattern monitoring imaging component and a second optical path pattern monitoring imaging component;
the first light path pattern monitoring imaging component comprises a first light splitter, a tubular lens, a miniature objective lens, a first lens and a first imaging CCD which are connected in sequence; a first parallel light path is arranged between the tubular lens and the miniature objective lens;
The second light path pattern monitoring imaging component comprises a detection light source, a specified waveband reflection plain film, a second light splitter, a second lens and a second imaging CCD which are connected in sequence;
the first imaging CCD reflects the image projected to the photosensitive material surface into the first imaging CCD through the first light path pattern monitoring imaging component, and the first imaging CCD and the phase modulator form a conjugate image; the imaging detection sub-component is used for detecting and adjusting the distance between the miniature objective lens and the photosensitive material, so that the focus plane of the miniature objective lens is always kept on the surface of the photosensitive material;
the focal length calibration sub-component detects the size of the light spot projected on the photosensitive material surface through the second imaging CCD to judge whether the photosensitive material surface is on the focus surface of the miniature objective lens.
As a further improvement of the embodiment of the present invention, the wavelength of light emitted from the detection light source is any value between 550nm and 700 nm;
the specified waveband reflecting flat sheet is a reflecting flat sheet plated with a wavelength reflecting film of a detection light source.
As a further improvement of the embodiment of the present invention, the large-format optical polarization pattern generation apparatus further includes a controller, a motor driving apparatus, and a detection apparatus, wherein the controller is configured to convert the collected optical path data into a control signal and send the control signal to each execution component;
The controller comprises a motion control module, and the motion control module comprises a focusing platform motion control unit and a sample carrying table motion control unit;
the motor driving device is used for driving a motor to drive the focusing platform and the sample carrying platform to move, and the detection device is used for monitoring the movement of the motor in real time and sending the movement position and the movement speed of the motor to the movement control module;
the focusing platform motion control unit controls the micro objective lens of the micro-polarization pattern micro-unit to move vertically, and the imaging detection sub-component focuses and keeps a focusing surface on the surface of the photosensitive material all the time;
and the sample carrying table motion control unit is used for controlling the photosensitive material to move in a two-dimensional plane so as to realize the splicing of polarized light fields or the interconnection of different polarized light fields through the pattern splicing assembly.
In another aspect, the present invention also provides an optical polarization pattern generation method, including the steps of:
s1, adjusting the line light source or point light source emitted from the laser to a collimated polarized surface light source;
s2, uniformly irradiating the illumination light source onto the phase modulator at a preset angle, and generating a pattern with any polarization distribution through the quarter-wave plate and the phase modulator;
S3, forming a fixed micro magnification ratio through the focal length ratio of the tubular lens and the micro objective lens, and micro-reducing the polarization pattern output by the phase modulator to output a polarization pattern light field;
s4, detecting and adjusting the distance between the miniature objective lens and the photosensitive material surface, so that the focal plane of the miniature objective lens is always kept on the photosensitive material surface;
s5, detecting the size of the light spot projected on the photosensitive material surface, and judging whether the photosensitive material surface is on the focus surface of the objective lens;
s6, recording the single photo-controlled orientation on the photosensitive material;
s7, moving the platform carrying the photosensitive material to the next designated position for the next pattern light field recording;
and S8, splicing each orientation unit together to form randomly distributed light orientation structures on the photosensitive material.
As a further improvement of the embodiment of the present invention, the step S4 specifically includes:
the image reflected from the surface of the photosensitive material sequentially passes through a miniature objective lens, a tubular lens, a specified waveband reflection flat sheet and a first light splitter, then enters a first imaging CCD through the first lens, a phase modulator and the first imaging CCD are positioned on the front focal plane of the tubular lens to form a conjugate relation, the definition of the image of the first imaging CCD is adjusted by controlling the up-and-down movement of a lens of the miniature objective lens, whether the focal plane of the miniature objective lens is on the surface of the photosensitive material is judged, the size of a laser spot in a second imaging CCD is calibrated, and the subsequent splicing is focused and monitored; and judging whether the focal plane of the objective lens is on the surface of the photosensitive material or not by the contrast of the outline of the imaging light spot projected to the photosensitive material.
As a further improvement of the embodiment of the present invention, the step S5 specifically includes:
detecting any value between 550nm and 650nm of wavelength of light emitted by a light source;
the second lens reflects the light spots projected to the photosensitive material surface to the second imaging CCD, the Z-axis servo focusing position is mapped through the light spot diameter, the vertical height of the Z-axis lens is adjusted, the light spot diameter in the second imaging CCD can be always kept to be R, and whether the photosensitive material surface is on the focusing surface of the objective lens or not is judged by detecting the size of the light spots projected to the photosensitive material surface through the second imaging CCD.
As a further improvement of the embodiment of the present invention, the step S7 of moving the platform carrying the photosensitive material to the next designated position for the next orientation is implemented by the following steps:
the controller transmits the position data to the motion control module, the motion control module converts the received data into a control signal and transmits the control signal to the motor driver, the motor driver controls the motion of the motor according to the received control signal, and the detection device is responsible for monitoring the motion of the motor in real time and transmitting the motion position and the motion speed of the motor to the motion control module; and then the motion control module feeds back the current positions and the current speeds of the focusing platform and the sample carrying platform to the controller.
As a further improvement of the embodiment of the present invention, after the single photo-alignment is recorded on the photosensitive material in step S6, the moving distance for moving the platform carrying the photosensitive material to the next designated position by the motion control module is the size of the single alignment unit, and the moving mode is line-by-line sequential moving scanning.
Compared with the prior art, the invention has the following beneficial effects:
1. the light source of the invention adopts ultraviolet or blue light after beam expansion collimation, the phase modulator is used for adjusting the light field, different polarization phases can be generated, and then the light field is combined with an imaging system for micro-shrinkage, finally, the polarization modulation in any direction in unit pixels is realized, and the problems of single polarization orientation, low flexibility and low processing efficiency are effectively overcome;
2. the invention adopts the assistance of a focusing servo system to control the objective lens to move up and down, so as to focus in real time and improve the resolution;
3. the invention adopts the high-precision platform to accurately control the sample to do two-dimensional plane movement, thereby providing favorable conditions for realizing large-format writing;
4. because the light energy is not concentrated, the invention proposes that the abutted seams between each light-operated orientation view field are eliminated and the resolution is improved by controlling the relation between the size of a single view field and the single translation distance;
5. The invention has the advantages of high precision, arbitrary controllability, large-area writing and high efficiency of single-exposure polarization patterns, and has important significance for designing and manufacturing large-size, high-precision and multifunctional liquid crystal optical devices.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an illumination component and a polarization pattern generation component of a large-format optical polarization pattern generation apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of an imaging optical path structure provided in an embodiment of the present invention;
FIG. 3 is a flow chart of a method for generating an optical polarization pattern according to an embodiment of the present invention;
FIG. 4 is an order numbering of specific scans involved with embodiments of the present invention;
FIG. 5 is an example of large format optical polarization pattern generation in accordance with an embodiment of the present invention;
the examples in the figures are represented as:
1-a component lighting component; 11-a laser; 12-a collimating assembly; 121-a focusing lens; 122-a pinhole filter; 123-a collimating lens; 13-a polarizer; 2-a polarization pattern generating means; 22-an optical rotator; 221-a quarter wave plate; 222-a phase modulator; 23-a light splitter; 24-a sample stage; 311-a miniature imaging component; 3-imaging detection and splicing parts; 31-an imaging detection sub-assembly; 3111-a focusing stage; 3112-micro objective; 312-a first light splitter; 313-a tubular lens; 314-a first lens; 315-first imaging CCD; 32-focus calibration subcomponent; 321-a detection light source; 322-specified waveband reflecting flat sheet; 323-second dichroic sheet; 324-a second lens; 325-second imaging CCD; 33-sample loading table; 4-optical bench.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
The embodiment of the invention provides a large-breadth optical polarization pattern generation device, as shown in fig. 1 and fig. 2, the device comprises a component illumination component 1, a polarization pattern generation component 2, a miniature imaging component 311 and an imaging detection and splicing component 3 which are connected in sequence;
the illumination component 1 is used for realizing single polarization collimation uniform surface light spots;
the polarization pattern generation section 2 includes a quarter wave plate 221 and a phase modulator 222 for outputting a polarization pattern;
the miniature imaging part 311 is used for miniature of the polarization pattern output by the polarization pattern generation part and writing the polarization pattern into a photosensitive material;
the imaging detection and splicing component 3 comprises an imaging detection sub-component 31 and a focal length calibration sub-component 32;
the focal length calibration subassembly 32 comprises a photosensitive material insensitive normally open light source and a vertical direction correction assembly, and is used for correcting the defocusing phenomenon generated by movement;
the imaging detection sub-assembly 31 comprises a dual-light-path pattern monitoring imaging assembly and a pattern splicing assembly; the pattern splicing assembly is used for splicing the miniature polarization pattern light field.
In some embodiments, in order to solve the problem of adjusting a line light source or a point light source emitted from a laser to a parallel surface light source, the illumination part 1 includes a laser 11, a collimating assembly 12, a polarizer 13; the collimating assembly 12 is used for adjusting a line light source or a point light source emitted from the laser 11 into a parallel surface light source and outputting the parallel surface light source to the polarized image generating part 2;
In the embodiment of the present invention, the wavelength of light emitted by the laser 11 is 442nm, the power is 100mw, the light is continuous light and S-polarized, collimation adjustment is performed by the beam expanding system, the light passes through the focusing lens 121, the aperture filter 122, the collimating lens 123, and the polarizer P1, so that a collimated uniform light spot with a light spot diameter of 2cm, a divergence angle of less than 10mrad and S-polarized light intensity uniformity of better than 80% is formed.
The polarizer 13 is used for generating single polarized light, and the polarizer 13 is connected with the collimation component 12 and used for controlling the initial polarization direction of the light and generating a surface light source with any polarization direction within the range of 0-179 degrees.
The polarization pattern generation section 2 includes an optical rotator 22 and a beam splitter 23 connected in this order;
in some embodiments, to address the problem of generating arbitrary polarization orientations, the optical rotator 22, including a quarter-wave plate 221 and a phase modulator 222 connected in series, is used to generate a pattern of arbitrary polarization distribution; the phase modulator 222 is connected to the optical splitter 23; further, in the embodiment of the present invention, two quarter wave plates 221 are disposed, namely, a first quarter wave plate 2211(QWP1) and a second quarter wave plate 2212(QWP2), wherein the first quarter wave plate 2211 is disposed between the polarizer 21 and the phase modulator 222, and the second quarter wave plate 2212 is disposed between the phase modulator 222 and the beam splitter 23.
Preferably, the phase modulator 222 is a liquid crystal spatial light modulator, and is a pixel type phase retarder with adjustable phase difference δ; the liquid crystal fast axis of the phase modulator 222 is at 45 degrees to the first quarter-wave plate fast axis direction.
The direction of the fast axis of the second quarter-wave plate is 90 degrees with the direction of the fast axis of the first quarter-wave plate.
In other implementations, the optical rotator 22 may include a single quarter-wave plate or multiple quarter-wave plates at the same time;
a single quarter wave plate is disposed between the phase modulator 222 and the beam splitter 23; when a plurality of quarter-wave plates are present, the other quarter-wave plates are disposed between the polarizer 13 and the phase modulator 222, and one quarter-wave plate is disposed between the phase modulator 222 and the beam splitter 23;
QWP1 being fast axis in the x directionThe wave plate, the phase modulator 222 is a liquid crystal spatial light modulator, and is a phase retarder having a fast axis at 45 degrees to the x axis and a phase difference of δ, and the QWP2 is a retardation plate having a fast axis in the y directionA wave plate. So that the transformation matrix of the system is
It acts as a rotator, assuming incident light is linearly polarized along the x-directionThe emergent light after passing through the system is
Polarization direction rotates clockwiseBy controlling the phase modulation of each pixel unit, the polarization direction of the light field in the pixel unit can be controlled, so that an arbitrary polarization pattern is output, and the resolution of the original polarized light field is determined by the pixel size of the liquid crystal spatial light modulator.
The specific process of forming the polarization pattern based on the phase modulator 222 is as follows: the QWP1 and QWP2 were aligned orthogonal in the fast axis direction and at 45 to the major axis of the liquid crystal alignment of the phase modulator 222. After passing through the QWP1, collimated light spots are incident at an angle of 3 degrees with the normal of the phase modulator 222, the phase modulator 222 is uniformly irradiated, the adopted phase modulator 222 has the pixel number of 1920 × 1080, the size of a single pixel is 8 microns, the size of the whole phase modulator 222 is 1.54cm × 0.86cm, and the phase modulation precision is better than 0.03pi when the phase modulation quantity is larger than 2pi for 442 nm.
The beam splitter 23 is connected to the imaging detector subassembly 31 for projecting the pattern reflected from the photosensitive material into the imaging detector subassembly 31;
the miniature imaging component 311 is configured to miniature the polarization pattern output by the phase modulator 222, and specifically, the miniature imaging component 311 includes a focusing platform 3111 and a miniature objective 3112, the focusing platform 3111 is disposed in parallel on the miniature objective 3112, and drives the miniature objective 3112 to move vertically, so as to form a focusing surface on the focusing platform 3111.
Further, the polarized light generating part 2 includes a sample stage 23, the sample stage 23 has a two-dimensional motion track; the sample stage 23 is disposed below the objective 3112 and configured to carry a photosensitive material and drive the photosensitive material to move in a two-dimensional plane, so that the surface of the photosensitive material is always kept on the focal plane of the objective 3112.
Specifically, in the embodiment of the present invention, the dual optical path pattern monitoring imaging component includes a first optical path pattern monitoring imaging component and a second optical path pattern monitoring imaging component;
the embodiment of the invention also comprises an optical platform 4;
the first optical path pattern monitoring and imaging component comprises a first light splitter 312, a tubular lens 313, a miniature objective 3112, a first lens 314 and a first imaging CCD315 which are connected in sequence; a first parallel light path is arranged between the tubular lens 313 and the miniature objective lens 3112;
the second optical path pattern monitoring imaging component comprises a second beam splitter 323, a second lens 324 and a second imaging CCD 325;
the image-forming detecting sub-assembly 31 is used for detecting and adjusting the distance between the miniature objective lens 3112 and the photosensitive material, so that the focal plane of the miniature objective lens 3112 is always kept on the surface of the photosensitive material.
In the embodiment of the present invention, the focal length of the tube lens 313 is 200mm, the focal length of the miniature objective 3112 is 4mm, and the focal length ratio is 50: 1, so as to implement 50 times of miniature of the image pattern, specifically: the pixel resolution of the LCOS panel of the phase modulator 222 is 1920 × 1080, the size of a single pixel is 8um, the full-width imaging size is 15360um × 8640um, the imaging size projected to the photosensitive material after passing through the tubular lens 313 and the miniature objective 3112 is 307.2um × 172.8um, and the theoretical resolution is 0.16 um.
Further, the focal length calibration sub-assembly 32 includes a detection light source 321 and a specified waveband reflection flat sheet 322 connected in sequence;
the first imaging CCD reflects the image projected to the photosensitive material surface into the first imaging CCD through the first light path pattern monitoring imaging component, and the first imaging CCD and the phase modulator form a conjugate image; the imaging detection sub-component is used for detecting and adjusting the distance between the miniature objective lens and the photosensitive material, so that the focus plane of the miniature objective lens is always kept on the surface of the photosensitive material;
and the focal length calibration sub-component detects the size of the light spot projected on the photosensitive material surface through the second imaging CCD to judge whether the photosensitive material surface is on the focus surface of the miniature objective lens.
Wherein, the wavelength of the emergent light of the detection light source 321 is any value between 550nm and 650 nm;
the designated waveband reflecting flat sheet 322 is a reflecting flat sheet plated with a wavelength reflecting film of a detection light source;
a second lens 324 for reflecting the image projected onto the photosensitive material surface into a second imaging CCD 325;
the focus calibration sub-assembly 32 detects the size of the light spot projected on the photosensitive material surface through the second imaging CCD325 to determine whether the photosensitive material surface is on the focus surface of the objective lens 3112.
