TWI808892B - Transfer method for uv optical film and manufacturing method of transfering roller - Google Patents

Transfer method for uv optical film and manufacturing method of transfering roller Download PDF

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TWI808892B
TWI808892B TW111135826A TW111135826A TWI808892B TW I808892 B TWI808892 B TW I808892B TW 111135826 A TW111135826 A TW 111135826A TW 111135826 A TW111135826 A TW 111135826A TW I808892 B TWI808892 B TW I808892B
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transfer
roller
manufacturing
pattern transfer
layer
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TW111135826A
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TW202414099A (en
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林劉恭
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光群雷射科技股份有限公司
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Abstract

The present invention provides a transfer method for ultraviolet (UV) optical film and a manufacturing method of a transferring roller. The manufacturing method includes: coating a photoresist (PR) layer onto an outer surface of a metallic roller; emitting an exposure UV light having a predetermined exposure wavelength, which forms a predetermined light shape by passing through a mask or an interference, to travel onto the PR layer, so that the PR layer becomes a patterned transfer inner layer; and forming a patterned transfer outer layer, which includes fluorine compound, onto an outer surface of the patterned transfer inner layer, in which the patterned transfer outer layer, the patterned transfer inner layer, and the metallic roller jointly form the transferring roller.

Description

紫外線光學膜的轉印製造方法及轉印滾輪的製造方法Production method of transfer printing of ultraviolet optical film and production method of transfer roller

本發明涉及一種轉印滾輪,尤其涉及一種紫外線光學膜的轉印製造方法及轉印滾輪的製造方法。The invention relates to a transfer roller, in particular to a transfer printing manufacturing method of an ultraviolet optical film and a manufacturing method of the transfer roller.

如果現有轉印滾輪的轉印層採用紫外線曝光材質時,其所欲滾壓轉印的光學膜則需要避免採用紫外線固化材質,據以避免所述轉印層於滾壓所述光學膜固化時受到損傷而使其轉印圖案失真。於是,本發明人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本發明。If the transfer layer of the existing transfer roller is made of UV-exposed materials, the optical film to be rolled and transferred needs to avoid using UV-curable materials, so as to avoid the transfer layer from being damaged when the optical film is rolled and cured, thereby distorting the transfer pattern. Therefore, the inventor believes that the above-mentioned defects can be improved, Naite devoted himself to research and combined with the application of scientific principles, and finally proposed an invention with reasonable design and effective improvement of the above-mentioned defects.

本發明實施例在於提供一種紫外線光學膜的轉印製造方法及轉印滾輪的製造方法,其能有效地改善現有轉印滾輪所可能產生的缺陷。The embodiment of the present invention provides a transfer printing manufacturing method of an ultraviolet optical film and a manufacturing method of a transfer roller, which can effectively improve the possible defects of the existing transfer rollers.

本發明實施例公開一種紫外線光學膜的轉印製造方法,其包括:實施一滾輪製造步驟:製造一轉印滾輪且其製造過程包含:於一金屬滾筒的外表面塗佈有一光阻層;以具有一預設曝光波長的一曝光紫外線通過光罩或干涉而形成一預定光形,進而照射在所述光阻層,以使所述光阻層構成一圖案轉印內層;及於所述圖案轉印內層的外表面上形成有一圖案轉印外層,其由氟化合物所構成;其中,所述圖案轉印外層、所述圖案轉印內層、及所述金屬滾筒共同構成所述轉印滾輪;實施一轉印步驟:以所述轉印滾輪的所述圖案轉印外層不間斷地滾壓於一紫外線光學膜上;其中,所述紫外線光學膜能被波長落在一預設光固化波段之內的紫外線所照射固化,並且所述曝光紫外線的所述預設曝光波長是落在所述預設光固化波段之內;以及實施一固化步驟:以波長落在所述預設光固化波段之內的一固化紫外線來照射並固化被所述轉印滾輪所滾壓後的所述紫外線光學膜。The embodiment of the present invention discloses a transfer printing manufacturing method of an ultraviolet optical film, which includes: implementing a roller manufacturing step: manufacturing a transfer roller and the manufacturing process includes: coating a photoresist layer on the outer surface of a metal roller; using an exposure ultraviolet light with a preset exposure wavelength to form a predetermined light shape through a mask or interference, and then irradiating the photoresist layer, so that the photoresist layer constitutes a pattern transfer inner layer; and forming a pattern transfer outer layer on the outer surface of the pattern transfer inner layer, which is composed of a fluorine compound; The pattern transfer outer layer, the pattern transfer inner layer, and the metal roller together constitute the transfer roller; implementing a transfer step: rolling the pattern transfer outer layer of the transfer roller onto an ultraviolet optical film without interruption; wherein, the ultraviolet optical film can be irradiated and cured by ultraviolet rays whose wavelength falls within a preset photocuring band, and the preset exposure wavelength of the exposed ultraviolet rays falls within the preset photocuring band; and implementing a curing step: curing with a wavelength falling within the preset photocuring band The ultraviolet light is used to irradiate and cure the ultraviolet optical film rolled by the transfer roller.

