TW200911389A - Nozzle keeping device and coating device - Google Patents

Nozzle keeping device and coating device Download PDF

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Publication number
TW200911389A
TW200911389A TW097125545A TW97125545A TW200911389A TW 200911389 A TW200911389 A TW 200911389A TW 097125545 A TW097125545 A TW 097125545A TW 97125545 A TW97125545 A TW 97125545A TW 200911389 A TW200911389 A TW 200911389A
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TW
Taiwan
Prior art keywords
nozzle
liquid
cleaning liquid
supply
cleaning
Prior art date
Application number
TW097125545A
Other languages
Chinese (zh)
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TWI348397B (en
Inventor
Shuichi Sagara
Mikio Masuichi
Yukihiro Takamura
Masafumi Kawagoe
Tsuyoshi Matsuka
Original Assignee
Dainippon Screen Mfg
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Publication date
Priority claimed from JP2007213040A external-priority patent/JP5002369B2/en
Priority claimed from JP2007213041A external-priority patent/JP5226984B2/en
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200911389A publication Critical patent/TW200911389A/en
Application granted granted Critical
Publication of TWI348397B publication Critical patent/TWI348397B/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/14Arrangements for preventing or controlling structural damage to spraying apparatus or its outlets, e.g. for breaking at desired places; Arrangements for handling or replacing damaged parts

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  • Coating Apparatus (AREA)
  • Electroluminescent Light Sources (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Abstract

The invention relates to a device for keeping a nozzle and a coating device. The nozzle-keeping device keeps the nozzle which sprays liquid from an outlet to inferior part and comprises a projection part, a supplying piping, a storage mechanism and a cleaning fluid supplier. The projection part is configured on the position opposite with the nozzle outlet on top of a supplying port. The supplying piping communicates a supplying source for supplying the cleaning fluid and the supplying port. The storage mechanism is connected to the piping, and can store the cleaning fluid in the position of the storage mechanism which is closer to the upper part than top of the projection. The cleaning fluid supplier supplies the cleaning fluid from the supplying source, so that the nozzle-keeping device is in a state as below: the projection top is filled with the cleaning fluid and the storage mechanism is stored with the cleaning fluid.

Description

200911389 六、發明說明: 【發明所屬之技術領域】 本發明關於一種喷嘴保管裝置及塗佈裝置,更特定而言,關 於一種當將液體吐出的喷嘴處於非吐出時,保管該喷嘴用的喷 嘴保管裝置、及使用其之塗佈裝置。 【先前技術】 習知,就將液體塗佈於基板等的塗佈裝置等,有將液體吐出[Technical Field] The present invention relates to a nozzle storage device and a coating device, and more particularly to a nozzle storage for storing a nozzle when a nozzle for discharging a liquid is not discharged. A device, and a coating device using the same. [Prior Art] Conventionally, a liquid is applied to a coating device such as a substrate, and the liquid is discharged.

的噴嘴施行洗淨用的技術。例如在專利文獻1(曰本專利特開 2005-3433號公報)中,便有揭示:利用對洗淨對象的噴嘴供 應洗淨液的洗淨溶液供應手段,而將該噴嘴施行洗淨的噴嘴洗 淨裝置。該噴慨淨裝置巾,洗淨絲供應手段狀置於嘴嘴 側邊附近位置處,形成洗淨液液滴,將該液滴從侧邊對噴嘴進 行ί、應此外’所供應的液滴利用在喷嘴附近所配置的抽吸手 段進行抽吸而回收。 j處考f在塗佈裝置未運㈣將噴嘴絲的情況。當保管喷 叫亦疋在防止呈乾燥的塗佈液堵塞噴嘴孔等目的下,為了 使噴嘴前端部分不乾燥便必需將該前端部分浸潰於液體中义 述專利文獻1的洗料置,搞管噴嘴的情況下村使用,利 =洗喷嘴絲。但是,上料敝獻1的洗淨 二 中必需經常供應液體(洗淨液),導致大量浪时 官用液體的問題發生。 、示 【發明内容】 97125545 200911389 緣是’本發明之目的在於提供—種可效率佳地使用保管用液 體而將喷嘴保管的喷嘴保管裝置及塗佈裝置。 . 本發明為能解決上制題便採用以下的構造。即,本發明第 1態樣係將從吐出σ朝下方吐出吐出液时嘴進行保管用X的噴 嘴保管裝置。喷嘴保管裝置係具備有:突起構件、供應配管; 儲存機構、及洗淨液供應手段。突起構件係配置於設置供應口 的上面對向於喷嘴吐出口的位置處。供應配管係從供應洗較 Γ ❸供應源連通至供應σ。儲存機構係連接於供應配管,可在較 突起構件上面更靠上方處儲存洗淨液。洗淨液供應手段係依突 起構件的上面上裝盛有洗淨液之狀態下,且儲存機構儲存有洗 淨液之狀態方式,從供應源供應洗淨液。 第2態樣中,喷嘴保管裝置亦可更具備有:經由儲存機構從 供應配管抽吸洗淨液的洗淨液抽吸手段。 第3態樣中,喷嘴保管裝置亦可更進一步具備有:檢測儲存 (J機構中所儲存洗淨液液量的檢測手段。此時,洗淨液供應手段 根據由檢測手段所檢測_液量,從供應源中供應洗淨液。 第4 L樣中,噴嘴保管裝置亦可更具備有:為使喷嘴下面與 • 犬I構件上面依既定間隔相對向,而使噴嘴與突起構件之至少 . 其中者移動的移動手段。此時,洗淨液供應手段係當將喷嘴 爭守以洗淨液湧出於突起構件上面上的方式,朝供應口供 應洗’f液移動手段係當將喷嘴洗淨時,便依满出於突起構件 上面上的洗淨液僅接觸到喷嘴下面之方式,設定既定間隔。 97125545 200911389 第5態樣中, 徑。 突起構件上面的直徑 亦可較小於噴嘴下面的直 從供應口抽吸洗 第6態樣巾,料保管打柯更具備有 淨液的洗淨液抽吸手段。 面周圍具有隨朝向外周而降 第7態樣中,突起構件亦可在上 低的傾斜面。 此吐出液亦可為有機肌材料或電洞輸送材料。 3有與纽$輯含溶料朗的溶劑。 另外’本發明雜供具備有上述第卜第δ祕的喷嘴伴管 裝^糟由對基板從噴嘴中吐出塗佈液,而對該基板 的塗佈裝置形態。 # 根據第1態樣,在喷嘴保管時,突起構件的上面上成裝成有 2淨錄態。藉此’可依喷嘴的吐出口接觸到洗淨液的狀態進 订保g,同時無需經常供應洗淨液,因而可效率佳地使用洗淨 °液。a—步’根據第1態樣’即使裝盛狀態的洗淨液已蒸發, 仍可藉由在較突起構件上面更靠上謂儲存洗淨液的儲存機 構’維持裝盛狀態的洗淨液量。即,在突起構件的上面上可將 洗淨液維持長時間裝盛狀態,可將噴嘴保管更長時間。 • 根據第2祕’彻洗雜抽吸手段,便可將保管時附著於 喷嘴上的洗淨液從噴嘴上去除。更進-步,因為洗淨液抽吸手 段經由儲存機構從供應口中抽吸洗淨液,因而並不需要另外設 置施仃抽吸用的抽吸口、或施行抽吸用的配管。所以可將塗佈 97125545 5 200911389 裝置的構造簡易化。 用=:广對儲存機構中·存的洗淨液液量,利 == 進:檢測’便可檢測出突起構件上面上原本裝盛的 洗/尹液消失(或變少)。所 逡杆# ’根據由檢測手段所檢測到的液量 已坪’ Γ了^、,航即使突起構件上面上縣盛的洗淨液 已蒸赉,仍可持續保管噴嘴。 ==’依湧出於突起構件上面上的洗淨液僅接觸到 =1面所附著的洗淨液去除便可•相二 )側It _著的情況,較容易去除,便可由洗淨確實 地將喷鳴上所附著的洗淨液去除。 根據第5祕,因為上面的直徑係設定為小於The nozzle performs the technique of washing. For example, in the patent document 1 (Japanese Laid-Open Patent Publication No. 2005-3433), a nozzle for cleaning the nozzle by supplying a cleaning solution for supplying a cleaning liquid to a nozzle to be cleaned is disclosed. Wash the device. The spray net cleaning device, the cleaning wire supply means is placed at a position near the side of the mouth to form a droplet of the cleaning liquid, and the droplet is sent from the side to the nozzle, and the supplied droplet It is recovered by suction using a suction means disposed near the nozzle. j test f in the coating device is not shipped (four) the nozzle wire condition. In order to prevent the drying of the coating liquid from clogging the nozzle hole, etc., in order to prevent the nozzle tip portion from being dried, it is necessary to impregnate the tip end portion of the liquid in the liquid. In the case of a tube nozzle, the village uses, Lee = wash the nozzle wire. However, it is necessary to supply liquid (washing liquid) frequently in the cleaning of the feed 1 and cause a problem of a large amount of official liquid. [Description of the Invention] 97125545 200911389 The purpose of the present invention is to provide a nozzle storage device and a coating device which can efficiently store a nozzle using a liquid for storage. The present invention adopts the following configuration in order to solve the above problem. In other words, the first aspect of the present invention is a nozzle storage device that stores a discharge X when the discharge liquid is discharged downward from the discharge σ. The nozzle storage device includes a protrusion member, a supply pipe, a storage mechanism, and a cleaning liquid supply means. The projecting member is disposed at a position where the upper surface of the supply port is opposed to the nozzle discharge port. The supply piping is connected from the supply supply to the supply σ. The storage mechanism is connected to the supply pipe, and the cleaning liquid can be stored above the protrusion member. The cleaning liquid supply means supplies the