TW200935123A - Apparatus and method for repairing LCD panel - Google Patents

Apparatus and method for repairing LCD panel Download PDF

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Publication number
TW200935123A
TW200935123A TW097149385A TW97149385A TW200935123A TW 200935123 A TW200935123 A TW 200935123A TW 097149385 A TW097149385 A TW 097149385A TW 97149385 A TW97149385 A TW 97149385A TW 200935123 A TW200935123 A TW 200935123A
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repair
lcd panel
vapor deposition
laser
test
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TW097149385A
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Chinese (zh)
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TWI495923B (en
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Hyun-Jung Kim
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Charm & Ci Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)

Abstract

The present invention is to provide a LCD panel repairing apparatus and method using laser to repair of defect pixels of LCD panel. The LCD panel repairing apparatus 100 of the present invention includes: a repairing desk 110 disposed on the base station 140 for placing the LCD panel 142, an X-axel moving element 120 and a Y-axel moving element 130 disposed on the repairing desk 110, a chemical gas-phase vapor deposition portion 170 used to carry out repairing operation on defect pixels and the testing pad 144 of the LCD panel 142, a probe 180 disposed by connecting with the chemical gas-phase vapor deposition portion 170 is used to check whether the repair of testing pad 144 repaired by means of the chemical gas-phase vapor deposition portion 170 is completed. The present invention is characterized in that the major repairing operation on the bad pixels of LCD panel 142 is carried out after the test repairing operation on the testing pad 144 of LCD panel 142 is carried out.

Description

200935123 六、發明說明: 【發明所屬之技術領域】 5 ❹ 10 15 ❹ 20 本發明係有關於一種LCD面板之修復裝置與方法。更 詳細言之,本發明係有關於在進行LCD面板之不良像素的 修復作業時,先對LCD面板之測試墊進行修復性能的預先 測試後,再進行修復LCD面板之不良像素,而使LCD面板 之不良率最小化的LCD面板之修復裝置與方法。 【先前技 背景技術 液晶顯示器(Liquid Crystal Display,以下簡稱LCD) 係在二玻璃薄板間注入固體與液體之中間物質的液晶,藉 由上下玻璃板上之電極的電壓差而使液晶分子之排列產生 變化而產生明暗,而顯示數字或影像之一種利用光轉換現 象的裝置。換言之,LCD係基於視頻訊號,而控制液晶之 透光率’進而顯示影像的顯示器,其包含具有排列成矩陣 狀之晶胞的液晶顯示面板,以及基於視頻訊號而控制各晶 胞之透光率的驅動電路。 在LCD生産同業者中,判定LCD面板是否不良的基 準為LCD面板中所含有不良像素的數量。在此,像素的不 良係為構成LCD面板之像素的各種訊號線容易產生短路的 情況。換言之’ LCD面板係以陣列基板、對向基板、液晶 層等等所構成’在陣列基板中,係形成有排列成矩陣形狀 之複數個像素電極、沿著複數個像素電極之行而排列之複 數個掃瞄線,以及沿著列而排列之複數個訊號線。舉例而 3 200935123 吕,在複數個訊號線當中,只要一訊號線在指定部位發生 短路’該像素即為電氣開放而成為不良。 所謂的LCD面板之修復(repair)’以將如前述之不良像 素之短路訊號線加以連結的作業來說,一般係藉由可進行 5化學乳相蒸汽沈積程序之化學氣相蒸汽沈積部而在訊號線 短路°卩位上蒸汽沈積傳導性物質,而將短路之訊號線電氣 連結。 另方面,為了充分掌握LCD面板之不良像素,必須 、>亍X像素之疋否電氣開放或短路的測定,為此,包含有 收發在該像素之電極墊上各別接觸之電氣訊號之針梢的探 針裝置是必要的。由於探針裝置係在修復大部分LCD面板 ,不良像素的裝置中與光學系同時具備藉由探針裝置修 j β掌握之不良像素的同時,藉由探針裝置可直接判斷修 復是否順利進行。 / 在乙:而$知LCD面板之修復裝置與方法係具有,針對 面板之實際修復過程中,當化學氣相蒸汽沈積部未 動作時所⑽之修復不良,無法適切處理的問題點。 之’ Μ由化學^目蒸汽沈積敎錯誤動作,無法正確 2〇 積傳導性物#、亦或是即使蒸汽沈積傳導性物質, 時,董^獲取平順電氣訊號通訊所要求之特定範圍的電阻値 別/不良像素未進行完美的修復(修復不良)的問題點。特 查二= 成之LCD面板的最終檢 Γ 目而成為LCD面板之生產率降低的原因。 I聲明内容】 200935123 本發明所欲解決之課題 因此,為了解決上述問題點之本發明係藉由在進行修 復LCD面板之不良像素之前,在LCD面板的一侧上形成 人工短路導線圖案之測試墊,並對該測試墊進行試驗修復 5作業而確認化學氣相蒸汽沈積部的動作狀態後,再對Lcd 面板之不良像素進行修復作業,而提供作為本發明目的之 使LCD面板之不良像素修復程序之不良率大幅降低的 LCD面板之修復裝置與方法。 ® 解決課題所需之元件 1〇 為了達成上述目的,本發明之LCD面板之修復裝置係 為檢測LCD面板之不良像素,並利用雷射修復不良像素的 裝置,其特徵在於包含一修復桌,其係設置放置LCD面板 之基台、X轴與Y軸移動裝置,其係設置於該修復桌上、 一化學氣相蒸汽沈積部,其係對LCD面板之不良像素與測 15試墊進行修復作業,以及一探針,其係與該化學氣相蒸汽 藝 沈積部相連設,並藉由該化學氣相蒸汽沈積部檢查該經修 復之測試墊的修復是否完成,其特徵在於,該修復裝置係 對該LCD面板之測試墊進行試驗修復作業後,再對該[CD 面板之不良像素進行主要修復作業。 2〇 該化學氣相蒸汽沈積部係可包含:一腔室,其係用於 提供在該LCD面板之不良像素上進行修復作業所需的化學 軋相蒸汽沈積空間、一雷射部,其係於藉由該腔室所提供 之空間内照射雷射,以及一光學部,其係將該雷射部所照 射之雷射的光線路徑與焦點加以控制。 5 200935123 該腔室係可包含:一氣體蒸汽沈積部,其係用於在該 LCD面板之不良像素上之指定部位提供氣體蒸汽沈積空 間、一金屬供給部,其係將用以修復的金屬粒子供給至藉 由該氣體蒸汽沈積部所提供之蒸汽沈積空間,以及一氣簾 5邠,其係用於將藉由該氣體蒸汽沈積部所提供之蒸汽沈積 空間與外部加以隔離。 •亥氣體蒸沈積部係可進一步包含一構造成雷射可通 過之窗體。 該腔室可進-步包含在該窗體之表面上提供模糊氣體 10之模糊氣體供給部。 本發明之LCD面板之修復方法係檢測LCD面板之不 良像素,並利用雷射修復不良像素,其特徵在於包含下列 步驟(a)對LCD面板之測試塾進行試驗修復作業之步驟、 (b)對該經修復之測試墊進行檢查修復是否完成之步驟,以 15及⑷對該LCD面板之不良像素進行主要修復作業之步驟。 該試驗與與主要修復作業係可利用化學氣相蒸汽沈積 法來進行。 °玄檢查作業係可利用探針接觸之電阻測定法來進行。 可藉由該試驗修復作業所決定之最佳修復條件來進行 20 該主要修復作業。 發明的效果 藉由上述構成之本發明,係對設置於LCD面板一側上 之測试墊進行試驗修復作業後,再藉由探針檢查測試墊的 修復疋否凡成,在試驗修復作業被判斷為正常進行的情況 200935123 下,藉由對LCD域之不良像素進行主要修復作業,而旦 有使修復作業之不良率大幅降低的效果。 【實施方式1 用以實施本發明之最佳形態 5 Ο 10 15 Ο 20 以下’將參照_而詳細說明本發明之構成。 第1圖係赫本發m例之LCD面板之修復裝置 1〇〇之構成的分解斜視圖與完成圖。如第1圖所示,lcd 面板之修復裝置刚係包含修復桌110、X軸移動部120 與Y轴移動部130、基台14〇、化學氣相蒸汽沈積部17〇, 以及探針180而構成。再者,化學氣相蒸汽沈積部—係 包含腔室200、雷射部172,以及第1光學部174而構成。 首先’利用金屬材質之角度框架所製得之修復桌n〇 係在自外部施加振動或衝擊亦不會搖動下固設於地面。修 復桌110之上面係使之平坦,以利於設置進行程序之裝置。 修復桌110之上面之上側以及下側之兩端,含有形成 直線狀之一對X軸執道的X軸移動部120係相互連動地設 置。X轴移動部12〇係藉由馬達(未顯示於圖中)之驅動力而 沿兩X轴軌道移動。再者,修復桌110之上面,亦設置含 有Y轴支持台之Y軸移動部130。X軸移動部120之兩軌 道,係與形成直線狀之γ軸支持台的兩端相連設。因此, 移動冑130之Υ軸支持台係為藉由X軸移動部120之 動作而设置為可在修復桌110之上部沿X軸方向移動。 Υ袖移動部130係設置有化學氣相蒸汽沈積部170。