TW200935195A - Positioning apparatus, exposure apparatus and device manufacturing method - Google Patents

Positioning apparatus, exposure apparatus and device manufacturing method

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Publication number
TW200935195A
TW200935195A TW097137017A TW97137017A TW200935195A TW 200935195 A TW200935195 A TW 200935195A TW 097137017 A TW097137017 A TW 097137017A TW 97137017 A TW97137017 A TW 97137017A TW 200935195 A TW200935195 A TW 200935195A
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TW
Taiwan
Prior art keywords
actuator
current
driver
wire
wires
Prior art date
Application number
TW097137017A
Other languages
Chinese (zh)
Other versions
TWI414909B (en
Inventor
Atsushi Kimura
Original Assignee
Canon Kk
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Publication of TW200935195A publication Critical patent/TW200935195A/en
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Publication of TWI414909B publication Critical patent/TWI414909B/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/50Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/50Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
    • G01R31/54Testing for continuity
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70758Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

There is provided a positioning apparatus capable of reliably and simply detecting a break of a current supply path to an actuator which drives a table. A current supply path (42) is connected between an actuator (2) for driving a stage (1) and a driver (3) for supplying a current to the actuator (2). A current detector (8) is arranged midway along the current supply path (42). The current supply path (42) has a plurality of paths. The current detector (8) detects a break of the current supply path (42) based on at least one of the plurality of paths.

Description

200935195 九、發明說明 【發明所屬之技術領域】 本發明有關一定位設備、曝光設備、及裝置製造設備 ,其被用於製造半導體裝置及液晶顯示器裝置之製程。 【先前技術】 圖8係一視圖,顯示一用於傳統曝光設備中之定位設 φ 備的配置。 參考數字10標示一可在基座上運動之工作台;20標 示一用於定位該工作台10之致動器;30標示一用於供給 電流至該致動器20之驅動器;且401及40 2標示具有電 流供給路徑之作用的電線。參考數字50標示一用於施行 伺服控制之控制器,以在一想要之位置定位該工作台1 0。 基於該目標位置及來自一配置在該工作台10上之位 置偵測器(未示出)的位置資訊間之差異,該控制器5 0 ❹ 該致動器20之目標電流値輸出至該驅動器30。該驅動器 30具有一電流控制電路(未示出),並控制之,以致一電 流輸出跟隨在該輸入目標電流値之後。 該致動器20被區分爲二類型。該第一型係一運動線 圈型,其馬達線圈部份係配置在其工作台1〇、亦即一可運 動部份中。該第二型係一運動磁鐵型,其馬達線圈部份係 配置在一固定不動部份中,且其具有一包括磁鐵部份及不 會承接電流之工作台10。於該運動線圈型中,電線401及 4 02連接該可運動及固定不動部份。譬如,於圖8中,該 200935195 電線401係一固定不動的電線,而該電線402連接該可運 動部份及該固定不動電線401。該電線402係於該可運動 部份之運動時彎曲或滑動。 當在用於該工作台10的控制器50之伺服控制中已發 生一異常時,該工作台1〇必需被緊急地停止。如果其係 不可能中斷伺服控制,一制動電路6 0必需使用一非伺服 控制系統制動該工作台10。通常是採用一用於藉由產生一 Φ 馬達線圈電流制動該工作台1〇之技術,該電流於該馬達 線圈短路時具有該工作台1 0之制動力的作用。此制動電 路60係一高電壓、大電流之電路,導致一大電路板。於 該運動線圈設計或該運動磁鐵設計其中之一中,該制動電 路60通常被配置在該固定不動部份中。 該等電線401及402可由於隨著時間流逝之退化、及 維修操作中之操作錯誤而中斷。特別地是,由於重複滑動 及彎曲,該運動線圈馬達之可運動線路部份係易於受強度 © 中之退化影響的。該致動器20通常具有複數用於增加推 力及軸心數目之馬達線圏。當該複數電線或該等電線之一 局部地中斷時,該馬達之制動力降低。 此外’如果該制動電路60及該馬達線圈部份間之電 線中斷,於短路該線圈時,一藉由反電動勢力量所產生之 制動電流不會流動。其結果是,該制動力降低。 於發生異常時,當該工作台制動力降低以增加一制動 距離時’該工作台10可在一高機率接觸一鄰近結構,且 這導致對鄰近結構及該工作台1〇中之零組件的損壞。 -5- 200935195 有可用之設計(看日本專利特許公開申請案第20〇〇_ 16199號),用於藉由在該電線部份的外殻中插入一中斷 偵測線偵測一中斷,其係最可能接觸該鄰近之結構及中斷 :及一設計(日本專利特許公開案第2006-3 1 8698號), 其使用一比該等鄰近電線更易受中斷影響的中斷預測信號 線。然而,其係難以指定該可運動線路部份之重複彎曲及 滑動的特定部份,一最大應力負載作用在該特定部份上。 © 其未總是首先中斷該偵測線之情況。 【發明內容】 本發明的一目的係提供一定位設備,其能夠可靠及簡 單地偵測一至致動器的電流供給路徑之中斷,該致動器驅 動一工作台。 根據一態樣,本發明提供一定位設備,包括一工作台 ,其可在一基座上運動;一致動器,其驅動該工作台;一 © 驅動器,其供給一電流至該致動器;一電流供給路徑,其 具有連接該驅動器與該致動器之複數平行路徑;及一偵測 器,其基於該複數平行路徑之至少一個的電流偵測該電流 供給路徑之中斷。 本發明之進一步特色將參考所附圖面由示範具體實施 例之以下敘述變得明顯。 【實施方式】 本發明之各種示範具體實施例、特色、及態樣將在下 -6 - 200935195 方參考該等圖面詳細地敘述。 \)/ 例 施 實 體 具 1 第 圖1係一視圖,顯示根據該第一具體實施例之定位設 備的配置。 參考數字1標示一可在基座上運動之工作台;及2標 示一致動器,其驅動該工作台1,以便定位該工作台1。 〇 該致動器2包括一配置在該工作台1上之可運動元件21 及一固定在該基座上之定子22»此結構採用一運動線圈馬 達,其中該等馬達線圈被安裝在該可運動元件21上。 參考數字3標示一驅動器,用於供給一電流至該致動 器2;且41及42標示具有電流供給路徑之作用的第一及 第二電線。該第二電線42係連接於該可運動部份(亦即 ,該工作台1)及該固定不動部份之間。於該工作台1之 運動時,該第二電線42時常重複彎曲及滑動。參考數字5 © 標示一控制器,用於施行伺服控制,以將該工作台1定位 在一想要之位置。 於此具體實施例中,該第二電線42係沿著中途分出 二路徑。更特別地是,該第二電線42具有複數路線。一 電流偵測機板7係配置在該第二電線42之分出部份中。 一制動電路6係配置於該第一電線41及該第二電線42之 間。當該控制器5由於一些理由不能持續伺服控制,且該 工作台1必需緊急地停止時,該可運動元件21之馬達線 圈被短路,以藉由電磁感應產生一反電動勢力量,藉此產 -7- 200935195 生一電流及因此產生一制動力。 於此具體實施例中之致動器2包括 2、3及4係槪要視圖,顯示包括該馬達線 42、及該電流偵測機板7之部份。沿著該 中途,該向前路徑係分出成第一向前電線 電線422,且該向後路徑亦被分出成第一 第二向後電線424。該等電線421至424 © 有相同之電阻。當一電流I流動在該第二 電流1/2流動於該等電線421至424之每-以上面之配置,縱使該第一向前電線 3所示,該電流I能流經該第二向前電線 供給該電流至該馬達線圈。這允許制動該 應用於該第二向前電線422中斷,或該第 或該第二向後電線42 4中斷其中之一的案 〇 Ο 如圖2、3及4所示,沿著該分出部 電偵測機板7。該電流偵測機板7包括用 電流偵測器8,用於使用一霍耳元件及一 獲得該第二向前電線422及該第一向後電 値。 當沒有發生中斷時,如圖2所示,藉 8所偵測之總電流値係1/2_1/2 = 0。然而, 線421中斷時,如圖3所示,該電流I在 4U中流動,且該電流1/2被保持供給至 相線圈馬達。圖 圈、該第二電線 ;第二電線42之 421及第二向前 向後電線423及 在所有路徑中具 電線42中時, -個中。 