CN116954018A - Embossing forming method of ultraviolet optical film - Google Patents
Embossing forming method of ultraviolet optical film Download PDFInfo
- Publication number
- CN116954018A CN116954018A CN202211260216.2A CN202211260216A CN116954018A CN 116954018 A CN116954018 A CN 116954018A CN 202211260216 A CN202211260216 A CN 202211260216A CN 116954018 A CN116954018 A CN 116954018A
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- optical film
- ultraviolet
- stamp
- imprint
- unit pattern
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- 239000012788 optical film Substances 0.000 title claims abstract description 73
- 238000000034 method Methods 0.000 title claims abstract description 44
- 238000004049 embossing Methods 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 claims abstract description 28
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 18
- 230000001678 irradiating effect Effects 0.000 claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims abstract description 7
- 238000000576 coating method Methods 0.000 claims abstract description 7
- 238000001723 curing Methods 0.000 claims description 56
- 150000002222 fluorine compounds Chemical class 0.000 claims description 22
- 238000012937 correction Methods 0.000 claims description 17
- 238000000465 moulding Methods 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 238000000016 photochemical curing Methods 0.000 claims description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
- -1 polytetrafluoroethylene Polymers 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 8
- 238000000059 patterning Methods 0.000 abstract description 4
- 230000002349 favourable effect Effects 0.000 abstract 1
- 238000006073 displacement reaction Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 238000009966 trimming Methods 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
The invention discloses an embossing forming method of an ultraviolet optical film, which comprises the following steps: an imprint stamp is manufactured, the manufacturing process comprising: coating a photoresist layer on the outer surface of a carrier, and irradiating the photoresist layer with an exposure ultraviolet ray through a photomask or interference to form a unit pattern layer; stamping a plurality of areas of an ultraviolet optical film one by using the stamping stamp, so that each area is stamped with a unit pattern to form a patterned area, and a gap of not more than 10 micrometers is reserved between any two adjacent patterned areas; and irradiating and curing the plurality of patterned areas of the ultraviolet optical film, which are imprinted by the imprint stamp, with a curing ultraviolet ray one by one. Therefore, when the unit pattern of the patterning area is distorted, the stamping forming method of the ultraviolet optical film is favorable for real-time adjustment, so that the effect of fine adjustment or repair of the patterning area is achieved.
Description
Technical Field
The present invention relates to a method for forming an optical film, and more particularly, to a method for embossing an ultraviolet optical film.
Background
The conventional optical film forming method mostly adopts a rolling method, but the rolling method has limitations (for example, a patterning roller for rolling is difficult to adjust or modify, so that the pattern distortion or defect of the patterning roller is difficult to eliminate).
Disclosure of Invention
The embodiment of the invention provides an embossing forming method of an ultraviolet optical film, which can effectively improve the defects possibly generated by the existing forming method of the optical film.
The embodiment of the invention discloses an embossing forming method of an ultraviolet optical film, which comprises the following steps: a stamp manufacturing step is performed: an imprint stamp is manufactured and its manufacturing process includes: coating a photoresist layer on the outer surface of a carrier; irradiating the photoresist layer with an exposure ultraviolet ray through a photomask or interference to form a unit pattern layer; wherein the unit pattern layer and the carrier together form an imprint stamp; an embossing step is carried out: stamping a plurality of areas of an ultraviolet optical film one by stamping the stamping stamp, so that each area is stamped with a unit pattern to form a patterned area; wherein a gap of not more than 10 micrometers remains between any two adjacent patterned areas; and (3) implementing a curing step: a plurality of patterned areas of the ultraviolet optical film, which are imprinted by the imprint stamp, are irradiated and cured one by one with a curing ultraviolet ray.
Preferably, in the curing step, an optical proximity correction operation is performed according to the unit pattern of at least one patterned area to adjust the intensity distribution of the curing ultraviolet light, and then the patterned area of the ultraviolet optical film imprinted by the imprinted stamp is irradiated and cured.