本發明實施例也公開一種轉印滾輪的製造方法,其包括:於一金屬滾筒的外表面塗佈有一光阻層;以具有一預設曝光波長的一曝光紫外線通過光罩或干涉而形成一預定光形,進而照射在所述光阻層,以使所述光阻層構成一圖案轉印內層;以及於所述圖案轉印內層的外表面上形成有一圖案轉印外層,其由氟化合物所構成;其中,所述圖案轉印外層、所述圖案轉印內層、及所述金屬滾筒共同構成所述轉印滾輪。The embodiment of the present invention also discloses a method for manufacturing a transfer roller, which includes: coating a photoresist layer on the outer surface of a metal cylinder; using an exposure ultraviolet light with a predetermined exposure wavelength to form a predetermined light shape through a photomask or interference, and then irradiating the photoresist layer, so that the photoresist layer constitutes a pattern transfer inner layer; and forming a pattern transfer outer layer on the outer surface of the pattern transfer inner layer, which is composed of a fluorine compound; Together constitute the transfer roller.

綜上所述,本發明實施例所公開的紫外線光學膜的轉印製造方法及轉印滾輪的製造方法,其通過所述圖案轉印外層由所述氟化合物而構成,以使得所述圖案轉印外層在滾壓所述紫外線光學膜之後,可以有效地使兩者之間高壓接觸的成形表面彼此分離、且較不會有相互影響或導致外型損毀的可能。To sum up, the method for manufacturing an ultraviolet optical film by transfer printing and the method for manufacturing a transfer roller disclosed in the embodiments of the present invention use the pattern transfer outer layer to be composed of the fluorine compound, so that after the pattern transfer outer layer is rolled on the ultraviolet optical film, the forming surfaces that are in high-pressure contact between the two can be effectively separated from each other, and there is less possibility of mutual influence or damage to the appearance.

換個角度來說,於本發明實施例所公開的紫外線光學膜的轉印製造方法之中,通過形成有由所述氟化合物而構成的所述圖案轉印外層,以使得所述圖案轉印內層可採用紫外線曝光材質,並且所述轉印滾輪所滾壓的光學膜可以採用紫外線固化材質。From another point of view, in the transfer printing manufacturing method of the ultraviolet optical film disclosed in the embodiment of the present invention, the pattern transfer outer layer composed of the fluorine compound is formed, so that the pattern transfer inner layer can be made of ultraviolet exposure material, and the optical film rolled by the transfer roller can be made of ultraviolet curable material.

為能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,但是此等說明與附圖僅用來說明本發明,而非對本發明的保護範圍作任何的限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings related to the present invention, but these descriptions and drawings are only used to illustrate the present invention, not to limit the protection scope of the present invention.

以下是通過特定的具體實施例來說明本發明所公開有關“紫外線光學膜的轉印製造方法及轉印滾輪的製造方法”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。The following is a description of the implementation of the "transfer manufacturing method of ultraviolet optical film and manufacturing method of transfer roller" disclosed by the present invention through specific specific examples. Those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple illustration, and are not drawn according to the actual size, which is stated in advance. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or one signal from another signal. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.

[實施例一][Example 1]

請參閱圖1至圖9所示,其為本發明的實施例一。如圖1所示,本實施例公開一種紫外線光學膜的轉印製造方法,其依序包含有:一滾輪製造步驟S100、一轉印步驟S200、及一固化步驟S300,但本發明不以此為限。舉例來說,所述紫外線光學膜的轉印製造方法也可以依據設計需求而增加相應的其他步驟。Please refer to FIG. 1 to FIG. 9 , which are the first embodiment of the present invention. As shown in FIG. 1 , the present embodiment discloses a transfer printing manufacturing method of an ultraviolet optical film, which sequentially includes: a roller manufacturing step S100 , a transfer printing step S200 , and a curing step S300 , but the present invention is not limited thereto. For example, the transfer printing manufacturing method of the ultraviolet optical film may also add corresponding other steps according to design requirements.

需額外說明的是,所述滾輪製造步驟S100於本實施例中是以搭配於所述轉印步驟S200及所述固化步驟S300來說明,但本發明不受限於此。舉例來說,在本發明未繪示的其他實施例中,所述滾輪製造步驟S100可以視為一種轉印滾輪的製造方法,進而被單獨地實施或是搭配其他步驟來實施。以下接著介紹所述紫外線光學膜的轉印製造方法的各個步驟S100~S300。It should be noted that the manufacturing step S100 of the roller is described as being combined with the transferring step S200 and the curing step S300 in this embodiment, but the present invention is not limited thereto. For example, in other embodiments not shown in the present invention, the roller manufacturing step S100 can be regarded as a method for manufacturing a transfer roller, and then implemented alone or in combination with other steps. The steps S100-S300 of the transfer printing manufacturing method of the ultraviolet optical film will be described below.

所述滾輪製造步驟S100:如圖1搭配圖2至圖7所示,製造一轉印滾輪100(如:圖6)且其製造過程依序包含有一塗佈流程S110、一圖案化流程S120、及一成形流程S130。需說明的是,所述滾輪製造步驟S100是通過實施上述多個流程S110~S130而達成,據以使所述滾輪製造步驟S100之中可以未採用任何鎳金屬材質,進而實現顯著降低製造成本的效果。也就是說,採用鎳金屬的任何滾輪製造步驟皆非本實施例所指的所述滾輪製造步驟S100(或所述轉印滾輪的製造方法)。The roller manufacturing step S100: as shown in FIG. 1 with FIG. 2 to FIG. 7, manufacture a transfer roller 100 (such as: FIG. 6) and its manufacturing process includes a coating process S110, a patterning process S120, and a forming process S130. It should be noted that the manufacturing step S100 of the roller is achieved by implementing the above-mentioned multiple processes S110-S130, so that no nickel material is used in the manufacturing step S100 of the roller, thereby significantly reducing the manufacturing cost. That is to say, any roller manufacturing step using nickel metal is not the roller manufacturing step S100 (or the manufacturing method of the transfer roller) referred to in this embodiment.

所述塗佈流程S110:如圖1和圖2所示,於一金屬滾筒1的外表面塗佈有一光阻層2a。其中,所述金屬滾筒1是一鉻金屬滾筒或一銅金屬滾筒,並且所述金屬滾筒1的長度較佳是大於1.5公尺(m),而所述光阻層2a是採用正光阻劑,其能在經過曝光後,使得受到光照的部分將在顯影時溶解,而顯影後留下的是未受到曝光部分的圖案。The coating process S110 : as shown in FIG. 1 and FIG. 2 , a photoresist layer 2 a is coated on the outer surface of a metal cylinder 1 . Wherein, the metal roller 1 is a chromium metal roller or a copper metal roller, and the length of the metal roller 1 is preferably greater than 1.5 meters (m), and the photoresist layer 2a is made of a positive photoresist, which can dissolve the part exposed to light during development after exposure, and the pattern of the unexposed part remains after development.

再者,所述光阻層2a於本實施例中是覆蓋於所述金屬滾筒1的整個所述外表面,以形成無縫隙構造;也就是說,在垂直所述金屬滾筒1長度方向的任一個橫截面上,所述光阻層2a是呈圓形且無間隙地覆蓋於所述金屬滾筒1的整個所述外表面。Furthermore, in this embodiment, the photoresist layer 2a covers the entire outer surface of the metal cylinder 1 to form a seamless structure; that is, on any cross-section perpendicular to the length direction of the metal cylinder 1, the photoresist layer 2a is circular and covers the entire outer surface of the metal cylinder 1 without gaps.

所述圖案化流程S120:如圖1和圖3至圖5所示,以具有一預設曝光波長的一曝光紫外線L1通過光罩M或干涉而形成一預定光形,進而使其照射在所述光阻層2a,以使所述光阻層2a構成一圖案轉印內層2。於本實施例中,所述曝光紫外線L1所具有的所述預設曝光波長較佳是可以介於400奈米(nm)~410奈米。The patterning process S120: as shown in FIG. 1 and FIG. 3 to FIG. 5 , an exposure ultraviolet light L1 having a predetermined exposure wavelength passes through the mask M or interferes to form a predetermined light shape, and then irradiates it on the photoresist layer 2a, so that the photoresist layer 2a constitutes a pattern transfer inner layer 2. In this embodiment, the preset exposure wavelength of the exposure ultraviolet light L1 is preferably between 400 nanometers (nm) and 410 nm.

再者,用來發出所述曝光紫外線L1的一曝光光源S1可以是能夠發出介於350奈米~450奈米的至少一個發光二極體晶片,並且至少一個所述發光二極體晶片的種類包含有雷射二極體晶片,但該種類可依設計需求而加以調整變化,本發明不以此為限。所述光罩M可以是具備有漸層式分佈的灰階值,據以利於所述曝光紫外線L1穿過而形成所述預定光形。Furthermore, an exposure light source S1 used to emit the exposure ultraviolet light L1 can be at least one light emitting diode chip capable of emitting light between 350 nm and 450 nm, and at least one type of the light emitting diode chip includes a laser diode chip, but the type can be adjusted according to design requirements, and the present invention is not limited thereto. The mask M may have grayscale values distributed in a gradual manner, so as to facilitate the passage of the exposure ultraviolet L1 to form the predetermined light shape.

進一步地說,如圖3所示,所述曝光光源S1與所述光罩M的曝光範圍於本實施例中可以是對應於所述金屬滾筒1的局部長度範圍,以使得所述曝光光源S1與所述光罩M能夠在所述金屬滾筒1自轉時,自所述金屬滾筒1的一端移動至另一端來進行曝光作業。Further, as shown in FIG. 3 , the exposure range of the exposure light source S1 and the photomask M in this embodiment may correspond to a partial length range of the metal cylinder 1, so that the exposure light source S1 and the photomask M can move from one end of the metal cylinder 1 to the other end when the metal cylinder 1 rotates to perform the exposure operation.

