CN103357637B - Clean the exhaust apparatus of etching machine movable drain tank - Google Patents
Clean the exhaust apparatus of etching machine movable drain tank Download PDFInfo
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- CN103357637B CN103357637B CN201210093743.9A CN201210093743A CN103357637B CN 103357637 B CN103357637 B CN 103357637B CN 201210093743 A CN201210093743 A CN 201210093743A CN 103357637 B CN103357637 B CN 103357637B
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- suction opeing
- drain tank
- convulsion
- exhaustor
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Abstract
The present invention provides a kind of exhaust apparatus cleaning etching machine movable drain tank, for the aerofluxus cleaning etching machine。Exhaust apparatus and the rotating disk cleaning etching machine are all maintained in fixing level, and drain tank (drain tank) then can move up and down, respectively the liquid that crystal column surface on spinning rotating disk disperses because of centrifugal force is collected discharge。It is made up of fixing bellows, main suction opeing, secondary suction opeing, main convulsion exhaustor, secondary convulsion exhaustor, isolation hairbrush and actuating device。Main suction opeing is in the middle position of each suction opeing, and the suction opeing of all the other alignment drain tanks is time suction opeing, and the suction opeing without drain tank alignment is closed for optional or opened。The sour gas carrying out autorotation disk is discharged along the autonomous convulsion exhaustor of principal exhaust flow path, and the gas of other drain tank is discharged along time grate flow channel from time convulsion exhaustor。
Description
Technical field
The invention relates to a kind of exhaust apparatus, especially for the exhaust apparatus cleaning etching machine movable drain tank。
Background technology
General rotary machine can be used for being coated with photoresistance, cleans or etches wafer or substrate。When cleaning or etch wafer, the acid solution that autorotation disk splashes out is collected by drain tank and is discharged, and gas is then discharged by exhaust apparatus, and general drain tank connects and maintains static, and rotating disk can move up and down, 4,903, No. 717 patents of U.S. Patent No. as authorized FranzSumnitsch et al. disclose one and clean etching machine, its rotating disk can move up and down, to select different drain tanks to discharge acid solution, exhaust apparatus is then concentrated and is discharged by the sour gas of all drain tanks, and each drain tank easily pollutes mutually。Rotating disk moves up and down and also must drive acid solution on rotating disk and pure water conduit, nozzle etc., increases the complexity of structure。Another kind of technology then makes rotating disk be fixed on certain level, and drain tank can move up and down and make rotating disk that different drain tanks can be selected to discharge acid solution。The Patent Case that this technology is applied for for the present inventor simultaneously, " there is the cleaning etching machine of movable drain tank " by name。Because drain tank can move up and down, if exhaust apparatus also moves up and down, by increasing the complexity of device, therefore there is a kind of demand, exhaust apparatus can be made to maintain static, and the sour gas of each drain tank can be discharged respectively。
The present invention is namely for this demand, it is proposed to a kind of exhaust apparatus that can solve disadvantage mentioned above, reduces mutual pollution to discharge the sour gas of each drain tank respectively。
Summary of the invention
The purpose of the present invention is providing a kind of exhaust apparatus cleaning etching machine movable drain tank, by corrosive gas and other thin corrosive gas separated exhaust, thoroughly to be discharged by corrosive gas。
A time purpose of the present invention, at a kind of exhaust apparatus cleaning etching machine movable drain tank of offer, coordinates the position of movable drain tank to distribute control each suction opeing, makes the optional closing of the suction opeing without drain tank alignment or open。
Another object of the present invention is providing a kind of exhaust apparatus cleaning etching machine movable drain tank, utilize isolation hairbrush make the connector of drain tank and the main suction opeing of fixing bellows and secondary suction opeing is connected formation soft contact and interval primary and secondary grate flow channel, between each connector through isolate hairbrush isolation to keep static pressure。
