TW200949239A - Glass waviness inspection device and inspection method thereof - Google Patents

Glass waviness inspection device and inspection method thereof Download PDF

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Publication number
TW200949239A
TW200949239A TW097119401A TW97119401A TW200949239A TW 200949239 A TW200949239 A TW 200949239A TW 097119401 A TW097119401 A TW 097119401A TW 97119401 A TW97119401 A TW 97119401A TW 200949239 A TW200949239 A TW 200949239A
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Taiwan
Prior art keywords
glass
light
ripple
wavelength
detecting device
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TW097119401A
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Chinese (zh)
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TWI388820B (en
Inventor
Soon-Jong Lee
Bong-Joo Woo
Seong-Jin Choi
Kyoung-Soo Lee
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Semisysco Co Ltd
Lg Display Co Ltd
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Publication of TW200949239A publication Critical patent/TW200949239A/en
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Publication of TWI388820B publication Critical patent/TWI388820B/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention discloses a glass waviness inspection device and an inspection method thereof. In the glass waviness inspection device and the inspection method thereof, when information about a shadow image contains noise due to brightness variation of light, power noise owing to instability of light or alternating current power, vibration generated while a glass moves, vibration of equipment or surroundings, etc., the noise is removed and then waviness on a surface of the glass is inspected, thereby eliminating an inspection error due to the noise, enhancing accuracy of the inspection and increasing satisfaction to products.

Description

200949239 九、發明說明: 【發明所屬之技術領域】 本發明是關於玻璃波紋檢測技術,且更明择地說,是 關於玻璃波紋檢測裝置以及其檢測方法,其 準確度同時防止歸因於諸如信號、聲雜訊其 璃的振動等等之基於檢測玻璃波紋時的外部因素之雜訊的 檢測誤差。 【先前技術】 薄膜電晶體液晶顯示ϋ包括形成有薄膜電晶體之下部 基板、形成有♦色濾、光狀上部基板,以及;主人於下部基 板與上部基板之間的液晶。 在基板即將形成有薄膜電晶體以及彩色滤光片之狀況 下,基板的表面上之膨脹、應變、刮痕、外來物 引發缺陷的產品。 因此’通常在處理腔室中㈣電漿於基板上執行沈 積、侧、贿或此等製程之前,基板必須經檢測。 然而’在基板之表面之習知的檢測的狀況下 機娜之關於基板之表面的影像資訊由於歸因於諸如電 號之雜訊、_杨、待_之基板 振動^ 等之外部因素的雜訊而受到失真。1此,習知 =錯誤以致將缺板狀為正常的以及 定 =】等等。如以上所描述,習知的檢測為並不準, 設想本發明解決如以上所描述之問題,且本發明之目 200949239 標為提供一種玻璃波紋檢測裝置以及其檢測方法,其中在 =訊中所含雜訊(例如,光之亮二= i义==穩之功率雜訊、玻璃移動時產生之振 因此I無L:兄之振動等等)的狀態下檢測玻璃波紋,且 確=在無歸因於雜訊之檢測誤差的情況下增強了檢測之準 ❹ 健ί想本發明解決如以上所描述之問題,且本發明之離 處=彳裝置,其包括用於檢查二 二應第波= 螢幕,在破壤透上= 先時所透射光在其上投影為陰影 ,對應於玻璃之表面且投影於螢幕上之器以ί 因 ===,理器操取之‘酬 資訊來檢測玻璃====_移除的陰影影像之 ,測單元可包括:照明器,其發 =:=第些光;朝向特定方向反射“光 :==;第二先量_器,其_第= -光mitri;以及波紋檢測器,其比較由第 200949239 波紋。 自照明器發射之光可包括氣氣燈、紅外線光源以及發 光二極體中之一者。 第二鏡面可以10。至90。之角度安裝以控制光之入射 角。200949239 IX. Description of the Invention: Technical Field of the Invention The present invention relates to a glass ripple detecting technique, and more particularly to a glass ripple detecting device and a detecting method thereof, the accuracy thereof being simultaneously prevented from being attributed to, for example, a signal The sound of the noise, the vibration of the glass, and the like are based on the detection error of the noise of the external factor when detecting the glass ripple. [Prior Art] A thin film transistor liquid crystal display unit includes a substrate on which a thin film transistor is formed, a color filter formed thereon, a light upper substrate, and a liquid crystal between the lower substrate and the upper substrate. A product in which expansion, strain, scratches, and foreign matter cause defects on the surface of the substrate in the case where a thin film transistor and a color filter are to be formed on the substrate. Therefore, the substrate must be inspected, usually before the deposition, side, bribe, or such process is performed on the substrate in the processing chamber. However, 'the image information on the surface of the substrate on the surface of the substrate is known to be due to external factors such as the noise of the electric signal, the vibration of the substrate such as the electric signal, etc. The news was distorted. 1 this, the conventional = error so that the lack of plate shape is normal and set =] and so on. As described above, the conventional detection is not accurate, and the present invention is conceived to solve the problems as described above, and the object 200949239 of the present invention is directed to provide a glass ripple detecting device and a detecting method thereof, wherein Detecting glass ripples in a state containing noise (for example, light bright two = i meaning == stable power noise, vibration generated when glass moves, so no L: brother vibration, etc.), and indeed = no return The detection of the noise is enhanced due to the detection error of the noise. The present invention solves the problems as described above, and the invention of the present invention includes the means for checking the second wave. The screen, on the broken soil penetration = the light transmitted by the first time is projected as a shadow on it, and the device corresponding to the surface of the glass and projected on the screen is used to detect the glass with the compensation information of ί因=== ====_Removed shadow image, the measuring unit may comprise: a illuminator, which emits =:= the first light; reflects "light:==; second pre-quantizer_, its__ - light mitri; and ripple detector, which is compared to ripples by the 200949239. Self-illuminator launch The light may include one of a gas lamp, an infrared source, and a light-emitting diode. The second mirror may be mounted at an angle of from 10 to 90 to control the angle of incidence of the light.

