TW201104290A - Method for manufacturing antiglare film, antiglare film, and method for manufacturing mold - Google Patents

Abstract

Provided is a method for manufacturing an antiglare film, which comprises a step of forming a roughened surface on a transparent substrate in accordance with a gradation pattern, wherein the gradation pattern has a shortest side with a length not less than 15 mm, the spectrum of the gradation pattern shows a maximum value within a space frequency range of 0.025 to 0.125 μ m-1, the roughed surface is formed of repeating structures of roughed surface units, and the roughed surface units are formed of concave portions and convex portions corresponding to the gradation of the gradation pattern. Also provided are a method for manufacturing a metal mold that is excellent to be used in said method for manufacturing an antiglare film, and the gradation pattern used in said method for manufacturing an antiglare film.

Description

[Technical Field] The present invention relates to a method for producing an antiglare film and an antiglare film obtained by the method. Further, the present invention relates to a gradation pattern used in the method for producing the antiglare film, and a method for producing a mold which is applied to the method for producing the antiglare film. [Prior Art] An image display device such as a liquid crystal display, a plasma display panel, a Brown tube (Cathode tube: CRT) display, an organic electroluminescence (EL) display device, etc., when visibility is reflected on the display surface thereof, visibility ( Visibility) will be significantly lost. In the past, in order to prevent such light from being reflected, a video or display device using a television or a personal computer that emphasizes enamel, a camera or a digital camera that is used outside the house, and a mobile phone that displays light using reflected light are used in the video display device. The surface is provided to prevent the film layer from being reflected by external light. The film layer can be roughly classified into two types: those which are formed by a film which is subjected to non-reflection treatment, which utilizes interference caused by an optical multilayer film; and those which are composed of a film which is subjected to anti-glare treatment The anti-glare treatment causes scattering of incident light and blurring of the reflected image by forming fine concavities and convexities on the surface. The former non-reflective film has a high cost since it is necessary to form a multilayer film having a uniform optical film thickness. On the other hand, the latter anti-glare film is widely used for use in large-sized personal computers or monitors. Such an anti-glare film is conventionally formed on a substrate sheet by, for example, adjusting a film thickness of a resin solution in which fine particles 322079 4 201104290 has been dispersed on a substrate sheet, and then applying the fine particles to the surface of the coating film. The method of surface irregularities such as random is manufactured. However, the anti-glare film produced by using the resin solution in which the fine particles are dispersed is difficult to affect the surface unevenness according to the state in which the fine particles are dispersed or coated in the solution of the tree, and it is difficult to open the surface. When the desired surface unevenness is obtained, when the haze of the anti-glare film is set to a low value, there is a problem that a sufficient anti-mite effect cannot be obtained. Further, when such a conventional anti-glare film is disposed on the surface of the image display device, there is a problem that the entire display surface is whitened by the scattered light, and m is formed into a hazy color, that is, "whitening". Further, with the recent refinement of the image display device, the surface of the image display device interferes with the surface unevenness of the surface of the image, and as a result, the brightness distribution is generated and the display surface is liable to be easily seen. The problem of flickering. In order to eliminate the flicker, although it has been tried to set a refractive index difference between the binder resin and the fine particles dispersed therein to scatter light, when such an anti-glare film is disposed on the surface of the image display device, Due to light scattering in the interface between the microparticles and the binder resin, there is also a problem that the contrast is lowered. On the other hand, it has been attempted to exhibit anti-glare properties by forming fine irregularities on the surface of the transparent resin layer in the absence of fine particles. For example, Japanese Laid-Open Patent Publication No. 2002-189106 discloses an anti-glare film in which a cured layer is laminated on a retentive resin film, which has a three-dimensional one-point average roughness and a three-dimensional roughness. The hardened material layer of the luminescence resin layer having a fine surface convexity and convexity whose average distance between the adjacent convex portions on the reference surface respectively satisfies a predetermined value is 322079 5 201104290. The anti-glare film is produced by curing the sclerosing curable resin between the embossed (embGSS) mold and the transparent resin film, thereby producing H, even if it is opened by Japan. The anti-glare film disclosed in Japanese Patent No. 189106 has also achieved sufficient anti-glare effect, suppression of whitening, high contrast, and suppression of flicker. Further, as a method of producing a film in which fine irregularities are formed on the surface, a method of transferring a concave-convex shape of a light tube having a concave-convex surface to a film is known. For example, in Japanese Laid-Open Patent Publication No. Hei 6-34961, a cylindrical body is produced by using a metal or the like, and the surface is electronically engraved, etched, sandblasted, or the like. The method of forming the concave and convex. Further, a method of producing an embossing roll by a bead shot method is disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. 2004-90187, which is incorporated herein by reference. The step of forming a metal chain coating on the surface, the step of mirror-polishing the surface of the metal plating layer, and the step of performing a peening process as needed, thereby producing a embossing roll. However, in the state where the blasting treatment is performed on the surface of the embossing cylinder, the distribution of the uneven diameter is generated due to the particle size distribution of the blasting particles, and it is difficult to control the depth of the hole obtained by the blasting. There is still a problem in that the unevenness of the anti-glare function is excellent in reproducibility. In the above-mentioned Japanese Patent Publication No. 2002-189106, it is preferable to use a roll formed by chrome plating on the surface of iron, and to form a concave-convex surface by a sand blast method or a bead method. In addition, it is also described that the surface of the mold surface 6 322079 201104290 in which the unevenness is formed is used for the durability of the & 鬲, and it is preferable to use it after performing the clock chrome or the like. And to prevent corruption. On the other hand, in each of the examples of the Japanese Patent Laid-Open Publication No. 2004-45472, the surface of the iron core is chrome-plated, and the liquid soap sand treatment of #250 is performed, and then the chrome plating treatment is performed again. The surface is formed with a fine uneven shape. However, in the manufacturing method of such an embossing cylinder, since the squeezing or spraying is performed on the forging of high hardness, it is difficult to form irregularities, and it is difficult to precisely control the uneven shape formed. JP-A-2000-284106 discloses a step of performing an etching step and/or a lamination step of a film after sandblasting the substrate. Further, JP-A-2006-53371 discloses that electroless nickel plating is performed after polishing the substrate and performing sandblasting. Japanese Laid-Open Patent Publication No. 2007-187952 discloses that after the base material is subjected to copper plating or nickel plating, after being subjected to sandblasting by grinding, chrome plating is performed to produce an embossed plate. Further, Japanese Laid-Open Patent Publication No. 2007-237541 discloses that after performing ore blasting, after performing sandblasting, after performing an etching step or a copper plating step, chrome plating is performed to prepare an embossed plate. Since these methods using sand blasting are difficult to form in a state in which the surface unevenness is hardly controlled, a large uneven shape having a period of 50//m or more in the surface uneven shape is also produced. As a result, these large uneven shapes interfere with the pixels of the image display device, and a luminance distribution is generated, which tends to cause "flickering" which makes the display surface difficult to see. [Abstract] [s]. 