此 化學氣相蒸汽沈積部170係藉由馬達(未顯示於圖中)之驅 7 200935123 動力並藉由動作之200935123 VI. Description of the invention: [Technical field to which the invention pertains] 5 ❹ 10 15 ❹ 20 The present invention relates to a repair apparatus and method for an LCD panel. More specifically, the present invention relates to pre-testing the repair performance of the test pads of the LCD panel after performing the repair operation of the defective pixels of the LCD panel, and then repairing the defective pixels of the LCD panel, thereby making the LCD panel A repair device and method for an LCD panel with a minimized defect rate. [Liquid Crystal Display (LCD) is a liquid crystal in which an intermediate substance of a solid and a liquid is injected between two glass sheets, and the arrangement of liquid crystal molecules is generated by the voltage difference between the electrodes on the upper and lower glass sheets. A device that uses light conversion phenomena to display light or darkness while displaying a number or image. In other words, the LCD is based on a video signal, and controls the transmittance of the liquid crystal to further display an image, the liquid crystal display panel having the unit cells arranged in a matrix, and controlling the transmittance of each unit cell based on the video signal. Drive circuit. Among LCD manufacturers, the basis for determining whether the LCD panel is defective is the number of defective pixels contained in the LCD panel. Here, the defect of the pixel is a case where various signal lines constituting the pixels of the LCD panel are likely to be short-circuited. In other words, 'the LCD panel is formed by an array substrate, a counter substrate, a liquid crystal layer, or the like.' In the array substrate, a plurality of pixel electrodes arranged in a matrix shape are formed, and a plurality of pixel electrodes are arranged along a row of a plurality of pixel electrodes. A scan line, and a plurality of signal lines arranged along the column. For example, 3 200935123 Lv, in a plurality of signal lines, as long as a signal line is short-circuited at a specified location, the pixel is electrically open and becomes defective. The so-called "repair" of the LCD panel is generally performed by a chemical vapor phase vapor deposition portion capable of performing a chemical emulsion vapor deposition process in which the short-circuit signal lines of the defective pixels are connected. The signal line is short-circuited. The conductive material is vapor deposited on the clamp, and the short-circuit signal line is electrically connected. On the other hand, in order to fully grasp the defective pixels of the LCD panel, it is necessary to measure whether the X-pixels are electrically open or short-circuited. For this purpose, the pin headers of the electrical signals respectively received and received on the electrode pads of the pixels are included. A probe device is necessary. Since the probe device is used to repair most of the LCD panels and the defective pixels, the optical system has the defective pixels grasped by the probe device, and the probe device can directly judge whether the repair is successful. / In B: The repair device and method of the LCD panel have problems in the actual repair process of the panel, when the chemical vapor deposition part is not operating (10), the repair is poor and cannot be properly handled. The ' Μ 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学 化学Don't/bad pixels don't have a perfect fix (bad repair). Special check 2 = Final inspection of the LCD panel has become the cause of the decrease in productivity of the LCD panel. I declare the content] 200935123 The problem to be solved by the present invention Therefore, in order to solve the above problems, the present invention is a test pad for forming a artificial short-circuited conductor pattern on one side of an LCD panel before repairing defective pixels of the LCD panel. After the test pad is repaired and the operation of the chemical vapor deposition portion is confirmed, the defective pixel of the Lcd panel is repaired, and the defective pixel repairing process for the LCD panel is provided as the object of the present invention. A repair device and method for an LCD panel having a significantly reduced defect rate. ® The components required for solving the problem 1 In order to achieve the above object, the repairing device for an LCD panel of the present invention is a device for detecting defective pixels of an LCD panel and repairing defective pixels by using a laser, characterized in that it comprises a repairing table, The base station, the X-axis and the Y-axis moving device for placing the LCD panel are disposed on the repair table, and a chemical vapor deposition layer is used for repairing the defective pixels of the LCD panel and the test pad 15 And a probe connected to the chemical vapor vapor deposition portion, and checking whether the repair of the repaired test pad is completed by the chemical vapor deposition portion, characterized in that the repair device is After the test repair work of the test pad of the LCD panel is performed, the main repair operation of the defective pixel of the [CD panel] is performed. The chemical vapor deposition layer may comprise: a chamber for providing a chemical rolling vapor deposition space required for repair work on the defective pixel of the LCD panel, and a laser portion The laser is irradiated by the space provided by the chamber, and an optical portion is controlled by the light path and focus of the laser irradiated by the laser portion. 