TWI256085B - Spin cleaning and etching wet processor with porous plate liquid removing apparatus - Google Patents
Spin cleaning and etching wet processor with porous plate liquid removing apparatusInfo
- Publication number
- TWI256085B TWI256085B TW94116822A TW94116822A TWI256085B TW I256085 B TWI256085 B TW I256085B TW 94116822 A TW94116822 A TW 94116822A TW 94116822 A TW94116822 A TW 94116822A TW I256085 B TWI256085 B TW I256085B
- Authority
- TW
- Taiwan
- Prior art keywords
- removing apparatus
- porous plate
- liquid removing
- plate liquid
- chamber
- Prior art date
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The present invention discloses a spin cleaning and etching wet processor with porous plate liquid removing apparatus. By implementing the absorption characteristic of the porous Teflon or plastic plate, the chemical, water, particles or other liquid which spreading to the wall of the chamber can be absorb and removed through a drain tube with pressure difference, thus the cleaning or etching wafer or substrate will not be contaminated by the water or chemical left on the wall of the chamber when it is coming out the door of the chamber. Thus may eliminate the maintenance time and cost and also increase the reliability and efficiency of the process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94116822A TWI256085B (en) | 2005-05-24 | 2005-05-24 | Spin cleaning and etching wet processor with porous plate liquid removing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94116822A TWI256085B (en) | 2005-05-24 | 2005-05-24 | Spin cleaning and etching wet processor with porous plate liquid removing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI256085B true TWI256085B (en) | 2006-06-01 |
TW200641990A TW200641990A (en) | 2006-12-01 |
Family
ID=37614069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94116822A TWI256085B (en) | 2005-05-24 | 2005-05-24 | Spin cleaning and etching wet processor with porous plate liquid removing apparatus |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI256085B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110544649A (en) * | 2018-05-29 | 2019-12-06 | 政汉电子科技有限公司 | batch-type wet etching cleaning device and batch-type wet etching cleaning method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI383444B (en) * | 2008-12-12 | 2013-01-21 | Grand Plastic Technology Co Ltd | Exhaust apparatus for lifting and lowering drain tank of wet etching device |
-
2005
- 2005-05-24 TW TW94116822A patent/TWI256085B/en not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110544649A (en) * | 2018-05-29 | 2019-12-06 | 政汉电子科技有限公司 | batch-type wet etching cleaning device and batch-type wet etching cleaning method |
CN110544649B (en) * | 2018-05-29 | 2024-06-07 | 政汉电子科技有限公司 | Batch type wet etching cleaning device and batch type wet etching cleaning method |
Also Published As
Publication number | Publication date |
---|---|
TW200641990A (en) | 2006-12-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |