TW201122121A - Titanium-copper for electronic component - Google Patents

Titanium-copper for electronic component Download PDF

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TW201122121A
TW201122121A TW099137715A TW99137715A TW201122121A TW 201122121 A TW201122121 A TW 201122121A TW 099137715 A TW099137715 A TW 099137715A TW 99137715 A TW99137715 A TW 99137715A TW 201122121 A TW201122121 A TW 201122121A
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Taiwan
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copper
copper alloy
hours
less
rolling
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TW099137715A
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Chinese (zh)
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TWI460294B (en
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Naohiko Era
Hiroyasu Horie
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Jx Nippon Mining & Metals Corp
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/02Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working in inert or controlled atmosphere or vacuum
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Conductive Materials (AREA)

Abstract

Provided is titanium-copper which has excellent strength and bendability. The titanium-copper is a copper alloy for electronic components which contains 2.0-4.0 mass% Ti, the remainder comprising copper and incidental impurities. The intensity peak of X-ray diffraction from the {220} crystal plane in a rolled surface of the copper alloy has a half-value width ss{220} which satisfies the relationship 3.0=ss{220}/ss0{220}=6.0, wherein ss0{220} is the half-value width of the intensity peak of X-ray diffraction from the {220} crystal plane of a standard powder of pure copper. The copper alloy, in a structure examination of a section parallel to the rolling direction, has an average crystal-grain diameter of 30 [μ]m or smaller in terms of equivalent-circle diameter.

Description

201122121 六、發明說明: 【發明所屬之技術領域】 本發明係關於—種適合用作連接器等電子零件用構 之鈦銅及其製造方法。 【先前技術】 近年來,以移動終端等為代表之電子機器之小型化不 斷發展’因此其中所使用之連接器之窄間距化及低背化 (Low Pn^le)之傾向顯著。連接器越小型,接腳寬度咖 width)越乍’為了成為摺疊得較小之加工形狀,要求所使用 之構件具有較高的強度以獲得必需之彈性、以及具有可承 受嚴酷青曲加工之優異-曲加工性。於該方面由於含有 鈦之銅合金(以下,稱為「鈦銅」)之強度比較高,且應力緩 和特性在銅合金中最為倡·里, 取马馒異因此自先前以來即被用作特 別要求強度之訊號系端子用構件。 欽銅係時效硬化型之銅合金。若藉由固溶化處理形成 作為溶f原子之Ti之過飽和固溶體’並自該狀態於低溫下 實施較長時間之熱處理,則會因為離相分解(sp副如 decomposition),而使得母相中之調變結構(m〇duiatedBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a titanium copper suitable for use as an electronic component such as a connector and a method of manufacturing the same. [Prior Art] In recent years, the miniaturization of electronic devices such as mobile terminals has been progressing steadily. Therefore, the narrow pitch and low profile of the connectors used therein are remarkable. The smaller the connector, the more the width of the pin is. In order to become a smaller folded shape, the member to be used is required to have higher strength to obtain the necessary elasticity and to withstand the harshness of the koji processing. - Curved workability. In this respect, since the strength of the copper alloy containing titanium (hereinafter referred to as "titanium copper") is relatively high, and the stress relaxation property is most advocated in the copper alloy, the horse is different and has been used as a special The signal for the strength is required for the terminal member. Chin copper is an ageing hardening type copper alloy. If a supersaturated solid solution of Ti as a dissolved f atom is formed by solution treatment and heat treatment is performed for a long time from this state at a low temperature, the mother phase is caused by the phase decomposing (sp de-decomposition). Modulation structure (m〇duiated

StrUCtUre)(即Tl丨農度之週期性變動)擴展,且強度提高。此 時’問題在於強度與幫曲加工性相反之特性這一點。即, 若使強度提高’則會損及彎曲加工性,相反地,若重視贊 曲加工性,則無法獲得期望之強度。一般而言,越提高冷 軋之軋縮率(WHng redueti()n),則所導人之差排(disi〇cati〇n) 量變得越多且差排密度變得越高,因此有助於析出之成核 201122121 位置會增加,可提高時效處理後之強度’但若過於提高軋 縮率,則彎曲加:^性會惡化。以,謀求兼具強度及彎曲 加工性已成為課題。 因此,已提出有從如下觀點來謀求兼具鈦銅之強度與 彎曲加工性之技術:添加Fe、c〇、Ni、Si等第三元素(專利 文獻1);限制於母相中固溶之雜質元素群之濃度,並使該 等作為第二相粒子(Cu-Ti一 X系粒子)以特定之分佈形態 析出來提高調變結構之規則性(專利文獻2);規定有效使結 晶粒微細化之微量添加元素與第二相粒子之密度(專利文獻 3 ),以及使結晶粒微細化(專利文獻4)。 於鈦銅之情形時,亦提出有如下之鈦銅:該鈦銅存在 相對於作為母相之α相,整合性較差之万相(TiCh)與整合 性較佳之石’相(TiCiu)’且因点相會對彎曲加工性造成不良 影響’另-方面m均句且微細地分散有助於兼具強 度與弯曲加工性’故該鈦銅係一面抑制"目一面使"目微 細分散而成者(專利文獻5)。 亦提出有如下技術:著眼於結晶方位,控制結晶配向 以滿足 1{420}/1。{420}:> 1〇 及 1{22〇}/1。{22〇}$3 〇,藉 此改善強度、彎Λ加工性及財應力緩和性(專利文獻6)。 [專利文獻1]日本特開2004_ 231985號公報 [專利文獻2]曰本特開2〇〇4 — 176163號公報 [專利文獻3]日本特開2〇〇5_ 97638號公報 [專利文獻4]日本特開2006— 26561 1號公報 [專利文獻5]日本特開2〇〇6 — 283142號公報 201122121 [專利文獻6]日本特開2008— 308734號公報 【發明内容】 如此’迄今為改善鈦銅之強度及脊曲加工性而研究了 各種方法,但尚有改善之餘地。因此,本發明之課題之一 在於自與迄今不同之觀點嘗試鈦銅之特性改善,提供一種 具有優異之強度及·彎曲加工性之鈦銅。本發明之另一課題 在於提供一種此種鈦銅之製造方法。 先前之鈦銅之製造方法基本係以錠之熔解鑄造—均質 化退火—熱軋—(反覆進行退火及冷軋)—最終固溶化處理 —冷軋—時效處理之順序構成。先前技術中所記載之鈦銅 亦以相同之順序製造。 本發明者於為解決上述課題而進行研究之過程中,發 現若最終固溶化處理之後進行之冷札及時效處理之順序與 先前相反,即,若替換成時效處理〜冷軋之次序後,最後 2適當之條件下實施去應變退火’則彎曲加工性會顯著提 :即彳將以先前之順序製造之鈦銅與本發明之鈦銅進 ^比:,則強度相同時,本發明之欽銅之f曲加工性更優 ::::::為調查其原因,而調查了本發明之鈦: 體而與結晶粒之形態中發現了特徵點。具 時效處理之順序時相比,設為時…’與°又為冷軋- 獲得之欽銅之差排密度更上升…之順序時所 之差排密度所必需之冷軋時之二之::減小獲得相同 可抑制冷乳時結晶粒朝壓延方向右乾縮率較小,則 万向延伸,因此會改善彎曲加 201122121 工性。 差排密度難以直接測定。其原因在於,因調變結構或 析出粒子之分佈而導致差排之分佈變得不均勻。間接地嘗 試評價時,與壓延面中之{220}結晶面之乂射線繞射強度峰 值之半高寬有關。半高寬即繞射強度曲線之峰值強度之i / 2之強度中之繞射強度曲線之寬度(万),以2 0表示。半 高寬係伴隨著冷軋之軋縮率之上升而與差排密度一同變 大。因此,於本發明中,以該半高寬為指標而間接地規定 差排密度之狀態。 基於上述見解而完成之本發明之一形態係一種電子零 件用銅合金,其含有2.0〜4_0質量%之Ti,且剩餘部份由 銅及不可避免之雜質構成; 來自壓延面之{220}結晶面之X射線繞射強度峰值的半 高寬石{220}與來自純銅標準粉末之{22〇丨結晶面之X射線 繞射強度峰值的半高寬召0 {220}滿足下式: 3.0 S 召{220}/ 沒 0{220} $ 6.0 ;且, 觀察平行於壓延方向之剖面之組織時,平均結晶粒徑 以近似圓的直徑表示為30 以下。 本發明之銅合金之一實施形態中’觀察平行於壓延方 向之剖面之組織時,平行於壓延方向之方向的平均結晶粒 徑(L)與垂直於壓延方向之方向的平均結晶粒徑(丁)之比(L /T)為1〜4 » 本發明之銅合金之另一實施形態中,其彈簧彎曲彈性 限度(spring bending elastic limit)為 600〜1〇〇〇 MPa。 201122121 其彈簧彎曲彈性 本發明之銅合金之另一實施形態中 限度為 3 0 0 ^ 6 〇 〇 Μ P a。 本發明之銅合金之:另一實施形態,合計含有〇〜〇5質 量%之選自為第3元素群之Mn、Fe、Mg、Cq、%、a、v、StrUCtUre) (ie, the periodic variation of Tl 丨 农 农) expands and the strength increases. At this time, the problem lies in the fact that the strength is opposite to the workability of the flex. In other words, if the strength is increased, the bending workability is impaired. Conversely, if the workability is emphasized, the desired strength cannot be obtained. In general, the more the cold rolling reduction ratio (WHng redueti()n) is increased, the more the amount of dissi〇cati〇n is introduced and the higher the density is, so it helps. The position of the nucleation 201122121 will increase, which will increase the strength after aging treatment. However, if the rolling reduction rate is too high, the bending will increase. Therefore, it has become a problem to achieve both strength and bending workability. Therefore, there has been proposed a technique of combining the strength and bending workability of titanium copper from the viewpoint of adding a third element such as Fe, c〇, Ni, or Si (Patent Document 1); and limiting it to solid solution in the matrix phase. The concentration of the impurity element group is such that the second phase particles (Cu-Ti-X-based particles) are precipitated in a specific distribution form to improve the regularity of the modulation structure (Patent Document 2); The density of the trace addition element and the second phase particle (Patent Document 3) and the refinement of the crystal grain (Patent Document 4). In the case of titanium copper, titanium copper is also proposed which has a poor integration of the phase (TiCh) and a better integrated stone 'phase (TiCiu)' with respect to the α phase as the parent phase and Since the point phase has an adverse effect on the bending workability, the other side of the m-thickness and fine dispersion contributes to both strength and bending workability, so the titanium-copper system suppresses " The founder (Patent Document 5). The following techniques have also been proposed: focusing on the crystal orientation and controlling the crystal alignment to satisfy 1{420}/1. {420}:> 1〇 and 1{22〇}/1. {22〇}$3 〇, thereby improving strength, bending workability, and financial stress mitigation (Patent Document 6). [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. Hei. No. Hei. [Patent Document 5] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. 2008- 308. Various methods have been studied for strength and spine processing, but there is still room for improvement. Therefore, one of the problems of the present invention is to provide an improvement in the properties of titanium and copper from the viewpoint of the difference from the prior art, and to provide a titanium copper having excellent strength and bending workability. Another object of the present invention is to provide a method of producing such a titanium copper. The previous method for producing titanium copper was basically composed of ingot casting, homogenization annealing, hot rolling, (repetitive annealing and cold rolling), final solution treatment, cold rolling, and aging treatment. The titanium copper described in the prior art is also manufactured in the same order. In the course of research by the present inventors to solve the above problems, it has been found that if the final solution treatment is performed after the final solution treatment, the order of the cold treatment is reversed, that is, after replacing the aging treatment with the cold rolling sequence, the last 2 Performing strain relief annealing under appropriate conditions, the bending processability is remarkably improved: that is, the titanium copper produced in the previous order is compared with the titanium copper of the present invention: when the strength is the same, the copper of the present invention The processability of f-curve is better:::::: In order to investigate the cause, the characteristics of the titanium of the present invention and the form of the crystal grain were investigated. Compared with the order of aging treatment, when it is set to ... and ° is cold-rolled again - the difference in the density of the obtained copper is higher than the order of the difference in the order of the difference between the two: : Reducing the same can suppress the cold milk, the right grain shrinkage rate of the crystal grain in the rolling direction is small, then the universal extension, thus improving the bending plus 201122121 workability. The difference in density is difficult to measure directly. The reason for this is that the distribution of the difference rows becomes uneven due to the modulation structure or the distribution of the precipitated particles. In the case of the inter-ground test, it is related to the half-height of the peak value of the 乂-ray diffraction intensity of the {220} crystal plane in the calendering surface. The full width at half maximum (i.e., the width of the diffraction intensity curve in the intensity of the peak intensity of the diffraction intensity curve i / 2 is expressed as 20 0. The half-height width increases with the difference in the density of the cold rolling. Therefore, in the present invention, the state of the difference density is indirectly defined by the half width and the width. One aspect of the present invention completed based on the above findings is a copper alloy for electronic parts containing 2.0 to 4% by mass of Ti, and the remainder consisting of copper and unavoidable impurities; {220} crystallizing from the calendering surface The half-height-width stone {220} of the X-ray diffraction intensity peak of the surface and the half-height width of the X-ray diffraction intensity peak of the {22〇丨 crystal plane from the pure copper standard powder are called 0 {220}, and the following formula is satisfied: 3.0 S Calling {220}/ no 0{220} $6.0; and, when observing the structure of the section parallel to the rolling direction, the average crystal grain size is represented by an approximate circle diameter of 30 or less. In one embodiment of the copper alloy of the present invention, when the structure parallel to the cross-section of the rolling direction is observed, the average crystal grain size (L) parallel to the direction of the rolling direction and the average crystal grain size perpendicular to the direction of the rolling direction (D) The ratio (L / T) is 1 to 4. In another embodiment of the copper alloy of the present invention, the spring bending elastic limit is 600 to 1 MPa. 201122121 Its spring bending elasticity The limit of another embodiment of the copper alloy of the present invention is 3 0 0 ^ 6 〇 Μ Μ P a . In another embodiment, the copper alloy of the present invention contains Mn, Fe, Mg, Cq, %, a, v, which are selected from the group consisting of 〇~〇5 by mass% of the third element group.

