JP2001136727A - Polyphase coil-type linear motor, aligner, and method of manufacturing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polyphase coil-type linear motor, which can detect an abnormal temperature of a coil by a simple structure with high reliability and which can stop equipment safely, without the burning or damaging of a motor driver or a controlling section, even if the motor driver has troubles or the control section undergoes runaway and can also provide an aligner. SOLUTION: A polyphase coil-type linear motor 100 comprises a stator provided with a plurality of coils 101, arranged in parallel with each other and a moving member which can be moved along the line of the coils. A conductor 103 for detecting the temperature of the coils is disposed either in contact with the coils 101 or near the coils 101. A temperature-detecting circuit 105 connected by an end of the conductor 103 causes a current to flow into the conductor 103, to detect the temperature of the conductor 3 from the resistance of the conductor 3 and then determines whether there is abnormality in the temperature of the linear motor from the detected temperature. When the detected temperature exceeds a preset threshold for determining the temperature abnormality, a display or other control sections are informed of and instructed to cope with of a hazard or these devices are stopped.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyphase coil type linear motor used for a positioning table device such as a machine tool or a semiconductor exposure apparatus, and an exposure apparatus using the polyphase coil type linear motor.

[0002]

2. Description of the Related Art A linear motor used for a positioning table device such as a machine tool or a semiconductor exposure apparatus usually has several tens of motors.
In order to use the power of W to several hundred W,
Abnormal heat generation due to abnormal cooling or overcurrent of the linear motor. Therefore, it is necessary to adopt a system configuration capable of avoiding such heat generation, and the most reliable method is to detect the temperature of the coil of the linear motor and stop the system when there is an abnormality.

In order to detect the temperature abnormality of a conventional linear motor,
A method of directly detecting the temperature rise of the coil by embedding the temperature sensor in the linear motor, or if it is difficult to embed the temperature sensor, attach the temperature sensor to the frame where the linear motor coil is mounted A method of detecting the temperature rise of the motor, and a method of detecting the temperature abnormality by monitoring the coil voltage and current and calculating the coil temperature from the coil resistance value instead of measuring the temperature of the linear motor. Has been adopted.

[0004]

However, in the case of a polyphase coil type linear motor, it becomes difficult to apply the above-described coil temperature detection methods, especially as the size of the apparatus increases and the number of phases increases. In the method of embedding a temperature sensor in a linear motor, a temperature sensor must be attached to each of the multi-phase coils. For example, in a linear motor having 20 coils, it is necessary to draw out 40 sensor wires. With such a structure, mounting is difficult, and even if it is implemented, the reliability will be reduced.

[0005] Further, the same applies to a method of providing a temperature sensor on a frame on which a coil is mounted, and the amount of heat generated increases as the size of the device increases, so that the thermal environment of the device is disturbed due to a rise in the temperature of the linear motor. In recent years, in order to prevent this, linear motors are often used by being enclosed in a refrigerant. In this case, it is difficult to detect an increase in temperature even if a temperature sensor is provided in the frame.

Also, in the method of obtaining the coil resistance from the voltage and current of the coil, when the positioning table is actually driven, it is almost always driven by issuing a trapezoidal speed pattern command. In the (acceleration and deceleration regions), it is difficult to measure the coil resistance from the voltage and current because the induced electromotive force is generated in the coil. Even if the induced electromotive force is calculated from the command value and corrected, the coil resistance is corrected. Even if it is found, there are many errors, and it is a matter of reliability. In addition, trapezoidal flat part (constant velocity area)
In this case, almost no current flows in a recent air bearing stage, so that it becomes difficult to measure the coil resistance from the voltage and current.

The present invention has been made in view of the above-mentioned unsolved problems of the prior art, and has been made in consideration of the above-mentioned problems. An object of the present invention is to provide an exposure apparatus capable of providing a motor and stopping the apparatus in a stable state even when a failure of a motor driver or a runaway of a control unit occurs, using the polyphase coil type linear motor. Things.

[0008]

In order to achieve the above object, a polyphase coil type linear motor according to the present invention comprises a stator having a plurality of coils arranged in parallel and a mover movable along a coil array. In the phase coil type linear motor, the coil temperature detecting conductor is arranged so as to be in contact with the plurality of coils or in the vicinity of the plurality of coils.

In the polyphase coil type linear motor according to the present invention, the coil temperature detecting conductor is formed of a thin metal in the vicinity of a coil for detecting a temperature and a thick metal in other portions. Is preferred.

In the polyphase coil type linear motor of the present invention, the coil temperature detecting conductor is a thin film metal formed by vapor deposition or a thin film metal formed through an adhesive on a linear motor jacket holding the coil. Preferably, the thin-film metal of the coil temperature detecting conductor is formed to be narrow in the vicinity of the coil for detecting the temperature and wide in other portions.

In the polyphase coil type linear motor of the present invention, a current is applied to the coil temperature detecting conductor, a temperature is detected from a resistance of the coil temperature detecting conductor, and a temperature abnormality of the linear motor is detected based on the detected temperature. It is preferable to include a coil temperature detecting means for determining.

In the polyphase coil type linear motor according to the present invention, when the detected temperature exceeds the temperature abnormality judgment threshold value, the coil temperature detecting means can send a danger notification to a display or another control unit. It is preferable that the coil temperature detecting means is set to a plurality of thresholds for judging the temperature abnormality, and that if the detected temperature exceeds a lower threshold, the coil temperature detecting means is dangerous. It is preferable that only notification is performed, and when the detected temperature exceeds the higher threshold value, danger notification and device stop processing are performed.

Further, the exposure apparatus of the present invention provides the above-described multi-phase coil linear motor, a moving stage driven by the multi-phase coil linear motor, and projects an original pattern onto a substrate via a projection optical system. It is characterized by having exposure means for exposing.

In the exposure apparatus of the present invention, the exposure means may be of a scanning type that exposes the substrate pattern to the substrate by scanning both the substrate and the original relative to the projection optical system. preferable.

[0015]

According to the present invention, it is possible to detect a coil temperature abnormality with high reliability by a simple structure. Also, the coil temperature detecting conductor is formed thin in the vicinity of the coil for detecting the temperature and the other portions are formed. In this case, the temperature detection sensitivity can be improved by forming the film thick.

Further, when the detected temperature exceeds a threshold value for judging a temperature abnormality, a danger notification to a display unit or another control unit and / or a process of stopping the apparatus are performed, so that the motor driver can be controlled. It is possible to stop the device in a stable state even if there is a failure or runaway of the control unit, etc.In addition, by setting a plurality of thresholds for judging temperature abnormality, it is possible to Appropriate measures can be taken.

Further, a motor temperature abnormality is detected through a plurality of paths of the motor control system, and the supply of current to the motor is stopped or a display or other control unit is notified based on the detected abnormality signal. With this configuration, even if an abnormality occurs in any part of the device, it is possible to reliably prevent the device from being damaged.

[0018]

Embodiments of the present invention will be described with reference to the drawings.

FIG. 1 is a block diagram schematically showing a control system of a polyphase coil type linear motor of the present invention. FIG. 2 (a) shows a temperature detection circuit in the polyphase coil type linear motor of the present invention. FIG. 3B is a circuit diagram showing one example of the temperature detection circuit, and FIG.

In FIG. 1 and FIG. 2, a multi-phase coil type linear motor 100 is provided on a linear motor jacket (motor frame) 102 so as to be movable along a coil array with a stator composed of a plurality of coils 101 arranged in parallel. Mover (not shown), and a servo controller 106
The table mounted on the mover (not shown) moves when the motor driver 107 appropriately supplies a current to each coil in accordance with the command value from. Also, the position of the table is
It is measured by position measuring means such as an interferometer or a linear sensor (not shown), and the measurement result is
6, the position of the table is controlled with high precision.