cleaning liquid from the supply source in a state in which the cleaning liquid is stored on the upper surface of the protruding member and the storage means stores the cleaning liquid. In the second aspect, the nozzle storage device may further include a cleaning liquid suction means for sucking the cleaning liquid from the supply pipe via the storage means. In the third aspect, the nozzle storage device may further include: means for detecting and storing (the amount of the cleaning liquid stored in the J mechanism). At this time, the cleaning liquid supply means detects the amount of liquid according to the detection means. The cleaning liquid is supplied from the supply source. In the fourth sample, the nozzle storage device may further include at least a nozzle and a protruding member so that the lower surface of the nozzle and the upper surface of the canine member are opposed to each other at a predetermined interval. The mobile moving means. At this time, the cleaning liquid supply means is to supply the washing liquid to the supply port in a manner that the nozzle is rushed to wash the cleaning liquid onto the upper surface of the protruding member, and the nozzle is washed. When the cleaning liquid on the upper surface of the protruding member only contacts the underside of the nozzle, the predetermined interval is set. 97125545 200911389 In the fifth aspect, the diameter of the protruding member may be smaller than the diameter below the nozzle. The sixth type of sample towel is directly sucked from the supply port, and the material is stored in a safe manner. The surface of the surface is covered with a cleaning liquid. low The sloping surface can also be an organic muscle material or a hole transporting material. 3 There is a solvent containing a solvent solution in New Zealand. In addition, the invention has a nozzle with the above-mentioned δ 秘 secret. The form of the coating device for discharging the coating liquid from the nozzle to the substrate. # According to the first aspect, when the nozzle is stored, the upper surface of the protruding member is mounted in a net recording state. This can be used to feed the cleaning liquid according to the discharge port of the nozzle, and it is not necessary to supply the cleaning liquid frequently, so that the cleaning liquid can be used efficiently. a-step 'according to the first aspect' even The washing liquid in the loaded state has evaporated, and the amount of the washing liquid in the loaded state can be maintained by the storage mechanism for storing the washing liquid on the upper surface of the protruding member. That is, the upper surface of the protruding member can be Keep the cleaning solution for a long time, and keep the nozzle for a long time. • According to the second secret 'cleaning and suction method, the cleaning liquid adhering to the nozzle during storage can be removed from the nozzle. Further step-by-step, because the cleaning liquid suction means is supplied from the storage mechanism Since the washing liquid is sucked in the mouth, it is not necessary to separately provide a suction port for suction or a pipe for suction. Therefore, the structure of the coating 97125545 5 200911389 can be simplified. The amount of washing liquid stored in the storage mechanism, profit == Into: Test 'can detect the disappearance (or less) of the original washing liquid on the upper surface of the protruding member. The amount of liquid detected by the means has been smashed, and even if the washing liquid on the upper part of the protruding member has been steamed, the nozzle can be kept safely. == 'Follow the washing on the upper part of the protruding member. The liquid can be removed only by the cleaning solution attached to the =1 surface. According to the 5th secret, because the upper diameter is set to be smaller than