或者,如圖4所示,所述曝光光源S1與所述光罩M的曝光範圍於本實施例中也可以是對應於所述金屬滾筒1的整個長度範圍,以使得所述曝光光源S1與所述光罩M能夠在所述金屬滾筒1自轉時,保持不動即可進行曝光作業。Alternatively, as shown in FIG. 4 , the exposure range of the exposure light source S1 and the mask M in this embodiment may also correspond to the entire length range of the metal cylinder 1, so that the exposure light source S1 and the mask M can be kept still while the metal cylinder 1 is rotating to perform the exposure operation.

所述成形流程S130:如圖1、圖6、及圖7所示,於所述圖案轉印內層2的外表面21上形成有一圖案轉印外層3,其由氟化合物所構成,據以使所述圖案轉印外層3、所述圖案轉印內層2、及所述金屬滾筒1能夠共同構成所述轉印滾輪100。此外,所述圖案轉印外層3是通過蒸鍍(evaporation)而完整覆蓋於所述圖案轉印內層2的所述外表面21上。The forming process S130: as shown in FIG. 1 , FIG. 6 , and FIG. 7 , a pattern transfer outer layer 3 is formed on the outer surface 21 of the pattern transfer inner layer 2 , which is made of a fluorine compound, so that the pattern transfer outer layer 3 , the pattern transfer inner layer 2 , and the metal cylinder 1 can jointly form the transfer roller 100 . In addition, the pattern transfer outer layer 3 completely covers the outer surface 21 of the pattern transfer inner layer 2 through evaporation.

需額外說明的是,非為氟化合物所構成的任何轉印層(尤其是金屬材質的轉印層)皆不同於本實施例所指的所述圖案轉印外層3。進一步地說,構成所述圖案轉印外層3的所述氟化合物於本實施例中較佳是限定為聚四氟乙烯(polytetrafluoroethene,PTFE),但本發明不以此為限。It should be noted that any transfer layer not made of fluorine compounds (especially the transfer layer made of metal) is different from the pattern transfer outer layer 3 referred to in this embodiment. Furthermore, the fluorine compound constituting the pattern transfer outer layer 3 is preferably limited to polytetrafluoroethylene (PTFE) in this embodiment, but the present invention is not limited thereto.

所述轉印步驟S200:如圖8所示,以所述轉印滾輪100的所述圖案轉印外層3不間斷地滾壓於一紫外線光學膜200上。其中,所述紫外線光學膜200的選用須符合下述特性:能被波長落在一預設光固化波段之內的紫外線所照射固化,並且所述曝光紫外線L1的所述預設曝光波長是落在所述預設光固化波段之內。於本實施例中,所述預設光固化波段較佳是介於350奈米~410奈米,但本發明不受限於此。The transfer step S200 : as shown in FIG. 8 , the pattern of the transfer roller 100 is used to transfer the outer layer 3 onto an ultraviolet optical film 200 without interruption. Wherein, the selection of the ultraviolet optical film 200 must meet the following characteristics: it can be irradiated and cured by ultraviolet rays whose wavelength falls within a preset photocuring band, and the preset exposure wavelength of the exposing ultraviolet rays L1 falls within the preset photocuring band. In this embodiment, the preset photocuring wavelength range is preferably between 350 nm to 410 nm, but the present invention is not limited thereto.

據此,通過所述紫外線光學膜200的特性選用,由所述氟化合物構成的所述圖案轉印外層3在滾壓所述紫外線光學膜200之後,可以有效地使兩者之間高壓接觸的成形表面彼此分離、且較不會有相互影響或導致外型損毀的可能。換個角度來說,所述圖案轉印外層3與所述紫外線光學膜200的選用有其相互搭配的關係存在,所以不符合上述特性的任何光學膜皆不同於本實施例所指的所述紫外線光學膜200。Accordingly, through the selection of the characteristics of the ultraviolet optical film 200, the pattern transfer outer layer 3 made of the fluorine compound can effectively separate the forming surfaces that are in high-pressure contact between the two after rolling the ultraviolet optical film 200, and there is less possibility of mutual influence or damage to the appearance. To put it another way, the selection of the pattern transfer outer layer 3 and the ultraviolet optical film 200 has a mutual matching relationship, so any optical film that does not meet the above characteristics is different from the ultraviolet optical film 200 referred to in this embodiment.

所述固化步驟S300:如圖8和圖9所示,以波長落在所述預設光固化波段之內的一固化紫外線L2來照射並固化被所述轉印滾輪100所滾壓後的所述紫外線光學膜200。其中,用來發出所述固化紫外線L2的一固化光源S2可以是能夠發出介於350奈米~410奈米的至少一個發光二極體晶片,並且至少一個所述發光二極體晶片的種類包含有雷射二極體晶片,但該種類可依設計需求而加以調整變化,本發明不以此為限。The curing step S300 : as shown in FIG. 8 and FIG. 9 , irradiate and cure the ultraviolet optical film 200 rolled by the transfer roller 100 with a curing ultraviolet L2 whose wavelength falls within the predetermined light curing band. Wherein, a curing light source S2 used to emit the curing ultraviolet light L2 can be at least one light-emitting diode chip capable of emitting between 350 nm to 410 nm, and at least one type of the light-emitting diode chip includes a laser diode chip, but this type can be adjusted and changed according to design requirements, and the present invention is not limited thereto.

於本實施例中,基於所述圖案轉印外層3是由所述氟化合物所構成,所以照射於所述轉印滾輪100的所述固化紫外線L2能被所述圖案轉印外層3反射至少70%,藉以有效地避免所述圖案轉印內層2受到所述固化紫外線L2照射而產生損傷或裂解。In this embodiment, since the pattern transfer outer layer 3 is composed of the fluorine compound, the curing ultraviolet L2 irradiated on the transfer roller 100 can be reflected by at least 70% of the pattern transfer outer layer 3, thereby effectively preventing the pattern transfer inner layer 2 from being damaged or cracked by the curing ultraviolet L2.

更進一步地說,如果所述轉印滾輪100在受到所述固化紫外線L2的(長時間)照射時,還是容易使所述圖案轉印內層2的所述外表面21產生裂痕22。其中,形成有所述裂痕22的所述外表面21於本實施例中可以通過所述圖案轉印外層3而維持其形狀不變;也就是說,所述圖案轉印外層3能夠有效地接合位在所述裂痕22旁的所述圖案轉印內層2區塊,以使所述圖案轉印外層3還是呈現預定外型,據以避免所述圖案轉印外層3於滾壓所述紫外線光學膜200時產生失真。Furthermore, if the transfer roller 100 is irradiated by the curing ultraviolet light L2 (for a long time), it is still easy to cause cracks 22 on the outer surface 21 of the pattern transfer inner layer 2 . Wherein, the outer surface 21 formed with the crack 22 can maintain its shape unchanged through the pattern transfer outer layer 3 in this embodiment; that is, the pattern transfer outer layer 3 can effectively join the pattern transfer inner layer 2 block located next to the crack 22, so that the pattern transfer outer layer 3 still presents a predetermined shape, so as to avoid distortion of the pattern transfer outer layer 3 when rolling the ultraviolet optical film 200.

依上所述,有鑑於所述圖案轉印外層3不但能夠避免所述圖案轉印內層2受到所述固化紫外線L2照射而產生損傷,並且縱使所述圖案轉印內層2受到所述固化紫外線L2照射而產生裂痕,所述圖案轉印外層3還是能維持預定外型而避免轉印圖案失真,所以所述固化光源S2與所述曝光光源S1於本實施例中是可以依據設計需求而採用同一個光源,進而有效地降低整體的設備成本、並縮小設備所需佔用的體積。According to the above, in view of the fact that the pattern transfer outer layer 3 can not only prevent the pattern transfer inner layer 2 from being damaged by the curing ultraviolet L2, but even if the pattern transfer inner layer 2 is exposed to the curing ultraviolet L2 to cause cracks, the pattern transfer outer layer 3 can still maintain a predetermined appearance and avoid the distortion of the transfer pattern, so the curing light source S2 and the exposure light source S1 in this embodiment can use the same light source according to the design requirements, thereby effectively reducing the overall equipment cost and reducing the volume required for the equipment. .

[實施例二][Example 2]

請參閱圖10所示,其為本發明的實施例二。由於本實施例類似於上述實施例一,所以兩個實施例的相同處不再加以贅述(如:所述滾輪製造步驟S100),而本實施例相較於上述實施例一的差異大致說明如下:Please refer to FIG. 10 , which is the second embodiment of the present invention. Since this embodiment is similar to the above-mentioned first embodiment, the similarities between the two embodiments will not be repeated (for example: the manufacturing step S100 of the roller), and the differences between this embodiment and the above-mentioned first embodiment are roughly described as follows:

於本實施例中,所述轉印步驟與所述固化步驟可以被同步實施。具體來說,所述固化光源S2可以被配置於所述紫外線光學膜200的下方,所以當所述紫外線光學膜200被所述轉印滾輪100所滾壓後,即可立即通過所述固化光源S2所發出的所述固化紫外線L2來進行固化,據以提升整體的生產效能。In this embodiment, the transferring step and the curing step can be implemented simultaneously. Specifically, the curing light source S2 can be arranged under the ultraviolet optical film 200, so when the ultraviolet optical film 200 is rolled by the transfer roller 100, it can be cured immediately by the curing ultraviolet light L2 emitted by the curing light source S2, so as to improve the overall production efficiency.

更進一步地說,當所述轉印步驟與所述固化步驟採用同步實施時,如何避免因為所述固化紫外線L2照射於所述轉印滾輪100而導致轉印圖案失真則顯得更為重要,所以由所述氟化合物所構成的所述圖案轉印外層3也因而更有其存在的必要性且與不可取代性。Furthermore, when the transfer step and the curing step are implemented simultaneously, how to avoid the distortion of the transfer pattern due to the irradiation of the curing ultraviolet light L2 on the transfer roller 100 is more important, so the pattern transfer outer layer 3 composed of the fluorine compound is therefore more necessary and irreplaceable.

[本發明實施例的技術效果][Technical effect of the embodiment of the present invention]

綜上所述,本發明實施例所公開的紫外線光學膜的轉印製造方法及轉印滾輪的製造方法,其通過所述圖案轉印外層由所述氟化合物而構成,以使得所述圖案轉印外層在滾壓所述紫外線光學膜之後,可以有效地使兩者之間高壓接觸的成形表面彼此分離、且較不會有相互影響或導致外型損毀的可能。To sum up, the method for manufacturing an ultraviolet optical film by transfer printing and the method for manufacturing a transfer roller disclosed in the embodiments of the present invention use the pattern transfer outer layer to be composed of the fluorine compound, so that after the pattern transfer outer layer is rolled on the ultraviolet optical film, the forming surfaces that are in high-pressure contact between the two can be effectively separated from each other, and there is less possibility of mutual influence or damage to the appearance.

換個角度來說,於本發明實施例所公開的紫外線光學膜的轉印製造方法之中,通過形成有由所述氟化合物而構成的所述圖案轉印外層,以使得所述圖案轉印內層可採用紫外線曝光材質,並且所述轉印滾輪所滾壓的光學膜可以採用紫外線固化材質。From another point of view, in the transfer printing manufacturing method of the ultraviolet optical film disclosed in the embodiment of the present invention, the pattern transfer outer layer composed of the fluorine compound is formed, so that the pattern transfer inner layer can be made of ultraviolet exposure material, and the optical film rolled by the transfer roller can be made of ultraviolet curable material.

再者,本發明實施例所公開的紫外線光學膜的轉印製造方法,其所採用的所述圖案轉印外層不但能夠避免所述圖案轉印內層受到所述固化紫外線照射而產生損傷(如:所述圖案轉印外層能用來反射波段介於350奈米~410奈米且照射於所述轉印滾輪的紫外線的至少70%),並且縱使所述圖案轉印內層受到所述固化紫外線照射而產生裂痕,所述圖案轉印外層還是能維持預定外型而避免轉印圖案失真,據以有效地維持所述轉印滾輪的滾壓成形精度。Furthermore, in the transfer printing manufacturing method of the ultraviolet optical film disclosed in the embodiment of the present invention, the pattern transfer outer layer adopted can not only prevent the pattern transfer inner layer from being damaged by the cured ultraviolet radiation (for example: the pattern transfer outer layer can be used to reflect at least 70% of the ultraviolet rays with a wavelength range of 350 nm to 410 nm and irradiated on the transfer roller), and even if the pattern transfer inner layer is exposed to the curing ultraviolet radiation to cause cracks, the pattern transfer outer layer can still maintain a predetermined appearance and avoid The transfer pattern is distorted, thereby effectively maintaining the roll forming accuracy of the transfer roller.

進一步地說,本發明實施例所公開的紫外線光學膜的轉印製造方法,其所述固化光源與所述曝光光源更是可以依據設計需求而採用同一個光源,進而有效地降低整體的設備成本、並縮小設備所需佔用的體積。Furthermore, in the transfer printing manufacturing method of the ultraviolet optical film disclosed in the embodiment of the present invention, the curing light source and the exposure light source can use the same light source according to the design requirements, thereby effectively reducing the overall equipment cost and reducing the required volume of the equipment.

以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的專利範圍內。The content disclosed above is only a preferred feasible embodiment of the present invention, and does not limit the patent scope of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the patent scope of the present invention.

S100:滾輪製造步驟 S110:塗佈流程 S120:圖案化流程 S130:成形流程 S200:轉印步驟 S300:固化步驟 100:轉印滾輪 1:金屬滾筒 2a:光阻層 2:圖案轉印內層 21:外表面 22:裂痕 3:圖案轉印外層 200:紫外線光學膜 M:光罩 S1:曝光光源 S2:固化光源 L1:曝光紫外線 L2:固化紫外線 S100: Roller Manufacturing Steps S110: coating process S120: Patterning process S130: Forming process S200: transfer step S300: Curing step 100: transfer roller 1: metal roller 2a: Photoresist layer 2: Pattern transfer inner layer 21: Outer surface 22: crack 3: Pattern transfer outer layer 200: UV optical film M: mask S1: Exposure light source S2: curing light source L1: UV exposure L2: UV curing

圖1為本發明實施例一的紫外線光學膜的轉印製造方法的步驟流程示意圖。FIG. 1 is a schematic flowchart of the steps of the transfer printing manufacturing method of an ultraviolet optical film according to Embodiment 1 of the present invention.

圖2為圖1中的塗佈流程的示意圖。FIG. 2 is a schematic diagram of the coating process in FIG. 1 .

圖3為圖1中的圖案化流程的示意圖。FIG. 3 is a schematic diagram of the patterning process in FIG. 1 .

圖4為圖1中的圖案化流程的另一態樣示意圖。FIG. 4 is a schematic diagram of another aspect of the patterning process in FIG. 1 .

圖5為圖1中的圖案化流程的過程示意圖。FIG. 5 is a process schematic diagram of the patterning process in FIG. 1 .

圖6為圖1中的成形流程的示意圖。FIG. 6 is a schematic diagram of the forming process in FIG. 1 .

圖7為圖6的區域VII的放大示意圖。FIG. 7 is an enlarged schematic view of area VII of FIG. 6 .

圖8為圖1中的轉印步驟與固化步驟的示意圖。FIG. 8 is a schematic diagram of the transfer step and the curing step in FIG. 1 .

圖9為圖8的區域IX的放大示意圖。FIG. 9 is an enlarged schematic view of area IX in FIG. 8 .

圖10為本發明實施例二的紫外線光學膜的轉印製造方法的轉印步驟與固化步驟的示意圖。10 is a schematic diagram of the transfer step and the curing step of the transfer printing manufacturing method of the ultraviolet optical film according to the second embodiment of the present invention.

S100:滾輪製造步驟 S100: Roller Manufacturing Steps

S110:塗佈流程 S110: coating process

S120:圖案化流程 S120: Patterning process

S130:成形流程 S130: Forming process

S200:轉印步驟 S200: transfer step

S300:固化步驟 S300: Curing step

Claims (9)

