201023262 、 .九、發明說明： 【發明所屬之技術領域】 、本發明係有關於一種排氣裝置，特別是用於清洗餘刻機台移 動式洩液槽之排氣裝置3主抽風口位於各抽風口之中央位置而連 接至主抽風棑氣管’以排出來自轉盤酸液之腐蝕性氣體，次抽風 口連接至次抽風排氣管，以排出其他洩液槽較淡之腐蝕性氣體。 【先前技4f】201023262, .9, invention description: [Technical field to which the invention pertains] The present invention relates to an exhaust device, in particular to an exhaust device 3 for cleaning a mobile sump of a residual machine. The central position of the air outlet is connected to the main exhaust air duct 'to discharge the corrosive gas from the rotary acid, and the secondary air outlet is connected to the secondary exhaust pipe to discharge the corrosive gas which is lighter in other drains. [Previous skill 4f]
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I 冰斗、I般旋轉機台可用於塗布光阻’清洗或侧晶圓或基板。清 時，自轉盤飛錢出來之酸液由触槽收集排出，氣 ί動，如ϊϊΐ排出’—般茂液槽接岐不動，而轉盤可以上下 同之沒液槽來排出酸液。此5移動使轉盤可以選擇不 案，名為「具有義1^_2==人_料之專利 移^排氣裝置若亦上下移動台二因«液槽可上下 種需求，能使排氣裝置固定不動，‘且二f之複雜度，因此有-从〜 傾而且齡別排出，各舰槽· 性氣體 置 本發明即針對此一需求，H物鳩之排氣裝 本發明之目的在提供一 裝置，將腐蝕性廣观焱;:一種Μ洗钱刻機台移動彳、由、六扭 粗與其他較淡之腐蝕性氣=洩液槽之排氣 税姐膳離排氣，以將腐 蝕性氣體徽底排出 201023262 -本發明之次一目的在提供一穢清洗蝕刻機台移動式茂液槽之 排氣裝置’配合移動式洩液糟之位置以分配控制各抽風口，^無 洩液槽對準之抽風口苛選擇翁閉或:開啟。 …、 本發明之再一目的在提换一種清洗蝕刻機台移動式洩液槽之 排氣裝置’利用隔離毛刷使洩液槽之連接口與固定風箱之主抽風 口及次抽風口連接形威.軟性籍觸而間隔主、次排氣流道，各連^ 口之間透過隔離毛刷隔離以保持靜壓。 Ο ❹ .、為達成上述目的友其爲目的，' 本發明之第一觀點教導一主 =蝕刻機台移動式洩液槽之排氣裝置，係配合移動式洩 二 計，包括.：一組固定風箱具有主抽風口及次抽風口，主^ ^ 各抽風口之中央位置而.蓮接至主抽風排氣管，以排出自 液之腐蝕性氣體，次抽風口連接至次抽風排氣管，以並 曹較淡之腐蝕性氣體，次抽風口之數為主抽風口之上^ 「）個’ Ν為洩液槽之槽激，故抽風口共有（Ν— ^ ) =2Ν—丨個;一個主抽風排氣管，經主抽風 ‘ 風口 =體排出-個次觸_，將次袖 I-組隔離毛刷，使細#之連接口 風口連接形成軟性接觸而間隔主、次^氣流道，^車^口 ^ 過隔離毛刷隔離以保持靜壓;，组隔板口=透 相上下移動時使連接σ配备於預定位々固疋風 管，並可選擇開啟或關閉無舰槽之抽風口^夺^離二人抽風排氣 【實施方式】 實施例之及優轉扣下之參照麻及最佳 台剖Ξίί 1_之清洗_機 速度旋轉，使峨清洗液均勻分；;：力：ϊ: 201023262 %· 或清洗液脫離晶圓，液體.進入沒液槽124.中被徘出，晶圓基板us 係由旋轉馬達122 :帶動。沒液槽124之槽數最少為二槽，一槽為 酸液敍刻槽，一槽為清洗槽。一般為2·至6槽，本實施例為4槽。 洩液槽124每一槽有一個連接口 .102、104、1Q6及log與固定風 相113連接’以將浪液槽124内之氣體排出。排氣裝置126具有 固定風箱113、主柚風排氣管116、次抽風排氣管114、主抽風口 H0，固定風箱113具有主抽風口 1Γ0及次抽風口 1:12，主抽風口 連接至主抽風排氣管116，以排出來自轉盤118腐蝕液之酸性 氣體，次抽風口 112連接至次抽風排氣管114，以排出其他浅液槽 ^ 較淡之腐蝕性氣體。主抽風口 110係在各抽風口之中央位置，其 餘對準洩液槽之抽風口為次抽風口 112’次抽風.口 112之數為上下 各（N—1)個’ n為洩液槽冬槽數，故抽風口共有（N—丨）+1 + (H)個。第1圖中，主抽風口.110之上有三個次抽風口 112 與茂液槽124之連接口 102、104、106相接，主柚風口 11〇及其 餘對準拽液槽124之次抽風口 112皆打開，來自轉盤Mg之酸性 氣體緣主排氣流道2〇4(請參考第2圖）自主抽風排氣管116排出， 其他洩t槽之氣體緣次排氣流道自次抽風排氣管114排出。無线 竦槽之抽風口為可選擇開啟或封閉。 产睛芩考第2圖（A) ’第2圖（A)係依據本發明之實施例之主排 ί流ΐ之示意圖。圖中可見主抽風口 110及次抽風口 112，主抽風 卜氣官116。主抽風口 110之酸性氣體沿主排氣流道2〇4自主抽風 排氣管116排出。第2圖⑻係依據本發明之實施例之次排氣流道 之不意圖。圖中可見洩液槽124之連接口 ι02、1〇4、1〇6、及1〇8 ^固定風箱113之主抽風口 110及次抽風口 112連接，次抽風口 2之氣體沿次排氣流道2〇2自次抽風排氣管IN排出。 、睛參考第3圖，第3圖係依據本發明之實施例之隔離毛刷之 f f圖。在主抽風口 110或次抽風口 112之週圍，以隔離毛刷3〇2 ^，洩液槽124之連接口 102、104、106、及1〇8與固定風箱 之主抽風口 11 〇及次抽風口 112形成軟性接觸而間隔主排氣流 201023262 及:欠排氣流道2Q2，各連接σ之騎過隔離毛驅離以保持 了參考第4圖，第4圖係依據本發明之實施例之洩液槽之連 ^口^固定風箱之主抽風口以隔離毛刷連接之剖面透視圖。