200940430 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種基板之搬送裝置、真空處理裝置、 及搬送方法。 【先前技術】 ❹ ❹ 於大型FPD ( Flat Panel Display，平板顯示器）之製程 中，利用有用於對基板實施成膜處理或加熱處理之各種真 空處理裝置。於真空處理裝置中’因需要與基板之尺寸相 應之真空空Μ，故隨著基板財之大型b須㈣極多之 時間用於形成真空空間。因此，對於真空處理裝置，先前 以來，為減少真空空間之形成頻率而提出有一種由彼此^ 連通之真空空間分別構成多個處理室之方案。 專利文獻i中記載之真空處理裝置包括…個行方 向連結之多個處理室；貫通各處理室並延伸於該行方向之 -對搬送路彳& ;以及將位於—方搬送隸（往路）上的搬 送托盤朝另-搬送路徑（復路）搬送之搬送室。該真空處 理裝置使搬送托盤於往路上移動之後，將往路上之搬送托 f朝復路上搬送，並使該搬送托盤於復路上移動。藉此， 專利文獻丨t記載之真空處理裝置能夠於可連通之多個真 空空間内依序執行不同之處理步驟。 [專利文獻1]日本專利特開扇[Μ I”號公報 【發明内容】 圓4⑷〜（d)及圖5(a)〜⑷分別係示意性地 表示專利文獻^中記载之真空處理裝置之搬送步驟之圓。 200940430 搬送室50中配置有使搬送托盤51升降之升降機構52、於 搬送路徑上非接觸性地保持搬送托盤51之保持機構53、及 使搬送托盤51於往路R1與復路R2之間滑動之滑動機構 54 ° 於圖4( a)中，首先，將以豎立狀態支持基板之搬送 托盤51沿往路R1搬入至搬送室5〇。搬送室5〇如以下所 示’藉由使搬送托盤51之升降動作與搬送托盤51之保持 動作同步而實現搬送步驟中之基板位置之穩定化。 亦即，於圖4(b)中，當搬入搬送托盤51時，升降機 構52與保持機構53 —面維持搬送托盤51與保持磁鐵53& 之間之距離，一面使搬送托盤51與保持磁鐵53a暫時上升， 使搬送托盤51脫離往路R1。當搬送托盤51脫離往路 時，如圖4 (c)所示，滑動機構54使托盤載台5竹滑動， 從而將掛鉤54a配置於搬送托盤51上所設之突片5u之下 方。 於圖4(d)中，當掛鉤54a被配置於突片51a之下方 時，升降機構52與保持機構53 一面維持搬送托盤51與保 持磁鐵53a之間之距離，一面使搬送托盤51與保持磁鐵' 暫時下降。繼而，藉由突片51a與掛鉤54a之卡接，將搬送 托盤5 1懸吊於托盤載台54f。 於圖5 (a)中，當搬送托盤51被懸吊於托盤載台54f 時保持機構53使保持磁鐵53a充分遠離搬送托盤η，從 而解除搬送托盤51之束缚（保持）。當搬送托盤5丨之束缚 被解除時’如圖5 ( b )所示，滑動機構54使把盤載台54f 200940430 滑動，從而將搬送托盤51配置於復路尺2之上方。 於圖5(0中，當搬送托盤51被配置於復路R2之上 方時，升降機構52再次上升，保持機構53使保持磁鐵… 再次下降，藉此，將搬送托盤51於復路R2之上方再次保 持於升降機構52 ±。當搬送托盤51被再次保持時，如圖^ (d)所示’升降機構52與保持機構53 一面維持搬送托盤 51與保持磁鐵53a之間之距離’―面使搬送托盤51與保持 磁鐵53a上升，從而解除突片5U與掛鉤5钧之卡接。 ® 藉此，搬送室50藉由搬送托盤51之升降與保持磁鐵 53a之升降之同步，可提高搬送托盤51之升降時的基板位 置之穩定性。又，搬送室50藉由突片51a與掛鉤之卡 接’可提高搬送路徑間的基板位置之穩定性。 然而，於專利文獻1之搬送步驟中，每當搬送基板時 須使固設於托盤載台54f上的掛鉤54a與搬送托盤51之突 片51a卡接，故而必須使托盤載台54f多次升降。其結果， 〇於基板之搬送步驟中，存在搬送托盤之多次升降需^要極 多之時間，從而導致基板處理之處理量大幅受損之問題。 再者’該問題並不限定於專利文獻1之搬送裝置，在必須 使搬送基板之托盤多次升降之其他習知搬送裝置中亦同樣 存在該問題。 又’專利文獻1之搬送裝置中’掛鉤54a於滑動機構 5斗上預先固定於與突片51a卡接之位置（圖4a)。因此，在 將搬送托盤51朝搬送室50搬送時，需要使滑動機構54移 動之空間以使搬送托盤51與掛鉤54a不接觸，從而存在導 5 200940430 致裝置之體積增大之問題。又，於此情形，在搬送托盤5ι 搬入後，為升降搬送托盤51而必須使掛鉤54a於搬送路徑 上移動，因而存在導致搬送步驟變多而處理量受損之問 題。進而，由於使搬送托盤51升降之升降機構52與使搬 送托盤51滑動之滑動機構54係分別設置於往路R1之左 右’因此存在導致裝置之體積變大之問題。 本發明係提供一種使基板之搬送處理中之處理量提$ 而不會導致裝置大型化之搬送裝置及搬送方法、與具備該 搬送裝置之真空處理裝置》 本發明之一態樣係一種搬送基板之搬送裝置。搬送装 置，具備：搬送托盤，一邊將該基板支持成豎立狀態一邊 於第1搬送路徑與第2搬送路徑之間搬送該基板；托盤載 台’可支持該搬送托盤；升降機構’使該托盤載台上升以 使該搬送托盤脫離該各搬送路徑，並使該托盤載台下降以 將該搬送托盤裝載於該各搬送路徑；以及滑動機構，使該 升降機構移動於該第1及第2搬送路徑間；該升降機構包 含與該托盤載台之上升連動以將該搬送托盤鎖止於該托盤 載台、與該托盤載台之下降連動以解除該搬送托盤之鎖止 狀態的鎖止機構》 本發明之另一態樣係一種真空處理裝置。真空處理裝 置’具備：搬送托盤’將基板支持成豎立狀態；第1及第2 搬送路徑，可供該搬送托盤移動；真空處理室，係設置於 該第1及第2搬送路徑上，將該搬送托盤所支持之該基板 在真空下進行處理；以及搬送室，係設置於該第1及第2 200940430 搬送路徑上且連結於該真空處理室，用於使該搬送托盤一 邊將該基板支持成暨立狀態一邊於該第1搬送路徑與該第2 搬送路徑之間搬送該基板；該搬送室，包含：托盤載台， 可支持該搬送托盤；升降機構，使該托盤載台上升以使該 搬送托盤脫離該各搬送路徑，並使該托盤載台下降以將該 搬送托盤裝載於該各搬送路徑；以及滑動機構，使該升降 機構移動於該帛1及第2搬送路徑間；該升降機構包含與 該托盤載台之上升連動以將該搬送托盤鎖止於該托盤載 台、與該托盤載台之下降連動以解除該搬送托盤之鎖止狀 態的鎖止機構。 本發明之又-態樣係一種搬送方法，係使將基板支持 成豎立狀應之搬送托盤自第i搬送路徑移動至第2搬送路 払。該方法，包含：將托盤載台配置於該第i搬送路徑的 動作；使該托盤載台上升，將位於該h搬送路徑上之該 $送托盤裝載於該托盤載台上㈣作；使該㈣載台自該 修送路徑移動至該第2搬送路徑的動作；以及使該托 搬送^下Γ將該托盤載台上之該搬送托盤裝載於該第2 搬送路徑上的動作；使該把盤載台上升之動作，包含藉由 與該托盤載台之上升連動之鎖止機 杯般機構於其上升時將該搬送 :盤鎖止於該托盤載台的動作；使該托盤載台下降之動 下藉由與該托盤載台之下降連動之該鎖止機構於立 下降時解除該搬送托盤之鎖止狀態的動作。 、 【實施方式】 以下， 依據圖式說明本發明 之一實施形態之搬送裝 200940430 置。圖1係示意性地表示具備搬送裝置30之真空處理裝置 W之立體圖。於囷1中，真空處理裝置1〇中，拆裝室 裝載/却載室（以下簡稱作！^室12)、第一處理室丨3、第 二處理室14、及搬送室15分別經由閘閥16而連結。 於真空處理裝置10中，設置有自拆裝室u朝向搬送室 15延伸之第一搬送路徑（以下簡稱作往路Ri)、及自搬送 室15朝向拆裝室11延伸之第二搬送路徑（以下簡稱作復路 R2 ) °本實施形態中之往路R1與復路r2彼此平行。 於往路R1及復路R2中，多個搬送托盤17分別由齒條 小齒輪機構進行搬送。各搬送托盤17較佳係形成為包圍基 板S之外緣之四邊框體狀，於此情形，例如搬送托盤口係 藉由設置於其下側之齒條18與往路R1及復路R2中分配之 小齒輪19相卡合，且各小齒輪19進行旋轉而沿往路以及 復路R2予以搬送。 於各搬送托盤17之左右兩侧（搬送方向上的前侧及後 側）’分別設置有作為被卡接部之凸部（7a。各凸部i h係 於搬送托盤17之搬送步驟中用於將該搬送托盤17鎖止於 盤載〇 38 (參照圖2)。又，於各搬送托盤17之上側配 f有托盤磁鐵21。第一處理室13、第二處理室14、及搬送 至15各自配置有與搬送托盤17之托盤磁鐵21產生磁性作 之保持裝置22❶搬送托盤17之托盤磁鐵21於該搬送托 盤^之搬送過程中藉由與各保持裝i 22《保持磁鐵產生 作用而於各搬送路徑之上方非接觸性地束縛該搬送托盤 17 〇 200940430 於本實施形態中’往路R1中的搬送托盤17之搬送方 向稱作X方向。又，將相對於水平面而垂直之方向設為Z 方向’將與X方向及Z方向正交且自往路ri朝向復路汉2 之方向稱作γ方向。200940430 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a substrate transfer device, a vacuum processing device, and a transfer method. [Prior Art] 真 各种 In the process of large-scale FPD (Flat Panel Display), various vacuum processing devices for performing film formation processing or heat treatment on a substrate are used. In the vacuum processing apparatus, the vacuum space corresponding to the size of the substrate is required, so that a large amount of time (four) of the substrate is used to form a vacuum space. Therefore, with respect to the vacuum processing apparatus, in order to reduce the frequency of formation of the vacuum space, there has been proposed a scheme in which a plurality of processing chambers are respectively constituted by vacuum spaces which are connected to each other. The vacuum processing apparatus described in Patent Document i includes a plurality of processing chambers that are connected in the row direction, a pair of transporting paths that pass through the processing chambers and extend in the row direction, and a transporting station (toward) The transfer tray of the upper transfer tray is transported to the other transport path (reroute). The vacuum processing device moves the transport tray to the road after moving the transport tray to the road, and moves the transport tray on the return road. Accordingly, the vacuum processing apparatus described in the patent document can perform different processing steps sequentially in a plurality of virtual spaces that can be connected. [Patent Document 1] Japanese Patent Laid-Open Fan [ΜI" No. [Invention] The rounds 4(4) to (d) and Figs. 5(a) to (4) schematically show the vacuum processing apparatus described in Patent Document ^, respectively. In the transfer chamber 50, the elevating mechanism 52 that elevates and lowers the transport tray 51, the holding mechanism 53 that non-contactably holds the transport tray 51 on the transport path, and the transport tray 51 in the forward path R1 and the return path are disposed. The sliding mechanism 54 that slides between R2 is shown in Fig. 4(a). First, the transport tray 51 supporting the substrate in an upright state is carried into the transport chamber 5 along the forward path R1. The transport chamber 5 is as follows. The lifting operation of the transport tray 51 is synchronized with the holding operation of the transport tray 51 to stabilize the substrate position in the transport step. That is, in FIG. 4(b), when the transport tray 51 is loaded, the lift mechanism 52 and the hold The mechanism 53 maintains the distance between the transfer tray 51 and the holding magnets 53 & the transfer tray 51 and the holding magnet 53a are