TWI256085B - Spin cleaning and etching wet processor with porous plate liquid removing apparatus - Google Patents

Spin cleaning and etching wet processor with porous plate liquid removing apparatus

Info

Publication number
TWI256085B
TWI256085B TW94116822A TW94116822A TWI256085B TW I256085 B TWI256085 B TW I256085B TW 94116822 A TW94116822 A TW 94116822A TW 94116822 A TW94116822 A TW 94116822A TW I256085 B TWI256085 B TW I256085B
Authority
TW
Taiwan
Prior art keywords
removing apparatus
porous plate
liquid removing
plate liquid
chamber
Prior art date
Application number
TW94116822A
Other languages
Chinese (zh)
Other versions
TW200641990A (en
Inventor
Chia-Kang Wang
Yu-Cheng Chen
Hung-Hua Lu
Original Assignee
Grand Plastic Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grand Plastic Technology Corp filed Critical Grand Plastic Technology Corp
Priority to TW94116822A priority Critical patent/TWI256085B/en
Application granted granted Critical
Publication of TWI256085B publication Critical patent/TWI256085B/en
Publication of TW200641990A publication Critical patent/TW200641990A/en

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Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The present invention discloses a spin cleaning and etching wet processor with porous plate liquid removing apparatus. By implementing the absorption characteristic of the porous Teflon or plastic plate, the chemical, water, particles or other liquid which spreading to the wall of the chamber can be absorb and removed through a drain tube with pressure difference, thus the cleaning or etching wafer or substrate will not be contaminated by the water or chemical left on the wall of the chamber when it is coming out the door of the chamber. Thus may eliminate the maintenance time and cost and also increase the reliability and efficiency of the process.
TW94116822A 2005-05-24 2005-05-24 Spin cleaning and etching wet processor with porous plate liquid removing apparatus TWI256085B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94116822A TWI256085B (en) 2005-05-24 2005-05-24 Spin cleaning and etching wet processor with porous plate liquid removing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94116822A TWI256085B (en) 2005-05-24 2005-05-24 Spin cleaning and etching wet processor with porous plate liquid removing apparatus

Publications (2)

Publication Number Publication Date
TWI256085B true TWI256085B (en) 2006-06-01
TW200641990A TW200641990A (en) 2006-12-01

Family

ID=37614069

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94116822A TWI256085B (en) 2005-05-24 2005-05-24 Spin cleaning and etching wet processor with porous plate liquid removing apparatus

Country Status (1)

Country Link
TW (1) TWI256085B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110544649A (en) * 2018-05-29 2019-12-06 政汉电子科技有限公司 batch-type wet etching cleaning device and batch-type wet etching cleaning method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI383444B (en) * 2008-12-12 2013-01-21 Grand Plastic Technology Co Ltd Exhaust apparatus for lifting and lowering drain tank of wet etching device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110544649A (en) * 2018-05-29 2019-12-06 政汉电子科技有限公司 batch-type wet etching cleaning device and batch-type wet etching cleaning method
CN110544649B (en) * 2018-05-29 2024-06-07 政汉电子科技有限公司 Batch type wet etching cleaning device and batch type wet etching cleaning method

Also Published As

Publication number Publication date
TW200641990A (en) 2006-12-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees