200941154 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種使像面中之像朝一次元方向（位移 (shift)方向）位移之技術。 【先前技術】 在使用於曝光裝置或描繪裝置等之成像光學系統中，有 欲使像面中之像之位置朝一次元方向僅位移任意之距離之 情形。以此種情形而言，例如，在大型之基板使用複數個 光學系統而同時曝光之描繪裝置中，需使複數個光學系統 之間距（pitch)正確地整齊一致之情形、或在進行多重曝光 之程序中為了在由於基板之收縮等而變化之基底圖案正確 地描繪下一個圖案而需使描繪間距整齊一致之情形等。 因此自以往以來提案有使像之位置位移之各式各樣之機 構。例如提案有： 1. 以與包含光轴與位移方向之面正交之轴使平行平板旋 轉’藉此而變更光之行進方向之機構； 2. 使光學系統整體、光學系統内之一部分之透鏡或透鏡 群在與光軸正交之面内移動，藉此而變更光之行進方向之 機構； 3. 使物體本身朝位移方向移動，藉此而變更成像位置之 機構等。 [專利文獻1]日本特許第2524151號公報 【發明内容】 [發明所欲解決之問題] 136010.doc 200941154 然而’在1.中係為了獲得所希望之位移量若使用相對較 厚之平行平板’則會有因為平行平板之旋轉而使像散差之 大小（絕對值）與變動較大之問題。雖說如此，若將該平行 平板變薄’則與其對應所需之旋轉量變多，而會有裝置本 身大型化之問題。此外，在2·中係若需使光學系統之整體 移動而亦包括驅動系統則會成為大規模之構成，並且需要 用以在位移方向收納可動部等之空間。而且，亦會有定位 精確度隨著光學系統整體之移動之降低或再現性、熱性之 問題。再者，在3.中係有與2.同樣之問題，尤其在配置於 上游側之物體為可變者（遮罩或孔徑（aperture)等）、或為電 性生成圖案者之情形會成為大規模之構成。 本發明係有鑑於上述問題而研創者，其目的在提供一種 不會損害光學性能，而可精簡，而且，高精確度地使像任 意位移之機構。 [解決問題之技術手段] © 為了解決上述之問題，請求項1之發明係一種像位置調 整裝置，其特徵為使像位移者，且包含：光學系統，其含 有彼此反向配置之頂角大致相同之2個楔形稜鏡；及調整 機構，其用以使前述2個楔形稜鏡之相對距離變化。 此外，請求項2之發明係為請求項丨之發明之像位置調整 裝置，其中根據前述像之最大位移量、及藉由前述調整機 構之前述相對距離之最大變化量，在前述調整機構使前述 相對距離變化之可動範圍，以偏角接近最小偏角之方式決 定前述2個楔形稜鏡之頂角。 136010.doc 200941154 此外’請求項3之發明係為請求項！或2之發明之像位置 調整裝置，其中在前述調整機構使前述相對距離變化之可 動範圍之中央位置，以變成像散差大致成為零之入射角之 方式決定前述光學系統之姿勢。 • 此外’請求項4之發明係為請求項1或2之發明之像位置 、 調整裝置，其中進一步包含第1旋轉機構，其以與前述像 之位移方向及光軸方向之任一者均正交之第丨轴為中心， ❺ 使前述光學系統旋轉。 此外’請求項5之發明係為請求項丨或2之發明之像位置 調整裝置，其中進一步包含第2旋轉機構，其以與光軸方 向平行之第2軸為中心，使一方之前述楔形稜鏡旋轉。 此外，請求項6之發明係為請求項丨或2之發明之像位置 調整裝置，其中進—步包含第3旋轉機構，其以與前述像 之位移方向平行之第3轴為中心，使一方之前述楔形稜鏡 旋轉。 _ 此外，請求項7之發明係為請求項1或2之發明之像位置 調整裝置’其中前述調整機構係藉由使前述2個楔形稜鏡 之中至少一方沿光軸方向移動而使前述相對距離變化。 此外，請求項8之發明係為請求項1或2之發明之像位置 調整裝置’其中進一步包含控制機構，其依據前述像面中 之像之位移量，而控制前述調整機構。 此外，請求項9之發明係一種光學裝置，其特徵為將光 照射於基板者，且包含：光源，其將光予以出射；保持機 構’其用以保持基板；及像位置調整裝置，其配置於處於 136010.doc 200941154 成像關係之光學系統之中之物空間，且使前述基板之表面 中之像位移；前述像位置調整裝置係包含：光學系統，其 含有彼此反向配置之頂角大致相同之2個楔形稜鏡；及調 整機構，其用以使前述2個楔形稜鏡之相對距離變化。 此外，請求項10之發明係一種光學裝置，其特徵為將光 照射於基板者，且包含：光源，其將光予以出射；保持機 構，其用以保持基板；及像位置調整裝置，其配置於處於 . 成像關係之光學系統之中之像空間，且使前述基板之表面 中之像位移；前述像位置調整裝置係包含：光學系統，其 含有彼此反向配置之頂角大致相同之2個楔形稜鏡；及調 整機構，其用以使前述2個楔形棱鏡之相對距離變化。 此外’請求項11之發明係如請求項9或1〇之發明之光學 裝置’其中前述像位置調整裝置係根據前述像之最大位移 量、及藉由前述調整機構之前述相對距離之最大變化量， 在前述調整機構使前述相對距離變化之可動範圍，以偏角 Φ 接近最小偏角之方式決定前述2個楔形稜鏡之頂角。 此外’請求項12之發明係如請求項9或1 〇之發明之光學 裝置’其中在前述調整機構使前述相對距離變化之可動範 圍之中央位置，以變成像散差大致成為零之入射角之方式 決定前述光學系統之姿勢。 此外，凊求項13之發明係如請求項9或1〇之發明之光學 裝置，其中進一步包含第1旋轉機構，其以與前述像之位 移方向及光軸方向之任一者均正交之第〗軸為中心使前 述光學系統旋轉。 1360I0.doc •9· 200941154 此外，請求項14之發明係如請求項9或1〇之發明之 &置’其中進一步包含第2旋轉機構，其以與光轴方向平 行之第2軸為中心，使一方之前述楔形稜鏡旋轉。 此外，料項15之發明係如言青求項9或1〇之發明之光學 • &置’其中進一步包含第3旋轉機構，其以與前述像之位 移方向平行之第3轴為中心，使一方 * 石之刚述楔形稜鏡旋 ⑩ 此外，請求項16之發明係、如請求項9或Π)之發明之光學 裝置，其中前述調整機構係藉由使前述2個楔形稜鏡之中 至少一方沿光轴方向移動而使前述相對距離變化。 此外，請求項17之發明係如請求項9或1〇之發明之光學 裝置，其中進一步包含控制機構，其依據前述像面中之像 之位移量’而控制前述調整機構。 【實施方式】 [發明之效果] ® 請求項1乃至請求項17所記載係包含：光學系統，其含 有彼此反向配置之頂角大致相同之2個楔形稜鏡；及調整 機構，其用以使2個楔形稜鏡之相對距離變化；藉此即可 以簡單之構成使像位移。此外，不需要使物朝使像位移之 方向移動之機構’因此可使裝置小型化。 請求項2及請求項丨丨所記載之發明係根據像之最大位移 量、及藉由調整機構之相對距離之最大變化量，在調整機 構使相對距離變化之可動範圍，以偏角接近最小偏角之方 式決定2個楔形棱鏡之頂角，藉此即可抑制藉由調整所致 '360l0.doc 200941154 之像散差之變動。 請求項3及請求項！ 2所記載之發明係在調整機構使相對 距離變化之可動範圍之中央位置，以變成像散差大致成為 零之入射角之方式決定光學系統之姿勢，藉此即可抑制像 散差之絕對值。 . 請求項4及請求項13所記载之發明係進一步包含第1旋轉 機構’其以與像之位移方向及光軸方向之任一者均正交之 ❹ 第1轴為中心’使光學系統旋轉，藉此即可在使像位移之 後，以消除像散差之方式進行調整。 請求項5及請求項14所記載之發明係進一步包含第2旋轉 機構’其以與光軸方向平行之第2轴為中心，使一方之楔 形稜鏡旋轉，藉此即可在使像位移時，於該像在像面中在 與位移方向正交之方向偏離之情形下，將此進行調整。 請求項6及請求項15所記載之發明係進一步包含第3旋轉 機構，其以與像之位移方向平行之第3轴為中心，使一方 〇 之楔形稜鏡旋轉，藉此即可於像在像面中相對於第3軸傾 斜之情形下，將此進行調整。 請求項8及請求項17所記載之發明係進一步包含控制機 構，其依據像面中之像之位移量，而控制調整機構，藉 此，例如相較於藉由操作者之目視之調整，可使正確性及 調整速度提升。 以下就本發明之較佳之實施形態，一面參照所附之圊式 一面進行詳細說明。 <1.第1實施形態> 136010.doc • 11 · 200941154 <1_1.光學裝置2之構成> 圖1係為表示發明之光學裝置2之圖。另外，在以下之說 明中’係如圖1所示定義x軸、γ軸及Z轴…准此等方向為 了掌握位置關係’係為了方便起見蚊義者，並不限定以 下說明之各方向。關於以下之各圖亦同樣。 光學裝置2係包含可動工作台（8吨6)20、曝光頭21及控 制部22，其作為將微細之圖案（像）曝光在支撐於可動工作 φ 台2〇之基板9之曝光裝置而構成。亦即，基板9之表面係相 當於對於光學裝置2而言之像面。 可動工作台2〇之上面係加工成水平面，且具有在基板9 以水平姿勢予以保持之功能。可動工作台2〇係藉由從未圖 示之吸附口進行吸引，而吸附所載置之基板9之背面而將 該基板9保持在特定之位置。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for shifting an image in an image plane toward a primary direction (shift direction). [Prior Art] In an imaging optical system used for an exposure device or a drawing device, there is a case where the position of an image in the image plane is shifted by an arbitrary distance in the primary direction. In this case, for example, in a drawing device in which a plurality of optical systems are simultaneously exposed in a large substrate, it is necessary to make the pitch of the plurality of optical systems correctly aligned, or to perform multiple exposures. In the program, in order to correctly draw the next pattern in the base pattern which changes due to shrinkage of the substrate or the like, it is necessary to make the drawing pitch uniform. Therefore, since the past, there have been proposals for various mechanisms for displacing the position of the image. For example, the proposal includes: 1. a mechanism for rotating the parallel plate by rotating the parallel plate with an axis orthogonal to the plane of the optical axis and the direction of the displacement; 2. a lens that makes the optical system as a whole and a part of the optical system Or a mechanism in which the lens group moves in a plane orthogonal to the optical axis, thereby changing the traveling direction of the light; 3. a mechanism for changing the imaging position by moving the object itself in the displacement direction. [Patent Document 1] Japanese Patent No. 2524151 [Disclosure] [Problems to be Solved by the Invention] 136010.doc 200941154 However, in "1. In order to obtain a desired displacement amount, if a relatively thick parallel plate is used" There is a problem that the magnitude (absolute value) and variation of the astigmatism difference are large due to the rotation of the parallel flat plate. In this case, if the parallel flat plate is thinned, the amount of rotation required for the parallel flat plate is increased, and there is a problem that the device itself is enlarged. Further, in the case of the second embodiment, if the entire optical system is moved and the drive system is included, the drive system will have a large-scale configuration, and a space for accommodating the movable portion or the like in the displacement direction is required. Moreover, there is also a problem that the positioning accuracy decreases with the overall movement of the optical system or reproducibility and heat. Further, in 3., there is a problem similar to 2. In particular, when the object disposed on the upstream side is a variable (a mask or an aperture) or a pattern is generated electrically, The composition of large-scale. The present invention has been made in view of the above problems, and an object thereof is to provide a mechanism which can reduce the optical performance without being impaired in optical performance, and which can arbitrarily shift the image with high precision. [Technical means for solving the problem] © In order to solve the above problem, the invention of claim 1 is an image position adjusting device characterized in that the image is displaced, and includes an optical system including an apex angle which is disposed opposite to each other. The same two wedge-shaped turns; and an adjustment mechanism for changing the relative distances of the two wedge-shaped turns. Further, the invention of claim 2 is the image position adjusting device of the invention of claim 2, wherein the adjustment mechanism causes the aforementioned adjustment mechanism according to the maximum displacement amount of the image and the maximum change amount of the relative distance by the adjustment mechanism The movable range of the relative distance change determines the apex angle of the two wedge-shaped turns in such a manner that the off-angle is close to the minimum off-angle. 136010.doc 200941154 In addition, the invention of claim 3 is a request item! In the image position adjusting device of the invention of claim 2, wherein the adjustment mechanism adjusts the posture of the optical system such that the imaging aberration is substantially zero at an incident angle at a central position of the movable range in which the relative distance is changed. The invention of claim 4 is the image position and adjustment device of the invention of claim 1 or 2, further comprising a first rotating mechanism that is positively coupled to either the displacement direction or the optical axis direction of the image Centering on the 丨 axis of the intersection, ❺ rotate the aforementioned optical system. Further, the invention of claim 5 is the image position adjusting device of the invention of claim 2 or 2, further comprising a second rotating mechanism that has one of the wedge-shaped ribs centered on the second axis parallel to the optical axis direction The mirror rotates. Further, the invention of claim 6 is the image position adjusting device of the invention of claim 2 or 2, wherein the step further comprises a third rotating mechanism centering on a third axis parallel to the displacement direction of the image The aforementioned dovetail is rotated. Further, the invention of claim 7 is the image position adjusting device of the invention of claim 1 or 2, wherein the adjustment mechanism causes the relative position by moving at least one of the two wedge-shaped turns in the optical axis direction Distance changes. Further, the invention of claim 8 is the image position adjusting device of the invention of claim 1 or 2, further comprising a control means for controlling the adjustment means in accordance with the displacement amount of the image in the image plane. Further, the invention of claim 9 is an optical device characterized by irradiating light onto a substrate, and comprising: a light source that emits light; a holding mechanism that holds the substrate; and a position adjustment device that is configured The object space in the optical system of the imaging relationship of 136010.doc 200941154, and the image in the surface of the substrate is displaced; the image position adjusting device comprises: an optical system comprising substantially the same apex angles arranged opposite to each other Two wedge-shaped turns; and an adjustment mechanism for varying the relative distances of the two wedge-shaped turns. Further, the invention of claim 10 is an optical device characterized by irradiating light onto a substrate, and comprising: a light source that emits light; a holding mechanism for holding the substrate; and an image position adjusting device, the configuration An image space in an optical system of an imaging relationship, and displacing an image in a surface of the substrate; the image position adjusting device includes: an optical system including two vertices arranged in opposite directions to each other a dovetail; and an adjustment mechanism for varying the relative distance of the two wedge prisms. The invention of claim 11 is the optical device of the invention of claim 9 or 1 wherein the image position adjusting device is based on a maximum displacement amount of the image and a maximum amount of change in the relative distance by the adjustment mechanism. In the movable range in which the adjustment mechanism changes the relative distance, the apex angles of the two wedge-shaped turns are determined such that the declination angle Φ approaches the minimum declination angle. Further, the invention of claim 12 is the optical device of the invention of claim 9 or 1 wherein the adjustment mechanism causes the central position of the movable range in which the relative distance changes to be changed to an incident angle of substantially zero The mode determines the posture of the aforementioned optical system. The optical device of the invention of claim 9 or claim 1, further comprising: a first rotating mechanism orthogonal to any one of a displacement direction and an optical axis direction of the image The first axis is centered to rotate the aforementioned optical system. In addition, the invention of claim 14 is the invention of claim 9 or claim 2, further comprising a second rotating mechanism centered on the second axis parallel to the optical axis direction To rotate the aforementioned wedge-shaped jaw of one side. Further, the invention of claim 15 is the optical device of the invention of claim 9 or 1 which further includes a third rotating mechanism centered on a third axis parallel to the displacement direction of the image, In addition, the invention of claim 16 is the optical device of the invention of claim 18, wherein the adjustment mechanism is formed by the two wedges At least one of them moves in the optical axis direction to change the relative distance. Further, the invention of claim 17 is the optical device of the invention of claim 9 or claim 1, further comprising a control mechanism that controls the adjustment mechanism in accordance with the displacement amount of the image in the image plane. [Embodiment] [Effect of the Invention] The invention of claim 1 to claim 17 includes: an optical system including two wedge-shaped turns having substantially the same apex angles arranged opposite each other; and an adjustment mechanism for The relative distance between the two wedge-shaped turns is changed; thereby, the image displacement can be simply configured. Further, there is no need to move the object toward the direction in which the image is displaced. Thus, the apparatus can be miniaturized. The invention described in claim 2 and claim 丨丨 is based on the maximum displacement of the image and the maximum amount of change in the relative distance of the adjustment mechanism, and the movable range of the relative distance change by the adjustment mechanism is close to the minimum deviation at an off angle. The angle method determines the apex angle of the two wedge prisms, thereby suppressing the variation of the astigmatism difference of '360l0.doc 200941154 caused by the adjustment. Request item 3 and request item! According to the invention of the second aspect, the position of the optical system is determined such that the position of the optical system is changed so that the imaging aberration is substantially zero at the center of the movable range in which the adjustment mechanism changes the relative distance, thereby suppressing the absolute value of the astigmatism difference. . The invention of claim 4 and claim 13 further includes a first rotating mechanism ′ which is orthogonal to either the displacement direction and the optical axis direction of the image, and the first axis is centered to make the optical system Rotation, by which the adjustment can be made in a manner that eliminates astigmatism after the image is displaced. The invention of claim 5 and claim 14 further includes a second rotating mechanism that rotates one of the wedge-shaped turns around the second axis parallel to the optical axis direction, thereby displacing the image This is adjusted in the case where the image is deviated in the direction orthogonal to the displacement direction in the image plane. The invention of claim 6 and claim 15 further includes a third rotating mechanism that rotates the wedge-shaped turn of one of the turns around the third axis parallel to the displacement direction of the image, thereby enabling the image to be This is adjusted in the case where the image plane is inclined with respect to the third axis. The invention of claim 8 and claim 17 further includes a control mechanism that controls the adjustment mechanism according to the displacement amount of the image in the image plane, whereby, for example, compared with the visual adjustment by the operator, Improve correctness and speed of adjustment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. <1. First Embodiment> 136010.doc • 11 · 200941154 <1_1. Configuration of Optical Device 2> Fig. 1 is a view showing the optical device 2 of the invention. In addition, in the following description, the x-axis, the γ-axis, and the Z-axis are defined as shown in Fig. 1. In order to grasp the positional relationship, it is not limited to the following directions for convenience. . The same applies to the following figures. The optical device 2 includes a movable table (8 tons 6) 20, an exposure head 21, and a control unit 22, which are formed as exposure means for exposing a fine pattern (image) to a substrate 9 supported by a movable operation φ table 2 . That is, the surface of the substrate 9 is equivalent to the image plane for the optical device 2. The upper surface of the movable table 2 is machined into a horizontal plane and has a function of holding the substrate 9 in a horizontal posture. The movable table 2 is sucked by an adsorption port not shown, and the back surface of the substrate 9 placed thereon is adsorbed to hold the substrate 9 at a specific position.
此外’可動工作台20係設為依據來自控制部22之控制信 號’而使可朝X軸方向及γ轴方向直線性移動。亦即，詳 ❹ 細内容雖予以省略，惟可動工作台20係包含：使基板9朝Y 軸方向移動之主掃描驅動機構、及使基板9朝X轴方向移動 之副掃描驅動機構。以此種機構而言，係例如可採用使用 線性馬達及線性導件之線性運動機構。 藉此，光學裝置2係設為可將從曝光頭21所出射之曝光 光照射在基板9之表面之任意之位置《如此，從光學裝置2 出射之曝光光係以基板9之表面為像面而成像。 曝光頭21係包含：屬於照射光之燈（lamp)之光源23、用 以導引從光源23所出射之光之照明光學系統24、將藉由照 136010.doc -12· 200941154 明光學系統24所導引之光予以調變之空間光調變器件 (device)25及成像光學系統26。 照明光學系統24係包含反射鏡（mirror)240、透鏡 (lens)241、光學濾光片（Hlter)242、柱型光學積分器（Rod Integrator)243、透鏡244、反射鏡245及反射鏡246。 從光源23所出射之光係藉由反射鏡240及透鏡241而導引 至光學濾光片242，且依據光學濾光片242之穿透率而調整 A 為所希望之光量。 穿透光學濾光片242之光，係介隔柱型光學積分器243、 透鏡244、反射鏡245而朝反射鏡246導引。反射鏡246係具 有特定之曲面，且一面將來自反射鏡245之光予以聚光一 面朝空間光調變器件25導引。反射鏡246係具有以特定之 角度使來自反射鏡245之光入射至空間光調變器件25之功 能。 如此，照明光學系統24係具有將從光源23所出射之光予 ❿ 以適宜調整而導引至空間光調變器件25之功能。另外，照 明光學系統24所包含之構成並不限定於本實施形態所示之 例，在光程上亦可適宜配置其他透鏡或反射鏡等之光學元 件。 本實施形態之空間光調變器件25係為DMD(Digital Micromirror Device，數位微型反射鏡器件）。空間光調變 器件25係含有微少之反射鏡多數排列於一面之陣列結構， 且各反射鏡係設為可依據來自控制部22之控制信號而變更 反射面之角度。再者，從控制部22被賦予「ON」信號之 136010.doc •13· 200941154 反射鏡，係將來自照明光學系統24之光朝向成像光學系統 26反射。另一方面，從控制部22被賦予「OFF j之反射 鏡，係以使來自照明光學系統24之光不朝向成像光學系統 26之方式反射。 成像光學系統26係包含第1成像透鏡260、透鏡261、像 位置調整裝置1及第2成像透鏡262。空間光調變器件25係 在藉由第1成像透鏡260入射至第2成像透鏡262為止形成一 ❹ 次像（中間像），而一次像係藉由第2成像透鏡262而在像面 (基板9之表面）成像而成為最終像。如圖1所示，本實施形 態之像位置調整裝置1係配置在一次像與第2成像透鏡2 6 2 之第1面之間。 藉由第1成像透鏡260及透鏡261所導引之光，係入射至 像位置調整裝置1。在以下之說明中，係將入射至像位置 調整裝置1之該光稱為「入射光Xi」。詳細内容將於後陳 述，惟像位置調整裝置1係具有使入射光&朝又軸方向僅位 © 移任意之距離之功能。在以下之說明中，係將從像位置調 整裝置1所出射之光（經位移之光）稱為「出射光、」。 藉由此種構成’成像光學系統26係具有將藉由空間光調 變器件25所調變之光導引至基板9之表面，而在相當於像 面之該表面之所希望之位置成像之功能。另外，在以下之 說明中’係將第2成像透鏡262之倍率設為「μ」。 控制部22係依據程式而動作，藉此而進行各種資料之運 算及控制信號之生成，且控制光學裝置2之各構成。例 依據應曝光於基板9之所希望之圖案而控制空間光調 136010.doc •14· 200941154 變器件25之各反射鏡，或控制光源232〇n.〇ff控制、或 可動工作台20之主掃描方向及副掃描方向之移動。 此外，控制部22係依據基板9之狀態而控制像位置調整 裝置1。例如，將藉由未圖示之攝像相機形成在基板9之對 準（alignment)圖案進行攝像，且檢測基板9之位置偏離。 再者，依據所檢測出之位置偏離，求出所需之位移量，來 控制像位置調整裝置1。 φ 另外，所謂基板9之位置偏離，不僅是基板9之載置位置 之位置偏離，亦包含有因為基板9之熱膨脹或收縮之歪斜 或撓曲所導致之位置偏離、及形成在基板9之圖案之位置 偏離等。 <1-2.像位置調整裝置1之構成> 圖2係為表示像位置調整裝置1之結構之圖。另外，本實 施形態中之像位置調整裝置1係以所希望之位移方向（可調 整位置之方向）成為X轴方向（副掃描方向）之方式設計，而 ❹ 像位置調整裝置1中之光轴方向係成為z軸方向。此外，將 像位置調整裝置1中之位移方向之像之最大位移量（可調整 之位移量）設為「s」、第2楔形稜鏡14之可動範圍幅度（最大 變化量）設為「d」。 像位置調整裝置1係包含光學系統i 〇、調整機構丨丨及像 位置控制部12，如後所述，具有使像朝（_χ)方向位移之功 能。 光學系統10係包含第1楔形稜鏡13及第2楔形稜鏡14。再 者’第1楔形稜鏡13與第2楔形稜鏡14係含有大致相同之結 136010.doc -15· 200941154 構（例如頂角α、折射率η均相同）’如圖2所示，以相對向 之面彼此成為平行之方式，而且彼此反向配置。 詳細内容雖未圖示，惟調整機構11係包含供第2楔形棱 鏡14固定之可動工作台、及使該可動工作台沿著ζ轴方向 (光轴方向）直線性移動之驅動部。再者，藉由驅動部使可 動工作台移動，而使第1楔形稜鏡13與第2楔形稜鏡14之相 對距離變化。以此種驅動部而言，例如，可採用含有藉由 ❹ 像位置控制部12所控制之旋轉馬達、與Ζ軸方向平行配置 之滾珠螺桿（ball screw)、及固定在可動工作台之螺帽（nut) 部之線性運動機構。 像位置控制部12係依據程式及來自控制部22之控制信號 而動作，藉此而控制像位置調整裝置1之各構成。尤其像 位置控制部12係根據從控制部22所傳遞之位移量，而控制 藉由調整機構11之第2楔形稜鏡14之移動量。 圖3係為表不光學系統1〇之俯視圖。另外，圖3中以二點 ❹ 鍵線所示之位置之第2楔形稜鏡14，係表示使第2楔形稜鏡 14朝最（-Z)方向移動之狀態。此外’實線所示之位置之第2 楔形稜鏡14 ’係表示使第2楔形稜鏡14朝最（+Z)方向移動 之狀態。 光學系統10中之第1楔形稜鏡13係以入射之入射光心成 為入射角h(後述）之姿勢固定配置。再者，以與此姿勢之 第1楔形稜鏡13之出射面相對向之方式，使第2楔形稜鏡14 以反向之姿勢配置。再者，第丨楔形稜鏡13與第2楔形稜鏡 14之相對向之面係設為彼此平行。 136010.doc -16· 200941154 如圖3所示，在第1楔形稜鏡13中係工朝z轴方向行進之 入射光λί入射。 第2楔形稜鏡14以與第1楔形稜鏡13密接之方式配置時 (位於以二點鏈線所示之位置時），光學系統1〇係成為與平 行平板專效’且從光學系統1〇所出射之光係成為如圖3所 不之出射光λο1。此出射光χ〇1之光軸係成為ζ軸方向，且成 為與入射光λ〗之光抽平行0 ❹ 此時之出射光λ〇ι係朝（-Χ)方向較入射光λί僅位移δ，惟第 2楔形棱鏡14係無法朝（-Ζ)方向移動超過此程度❶因此，光 學系統10將會使入射光人1至少僅位移最小位移量§。然而， 此最小位移量δ係預先已知’因此可考慮此來設計成像光 學系統26。 像位置調整裝置1係將入射光人1朝（-Χ)方向，以僅位移 8+s/2之位置為基準位置之方式，決定入射光&之位置。藉 此’本實施形態中之像位置調整裝置i，係被設計為以基 φ 準位置為中心而朝X軸方向僅位移調整±s/2之裝置。 另一方面’第2楔形棱鏡14在實線所示之位置移動時， 從第1楔形稜鏡13係出射光人„)。此時入射光\之光轴與光λ)η 之光軸所形成之角係為第1楔形稜鏡13之偏角θ。此外，在 第2楔形棱鏡14係供從第1楔形稜鏡13所出射之光、入射， 且供出射光λ。2出射。再者，出射光χ。2之光軸係與出射光 λ〇ι同樣成為Ζ軸方向’且成為與入射光\之光軸平行。 此時之出射光λ。2係朝（_χ)方向僅較入射光\位移δ+3，惟 第2楔形棱鏡14係無法朝（+Ζ)方向移動超過此程度。因 136010.doc -17- 200941154 此，光學系統ι〇係可使入射光λί最大僅位移δ+s ^然而，如 前所述，此最小位移量δ係為無法調整之範圍，因此，像 位置調整裝置1中之最大位移量係如前所述成為「s」。 綜上所述，本實施形態中之像位置調整裝置1係藉由使 第1楔形稜鏡13與第2楔形稜鏡14之相對距離變化，而可將 藉由入射光λί之像之位置朝一次元方向（位移方向：X轴方 向）調整。此時’所需之動作，僅係使第2楔形棱鏡14朝光 軸方向直線性移動，因此可相對較單純，而且小型之構成 來實現。 <1-3.設計方法> 接著就最佳決定第1實施形態中之像位置調整裝置1之第 1楔形稜鏡13(第2楔形稜鏡14)之頂角α、及為了決定此等 姿勢所需之入射角i!之設計方法進行說明。 圖4係為表示光入射至一般之三角稜鏡8之情況之圖。在 此，三角稜鏡8之角α，係相當於第1楔形棱鏡13(第2楔形 _ 稜鏡14)之頂角α，而三角稜鏡8之折射率係設為與第丨楔形 棱鏡13(第2楔形稜鏡14)之折射率11相等者。此外，兹將各 h、Π、ο定義為如圖4所示，且將像面（基板9之表面）中所 要求之最大位移量（最大實位移量）設為「S」。 卜最大實位移量S係為在光學裝置2中成為可調整之 最大位移量之值，因此，例如可從對於光學裝置2之要求 ^ 任意決定。此外，可動範圍d係為依據朝光軸方向 多夕工間所決定之值，而可從可組入於成像光學系統 26之像位置調整裝置1之大小等來任意決定。 136010.doc -18- 200941154 首先就求出頂角α之方法進行說明。像位置調整裝置^中 之最大位移里s、彳動範圍d及偏角θ中係成立公式⑴之關 係。 [數1] •s=dtan0 …（公式 1) 接者，在三角棱鏡8中，#由在各邊界面之折射之公式 與偏角之定義，公式2、公式3、公式4及公式5成立。Further, the movable table 20 is linearly movable in the X-axis direction and the γ-axis direction in accordance with the control signal from the control unit 22. That is, although the details are omitted, the movable table 20 includes a main scanning drive mechanism that moves the substrate 9 in the Y-axis direction, and a sub-scanning drive mechanism that moves the substrate 9 in the X-axis direction. In the case of such a mechanism, for example, a linear motion mechanism using a linear motor and a linear guide can be employed. Thereby, the optical device 2 is configured to illuminate the exposure light emitted from the exposure head 21 at any position on the surface of the substrate 9. Thus, the exposure light emitted from the optical device 2 is the image surface of the substrate 9 And imaging. The exposure head 21 includes: a light source 23 belonging to a lamp for illuminating light, an illumination optical system 24 for guiding light emitted from the light source 23, and an optical system 24 by 136010.doc -12·200941154 The guided light is modulated by a spatial light modulation device 25 and an imaging optical system 26. The illumination optical system 24 includes a mirror 240, a lens 241, an optical filter (Hlter) 242, a rod type optical integrator 243, a lens 244, a mirror 245, and a mirror 246. The light emitted from the light source 23 is guided to the optical filter 242 by the mirror 240 and the lens 241, and A is adjusted to a desired amount of light depending on the transmittance of the optical filter 242. The light that penetrates the optical filter 242 is guided toward the mirror 246 via the columnar optical integrator 243, the lens 244, and the mirror 245. The mirror 246 has a specific curved surface, and one side condenses the light from the mirror 245 toward the spatial light modulation device 25. The mirror 246 has a function of causing light from the mirror 245 to be incident on the spatial light modulation device 25 at a specific angle. Thus, the illumination optical system 24 has a function of guiding the light emitted from the light source 23 to the spatial light modulation device 25 with appropriate adjustment. Further, the configuration of the illumination optical system 24 is not limited to the example shown in the embodiment, and optical elements such as other lenses or mirrors may be disposed in the optical path. The spatial light modulation device 25 of the present embodiment is a DMD (Digital Micromirror Device). The spatial light modulation device 25 includes an array structure in which a plurality of mirrors are arranged in a large number, and each of the mirrors is configured to change the angle of the reflection surface in accordance with a control signal from the control unit 22. Further, the mirror 136010.doc •13·200941154 is provided with an "ON" signal from the control unit 22, and reflects light from the illumination optical system 24 toward the imaging optical system 26. On the other hand, the "OFF j mirror" is provided from the control unit 22 so that the light from the illumination optical system 24 is not reflected toward the imaging optical system 26. The imaging optical system 26 includes the first imaging lens 260 and the lens. 261. The image position adjusting device 1 and the second imaging lens 262. The spatial light modulation device 25 forms a sub-image (intermediate image) by the first imaging lens 260, and the primary image is formed by the first imaging lens 260. The image forming surface (the surface of the substrate 9) is imaged by the second imaging lens 262 to form a final image. As shown in Fig. 1, the image position adjusting device 1 of the present embodiment is disposed in the primary image and the second imaging lens 2. The light guided by the first imaging lens 260 and the lens 261 is incident on the image position adjusting device 1. In the following description, the image is incident on the image position adjusting device 1. This light is called "incident light Xi". The details will be described later, but the position adjustment device 1 has a function of shifting the incident light & In the following description, the light (displaced light) emitted from the image position adjusting device 1 is referred to as "exit light". With such a configuration, the imaging optical system 26 has the light modulated by the spatial light modulation device 25 guided to the surface of the substrate 9, and is imaged at a desired position corresponding to the surface of the image surface. Features. In the following description, the magnification of the second imaging lens 262 is set to "μ". The control unit 22 operates in accordance with the program, thereby generating various data operations and control signals, and controlling the respective configurations of the optical device 2. For example, each of the mirrors of the variable device 235010.doc • 14· 200941154 can be controlled according to the desired pattern exposed to the substrate 9, or the control light source 232〇n.〇ff control, or the main body of the movable table 20 The movement of the scanning direction and the sub-scanning direction. Further, the control unit 22 controls the image position adjusting device 1 in accordance with the state of the substrate 9. For example, an alignment pattern formed on the substrate 9 by an imaging camera (not shown) is imaged, and the positional deviation of the substrate 9 is detected. Further, the image position adjusting device 1 is controlled by determining the required displacement amount based on the detected positional deviation. Further, the positional deviation of the substrate 9 is not only the positional deviation of the mounting position of the substrate 9, but also the positional deviation caused by the skew or deflection of the thermal expansion or contraction of the substrate 9, and the pattern formed on the substrate 9. The position is deviated and so on. <1-2. Configuration of Image Positioning Apparatus 1> Fig. 2 is a view showing the configuration of the image position adjusting apparatus 1. Further, in the image position adjusting device 1 of the present embodiment, the desired displacement direction (the direction in which the position can be adjusted) is set to the X-axis direction (sub-scanning direction), and the optical axis in the image position adjusting device 1 is designed. The direction is the z-axis direction. Further, the maximum displacement amount (adjustable displacement amount) of the image in the displacement direction in the position adjusting device 1 is "s", and the movable range width (maximum variation amount) of the second dovetail 14 is set to "d". "." The image position adjusting device 1 includes an optical system i 〇, an adjustment mechanism 丨丨, and an image position control unit 12, and has a function of displacing the image in the (_χ) direction as will be described later. The optical system 10 includes a first dovetail 13 and a second dovetail 14. Furthermore, the 'first dovetail 13 and the second dovetail 14 have substantially the same junction 136010.doc -15·200941154 (for example, the apex angle α and the refractive index η are the same)' as shown in FIG. 2, The opposite faces are parallel to each other and are arranged opposite each other. Although not shown in the drawings, the adjustment mechanism 11 includes a movable table to which the second wedge prism 14 is fixed, and a drive unit that linearly moves the movable table in the z-axis direction (optical axis direction). Further, the movable table is moved by the driving portion, and the relative distance between the first dovetail 13 and the second dovetail 14 is changed. For example, a drive motor including a rotary motor controlled by the image position control unit 12, a ball screw disposed in parallel with the x-axis direction, and a nut fixed to the movable table can be used. (nut) Linear motion mechanism. The image position control unit 12 operates in accordance with a program and a control signal from the control unit 22, thereby controlling the respective configurations of the image position adjusting device 1. In particular, the position control unit 12 controls the amount of movement of the second dovetail 14 by the adjustment mechanism 11 based on the amount of displacement transmitted from the control unit 22. Fig. 3 is a plan view showing the optical system 1〇. Further, the second dovetail 14 at the position indicated by the two-dot key line in Fig. 3 indicates a state in which the second dovetail 14 is moved in the most (-Z) direction. Further, the second dovetail 14' at the position indicated by the solid line indicates a state in which the second dovetail 14 is moved in the most (+Z) direction. The first dovetail 13 in the optical system 10 is fixedly disposed in such a manner that the incident optical center of incidence becomes an incident angle h (described later). Further, the second dovetail 14 is disposed in a reverse posture so as to face the exit surface of the first dovetail 13 in this posture. Further, the opposing faces of the second dovetail 13 and the second dovetail 14 are set to be parallel to each other. 136010.doc -16· 200941154 As shown in Fig. 3, the incident light λί that is traveling in the z-axis direction in the first dovetail 13 is incident. When the second dovetail 14 is disposed in close contact with the first dovetail 13 (when it is located at a position indicated by a two-dot chain line), the optical system 1 is made to be in parallel with the parallel plate and from the optical system 1 The light emitted by 〇 becomes the outgoing light λο1 as shown in Fig. 3. The optical axis of the exit pupil 1 is in the x-axis direction and is parallel to the light of the incident light λ. 0 ❹ The outgoing light λ〇ι is in the (-Χ) direction, and the incident light λί is only displaced by δ. However, the second wedge prism 14 cannot move more than this in the (-Ζ) direction. Therefore, the optical system 10 will cause the incident light person 1 to be displaced at least only by the minimum displacement amount §. However, this minimum displacement δ is known in advance' so the imaging optical system 26 can be designed in consideration of this. The image position adjusting device 1 determines the position of the incident light & the incident light person 1 is oriented in the (-Χ) direction with the position shifted by only 8 + s/2 as the reference position. The image position adjusting device i in the present embodiment is designed to be adjusted to ±s/2 in the X-axis direction with the base φ position as the center. On the other hand, when the second wedge prism 14 moves at a position indicated by a solid line, a light ray is emitted from the first dovetail 13 at this time. At this time, the optical axis of the incident light and the optical axis of the light λ) η are The angle formed is the off angle θ of the first dovetail 13. The second wedge prism 14 is provided with light emitted from the first dovetail 13 and incident thereon, and the emitted light λ. 2 is emitted. The exit pupil is the same as the exit light λ〇ι and becomes parallel to the optical axis of the incident light. The exit light λ. 2 is only incident in the (_χ) direction. Light\displacement δ+3, but the second wedge prism 14 cannot move more than this in the (+Ζ) direction. Since 136010.doc -17- 200941154, the optical system ι〇 can shift the incident light λί by only δ max. +s ^ However, as described above, the minimum displacement amount δ is a range that cannot be adjusted, and therefore, the maximum displacement amount in the image position adjusting device 1 is "s" as described above. As described above, in the image position adjusting device 1 of the present embodiment, by changing the relative distance between the first dovetail 13 and the second dovetail 14, the position of the image by the incident light λί can be directed toward The primary direction (displacement direction: X-axis direction) is adjusted. At this time, the required action is only to linearly move the second wedge prism 14 in the optical axis direction, so that it can be realized in a relatively simple and compact configuration. <1-3. Design Method> Next, the apex angle α of the first dovetail 13 (second dovetail 14) of the image position adjusting device 1 in the first embodiment is determined optimally, and in order to determine this The design method of the incident angle i! required for the posture is explained. Fig. 4 is a view showing a state in which light is incident on a general triangular ridge 8. Here, the angle α of the triangular ridge 8 corresponds to the apex angle α of the first wedge prism 13 (second wedge _ 稜鏡 14), and the refractive index of the triangular ridge 8 is set to be the same as the second wedge prism 13 (The second dovetail 14) has the same refractive index of 11. Further, each of h, Π, and ο is defined as shown in Fig. 4, and the maximum displacement amount (maximum real displacement amount) required for the image plane (surface of the substrate 9) is set to "S". Since the maximum real displacement S is a value which is an adjustable maximum displacement amount in the optical device 2, it can be arbitrarily determined, for example, from the requirements for the optical device 2. Further, the movable range d is arbitrarily determined from the size determined by the image forming apparatus 1 which can be incorporated in the imaging optical system 26, depending on the value determined in the optical axis direction. 136010.doc -18- 200941154 First, the method of determining the apex angle α will be described. The relationship between the maximum displacement s, the sway range d, and the yaw angle θ in the position adjustment device ^ establishes the relationship of the formula (1). [Equation 1] • s=dtan0 (Equation 1) In the triangular prism 8, # is defined by the formula of the refraction at each boundary surface and the declination, and Equation 2, Equation 3, Equation 4, and Equation 5 are established. .
[數2] sini,=«sinr,…（公式 2) [數3] 丨…（公式3) [數4] «sinr2=sim.2 …（公式 4) [數5] θ=ί·ι + ζ·2-α …（公式 5) 接著將公式5以入射角卜進行微分，藉此而獲得公式6。 [數6] de[Number 2] sini,=«sinr,...(Formula 2) [Number 3] 丨...(Formula 3) [Number 4] «sinr2=sim.2 ... (Formula 4) [Number 5] θ=ί·ι + ζ·2-α (Equation 5) Next, Equation 5 is differentiated by the incident angle, thereby obtaining Formula 6. [Number 6] de
COS Ζχ cos Γ2 COS 2*2 COS Γι …（公式6) 圖5係為表示入射角ii與偏角Θ之關係及入射角丨1與£10仙1 之關係之圖。另外，圖5係表示a=10[deg]之情形。 依據圖5，使入射角h變化之情形下，可明瞭在偏角Θ係 存在極小值（最小偏角）。 般而δ ’若以偏角Θ成為最小偏角之方式決定入射角 136010.doc -19- 200941154 ’則可抑制由於第2楔形稜鏡Η之移動所致之像散差之變 動。另-方面，從圖5可明瞭’偏角e成為最小偏角(極小 值），係在成為de/dipin公式6之右邊之值為「〇」）時。由 此觀之，偏角θ成為最小偏角時，可明昤丨 N w 12、n=r2之關 係成立。與如此方式所獲得2Γι==Γ2,可從公式3求得公式 Ί。 [數7] Γι = 7-2 = f …（公式 7) 再者，從i丨若Sini,=sini2之關係成立，且將公式7代入 至公式2及公式4，則求得公式8。 [數8] (公式8) sin i\ = sin = nsin — 右考慮像散差之產生’則在三角稜鏡8(第丨楔形稜鏡13)COS Ζχ cos Γ2 COS 2*2 COS Γι (Formula 6) Figure 5 is a graph showing the relationship between the incident angle ii and the yaw angle 及 and the relationship between the incident angle 丨1 and £10 sen. In addition, FIG. 5 shows a case where a=10 [deg]. According to Fig. 5, in the case where the incident angle h is changed, it is understood that there is a minimum value (minimum declination) in the yaw angle system. Generally, δ ′ determines the incident angle 136010.doc -19- 200941154 ′ in such a manner that the yaw angle becomes the minimum off angle, and the variation of the astigmatism difference due to the movement of the second dovetail can be suppressed. On the other hand, it can be understood from Fig. 5 that the 'offset angle e becomes the minimum off angle (minimum value) when the value on the right side of the de/dipin formula 6 is "〇"). From this point of view, when the declination angle θ becomes the minimum declination angle, the relationship between N w 12 and n=r2 can be established. With 2Γι==Γ2 obtained in this way, the formula 求 can be obtained from Equation 3. [Equation 7] Γι = 7-2 = f (Equation 7) Furthermore, if the relationship between i and Sini and =sini2 is established, and Equation 7 is substituted into Equation 2 and Equation 4, Equation 8 is obtained. [Equation 8] (Equation 8) sin i\ = sin = nsin — The right to consider the generation of astigmatism' is then in the triangle 稜鏡8 (the third wedge 稜鏡13)
中，頂角α係以較小為較佳（惟忽視d之情形）。因此，只要 較頂角α设計為較小，則sina〜α之近似關係成立。此外， 由於入射角1丨亦較小’因此同樣之近似關係成立，而為 sink % h 0 將此等近似關係代入至公式8，求得公式（9)。 [數9] /丨In the middle, the apex angle α is preferably smaller (but the case of d is ignored). Therefore, as long as the apex angle α is designed to be smaller, the approximate relationship of sina~α is established. In addition, since the incident angle 1丨 is also small', the same approximate relationship holds, and for the sink % h 0 , the approximate relationship is substituted into the equation 8, and the formula (9) is obtained. [Number 9] /丨
Zi = Z2 = _ ...(公式 9) 再者，右將公式9代入至公式5，則求得公式1〇。 [數 10] 136010.doc -20· 200941154 0=("«-1)α …（公式 l〇) 此外，若將公式1 〇代入至公式1，則求得公式11。 [數 11] « = ^TT)tan-1 (¾ ...(公式 11) . 另外，在本實施形態中，係如圖1所示，在光學系統 1〇(像位置調整裝置1)與像面之間配置有第2成像透鏡262。 換言之，在物體（或與此對應之像）與到第2成像透鏡262之 φ 第1面之間（物空間）配置有像位置調整裝置1。因此，藉由 該第2成像透鏡262之倍率，s=S/M之關係成立。因此，若 使用在像面中所要求之最大實位移量S(光學裝置2所要求 之位移量）來表示頂角α，則成為公式12。 [數 12] …（公式 12) 另外，像位置調整裝置1係亦可配置在第2成像透鏡262 之最終面與像面之間（亦即像空間），該情形下，S=s之關係 ® 成立。 如此，本實施形態中之第1楔形稜鏡13及第2楔形稜鏡14 之頂角α係根據像位置調整裝置1所要求之最大位移量s、 及為了實現該最大位移量s所容許之第2楔形稜鏡14之可動 範圍d ’而可藉由公式u.來求出。 以下’在本實施形態中’係將第2成像透鏡262之倍率Μ 设為0·1[倍]、在像面所要求之最大實位移量s設為 〇.25[mm](亦即最大位移量s係為2 5[mm])、第丨楔形稜鏡 136010.doc 200941154 第2楔形稜鏡14)之折射率n設為1.476、第2楔形稜鏡14 之可動範圍d設為30 [mm]。若從此等數值求出頂角α，即成 為 α与 l〇[deg]。 如此’藉由設計第1楔形稜鏡13及第2楔形稜鏡14之頂角 α’在像位置調整裝置1中調整像之位置時，以偏角Θ成為 最小偏角附近，而且可利用可動範圍全域之方式，可將頂 角α最佳化。 ❹ 接著就決定入射角ii之方法進行說明，該入射角卜係用 以決定繞著像位置調整裝置1中之第1楔形稜鏡13(第2楔形 梭鏡14)之Y軸之旋轉姿勢。 圖6係為表示藉由調整機構η使第2楔形稜鏡14沿光軸方 向移動時之像散差之變化之圖。圖6係圖示頂角α為 「10[deg]」之情形。此外，圖6所示之6個曲線圖係各自表 示入射角為 5.3、6.245、6.5、6.8、7.391、8.3[deg]時之像 散差之變化。 參 藉由上述之公式5及公式8成為最小偏角之偏角θ係為 「4.782[deg]」，而偏角θ成為最小偏角時之入射角係為 「7.3 91[(16§]」。在圖6中若觀看入射角=7.391[(^§]之曲線 圖’則使第2楔形棱鏡14移動時之像散差之變動大致成為 「0」，若以偏角Θ成為最小偏角之方式決定入射角，則可 將隨著使第2楔形稜鏡14移動所產生之像散差之變動抑制 在最小限度。 然而’此時之像散差之值係成為第1楔形棱鏡13與第2楔 形稜鏡14之相對距離為「〇」（與平行平板等效之狀態）中之 136010.doc -22- 200941154 像散差’未必成為較小之值。若觀看圖6，此時之像散差 之絕對值係成為約〇.〇〇12fmmJ。 在本實施形態中，係在將第2楔形稜鏡14安置於可動範 圍d之中央之位置（出射光χ。成為基準位置之位置）之狀態 了 ’在將人射角各減小些許之方向，使繞著光學系統1〇之 Υ轴之旋轉姿勢，從繞著偏角θ成為最小偏角之光學系統1〇 之Υ轴之旋轉姿勢變化’而藉由模擬求出像散差成為「〇」 ^ 時之入射角。 ο 若觀看圖6,若從偏角0成為最小偏角之入射角 (=7.391[deg])減少入射角，則像散差之絕對值即逐漸減 少。再者，可明瞭位移量為「〇」時像散差成為「〇」係入 射角為「6.245[deg]」之曲線圖。再者，亦可明瞭以入射 角「6.25[deg]」為邊界，像散差之絕對值再度增加。 因此，在本實施形態之像位置調整裝置1中，係以入射 角丨！成為「6.245[deg]」之方式來決定繞著第i楔形稜鏡13 Ο 及第2楔形棱鏡14之γ轴之旋轉姿勢。如此，藉由將繞著第 1楔形稜鏡13及第2楔形棱鏡14之Y轴之旋轉姿勢最佳化， 即可在不需要像位置調整裝置丨中之像之位置調整之情形 下（基準位置之情形下）將像散差設為大致「〇」，並且即使 進行位置調整之情形下，亦可將所產生之像散差抑制在最 小限度’且不會損害光學性能而可使像位移。 <2.第2實施形態> 第1實施形態之光學裝置2雖係包含1個像位置調整裝置 1’惟用於組入像位置調整裝置1之裝置並不限定於此種裝 136010.doc 23· 200941154 置。 圖7係為表示第2實施形態之光學裝置3之圖。 光學裝置3係包含成為光學裝置3之構成之基台之基座 (baSe)30、及用以保持跨架在基座3〇之上面之架橋結構之 框架（frame)31及基板9之保持部32。 保持部32係包含工作台320、第1平板（plate)321、及第2 平板322’具有將屬於光學裝置3中之被處理對象物之基板 φ 9以特定之姿勢予以保持之功能。 工作台320之上面係設為水平面，且藉由從未圖示之吸 附口進行吸引而吸附基板9’且將該基板9以水平姿勢予以 保持。在第1平板321中，係介隔旋轉機構35而安裝有工作 台320。亦即，第丨平板321與工作台32〇係以旋轉機構”之 旋轉轴為中心而旋轉自如地安裝。在第2平板322之上面， 係設有副掃描機構34，而第2平板322與第丨平板321係介隔 副掃描機構34而安裝。再者，第2平板似係介隔主掃描機 _ 構33而安裝於基座30。 主掃描機構33係包含線性馬達33〇、及一對導件331。 性馬達330係包含固設在基座3〇之上面之固定子及安裝 在第2平板322之背面之移動子’藉由該移動子與該固定子 之電磁性相互作用而生成使第2平板切㈣轴方向移動之 驅動力。-對導件33】係為朝γ抽方向含有長度方向之構 件’區分在X軸方向之兩側而各自固設於基座3〇。導件别 係與第2平板322之背面迎合，具有規限第2平板似之移動 方向之功能。 1360I0.doc •24- 200941154 藉由此種結構，主掃描機構33係依據來自控制部％之控 制信號，而使第2平板322朝Y軸方向移動，藉此而使基板9 相對於描繪頭37相對地移動’而實現主掃描方向之掃描。 副掃描機構34係包含線性馬達34〇、及一對導件341。線 性馬達340係包含固設在第2平板322之上面之固定子、及 女裝在第1平板321之背面之移動子，藉由該移動子與該固 定子之電磁性相互作用而生成使第i平板321朝又轴方向移 ❹ 動之驅動力。一對導件341係為朝X軸方向含有長度方向之 構件，區分在Y轴方向之兩側而各自固設於第2平板322。 導件341係與第1平板321之背面迎合，具有規限第1平板 321之移動方向之功能。 藉由此種結構’副掃描機構34係依據來自控制部38之控 制信號’而使第1平板321朝X軸方向移動，藉此而使基板9 相對於描繪頭37相對地移動，而實現副掃描方向之掃描。 旋轉機構35係包含上端固設在工作台320之背面中央之 Ο 與2轴平行之旋轉軸、及使該旋轉軸轉動之馬達。若旋轉 機構35藉由該馬達使旋轉軸旋轉，則工作台32〇即依然為 水平姿勢，以該旋轉轴為中心轉動。 圖8係為表示第2實施形態之光源部36及描繪頭37之圖。 在圖7中雖係省略圖示，惟光源部36係依各描繪頭37所 設0 詳細内容雖未圖示，惟光源部3 6係包含雷射驅動部、雷 射振盪器、照明光學系統。若根據來自控制部38之控制信 號而使雷射驅動部動作，則脈衝光即從雷射振盪器振盪， 136010.doc -25- 200941154 而振盪之脈衝光即介隔照明光學系統而導引至描緣頭3 7。 複數個描繪頭37(在圖7中係圖示7個描緣頭37)，係於排 列朝X軸方向之狀態下固設於框架3丨，且以各自與保持在 保持部3 2之基板9之表面相對向之方式配置。 各描繪頭37係包含：從光源部36入射之脈衝光之出射方 向成為Z軸方向之方式調整之出射部37〇、將脈衝光依據所 希望之圖案予以部分遮光之孔徑單元371、用以調整基板9 φ 之表面（像面）中之像之位置之像位置調整裝置1及成像透鏡 372。亦即’在光學裝置3中，係像位置調整裝置1及成像 透鏡3 7 2構成成像光學系統。 圖9係為概略性表示使基板9之表面中之像位移之例之 圖。圖9之左側所示之基板90係為正常之狀態之基板9,而 右側所示之基板91係為因為熱而膨脹而使X轴方向之大小 變化之基板9。 小區域92乃至98係表示成為從各描繪頭37所出射之脈衝 Φ 光之基準之成像位置。此外’像99係表示描繪在小區域92 之中央部之像（描繪圖案）。 對於正常之狀態之基板90描繪時，藉由各像位置調整裝 置1之位移量係調整為「〇」，而藉由各描繪頭37之像，係 成像於基準位置。另一方面，對於X軸方向之大小因為膨 脹而變化之基板91 ’若使像成像於與基板9〇之情形相同之 位置’則小區域92乃至98中之像之位置就偏離。圖9中以 虛線所示之像99b，係表示不使像99位移，而使成像於相 同位置之情形之位置。 136010.doc •26- 200941154 然而，由於光學裝置3係各描繪頭37各自包含像位置調 整裝置1，因此可依據基板91之膨脹，以像99成像於小區 域92之中央之方式，使出射光朝（_χ)方向位移，且使像99& 成像在基板91之小區域92a之中央。 • 另外，作為將脈衝光設為所希望之圖案之光束之構成， 雖係以使用孔徑單元3 71為例進行了說明，惟亦可例如取 代孔徑單元371，而使用形成有成為基準之圖案之遮罩 ❹ 等。此外’亦可使用繞射格栅型之空間光調變元件。 綜上所述，如第2實施形態之光學裝置3所示，藉由包含 複數個像位置調整裝置1，亦可使複數個描繪頭37之間距 整齊一致。 <3.第3實施形態> 上述實施形態中之像位置調整裝置1，係設為可藉由調 整機構11而調整第2楔形棱鏡14之Z軸方向之位置，藉此而 僅調整像之X轴方向之位置。然而，藉由在像位置調整裝 ❿ 置1設置其他驅動機構，亦可調整其他各式各樣之狀態。 圖10係為表示第3實施形態中之像位置調整裝置la之結 構之圖。像位置調整裝置la係在包含有第1旋轉機構15、 第2旋轉機構16及第3旋轉機構17之點與上述實施形態中之 像位置調整裝置1有所不同。 第1旋轉機構15係為以Y轴為中心使光學系統1〇旋轉之機 構。Y軸係為與平行於位移方向之X轴、及平行於光轴方 向之Z軸正交之軸。因此，γ軸係相當於本發明中之第1 軸，而第1旋轉機構15係相當於本發明中之第1旋轉機構。 136010.doc -27- 200941154 在上述實施形態之像位置調整裝置1中，係以位移量為 〇」時像散差成為「〇」之方式設計。因此，若使第2横 形稜鏡14從中央位置移動而使像之位置位移，則雖然以該 值變小之方式受到抑制，惟未必會產生像散差。 . 本實施形態中之像位置調整裝置1 a係在調整像之位置之 後（調整第2楔形稜鏡14之位置之後），以像散差成為「〇」 之方式’藉由第1旋轉機構15而使光學系統10旋轉，藉此 ❸ 而將入射角ii進行微調整。藉此，不論位移量，均可抑制 像散差之產生。 第2旋轉機構16係為以Z軸為中心使一方之楔形稜鏡（第1 楔形棱鏡13或第2楔形棱鏡14之中之一方）旋轉之機構。如 前所述’ Z軸係為與光轴方向平行支轴》因此，z軸係相當 於本發明中之第2軸，而第2旋轉機構16係相當於本發明中 之第2旋轉機構。 因為第1楔形稜鏡13或第2楔形稜鏡14之加工精破度等之 參 原因’若使第2楔形稜鏡14移動，則會有像面中之像在γ軸 方向偏離之情形。此種情形下’像位置調整裝置1係藉由 第2旋轉機構16使一方之楔形稜鏡以Z轴為中心旋轉，藉此 即可修正在Y轴方向所產生之偏離。因此，像位置調整裝 置la係可更高精確度使像朝X轴方向（一次元方向）位移。 第3旋轉機構17係為以X軸為中心使一方之換形棱鏡旋轉 之機構。如前所述，X軸係為與位移方向平行之軸。因 此，X轴係相當於本發明中之第3軸，而第3旋轉機構17係 相當於本發明中之第3旋轉機構。 136010.doc -28- 200941154 像在像面中從原本之χ轴傾斜之情形下係藉由第3旋轉 機構17而使-方之楔形稜鏡以χ抽為中心旋轉，藉此即可 修正此傾斜。 另外，在圖10中，第3旋轉機構17之旋轉軸軸广第i i轉機構15之旋轉轴（γ轴）、第2旋轉機構⑽旋轉轴㈣） , ’糸以1點相交之方式設定，惟此等之軸亦可彼此交叉。此 外，交點之位置並不限定於圖1〇所示之位置。 • <4.變形例> 〇 以上雖就本發明之實施形態進行了說明惟本發明並不 限疋於上述實施形態，亦可作各式各樣之變形。 例如，需藉由像位置調整裝置】調整像之位置之原因並 不限疋於上述實施形態所舉者。例如，亦可為將光學裝置 2之成像光學系統26中之製造誤差、或光學裝置3之複數個 描繪頭37之頭間差予以修正者。 此外，藉由像位置調整裝置丨之像之位置調整，係可與 ® 其他位置調整方法併用。例如，在第1實施形態中之光學 裝置2中，以一面將X轴方向之偏離，藉由可動工作台加之 SiJ掃描方向之移動大幅修正’ 一面進行藉由像位置調整裝 置1之微調整之方式構成亦可。 此外，在上述實施形態中，雖係針對將像位置調整裝置 1組入於作為曝光裝置所構成之光學裝置2或作為描繪裝置 所構成之光學裝置3之例進行了說明，惟像位置調整裝置j 之用途並不限定於此。例如，像位置調整裝置〗亦可應用 在測定偏離量之檢測裝置。亦即，為了使表示實像(被攝 136010.doc •29- 200941154 體）之入射光人1與像面（CCD)中之基準像一致，乃根據要使 第2楔形稜鏡14從基準位置移動多少程度來測定實像之偏 離量。 此外’以基板9而言，雖有彩色濾光片用之基板、液晶 顯示裝置及電漿顯示裝置等之平面面板顯示器（FDP)用之 玻璃基板、半導體基板、印刷基板等屬之，惟當然並不限 定於此。 φ 【圖式簡單說明】 圖1係為表示發明之光學裝置之圖。 圖2係為表示像位置調整裝置之結構之圖。 圖3係為表示光學系統之俯視囷。 圖4係為表示光入射至一般之三角棱鏡之情況之圖。 圖5係為表示入射角與偏角之關係及入射角與山1之關 係之圖。 圖6係為表示藉由調整機構使第2楔形稜鏡沿光軸方向移 〇 動時之像散差之變化之圖。 圖7係為表示第2實施形態中之光學裝置之圖。 圖8係為表示第2實施形態中之光源部及摘纷頭之頭。 圖9係為概略性表示使基板之表面中之像位移之例之 圖。 圖10係為表示第3實施形態中之像位置調整裝置之結構 之圖。 【主要元件符號說明】 1、la 像位置調整裝置 136010.doc -30- 200941154 參 2 ' 3 光學裝置 9 基板 10 光學系統 11 調整機構 12 像位置控制部 13 第1楔形稜鏡 14 第2楔形稜鏡 15 第1旋轉機構 16 第2旋轉機構 17 第3旋轉機構 20 可動工作台 21 曝光頭 22 控制部 23 光源 24 照明光學系統 25 空間光調變器件 26 成像光學系統 30 基座 32 保持部 33 主掃描機構 34 副掃描機構 36 光源部 37 描繪頭 38 控制部 136010.doc •31 - 200941154 371 372 孔徑單元 成像透鏡Zi = Z2 = _ ... (Equation 9) Again, by substituting Equation 9 into Equation 5, the formula 1 is obtained. [Equation 10] 136010.doc -20· 200941154 0=("«-1)α ... (Formula l〇) In addition, if the formula 1 〇 is substituted into the formula 1, the formula 11 is obtained. [Equation 11] « = ^TT) tan-1 (3⁄4 (Equation 11). Further, in the present embodiment, as shown in Fig. 1, the optical system 1 (image position adjusting device 1) and The second imaging lens 262 is disposed between the image planes. In other words, the image position adjusting device 1 is disposed between the object (or an image corresponding thereto) and the φ first surface of the second imaging lens 262 (object space). Therefore, the relationship of s=S/M is established by the magnification of the second imaging lens 262. Therefore, the maximum real displacement amount S (the amount of displacement required by the optical device 2) required in the image plane is used. The apex angle α is Equation 12. [Equation 12] Further, the image position adjusting device 1 may be disposed between the final surface of the second imaging lens 262 and the image plane (that is, the image space). In this case, the relationship S of S = s is established. Thus, the apex angle α of the first dovetail 13 and the second dovetail 14 in the present embodiment is the maximum displacement amount s required by the image position adjusting device 1. And in order to realize the movable range d' of the second dovetail 14 allowed by the maximum displacement amount s, it can be obtained by the formula u. In the present embodiment, the magnification Μ of the second imaging lens 262 is set to 0·1 [times], and the maximum real displacement amount s required for the image plane is set to 〇.25 [mm] (that is, the maximum displacement) The amount s is 2 5 [mm]), the second wedge-shaped 稜鏡 136010.doc 200941154 The second wedge-shaped 稜鏡 14) has a refractive index n of 1.476, and the second wedge-shaped 稜鏡 14 has a movable range d of 30 [mm] ]. If the apex angle α is obtained from these values, it becomes α and l 〇 [deg]. When the position of the image is adjusted in the image position adjusting device 1 by designing the apex angle α' of the first dovetail 13 and the second dovetail 14, the vicinity of the minimum declination is obtained by the yaw angle ,, and the movable angle can be utilized. The apex angle α can be optimized in a range-wide manner. Next, a method of determining the incident angle ii for determining the rotational posture of the Y-axis around the first dovetail 13 (second wedge-shaped shuttle mirror 14) in the image position adjusting device 1 will be described. Fig. 6 is a view showing a change in astigmatic aberration when the second dovetail 14 is moved in the optical axis direction by the adjustment mechanism η. Fig. 6 is a diagram showing a case where the vertex angle α is "10 [deg]". Further, the six graphs shown in Fig. 6 each show a change in astigmatism when the incident angles are 5.3, 6.245, 6.5, 6.8, 7.391, and 8.3 [deg]. The deviation angle θ which becomes the minimum declination from the above formula 5 and formula 8 is "4.782 [deg]", and the incident angle when the declination angle θ becomes the minimum declination is "7.3 91 [(16§]" In Fig. 6, when the incident angle = 7.391 [(^§] graph] is observed, the variation of the astigmatism difference when the second wedge prism 14 is moved is substantially "0", and the yaw angle becomes the minimum yaw angle. By determining the incident angle, the variation of the astigmatism difference caused by the movement of the second dovetail 14 can be minimized. However, the value of the astigmatism difference at this time is the first wedge prism 13 and The relative distance of the second dovetail 14 is "〇" (the state equivalent to the parallel plate). 136010.doc -22- 200941154 The astigmatism difference does not necessarily become a small value. If you look at Figure 6, at this time The absolute value of the astigmatism is about f12fmmJ. In the present embodiment, the second dovetail 14 is placed at the center of the movable range d (the exit pupil is at the position of the reference position). The state of 'in the direction of reducing the angle of the human eye, so that the rotation of the axis around the optical system The angle of incidence when the astigmatism difference becomes "〇" ^ is obtained by simulation from the change of the rotational posture of the axis of the optical system 1〇 which is the minimum off angle around the declination angle θ. ο If the figure 6 is viewed, When the angle of incidence becomes the angle of incidence of the minimum off angle (=7.391 [deg]), the incident angle is reduced, and the absolute value of the astigmatism difference is gradually decreased. Furthermore, it can be understood that the astigmatism difference becomes "〇" when the displacement amount is "〇". The graph of the incident angle is "6.245 [deg]". Furthermore, it can be seen that the absolute value of the astigmatism difference increases again with the incident angle "6.25 [deg]" as the boundary. Therefore, the image of this embodiment is In the position adjusting device 1, the rotation posture around the γ-axis of the i-th wedge-shaped 稜鏡13 Ο and the second wedge-shaped prism 14 is determined so that the incident angle 丨! becomes "6.245 [deg]". The rotation posture around the Y-axis of the first dovetail 13 and the second wedge-shaped prism 14 is optimized, and the position adjustment of the image in the position adjusting device 不需要 is not required (in the case of the reference position) Set the astigmatism difference to roughly "〇", and even if the position is adjusted, you can The astigmatism of the astigmatism is minimized and the image can be shifted without impairing the optical performance. <2. Second Embodiment> The optical device 2 of the first embodiment includes one image position adjusting device 1 The device for arranging the image position adjusting device 1 is not limited to the above-described device 136010.doc 23·200941154. Fig. 7 is a view showing the optical device 3 of the second embodiment. A base (baSe) 30 of the base of the optical device 3, and a frame 31 for holding the bridge structure across the top of the base 3 and a holding portion 32 of the substrate 9. The holding portion 32 includes a table 320, a first plate 321 and a second plate 322', and has a function of holding the substrate φ 9 belonging to the object to be processed in the optical device 3 in a specific posture. The upper surface of the table 320 is a horizontal plane, and the substrate 9' is sucked by suction from an adsorption port (not shown), and the substrate 9 is held in a horizontal posture. In the first flat plate 321, a table 320 is attached via a rotating mechanism 35. That is, the second flat plate 321 and the table 32 are rotatably mounted around the rotation axis of the rotating mechanism. On the upper surface of the second flat plate 322, a sub-scanning mechanism 34 is provided, and the second flat plate 322 is provided. The second flat plate 321 is attached via the sub-scanning mechanism 34. Further, the second flat plate is attached to the susceptor 30 via the main scanning device 33. The main scanning mechanism 33 includes a linear motor 33A, and a The guide motor 331. The motor 330 includes a stator fixed on the base 3〇 and a mover mounted on the back surface of the second plate 322. The electromagnetic interaction between the mover and the stator is The driving force for moving the second flat plate in the (four) axis direction is generated. The pair of guide members 33 are respectively disposed on the both sides of the X-axis direction in the longitudinal direction of the member in the γ pumping direction, and are fixed to the base 3A. The guide member is in contact with the back surface of the second flat plate 322, and has a function of restricting the moving direction of the second flat plate. 1360I0.doc • 24-200941154 With this configuration, the main scanning mechanism 33 is based on the control unit%. Controlling the signal to move the second flat plate 322 in the Y-axis direction, thereby The substrate 9 is moved relative to the drawing head 37 to perform scanning in the main scanning direction. The sub-scanning mechanism 34 includes a linear motor 34A and a pair of guides 341. The linear motor 340 is fixed to the second plate 322. The upper fixed holder and the moving member of the wearer on the back surface of the first flat plate 321 generate a drive for moving the i-th flat plate 321 in the direction of the other axis by the electromagnetic interaction of the mover and the fixed member. The pair of guides 341 are members having a longitudinal direction in the X-axis direction, and are respectively fixed to the second flat plate 322 on both sides in the Y-axis direction. The guide 341 is in contact with the back surface of the first flat plate 321, The function of restricting the moving direction of the first flat plate 321 is such that the sub-scanning mechanism 34 moves the first flat plate 321 in the X-axis direction in accordance with the control signal from the control unit 38, thereby causing the substrate 9 is relatively moved relative to the drawing head 37 to realize scanning in the sub-scanning direction. The rotating mechanism 35 includes a rotating shaft whose upper end is fixed to the center of the back surface of the table 320 and which is parallel to the two axes, and the rotating shaft is rotated. Motor. If the rotating mechanism 35 When the rotary shaft is rotated by the motor, the table 32 is still in a horizontal posture and is rotated about the rotation axis. Fig. 8 is a view showing the light source unit 36 and the drawing head 37 according to the second embodiment. Although the illustration is omitted in Fig. 7, the light source unit 36 is provided for each drawing head 37. Although the details are not shown, the light source unit 36 includes a laser driving unit, a laser oscillator, and an illumination optical system. When the laser driving unit is operated based on the control signal from the control unit 38, the pulsed light oscillates from the laser oscillator, and the pulsed light oscillated by 136010.doc -25-200941154 is guided to the illumination optical system. The head is 3 7. A plurality of drawing heads 37 (seven drawing heads 37 are shown in FIG. 7) are fixed to the frame 3A in a state in which the array is oriented in the X-axis direction, and are respectively supported on the substrate held by the holding portion 3 2 The surface of 9 is configured in a relatively opposite manner. Each of the drawing heads 37 includes an emitting unit 37 that is adjusted so that the emission direction of the pulse light incident from the light source unit 36 is in the Z-axis direction, and an aperture unit 371 that partially shields the pulsed light from the desired pattern for adjustment. The image position adjusting device 1 and the imaging lens 372 at positions of the image on the surface (image surface) of the substrate 9 φ. That is, in the optical device 3, the image position adjusting device 1 and the imaging lens 372 constitute an imaging optical system. Fig. 9 is a view schematically showing an example of displacing an image on the surface of the substrate 9. The substrate 90 shown on the left side of Fig. 9 is a substrate 9 in a normal state, and the substrate 91 shown on the right side is a substrate 9 which is expanded by heat to change the size in the X-axis direction. The small area 92 or 98 indicates the imaging position which is the reference of the pulse Φ light emitted from each of the drawing heads 37. Further, the image "99" indicates an image (drawing pattern) drawn in the central portion of the small region 92. When the substrate 90 is drawn in the normal state, the displacement amount of each image position adjusting device 1 is adjusted to "〇", and the image of each drawing head 37 is imaged at the reference position. On the other hand, the position of the image in the small area 92 or 98 is deviated when the substrate 91' which changes in size in the X-axis direction due to the expansion is imaged at the same position as the case of the substrate 9'. The image 99b shown by a broken line in Fig. 9 indicates the position where the image 99 is not displaced, but is imaged at the same position. 136010.doc •26- 200941154 However, since the optical device 3 each of the drawing heads 37 each includes the image position adjusting device 1, the light can be emitted in such a manner that the image 99 is imaged in the center of the small region 92 in accordance with the expansion of the substrate 91. The direction is shifted toward (_χ), and the image 99& is imaged in the center of the small area 92a of the substrate 91. In addition, as a configuration of the light beam in which the pulse light is a desired pattern, the aperture unit 371 is used as an example. However, for example, instead of the aperture unit 371, a pattern to be the reference may be used. Mask ❹ and so on. Further, a diffraction grating type spatial light modulation element can also be used. As described above, as shown in the optical device 3 of the second embodiment, by including a plurality of image position adjusting devices 1, the distance between the plurality of drawing heads 37 can be aligned. <3. Third Embodiment> The image position adjusting device 1 according to the above embodiment is configured such that the position of the second wedge prism 14 in the Z-axis direction can be adjusted by the adjustment mechanism 11, thereby adjusting only the image The position of the X-axis direction. However, by providing other driving mechanisms in the image position adjusting device 1, it is possible to adjust other various states. Fig. 10 is a view showing the configuration of the image position adjusting device 1a according to the third embodiment. The image position adjusting device 1a differs from the image position adjusting device 1 in the above embodiment in that the first rotating mechanism 15, the second rotating mechanism 16, and the third rotating mechanism 17 are included. The first rotating mechanism 15 is a mechanism that rotates the optical system 1 around the Y axis. The Y-axis is an axis orthogonal to the X-axis parallel to the displacement direction and the Z-axis parallel to the optical axis direction. Therefore, the γ-axis system corresponds to the first axis in the present invention, and the first rotation mechanism 15 corresponds to the first rotation mechanism in the present invention. 136010.doc -27- 200941154 In the image position adjusting device 1 of the above-described embodiment, the astigmatism difference is "〇" when the displacement amount is 〇". Therefore, if the position of the image is shifted by moving the second lateral shape 14 from the center position, the value is reduced so that the value is reduced, but the astigmatism difference does not necessarily occur. In the image position adjusting device 1a of the present embodiment, after the position of the image is adjusted (after adjusting the position of the second dovetail 14), the astigmatism difference becomes "〇" by the first rotating mechanism 15 The optical system 10 is rotated, whereby the incident angle ii is finely adjusted. Thereby, the generation of the astigmatism difference can be suppressed regardless of the amount of displacement. The second rotating mechanism 16 is a mechanism that rotates one of the wedge-shaped turns (one of the first wedge-shaped prism 13 or the second wedge-shaped prism 14) around the Z-axis. As described above, the 'Z-axis is parallel to the optical axis direction'. Therefore, the z-axis is equivalent to the second axis in the present invention, and the second rotating mechanism 16 corresponds to the second rotating mechanism in the present invention. The reason why the first dovetail 13 or the second dovetail 14 is processed and the like is caused. If the second dovetail 14 is moved, the image in the image plane is deviated in the γ-axis direction. In this case, the image position adjusting device 1 can rotate the one of the dovetails about the Z axis by the second rotating mechanism 16, whereby the deviation in the Y-axis direction can be corrected. Therefore, the image position adjusting device la can shift the image toward the X-axis direction (primary direction) with higher precision. The third rotating mechanism 17 is a mechanism that rotates one of the deformable prisms around the X-axis. As mentioned earlier, the X-axis is the axis parallel to the direction of displacement. Therefore, the X-axis system corresponds to the third axis in the present invention, and the third rotation mechanism 17 corresponds to the third rotation mechanism in the present invention. 136010.doc -28- 200941154 In the case where the image plane is inclined from the original axis, the third rotating mechanism 17 is used to rotate the wedge-shaped ridge around the squeegee, thereby correcting this. tilt. In addition, in FIG. 10, the rotation axis of the third rotation mechanism 17 is widened by the rotation axis (γ axis) of the second rotation mechanism 15 and the rotation axis (four) of the second rotation mechanism (10), and '糸 is set by one point intersection. However, the axes of these can also cross each other. Further, the position of the intersection is not limited to the position shown in Fig. 1A. <4. Modifications> 〇 Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications may be made. For example, the reason for adjusting the position of the image by the image position adjusting device is not limited to the above embodiment. For example, it is also possible to correct the manufacturing error in the imaging optical system 26 of the optical device 2 or the difference between the heads of the plurality of drawing heads 37 of the optical device 3. In addition, the position adjustment of the image like the position adjustment device can be used in conjunction with other position adjustment methods. For example, in the optical device 2 of the first embodiment, the deviation of the X-axis direction is performed, and the movement of the movable table and the movement of the SiJ scanning direction is greatly corrected, and the fine adjustment by the image position adjusting device 1 is performed. The method can also be constructed. Further, in the above-described embodiment, an example in which the image position adjusting device 1 is incorporated in the optical device 2 configured as an exposure device or the optical device 3 configured as a drawing device has been described. The use of j is not limited to this. For example, the image position adjusting device can also be applied to a detecting device that measures the amount of deviation. That is, in order to make the incident light person 1 representing the real image (photographed 136010.doc • 29-200941154 body) coincide with the reference image in the image plane (CCD), the second wedge-shaped crucible 14 is moved from the reference position. How much is the amount of deviation of the real image. In addition, the substrate 9 includes a glass substrate for a flat panel display (FDP) such as a substrate for a color filter, a liquid crystal display device, and a plasma display device, and a semiconductor substrate or a printed substrate. It is not limited to this. φ [Simplified description of the drawings] Fig. 1 is a view showing an optical device of the invention. Fig. 2 is a view showing the structure of an image position adjusting device. Fig. 3 is a plan view showing the optical system. Fig. 4 is a view showing a state in which light is incident on a general triangular prism. Fig. 5 is a view showing the relationship between the incident angle and the off angle and the relationship between the incident angle and the mountain 1. Fig. 6 is a view showing a change in astigmatic aberration when the second dovetail is moved in the optical axis direction by the adjustment mechanism. Fig. 7 is a view showing the optical device in the second embodiment. Fig. 8 is a view showing the light source unit and the head of the picking head in the second embodiment. Fig. 9 is a view schematically showing an example of displacing an image in the surface of a substrate. Fig. 10 is a view showing the configuration of an image position adjusting device in the third embodiment. [Description of main component symbols] 1. La image position adjustment device 136010.doc -30- 200941154 Reference 2 ' 3 Optical device 9 Substrate 10 Optical system 11 Adjustment mechanism 12 Image position control unit 13 First dovetail 14 Second wedge rib Mirror 15 First rotation mechanism 16 Second rotation mechanism 17 Third rotation mechanism 20 Movable table 21 Exposure head 22 Control unit 23 Light source 24 Illumination optical system 25 Space light modulation device 26 Imaging optical system 30 Base 32 Holding portion 33 Main Scanning mechanism 34 Sub-scanning mechanism 36 Light source section 37 Drawing head 38 Control section 13610.doc • 31 - 200941154 371 372 Aperture unit imaging lens
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