Nb、Mo 1種或2種以上。Nb or Mo is one type or two or more types.

Zr ' Si、B及P構成之群之 本發明之另一形態係一種伸銅品(ei〇ngated⑶叩^ product),其由上述銅合金構成。 本發明之又一形態係一種電子零件,其具備上述銅合 金。 本發明之又一形態係一種連接器,其具備上述銅合金。 本發明之又一形態:係一種電子零件用銅合金之製造方 法’其包括如下步驟: 對含有2.0〜4·〇質量%iTl,並合計含有〇〜〇5質量 %之選自為第3元素群f Mn、Fe、Mg、c〇、犯、v、 ^^。、〜、^^㈣成之群之任意^或^以上, 且剩餘部份由銅及不可避免之雜質構成之銅合金素材,進 仃加熱至在730〜880°C内Ti之固溶限變成與添加量相同之 溫度以上的固溶化處理; 於固溶化處理後,進行於材料溫度4〇〇〜5〇〇&lt;&gt;c下加熱 〇. 1〜20小時之時效處理;且 時效處理後,進行抨縮率為〇〜4〇%之最終冷軋。 本發明之銅合金之製造方法於一實施形態中,包括於 最終冷軋後進行去應變退火,該去應變退火係以材料溫度 WOt以上、未達35(TC加熱〇顧小時以上、4〇小時以下二 201122121 以材料溫度350°C以上、未達550t加熱0.0001小時以上、 20小時以下’或者以材料溫度55〇°C以上、700。(:以下加熱 0.0001小時以上、0.003小時以下。 本發明之銅合金之製造方法於另一實施形態中,包括 於最終冷軋後進行去應變退火,該去應變退火係以材料溫 度200°C以上、未達400°C加熱0.001〜20小時。 根據本發明,可獲得強度及彎曲加工性優異之鈦銅。 【實施方式】 &lt; Ti含量&gt; 於Ti未達2.0質量%時,無法充分地獲得由鈦銅原本之 δ周變結構之形成所產生的強化機制,因此無法獲得充分之 強度’相反地若超過4.0質量%,則存在粗大之TiCu3易於 析出’且強度及彎曲加工性劣化之傾向。因此,本發明之 銅合金中之Ti的含量為2.0〜4.0質量。/〇,較佳為2 7〜3 5 質量%。藉由將Ti之含量如此適當化,可同時實現適合用 於電子零件之強度及彎曲加工性。 &lt;第3元素&gt; 若於鈦銅中添加一定之第3元素,則具有如下之效果: 即便於Ti充分固溶之高溫下進行固溶化處理,結晶粒亦容 易微細化,且使強度提高。又,一定之第3元素會促進調 變結構之形成。進而,亦具有抑制Ti—Cu系之穩定相之急 遽粗大化之效果。因此,可獲得鈦銅原本之時效硬化能 (Age-hardening P〇wer)。 於欽銅中’上述效果最佳者為Fee至於Mn、Mg、CQ、 201122121Another group of the invention consisting of Zr 'Si, B and P is a copper product (ei〇ngated (3) product^ product) composed of the above copper alloy. Still another aspect of the invention is an electronic component comprising the above copper alloy. Still another aspect of the invention is a connector comprising the above copper alloy. According to still another aspect of the present invention, there is provided a method for producing a copper alloy for an electronic component, which comprises the steps of: containing a second element containing 2.0 to 4% by mass of iT1 and containing 〇~〇5 mass% in total Group f Mn, Fe, Mg, c〇, guilt, v, ^^. , ~, ^^ (4) Any group of ^ or ^ above, and the remaining part of the copper alloy material consisting of copper and inevitable impurities, heating into the 730 ~ 880 ° C Ti solid solution limit becomes The solution treatment is performed at a temperature equal to or higher than the addition amount; after the solution treatment, the aging treatment is performed at a material temperature of 4 〇〇 5 5 ° &lt;&gt;c, and the aging treatment is performed for 1 to 20 hours; and after the aging treatment The final cold rolling is performed at a collapse rate of 〇~4〇%. In one embodiment, the method for producing a copper alloy according to the present invention comprises performing strain relief annealing after final cold rolling, and the strain relief annealing is performed at a material temperature of WOt or more and less than 35 (TC heating is more than hours, 4 hours) The following two 201122121 are heated at a material temperature of 350 ° C or higher, less than 550 t for 0.0001 hours or more, and 20 hours or less 'or a material temperature of 55 〇 ° C or more and 700. (: The following heating is 0.0001 hours or more and 0.003 hours or less. In another embodiment, the method for producing a copper alloy includes performing strain relief annealing after final cold rolling, and the strain relief annealing is performed at a material temperature of 200 ° C or higher and less than 400 ° C for 0.001 to 20 hours. Titanium copper having excellent strength and bending workability can be obtained. [Embodiment] &lt;Ti content&gt; When Ti is less than 2.0% by mass, the formation of the original δ-variation structure of titanium copper cannot be sufficiently obtained. When the mechanism is strengthened, sufficient strength cannot be obtained. When the amount is more than 4.0% by mass, the coarse TiCu3 tends to precipitate, and the strength and bending workability tend to deteriorate. The content of Ti in the copper alloy of the present invention is 2.0 to 4.0 mass%, preferably 2 7 to 3 5 mass%. By appropriately arranging the content of Ti, it is possible to simultaneously achieve suitable use for electronic parts. Strength and bending workability. <Third element> When a certain third element is added to titanium copper, the effect is as follows: that is, it is easy to finely dissolve the crystal grains at a high temperature in which Ti is sufficiently solid-solved. In addition, the third element promotes the formation of a modulation structure, and also has the effect of suppressing the sharpening and coarsening of the Ti-Cu-based stable phase. Therefore, the original aging of titanium copper can be obtained. Age-hardening P〇wer. In Yuqin Copper, the best effect is Fee as for Mn, Mg, CQ, 201122121