7 322079 201104290 An object of the present invention is to provide a method for producing an anti-glare film, and an anti-glare film obtained according to the manufacturing method, wherein the anti-glare film is low in haze, It exhibits excellent anti-glare performance when used in an image display device, and prevents the visibility from being lowered due to whitening, and at the same time, when used in a high-definition image display device, flicker does not occur, and the performance is high. Contrast. Further, another object of the present invention is to provide a gradation pattern used in the method for producing an anti-glare film and a method for producing a mold which is used in the method for producing the anti-glare film. The present invention relates to a method for producing an anti-glare film comprising the steps of forming a concave-convex surface on a transparent substrate according to a tone pattern. The color gradation pattern has a minimum side length of 15ππη or more, and the energy spectrum of the gradation pattern shows a maximum value in a range of a spatial frequency of 0.025 to 0.125//πΓ1. In the method for producing an anti-glare film of the present invention, the uneven surface formed on the transparent substrate is composed of a repeating structure of a concave-convex surface unit (a structure in which a plurality of concave-convex surface units are repeatedly arranged in parallel), and the concave-convex surface unit is It is composed of a concave portion and a convex portion corresponding to the color gradation of the gradation pattern. In the method for producing an anti-glare film of the present invention, the tone pattern can be suitably used for image data made by a computer. As the image data of the gradation pattern, it is better to binarize into white and black. When the gradation pattern is binarized into white and black image data, the concave and convex surface unit is composed of a concave portion and a convex portion corresponding to the gradation of the binarized image data, and specifically, the concave portion constituting the concave surface unit Or either of the convex portions corresponds to the white area of the binarized image data. 322079 201104290 The step of forming the concave-convex surface on the transparent substrate is preferably performed by a wrap-around step of the package: a four-contrast device is produced according to the above-mentioned color gradation pattern, and the concave-convex surface of the mold is transferred to a transparent Less defects on the substrate. Further, the present invention provides a method for producing a mold which is suitable for use in the method for producing an anti-glare film of the present invention. The method for producing a mold according to the present invention includes the steps of: performing a first bonding step of plating copper or nickel plating on the surface of the substrate for a mold; and grinding the surface subjected to plating by the first plating step. a photosensitive resin film forming step of forming a photosensitive resin film on the polished surface; an exposure step of exposing the color tone pattern on the photosensitive resin film; and imaging the exposed color tone pattern on the photosensitive resin film a gradation pattern development step; a first etching step of performing etching treatment using a developed photosensitive resin film as a mask, and forming irregularities on the polished plating surface; and sensitizing the photosensitive resin film a resin film peeling step; and a second plating step of performing chromium plating on the formed uneven surface. The method for producing a mold according to the present invention is to include a second etching step of passivating the uneven shape of the convex surface formed by the second step in the etching process between the photosensitive resin film and the second coating step by etching. The second Wei Bu shot of the secret of the secret chrome of the Qing dynasty is preferably the concave and convex surface of the mold transferred on the transparent substrate. That is, the step of not providing the polishing surface after the second plating step is applied, and the chrome-like uneven surface is directly used as a mold for transferring the mold on the transparent substrate. The chrome layer formed by the second plating is the thickness of the chrome layer having a thickness of 322079 9 201104290 1 to 10" m. Further, the antiglare film obtained by the method for producing an antiglare film of the present invention and the method for producing the antiglare film of the present invention have a minimum length of 15 mm or more and an energy spectrum. The spatial frequency is 0. 025 to 0. 125# The color scale pattern showing the maximum value in the range of πΓ1. The gradation pattern of the present invention is preferably image data which is binarized into white and black. According to the present invention, an anti-glare film which is low in haze is excellent in reproducibility, exhibits excellent anti-glare property when used in an image display device, and can prevent visibility from being lowered due to whitening At the same time, when used in a high-definition image display device, flicker does not occur and high contrast is exhibited. [Embodiment] (Description of a preferred embodiment) <Method for producing an anti-glare film> Hereinafter, preferred embodiments of the present invention will be described in detail. The method for producing an anti-glare film of the present invention is characterized by comprising the step of forming a fine uneven surface (fine uneven surface) on a transparent substrate in accordance with a specific tone pattern. Here, the "gradation pattern" is typically composed of a gradation of two or three gradations by a computer for use in forming a fine uneven surface of the anti-glare film. The meaning of the image data, but may also include data (array, etc.) that can be converted into the image data. For the information that can be converted into image data, for example, only the coordinates of the coordinates and the color scale of each pixel can be listed. In order to correspond to the gradation of such a gradation pattern, the concave-convex surface unit corresponding to the gradation pattern can be formed on the transparent substrate by forming the concave portion and the convex portion on the transparent substrate of 10 322079 201104290. In the method for producing an anti-glare film of the present invention, the fine uneven surface formed on the transparent substrate can be constituted by a repeating structure in which the uneven surface unit formed by densely arranging two or more uneven surface units is densely arranged. (Color gradation pattern) In the present invention, the gradation pattern has a length of 15 mm or more using the smallest side, and the energy spectrum displays a pattern of maximum values in the range of the space frequency 〇25 to 〇_丨. By providing a fine uneven surface on the transparent substrate according to the gradation pattern, an anti-glare film which exhibits excellent anti-glare properties when used in an image display device with low turbidity, and It can prevent the visibility from being lowered due to whitening, and at the same time, when used in the image display device of the South Fine, it does not produce flash and can exhibit high contrast. t, that is, by using the energy spectrum to display the maximum-order gradation pattern in the range of the spatial frequency of 0.025 to 0.125/iml, it is possible to accurately form the fine concave-convex surface having an unspecified spatial frequency distribution, more specifically A fine uneven surface including a surface impurity having a period of 1Q to the palpitations as a main component can be formed with high precision, whereby a sufficient anti-glare effect (preventing an effect such as a reflection effect) can be exhibited, and at the same time, flicker can be sufficiently suppressed . When the fine uneven surface of the anti-glare film contains a long-period component of more than 5 Å, if it is disposed on the surface of the high-definition image display device, it is easy to produce flicker = the direction of 'again' contains only less than 1 G/Zm. The fine concave surface of the short-period component tends to prevent the anti-glare effect of the anti-glare effect from being insufficient.

ES 322079 11 201104290 In addition, in the anti-glare film which is formed by repeating the uneven surface unit corresponding to a certain pattern and forming the fine uneven surface, the interference color is observed due to interference with external light (interfere c〇1〇r Or, in the case of being disposed on the surface of the image display device, there is a case where moire (m〇ir6) is generated. However, according to the present invention, the length of the minimum side of the color pattern is set to 15 or more. In this case, an anti-glare film which is excellent not only in preventing the ability to be reflected but also effectively prevents the generation of interference color and moiré can be obtained. Moreover, although the length of the smallest-edge of the gradation pattern is less than 15 coffee, there is a case where interference color and moiré are not generated, but if the minimum value of the gradation diagram $ is less than 1 ,, then there is The tendency to generate interference color and moiré is strong, and in order to surely prevent the occurrence of interference color and moiré, the minimum-side length of the tone pattern is preferably set to 15 mm or more. Further, when the uneven surface unit corresponding to a certain pattern is repeatedly arranged to form a fine uneven surface, when the surface of the anti-glare film is observed by irradiating external light, a repeating pattern is observed (for example, a square according to a square pattern) When the uneven surface unit is densely and repeatedly arranged to form a fine uneven surface, a lattice line of the boundary line of each uneven surface unit is formed, but the length of the smallest side is 15 mm or more and the energy spectrum is at a spatial frequency. The 025 to 0.125" mi range shows a maximum value of the gradation pattern, and an anti-glare film that does not have such a repeating pattern and excellent visibility is obtained. Here, the "length of the smallest side" of the gradation pattern means the length of the shortest side among the sides which form the outer shape of the gradation pattern. The outer shape of the gradation pattern is not particularly limited as long as the length of the smallest side is 15 mm or more. For example, a polygon having a side of 15 mm or more, a polygon having a square angle of 12 322079, 201104290, or a hexagon may be cited. The gradation pattern is preferably such that when a plurality of patterns are adjacently arranged side by side on a plane, an unpatterned area is not formed, and a shape in which the outer shape is densely filled is preferable. Thereby, when the fine uneven surface is formed on the transparent substrate in accordance with the gradation pattern, it is possible to prevent the occurrence of the region where the unevenness is not formed. From such a viewpoint, it is preferable to form a polygonal shape with respect to the shape of the gradation pattern as compared with a curve having a circular shape or the like. When the shape of the gradation pattern is polygonal, such as a triangle, a quadrangle, or a hexagon, the length of each side may be the same or a different length. The length of the smallest side of the gradation pattern is preferably 16 mm or more, more preferably 20 mm or more. Further, the upper limit of the length of the smallest side of the gradation pattern is not particularly limited. However, when the image data is produced by the computer, it is preferably 300 mm or less from the viewpoint of suppressing an increase in the calculation load. Next, the energy spectrum of the gradation pattern will be described. The gradation pattern used in the present invention is as described above, and the maximum value is displayed in the range of the spatial frequency of 0. 