玻璃波紋檢測裝置可更包括狹縫,狹縫提供於照明器 之前端處且設定光之照射範圍以檢測玻璃之特定區域。 玻璃波紋檢測裝置可更包括濾光片構件,濾光片構件 提供於狹缝之前端處且僅允許具有特定頻帶之波長的光通 過其。 影像處理器可包括線掃描電荷耦合裝置(CCD)相機。 第一鏡面可包括半鏡面。 本發明之第三態樣為提供一種檢測破璃波紋之方法, 方法包括:自整體擷取之陰影影像選擇對應於特定區域之 待檢測的影像之第一步驟;藉由列表顯示關於特定區域之 所選影像中水平/垂直線之行的像素值(亮度)以及藉由移 動平均法以計算鄰近像素值的平均值來主要地減少來自影 像之雜訊之第二步驟;輸出藉由在第二步驟中主要地減少^ 雜訊之狀態下合計或平均來自像素值之所計算平均值的= 平線行A卜A2、A3、A4、Α5.·.Αη轉得之影像信號7的 第三步驟;以及判定第三步驟t之影像信號輸出是否超出 預設的臨限(threshold)值以檢測玻璃之表面上的波紋 四步驟。 ' 第 可藉由以下的等式來獲得基於第三步驟之合計(或平 200949239 均)結果之影像信號輸出: -^- = (-^4+8^3-8^+4,) 其中,ZW為用以藉由影像處理器在掃描一線之後掃 描另一線之時間(約1亳秒至2毫秒),且《為自然數。 在第三步驟中,當影像信號藉由快速傅立葉變換 (FFT)演算法變換為頻率信號波形時可檢查影像信號之哪 個區域含有雜訊信號。 【實施方式】 以下’將參看隨附圖式描述本發明之實施例。 圖1展示根據本發明之實施例之玻璃波紋檢測裝置的 組態’圖2為說明狹縫施加至根據本發明之實施例之照明 器的正視圖,圖3展示濾光片構件安裝至根據本發明之實 施例之照明’且圖4為說明在狹缝施加直根據本發明之 實施例之照明器的前端之狀況下的光徑之示意圖。 〇 參看圖1至圖4,根據本發明之實施例之玻璃波紋檢 測裝置包括檢測旱元,檢測單元用於檢查即將由輸送單元 100供應至處理設備之玻璃200之表面上的波紋。檢測單 元包括照明器10、第二鏡面20、螢幕3〇、影像處理器4〇 以及波紋檢測器50。 ' 照明器10發射光。照明器丨〇可包括氙氣燈、紅外線 * 光源以及發光二極體。 " 參看圖2,狹縫11提供於照明器1〇之前端處且將待 ❹The glass ripple detecting device may further include a slit provided at a front end of the illuminator and setting an irradiation range of the light to detect a specific region of the glass. The glass ripple detecting device may further include a filter member provided at the front end of the slit and allowing only light having a wavelength of a specific frequency band to pass therethrough. The image processor can include a line scan charge coupled device (CCD) camera. The first mirror may comprise a semi-mirror. A third aspect of the present invention provides a method for detecting a glass fringe, the method comprising: selecting a first step of an image to be detected corresponding to a specific area from a shadow image captured as a whole; displaying a specific area by a list The pixel value (brightness) of the horizontal/vertical line in the selected image and the second step of calculating the noise from the image by moving the average to calculate the average of the adjacent pixel values; the output is in the second In the step, the third step of the image signal 7 obtained by summing or averaging the calculated average value from the pixel value in the state of the noise = flat line A A2, A3, A4, Α5. And determining whether the image signal output of the third step t exceeds a preset threshold value to detect the ripple on the surface of the glass. ' The image signal output based on the total result of the third step (or flat 200949239) can be obtained by the following equation: -^- = (-^4+8^3-8^+4,) where, The ZW is the time (about 1 second to 2 milliseconds) for scanning the other line after scanning the line by the image processor, and "is a natural number. In the third step, when the image signal is converted into a frequency signal waveform by a fast Fourier transform (FFT) algorithm, it can be checked which region of the image signal contains the noise signal. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. 1 shows a configuration of a glass ripple detecting device according to an embodiment of the present invention. FIG. 2 is a front view illustrating the application of a slit to an illuminator according to an embodiment of the present invention, and FIG. 3 shows a filter member mounted to the present according to the present invention. The illumination of the embodiment of the invention' and FIG. 4 is a schematic view illustrating the optical path in the case where the slit is applied directly to the front end of the illuminator according to the embodiment of the present invention. Referring to Figs. 1 through 4, a glass corrugated detecting apparatus according to an embodiment of the present invention includes detecting a dry element, and the detecting unit is for checking a corrugation on a surface of a glass 200 to be supplied from a conveying unit 100 to a processing apparatus. The detecting unit includes a illuminator 10, a second mirror 20, a screen 3, an image processor 4A, and a ripple detector 50. The illuminator 10 emits light. The illuminator 丨〇 may include a xenon lamp, an infrared ray source, and a light emitting diode. " Referring to Figure 2, the slit 11 is provided at the front end of the illuminator 1〇 and will be awaiting

200949239 發射之光僅導引至第二鏡面20。另外,濾光片構件12提 供於狭縫之前端處且僅允許具有特定頻帶之波長的光通過 其。 濾光片構件12包括紫外線濾光片、紅外線濾光片以及 可見光濾光片。 紫外線濾光片僅允許紫外線區域之波長通過,或僅允 許其他可見光以及紅外線區域之波長通過其同時僅濾除紫 外線區域的波長,其中其波長頻帶自214〇11至39611111而 變化。 可見光濾光片僅允許可見光區域之特定波長通過,且 允許長於特定波長之波長通過其同時僅濾除短於特定波長 的波長,或允許短於特定波長之波長通過其同時僅濾除長 於特定波長之波長’其中其波長頻帶自462碰至75〇腿 而變化。紅外線濾光片僅允許紅外線區域之特定波長通 =且允許長於特定波長之波長通過其同時鶴除短於特 =波長的波長,或允許短於特⑽長之波長通過其同時僅 2長於特定波長之波長,其中其波長頻帶自760 nm至 而變化。第二鏡面2〇朝向玻璃細而反射自照明 的入射角射之光且以1〇。至9〇。之角度安裝以控制所反射光 光在透射自第二鏡面2G反射之光時,所透射之 H投影為對應於玻璃綱的表面之陰影影像。 景/影像。影像處理器40包括線掃描電荷轉合 200949239 裝置(CCD )相機。 波紋檢測器50自陰影影像而移除歸因於外部因素之 雜,且基於雜訊經移除之陰影影像來檢查該玻璃200的表 面品質。此處’外部因素包括光之亮度變化、光或特定頻 帶(例如,40 Hz至80 Hz)中的電信號之不穩定性、破璃 200移動以待檢測時產生之振動、設備或環境之振動等等。 在根據本發明之實施例之玻璃波紋檢測裝置以及其檢 測方法中,如圖j至圖13中所示,玻璃2⑻經移動至處理 設備以藉由使用電漿來用於沈積、蝕刻、濺鍍或此等製程 以製造薄膜電晶體液晶顯示器,或由諸如滾筒或具有定速 部分之機械臂之類的輸送單元100來停止。 σ當光以預定的照射角自安裝於輸送單元100下的照明 器10發射時,光自該在10。至90。之角度内經安裝以控制 入射角之第二鏡面20反射,且通過由輸送單元1〇〇輸送的 玻璃200。 ,接著,通過玻璃200之光使得玻璃2〇〇的陰影影像投 影於螢幕3G上。職狀陰娜像由㈣影減理器4〇 之線掃描CCD城娜,且接著魏讀嫌測器5〇。 一在照明器10發射光之狀況下,如圖2至圖4中所示, 光、、’£由文裝於照明器1〇之前端處的狹縫η自照明器 發射至第二鏡面20,且僅允許特定波長頻帶之光通過濾光 片構件12。 換言之’紫外線滤光片、可見光濾光片以及紅外線遽 光片經選擇性地組合且用作安裝至照明器1〇之濾光片構 200949239 件12。在此狀況下,濾光片構件12僅允許特定波長頻帶 之光通過。 