In the embodiment of the invention, the large-format optical polarization pattern generation device further comprises a controller, a motor driving device and a detection device, wherein the controller is used for converting the acquired light path data into control signals and sending the control signals to each execution component;
Specifically, the controller comprises a motion control module, and the motion control module further comprises a focusing platform motion control unit and a sample carrying platform motion control unit;
the detection device is used for monitoring the motion of the motor in real time and sending the motion position and the motion speed of the motor to the motion control module;
the focusing platform motion control unit controls the miniature objective lens to move up and down in the vertical direction, and a focusing surface is formed on the focusing platform;
a sample carrying table motion control unit for controlling the motion of the photosensitive material in a two-dimensional plane to realize the splicing of polarized light fields or the interconnection of different polarized light fields through the pattern splicing component
The control logic in the embodiment of the invention is specifically as follows: the control software in the industrial personal computer transmits the position data to the motion control module, the motion control module converts the received data into a control signal and transmits the control signal to the motor driver, and the motor driver controls the motion of the motor according to the received control signal; the detection device is responsible for monitoring the motion of the motor in real time and sending the motion position and the motion speed of the motor to the motion control module; and the motion control module feeds back the current position and speed of the platform to the software.
A phase modulator LCOS in the optical system is connected with an industrial personal computer through a data transmission line, so that control software can transmit phase diagram data to the LCOS. The motion control card is connected with the laser through a trigger line and controls the light emission of the laser by sending a pulse signal.
In another aspect, an embodiment of the present invention further discloses a method for generating the above optical polarization pattern, as shown in fig. 3, including the following steps:
s1, adjusting the line light source or point light source emitted from the laser to a collimated polarized surface light source;
s2, uniformly irradiating the illumination light source onto the phase modulator at a preset angle, and generating a pattern with any polarization distribution through the quarter-wave plate and the phase modulator;
s3, forming a fixed micro magnification ratio through the focal length ratio of the tubular lens and the micro objective lens, and micro-reducing the polarization pattern output by the phase modulator to output a polarization pattern light field;
s4, detecting and adjusting the distance between the miniature objective lens and the photosensitive material surface, so that the focal plane of the miniature objective lens is always kept on the photosensitive material surface;
s5, detecting the size of the light spot projected on the photosensitive material surface, and judging whether the photosensitive material surface is on the focus surface of the objective lens;
it should be noted that there is a difference in the energy of the laser spot after the beam expansion and collimation of the collimated light source or the laser, for example, the energy of the center of the laser spot formed after the beam expansion and collimation of the laser spot is strong, and the energy of the edge is small. When the large-format structure orientation is executed, the light energy of one-time orientation in a single view field is inconsistent, so that the characteristics of the structure in the single view field are different, and the abutted seams among a plurality of oriented view fields are caused;
S6, recording the single photo-controlled orientation on the photosensitive material;
after the single photo-controlled orientation is recorded on the photosensitive material, the moving distance of the platform carrying the photosensitive material to the next specified position is the size of a single orientation unit through the motion control module, the moving mode is that the platform is moved and scanned line by line in sequence, and the specific scanning sequence is shown in figure 4 by the number;
s7, moving the platform carrying the photosensitive material to the next designated position for the next pattern light field recording;
and S8, splicing each orientation unit together to form randomly distributed light orientation structures on the photosensitive material. A large format optical polarization pattern as shown in figure 5.
Wherein, step S4 specifically includes:
the image reflected from the surface of the photosensitive material sequentially passes through a miniature objective lens, a tubular lens, a specified waveband reflection flat sheet and a first light splitter, then enters a first imaging CCD through the first lens, a phase modulator and the first imaging CCD are positioned on the front focal plane of the tubular lens 313 to form a conjugate relation, the definition of the image in the first imaging CCD is adjusted by controlling the up-and-down movement of a lens of the miniature objective lens, whether the focal plane of the miniature objective lens is on a photosensitive plane is judged, the size of a laser spot in a second imaging CCD is calibrated, and the subsequent splicing is focused and monitored; and judging whether the focal plane of the objective lens is on the surface of the photosensitive material or not by the contrast of the outline of the imaging light spot projected to the photosensitive material.
Preferably, step S5 specifically includes:
detecting any value between 550nm and 650nm of wavelength of light emitted by a light source;
the second lens reflects the light spots projected to the photosensitive material surface to the second imaging CCD, the Z-axis servo focusing position is mapped through the light spot diameter, the vertical height of the Z-axis lens is adjusted, the light spot diameter in the second imaging CCD can be always kept to be R, and whether the photosensitive material surface is on the focusing surface of the objective lens or not is judged by detecting the size of the light spots projected to the photosensitive material surface through the second imaging CCD.