025 to 0.125 # πΓ1. By forming the fine uneven surface based on the gradation pattern showing such spatial frequency characteristics, it is possible to obtain an anti-glare film which is excellent in anti-glare property and at the same time suppresses the excellent visibility of flicker, whitening, interference color, embossing, and repeated patterns. When the color gradation pattern is image data, the energy spectrum of the gradation pattern is converted into a gray scale of 256 gradation, and the gradation of the gradation pattern data is a quadratic function g ( x, y) represents, and the obtained quadratic function g(x, y) is subjected to Fourier transform to calculate the quadratic function G(fx, fy), and then the obtained quadratic function G (fx) , fy) is obtained by squared. Here, X and y represent the orthogonal coordinates in the color gradation pattern @ 13 322079 201104290 2 (for example, the χ direction is the horizontal direction of the gradation pattern of the image data, and the y direction is the longitudinal direction of the gradation pattern of the image).匕 and heart points and another J represents the spatial frequency in the X direction and the spatial frequency in the y direction. In fact, the gradation of each element is obtained as a set of discrete data points, so that the second-order function of the gradation of the image data is a discrete function (discrete functi〇n). Therefore, the discrete function G(fx, is calculated by the discrete Fourier transform defined by the following equation, and the energy spectrum ρ (Lfy) is obtained by squaring the obtained discrete function (; (fx, fy) Here, in the formula (1); Γ is the pi, i is the imaginary unit. Further, Μ is the prime number in the X direction, n is the prime number in the y direction, and 1 is -M/2 An integer of M/2 or less, m is an integer of /2/2 or more and N/2 or less. Further, the spatial frequency intervals in the χ direction and the y direction are respectively expressed by the following equations (2) and (3). Definitions The 分解 and Ay in equations (2) and (3) are the horizontal decomposition energies in the x-axis direction and the y-axis direction, respectively. Meanwhile, when the color gradation pattern is image data, Δχ and Ay are respectively 1 pixel. The length in the X-axis direction and the length in the y-axis direction are equal. That is, when the color gradation pattern is used as the image data of 6400 dpi, Δ x=Ay=4em, when the color gradation pattern is used as the image data of 12800 dpi, '△ x=Ay = 2em. = +km6yi^y)] (1) ΜΔχ

N (2) (3) will be used as the gradation pattern of the image data, as will be described later, as a random 14 322079 201104290 configuration of most side positions, Μ will be its material energy spectrum G2 (ix, W is will, When the vertical and the height are respectively expressed as the 3rd dimension graph of the ^== spectrum G (χ, fy), it will become the space where the origin of (4) ΓΓ = 当作 is taken as the center, and the space of the maximum value of y is f. The frequency is the spatial frequency obtained by the energy spectrum heart:; = 〇 is the spatial frequency fy, and the vertical axis is the x spectrum of the energy spectrum. In this quadratic graph, since the spatial frequency fy of the horizontal axis is symmetrical even when fy = G, the absolute value of the = rate fy can be set. At the same time, the invention towel, "the energy spectrum shows the maximum value in the range of the spatial frequency 〇· 〇25 to 〇•咖" means the energy in the sectional view showing the energy spectrum ^2 (^, fx=G) The spectrum has a plurality of maximum values, and more than one of the polar values includes a case where the spatial frequency is 0 025 to 〇125. The first figure is suitable for the method for manufacturing the anti-glare film of the present invention. One of the examples of the gradation pattern (specifically, the gradation pattern used in the production of the mold of the embodiment 丨 and the third embodiment) is enlarged, and the specific pattern shape of the gradation pattern in the present invention is as long as The length of the smallest side is 15mm or more, and the energy spectrum is displayed in the range of 0 025 to 〇. 125#. The maximum value is not particularly limited. For example, as shown in Fig. 1, it can be a plurality of dots ( The white area in Fig. 1 is a pattern randomly arranged. The gradation pattern shown in Fig. 1 is two-level image data (image resolution: 12800 dpi) binarized into white and black, and Put the dot diameter (the straight point of the dot) as one of the dots Randomly configure the majority

L 322079 15 201104290 The winners. Again, the gradation map is at spatial frequency. ·. : Case: The side is a square of 2〇_ which can display the maximum value from m. In this way, when a plurality of round ί dots are randomly arranged to form a gradation pattern, η is randomly arranged by η#, and a plurality of dots are randomly arranged, and a plurality of 0 points (four) and more _ dots are randomly arranged. Ground configuration. The average dot diameter of the dot (the average of the full dot in the pattern and the mean diameter of the dot in the pattern) is not particularly limited, and is preferably 6 to 3 () _. When the average dot count is up to or exceeds 30"m, there is a case where the energy spectrum 1 does not show a maximum value within the range of the spatial frequency G 〇25. When the color gradation pattern is image data, the means for randomly drawing a plurality of dots may be, for example, an image of a phase width wx and a height WY, by taking a pseudo I sequence of values from 0 to 1 (pseud) 〇 〇 〇 number number number number number number number number number number R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R Here, both a and b are natural numbers. For the method of generating the pseudo-random sequence, you can use Linear congruential generators, Xorshift, or Mersenne Twister, as long as it has sufficient number of dots to be sealed. The long period of the cycle, you can use any pseudo-random number generation method. Alternatively, it is not limited to the pseudo-random number, and a hard body which generates random numbers due to thermal noise or the like can be used as pattern data which is randomly arranged by dots. Further, the pattern of the gradation pattern used in the present invention may be a pattern material obtained by performing a specific operation with respect to the pattern data formed by randomly arranging a plurality of dots. For such an operation, for example, (i) an operation using a high-pass filter of 16 322079 201104290, which removes a low spatial frequency component composed of a spatial frequency below a specific lower limit value B; And (ii) an operation using a band-pass filter that removes a low spatial frequency component composed of a spatial frequency lower than a specific lower limit value B and a predetermined upper limit value T A high spatial frequency component composed of a spatial frequency, and a spatial frequency component composed of a spatial frequency of a specific range from the lower limit value B to the upper limit value τ is extracted. It is known that the gradation pattern obtained by using the above (i) two-way chopper is a low spatial frequency component removed from a spatial frequency component which can be contained in a pattern in which a plurality of dots are randomly arranged. Therefore, it is more difficult to form a fine uneven surface having a period of more than 5 〇em, and it becomes more effective to prevent flashing. The lower limit value β can be, for example, in the range of 〇·〇2 to 〇·. Further, according to the gradation pattern obtained by using the above (ii) band pass filter, the low spatial frequency component is removed from the spatial frequency component which can be contained in the pattern in which a plurality of dots are randomly arranged. Since the high spatial frequency component is formed, it is more difficult to form a fine uneven surface having a period of more than 50 mm, which makes it possible to more effectively prevent flicker, and at the same time, improve the process reproducibility when forming a concave-convex surface on a transparent substrate according to the gradation pattern. The lower limit value B is, for example, above 0·01//ιη, and is preferably 0.02/zra or more. The upper limit value τ' is preferably 1 / (Dx2) / /nf1 or less. Here, d(#m) is the decomposition energy of the processing apparatus used when forming the uneven surface on the transparent substrate (for example, when the resist is exposed by a laser scanning device and the uneven surface is formed, the point of the laser is Spot diameter). 322079 17 201104290 When a large number of dots are randomly arranged to form a tone pattern, or when a high-pass filter or a band-pass filter is used, by appropriately controlling the dot diameter, the dot density, and the high pass The lower limit value of the filter B, the lower limit value B' of the band pass filter, and the upper limit value Τ', etc., and the energy spectrum is displayed in the range of 0. 025 to 0. 