temporarily raised, and the transfer tray 51 is detached from the forward path R1. When the transfer tray 51 is detached, as shown in Fig. 4 ( c) shown The slide mechanism 54 slides the tray stage 5 so that the hook 54a is disposed below the tab 5u provided on the transfer tray 51. In Fig. 4(d), when the hook 54a is disposed below the tab 51a The elevating mechanism 52 and the holding mechanism 53 temporarily lower the transport tray 51 and the holding magnets while maintaining the distance between the transport tray 51 and the holding magnets 53a. Then, the tabs 51a and the hooks 54a are engaged and transported. The tray 5 1 is suspended from the tray stage 54f. In Fig. 5 (a), when the transfer tray 51 is suspended from the tray stage 54f, the holding mechanism 53 sufficiently moves the holding magnet 53a away from the transfer tray n, thereby releasing the transfer tray 51. When the binding of the transport tray 5 is released, as shown in Fig. 5 (b), the slide mechanism 54 slides the disk tray 54f 200940430 to arrange the transport tray 51 above the returning ruler 2. In Fig. 5 (0), when the transport tray 51 is placed above the return path R2, the elevating mechanism 52 rises again, and the holding mechanism 53 lowers the holding magnet... again, whereby the transport tray 51 is again over the return path R2. Keeping on the lifting mechanism 5 2 ± When the transfer tray 51 is held again, as shown in Fig. 2 (d), the 'lifting mechanism 52 and the holding mechanism 53 maintain the distance between the transfer tray 51 and the holding magnet 53a', and the transfer tray 51 and the holding When the magnet 53a is raised, the engagement between the protruding piece 5U and the hook 5 is released. The transfer chamber 50 can be raised and lowered in synchronization with the lifting and lowering of the holding magnet 53a by the transfer tray 51, thereby improving the substrate during the lifting and lowering of the transfer tray 51. Further, the stability of the position of the substrate between the transport paths can be improved by the engagement of the tabs 51a with the hooks. However, in the transporting step of Patent Document 1, the hook 54a fixed to the tray stage 54f must be engaged with the tab 51a of the transport tray 51 every time the substrate is transported, and therefore the tray stage 54f must be lifted and lowered several times. . As a result, in the substrate transfer step, there are many times when the transfer tray is moved up and down a lot, and the amount of processing of the substrate processing is greatly impaired. Further, this problem is not limited to the transfer device of Patent Document 1, and the same problem exists in other conventional transfer devices that have to lift the tray of the transfer substrate a plurality of times. Further, in the "transporting device of Patent Document 1," the hook 54a is fixed to the slide mechanism 5 in a position to be engaged with the tab 51a (Fig. 4a). Therefore, when the transport tray 51 is transported to the transport chamber 50, the space in which the slide mechanism 54 is moved is required to prevent the transport tray 51 from coming into contact with the hook 54a, and there is a problem that the volume of the device is increased. In this case, after the transport tray 5 is carried in, it is necessary to move the hook 54a on the transport path in order to elevate and transport the tray 51. This causes a problem that the number of transport steps increases and the amount of processing is impaired. Further, since the elevating mechanism 52 that elevates and lowers the transport tray 51 and the slide mechanism 54 that slides the transport tray 51 are disposed on the left and right sides of the forward path R1, there is a problem that the volume of the device becomes large. The present invention provides a transport apparatus and a transport method for increasing the throughput of a substrate in a transport process without causing an increase in size of the apparatus, and a vacuum processing apparatus including the transport apparatus. Transfer device. The transport device includes a transport tray that transports the substrate between the first transport path and the second transport path while supporting the substrate in an upright state; the tray stage 'supports the transport tray; and the lift mechanism' causes the tray to carry The table is raised to disengage the transport tray from the transport path, the tray stage is lowered to mount the transport tray on each transport path, and a slide mechanism is configured to move the lift mechanism to the first and second transport paths The lifting mechanism includes a locking mechanism that interlocks with the rise of the tray stage to lock the transfer tray to the tray stage and interlock with the lower side of the tray stage to release the locked state of the transfer tray. Another aspect of the invention is a vacuum processing apparatus. The vacuum processing apparatus ' includes: a transfer tray that supports the substrate in an upright state; the first and second transfer paths are movable by the transfer tray; and the vacuum processing chamber is provided on the first and second transfer paths, and the vacuum processing chamber is provided The substrate supported by the transfer tray is processed under vacuum; and the transfer chamber is disposed on the first and second 200940430 transport paths and is coupled to the vacuum processing chamber for supporting the substrate by the transfer tray The substrate is transported between the first transport path and the second transport path; the transport chamber includes a tray carrier that supports the transport tray, and a lifting mechanism that raises the tray carrier to The transport tray is separated from the transport path, the tray stage is lowered to mount the transport tray on each transport path, and the slide mechanism is configured to move the lift mechanism between the first transport path and the second transport path; And interlocking with the rise of the tray stage to lock the transfer tray to the tray stage and interlocking with the drop of the tray stage to release the lock state of the transfer tray Locking mechanism. Further, the present invention is a transport method in which a transport tray for supporting a substrate in an upright position is moved from an i-th transport path to a second transport path. The method includes: arranging a tray stage on the ith transport path; raising the tray stage, and loading the $tray on the h transport path on the tray stage (4); (4) an operation of moving the stage from the repairing path to the second transport path; and an operation of loading the transport tray on the tray carrier on the second transport path; The operation of raising the disc carrier includes an operation of locking the disc to the tray stage by the locking cup-like mechanism interlocking with the rise of the tray stage; and causing the tray stage to descend When the lock mechanism that is interlocked with the lowering of the tray stage moves downward, the lock state of the transfer tray is released. [Embodiment] Hereinafter, a transport apparatus 200940430 according to an embodiment of the present invention will be described with reference to the drawings. Fig. 1 is a perspective view schematically showing a vacuum processing apparatus W including a conveying device 30. In the first processing, in the vacuum processing apparatus 1A, the disassembly chamber loading/loading chamber (hereinafter referred to as the "room 12"), the first processing chamber 3, the second processing chamber 14, and the transfer chamber 15 respectively pass through the gate valve. 16 and link. In the vacuum processing apparatus 10, a first transport path (hereinafter referred to simply as a forward path Ri) extending from the detachable chamber u toward the transfer chamber 15 and a second transport path extending from the transfer chamber 15 toward the detachable chamber 11 are provided (hereinafter Referred to as the return path R2) ° The forward path R1 and the complex path r2 in this embodiment are parallel to each other. In the forward path R1 and the return path R2, the plurality of transfer trays 17 are transported by the rack and pinion mechanism, respectively. Each of the transport trays 17 is preferably formed in a four-frame shape surrounding the outer edge of the substrate S. In this case, for example, the transport tray port is distributed by the rack 18 disposed on the lower side thereof and the forward path R1 and the reverse path R2. The pinion gears 19 are engaged, and the pinion gears 19 are rotated to be transported along the forward path and the return path R2. Each of the left and right sides (the front side and the rear side in the transport direction) of each of the transport trays 17 is provided with a convex portion (7a) as a contact portion, and each convex portion ih is used in the transport step of the transport tray 17 The transfer tray 17 is locked to the disk cassette 38 (see FIG. 2). Further, the tray magnet 21 is disposed on the upper side of each of the transfer trays 17. The first processing chamber 13, the second processing chamber 14, and the transport to 15 Each of the tray magnets 21, which are disposed with the tray magnets 21 of the transfer tray 17, and the trays 21 for transporting the trays 17 are transported by the holding magnets in the transfer trays. In the present embodiment, the transport direction of the transport tray 17 in the forward path R1 is referred to as the X direction. Further, the direction perpendicular to the horizontal plane is referred to as the Z direction. The direction orthogonal to the X direction and the Z direction and from the forward path ri toward the complex road 2 is referred to as the γ direction.
拆裝室11將自外部放入之處理前之基板3安裝於搬送 托盤17上，以豎立狀態將該基板8搬出至1[室又， 拆裝室11將安裝於搬送托盤17上的處理後之基板s自搬 送牦盤17上移除，並搬出至真空處理裝置1〇之外部。拆 裝室11係於大氣壓下進行上述基板S之拆裝。 LL至12使室内成為大氣壓，自拆裝室u將搬送托盤 Η沿往路R1搬入，隨後，藉由對室内進行減壓而將該搬送 ，盤17沿往路R1搬出至第一處理室13。又，ll室^對 室内進行減壓，自第一處理室13將搬送托盤17沿復路们 搬入，隨後，藉由將室内向大氣開放而將該搬送托盤丨7沿 復路R2搬出至拆裝室11。 第一處理室13自LL室12將搬送托盤17沿往路R1搬 、藉由保持裝置22之磁性作用而將該搬送托盤丨了束 缚於往路Ri 第一處理室13對安裝於搬送托盤Η上的 基板S實施成膜處理或加熱處理等各種處理之後，解除保 持裝置22之束缚，將該搬送托盤17沿往^搬出二 處理室14。 一 又，第—處理室13自第二處理室14將搬送托 復路R ? ito、 ，並藉由保持裝置22之磁性作用而將該搬送 17束_復路R2J1。第-處理室13對安裝於搬送托 200940430 盤17上的基板s實施成膜處理或加熱處理等各種處理之 後，解除保持裝置22之束缚，將該搬送托盤17沿復路r2 搬出至LLj_ 12。第一處理室13係、於減壓下進行上述搬送 托盤17之搬入、搬出。 第二處理室14自第一處理室13將搬送托盤17沿往路 R1搬入，並藉由保持裝置22之磁性作用而將該搬送托盤 P束缚於往路R1上。第二處理室14對安裝於搬送托盤 上的基板S實施成膜處理或加熱處理等各種處理之後，解 除保持裝置22之束缚，將該搬送托盤17沿往路R1搬出至 搬送室15。 又’第二處理室14自搬送室15將搬送托盤I?沿復路 R2搬入，並藉由保持裝置22之磁性作用而將該搬送托盤 17束缚於復路R2上。第二處理室14對安裝於搬送托盤17 上的基板S實施成膜處理或加熱處理等各種處理之後，解 除保持裝置22之束缚’將該搬送托盤17沿復路R2搬出至 第處理室13。第二處理室14係於減壓下進行上述搬送托 盤17之搬入、搬出。 於搬送室15中之X方向之兩側（搬送方向上的前侧及 後側）’裝載有作為搬送裝置之一對往復運動裝置3(^搬送 至15自第二處理室14將搬送托盤17沿往路ri搬入，並 藉由保持裝置22之磁性作用而將該搬送托盤17暫時束缚 於往路R1上》搬送室15 —面解除往路R1上的搬送托盤 17之磁性束缚，一面藉由使用往復運動裝置3〇之搬送處理 而將該搬送托盤17自往路ri搬送至復路r2上。搬送室 200940430 β將裝載於復路R2上的搬送托盤"沿復路R2搬出至第 一-處理室14。 搬送室15係於減壓下進行自往_朝向復路以之搬 送托盤17之搬送》又，搬送— 至15於將搬送托盤I?自往路 R1朝復路R2搬送之期間’藉由往復運動震置⑼之 能而將該搬送托盤17鎖止於托盤載台38 (參照圖2)。 圖2係不意性地表示彡*，苗 衣不往復運動裝置30 (僅示出一個） Ο ❹ 〜⑷分別係表示使用往復運動裝置3。 2送步驟之步驟圖。於圖2中，往復運動裝置30具備滑 動機構31及升降機構3;^ M1於滑動機構31中具備滑動馬達⑷及連結於滑動馬達 =之驅動轴之傳遞部33β於傳遞部33之上側，設有沿達γ ^伸之導軌33a，於導軌…上安裝有升降 =33利用栓槽轴等動力傳遞抽來接受滑動馬達M1j 力。將滑動馬達M1之驅動力轉換成升降機構％之移動 ’月動機構3 1當滑動馬玉金Μ1 τ # 士 之藤“. 馬達M1正轉時’藉由滑動馬達Ml 之驅動力而使升降機構32朝Y方向移動（ 鏈線位置朝實線位署孩& 圖中之一點 罝朝實線位置移動）。又，滑動機構3 M1反轉時，藉由滑動馬達 *滑動馬達 朝反γ方向移動（自圓2中而使升降機構32 動）。 ^實線位置朝二點鏈線位置移 於本實施形態中，蔣白γ 士 A & 6 往路幻之上yF Μ 方向觀察，托盤裁台38位於 之上方或下方時之升降機構32之位置稱作往路位 11 200940430 置又將自χ方向觀察，托盤載台38位於復路R2之上 方或下方時之升降機構32之位置稱作復路位置。滑動機構 3 1使升降機構32於往路位置與復路位置之間移動》 於升降機構32中具備升降機馬達Μ2以及連結於升降 馬達M2之驅動軸的傳遞部35。於傳遞部35之γ方向上的 端部側設有沿2方向延伸之支持臂36，於該支持臂36之Υ 方向上的端部側設有沿ζ方向延伸之導軌。於導軌3化 上安裝有可沿Z方向往復移動之托盤載台38。傳遞部35利 用栓槽轴等動力傳遞軸來接受升降馬達⑽之驅動力，將升❹ 降馬達M2之驅動力轉換成托38之移動力。 升降機構32當升降馬達M2正轉時，藉由升降馬達M2 之驅動力而使牦盤載台38朝2方向移動（自圖”之實線 位置朝二點鏈線位置移動）。又，升降機構Μ當升降馬達 M2反轉時，藉由升降馬達M2之驅動力而使托盤載台38 朝反Z方向移動（自圖2中之二點鏈線位置朝實線位置移 ❹ 於本實施形射，將於2方向上，托盤載台38位於往 路R1或復路R2更下方時之該托盤載台以位置稱作待機位 置。又，將於Z方向上，㈣載台38位於往路旧或復路 R2更上方時之該托盤載台38之位晋磁^ <仅罝稱作脫離位置（搬送托 盤17脫離搬送路徑Rl、R2之位罟、α ^ y 之位置）。升降機構32使托盤 載台38於待機位置與脫離位置之間移動。 於升降機構32上的支持臂36之前 <則端（上端附近），以 沿X方向延伸之旋動軸36a為中心 而紅動自如地支持有呈 12 200940430 帶狀之掛鉤37之基端。於掛釣37之前端’形成有可與搬 送托盤17之凸冑17a卡接之缺σ 37ae掛鉤37在搬送托盤 17位於托盤載台38上方之狀態下，於該缺口 37a與凸部 相隔離之位置、與該缺口 37a與凸部17a相卡接之位置（圖 2中之二點鍵線位置）之間旋動。在缺口 ％與凸部^相 卡接之狀態下，搬送托盤17被鎖止於托盤載台38。又，在 缺口 37&與凸部17a相隔離之狀態下，搬送托盤17之鎖止 狀態被解除。 於本實施形態中，將缺口 37a與凸部17a相卡接之掛鉤 37之位置稱作鎖止位置。又，將缺口 ^與凸部⑺相隔 離之掛鉤37之位置即拼鉤37偏離搬送托盤17之移動軌跡 之位置稱作解除位置。再者，圖2中之掛夠37之實線位置 表不鎖止位置與解除位置之間的位置。 ❹ 於掛鉤37之前端’以沿X方向延伸之軸^為中心而 旋動自如地支持有沿反Z方向延伸之棒狀之連桿構件39。 ，構件39之下端以沿χ方向延伸之轴c2為中心而旋動 :如地支料托盤載台38之上端。連桿構件39當托盤載 口 38上升時，將托盤載台38之上動傳遞至掛鉤η，使掛 鉤37朝右旋動。又，連桿構件㈣托㈣台％下降時， 將托盤载台38之下動傳遞至掛釣37，使掛釣”朝左旋動。 右坪細敍述，當在搬送托盤17位於托盤載台％之上 :狀態下’托盤載台38自待機位置向上方朝脫離位置移 動時，掛釣37經由連桿構件39與托盤載台 而自解除位置朝銼丨μ办要必▲ 朝鎖位置移動。即，當托盤載台38上升時， 13 200940430 盤17被鎖止於托盤載台％。相反地，當在搬送托盤 .於托盤载台38上之狀態下，托盤載台％自脫離位 向下方朝待機位置移動時，辨釣37經由連桿構件Μ與 托盤載台38之下降連動而自鎖止位置朝解除位置移動。、 即’當托盤載台38下降時’搬送托盤17之鎖止狀態被解 除。 於本實施形態中，藉由該等摒鉤37及連桿構件39而 構成鎖止機構。The detachable chamber 11 is attached to the transfer tray 17 by the substrate 3 before being processed from the outside, and the substrate 8 is carried out to the vacant state in the erected state, and the detachment chamber 11 is attached to the transfer tray 17 after the process. The substrate s is removed from the transfer tray 17 and carried out to the outside of the vacuum processing apparatus 1 . The detachable chamber 11 is detachably attached to the substrate S under atmospheric pressure. LL to 12 causes the room to be at atmospheric pressure, and the transfer tray 搬 is carried in along the forward path R1 from the detaching and detaching chamber u, and then the transfer is carried out by decompressing the room, and the tray 17 is carried out to the first processing chamber 13 along the forward path R1. Further, the room 1 is depressurized, and the transfer tray 17 is carried in the first processing chamber 13 along the return path, and then the transfer tray 7 is carried out along the return path R2 to the disassembly room by opening the room to the atmosphere. 11. The first processing chamber 13 carries the transport tray 17 from the LL chamber 12 along the forward path R1, and the transfer tray is bound by the magnetic action of the holding device 22 to the forward path Ri. The first processing chamber 13 is attached to the transport tray. After the substrate S is subjected to various processes such as a film forming process or a heat treatment, the holding device 22 is released from the restraint, and the transfer tray 17 is carried out to the second processing chamber 14 . Further, the first processing chamber 13 carries the transfer path R? ito from the second processing chamber 14, and carries the bundle 17 to the return path R2J1 by the magnetic action of the holding device 22. The first processing chamber 13 performs various processes such as a film forming process or a heat treatment on the substrate s attached to the tray 17 of the transfer tray 200940430, and then releases the restraint of the holding device 22, and carries the transfer tray 17 to the LLj_12 along the return path r2. The first processing chamber 13 carries out the loading and unloading of the above-described transfer tray 17 under reduced pressure. The second processing chamber 14 carries the transport tray 17 from the first processing chamber 13 along the forward path R1, and binds the transport tray P to the forward path R1 by the magnetic action of the holding device 22. After the second processing chamber 14 performs various processes such as a film forming process or a heat treatment on the substrate S attached to the transfer tray, the holding device 22 is released, and the transfer tray 17 is carried out to the transfer chamber 15 along the forward path R1. Further, the second processing chamber 14 carries the transport tray I from the transfer chamber 15 along the return path R2, and the transfer tray 17 is bound to the return path R2 by the magnetic action of the holding device 22. The second processing chamber 14 performs various processes such as a film forming process or a heat treatment on the substrate S attached to the transfer tray 17, and then releases the restraint of the holding device 22. The transfer tray 17 is carried out to the first processing chamber 13 along the return path R2. The second processing chamber 14 carries out the loading and unloading of the transport tray 17 under reduced pressure. In the transfer chamber 15 on both sides (the front side and the rear side in the transport direction) of the transport chamber 15 (the front side and the rear side in the transport direction) are loaded with the reciprocating device 3 as one of the transport devices (the transport to the transport chamber 17 from the second processing chamber 14 is carried out) Carrying in the forward path ri, and by the magnetic action of the holding device 22, the transfer tray 17 is temporarily restrained on the forward path R1. The transfer chamber 15 is released from the magnetic binding of the transfer tray 17 on the forward path R1, and the reciprocating motion is used. The transport tray 17 transports the transport tray 17 from the forward path ri to the return path r2. The transport chamber 200940430 β carries the transport tray mounted on the return path R2 to the first-processing chamber 14 along the return path R2. 15 is carried out under reduced pressure, and the transfer tray 17 is transported to the return path. Further, the transfer to the transfer tray I is carried out by the reciprocating motion during the transfer of the transport tray I to the return path R2 (9) The transfer tray 17 can be locked to the tray stage 38 (see Fig. 2). Fig. 2 is an unintentional representation of 彡*, and the seedlings are not reciprocating means 30 (only one shown) Ο 〜 ~ (4) are respectively indicated Use the reciprocating device 3. 2 step In Fig. 2, the reciprocating device 30 includes a sliding mechanism 31 and a lifting mechanism 3; M1 includes a sliding motor (4) in the sliding mechanism 31 and a transmission portion 33β coupled to the driving shaft of the sliding motor = in the transmission portion On the upper side of the 33, there is a guide rail 33a extending along the γ^, and the lift/33 is attached to the guide rail... The force of the slide motor M1j is received by the power transmission pumping such as the bolt shaft. The driving force of the slide motor M1 is converted into the lift mechanism%. The movement 'moon movement mechanism 3 1 when sliding Ma Yujin Μ 1 τ #士藤藤". When the motor M1 is rotating forward, the lifting mechanism 32 is moved in the Y direction by the driving force of the sliding motor M1 (the chain position is toward the solid line) One of the points in the figure is moved toward the solid line position. When the sliding mechanism 3 M1 is reversed, the sliding motor* slides the motor in the anti-γ direction (the lifting mechanism 32 is moved from the circle 2) ^The position of the solid line moves toward the two-point chain line position in the present embodiment, and the white lifting mechanism 32 is located above the yF Μ direction of the road illusion, and the lifting mechanism 32 is located above or below the tray cutting table 38. The location is called the way to the road 11 200940430 The position of the elevating mechanism 32 when the tray stage 38 is located above or below the re-route R2 is referred to as a re-route position, and the sliding mechanism 31 moves the elevating mechanism 32 between the forward path and the re-routed position. The elevator motor Μ2 and the transmission portion 35 connected to the drive shaft of the hoist motor M2 are provided. The support arm 36 extending in the two directions is provided on the end side of the transmission portion 35 in the γ direction, in the direction of the support arm 36. The upper end side is provided with a guide rail extending in the z-direction, and a pallet stage 38 reciprocally movable in the Z direction is attached to the guide rail 3. The transmission unit 35 receives the driving force of the hoisting motor (10) by using a power transmission shaft such as a spigot shaft, and converts the driving force of the hoisting and lowering motor M2 into the moving force of the yoke 38. When the elevation motor M2 rotates forward, the lifting mechanism 32 moves the pallet stage 38 in two directions (moving from the solid line position of the figure to the two-point chain line position) by the driving force of the elevation motor M2. When the lift motor M2 is reversed, the tray stage 38 is moved in the reverse Z direction by the driving force of the lift motor M2 (the position of the two-point chain line in FIG. 2 is moved toward the solid line position). In the direction of 2, when the pallet stage 38 is located below the road R1 or the reverse road R2, the pallet stage is referred to as the standby position. In addition, in the Z direction, the (4) stage 38 is located in the old road or the road. When the R2 is further above, the position of the tray stage 38 is changed to a position (only the position of the transfer tray 17 is out of the transport path R1, R2, and the position of α ^ y). The elevating mechanism 32 causes the tray to carry The table 38 is moved between the standby position and the disengagement position. Before the support arm 36 on the elevating mechanism 32, the end (near the upper end) is supported by the rotation axis 36a extending in the X direction. 12 200940430 The base end of the strap-shaped hook 37. At the front end of the hanging fishing 37' The yoke 37ae hook 37 which is engageable with the boss 17a of the transport tray 17 is placed at a position above the tray stage 38 in a state where the transport tray 17 is positioned above the tray stage 38, and the notch 37a is separated from the convex portion 37a. The position where the convex portion 17a is engaged (the position of the two-point key line in Fig. 2) is rotated. When the notch % is engaged with the convex portion, the transfer tray 17 is locked to the tray stage 38. Further, in a state where the notch 37 & is separated from the convex portion 17a, the locked state of the transport tray 17 is released. In the present embodiment, the position of the hook 37 that engages the notch 37a and the convex portion 17a is called a lock. Further, the position of the hook 37 which separates the notch ^ from the convex portion (7), that is, the position at which the hook 37 is displaced from the movement trajectory of the transport tray 17 is referred to as a release position. Further, the solid line of the suffix 37 in Fig. 2 The position table is not in the position between the locked position and the released position. ❹ The front end of the hook 37 is pivotally supported by a rod member extending in the opposite Z direction with the axis extending in the X direction as a center 39. The lower end of the member 39 is pivoted about the axis c2 extending in the χ direction. : such as the upper end of the ground support tray 38. When the tray load 38 rises, the link member 39 transmits the upper movement of the tray stage 38 to the hook η to rotate the hook 37 to the right. Further, the link member (4) When the (4) table is lowered, the tray stage 38 is moved downward to the hanging fishing 37, so that the hanging fishing "swivels to the left. The right ping is described in detail when the conveying tray 17 is above the tray stage %:" When the tray stage 38 is moved upward from the standby position toward the detachment position, the hang-up fishing 37 moves from the release position to the yoke via the link member 39 and the tray stage ▲ toward the lock position. That is, when the tray stage is loaded When 38 is raised, 13 200940430 The disk 17 is locked to the tray stage %. On the other hand, when the tray stage % is moved to the standby position from the disengagement position in the state where the tray is placed on the tray stage 38, the fishing line 37 is interlocked with the lower stage of the tray stage 38 via the link member 而. The self-locking position moves toward the release position. That is, when the tray stage 38 is lowered, the lock state of the transport tray 17 is released. In the present embodiment, the hook mechanism 37 and the link member 39 constitute a lock mechanism.
圖3(&)〜（d)係、表示使用往復運動裝置3G之基板S 之搬送步驟之圖。首# 耳无於搬送至15之内部，如圖3(a) 所示’托盤載台38配置於技故 亂1於任路Ri之位置（以下簡稱作初 。置）上又掛鉤37配置於解除位置上而偏離搬送托 盤丨7之移動軌跡》 當由該狀態開始，自第二處理室14將搬送托盤17朝 搬送室15搬入時，往復運動裝置3〇如圖3 (b)所示般驅 動升降機構32,使托盤載台38自初始位置向上方朝脫離位 置（朝箭頭方向）移動。藉此，搬送托盤17被裝載於托盤 載台38上並脫離往路ri。 此時，保持裝置22使保持磁鐵mg相應地上升托盤載 台38所上升之量，繼續維持保持磁鐵MG與托盤磁鐵21 之間之距離。藉此，保持裝置22繼續將搬送托盤17磁性 束縛於往路R1之上方。並且，升降機構32與托盤載台38 之上升連動而使掛鉤37自解除位置朝鎖止位置移動。即， 往復運動裝置30 —面使搬送托盤17脫離往路R1__面將該 200940430 搬送托盤17鎖止於托盤載台38。 當搬送托盤17被鎖止於托盤載 ---38時，保持裝置223 (&) to (d) show a transfer step of the substrate S using the reciprocating device 3G. The first # ear is not transported to the inside of the 15, as shown in Fig. 3 (a), the tray carrier 38 is placed in the position of the road 1 (hereinafter referred to as the initial position) When the transfer tray 17 is moved from the second processing chamber 14 to the transfer chamber 15 when the position is released, the reciprocating device 3 is as shown in FIG. 3(b). The elevating mechanism 32 is driven to move the tray stage 38 upward from the initial position toward the disengagement position (in the direction of the arrow). Thereby, the transport tray 17 is mounted on the tray stage 38 and is separated from the path ri. At this time, the holding device 22 raises the amount by which the holding magnet mg rises by the tray stage 38, and continues to maintain the distance between the holding magnet MG and the tray magnet 21. Thereby, the holding device 22 continues to magnetically bind the transfer tray 17 above the forward path R1. Further, the elevating mechanism 32 moves in conjunction with the rise of the tray stage 38 to move the hook 37 from the release position toward the lock position. That is, the reciprocating device 30 closes the transport tray 17 to the forward path R1__, and locks the 200940430 transport tray 17 to the tray stage 38. When the transport tray 17 is locked to the tray load --38, the holding device 22