5 200935123 The chamber system may include: a gas vapor deposition portion for providing a gas vapor deposition space at a designated portion on the defective pixel of the LCD panel, and a metal supply portion for metal particles to be repaired It is supplied to the vapor deposition space provided by the gas vapor deposition portion, and an air curtain 5 is used to isolate the vapor deposition space provided by the gas vapor deposition portion from the outside. • The gas vapor deposition section may further comprise a window configured to pass through the laser. The chamber may further comprise a fuzzy gas supply providing a fuzzy gas 10 on the surface of the window. The repair method of the LCD panel of the present invention detects defective pixels of the LCD panel and repairs defective pixels by using the laser, and is characterized by the steps of (a) performing a test repair operation on the test panel of the LCD panel, and (b) The repaired test pad performs the steps of checking whether the repair is completed, and steps 15 and (4) perform the main repair operation on the defective pixels of the LCD panel. This test and the main repair operation can be carried out by chemical vapor deposition. The quaint inspection operation can be performed by the resistance measurement method of the probe contact. This major repair operation can be performed by the best repair conditions determined by the test repair work. Advantageous Effects of Invention According to the present invention, the test pad provided on one side of the LCD panel is subjected to a test repair operation, and then the repair of the test pad by the probe is performed, and the test repair work is performed. When it is judged that the operation is normal, 200935123, the main repair operation for the defective pixels in the LCD domain is performed, and the defect rate of the repair operation is greatly reduced. [Embodiment 1] BEST MODE FOR CARRYING OUT THE INVENTION 5 Ο 10 15 Ο 20 Hereinafter The configuration of the present invention will be described in detail with reference to _. Fig. 1 is an exploded perspective view and a completed view of the repairing device of the LCD panel of the example of Heben. As shown in FIG. 1, the repairing device of the lcd panel includes the repairing table 110, the X-axis moving part 120 and the Y-axis moving part 130, the base 14〇, the chemical vapor deposition part 17〇, and the probe 180. Composition. Further, the chemical vapor deposition layer includes a chamber 200, a laser portion 172, and a first optical portion 174. First, the repair table made by the angle frame of the metal material is applied to the ground without applying vibration or impact from the outside. The top of the repair table 110 is flattened to facilitate the installation of the program. The both sides of the upper side and the lower side of the upper surface of the repair table 110 are provided so as to be interlocked with each other, including one of the linear axes and the X-axis moving portions 120. The X-axis moving portion 12 is moved along the two X-axis trajectories by the driving force of a motor (not shown). Further, on the upper surface of the repair table 110, a Y-axis moving portion 130 including a Y-axis support table is also provided. The two tracks of the X-axis moving portion 120 are connected to both ends of the linear γ-axis support table. Therefore, the x-axis support table of the moving cassette 130 is set to be movable in the X-axis direction on the upper portion of the repair table 110 by the action of the X-axis moving portion 120. The cuff moving portion 130 is provided with a chemical vapor deposition portion 170. The chemical vapor deposition portion 170 is powered by a motor (not shown) and is actuated by action.

轴支持台之丫轴方 動部13(3 ’而成為可移動於沿Y 170時,Y軸移動部丨:此’於設置:學氣相蒸汽沈積部 度框架或金屬材=Y軸支持台上’係設置利用角 ,同時,化學〜輪廓(Pr〇fUe)等等製作所得之台座 学乳相蒸汽沈積部17〇係藉 設置於Y轴移動部 *由此口座160而 ° 0之γ轴支持台上。化$帛# Y + 積部no之組袈狀態 化干礼相糾沈 ^貫例係例不於第2圖中。 10 15 馬達二=,x、軸移動部120與γ軸移動部13°係藉由 ❿分別動作’而使修復桌u 相蒸汽沈積部軸移動成為可^之化子乳 在藉由修復桌m兩端所設置之x_動部120之兩 X轴軌道所提供的空間,係設置有放置:二2 =台-〜所示,…CD:二 -ΤΓΠ 面板所構成,在最終段階,係將各別之單 凡面板加以分離而使用。此係為用以提高㈣面板 之生産率,參照第 _ *’、、 圖,在1號製造程序中,係可生產8 個早疋LCD面板。 +基σ 140係配設在設置有Y軸移動部130之化 々蒸'飞沈積邛170的下部位置,而以不影響化學氣相 蒸Η沈積部17〇之動作為佳。再者,在基台⑽上,由於 △置後述之LCD面板142,即使在LCD面板I42放置於 〇上的狀態下,化學氣相蒸汽沈積部H亦必須可 圓滑地動作。 有關在Y軸移動# 13〇所設置之化學氣相蒸汽沈積部 20 200935123 170的構成,將於以下詳述。 首先,用於供給進行化學氣相蒸汽沈積程序所需之金 屬氣體與氣簾用惰性氣體的氣體供給部150係設置於γ轴 移動部130。如第!圖所示,雖然,γ轴移動部13〇之γ 5軸支持台一側上係配設有氣體供給部150,而可於後述腔室 200供給氣體,在不影響X軸移動部120與Y軸移動部130 之動作下’可於裝置外部另外設置氣體供給部150。 Y軸移動部130上,利用金屬材質之角度框架等等所 製作之台座160上所設置之化學氣相蒸汽沈積部17〇係設 10置為可沿γ軸支持台移動。 台座160之上部係設置有雷射部172。雷射部172係可 使用脈衝雷射或連續波(Continuous Wave,cw)雷射,因 應修復作業,輸出亦為可變的。 台座160之中間部,係設置有用於控制自雷射部I?] 15所照射之雷射光線路徑與焦點之諸如光束分光鏡、透鏡' 慮光鏡之光學機構所構成的第1光學部174。 台座160之下段的一側上,對藉由化學氣相蒸汽沈積 部170所修復之LCD面板142之測試墊144進行修復是否 凡成檢查之探針180係藉由z軸移動部182而設置為可移 20動於上下(2軸)方向。Z軸移動部182係藉由馬達之驅動力 而動作,並使探針180上下移動。探針18〇係包含有與LCD 面板142之測試墊144相接觸之探測卡184與觀測此探測 卡之接觸狀態等等之第2光學部181。 再者,藉由與氣體供給部15〇相連結之氣體供給管線, 9 200935123 利用自外部所供給之氣體,在LCD面板142之指定位置上 : k供化學氣相蒸汽沈積程序所需之空間的腔室200亦設置 於台座160下段的一側上。 第3A圖與3B圖係顯示探測卡184之構成。第3A圖 5係顯示探測卡184之構成的平面圖,而第3B圖係第3A圖 所示之探測卡184,自A方向所見之侧面圖。 如第3A圖與3B圖所示,探測卡184係具有,在與pCB 相對應之主要基板的中央上,設置有與LCD面板142之測 試墊144相接觸的針梢186的構成。雖然,針梢186係以 0 10各8個呈2列對向設置而總數共為16個,然而,此係可依 據欲進行檢查之LCD面板142之測試墊144的狀態而加以 變更。針梢186係具有與“「”模様相近之針狀,材質以諸 如鎢之高強度金屬來製作為佳。在針梢186之與測試墊144 ' 相接觸側的端部係以圓錘狀或圓筒狀為佳。為了檢查測試 15墊I44之修復是否完成,針梢186之與測試墊144相接觸 側的另一側係與外部的訊號線(未顯示於圖中)相連結。 探測卡184係於呈對向之針梢186的兩側上設置有邊 Ο 緣感測器188。此邊緣感測器188係用於作為識別針梢186 與LCD面板142之測試墊144是否正確地相接觸著的功能。 