125/zm_1. Level pattern. The dot density (ratio of the area where the dot is drawn relative to the entire area of the tone pattern) is preferably 20 to 80%, more preferably 40 to 70%. The step of forming the uneven surface on the transparent substrate includes the use of a resist work of a laser drawing device, etc., and the color gradation pattern used in the method for producing the anti-glare film of the present invention is It is better to binarize the image data of white and black. This is because, in the case of including a work using a resist such as a laser scanning device, etc., it is usually formed by, for example, a binary value of whether or not the laser is irradiated. Regarding image data of three or more gradations, it is possible to easily convert into binarized image data by setting an appropriate threshold value in consideration of a ratio of an exposure region in a resist work or the like. (Formation of Concavo-Convex Surface According to Hue Pattern) In the method for producing an anti-glare film of the present invention, a fine uneven surface is formed on a transparent substrate in accordance with the above-described gradation pattern. The fine concavo-convex surface formed is composed of a concave portion and a convex portion corresponding to the gradation of the gradation pattern. When the tone pattern is binarized into white and black image data, either of the concave or convex portions constituting the fine uneven surface corresponds to the white region of the binarized image data. Further, in the present invention, the fine uneven surface formed on the transparent substrate may be a fine uneven surface composed of a repeating structure which is composed of a concave portion and a convex portion corresponding to the gradation of one gradation pattern. The concave and convex table 18 322079 201104290 The surface units are adjacent and densely repeated side by side. The fine uneven surface formed by the repeating structure can be formed by using pattern data which is formed by repeating the arrangement of two or more color gradation patterns as image data, and can also be formed by corresponding one color gradation. The fine uneven surface (concave surface unit) of the pattern is formed by repeating and arranging one by one. Further, a plurality of the masks may be repeatedly arranged side by side by creating a mask corresponding to one gradation pattern, and formed by performing full exposure through a plurality of masks arranged side by side. Specific examples of the method of forming the fine uneven surface on the transparent substrate based on the above-described gradation pattern include a printing method, a pattern exposure method, a waste pattern method, and the like. In the printing method, the above-described gradation pattern is printed on a transparent substrate by, for example, flexographic printing using a photocurable resin or a thermosetting resin, screen printing, inkjet printing, or the like. The anti-glare film of the present invention can be produced by drying or hardening it by active light or heating. For example, in flexographic printing, a wood plate belonging to a relief according to the above pattern is produced, and a photocurable resin is applied to the convex portion of the flexographic plate, and the applied photocurable resin is transferred onto the transparent support by the active light. It is hardened, and fine unevenness according to the above pattern can be formed on the transparent support. In the case of screen printing, a screen which is a stencil according to the above pattern is produced, and after the pattern is printed on a transparent support using the screen and the photocurable resin, the photocurable resin is cured by active light. Fine irregularities can be formed on the transparent support. In the case of inkjet printing, the above pattern is directly printed on a transparent support using a photocurable resin, and then the photocurable resin is cured by active light to form a sign on the transparent support [322079 19 201104290 Πί二The fine unevenness formed by the "printing method" is inclined because the resin layer is not formed on the transparent support. Therefore, it is preferable to apply photohardening to the fine unevenness formed by the printing method: 吏The angle of inclination is smoothed and is fully formed on the transparent support. In the ® (four) light method, 'the light hard-stitched resin is coated on the transparent „ borrowing: direct scanning exposure using the above-mentioned color pattern laser, or by separating The mask having the above (10) pattern is subjected to full exposure, and pattern exposure is performed, and after the development is required, the antiglare film of the present invention can be produced by curing with active light or twisting. In the direct tracing exposure by laser, after applying the photocurable resin on the transparent support body, the pattern is directly exposed by the laser light to expose the portion exposed by the development. Or, it dissolves, and it is fully hardened by irradiating the residual photocurability (4) active secret money, * The fine unevenness according to the above-mentioned pattern can be formed on the transparent support. Since the fine concavities and convexities formed by the direct scanning exposure by the laser are sharp, it is preferable to apply the photocurable resin to the fine concavities and convexities formed by the direct intercalation exposure by laser. To smooth the tilt angle. In the total exposure by the mask, a mask having the above-described pattern is formed, and after applying a photocurable resin to the transparent support, the photocurable resin is exposed through the mask, and in the developing step The exposed portion is left or dissolved, and the residual photocurable resin is irradiated with the active light to completely cure it, and fine irregularities according to the above pattern can be formed on the transparent support. In the full exposure through the mask, the tilt angle of the fine concavities and convexities can be controlled by appropriately controlling the proximity gap ($322079 20 201104290) by making the mask into a gradation mask. Controlling the degree of exposure. In the embossing method, a mold having a fine uneven surface is produced according to the above-described gradation pattern, and the uneven surface of the manufactured mold is transferred onto a transparent substrate. Secondly, the transfer is performed. The transparent substrate of the uneven surface is peeled off from the mold, whereby the anti-glare meal of the present invention can be produced. Among them, the anti-glare film of the present invention is borrowed from the viewpoint of forming a fine uneven surface with good precision and good reproducibility. The embossing method is preferably exemplified by a uv embossing method using a photocurable resin or a thermal embossing method using a thermoplastic resin, wherein, from the viewpoint of productivity, UV embossing is used. The UV embossing method is to form a photocurable resin layer on the surface of a transparent substrate, and to laminate the photocurable resin to the uneven surface of the mold to cure the surface of the mold. A method of printing on a photocurable resin layer. Specifically, an ultraviolet curable resin is applied onto a transparent substrate, and the applied ultraviolet curable resin is adhered to the uneven surface of the mold, and is transparent. When the material side is irradiated with ultraviolet rays, the ultraviolet curable resin is cured, and then the transparent substrate on which the cured ultraviolet curable resin layer is formed is peeled off from the mold. Thus, the uneven shape of the mold is transferred to the ultraviolet curable resin. In the uv embossing method, the transparent substrate is substantially an optically transparent film, and examples thereof include a triacetate cellulose film, a polyethylene terephthalate film, and a polymethyl acrylate. A solvent film such as a film, a polycarbonate film, or a norbornene compound as a monomeric amorphous cyclic olefinic resin, or a resin film such as an extruded film. 21 322079 201104290 When using the uv embossing method The type of the ultraviolet curable resin is not particularly limited, and a commercially available product can be used. Further, an ultraviolet curable resin can be used in combination with an appropriately selected photoinitiator. A resin that can be cured even with visible light longer than the ultraviolet wavelength. The ultraviolet curable resin can be suitably used with a polyfunctional acrylate such as trimethylolpropane triacrylate or pentaerythritol tetraacrylate. One or two or more kinds of resin compositions of a photopolymerization initiator such as Irgacure 907 (manufactured by Ciba Specialty Chemicals Co., Ltd.), Irgacure 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.), or Lucirin TP0 (manufactured by BASF Corporation). The heat embossing method is a method in which a transparent substrate composed of a thermoplastic resin is pressed into a mold in a heated state to transfer a surface uneven shape of the mold to a transparent substrate. The transparent substrate used in the heat embossing method may be any one as long as it is substantially transparent, and for example, polydecyl methacrylate, polycarbonate, polyethylene terephthalate, and triethyl acrylate can be used. A solvent-cast film or a squeeze film of a thermoplastic resin such as a mercapto cellulose or a norbornene-based compound as a monomeric amorphous ring-return furnace. These transparent resin films can also be suitably used as a transparent substrate for coating an ultraviolet curable resin in the UV embossing method described above. <Production Method of Mold for Producing Antiglare Film> Hereinafter, a method of manufacturing a mold which is applicable to the method for producing an antiglare film of the present invention will be described. Fig. 2 is a view showing a preferred example of the first half of the method for producing a mold of the present invention. In Fig. 2, the cross section of the mold of each step is shown in a schematic manner. The mold 2322079 22 201104290 of the present invention basically comprises the following steps: [1] first plating step, [2] grinding step, [3] photosensitive resin film forming step, [4] exposure step, [ 5] development step, [6] first etching step, [7] photosensitive resin film peeling step, and '[8] second plating step. Hereinafter, each step of the method for manufacturing a mold according to the present invention will be described in detail with reference to Fig. 2 . [1] First plating step The method for producing a mold according to the present invention firstly performs copper plating or mineral nickel on the surface of a substrate used for a mold. As described above, by performing copper plating or nickel plating on the surface of the substrate for a mold, the adhesion or gloss of chrome plating in the subsequent second plating step can be improved. In other words, when chrome plating is applied to the surface of iron or the like, or embossing is performed by sandblasting or beading on the surface of the bonding layer, the surface is easily roughened, and fine cracks are generated, making it difficult to control the surface of the mold. Concave shape. On the other hand, first, by performing copper plating or nickel plating on the surface of the substrate in advance, such a disadvantage can be eliminated. Since copper plating or nickel plating is highly coating and has a high smoothing effect, it is filled with minute irregularities or cavities of the substrate for a mold to form a flat and shiny surface. By the characteristics of such copper plating or nickel plating, even if chrome plating in the second plating step described later is performed, the roughness of the chrome-plated surface which is considered to be caused by minute irregularities or voids in the substrate can be eliminated, and Due to the high coating quality of copper plating or nickel plating, the occurrence of fine cracks is reduced.

