CN219903331U - Alignment type holographic film forming equipment - Google Patents

Abstract

An alignment type holographic film forming device, comprising: the workbench is provided with a pair of alignment type carriers, wherein the alignment type carriers are provided with a plurality of carrier alignment marks and define a plurality of stamping areas through the carrier alignment marks; the displacement mechanism is arranged on the workbench; the glue dispensing mechanism is arranged corresponding to the workbench and is used for setting an ultraviolet curing glue; and an imprint mask, the imprint mask comprising: a plate body formed with a plurality of mask alignment marks; a unit pattern layer; the alignment type holographic film forming equipment can align marks on at least two carriers beside any ultraviolet curing colloid, and then the imprinting photomask is imprinted along the height direction through the displacement mechanism, so that a plurality of ultraviolet curing colloids are sequentially imprinted to form a holographic film unit pattern respectively. Through the mutual matching between the mask alignment marks and the carrier alignment marks, the forming accuracy of a plurality of holographic film unit patterns is ensured.

Description

Alignment type holographic film forming equipment

Technical Field

The present utility model relates to an optical film forming apparatus, and more particularly, to an alignment type holographic film forming apparatus.

Background

Most of the existing holographic film forming equipment adopts a rolling mode, but the rolling mode has limitations, so that the holographic film forming equipment is difficult to further improve or develop greatly. Accordingly, the present inventors considered that the above-mentioned drawbacks could be ameliorated, and have made intensive studies and have completed the application of scientific principles to propose the present utility model which is a rational and effective improvement of the above-mentioned drawbacks.

Disclosure of Invention

The embodiment of the utility model provides a para-type holographic film forming device which can effectively improve the defects possibly generated by the prior holographic film forming device.

The embodiment of the utility model discloses a para-type holographic film forming device, which comprises: a workbench for arranging a pair of alignment type carriers on the workbench; the alignment type carrier is provided with a plurality of carrier alignment marks, and a plurality of stamping areas are defined by the alignment type carrier through the carrier alignment marks; the displacement mechanism is arranged on the workbench and can move relative to the workbench along a height direction, a transverse moving direction and a longitudinal moving direction which are mutually orthogonal; the dispensing mechanism is arranged corresponding to the workbench and is used for sequentially arranging an ultraviolet curing colloid in each stamping area; and an imprint mask coupled to the displacement mechanism, the imprint mask comprising: a plate body formed with a plurality of mask alignment marks; the unit pattern layer is formed on the plate body, and the positions of the unit pattern layer correspond to the plurality of photomask alignment marks; the alignment type holographic film forming equipment can align a plurality of mask alignment marks of the stamping mask along the height direction to at least two carrier alignment marks beside any ultraviolet curing colloid, and then the stamping mask is stamped along the height direction through the displacement mechanism, so that a plurality of ultraviolet curing colloid are stamped in sequence to form a holographic film unit pattern respectively.

Preferably, the dispensing mechanism is configured to form a plurality of uv-curable colloids disposed at intervals on the alignment-type carrier, and a pair of alignment gaps of no more than 5 μm are reserved between any two adjacent uv-curable colloids, so as to expose at least one alignment mark of the carrier.

Preferably, the alignment type carrier is in a hollow cylinder shape, the alignment type holographic film forming device further comprises a flattening mechanism, and the flattening mechanism stretches into the inner side of the alignment type carrier and applies force to prop open the alignment type carrier so that the alignment type carrier is in a flat shape.

Preferably, the alignment type holographic film forming apparatus further includes an adsorption mechanism, where the adsorption mechanism is configured to be disposed on the inner side of the alignment type carrier, and the adsorption mechanism is configured to adsorb a portion to be embossed of the alignment type carrier, so that the portion to be embossed is flat.

Preferably, the flattening mechanism includes a plurality of rollers, and the plurality of rollers are disposed on the inner side of the alignment carrier, so as to apply a force to the alignment carrier to make the alignment carrier flat, and the plurality of rollers can be used for moving the to-be-stamped portion of the alignment carrier for the adsorption mechanism to adsorb.

Preferably, the imprint mask is elongated, and the length of the unit pattern layer is at least 80% of the length of the alignment type carrier in the axial direction of the alignment type carrier.