4 2 1中斷,如圖 422,以連續地 工作台1。這亦 一向後電線423 例,如圖4所示 份之中途配置該 作一偵測部份之 電流測量放大器 線423之總電流 由該電流偵測器 當該第一向前電 該第二向前電線 該第一向後電線 -8 - 200935195 423。該總電流値係1-1/2= 1/2。 當該第一向後電線423中斷時,如圖4所示,該電流 1/2流動於該第二向前電線422中,但流動於該第—向後 電線423中之電流爲零。該總電流値係1/2-0 = 1/2。這亦應 用至該第二向前電線422或該第二向後電線424中斷之案 例。 如上面所述,該正常操作及在發生中斷時的操作中藉 〇 由該電流偵測器8所偵測之總電流値係彼此不同的。這使 其可能按照藉由該電流偵測器8所偵測之總電流値偵測一 中斷之存在/不存在。 依據此具體實施例,縱使在該二路徑之一中發生一中 斷,且每一路徑具有分出之路徑,該電流可被連續地供給 至該致動器2之馬達線圈部份。這使其可能制動該工作台 1及安全地停止之。縱使該等電流路徑係多餘的,對於該 數目之系統不須準備電流偵測器8,藉此使電路規模中之 〇 增加減至最小。於偵測一中斷時,該控制器通知一主機系 統,用於控制發生該中斷之曝光系統。因此,該設備順序 能停止,且零組件之替換能被做成。 (第二具體實施例) 將在下面敘述本發明之第二具體實施例。此具體實施 例的一定位設備之配置遵從圖1中者,除了一致動器2之 可運動元件21包括一星形連接的三相馬達以外。 圖5、6及7係槪要圖,顯示一包括該馬達線圈、第 -9 - 200935195 二電線42、及一電流偵測機板7的部份。該第二電線42 對於每一相係沿著中途分出成二路徑。該等線圏被界定爲 A-、B-、及C-相線圈。該等個別相馬達線圈及一驅動器3 係經由該三條電線連接。三條電線之每一個包括複數路徑 '。更特別地是,用於供給一電流至該A-相線圈之電線包 括第一 A-相電線425及第二A-相電線428。用於供給一 電流至該C-相線圈之電線包括第一 C-相電線426及第二 〇 C-相電線429。用於供給一電流至該B-相線圈之電線包括 第一B-相電線427及第二B-相電線43 0。該電線425至 430在所有該等路徑中具有幾乎相同之電阻。讓la爲流經 該A-相線圈之總電流,lb爲流經該B-相線圈之總電流, 及Ic爲流經該C-相線圈之總電流,一爲該總電流的1/2 之電流流經每一分出之路徑。Ia + Ib + Ic = 0。 以上面之配置’如圖6所示,縱使該第一A-相電線 425中斷,該電流la能流經該第二A-相電線428,以連續 Ο 地供給該電流至該馬達線圈。這允許制動該工作台1。這 亦應用至該其餘電線426至430之一中斷的案例。 於圖5、6及7中,該電偵測機板7係沿著該等分出 部份之中途配置。該電流偵測機板7包括一電流偵測器8 ,用於使用諸如霍耳元件及電流測量放大器之元件獲得該 等路徑之總電流値,每一路徑選自該三條電線的一對應電 線。於所示具體實施例中,該電流偵測器8偵測該第二 A-相電線428、該第二C-相電線429、及該第二B-相電線 430之總電流値。 -10- 200935195 當沒有中斷發生時,如圖5所示’藉由該電流偵測器 8所偵測之總電流値係Ia/2 + Ib/2 + Ic/2 = 0。然而’如圖6所 示,當該第一 A-相電線425中斷時’該總電流値係 Ia + Ib/2 + Ic/2 = Ia/2,因爲該電流la流經該第二A-相電線 428 ° 當該第二A-相電線428中斷時,如圖7所示,該電 流la流經該第一A-相電線425,且流經該第一 A-相電線 〇 428之電流値變成零。該總電流値係Ib/2 + IC/2。這亦應用 至其餘電線426、42 7、42 9及430之一中斷的案例。 如於該第一具體實施例中,如上述,該正常操作及在 發生中斷時的操作中藉由該電流偵測器8所偵測之總電流 値係彼此不同的。這使其可能按照藉由該電流偵測器8所 偵測之總電流値偵測一中斷之存在/不存在。 依據此具體實施例,如於該第一具體實施例中,縱使 在該二路徑之一中發生一中斷,且每一路徑具有分出之路 © 徑,該電流可被連續地供給至該致動器2之馬達線圈部份 。這使其可能制動該工作台1及安全地停止之。縱使該等 電流路徑係多餘的,對於該數目之系統不須準備電流偵測 器8,藉此使電路規模中之增加減至最小。於偵測一中斷 時,該控制器通知一主機系統,用於控制發生該中斷之曝 光系統。因此,該設備順序能停止,且零組件之替換能被 做成。 於上面所述之第一及第二具體實施例中,該第二電線 42係分出成二路徑。如果路徑之數目係三或更多,與上面 -11 - 200935195 所述相同之效果能被獲得。如果用作一至致動器之電流供 給路徑的電線係分出成η條路徑,監視該η條路徑的至少 一路徑中之電流,以偵測一中斷。 (第三具體實施例) ‘現在將在下面敘述一應用本發明之定位設備的示範曝 光設備。 〇 如圖9所示,該曝光設備包括一照明裝置501、一安 裝有用作罩幕(光掩模)之光罩的光罩工作台502、一投 射光學系統 5 03、及一安裝有晶圓之晶圓工作台 504。該 曝光設備將一形成在該光罩上之電路圖案投射及曝光至晶 圓上,且採用該步進與重複投射曝光方案或步進與掃描投 射曝光方案。 該照明系統501照明一在其上形成電路圖案之光罩, 且包括一光源及照明光學系統。該光源單元包括譬如當作 © 一光源之雷射。該雷射可爲一具有大約193奈米波長之 ArF準分子雷射、一具有大約24 8奈米波長之KrF準分子 雷射、一具有大約153奈米波長之F2準分子雷射等。雷 射之型式不限於準分子雷射,但一 YAG雷射係可用的。 雷射之數目不限於一特定數目。當該光源採用一雷射時, 較佳地係使用一光束成形光學系統,用於將來自一雷射源 之平行光束塑形成一想要之光束形狀;及使用一不相干之 光學系統,用於將一相干之雷射光束轉換成一不相干之雷 射光束。可用在該光源單元中之光源不限於該等雷射。一 -12- 200935195 或複數燈泡、諸如水銀燈或氙氣燈係可用的。該照明光學 系統係一光學系統,其照明一罩幕與包括一透鏡、鏡片、 光學積分器、及光闌。 該投射光學系統503可爲一僅只包括複數透鏡元件之 光學系統、或一包括複數透鏡元件及最少一凹鏡之光學系 統(光線反射曲折的光學系統)。該投射光學系統503可 爲一包括複數透鏡元件及繞射光學元件(例如機諾虹( 〇 kinoform))、一全鏡片型光學系統等之光學系統。 該光罩工作台5 02及該晶圓工作台5 04係可藉由譬如 一線性馬達運動的。於該步進與掃描投射曝光方案中,這 些工作台彼此同步地運動。該晶圓工作台及該光罩工作台 之至少一個包括一離散式致動器,以將該光罩圖案對齊至 該晶圓上。上面具體實施例之定位設備係可適用於該光罩 工作台502及該晶圓工作台504之至少一個。 上面之曝光設備係可用於製造諸如半導體積體電路之 © 半導體裝置、及一具有細微圖案之裝置,諸如一微機械及 —薄膜磁頭。 本發明之具體實施例的裝置製造方法係適用於製造一 裝置、諸如半導體裝置及液晶裝置。此裝置製造方法可包 括使用上面之曝光設備將塗以光阻劑之基板暴露至輻射能 量之步驟、使於該曝光步驟中曝光之基板顯影的步驟、及 其他處理已顯影基板之習知步驟,以便製造該裝置。 雖然本發明已參考示範具體實施例作敘述,應了解本 發明不限於所揭示之示範具體實施例。以下申請專利之範 -13- 200935195 圍將被給與最寬廣之解釋,以便涵括所有此等修改及同等 結構與功能 【圖式簡單說明】 圖1係一視圖,顯示一具體實施例之定位設備的配置 » 圖2係包括該第一具體實施例的定位設備中之馬達線 〇 圈、第二電線、及電流偵測機板的一部份之槪要圖; 圖3係一視圖,顯示當該第一具體實施例中之第一向 前電線中斷時的範例; 圖4係一視圖,顯示當該第一具體實施例中之第一向 後電線中斷時的範例; 圖5係包括該第二具體實施例的定位設備中之馬達線 圈、第二電線、及電流偵測機板的一部份之槪要圖; 圖6係一視圖,顯示當該第二具體實施例中之第一向 © 前電線中斷時的範例; 圖7係一視圖,顯示當該第二具體實施例中之第一向 後電線中斷時的範例; 圖8係一視圖,顯示一傳統定位設備之配置;及 圖9係一視圖,顯示第三具體實施例之曝光設備的配 置。 【主要元件符號說明】 1 :工作台 -14- 200935195 致動器 驅動器 控制器 制動電路 電流偵測機板 電流偵測器 工作台 致動器 可運動元件 定子 驅動器 電線 電線 控制器 制動電路 :電線 :電線 :電線 :電線 :電線 :電線 :電線 :電線 :電線 200935195 4 2 8 :電線 429 :電線 4 3 0 :電線 501 :照明裝置 5 0 2 :光罩工作台 5 03 :投射光學系統 504:晶圓工作台BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a positioning apparatus, an exposure apparatus, and a device manufacturing apparatus which are used in a process for manufacturing a semiconductor device and a liquid crystal display device. [Prior Art] Fig. 8 is a view showing a configuration for a positioning device in a conventional exposure apparatus. Reference numeral 10 designates a table movable on the base; 20 designates an actuator for positioning the table 10; 30 designates a driver for supplying current to the actuator 20; and 401 and 40 2 indicates an electric wire having a function of a current supply path. Reference numeral 50 designates a controller for performing servo control to position the table 10 at a desired position. Based on the difference between the target position and the position information from a position detector (not shown) disposed