The copper or nickel used in the first plating step may be a pure metal, or may be an alloy mainly composed of copper or an alloy mainly composed of nickel. Therefore, in the present specification, the term "copper" "Including copper and copper alloys I"

L 23 322079 201104290 Two solutions of nickel (four) for the package: nickel and nylon alloy meaning. Copper plating and plating can be carried out separately = electrolytic recording, or (4) deplating, but usually electrolytic plating 2 = steel or mine record, when the clock coating is too thin 'because the substrate surface cannot be excluded The influence of the thickness is preferably that the upper limit of the thickness of the plating layer is not a critical value, but the upper limit of the surface is preferably about 5 GMin. Thickness of the coating layer In the method for producing a mold of the present invention, the metal material suitable for use in the formation of the substrate for a mold may be, for example, Ming, iron or the like from the viewpoint of cost. In terms of handling, it is preferable to use a lightweight one. Here, the so-called α-face is also split into a pure metal, and the material may be an alloy mainly composed of sho or iron. Further, the shape of the substrate for the mold may be in the field of the field, for example, in addition to the flat shape, it may be cylindrical or cylindrical (four). When the base material of the Wei cylinder is used as a spacer, there is an advantage that the antiglare film can be produced in a continuous roll shape. [2] After the grinding step, the grinding step of the nozzle is performed by polishing the surface of the substrate subjected to copper plating or plating in the first plating step. Preferably, the surface of the substrate is ground to an approximately specular state via this step. In this case, in order to achieve the desired precision, the metal plate or the metal roll as the base material is subjected to machining such as cutting or grinding, so that the machined hole remains on the surface of the substrate, even if copper plating is performed. In the state of _ or _, these processed holes are also left, and in the state of mineralization, the surface is not completely smooth. In other words, 322079 24 201104290, even if the steps described later are performed on the surface of the processed hole or the like of the residual (four), the unevenness of the boring hole or the like may be deeper than the step formed after the execution of each step, and X is added. The influence of holes, etc. may remain. When using these molds to make an anti-glare film, the optical button may be unpredictable. Fig. 2(4) schematically shows that the flat substrate 7 for sheet metal is plated with copper or nickel in the first plating step (the copper plating or nickel plating layer formed in this step is not used). ) 'There is a state in which the surface 8 is mirror-polished by the grinding step (4). Regarding the method of polishing the surface of the substrate subjected to copper plating or _, there is no specific hiding, and (4) the mechanical polishing method, the electrolytic polishing method, and the chemical polishing method. The mechanical grinding method is exemplified by super finishing method (super finishing method), lapping method, fluid grinding method, polishing wheel (bu (1) abrasive material, researching money, "roughness is the center line average of mosquitoes _ 0601" _ degree Ra is 〇 · one or less is better, preferably 0.05_ or less. The average roughness of the center line after grinding is greater than 0·1/zin 'for the concave and convex shape of the final mold surface, the surface after grinding is reduced The influence of the degree may be left. In addition, the lower limit of the average coarseness Ra of the center line is not particularly limited, and it is naturally limited by the viewpoint of the curing time or the processing cost, so there is no need to specify it. [3] Photosensitive Tree Wax Film Forming Step In the subsequent photosensitive resin film forming step, the ground surface 8 of the substrate 7 for mold which is mirror-polished by the above-described polishing step is dissolved in the solvent. The solution of the photosensitive resin is applied, and the photosensitive resin film is formed by heating and drying. Fig. 2 (Β) is a schematic dance 322079 25 201104290 shows the surface of the substrate 7 for polishing Forming light on 8 In the state of the resin film 9, a photosensitive resin which is conventionally known can be used as the photosensitive resin, and a photosensitive resin having a hardening property can be used, for example, a propylene group or a methyl propyl group can be used in the molecule. a propyl acetoacetate monomer or prepolymer, a mixture of a bisazide compound and a diene rubber, a polyvinyl cinnamate compound, etc. Further, there is a photosensitive portion which is dissolved by development and only remains unsensitized For the positive photosensitive resin having a partial nature, for example, a phenol resin or a novolac resin may be used. Further, if necessary, a photosensitive resin may be blended: a sensitizer or a display. Various additives such as an accelerator, an adhesion modifier, and a coating improver. When these photosensitive resins are applied to the polished surface 8 of the substrate 7 for a mold, it is diluted in order to form a good coating film. It is preferred to apply it after a suitable solvent, and a solvent, a solvent, a propylene glycol-based solvent, an ester-based solvent, an alcohol-based solvent, a ketone-based solvent, a highly polar solvent, or the like can be used. For the method of the photosensitive resin solution, a meniscus coat, a fountain coat, a dip coat, a spin coating, a roll coating, a wire bar coating, an air knife coating, a doctor blade can be used. A conventional method such as coating, curtain coating, etc. The thickness of the coating film is preferably in the range of 1 to 6/zm after drying. [4] Exposure step Subsequent exposure step is to apply the above-described color gradation pattern to the above-mentioned photosensitivity. The photosensitive resin film 9 formed in the resin film forming step is exposed. The light source ' used in the exposure step 322079 26 201104290 may be appropriately selected in accordance with the feeling or sensitivity of the applied photosensitive resin, and for example, a high pressure mercury lamp may be used. Transport line (wavelength: 436 mn), h line of high-pressure mercury lamp (wavelength: 4〇5nm), i-line of high-pressure mercury lamp (wavelength: 365nm), semiconductor laser (wavelength: 83〇nm, 532mn, 488nm, 405nm, etc.) ), YAG laser (wavelength: 1〇64nm), Krf excimer iaser (wavelength: 248nm), ArF excimer laser (wavelength: 193nm), F2 excimer laser (wavelength: 157nm), etc. . In the method for producing a mold of the present invention, in order to form the surface uneven shape with high precision, it is preferable to expose the color gradation pattern to the photosensitive resin film in a state of precise control in the exposure step. In the method for producing a mold according to the present invention, in order to accurately expose the gradation pattern on the photosensitive resin film, the laser is controlled from a computer based on a gradation pattern of image data made by a computer. It is preferable to trace the pattern on the photosensitive resin film by the laser light emitted from the hair. For such a laser well-being, a laser scanning device for printing plate production can be used. Examples of such a laser scanning device include, for example, Laser Stream FX (manufactured by Think Laboratory). Fig. 2(c) schematically shows a state in which the pattern is exposed on the photosensitive resin film 9. When the photosensitive resin film is formed of a negative photosensitive resin, the exposed region 10 undergoes a crosslinking reaction of the resin by exposure, and the solubility in a developing solution to be described later is lowered. Therefore, the unexposed area 11 in the developing step is dissolved by the developing liquid, and only the exposed area 1 〇 remains on the surface of the substrate to become a mask. On the other hand, when the photosensitive resin film is formed of a positive photosensitive resin, the exposed region 1 is cut by exposure, and the bonding of 27 322079 201104290 fat increases the solubility of the developing solution described later. . Therefore, the exposed area 1〇 in the developing step is dissolved by the developing liquid, and only the unexposed area 11 remains on the surface of the substrate to become a mask. [5] In the subsequent development step of the developing step, when the negative photosensitive resin is used as the photosensitive resin film 9, the unexposed region η is dissolved by the developing solution, and only the exposed region 10 remains in the mold. The substrate then acts as a mask in the second etching step. On the other hand, when a positive photosensitive resin is used as the photosensitive resin film 9, only the exposed region 1〇 is dissolved by the developing liquid, and the unexposed region remains on the substrate for the mold, and then 1 money in the step of the mask to play a role. The developing liquid used in the developing step can be used by a conventional one. For example, inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium metasilicate, and aqueous ammonia; primary amines such as ethylamine and n-propylamine; diethylamine and Secondary amines such as n-butylamine; secondary amines such as triethylamine and methyldiethylamine; alcoholamines such as dimethylethanolamine and triethanolamine; tetradecyl ammonium hydroxide and tetraethyl hydroxide Four-stage (four) such as ammonium amide, trimethyl hydroxyethyl ammonium hydroxide, etc.; an aqueous solution such as a cyclic amine such as hydrazine; and an organic solvent such as xylene or hydrazine. There is no particular limitation on the method of imaging in the case of the v. The method of immersing the image of the mouth, the image of the brush, the brush deve 1 〇pment, and the method of supersonic _ image can be used. *''' Fig. 2(D) schematically shows a state in which a photosensitive resin of a negative type is used as the photosensitive resin film 9 and development processing is performed. In Fig. 2(c), 322079 28 201104290 The unexposed area u is dissolved by the developing liquid, and only the _light area ι〇 remains on the surface of the substrate to become the mask 12. 