舉例而言’若紫外線濾光片用作照明器10之濾光片構 件12,則當照明器1〇發射光至玻璃2〇〇時,紫外線濾光 片僅允許214 nm與396 nm之間的紫外線區域之波長通 過,或允許其他可見光以及紅外線區域之波長通過其同時 僅濾除紫外線區域之波長。 接著,特定波長頻帶之經過濾的光在其入射角由第二 鏡面20控制之狀態下自第二鏡面2〇反射,且通過玻璃 200。因此,通過玻璃200之表面之光使得陰影影像更清晰 地投影於螢幕30上。清晰陰影影像由用作影像處理器4〇 之線掃描CCD相機清晰地擷取,且接著發送至波紋檢測 器50。 另外,若可見光濾光片用作照明器1〇之濾光片構件 12,則當照明器10發射光至玻璃200時,可見光濾光片僅 允許426 nm與750 nm之間的可見光區域之特定波長通 過,允許長於特定波長之波長通過其同時僅濾除短於特定 波長的波長,或允許短於特定波長之波長通過其同時僅濾 除長於特定波長之波長。 . 、 接著’特定波長頻帶之經過濾的光僅照射玻璃2〇〇之 ,面且通過玻璃2〇〇。因此,通過玻璃2〇〇之表面之光使 ,陰影影像更清晰地投影於螢幕30上。清晰的陰影影像由 影像處理器40清晰地擷取;且接著發送至波紋檢測器5〇。 另外,若紅外線濾光片用作照明器10之濾光片構件 11 200949239 12’則當照明器10發射光至破璃2〇〇時,可見光濾光片僅 允許760 nm與1000 nm之間的可見光區域之特定波長通 過,允許長於特定波長之波長通過其同時僅濾除短於特定 波長的波長,或允許短於特定波長之波長通過 除長於特定波長之波長。 接著,特定波長頻帶之經過濾的光僅照射玻璃2〇〇之 ,面且通過玻璃2GG。因此’通過玻璃·之表面之光使 ❹ 影像更清晰地投影於®幕3G上。清晰的陰影影像由 衫像處理H 40清晰地練,且接著魏至驗檢測器5〇。 此時’舰制^ 5〇將清_陰郷像魏為波形圖 :、’且自陰影彡目案移除歸祕外部因素之雜 :用:!關於玻璃200之均勻度之參考值的邊界條件 !鎌的影像魏,以便準確 · 疋否具有波紋。 更詳言之,如圖5中戶斤.J, AV. . T 不首先,波紋檢測器50自藉200949239 The emitted light is only directed to the second mirror 20. In addition, the filter member 12 is provided at the front end of the slit and allows only light having a wavelength of a specific frequency band to pass therethrough. The filter member 12 includes an ultraviolet filter, an infrared filter, and a visible light filter. The ultraviolet filter only allows the wavelength of the ultraviolet region to pass, or allows only the wavelengths of other visible and infrared regions to pass through it while filtering only the wavelength of the ultraviolet region, wherein its wavelength band varies from 214〇11 to 39611111. The visible light filter only allows a specific wavelength of the visible light region to pass, and allows wavelengths longer than a specific wavelength to pass through at the same time only filtering out wavelengths shorter than a specific wavelength, or allowing wavelengths shorter than a specific wavelength to pass through at the same time only filtering longer than a specific wavelength The wavelength 'where its wavelength band varies from 462 to 75 feet. The infrared filter only allows a specific wavelength of the infrared region to pass = and allows a wavelength longer than a specific wavelength to pass through at the same time to eliminate a wavelength shorter than the specific wavelength, or to allow a wavelength shorter than the (10) long wavelength to pass through at the same time only 2 longer than a specific wavelength The wavelength in which the wavelength band varies from 760 nm. The second mirror surface 2 is thin toward the glass and is reflected from the incident angle of the illumination and is 1 〇. To 9 〇. The angle is mounted to control the reflected light to be reflected by the second mirror 2G, and the transmitted H projection is a shadow image corresponding to the surface of the glass. Scene/image. Image processor 40 includes a line scan charge transfer 200949239 device (CCD) camera. The ripple detector 50 removes from the shadow image due to external factors and checks the surface quality of the glass 200 based on the removed shadow image of the noise. Here, 'external factors include changes in the brightness of light, instability of electrical signals in light or specific frequency bands (eg, 40 Hz to 80 Hz), vibrations generated when the glass 200 moves to be detected, vibration of equipment or the environment and many more. In the glass corrugation detecting apparatus and the detecting method thereof according to the embodiment of the present invention, as shown in FIGS. j to 13, the glass 2 (8) is moved to the processing apparatus to be used for deposition, etching, sputtering by using plasma. Or such a process to manufacture a thin film transistor liquid crystal display, or to be stopped by a transport unit 100 such as a drum or a robot arm having a constant speed portion. σ When the light is emitted from the illuminator 10 mounted under the transport unit 100 at a predetermined illumination angle, the light is from 10. To 90. The second mirror 20, which is mounted to control the angle of incidence, is reflected by the angle and passes through the glass 200 conveyed by the transport unit 1〇〇. Then, the shadow image of the glass 2 投 is projected onto the screen 3G by the light of the glass 200. The role of Yin Na is scanned by CCD Chengna from the line of (4) Shadow Reducer 4〇, and then Wei reading the detector 5〇. In the case where the illuminator 10 emits light, as shown in FIGS. 2 to 4, the light η, the slit η at the front end of the illuminator 1 自 is emitted from the illuminator to the second mirror 20 And only light of a specific wavelength band is allowed to pass through the filter member 12. In other words, the ultraviolet filter, the visible light filter, and the infrared ray film are selectively combined and used as a filter structure mounted to the illuminator 1 200949239. In this case, the filter member 12 allows only light of a specific wavelength band to pass. For example, if an ultraviolet filter is used as the filter member 12 of the illuminator 10, when the illuminator 1 〇 emits light to the glass 2 紫外线, the ultraviolet filter only allows between 214 nm and 396 nm. The wavelength of the ultraviolet region passes, or allows the wavelengths of other visible and infrared regions to pass through while filtering only the wavelength of the ultraviolet region. Then, the filtered light of the specific wavelength band is reflected from