TW201005789A - Flat field-emission lamp and its manufacturing - Google Patents

Flat field-emission lamp and its manufacturing Download PDF

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Publication number
TW201005789A
TW201005789A TW98114033A TW98114033A TW201005789A TW 201005789 A TW201005789 A TW 201005789A TW 98114033 A TW98114033 A TW 98114033A TW 98114033 A TW98114033 A TW 98114033A TW 201005789 A TW201005789 A TW 201005789A
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Taiwan
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layer
wall
lamp
plate
cathode
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TW98114033A
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Chinese (zh)
Inventor
Laurent Joulaud
Francois-Julien Vermersch
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Saint Gobain
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Publication of TW201005789A publication Critical patent/TW201005789A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J63/00Cathode-ray or electron-stream lamps
    • H01J63/06Lamps with luminescent screen excited by the ray or stream

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  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Discharge Lamp (AREA)

Abstract

One subject of the invention is a flat field-emission lamp (100) transmitting radiation in the visible and/or the ultraviolet ranges, comprising: first and second flat dielectric walls (1, 2) with an anode (3) and a cathode (4) respectively, the first wall/anode assembly being transparent or overall transparent in the visible and/or the UV ranges; a cathodoluminescent material; an electron-accelerating element which comprises an apertured, essentially mineral dielectric plate (6) and/or a diskontinuous enamel-based dielectric layer (6"), the apertures (63) emerging on at least the main face called the free face (61) of the plate, opposite the internal face (21) of the first wall, for said electron bombardment, said apertured plate (6) or said diskontinuous enamel-based dielectric layer (6") carries, on its free face (61), a third electrode (7), forming an accelerating electrode, or else the apertured plate or the diskontinuous enamel-based dielectric layer has a poled surface, thus creating an electron-accelerating remnant electric field. The invention also relates to its manufacture.

Description

201005789 六、發明說明 【發明所屬之技術領域】 本發明係相關於平面燈的領域,尤其是相關於在可見 光及/或紫外光範圍傳送輻射之平面場發射燈及其製造。 【先前技術】 在已知的平面燈之中,具有平面放電燈,其能夠被使 Φ 用當作裝飾或建築照明燈具。這些平面燈典型上係由利用 在它們之間通常小於幾毫米的小間隙保持在一起並且緊密 密封之兩玻璃片所組成,以包含減壓的氣體,在其中放電 產生通常在紫外線範圍中的輻射,其激發接著發出可見光 之光致發光材料。UV燈通常係以此技術爲基礎。201005789 VI. Description of the Invention [Technical Field] The present invention relates to the field of flat lamps, and more particularly to planar field emission lamps and their manufacture relating to the transmission of radiation in the visible and/or ultraviolet range. [Prior Art] Among the known flat lamps, there is a flat discharge lamp which can be used as a decorative or architectural lighting fixture. These flat lamps are typically composed of two glass sheets held together and tightly sealed with a small gap, typically less than a few millimeters between them, to contain a reduced pressure gas in which to generate radiation that is typically in the ultraviolet range. It excites a photoluminescent material that then emits visible light. UV lamps are usually based on this technology.