Nl、Sl、Cr、v、Nb、Mo、Zr、B*p,h__F 之效果’單獨添加即可見效,亦可複合添加兩種以上、、、Fe 含有⑽質量。切上之該等元素,則出現 :仁右合計超過0.5質量%,則存在強度與彎曲加工性之 千衡性劣化之傾向。因此,可合計含有〇〜 自Λ笛7 -主i %之選 自為第3兀素群之Mn、Fe、Mg、c〇、Ni、Cr、 :。广Sl、…構成之群之丨種或2種以上,較佳為 s什含有〇.〇5〜〇·5質量%。 為 〈結晶粒徑&gt; 為提高鈦銅之強度及彎曲加工性,結晶粒越小越好。 因此,較佳之平均結晶粒徑為3〇…下,更佳為 Π:而更佳為1〇 ^以下。關於下限並無特別限制, -由於難以辨別結晶粒徑,因此將此種情況設為未達^ -(&lt;1心),此種較小之粒徑亦包含於本發明之範圍。缺 :緩若:端地縮小’則應力緩和特性會降低,目此需要應 性時’較佳Si…上。本發明中,平均結晶 &quot; X利用《學顯微鏡或電子顯微鏡觀察平行於壓延方 向之剖面之組織時觀察产之近似圓的直徑表示。 -般而言,結晶粒對應於最終之冷乾中之軋縮率而呈 現朝壓延方向延伸之橢圓形狀’但為提高弯曲加工性,較 :理想的是儘量接近正圓,且結晶粒之形狀不存在異向 ^本發明中,由於可減小冷軋中之軋縮率,目此可獲得 月线方向之延伸較少之結晶粒。然』,若欲使結晶粒之 &gt;狀接近正圓而使最終之冷軋之軋縮率過低,#會導致強 201122121 因此,本發明之鈦銅之一實施形態中,藉由電子 顯微鏡觀察平行於壓延方向之剖面之組織時,平行於壓延 &quot;向彳向的平均結晶粒徑⑹與垂直於壓延方向之方向的 平均結晶粒徑⑺之比(L/ τ)(以下,稱為「結晶粒縱橫比」) 為1〜4,較佳為丨.5〜3.5,更佳為2〜3。 &lt;半高寬&gt; 本發明中,使用壓延面中之{22(^結晶面之χ射線繞射 強度峰值之半高寬作為差排密度之指標。此係根據上述理 由。而且,本發明之鈦銅之來自壓延面之{220丨結晶面的X 射線繞射強度峰值之半高寬冷{220},與來自純銅標準粉末 之{220}結晶面之χ射線繞射強度峰值之半高寬点〇{22〇)滿 足下式: 3.〇蕊石{220}/ /5 〇{220}$ 6.0。 /3 {220}及冷〇 {220}係以相同測定條件進行測定。純銅 標準粉末係以325網眼(JIS Ζ8801)之純度99.5%之銅粉末來 定義。 冷{220}/ /5 0{220}隨著差排密度降低而降低,相反 地,隨著差排密度升高而上升。若冷{220}/冷0 {220}變小, 則弯曲加工性會提高,但強度會降低。相反地,若万{2 2 0 J / /5 〇{220}增大,則強度會提高,但彎曲加工性會降低。如 欲謀求兼具強度與彎曲加工性,則必須為3.0$厶{220}/ 冷 〇{220} $ 6.0,較佳為 3.5S /3 {220}/“{220}蕊 5.〇。如 先前般在最終固溶化處理後以冷軋—時效處理之順序進行 處理之製法中,為使Θ {220}//5 〇{220}變成3.0左右而必 201122121 須進行軋縮率接近50%之冷軋’但本發明之製法中,能夠 以10◦/〇左右之軋縮率達成。因此,可一面提高差排密度(強 度)’ 一面使結晶粒縱橫比較小,亦即不損及彎曲加工性。 &lt;彈簧彎曲彈性限度&gt; 對於本發明之銅合金,如後述般可藉由是否於最終步 驟實施去應變退火來調節彈簧彎曲彈性限度。因此,可一 面維持上述之半高寬或結晶粒之條件,一面定出所求之彈 簧彎曲彈性限度。例如,本發明之銅合金於一實施形態中, 可具有300〜1000 MPa之彈簧彎曲彈性限度,於具有較高 之彈簧彎曲彈性限度之實施形態中,可設為6〇〇〜1 〇〇〇 MPa ’較佳為可設為8〇〇〜1 〇〇〇 MPa,於具有較低之彈箸彎 曲彈性限度之實施形態中,可設為300〜6〇〇 MPa,較佳為 可設為400〜600 MPa。 &lt;用途&gt; 本發明之銅合金可供作為各種伸銅品’例如板、條、 管、棒及線。本發明之鈦銅並無限定,可適當地用作開關、 、繼電器等電子零件之材料。 &lt;製法&gt;The effects of Nl, Sl, Cr, v, Nb, Mo, Zr, B*p, and h__F may be effective when added alone, or may be added in combination of two or more, and Fe contains (10) mass. When these elements are cut, it is found that when the total amount of the right side exceeds 0.5% by mass, there is a tendency that the strength of the strength and the bending workability deteriorate. Therefore, the total amount of 〇, Λ, 主, 主, 主, 主, 主, Ni, Ni, Ni, Ni, Ni, Ni, Ni, Ni, Ni, Ni, Ni, Ni, Ni, 。丨 〇 〇 〇 〇 〇 、 、 、 、 、 、 、 、 、 、 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 <Crystal Grain Size> In order to increase the strength and bending workability of titanium copper, the smaller the crystal grains, the better. Therefore, the preferred average crystal grain size is 3 Å, more preferably Π: and more preferably 1 〇 ^ or less. The lower limit is not particularly limited. - Since it is difficult to discriminate the crystal grain size, this case is set to be less than - (&lt;1 core), and such a smaller particle size is also included in the scope of the present invention. Lack: If the end is reduced, the stress relaxation property will be reduced, and it is necessary to have a better condition. In the present invention, the average crystallization &quot; X is expressed by the diameter of an approximate circle observed when observing the structure parallel to the section of the rolling direction by a microscope or an electron microscope. In general, the crystal grains exhibit an elliptical shape extending in the rolling direction corresponding to the final shrinkage ratio in the cold drying. However, in order to improve the bending workability, it is desirable to be as close as possible to a perfect circle and the shape of the crystal grains. There is no anisotropy. In the present invention, since the rolling reduction in cold rolling can be reduced, it is possible to obtain crystal grains having a small extension in the direction of the moon line. However, if the shape of the crystal grain is close to a perfect circle and the final cold rolling is too low, # will result in a strong 201122121. Therefore, in one embodiment of the titanium copper of the present invention, an electron microscope is used. When observing the structure of the cross section parallel to the rolling direction, the ratio (L/τ) of the average crystal grain size (6) parallel to the calendering direction and the direction perpendicular to the rolling direction (L/τ) (hereinafter referred to as The "crystal grain aspect ratio") is 1 to 4, preferably 丨.5 to 3.5, more preferably 2 to 3. &lt;Half-height width&gt; In the present invention, the half-height width of the peak of the diffraction intensity of the 结晶-ray of the crystal face is used as an index of the difference in the density of the discharge. This is based on the above reasons. The half-height-width cold {220} of the X-ray diffraction intensity peak of the {220丨 crystal plane from the calendered surface of titanium and copper, and the half-height of the peak diffraction intensity of the {220} crystal plane from the pure copper standard powder The wide point 〇{22〇) satisfies the following formula: 3. 〇石石{220}/ /5 〇{220}$ 6.0. /3 {220} and cold heading {220} were measured under the same measurement conditions. Pure copper The standard powder is defined by a copper powder of 325 mesh (JIS Ζ8801) with a purity of 99.5%. The cold {220} / /5 0{220} decreases as the difference in density is lowered, and conversely, as the difference in density increases. If the cold {220}/cold 0 {220} becomes smaller, the bending workability will increase, but the strength will decrease. Conversely, if 10,000 {2 2 0 J / /5 〇 {220} is increased, the strength is increased, but the bending workability is lowered. If you want to combine strength and bending workability, you must be 3.0$厶{220}/ 冷〇{220} $6.0, preferably 3.5S /3 {220}/"{220}蕊5.〇. In the conventional method of treating in the order of cold rolling-aging treatment after the final solution treatment, in order to make Θ {220}//5 〇{220} become about 3.0, the 201122121 must be subjected to a rolling reduction rate of nearly 50%. Cold rolling 'However, in the production method of the present invention, it can be achieved at a rolling reduction ratio of about 10 ◦ / 。. Therefore, the crystal grain size can be made smaller and smaller, that is, the bending process can be performed without increasing the difference in density (strength) &lt;Spring Bending Elastic Limit&gt; For the copper alloy of the present invention, the spring bending elastic limit can be adjusted by performing strain relief annealing in the final step as will be described later. Therefore, the above-described full width at half maximum or crystallization can be maintained. The condition of the grain is determined by the desired spring bending elastic limit. For example, the copper alloy of the present invention may have a spring bending elastic limit of 300 to 1000 MPa in one embodiment, and has a high spring bending elastic limit. In the form, it can be set to 6〇〇 1 〇〇〇 MPa ' is preferably set to 8 〇〇 to 1 〇〇〇 MPa, and in the embodiment having a lower elastic limit of elastic bending, it may be 300 to 6 MPa, preferably It can be set to 400 to 600 MPa. &lt;Use&gt; The copper alloy of the present invention can be used as various copper-exposed products such as plates, strips, tubes, rods, and wires. The titanium copper of the present invention is not limited and can be suitably used. Used as a material for electronic parts such as switches, relays, etc. &lt;Manufacturing &gt;

步驟依序說明適宜之製造例。 連接器、插孔、端子、 之固溶化處理及其後 製造。以下,按每個 1)錠之製造The steps sequentially describe suitable manufacturing examples. Solidification of connectors, jacks, terminals, and subsequent manufacturing. Following, each 1) ingot manufacturing

上於真空中或惰性氣 元素之不熔殘渣,則 201122121 無助於強度之提高。由此,為去除不熔殘渣,必須於添加 Fe或Cr等高熔點之第3元素後充分地進行攪拌,其後保持 一定時間。另一方面,由於Ti相對容易熔解於中因 此於熔解第3元素後添加即可。因此,較為理想 合計含有0〜〇.5〇質量%之方式將選自Mn、Fe、Mg、、If it is in a vacuum or a non-melting residue of inert gas, 201122121 does not contribute to the improvement of strength. Therefore, in order to remove the infusible residue, it is necessary to sufficiently stir the third element having a high melting point such as Fe or Cr, and then hold it for a predetermined period of time. On the other hand, since Ti is relatively easily melted, it may be added after melting the third element. Therefore, it is preferable that the total amount of 0 to 〇.5 〇 mass% is selected from the group consisting of Mn, Fe, Mg, and