A conductor 103 for detecting the coil temperature is arranged so as to be in contact with or near all the coils 101 of the linear motor 100, and an end of the conductor 103 is pulled out to a conductor outlet 104 and connected to a temperature detection circuit 105. I do. The conductor 103 is formed by folding a single conductive wire in order to reduce the influence of the electric field generated by the current flowing through the coil 101 and the current generated by the movement of the mover (not shown) on which the magnet is mounted. It is used as a stranded wire, and the surface of the conductor 103 is covered with an insulating film to prevent a short circuit with the coil 101.

The conductor 103 viewed from the conductor outlet 104
Can be expressed by the following equation (1). R = Ro (1 + kT) (1) where Ro is a resistance value of the conductor at a temperature T = 0 ° C., k
Is a known temperature coefficient depending on the type of conductor, and T is temperature. By rewriting the equation (1), T = (R / Ro-1) / k (2). By measuring the resistance R of the conductor 103, the temperature of the conductor 103 can be detected.

The conductor 103 for detecting the coil temperature is
Although shown as a conducting wire in FIG. 1, the present invention is not limited to the conducting wire, and is made of, for example, a thin film metal formed by vapor deposition or a thin film metal formed by an adhesive or the like on the linear motor jacket 102 holding the coil. You can also. Further, in order to increase the temperature detection sensitivity in the portion where the temperature needs to be detected in the conductor for detecting the coil temperature, the area A near the coil is made thinner as shown in FIG. Area B that does not need to be detected
In such a case, it is preferable to increase the thickness, and such a shape enables highly reliable temperature detection.
Even when a thin-film metal is used as the coil temperature detecting conductor, as shown in FIG.
Therefore, the temperature detection sensitivity can be increased by reducing the width and increasing the width in the region B where the temperature detection is not necessary.

Next, the temperature detection circuit will be described with reference to FIG.

The conductor 103 for detecting the coil temperature is a conductor
The circuit input Rin of the temperature detection circuit 105 from the outlet 104
Connected to. R₁ , R_Two , R_Three At normal operating temperature.
The same value as the resistance value of the conductor 103 is selected in advance. V₁ Is
Highly stable reference power source, C ₁ , C_Two , C_Three Is the high
The time constant of this filter is
The change is in seconds at the earliest, and the noise from the coil
To remove the effects, set aside large seconds.
Good. C₁ Is C_Two , C_Three Due to measurement variation
It is inserted to prevent the degradation of CMRR of the pic1. measurement
The output of the amplifier ic1 depends on the resistance change of the conductor 103.
Since this output changes, the output of the conductor 10 is set in advance.
Threshold level V corresponding to temperature of 3_Two (Threshold)
Is input to the comparator ic2 in which
The output Vout of the data ic2 is such that the resistance value of the conductor 103 is constant.
When it exceeds the degree, it becomes Low (see FIG. 2B). What
Contact, R_Four , R_Five Gives hysteresis to comparator ic2
This is for the purpose of providing
Reduce crop.

Although the temperature of the conductor 103 is not equal to the temperature of the coil 101, when the temperature of any one of the coils of the multi-phase coil type linear motor rises, it is disposed in contact with or close to the coil. The temperature of the conductor 103 is also increased. For example, since the upper limit of the temperature of the coil 101 is 100 ° C., when detecting the coil temperature of 80 ° C., the temperature of the conductor 103 when the coil temperature is 80 ° C. is measured in advance, and the temperature of the conductor 103 is measured. when it is the temperature to set the threshold level V ₂ to the comparator ic2 to work. Also, in the case of a multi-phase coil, even if there is an abnormality, the temperature of all coils does not usually rise, but the temperature of one of the coils usually rises. the advance by measuring the temperature rise of the temperature rise during the conductor 103, setting the threshold level V ₂ accordingly.

Output Vout of temperature detection circuit 105
Is input to the servo controller 106, and when the signal goes low, the servo controller 106 stops the table being driven and notifies an error to a display (not shown) or a higher-level control device. Although only one output Vout is provided in the temperature detection circuit 105 illustrated in FIG. 2, a plurality of comparators having different temperature settings may be provided. For example, two comparators are provided, and a threshold having a lower set temperature is provided. When the threshold level (threshold) is exceeded, a warning level is displayed as a danger (abnormal) and only the upper level is notified. When the threshold level (threshold) of the higher set temperature is exceeded, an error level is set. The device can be stopped together with the danger (abnormal) notification. As described above, by changing the processing method at the time of abnormality in accordance with the threshold level (threshold value), it is possible to perform appropriate processing in accordance with the degree of temperature rise.