而且又已知的是以場發射爲基的平面燈,其用於LCD (液晶顯示器)螢幕的背光。 文件US 2007/0228928 A1如此設置一場發射燈,包 9 含: -陽極,係爲沈積在第一玻璃片的內面上之混合銦錫 氧化物(ITO)爲基的導電層形式,被供應有正電壓,及 以在電子轟擊之下能夠產生白光的磷光體層覆蓋; -陰極,其爲沈積在第二玻璃片的內面上之導電層, 被供應有負電壓,該層被圖型化,即、爲電極的帶形式; -微尖端,用於電子發射,其位在電極的帶上;及 -多層塗層,係從覆蓋有形成閘極或加速電極的金屬 層之介電層所形成,多層塗層爲與陽極帶交叉的帶形式。 -5- 201005789 而且 ’ Elsevier 出版,第 74 冊(2004),第 105-111 頁,D. Lee等人之標題爲“使用熱生長的碳奈米管之平面 燈的真空封裝”的文件揭示平面場發射燈(見圖lb),用 於液晶平板的背光,利用: -壁,鹼石灰矽土玻璃片; -一連串磷光體,分別發出紅、綠、及藍,以產生白 光; -陽極,ITO層; -陰極,以Fe (鐵)或Ni (鎳)催化劑所覆蓋的 Ti/Cr (鈦/鉻)多層,用於發射材料的生長; -電子發射材料,以高溫沈積在催化劑上之碳奈米管 (CNT):及 •加速電極,插入在平行於玻璃片的內部空間並且藉 由接觸傳送透過第二玻璃片連接之金屬網柵,係爲具有網 眼壁寬度30μηι之直徑250μιη的六角隙孔陣列(見圖lb) 之形式。利用此三極管型技術,將所施加的電壓降低。 上述平面場發射燈無疑地具有有關小巧和光學性能的 優點,但是它們仍然複雜,或者甚至麻煩。 【發明內容】 因此,本發明的一目的係用於設置一簡化的平面燈( 在可見光及/或UV (紫外光)範圍發射),尤其是其製 造與工業要求相容(容易及/或製造速度,殘料率低), 卻不用犧牲其光學性能(均勻性及/或效率)或增加其電 201005789 力消耗。 因此,本發明設置一平面場發射燈,其在可見光及/ 或紫外光範圍傳送輻射,包含: -第一和第二大體上平面的介.電壁,其彼此面對,並 且具有保持大體上平行和隔開之主要表面,燈具有周圍密 封,如此界定真空下的內部空間; -第一電極,被稱作陽極,位在平行於主要表面的平 φ 面中並且與第一壁結合,組裝包含第一壁和陽極,其爲透 明或通常在可見光及/或紫外光範圍是透明的; -至少一磷光體材料,藉由電子轟擊而發射可見光及 /或紫外光輻射(又稱作陰極發光材料),材料在第一壁 的內面上(例如沈積在此面上),並且比陽極更接近內部 空間; -第二電極,被稱作陰極,位在平行於主要表面的平 面中; -電子發射材料,具有比ίο大的形狀因子,材料在 陰極上(直接在頂部或不是),及較佳是定義複數發射區 :及 -電子加速元件,插入在第一和第二壁之間且與第一 壁隔開,位在約平行於主要表面的平面中,並且具有讓該 等電子通過的複數隙孔, 該元件包含有孔、本質上是礦物的介電板及/或非連 續琺瑯爲基的介電層,隙孔露在被稱作自由面之至少主要 面上,與第一壁的內面(11)相對,及其中, 201005789 -就該電子轟擊而言,有孔的板或該非連續琺瑯爲基 的層在其自由面上攜帶第三電極,其形成加速電極,或該 板或非連續琺瑯爲基的層具有極化表面,如此產生電子加 速剩餘電場(即、被動組態), -陰極在第二壁的內面上,及/或當有孔的板之隙孔 被選定爲盲孔時,在板之隙孔的底面中。 經由使用有孔、本質上是礦物的介電板或加速琺瑯層 (在外表面上),根據本發明的燈較簡易並且較不昂貴。 爲了形成板的隙孔(被選用塗佈),或者非連續琺瑯 爲基的層,可立即省掉通常用於習知技術的顯示螢幕以形 成小像素之光致微影技術,蝕刻從絕緣層所形成之多層塗 層,習知技術的加速金屬層,及傳統上藉由物理汽相沈積 或PVD (濺鍍、蒸發等)所沈積的層,此技術是必要的。 爲了形成根據本發明的塗佈有加速電極之有孔的板, 可在實心板上產生全層(藉由任何膜沈積技術:物理汽相 沈積或PVD、化學汽相沈積或CVD、液體沈積等),然後 可在組裝上產生隙孔。另一選擇是,可在塗佈有加速電極 之前產生隙孔。 在主動組態中,可在陰極上連續沈積如下(在第二壁 的內面上較佳): -介電琺瑯層;及 -導電琺瑯層。 在被動組態中,可在陰極上形成極化琺瑯層(在第二 壁的內面上較佳)。 -8- 201005789 陰極本身亦可由導電琺瑯製成,尤 導電琺瑯之琺瑯完全相同》 根據本發明,“琺瑯”一詞意謂,藉 得的至少部分玻璃狀層,選用地混合有 需要的話是導電的,塡料,接著燃燒該 前將玻璃料與將在燃燒期間被去除之通 合劑混合。 可藉由各種選擇的沈積技術來沈積 狀層,即、在某些預定間隔區(攜帶電 ),以避免任何結構或任何遮蓋,尤其 光致微影步驟。尤其是選擇液體沈積法 噴墨印刷,壓力墊片印刷等。 有孔的板及/或琺瑯層之隙孔可以 米或甚至豪米大小,最特別的是,不需 發光或背光應用,藉以給予較大的製造 # 較佳的是,透過與加速層相對的面 現存的處理通常需要形成稍微圓錐的隙 (最寬的部分)位在產生隙孔的側邊上 層相對的面產生隙孔,如此發射材料暴 場。 典型上,有孔的板或琺瑯爲基的層 、最小及/或最大的寬度(和因此板的 ),等於或大於ΙΟμιη,或等於或大於 於或大於1 mm。 其是與加速電極的 由沈積玻璃料所獲 ,例如礦物的,若 熔塊。可在沈積之 常有機的或媒介結 根據本發明之玻璃 子發射材料的空間 是如上面所指出的 ,諸如絲網印刷或 相當寬,尤其是微 要形成像素的一般 自由度。 來製造隙孔。各種 孔,圓錐體的基座 。藉由透過與加速 露至非常強的加速 之隙孔可具有平均 平面中之特性尺寸 1 ΟΟμιη,或甚至等 -9- 201005789 依據用於形成隙孔的方法,可在極化下方的加速層或 板之後或之前使板有隙孔。 藉由使用例如雷射(尤其是毫微微秒)蝕刻,機械切 割,尤其是利用鑽石鋸,噴沙或使用高壓噴射(水或其他 液體)。 爲了硏磨可能的V形邊緣及獲得大體上直線的側壁, 可例如藉由適當的玻璃化學蝕刻、例如酸(HF )蝕刻,藉 由電漿蝕刻(RIE等),或離子轟擊蝕刻(IBE等)來完 成操作。 隙孔可以是延長的隙孔,尤其是拉長及大體上直線的 帶,及/或點狀,尤其是幾何形狀(圓形、方形、矩形、 橢圓形等)。 隙孔不一定要具有相同大小或形狀。然而,隙孔大體 上均勻分佈在板的表面上較佳,例如線或矩形或圓形點的 週期性陣列,或多個陣列(雙週期性陣列),或者假週期 性或不定期陣列。 板及/或非連續琺瑯層的一或多個相當延長的區可以 沒有隙孔,以產生例如差異發光(例如,交替的黑暗區及 光亮區)。 隙孔具有約等於發射區的尺寸之尺寸較佳。這些隙孔 之間的平均間隔可以是微米的等級,或至少約ΙΟΟμιη或甚 至毫米大小更好。兩隙孔之間的間隔可等於或大於隙孔的 寬度。隙孔的橫向邊緣(側壁)可以大體上是直線的,約 垂直於第二壁的內面。 -10- 201005789 像根據本發明的琺瑯層之礦物板,尤其是玻璃,具有 良好的機械和耐熱性,並且經得起電子蟲擊和密封操作, 同時又不昂貴。 根據本發明的燈可以是大尺寸,例如具有至少0.1或 甚至lm2的面積。 較佳的是,在該可見光及/或UV輻射的峰値四周之 根據本發明的燈之傳輸因子(至少在第二壁側上)等於或 φ 大於50%,等於或大於70%及甚至等於或大於80%更好。 板可以是撓性的,半剛性的,但是剛性的較佳。其爲 半支撐部分,由一或多個部位所組成,與層作區分。 而且,根據本發明之有孔的礦物介電板亦爲金屬網柵 較佳,由於較容易插入及適於密封。在習知技術中,爲了 足以堅固到能夠經得起製造期間的熱循環、真空和電子轟 擊,實際上利用由Invar®的網柵,係以鎳和鐵爲基的昂貴 材料。 ^ 根據本發明之使用有孔的礦物介電板亦具有提供製造 彈性的優點:可在安裝板之前或之後沈積電子發射材料, 尤其是將其黏附到第二壁之前或之後。 有利的是,板可以選自陶瓷、玻璃陶瓷或玻璃爲基的 材料,尤其是鹼石灰矽土玻璃。 較佳的是,壁及/或選用的有孔的板可以是玻璃片, 其是鹼石灰矽土玻璃(特別是當壁本身未極化時),尤 其是用於燈。 在UV燈的例子中,壁或有孔的板可由適當玻璃製成 -11 - 201005789 或由石英製成較佳。 板可以是薄的,例如具有1 mm或更少的厚度,尤其 是當將其裝附於第二壁時。在自我支撐的玻璃板之例子中 ,其厚度在0.7和3mm之間較佳。 在一或多個非連續琺瑯層的例子中,每一層的厚度( 無論是介電還是導電層)可以非常小,典型上在1和50 微米之間,尤其是在5和20微米之間,以及甚至在1〇和 15微米之間。 可將板製成一片或甚至非連續的較佳,可以是相當長 的任何幾何形狀(矩形、方形等)之複數板部位的形式, 以隙孔連續隔開這些部位。可將這些板部位均勻分佈較佳 〇 必須將燈緊密密封,可能以各種方式產生周圍密封: -藉由一至少密封:聚合(矽氧烷等)密封或礦物( 玻璃料等)密封; -藉由接合到壁(及/或接合到板)的至少一周圍框 ,例如藉由膜的熱密封或甚至黏附結合,礦物膜較佳,諸 如玻璃料等,該膜的厚度爲幾百μιη或甚至更少,框亦能 夠選用地當作間隔物,或取代一或多個分離的間隔物。 藉由至少一密封來達成密封較佳,尤其是本質上爲礦 物的密封。 可透過第一和第二壁的內面而將密封產生在例如第一 和第二壁之間,有孔的板是在內部空間並且具有小於第二 壁的尺寸。 -12- 201005789 亦可將密封產生在板的自由面(選用地爲第二壁的內 面)和第一壁的內面之間。 此外,因此選擇具有熱漲係數接近或類似於第一壁的 熱漲係數之板材料較佳。然後板具有約等同或大於壁的尺 寸之尺寸。 而且,可改變有孔的板之配置。 在第一組態中,有孔的板與第二壁隔開(透過真空) • ,及隙孔露在與自由面相對的面上(相對面被稱作底面) 〇 因此提供雙重周圍密封,也就是說在有孔的板之自由 面和第一壁的內面之間的第一密封,以及有孔的底面和第 二壁的內面之間的第二密封。 典型上,可藉由幾mm或更少的距離將板與第二壁隔 開,及藉由幾mm或更少的距離與第一壁隔開。 在此雙重密封組態中,選用的加速電極整合到玻璃( # 強化玻璃)較佳,或者仍在底面上更好,及爲導電層的形 式較佳。 隙孔可以是肓孔,其產生在形成第二壁較佳的板上。 如此,在第二組態中,第二壁係由具有盲孔之有孔的 板(即、不露在底面上)所組成,但是露在第二壁的至少 一和同一邊緣上較佳,及陰極以導電層的形式位在隙孔的 底面中,並且較佳的是透過該凹下(橫向或縱向)邊緣來 供應,以幫助周圍電連接》 在陰極上,因此將發射材料覆蓋在這些隙孔的底面中 -13- 201005789 ,若需要的話形成催化劑,或能夠以催化劑覆蓋在其上。 肓孔,尤其是露出的盲孔,可以是任何(多邊、圓形 、橢圓形等)形狀,並且爲溝槽形式較佳。溝槽可以或不 用相互平行,以約固定的(矩形、方形等)輪廓或不用亦 可。溝槽可以相當長,尤其是爲由幾部分所製成的路徑之 形式,因此露在兩相對或毗連邊緣上較佳,以幫助周圍電 連接。 在第三組態中,透過本質上是礦物的鏈結機構將板的 底面固定至第二壁的內面。 此鏈結可以是周圍、局部(有限制)的區域(藉由黏 附劑的點等),但是此鏈結分佈在板的整個表面上較佳, 例如板和第二壁之間的層。 第二壁和有孔的板之間的此鏈結必須與燈的製造處理 (真空產生、加熱等)相容。 如此,銅鋅合金焊接或焊接(以鎳、鉻、銦、金、錫 等爲基)或陽極密封此密封熔塊類型或任何其他材料之如 此具有良好耐熱和機械的本質上是礦物的鏈結機構,尤其 是玻璃料較佳。 當將密封產生在板和第一壁之間,第二壁和有孔的板 之間的鏈結維持密封,及液態水及/或水蒸氣無法滲透此 鏈結。 就密封形式之周圍密封而言,以及就第二壁/板的鏈 結(無論是分離或延伸的鏈結)而言,可使用相同材#, 例如藉由絲網印刷所沈積的玻璃料。 -14- 201005789 爲了簡化,在此第三實施例中,隙孔露在與自由面以 及陰極相對的面上較佳(因此爲底面),以及第二壁的內 面包含外部導電層,係由第二壁和有孔的板之間的導電鏈 結材料所製成,以至少部分形成陰極及/或用於發射材料 的生長之催化劑當作一層。 如此,此層至少爲雙功能層(具有與電耦合之鏈結功 能及/或生長催化劑功能)。其在發射區下方及板下方。 直接在內面上的單層較佳之外層可有利地由選自鎳、 鉻、鐵、鈷、及其混合物(尤其是NiCr)的材料所製成。 發射材料的形狀因子對應於其寬度(若可變的話爲最 高寬度)對其高度(若可變的話爲最大高度)之比率。 材料可以是各種形式的:絲狀、管狀、圓錐形。發射 材料可以是尖端形式,尤其是金屬尖端,典型上係由鎢所 製成,及它們可以是微米或甚至次微米大小。可將這些尖 端指向第一壁較佳,及尤其是面對第一壁約90°。 發射材料亦可以氧化鋅奈米線爲基。此種奈米線的典 型尺寸如下:長度範圍從1至10微米、3至5微米較佳, 及直徑範圍從50至500奈米、100至300 nm較佳。 可有利地在低溫中藉由電化學沈積來獲得這些氧化鋅 奈米線。Langmuir 2008,24,9707-9716 之 Pradhan 等人的 標題爲“藉由直接電沈積之塗佈有氧化銦錫的玻璃上之二 維和一維ZnO奈米結構的受控生長”之出版品特別說明此 類型的處理,其中ZnO奈米線沈積在玻璃基板上,此玻璃 基板係藉由將其浸泡到鋅硝酸鹽(Zn( N〇3 ) r6H20 )溶 -15- 201005789 液並且建立相對於相對電極的電位差-1.1 V而塗佈有混合 的氧化銦錫(ITO)之導電層。 發射材料亦可以片狀的非晶碳爲基,尤其是石磨碳, 或奈米管形式更好。 碳奈米管層的厚度典型上可從lOOnm到一微米的等級 ,即、在1和ΙΟμιη之間。奈米管的寬度典型上爲lOnm 的等級。 寬高比等於或大於1〇〇較佳,或甚至等於或大於1000 〇 在所選定的基板相容之溫度中,可藉由任何已知的方 法來沈積碳奈米管: -PECVD (電漿增強型化學汽相沈積),尤其是透過 大氣電漿(AP-PECVD ),如 Surface and Coatings Technology 20 1, ( 2007 ),第 53 78-53 82 頁之 Se-JinAlso known is a field emission based flat panel lamp for backlighting of an LCD (Liquid Crystal Display) screen. Document US 2007/0228928 A1 is provided with a launching lamp, package 9 comprising: - an anode, in the form of a mixed indium tin oxide (ITO) based conductive layer deposited on the inner face of the first glass sheet, supplied a positive voltage, and a phosphor layer capable of generating white light under electron bombardment; a cathode, which is a conductive layer deposited on the inner surface of the second glass piece, is supplied with a negative voltage, and the layer is patterned, That is, in the form of a strip of electrodes; - a microtip for electron emission, which is located on the strip of the electrode; and - a multilayer coating formed from a dielectric layer covered with a metal layer forming a gate or an accelerating electrode The multilayer coating is in the form of a strip that intersects the anode strip. -5- 201005789 and 'Elsevier Publishing, Vol. 74 (2004), pp. 105-111, document by D. Lee et al. entitled "Vacuum Packaging of Planar Lamps Using Thermally Grown Carbon Nanotubes" Reveals Plane Field emission lamp (see Figure lb), used for backlighting of liquid crystal panels, using: - wall, soda lime silicate glass; - a series of phosphors, respectively emitting red, green, and blue to produce white light; - anode, ITO a cathode, a Ti/Cr (titanium/chromium) multilayer covered with Fe (iron) or Ni (nickel) catalyst for growth of an emissive material; - an electron emissive material, carbon naphthalene deposited on a catalyst at a high temperature a tube (CNT): and an accelerating electrode inserted in a metal grid parallel to the inner space of the glass sheet and connected through the second glass sheet by contact transmission, and having a hexagonal gap of 250 μm in diameter with a mesh wall width of 30 μm The form of the hole array (see Figure lb). With this triode type technology, the applied voltage is lowered. The above-described planar field emission lamps undoubtedly have advantages in terms of compactness and optical performance, but they are still complicated or even troublesome. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a simplified planar light (transmitting in the visible and/or UV (ultraviolet) range), particularly that its manufacture is compatible with industrial requirements (easy and/or manufactured). Speed, low residual rate), without sacrificing its optical performance (uniformity and / or efficiency) or increasing its power consumption of 201005789. Accordingly, the present invention provides a planar field emission lamp that transmits radiation in the visible and/or ultraviolet range, comprising: - first and second substantially planar dielectric walls that face each other and have a substantially Parallel and spaced apart major surfaces, the lamp has a surrounding seal that defines the internal space under vacuum; - a first electrode, referred to as the anode, located in a flat φ plane parallel to the major surface and bonded to the first wall, assembled Including a first wall and an anode that is transparent or generally transparent in the visible and/or ultraviolet range; at least one phosphor material that emits visible and/or ultraviolet radiation by electron bombardment (also known as cathodoluminescence) Material), the material is on the inner surface of the first wall (eg deposited on this surface) and is closer to the internal space than the anode; - the second electrode, referred to as the cathode, lies in a plane parallel to the main surface; An electron-emitting material having a shape factor larger than ίο, a material on the cathode (directly on top or not), and preferably defining a plurality of emitter regions: and - an electron acceleration component, inserted in the And between the second wall and spaced apart from the first wall, in a plane approximately parallel to the major surface, and having a plurality of apertures through which the electrons pass, the element comprising a porous, substantially mineral dielectric a plate and/or a discontinuous germanium-based dielectric layer, the aperture being exposed on at least a major face referred to as a free face, opposite the inner face (11) of the first wall, and wherein, 201005789 - the electron bombardment In particular, the apertured plate or the discontinuous ruthenium-based layer carries a third electrode on its free face, which forms an accelerating electrode, or the plate or discontinuous ruthenium-based layer has a polarized surface, thus generating electron acceleration The residual electric field (i.e., passive configuration), - the cathode is on the inner face of the second wall, and/or when the aperture of the perforated plate is selected as a blind hole, in the bottom surface of the slot of the plate. The lamp according to the invention is simpler and less expensive via the use of a porous, essentially mineral-like dielectric plate or an accelerated enamel layer (on the outer surface). In order to form the aperture of the board (selected coating), or a discontinuous germanium-based layer, the photolithographic technique commonly used in conventional display screens to form small pixels can be omitted, etching from the insulating layer. This technique is necessary for the multilayer coating formed, the accelerated metal layer of the prior art, and the layers conventionally deposited by physical vapor deposition or PVD (sputtering, evaporation, etc.). In order to form a perforated plate coated with an accelerating electrode according to the present invention, a full layer can be produced on a solid plate (by any film deposition technique: physical vapor deposition or PVD, chemical vapor deposition or CVD, liquid deposition, etc.) ), then a gap can be created in the assembly. Alternatively, a gap can be created prior to application of the accelerating electrode. In an active configuration, the cathode can be deposited as follows (preferably on the inner face of the second wall): - a dielectric layer; and - a conductive layer. In a passive configuration, a layer of polarized germanium can be formed on the cathode (better on the inner face of the second wall). -8- 201005789 The cathode itself can also be made of conductive crucible, especially the same as the conductive crucible. According to the invention, the term "珐琅" means that at least part of the glass layer borrowed is selectively conductive if necessary. The mash, which is then burned, is then mixed with a binder that will be removed during combustion. The layer may be deposited by a variety of selective deposition techniques, i.e., at certain predetermined spacers (carrying electricity) to avoid any structure or any occlusion, particularly photolithographic steps. In particular, liquid deposition methods such as inkjet printing, pressure pad printing, and the like are selected. The apertured plate and/or the aperture of the enamel layer may be of a meter or even a megameter size, most particularly, without the need for illumination or backlighting, thereby giving greater manufacturing. Preferably, the aperture is