2nd Schematic (4) Table = Using a positive photosensitive resin as the photosensitive (tetra) film 9 and performing the display: 2 (the exposed region H in the image (6)) is left by the developing liquid and the unexposed region n On the surface of the base # 遮 12 〇 〇 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 6 2 The W substrate is masked at the unmasked portion, and the irregularities are formed by the rubbed money. Fig. 3 is a view showing a preferred example of the rear + part of the mold of the present invention. Fig. 3 (4) is a schematic diagram. The first step is to make the unmasked portion 13 use the state of being left. The substrate 7 for the mold at the lower portion of the mask 12 is not subjected to the surface of the substrate (4), but at the same time as (4), it will be 13 gorges from the no-cover. Therefore, the substrate 7 for the mold in the vicinity of the mask 12 and the unlined portion of the mask 12 is also left in the mold. Thus, in the vicinity of the boundary between the cover 12 and the unmasked portion 13, the substrate 7 for the holder at the lower portion of the mask 12 is also secretly engraved, which is hereinafter referred to as "etching". Figure 4 is a schematic representation of the progress of the side etch. The fourth dotted line 14 indicates the surface β of the substrate for the mold which changes simultaneously with the etching, and the etching treatment in the first step is usually performed by using a ferric chloride (FeCl 3 ) solution, chlorination. Copper (CuCl2) liquid, alkaline etching solution (Cu(NH3)4Cl2), etc. 322079 29 201104290 Corrosion of the metal surface is carried out, but hydrochloric acid or sulfuric acid may be used, or when it is applied by external plating and electrolytic plating. Reverse electrolytic etching performed at the opposite potential. The concave shape formed on the substrate for the mold when the etching treatment is performed is different depending on the type of the underlying layer metal, the type of the photosensitive resin film, and the remaining technique, and thus cannot be generalized, but the surname is When the amount is below /zro, the 'metal surface from the contact with the etching liquid is engraved in a slightly equal direction. Here, the so-called etching amount refers to the thickness of the substrate which is removed by etching. The etching amount in the first surname step is preferably 1 to 50/zm. When the etching amount is less than 1/zm, the metal surface is hardly formed into a concavo-convex shape, and the mold is almost flat, so that the anti-glare property is not exhibited. Further, when the etching amount exceeds 5 〇 m, the height difference between the uneven shapes formed on the metal surface becomes large, and the anti-glare film produced by using the obtained mold may cause whitening in the image display device to be used. The etching treatment in the first etching step can be carried out by etching treatment in the next step, or the money etching treatment can be carried out in two or more times. When the residual etching treatment is carried out in two or more times, the total amount of etching in the etching treatment for two or more times is preferably from 1 to 50 // m. [7] Photosensitive resin film peeling step In the subsequent photosensitive resin film peeling step, the photosensitive resin film remaining as a mask in the first step is completely dissolved = go. In the photosensitive resin film peeling step, the photosensitive resin film is dissolved using a peeling liquid. The peeling liquid can be used in the same manner as the above-mentioned developing liquid, and the photosensitive resin film of the exposed portion is completely dissolved in the (4) negative-type photosensitive resin film by changing the pH, 'temperature, concentration, and immersion time. In the case where the photosensitive resin film of the positive type 322079 30 201104290 is used, the photosensitive resin film of the non-exposed portion is completely removed and removed. There is no particular limitation on the method of peeling off the photosensitive tree _ step. The method of immersion development, spray development, brush development, and ultrasonic imaging can be used. Fig. 3(b) is a view schematically showing a state in which the photosensitive resin film used as the mask 12 in the first etching step is completely dissolved and removed by the photosensitive resin film peeling step. The first surface concave-convex shape 15 is formed on the surface of the substrate for a mold by the _ of the mask 12 formed of the photosensitive resin film. [8] The second bonding step is followed by chrome plating on the formed uneven surface (first surface uneven shape 15), and the uneven shape of the surface is blunt (Fig. 6) shows the processing by the first (four) step The chrome-plated layer 16 is formed on the formed first surface uneven shape, whereby a surface (chromium-plated surface 17) which is more passivated than the unevenness of the i-th surface uneven shape 15 is formed. In the invention, on the surface of the flat material, chrome plating having a gloss, a hardness, a small material coefficient, and a good release property can be used. There is no special job for the type of railway, and it is better to use chrome plating called gloss chrome plating or forging. The chrome plating is usually carried out by electrolysis. [The iron-clad bath system uses an aqueous solution containing chromic anhydride _3) and a small amount of sulfuric acid. Material, money density and electrolysis _, can (4) the thickness of chrome plating. In the above-mentioned Japanese Patent Publication No. 6, Japanese Patent No. 45472, Japanese Unexamined-Japanese-Korean publication, etc., 322079 31 201104290 discloses chrome plating, but the base layer and chrome plating before plating according to the mold are disclosed. The type of ' often causes the surface to become coarse sugar after plating, or causes a large number of tiny cracks caused by plating. As a result, the optical characteristics of the anti-glare film obtained by using the mold are in a bad direction. A mold having a plated surface in a state of a thick chain is not suitable for producing an antiglare film. This is because the surface of the surface is polished after chrome plating in order to eliminate the rough feeling, but as described later, in the present invention, the surface grinding after plating is not preferable. The present invention eliminates such undesirable conditions that can be easily caused by chrome plating by applying copper or nickel plating to the underlying metal. Further, in the second coating step, plating other than chrome plating is not preferable. This is because the plating other than chromium lowers the hardness or wear resistance, so the durability of the mold is lowered, and the unevenness is worn out during use, and the mold is damaged. The anti-glare film obtained by such a mold has a high possibility of not obtaining sufficient anti-glare function, and the possibility of occurrence of defects on the film is also high. Further, the surface polishing after plating as disclosed in Japanese Laid-Open Patent Publication No. 2004-90187 or the like is also disadvantageous in the present invention. That is, it is preferable that the step of polishing the surface is not provided after the second furnace coating step, and the chrome-plated uneven surface is directly used as the uneven surface of the mold transferred on the transparent substrate. This is because the flat portion is generated on the outermost surface by grinding, which may cause deterioration of optical characteristics. Further, since the control factor of the shape is increased, shape control with good reproducibility is difficult; . As described above, in the method for producing a mold of the present invention, chrome plating is performed on the surface on which the fine surface embossed shirt is formed, thereby obtaining a yoke having a concave and convex shape blunt 322079 32 201104 290 and the surface τ of the same day. At this time, the passivation of the unevenness is different depending on the type of the underlying metal, the size and depth of the unevenness obtained by the first surname step, or the type or thickness of the plating, and cannot be generalized, but the maximum passivation condition is controlled. The factor is still the plating thickness. When the thickness of the chrome plating is too thin, the effect of passivating the uneven surface shape obtained before the chrome plating is insufficient, and the optical characteristics of the antiglare film which is transferred to the transparent substrate by the uneven shape are not good. On the other hand, when the thickness of the shovel is too thick, in addition to deterioration in productivity, a projection-like plating defect called a nodule is generated, which is not preferable. Therefore, the thickness of the chrome plating is preferably in the range of 1 to 10 μm, more preferably in the range of 3 to 6 / zm. The chrome plating layer formed in the second plating step is preferably formed so as to have a Vickers hardness of 800 or more, and is preferably formed to be 1000 or more. This is because the chrome-plated layer has a Vicker hardness of less than 8000, which not only reduces the durability of the mold when used, but also reduces the hardness of the chrome plating, which causes the plating bath composition and electrolysis during the plating treatment. There is a high possibility that an abnormality such as a condition may occur, and there is a high possibility that the occurrence of the defect may be adversely affected. Further, in the method for producing a mold according to the present invention, the uneven surface formed by the first etching step is subjected to etching treatment between the [7] photosensitive resin film peeling step and the [8] second plating step. The second etching step of passivation is a value. In the second surname step, the photosensitive resin film is used as the first surface concavo-convex shape 15 formed by the first surname step of the mask, and passivation is performed by etching. By the second etching treatment, the portion of the first surface uneven shape 15 formed by the first etching treatment is sharply inclined, and the optical characteristics of the anti-glare produced by using the obtained mold are eliminated. In the fifth embodiment, the first surface uneven shape 15 of the mold substrate 7 is passivated by the second etching treatment, and the portion where the surface is steeply inclined is passivated to form a relaxed surface. The state of the inclined second surface uneven shape 18. The etching process of the second etching step is also the same as the first etching step, usually by using a vaporized iron (FeCh) solution, a copper chloride (CuCi2) solution, or an alkaline solution. An etching solution (CiKNH^Ch) or the like is used to etch the surface, but a strong acid such as citric acid or sulfuric acid may be used, or a reverse electrolytic etching by applying an electric potential to the electrolytic plate may be used. The situation of 'the situation' is as follows: the type of the base layer metal, the surname method, the pure engraving step, the size and depth (4), and the maximum factor for controlling the passivation is (4). Engraved I' Also with the first step (4) and the so-called etched thickness of 1 hour, the purification effect of the table (4) by the first cut is not sufficient, and the opacity of the glare film is not good. When it is too large, it is preferable to make it into another range of 5°_, and it is carried out in the case of =2::= in the case of 1 to 1 time, or it can be carried out in the same manner as 2 steps. The engraving process is divided into: the above surface _ the total amount of the amount ～ to 5. 2.22 322079 34 201104290 By using the manufacturing method of the mold according to the present invention, since the surface of the fine uneven surface is precisely controlled <Site, so that sufficient anti-glare properties can be obtained, and no formation occurs. The image does not flicker when the image is displayed on the surface of the device, and the display = j is placed on the anti-glare film. Further, an anti-glare film in which the contrast color and the generation of the contrast of the moiré are effectively suppressed can be obtained. EXAMPLES OF REPRESENTATIVE EXAMPLES The following examples are given to illustrate the invention in detail and are limited by the examples. However, the spatial frequency of the energy spectrum maximum value of the [1] colorless pattern of the present invention is not determined by the gradation pattern data of 128 〇〇dpi, and the gradation is a discrete function of the second order element. The discrete 7-degree-transition function g(x, y) is subjected to discrete Four-leaf _ conversion, and the quadratic ^ function G(fx, fy) is obtained. The under-metafunction G (fx,f is calculated as = the quadratic function G2(fx,fy) of the energy spectrum, and the G(0, fy) of the cross-section curve of f(four)[the horizontal axis is the spatial frequency fy, and the vertical axis is The two-dimensional graph of the energy spectrum] obtains the spatial frequency showing the maximum value of the energy spectrum. Here, the "spatial frequency showing the maximum value of the energy spectrum" shown in Table 1 means the spatial frequency fy== Among the complex maxima existing outside the position of 〇y ΠΓ1, the spatial frequency with the smallest absolute value and the maximum maximum value is displayed. The horizontal decomposition energy Δχ and Ay of the pattern used in the leaf calculation are set to 2/. Zm ° and 'calculation range is set to 1000 //mxl000 /im. [2] Determination of anti-glare haze The anti-glare haze is measured by the method specified in JIS 7136. With stomach 322079 35 201104290, The haze is measured using a Haze meter HM-150 (manufactured by Murakami Color Research Laboratory Co., Ltd.) according to the specification. In order to prevent the warpage of the anti-glare film, an optically transparent adhesive is used. The uneven surface is adhered to the glass substrate in such a manner as to be applied to the glass substrate. When the haze is increased, the image is darkened when used in an image display device, and as a result, the front contrast is likely to be lowered. Therefore, the haze is preferably lower. [3] Evaluation of the anti-glare property of the anti-glare film (repeated In order to prevent the reflection from the inside of the anti-glare film, the anti-glare film is adhered to the black acrylic resin plate so that the uneven surface becomes the surface, and the fluorescent light is illuminated. The bright interior of the lamp is visually observed from the side of the concave and convex surface, and visually evaluates whether there is a repeating pattern, whether there is a dry step, whether or not the fluorescent lamp is reflected, and whether there is whitening. Repeating pattern, interference color, reflection, and whitening respectively The evaluation was carried out in accordance with the following criteria in the 3 stages of 1 to 3. Repeating pattern 1: No repeating pattern was observed 2: Repeated pattern was observed slightly 3: Repeated pattern was observed clearly. Interference color 1: No interference color was observed. 2: The interference color was observed slightly. 3: The interference color was observed clearly. The reflection 1 was observed and the reflection was not observed. 2: The reflection was slightly observed. 3: The reflection was clearly observed. Whitening 1: No panning was observed. White. 36 322079 201104290 2 I have observed whitening. 3 · Obviously observed whitening. (Evaluation of scintillation and embossing) A commercially available LCD TV (LC-32GH3 (manufactured by Sharp Corporation, Japan)) strips the polarizing plates on both sides of the watch. In place of the original polarizing plates, the absorption axis of the polarizing plate Sumikalan SRDB31E (manufactured by Sumitomo Chemical Co., Ltd.) and the absorption axis of the original polarizing plate are aligned on the back side and the display surface side. The anti-glare film shown in each of the following examples was adhered to the display-side polarizing plate via an adhesive, and the anti-glare film was adhered via an adhesive so that the uneven surface became a surface. In this state, the degree of flicker and embossing was visually observed in three stages from the following basis, from a position of about 3 〇 cm from the sample. Blinking 1 No flicker is observed. 2 A slight flicker is observed. 3 Obviously observed flicker. Overprint 1 No overstacks were observed. 2 A little overlap was observed. 3 Example 1 The embossing was clearly observed. Prepare a repeating bell steel (c〇ppei· bal lard plating) on the surface of a direct-controlled 200 mm aluminum rol 1 (according to JIS A5056). The repeated copper plating is composed of a copper plating layer/thin silver plating layer/surface copper plating layer. The thickness of the entire plating layer is set to be about 2 Å/m. The copper-plated surface was mirror-polished, and a photosensitive resin was coated on the polished copper-plated surface, and a photosensitive resin film was formed after drying at 37 37 322079 201104290. Next, a plurality of patterns of the pattern data shown in Fig. 1 are successively repeated and the pattern data formed by the exposure is developed by exposure of the laser light on the photosensitive resin film. Exposure and development by laser light was carried out using Laser Stream FX (manufactured by Think Laboratory). The photosensitive resin film uses a positive photosensitive resin. The gradation pattern data shown in Fig. 1 is a pattern in which a plurality of dot diameters (diameter of the dot) of 16 // m are randomly arranged, and the energy spectrum is displayed at a spatial frequency of 0.046 // m_1. maximum. Further, the gradation pattern data shown in Fig. 1 is a square having a side of 20 mm. Thereafter, the first etching treatment is performed with the vaporized copper solution. The etching amount at this time was set to 3/zm. The photosensitive resin film was removed from the roll after the first etching treatment. The second etching treatment was again performed with a copper chloride solution. The etching amount at this time was set to 10 #m. Thereafter, chrome plating is performed to produce a mold a. At that time, Ming' thickness is set to 4 yf / 1 Π. The photocurable resin composition GRANDIC 806T (manufactured by Dainippon Ink Chemicals Co., Ltd.) was dissolved in ethyl acetate to prepare a solution having a concentration of 5 〇% by weight 'further' with a hardness of 1 part by weight. A coating liquid was prepared by adding 5 reset parts of Lucirin TP0 (manufactured by BASF Corporation, chemical name: 2, 4, 6-trimethylbenzylphosphonium diphenylphosphine oxide) as a photopolymerization initiator to the resin component. . The coating liquid was applied to a triethylene glycol cellulose (TAC) film having a thickness of 8 Å/m, and the coating liquid was dried to a coating thickness of 10 μm, and dried in a dryer set at 60 ° C for 3 minutes. The dried film was adhered and adhered using a rubber roller so that the photocurable resin composition layer became the mold side on the uneven surface of the mold A. In the state of 322079 38 201104290, the light of the high-pressure mercury lamp having a strength of 2 〇 mW/cm 2 is irradiated in an amount of 2 〇〇 mJ/cm 2 from the TAC film side, and the photocurable resin composition layer is irradiated. hardening. Thereafter, the TAC film was peeled off from the mold together with the entire hardened resin, and a transparent antiglare film a composed of a laminate of a hardened resin having a rough surface and a TAC film was produced. <Example 2> Except that the gradation pattern shown in Fig. 6 is used as the gradation pattern exposed by the laser light, and the second etching process and the second (fourth) processing are performed by the etching amount described in the table, Mold B was obtained in the same manner as in Example 1. An anti-glare film B was produced in the same manner as in Example i except that the obtained mold B was used. The gradation pattern data shown in Fig. 6 is a pattern in which a plurality of dots having a circle diameter of 12" are randomly arranged, and the energy spectrum is in space, and the maximum value is displayed at a rate of 0.056/^1. Further, the gradation pattern data shown in Fig. 6 is a square having a side of lOOrom. <Example 3> Except that the pattern data was made into a square having a length of 16 bribes for exposure, the same color gradation pattern as in Example 1 = making = was also used. Side amount ==^2_ processing, the rest and embodiment 1 <Comparative Example 1 and Comparative Example 2> The color gradation: ::::: The square of the square having a length of 20 mm is shown in Fig. 7 as a gradation pattern by laser light exposure, and 322079 39 The etching amount of the test described in 201104290 1 is the same as that of the first embodiment in the same manner as in the first embodiment, and the mold D and the mold E are obtained by using the obtained (four) and =. In addition to the anti-glare film D and the anti-glare film, the rest of the dot pattern is added in the same manner as in the first embodiment, and the gradation pattern data system shown in Fig. 7 is::: dot position 36_ The dot random spectrum is in the spatial frequency 〇.〇17 -丨叩珉的圏茶 here ^ « —The member is not the maximum value. The gradation pattern shown in Fig. 7 has no maximum value in the space. 1 frequency please 5 to 〇.125〆 <Comparative Example 3> Except that the gradation pattern (4) having a length of 1 Gmm was used as the gradation pattern by laser light exposure, Example 1 was similarly operated to obtain a mold, except that the obtained mold F was used. Anti-F was produced in the same manner as in Comparative Example 1. <Comparative Examples 4 to 7> In addition to using the gradation pattern shown in Figs. 8 to u as the gradation _ ' by the exposure of the laser light, and performing the reticle processing and the In the same manner as in the example i, the molds G to J were obtained. An anti-glare film G was produced in the same manner as in Example 1 except that the obtained mold was used. The material shown in Fig. 8 = the dot of the circle diameter 16 (four) is randomly arranged: into: pattern, If space frequency 〇. 