Specifically, the step S7 of moving the platform carrying the photosensitive material to the next designated position for the next orientation is implemented by the following steps:
the controller transmits the position data to the motion control module, the motion control module converts the received data into a control signal and transmits the control signal to the motor driver, the motor driver controls the motion of the motor according to the received control signal, and the detection device is responsible for monitoring the motion of the motor in real time and transmitting the motion position and the motion speed of the motor to the motion control module; and then the motion control module feeds back the current positions and the current speeds of the focusing platform and the sample carrying platform to the controller.
After the single photo-alignment is recorded on the photosensitive material in step S6, the platform carrying the photosensitive material is moved to the next designated position by the motion control module by the size of the single alignment unit, and the moving manner is moving scan line by line.
The resulting overall web of photosensitive material has a structure with an arbitrarily distributed light orientation, as shown in particular in fig. 4. The method overcomes the defects that all polarization directions in dynamic mask patterns output by the DMD are the same and characteristic polarization distribution patterns need to be realized through multiple exposures in the prior art, DMD writing does not need to be refreshed for multiple times, and efficiency is remarkably improved.
The embodiment of the invention provides a mode that the size of a bitmap of a projection orientation is larger than the moving step distance of a platform, which is used for eliminating the seam between every orientation view field in the traditional technology, for example: the stage was moved 256 × 256um, but the pixel size of the phase map uploaded onto the LCOS was 512 × 512 pixels, i.e., there were 256 overlapping orientation regions between adjacent orientation fields, each region exhibiting 4 repeated orientations. When the stage is moved by a pitch of one-third of the size of the exposure field, the number of times of the overlay orientation becomes 9 times. By changing the times of the overlapping orientation, the difference of the light spot energy can be eliminated, so that the light energy of each photo-oriented area on the substrate is the same, and the final structure consistency is ensured.
Compared with the prior art, the invention has the following beneficial effects:
1. the light source of the invention adopts ultraviolet or blue light after beam expansion collimation, the phase modulator 222 is used for adjusting the light field, different polarization phases can be generated, and then the light field is combined with an imaging system for micro-shrinkage, finally, the polarization modulation in any direction in unit pixels is realized, and the problems of single polarization orientation, low flexibility and low processing efficiency are effectively overcome;
2. the invention adopts the assistance of a focusing servo system to control the objective lens to move up and down, focus in real time and improve the resolution;
3. the invention adopts the high-precision platform to accurately control the sample to do two-dimensional plane movement, thereby providing favorable conditions for realizing large-format writing;
4. because the light energy is not concentrated, the invention proposes that the abutted seams between each light-operated orientation view field are eliminated and the resolution is improved by controlling the relation between the size of a single view field and the single translation distance;
5. the invention has the advantages of high precision, arbitrary controllability, large-area writing and high efficiency of single-exposure polarization patterns, and has important significance for designing and manufacturing large-size, high-precision and multifunctional liquid crystal optical devices.
All the above-mentioned optional technical solutions can be combined arbitrarily to form the optional embodiments of the present invention, and are not described herein again.
It should be noted that: in the embodiment, when the optical polarization pattern generating method is executed, the division of the functional modules is merely used for illustration, and in practical applications, the functions may be distributed by different functional modules according to needs, that is, the internal structure of the system may be divided into different functional modules to complete all or part of the functions described above. In addition, the embodiment of the large-format optical polarization pattern generation device and the embodiment of the optical polarization pattern generation method provided by the above embodiments belong to the same concept, and specific implementation processes thereof are described in the embodiment of the method for details, and are not described herein again.
It will be understood by those skilled in the art that all or part of the steps for implementing the above embodiments may be implemented by hardware, or may be implemented by a program instructing relevant hardware, where the program may be stored in a computer-readable storage medium, and the above-mentioned storage medium may be a read-only memory, a magnetic disk or an optical disk, etc.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (12)
1. A large-breadth optical polarization pattern generation device is characterized by comprising an illumination component, a polarization pattern generation component, a miniature imaging component, an imaging detection component and a splicing component which are connected in sequence;
the illumination component is used for realizing single polarization collimation uniform surface light spots;
the polarization pattern generation part comprises a wave plate and a phase modulator and is used for outputting a polarization pattern;
the miniature imaging component is used for miniature the polarization pattern output by the polarization pattern generating component and writing the polarization pattern into the photosensitive material;
the imaging detection and splicing component comprises an imaging detection sub-component and a focal length calibration sub-component;
the focal length calibration subassembly comprises a photosensitive material insensitive normally open light source and a vertical direction correction assembly and is used for correcting the defocusing phenomenon generated by movement; the imaging detection sub-component comprises a double-light-path pattern monitoring imaging component and a pattern splicing component; the pattern splicing assembly is used for splicing the miniature polarization pattern light field; wherein,
the large-format optical polarization pattern generation device further comprises a controller; the controller comprises a motion control module, and the motion control module comprises a sample carrying table motion control unit; the sample carrying table motion control unit is used for controlling the photosensitive material to move in a two-dimensional plane so as to realize polarized light field splicing or interconnection among different polarized light fields through the pattern splicing assembly, wherein,
The moving distance of the platform carrying the photosensitive material to the next specified position is the size of the single orientation unit through the motion control module, and the moving mode is line-by-line sequential moving scanning.
2. The large format optical polarization pattern generating apparatus of claim 1 wherein the illumination component comprises a laser, a collimating assembly, and a polarizer;
the collimation assembly is used for adjusting a linear light source or a point light source emitted from the laser into a parallel surface light source and outputting the parallel surface light source to the polarized image generation component;
the polarizer is used for generating single polarized light, and is connected with the collimation assembly and used for controlling the initial polarization direction of the light and generating a surface light source with any polarization direction within the range of 0-179 degrees.
3. The large-format optical polarization pattern generation apparatus of claim 1, wherein the polarization pattern generation means comprises an optical rotator and an optical splitter connected in series;
the optical rotator comprises a quarter-wave plate and a phase modulator which are connected in sequence and used for generating a pattern with any polarization distribution; the phase modulator is connected with the optical splitter;
the beam splitter is coupled to the imaging detector subassembly for projecting the pattern reflected from the photosensitive material into the imaging detector subassembly.
4. The large-format optical polarization pattern generation apparatus of claim 3, wherein the optical rotator comprises a phase modulator and at least one quarter-wave plate;
the at least one quarter wave plate comprises a first quarter wave plate;
the first quarter-wave plate is arranged between the phase modulator and the optical splitter;
5. The large-format optical polarization pattern generation apparatus of claim 4, wherein the at least one quarter-wave plate comprises a first quarter-wave plate and a second quarter-wave plate;
the first quarter wave plate is arranged between the phase modulator and the optical splitter, and the second quarter wave plate is arranged between the polarizer and the phase modulator;
the direction of the fast axis of the second quarter-wave plate and the direction of the fast axis of the first quarter-wave plate form 90 degrees.
6. The large-format optical polarization pattern generation apparatus of claim 1, wherein the dual optical path pattern monitoring imaging assembly comprises a first optical path pattern monitoring imaging assembly and a second optical path pattern monitoring imaging assembly;
The first light path pattern monitoring imaging component comprises a first light splitter, a tubular lens, a miniature objective lens, a first lens and a first imaging CCD which are connected in sequence; a first parallel light path is arranged between the tubular lens and the miniature objective lens;
the second light path pattern monitoring imaging component comprises a detection light source, a specified waveband reflection plain film, a second light splitter, a second lens and a second imaging CCD which are connected in sequence;
the first imaging CCD reflects the image projected to the photosensitive material surface into the first imaging CCD through the first light path pattern monitoring imaging component, and the first imaging CCD and the phase modulator form a conjugate image; the imaging detection sub-component is used for detecting and adjusting the distance between the miniature objective lens and the photosensitive material, so that the focus plane of the miniature objective lens is always kept on the surface of the photosensitive material;
the focal length calibration sub-component detects the size of the light spot projected on the photosensitive material surface through the second imaging CCD to judge whether the photosensitive material surface is on the focus surface of the miniature objective lens.