For reaching above-mentioned purpose and other purpose, first viewpoint of the present invention instructs a kind of exhaust apparatus cleaning etching machine movable drain tank, it is to cooperate with movable drain tank and designs, including: one group of fixing bellows, there is main suction opeing and secondary suction opeing, main suction opeing is positioned at the middle position of each suction opeing and is connected to main convulsion exhaustor, to eject the corrosive gas of autorotation disk acid solution, secondary suction opeing is connected to time convulsion exhaustor, the corrosive gas thin to discharge other drain tank, each up and down (N-1) that the number of secondary suction opeing is main suction opeing is individual, N is the groove number of drain tank, therefore total (N-1)+1+ (N-1)=2N-1 of suction opeing；One main convulsion exhaustor, discharges the gas of main suction opeing through main convulsion exhaust manifolds；One convulsion exhaustor, discharges the gas of secondary suction opeing；One group isolation hairbrush, make the connector of drain tank and the main suction opeing of fixing bellows and secondary suction opeing is connected formation soft contact and interval primary and secondary grate flow channel, between each connector through isolate hairbrush isolation to keep static pressure；One group seals dividing plate, makes this connector be isolated from the outside, again isolate corrosive gas；One group of actuating device, makes connector be matched with precalculated position, in good time isolation time convulsion exhaustor when drain tank moves up and down along fixing bellows, and optional is turned on and off the suction opeing without drain tank。
Accompanying drawing explanation
Fig. 1 is based on the cleaning etching machine profile perspective of embodiments of the invention。
Fig. 2 (A) is based on the schematic diagram of the principal exhaust flow path of embodiments of the invention。
Fig. 2 (B) is based on the schematic diagram of the secondary grate flow channel of embodiments of the invention。
Fig. 3 is based on the perspective view of the isolation hairbrush of embodiments of the invention。
Fig. 4 is based on the connector of the drain tank of embodiments of the invention with the main suction opeing of fixing bellows to isolate the profile perspective that hairbrush is connected。
Fig. 5 is based on the drain tank of embodiments of the invention with fixing bellows to isolate the profile that hairbrush is connected。
Symbol description
102,104,106,108 connector
110 112 suction opeings of main suction opeing
114 main convulsion exhaustors of convulsion exhaustor 116
113 fixing 114 convulsion exhaustors of bellows
116 main convulsion exhaustor 118 rotating disks
122 rotation motor 124 drain tanks
126 exhaust apparatus 202 times grate flow channels
204 principal exhaust flow path 302 isolate hairbrush
402 linkage interfaces 502 seal dividing plate
504 actuating devices
Detailed description of the invention
Above and other purpose of the present invention and advantage are more easy to understand completely with reference to the following explanations with reference to diagram and most preferred embodiment。
Refer to Fig. 1, Fig. 1 and be based on the cleaning etching machine profile perspective of embodiments of the invention。Rotating disk 118 is for placing wafer or lamellar workpiece, can rotate with friction speed, after making etching or cleanout fluid be uniformly distributed in wafer, will etch with centrifugal force or cleanout fluid departs from wafer, liquid enters in drain tank 124 and is discharged, and rotating disk 118 is to be driven by rotation motor 122。The groove number of drain tank 124 is minimum is two grooves, and a groove is acid solution etching groove, and a groove is rinse bath。Being generally 2 to 6 grooves, the present embodiment is 4 grooves。The each groove of drain tank 124 has a connector 102,104,106 and 108 to be connected with fixing bellows 113, to be discharged by the gas in drain tank 124。Exhaust apparatus 126 has fixing bellows 113, main convulsion exhaustor 116, secondary convulsion exhaustor 114, main suction opeing 110, fixing bellows 113 have main suction opeing 110 and secondary suction opeing 112, main suction opeing 110 is connected to main convulsion exhaustor 116, to eject the sour gas of autorotation disk 118 corrosive liquid, secondary suction opeing 112 is connected to time convulsion exhaustor 114, the corrosive gas thin to discharge other drain tank。Main suction opeing 110 is in the middle position of each suction opeing, the suction opeing of all the other alignment drain tanks is time suction opeing 112, the number of secondary suction opeing 112 is each (N-1) individual up and down, and N is the groove number of drain tank, therefore total (the N-1)+1+ (N-1) of suction opeing is individual。In Fig. 1, main suction opeing 110 there are three suction opeings 112 connect with the connector 102,104,106 of drain tank 124, the secondary suction opeing 112 of main suction opeing 110 and all the other alignment drain tanks 124 is all opened, the autonomous convulsion exhaustor 116 of sour gas edge principal exhaust flow path 204 (refer to Fig. 2 (A)) carrying out autorotation disk 118 is discharged, and the gas edge of other drain tank time grate flow channel is discharged from time convulsion exhaustor 114。Suction opeing without drain tank alignment is optional opening and closing of fault。
Refer to Fig. 2 (A), Fig. 2 (A) is based on the schematic diagram of the principal exhaust flow path of embodiments of the invention。Visible main suction opeing 110 and secondary suction opeing 112, main convulsion exhaustor 116 in figure。The sour gas of main suction opeing 110 is discharged along the autonomous convulsion exhaustor 116 of principal exhaust flow path 204。Fig. 2 (B) is based on the schematic diagram of the secondary grate flow channel of embodiments of the invention。In figure, the connector 102,104,106 and 108 of visible drain tank 124 is connected with main suction opeing 110 and the secondary suction opeing 112 of fixing bellows 113, and the gas of secondary suction opeing 112 is discharged along time grate flow channel 202 from time convulsion exhaustor 114。
Refer to the perspective view that Fig. 3, Fig. 3 are based on the isolation hairbrush of embodiments of the invention。Around main suction opeing 110 or secondary suction opeing 112, with isolate hairbrush 302 around, the connector 102,104,106 and 108 of drain tank 124 and the main suction opeing 110 of fixing bellows 113 and secondary suction opeing 112 form soft contact and interval principal exhaust flow path 204 and secondary grate flow channel 202, isolate through isolation hairbrush to keep static pressure between each connector。
Refer to Fig. 4, Fig. 4 and be based on the connector of drain tank of embodiments of the invention with the main suction opeing of fixing bellows to isolate the profile perspective that hairbrush is connected。The connector 102 of drain tank forms soft contact with the linkage interface 402 of the main suction opeing 110 of fixing bellows to isolate hairbrush 302。
Refer to Fig. 5, Fig. 5 and be based on the drain tank of embodiments of the invention with fixing bellows to isolate the profile that hairbrush is connected。The connector 102 of drain tank 124 is connected to isolate hairbrush 302 with the main suction opeing 110 of fixing bellows 113, separately has sealing dividing plate 502 to make connector 102 be isolated from the outside, again isolates sour gas。Actuating device 504 makes connector 102 be matched with precalculated position to make the dodge gate of bellows coordinate the action of drain tank to switch when drain tank 124 moves up and down along these fixing bellows 113, to reach the purpose keeping the scope of bleeding in controlling, isolation time convulsion exhaustor 114 in good time, and the optional suction opeing (gate) being turned on and off without drain tank。
By the detailed description of above preferably specific embodiment, it is intended to the feature clearly describing this creation and spirit, and not with above-mentioned disclosed preferred embodiments, scope of the invention is any limitation as。Contrary, its objective is that the present invention that is arranged in wishing to contain various change and tool equality is intended in the protection category applied for。
Claims (3)
1. clean an exhaust apparatus for etching machine movable drain tank, be to cooperate with movable drain tank and design, make work in coordination with mobile drain tank the opportunity of bleeding, reach the complete purpose in good time extracting corrosive gas, it is characterised in that include at least:
One group of fixing bellows, has main suction opeing and secondary suction opeing, and this main suction opeing is connected to main convulsion exhaustor, and to eject the corrosive gas of autorotation disk acid solution, this time suction opeing is connected to time convulsion exhaustor, the corrosive gas thin to discharge other drain tank；
One main convulsion exhaustor, discharges the gas of this main suction opeing through main convulsion exhaustor；
One convulsion exhaustor, discharges the gas of this suction opeing；
One group isolation hairbrush, make the connector of drain tank and the main suction opeing of these fixing bellows and secondary suction opeing is connected formation soft contact and interval primary and secondary grate flow channel, between each connector pass through this isolation hairbrush isolation to keep static pressure；
One group seals dividing plate, makes this connector be isolated from the outside, again isolate sour gas；
One group of actuating device and bellows switch gate, make connector be matched with precalculated position when drain tank moves up and down along these fixing bellows, in good time this convulsion exhaustor of isolation, and closes the suction opeing without drain tank。
2. device as claimed in claim 1, it is characterised in that this main suction opeing is in the middle position of each suction opeing。
3. device as claimed in claim 1, it is characterised in that each up and down (N-1) that the number of this suction opeing is main suction opeing is individual, and N is the groove number of drain tank, total (N-1)+1+ (N-1)=2N-1 of suction opeing。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210093743.9A CN103357637B (en) | 2012-03-31 | 2012-03-31 | Clean the exhaust apparatus of etching machine movable drain tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210093743.9A CN103357637B (en) | 2012-03-31 | 2012-03-31 | Clean the exhaust apparatus of etching machine movable drain tank |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103357637A CN103357637A (en) | 2013-10-23 |
| CN103357637B true CN103357637B (en) | 2016-06-22 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201210093743.9A Active CN103357637B (en) | 2012-03-31 | 2012-03-31 | Clean the exhaust apparatus of etching machine movable drain tank |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104841679B (en) * | 2015-05-21 | 2017-02-22 | 北京七星华创电子股份有限公司 | Cleaning medium collecting device |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3523706A (en) * | 1967-10-27 | 1970-08-11 | Ibm | Apparatus for supporting articles without structural contact and for positioning the supported articles |
| US4903717A (en) * | 1987-11-09 | 1990-02-27 | Sez Semiconductor-Equipment Zubehoer Fuer die Halbleiterfertigung Gesellschaft m.b.H | Support for slice-shaped articles and device for etching silicon wafers with such a support |
| DE19801360A1 (en) * | 1998-01-16 | 1999-07-22 | Sez Semiconduct Equip Zubehoer | Method for cleaning, etching, or smoothing semiconductor wafer coated surfaces |
| CN100447943C (en) * | 2003-03-20 | 2008-12-31 | Sez股份公司 | Device and method for wet treating disc-shaped articles |
| CN100508114C (en) * | 2006-01-13 | 2009-07-01 | 细美事有限公司 | Apparatus for treating substrate |
| US7849865B2 (en) * | 2007-01-05 | 2010-12-14 | Semitool, Inc. | System for processing a workpiece |
| CN101958228A (en) * | 2009-07-13 | 2011-01-26 | 弘塑科技股份有限公司 | Cleaning and etching bench with movable drain tank |
| CN101958229A (en) * | 2009-07-13 | 2011-01-26 | 弘塑科技股份有限公司 | Cleaning and etching bench with bubble blocking ring |
-
2012
- 2012-03-31 CN CN201210093743.9A patent/CN103357637B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3523706A (en) * | 1967-10-27 | 1970-08-11 | Ibm | Apparatus for supporting articles without structural contact and for positioning the supported articles |
| US4903717A (en) * | 1987-11-09 | 1990-02-27 | Sez Semiconductor-Equipment Zubehoer Fuer die Halbleiterfertigung Gesellschaft m.b.H | Support for slice-shaped articles and device for etching silicon wafers with such a support |
| DE19801360A1 (en) * | 1998-01-16 | 1999-07-22 | Sez Semiconduct Equip Zubehoer | Method for cleaning, etching, or smoothing semiconductor wafer coated surfaces |
| CN100447943C (en) * | 2003-03-20 | 2008-12-31 | Sez股份公司 | Device and method for wet treating disc-shaped articles |
| CN100508114C (en) * | 2006-01-13 | 2009-07-01 | 细美事有限公司 | Apparatus for treating substrate |
| US7849865B2 (en) * | 2007-01-05 | 2010-12-14 | Semitool, Inc. | System for processing a workpiece |
| CN101958228A (en) * | 2009-07-13 | 2011-01-26 | 弘塑科技股份有限公司 | Cleaning and etching bench with movable drain tank |
| CN101958229A (en) * | 2009-07-13 | 2011-01-26 | 弘塑科技股份有限公司 | Cleaning and etching bench with bubble blocking ring |
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|---|---|
| CN103357637A (en) | 2013-10-23 |
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