Preferably, the alignment type holographic film forming apparatus further comprises a curing light source, wherein the curing light source is connected to the displacement mechanism and is configured corresponding to the imprinting photomask; the curing light source can be used for emitting curing ultraviolet rays with the wavelength falling within a preset light curing wave band, and the curing light source can emit the curing ultraviolet rays towards any one of the holographic film unit patterns which are embossed by the embossing photomask so as to irradiate the holographic film unit patterns and cure the holographic film unit patterns.

Preferably, the imprint mask and the curing light source are capable of moving synchronously by the displacement mechanism.

Preferably, the unit pattern layer is formed by irradiating an exposure ultraviolet ray on a photoresist layer through a photomask or interference, and a preset exposure wavelength of the exposure ultraviolet ray falls outside the preset photo-curing band of the curing ultraviolet ray, and the preset exposure wavelength is at least 100 nm smaller than the preset photo-curing band.

Preferably, the curing light source can perform an optical proximity correction operation through the shape of at least one of the holographic film unit patterns to adjust the intensity distribution of the curing ultraviolet rays emitted by the curing light source.

In summary, the alignment type holographic film forming apparatus disclosed in the embodiments of the present utility model adopts a manner different from roll forming to realize rapid forming of a plurality of holographic film unit patterns, and ensures forming accuracy of a plurality of holographic film unit patterns through mutual matching between a plurality of mask alignment marks of the imprint mask and a plurality of carrier alignment marks of the alignment type carrier.

For a further understanding of the nature and the technical aspects of the present utility model, reference should be made to the following detailed description of the utility model and the accompanying drawings, which are included to illustrate and not to limit the scope of the utility model.

Drawings

Fig. 1 is a schematic perspective view of a para-type holographic film forming apparatus according to an embodiment of the present utility model.

Fig. 2 is a schematic diagram illustrating a pre-step of a method for aligning and forming a holographic film according to an embodiment of the present utility model.

Fig. 3 to 6 are schematic diagrams illustrating an imprint curing step of a method for aligning and forming a holographic film according to a first embodiment of the present utility model.

Fig. 7 is a schematic diagram illustrating a correction mask step of a method for aligning and forming a holographic film according to an embodiment of the present utility model.

Fig. 8 is a schematic partial perspective view of a para-type holographic film forming apparatus according to a second embodiment of the present utility model.

Fig. 9 is a schematic diagram illustrating a flattening step of a method for aligning and forming a holographic film according to a second embodiment of the present utility model.

Fig. 10 is a schematic diagram illustrating an imprint curing step of a method for contraposition forming of a holographic film according to a second embodiment of the present utility model.

Detailed Description

The following specific examples are presented to illustrate the embodiments of the present utility model disclosed herein with respect to a "para-type holographic film forming apparatus" and those skilled in the art will appreciate the advantages and effects of the present utility model from the disclosure herein. The utility model is capable of other and different embodiments and its several details are capable of modifications and various other uses and applications, all of which are obvious from the description, without departing from the spirit of the utility model. It should be noted that the drawings of the present utility model are merely schematic illustrations, and are not drawn to actual dimensions. The following embodiments will further illustrate the related art content of the present utility model in detail, but the disclosure is not intended to limit the scope of the present utility model.

It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various components or signals, these components or signals should not be limited by these terms. These terms are used primarily to distinguish one element from another element or signal from another signal. In addition, the term "or" as used herein shall include any one or a combination of more of the associated listed items as the case may be.

Example one

Please refer to fig. 1 to 7, which illustrate a first embodiment of the present utility model. As shown in fig. 1, the present embodiment discloses a method for aligning and forming a holographic film and an apparatus 100 for aligning and forming a holographic film. For ease of understanding, the alignment type holographic film forming apparatus 100 will be described first, and then the alignment type holographic film forming method will be described.

It should be noted that, in the present embodiment, the alignment forming method of the holographic film is implemented by the alignment type holographic film forming apparatus 100, but the utility model is not limited thereto. For example, in other embodiments of the utility model not shown, the method of contraposition forming the holographic film may be implemented by other devices.

In this embodiment, as shown in fig. 1 to 3, the alignment type holographic film forming apparatus 100 includes a table 5, a displacement mechanism 3 disposed on the table 5, a dispensing mechanism 4 disposed corresponding to the table 5, an imprint mask 1 connected to the displacement mechanism 3, and a curing light source 2 connected to the displacement mechanism 3 and disposed corresponding to the imprint mask 1. The alignment type holographic film forming apparatus 100 is illustrated by the above-mentioned combination of a plurality of components in the present embodiment, but the present utility model is not limited thereto. For example, in other embodiments of the utility model not shown, the curing light source 2 may be omitted or replaced by other components.

The workbench 5 is used for arranging a pair of alignment type carriers 200 on the workbench. The alignment type carrier 200 is flat in this embodiment, and has a plurality of carrier alignment marks 201 formed thereon, and the alignment type carrier 200 defines a plurality of imprint regions 202 through a plurality of the carrier alignment marks 201. It should be noted that, in the present embodiment, the plurality of embossed areas 202 are disposed at intervals, and the interval between any two adjacent embossed areas 202 is preferably less than 5 micrometers (μm), but the present utility model is not limited thereto.

The displacement mechanism 3 is movable relative to the table 5 in a height direction H, a traversing direction W and a longitudinal direction L orthogonal to each other. In this embodiment, the dispensing mechanism 4, the imprint mask 1, and the curing light source 2 are mounted on the displacement mechanism 3, so that the dispensing mechanism 4, the imprint mask 1, and the curing light source 2 can be moved in the height direction H, the lateral direction W, and the longitudinal direction L by the displacement mechanism 3, respectively. The imprint mask 1 and the curing light source 2 are preferably capable of moving synchronously by the displacement mechanism 3, but the present utility model is not limited thereto.

The imprint mask 1 includes a plate 11 and a unit pattern layer 12 formed on the plate 11, and the unit pattern layer 12 is formed on the outer surface of the plate 11 by ultraviolet exposure and development. The plate 11 has a plurality of mask alignment marks 111 formed thereon, and the unit pattern layer 12 corresponds to the plurality of mask alignment marks 111 (e.g., the unit pattern layer 12 is disposed inside the plurality of mask alignment marks 111).

The above is a brief explanation of the structure of the alignment type hologram film forming apparatus 100, and the alignment forming method of the hologram film performed by the alignment type hologram film forming apparatus 100 will be described below, but the present utility model is not limited thereto. In this embodiment, the alignment forming method of the holographic film mainly includes a pre-step S110 and an imprint curing step S120.

The preceding step S110: as shown in fig. 1 and 2, the imprint mask 1 is manufactured, and the manufacturing process of the imprint mask 1 includes coating a photoresist layer 12a on the outer surface of the plate 11; and irradiating the photoresist layer 12a with an exposure ultraviolet ray UV through a mask M or interference so that the photoresist layer 12a constitutes the unit pattern layer 12. That is, the unit pattern layer 12 and the plate 11 together form the imprint mask 1 in this embodiment.

It should be noted that, in this embodiment, the plate 11 has light transmittance, and the plate 11 may be made of light-transmitting material or be perforated by a structure to transmit light. For example, the plate 11 may be a glass carrier or a silica gel carrier with holes, and the pre-step S110 is preferably not performed with any nickel metal material, but the utility model is not limited thereto.

The imprint curing step S120: as shown in fig. 1, and fig. 3 to fig. 6, an ultraviolet curing gel 300 is disposed in sequence in each of the imprint regions 202, and at least two carrier alignment marks 201 located beside any one of the ultraviolet curing gel 300 are formed along the height direction H by the mask alignment marks 111 of the imprint mask 1, and then the unit pattern layer 12 is imprinted and cured along the height direction H (e.g., the unit pattern 301 of any one of the plenoptic film imprinted by the imprint mask 1 is irradiated and cured by a curing ultraviolet ray 21), so that the plurality of ultraviolet curing gels 300 are sequentially imprinted to form a unit pattern, respectively, thereby forming a plenoptic film unit pattern 301. Furthermore, the holographic film unit patterns 301 may be arranged in a matrix in the present embodiment, but not limited to this.