the second mirror surface 2 in a state where the incident angle thereof is controlled by the second mirror 20, and passes through the glass 200. Therefore, the light passing through the surface of the glass 200 causes the shadow image to be projected more clearly on the screen 30. The clear shadow image is clearly captured by the line scan CCD camera used as the image processor 4〇 and then sent to the ripple detector 50. In addition, if the visible light filter is used as the filter member 12 of the illuminator 1, when the illuminator 10 emits light to the glass 200, the visible light filter only allows the specificity of the visible light region between 426 nm and 750 nm. The passage of wavelengths allows wavelengths longer than a particular wavelength to pass through at the same time only filtering wavelengths shorter than a particular wavelength, or allowing wavelengths shorter than a particular wavelength to pass through at the same time only filtering wavelengths longer than a particular wavelength. Then, the filtered light of the 'specific wavelength band' illuminates only the glass, and passes through the glass. Therefore, the shadow image is more clearly projected onto the screen 30 by the light of the surface of the glass. The clear shadow image is clearly captured by image processor 40; and then sent to ripple detector 5〇. In addition, if the infrared filter is used as the filter member 11 of the illuminator 10 200949239 12', when the illuminator 10 emits light to the glass 2, the visible light filter only allows between 760 nm and 1000 nm. The passage of a specific wavelength in the visible light region allows wavelengths longer than a specific wavelength to pass through at the same time only filtering out wavelengths shorter than a specific wavelength, or allowing wavelengths shorter than a specific wavelength to pass wavelengths longer than a specific wavelength. Then, the filtered light of a specific wavelength band is irradiated only to the glass, and passes through the glass 2GG. Therefore, the image of the surface of the glass is projected more clearly on the screen 3G by the light of the surface of the glass. The clear shadow image is clearly trained by the shirt image processing H 40, and then the Wei to the detector 5 〇. At this time, 'ship system ^ 5 〇 will clear _ 郷 郷 like Wei for the waveform diagram:, 'and remove the external factors from the shadow 彡 彡 : : : : : : : : : : : : : : : : : : : : : : : : : : : Condition! The image of 镰 is Wei, so that it is accurate. More specifically, as shown in Fig. 5, J. AV, . . . T. First, the ripple detector 50 borrows itself.

Q =:景:操取並發送之整個陰影影像來選擇對應 像對應於特定區域之影像而非整個陰影影 t ’則由於在檢測玻璃獅之 =^2如圖12中所示水平地發生,但某些可 (λ 發生’因此在僅合計(或平均)膨脹 (亦即,僅㈣區域)時會出現問題。 接著,如圖6中戶斤子,石,丨* β i ^ 1. r 斤 列表顯示關於所選特定區域之 影像中之水平/垂直線的行之像素值(亮度〕,料移動平〃 12 200949239 S3算鄰近像素值料均值,藉此主要地自陰影影像 僅作參考’雜訊在儲存資料時已含於陰影影 錄=度變化、光或預定頻帶之電信號之不穩定性、玻璃 於阶^^振H備麵躺鶴料峡,雜訊含 ❹ ❹ ,弋此來增強檢測的準確度且增加對產品之滿之= 此,波紋檢測器50主要執行減少雜訊之操作。—因 在如以上所描述主要地減少雜訊之狀態下 器5〇輸出藉由如圖7所示合計(或平均 估檢測 計f的平均值之水平線行A1、A2、A3、A4、A5、:: 獲得之影像信號。藉由以下的等式獲得影像信號。··· n 士 = (乂4+H+3-H+1M) 其中,A為用以藉由影像處理 乂時,影像錢具有如圖8中所示之波形圖案然數 形圖案巾之祕錢巾所含軸 立、施 (FFT)演算法變換為如圖9中 ㈣立葉變換 測器直接可見。冑9中所不之頻率信號波形時由檢 因此’波紋檢測器50判定含有 ^ 出預設的臨限值。若判定影像信號超出了 =破 檢測器50準確地檢查如圖1〇中所示之玻璃2⑽之表= 13 200949239 的波紋。 ❹Q =: Scene: fetch and send the entire shadow image to select the corresponding image corresponding to the specific area instead of the entire shadow shadow t 'because the detection of the glass lion = ^ 2 occurs horizontally as shown in Figure 12, But some can (λ occurs 'so there is a problem when only the total (or average) expansion (that is, only the (four) area). Next, as shown in Figure 6, the household, stone, 丨 * β i ^ 1. r The pound list displays the pixel value (brightness) of the horizontal/vertical line in the image of the selected specific area, and the material moves flat. 12 200949239 S3 calculates the average value of the neighboring pixel values, thereby mainly referring to the shadow image as a reference. When the data is stored, the noise is already contained in the shadow recording = degree change, the instability of the light or the predetermined frequency band, the glass in the order, the vibration of the surface, the hoisting gorge, the noise containing ❹ 弋, 弋To enhance the accuracy of the detection and increase the fullness of the product = this, the ripple detector 50 mainly performs the operation of reducing the noise. - Because the noise is mainly reduced as described above, the output of the device 5 Figure 7 shows the total (or average of the average of the test f) Lines A1, A2, A3, A4, A5, ::: Obtained image signals. The image signal is obtained by the following equation: ··· n 士 = (乂4+H+3-H+1M) where A In order to use the image processing method, the image money has a waveform pattern of the pattern pattern as shown in FIG. 8 and the axis of the money towel is transformed into an FFT algorithm as shown in FIG. 9 (four) The transducer is directly visible. The waveform of the frequency signal that is not in 胄9 is detected by the detection. Therefore, the ripple detector 50 determines that the preset threshold value is included. If it is determined that the image signal is out of the = detector Detector 50, it is accurately checked. The table of glass 2 (10) shown in Fig. 1 = = the ripple of 13 200949239.