Preferably, after the curing step, an optical proximity correction operation is performed according to the unit pattern of at least one patterned region to perform a correction stamp manufacturing step: a correction imprint stamp is manufactured and its manufacturing process includes: coating another photoresist layer on the outer surface of the other carrier; adjusting the intensity distribution of the exposure ultraviolet rays by an optical proximity correction operation; forming a preset light shape by the adjusted exposure ultraviolet through a photomask or interference, and then irradiating the other photoresist layer to enable the other photoresist layer to form a modified unit pattern layer; wherein the corrected unit pattern layer and the other carrier form a corrected stamping stamp together.
Preferably, in the stamp manufacturing step, a fluorine compound layer is formed on the outer surface of the unit pattern layer; wherein the fluorine compound layer, the unit pattern layer and the carrier together constitute an imprint stamp.
Preferably, in the stamp manufacturing step, the fluorine compound layer is entirely covered on the outer surface of the unit pattern layer by evaporation.
Preferably, the fluorine compound layer is further defined as a polytetrafluoroethylene layer.
Preferably, in the curing step, the imprint stamp is irradiated with curing ultraviolet rays so as to generate cracks on the outer surface of the unit pattern layer; wherein the outer surface on which the crack is formed is maintained in its shape by the fluorine compound layer.
Preferably, in the curing step, the curing ultraviolet rays irradiated to the imprint stamp can be reflected by the fluorine compound layer by at least 70%.
Preferably, the preset exposure wavelength of the exposure ultraviolet rays falls outside a preset light curing band of the curing ultraviolet rays, and the preset exposure wavelength is at least less than 100 nanometers compared to the preset light curing band.
Preferably, the carrier for stamping the stamp is a glass carrier or a silica gel carrier, and no nickel metal material is used in the stamp manufacturing step.
In summary, the method for stamping and forming the ultraviolet optical film disclosed in the embodiments of the present invention adopts a mode different from roll forming to realize rapid forming of a plurality of patterned areas of the ultraviolet optical film, and the method for stamping and forming the ultraviolet optical film is also beneficial to real-time adjustment if the patterned areas have distortion of the unit pattern, so as to achieve the effect of fine tuning or repairing the patterned areas.
For a further understanding of the nature and the technical aspects of the present invention, reference should be made to the following detailed description of the invention and the accompanying drawings, which are included to illustrate and not to limit the scope of the invention.
Drawings
Fig. 1 is a schematic perspective view of an optical film forming apparatus according to a first embodiment of the present invention.
Fig. 2 is a schematic diagram showing a stamp manufacturing step of an imprint molding method of an ultraviolet optical film according to an embodiment of the present invention.
Fig. 3 to 5 are schematic diagrams illustrating an imprinting step and a curing step of an imprinting forming method of an ultraviolet optical film according to a first embodiment of the present invention.
Fig. 6 is a schematic diagram illustrating an optical proximity correction operation used in a curing step of an imprint molding method of an ultraviolet optical film according to a first embodiment of the present invention.
Fig. 7 is a schematic diagram showing a correction stamp manufacturing step of the imprint molding method of the ultraviolet optical film according to the first embodiment of the present invention.
Fig. 8 is a schematic diagram of an imprint stamp according to a second embodiment of the present invention.
Fig. 9 is a schematic diagram of an imprinting step and a curing step of an imprinting forming method of an ultraviolet optical film according to a second embodiment of the present invention.
Detailed Description
The following is a description of embodiments of the present invention disclosed herein with respect to "imprint molding method of ultraviolet optical film" by specific examples, and those skilled in the art will appreciate the advantages and effects of the present invention from the disclosure herein. The invention is capable of other and different embodiments and its several details are capable of modifications and various other uses and applications, all of which are obvious from the description, without departing from the spirit of the invention. The drawings of the present invention are merely schematic illustrations, and are not intended to be drawn to actual dimensions. The following embodiments will further illustrate the related art content of the present invention in detail, but the disclosure is not intended to limit the scope of the present invention.