on the table 10, the controller 5 0 目标 the target current of the actuator 20 is output to the driver 30. The driver 30 has a current control circuit (not shown) and is controlled such that a current output follows the input target current 値. The actuator 20 is divided into two types. The first type is a moving coil type, and the motor coil portion is disposed in the table 1, that is, a movable portion. The second type is a moving magnet type in which the motor coil portion is disposed in a fixed portion and has a table 10 including a magnet portion and a current that does not receive current. In the moving coil type, the wires 401 and 242 are connected to the movable and fixed portions. For example, in Fig. 8, the 200935195 electric wire 401 is a fixed electric wire, and the electric wire 402 connects the movable portion and the fixed electric wire 401. The wire 402 is bent or slid during movement of the movable portion. When an abnormality has occurred in the servo control of the controller 50 for the table 10, the table 1 must be urgently stopped. If it is not possible to interrupt the servo control, a brake circuit 60 must brake the table 10 using a non-servo control system. A technique for braking the table 1 by generating a Φ motor coil current is generally employed, which current has a braking force of the table 10 when the motor coil is short-circuited. This brake circuit 60 is a high voltage, high current circuit that results in a large circuit board. In one of the moving coil design or the moving magnet design, the brake circuit 60 is typically disposed in the fixed portion. These wires 401 and 402 can be interrupted due to degradation over time and operational errors in maintenance operations. In particular, the movable line portion of the moving coil motor is susceptible to degradation in the strength © due to repeated sliding and bending. The actuator 20 typically has a plurality of motor turns for increasing the amount of thrust and the number of axes. When the plurality of wires or one of the wires is partially interrupted, the braking force of the motor is lowered. Further, if the electric wire between the brake circuit 60 and the motor coil portion is interrupted, a brake current generated by the back electromotive force does not flow when the coil is short-circuited. As a result, the braking force is lowered. When an abnormality occurs, when the table braking force is lowered to increase a braking distance, the table 10 can contact a neighboring structure at a high probability, and this results in the adjacent structure and the components in the table 1 damage. -5- 200935195 A design is available (see Japanese Patent Application No. 20_16199) for detecting an interruption by inserting an interrupt detection line in the outer casing of the wire portion. It is most likely to be in contact with the adjacent structure and interruption: and a design (Japanese Patent Laid-Open No. 2006-3 18698) which uses an interrupt prediction signal line which is more susceptible to interruption than the adjacent wires. However, it is difficult to specify a specific portion of the repetitive bending and sliding of the movable line portion, and a maximum stress load acts on the specific portion. © It does not always interrupt the detection line first. SUMMARY OF THE INVENTION One object of the present invention is to provide a positioning apparatus capable of reliably and simply detecting an interruption of a current supply path to an actuator that drives a table. According to one aspect, the present invention provides a positioning apparatus including a table that is movable on a base; an actuator that drives the table; and an actuator that supplies a current to the actuator; a current supply path having a plurality of parallel paths connecting the driver and the actuator; and a detector for detecting an interruption of the current supply path based on a current of at least one of the plurality of parallel paths. Further features of the present invention will become apparent from the following description of exemplary embodiments. [Embodiment] Various exemplary embodiments, features, and aspects of the present invention will be described in detail with reference to the drawings in the following -6 - 200935195. \)/ Example Solid body 1 Fig. 1 is a view showing the configuration of a pointing device according to the first embodiment. Reference numeral 1 designates a table movable on the base; and 2 denotes an actuator that drives the table 1 to position the table 1. The actuator 2 includes a movable member 21 disposed on the table 1 and a stator 22 fixed to the base. The structure employs a moving coil motor, wherein the motor coils are mounted thereon. On the moving element 21. Reference numeral 3 designates a driver for supplying a current to the actuator 2; and 41 and 42 designate first and second electric wires having a function of a current supply path. The second electric wire 42 is connected between the movable portion (that is, the table 1) and the fixed portion. During the movement of the table 1, the second wire 42 is often repeatedly bent and slid. Reference numeral 5 © indicates a controller for performing servo control to position the table 1 at a desired position. In this particular embodiment, the second wire 42 separates the two paths along the way. More specifically, the second wire 42 has a plurality of routes. A current detecting board 7 is disposed in the separated portion of the second electric wire 42. A brake circuit 6 is disposed between the first electric wire 41 and the second electric wire 42. When the controller 5 cannot continue servo control for some reason, and the table 1 must be stopped urgently, the motor coil of the movable member 21 is short-circuited to generate a counter electromotive force by electromagnetic induction, thereby producing - 7- 200935195 A current is generated and a braking force is generated. The actuator 2 in this embodiment includes two, three, and four series schematic views including portions of the motor wire 42 and the current detector plate 7. Along the way, the forward path is split into first forward wire wires 422, and the rearward path is also split into first and second rearward wires 424. These wires 421 to 424 © have the same resistance. When a current I flows in the second current 1/2 flowing in each of the wires 421 to 424, the current I can flow through the second direction as indicated by the first forward wire 3. The front wire supplies the current to the motor coil. This allows the brake to be applied to the second forward wire 422 to be interrupted, or the second or the rearward wire 42 4 interrupts one of the cases, as shown in Figures 2, 3 and 4, along the branch Electrical detection board 7. The current detector board 7 includes a current detector 8 for using a Hall element and a second forward wire 422 and the first backward electrode. When no interruption occurs, as shown in Figure 2, the total current detected by 8 is 1/2_1/2 = 0. However, when the line 421 is interrupted, as shown in Fig. 3, the current I flows in 4U, and the current 1/2 is kept supplied to the phase coil motor. The loop, the second wire; the second wire 42 421 and the second forward-back wire 423 and when there are wires 42 in all paths, one. 4 2 1 interrupt, as shown in Figure 422, to continuously work on station 1. This is also a case of a rear-line electric wire 423. The total current of the current measuring amplifier line 423 configured as a detecting portion is shown in the middle of FIG. 4 by the current detecting device when the first forward electric current is the second direction. Front wire the first rear wire -8 - 200935195 423. The total current is 1-1/2 = 1/2. When the first backward electric wire 423 is interrupted, as shown in Fig. 4, the current 1/2 flows in the second forward electric wire 422, but the current flowing in the first backward electric wire 423 is zero. The total current is 1/2-0 = 1/2. This also applies to the case where the second forward wire 422 or the second backward wire 424 is interrupted. As described above, the normal operation and the operation in the event of an interruption are caused by the total currents detected by the current detector 8 being different from each other. This makes it possible to detect the presence/absence of an interrupt in accordance with the total current detected by the current detector 8. According to this embodiment, even if an interruption occurs in one of the two paths, and each path has a branching path, the current can be continuously supplied to the motor coil portion of the actuator 2. This makes it possible to brake the table 1 and stop it safely. Even though the current paths are redundant, it is not necessary to prepare the current detector 8 for this number of systems, thereby minimizing the increase in the circuit scale. Upon detecting an interrupt, the controller notifies a host system to control the exposure system in which the interrupt occurred. Therefore, the device sequence can be stopped and replacement of components can be made. (Second embodiment) A second embodiment of the present