20 第4A圖係顯示化學氣相蒸汽沈積部170之腔室200 之構成的斜視圖,而第4B圖係顯示腔室2〇〇之内部構成的 部分切取圖。又,第4C圖係顯示腔室2〇〇之構成的載面圖。 腔室200係由整體形成圓形狀之腔室本體21〇、為了在 化學氣相蒸汽沈積部170之下部的一側上裝設腔室2〇〇而 10 200935123 '固定於腔室本體210之一側上的安裝架212所構成。安敦 架212係可容易地將腔室200固定於台座16〇之一側上。 在腔室本體210的中央,係形成有用於提供進行化學 氣相蒸汽沈積程序所需空間之圓筒狀的氣體蒸汽沈積部 5 220 ’在氣體蒸》V’尤積部220之上部’係設置有將氣體蒸汽 沈積部220與外部大氣相隔離之窗體222。此時,自雷射部 172所照射之雷射光束係通過窗體,而進行雷射化學氣相蒸 汽沈積程序之同時,用於進行修復作業之窗體222係以諸 © 如石英之透明材質所形成為佳。 10 15 ❹ 20 在腔室本體210之兩側±,為了在LCD面板142之指 定部位上供給金屬粒子,以對不良像素進行修復程序,^ 分別設置有金屬供給管214a與金屬排出f 21扑。此時,經 由金屬供給管214a所供給之金屬粒子係以嫣(w)為佳。、 金屬供給管2Ma係與形成在氣體蒸汽沈積部22〇之一 侧上之金屬供給° 2咏相連結,金屬排出管214b係與形 成在氣體蒸汽沈積部22G之周圍㈣成為環狀之金屬排出 溝测相連結。因此,透過金屬供給口 2i4c而供給,且 在化學氣相蒸汽沈積_使用之金屬粒子以及在化學氣相 蒸汽沈積日寺所產生之副產物係經由金屬排出溝⑽與 排出管214b而排出至外部。 在腔室本體210之兩側上,為了不使經由金屬供給管 ⑽與金屬排出管⑽所供給之金屬粒子漏出至外部,同 時為了供給形成防止包含料部大氣内之異物侵入而血金 屬粒子進行反應之氣簾的惰性氣體,係分職置有將氣簾 11 200935123 形成時所使用之惰性氣體排出至外部的氣簾供給管216仏 氣簾排氣管216b。此時,所供給之惰性氣體,係以使用氩 (Ar)為佳。 經由氣簾供給管2l6a所供給之惰性氣體係經由形成在 5腔室本體2H)之下部側上的氣簾供給溝21&排出後,於氣 簾排氣溝216d加以回收’之後再經由氣簾排氣管而 排出至外部。 氣簾供給溝216c與氣簾排氣溝216d係分別形成環 狀,且相互為同心圓狀。 0 10 #此,以使用氣簾方式之氣體喷射方式,在大氣中亦 可進行化學氣相蒸汽沈積程序。 於此,氣簾供給溝216c與氣簾排氣溝216d係與金屬 - 排出溝214d形成同心圓狀,而氣體蒸汽沈積部22〇係位於、.-中心位置上。 · 15 另一方面,以氣體蒸汽沈積部220進行蒸汽沈積程序 時’在氣體蒸汽沈積部220之上部側所設置之窗體222亦 進行蒸汽沈積,由於此會妨礙雷射之通過,因此,為了防 ◎ 止在窗體222發生蒸汽沈積而供給模糊氣體。為此,腔室 本體210之一側上係設置模糊氣體供給管2i8a,其係與在 2〇氣體蒸汽沈積部220之上段部所設置之㈣瓜相對,而 可喷射模糊氣體。 有關利用前述構成之LCD面板之修復裝置1〇〇所進行 之本發明LCD面板之修復方法’將參照第5圖至第8圖加 以説明。 12 200935123 在修復桌lio之上部放置基台14〇後,在基台14〇上 設置由複數解元LCD面板所形叙LCD面板142。 5 10 15 Ο 20 在LCD面板142之一側上,係形成有用於對j^cd面 板142之不良像素進行試驗修復作業之測試墊144。此時, 測试塾144係在LCD面板142之整體區域中,以形成於 LCD製作過程巾將被廢棄之區域為佳。 一在將LCI)面板142設置於基台14〇後,使化學氣相蒸 汽沈積部17G進行動作而對LCD面板142之不良像素進行 修復(主要修復)作業。 此時,在進行主要之修復作業前,優先進行對在IXD 面板142之側上所形成之測試墊144的修復(試驗修復) 作業。為此,在確認測試塾144之配線狀態後使χ轴移 動部120與Υ軸移動畜Μ3〇進行動作,而使腔冑2〇〇移動 於測試墊144之正上方(參照第5圖)。 第6Α圖係顯示在LCD面板142之一側上所設置之測 試墊144的一實例。如第6A圖所示,係形成與測試墊144 相對之複數對短路之訊號線a〜g。測試墊144係由全部8 組訊號線a〜g所構成。此係與第3A圖所示之由8組針梢 186所構成之探測卡184為相對應物。然而,如前所述測 試墊184之訊號線的數量亦可依據需求進行變更。又,測 試墊144之訊號線a〜g的數量與探測卡184之針梢186的 數量以相同為佳。 將腔室200放置於測試墊144之上方後,在於腔室2〇〇 供給金屬氣體與氣簾用惰性氣體之同時,經由在腔室本體 13 200935123 210之中央所开>成之軋體蒸汽沈積部220而製作進行化學 - 氣相蒸汽沈積程序之環境,而進行試驗修復作業。在化學 氣相蒸η//尤積程序中,自雷射部172所發射之雷射係通過 設置在腔室本體210之窗體222,而照射於欲進行測試墊 5 144之試驗修復作業的部位上。此時,雷射係藉由在第1 光學部174所設置之光學機構(光束分光鏡、透鏡等等)而引 導至必要的位置。 第6Β圖係顯示完成試驗修復作業時,測試墊144的狀 態。如第6Β圖所示,藉由試驗修復作業,在第6α圖中, 〇 10短路之訊號線a〜g間蒸汽沈積傳導性物質140,而使訊號 線a〜g相互連結。雖然,在試驗修復過程中,蒸汽沈積之 傳導性物質146的種類並未特別制限,但以與主要修復過 程中所使用之傳導性物質相同為佳。 、' 另一方面,在試驗修復作業中,藉由化學氣相蒸汽沈 15積部丨7〇之化學氣相蒸汽沈積條件係以測試墊144之各訊 號線a〜g分別不同為佳。此乃由於,基於化學氣相蒸汽沈 積條件所蒸汽沈積之傳導性物質的電阻値會產生變化的緣 故’因此,藉由主要修復作業所修復之訊號線係以LCD面 板實際上所要求之最適電阻値來設定最適的化學氣相蒸汽 20 沈積條件(例如,蒸汽沈積壓力、蒸汽沈積速度、雷射強度、 雷射焦點距離等等)。 一但完成試驗修復作業,如第7圖所示,使Z軸移動 部182動作,而使探針180與測試墊144相接觸之後,藉 由對測試墊144之訊號線a〜g測定電阻,檢查對測試墊144 14 200935123 之修復是否正常進行,而取得顯 復時所適㈣化學氣相蒸汽沈積條件。値之訊號線修 其次,以與第7圖之過程 汽沈積條件相同的條件,對LCD 狀最軌學氣相蒸 5 e 10 15 ❹ 20 修復(主要修復)作業。為此’ χ軸移動部η:與良 ::=::Γ室200移動至作為進行主要修復 == 指定位置上(參照第8圖)。 由於主要純時之化學氣相蒸汽沈積部17G ) 述試驗修復岐有差異,因Μ略其詳細制。〜』 藉此’在本發明中’在對LCD面板m之—側上所設 置之測試墊144進行試驗修復作業後,藉由探針⑽檢^ 測試塾144之修復是讀所取得之最適化學氣 相蒸汽沈積條件相同條件,對LCD面板之不良像素進行主 要修復作業’可具有使修復作業之不良率大幅降低的優 點。因此,可以說本發明具有高度的産業利用性。 另外,雖然已說明本發明之最佳實施形態,在不脫離 本發明之要旨的範圍内,參照此項技術領域之技術可進行 各種變化。因此,本發明之技術的範圍係非限制於上述之 實施形態,而應以申請專利範圍之記載及與其相等之物所 界定者。 【圖式簡單说明】 第1圖係顯示本發明一實施例之LCD面板之修復襄置 之構成的分解斜視圖與完成圖。 第2圖係顯示化學氣相蒸汽沈積部之一例之構成的斜 15 200935123 視圖圖。 第3A圖係顯示探剛卡之構成的平面圖。 第3B圖係第3A圖所示之探測卡自a方向所見的側面 圖。 5 第4A圖係顯示化學氣相蒸汽沈積部之腔室之構成的 斜視圖。 第4B圖係顯示化學氣相蒸汽沈積部之腔室内部構成 的部分切取圖。 第4C圖係顯示化學氣相蒸汽沈積部之腔室之構成的 10 截面圖。 第5圖係顯示本發明一實施例之LCD面板之修復方法 的構成。 第6A圖係顯示本發明一實施例之LCD面板之修復方 法的構成。 15 第6B圖係顯不本發明一實施例之LCD面板之修復方 法的構成。 第7圖係顯示本發明一實施例之LCD面板之修復方法 的構成。 第8圖係顯示本發明一實施例之LCD面板之修復方法 20 的構成。 【主要元件符號說明】 100 LCD面板之修復裝置 130 Y軸移動部 110修復桌 140基台 120 X軸移動部 142 LCD面板 16 200935123 144 測試塾 210 腔室本體 146 傳導性物質 212 安裝架 150 氣體供給部 214a 金屬供給管 160 台座 214b 金屬排出管 170 化學氣相蒸汽沈積部 214c 金屬供給口 172 雷射部 214d 金屬排出溝 174 第1光學部 216a 氣簾供給管 180 探針 216b 氣簾排氣管 181 第2光學部 216c 氣簾供給溝 182 Z軸移動部 216d 氣簾排氣溝 184 探測卡 218a 模糊氣體供給管 186 針梢 220 氣體蒸汽沈積部 188 邊緣感測器 222 窗體 200 腔室 17The shaft support portion 13 of the shaft support table (3' becomes movable along the Y 170, the Y-axis movement portion 丨: this 'in the setting: the vapor phase vapor deposition degree frame or the metal material = Y-axis support table The upper set system uses the angle, and at the same time, the pedestal milk phase vapor deposition portion 17 produced by the chemical-contouring (Pr〇fUe) or the like is disposed on the Y-axis moving portion* by the mouth 160 and the γ axis of the 0 Supporting the stage. The group of 帛$帛# Y + 积部 no 袈 化 干 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 10 The moving portion 13° moves the axis of the steam deposition portion of the repair table by the action of the ❿ respectively to become the two X-axis tracks of the x-moving portion 120 provided by the ends of the repair table m The space provided is set to be placed: two 2 = table - ~, ... CD: two - ΤΓΠ panel, in the final stage, the separate panels are used separately. This is used In order to improve the productivity of the (4) panel, refer to the _*', and the figure, in the No. 1 manufacturing process, it is possible to produce 8 early LCD panels. It is preferable to provide the lower portion of the vapor deposition 'flying deposition crucible 170 of the Y-axis moving portion 130, and to prevent the chemical vapor vapor deposition portion 17 from being affected. Further, on the base (10), due to the Δ setting In the LCD panel 142 described later, the chemical vapor deposition portion H must be smoothly operated even when the LCD panel I42 is placed on the crucible. The chemical vapor deposition portion is provided in the Y-axis movement #13〇. The structure of the 200935123 170 will be described in detail below. First, the gas supply unit 150 for supplying the metal gas required for the chemical vapor deposition process and the inert gas for the curtain is provided in the γ-axis moving unit 130. As shown in the figure, the gas supply unit 150 is disposed on the γ 5-axis support stage side of the γ-axis moving unit 13〇, and the gas can be supplied to the chamber 200 to be described later without affecting the X-axis moving unit 120. Under the operation of the Y-axis moving portion 130, a gas supply portion 150 may be additionally provided outside the device. The Y-axis moving portion 130 is provided with a chemical vapor deposition portion provided on a pedestal 160 made of a metal angle frame or the like. 17〇 is set to 10 to be along The shaft support table moves. The upper portion of the pedestal 160 is provided with a laser portion 172. The laser portion 172 can use a pulsed laser or a continuous wave (cw) laser, and the output is also variable in response to the repair work. The intermediate portion of the pedestal 160 is provided with a first optical portion 174 formed by an optical mechanism such as a beam splitter or a lens 'illuminator for controlling the laser beam path and the focus from the laser portion I? The test pad 144 of the LCD panel 142 repaired by the chemical vapor deposition portion 170 is repaired on the side of the lower portion of the pedestal 160. The probe 180 is set by the z-axis moving portion 182. Move 20 in the up and down (2 axis) direction. The Z-axis moving portion 182 is operated by the driving force of the motor to move the probe 180 up and down. The probe 18 includes a second optical portion 181 including a probe card 184 that is in contact with the test pad 144 of the LCD panel 142, a contact state in which the probe card is observed, and the like. Further, by the gas supply line connected to the gas supply unit 15 , 9 200935123 utilizes the gas supplied from the outside at a specified position of the LCD panel 142: k for the space required for the chemical vapor deposition process The chamber 200 is also disposed on one side of the lower section of the pedestal 160. Figures 3A and 3B show the construction of the probe card 184. Fig. 3A is a plan view showing the configuration of the probe card 184, and Fig. 3B is a side view of the probe card 184 shown in Fig. 3A as seen from the direction A. As shown in Figs. 3A and 3B, the probe card 184 has a configuration in which a needle tip 186 which is in contact with the test pad 144 of the LCD panel 142 is provided at the center of the main substrate corresponding to the pCB. Although the needle tips 186 are arranged in two rows of 0 and 10, and the total number is 16 in total, this can be changed depending on the state of the test pad 144 of the LCD panel 142 to be inspected. The needle tip 186 has a needle shape similar to that of the """, and the material is preferably made of a high-strength metal such as tungsten. The end portion of the needle tip 186 on the side in contact with the test pad 144' is preferably a round hammer or a cylindrical shape. To check if the repair of the test pad 15 is completed, the other side of the tip 186 that is in contact with the test pad 144 is coupled to an external signal line (not shown). The probe card 184 is provided with a side edge sensor 188 on both sides of the opposite needle tip 186. This edge sensor 188 is used as a function of identifying whether the needle tip 186 and the test pad 144 of the LCD panel 142 are in proper contact. 20 Fig. 4A is a perspective view showing the configuration of the chamber 200 of the chemical vapor deposition portion 170, and Fig. 4B is a partial cutaway view showing the internal structure of the chamber 2'. Further, Fig. 4C is a plan view showing the configuration of the chamber 2A. The chamber 200 is formed by integrally forming a circular chamber body 21〇, for mounting a chamber 2 on one side of the lower portion of the chemical vapor deposition portion 170, and 10200935123' is fixed to one of the chamber bodies 210. The mounting bracket 212 on the side is formed. The Anton frame 212 can easily secure the chamber 200 to one side of the pedestal 16 。. In the center of the chamber body 210, a cylindrical gas vapor deposition portion 5 220 ' is provided for providing a space required for the chemical vapor deposition process, and the gas is vaporized. There is a window 222 that separates the gas vapor deposition portion 220 from the external atmosphere. At this time, the laser beam irradiated from the laser portion 172 passes through the window to perform the laser chemical vapor deposition process, and the form 222 for repair work is made of a transparent material such as quartz. It is formed as well. 10 15 ❹ 20 On both sides of the chamber body 210, in order to supply metal particles to a predetermined portion of the LCD panel 142, a repair process for defective pixels is performed, and a metal supply tube 214a and a metal discharge f 21 are respectively provided. At this time, the metal particles supplied through the metal supply pipe 214a are preferably 嫣(w). The metal supply pipe 2Ma is connected to a metal supply 2 咏 formed on one side of the gas vapor deposition portion 22, and the metal discharge pipe 214b is formed in a ring-shaped metal formed around the gas vapor deposition portion 22G. The ditch test is connected. Therefore, it is supplied through the metal supply port 2i4c, and the metal particles used in the chemical vapor deposition and the by-products generated in the chemical vapor deposition of the Japanese temple are discharged to the outside through the metal discharge groove (10) and the discharge pipe 214b. . On the both sides of the chamber body 210, the metal particles supplied through the metal supply tube (10) and the metal discharge tube (10) are not leaked to the outside, and the blood metal particles are prevented from being formed in order to prevent the intrusion of foreign matter in the atmosphere of the containing portion. The inert gas of the air curtain of the reaction is divided into a curtain supply pipe 216b which discharges the inert gas used when the air curtain 11 200935123 is formed to the outside. In this case, it is preferred to use argon (Ar) as the inert gas to be supplied. The inert gas system supplied through the air curtain supply pipe 216a is discharged through the air curtain supply groove 21 & formed on the lower side of the five-chamber main body 2H), and then recovered in the air curtain exhaust groove 216d, and then passed through the air curtain exhaust pipe. Drain to the outside. The air curtain supply groove 216c and the air curtain exhaust groove 216d are each formed in a ring shape and are concentric with each other. 0 10 #This, in the gas jet method using the air curtain method, the chemical vapor deposition process can also be performed in the atmosphere. Here, the air curtain supply groove 216c and the air curtain exhaust groove 216d form a concentric shape with the metal-discharge groove 214d, and the gas vapor deposition portion 22 is located at a center position. On the other hand, when the vapor deposition process is performed by the gas vapor deposition unit 220, the form 222 disposed on the upper side of the gas vapor deposition portion 220 is also vapor-deposited, since this may hinder the passage of the laser, and therefore, The ZZ is vapor-deposited on the window 222 to supply a fuzzy gas. To this end, a fuzzy gas supply pipe 2i8a is provided on one side of the chamber body 210, which is opposed to the (iv) melon disposed at the upper portion of the gas vapor deposition portion 220, and the vague gas can be ejected. The repairing method of the LCD panel of the present invention by the repairing apparatus 1 of the above-configured LCD panel will be described with reference to Figs. 5 to 8. 12 200935123 After the base 14 is placed on the upper part of the repair table lio, the LCD panel 142 is formed on the base 14 by a plurality of LCD panels. 5 10 15 Ο 20 On one side of the LCD panel 142, a test pad 144 for performing a test repair operation on defective pixels of the j^cd panel 142 is formed. At this time, the test cassette 144 is attached to the entire area of the LCD panel 142 to be formed in an area where the LCD manufacturing process towel is to be discarded. After the LCI panel 142 is placed on the base 14 ,, the chemical vapor deposition section 17G is operated to repair (mainly repair) the defective pixels of the LCD panel 142. At this time, the repair (test repair) operation of the test pad 144 formed on the side of the LCD panel 142 is preferentially performed before the main repair work is performed. Therefore, after confirming the wiring state of the test cartridge 144, the x-axis moving portion 120 and the x-axis moving animal 3 are operated, and the cavity 2 is moved directly above the test pad 144 (refer to Fig. 5). The sixth drawing shows an example of the test pad 144 provided on one side of the LCD panel 142. As shown in Fig. 6A, signal lines a to g which are short-circuited with respect to the plurality of pairs of test pads 144 are formed. The test pad 144 is composed of all eight sets of signal lines a to g. This is the corresponding to the probe card 184 composed of the eight sets of needle tips 186 shown in Fig. 3A. However, the number of signal lines of the test pad 184 as described above can also be changed as needed. Further, the number of signal lines a to g of the test pad 144 is preferably the same as the number of the needle tips 186 of the probe card 184. After the chamber 200 is placed above the test pad 144, the vapor deposition of the rolled body is carried out via the center of the chamber body 13 200935123 210 while the metal gas and the air curtain are supplied with the inert gas. In the portion 220, an environment in which a chemical-vapor phase vapor deposition process is performed is performed, and a test repair operation is performed. In the chemical vapor vapour η / / special program, the laser system emitted from the laser portion 172 is irradiated to the test repair work of the test pad 5 144 through the window 222 disposed in the chamber body 210. On the part. At this time, the laser light is guided to a necessary position by the optical mechanism (beam beam splitter, lens, etc.) provided in the first optical