It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various components or signals, these components or signals should not be limited by these terms. These terms are used primarily to distinguish one element from another element or signal from another signal. In addition, the term "or" as used herein shall include any one or combination of more of the associated listed items as the case may be.
Embodiment one:
please refer to fig. 1 to 7, which illustrate a first embodiment of the present invention. The present embodiment discloses an imprint molding method of an ultraviolet optical film and an optical film forming apparatus 100. For ease of understanding, the optical film forming apparatus 100 will be described first, and then the imprint forming method of the ultraviolet optical film will be described.
It should be noted that the method for embossing the ultraviolet optical film is implemented by the optical film forming apparatus 100 in the present embodiment, but the present invention is not limited thereto. For example, in other embodiments of the invention not shown, the method of imprint molding the ultraviolet optical film may be implemented by other apparatuses.
In this embodiment, as shown in fig. 1 and 2, the optical film forming apparatus 100 includes an imprint stamp 1, a curing light source 2 disposed corresponding to the imprint stamp 1, a displacement mechanism 3 connecting the imprint stamp 1 and the curing light source 2, and a stage 4 carrying the displacement mechanism 3. In the present embodiment, the imprint stamp 1 and the displacement mechanism 3 are described as being matched with the curing light source 2, but the present invention is not limited thereto. For example, in other embodiments of the invention not shown, the stamp 1 and the displacement mechanism 3 may be defined together as an optical film stamping device, which may be used separately (e.g. vending) or by other means.
The imprint stamp 1 includes a carrier 11 and a unit pattern layer 12 formed on the carrier 11, and the unit pattern layer 12 is formed on the outer surface of the carrier 11 by ultraviolet exposure and development. Furthermore, the imprint stamp 1 and the curing light source 2 are both mounted on the displacement mechanism 3, so that the imprint stamp 1 and the curing light source 2 can each independently move along a height direction H, a lateral direction W and a longitudinal direction L, which are orthogonal to each other, through the displacement mechanism 3.
The above is a brief explanation of the configuration of the optical film forming apparatus 100, and the imprint forming method of the ultraviolet optical film performed by the optical film forming apparatus 100 is described below, but the present invention is not limited thereto. In this embodiment, the imprint molding method of the ultraviolet optical film mainly includes a stamp manufacturing step S110, an imprinting step S120, and a curing step S130.
The seal manufacturing step S110: as shown in fig. 1 and 2, the imprint stamp 1 is manufactured, and the manufacturing process of the imprint stamp 1 includes coating the outer surface of the carrier 11 with a photoresist layer 12a; and irradiating the photoresist layer 12a with an exposure ultraviolet ray UV through a mask M or interference so that the photoresist layer 12a constitutes the unit pattern layer 12. That is, the unit pattern layer 12 and the carrier 11 together constitute the imprint stamp 1 in this embodiment.
It should be noted that, in the present embodiment, the carrier 11 is a glass carrier or a silica gel carrier, but not limited thereto. Furthermore, the seal manufacturing step S110 does not use any nickel metal material in the present embodiment; that is, any manufacturing step using nickel metal is not the seal manufacturing step S110 referred to in this embodiment.
The embossing step S120: as shown in fig. 1, 3 and 4, the imprint stamp 1 is used to imprint a plurality of areas 201 of an ultraviolet optical film 200 one by one, so that each area 201 is imprinted with a unit pattern to form a patterned area 202; wherein a gap 203 of no more than 10 micrometers (μm) remains between any two adjacent patterned areas 202.