In more detail, the plurality of uv-curable colloids 300 are preferably disposed at intervals, and a pair of alignment gaps 302 of not more than 5 μm are reserved between any two adjacent uv-curable colloids 300 for exposing at least one of the carrier alignment marks 201. Furthermore, during any two sequential imprinting processes of the imprinting curing step S120 (as shown in fig. 4 and 6), the positions corresponding to the two uv-curable gels 300 that are imprinted and outflow can fill the alignment gaps 302 between them to cover the corresponding at least one carrier alignment mark 201.

Further, when the alignment type holographic film forming apparatus 100 is used, the dispensing mechanism 4 is configured to sequentially provide one ultraviolet curing gel 300 for each of the embossed areas 202; that is, the dispensing mechanism 4 is configured to form a plurality of the uv curable gels 300 on the alignment type carrier 200 at intervals. The alignment gap 302 between any two adjacent uv-curable colloids 300 can pass through the displacement mechanism 3 and the dispensing mechanism 4, thereby precisely controlling and maintaining the dimension of not more than 5 micrometers, and further meeting more pattern forming requirements.

Furthermore, the alignment type holographic film forming apparatus 100 can align the mask alignment marks 111 of the imprint mask 1 with the at least two carrier alignment marks 201 beside any one of the uv curable glue 300 along the height direction H, and then imprint the imprint mask 1 along the height direction H by the displacement mechanism 3, so that the plurality of uv curable glue 300 are sequentially imprinted to form the holographic film unit patterns 301. Wherein the curing light source 2 can be used to emit a curing ultraviolet ray 21 having a wavelength falling within a preset light curing band, and the curing light source 2 can emit the curing ultraviolet ray 21 toward any one of the holographic film unit patterns 301 embossed by the embossing mask 1 to irradiate and cure it.

It should be noted that, in order to prevent the unit pattern layer 12 of the imprint mask 1 from being damaged by the irradiation of the curing UV, the predetermined exposure wavelength of the exposing UV preferably falls outside the predetermined photo-curing band of the curing UV 21, but the utility model is not limited thereto. In this embodiment, the preset exposure wavelength may be at least 100 nm smaller than the preset light curing wavelength band. For example, the preset exposure wavelength may be 190 nanometers (nm) to 250 nm, and the preset light curing wavelength band is preferably 350 nm to 410 nm, but the utility model is not limited thereto.

As described above, the imprint curing step S120 is described in the present embodiment by overlapping the partial operation time periods of the dispensing mechanism 4, the imprint mask 1, and the curing light source 2 of the alignment type holographic film forming apparatus 100 (i.e. when the nth uv-curable gel 300 is imprinted, the nth uv-curable gel 300 is cured synchronously, and the n+1th uv-curable gel 300 can be formed on the corresponding imprint region 202, and N is a positive integer greater than 1), thereby improving the manufacturing efficiency, but the utility model is not limited thereto.

Accordingly, the alignment forming method of the holographic film disclosed in this embodiment adopts a manner different from roll forming to realize rapid forming of the plurality of holographic film unit patterns 301, and ensures forming accuracy of the plurality of holographic film unit patterns 301 (for example, accuracy can be improved to less than 5 microns from a known error between 100 microns and 400 microns) through mutual matching between the plurality of mask alignment marks 111 of the imprinting mask 1 and the plurality of carrier alignment marks 201 of the alignment carrier 200.

Further, the alignment carrier 200 and the plurality of the holographic film unit patterns 301 thereon can be used as a master mold for transferring a number of sub-molds (not shown), and any of the sub-molds is used for transferring an optical film product for consumers to use, which is a holographic film product. That is, the alignment forming method of the holographic film may be referred to as an alignment forming method of the holographic film master mold, and the alignment type holographic film forming apparatus 100 may be referred to as an alignment type holographic film master mold forming apparatus, but the utility model is not limited thereto.

Furthermore, when the unit pattern 301 of the holographic film is distorted, the alignment forming method of the holographic film is also beneficial to real-time adjustment to achieve the effect of trimming or repairing the unit pattern 301 of the holographic film (this is not necessarily the case, but the alignment forming method of the holographic film has the trimming or repairing function).

Further, as shown in fig. 1 and 6, if the unit pattern formed in any one of the holographic film unit patterns 301 is distorted, in the imprint curing step S120, an optical proximity correction (optical proximity correction, OPC) operation is performed according to the unit pattern of at least one of the holographic film unit patterns 301 to adjust the intensity distribution of the cured uv rays 21 (e.g., to strengthen the outside curing intensity of the cured uv rays 21 in fig. 7), thereby irradiating and curing the holographic film unit pattern 301 imprinted by the imprint mask 1, thereby achieving the effect of trimming or repairing the holographic film unit pattern 301.

That is, when the alignment type holographic film forming apparatus 100 is adopted, the curing light source 2 can perform the optical proximity correction operation by the shape of at least one of the holographic film unit patterns 301 to adjust the intensity distribution of the curing ultraviolet rays 21 emitted from the curing light source 2, thereby achieving the effect of fine tuning or repairing the holographic film unit patterns 301.

As shown in fig. 6 and 7, even when distortion occurs in the unit pattern formed by any one of the hologram film unit patterns 301, the imprinting mask 1 can be changed to improve the distortion. That is, after the imprint curing step S120, an optical proximity correction operation is performed according to the unit pattern of at least one of the holographic film unit patterns 301 to implement a correction mask step S130 to manufacture a correction imprint mask 1', and then the imprint curing step S120 (not shown) described above is performed by the correction imprint mask 1'.

Further, the manufacturing process of the correction imprint mask 1' includes: the outer surface of the other plate 11 'is coated with another photoresist layer 12a'; adjusting the intensity distribution of the exposure ultraviolet UV by the optical proximity correction operation (as shown in fig. 7: strengthening the outside exposure intensity of the exposure ultraviolet UV); and forming a predetermined light shape by the adjusted exposure ultraviolet UV through the photomask M or interference, and then irradiating the other photoresist layer 12a ', so that the other photoresist layer 12a ' forms a modified unit pattern layer 12'. Wherein the corrected unit pattern layer 12' and the other plate 11' together form the corrected imprint mask 1'.

Example two

Please refer to fig. 8-10, which illustrate a second embodiment of the present utility model. Since this embodiment is similar to the first embodiment, the same parts of the two embodiments will not be described again, and the differences between the present embodiment and the first embodiment are described as follows:

in this embodiment, the alignment carrier 200 is hollow and cylindrical, the imprint mask 1 is elongated, and the length of the unit pattern layer 12 of the imprint mask 1 is at least 80% of the length of the alignment carrier 200 in the axial direction of the alignment carrier, so that any one of the holographic film unit patterns 301 is parallel to the axial direction.

Further, the alignment forming method of the holographic film further includes a flattening step S121 before the imprint curing step S120: a force is applied from the inside of the alignment type carrier 200 to spread the alignment type carrier 200 to be flat. In the imprint curing step S120, a portion to be imprinted of the alignment carrier 200 is adsorbed (by the adsorption mechanism 52) from the inner side of the alignment carrier 200 to be flat.

Alternatively, the alignment type holographic film forming apparatus 100 (or the workbench) further comprises a flattening mechanism 51 and an adsorption mechanism 52 matched with the flattening mechanism 51; that is, the flattening mechanism 51 and the suction mechanism 52 may be members belonging to the table (not shown) in the present embodiment. Wherein, the flattening mechanism 51 extends into the inner side of the alignment type carrier 200 and applies a force to spread the alignment type carrier 200 to be flat. The adsorption mechanism 52 is disposed on the inner side of the alignment carrier 200, and the adsorption mechanism 52 can be used to adsorb the portion to be imprinted of the alignment carrier 200 to be flat.

In this embodiment, the flattening mechanism 51 includes a plurality of rollers 511, the rollers 511 (in the flattening step S121) apply force to the inner side of the alignment carrier 200 to make the inner side flat, and the rollers 511 (in the embossing curing step S120) can be used to move the to-be-embossed portion of the alignment carrier 200 for the adsorbing mechanism 52 to adsorb.

As described above, the alignment forming method of the holographic film disclosed in the embodiments of the present utility model can enable the hollow cylindrical alignment carrier 200 to form the plurality of holographic film unit patterns 301 in an imprinting manner through the flattening step S121, and can also effectively ensure the forming accuracy of the plurality of holographic film unit patterns 301 through the mutual matching between the plurality of mask alignment marks 111 of the imprinting mask 1 and the plurality of carrier alignment marks 201 of the alignment carrier 200.