portion 174. Figure 6 shows the state of the test pad 144 when the test repair work is completed. As shown in Fig. 6, by the test repair operation, in the 6th map, the signal lines a to g between the short-circuited signals a to g are vapor-deposited with the conductive material 140, and the signal lines a to g are connected to each other. Although the type of the vapor deposition conductive material 146 is not particularly limited during the test repair process, it is preferably the same as the conductive material used in the main repair process. On the other hand, in the test repair operation, the chemical vapor deposition conditions of the chemical vapor phase vapor deposition layer are preferably different from the respective signal lines a to g of the test pad 144. This is because the resistance 蒸汽 of the vapor deposited conductive material based on chemical vapor deposition conditions changes, so the signal line repaired by the main repair operation is the optimum resistance actually required by the LCD panel.设定Set the optimum chemical vapor vapor 20 deposition conditions (eg, vapor deposition pressure, vapor deposition rate, laser intensity, laser focus distance, etc.). Once the test repair operation is completed, as shown in FIG. 7, the Z-axis moving portion 182 is operated, and after the probe 180 is brought into contact with the test pad 144, the resistance is measured by the signal lines a to g of the test pad 144. Check whether the repair of the test pad 144 14 200935123 is normal, and obtain the chemical vapor deposition conditions (4) suitable for the recovery.値 讯 讯 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次 其次For this reason, the χ-axis moving portion η: and the good ::=:: chamber 200 are moved to the designated position where the main repair == (see Fig. 8). Since the main pure-time chemical vapor deposition section 17G) has a difference in the test repair, it is slightly detailed. 〜 』 In the present invention, after the test repair operation of the test pad 144 provided on the side of the LCD panel m, the repair of the test 144 by the probe (10) is the optimum chemistry obtained by reading Under the same conditions of vapor phase vapor deposition, the main repair operation for defective pixels of the LCD panel can have the advantage of greatly reducing the defective rate of the repair operation. Therefore, it can be said that the present invention has high industrial applicability. In addition, the preferred embodiments of the present invention have been described, and various changes can be made without departing from the spirit and scope of the invention. Therefore, the scope of the technology of the present invention is not limited to the above-described embodiments, but should be defined by the description of the claims and equivalents thereof. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an exploded perspective view and a completed view showing the configuration of a repairing device for an LCD panel according to an embodiment of the present invention. Fig. 2 is a perspective view showing a configuration of an example of a chemical vapor deposition section. Fig. 3A is a plan view showing the constitution of the probe card. Fig. 3B is a side view of the probe card shown in Fig. 3A as seen from the direction a. 5 Fig. 4A is a perspective view showing the constitution of a chamber of a chemical vapor deposition section. Fig. 4B is a partial cutaway view showing the inside of the chamber of the chemical vapor deposition section. Fig. 4C is a cross-sectional view showing the constitution of the chamber of the chemical vapor deposition section. Fig. 5 is a view showing the constitution of a repair method of an LCD panel according to an embodiment of the present invention. Fig. 6A is a view showing the constitution of a repair method of an LCD panel according to an embodiment of the present invention. Fig. 6B is a view showing the constitution of a repair method of an LCD panel according to an embodiment of the present invention. Fig. 7 is a view showing the constitution of a repair method of an LCD panel according to an embodiment of the present invention. Fig. 8 is a view showing the construction of a repair method 20 for an LCD panel according to an embodiment of the present invention. [Main component symbol description] 100 LCD panel repair device 130 Y-axis moving portion 110 repair table 140 base 120 X-axis moving portion 142 LCD panel 16 200935123 144 Test 塾 210 chamber body 146 Conductive substance 212 Mounting frame 150 Gas supply Portion 214a metal supply pipe 160 pedestal 214b metal discharge pipe 170 chemical vapor deposition portion 214c metal supply port 172 laser portion 214d metal discharge groove 174 first optical portion 216a air curtain supply pipe 180 probe 216b air curtain exhaust pipe 181 second Optical portion 216c Air curtain supply groove 182 Z-axis moving portion 216d Air curtain exhaust groove 184 Detection card 218a Fuzzy gas supply pipe 186 Needle tip 220 Gas vapor deposition portion 188 Edge sensor 222 Form 200 Chamber 17

Claims (1)