舉例而言,待檢測之膨脹之寬度為約3晒至 二厚度為若干nm至許多nm,玻璃2〇〇以恆定速率 苇數)移動,且以預定間隔(例如,i毫秒至2亳秒) 新影像資訊。因此,當藉由FFT將圖8之影像信號變換 圖9之影像信號時’可計算哪個部分對應於信號區域。、^ 即,3 mm之間隔之膨脹對應於t(時間)=3 mm/vi經變換 為f=l/t=v/3 mm之頻率,使得信號區域可自fl至Q (打 打一l/t=v/3 mm,f2=l/t2=v/10 mm)而變化。 因此,不同於前述範圍之區域視為不必要的雜訊,且 波紋檢測器50使用關於玻璃200之均勻度的參考值之邊界 條件且更準確地檢查玻璃200之表面上是否存在著膨騰。 此處,藉由FFT將圖10之如以上所描述的雜訊經移 除之影像信號的波形變換為如圖11中所示之頻率信號波 形,使得檢測器直接可看見已移除雜訊之狀態。 同時,圖14展示根據本發明之另一實施例之檢測裝 置。在此實施例中,檢測裝置包括:照明器10,其發射光; 第一鏡面60,其用以透射自照明器10發射之某些光且朝 向預定的方向反射某些光;第二鏡面20,其用以反射通過 第一鏡面60之某些光使得所反射之光通過玻璃200;第一 光量偵測器7〇,其用以偵測自第二鏡面20反射且通過玻 璃200之光的量;第二光量偵測器80,其用以偵測自第一 面60朝向預定的方向反射之光的量;以及波紋檢測器 50,其比較由第一光量偵測器7〇以及第二光量偵測器80 200949239 偵測到之光量,移除玻璃之性質中所包括的雜訊或由交流 電源產生之功率雜訊,其中雜訊是歸因於外部因素,且在 無雜訊之情形下根據光量來檢測該玻璃200之表面上之波 紋。 如圖14中所示,當照明器10發射光時,某些光(50%) 自該没置為半鏡面之第一鏡面60反射且經導引至第二光 量偵測器80,但光之剩餘部分(50%)通過第一鏡面6〇 且經導引至第二鏡面20。 ❹接著,第二光量偵測器80偵測某些光的量且將偵測結 果輸出至波紋檢測器50,且第二鏡面20朝向玻璃200反 射某些通過第一鏡面60之光使得所反射的光可通過玻璃 200。 此時,當玻璃200透射自第二鏡面2〇反射之光時,由 第一光量偵測器70偵測透射的光量且接著將偵測結果發 送至波紋檢測器50。 波紋檢測器50比較由第一光量偵測器7〇以及第二光 〇 量偵測器80偵測之光量,移除由外部因素引起之雜訊(特 定吕之,功率雜訊)’且在無雜訊的情形下根據光量來檢測 該玻璃200之表面上的波紋。 因為由第二光量偵測器8〇偵測到之光量與玻璃2〇〇 無關,但通過玻璃200且由第一光量偵測器7〇偵測到的光 量受玻璃200影響,所以波紋檢測器5〇基於由第一光量偵 測器70偵測到之光量相對於由第二光量偵測器8〇偵測到 之光量來移除由交流電源產生的功率雜訊。因此,波紋檢 15 200949239 /XI器50在無雜訊之情形下根據光量而應用關於玻璃200 之均勻度的參考值之邊界條件,藉此更準確地檢查玻璃 200之表面上是否存在著膨脹。 以下將避免反覆的描述。 對於熟習此項技術者將顯而易見,在不脫離本發明之 精神或範疇之情形下可在本發明中進行各種修改以及變 化。因此,本發明意欲覆蓋本發明之修改以及變化,只要 該變化及修改在附加申請專利範圍以及其等效物之範疇 内。 根據本發明之實施例,當關於陰影影像之資訊含有歸 因於光的亮度變化、由於光或交流電源之不穩定性之功率 雜訊、玻璃移動時產生的振動、設備或環境之振動等等之 雜訊時,移除雜訊且檢測玻璃之表面上的波紋,藉此消除 歸因於雜訊之檢測誤差,從而增強檢測之準確度且增加對 產品的滿意度。 【圖式簡單說明】 圖1展示根據本發明之實施例之玻璃波紋檢測裝置的 組態。 圖2為說明狹縫施加至根據本發明之實施例之照明器 的正視圖。 圖3展示濾光片構件安裝至根據本發明之實施例之照 明器。 ⑼ 圖4為說明在狹縫施加至根據本發明之實施例之照明 器的前端之狀況下的光徑之示意圖。 16 200949239 圖5至圖11展示根據本發明之實施例檢測玻璃波故之 12以及圖13為根據本發明之實施例之玻璃的表 上的水平膨脹或傾斜膨意圖。 面 圖14展不根據本發明之另一實施例之檢測裝置。 【主要元件符號說明】 10 :照明器 11 :狹缝 ΟFor example, the width of the expansion to be detected is about 3 to two thicknesses of several nm to many nm, and the glass 2〇〇 moves at a constant rate, and at predetermined intervals (for example, i milliseconds to 2 seconds). New image information. Therefore, when the image signal of Fig. 8 is converted by the FFT to the image signal of Fig. 9, it is possible to calculate which portion corresponds to the signal region. ^, that is, the expansion of the interval of 3 mm corresponds to the frequency of t (time) = 3 mm / vi converted to f = l / t = v / 3 mm, so that the signal area can be from fl to Q (play a l /t=v/3 mm, f2=l/t2=v/10 mm) varies. Therefore, an area different from the aforementioned range is regarded as unnecessary noise, and the ripple detector 50 uses the boundary condition with respect to the reference value of the uniformity of the glass 200 and more accurately checks whether or not there is swelling on the surface of the glass 200. Here, the waveform of the image signal of the noise removed as described above by FIG. 10 is converted into a frequency signal waveform as shown in FIG. 11 by the FFT, so that the detector can directly see the noise removed. status. Meanwhile, Fig. 14 shows a detecting device according to another embodiment of the present invention. In this embodiment, the detecting device comprises: a illuminator 10 that emits light; a first mirror 60 for transmitting some of the light emitted from the illuminator 10 and reflecting some of the light toward a predetermined direction; the second mirror 20 For reflecting some of the light passing through the first mirror 60 such that the reflected light passes through the glass 200; the first light quantity detector 7 is configured to detect light reflected from the second mirror 20 and passing through the glass 200. a second light quantity detector 80 for detecting the amount of light reflected from the first face 60 toward a predetermined direction; and a ripple detector 50 comparing the first light quantity detector 7 and the second Light quantity detector 80 200949239 The amount of light detected, removing the noise included in the nature of the glass or the power noise generated by the AC power source, where the noise is due to external factors and there is no noise. The ripple on the surface of the glass 200 is detected in accordance with the amount of light. As shown in Figure 14, when the illuminator 10 emits light, some of the light (50%) is reflected from the first mirror 60 that is not semi-specular and is directed to the second light quantity detector 80, but the light The remainder (50%) passes through the first mirror 6 and is guided to the second mirror 20. Then, the second light quantity detector 80 detects the amount of some light and outputs the detection result to the ripple detector 50, and the second mirror 20 reflects some of the light passing through the first mirror 60 toward the glass 200 so that the reflection The light can pass through the glass 200. At this time, when the glass 200 is transmitted through the light reflected from the second mirror surface 2, the amount of transmitted light is detected by the first light amount detector 70 and then the detection result is sent to the ripple detector 50. The ripple detector 50 compares the amount of light detected by the first light amount detector 7A and the second light amount detector 80, and removes noise caused by external factors (specific Lv, power noise)' The ripple on the surface of the glass 200 is detected based on the amount of light without noise. Since the amount of light detected by the second light amount detector 8 is independent of the glass 2, the amount of light detected by the glass 200 and detected by the first light amount detector 7 is affected by the glass 200, so the ripple detector 5〇 The power noise generated by the AC power source is removed based on the amount of light detected by the first light amount detector 70 relative to the amount of light detected by the second light amount detector 8A. Therefore, the ripple detection 15 200949239 /XI device 50 applies the boundary condition of the reference value for the uniformity of the glass 200 in accordance with the amount of light without noise, thereby more accurately checking whether or not there is expansion on the surface of the glass 200. The following description will be avoided. It will be apparent to those skilled in the art that various modifications and changes can be made in the present invention without departing from the spirit and scope of the invention. Thus, the present invention is intended to cover the modifications and modifications of the invention According to an embodiment of the invention, when the information about the shadow image contains a change in brightness due to light, power noise due to instability of light or AC power, vibration generated when the glass moves, vibration of equipment or the environment, etc. In the case of noise, the noise is removed and the ripple on the surface of the glass is detected, thereby eliminating the detection error attributed to the noise, thereby enhancing the accuracy of the detection and increasing the satisfaction of the product. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows the configuration of a glass ripple detecting apparatus according to an embodiment of the present invention. Fig. 2 is a front elevational view showing the application of a slit to an illuminator according to an embodiment of the present invention. Figure 3 shows a filter member mounted to an illuminator in accordance with an embodiment of the present invention. (9) Fig. 4 is a view showing the optical path in the case where a slit is applied to the front end of the illuminator according to the embodiment of the present invention. 16 200949239 Figures 5 through 11 show the detection of glass waves in accordance with an embodiment of the present invention and Figure 13 is a horizontal or oblique expansion of the glass of the embodiment of the present invention. Figure 14 shows a detecting device not according to another embodiment of the present invention. [Main component symbol description] 10 : Illuminator 11 : Slit Ο

12 :濾光片構件 20 :第二鏡面 30 :螢幕 40 :影像處理器 50 :波紋檢測器 60 :第一鏡面 70 :第一光量偵測器 80 :第二光量偵測器 1〇〇:輸送單元 200 :玻璃 1712: Filter member 20: Second mirror 30: Screen 40: Image processor 50: Corrugation detector 60: First mirror 70: First light amount detector 80: Second light amount detector 1: Transport Unit 200: Glass 17

Claims (1)

200949239 十、申請專利範圍: 1.一種玻璃波紋檢測裝置,其包括用於檢查即將經由 輸送單元供應至處理設備之玻璃之表面上的波紋之檢測單 元,所述檢測單元包括: 照明器,其發射光; 第二鏡面,其反射由所述照明器發射之光; 螢幕’當所述玻璃透射自所述第二鏡面反射之光時 ^ 透射的光在其上投影為陰影影像; 影像處理器’其擷取對應於所述玻璃之表面且投影 於所述螢幕上之所述陰影影像;以及 波紋檢測器,其自藉由所述影像處理器擷取之所述 陰影影像移除歸因於外部因素之雜訊且基於關於所述雜 訊經移除的所述陰影影像之資訊來檢測所述玻璃之表面 上的波紋。 2·如申請專利範圍第1項所述之玻璃波紋檢測装置, 其中所述照明器包括氙氣燈、紅外線光源以及發光二極體 〇 中之一者。 3. 如申請專利範圍第1項或第2項所述之玻璃波紋檢 測裝置’其更包括狹縫,其提供於所述照明器之前端處且 將來自所述照明器的所述光僅導引至所述第二鏡面。 4. 如申明專利範圍第丨項或第2項所述之玻璃波紋檢 測裝置,其中所述第二鏡面是以1〇。至9〇。之角度安裝以 控制所述光的入射角^ 5. 如申凊專利範圍第3項所述之玻璃波紋檢測裝置, 18 200949239 其更包括滤光片構件,滤光片構件提供於所述狹缝之前端 處且僅允許具有特定頻帶的波長之光通過。 6.如申請專利範圍第5項所述之玻璃波紋檢測裝置, 其中所述濾光片構件包括紫外線濾光片,紫外線濾光片僅 允許紫外線區域之波長通過,或僅允許可見光區域以及紅 外線區域的波長通過其同時僅濾、除所述紫外線區域之波 長。 7·如申請專利範圍第5項之玻璃波紋檢測裝置,其中 ® 所述濾光片構件包括可見光濾光片,可見光濾光片僅允許 可見光區域之特定波長通過,且允許長於特定波長之波長 通過其同時僅濾除短於所述特定波長的波長,或允許短於 特定波長之波長通過其同時僅濾除長於所述特定波長之波 長。 / 8.如申請專利範圍第5項所述之玻璃波紋檢測裝置, 其中所述濾光片構件包括紅外線濾光片,紅外線濾光片僅 允許紅外線區域之特定波長通過,且允許長於特定波長的 〇 波長通過其同時僅濾除短於所述特定波長之波長,或允許 短於特定波長之波長通過其同時僅濾除長於所述特定波^ 的波長。 9·如申請專利範圍第丨項所述之玻璃波紋檢測裝置, 其中所述影像處理器包括線掃描電荷耦合裝置(CCD)相 機。 10,種玻璃波紋檢測裝置,其包括用於檢查待經由輸 送單元供應錢理設狀_之表面上的波紋之檢測單 19 200949239 元,所述檢測單元包括: 照明器’其發射光·, 第一鏡面,其透射自所述照明器發射之某些光且朝 向特定方向反射某些光; 第二鏡面,其反射通過所述第一鏡面之某些光使得 所述經反射光通過所述玻璃; 第一光量偵測器,其偵測自所述第二鏡面反射且通 過所述玻璃之光的量; 第二光量偵測器,其偵測自所述第一鏡面朝向所述 特定方向反射之所述光的量;以及 波紋檢測器,其比較由所述第一光量偵測器以及所 述第一光量偵測器偵測之所述光量,移除歸因於外部因 素之雜訊,且檢測所述雜訊經移除的所述玻璃之表面上 之波紋。 11. 如申請專利範圍第10項所述之玻璃波紋檢測裝 置,其中所述照明器包括氙氣燈、紅外線光源以及發光二 ❹ 極體中之一者。 12. 如申请專利範圍第10項所述之玻璃波紋檢測裝 置’其中所述第二鏡面是以10。至9〇。之角度安裝以控制 所述光的入射角。 13. 如申請專利範圍第10項或第n項所述之玻璃波紋 檢測裝置,其更包括狹縫,狹縫提供於所述照明器之前端 處且設定所述光的照射範圍以檢測所述玻璃之特定區域。 14·如申請專利範圍第13項所述之玻璃波紋檢測裝 20 200949239 f ’其更包括濾構件,濾光片構件提供於所述狹縫之 前端處且僅允許具有特定頻帶的波長之光通過。 15. 如申請專利範圍第1Q項所述之玻璃波紋檢測裝 置’其中所述第一鏡面包括半鏡面。 16. —種玻璃波紋檢測方法,其包括·· 第一步驟,自整體擷取之陰影影像選擇對應於待檢 測之特定區域的影像; 〇 第二步驟,藉由列表顯示關於所述特定區域之所述 所選影像中水平/垂直線的行之像素值(亮度)以及藉由 移動平均法以計算所述鄰近像素值的平均值來主要地減 少來自所述影像之雜訊; 第二步驟,輸出藉由在所述第二步驟中主要地減少 所述雜訊之狀態下合計或平均來自所述像素值之所述所 叶算的平均值的所述水平線行Al、Α2、Α3、Α4、Α5...Απ 而獲得之影像信號;以及 〇 第四步驟,判定所述第三步驟中之所述影像信號輸 出是否超出預設的臨限值以檢測所述玻璃之表面上的波 、、η·如申請專利範圍第16項所述之玻璃波紋檢測方 =,其中藉由以下的等式來獲得基於所述第三步驟之所述 合計(或平均)結果之所述影像信號輸出。 = (~Λ+4 + 8Λ+3 ~ 8Λ+1 + Λ ) 21 200949239 18. —種玻璃波紋檢測方法,其包括: 第一步驟,藉由照明器發射光; 第二步驟,接收所述第一步驟中發射之某些光以及 偵測光量; 第三步驟,在玻璃透射所述第一步驟中發射之所述 光之剩餘部分時偵測透射的光量; ❹ 訊;以及 第四步驟,比較由所述第一步驟以及所述第二步驟 侧到之光量以及移除簡所述玻璃之性質產生的雜 第五步驟,基於在所述第四步 所述光量藉由應用關於所述破叙c移除之 界條件來檢_酬之==相參考值之邊 Ο 22200949239 X. Patent application scope: 1. A glass corrugation detecting device comprising a detecting unit for checking a corrugation on a surface of a glass to be supplied to a processing device via a conveying unit, the detecting unit comprising: an illuminator emitting a second mirror that reflects light emitted by the illuminator; a screen 'when the glass is transmitted from the second specularly reflected light ^ transmitted light is projected thereon as a shadow image; image processor' Shaking the shadow image corresponding to the surface of the glass and projected on the screen; and a ripple detector that is removed from the shadow image captured by the image processor due to the external The noise of the factor and the ripple on the surface of the glass is detected based on information about the shadow image from which the noise is removed. 2. The glass ripple detecting device according to claim 1, wherein the illuminator comprises one of a xenon lamp, an infrared light source, and a light emitting diode. 3. The glass ripple detecting device of claim 1 or 2, further comprising a slit provided at a front end of the illuminator and directing the light from the illuminator Lead to the second mirror. 4. The glass-corrugated detecting device of claim 2, wherein the second mirror surface is 1 〇. To 9 〇. The angle of view is installed to control the incident angle of the light. 5. The glass corrugation detecting device of claim 3, wherein the filter member is further provided with a filter member, the filter member is provided in the slit At the front end, only light having a wavelength of a specific frequency band is allowed to pass. 6. The glass ripple detecting device according to claim 5, wherein the filter member comprises an ultraviolet filter, the ultraviolet filter only allows the wavelength of the ultraviolet region to pass, or only the visible light region and the infrared region are allowed. The wavelength through which it filters at the same time only removes the wavelength of the ultraviolet region. 7. The glass corrugation detecting device of claim 5, wherein the filter member comprises a visible light filter, the visible light filter only allows passage of a specific wavelength in the visible light region, and allows wavelengths longer than a specific wavelength to pass It simultaneously filters only wavelengths shorter than the particular wavelength, or allows wavelengths shorter than a particular wavelength to pass through at the same time only filtering wavelengths longer than the particular wavelength. The glass corrugation detecting device of claim 5, wherein the filter member comprises an infrared filter, the infrared filter only allows passage of a specific wavelength of the infrared region, and allows longer than a specific wavelength The 〇 wavelength passes through it at the same time only filters out wavelengths shorter than the specific wavelength, or allows wavelengths shorter than a specific wavelength to pass through at the same time only filtering wavelengths longer than the specific wavelength. 9. The glass ripple detecting device of claim 2, wherein the image processor comprises a line scan charge coupled device (CCD) camera. 10, a glass corrugation detecting device comprising a detecting unit 19 200949239 for checking a corrugation on a surface to be supplied via a conveying unit, the detecting unit comprising: an illuminator 'the emitted light ·, the first a mirror that transmits some of the light emitted from the illuminator and reflects some of the light toward a particular direction; a second mirror that reflects some of the light passing through the first mirror such that the reflected light passes through the glass a first light quantity detector that detects an amount of light reflected from the second specular surface and passing through the glass; and a second light quantity detector that detects reflection from the first mirror surface toward the specific direction The amount of the light; and a ripple detector that compares the amount of light detected by the first light quantity detector and the first light quantity detector to remove noise due to external factors, And detecting the ripple on the surface of the glass through which the noise is removed. 11. The glass ripple detecting device of claim 10, wherein the illuminator comprises one of a xenon lamp, an infrared light source, and a light emitting diode. 12. The glass corrugation detecting device of claim 10, wherein the second mirror surface is 10. To 9 〇. The angle is mounted to control the angle of incidence of the light. 13. The glass corrugation detecting device according to claim 10 or n, further comprising a slit provided at a front end of the illuminator and setting an irradiation range of the light to detect the A specific area of glass. The glass corrugation detecting device 20 of claim 13 is further comprising a filter member, the filter member being provided at the front end of the slit and allowing only light having a wavelength of a specific frequency band to pass . 15. The glass corrugation detecting device of claim 1Q wherein the first mirror surface comprises a semi-mirror surface. 