In a multi-phase coil type linear motor, the coil may be sealed in a refrigerant in order to prevent the linear motor from generating heat. For example, as shown in FIG.
A non-conductive refrigerant such as Galden is passed through a gap 111 between the linear motor jacket 102 holding the coil and the coil 101 and circulated to cool the linear motor. In such a case, as shown in FIG.
The coil temperature cannot be detected properly because the temperature does not rise sufficiently just by contacting the coil. Therefore, as shown in FIG. 4, by winding the conductor 103 for detecting the coil temperature around the coil 101, or by winding it around a part of the coil 101,
A temperature rise of 3 can be obtained.

Next, an embodiment in which the multi-phase coil type linear motor provided with the above-described coil temperature detecting means is applied to a semiconductor exposure apparatus will be described with reference to FIGS.

FIG. 5 is a side view schematically showing an exposure apparatus of the present invention, FIG. 6 is a perspective view schematically showing the exposure apparatus of the present invention, and FIG. 7 is an exposure apparatus of the present invention. 3 is a block diagram of a control system of FIG.

The exposure apparatus shown in FIGS. 5 and 6 projects a part of the pattern of a reticle (original plate) on a reticle stage 1 onto a wafer (substrate) on a wafer stage 3 via a projection optical system 2. The reticle pattern is exposed on the wafer by synchronously scanning the reticle and the wafer in the Y direction relative to the projection optical system 2, and this exposure scanning is repeatedly performed on a plurality of exposure areas (shots) on the wafer. Step-and-scan type exposure apparatus which performs the movement while interposing a step movement.

The reticle stage 1 is driven by a linear motor 4 in the Y direction,
a is driven in the X direction by the linear motor 5, and the Y stage 3b is driven in the Y direction by the linear motor 6. In the synchronous scanning of the reticle and the wafer, the reticle stage 1 and the Y stage 3b are driven in the Y direction at a constant speed ratio (for example, 4: -1, where "-" indicates that the directions are opposite). It does by doing. Also, the step movement in the X direction is the X stage 3
a. A Z tilt stage (not shown) is mounted on the X stage 3a, and a wafer chuck (not shown) for holding a wafer is mounted thereon.

The wafer stage 3 is provided on a stage base 7, and the stage base 7 is supported on a floor or the like at three points via three dampers 8. The reticle stage 1 and the projection optical system 2 are provided on a barrel base 9.
Is supported on a base frame 10 placed on a floor or the like via three dampers 11 and columns 12. Although the damper 8 uses an active damper for actively damping or removing vibrations in six axial directions, a passive damper may be used or may be supported without a damper.
The exposure apparatus shown in the figure includes a distance measuring means 13 such as a laser interferometer or a micro encoder for measuring the distance between the lens barrel base 9 and the stage base 7 at three points.

In FIG. 5, reference numerals 21 and 22 denote light projecting means and light receiving means, which constitute a focus sensor, and determine whether or not the wafer on the wafer stage 3 is positioned on the focus surface of the projection optical system 2. To detect. That is, the lens barrel surface plate 9
The wafer is irradiated with light from an oblique direction by a light projecting means 21 fixed to the wafer, and the position of the reflected light is detected by a light receiving means 22 to detect the position of the wafer surface in the optical axis direction of the projection optical system 2. Is done.

Reference numeral 24 denotes a Y-direction laser interferometer for a reticle stage, into which light emitted from a laser interferometer light source (not shown) is introduced, and the light introduced into the laser interferometer 24 is converted into a beam splitter in the laser interferometer 24. (Not shown) fixed mirror in laser interferometer 24 (not shown)
And the light traveling toward the Y-direction movable mirror 26 fixed to the reticle stage 4. Y-direction movable mirror 26
Is incident on a Y-direction moving mirror 26 fixed to the reticle stage 4 through a Y-direction length measuring optical path 25. Here, the reflected light returns to the beam splitter in the laser interferometer 24 again through the Y-direction length measuring optical path 25, and is superimposed on the light reflected by the fixed mirror. Is detected, the moving distance in the Y direction is measured. The movement distance information measured in this way is fed back to a scanning control device (not shown), and positioning control of the scanning position of the reticle stage 4 is performed. Similarly, the Y stage 3b of the wafer stage 3 is controlled to position the scanning position based on the length measurement result by the wafer stage Y direction laser interferometer 23.

In such a configuration, the wafer is transferred onto the wafer stage 3 by a transfer means (not shown) through a transfer path between the two columns 12 at the front of the apparatus. Exposes and transfers a reticle pattern to a plurality of exposure regions on a wafer while repeating scanning exposure and step movement. At the time of scanning exposure, the reticle stage 1 and the Y stage 3b of the wafer stage 3 are moved in the Y direction (scanning direction) at a predetermined speed ratio, and the pattern on the reticle is scanned with the slit-shaped exposure light. By scanning the projected image on the wafer, a pattern on the reticle is exposed to a predetermined exposure area on the wafer. During the scanning exposure, the height of the wafer surface is measured by the focus sensors 21 and 22, and based on the measured values, the height and tilt of the wafer stage 3 are controlled in real time to perform focus correction. When the scanning exposure for one exposure area is completed, the X stage 3a is driven in the X direction to move the wafer stepwise, thereby positioning the wafer with respect to the start position of the other exposure area and performing the scanning exposure. The combination of the step movement in the X direction and the movement for scanning exposure in the Y direction allows each exposure apparatus to sequentially and efficiently expose a plurality of exposure areas on the wafer. , The scanning direction of either positive or negative Y, and the order of exposure to each exposure area are set.

Next, a control system of the wafer stage and the reticle stage in the exposure apparatus of the present invention will be described with reference to FIG.
This will be described with reference to FIG. FIG. 7 shows an example in which each linear motor is cooled by a cooling liquid.

The reticle stage 1 is driven in the Y direction by a polyphase coil type linear motor 4, and the position in the Y direction is measured by an interferometer 24. The wafer stage 3 is driven in the Y direction by the polyphase coil linear motor 6 and in the X direction by the polyphase coil linear motor 5. The Y direction position of the wafer stage 3 is Each is measured by the interferometer 27. 31a, 31b ...
31e is a linear motor driver, and each driver is composed of a current amplifier and a coil selection circuit. The measurement values of the interferometers 23, 24, and 27 are transmitted to the control calculation unit 35 via the interferometer interface 32. The control calculation unit 35 outputs a command value to the driver controller 34 in consideration of the drive profile at the current position of the stage. The driver controller 34 outputs an output corresponding to the command value to each of the linear motor drivers 31a, 31b... 31e.

The cooling device 37 is connected to each linear motor by a pipe 3
8, and the sensors 36a, 36
The flow rate and temperature of the cooling liquid in the piping are monitored via b... 36e. When the sensors 36a, 36b... 36e detect an abnormality in the flow rate and temperature of the cooling liquid, the cooling device 37 outputs an abnormality signal to the driver controller 34 and the control calculation unit 35. Upon receiving the abnormal signal, the control calculation unit 35 switches to emergency processing such as not receiving (outputting) the next drive command, stopping the stage, or turning off the servo, and a higher-level control unit (not shown) or display. Outputs an error to the section. Upon receiving the abnormal signal, the driver controller 34 stops the current supply and performs a measure such as applying a regenerative brake.

However, the aforementioned coolant sensor 36a,
36e are secondary sensors, and these sensors are provided on the coolant supply side.
If the temperature of the linear motor rises due to leakage of the coolant during the process, or if the coolant is flowing normally, the current exceeding the design value will be continuously applied to the linear motor due to runaway of the control unit or failure of the driver. It is not possible to detect an abnormal temperature of the linear motor such as when it flows.

Therefore, in this embodiment, a coil temperature detecting conductor is arranged so as to be in contact with a plurality of coils of each polyphase coil type linear motor or in the vicinity of the plurality of coils, and these are connected to a temperature detecting circuit 33. Then, the temperature abnormality of the linear motor is detected. The resistance output of the conductor for temperature detection provided in each polyphase coil type linear motor is input to a temperature detection circuit 33, and when the temperature of each polyphase coil type linear motor exceeds a preset temperature, an abnormal signal is generated. It outputs to the driver controller 34 and the control operation unit 35. Upon receiving the abnormal signal, the control calculation unit 35 switches to emergency processing such as not receiving (outputting) the next drive command, stopping the stage, or turning off the servo. Outputs an error to the display. Upon receiving the abnormal signal, the driver controller 34 stops the current supply and performs a measure such as applying a regenerative brake. In this way, by notifying the driver controller 34 and the control operation unit 35 of the abnormal signal doubly and taking emergency measures individually, even if the control unit runs away or the driver controller is damaged and the motor is heated, The device can be safely stopped. Also in the temperature detection circuit 33 of the present embodiment, a plurality of thresholds for judging the temperature abnormality are set, and when the set temperature exceeds the lower threshold, the warning level is set as a warning level, and only a danger (abnormal) display and a notification to a higher order are performed. In this way, when the set temperature exceeds the higher threshold value, an error level can be set as an error level and a measure to stop the device together with the danger notification can be taken. As described above, by changing the processing method at the time of abnormality according to the threshold value, it is possible to perform an appropriate measure according to the degree of temperature rise.

In the above embodiment, a scanning type exposure apparatus has been described as an exposure apparatus. However, the present invention can be applied to a stepper which does not scan a reticle, similarly to this embodiment, except that the linear motor portion of the reticle stage is eliminated. It goes without saying that you can do it.

Next, an embodiment of a device manufacturing method using the above-described exposure apparatus of the present invention will be described.

FIG. 8 shows a micro device (a semiconductor chip such as an IC or an LSI, a liquid crystal panel, a CCD, a thin film magnetic head,
2 shows a flow of manufacturing a micromachine or the like. Step 1
In (Circuit Design), a device pattern is designed. Step 2 is a process for making a mask on the basis of the designed pattern. Step 3 (wafer manufacturing)
Then, a wafer is manufactured using a material such as silicon or glass. Step 4 (wafer process) is called a pre-process,
An actual circuit is formed on the wafer by lithography using the prepared mask and wafer. The next step 5 (assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer produced in step 4, and includes an assembly process (dicing and bonding).
It includes steps such as a packaging step (chip encapsulation). In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the semiconductor device manufactured in step 5 are performed. Through these steps, a semiconductor device is completed and shipped (step 7).

FIG. 9 shows a detailed flow of the wafer process. Step 11 (oxidation) oxidizes the wafer's surface. Step 12 (CVD) forms an insulating film on the wafer surface. Step 13 (electrode formation) forms electrodes on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. Step 1
In step 5 (resist processing), a resist is applied to the wafer.
Step 16 (exposure) uses the above-described exposure apparatus to align and print the circuit pattern of the mask on a plurality of shot areas of the wafer. Step 17 (development) develops the exposed wafer. In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer.

By using such a device manufacturing method, it is possible to manufacture a highly integrated device, which has been conventionally difficult to manufacture, stably at a low cost.

[0047]

As described above, according to the polyphase coil type linear motor and the exposure apparatus using the polyphase coil type linear motor of the present invention, a highly reliable coil temperature abnormality can be detected with a simple configuration. Further, when the detected temperature exceeds a threshold value for judging a temperature abnormality, the motor is configured to perform a notification of an abnormality to a display or another control unit and / or a process of stopping the apparatus, thereby providing a motor. The apparatus can be stopped in a stable state even if a driver failure or a runaway of the control unit occurs. In addition, by setting a plurality of temperature abnormality determination thresholds, it becomes possible to take appropriate measures according to the degree of temperature rise of the coil.

[Brief description of the drawings]

FIG. 1 is a block diagram schematically showing a control system of a polyphase coil type linear motor of the present invention.

FIG. 2A is a circuit diagram showing an example of a temperature detection circuit in the polyphase coil linear motor of the present invention, and FIG.
FIG. 4 is a diagram showing a relationship between an input Rin and an output Vout in a temperature detection circuit.

FIG. 3 is a schematic diagram showing one embodiment of a coil temperature detecting conductor in the multiphase coil linear motor of the present invention.

FIG. 4 is an enlarged view showing a part of a coil portion showing another embodiment of the multi-phase coil linear motor of the present invention.

FIG. 5 is a side view schematically showing an exposure apparatus of the present invention.

FIG. 6 is a perspective view schematically showing an exposure apparatus of the present invention.

FIG. 7 is a block diagram of a control system of the exposure apparatus of the present invention.

FIG. 8 is a flowchart showing a semiconductor device manufacturing process.

FIG. 9 is a flowchart showing a wafer process.

[Explanation of symbols]

 REFERENCE SIGNS LIST 100 polyphase coil type linear motor 101 coil 102 linear motor jacket (motor frame) 103 (coil temperature detection) conductor 105 temperature detection circuit 106 servo controller 107 motor driver 1 reticle stage 2 projection optical system 3 wafer stage 3a X stage 3b Y Stage 4, 5, 6 Linear motor 7 Stage base 9 Barrel base 10 Base frame 13 Distance measuring means 21 Light emitting means 22 Light receiving means 23, 24, 27 Laser interferometer 31 (a, b ...) Linear motor driver 32 Interferometer interface 33 Temperature detection circuit 34 Driver controller 35 Control operation unit 36 (a, b ...) (for cooling liquid) sensor 37 Cooling device

Claims (10)

[Claims] 1. A multi-phase coil type linear motor including a stator having a plurality of coils arranged in parallel and a mover movable along a coil row, wherein a coil temperature detecting conductor is in contact with a plurality of coils or a plurality of coils. A multi-phase coil type linear motor, wherein the linear motor is disposed in the vicinity of a coil. 2. The coil temperature detecting conductor according to claim 1, wherein the coil temperature detecting conductor is formed of a thin metal in the vicinity of the coil for detecting the temperature and a thick metal in other portions. Polyphase coil type linear motor. 3. The coil temperature detecting conductor is a thin film metal formed by vapor deposition or a thin film metal formed through an adhesive on a linear motor jacket holding the coil. The polyphase coil type linear motor as described. 4. The coil temperature detecting conductor is formed narrow in the vicinity of a coil for detecting temperature, and is formed wide in other portions.
The polyphase coil type linear motor as described. 5. An electric current is applied to the coil temperature detecting conductor to detect a temperature from a resistance of the coil temperature detecting conductor.
2. A coil temperature detecting means for judging an abnormal temperature of the linear motor from the detected temperature.
5. The polyphase coil type linear motor according to any one of claims 4 to 4. 6. When the detected temperature exceeds the temperature abnormality determination threshold, the coil temperature detecting means performs a danger notification to a display or another control unit and / or a process of stopping the apparatus. 6. A structure according to claim 5, wherein
The polyphase coil type linear motor as described. 7. The coil temperature detecting means is provided with a plurality of thresholds for judging the temperature abnormality, and issues only a danger notification when the detected temperature exceeds the lower threshold, and sets a higher threshold for the detected temperature. 6. The multi-phase coil linear motor according to claim 5, wherein a danger notification and a device stop processing are performed when the number exceeds the limit. 8. A multi-phase coil linear motor according to claim 5, a moving stage driven by the multi-phase coil linear motor, and an original pattern through a projection optical system. An exposure apparatus comprising: an exposure unit that projects onto a substrate and exposes the substrate. 9. The apparatus according to claim 1, wherein the exposure unit is a scanning type that exposes the original pattern onto the substrate by scanning both the substrate and the original relative to the projection optical system. 9. The exposure apparatus according to 8. 10. A device manufacturing method comprising: a step of applying a photosensitive material to a substrate; a step of exposing the substrate by the exposure apparatus according to claim 8 or 9; and a step of developing the exposed substrate. Method.