opposite to the acceleration layer. The existing processing of the face typically requires the formation of a slightly conical gap (the widest portion) that creates a gap in the opposite side of the upper side of the slot where the gap is created, thus emitting a material burst. Typically, the apertured plate or ruthenium-based layer, the minimum and/or maximum width (and thus the plate), is equal to or greater than ΙΟμηη, or equal to or greater than or greater than 1 mm. It is obtained from a deposited frit with an accelerating electrode, such as a mineral, if a frit. The space of the glass-emitting material according to the present invention may be as indicated above, such as screen printing or relatively wide, especially the general degree of freedom in which pixels are formed. To make the aperture. Various holes, the base of the cone. The aperture of the average plane can be obtained by the transmission and acceleration to the very strong acceleration aperture 1 ΟΟμιη, or even -9-201005789 depending on the method used to form the aperture, the acceleration layer below the polarization or The plate has a gap after or before the plate. Mechanical cutting is performed by using, for example, laser (especially femtosecond) etching, especially with a diamond saw, sandblasting or using high pressure jets (water or other liquid). In order to honing possible V-shaped edges and obtaining substantially straight sidewalls, for example by suitable glass chemical etching, such as acid (HF) etching, by plasma etching (RIE, etc.), or ion bombardment etching (IBE, etc.) ) to complete the operation. The apertures may be elongated apertures, especially elongated and substantially straight strips, and/or dots, especially geometric shapes (circular, square, rectangular, elliptical, etc.). The apertures do not have to have the same size or shape. However, the apertures are generally evenly distributed over the surface of the panel, such as a periodic array of lines or rectangular or circular dots, or multiple arrays (bi-periodic arrays), or pseudo-periodic or irregular arrays. One or more relatively elongated regions of the plate and/or discontinuous layer may have no apertures to create, for example, differential illumination (e.g., alternating dark and bright regions). The aperture has a size which is approximately equal to the size of the emitter. The average spacing between the apertures may be on the order of microns, or at least about ΙΟΟμηη or even mm. The spacing between the two apertures may be equal to or greater than the width of the aperture. The lateral edges (side walls) of the apertures may be substantially rectilinear, approximately perpendicular to the inner faces of the second walls. -10-201005789 Mineral sheets such as enamel layers according to the present invention, especially glass, have good mechanical and heat resistance and are resistant to electronic insects and sealing operations while being inexpensive. The lamp according to the invention may be of a large size, for example having an area of at least 0.1 or even lm2. Preferably, the transmission factor of the lamp according to the invention (at least on the second wall side) around the peak of the visible light and/or UV radiation is equal to or greater than 50%, equal to or greater than 70% and even equal to Or better than 80%. The plates can be flexible, semi-rigid, but stiffer. It is a semi-supported portion consisting of one or more parts, distinguished from the layers. Moreover, the perforated mineral dielectric plate according to the present invention is also preferably a metal mesh because it is easier to insert and suitable for sealing. In the prior art, in order to be strong enough to withstand thermal cycling, vacuum and electron bombardment during manufacturing, the grid of Invar® is actually utilized, which is an expensive material based on nickel and iron. The use of a porous mineral dielectric plate according to the present invention also has the advantage of providing manufacturing flexibility: the electron-emitting material can be deposited before or after the mounting of the plate, especially before or after adhering it to the second wall. Advantageously, the plates may be selected from ceramic, glass ceramic or glass based materials, especially soda lime alumina glass. Preferably, the wall and/or the apertured plate selected may be a glass sheet which is a soda lime alumina glass (especially when the wall itself is not polarized), particularly for lamps. In the case of a UV lamp, the wall or perforated plate may be made of a suitable glass -11 - 201005789 or preferably made of quartz. The plate may be thin, for example having a thickness of 1 mm or less, especially when attached to the second wall. In the case of a self-supporting glass plate, the thickness is preferably between 0.7 and 3 mm. In the case of one or more discontinuous tantalum layers, the thickness of each layer (whether dielectric or conductive) can be very small, typically between 1 and 50 microns, especially between 5 and 20 microns. And even between 1 and 15 microns. Preferably, the sheets may be formed into one piece or even discontinuous, and may be in the form of a plurality of geometrical shapes (rectangular, square, etc.) of a plurality of plates, with the apertures continuously separating the portions. It is preferable to evenly distribute the plate parts, the lamp must be tightly sealed, and the surrounding seal may be produced in various ways: - by at least one seal: a polymer (halogen oxide, etc.) seal or a mineral (glass frit, etc.) seal; The mineral film is preferably bonded to the at least one surrounding frame of the wall (and/or to the plate), for example by heat sealing or even adhesion of the film, such as glass frit, etc., the film having a thickness of several hundred μm or even Fewer, the frame can alternatively be used as a spacer or in place of one or more separate spacers. Sealing is preferably achieved by at least one seal, especially a mineral seal. The seal can be created, for example, between the first and second walls through the inner faces of the first and second walls, the apertured plates being in the interior space and having a smaller dimension than the second wall. -12- 201005789 It is also possible to create a seal between the free face of the plate (optionally the inner face of the second wall) and the inner face of the first wall. Further, it is therefore preferred to select a plate material having a coefficient of thermal expansion that is close to or similar to the coefficient of thermal expansion of the first wall. The panel then has a size that is approximately equal to or greater than the size of the wall. Moreover, the configuration of the perforated plate can be changed. In the first configuration, the apertured plate is spaced from the second wall (through vacuum) and the aperture is exposed on the opposite side of the free surface (the opposite side is referred to as the bottom surface), thus providing a double surrounding seal, That is, a first seal between the free face of the apertured plate and the inner face of the first wall, and a second seal between the bottom surface of the aperture and the inner face of the second wall. Typically, the panel can be separated from the second wall by a distance of a few mm or less and from the first wall by a distance of a few mm or less. In this double seal configuration, the optional accelerating electrode is preferably integrated into the glass (# reinforced glass), or is still better on the bottom surface, and is preferably in the form of a conductive layer. The aperture may be a bore that is produced on a preferred plate forming the second wall. Thus, in the second configuration, the second wall is composed of a perforated plate having blind holes (ie, not exposed on the bottom surface), but is preferably exposed on at least one and the same edge of the second wall. And the cathode is located in the bottom surface of the aperture in the form of a conductive layer, and is preferably supplied through the concave (lateral or longitudinal) edge to assist in the electrical connection on the cathode, thus covering the emissive material The bottom surface of the aperture is -13 to 201005789, forming a catalyst if necessary, or capable of covering it with a catalyst. The pupil, especially the exposed blind hole, may be of any (polygonal, circular, elliptical, etc.) shape and is preferably in the form of a groove. The grooves may or may not be parallel to each other to be approximately fixed (rectangular, square, etc.) contours or not. The grooves can be quite long, especially in the form of paths made of several parts, so that it is preferred to be exposed on opposite or adjoining edges to aid in electrical connection. In a third configuration, the bottom surface of the panel is secured to the inner surface of the second wall by a chain mechanism that is essentially mineral. The link may be a peripheral, local (restricted) area (by the point of the adhesive, etc.), but the link is preferably distributed over the entire surface of the panel, such as a layer between the panel and the second wall. This link between the second wall and the perforated plate must be compatible with the manufacturing process (vacuum generation, heating, etc.) of the lamp. Thus, the copper-zinc alloy is welded or welded (based on nickel, chromium, indium, gold, tin, etc.) or the anode is sealed. This sealed frit type or any other material has such good heat and mechanical properties that it is a mineral chain. Institutions, especially frits, are preferred. When a seal is created between the plate and the first wall, the chain between the second wall and the apertured plate remains sealed and liquid water and/or water vapor cannot penetrate the chain. For the surrounding seal of the sealed form, and for the chain of the second wall/board (whether the separated or extended chain), the same material # can be used, for example by screen printing the deposited frit. -14- 201005789 For the sake of simplicity, in this third embodiment, the aperture is preferably exposed on the face opposite the free face and the cathode (and thus the bottom face), and the inner face of the second wall comprises an outer conductive layer. The conductive chain material between the second wall and the apertured plate is formed as a layer that at least partially forms the cathode and/or the catalyst for the growth of the emissive material. As such, the layer is at least a bifunctional layer (having a link function with electrical coupling and/or a growth catalyst function). It is below the launch area and below the board. The preferred outer layer of the single layer directly on the inner surface may advantageously be made of a material selected from the group consisting of nickel, chromium, iron, cobalt, and mixtures thereof, especially NiCr. The shape factor of the emissive material corresponds to the ratio of its width (if the variable is the highest width) to its height (if variable, the maximum height). The material can be in various forms: filamentous, tubular, conical. The emissive material can be in the form of a tip, especially a metal tip, typically made of tungsten, and they can be micron or even sub-micron in size. Preferably, the tips are directed toward the first wall, and in particular about 90° to the first wall. The emissive material can also be based on a zinc oxide nanowire. Typical dimensions of such nanowires are as follows: lengths ranging from 1 to 10 microns, 3 to 5 microns, and diameters ranging from 50 to 500 nm, and 100 to 300 nm are preferred. These zinc oxide nanowires can advantageously be obtained by electrochemical deposition at low temperatures. The publication of Pradhan et al., Langmuir 2008, 24, 9707-9716, entitled "Controlled growth of two-dimensional and one-dimensional ZnO nanostructures on glass coated with indium tin oxide by direct electrodeposition" is particularly This type of treatment is illustrated in which a ZnO nanowire is deposited on a glass substrate by soaking it into zinc nitrate (Zn(N〇3)r6H20) solution -15-201005789 and establishing relative relative The potential difference of the electrodes was -1.1 V and a conductive layer of mixed indium tin oxide (ITO) was applied. The emissive material can also be based on a sheet of amorphous carbon, especially in the form of stone-milled carbon or nanotubes. The thickness of the carbon nanotube layer can typically range from 100 nm to one micron, i.e., between 1 and ΙΟμιη. The width of the nanotube is typically on the order of lOnm. The aspect ratio is preferably equal to or greater than 1 〇〇, or even equal to or greater than 1000 〇. The carbon nanotubes can be deposited by any known method at a temperature compatible with the selected substrate: - PECVD (plasma) Enhanced chemical vapor deposition), especially through atmospheric plasma (AP-PECVD), such as Surface and Coatings Technology 20 1, (2007), pp. 53 78-53 82 Se-Jin