Further, when the optical film forming apparatus 100 is employed, the optical film forming apparatus 100 can drive the imprint stamp 1 to be imprinted one by one on the plurality of the regions 201 of the ultraviolet optical film 200 by the displacement mechanism 3 so that each of the regions 201 is imprinted into the patterned region 202. Wherein the gap 203 between any two adjacent patterned areas 202 (or any two adjacent areas 201) can be maintained at a size of not more than 10 μm by the displacement mechanism 3, so as to meet more pattern forming requirements.
The curing step S130: as shown in fig. 1, 4 and 5, a plurality of the patterned areas 202 of the ultraviolet optical film 200, which are imprinted by the imprint stamp 1, are irradiated with a curing ultraviolet ray 21 one by one and cured. In order to prevent the unit pattern layer 12 of the imprint stamp 1 from being damaged by the irradiation of the curing UV, the predetermined exposure wavelength of the exposing UV is preferably outside the predetermined photo-curing band of the curing UV 21, but the present invention is not limited thereto.
In this embodiment, the preset exposure wavelength may be at least less than 100 nm compared to the preset light curing wavelength band. For example, the predetermined exposure wavelength may be 190 nanometers (nm) to 250 nm, and the predetermined light curing wavelength band is preferably 350 nm to 410 nm, but not limited thereto.
Further, when the optical film forming apparatus 100 is employed, the curing light source 2 can be used to emit the curing ultraviolet rays 21 having wavelengths within the preset photocuring wavelength band, and the curing light source 2 is driven by the displacement mechanism 3 so that the curing light source 2 follows the plurality of patterned areas 202 imprinted by the imprint stamp 1, and emits the curing ultraviolet rays 21 to irradiate and cure one by one.
It should be noted that, in the present embodiment, the imprinting step S120 and the curing step S130 are described as partially overlapping in terms of implementation time (i.e. when the nth region 201 of the uv optical film 200 is imprinted, the N-1 th patterned region 202 can be cured, and N is a positive integer greater than 1), but the invention is not limited thereto. For example, the curing step S130 may be performed after the plurality of areas 201 of the uv optical film 200 are printed into the plurality of patterned areas 202, so as to simultaneously cure the plurality of patterned areas 202.
Accordingly, the method for embossing the uv optical film disclosed in the present embodiment adopts a mode different from roll forming to realize rapid forming of the plurality of patterned areas 202 of the uv optical film 200, and the method for embossing the uv optical film is also beneficial to be adjusted in real time to achieve the effect of trimming or repairing the patterned areas 202 if the unit pattern of the patterned areas 202 is distorted (the condition does not necessarily occur, but the method for embossing has the trimming or repairing function).
Further, as shown in fig. 1 and 6, if the unit pattern formed in any one of the patterned areas 202 of the uv optical film 200 is distorted, an optical proximity correction (optical proximity correction, OPC) operation can be performed according to the unit pattern of at least one of the patterned areas 202 in the curing step S130 to adjust the intensity distribution of the cured uv 21 (e.g. to strengthen the outside curing intensity of the cured uv 21 in fig. 6), and then the patterned areas 202 of the uv optical film 200 imprinted by the imprint stamp 1 are irradiated and cured, thereby achieving the effect of trimming or repairing the patterned areas 202.
That is, when the optical film forming apparatus 100 is employed, the curing light source 2 can perform the optical proximity correction operation through the shape of at least one of the patterned areas 202 to adjust the intensity distribution of the curing ultraviolet rays 21 emitted from the curing light source 2, thereby achieving the effect of trimming or repairing the patterned areas 202.
As shown in fig. 1 and 7, even when the unit pattern formed in any one of the patterned areas 202 of the ultraviolet optical film 200 is distorted, the imprint stamp 1 can be changed to improve the distortion. That is, after the curing step S130, an optical proximity correction operation is performed according to the unit pattern of at least one of the patterned areas 202 to perform a corrected stamp manufacturing step S140 to manufacture a corrected imprint stamp 1', and then the imprinting step S120 and the curing step S130 (not shown) described above are performed sequentially with the corrected imprint stamp 1'.