如圖3(c)所示般使保持磁鐵M 退步上升，使保持磁 ❹As shown in Fig. 3(c), the holding magnet M is stepped up to maintain the magnetic enthalpy.
鐵腦與托盤磁鐵21之間隔開充分之距離。藉此 置22解除對搬送托盤17之磁性束缚。當搬送_ η 缚被解除時，往復運動裝置3G驅動滑動機構Μ使升 構32自往路位置朝復路位置（朝箭頭方向）移動。藉此， 將托盤載台38配置於復路R2之正上方。 在此期間’由於搬送托盤17 一方面不受保持裝置h 之磁性束缚，但另一方面受到往復運動裝置3〇之鎖止機構 之機械性束缚，故而維持相對於托盤載台38之相對位置。 其結果，搬送托盤17自往路R1之正上方朝復路尺2之正i 方被搬送，而不會導致自托盤載台38發生位置偏移。 當升降機構32到達復路位置時，往復運動裝置3〇如 圖3(d)所示般驅動升降機構32而使托盤載台38自脫離 位置向下方朝初始位置（朝箭頭方向）移動。藉此將搬 送托盤17自托盤載台38裝載於復路r2上。 此時，保持裝置22藉由使保持磁鐵MG下降而縮短保 持磁鐵MG與托盤磁鐵21之間之距離，將搬送牦盤17磁 性束缚於復路R2之上方。又，升降機構32與托盤載台38 之下降連動而使掛鉤37自鎖止位置朝解除位置移動。即， 往復運動裝置30 —面使搬送托盤17裝載於復路R2上一面 解除該搬送托盤17之鎖止狀態。 當搬送托盤17被裝載於復路R2上時，往復運動裝置 15 200940430 30驅動滑動機構31而使升降機構32自復路位置朝初始位 置移動。藉此，托盤載台38自復路R2上被搬送至往路尺丨 上。以後同樣’搬送室15每當自第二處理室丨4搬入搬送 托盤17時，驅動保持裝置22與往復運動裝置3〇而將往路 R1上之搬送托盤17朝復路R2搬送。 上述實施形態之搬送裝置30 (真空處理裝置1〇)具有 以下優點。 (1)往復運動裝置30具有藉由托盤載台38之下降及 上升而選擇性地進行搬送托盤17相對於該搬送路徑Rl、 ^ R2之裝載及脫離之升降機構32;以及使升降機構32於搬 送路徑Rl、R2間移動之滑動機構31。並且，升降機構32 具有鎖止機構（於一實施例中為掛鉤37及連桿構件39)， 其與托盤載台38之上升連動而將搬送托盤17鎖止於托盤 載台38,並與托盤載台38之下降連動而解除搬送托盤17 之鎖止狀態。 因此，往復運動裝置30僅須使托盤載台38上升一次， 便可使搬送托盤17脫離往路尺丨上且將搬送托盤17鎖止於 ◎ 托盤載台38。又，往復運動裝置3〇僅須使托盤載台“下 降一次便可解除搬送托盤17之鎖止狀態且將搬送托盤Η 裝載於復路R2上。換言之’將搬送托盤17鎖止於托盤載 台38所需之搬送托盤17之移動僅為丨次之上升，解除搬 送托盤17與托盤載自38<鎖止所需之搬送托# 17之移動 僅為1人之下降。其結果，往復運動裝置30將搬送處理中 之把盤載台38之升降次數，進而將搬送托盤17之升降次 16 200940430 數抑制為最小限度，故而可使處理量提高。除此以外，由 於鎖止機構（37、39)係與托盤載台38之上升及下降連動 而進行驅動，故而與另行設置鎖止機構之驅動源之情形相 比，可實現鎖止機構之省空間化，進而可實現裝置3〇 型化》 (2)掛鉤37係於鎖止位置與解除位置之間旋動，上 述鎖止位置係藉由與搬送托盤17之凸部17a卡接而鎖止搬 送托盤17之位置，上述解除位置係藉由脫離凸部na而解 © 除搬送托盤17之鎖止狀態並偏離搬送托盤17之移動軌跡 之位置。又，連桿構件39連結於托盤載台38與掛鉤37之 間，將托盤載台38之上升及下降傳遞至掛鉤37 ,使掛鉤 37朝鎖止位置及解除位置移動。 因此，於往復運動裝置30中，托盤載台38之上下移 動經由連桿構件39而轉換成掛鉤37之旋動。其結果，往 復運動裝置30僅須使搬送托盤17脫離往路…便可鎖止搬 送托盤17，僅須將搬送托盤17裝載於復路R2上便可解除 搬送托# 17之鎖止狀態、。因此，該往復運動裝i 3〇將搬 送處理中之托盤載台38之料次數㈣為最小限度，故而 使處理量提高。又’當掛釣37移動至解除位置而使與搬送 托盤丨7之鎖止解除時，掛鉤37脫離搬送托盤^之移動軌 跡。藉此’可將托盤載自38預先配置於往路以上之待機 位置。其原因在於’當托盤載台38位於待機位置時，搬送 托盤丨7之移動不受托盤載台38及掛釣37之妨礙。因此， 可削減用於使托盤載台38自往路^退開之升降機構32之 17 200940430 移動空間°進而’可實現搬送室15或真空處理裝置1G之 小型化。 (3) 鎖止機構（37'39)將托盤載台38之上下移動 轉換成掛鉤37之旋動，故而與將托盤載台38之上下移動 僅利用作掛鉤37之上下移動之情形相比，可擴大掛鉤37 (缺口 37a)之位移範圍。因此，往復運動裝置3〇可擴大 與搬送㈣17之尺寸或形狀，進而與基板s之尺寸或形狀 相關之適用範圍。 (4) 掛鉤37未固定於滑動機構31 ’而是連動於托盤❹ 載台38之上下移動而旋動。因此，於基板處理冑μ及搬 送室15間之搬送托盤17之搬送時，為避免掛鉤37與搬送 托盤17之接觸，不使滑動機構31移動即可。因此，可將 滑動機構31移動之空間縮小化，故而可實現裝置之小型化。 (5) 可將搬送托盤17直接搬入至在搬送路徑（往路 R1)之位置上待機的托盤載台38上。因此，無須於基板s 之搬入後使托盤載台38移動至往路R1上。因此，可縮短 搬送處理中之作業時間而提高處理量。 〇 (6) 由於將升降機構32設置於滑動機構31之上部， 因此可縮小搬送室15内之空間，進而可實現裝置之小型化。 (7) 真空處理裝置1〇將往復運動裝置3〇裝載於搬送 室15中，故而可將搬送處理中之托盤載台38 (搬送托盤 17 )之升降次數抑制為最小限度’進而可在與基板s相關 之一連串之處理步驟中提高處理量。 再者，上述實施形態亦可利用以下之態樣來實施。 18 200940430 •掛鉤37亦可為接受托盤裁台38之上 移動之構成。即，掛鉤37亦可為連動於托盤載台38之上 搬送托盤17之鎖止位置與解除搬送托盤17 之鎖止狀態之解除位置之間（例如沿著支持臂36而上下） 移動之構成。於此情形，較佳為，在使掛釣37向下方移動 之同時或者向下方移動之後，使該掛鉤37 之移動執跡退開。 •對於被卡接部，亦可取代凸部17a而設為例如搬送托 盤17所具有之凹部。即，本發明所屬技術領域中具有通常 知識者可採用任意構成之被卡接部，該被卡接部藉由與掛 鉤37相卡接而將搬送托盤17鎖止於托盤載台38，並藉由 自掛鉤37分離而解除搬送托盤17之鎖止狀態。 .於上述實施形態中，藉由掛鉤37之缺口 37a與搬送 托盤17之凸部17a相卡接而將搬送托盤17鎖止於托盤載台 38。並不限定於此’鎖止機構亦可為磁鐵機構。作為一例， 亦可將缺口 37a與凸部17&分別變更為磁鐵。於此情形，藉 ® 由設於掛鉤37上的N極與設於搬送托盤17上的s極相靠 近而將搬送托盤17鎖止於托盤載台38。即，本發明所屬技 術領域中具有通常知識者可採用各種構成之鎖止機構，該 鎖止機構與托盤載台38之上升連動而將搬送托盤n鎖止 於托盤載台38,並與托盤載台38之下降連動而解除搬送托 盤丨7之鎖止狀態。 •鎖止機構亦可僅由掛鉤37構成（即，省略連桿構件 39亦可）。於此情形，於托盤載台38上升前使掛鉤37預先 200940430 位於解除位置（偏離搬送托盤n <移動執跡之位置），於 托盤載台38上升後使掛釣37移動至鎖止位置即可。' •於上述實施形態中，搬送路徑係由往路ri及復路 1^構成’1往路R1與復路R2係相互平行地設置。並不限 定於此，例如，搬送路徑亦可為3條 巧j條以上，各搬送路徑亦 可為相交叉之構成。 •上述實施形態中之搬送路徑係使用齒條小齒輪機構 但搬送路徑亦可為輥搬送式、輸送機搬送式或者且有車輪 之搬送托盤於固定在真空處理室底面之軌道上行敌之軌道 搬送式機構，且並不僅限於該等搬送方法。The iron brain is separated from the tray magnet 21 by a sufficient distance. Thereby, the magnetic binding to the transport tray 17 is released. When the transport_η linkage is released, the reciprocating device 3G drives the slide mechanism to move the lift 32 from the forward position to the return position (in the direction of the arrow). Thereby, the tray stage 38 is disposed directly above the return path R2. During this period, the transport tray 17 is not bound by the magnetic force of the holding device h, but is mechanically restrained by the lock mechanism of the reciprocating device 3, so that the relative position with respect to the tray stage 38 is maintained. As a result, the transport tray 17 is transported toward the positive side of the returning ruler 2 directly above the forward path R1 without causing a positional shift from the pallet stage 38. When the elevating mechanism 32 reaches the re-route position, the reciprocating device 3 drives the elevating mechanism 32 as shown in Fig. 3(d) to move the tray stage 38 downward from the disengaged position toward the initial position (in the direction of the arrow). Thereby, the transport tray 17 is loaded from the pallet stage 38 on the return path r2. At this time, the holding device 22 shortens the distance between the holding magnet MG and the tray magnet 21 by lowering the holding magnet MG, and magnetically binds the conveying tray 17 above the return path R2. Further, the elevating mechanism 32 moves in conjunction with the lowering of the tray stage 38 to move the hook 37 from the lock position to the release position. In other words, the reciprocating device 30 causes the transport tray 17 to be placed on the return path R2 to release the locked state of the transport tray 17. When the transport tray 17 is loaded on the return path R2, the reciprocating device 15 200940430 30 drives the slide mechanism 31 to move the lift mechanism 32 from the return path toward the initial position. Thereby, the pallet stage 38 is transported from the return path R2 to the path ruler. When the transport tray 15 is loaded into the transport tray 17 from the second processing chamber 4, the transport device 22 and the reciprocating device 3 are driven to transport the transport tray 17 on the forward path R1 to the return path R2. The conveying device 30 (vacuum processing device 1) of the above embodiment has the following advantages. (1) The reciprocating device 30 has an elevating mechanism 32 that selectively loads and disengages the transport tray 17 with respect to the transport paths R1, R2 by the descending and rising of the tray stage 38; and causes the elevating mechanism 32 to The sliding mechanism 31 that moves between the transport paths R1 and R2. Further, the lifting mechanism 32 has a locking mechanism (in one embodiment, a hook 37 and a link member 39) that interlocks with the rise of the tray stage 38 to lock the transfer tray 17 to the tray stage 38 and to the tray The lowering of the stage 38 is interlocked to release the locked state of the transport tray 17. Therefore, the reciprocating device 30 only needs to raise the tray stage 38 once, and the transfer tray 17 can be detached from the path ruler and the transfer tray 17 can be locked to the ◎ tray stage 38. Further, the reciprocating device 3 only needs to "slow down the tray stage once to release the lock state of the transfer tray 17 and load the transfer tray 于 on the return path R2. In other words, the transfer tray 17 is locked to the tray stage 38. The movement of the required transport tray 17 is only a gradual increase, and the movement of the transport tray 17 and the transport tray #17 required to lock the tray is only one person. As a result, the reciprocating device 30 is lowered. The number of times of lifting and lowering the disk tray 38 in the transport processing is further minimized by the number of lifting and lowering times 16 200940430 of the transport tray 17, so that the amount of processing can be increased. In addition, the locking mechanism (37, 39) is used. The drive is driven in conjunction with the rise and fall of the pallet stage 38. Therefore, compared with the case where the drive source of the lock mechanism is separately provided, the space saving of the lock mechanism can be realized, and the device 3 can be realized. 2) The hook 37 is rotated between the lock position and the release position, and the lock position is locked by the convex portion 17a of the transport tray 17 to lock the position of the transport tray 17, and the release position is released. Protrusion na Solution © In addition to the locked state of the transport tray 17 and offset from the position of the movement path of the transport tray 17. Further, the link member 39 is coupled between the tray stage 38 and the hook 37 to transfer the rise and fall of the tray stage 38 to The hook 37 moves the hook 37 toward the lock position and the release position. Therefore, in the reciprocating device 30, the upper and lower movements of the tray stage 38 are converted into the rotation of the hook 37 via the link member 39. As a result, the reciprocating motion The device 30 only needs to disengage the transport tray 17 from the forward path... The transport tray 17 can be locked, and only the transport tray 17 must be loaded on the return path R2 to release the lock state of the transport tray #17. Therefore, the reciprocating device is installed. 3. The number of times (4) of the pallet stage 38 in the transport process is minimized, so that the amount of processing is increased. Further, when the hook 37 is moved to the release position and the lock of the transfer tray 7 is released, the hook 37 is The movement trajectory of the transport tray is removed. Thus, the tray can be placed in advance at a standby position above the road. The reason is that when the tray stage 38 is in the standby position, the movement of the transport tray 丨7 is not affected. The tray stage 38 and the hanging fishing 37 are obstructed. Therefore, the lifting mechanism 32 for retracting the tray stage 38 from the forward direction can be reduced. 200940430 Moving space ° Further, the transfer chamber 15 or the vacuum processing apparatus 1G can be realized. (3) The locking mechanism (37'39) converts the upper and lower movements of the pallet stage 38 into the rotation of the hook 37, so that the upper and lower movements of the tray stage 38 are only used as the upper and lower movements of the hook 37. In contrast, the displacement range of the hook 37 (notch 37a) can be enlarged. Therefore, the reciprocating device 3 can expand the size and shape of the transport (four) 17, and thus the range of application of the size or shape of the substrate s. (4) The hook 37 is not fixed to the slide mechanism 31' but moves in the lower direction of the tray 载 table 38 to be rotated. Therefore, in the conveyance of the transfer tray 17 between the substrate processing 及 and the transfer chamber 15, in order to avoid contact between the hook 37 and the transfer tray 17, the slide mechanism 31 may not be moved. Therefore, the space in which the slide mechanism 31 is moved can be reduced, so that the size of the apparatus can be reduced. (5) The transport tray 17 can be directly carried into the pallet stage 38 that is waiting at the position of the transport path (the path R1). Therefore, it is not necessary to move the tray stage 38 to the forward path R1 after the substrate s is carried in. Therefore, the work time in the transfer process can be shortened and the throughput can be increased. 〇 (6) Since the elevating mechanism 32 is provided on the upper portion of the slide mechanism 31, the space in the transfer chamber 15 can be reduced, and the size of the device can be reduced. (7) The vacuum processing apparatus 1 〇 loads the reciprocating device 3〇 in the transfer chamber 15, so that the number of times of lifting and lowering of the tray stage 38 (transport tray 17) during the transfer process can be minimized. One of the series of processing steps increases the amount of processing. Furthermore, the above embodiment can also be implemented by the following aspects. 18 200940430 • The hook 37 can also be configured to accept movement over the tray table 38. In other words, the hook 37 may be configured to move between the lock position of the transport tray 17 on the tray stage 38 and the release position of the lock state of the release tray 17 (for example, up and down along the support arm 36). In this case, it is preferable that the movement of the hook 37 is retracted while moving the hanging fishing 37 downward or downward. The recessed portion may be replaced by, for example, the transport tray 17 instead of the convex portion 17a. That is, those having ordinary knowledge in the technical field to which the present invention pertains may employ a clipped portion of any configuration, and the clipped portion locks the transport tray 17 to the tray stage 38 by being engaged with the hook 37, and borrows The lock state of the transport tray 17 is released by being separated from the hook 37. In the above embodiment, the transport tray 17 is locked to the tray stage 38 by the notch 37a of the hook 37 being engaged with the convex portion 17a of the transport tray 17. It is not limited to this. The locking mechanism may also be a magnet mechanism. As an example, the notch 37a and the convex portion 17& can be changed to magnets, respectively. In this case, the transfer tray 17 is locked to the tray stage 38 by the N pole provided on the hook 37 and the s pole provided on the transfer tray 17. That is, those having ordinary knowledge in the technical field to which the present invention pertains can employ various types of locking mechanisms that interlock with the rise of the tray stage 38 to lock the transport tray n to the tray stage 38 and The lowering of the table 38 is interlocked to release the locked state of the transport tray 丨7. The locking mechanism may also be constituted by only the hooks 37 (i.e., the link member 39 may be omitted). In this case, before the tray stage 38 is raised, the hook 37 is placed in the release position in advance (deviated from the transport tray n < the position where the movement is performed), and after the tray stage 38 is raised, the hook 37 is moved to the lock position. can. In the above embodiment, the transport path is formed by the forward path ri and the return path 1', and the forward path R1 and the return path R2 are arranged in parallel with each other. It is not limited thereto. For example, the transport path may be three or more, and each transport path may be a crossover structure. In the above-described embodiment, the rack path is a rack-and-pinion mechanism, but the transport path may be a roller transport type, a conveyor transport type, or a transport tray for wheels, which is transported to an orbit on the bottom of the vacuum processing chamber. The mechanism is not limited to these transfer methods.
q述實w t之托㈣台38之初始位置及脫離位 置、托盤載台38裝載搬送托盤17之裝載位置、及搬送托 盤17之卡接位置之高度可在自搬入搬出搬送托盤17之真 空處理室10之最下邊至最上邊之間任意變更。該等位置只 要是搬送托盤17可藉由往復運動裝置3〇之搬送處理而自 一個搬送路徑搬送至其他搬送路徑之位置即可。但托盤載 台38之初始位置較理想的是設定成，托盤載台38之上面 (支持搬送托盤17之下面之面）低於搬送路徑Ri、R2之 上面。如此，於將搬送托盤17自第二處理室14朝搬送室 15搬入時，托盤載台38亦不會妨礙搬送托盤丨7之移動。 因此，可使自往路R1至復路R2之托盤載台38之移動距離 為最小。然而，該初始位置並不限制本發明。其原因在於， 縱然產生須使應自搬送托盤17之移動軌跡退開之托盤載台 38向下方移動之必要，但使搬送托盤17上下移動之次數亦 20 200940430 不會增加。 •於上述實施形態中，2個搬送路徑係由往路R1及復 路R2構成。並不限定於此，2個搬送路徑亦可各自用於搬 送托盤17之往路及復路雙方。於此情形，例如亦可為以下 構成，即：當搬送托盤17自一個搬送路徑移載至另一搬送 路徑時，往復運動裝置30使托盤載台38於該另一搬送路 徑上待機，將位於該另一搬送路徑上的搬送托盤17再次移 動至該一個搬送路徑上。 •於上述實施形態中，多個搬送路徑係由一個往路以 及一個復路R2構成，但並不限定於此，多個搬送路徑亦可 由多個往路R1及多個復路R2構成。 【圖式簡單說明】 圖1係示意性表示真空處理裝置之整體之立體圖。 圖2係表示往復運動裝置之側視圖。 圖3 ( a)〜（d)係分别表示使用往復運動裝置之搬送 步驟之圖。 圖4 (a)〜（d)係分別表示使用習知例之往復運動裝 置之搬送步驟之圖。 圖5 ( a )〜（d )係分別表示使用習知例之往復運動裝 置之搬送步驟之圖。 【主要元件符號說明】 R1 搬送路徑之一例之往路 R2 搬送路徑之一例之復路 s 基板 21 200940430 ίο 13 14 15 17 17a 30 31 32 37 38 39 真空處理裝置 真空處理室之一例之第一處理室 真空處理室之一例之第二處理室 搬送室 搬送托盤 作為被卡接部之凸部 作為搬送裝置之往復運動裝置 滑動機構 升降機構 卡接部之一例之掛鉤 托盤載台 連桿之一例之連桿構件 22The initial position and the disengagement position of the (four) table 38, the loading position of the loading tray 17 of the tray stage 38, and the height of the locking position of the transfer tray 17 can be described in the vacuum processing chamber of the loading/unloading tray 17 Change from the bottom to the top of 10. These positions may be such that the transfer tray 17 can be transported from one transport path to the other transport path by the transport processing of the reciprocating device 3. However, the initial position of the tray stage 38 is preferably set such that the upper surface of the tray stage 38 (the surface supporting the lower side of the transfer tray 17) is lower than the upper surfaces of the transport paths Ri and R2. As described above, when the transfer tray 17 is carried into the transfer chamber 15 from the second processing chamber 14, the tray stage 38 does not interfere with the movement of the transfer tray 7. Therefore, the moving distance of the pallet stage 38 from the forward path R1 to the return path R2 can be minimized. However, this initial position does not limit the invention. The reason for this is that even if the tray stage 38 to be retracted from the movement path of the transfer tray 17 is moved downward, the number of times the transfer tray 17 is moved up and down is also increased by 20, 2009,404. In the above embodiment, the two transport paths are constituted by the forward path R1 and the complex path R2. The present invention is not limited thereto, and the two transport paths may be used for both the forward path and the return path of the transport tray 17. In this case, for example, when the transport tray 17 is transferred from one transport path to the other transport path, the reciprocating device 30 waits for the tray stage 38 to stand on the other transport path, and will be located. The transport tray 17 on the other transport path moves again to the one transport path. In the above embodiment, the plurality of transport paths are constituted by one path and one return path R2. However, the present invention is not limited thereto, and the plurality of transport paths may be composed of a plurality of forward paths R1 and a plurality of complex paths R2. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view schematically showing the entire vacuum processing apparatus. Figure 2 is a side view showing the reciprocating device. Fig. 3 (a) to (d) are views respectively showing a transfer step using a reciprocating device. 4(a) to 4(d) are views showing a conveying step of a reciprocating apparatus using a conventional example. Fig. 5 (a) to (d) are views each showing a transfer step using a reciprocating device of a conventional example. [Description of main component symbols] R1 Transfer path is an example of the path R2. The transfer path of one of the transfer paths is the substrate 21 200940430 ίο 13 14 15 17 17a 30 31 32 37 38 39 Vacuum processing unit Vacuum processing chamber is the first processing chamber vacuum The second processing chamber transfer tray of one of the processing chambers is a link member of the hook tray stage link as an example of the hook portion of the reciprocating device sliding mechanism lifting mechanism twenty two