洩液 s ❹ ❹I Ice buckets, I-like rotating machines can be used to coat photoresist 'cleaning or side wafers or substrates. At the time of clearing, the acid liquid from the turntable is collected and discharged by the contact tank, and the gas moves, such as the sputum discharge, and the sleek liquid tank does not move, and the turntable can be used up and down with the liquid tank to discharge the acid. This 5 movement makes the turntable can be selected, and the patented "moving and exhausting device with the meaning of 1^_2==人_料] can also move up and down the second stage due to the liquid tank. It is fixed, 'and the complexity of the two f, so there is - from ~ dumping and age discharge, each ship's tank · Sexual gas, the present invention is directed to this demand, the exhaust of the H object is provided for the purpose of the present invention. A device that will be highly corrosive; a kind of money laundering machine moves the sputum, the yoke, the six twisted coarse and the other lighter corrosive gas = the effluent of the effluent tank The gas bottom of the gas is discharged 201023262 - the second purpose of the present invention is to provide a venting device for the mobile immersion tank of the cleaning and etching machine to cooperate with the position of the mobile effluent to distribute and control each vent, and no venting The groove is aligned with the exhaust port to select the closed or open: ..., another object of the present invention is to replace the exhaust device of the mobile venting tank of the cleaning and etching machine's use of the isolating brush to connect the sump The interface is connected with the main air vent and the secondary air vent of the fixed bellows. The primary and secondary exhaust runners are separated by a separate brush to maintain static pressure. Ο ❹. For the purpose of achieving the above objectives, the first aspect of the present invention teaches a master = etching The exhausting device of the mobile venting tank of the machine is matched with the mobile venting meter, including: a set of fixed bellows has a main venting port and a secondary venting port, and the main position of each of the venting ports is connected. To the main exhaust pipe, to discharge the corrosive gas from the liquid, the secondary exhaust port is connected to the sub-exhaust exhaust pipe, and the corrosive gas is lighter, and the number of the second exhaust port is above the main exhaust port ^" ) Ν Ν 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄 泄Sleeve I-group isolation brush, so that the connection port of the thin # is connected to form a soft contact and separate the main and secondary airflow channels, ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ When moving up and down, the connection σ is provided in the predetermined position of the tamping duct, and the air outlet of the tankless slot can be selected to be opened or closed. ^ ^ ^Two people exhaust ventilation [Embodiment] The reference of the embodiment and the excellent turn under the reference hemp and the best table Ξ ίί 1_ cleaning _ machine speed rotation, so that the 峨 cleaning solution evenly divided;;: force: ϊ: 