〇 W shows the maximum value. Open ^ _不之^_ The data is made into one side of the square 1:1 1 Figure 22 1 3rd order: The case data is randomly arranged with a plurality of dots of 14_, heart and 22" The pattern, energy 322079 40 201104290 spectrum in the spatial frequency 0. 042# nf1 shows the maximum value. In addition, the color pattern data shown in Figure 9 is made into a square of 2mm on one side. The pattern data is a pattern in which a plurality of dots having a circle diameter of 2G_ are randomly arranged, and the energy spectrum shows a maximum value at a spatial frequency of 0.033# γ. Further, the color pattern data shown in Fig. ίο is created. One side is a square of lmm. The gradation pattern data shown in Fig. 11 is a pattern in which a plurality of dots having a circle diameter of 22#m are randomly arranged, and the energy spectrum shows a maximum value at a spatial frequency 〇Ο% em1. Further, the gradation pattern data shown in Fig. u is a square having a side of 1 mm. The first etching treatment and the second etching treatment when the molds A to J are produced = the etching amount, and the color used in the production. The dot diameter of the step pattern and the spatial frequency of the maximum value of the energy spectrum (as described above, the record of the block The spatial frequency 'is in the multiplicity max = 2 in the G2 (〇, fy) of the cross-sectional curve of the energy spectrum G2(fx,fy)2 fx=〇, at a position other than the spatial frequency 5=0//111-1. The spatial frequency with the smallest absolute value and the extremely large maximum value), the shape of the gradation pattern, and the length of the smallest side are organized in Table 1. Figure 12 shows the implementation of Example 1 and the implementation. The cross-sectional view of the energy spectrum G2 (fx, 匕) of the color-white pattern used in Example 2 is fx = 。. The numerical value of the horizontal axis of Fig. 12 indicates the absolute value of the spatial frequency fy. t S1 322079 41 201104290 Table 1 Last Name (# m) Color Step Case 1st Engraving Process 2nd Etching Process 圊 Point Diameter (Mm) The spatial frequency of the maximum value of the energy spectrum (μ πΓ)) The length of the smallest side of the shape (mm Example 1 Mold A 3 10 16 0. 046 Square 20 Example 2 Mold B 3 6 12 0. 056 Square 100 Example 3 Mold C 5 12 16 0. 046 Square 16 Comparative Example 1 Mold D 10 30 36 0. 017 Square 20 Comparative Example 2 Mold E 8 4 36 0. 017 Square 20 Comparative Example 3 Mold F 10 30 36 0. 017 square 10 Comparative Example 4 Mold G 4 10 16 0. 056 Square 10 Comparative Example 5 Mold H 3 10 Η, 18, 22 0. 042 Square 2 Comparative Example 6 Mold I 4 10 20 0. 033 Square 1 Comparative Example 7 Mold J 4 10 22 0, 033 Positive-square 1 Further, Table 2 shows the measurement results of the haze of the obtained anti-glare film and the evaluation results of the anti-glare performance. Table 2 Anti-glare film haze (%) Repeated pattern interference color duzed reflection whitening flicker Example 1 A 0. 7 1 1 1 1 1 Example 2 B 8. 4 1 1 1 1 1 Example 3 C 0 6 1 . 1 1 I 1 I Comparative Example 1 D 0. 7 2 1 1 1 1 3 Comparative Example 2 E 61. 9 2 1 1 1 3 2 Comparative Example 3 F 0. 9 3 1 1 1 I 3 Comparative Example 4 G 0. 7 2 1 1 1 1 1 Comparative Example 5 B 0. 7 3 2 3 1 1 1 Comparative Example 6 I 7. 2 3 2 3 1 I 2 Comparative Example 7 J 3. 2 3 3 3 1 1 2 42 025079 201104290 From the evaluation results of Table 2, the anti-glare films A to C of Examples 1 to 3 obtained by the manufacturing method of the present invention have a minimum length of 15 mm or more and an energy spectrum at a spatial frequency of 0. 025. The gradation pattern forming mold which shows the maximum value in the range of 0.125/ζπΓ1 is formed by transferring the uneven surface of the mold to form a fine uneven surface, so that the obtained anti-glare film is excellent in the ability to prevent reflection. At the same time, it is also an anti-glare film with excellent visibility of flickering, whitening, repeating pattern, interference color and moiré. Further, since the anti-glare film Α to C has low haze and also exhibits good anti-glare performance, it is possible to provide an image display device which has excellent anti-glare properties and also exhibits high contrast. On the other hand, in the anti-glare films D and E of Comparative Examples 1 and 2, the length of the smallest side of the gradation pattern used was 20 mm, and interference color and moiré did not occur, but the energy spectrum was at the spatial frequency. 0. 025 to 0. 125# The maximum value is not displayed in the range of πΓ1, so the effect of suppressing flicker and whitening is not sufficient. Further, since the gradation pattern in which the maximum value is not displayed in the above range is used, a repeating pattern (which is a lattice line constituting the outline of the concave-convex surface unit) corresponding to the repeating side-by-side gradation is observed. Pattern) phenomenon. Further, in the anti-glare films F to J of Comparative Examples 3 to 7, since the length of the smallest side of the gradation pattern used is 1 to 10 mm, even if the energy spectrum is extremely large in the range of the spatial frequency of 0.025 to 0.125/zm1. When the value is changed, a repeating pattern is also observed. Further, in the anti-glare films Η to J of Comparative Examples 5 to 7 in which the length of the smallest side of the gradation pattern used was less than 1 Omm, interference color and embossing were also observed. Further, in the anti-glare film F of Comparative Example 3, since the energy spectrum of the gradation pattern used in Γ 43 322079 201104290 does not show a maximum value within the range of the spatial frequency m 1 , observation 025 to 125 / / Brief description of the style], 叼 叼. Fig. 1 is an enlarged view of an example of a step pattern of the antiglare film of the present invention, which is used in the case of the color 1 and the mold of the third embodiment, and is used to expand the embodiment. Figure. One part of the white pattern is given to the half part = the first half of the manufacturing method of the mold of the present invention == Table: The following is a schematic view of the manufacturing method of the mold of the present invention: 3 series shows the side 饳 in the first face step The gradation pattern pattern used in the production of the mold in the state of the engraved state is a gradation pattern of 1 to 3 used in the production of the mold to enlarge the graph. The figure of the gradation pattern used in the production of the mold of Comparative Example 4 is enlarged. The Qiu Bagua is a diagram showing an enlarged view of the portion of the gradation pattern used in the production of the mold of Comparative Example 5. Fig. 10 is a view showing an enlarged view of a part of the gradation pattern 44 322079 201104290 used in the case of the sample of Comparative Example 6. j Fig. 11 is a view showing a part of the gradation pattern used in the production of the mold of Comparative Example 7 in an enlarged manner. • Fig. 12 is a cross-sectional view showing the gradation pattern used in the first embodiment and the second embodiment, and the fx=0 of the calculated energy spectrum G2 (fx, 5). [Main component symbol description] 7 Mold base material 8 Grinded surface 9 Photosensitive resin film 10 Exposure area 11 Unexposed area 12 Mask 13 Unmasked place 14 Dotted line 15 First surface uneven shape 16 chrome Layer 17 surface of Qianluo 18 second surface concave and convex shape 45 322079

Claims (1)

201104290 VII. Patent application scope: 1. A method for manufacturing an anti-glare film, comprising the steps of: forming a concave-convex surface on a transparent substrate according to a gradation pattern; wherein the gradation pattern is a length of a minimum side And the energy spectrum of the gradation pattern shows a maximum value in a range of a spatial frequency of 0. 025 to 0.125 // m_1; the concave-convex surface is composed of a repeating structure of the concave-convex surface unit, the unevenness The surface unit is composed of a concave portion and a convex portion corresponding to the gradation of the aforementioned gradation pattern. 2. The method according to claim 1, wherein the gradation pattern is image data binarized into white and black, and any one of the concave portion or the convex portion constituting the concave-convex surface unit corresponds to the aforementioned The white area of binarized image data. 3. The method of claim 1, wherein the step of forming the uneven surface on the transparent substrate comprises the steps of: forming a mold having a concave-convex surface according to the color gradation pattern, and The step of transferring the uneven surface onto the transparent substrate. A method for producing a mold, which is a method for producing a mold according to item 3 of the patent application, comprising the steps of: performing a first plating step of copper plating or nickel plating on a surface of a substrate for a mold; a polishing step of polishing the surface subjected to plating by the first plating step; a photosensitive resin 46 for forming a photosensitive resin film on the polished surface; 322079 201104290 * Film forming step; 1 Making on the photosensitive resin film An exposure step of exposing the gradation pattern; a developing step of developing the exposed gradation pattern on the exposed photosensitive resin film; / etching using a developed photosensitive resin film as a mask, And a first etching step of forming irregularities on the polished plating surface; a photosensitive resin film peeling step of peeling the photosensitive resin film; and a second plating step of subjecting the formed uneven surface to chromium plating. 5. The method according to claim 4, wherein the photosensitive resin film peeling step and the second plating step comprise the step of: forming the uneven shape of the uneven surface formed by A second etching step that is passivated by etching. 6. The method of claim 4, wherein the chrome-plated concave-convex surface formed by the second plating step t is an uneven surface of the mold transferred onto the transparent substrate. 7. The method of claim 4, wherein the chrome plating layer formed by chrome plating in the second plating step has a thickness of 1 to 10/zm. 8. An anti-glare film manufactured according to the manufacturing method of claim 1 of the patent application. 025至0。 The gradation of the gradation of the smear of the smear of the smear of the smear of the smear of the smear of the smear The maximum value is displayed within the range of . 10. The gradation pattern as described in claim 9 of the patent application, which is binarized into white and black image data. 48 322079