200935123 七、申請專利範圍: 1. 一種液晶顯示(LCD)面板之修復裝置,其係檢測LCD面 板之不良像素,並利用雷射修復不良像素,其包含: —修復桌,其係設置放置LCD面板之基台; X軸與Y軸移動裝置,其係設置於該修復桌上; 一化學氣相蒸汽沈積部,其係對LCD面板之不良像 素與測試塾進行修復作業;以及 一探針,其係與該化學氣相蒸汽沈積部相連設,並 藉由β玄化學氣相蒸汽沈積部檢查該經修復之測試塾的修 復是否完成, 該修復裝置係對該LCD面板之測試墊進行試驗修復 作業後,再對該LCD面板之不良像素進行主要修復作業。 2. 如申請專利範圍第丨項之LCD面板之修復裝置,其中該 化學氣相蒸汽沈積部包含: 一腔室,其係用於提供在該LCD面板之不良像素上 進行修復作業所需的化學氣相蒸汽沈積空間; 一雷射部,其係於藉由該腔室所提供之空間内照射 雷射;以及 一光學部,其係將該雷射部所照射之雷射的光線路 徑與焦點加以控制。 3·如申請專利範圍第2項之LCD面板之修復裝置,其中該 腔室包含: 一氣體蒸汽沈積部,其係用於在該LCD面板之不良 像素上之指定部位提供氣體蒸汽沈積空間; 18 ‘州 35123 择〜金屬供給部,其係將用以修復的金屬粒子供給至 g由讀氣體蒸汽沈積部所提供之以沈積空間;以及 氣簾部’其係用於將藉由該氣體蒸汽沈積部所提 供之荔V» 4 為辽沈積空間與外部加以隔離。 ,Θ專利範圍第3項之LCD面板之修復裝置,其中該 二體蒸汽沈積部進一步包含一構造成雷射可通過之窗 m 5.200935123 VII. Patent application scope: 1. A liquid crystal display (LCD) panel repair device, which detects defective pixels of an LCD panel and repairs defective pixels by using a laser, which comprises: - a repair table, which is arranged to place an LCD panel a base station; an X-axis and Y-axis moving device disposed on the repair table; a chemical vapor deposition portion for repairing defective pixels and test defects of the LCD panel; and a probe And the chemical vapor phase vapor deposition portion is connected, and the repair of the repaired test flaw is checked by the β-Xuan chemical vapor phase vapor deposition section, and the repair device is tested and repaired on the test pad of the LCD panel. After that, the main repair operation of the defective pixels of the LCD panel is performed. 2. The repair device for an LCD panel of the invention of claim 2, wherein the chemical vapor deposition portion comprises: a chamber for providing a chemical required for repair work on defective pixels of the LCD panel a vapor phase vapor deposition space; a laser portion that illuminates the laser through a space provided by the chamber; and an optical portion that is a light path and focus of the laser irradiated by the laser portion Control it. 3. The repair device of the LCD panel of claim 2, wherein the chamber comprises: a gas vapor deposition portion for providing a gas vapor deposition space at a designated portion on the defective pixel of the LCD panel; 'State 35123 Select - Metal Supply Department, which supplies the metal particles for repair to g to the deposition space provided by the read gas vapor deposition portion; and the air curtain portion for the gas vapor deposition portion The 荔V» 4 provided is isolated from the exterior of the Liao sedimentary space. The repair device of the LCD panel of the third aspect of the patent, wherein the two-body vapor deposition portion further comprises a window configured to pass through a laser. 肸2 π專利範圍第4項之LCD面板之修復裝置,其中該 進步包含於該®體表面上提供模糊氣體之模糊氣 體供给部。 板液日日顯不(LCD)面板之修復方法,其係檢測LCD面 之不良像素,朗用雷射修復*良像素,該修復方法 匕含下列步驟: (幻對LCD面板之測試墊進行試驗修復作業之步驟; (b)對該經修復之測試墊進行檢查修復是否完成之步 ;以及 (c)對該LCD面板之不良像素進行主要修復作業之 歩騍。 =申请專利範圍第6項之LCD面板之修復方法,其中該 <驗與主要修復作業係利用化學氣相蒸汽沈積法來進 行。 如申*青專利範圍第6項之LCD面板之修復方法,其中該 & %查作業係利用藉由探針接觸之電阻測定法來進行。 如申s青專利範圍第6項之lCd面板之修復方法,係藉由 19 200935123 該試驗修復作業所決定之最佳修復條件,來進行該主要 修復作業。The repair apparatus of the LCD panel of the fourth aspect of the invention, wherein the improvement comprises a fuzzy gas supply portion for providing a fuzzy gas on the surface of the body. The method for repairing the liquid crystal display (LCD) panel is to detect the defective pixels on the LCD surface and use the laser to repair the good pixels. The repair method includes the following steps: (The test is performed on the test pad of the LCD panel. (b) the step of checking whether the repaired test pad is completed; and (c) performing major repair work on the defective pixels of the LCD panel. The repair method of the LCD panel, wherein the <test and main repair operation is performed by a chemical vapor deposition method. For example, the repair method of the LCD panel of the sixth item of the patent application scope, wherein the & % check operation system It is carried out by the resistance measurement method by probe contact. The repair method of the lCd panel according to item 6 of the patent scope of Shen Singqing is carried out by the best repair condition determined by the repair work of 19 200935123. Repair the job.
TW097149385A 2008-01-28 2008-12-18 Apparatus and method for repairing lcd panel TWI495923B (en)

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Cited By (2)

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TWI567230B (en) * 2015-10-02 2017-01-21 燦美工程股份有限公司 Deposition apparatus and method
CN112795907A (en) * 2020-12-24 2021-05-14 深圳市华星光电半导体显示技术有限公司 Broken line repairing device and debugging method thereof

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KR20050065823A (en) * 2003-12-24 2005-06-30 엘지.필립스 엘시디 주식회사 Repair apparatus for liquid crystal display device
KR20050068243A (en) * 2003-12-29 2005-07-05 엘지.필립스 엘시디 주식회사 Chemical vapor deposition repair equipment
KR20060014582A (en) * 2004-08-11 2006-02-16 삼성전자주식회사 Method for repairing substrate and apparatus of repairing substrate therefor
KR101071136B1 (en) * 2004-08-27 2011-10-10 엘지디스플레이 주식회사 apparatus for processing a thin film on substrate for flat panel display device
JP2007206641A (en) * 2006-02-06 2007-08-16 Laserfront Technologies Inc Repair device and method

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TWI567230B (en) * 2015-10-02 2017-01-21 燦美工程股份有限公司 Deposition apparatus and method
CN112795907A (en) * 2020-12-24 2021-05-14 深圳市华星光电半导体显示技术有限公司 Broken line repairing device and debugging method thereof

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