Kying等人的標題爲“藉由使用NiCr催化劑的大氣壓力增 強型化學汽相沈積之碳奈米管的生長”之出版品所說明一 般。 -熱生長沈積,如同在已引用的習知技術文件中’由 Ijin Nanotech Co. Ltd 所完成的,由 Lee 等人; - 絲網印刷沈積,例如如 Journal of Information Display,Vol. 5,No. 4,2004 由 S Jik-Kwon 等人之標題爲“ 使用光敏CNT電漿所製造之三極管型CNT-FED的特性” 的文件中所說明的一般。 根據本發明可以有兩加速組態。 201005789 在主動組態中,加速電極係爲導電,尤其是金屬層形 式,其在子層上較佳,尤其是以矽土或氮化矽爲基及/或 覆蓋有保護覆蓋層的子層,尤其是矽土或氮化矽覆蓋層。 當作導電層,可選擇金屬層,例如銀層,尤其是以絲 網印刷者的金屬層(銀琺瑯等),或者導電金屬氧化層。 此加速層不一定是實心並且完全覆蓋層。可以是非連 續的,形成導電帶或軌道,尤其是以網柵的形式配置。 φ 此加速層也可以是真空沈積的,尤其是藉由磁電管濺 鎪,在形成隙孔之前或之後,或者藉由絲網印刷或藉由噴 墨印刷來沈積》 當板具有較第二壁微小的尺寸時,可透過金屬化間隔 物或者導電漿糊或黏附劑,藉由第一壁將加速電極供應在 周圍上。 在主動組態中,將一表面極化,藉以尤其能夠進一步 降低操作電壓。 Φ 在第一主動組態中,玻璃板(可能形成第二壁)能夠 本身被極化。在第二、新的被動組態中,板(例如由玻璃 或石英所製成及/或可能形成第二壁)可包含極化層。此 層可例如以矽土爲基。極化層亦可以是極化琺瑯。選用地 ,板亦可被極化。極化層的厚度可例如唯一微米的等級。 較佳的是,選擇矽土層,尤其是藉由極化管濺鍍或藉 由蒸發,或者藉由化學汽相沈積(CVD ),在真空下所沈 積的。在形成隙孔之前或之後沈積矽土層。 極化層亦可是琺瑯,尤其是從藉由選擇性沈積技術所 -17- 201005789 沈積的玻璃狀材料所製成’沈積技術係諸如絲網印刷,噴 墨印刷、或其他印刷等,如曾見到一般。 在第三、新的被動組態中,直接在陰極上的極化層是 極化琺瑯。 如此’出乎預料的’可將琺瑯爲基的層(藉由燃燒玻 璃料所形成)極化。 通常“極化材料”一詞被瞭解作意謂:具有剩餘電場在 其表面的至少其中之一上的材料。延伸之下,材料的“極 化表面”一詞(裝附層及/或板)被定義作,產生剩餘電 場的子表面區。將剩餘電場導向垂直於材料的表面較佳。 通常藉由將加熱材料置放在強力電場之處理來產生。特別 將某些玻璃、晶體、或聚合物極化(經過極化處理),以 給予它們非線性的光學特性,尤其是第二諧波產生特性。 在玻璃的例子中(例如非晶矽玻璃),剩餘場係由於陽離 子的遷移,尤其是鹼性金屬離子(Li+、Na+、K +等)或鹼 性土金靥離子(Mg2+、Ca2+、Sr2+、Ba2 +等)。在玻璃的 最外表面中之陽離子的此局部耗盡產生極強烈的內部電場 。由於被限定成非常小的厚度(有時爲幾微米的等級), 極化又產生非常強的剩餘場。 在 Optical Letters, Vol. 161,1 9 9 1,第 1 7 3 2 頁之 R. A. Myers的出版品中已說明經由電場的活動在玻璃中存在當 作雜質鈉之離子的遷移。 較佳的是,從玻璃(尤其是,矽土爲基的玻璃)和玻 璃陶瓷選擇極化材料。“矽土爲基的玻璃”一詞被瞭解作意 201005789 謂含有至少50重量百分比的Si02在其化學組成中之玻璃 〇 礦物材料較佳,尤其是因爲在密封操作期間它們的強 度。玻璃,尤其是在它們之中出現矽土玻璃(又稱作非晶 砂土)的砂土爲基之玻璃特別有利。 較佳的是,極化材料(從玻璃料或習知層所獲得)是 包含低於1重量百分比的鹼性金屬氧化物之矽土爲基的玻 璃。尤其是,包含矽土和諸如CaO、MgO、SrO、BaO等 鹼性土金屬氧化物的玻璃。純矽土事實上具有非常高的熔 點(1 700°C以上),藉以需要使用非常昂貴的熔化處理β 鹼性土金屬氧化物的添加能夠降低熔點,並且能夠利用習 知用於製造玻璃術之熔化處理。又能夠在1700°C或以下, 或甚至1 600°C的溫度中生產這些玻璃。驗性金屬氧化物( Li2〇、Na20、K20 )的存在又有助於使其更容易熔化玻璃 。然而,它們的總含量限制到低於1重量百分比較佳,因 Ο 爲當它們大量存在時,會降低剩餘場的使用期限。矽土爲 基的玻璃又含有其他氧化物,諸如αι2ο3、或β2ο3等,後 者使其更容易熔化玻璃。有利的是,矽土爲基的玻璃可具 有申請案ΕΡ 1 43 3 758所說明之組成的其中之一。 極化產生剩餘電場在介電材料的至少一表面上(被稱 作極化表面),厚度在0.5和50微米之間較佳,尤其是 在5和20微米之間》通常,極化處理在於,經由之間( 並且與之接觸)置放欲極化的材料之兩平面電極產生幾百 或幾千伏特的等級之電壓。通常將材料加熱至範圍從約 -19- 201005789 100 °C至約500 °c的溫度,典型上約300 °C,以促進陽離子 朝陰極遷移。 較佳的是,由極化所產生的剩餘電場在〇·01和1 GV/m之間,尤其是在0.1和1 GV/m之間。 而且,電極可改變位置和性質。電極(陽極及/或陰 極及/或選用的加速層)可以是層的形式。 除非特別指明,否則在本發明中,“層”一詞可表示單 層或多層。 除非特別指明,否則導電層(陽極及/或陰極及/或 選用的加速層)可藉由精於本技藝之人士已知的任何機制 來沈積,諸如藉由液相沈積等,尤其是藉由絲網印刷或噴 墨印刷,真空沈積(蒸發或極化管濺鍍)或藉由熱解(透 過粉末或蒸汽(CVD))。 陰極可大體上覆蓋第二壁的整個內面(除了邊緣以外 )。陰極可包含(或甚至由其組成)導電層。 陰極可以是連續或非連續的,尤其是僅在給定的發射 區,例如以引導軌道或帶的形式(無論有孔與否)。可特 別以網柵的形式配置陰極。 陰極並不一定是透明的,或者是全透明的。當作非透 明電極材料(無論是層與否),能夠使用例如金屬材料, 諸如鎢、銅、或鎳等。 更特別的是,陰極可以是金屬導電層,其選用地形成 用於發射材料的薄膜生長之催化劑當作一層,尤其是選自 鎳、鉻、鐵、鈷和其混合物的材料。 201005789 然而,可想像陰極爲透明(在可見光中)的全層及係 爲 · -以純或合金金屬的薄層爲基,尤其是銀,選用地在 純粹或混合及/或摻雜的導電氧化物所製成的兩層之間, 其形成透明多層;或者 -以純粹或混合及/或摻雜的導電金屬氧化物爲基, 諸如摻雜氟的氧化錫或混合的銦錫氧化物(ITO )。 Φ 也能夠選擇LiF層當作陰極。 選用的加速電極可大體上覆蓋板的整個自由面。加速 電極可以是連續或非連續的,以帶的形式(有孔或沒有孔 ),及可以網柵的形式配置。加速電極可以編織或未編織 的線爲基,或者以實心或鑲邊的帶子爲基,例如部分倂入 到板內。 在主動的組態中,加速電極可以金屬粒子或奈米粒子 爲基,尤其是金及/或銀或導電氧化物粒子或奈米粒子, 該粒子或奈米粒子是在結合劑中較佳,在礦物結合劑中更 好。加速電極尤其可以是在燃燒後包含玻璃狀結合劑和金 屬粒子或奈米粒子之琺瑯的一層。此導電層,尤其是以琺 瑯的形式,可例如藉由絲網印刷或藉由噴墨印刷來沈積。 關於陽極,此可由讓可見光及/或UV光能夠通過之 任何透明的導電材料所組成。 陽極可以是: -與第一壁的外面結合,附在(直接或非直接)此面 或與此面整合(藉由任何已知的黏附機構與之接觸或分開 -21 - 201005789 -或者與第一壁的內面結合,尤其是直接沈積在此面 上或子層上; -或者局部整合在表面上或完全在第一壁中(強化玻 璃型)。 如此,陽極可大體上覆蓋第一壁(除了邊緣以外)的 整面(內部或者外部)。陽極如此可以是連續(全層)或 者非連續的,以網柵(就全透明而言)的形式配置之帶( 無論有孔與否)的形式。 較佳的是,形成陽極的導電層是在子層上(鹸性金屬 屏障層,繫層等),尤其是矽土或氮化矽層。 較佳的是,陽極是第一壁的內面上之導電層。陽極可 以是(全)透明的導電層或者相對不透明的非連續層(就 全透明而言)之形式。 具有透明(在可見光中)的全層之形式的陽極較佳及 係爲: -以純或合金金屬的薄層爲基,尤其是銀,選用地在 純粹或混合及/或摻雜的導電氧化物所製成的兩層之間, 其形成透明多層;或者 -以純粹或混合及/或摻雜的導電金屬氧化物爲基, 諸如摻雜氟的氧化錫或混合的銦錫氧化物(ITO)。 不透明(在可見光及/或UV範圍中)之導電層的形 式之陽極可以金屬粒子或奈米粒子爲基,尤其是金及/或 銀粒子或奈米粒子,或導電氧化物粒子或奈米粒子,在結 -22- 201005789 合劑中較佳,及在礦物結合劑中甚至更好。此非連續不透 明導電層可例如藉由絲網印刷或藉由噴墨印刷來沈積。 另一選擇是,以編織或未編織的線爲基,無論相鄰與 否,以實心或鑲邊的帶子爲基等所製成之陽極例如局部倂 入到第一壁或者到外部介電內。 至於UV燈,陽極可以傳送UV輻射的材料爲基。傳 送UV輻射的導電材料可以是一層非常薄的金,例如具有 φ l〇nm的等級之厚度;或者可以是一層非常薄的鹸性金屬 ,諸如鉀、铷、鉋、或鋰等,例如具有0.1至Ιμιη的厚度 :或者由合金製成,例如25%鈉/75%鉀合金。 如上述,若陽極的(及/或陰極的及/或選用的加速 電極的)材料吸收或反射UV及/或可見光,陽極(及/ 或陰極及/或選用的加速電極)被設計成允許總傳送該 UV或可見光輻射。 更精確地說,如此能夠形成約平行的帶,具有寬度11 φ 和以距離dl隔開,Π/dl比可以在10%和50%之間,以允 許在電極側上總UV或可見光傳送至少50%,11/dl比亦能 夠根據結合的壁之傳送來調整。 亦能夠形成本質上延長之導電圖案元件的陣列,諸如 導電線(能夠將其比作非常薄的帶)或實際導電線等,這 些圖案元件能夠大體上爲直線或呈波浪狀,或鋸齒狀等。 可以圖案元件和圖案元件之被稱作12的寬度(在寬度的 數目之例子中爲最大寬度)之間的被稱作pi的給定間距 (在間距的數目之例子中爲最小間距)定義此陣列。兩系 -23- 201005789 列圖案元件可交叉。尤其是可以網柵的形式組織此陣列, 諸如織品、布料等。 此外,如上述,能夠根據想要的透明性,藉由採用 ll/dl比,及/或根據想要的透明性,藉由使用導電圖案 的陣列和藉由採用寬度12及/或間距pi來獲得對UV或 對可見光的全透明。 如此,寬度12對間距pi比可等於5 0%或更少較佳, 等於10%或更少較佳,甚至等於1%或更少更好。 例如,間距pi可在5μιη和2cm之間,在50μιη和 1.5cm之間較佳,及甚至在ΙΟΟμιη和lcm之間更好,以及 寬度12可在Ιμιη和1mm之間,在10和50μιη之間較佳。 當作例子,能夠將導電陣列(以網柵的形式等)用於 玻璃片上或在塑膠片上,例如,PET片,具有在ΙΟΟμιη和 300μιη之間的間距pi,以及10至20μιη的寬度12,或者 至少部分倂入到叠層中間層的傳導導線之陣列,具有間距 pi在1和l〇mm之間,尤其是3mm,以及寬度12在10和 50μιη之間,尤其是在20和30μιη之間。 至於電力供應,可利用正DC電位VI來電供應陽極 ,典型上在1000V和3000V之間,透過外部供應結構( 通常被稱作匯流排)或者至少延伸到外面的供應結構較佳 〇 利用負DC電位V2或零(大地)電位來電供應陰極 ,透過外部供應結構或者延伸到外面的供應結構較佳。 就電力安全而言,可設置電磁防護罩。例如,可設置 -24- 201005789 足夠厚度的介電在陽極上方(僅爲第一壁的厚度或與附加 的透明介電組合之厚度)。亦可以設置比陽極更外面之透 明導電元件’其與陽極電絕緣並且接地。例如’此可以是 透明的導電單層或多層,或者與第一壁的外面結合之全透 明的網柵,陽極是在外面上。而且’此層可具有低E (低 發射率)或陽光控制功能。 在第一實施例中: φ - VI是在1000V和30 00V之間;及 -V2是大地電位。 在第二實施例中: -VI是在500V和150 0V之間;及 -V2是在-500V和-1500V之間。 可以DC電位V3電供應加速電極,典型上在100V和 800V之間。 當然,平面燈可設置有間隔物,尤其是由玻璃製成的 • ,以球等的形式,分佈在表面上。也能夠設置周圍框型的 間隔物,尤其是就小的燈尺寸而言,周圍框能夠選用地用 於密封燈。 可以固定距離將壁保持隔開。壁可以是任何形狀:基 板的外形可以是多角形、凹面或凸面、尤其是方形或矩形 ;或者彎曲的,具有固定或可變的曲率半徑,尤其是圓形 或橢圓形。 較佳的是,第一和第二壁可以爲鹼石灰矽土片或硼矽 酸玻璃。玻璃可以是清澈的或者格外清澈的。 -25- 201005789 至少第一壁可以藉由絲網印刷等加以塗佈及/或處理 ’以提供光學效果,尤其是顏色,裝飾效果,結構性減輕 效果’錯覺效果’擴散層,抗反射塗佈等。 至於UV燈,第—壁可由傳送UV輻射的介電材料製 成。一或兩壁的材料可選自石英、矽土、氟化鎂(MgF2 ) 或氟化鈣(CaF2 )、硼矽酸玻璃或具有小於〇.〇5%Fe203 的玻璃較佳。 就3 mm的厚度而言,例子爲: -氟化鎂或氟化鈣傳送遍及整個UV範圍之大於80% 或甚至90%,即、UVA (在315和380nm之間)、UVB( 在280和315nm之間)、UVC (在200和280nm之間) 、或VUV (在約1〇和200nm之間); -石英和某些高純度矽土傳送遍及整個UVA、UVB、 及UVC範圍之大於8 0%或甚至90% ; -硼矽酸玻璃,諸如Schott的“Borofloat”等,傳送遍 及整個UVA範圍之大於70% ;及 -具有小於〇.〇5%Fe203之鹼石灰矽土玻璃,尤其是 Saint-Gobain 的玻璃 Diamant,Pilkington 的玻璃 Optiwhite,及 Schott的玻璃 B270,它們傳送遍及整個 UVA範圍的大於70%或甚至80%。 然而,諸如 Saint-Gobain Glass所販售的玻璃 Planilux等鹸石灰矽土玻璃超過360nm具有大於80%的傳 送,其對某些實施例和應用是足夠的。 可藉由間隔物將兩壁之間的間隔設定成約〇.3至5mm 201005789 的値,尤其是等於或小於約2mm。從FR-A-2 787 1 3 3得 知用以在真空絕緣上釉單元中沈積間隔物之技術。根據此 方法,將黏附劑的點沈積在玻璃片上,尤其是藉由絲網印 刷所沈積之琺瑯的點,具有等於或小於間隔物的直徑之直 徑,及使間隔物能夠在傾斜較佳的該玻璃片上滾動,使得 單一間隔物黏貼在黏附劑的每一點上。然後將第二玻璃片 塗敷在所沈積的間隔物上和周圍密封》 Φ 間隔物可由非導電材料所製成。較佳的是,它們由玻 璃製成,尤其是鹼石灰型。 根據一實施例,可藉由首先製造中間的空氣腔是在大 氣壓力中之密封的封閉體,然後藉由產生真空,(至少) 高度真空較佳來產生燈。根據此實施例,壁的其中之一, 較佳的是第一壁,在其厚度中具有由礦物密封構件較佳所 阻塞的孔。 所有或部分內面可被塗佈有陰極發光材料。尤其是, Φ 能夠僅提供具有陰極發光材料的某些表面區域,以在給定 的表面上產生預先界定的照明(各別的UV發射)區。照 明區可選用地由裝飾性圖案或陳列所組成,諸如商標或記 號等。 有利的是,可選擇或利用陰極發光材料,以在廣泛的 調色盤內決定照明的顏色。 可選擇一般的磷光體用於燈。就UV燈而言,尤其具 有在UVC中發射之磷光體。例如摻雜鐯或摻雜鉛的材料 ,諸如LaP04: Pr、CaS04: Pb等。亦具有在UVA或近 -27- 201005789 UVB中發射之磷光體。例如摻雜釓的材料,諸如YB03Gd ;YB2〇5 : Gd ; LaP309 : Gd ; NaGdSi04 ; YAI3 ( B03 ) 4 :Gd ; YPO4 : Gd ; YAI03 : Gd ; SrB4〇? : Gd ; LaP04 :The publication of Kying et al., entitled "Growth of Carbon Nanotubes by Atmospheric Pressure Enhanced Chemical Vapor Deposition Using NiCr Catalysts" is generally described. - Thermal growth deposition, as in the cited prior art documents 'by Ijin Nanotech Co. Ltd, by Lee et al; - Screen printing deposition, for example as Journal of Information Display, Vol. 5, No. 4,2004 The general description of the document entitled "Characteristics of Transistor-Type CNT-FED Made Using Photosensitive CNT Plasma" by S Jik-Kwon et al. There are two acceleration configurations available in accordance with the present invention. 201005789 In the active configuration, the accelerating electrode is electrically conductive, especially in the form of a metal layer, which is preferably on the sub-layer, in particular based on alumina or tantalum nitride and/or a sub-layer covered with a protective covering layer, Especially a bauxite or tantalum nitride overlay. As the conductive layer, a metal layer such as a silver layer may be selected, especially a metal layer (silver enamel or the like) of a screen printer, or a conductive metal oxide layer. This acceleration layer is not necessarily solid and completely covered. It may be non-continuous to form a conductive strip or track, especially in the form of a grid. φ This accelerating layer can also be vacuum deposited, especially by magnetron sputtering, before or after the formation of the aperture, or by screen printing or by inkjet printing. In the case of a small size, the accelerating electrode can be supplied to the periphery by the first wall through a metallized spacer or a conductive paste or an adhesive. In the active configuration, a surface is polarized, in particular to further reduce the operating voltage. Φ In the first active configuration, the glass plate (possibly forming the second wall) can be itself polarized. In a second, new passive configuration, a plate (e.g., made of glass or quartz and/or possibly forming a second wall) may comprise a polarizing layer. This layer can be based, for example, on alumina. The polarizing layer can also be a polarization enthalpy. The ground plate can also be polarized. The thickness of the polarizing layer can be, for example, a single micron rating. Preferably, the alumina layer is selected, especially by sputtering with a polarizing tube or by evaporation, or by chemical vapor deposition (CVD), under vacuum. An alumina layer is deposited before or after the formation of the aperture. The polarizing layer can also be germanium, especially from glass-like materials deposited by selective deposition techniques -17-201005789. Deposition techniques such as screen printing, inkjet printing, or other printing, etc. To the general. In the third, new passive configuration, the polarization layer directly on the cathode is a polarization 珐琅. Such an 'unpredictable' can polarize the ruthenium-based layer (formed by the burning of the glass frit). The term "polarized material" is generally understood to mean a material having a residual electric field on at least one of its surfaces. Under extension, the term "polarized surface" of the material (attachment layer and/or plate) is defined to produce a subsurface area of the remaining electric field. It is preferred to direct the residual electric field perpendicular to the surface of the material. This is usually produced by placing the heating material in a strong electric field. In particular, certain glasses, crystals, or polymers are polarized (polarized) to give them nonlinear optical properties, especially second harmonic generation characteristics. In the case of glass (eg amorphous bismuth glass), the remaining field is due to cation migration, especially alkaline metal ions (Li+, Na+, K+, etc.) or alkaline earth lanthanum ions (Mg2+, Ca2+, Sr2+, Ba2 +, etc.). This partial depletion of the cations in the outermost surface of the glass produces a very strong internal electric field. Since it is limited to a very small thickness (sometimes a few microns), the polarization produces a very strong residual field. In the publication of R. A. Myers, Optical Letters, Vol. 161, 1 9 9 1, pp. 1 7 3 2, the migration of ions as impurity sodium exists in the glass via the activity of the electric field. Preferably, the polarizing material is selected from glass (especially alumina-based glass) and glass ceramics. The term "alumina-based glass" is understood to mean that 201005789 is a glass 含有 mineral material containing at least 50% by weight of SiO 2 in its chemical composition, especially because of their strength during the sealing operation. Glass, especially sand-based glass in which alumina glass (also known as amorphous sand) is present, is particularly advantageous. Preferably, the polarizing material (obtained from a frit or a conventional layer) is an alumina-based glass comprising less than 1 weight percent of an alkali metal oxide. In particular, glass containing alumina and alkaline earth metal oxides such as CaO, MgO, SrO, BaO. Pure bauxite actually has a very high melting point (above 1 700 °C), so that the use of very expensive melting treatments, the addition of beta alkaline earth metal oxides, can lower the melting point and can be used to make glass. Melting treatment. It is also possible to produce these glasses at temperatures of 1700 ° C or below, or even at 1 600 ° C. The presence of an identifiable metal oxide (Li2〇, Na20, K20) helps to make it easier to melt the glass. However, it is preferred that their total content is limited to less than 1% by weight, because Ο is such that when they are present in a large amount, the life of the remaining field is lowered. Alumina-based glass also contains other oxides, such as αι2ο3, or β2ο3, which make it easier to melt the glass. Advantageously, the alumina-based glass may have one of the compositions described in the application ΕΡ 1 43 3 758. Polarization produces a residual electric field on at least one surface of the dielectric material (referred to as a polarized surface), preferably between 0.5 and 50 microns thick, especially between 5 and 20 microns. The voltages of the order of hundreds or thousands of volts are generated by the two planar electrodes placed between (and in contact with) the material to be polarized. The material is typically heated to a temperature ranging from about -19 to 201005789 100 ° C to about 500 ° C, typically about 300 ° C, to promote cation migration toward the cathode. Preferably, the residual electric field produced by the polarization is between 〇·01 and 1 GV/m, especially between 0.1 and 1 GV/m. Moreover, the electrodes can change position and properties. The electrodes (anode and/or cathode and/or optional accelerating layer) may be in the form of layers. In the present invention, the term "layer" may mean a single layer or multiple layers unless otherwise specified. Unless otherwise specified, the conductive layer (anode and/or cathode and/or optional acceleration layer) may be deposited by any mechanism known to those skilled in the art, such as by liquid deposition, etc., especially by Screen printing or inkjet printing, vacuum deposition (evaporation or polarized tube sputtering) or by pyrolysis (through powder or steam (CVD)). The cathode can substantially cover the entire inner face of the second wall (except for the edges). The cathode can comprise (or even consist of) a conductive layer. The cathode may be continuous or discontinuous, especially only in a given emission zone, such as in the form of a guiding track or strip (whether or not there is a hole). The cathode can be specially configured in the form of a grid. The cathode is not necessarily transparent or completely transparent. As the non-transparent electrode material (whether or not), for example, a metal material such as tungsten, copper, or nickel can be used. More particularly, the cathode may be a metallic conductive layer which selectively forms a catalyst for film growth of the emissive material as a layer, especially a material selected from the group consisting of nickel, chromium, iron, cobalt, and mixtures thereof. 201005789 However, it is conceivable that the cathode is transparent (in visible light) and the whole layer is based on a thin layer of pure or alloyed metal, especially silver, selected from pure or mixed and/or doped conductive oxides. Between the two layers produced, which form a transparent multilayer; or - based on pure or mixed and/or doped conductive metal oxides, such as fluorine-doped tin oxide or mixed indium tin oxide (ITO) . Φ It is also possible to select the LiF layer as the cathode. The optional accelerating electrode can cover substantially the entire free surface of the panel. The accelerating electrode can be continuous or discontinuous, in the form of a strip (with or without holes), and can be configured in the form of a grid. The accelerating electrode may be based on a woven or unwoven wire, or may be based on a solid or edging tape, for example partially into the panel. In an active configuration, the accelerating electrode can be based on metal particles or nanoparticles, especially gold and/or silver or conductive oxide particles or nanoparticles, which are preferred in the bonding agent. Better in mineral binders. The accelerating electrode may especially be a layer comprising a glassy binder and a metal particle or a nanoparticle after combustion. This conductive layer, especially in the form of ruthenium, can be deposited, for example, by screen printing or by ink jet printing. Regarding the anode, this may be composed of any transparent conductive material through which visible light and/or UV light can pass. The anode may be: - combined with the outer surface of the first wall, attached to or directly integrated with the surface (contacted or separated by any known adhesion mechanism - 21 - 201005789 - or with The inner face of one wall is bonded, in particular directly deposited on this face or sub-layer; or locally integrated on the surface or completely in the first wall (tempered glass type). Thus, the anode can substantially cover the first wall The entire surface (internal or external) (except for the edges). The anode can be continuous (full layer) or discontinuous, in the form of a grid (in terms of full transparency) (whether or not there is a hole) Preferably, the conductive layer forming the anode is on the sub-layer (an inert metal barrier layer, a tie layer, etc.), especially an alumina or tantalum nitride layer. Preferably, the anode is the first wall. a conductive layer on the inner surface. The anode may be in the form of a (fully) transparent conductive layer or a relatively opaque discontinuous layer (in terms of full transparency). An anode having a transparent (in visible light) full layer form Jiahe is: - pure a thin layer of alloy metal, in particular silver, optionally formed between two layers of purely or mixed and/or doped conductive oxide, which form a transparent multilayer; or - pure or mixed and/or Doped conductive metal oxide based, such as fluorine-doped tin oxide or mixed indium tin oxide (ITO). The anode in the form of an opaque (in the visible and/or UV range) conductive layer may be metal particles or Nanoparticles are based, especially gold and/or silver particles or nanoparticles, or conductive oxide particles or nanoparticles, preferably in the mixture of knots-22-201005789, and even better in mineral binders. The discontinuous opaque conductive layer can be deposited, for example, by screen printing or by inkjet printing. Another option is to use a woven or unwoven wire, whether adjacent or not, with a solid or edging tape. The anode made for the base, for example, is partially intruded into the first wall or into the external dielectric. As for the UV lamp, the anode can be based on a material that transmits UV radiation. The conductive material that transmits UV radiation can be a very thin layer of gold. , for example, with φ l a thickness of the order of 〇nm; or may be a very thin layer of an inert metal such as potassium, tantalum, planer, or lithium, etc., for example, having a thickness of 0.1 to Ιμη: or made of an alloy, such as 25% sodium / 75% Potassium alloy. As mentioned above, if the anode (and/or cathode and/or optional accelerating electrode) material absorbs or reflects UV and/or visible light, the anode (and / or cathode and / or optional accelerating electrode) is designed The transmission is allowed to always transmit the UV or visible radiation. More precisely, it is thus possible to form approximately parallel strips having a width 11 φ and a distance d, and the Π/dl ratio can be between 10% and 50% to allow The total UV or visible light transmission on the electrode side is at least 50%, and the 11/dl ratio can also be adjusted according to the transfer of the bonded walls. It is also possible to form an array of substantially extended conductive pattern elements, such as conductive lines (comparable to These very thin strips) or actual conductive lines, etc., can be substantially straight or wavy, or jagged or the like. This can be defined by a given pitch called pi (the minimum spacing in the example of the number of pitches) between the width of the pattern element and the pattern element, referred to as the width of 12 (the maximum width in the number of widths). Array. Two Series -23- 201005789 Column pattern elements can be crossed. In particular, the array can be organized in the form of a grid, such as a fabric, cloth, or the like. Furthermore, as described above, it is possible to use an array of conductive patterns and by using a width of 12 and/or a pitch pi according to a desired transparency, by using an ll/dl ratio, and/or according to a desired transparency. Obtain full transparency to UV or to visible light. Thus, the width 12 to pitch pi ratio may be equal to 50% or less, preferably 10% or less, and even more preferably 1% or less. For example, the pitch pi may be between 5 μm and 2 cm, preferably between 50 μm and 1.5 cm, and even better between ΙΟΟμηη and lcm, and the width 12 may be between Ιμηη and 1 mm, between 10 and 50 μm Preferably. As an example, a conductive array (in the form of a grid, etc.) can be used on a glass sheet or on a plastic sheet, for example, a PET sheet having a pitch pi between ΙΟΟμηη and 300 μm, and a width 12 of 10 to 20 μm, or An array of conductive wires at least partially interposed into the laminated intermediate layer having a pitch pi between 1 and 10 mm, especially 3 mm, and a width 12 between 10 and 50 μm, especially between 20 and 30 μm. As for the power supply, the positive DC potential VI can be used to supply the anode, typically between 1000V and 3000V, through an external supply structure (often referred to as a busbar) or at least to the outside of the supply structure, preferably using a negative DC potential The V2 or zero (earth) potential is electrically supplied to the cathode, preferably through an external supply structure or a supply structure that extends to the outside. In terms of electrical safety, an electromagnetic shield can be provided. For example, a dielectric of sufficient thickness can be set from -24 to 201005789 above the anode (only the thickness of the first wall or the thickness combined with the additional transparent dielectric). It is also possible to provide a transparent conductive element that is outside the anode, which is electrically insulated from the anode and grounded. For example, 'this may be a transparent conductive single layer or multiple layers, or a fully transparent grid bonded to the outside of the first wall, the anode being on the outside. Moreover, this layer can have low E (low emissivity) or solar control. In the first embodiment: φ - VI is between 1000 V and 300 00 V; and - V2 is the earth potential. In the second embodiment: -VI is between 500V and 150V; and -V2 is between -500V and -1500V. The accelerating electrode can be electrically supplied at a DC potential V3, typically between 100V and 800V. Of course, the flat lamps can be provided with spacers, in particular made of glass, distributed in the form of balls or the like on the surface. Space-type spacers can also be provided, especially for small lamp sizes, where the surrounding frame can optionally be used to seal the lamp. The walls can be kept at a fixed distance. The wall may be of any shape: the shape of the substrate may be polygonal, concave or convex, especially square or rectangular; or curved, with a fixed or variable radius of curvature, especially circular or elliptical. Preferably, the first and second walls may be soda lime alumina sheets or borosilicate glass. The glass can be clear or exceptionally clear. -25- 201005789 At least the first wall can be coated and/or treated by screen printing or the like to provide an optical effect, especially color, decorative effect, structural mitigating effect 'illusion effect' diffusion layer, anti-reflective coating Wait. As for the UV lamp, the first wall can be made of a dielectric material that transmits UV radiation. The material of one or both walls may be selected from the group consisting of quartz, alumina, magnesium fluoride (MgF2) or calcium fluoride (CaF2), borosilicate glass or glass having less than 〇.〇5% Fe203. For a thickness of 3 mm, examples are: - Magnesium fluoride or calcium fluoride is transported over 80% or even 90% over the entire UV range, ie UVA (between 315 and 380 nm), UVB (at 280 and Between 315 nm), UVC (between 200 and 280 nm), or VUV (between about 1 〇 and 200 nm); - Quartz and some high purity alumina transport throughout the entire UVA, UVB, and UVC range greater than 8 0% or even 90%; - borosilicate glass, such as Schott's "Borofloat", etc., delivered over 70% of the entire UVA range; and - has a soda lime alumina glass of less than 〇.〇5% Fe203, especially Saint-Gobain's glass Diamant, Pilkington's glass Optiwhite, and Schott's glass B270, which deliver greater than 70% or even 80% throughout the UVA range. However, 鹸 lime alumina glass, such as glass Planilux sold by Saint-Gobain Glass, has greater than 80% transmission over 360 nm, which is sufficient for certain embodiments and applications. The spacing between the walls can be set by the spacer to be about 〇.3 to 5 mm 201005789, especially equal to or less than about 2 mm. A technique for depositing spacers in a vacuum insulated glazing unit is known from FR-A-2 787 1 3 3. According to this method, the dots of the adhesive are deposited on the glass sheet, especially the dots deposited by screen printing, having a diameter equal to or smaller than the diameter of the spacer, and the glass which enables the spacer to be tilted better. Rolling on the sheet allows a single spacer to adhere to each point of the adhesive. A second piece of glass is then applied over and around the deposited spacer. The Φ spacer can be made of a non-conductive material. Preferably, they are made of glass, especially a soda lime type. According to one embodiment, the lamp can be produced by first creating a sealed enclosure in which the intermediate air chamber is at atmospheric pressure and then (at least) a high vacuum by creating a vacuum. According to this embodiment, one of the walls, preferably the first wall, has a hole in its thickness which is preferably blocked by the mineral sealing member. All or part of the inner surface may be coated with a cathodoluminescent material. In particular, Φ can provide only certain surface areas with cathodoluminescent materials to produce pre-defined illumination (individual UV emission) regions on a given surface. The illuminated area may consist of decorative patterns or displays, such as trademarks or symbols. Advantageously, the cathodoluminescent material can be selected or utilized to determine the color of the illumination within a wide palette. A general phosphor can be selected for the lamp. In the case of UV lamps, in particular, phosphors which emit in UVC are present. For example, materials doped with antimony or doped with lead, such as LaP04: Pr, CaS04: Pb, and the like. There are also phosphors that emit in UVA or near -27-201005789 UVB. For example, yttrium-doped materials such as YB03Gd; YB2〇5: Gd; LaP309: Gd; NaGdSi04; YAI3 (B03) 4: Gd; YPO4: Gd; YAI03: Gd; SrB4〇?: Gd; LaP04:

Gd ; LaMgBsOlo : Gd,Pr ; LaB308 : Gd,Pr ;及(CaZn) 3 (P〇4 ) 2 : TI等。亦具有UVA中發射之磷光體。例如:Gd; LaMgBsOlo: Gd, Pr; LaB308: Gd, Pr; and (CaZn) 3 (P〇4) 2 : TI and the like. It also has a phosphor that emits in the UVA. E.g:

LaP04 : Ce ; ( Mg,Ba) Aln〇19 : Ce ; BaSi2〇s : Pb ; YP04 :Ce ; ( Ba,Sr,Mg ) 3Si2〇7 : Pb ;及 SrB4〇7 : Eu。 藉由對比(即、最大亮度和最小亮度之間的差對最大 _ 亮度和最小亮度的總和之比),可評估均勻性。小於80% ,或甚至50%或更少,的對比較佳。 藉由Lumens/W的產量,即、輻射(光學或UV)力 對注射電力的比,可評估燈的總效率。容易獲得等於或大 於10 lumens/W的產量。 根據本發明的UV燈可產生本質上單向輻射(在第一 壁側上)。 在具有單發射面的UV燈組態中,另一壁是不透明的 @ ,例如,玻璃陶瓷,或甚至非玻璃介電,較佳的是具有類 似的膨脹係數。 根據本發明的UV燈可產生雙向輻射(在第一壁側上 )。例如,其可產生差異發光。 在面對第二壁的側上,可見光及/或UV範圍中的總 傳送可大於50%,尤其是藉由足夠限制發射區的面積,例 如等於或小於燈的內面積之50%的發射區面積。而且,第 二壁(例如由玻璃製成)/陰極組裝可具有可見光中至少 -28- 201005789 7 0%的總傳送較佳。最後,陰極可以是透明的(當作全層 )或全透明的(以帶形式、網柵形式等),如上述。 根據本發明之在可見光中發射的燈可用於裝飾或用於 顯示螢幕(液晶顯示、電視、監視器等)的背光。本發明 係相關於例如產生照明裝飾或建築元件及/或具有顯示功 能(指示元件、發光商標或記號)的那些,諸如發光燈具 ,尤其是平面發光燈具,照明壁,尤其是懸吊壁,照明磚 ❿ 等。 根據本發明之在可見光中發射的燈尤其可形成: -照明窗的一部分(氣窗等),用於建築物或者用於 移動機構,尤其是火車窗或者船艙或飛機艙的窗; -照明屋頂,尤其是用於陸、空、或海移動機構; -房間之間或陸、空、海移動機構的兩隔間之間的內 部隔牆; -櫥窗,都市家具元件,家具外觀,或冰箱層架。 φ 可藉由疊層中間層(由PVB、PU、EVA等所製成) 將燈與和第二壁結合的第一背嵌板堆疊,或者藉由叠層中 間層(由PVB、PU、EVA等所製成)與結合第二壁的第 二背嵌板堆疊。 可將根據本發明的UV燈用於工業領域和家用領域二 者,前者例如用於美學、生化、電子、或食物目的,後者 例如用於淨化自來水,用於使游泳池水可引用,用於淨化 空氣ph,用於UV乾燥,及用於熟化。 藉由選擇UVA中或者甚至UVB中的輻射,可使用根 -29- 201005789 據本發明的UV燈: •當作日曬燈(尤其是根據生效的標準,具有UVA 中的99.3%和UVB中的0.7%之燈); -用於皮虜處理(尤其是UVA中3 08 nm的輻射); -用於光化學活化處理,例如熟化,尤其是黏附劑, 或者交聯,或者用於乾燥紙; -用於螢光材料的活化,諸如以凝膠形式所使用的溴 乙啶等,用於分析核酸或蛋白質; -用於活化光催化材料,例如用於降低冰箱中來自垃 圾的臭味。 藉由選擇UVB中的輻射,根據本發明的UV燈用於促 進皮膚中的維他命D之形成。 藉由選擇UVC中的輻射,可將根據本發明的UV燈用 於藉由殺菌作用使空氣、水、或表面殺菌/消毒,尤其是 在250nm和260nm之間。 藉由選擇遠UVC中或者較佳的是UVA中之輻射用於 臭氧產生,根據本發明的UV燈尤其用於表面的處理,尤 其在沈積電子、電腦、光學、半導體等的主動層之前。 可將根據本發明的UV燈例如整合至家用電器設備, 諸如電冰箱等,或者整合至廚房工作台。 在UV燈中提供具有給定功能的至少一塗層也是有利 的,該塗層是在一或多個壁的外面上。此可以是: -塗層,具有阻隔紅外線波長的輻射之功能,例如用 於電磁相容性;及/或 -30- 201005789 -抗髒污塗層(包含Ti〇2的光催化塗層,至少局部 以銳鈦礦形式結晶化);及/或 -抗反射多層塗層,例如Si3N4/Si02/Si3N4/Si02型的 〇 可將具有有孔的表面之板和壁分開供應,或成套販售 ,及容易組裝。 本發明的主題亦是使用具有極化表面之有孔的板,尤 其是選自具有極化矽土爲基的層或極化琺瑯層之極化玻璃 板或介電板(玻璃、石英、玻璃陶瓷、陶瓷等),在平面 場發射燈中當作電子加速元件。 如此,本發明的主題亦是使用非連續極化琺瑯層在平 面場發射燈中當作電子加速元件。 通常,本發明的主題亦是使用具有極化表面之有孔的 板或非連續極化琺瑯層,尤其是選自極化玻璃板、極化琺 瑯層、具有極化矽土爲基的層或具有極化琺瑯層之介電板 Φ ,當作平面場發射燈中的電子加速元件。 本發明的主題亦是用以製造如上述的燈之處理,包含 藉由至少部分形成金屬催化劑及/或陰極之較佳是(實質 上)導電礦物材料的鏈結材料來鏈結第二壁和有孔的板, 該有孔的板具有極化表面和露在與自由面相對的面上之隙 孔。 較佳的是,將此鏈結材料沈積在第二壁的內面上和與 板相對的該面上二者。 更精確地說,至於組裝操作,可提供下面步驟: -31 - 201005789 -將板鏈結至第二壁; -將間隔物沈積在有孔的板上; -同時,組裝第一壁和選用地具有磁化表面之有孔的 板;及 -經由第一壁和板的周圍或第二壁上之密封劑來密封 內部空間。 在根據本發明之燈的所有組態中(板與第二壁隔開, 接合至第二壁,形成第二壁),就產生真空而言,可提供 下面步驟: -透過製作於壁的其中之一的孔,以真空,較佳的是 高度真空,來取代包含在內部空間的大氣;及 -以密封機構塞住孔。 在形成第二壁的板之例子中,可與盲孔同時形成真空 孔。 爲了以氣體取代大氣,可使用用以經由雙重或多個上 釉結構來栗唧之處理,諸如文件EP-A-645 5 1 6中所特別 說明的處理等。在那文件中,建議燒結焊接玻璃的懸吊當 作密封劑。剛好在製造的一開始以球的形式將此密封劑置 放在孔的外端,經由此組件產生真空,然後將密封劑軟化 ,以塞住孔。 在FR-A-2 7 74 3 73中說明另一處理,其中使用低熔點 合金當作密封劑。能夠剛好在製造的一開始以一部分適當 形狀的形式將此密封劑置放在孔的外端,經由此組件產生 真空,然後將其熔化,以密封孔的壁,以塞住孔。 -32- 201005789 根據本發明的較佳處理在於,以覆蓋孔的外洞之密封 碟塞住孔。可藉由焊接將金屬製成較有利的此碟接合至壁 而且,較佳的是,經由露在與板的自由面相對之面上 的隙孔將電子發射材料沈積在第二壁的內面上,該板位在 內面上或已鏈結至內面。 根據本發明之燈的製造處理較佳,使得其連續包含: -在第二壁的內面上之陰極上,一可極化玻璃料爲基 的層之非連續沈積,尤其是透過噴墨印刷或絲網印刷; -燃燒步驟,用於形成琺瑯層;及 -極化琺瑯層的步驟。 【實施方式】 圖1爲具有兩壁之平面場發射燈100,此兩壁係分別 由第一和第二玻璃片1、2所組成,第一和第二玻璃片例 • 如由厚度約3.15mm的鹼石灰矽土玻璃所製成;具有內主 要面11、12和外主要面12、22。 在玻璃片1、2之間所謂的內部空間10中具有一真空 ,高度真空較佳》 首先,內面11帶有形成陽極的導電塗層3和陰極發 光材料的塗層5,例如一或多個磷光體,以產生白光。 將陽極3直接沈積在內面11上或屏障子層上,例如 由氮化矽(未圖示)所製成。陽極3例如是配置成全透明 的絲網印刷銀層,例如以網柵形式,或者全透明的導電層 -33- 201005789 ,諸如銀多層等。 當作變化,可以各種方式將陽極3與第一片1結合: 可將其沈積在電絕緣載體元件的外或內面上,將此載體元 件接合至第一片,以使塗層壓向外面12。例如,此元件可 以是EVA或PVB膜或幾個塑膠膜,例如PET、PVB、及 PU膜。 陽極3亦可以是金屬網柵的形式,這些金屬網柵整合 到塑膠膜或甚至到第一片內,因此形成強化玻璃,或者以 相互平行導線的形式。 亦可將陰極4夾置在第一電絕緣體和第二電絕緣體之 間,組裝接合至第一壁1。例如,可將陽極插入在兩塑膠 片之間。 電絕緣體的另一組合如下:使用PVB片當作第一電 絕緣體,其將用於結合第二電絕緣體且帶有陽極,諸如 PET片等,陽極在PVB片和PET片之間。 內面21本身帶有形成陰極4的導電塗層4。 較佳的是,將陰極4直接沈積在第二片的內面21上 。例如,陽極4爲全NiCr爲基的層,典型上具有50至 1 0Onm的厚度》 固定至第二板2的內面21的是由鹸石灰矽土玻璃所 製成之有孔的板6,例如厚度約爲0.7mm»此板6被設置 有所謂的自由或上主要面61 (此面轉向第一壁),以及被 設置有所謂的下主要面62 (指向第二壁)。 藉由黃銅所製成之陰極4將有孔的板6和第二壁2固 -34- 201005789 定在一起。另一選擇是,例如利用密封料將它們結合在一 起(在周圍或分佈於表面上)。 板的隙孔63露在主要面61、62上,並且均勻分佈在 板的表面上。例如,隙孔63形成交錯型矩形圖案元件的 陣列,寬度約爲1 mm並且隔開約1 mm,如圖2所示。 上面61被覆蓋有形成加速電極的導電層7,例如絲網 印刷銀層,選用地以網柵的形式配置。導電層7亦可以是 φ 包含玻璃狀結合劑和導電金屬塡料(例如銀粒子)的琺瑯 層,典型上層具有10和15微米之間的厚度。其亦可以是 藉由習知技術(PVD、CVD )所沈積的薄層,例如由銦錫 氧化物(ITO )所製成,摻雜氟的氧化錫(Sn02 : F )所製 成’摻雜鋁的氧化鋅(ZnO : A1 )所製成,或金屬,諸如 銀或鉬等。 當作例子,可藉由陰極濺鍍處理將全玻璃板6塗佈有 銦錫氧化物所製成的導電層7,然後使用諸如噴沙、雷射 # 切割(選用地以氫氟酸來幫助)、或水噴射切割,刺穿與 層7相對的面,以形成隙孔63。 內面21進一步包括經由陰極4上的隙孔所沈積之碳 奈米管8,陰極亦形成用以生長這些奈米管的催化劑。 例如透過彈性夾鐵將陽極3連接到電力供應,及形成 外部供應結構33,例如絲網印刷銀琺瑯。陽極3約在 1000V 至 3000V 的 DC 電位 VI。 就電力保護而言,將例如由導電氧化物所製成的透明 導電層3’接地(V4等於0V),並且存在於第一壁的外面 -35- 201005789 1 2上。形成例如由絲網印刷銀琺瑯所製成的供應結構3 3 ’ 用於此層3’。而且,利用PVB片13將第一壁疊層至背嵌 板1,。 透過彈性夾鐵電供應陰極4,及例如由絲網印刷銀琺 瑯所製成的供應結構43形成在密封的外面上。爲此,可 使板6相對於第二壁2而稍微往後。陰極4在等於〇V( 大地電位)較佳的DC電位V2。 透過例如彈性夾鐵電供應加速電極7,及形成例如由 絲網印刷銀琺瑯所製成的外部供應結構73。結構是在 1 00V和800V之間的DC電位V3。 利用它們彼此面對的面11、61而使第一壁1和有孔 的板6在一起並且經由密封料9接合在一起。如此將密封 選定爲礦物密封較佳。 可藉由置放(均句地較佳)在它們之間的玻璃間隔物 10’來形成此壁1和此板6之間的間隔(被設定成通常小 於5mm的値)》此處,間隔約0.3至5mm,例如0.4至 2mm。 間隔物10’可具有球面、圓柱、或立方形狀,或另一 多角,例如十字形的橫剖面。間隔物可被塗佈有與磷光體 5相同或不同之磷光體。 當作變化,可使用周圍間隔物框(因此當作板的邊界 )和中央之選用的間隔物。 爲了產生真空,第一壁1在周圍附近具有遍及其厚度 的孔(未圖示),直徑爲幾毫米,以密封碟(未圖示)塞 -36- 201005789 住外面的洞,尤其是焊接至外面的銅碟。 將間隔物1 〇 ’沈積和結合在事先界定的位置,例如經 由自動裝置,及將壁1和板6置放成彼此面對。接著,沈 積密封料以及在高溫中密封組裝。 接著,經由密封孔利用泵去除包含在密封封閉體中的 大氣。當到達高度真空時,將密封碟置放在密封孔開口的 前面,在其四周沈積焊料合金的熔珠。起動在焊料的附近 Φ 之加熱源以軟化焊料,及在重力之下將碟按壓向孔的洞, 如此焊接至基板1,形成緊密的密封插塞。 陰極發光材料5可產生均勻的白光。有利的是,可選 擇或採用此材料5,以在廣泛的調色盤中決定照明的顏色 〇 就裝飾照明而言,可形成不同顏色及/或形狀及/或 尺寸的發光區,或發光區和黑暗區的交替。 亦能夠改變光強度,例如藉由改變陰極發光材料的厚 ❹ 度。 在第一變化(未圖示)中,加速電極可以是極化矽土 層或極化琺瑯層,典型上具有10和15微米之間的厚度。 在第二變化(未圖示)中,以琺瑯介電層取代板,典 型上具有1〇和15微米之間的厚度,在其上沈積有由導電 琺瑯所製成的導電層,其具有10和15微米之間的厚度。 例如,可完成藉由絲網印刷的沈積。 在沈積第二琺瑯層之前,第一琺瑯層可經過燃燒操作 。另一選擇是,可在沈積第二琺瑯層之前僅乾燥第一琺瑯 -37- 201005789 層,然後將兩層一起經過燃燒處理。 在圖3所示的實施例中,燈的結構2 00基本上重複圖 1的結構,除了 : -省略加速電極及其電力供應; -將板6’極化,在表面上形成剩餘場70 (如圖3的 詳細圖所示一般); 參 -隙孔63 ’是呈列和行之矩形圖案元件的陣列(見圖 Ο ;及 -選用地省略叠層和保護導體。 未含鹼性金屬氧化物之鋁硼矽酸型的板6’之玻璃的重 量之化學組成如下(以百分比):LaP04 : Ce ; ( Mg , Ba ) Aln〇 19 : Ce ; BaSi 2 〇 s : Pb ; YP04 : Ce ; ( Ba , Sr , Mg ) 3Si 2 〇 7 : Pb ; and SrB 4 〇 7 : Eu. Uniformity can be evaluated by comparison (i.e., the ratio of the difference between the maximum brightness and the minimum brightness to the sum of the maximum _ brightness and the minimum brightness). A comparison of less than 80%, or even 50% or less, is preferred. The overall efficiency of the lamp can be evaluated by the Lumens/W production, i.e., the ratio of radiation (optical or UV) force to injected power. It is easy to obtain a yield equal to or greater than 10 lumens/W. The UV lamp according to the invention can produce essentially unidirectional radiation (on the first wall side). In a UV lamp configuration with a single emitting surface, the other wall is opaque @, for example, glass ceramic, or even non-glass dielectric, preferably having a similar coefficient of expansion. The UV lamp according to the invention can produce bidirectional radiation (on the first wall side). For example, it can produce differential illumination. On the side facing the second wall, the total transmission in the visible and/or UV range may be greater than 50%, in particular by sufficiently limiting the area of the emitter, for example an emission zone equal to or less than 50% of the inner area of the lamp. area. Moreover, the second wall (e.g., made of glass) / cathode assembly may have a total transfer of at least -28 - 201005789 70% of visible light. Finally, the cathode can be transparent (as a full layer) or fully transparent (in the form of a strip, grid, etc.), as described above. A lamp that emits in visible light according to the present invention can be used for decoration or for displaying a backlight of a screen (liquid crystal display, television, monitor, etc.). The invention relates to, for example, the production of lighting decorative or architectural elements and/or those having display functions (indicating elements, illuminated signs or indicia), such as illuminating luminaires, in particular flat illuminating luminaires, illuminating walls, in particular suspended walls, illumination Bricks, etc. In particular, the lamp emitted in visible light according to the invention can form: a part of a lighting window (air vent, etc.) for a building or for a moving mechanism, in particular a window of a train window or a cabin or an aircraft cabin; Especially for land, air, or sea moving mechanisms; - internal partitions between rooms or between two compartments of land, air, and sea moving mechanisms; - shop windows, urban furniture components, furniture exteriors, or refrigerator shelves . φ may be stacked by stacking the intermediate layer (made of PVB, PU, EVA, etc.) with the first back panel bonded to the second wall, or by laminating the intermediate layer (by PVB, PU, EVA) And is made of a second back panel stacked in combination with the second wall. The UV lamp according to the invention can be used for both industrial and domestic applications, for example for aesthetic, biochemical, electronic, or food purposes, the latter for example for purifying tap water, for making pool water quotable for purification Air ph for UV drying and for curing. By selecting radiation in UVA or even UVB, root -29-201005789 UV lamps according to the invention can be used: • as a daylight lamp (especially according to the effective standard, with 99.3% in UVA and in UVB) 0.7% lamp); - for skin treatment (especially 3 08 nm radiation in UVA); - for photochemical activation treatment, such as curing, especially adhesives, or cross-linking, or for drying paper; - for activation of fluorescent materials, such as ethidium bromide used in the form of a gel, for analysis of nucleic acids or proteins; - for activating photocatalytic materials, for example for reducing odor from garbage in a refrigerator. The UV lamp according to the present invention is used to promote the formation of vitamin D in the skin by selecting radiation in the UVB. The UV lamp according to the present invention can be used to sterilize/sterilize air, water, or surface by sterilization, especially between 250 nm and 260 nm, by selecting radiation in the UVC. By selecting radiation in the far UVC or preferably UVA for ozone generation, the UV lamp according to the present invention is particularly useful for surface treatment, particularly prior to depositing active layers of electronics, computers, optics, semiconductors, and the like. The UV lamp according to the present invention can be integrated, for example, into a household appliance device, such as a refrigerator or the like, or integrated into a kitchen workbench. It is also advantageous to provide at least one coating having a given function in the UV lamp, the coating being on the outside of one or more walls. This can be: - a coating having the function of blocking radiation at infrared wavelengths, for example for electromagnetic compatibility; and / or -30 - 201005789 - anti-fouling coating (photocatalytic coating comprising Ti〇2, at least Partially crystallized in the form of anatase; and/or anti-reflective multilayer coatings, such as Si3N4/SiO2/Si3N4/SiO2 type crucibles, may be supplied separately from plates and walls with perforated surfaces, or sold in sets, And easy to assemble. The subject of the invention is also the use of apertured plates having a polarized surface, in particular polarized glass plates or dielectric plates (glass, quartz, glass) selected from layers having a polarized alumina-based layer or a polarized layer. Ceramics, ceramics, etc.) are used as electron acceleration components in flat field emission lamps. Thus, the subject of the invention is also to use a discontinuously polarized layer as an electron accelerating element in a flat field emission lamp. In general, the subject of the invention is also the use of apertured plates or non-continuously polarized layers having a polarized surface, in particular selected from polarized glass sheets, polarized germanium layers, layers having a polarized alumina or A dielectric plate Φ having a polarized germanium layer is used as an electron accelerating element in a planar field emission lamp. The subject matter of the invention is also a process for the manufacture of a lamp as described above, comprising the joining of a second wall by a chain material of at least partially formed metal catalyst and/or a preferred (substantially) electrically conductive mineral material of the cathode A perforated plate having a polarized surface and a slit exposed on a face opposite the free face. Preferably, the link material is deposited on both the inner face of the second wall and the face opposite the plate. More precisely, as for the assembly operation, the following steps can be provided: -31 - 201005789 - chaining the plate to the second wall; - depositing the spacer on the perforated plate; - simultaneously assembling the first wall and the selected ground a perforated plate having a magnetized surface; and - sealing the interior space via a sealant around the first wall and the plate or on the second wall. In all configurations of the lamp according to the invention (the plate is spaced from the second wall, joined to the second wall to form the second wall), in terms of creating a vacuum, the following steps can be provided: - through the wall One of the holes replaces the atmosphere contained in the internal space with a vacuum, preferably a high vacuum; and - the hole is plugged with a sealing mechanism. In the example of the plate forming the second wall, a vacuum hole can be formed simultaneously with the blind hole. In order to replace the atmosphere with a gas, a treatment for licking via a double or a plurality of glazing structures, such as the treatment specifically described in the document EP-A-645 516, may be used. In that document, it is recommended that the suspension of sintered glass be used as a sealant. This sealant is placed in the form of a ball at the outer end of the hole just at the beginning of manufacture, a vacuum is created via this assembly, and the sealant is then softened to plug the hole. Another treatment is described in FR-A-2 7 74 3 73, in which a low melting point alloy is used as a sealant. The sealant can be placed at the outer end of the hole just at the beginning of the manufacture in a portion of a suitable shape, a vacuum is created through the assembly, and then melted to seal the wall of the hole to plug the hole. -32- 201005789 A preferred treatment according to the present invention consists in plugging the hole with a sealing disk covering the outer hole of the hole. It is possible to bond the metal to the wall by soldering, and it is preferable to deposit the electron-emitting material on the inner surface of the second wall via a slit exposed on the surface opposite to the free surface of the plate. Upper, the plate is on the inner surface or has been linked to the inner surface. The lamp according to the invention is preferably produced in such a way that it comprises continuously: - a discontinuous deposition of a polarizable frit-based layer on the cathode on the inner face of the second wall, in particular through ink jet printing Or screen printing; - a burning step for forming a layer of germanium; and - a step of polarizing the layer of germanium. [Embodiment] FIG. 1 is a planar field emission lamp 100 having two walls, which are respectively composed of first and second glass sheets 1, 2, and first and second glass sheets, for example, having a thickness of about 3.15. Made of soda lime alumina glass; with inner major faces 11, 12 and outer major faces 12, 22. There is a vacuum in the so-called internal space 10 between the glass sheets 1, 2, and a high vacuum is preferred. First, the inner surface 11 is provided with a conductive coating 3 forming an anode and a coating 5 of a cathode luminescent material, such as one or more. Phosphors to produce white light. The anode 3 is deposited directly on the inner face 11 or on the barrier sublayer, for example, from tantalum nitride (not shown). The anode 3 is, for example, a screen-printed silver layer which is configured to be completely transparent, for example in the form of a grid, or a fully transparent conductive layer -33 - 201005789, such as a silver multilayer or the like. As a variant, the anode 3 can be combined with the first sheet 1 in various ways: it can be deposited on the outer or inner face of the electrically insulating carrier element, the carrier element being joined to the first sheet to press the coating to the outside 12. For example, the component can be an EVA or PVB film or several plastic films such as PET, PVB, and PU films. The anodes 3 may also be in the form of metal grids which are integrated into the plastic film or even into the first sheet, thus forming tempered glass, or in the form of mutually parallel wires. The cathode 4 may also be sandwiched between the first electrical insulator and the second electrical insulator and assembled to the first wall 1. For example, the anode can be inserted between two plastic sheets. Another combination of electrical insulators is as follows: a PVB sheet is used as the first electrical insulator that will be used to bond the second electrical insulator with an anode, such as a PET sheet, etc., with the anode between the PVB sheet and the PET sheet. The inner face 21 itself carries a conductive coating 4 forming a cathode 4. Preferably, the cathode 4 is deposited directly on the inner face 21 of the second sheet. For example, the anode 4 is a full NiCr-based layer, typically having a thickness of 50 to 10 nm, and is fixed to the inner face 21 of the second plate 2 by a perforated plate 6 made of strontium lime bauxite glass. For example, the thickness is about 0.7 mm. This plate 6 is provided with a so-called free or upper main face 61 (this face is turned to the first wall) and is provided with a so-called lower main face 62 (pointing to the second wall). The perforated plate 6 and the second wall 2 are fixed together by a cathode 4 made of brass. Another option is to combine them (either around or on the surface), for example, using a sealant. The apertures 63 of the plates are exposed on the major faces 61, 62 and are evenly distributed over the surface of the plates. For example, the apertures 63 form an array of staggered rectangular pattern elements having a width of about 1 mm and spaced about 1 mm apart, as shown in FIG. The upper surface 61 is covered with a conductive layer 7 forming an accelerating electrode, such as a screen printed silver layer, optionally in the form of a grid. Conductive layer 7 can also be a tantalum layer comprising φ glass-like binder and conductive metal tantalum (e.g., silver particles), typically having a thickness between 10 and 15 microns. It may also be a thin layer deposited by conventional techniques (PVD, CVD), such as made of indium tin oxide (ITO), and doped with fluorine-doped tin oxide (Sn02:F). Made of aluminum zinc oxide (ZnO: A1), or a metal such as silver or molybdenum. As an example, the entire glass plate 6 may be coated with a conductive layer 7 made of indium tin oxide by a cathode sputtering process, and then cut using, for example, sandblasting, laser # (optional with hydrofluoric acid) Or, water jet cutting, piercing the face opposite to the layer 7 to form the slit 63. The inner face 21 further includes carbon nanotubes 8 deposited through the apertures in the cathode 4, which also form a catalyst for growing the nanotubes. The anode 3 is connected to the power supply, for example, via a resilient clamp, and forms an external supply structure 33, such as a screen printed silver enamel. The anode 3 is approximately at a DC potential VI of 1000V to 3000V. In terms of power protection, a transparent conductive layer 3' made of, for example, a conductive oxide is grounded (V4 is equal to 0 V) and is present on the outside of the first wall -35 - 201005789 1 2 . A supply structure 3 3 ' made of, for example, screen-printed silver enamel is formed for this layer 3'. Moreover, the first wall is laminated to the back panel 1 by means of the PVB sheet 13. The cathode 4 is supplied through the elastic clip iron, and a supply structure 43 made of, for example, screen printed silver crucible is formed on the outer surface of the seal. To this end, the plate 6 can be slightly rearward relative to the second wall 2. The cathode 4 is at a DC potential V2 which is preferably equal to 〇V (earth potential). The accelerating electrode 7 is supplied through, for example, a spring-clamping iron, and an external supply structure 73 made of, for example, screen-printed silver enamel is formed. The structure is a DC potential V3 between 100V and 800V. The first wall 1 and the perforated plate 6 are brought together by their faces 11, 61 facing each other and joined together via a sealing material 9. It is preferred to select the seal as a mineral seal. The spacing between the wall 1 and the plate 6 can be formed by placing (evenly preferably) the glass spacer 10' between them (set to a radius of typically less than 5 mm). It is about 0.3 to 5 mm, for example 0.4 to 2 mm. The spacer 10' may have a spherical, cylindrical, or cubic shape, or another multi-angle, such as a cross-shaped cross section. The spacer may be coated with a phosphor which is the same as or different from the phosphor 5. As a variation, the surrounding spacer frame (and therefore the boundary of the plate) and the spacer used in the center can be used. In order to generate a vacuum, the first wall 1 has a hole (not shown) having a thickness throughout its circumference, and has a diameter of a few millimeters to seal the dish (not shown) from the plug - 36 - 201005789 to the outer hole, especially to the weld. Copper disc outside. The spacer 1 〇 ' is deposited and bonded at a previously defined location, such as by an automated device, and the walls 1 and 6 are placed facing each other. Next, the sealant is deposited and sealed and assembled at high temperatures. Next, the atmosphere contained in the hermetic enclosure is removed by a pump through a sealed hole. When a high vacuum is reached, a sealing disc is placed in front of the opening of the sealing hole, and a solder alloy bead is deposited around it. A heat source Φ is activated in the vicinity of the solder to soften the solder and press the disc against the hole of the hole under gravity, thus soldering to the substrate 1 to form a tight sealed plug. Cathodoluminescent material 5 produces uniform white light. Advantageously, the material 5 can be selected or employed to determine the color of the illumination in a wide palette of colours, in the case of decorative lighting, a light-emitting zone of different colours and/or shapes and/or dimensions, or a lighting zone can be formed. Alternating with the dark area. It is also possible to vary the light intensity, for example by varying the thickness of the cathodoluminescent material. In a first variation (not shown), the accelerating electrode can be a polarized alumina layer or a polarized germanium layer, typically having a thickness between 10 and 15 microns. In a second variation (not shown), the plate is replaced by a tantalum dielectric layer, typically having a thickness between 1 and 15 microns, on which is deposited a conductive layer made of conductive germanium having 10 And a thickness between 15 microns. For example, deposition by screen printing can be accomplished. The first layer can be subjected to a combustion operation prior to depositing the second layer. Alternatively, only the first layer of -37-201005789 may be dried prior to deposition of the second layer, and then the two layers may be subjected to combustion treatment together. In the embodiment shown in Figure 3, the structure 200 of the lamp substantially repeats the structure of Figure 1, except: - the acceleration electrode and its power supply are omitted; - the plate 6' is polarized to form a residual field 70 on the surface ( As shown in the detailed view of Fig. 3; the reference-gap hole 63' is an array of rectangular pattern elements in columns and rows (see Fig. 及; and - optionally omitting the laminate and the protective conductor. The chemical composition of the weight of the glass of the aluminum borosilicate type plate 6' is as follows (in percentage):

Si02 64.0 ai2o3 16.0 B 2 〇 3 11.0 CaO 8.0 ❿ 此組成的類型具有剩餘場長於兩年的使用期限之優點 在燈200’的局部剖面圖之圖3a所示的變化中,以極 化琺瑯層6”取代極化板,典型上具有1 〇和1 5微米之間的 厚度。這是例如從依據參考VN 821之從Ferro所販售的 無鉛玻璃料所獲得之琺瑯。熔塊與媒體混合,然後在燃燒 之前藉由絲網印刷或噴墨印刷來沈積。產生剩餘電場70” 的極化可以大體上是在層的整個厚度上或表面上。 -38- 201005789 選用地,再者,如圖3a槪略所示一般,碳奈米管亦 可由沈積在陰極上之ZnO奈米線8”來取代。 在加熱玻璃或琺瑯至3 00 °C並且將其經過3 kV之靜電 場的同時完成極化。爲此,在兩金屬電極之間使玻璃基板 或琺瑯保持接觸。 子表面剩餘電場約爲〇·9 GV/m,使用依據參考JCI 140 CF,由 John Chubb Instrumentation 所販售之靜電測 φ 量儀器所測量的。以SIMS (二次離子質譜儀)估算剩餘 電場的地點之子表面區的深度。此技術被用於偵測鈣中非 常高的局部耗盡,在約10微米深的子表面區之上。 在圖5所示的實施例中,極化板是非連續的,以分佈 在表面上之板部位6的形式,然後隙孔63是連續的。由 板部位所界定的區域位在內部空間內。密封是在第一和第 二壁之間。 在圖6所示的實施例中,燈的結構300基本上重複圖 • 3的結構,除了 : -板2’係由具有盲孔23’之鹸石灰矽土玻璃所製成, 該板形成第二壁2’; -在內面21上將板2’塗佈有矽土爲基的層60,藉由 濺鍍及然後極化以形成剩餘電場70’(如圖6詳細圖示一 般); -盲孔23’爲平行溝槽的形式,其露在第二壁23的橫 向邊緣上,本身是凹下的; -陰極4是非連續的,存在於盲孔23’的底部中以及 -39- 201005789 凹下的橫向邊緣23上,用於電連接陰極4(見圖7a) ’ 在其邊緣的頂部上具有匯流排43 ;及 -密封9是在第二壁的內面和第一壁的內面之間(在 凹下的邊緣連接區和其他周圍區中具有不同的密封高度) 〇 層60亦可以是極化琺瑯層,尤其是具有典型上在10 和15微米之間的厚度。此例如可以是依據參考VN 821之 從Ferro所販售的無鉛玻璃料所獲得之琺瑯。熔塊與媒體 混合,然後在燃燒之前藉由絲網印刷或噴墨印刷來沈積。 典型上在1 kV之電場中以300°C加熱樣本80分鐘的同時 完成極化。 當作圖7b所示之組裝變化,使板2’的整周凹下,以 維持相同密封高度。 在圖8所示的實施例中,燈的結構400基本上重複圖 3的結構,除了 : -以鎢微尖端8’取代(完全或部分)碳奈米管; -陰極4 ’是透明的,例如導電氧化層; -板6’是在內部空間,具有較第二壁爲小的尺寸,及 密封是在兩壁1、2之間; -以存在於周圍上的玻璃密封料40將板6,固定至第 二壁2 ;及 -隙孔63之間的間隔至少爲隙孔63寬度的兩倍(圖 式中並未按比例畫出)。 藉由隙孔間隔、陰極材料4和周圍密封的選擇,此燈 201005789 亦產生雙向照明(因此在燈的兩側上),其照明可維持有 差異(如藉由箭頭的不同寬度來象徵性圖示一般)。 上述例子當然不限制限本發明》 至於隙孔(盲孔或露出及任何可能形狀的)和至於電 極(材料和形狀的選擇)二者,或者板和第二壁之間的密 封或鏈結之可能方法,所有組裝變化和不對稱都有可能。 發光區亦可形成一列幾何圖案元件(線、立柱、圓形 • 、方形或任何其他形狀區域),和可改變圖案元件及/或 圖案元件的尺寸之間的間隔。 當作變化,藉由選擇陰極發光元件和由適當材料所製 成的第一壁(或第二壁)產生UV燈。 【圖式簡單說明】 連同附圖,從下面的詳細說明將使本發明的其他細節 和特徵變得清楚,其中: 〇 -圖1爲第一實施例之在可見光中發射的平面場發射 燈之橫向剖面槪要圖; -圖2爲用於圖1所示的第一實施例之具有電子發射 材料的玻璃片上之有孔的玻璃板之槪要俯視圖; -圖3爲第二實施例之在可見光中發射的平面場發射 燈之橫向剖面槪要圖; -圖3a爲第二實施例的變化之在可見光中發射的平 面場發射燈之橫向剖面槪要局部圖; -圖4爲用於圖3所示的第二實施例之具有電子發射 -41 - 201005789 材料的玻璃片上之有孔的玻璃板之槪要俯視圖; -圖5爲本發明之另一實施例的具有電子發射材料之 玻璃片上的部位中之有孔的玻璃板的槪要俯視圖; -圖6爲第三實施例之在可見光中發射的平面場發射 燈之橫向剖面槪要圖; -圖7a爲用於圖6所示的第三實施例之具有電子發 射材料的玻璃片上之有孔的玻璃板之槪要俯視圖,而圖7b 爲其變化:及 -圖8爲第四實施例之在可見光中發射的平面場發射 燈之橫向剖面槪要圖。 應注意的是,爲了清楚起見,所呈現的物體之各種元 件並不一定按比例畫出。 【主要元件符號說明】 1 :第一壁 1 :第一玻璃片 1 ’ :背嵌板 2 :第二壁 2 :第二玻璃片 2’ :板 3 :陽極 3 ’ :透明導電層 4 :導電塗層 4’ :陰極 -42- 201005789 5 :磷光體 6 :板 6’ :板 6” :極化琺瑯層 7 :加速電極 8 :電子發射材料 8 ’ :鎢微尖端 φ 8 ” :奈米線 9 :密封 1 〇 :內部空間 1 〇 ’ :間隔物 1 1 :內部主要面 12 :外部主要面 13:聚乙烯縮丁醛片 21 :內部主要面 φ 22 :外部主要面 23 :第二壁 23’ :盲孔 3 3 :外部供應結構 33’ :供應結構 40 :玻璃密封料 43 :匯流排 60 :層 61 :面 -43 201005789 62 :面 63 :隙孔 63’ :隙孔 7 0 :剩餘場 7 0 ’ :剩餘電場 7 0”:剩餘電場 73 :外部供應結構 100 :平面場發射燈 200 :結構 200’ :燈 3 00 :結構 400 :結構Si02 64.0 ai2o3 16.0 B 2 〇3 11.0 CaO 8.0 ❿ The type of this composition has the advantage of the remaining field length over two years of use. In the variation shown in Figure 3a of the partial section of the lamp 200', the polarization layer 6 is Instead of a polarizing plate, it typically has a thickness between 1 1 and 15 μm. This is for example obtained from a lead-free glass frit sold under the reference VN 821 from Ferro. The frit is mixed with the medium and then The deposition is performed by screen printing or ink jet printing prior to combustion. The polarization that produces the residual electric field 70" can be substantially over the entire thickness of the layer or on the surface. -38- 201005789 Select the ground, and, as shown in Fig. 3a, the carbon nanotubes can also be replaced by ZnO nanowires 8" deposited on the cathode. After heating the glass or crucible to 300 ° C and The polarization is completed while passing through an electrostatic field of 3 kV. To this end, the glass substrate or the crucible is kept in contact between the two metal electrodes. The residual electric field on the sub-surface is about G·9 GV/m, and the reference is based on the reference JCI 140 CF. Measured by an electrostatic measuring instrument sold by John Chubb Instrumentation. The depth of the subsurface area of the location of the residual electric field is estimated by SIMS (Secondary Ion Mass Spectrometer). This technique is used to detect very high calcium. Partially depleted, above the subsurface area of about 10 microns deep. In the embodiment shown in Figure 5, the polarizing plates are discontinuous in the form of plate portions 6 distributed over the surface, and then the holes 63 are Continuously, the area defined by the plate portion is located in the internal space. The seal is between the first and second walls. In the embodiment shown in Figure 6, the structure 300 of the lamp substantially repeats the structure of Figure 3. Except: - Plate 2' is made up of blind holes 23' Made of 鹸 lime bauxite glass, the plate forms a second wall 2'; - the plate 2' is coated with an alumina-based layer 60 on the inner face 21, by sputtering and then polarized to form the remainder An electric field 70' (as illustrated in detail in FIG. 6); - the blind hole 23' is in the form of a parallel groove which is exposed on the lateral edge of the second wall 23 and is itself concave; - the cathode 4 is discontinuous, Exists in the bottom of the blind hole 23' and on the lateral edge 23 of the recessed -39-201005789 for electrically connecting the cathode 4 (see Fig. 7a) 'having a bus bar 43 on the top of its edge; and - the seal 9 is Between the inner surface of the second wall and the inner surface of the first wall (having a different sealing height in the concave edge connection region and other surrounding regions), the enamel layer 60 may also be a polarized layer, especially having a typical A thickness between 10 and 15 microns. This may for example be obtained from a lead-free glass frit sold under the reference VN 821 from Ferro. The frit is mixed with the medium and then screen printed or Inkjet printing for deposition. Typically, the sample is heated at 300 ° C for 80 minutes in an electric field of 1 kV. The polarization is completed. As an assembly change as shown in Figure 7b, the entire circumference of the panel 2' is recessed to maintain the same sealing height. In the embodiment shown in Figure 8, the structure 400 of the lamp substantially repeats the Structure, except: - replacing (completely or partially) carbon nanotubes with tungsten microtip 8'; - cathode 4' is transparent, such as a conductive oxide layer; - plate 6' is in the inner space, with a second wall The small size, and the seal is between the two walls 1, 2; - the plate 6 is fixed to the second wall 2 with the glass sealant 40 present on the periphery; and the gap between the gap holes 63 is at least a gap The width of the aperture 63 is twice (not drawn to scale in the drawings). With the choice of slot spacing, cathode material 4 and surrounding seals, this lamp 201005789 also produces two-way illumination (and therefore on both sides of the lamp), and its illumination can be maintained differently (eg symbolic by different widths of the arrows) Show general). The above examples are of course not limited to the invention. As for the aperture (blind or exposed and any possible shape) and as for the electrode (the choice of material and shape), or the seal or chain between the plate and the second wall Possible methods, all assembly changes and asymmetry are possible. The illuminating region can also form a list of geometric pattern elements (lines, posts, circles, squares, or any other shape regions), and the spacing between the dimensions of the pattern elements and/or pattern elements can be varied. As a variant, a UV lamp is produced by selecting a cathode illuminating element and a first wall (or second wall) made of a suitable material. BRIEF DESCRIPTION OF THE DRAWINGS Other details and features of the present invention will become apparent from the following detailed description. a cross-sectional view of the transverse section; - Figure 2 is a top plan view of a perforated glass plate on a glass sheet with electron-emitting material of the first embodiment shown in Figure 1; - Figure 3 is a second embodiment A transverse cross-sectional view of a planar field emission lamp emitted in visible light; - Figure 3a is a partial cross-sectional view of a transverse field emission lamp emitted in visible light in a variation of the second embodiment; - Figure 4 is for 3 is a top view of a perforated glass plate on a glass sheet having electron emission -41 - 201005789 material of the second embodiment shown in FIG. 3; FIG. 5 is a glass sheet having an electron emission material according to another embodiment of the present invention. A top view of a perforated glass plate in a portion; - Figure 6 is a schematic cross-sectional view of a planar field emission lamp emitted in visible light in the third embodiment; - Figure 7a is used in Figure 6 The third embodiment has an electron The perforated glass sheet on the glass sheet of the emitting material is top view, and Fig. 7b is a variation thereof: and - Fig. 8 is a schematic cross-sectional view of the planar field emission lamp emitted in visible light in the fourth embodiment. It should be noted that, for the sake of clarity, the various elements of the objects presented are not necessarily drawn to scale. [Description of main component symbols] 1 : First wall 1: First glass piece 1 ': Back panel 2: Second wall 2: Second glass piece 2': Plate 3: Anode 3': Transparent conductive layer 4: Conductive Coating 4': Cathode-42-201005789 5: Phosphor 6: Plate 6': Plate 6": Polarized layer 7: Accelerating electrode 8: Electron emitting material 8': Tungsten microtip φ 8 ": Nanowire 9 : Seal 1 〇: Internal space 1 〇 ' : Spacer 1 1 : Internal main surface 12 : External main surface 13 : Polyvinyl butyral sheet 21 : Internal main surface φ 22 : External main surface 23 : Second wall 23 ' : blind hole 3 3 : external supply structure 33 ′ : supply structure 40 : glass seal 43 : bus bar 60 : layer 61 : face -43 201005789 62 : face 63 : slot 63 ' : slot 7 0 : remaining field 7 0 ' : Residual electric field 7 0": Residual electric field 73: External supply structure 100: Planar field emission lamp 200: Structure 200': Lamp 3 00: Structure 400: Structure