一種紫外線光學膜的轉印製造方法,其包括:實施一滾輪製造步驟:製造一轉印滾輪且其製造過程包含:於一金屬滾筒的外表面塗佈有一光阻層;以具有一預設曝光波長的一曝光紫外線通過光罩或干涉而形成一預定光形,進而照射在所述光阻層,以使所述光阻層構成一圖案轉印內層;及於所述圖案轉印內層的外表面上形成有一圖案轉印外層,其由氟化合物所構成;其中,所述圖案轉印外層、所述圖案轉印內層、及所述金屬滾筒共同構成所述轉印滾輪;實施一轉印步驟:以所述轉印滾輪的所述圖案轉印外層不間斷地滾壓於一紫外線光學膜上;其中,所述紫外線光學膜能被波長落在一預設光固化波段之內的紫外線所照射固化,並且所述曝光紫外線的所述預設曝光波長是落在所述預設光固化波段之內;以及實施一固化步驟:以波長落在所述預設光固化波段之內的一固化紫外線來照射並固化被所述轉印滾輪所滾壓後的所述紫外線光學膜;其中,於所述固化步驟之中,所述轉印滾輪受到所述固化紫外線的照射,以使所述圖案轉印內層的所述外表面產生裂痕;其中,形成有所述裂痕的所述外表面通過所述圖案轉印外層而維持其形狀不變。 A transfer printing manufacturing method of an ultraviolet optical film, which includes: implementing a roller manufacturing step: manufacturing a transfer roller and the manufacturing process includes: coating a photoresist layer on the outer surface of a metal cylinder; forming a predetermined light shape through a photomask or interference with an exposure ultraviolet light having a predetermined exposure wavelength, and then irradiating the photoresist layer, so that the photoresist layer constitutes a pattern transfer inner layer; and forming a pattern transfer outer layer on the outer surface of the pattern transfer inner layer, which is composed of a fluorine compound; The outer layer, the pattern transfer inner layer, and the metal roller together constitute the transfer roller; a transfer step is carried out: the pattern transfer outer layer of the transfer roller is continuously rolled on an ultraviolet optical film; wherein, the ultraviolet optical film can be irradiated and cured by ultraviolet rays whose wavelength falls within a preset photocuring band, and the preset exposure wavelength of the exposing ultraviolet rays falls within the preset photocuring band; Curing the ultraviolet optical film after being rolled by the transfer roller; wherein, in the curing step, the transfer roller is irradiated by the curing ultraviolet rays, so that cracks are generated on the outer surface of the pattern transfer inner layer; wherein, the outer surface formed with the crack is kept in shape by the pattern transfer outer layer. 如請求項1所述的紫外線光學膜的轉印製造方法,其中,於所述滾輪製造步驟之中,構成所述圖案轉印外層的所述氟化合物進一步限定為聚四氟乙烯(polytetrafluoroethene, PTFE)。 The transfer printing manufacturing method of the ultraviolet optical film according to claim 1, wherein, in the manufacturing step of the roller, the fluorine compound constituting the outer layer of the pattern transfer is further limited to polytetrafluoroethylene (polytetrafluoroethene, PTFE). 如請求項2所述的紫外線光學膜的轉印製造方法,其中,於所述滾輪製造步驟之中,所述圖案轉印外層是通過蒸鍍(evaporation)而完整覆蓋於所述圖案轉印內層的所述外表面上。 The transfer printing manufacturing method of the ultraviolet optical film according to claim 2, wherein, in the manufacturing step of the roller, the pattern transfer outer layer is completely covered on the outer surface of the pattern transfer inner layer by evaporation. 如請求項2所述的紫外線光學膜的轉印製造方法,其中,於所述固化步驟之中,照射於所述轉印滾輪的所述固化紫外線能被所述圖案轉印外層反射至少70%。 The transfer printing manufacturing method of an ultraviolet optical film according to claim 2, wherein in the curing step, the curing ultraviolet rays irradiated on the transfer roller can be reflected by at least 70% by the pattern transfer outer layer. 如請求項1所述的紫外線光學膜的轉印製造方法,其中,所述預設曝光波長介於350奈米(nm)~450奈米,而所述預設光固化波段介於350奈米~410奈米。 The transfer printing manufacturing method of an ultraviolet optical film as described in Claim 1, wherein, the preset exposure wavelength is between 350 nanometers (nm) and 450 nm, and the preset photocuring wavelength range is between 350 nm and 410 nm. 如請求項1所述的紫外線光學膜的轉印製造方法,其中,所述金屬滾筒是一鉻金屬滾筒或一銅金屬滾筒,並且所述滾輪製造步驟之中未採用任何鎳金屬材質。 The transfer printing manufacturing method of the ultraviolet optical film according to claim 1, wherein the metal roller is a chromium metal roller or a copper metal roller, and any nickel metal material is not used in the roller manufacturing step. 一種轉印滾輪的製造方法,其包括:於一金屬滾筒的外表面塗佈有一光阻層;以具有一預設曝光波長的一曝光紫外線通過光罩或干涉而形成一預定光形,進而照射在所述光阻層,以使所述光阻層構成一圖案轉印內層;以及於所述圖案轉印內層的外表面上形成有一圖案轉印外層,其由氟化合物所構成;其中,所述圖案轉印外層、所述圖案轉印內層、及所述金屬滾筒共同構成所述轉印滾輪; 其中,當所述圖案轉印內層的所述外表面產生裂痕時,形成有所述裂痕的所述外表面能通過所述圖案轉印外層而維持其形狀不變。 A method for manufacturing a transfer roller, comprising: coating a photoresist layer on the outer surface of a metal cylinder; using an exposure ultraviolet light with a preset exposure wavelength to form a predetermined light shape through a photomask or interference, and then irradiating the photoresist layer so that the photoresist layer constitutes a pattern transfer inner layer; and forming a pattern transfer outer layer on the outer surface of the pattern transfer inner layer, which is composed of a fluorine compound; wherein the pattern transfer outer layer, the pattern transfer inner layer, and the metal roller jointly constitute the transfer scroll wheel; Wherein, when cracks are formed on the outer surface of the pattern transfer inner layer, the outer surface with the cracks can maintain its shape through the pattern transfer outer layer. 如請求項7所述的轉印滾輪的製造方法,其中,所述金屬滾筒是一鉻金屬滾筒或一銅金屬滾筒,並且所述轉印滾輪的製造方法未採用任何鎳金屬材質。 The manufacturing method of the transfer roller according to claim 7, wherein the metal roller is a chromium metal roller or a copper metal roller, and the manufacturing method of the transfer roller does not use any nickel metal material. 如請求項7所述的轉印滾輪的製造方法,其中,構成所述圖案轉印外層的所述氟化合物進一步限定為聚四氟乙烯,並且所述圖案轉印外層能用來反射波段介於350奈米~410奈米且照射於所述轉印滾輪的紫外線的至少70%。 The manufacturing method of the transfer roller according to claim 7, wherein the fluorine compound constituting the pattern transfer outer layer is further limited to polytetrafluoroethylene, and the pattern transfer outer layer can be used to reflect at least 70% of the ultraviolet rays with a wavelength range of 350 nm to 410 nm and irradiated on the transfer roller.
TW111135826A 2022-09-22 2022-09-22 Transfer method for uv optical film and manufacturing method of transfering roller TWI808892B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201031532A (en) * 2009-02-26 2010-09-01 Taiwan Decor Technology Co Heat transfer-printing film and heat transfer-printing method utilizing the same
CN101923181A (en) * 2009-06-09 2010-12-22 住友化学株式会社 The manufacture method of the manufacture method of antiglare film, antiglare film and mould
TW201545849A (en) * 2014-03-07 2015-12-16 Asahi Glass Co Ltd Mold release film, method for manufacturing same, and method for manufacturing semiconductor package
TWM607547U (en) * 2020-10-07 2021-02-11 光群雷射科技股份有限公司 Transfer roller production equipment and optical film production equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201031532A (en) * 2009-02-26 2010-09-01 Taiwan Decor Technology Co Heat transfer-printing film and heat transfer-printing method utilizing the same
CN101923181A (en) * 2009-06-09 2010-12-22 住友化学株式会社 The manufacture method of the manufacture method of antiglare film, antiglare film and mould
TW201545849A (en) * 2014-03-07 2015-12-16 Asahi Glass Co Ltd Mold release film, method for manufacturing same, and method for manufacturing semiconductor package
TWM607547U (en) * 2020-10-07 2021-02-11 光群雷射科技股份有限公司 Transfer roller production equipment and optical film production equipment

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