invention will be described below. The configuration of a positioning device of this embodiment follows the one in Figure 1, except that the movable element 21 of the actuator 2 includes a star-connected three-phase motor. Figures 5, 6 and 7 are schematic views showing a portion including the motor coil, the -9 - 200935195 two wires 42, and a current detecting plate 7. The second wire 42 is split into two paths along the middle for each phase. These turns are defined as A-, B-, and C-phase coils. The individual phase motor coils and a driver 3 are connected via the three wires. Each of the three wires includes a complex path '. More specifically, the wires for supplying a current to the A-phase coil include a first A-phase wire 425 and a second A-phase wire 428. The wires for supplying a current to the C-phase coil include a first C-phase wire 426 and a second C-phase wire 429. The electric wire for supplying a current to the B-phase coil includes a first B-phase electric wire 427 and a second B-phase electric wire 43 0. The wires 425 through 430 have nearly the same resistance in all of these paths. Let la be the total current flowing through the A-phase coil, lb is the total current flowing through the B-phase coil, and Ic is the total current flowing through the C-phase coil, one being 1/2 of the total current The current flows through each of the branches. Ia + Ib + Ic = 0. In the above configuration, as shown in Fig. 6, even if the first A-phase electric wire 425 is interrupted, the current la can flow through the second A-phase electric wire 428 to continuously supply the current to the motor coil. This allows the table 1 to be braked. This also applies to the case where one of the remaining wires 426 to 430 is interrupted. In Figures 5, 6 and 7, the electrical detection board 7 is disposed along the middle of the divided portions. The current detector board 7 includes a current detector 8 for obtaining the total current 该 of the paths using components such as a Hall element and a current measuring amplifier, each path being selected from a corresponding one of the three wires. In the illustrated embodiment, the current detector 8 detects the total current 该 of the second A-phase wire 428, the second C-phase wire 429, and the second B-phase wire 430. -10- 200935195 When no interruption occurs, as shown in Figure 5, the total current detected by the current detector 8 is Ia/2 + Ib/2 + Ic/2 = 0. However, as shown in FIG. 6, when the first A-phase electric wire 425 is interrupted, the total current is Ia + Ib/2 + Ic/2 = Ia/2 because the current la flows through the second A- Phase wire 428 ° When the second A-phase wire 428 is interrupted, as shown in FIG. 7, the current la flows through the first A-phase wire 425 and flows through the first A-phase wire 428.値 becomes zero. The total current is Ib/2 + IC/2. This also applies to the case where one of the remaining wires 426, 42 7, 42 9 and 430 is interrupted. As in the first embodiment, as described above, the normal operation and the total current detected by the current detector 8 in the operation at the time of the interruption are different from each other. This makes it possible to detect the presence/absence of an interruption in accordance with the total current detected by the current detector 8. According to this specific embodiment, as in the first embodiment, even if an interruption occurs in one of the two paths, and each path has a path of separation, the current can be continuously supplied to the source. The motor coil portion of the actuator 2. This makes it possible to brake the table 1 and stop it safely. Even though the current paths are redundant, it is not necessary to prepare the current detector 8 for this number of systems, thereby minimizing the increase in circuit scale. Upon detecting an interrupt, the controller notifies a host system to control the exposure system in which the interrupt occurred. Therefore, the device sequence can be stopped and replacement of components can be made. In the first and second embodiments described above, the second wire 42 is split into two paths. If the number of paths is three or more, the same effect as described in -11 - 200935195 above can be obtained. If the wires used as the current supply path to the actuator are branched into n paths, the current in at least one of the n paths is monitored to detect an interruption. (Third embodiment) "An exemplary exposure apparatus to which the positioning apparatus of the present invention is applied will now be described below. As shown in FIG. 9, the exposure apparatus includes an illumination device 501, a mask table 502 mounted with a mask used as a mask (photomask), a projection optical system 503, and a wafer mounted thereon. Wafer table 504. The exposure apparatus projects and exposes a circuit pattern formed on the reticle to the wafer, and employs the step and repeat projection exposure scheme or the step and scan projection exposure scheme. The illumination system 501 illuminates a reticle having a circuit pattern formed thereon and includes a light source and illumination optics. The light source unit includes, for example, a laser as a light source. The laser may be an ArF excimer laser having a wavelength of about 193 nm, a KrF excimer laser having a wavelength of about 24 nm, an F2 excimer laser having a wavelength of about 153 nm, or the like. The type of laser is not limited to excimer lasers, but a YAG laser system is available. The number of lasers is not limited to a specific number. When the light source employs a laser, it is preferred to use a beam shaping optical system for shaping a parallel beam from a laser source into a desired beam shape; and using an incoherent optical system, Converting a coherent laser beam into an incoherent laser beam. The light sources usable in the light source unit are not limited to the lasers. A -12- 200935195 or multiple bulbs, such as mercury or xenon lamps are available. The illumination optics is an optical system that illuminates a mask and includes a lens, a lens, an optical integrator, and an aperture. The projection optical system 503 can be an optical system including only a plurality of lens elements, or an optical system (a light-reflecting optical system) including a plurality of lens elements and a minimum of concave mirrors. The projection optical system 503 can be an optical system including a plurality of lens elements and a diffractive optical element (e.g., 〇 kinoform), a full lens type optical system, and the like. The reticle stage 52 and the wafer stage 504 can be moved by, for example, a linear motor. In this step and scan projection exposure scheme, these stations move in synchronism with each other. At least one of the wafer table and the reticle stage includes a discrete actuator to align the reticle pattern onto the wafer. The positioning device of the above specific embodiment is applicable to at least one of the reticle stage 502 and the wafer stage 504. The above exposure apparatus can be used to fabricate a semiconductor device such as a semiconductor integrated circuit, and a device having a fine pattern such as a micromechanical and thin film magnetic head. The device manufacturing method of a specific embodiment of the present invention is suitable for fabricating a device such as a semiconductor device and a liquid crystal device. The device manufacturing method may include the steps of exposing the photoresist-coated substrate to radiant energy using the above exposure apparatus, developing the substrate exposed in the exposure step, and other conventional steps of processing the developed substrate, In order to manufacture the device. While the invention has been described herein with reference to the preferred embodiments, the invention The following patent application is hereby incorporated by reference in its entirety in its entirety in its entirety in the the the the the the Configuration of the device» Fig. 2 is a schematic diagram of a part of a motor coil, a second wire, and a current detecting machine board in the positioning device of the first embodiment; Fig. 3 is a view showing An example when the first forward wire in the first embodiment is interrupted; FIG. 4 is a view showing an example when the first backward wire in the first embodiment is interrupted; FIG. 5 includes the A schematic view of a portion of a motor coil, a second wire, and a current detecting machine plate in the positioning device of the second embodiment; FIG. 6 is a view showing the first of the second embodiment FIG. 7 is a view showing an example when the first backward wire is interrupted in the second embodiment; FIG. 8 is a view showing a configuration of a conventional positioning device; Figure 9 is a view showing the third The configuration of the exposure apparatus of the specific embodiment. [Main component symbol description] 1 : Workbench-14- 200935195 Actuator driver controller Brake circuit Current detector board Current detector Workbench actuator Movable component Stator driver Wire and cable controller Brake circuit: Wire: Wire: Wire: Wire: Wire: Wire: Wire: Wire: Wire 200935195 4 2 8: Wire 429: Wire 4 3 0: Wire 501: Lighting 5 0 2: Mask Workbench 5 03: Projection Optical System 504: Crystal Round workbench

Claims (1)

200935195 十、申請專利範園 1. 一種定位設備,包括: 一工作台,其可在一基座上運動; 一致動器,其驅動該工作台; —驅動器,其供給一電流至該致動器; 一電流供給路徑,其具有連接該驅動器與該致動器之 複數平行路徑;及 〇 —偵測器,其基於該複數平行路徑之至少一個的電流 偵測該電流供給路徑之中斷。 2. 如申請專利範圍第1項之定位設備,其中該致動 器包括一配置在該基座上之定子及一配置在該工作台上之 可運動元件,且該電流供給路徑連接該定子與該驅動器。 3. 如申請專利範圍第1或2項之定位設備,其中 該電流供給路徑包括複數向後之電線與複數向前之電 線,及 〇 該偵測器基於該複數向前之電線的至少一個與該複數 向後之電線的至少一個之總電流偵測該電流供給路徑之中 斷。 4. 如申請專利範圍第2項之定位設備,其中 該可運動元件包括一線圈’該定子包括一磁鐵’且該 電流供給路徑連接該驅動器及該線圈。 5 .如申請專利範圍第2項之定位設備,另包括一制 動電路,其藉由將該線圈短路,使用藉由該線圈中所產生 之電磁感應的反電動勢,對該運動元件產生—制動力, -17- 200935195 其中該制動電路被設置於該驅動器及該線圈之間, 且其中該電流供給路徑包括一連接該驅動器與該制動 電路之第一電流供給路徑、及一連接該制動電路與該線圈 之第二電流供給路徑。 6. 如申請專利範圍第2項之定位設備,其中 該可運動元件包括三相馬達,其中三相馬達線圈係星 形連接^ © 該電流供給路徑包括三條電線,該等電線連接該驅動 器及該三相馬達之個別馬達線圈, 該三條電線之每一條包括複數路徑,及 該偵測器基於選自該三條電線之每一條的至少一路徑 之總電流値偵測該電流供給路徑之中斷。 7. —種定位設備,包括: 一工作台; 一致動器,其驅動該工作台; 〇 一驅動器,其供給一電流至該致動器; 一電線,其連接該驅動器與該致動器, 該電線具有在該驅動器與該致動器之間的複數平 行路徑;及 一偵測器,其偵測流經該複數平行路徑之至少一路徑 的電流。 8. 如申請專利範圍第7項之定位設備,其中 該致動器包括一定子及一包括該工作台之可運動元件 ,該可運動元件包括一線圈,及 -18 - 200935195 該電線連接該線圏與該驅動器。 9. 如申請專利範圍第7項之定位設備’其中 該電線包括複數向前之電線與複數向後之電線,及 該偵測器偵測該複數向前之電線的至少一個與該複數 向後之電線的至少一個之總電流。 10. 如申請專利範圍第9項之定位設備,另包括一制 動電路,其藉由將該線圏短路,使用藉由該線圈中所產生 〇 之電磁感應的反電動勢,對該運動元件產生一制動力, 其中該制動電路被設置於該驅動器及該線圈之間, 且其中該電線包括一連接該驅動器與該制動電路之第 一電線、及一連接該制動電路與該線圏之第二電線。 11. 如申請專利範圍第8項之定位設備,其中 該可運動元件包括三相馬達,其中三相馬達線圈係星 形連接, 該複數電線包括三條電線,該等電線連接該驅動器與 ❹ 該三相馬達之個別馬達線圈, 該三條電線之每一條包括複數路徑,及 該偵測器偵測選自該三條電線之每一條的至少一路徑 之總電流値。 12. —種將放在光罩工作台上之光罩的圖案投射及暴 露至放在晶圓工作台上之晶圓的曝光設備,該曝光設備包 括一定位設備,該定位設備定位該光罩工作台及該晶圓工 作台之至少一個, 該定位設備包括 -19- 200935195 一工作台,其可在一基座上運動; —致動器,其驅動該工作台; 一驅動器’其供給一電流至該致動器; 一電流供給路徑’其具有連接該驅動器與該致動器之 複數平行路徑;及 一偵測器,其基於該複數平行路徑之至少一個的電流 偵測該電流供給路徑之中斷。 © 13_ —種製造裝置之方法,包括以下步驟: 使用一曝光設備將光罩之圖案暴露至一晶圓上;及 使該晶圓顯影, 該曝光設備包括一定位設備,其定位該光罩及該晶圓 之至少一個, 該定位設備包括 一工作台,其可在一基座上運動; —致動器,其驅動該工作台; © 一驅動器’其供給一電流至該致動器; 一電流供給路徑,其具有連接該驅動器與該致動器之 複數平行路徑;及 一偵測器,其基於該複數平行路徑之至少一個的電流 偵測該電流供給路徑之中斷。 14. 一種將放在光罩工作台上之光罩的圖案投射及暴 露至放在晶圓工作台上之晶圓的曝光設備,該曝光設備包 括一定位設備’該定位設備定位該光罩工作台及該晶圓工 作台之至少一個, -20- 200935195 該定位設備包括 一致動器,其驅動該至少一工作台; 一驅動器,其供給一電流至該致動器; 一電線,其連接該驅動器與該致動器, 該電線具有在該驅動器與該致動器之間的複數平 行路徑;及 一偵測器’其偵測流經該複數平行路徑之至少一路徑 © 的電流。 15. —種製造裝置之方法,包括以下步驟: 使用一曝光設備將光罩之圖案暴露至一晶圓上;及 使該經曝光之晶圓顯影, 該曝光設備包括一定位設備,其定位該光罩及該晶圓 之至少一個, 該定位設備包括 一致動器,其驅動該至少一工作台; ® —驅動器,其供給一電流至該致動器; 一電線,其連接該驅動器與該致動器, 該電線具有在該驅動器與該致動器之間的複數平 行路徑;及 一偵測器,其偵測流經該複數平行路徑之至少一路徑 的電流。 -21 -200935195 X. Patent application park 1. A positioning device comprising: a work table movable on a base; an actuator driving the work table; a driver supplying a current to the actuator And a current supply path having a plurality of parallel paths connecting the driver and the actuator; and a detector detecting the interruption of the current supply path based on the current of the at least one of the plurality of parallel paths. 2. The positioning device of claim 1, wherein the actuator comprises a stator disposed on the base and a movable component disposed on the table, and the current supply path is coupled to the stator and The drive. 3. The positioning device of claim 1 or 2, wherein the current supply path comprises a plurality of backward wires and a plurality of forward wires, and wherein the detector is based on at least one of the plurality of forward wires The total current of at least one of the plurality of backward wires detects an interruption of the current supply path. 4. The positioning device of claim 2, wherein the movable element comprises a coil 'the stator comprises a magnet' and the current supply path connects the driver and the coil. 5. The positioning device of claim 2, further comprising a braking circuit that generates a braking force for the moving element by short-circuiting the coil using a counter electromotive force generated by electromagnetic induction generated in the coil , -17- 200935195 wherein the brake circuit is disposed between the driver and the coil, and wherein the current supply path includes a first current supply path connecting the driver and the brake circuit, and a connection between the brake circuit and the A second current supply path of the coil. 6. The positioning device of claim 2, wherein the movable component comprises a three-phase motor, wherein the three-phase motor coil is a star connection ^ © the current supply path comprises three wires, the wires connecting the driver and the wire An individual motor coil of the three-phase motor, each of the three wires including a plurality of paths, and the detector detecting an interruption of the current supply path based on a total current of at least one path selected from each of the three wires. 7. A positioning device comprising: a work table; an actuator that drives the table; a first driver that supplies a current to the actuator; and a wire that connects the driver to the actuator, The wire has a plurality of parallel paths between the driver and the actuator; and a detector that detects current flowing through at least one of the plurality of parallel paths. 8. The positioning device of claim 7, wherein the actuator comprises a stator and a movable member including the table, the movable member comprises a coil, and -18 - 200935195 the wire is connected to the wire圏 with the drive. 9. The positioning device of claim 7, wherein the wire comprises a plurality of forward wires and a plurality of backward wires, and the detector detects at least one of the plurality of forward wires and the plurality of backward wires At least one of the total currents. 10. The positioning device of claim 9 further comprising a brake circuit for generating a thermal shock to the moving element by using a counter electromotive force of electromagnetic induction generated by the coil in the coil. a brake circuit, wherein the brake circuit is disposed between the driver and the coil, and wherein the wire includes a first wire connecting the driver and the brake circuit, and a second wire connecting the brake circuit and the wire . 11. The positioning device of claim 8, wherein the movable component comprises a three-phase motor, wherein the three-phase motor coil is star-connected, the plurality of wires comprising three wires, the wires connecting the driver and the third Each of the three motor wires includes a plurality of paths, and the detector detects a total current 至少 of at least one path selected from each of the three wires. 12. An exposure apparatus for projecting and exposing a pattern of a reticle placed on a reticle stage to a wafer placed on a wafer table, the exposure apparatus comprising a positioning device that positions the reticle At least one of a workbench and the wafer table, the positioning device comprising a -19-200935195 workbench movable on a pedestal; an actuator driving the workbench; a drive 'supplying one Current to the actuator; a current supply path 'having a plurality of parallel paths connecting the driver and the actuator; and a detector for detecting the current supply path based on current of at least one of the plurality of parallel paths Interrupted. 13 13 — A method of manufacturing a device, comprising the steps of: exposing a pattern of a reticle to a wafer using an exposure apparatus; and developing the wafer, the exposure apparatus including a positioning device that positions the reticle and At least one of the wafers, the positioning device includes a table that is movable on a base; an actuator that drives the table; a driver that supplies a current to the actuator; a current supply path having a plurality of parallel paths connecting the driver and the actuator; and a detector that detects an interruption of the current supply path based on a current of at least one of the plurality of parallel paths. 14. An exposure apparatus for projecting and exposing a pattern of a reticle placed on a reticle stage to a wafer placed on a wafer table, the exposure apparatus comprising a positioning device that positions the reticle At least one of the stage and the wafer table, -20-200935195 the positioning device includes an actuator that drives the at least one table; a driver that supplies a current to the actuator; and a wire that connects the a driver and the actuator, the wire having a plurality of parallel paths between the driver and the actuator; and a detector 'detecting current flowing through at least one path © of the plurality of parallel paths. 15. A method of fabricating a device comprising the steps of: exposing a pattern of a reticle to a wafer using an exposure apparatus; and developing the exposed wafer, the exposure apparatus comprising a positioning device positioned At least one of a mask and the wafer, the positioning device includes an actuator that drives the at least one table; a driver that supplies a current to the actuator; and a wire that connects the driver to the actuator The wire has a plurality of parallel paths between the driver and the actuator; and a detector that detects current flowing through at least one of the plurality of parallel paths. -twenty one -
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US20090091724A1 (en) 2009-04-09
JP2009095090A (en) 2009-04-30

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