Claims (1)

201005789 七、申請專利範園 1.—種平面場發射燈(100至400),其在可見光及 /或紫外光範圍傳送輻射,包含: -第一和第二平面介電壁(1、2、2,)’其彼此面對 ’並且具有保持平行和隔開的主要表面,該燈具有一周圍 密封(9),如此界定真空下的一內部空間(10); -一第一電極(3),被稱作陽極,位在平行於該等 Φ 主要表面的一平面中並且與該第一壁(1)結合,該組裝 包含該第一壁和該陽極,其爲透明或通常在該可見光及/ 或該紫外光範圍是透明的; -一磷光體材料(5),藉由電子森擊而發射可見光 及/或紫外光(UV)輻射,該材料在該第一壁的內面( 11)上’並且比該陽極更接近該內部空間; -一第二電極(4),被稱作陰極,位在平行於該等 主要表面的一平面中; ® -—電子發射材料(8、8’、8”),具有比10大的形 狀因子,該材料在該陰極上;及 •一電子加速元件,插入在該第一和第二壁之間且與 該第一壁隔開,位在約平行於該等主要表面的一平面中, 並且具有讓該等電子通過它們的複數隙孔,其特徵在於該 電子加速元件包含一有孔的、本質上是礦物的介電板(6 、6’、2’)及/或一非連續琺瑯爲基的介電層(6”),該 等隙孔(63、63’、23”)至少露在被稱作該板的自由面( 61)之該主要面上,與該第一壁的該內面(u)相對,及 -45- 201005789 其中就該電子轟擊而言,該有孔的板(6)或該非連續琺 瑯爲基的層(6”)在其自由面(61)上攜帶一第三電極( 7),其形成一加速電極,或者該有孔的板(6’、2’)或該 非連續琺瑯爲基的層(6”)具有一極化表面(60 )’如此 產生一電子加速剩餘電場(70、70’、70”),及其中該陰 極在該第二壁(2)的內面(21)上,及/或當該有孔的 板之該等隙孔(23’)被選定爲盲孔時,在該板(2’)之該 等隙孔的底面中。 @ 2·根據申請專利範圍第1項之平面燈(1〇〇至400) ,其中該板(6、6’、2’)係以選自一陶瓷、一玻璃陶瓷、 及一玻璃的材料爲基。 3·根據申請專利範圍第1項或第2項之平面燈(1〇〇 至400),其中該等壁(1、2、2,)是玻璃,尤其是鹸石 灰砂土玻璃,或石英片。 4. 根據前述申請專利範圍的任一項之平面燈(100至 300),其中該密封,藉由至少—礦物密封較佳,係在該 參 板(6、6’)的該自由面(62)和該第一壁的該內面(21 )之間。 5. 根據前述申請專利範圍的任一項之平面燈’其中 該有孔的板與該第二壁隔開,及隙孔露在與該自由面相對 的面上。 6. 根據申請專利範圍第1至4項的任一項之平面燈 (300 ) ’其中該第二壁(2,)係由具有肓孔(23,)之該 有孔的板(2,)所組成,但是露在該第二壁的一邊緣上較 -46- 201005789 佳,及該陰極以一導電層的形式位在該等隙孔 並且較佳是透過該凹下邊緣(23)來電供應。 7.根據申請專利範圍第1至4項的任一 (100、200、400),其中較佳透過本質上是 機構(4、40),尤其是一玻璃料(40)、一雀 焊接、或陽極密封,而將與該自由面(61)相 該面(62)固定至該第二壁(2)的該內面(2 • 8·根據申請專利範圍第7項之平面燈( 400 ),其中該等隙孔露在與該自由面(61 ) (62)上,及該第二壁的該內面(21)包含由 料製成之一外部導電層(4),其位在該第二 的板之間,以使至少部分形成該陰極及/或用 料(8)的生長之一催化劑當作一層。 9. 根據申請專利範圍第8項之平面燈( 400 ),其中直接在該內面上的一單層較佳之 • 層(4)係由選自鎳、鉻、鐵、鈷、及其混合 所製成。 10. 根據前述申請專利範圍的任一項之q 至3 00 ),其中該發射材料(8)係以碳爲基, 米管的形式。 11·根據申請專利範圍第1至9項的任一 (400 ),其中該發射材料包含微米大小或甚 小的金屬尖端(8,),尤其是鎢尖端。 12.根據申請專利範圍第1至9項的任一 的底面中, 項之平面燈 礦物的鏈結 同焊(4)、 對之該板的 1 )。 100 、 200 、 相對的該面 導電鏈結材 壁和該有孔 於該發射材 100、 200 ' 該外部周圍 物的一材料 S面燈(100 尤其是以奈 項之平面燈 至次微米大 項之平面燈 -47- 201005789 (2 00,),其中該發射材料係以氧化鋅奈米線(8”)爲基 〇 13. 根據前述申請專利範圍的任一項之平面燈 ),其中該有孔的板上之該加速電極(7)包含一導電層 ,尤其是一金屬層,及位在一子層上較佳,尤其是以砂土 或氮化矽爲基的一子層。 14. 根據前述申請專利範圍的任一項之平面燈(300 ),其中將該選用的極化板(2,)塗佈有以極化矽土或極 化琺瑯爲基之一層(60)。 15. 根據前述申請專利範圍的任一項之平面燈(1〇〇 至300 ),其中該陰極(4)包含一金屬導電層(4) ’其 形成用於該發射材料(8)的薄膜生長之一催化劑當作一 層,尤其是選自鎳、鉻、鐵、鈷、及其混合物的一材料。 16. 根據前述申請專利範圍的任一項之平面燈(100 至400 ),其中該陰極(3 )以一透明導電層或一非連續金 靥層的形式位在該第一壁之該內面(11)上,尤其是以網 柵形式配置,及該陽極在一屏障子層上較佳’尤其是~矽 土或氮化矽層。 17. 根據前述申請專利範圍的任一項之平面燈(100 至400 ),其中該陽極(3)被供應有正DC電位(VI), 將該陰極(4)接地(V2),及其中該燈選用地包含一電 保護元件(3’),與該第一壁的外面(12)結合,其爲一 透明導電層且接地(V4)或一透明介質。 18. 根據前述申請專利範圍的任一項之平面燈(400 201005789 )’其中在面對該第二壁的側面上,在該可見光及/或該 UV範圍中的總傳送等於或大於50%,及該(等)發射區 的面積等於或小於該燈之內部面積的50 %較佳。 19. 根據前述申請專利範圍的任一項之平面燈(1〇0 至400 ),其中以該可見光發射之該燈形成—裝飾或建築 元件’具有一顯示功能的一元件,諸如例如平面照明燈具 、照明壁、尤其是懸吊壁、照明磚、及用於顯示螢幕的背 • 光。 20. 根據前述申請專利範圍的任一項之平面燈(1〇〇 至400 ),其中以該可見光發射之該.燈形成用於建築物的 一照明窗或陸、空、海移動機構的一照明窗之一部分,用 於移動的機構之照明屋頂,陸、空、海移動機構的兩隔間 之間或兩房間之間的內部隔牆,一櫥窗,一都市家具元件 ’一家具外觀或一冰箱層架,及其中該UV燈用於美學目 的,諸如日曬燈等,用於生化、電子、或食物目的,用於 Φ 淨化自來水,用於使游泳池水可飲用,用於淨化空氣ph, 用於UV乾燥,及用於熟化。 21. —種有孔的板(2’,6’)或具有一極化表面的非 連續琺瑯層(6”)之用途,尤其是選自具有一極化矽土爲 基的層(60)或具有一極化琺瑯層的一極化玻璃板(2,, 6’)、一極化琺瑯層(6”)、或一介電板,諸如一平面場 發射燈(200至400 )中的一電子加速元件。 22. —種燈之製造方法,該燈係爲根據申請專利範圍 第1至20項的任一項之燈(1〇〇、200、400),包含藉由 -49- 201005789 至少部分形成用於該發射材料的一催化劑當作一層及/或 該陰極的一鏈結材料來鏈結該第二壁(2)和該有孔的板 (6’ 6’),該有孔的板具有露在與該自由面(62)相對 的該面(6 1 )上之隙孔。 23. 根據申請專利範圍第22項之燈(100、200、400 )的製造方法,其中將該鏈結材料沈積在該第二壁的該內 面上以及與該板相對的該面上。 24. 根據申請專利範圍第22或23項之燈(1〇〇、200 、40 0 )的製造方法,其中經由露在與該板的該自由面相 對之該面上的該等隙孔’將該電子發射材料(8)沈積在 該第二壁的該內面上。 25. —種燈的製造方法,該燈係爲根據申請專利範圍 第1至20項的任一項之燈(200’),其特徵在於該方法 連續地包含: -在該第二壁的該內面上之該陰極上,一可極化玻璃 料爲基的層之非連續沈積,尤其是透過噴墨印刷或絲網印 刷; -一燃燒步驟,以形成該琺瑯層(6”);及 -一極化該琺瑯層(6”)的步驟。 -50-201005789 VII. Application for Patent Park 1. A type of flat field emission lamp (100 to 400) that transmits radiation in the visible and/or ultraviolet range, comprising: - first and second planar dielectric walls (1, 2) 2)) 'which faces each other' and has a main surface that remains parallel and spaced apart, the luminaire has a surrounding seal (9), thus defining an internal space (10) under vacuum; - a first electrode (3), Referred to as an anode, in a plane parallel to the major surfaces of the Φ and associated with the first wall (1), the assembly comprises the first wall and the anode, which is transparent or generally in the visible light and/or Or the ultraviolet light range is transparent; - a phosphor material (5) that emits visible light and/or ultraviolet (UV) radiation by electronic smashing, the material being on the inner surface (11) of the first wall 'and closer to the internal space than the anode; - a second electrode (4), referred to as the cathode, in a plane parallel to the major surfaces; ® - electron emissive material (8, 8', 8") having a shape factor greater than 10, the material being on the cathode; An electron accelerating element interposed between and spaced apart from the first wall and positioned in a plane parallel to the major surfaces and having a plurality of spaces through which the electrons pass a hole, characterized in that the electron acceleration element comprises a porous, substantially mineral dielectric plate (6, 6', 2') and/or a discontinuous germanium-based dielectric layer (6"), The apertures (63, 63', 23") are exposed at least on the major face of the free face (61) referred to as the plate, opposite the inner face (u) of the first wall, and -45 - 201005789 wherein, in the case of electron bombardment, the apertured plate (6) or the discontinuous raft-based layer (6") carries a third electrode (7) on its free surface (61) which forms a The accelerating electrode, or the apertured plate (6', 2') or the discontinuous germanium-based layer (6") has a polarized surface (60)' such that an electron accelerating residual electric field (70, 70', 70"), and wherein the cathode is on the inner surface (21) of the second wall (2), and/or when the apertured plate of the apertured plate (23) ') is selected as a blind hole in the bottom surface of the gap of the plate (2'). @ 2· A flat lamp (1〇〇 to 400) according to the scope of claim 1 wherein the plate (6, 6', 2') is selected from the group consisting of a ceramic, a glass ceramic, and a glass. base. 3. A flat lamp (1〇〇 to 400) according to item 1 or 2 of the scope of the patent application, wherein the walls (1, 2, 2,) are glass, especially 鹸 lime sand glass, or quartz . The flat lamp (100 to 300) according to any one of the preceding claims, wherein the seal is preferably at least the mineral seal, the free face of the slab (6, 6') (62) And between the inner face (21) of the first wall. 5. A flat lamp according to any one of the preceding claims, wherein the apertured plate is spaced from the second wall and the aperture is exposed on a face opposite the free face. 6. A flat lamp (300) according to any one of claims 1 to 4, wherein the second wall (2,) is a perforated plate (2,) having a bore (23,) Composition, but exposed on an edge of the second wall is better than -46-201005789, and the cathode is located in the gap hole in the form of a conductive layer and is preferably supplied through the concave edge (23) . 7. According to any one of claims 1 to 4 (100, 200, 400), wherein the preferred transmission is essentially a mechanism (4, 40), especially a frit (40), a fin welding, or An anode seal, and the face (62) of the free face (61) is fixed to the inner face of the second wall (2) (2 • 8 · a flat lamp (400) according to item 7 of the patent application scope, Wherein the gap is exposed on the free surface (61) (62), and the inner surface (21) of the second wall comprises an outer conductive layer (4) made of material, which is located at the Between the two plates, a catalyst which at least partially forms the growth of the cathode and/or the material (8) is used as a layer. 9. The flat lamp (400) according to claim 8 of the patent application, wherein directly A single layer on the inner surface is preferably made of a layer selected from the group consisting of nickel, chromium, iron, cobalt, and mixtures thereof. 10. q to 300 according to any of the preceding claims. Wherein the emissive material (8) is in the form of a carbon based tube. 11. The method of any one of claims 1 to 9 (400), wherein the emissive material comprises a micron-sized or small metal tip (8), in particular a tungsten tip. 12. According to the bottom surface of any of the claims 1 to 9 of the patent application, the chain of the flat lamp mineral is the same as the weld (4), and 1) of the plate. 100, 200, the opposite side of the conductive chain material wall and the material S-side lamp having the hole of the outer surface of the emissive material 100, 200' (100, especially the flat lamp of the nematic item to the sub-micron item a planar light-47-201005789 (2 00,), wherein the emissive material is based on a zinc oxide nanowire (8"). The flat lamp according to any one of the preceding claims, wherein The accelerating electrode (7) on the plate of the hole comprises a conductive layer, in particular a metal layer, and is preferably located on a sub-layer, in particular a sub-layer based on sand or tantalum nitride. A planar lamp (300) according to any one of the preceding claims, wherein the selected polarizing plate (2,) is coated with a layer (60) based on polarized alumina or polarized germanium. A planar lamp (1〇〇 to 300) according to any one of the preceding claims, wherein the cathode (4) comprises a metal conductive layer (4) 'which forms one of thin film growth for the emissive material (8) The catalyst acts as a layer, especially a material selected from the group consisting of nickel, chromium, iron, cobalt, and mixtures thereof The flat lamp (100 to 400) according to any one of the preceding claims, wherein the cathode (3) is located on the inner surface of the first wall in the form of a transparent conductive layer or a discontinuous metal layer (11), in particular in the form of a grid, and the anode is preferably a 'bare earth or tantalum nitride layer' on a barrier sublayer. 17. A planar light according to any of the preceding claims (100 to 400), wherein the anode (3) is supplied with a positive DC potential (VI), the cathode (4) is grounded (V2), and wherein the lamp optionally comprises an electrical protection element (3'), The outer surface (12) of the first wall is bonded, which is a transparent conductive layer and is grounded (V4) or a transparent medium. 18. A planar light according to any of the preceding claims (400 201005789) On the side of the second wall, the total transfer in the visible light and/or the UV range is equal to or greater than 50%, and the area of the (etc.) emitter region is equal to or less than 50% of the inner area of the lamp. 19. A planar light (1〇0 to 400) according to any one of the preceding claims, The lamp that emits with the visible light forms an element of a decorative or architectural element that has a display function, such as, for example, a planar lighting fixture, an illumination wall, in particular a suspended wall, a lighting tile, and a backlight for displaying the screen. The flat lamp (1〇〇 to 400) according to any one of the preceding claims, wherein the light emitted by the visible light forms a lighting window for a building or a land, air, and sea moving mechanism One part of the lighting window, the illuminated roof of the moving mechanism, the internal partition between the two compartments of the land, air and sea moving mechanism or between the two rooms, a window, an urban furniture component 'a furniture look or a a refrigerator shelf, and the UV lamp therein is used for aesthetic purposes, such as a sun light, for biochemical, electronic, or food purposes, for Φ purifying tap water, for making swimming pool water drinkable, for purifying air ph, Used for UV drying and for curing. 21. Use of a perforated plate (2', 6') or a discontinuous tantalum layer (6" having a polarized surface, in particular selected from the group consisting of a polarized alumina based layer (60) Or a polarized glass plate (2, 6') having a polarized layer, a polarized layer (6"), or a dielectric plate, such as in a planar field emission lamp (200 to 400) An electronic acceleration component. 22. A method of manufacturing a lamp, which is a lamp (1, 200, 400) according to any one of claims 1 to 20, comprising at least partially formed by -49-201005789 a catalyst of the emissive material acts as a layer and/or a link material of the cathode to link the second wall (2) and the perforated plate (6' 6'), the perforated plate having a dew a slot on the face (61) opposite the free face (62). 23. The method of manufacturing a lamp (100, 200, 400) according to claim 22, wherein the link material is deposited on the inner face of the second wall and on the face opposite the plate. 24. The method of manufacturing a lamp (1, 200, 40 0) according to claim 22 or 23, wherein the gap hole' is exposed on the face opposite the free face of the plate The electron-emitting material (8) is deposited on the inner face of the second wall. A lamp (200') according to any one of claims 1 to 20, characterized in that the method continuously comprises: - the a non-continuous deposition of a polarizable frit-based layer on the inner surface of the cathode, in particular through ink jet printing or screen printing; a combustion step to form the tantalum layer (6"); - a step of polarizing the layer (6"). -50-
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CN103426718A (en) * 2013-03-25 2013-12-04 上海显恒光电科技股份有限公司 Flat ultraviolet radiation light source 3D printing system and light source thereof
CN103426718B (en) * 2013-03-25 2016-08-10 上海显恒光电科技股份有限公司 Flat-panel radiating light source 3D print system and light source thereof
TWI753924B (en) * 2016-07-07 2022-02-01 法商達樂股份有限公司 Vacuum electron tube with planar cathode based on nanotubes or nanowires

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WO2009138682A2 (en) 2009-11-19
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FR2930673A1 (en) 2009-10-30

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