Further, the process of manufacturing the corrected imprint stamp 1' includes: coating another photoresist layer 12a 'on the outer surface of another carrier 11'; adjusting the intensity distribution of the exposure ultraviolet UV by the optical proximity correction operation (as shown in fig. 7: strengthening the outside exposure intensity of the exposure ultraviolet UV); and forming a predetermined light shape by the adjusted exposure ultraviolet UV through the photomask M or interference, and then irradiating the other photoresist layer 12a ', so that the other photoresist layer 12a ' forms a modified unit pattern layer 12'. Wherein the modified unit pattern layer 12' and the other carrier 11' together constitute the corrected imprint stamp 1'.
Embodiment two:
please refer to fig. 8 and 9, which illustrate a second embodiment of the present invention. Since this embodiment is similar to the first embodiment, the same parts of the two embodiments will not be described again, and the differences between the present embodiment and the first embodiment are described as follows:
in the seal manufacturing step S110 of the present embodiment, a fluorine compound layer 13 is formed on the outer surface of the unit pattern layer 12. Wherein the fluorine compound layer 13, the unit pattern layer 12, and the support 11 together constitute the imprint stamp 1. That is, the imprint stamp 1 further includes the fluorine compound layer 13, which is, for example, a Polytetrafluoroethylene (PTFE) layer, formed on the outer surface of the unit pattern layer 12, but the present invention is not limited thereto.
Further, in the seal manufacturing step S110, the fluorine compound layer 13 is entirely covered on the outer surface of the unit pattern layer 12 by evaporation (evapration). Further, in the curing step S130, the curing ultraviolet ray 21 irradiated to the imprint stamp 1 may be reflected by the fluorine compound layer 13 by at least 70%, and if the imprint stamp 1 is irradiated with the curing ultraviolet ray 21 such that the outer surface of the unit pattern layer 12 generates the crack 121, the outer surface formed with the crack 121 may maintain its shape by the fluorine compound layer 13.
Accordingly, the fluorine compound layer 13 can effectively bond the unit pattern layer 12 blocks located beside the cracks 121, so that the unit pattern layer 12 still has a predetermined shape, thereby avoiding distortion generated when the imprint stamp 1 imprints the ultraviolet optical film 200.
As described above, since the fluorine compound layer 13 can not only prevent the unit pattern layer 12 from being damaged by the irradiation of the curing UV light 21, but also maintain the predetermined shape of the fluorine compound layer 13 to avoid the distortion of the transfer pattern even if the unit pattern layer 12 is cracked 121 by the irradiation of the curing UV light 21, the curing UV light 21 and the exposing UV light can be the same light source according to the design requirement in the present embodiment, so that the overall equipment cost is effectively reduced.
In addition, when the imprint stamp 1 is separated from the uv optical film 200 after imprinting the uv optical film 200, the fluorine compound layer 13 can help to separate the imprint stamp 1 from the uv optical film 200, so as to more effectively avoid the occurrence of residual glue therebetween, thereby improving the accuracy of the patterned region 202 of the uv optical film 200.
The technical effects of the embodiment of the invention are as follows:
in summary, the method for stamping and forming an ultraviolet optical film according to the embodiments of the present invention adopts a manner different from roll forming to achieve rapid forming of a plurality of patterned areas of the ultraviolet optical film, and the method for stamping and forming an ultraviolet optical film is also beneficial to real-time adjustment to achieve the effect of trimming or repairing the patterned areas if the patterned areas are distorted (the condition does not necessarily occur, but the stamping and forming method has the trimming or repairing function).
The foregoing disclosure is only illustrative of the preferred embodiments of the present invention and is not to be construed as limiting the scope of the invention, as all changes which come within the meaning and range of equivalency of the specification and drawings are intended to be embraced therein.