7. The large-format optical polarization pattern generation apparatus of claim 6,
the wavelength of emergent light of the detection light source is any value between 550nm and 700 nm;
The specified waveband reflecting flat sheet is a reflecting flat sheet plated with a wavelength reflecting film of a detection light source.
8. The large-format optical polarization pattern generation apparatus according to claim 1, further comprising a motor driving device and a detection device, wherein the controller is configured to convert the collected optical path data into a control signal and send the control signal to each execution component;
the motion control module further comprises a focusing platform motion control unit;
the motor driving device is used for driving a motor to drive the focusing platform and the sample carrying platform to move, and the detection device is used for monitoring the movement of the motor in real time and sending the movement position and the movement speed of the motor to the movement control module;
the focusing platform motion control unit controls the micro objective lens of the micro-polarization pattern micro-unit to move vertically, and the imaging detection sub-component focuses and keeps the focusing surface on the surface of the photosensitive material all the time.
9. A method of generating an optical polarization pattern, the method comprising the steps of:
s1, adjusting the line light source or point light source emitted from the laser to a collimated polarized surface light source;
s2, uniformly irradiating the illumination light source onto the phase modulator at a preset angle, and generating a pattern with any polarization distribution through the quarter-wave plate and the phase modulator;
S3, forming a fixed micro magnification ratio through the focal length ratio of the tubular lens and the micro objective lens, and micro-reducing the polarization pattern output by the phase modulator to output a polarization pattern light field;
s4, detecting and adjusting the distance between the miniature objective lens and the photosensitive material surface, so that the focal plane of the miniature objective lens is always kept on the photosensitive material surface;
s5, detecting the size of the light spot projected on the photosensitive material surface, and judging whether the photosensitive material surface is on the focus surface of the objective lens;
s6, recording the single photo-controlled orientation on the photosensitive material;
s7, moving the platform carrying the photosensitive material to the next designated position for the next pattern light field recording, wherein the moving distance of the platform carrying the photosensitive material to the next designated position is the size of a single orientation unit, and the moving mode is line-by-line sequential moving scanning;
and S8, splicing each orientation unit together to form randomly distributed light orientation structures on the photosensitive material.
10. The method for generating an optical polarization pattern according to claim 9, wherein the S4 specifically includes:
the image reflected from the surface of the photosensitive material sequentially passes through the miniature objective lens, the tubular lens, the specified waveband reflection flat sheet and the first light splitter and then enters the first imaging CCD through the first lens, and the phase modulator and the first imaging CCD are positioned on the front focal plane of the tubular lens and form a conjugate relation; adjusting the definition of an image in the first imaging CCD by controlling the up-and-down movement of a lens of the miniature objective lens, judging whether the focal plane of the miniature objective lens is on the surface of a photosensitive material, calibrating the size of a laser spot in the second imaging CCD, and carrying out focusing monitoring on subsequent splicing; and judging whether the focal plane of the objective lens is on the surface of the photosensitive material or not by the contrast of the outline of the imaging light spot projected to the photosensitive material.
11. The method for generating an optical polarization pattern according to claim 9, wherein the S5 specifically includes:
detecting any value between 550nm and 650nm of wavelength of light emitted by a light source;
the second lens reflects the light spots projected to the photosensitive material surface to the second imaging CCD, the Z-axis servo focusing position is mapped through the light spot diameter, the vertical height of the Z-axis lens is adjusted, the light spot diameter in the second imaging CCD can be always kept to be R, and whether the photosensitive material surface is on the focusing surface of the objective lens or not is judged by detecting the size of the light spots projected to the photosensitive material surface through the second imaging CCD.
12. The method for generating an optical polarization pattern according to claim 9, wherein the moving the platform carrying the photosensitive material to the next designated position for the next orientation in S7 is implemented by:
the controller transmits the position data to the motion control module, the motion control module converts the received data into a control signal and transmits the control signal to the motor driver, the motor driver controls the motion of the motor according to the received control signal, and the detection device is responsible for monitoring the motion of the motor in real time and transmitting the motion position and the motion speed of the motor to the motion control module; and then the motion control module feeds back the current positions and the current speeds of the focusing platform and the sample carrying platform to the controller.
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