[ technical Effect of embodiments of the utility model ]

In summary, the alignment type holographic film forming apparatus disclosed in the embodiments of the present utility model adopts a manner different from roll forming to realize rapid forming of a plurality of holographic film unit patterns, and ensures forming accuracy of a plurality of holographic film unit patterns through mutual matching between a plurality of mask alignment marks of the imprint mask and a plurality of carrier alignment marks of the alignment type carrier.

The foregoing disclosure is only illustrative of the preferred embodiments of the present utility model and is not intended to limit the scope of the utility model, therefore, all changes which come within the meaning and range of equivalency of the description and drawings are to be embraced therein.

Claims (10)

1. An alignment type holographic film forming device, which is characterized by comprising:

a workbench for arranging a pair of alignment type carriers on the workbench; the alignment type carrier is provided with a plurality of carrier alignment marks, and a plurality of stamping areas are defined by the alignment type carrier through the carrier alignment marks;

the displacement mechanism is arranged on the workbench and can move relative to the workbench along a height direction, a transverse moving direction and a longitudinal moving direction which are mutually orthogonal;

the dispensing mechanism is arranged corresponding to the workbench and is used for sequentially arranging an ultraviolet curing colloid in each stamping area; and

an imprint mask coupled to the displacement mechanism, the imprint mask comprising:

a plate body formed with a plurality of mask alignment marks; and

The unit pattern layer is formed on the plate body, and the positions of the unit pattern layer correspond to the plurality of photomask alignment marks;

the alignment type holographic film forming equipment can align a plurality of mask alignment marks of the stamping mask along the height direction to at least two carrier alignment marks beside any ultraviolet curing colloid, and then the stamping mask is stamped along the height direction through the displacement mechanism, so that a plurality of ultraviolet curing colloid are stamped in sequence to form a holographic film unit pattern respectively.

2. The alignment type holographic film forming apparatus of claim 1, wherein said dispensing mechanism is configured to form a plurality of said uv curable gels on said alignment type carrier in spaced relation, and a pair of alignment gaps of no more than 5 microns remain between any two adjacent uv curable gels for exposing at least one of said carrier alignment marks.

3. The apparatus of claim 1, wherein the alignment type carrier is hollow and cylindrical, the apparatus further comprises a flattening mechanism, and the flattening mechanism extends into the inner side of the alignment type carrier and applies a force to spread the alignment type carrier so as to flatten the alignment type carrier.

4. The apparatus according to claim 3, further comprising an adsorption mechanism disposed on the inner side of the alignment carrier, and configured to adsorb a portion of the alignment carrier to be imprinted, so that the portion to be imprinted is flat.

5. The apparatus of claim 4, wherein the flattening mechanism comprises a plurality of rollers, and the rollers are disposed on the inner side of the alignment carrier to apply a force to the alignment carrier to flatten the alignment carrier, and the rollers are capable of moving the portion of the alignment carrier to be embossed for the adsorption mechanism to adsorb.

6. The alignment type holographic film forming apparatus of claim 1, wherein said imprint mask is elongated and said unit pattern layer has a length of at least 80% of a length of said alignment type carrier in an axial direction of said alignment type carrier.

7. The apparatus of claim 1, further comprising a curing light source coupled to the displacement mechanism and configured to correspond to the imprint mask; the curing light source can be used for emitting curing ultraviolet rays with the wavelength falling within a preset light curing wave band, and the curing light source can emit the curing ultraviolet rays towards any one of the holographic film unit patterns which are embossed by the embossing photomask so as to irradiate the holographic film unit patterns and cure the holographic film unit patterns.

8. The apparatus of claim 7, wherein the imprint mask and the curing light source are movable synchronously by the displacement mechanism.

9. The alignment type holographic film forming apparatus of claim 7, wherein said unit pattern layer is formed by irradiating an exposure ultraviolet ray on a photoresist layer through a photomask or interference, and a preset exposure wavelength of said exposure ultraviolet ray falls outside said preset photo-curing band of said curing ultraviolet ray, and said preset exposure wavelength is at least 100 nm smaller than said preset photo-curing band.

10. The apparatus of claim 7, wherein the curing light source is capable of performing an optical proximity correction operation by passing the shape of at least one of the holographic film unit patterns to adjust the intensity distribution of the curing ultraviolet rays emitted from the curing light source.