Claims (10)
1. An imprint molding method of an ultraviolet optical film, characterized in that the imprint molding method of an ultraviolet optical film comprises:
a stamp manufacturing step is performed: an imprint stamp is manufactured and its manufacturing process includes:
coating a photoresist layer on the outer surface of a carrier; and
Irradiating the photoresist layer with an exposure ultraviolet ray through a photomask or interference to form a unit pattern layer; wherein the unit pattern layer and the carrier together constitute the imprint stamp;
an embossing step is carried out: stamping a plurality of areas of an ultraviolet optical film one by using the stamping stamp, so that each area is stamped with a unit pattern to form a patterned area; wherein a gap of not more than 10 micrometers remains between any two adjacent patterned areas; and
implementing a curing step: and irradiating and curing the plurality of patterned areas of the ultraviolet optical film which are stamped by the stamping stamp one by using curing ultraviolet rays.
2. The method according to claim 1, wherein in the curing step, an optical proximity correction is performed according to the unit pattern of at least one of the patterned areas to adjust the intensity distribution of the cured ultraviolet light, and then the patterned areas of the ultraviolet optical film after being embossed by the embossing stamp are sequentially irradiated and cured.
3. The method according to claim 1, wherein after the curing step, an optical proximity correction operation is performed according to the unit pattern of at least one of the patterned areas to perform a correction stamp manufacturing step: a correction imprint stamp is manufactured and its manufacturing process includes:
coating another photoresist layer on the outer surface of the other carrier;
adjusting an intensity distribution of the exposure ultraviolet rays by the optical proximity correction operation; and
Forming a preset light shape by the adjusted exposure ultraviolet through a photomask or interference, and then irradiating the other photoresist layer to enable the other photoresist layer to form a modified unit pattern layer; wherein the corrected unit pattern layer and the other carrier together form the corrected imprint stamp.
4. The imprint-molding method of an ultraviolet optical film according to claim 1, wherein in the stamp manufacturing step, a fluorine compound layer is formed on an outer surface of the unit pattern layer; wherein the fluorine compound layer, the unit pattern layer, and the carrier together constitute the imprint stamp.
5. The imprint-molding method of an ultraviolet optical film according to claim 4, wherein in the stamp manufacturing step, the fluorine compound layer is entirely covered on the outer surface of the unit pattern layer by vapor deposition.
6. An imprint-molding method of an ultraviolet optical film as recited in claim 5, wherein the fluorine compound layer is further defined as a polytetrafluoroethylene layer.
7. The imprint molding method of an ultraviolet optical film according to claim 4, wherein in the curing step, the imprint stamp is irradiated with the curing ultraviolet rays to cause cracks in the outer surface of the unit pattern layer; wherein the outer surface on which the crack is formed is maintained in its shape by the fluorine compound layer.
8. The imprint molding method of an ultraviolet optical film according to claim 4, wherein in the curing step, the cured ultraviolet light irradiated to the imprint stamp can be reflected by the fluorine compound layer by at least 70%.
9. The imprint molding method of an ultraviolet optical film according to claim 1, wherein the preset exposure wavelength of the exposure ultraviolet light falls outside a preset photocuring band of the curing ultraviolet light, and the preset exposure wavelength is at least less than 100 nm as compared to the preset photocuring band.
10. The method of imprint molding an ultraviolet optical film according to claim 1, wherein the carrier of the imprint stamp is a glass carrier or a silica gel carrier, and no nickel metal material is used in the stamp manufacturing step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211260216.2A CN116954018A (en) | 2022-10-14 | 2022-10-14 | Embossing forming method of ultraviolet optical film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211260216.2A CN116954018A (en) | 2022-10-14 | 2022-10-14 | Embossing forming method of ultraviolet optical film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116954018A true CN116954018A (en) | 2023-10-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211260216.2A Pending CN116954018A (en) | 2022-10-14 | 2022-10-14 | Embossing forming method of ultraviolet optical film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116954018A (en) |
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2022
- 2022-10-14 CN CN202211260216.2A patent/CN116954018A/en active Pending
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