Ni、Cr、V、Nb、M〇、Zr、Si'以p構成之群之丄種或2 種以上添加至Cu巾’繼而以含有2 〇〜4 〇質量%之方式將 Ti添加至Cu中來製造旋。 2)均質化退火及熱軋 由於在錠之製造時所產生之凝固偏析或結晶物較粗 大,因此較理想的是藉由均質化退火儘量使其固溶於母相 中而縮小,儘可能將其去除。其原因在於:對防止f曲破 。具體而έ,較佳為於錠之製造步驟後,加熱至9〇〇〜97〇 丁 3 24小時之均質化退火,其後實施熱軋。為防 液體金屬脆性’較佳為於熱軋前及熱軋中設為以 X且於自初始厚度至整體之軋縮率$ 9 為90(TC以上。而η达 退人〇又 而有效減少Τ·^ 於每一道次中產生適度之再結晶 mm實施即可。 -要將每-道次之軋縮量以10〜20 3)第一固溶化處理 其後, 溶化處理。 溶化處理中 較佳為於適當地反覆進行冷軋與退火後進行固 此處預先進行m之王里由係為減輕最終之固 之負擔。即’最終之固溶化處理並非用以使第Ni, Cr, V, Nb, M〇, Zr, Si', or a mixture of two or more types added to the Cu towel, and then Ti is added to the Cu in a manner of containing 2 〇 to 4% by mass. To make a spin. 2) Homogenization annealing and hot rolling Because the solidification segregation or crystals generated during the production of the ingot are coarse, it is desirable to reduce the solidification in the matrix by homogenization annealing as much as possible. It is removed. The reason is: to prevent f breaks. Specifically, it is preferable to heat-anneal to 9 〇〇 to 97 〇 3 24 hours after the production step of the ingot, and then perform hot rolling. In order to prevent liquid metal brittleness, it is preferable to set X in the hot rolling and hot rolling, and the rolling reduction ratio from the initial thickness to the whole is 90 (TC or more), and η is regressive and effective. Τ·^ It is sufficient to produce moderate recrystallization in each pass. - The amount of rolling per pass is 10~20 3). After the first solution treatment, it is melted. In the melting treatment, it is preferred to carry out the cold rolling and the annealing in an appropriate manner, and then to perform the fixing in advance. That is, the final solution treatment is not used to make

S 12 201122121 二相粒子固溶之熱處理,,且由於已被固溶化,因此只要一 面維持該狀態一面僅產生再結晶即可,因而進行輕微之熱 處理即可。具體而言,第一固溶化處理中,只要將加熱溫 度設為850〜90CTC,並進行2〜1〇分鐘即可。較佳為極力 使此時之升溫速度及冷卻速度亦加速,且此處不使第二相 粒子析出。再者’亦可不進行第一固溶化處理。 4) 中間壓延 最終之固溶化處理前之中間壓延t之軋縮率越高,則 越可將最終之固溶化處理中之再結晶粒控制得均勾且微 細。因此,中間壓延之軋縮率較佳為7〇〜99%。軋縮率係 以{((壓延前之厚度—壓延後之厚度)〆壓延前之厚度^ 100%}定義。 &quot; 5) 最終之固溶化處理 々最 '終之固溶化處理中,較為理想的是使析出物完全固 ' 若加熱至全去除為止之高溫,則結晶粒易粗大化, 因此將加熱溫度設為第二相粒子組成之固溶限附近之溫度 (於Ti之添加量為2 〇〜4 〇質量%之範圍内,Ti之固溶限變 成與添加量相同之溫度為73〇〜請。C左右,例如Τι之添加 ,為3.0質量%時為綱t左右)。而且,若迅速加熱至該溫 又,且亦使冷卻速度加速,則粗大之第二相粒子之產生受 J抑制因此,較典型的是加熱至730〜8801之Ti之固溶 限變成與添加量相同之、、田;S: w μ s Λ . 〜嗔之Τ· 更典型的是加熱至比730 π 1之固溶限彎成與添加量相同之溫度高〇〜2〇t 又較佳為加熱至高0〜1〇〇c之溫度。 13 201122121 曰又最終之固溶化處理中之加熱時間越短,越可抑制 粒之粗大化,加熱時間例如可設,為π〜秒,較典型 =是可設為30〜60秒。即便於該時間點產生第2相粒子, :要微細且均勻地分散,則幾乎不會對強度與彎曲加工性 j成損害。然而,由於存在粗大者於最終之時效處理中進 步成長之傾向,因此即便於該時間:點生成第2相粒子, 亦必須儘量使其較少且較小。 6)時效處理 於最終之固溶化處理之後進行時效處理。雖然先前之 通例係於最終之固溶化處理後進行冷軋,但獲得本發明之 鈦銅之要點在於:在最終之固溶化處理之後,不進行冷軋 而直接進行時效處理。其原因在於:與在時效處理之:進 行冷軋之情形相比,即便為相同之軋縮率,亦可提高差排 密度。雖然無意根據理論對本發明“行限^,但認為其與 結晶粒内之結晶性與剪切帶之產生有關。通常若進行壓 延’則由於導入差排,因此結晶會產生應變,且半高寬會 增大。若半高寬較小’則結晶性較高,若半高寬較大,則 結晶性較低。若於結晶性較高之狀態下進行時效處理,並 進行彎曲加工’則剪切帶易擴展,易成為彎曲破裂之原因。 若於固溶後進行時效處理,則於結晶粒内均勻地進行析出 反應,且調變結構或微細之第2相粒子易均勻地擴展。若 於藉由時效處理控制成此種組織後再進行冷軋,則與未進 行時效處理之情形相比,結晶更易產生應變,且剪切帶更 難以擴展。然而’若加工度提高,則差排密度會過於增加 201122121 而損及彎曲加工性。由此,即便為較低之加工度,亦可 制剪切帶之擴展,並且獲得高強度。由於時效處理係於= 溶化處理後進行,因此成為析出之驅動力之應變較少,故 於較慣例之時效條件略高溫下進行即可。具體而古,較佳 為於材料溫度400〜50(TC下加熱0.1〜2〇小時,更佳為於 材料溫度400〜480。(:下加熱1〜16小時。 7 )最終之冷軋 於上述時效處理後進行最終之冷軋。藉由最終之冷 加工可提高鈦銅之強度。雖然亦可不實施該冷軋,但為; 獲得較高之強度,而將軋縮率設為5%以上,較佳$ 1〇%以 上’更佳A 15%以上。然而,若軋縮率過高則結晶粒縱 橫比會變得過大而使f曲加卫性之提高效果減小,因此將 軋縮率設為4G%以下,較佳為3G%以下,更佳為25%以下。 8)去應變退火 對應於電子零件之構造,要求不同之形狀加工。通常 對實施了弯曲加工或凹口加工等塑性變形之部位進行加工 硬化’使素材之強度進一步上升。由於以此種彎曲加工部 確保接壓之構造不易塑性㈣,因此不需要較高之彈簧彎 曲彈性限度。因此,對於此種用途亦可不進行去應變退火。 另-方面,以衝壓後之形狀加工時不會塑性變形之部 位來確保接壓之構造(例如:自端子之接點部起至弯曲加工 =直線部分(支臂)的距離較長之構造,或如叉型端子般未 :有凹口加工或彎曲加工之構造,即如對支臂施加彎曲應 力之構造)’因為需要有對於彎曲變形之阻力,因此較高之 15 201122121 彈簧彎曲彈性限度變得重要。 因此,尤其於彈簧f曲彈性限度為重要之用途中,會 在最終之冷軋後進行去應變退火。尤其於最終之冷軋之軋 縮率為3。/。以上之情形時,在彈簧彎曲彈性限度為重要之用 途中進行去應變退火較佳。λ,於最終之冷乾之乳縮率為 10%以上之情形時,在彈箐彎曲彈性限度$重要之用途中進 行去應變退火尤佳。去應變退火之條件可為慣用之條件, 但在冷軋中所導人之差排會分佈不均句。#由進行去應變 退火而使差排再配置排列,藉此亦可進一步謀求強度上 升。然而,若過度地進行去應變退火,則差排會消失且強 度降低’&amp;欠佳,,例如只要以材料溫度⑽t以上未 達3 50 C加熱0.001小時以上I π* 。 J于乂上40小時以下、以材料溫度350 C以上未達550。(:加熱O.OOOi小時 J。守Μ上20小時以下、戋者 以材料溫度550〇C以上700°(:以下士办η u L以下加熱0.0001小時以上 0_ 0 0 3小時以下即可,較佳兔於 。 牧佳為於以材料溫度200t以上未達 400°C加熱0.001〜2〇小時之倏株 保件下進行,更佳為於以材料 ^度350°C以上未達55CTC加熱0 0ηι Λ &quot; 热Ο·〇〇1〜〇.5小時之條件下進 〇Γ 士批 于門(例如以材料溫度200〜3〇〇 C加熱1 〇〜20小時)之條件進行、+ ▲ 右為尚溫則以短時間(例 如以材料溫度550〜70(TC以下力0勒Λ ( 件進行。 下加熱0.001〜0.003小時)之條 再者’若為本領域從業人員, ....^ ^ 則應該能夠理解可於上 这各步驟之間適當地進行用以, J 、上 ^ ^ A ^表面之氧化皮之研削、 研磨、珠粒喷擊酸洗等步驟。S 12 201122121 The heat treatment of the solid solution of the two-phase particles is carried out, and since it has been solid-solved, it is only necessary to recrystallize while maintaining this state on one side, and thus a slight heat treatment may be performed. Specifically, in the first solution treatment, the heating temperature may be 850 to 90 CTC and may be carried out for 2 to 1 minute. It is preferable to accelerate the temperature increase rate and the cooling rate at this time as much as possible, and the second phase particles are not precipitated here. Further, the first solution treatment may not be performed. 4) Intermediate calendering The higher the rolling reduction ratio of the intermediate calendering t before the final solution treatment, the more the recrystallized grains in the final solution treatment can be controlled to be fine and fine. Therefore, the rolling reduction ratio of the intermediate calendering is preferably from 7 〇 to 99%. The rolling reduction ratio is defined by {((thickness before rolling - thickness after rolling) 厚度 thickness before rolling ^ 100%}. &quot; 5) Final solid solution treatment, the most 'final solid solution treatment, ideal If the precipitate is completely solidified, if the temperature is high until the total temperature is removed, the crystal grains are easily coarsened. Therefore, the heating temperature is set to a temperature near the solid solution limit of the second phase particle composition (the addition amount of Ti is 2). In the range of 〇~4 〇% by mass, the solid solution limit of Ti becomes the same as the addition amount of 73 〇~ please. C or so, for example, the addition of Τι is 3.0% by mass. Moreover, if the temperature is rapidly heated to the temperature and the cooling rate is also accelerated, the generation of the coarse second phase particles is inhibited by J. Therefore, the solid solution limit of Ti heated to 730 to 8801 is usually added and added. The same, the field; S: w μ s Λ . ~ 嗔 Τ 更 · More typically is heated to a solid solution limit of 730 π 1 to bend the same temperature as the addition of high ~ 2 〇 t and preferably Heat to a temperature of 0~1〇〇c. 13 201122121 The shorter the heating time in the final solution treatment, the more the coarsening of the particles can be suppressed. The heating time can be set, for example, to π sec., and the typical y = 30 to 60 sec. That is, it is easy to generate the second phase particles at this time point, and if it is to be finely and uniformly dispersed, the strength and the bending workability j are hardly impaired. However, since there is a tendency for the coarse person to grow further in the final aging treatment, even if the second phase particle is generated at this point: it is necessary to make it smaller and smaller as much as possible. 6) Aging treatment The aging treatment is carried out after the final solution treatment. Although the conventional example has been subjected to cold rolling after the final solution treatment, the point of obtaining the titanium copper of the present invention is that after the final solution treatment, the aging treatment is directly performed without performing cold rolling. The reason for this is that the difference in density can be improved even in the case of aging treatment: cold rolling. Although it is not intended to limit the invention according to the theory, it is considered to be related to the crystallinity in the crystal grains and the generation of shear bands. Generally, if calendering is carried out, the crystals will be strained due to the introduction of the difference row, and the full width at half maximum. If the half-height width is smaller, the crystallinity is higher. If the full width at half maximum is larger, the crystallinity is lower. If the crystallinity is high, the aging treatment is performed, and the bending process is performed. The cut tape is easy to expand and is likely to cause bending cracking. If the aging treatment is performed after solid solution, the precipitation reaction is uniformly performed in the crystal grains, and the modified structure or the fine second phase particles are easily spread uniformly. By controlling the microstructure to be cold-rolled by aging treatment, the crystallization is more susceptible to strain than in the case where the aging treatment is not performed, and the shear band is more difficult to expand. However, if the degree of processing is increased, the difference in density It will increase the 201122121 too much and damage the bending workability. Therefore, even for the lower processing degree, the expansion of the shear band can be made and the high strength can be obtained. Since the aging treatment is after the melting treatment Therefore, the strain that becomes the driving force for precipitation is less, so it can be carried out at a slightly higher temperature than the conventional aging condition. Specifically, it is preferably heated at a material temperature of 400 to 50 (0.1 to 2 hours under TC, more Preferably, the material temperature is 400 to 480. (: heating is performed for 1 to 16 hours. 7) The final cold rolling is performed after the above aging treatment, and the final cold rolling is performed. The final cold working can increase the strength of the titanium copper. The cold rolling is performed, but the higher strength is obtained, and the rolling reduction ratio is set to 5% or more, preferably more than 10,000% or more, more preferably 15% or more. However, if the rolling reduction ratio is too high, the crystallization is performed. The grain aspect ratio becomes too large and the effect of improving the f-curvature property is reduced. Therefore, the rolling reduction ratio is set to 4 G% or less, preferably 3 G% or less, more preferably 25% or less. 8) Strain annealing Corresponding to the structure of the electronic component, it is required to process different shapes. Usually, the portion where plastic deformation such as bending or notch processing is performed is hardened, and the strength of the material is further increased. Since the bending portion is used to secure the pressure The structure is not easy to plastic (four), so there is no need to compare The spring bends the elastic limit. Therefore, it is not necessary to perform strain relief annealing for such a use. On the other hand, the structure that is not plastically deformed when the shape after punching is processed is ensured (for example, the contact from the terminal) The structure from the part to the bending process = the straight part (arm) is long, or is not like a fork type terminal: a structure having a notch processing or a bending process, that is, a structure in which a bending stress is applied to the arm) There is a need for resistance to bending deformation, so the higher 15 201122121 spring bending elastic limit becomes important. Therefore, especially in applications where the spring b-flexile limit is important, strain relief annealing will be performed after the final cold rolling. In the case of the final cold rolling reduction ratio of 3% or more, it is preferable to perform strain relief annealing in an application in which the spring bending elastic limit is important. λ, in the case where the final cold-drying emulsion shrinkage rate is 10% or more, it is particularly preferable to perform strain relief annealing in an application in which the elastic bending limit of the magazine is important. The condition of the strain relief annealing may be a conventional condition, but the difference in the ranks of the people in the cold rolling may be unevenly distributed. # By performing strain relief annealing and rearranging the difference rows, it is possible to further increase the strength. However, if the strain relief annealing is excessively performed, the difference is eliminated and the strength is lowered && is not good. For example, it is heated at a material temperature of (10) t or more and not more than 3 50 C for 0.001 hour or more and I π*. J is less than 40 hours on the sputum, and the material temperature is less than 550 at 350 C or more. (: Heat O.OOOi hour J. Keep the sputum for less than 20 hours, and the material temperature is 550 〇C or more and 700 ° ((:: ~ below the η u L heating for 0.0001 hours or more 0_0 0 3 hours or less, compared佳佳在. The grazing is carried out under the condition of a material temperature of 200t or more and less than 400°C for 0.001~2〇 hours, more preferably for the material ^degree 350°C or more and less than 55CTC heating 0 0ηι Λ &quot; Ο Ο 〇〇 〇 〇 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 批 5 批 批 批 批 批The temperature is still short (for example, the material temperature is 550~70 (TC below force 0 Λ (pieces are carried out. Under heating 0.001~0.003 hours) and then 'if the field practitioners, ....^ ^ It should be understood that steps such as grinding, grinding, bead blasting, etc. of the scale of J, upper surface, and the surface of the surface may be appropriately performed between the above steps.

16 S 201122121 [實施例] 月之實把例及比較例,但該等實施 例係為增進理解本發明b # ,、優點而知:供者,並非欲限定發 明者。 製造本發明例之銅合金時,由於將活性金屬们作為第 2成分而添加,因此於溶製時使用真空熔解爐ϋ避免 由於混入本發明中規定之元素以外之雜質元素而產生預想 外之副作用,原料係嚴格挑選純度比較高者來使用。 首先’將 Mn、Fe、Mg、Co、Ni、Cr、V、Nb、Mo、16 S 201122121 [Embodiment] The examples and comparative examples of the present invention are for the purpose of promoting an understanding of the present invention, and the advantages of the present invention are not intended to limit the invention. When the copper alloy of the present invention is used, since the active metal is added as the second component, a vacuum melting furnace is used in the dissolution to prevent the occurrence of unexpected side effects due to the addition of the impurity element other than the element specified in the present invention. The raw materials are strictly selected for use with higher purity. First, 'Mn, Fe, Mg, Co, Ni, Cr, V, Nb, Mo,

Zr Si、B及P以表1所示之組成分別添加於cu後,分別 添加該表所示之組成之Ti。為避免產生添加元素之不溶殘 渣,亦充分顧及添加後之保持時間,其後於Ar環境下將該 等注入至鑄模中’而分別製造約2 kg之錠。 17 201122121 [表i] 表1 ·添加元素(質量%)Zr Si, B and P were respectively added to cu in the compositions shown in Table 1, and Ti of the composition shown in the table was added. In order to avoid the insoluble residue of the added element, the retention time after the addition was also taken into consideration, and then the same was injected into the mold in the Ar environment, and an ingot of about 2 kg was separately produced. 17 201122121 [Table i] Table 1 · Adding elements (% by mass)

No. Ti Μη Fe Mg Co Ni Cr V Nb Mo Zr Si B P 1 3.0 2 3.0 3 3.0 4 3.0 5 3.0 6 3.0 7 2.0 8 4.0 9 3.0 0.05 0.1 0.05 0.1 0.1 0.1 10 3.0 0.05 0.1 0.05 0.1 0.1 0.1 11 3.0 0.1 0.1 0.1 0.05 0.05 0.05 0.05 12 3.0 0.1 0.1 0.1 0.05 0.05 0.05 0.05 發 明 例 13 3.0 14 3.0 15 3.0 16 3.0 17 3.0 18 3.0 19 3.0 20 3.0 21 3.0 22 3.0 23 3.0 24 3.0 25 3.0 26 3.0 1 3.0 2 3.0 3 3.0 4 3.0 比 5 3.0 較 6 3.0 例 7 3.0 8 3.0 9 3.0 10 3.0 11 3.0 對上述錠進行於950°C下加熱3小時之均質化退火後,No. Ti Μ Fe Fe Mg Co Ni Cr V Nb Mo Zr Si BP 1 3.0 2 3.0 3 3.0 4 3.0 5 3.0 6 3.0 7 2.0 8 4.0 9 3.0 0.05 0.1 0.05 0.1 0.1 0.1 10 3.0 0.05 0.1 0.05 0.1 0.1 0.1 11 3.0 0.1 0.1 0.1 0.05 0.05 0.05 0.05 12 3.0 0.1 0.1 0.1 0.05 0.05 0.05 0.05 Inventive Example 13 3.0 14 3.0 15 3.0 16 3.0 17 3.0 18 3.0 19 3.0 20 3.0 21 3.0 22 3.0 23 3.0 24 3.0 25 3.0 26 3.0 1 3.0 2 3.0 3 3.0 4 3.0 to 5 3.0 to 6 3.0 Example 7 3.0 8 3.0 9 3.0 10 3.0 11 3.0 After the homogenization annealing of the above ingot at 950 ° C for 3 hours ,