16. A method for detecting a glass ripple, comprising: a first step of: selecting an image corresponding to a specific area to be detected from a shadow image captured as a whole; and a second step of displaying, by the list, the specific area The pixel value (brightness) of the horizontal/vertical line of the selected image and the average of the adjacent pixel values by the moving average method to reduce the noise from the image; the second step, Outputting the horizontal line rows A1, Α2, Α3, Α4, which are summed or averaged from the average of the leaf values of the pixel values, in a state in which the noise is mainly reduced in the second step. The image signal obtained by Α5...Απ; and the fourth step of determining whether the image signal output in the third step exceeds a preset threshold to detect a wave on the surface of the glass, η. The glass ripple detecting party according to item 16 of the patent application scope, wherein the image signal output based on the total (or average) result of the third step is obtained by the following equation= (~Λ+4 + 8Λ+3 ~ 8Λ+1 + Λ ) 21 200949239 18. A method for detecting a glass ripple, comprising: a first step of emitting light by an illuminator; and a second step of receiving the Certain light emitted in one step and detecting the amount of light; a third step of detecting the amount of transmitted light when the glass transmits the remaining portion of the light emitted in the first step; ❹; and the fourth step, comparing a fifth step of the light generated by the first step and the second step side and the removal of the properties of the glass, based on the amount of light in the fourth step by applying c remove the boundary condition to check the value of the == phase reference value Ο 22
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2497098B (en) * 2011-11-30 2018-01-03 Taylor Hobson Ltd Metrological apparatus and a method of determining a surface characteristic or characteristics
KR20130066894A (en) * 2011-12-13 2013-06-21 동우 화인켐 주식회사 Defect inspection apparatus for correction of vibration noise
CN103185662B (en) * 2011-12-30 2015-09-09 信义汽车玻璃(深圳)有限公司 Tempered glass of automobile water ripples Bracket for Inspection and system and detection method
CN103528546A (en) * 2013-09-23 2014-01-22 芜湖长信科技股份有限公司 Device and method for detecting floating glass corrugation degree
DE102016005130B3 (en) * 2016-04-27 2017-09-14 e.solutions GmbH Technique for testing a display unit
KR101958472B1 (en) * 2018-11-15 2019-03-15 엘아이지넥스원 주식회사 Method for Detecting Bad Fixel based on Line Scan, and Device therewith
CN110455828A (en) * 2019-09-02 2019-11-15 蚌埠中光电科技有限公司 A kind of large scale TFT substrate glass nondestructive micro-waviness detection method

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348444A (en) * 1986-08-19 1988-03-01 Narumi China Corp Method and device for automatic inspection of surface of glass substrate
JPH0327343U (en) * 1989-07-27 1991-03-19
JP2671241B2 (en) * 1990-12-27 1997-10-29 日立電子エンジニアリング株式会社 Glass plate foreign matter detection device
JPH05273149A (en) * 1992-03-27 1993-10-22 Toppan Printing Co Ltd Inspecting method and device for color transfer ribbon
JP3417494B2 (en) * 1993-11-08 2003-06-16 旭硝子株式会社 Method and apparatus for inspecting surface undulation of glass substrate
JP3314253B2 (en) * 1993-11-26 2002-08-12 大日本印刷株式会社 Inspection device for color filters for viewfinder
JPH08122266A (en) * 1994-10-21 1996-05-17 Sony Tektronix Corp Surface inspection device
DE19509345A1 (en) * 1995-03-15 1996-09-19 Ver Glaswerke Gmbh Methods for recognizing and evaluating defects in partially reflecting surface layers
JPH09152322A (en) * 1995-11-30 1997-06-10 Nippon Steel Corp Method and device for surface quality inspection
JP3714490B2 (en) * 1995-12-01 2005-11-09 株式会社山武 Surface condition measurement method
JPH09218162A (en) * 1996-02-08 1997-08-19 Olympus Optical Co Ltd Surface defect inspection device
JPH09311109A (en) * 1996-05-22 1997-12-02 Matsushita Electric Ind Co Ltd Defect inspection method and device utilizing light
JP2001201429A (en) * 2000-01-18 2001-07-27 Mitsubishi Chemicals Corp Method and device for inspecting defect in inspected base body
JP2001281165A (en) * 2000-03-31 2001-10-10 Kokusai Gijutsu Kaihatsu Co Ltd Method and device for inspecting substrate
JP2002310925A (en) * 2001-04-18 2002-10-23 Corning Japan Kk Plate material inspecting method and device thereof
JP2003098102A (en) * 2001-09-25 2003-04-03 Konica Corp Method and apparatus for inspecting surface
JP4041854B2 (en) * 2002-04-05 2008-02-06 レーザーテック株式会社 Imaging apparatus and photomask defect inspection apparatus
JP2006351669A (en) * 2005-06-14 2006-12-28 Mitsubishi Electric Corp Infrared inspection device and infrared inspection method, and method of manufacturing semiconductor wafer
KR100684104B1 (en) * 2005-08-02 2007-02-16 삼성전자주식회사 Method of inspecting a defect and apparatus for inspecting a defect using the same
JP2007170961A (en) * 2005-12-21 2007-07-05 Fujifilm Corp Inspection device and inspection method
JP2007271410A (en) * 2006-03-31 2007-10-18 Dainippon Printing Co Ltd Flaw detection method, flaw detector, and flaw detection program
KR100838655B1 (en) * 2006-10-27 2008-06-16 (주)쎄미시스코 Quality tester of glass board and method thereof
KR100782424B1 (en) * 2007-07-27 2007-12-05 (주)쎄미시스코 Quality tester of glass board

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