201023262 %· or the cleaning solution is detached from the wafer, the liquid is taken out into the sump 124. The wafer substrate us is driven by the rotary motor 122. The number of slots of the immersion tank 124 is at least two slots, one The tank is an acid sifting tank, and one tank is a washing tank. Generally, it is 2 to 6 tanks, and this embodiment is 4 tanks. The drain tank 124 has one connection port per tank. 102, 104, 1Q6 and log and fixed The wind phase 113 is connected to 'discharge the gas in the wave tank 124. The exhaust device 126 has a fixed bellows 113, a main pomelo exhaust pipe 116, a secondary exhaust pipe 114, a main exhaust port H0, and a fixed bellows 113. The main exhaust vent is connected to the main exhaust exhaust pipe 116 to discharge the acid gas from the corrosive liquid of the turntable 118, and the sub-exhaust port 112 is connected to the sub-exhaust exhaust pipe 114 to Exhaust other shallow liquid tanks ^ lighter corrosive gases. The main air vent 110 is located at the center of each air vent, and the other air vents aligned with the sump are the second air vent 112's. The number of ports 112 is up and down (N-1). There are a number of winter troughs, so there are a total of (N-丨)+1 + (H). In Fig. 1, three primary air outlets 112 are connected to the connection ports 102, 104, 106 of the molten liquid tank 124, and the main grape air outlet 11 and the other are aligned with the sump 124. The ports 112 are all open, and the main exhaust gas flow passage 2〇4 (please refer to FIG. 2) from the acid gas edge of the turntable Mg is discharged from the self-exhaust exhaust pipe 116, and the other exhaust gas channels of the exhaust chute are exhausted from the second exhaust. The exhaust pipe 114 is exhausted. The air vents of the wireless gutter are optional to open or close. Fig. 2(A) is a schematic view of a main flow according to an embodiment of the present invention. The main exhaust vent 110 and the secondary vent 112 are visible in the figure, and the main exhaust is 116. The acid gas of the main exhaust port 110 is exhausted along the main exhaust runner 2〇4 by the exhaust pipe 116. Fig. 2 (8) is a schematic view of the secondary exhaust runner according to the embodiment of the present invention. It can be seen that the connection ports ι02, 1〇4, 1〇6, and 1〇8 of the drain tank 124 are connected to the main air outlet 110 and the secondary air outlet 112 of the fixed bellows 113, and the gas of the secondary air outlet 2 is along the second row. The air passage 2〇2 is discharged from the secondary exhaust pipe IN. Reference is made to Fig. 3, which is a ff diagram of the insulating brush according to an embodiment of the present invention. Around the main air outlet 110 or the secondary air outlet 112, the cleaning brush 3〇2 ^, the connection ports 102, 104, 106, and 1〇8 of the drain tank 124 and the main air outlet 11 of the fixed bellows are The secondary air outlet 112 forms a soft contact and is spaced apart from the main exhaust flow 201023262 and the under-exhaust flow passage 2Q2, and each connection σ rides over the isolation hair drive to maintain reference to FIG. 4, which is based on the implementation of the present invention. For example, the connection of the drain tank is fixed to the main exhaust port of the bellows to isolate the cross-sectional perspective view of the brush connection. Drainage s ❹ ❹
相113之主柚風口 11〇以隔離毛刷3〇2連接，另有密封 於ΙΪϋ口/〇2與外界隔離，再次隔離酸性氣體。傳動裳置I 狀活動門配合槽之動作而開關，以達到保接 擇之中的目的，適時隔離次抽風排氣管114，並‘ 擇開啟或關閉無洩液槽之抽風口（閘門）。 亚j選 藉由以上較佳之具體實施例之詳述，係渣 本創作之特徵與精神，而並非社述所揭 述 本發明之範私以限制。相反的，·其目的是 及具相等性的安排於本發明所欲申請之專利範疇内。 變 【圖式簡單說明】. =1圖係依據本發明之實施例之清洗举刻機台剖面 第2圖(A)係依據本發明之實施例之主排氣流道之圖 第2圖⑻係依據本㈣之實細之讀氣雜之= 第3圖係依據本發明之實施例之隔離毛刷之透視圖。%、。 第4圖係轉本發明之實關之缺槽之連 ，風口以隔離毛刷連接之剖面透視圖。 ，、固疋風箱之主 縣㈣之實_之_槽翻-箱叫離毛刷連 201023262 .【主要,元件符號說翁1’ ： ' ^ • _ - - - -102、ί(Μ、106、1偈' 連接口 ：: 110 主抽風口 112, 114 .次柚風排氣管 .Π:6 113 圈定風箱. 1-14 116 主柚風排氣着 . 111 122旋轉馬連 … y 1說 12·6排氣裝置 · > 2嘗2 204 主棑氣流道 3Q2 ❾402連接界面/ 50¾ ❹刚傳動裝置 >主抽 Ασ· ..:: :玺抽瘋棑氣费 .表抽風雜氯螢 .· · · · 轉瀵厂：:. 魏液 次排氟激道' 隔離Ά剩 •密封儒板 ^ >. ..The main pomelo port of the phase 113 is connected by a 3毛2 isolation brush, and sealed to the outside of the mouth/〇2 to isolate the acid gas. The drive swings the I-shaped movable door in cooperation with the slot to switch, so as to achieve the purpose of ensuring the selection, timely isolate the secondary exhaust pipe 114, and selectively open or close the exhaust port (gate) without the drain. The features and spirit of the slag creations are not limited by the specifics of the invention described above. On the contrary, it is intended to be equivalent to the scope of the patent to which the invention is claimed. Fig. 2 is a cross-sectional view of a cleaning and polishing machine according to an embodiment of the present invention. Fig. 2(A) is a diagram of a main exhaust gas flow path according to an embodiment of the present invention (Fig. 2) According to the actual reading of this (4), the third drawing is a perspective view of the insulating brush according to the embodiment of the present invention. %,. Figure 4 is a cross-sectional perspective view of the ventilating joint of the present invention. , the main county of the solid wind bellows (four) the actual _ _ trough turn - the box called the hair brush even 201023262. [mainly, the component symbol says Weng 1': ' ^ • _ - - - -102, ί (Μ, 106, 1偈' Connector: 110 Main exhaust vent 112, 114. Secondary pomelo exhaust pipe. Π: 6 113 定定风箱. 1-14 116 Main pomelo air exhausted. 111 122 Rotating Malian... y 1 Said 12·6 exhaust device · > 2 taste 2 204 main air flow channel 3Q2 ❾ 402 connection interface / 503⁄4 ❹ rigid transmission device> main Α · . . . 表 表 表 表 表 表 表 表 表 表 表 表 表 表 表 表 表萤.· · · · Transfer factory::. Wei liquid secondary discharge fluorine channel 'isolated Ά remaining • sealed 儒板 ^ >. ..