S 18 201122121 於900〜950°C下進行熱軋,而獲得板厚為市爪之敎 板。藉由平面切削除鏽皮後,進行冷軋而形成條料之*’、、軋 (2_0mm),且進行條料狀態下之第丨次固溶化處理。第1 = 固溶化處理之條件係設為於850t加熱1〇分鐘。 火 丹者,於 一部分之實施例中不進行第i固溶化處理。繼而,於中門 之冷軋中,以使最終板厚達到0.10 mm之方式進行冷軋調 整中間之板厚後,插入至可迅速加熱之退火爐中而^行最 終之固溶域理,其後,用水冷卻。料之加熱條件係設 為:材料溫度係以Ti之固溶限與添加量相同時之溫度(Ti 濃度為3.0質量%時約8〇〇t,Ti濃度為2 〇質量%時約%^ C,Ti濃度為4_〇質量%時約84(rc )為基準,以表2所記載 之加熱條件分別保持i分鐘。繼而,於Ar環境中以表2所 圮載之條件進行時效處理。藉由酸洗除鏽皮後,以表2所 ^載之條件進行冷軋,t後以纟2戶斤f己載之各加熱條件進 订退火而製成發明例及比較例之試驗片。有些試驗片省略 了緊接在固溶化處理後之時效處理。 19 201122121 [表2]S 18 201122121 was hot rolled at 900 to 950 ° C to obtain a plate having a plate thickness of a city. After the scale is removed by plane cutting, cold rolling is performed to form a strand *', a roll (2_0 mm), and a second solid solution treatment in a strip state. The first = the conditions of the solution treatment were set to be heated at 850 t for 1 minute. In the case of the flamingo, the i-th solid solution treatment is not carried out in some of the examples. Then, in the cold rolling of the middle door, the cold-rolling adjustment intermediate thickness is performed so that the final thickness becomes 0.10 mm, and then inserted into the rapidly heating annealing furnace to perform the final solid solution domain. After that, it is cooled with water. The heating condition of the material is such that the material temperature is the same as the solid solution limit of Ti and the addition amount (about 8 〇〇t when the Ti concentration is 3.0% by mass, and about % C when the Ti concentration is 2 〇% by mass). When the Ti concentration was 4 〇 mass %, about 84 (rc) was used as a standard, and the heating conditions described in Table 2 were maintained for i minutes, respectively, and then aging treatment was carried out under the conditions of Table 2 in the Ar environment. After the scale was removed by pickling, the cold rolling was carried out under the conditions shown in Table 2, and the test pieces of the inventive examples and the comparative examples were prepared by annealing under the heating conditions of 纟2 jin. The test piece omits the aging treatment immediately after the solution treatment. 19 201122121 [Table 2]

No. 固溶化處理 (第1次) 固溶化處理 (第2次) 時效處理 冷軋 時效處理/去 應變退火 溫度 時間 溫度 時間 溫度 時間 軋縮率 溫度 時間 (°C) ⑻ (°C) (s) CC) (h) (%) CC) (h) 1 850 600 800 60 400 6 10 400 0.005 2 850 600 800 60 450 6 15 400 0.005 3 850 600 800 60 480 6 20 400 0.005 4 850 600 800 60 450 6 25 400 0.005 5 850 600 800 60 450 6 30 400 0.005 6 850 600 820 60 450 6 15 400 0.005 7 850 600 730 60 450 15 400 0.005 8 850 600 840 60 450 6 15 400 0.005 9 850 600 820 60 450 6 15 400 0.001 10 850 600 820 60 450 6 15 200 20 11 850 600 820 60 450 6 15 400 0.001 12 850 600 820 60 450 6 15 200 20 發 13 850 600 830 30 450 6 15 400 0.005 明 14 850 600 800 60 450 6 3 400 0.005 例 15 850 600 800 60 400 10 25 400 0.005 16 850 600 800 60 500 3 25 400 0.005 17 850 600 800 60 450 6 15 無 無 18 850 600 800 60 450 6 25 無 無 19 850 600 800 60 450 6 25 150 40 20 850 600 800 60 450 6 25 200 20 21 850 600 800 60 450 6 25 600 0.0005 22 無 無 800 60 450 6 15 400 0.005 23 無 無 800 60 450 6 25 400 0.005 24 無 無 800 60 450 6 15 無 無 25 無 無 800 60 450 6 25 無 無 26 850 600 800 60 450 6 25 200 0.0028 1 850 600 800 60 無 無 24 400 5 2 850 600 800 60 無 無 29 400 5 3 850 600 800 60 無 無 47 400 5 4 850 600 800 60 450 6 50 無 無 比 5 850 600 900 60 450 6 30 無 無 較 6 無 無 900 60 450 6 30 無 無 例 7 無 無 900 60 無 無 30 450 6 8 無 無 800 60 無 無 30 400 5 9 無 無 900 60 450 6 30 400 0.005 10 850 600 900 60 450 6 30 400 0.005 11 850 600 800 60 450 6 25 750 0.001No. Solution treatment (1st time) Solution treatment (2nd time) Aging treatment Cold rolling aging treatment / strain relief annealing temperature time temperature time temperature time rolling reduction temperature time (°C) (8) (°C) (s CC) (h) (%) CC) (h) 1 850 600 800 60 400 6 10 400 0.005 2 850 600 800 60 450 6 15 400 0.005 3 850 600 800 60 480 6 20 400 0.005 4 850 600 800 60 450 6 25 400 0.005 5 850 600 800 60 450 6 30 400 0.005 6 850 600 820 60 450 6 15 400 0.005 7 850 600 730 60 450 15 400 0.005 8 850 600 840 60 450 6 15 400 0.005 9 850 600 820 60 450 6 15 400 0.001 10 850 600 820 60 450 6 15 200 20 11 850 600 820 60 450 6 15 400 0.001 12 850 600 820 60 450 6 15 200 20 hair 13 850 600 830 30 450 6 15 400 0.005 Ming 14 850 600 800 60 450 6 3 400 0.005 Example 15 850 600 800 60 400 10 25 400 0.005 16 850 600 800 60 500 3 25 400 0.005 17 850 600 800 60 450 6 15 No 18 850 600 800 60 450 6 25 No 19 850 600 800 60 450 6 25 150 40 20 850 600 800 60 450 6 25 200 20 21 850 600 800 60 450 6 25 600 0.0005 22 No 800 60 450 6 15 400 0.005 23 No 800 60 450 6 25 400 0.005 24 No 800 60 450 6 15 No 25 No No 800 60 450 6 25 No 26 850 600 800 60 450 6 25 200 0.0028 1 850 600 800 60 No 24 400 5 2 850 600 800 60 No 29 400 5 3 850 600 800 60 No 47 400 5 4 850 600 800 60 450 6 50 No incomparable 5 850 600 900 60 450 6 30 No No 6 No 900 60 450 6 30 No Case 7 No 900 60 No No 30 450 6 8 No 800 60 No No 30 400 5 9 No 900 60 450 6 30 400 0.005 10 850 600 900 60 450 6 30 400 0.005 11 850 600 800 60 450 6 25 750 0.001

S 20 201122121 對所獲得之各試驗片 進行特性評價 利用以下之條件 將結果示於表3。 &lt;強度&gt; 以使拉伸方向妫 、堅延方向平行之方式,使用A 作JIS13B號試驗片。 更用加壓機製 狻片根據JIS—Z2241進行該試驗 試驗,測定壓延平分士 拉伸 J心!埯十仃方向之〇.2%耐力(YS)。 &lt;彎曲加工性&gt; A : W彎曲 根據JISH3130,以弯曲半徑達到板厚之2倍之模且實S 20 201122121 Evaluation of characteristics of each of the obtained test pieces The results are shown in Table 3 using the following conditions. &lt;Strength&gt; A was used as the test piece of JIS13B so that the stretching direction 妫 and the direction of the stretching were parallel. Further, the pressurizing mechanism is used to test the test piece according to JIS-Z2241, and the calendering tester is measured.埯10仃 direction. 2% stamina (YS). &lt;Bending workability&gt; A : W bending According to JISH3130, the bending radius is twice as large as the plate thickness and

施BadWay(f曲轴與壓延方向為同一方向k ㈣I 將不產生破裂之情形設為〇,將產生有破裂之情形設為X。 B : 180°彎曲 將試驗片抵壓於具有特定之圓角半徑(c〇rner ⑻ 之塊狀物之角上進行90。彎曲,將厚度為該圓角半徑之2倍 (2R)的板(圓角半徑R)夾於90。彎曲加工部之内側之後沿 板之端面摺疊180。。將18(Τ彎曲加工後之外側彎曲表面不 致產生裂痕之最小寶曲半徑(R)除以板厚⑴所得之值(R/t) 設為彎曲加工性之指標。 圓角半徑每次改變0.01 mm。 &lt;導電率&gt; 依據JIS Η 0505’藉由四端子法測定導電率(Ec: %IACS)。 &lt;平均結晶粒徑&gt; 平均結晶粒徑之測疋’係利用FIB將平行於壓延方向 21 201122121 之剖面切斷,藉此露出剖面後,利用SIM觀察剖面,並計 算每單位面積之結晶粒之數量,求出結晶粒之平均之近似 圓的直徑。具體而言,即作一 100 y mx 100 之框,並 l'i 計算存在於該框中之結晶粒之數量。·再者,對於橫穿框之 結晶粒,均算作為1 / 2個。框之面積1 0000 M m2除以結 晶粒之合計數量所得者,即為每1個結晶粒之面積之平均 值。由於具有該面積之正圓之直徑為近似圓的直徑,因此 將其設為平均結晶粒徑。 &lt;結晶粒徑縱橫比&gt; 藉由電解研磨使平行於壓延方向之剖面之組織出現 後,利用電子顯微鏡(Philips公司製焱XL3〇 SFEG)拍攝觀 察視野100 zzmxioo 。根據JISH〇5〇1,藉由切斷法 求出垂直於壓延方向之方向的平均結晶粒徑及平行於壓延 方向之方向的平均結晶粒徑,並算出縱橫比。 &lt;半高寬&gt; 針對各試驗片,使用理學電機公司製造之型號為如 肋麵2_之X射線繞射裝置,於以下之敎條件下取得 I延面之繞射強度曲線’並測定{22〇}結晶面之χ射線繞射 強度峰值之半高寬川2〇}。於相同之測定條件下,亦 純銅粉標準試樣求出半高寬心{22G}。於鋼粉標準試樣中, {220}面之峰值係顯示於20為74。附近。Apply BadWay (f crankshaft and rolling direction are in the same direction k (four) I. The case where no crack occurs is set to 〇, and the case where crack occurs is set to X. B: 180° bending the test piece against a specific fillet radius (The angle of the block of c〇rner (8) is 90. Bending, the plate having a thickness of 2 times (2R) of the fillet radius (corner radius R) is clamped to 90. The inner side of the bent portion is along the plate. The end face is folded 180. The value (R/t) obtained by dividing the minimum radius of curvature (R) of the outer curved surface of the bent surface after the bending process by the thickness (1) is set as an index of bending workability. The fillet radius is changed by 0.01 mm each time. &lt;Conductivity&gt; The conductivity (Ec: %IACS) is measured by a four-terminal method according to JIS Η 0505'. &lt;Average crystal grain size&gt; Measurement of average crystal grain size The section cut parallel to the rolling direction 21 201122121 by FIB, thereby exposing the cross section, observing the cross section by SIM, and calculating the number of crystal grains per unit area, and obtaining the average diameter of the approximate circle of the crystal grains. Specifically, it is a box of 100 y mx 100, and l'i is calculated. It is the number of crystal grains in the frame. · Again, for the crystal grains that traverse the frame, it is counted as 1/2. The area of the frame is 1 0000 M m2 divided by the total amount of crystal grains, which is The average value of the area of one crystal grain. Since the diameter of the perfect circle having this area is a diameter of an approximate circle, it is set as the average crystal grain size. &lt;crystal grain size aspect ratio&gt; Parallel by electrolytic grinding After the microstructure of the cross section in the rolling direction appeared, the observation field 100 zzmxioo was taken by an electron microscope (焱 焱 XL3 〇 SFEG manufactured by Philips). According to JISH 〇 5〇1, the average perpendicular to the direction of the rolling direction was obtained by the cutting method. The crystal grain size and the average crystal grain size parallel to the direction of the rolling direction were calculated, and the aspect ratio was calculated. <Half-height width> For each test piece, an X-ray winding such as a rib surface 2_ was used for each test piece. In the following apparatus, the diffraction intensity curve of the I-face is obtained under the following conditions and the half-height of the χ-ray diffraction intensity of the {22〇} crystal plane is measured. Under the same measurement conditions, the copper is also pure. Powder standard test FWHM determined heart} {22G. In standard steel powder sample, {220} plane of the peak lines are shown in the vicinity of 74. 20.

•乾材:Cu管 •管電壓:40 kV •管電流:40 mA• Dry material: Cu tube • Tube voltage: 40 kV • Tube current: 40 mA

S 22 201122121 •掃描速度:5 ° / min •取樣寬度:0.02° •測定範圍(2 0 ) : 60°〜80° &lt;彈簧彎曲彈性限度(Kb) &gt; 彈簧彎曲彈性限度(Kb)係依據JIS H 3130(合金編號 C 1 990),實施重複式彎曲試驗,並根據殘留永久應變之彎 曲力矩測定表面最大應力。 23 201122121S 22 201122121 • Scanning speed: 5 ° / min • Sampling width: 0.02 ° • Measuring range (2 0 ) : 60° to 80° &lt;Spring bending elastic limit (Kb) &gt; Spring bending elastic limit (Kb) is based on JIS H 3130 (alloy No. C 1 990), a repeated bending test was carried out, and the maximum surface stress was measured from the bending moment of the residual permanent strain. 23 201122121

β {220} / β 〇{220} 結晶i YS EC 彎曲加工性 Kb No 平均結晶 粒徑(“m) 縱橫比 (L/T) (MPa) %IAC c R/t = 2 180。 彎曲 (MPa) o W彎曲 1 3.1 7 1.8 880 16 〇 0.7 814 2 3.6 15 2.1 935 14 〇 1.5 878 3 3.9 15 2.4 965 16 〇 2.2 898 4 4.3 15 2.7 1000 13 〇 2.9 940 5 4.6 15 3.0 1030 13 〇 2.9 958 6 3.5 25 2.1 930 13 〇 1.5 860 7 3.2 16 2.1 880 16 〇 1.4 825 8 5.5 12 2.1 1050 10 〇 3.3 972 9 3.9 10 2.1 975 13 〇 1.6 902 10 4.0 10 2.1 980 13 〇 1.7 907 11 4.0 10 2.1 985 11 〇 1.8 911 12 4.1 10 2.1 990 11 〇 2.0 916 發 明 例 13 3.5 30 2.1 924 13 〇 1.8 864 14 3.0 15 1.3 800 14 〇 0.0 780 15 4.1 15 2.7 992 13 〇 2.9 942 16 4.6 15 2.7 977 16 〇 2.9 909 17 3.6 15 2.1 921 14 〇 1.5 320 18 4.3 15 2.7 973 .13 〇 2.9 487 19 4.3 15 2.7 1002 13 〇 2.9 952 20 4.3 15 2.7 1004 13 〇 2.9 954 21 4.3 15 2.7 994 13 〇 2.9 944 22 3.8 15 2.1 931 15 〇 1.8 858 23 4.5 15 2.7 1003 13 〇 3.0 943 24 3.8 15 2.1 909 14 〇 1.8 336 25 4.5 15 2.7 972 13 〇 3.0 527 26 4.3 15 2.7 1004 13 〇 2.9 924 1 1.2 12 2.6 845 13 〇 1.5 814 2 2.7 7 2.9 880 12 X 2.5 860 3 2.9 25 5.1 880 12 X 3.7 980 4 6.1 15 5.4 1050 13 X 6.1 370 比 5 4.6 40 5.3 980 .13 X 4.2 490 較 6 4.6 40 5.3 974 13 X 4.4 490 例 7 2.8 40 5.3 804 14 X 4.4 875 8 2.8 7 2.9 848 12 X 2.3 828 9 4.6 40 5.3 991 13 X 4.7 922 10 4.6 40 5.3 997 13 X 4.4 939 11 2.6 15 2.7 734 7 〇 0.0 702 s 24 201122121 &lt;考察&gt; 可知發明例No. 1〜25之強度與彎曲加工性平衡性良好 地提高。發明例13〜26係對製造步驟賦予變化之變形例。 於發明例1 3中將第2次固溶化處理溫度設定得較高,並獲 得上限之平均結晶粒徑。發明例丨4因最終冷軋之軋縮率較 低,故/3成為申請專利範圍之下限,且縱橫比亦降低但 由於處於本發明之規定之範圍内,因此強度與彎曲加工性 平衡性良好地提高。發明例丨5係與發明例N〇 4相比將時 效處理溫度設定為下限所得之結果。發明例丨6係與發明例 No.4相比將時效處理溫度設定為上限所得之結果。發明例 1 7及1 8係分別省略了發明例No.2及發明例No.4之步驟之 去應變退火之例’可知即便省略了去應變退火,万之值亦 處於本發明之規定之範圍内,且強度與彎曲加工性平衡性 良好地提高。相對於發明例1 7及1 8,於發明例1 9、20及 21中進行了去應變退火,藉此使強度及值上升。發明例 22〜25係省略了第1次固溶化處理之例,進而,No.24及 25係、未進行去應變退火之例,可知即便省略了第1次固溶 化處理’而且不進行去應變退火,yS之值亦處於本發明之 規定之範圍内,且強度與彎曲加工性平衡性良好地提高。 發明例26係以低溫短時間進行去應變退火之例。 另—方面,於比較例No· 1〜3中,由於在固溶化處理 後不進行時效處理而進行冷軋,因此半高寬較小,且強度 與f曲加工性之平衡性不及發明例。又,雖然於比較例N〇 4 25 201122121 〜5中在固溶化處理後進行了時效處理,但於比較例No.4 中冷札中之乾縮率變高,且半高寬變得過大,因此強度與 奇曲加工性之平衡性不及發明例。於'比較例No.5中,由於 固溶化處理中之加熱溫度過高,因此結晶粒徑增大。雖然 由於最終之冷軋之軋縮率較高,因此獲得了相對較高之強 度,但彎曲加工性較差。於比較例Νο.ό、7、9及10中, 由於固溶溫度過高,因此結晶粒徑超過上限,且彎曲加工 【生劣化°又’於比較例7及8中,由於在固溶化處理後不 進行時效處理而進行冷軋,因此半高寬較小,且強度與彎 曲加工性之平衡性較差。於比較例No. 11中,由於在高溫下 進行去應變退火’因此開始再結晶而導致差排密度降低且 点降低,由於亦開始再固溶,因此導致強度與導電率下降。 【圖式簡單說明】 無 【主要元件符號說明】 無β {220} / β 〇{220} Crystalline i YS EC Bending workability Kb No Average crystal grain size ("m) Aspect ratio (L/T) (MPa) %IAC c R/t = 2 180. Bending (MPa o W Bend 1 3.1 7 1.8 880 16 〇0.7 814 2 3.6 15 2.1 935 14 〇1.5 878 3 3.9 15 2.4 965 16 〇2.2 898 4 4.3 15 2.7 1000 13 〇2.9 940 5 4.6 15 3.0 1030 13 〇2.9 958 6 3.5 25 2.1 930 13 〇1.5 860 7 3.2 16 2.1 880 16 〇1.4 825 8 5.5 12 2.1 1050 10 〇3.3 972 9 3.9 10 2.1 975 13 〇1.6 902 10 4.0 10 2.1 980 13 〇1.7 907 11 4.0 10 2.1 985 11 〇1.8 911 12 4.1 10 2.1 990 11 〇2.0 916 Inventive Example 13 3.5 30 2.1 924 13 〇1.8 864 14 3.0 15 1.3 800 14 〇0.0 780 15 4.1 15 2.7 992 13 〇2.9 942 16 4.6 15 2.7 977 16 〇2.9 909 17 3.6 15 2.1 921 14 〇1.5 320 18 4.3 15 2.7 973 .13 〇2.9 487 19 4.3 15 2.7 1002 13 〇2.9 952 20 4.3 15 2.7 1004 13 〇2.9 954 21 4.3 15 2.7 994 13 〇2.9 944 22 3.8 15 2.1 931 15 〇1.8 858 23 4.5 15 2.7 1003 13 〇3.0 943 24 3.8 15 2.1 909 14 〇 1.8 336 25 4.5 15 2.7 972 13 〇 3.0 527 26 4.3 15 2.7 1004 13 〇 2.9 924 1 1.2 12 2.6 845 13 〇 1.5 814 2 2.7 7 2.9 880 12 X 2.5 860 3 2.9 25 5.1 880 12 X 3.7 980 4 6.1 15 5.4 1050 13 X 6.1 370 to 5 4.6 40 5.3 980 .13 X 4.2 490 compared to 6 4.6 40 5.3 974 13 X 4.4 490 Example 7 2.8 40 5.3 804 14 X 4.4 875 8 2.8 7 2.9 848 12 X 2.3 828 9 4.6 40 5.3 991 13 X 4.7 922 10 4.6 40 5.3 997 13 X 4.4 939 11 2.6 15 2.7 734 7 〇 0.0 702 s 24 201122121 &lt;Exploration&gt; It is understood that the strengths of the invention examples Nos. 1 to 25 and the bending workability are improved satisfactorily. . Inventive Examples 13 to 26 are modified examples in which the manufacturing steps are changed. In the inventive example 13, the second solution treatment temperature was set to be high, and the upper limit average crystal grain size was obtained. Inventive Example 4, since the final cold rolling has a low rolling reduction ratio, /3 becomes the lower limit of the patent application range, and the aspect ratio is also lowered, but since it is within the range of the present invention, the balance between strength and bending workability is good. Improve the ground. Inventive Example 5 is a result obtained by setting the aging treatment temperature to the lower limit as compared with the inventive example N〇 4. Inventive Example 6 is a result obtained by setting the aging treatment temperature to the upper limit as compared with the inventive example No. 4. Inventive Example 1 The examples of the strain relief annealing in the steps of the invention examples No. 2 and the invention example No. 4 are omitted, respectively. It is understood that even if the strain relief annealing is omitted, the value of 10,000 is within the scope of the present invention. Internally, the balance between strength and bending workability is improved satisfactorily. With respect to Inventive Examples 1 7 and 18, strain relief annealing was carried out in Inventive Examples 19, 20 and 21, whereby the strength and value were increased. In the examples 22 to 25, the first solid solution treatment was omitted, and the No. 24 and 25 systems were not subjected to the strain relief annealing. It is understood that the first solid solution treatment is omitted and the strain reduction is not performed. Annealing, the value of yS is also within the range defined by the present invention, and the balance between strength and bending workability is favorably improved. Inventive Example 26 is an example in which strain relief annealing is performed at a low temperature for a short period of time. On the other hand, in Comparative Examples No. 1 to 3, since cold rolling was performed without performing aging treatment after the solution treatment, the full width at half maximum was small, and the balance between strength and f-lubricity was inferior to the invention. Further, although the aging treatment was performed after the solution treatment in Comparative Example N〇4 25 201122121 to 5, the dry shrinkage ratio in the cold sample was higher in Comparative Example No. 4, and the full width at half maximum was too large. Therefore, the balance between the strength and the odd-shaped workability is inferior to the invention. In Comparative Example No. 5, since the heating temperature in the solution treatment was too high, the crystal grain size increased. Although the final cold rolling has a higher rolling reduction ratio, a relatively high strength is obtained, but the bending workability is poor. In the comparative examples Νο.ό, 7, 9, and 10, since the solid solution temperature is too high, the crystal grain size exceeds the upper limit, and the bending process [biodegradation ° is again] in the comparative examples 7 and 8, due to the solution treatment in the solution After the cold rolling is performed without aging treatment, the full width at half maximum is small, and the balance between strength and bending workability is poor. In Comparative Example No. 11, since the strain relief annealing was carried out at a high temperature, recrystallization was started to cause a decrease in the density of the poor discharge and a decrease in the point, and since the solid solution was started again, the strength and the electrical conductivity were lowered. [Simple diagram description] None [Main component symbol description] None

S 26S 26

Claims (1)

201122121 七、申請專利範圍: 1.-種銅合金’係含有2·0〜4 〇質量%之 份由銅及不可避免之雜皙 且剩餘部 避光之雜質構成之電子零件用铜 者,係含有2.0〜4.0質量%之?1,並合計含有。二質, %之選自為第3元素群之Mn、Fe、Mg、C〇、Ni.、fl Nb ' Mo ' Zr ' Si ' R » d r ' ^ ' 及P構成之群之l種或2種 剩餘部份由銅及不可避免之 ,且 金丨 買構成之電子零件用銅合 :自!延面之⑽}結晶面之χ射線繞射強度峰值 南寬/5(22()}與來自純銅標準粉末之{22_晶面之 繞射強度峰值的半高寬/3 〇{220}滿足下式: 、、、、 3.〇$ 点{220} / 召。{220} $ 6.0 ;且, 觀察平行於壓延方向之剖面之組織時,平均結晶粒徑 以近似圓的直徑表示為3〇 &quot; m以下。 2·如申請專利範圍第i項之銅合金,其中,觀察平行於 壓延方向之剖面之組織時,平行於壓延方向之方向的平均 結晶粒徑(L)與垂直於壓延方向之方向的平均結晶粒徑⑺ 之比(L/T)為1〜4。 3 ·如申請專利範圍第1或2項之銅合金,其彈簧彎曲彈 性限度(spnng bending elastic limit)為 600〜1000 MPa。 女申咕專利範圍第1或2項之銅合金,其彈簧彎曲彈 性限度為300〜600 MPa。 5.—種伸銅品,其係由申請專利範圍第丨至4項中任— 項之銅合金構成。 27 201122121 6.—種電子零件 一項之銅合金。 其具備申請專利範圍第丨至4項中任 7.—種連接器 項之銅合金。 其具備申請專利範圍第 至4項中任一 8 · — 種電子零件用銅合 金之製造方法201122121 VII. Scope of application for patents: 1.----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------- It contains 2.0 to 4.0% by mass of ?1 and is contained in total. Second, % is selected from the group consisting of Mn, Fe, Mg, C〇, Ni., fl Nb ' Mo ' Zr ' Si ' R » dr ' ^ ' and P group The remaining part is made of copper and inevitable, and the electronic parts made of gold are made of copper: from! The peak of the diffraction intensity of the radiant ray of the (10)} crystal plane is south width/5 (22()} and the full width at half maximum of the diffraction intensity peak of the {22_ crystal plane from the pure copper standard powder / 3 〇 {220} The following formula: 、,,, 3.〇$点{220} / 召.{220} $ 6.0 ; and, when observing the structure of the section parallel to the rolling direction, the average crystal grain size is expressed as approximately the diameter of the circle. &quot; m below. 2. The copper alloy of claim i, wherein the average crystal grain size (L) parallel to the direction of the rolling direction and the direction perpendicular to the rolling direction when observing the structure parallel to the section of the rolling direction The ratio (L/T) of the average crystal grain size (7) in the direction is 1 to 4. 3 · The copper alloy of the first or second aspect of the patent application has a spnng bending elastic limit of 600 to 1000. MPa. The copper alloy of the 1st or 2nd patent scope of the female patent application has a spring bending elastic limit of 300~600 MPa. 5.—A kind of copper extension product, which belongs to the fourth to fourth of the patent application scope. Copper alloy composition. 27 201122121 6. A copper alloy for electronic components. . Shu Li range of 4 to 7 .- copper alloys according to any connector comprising Paragraph range of the patent to any one of four 8.1 - electronic components using the method of producing a copper alloy 其包括如下步 對含有2_〇〜4.〇暂县。π. 量之Τι,並合計含有〇〜〇5 %之選自為第3元杳雔少貨量 '群之 Mn、Fe、Mg、Co、Ni、Cr、V、 ⑽⑽^^及^冓成之群之任意丨種或:種以上, 且剩餘部分由銅及不可避免之雜f構成之銅合金素材,進 行加熱至在730〜88ΓΤΡ知上 内之Τι固溶限變成與添加量相同之 溫度以上的固溶化處理; 於固溶化處理後,進行於材料溫度4〇〇〜5〇〇〇c下加熱 0.1〜20小時之時效處理;且 ) 時效處理後,進行軋縮率為〇〜4〇%之最終冷軋。 9.如申請專利範圍帛8項之電子零件用銅合金之製造 方法,其包括於最終冷軋後進行去應變退火,該去應變退 火係以材料溫度10〇£&gt;C以上、未達350eC加熱0.001小時以 上、40小時以下,以材料溫度35〇艽以上、未達55〇它加熱 0.0001小時以上、20小時以下,或以材料溫度55〇&lt;t以上、 700°C以下加熱0.0001小時以上、0.003小時以下。 10·如申請專利範圍第8項之電子零件用銅合金之製造 方法’其包括於最終冷軋後進行去應變退火,該去應變退 火係以材料溫度20(TC以上、未達400t加熱0.001〜20小 S 28 201122121 時。 八、圖式: 無 29It includes the following steps to the county containing 2_〇~4.〇. π. The amount of Τι, and the total amount of Mn, Fe, Mg, Co, Ni, Cr, V, (10) (10) ^ ^ and ^ 冓 〇 〇 〇 〇 选自 为 为 为 第 第 第 第Any of the group or the above-mentioned type, and the remaining part of the copper alloy material composed of copper and the unavoidable impurity f, is heated to a temperature of 730~88, and the solid solution limit becomes the same temperature as the addition amount. The above solution treatment; after the solution treatment, the aging treatment is carried out at a material temperature of 4 Torr to 5 〇〇〇c for 0.1 to 20 hours; and) after the aging treatment, the reduction ratio is 〇~4〇. The final cold rolling of %. 9. The method for producing a copper alloy for electronic parts according to the patent application 帛8, which comprises performing strain relief annealing after final cold rolling, wherein the strain relief annealing is at a material temperature of 10 Å or more and less than 350 eC. Heating for 0.001 hour or more and 40 hours or less, heating at a material temperature of 35 〇艽 or more, less than 55 〇, heating for 0.0001 hours or more, 20 hours or less, or heating at a material temperature of 55 〇 &lt; t or more and 700 ° C or less for 0.0001 hours or more. , 0.003 hours or less. 10. The method for producing a copper alloy for an electronic component according to claim 8 of the patent application, which comprises performing strain relief annealing after the final cold rolling, wherein the strain relief annealing is performed at a material temperature of 20 (TC or more, less than 400 t, heating 0.001) 20 small S 28 201122121 hours. Eight, schema: no 29
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TWI480618B (en) * 2012-10-24 2015-04-11 Jx Nippon Mining & Metals Corp Camera module and titanium copper foil
TWI692535B (en) * 2018-08-30 2020-05-01 日商Jx金屬股份有限公司 Titanium copper plate, pressed processed product and method for manufacturing pressed processed product

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