徑.,因而即使該上面與該下面的間隔相當小,從供應Γ中L 的洗淨液仍不會附著於喷嘴 液附著於噴嘴側面上。 1所以可更確霄防止洗淨 再者’第5態樣中’當噴嘴洗淨裝置更具備有第6態樣的洗 "液抽吸手段情況時,洗淨液的抽吸動作係供應口與噴嘴間的 距離越靠近,職吸效果將越大。此情況下,根_離樣, 因為可將供應口與嘴嘴間的距離非常靠近呈可充分施行抽吸 狀二=Γ確實利用洗淨液抽吸手段施行洗淨液去除。 根據弟、6悲樣,利用洗淨液抽吸手段,可將洗淨時附著於喷 f上的洗斤液從贺嘴去除。更進一步,因為洗淨液抽吸手段從 97125545 200911389 供應口抽吸洗淨液,因而並不需要另外設置施行抽·的抽吸 口。因此,可將塗佈裝置的構造簡易化。 根據第7態樣,因為突起構件係具有傾斜面的形狀,因而突 起構件可縮小上面的直徑,同時可確健起構件整體的粗度, 可確保突起構件的強度。 +根據第8態樣,為了將塗佈有機EL材料或電洞輸送材料的 喷嘴加以保管,可適用喷嘴保管裝置。Therefore, even if the interval between the upper surface and the lower surface is relatively small, the cleaning liquid from the supply port L does not adhere to the nozzle liquid and adheres to the nozzle side. 1 Therefore, it is possible to prevent the washing from being in the '5th aspect'. When the nozzle cleaning device has the sixth aspect of the washing "liquid suction means, the suction action of the cleaning liquid is supplied. The closer the distance between the mouth and the nozzle, the greater the job suction effect will be. In this case, the root _ is isolated, because the distance between the supply port and the mouth can be very close, so that the suction can be sufficiently performed. According to the younger brother and the 6 sadness, the washing liquid adhered to the spray f during washing can be removed from the mouthpiece by the washing liquid suction means. Further, since the cleaning liquid suction means suctions the washing liquid from the supply port of 97125545 200911389, it is not necessary to additionally provide a suction port for performing the pumping. Therefore, the structure of the coating device can be simplified. According to the seventh aspect, since the projecting member has the shape of the inclined surface, the projecting member can reduce the diameter of the upper surface, and at the same time, the thickness of the entire member can be ensured, and the strength of the projecting member can be ensured. + According to the eighth aspect, in order to store the nozzle for applying the organic EL material or the hole transporting material, a nozzle storage device can be applied.

再者,當本發明由塗錄置職提供的情況,便可將喷嘴保 管裝置適用於藉由從喷嘴中對基板吐出塗佈液而對該基板施 打塗佈的塗佈裝置,可將該塗魅置的喷嘴在效率佳地使用洗 淨液之情況下進行保管。 針對本發明上述事項、及其他目的、舰、雜、效果表昭 所附圖式由以下的詳細說明,便可更加清楚明瞭。 【實施方式】 Ο (第1實施形態) (1)塗佈裝置之構造 ,以下’針對本發明第丨實卿態时嘴保管I置進行說明。 ^ 1實施形態魏噴嘴保管裝置構成塗佈裝置(其係供製造有 機EL(electr〇luminescence)顯示裝置用)其中一部分的情兄 為例進行說明。該塗佈裝置储平台上職置的基板,從^嘴 中吐出有機EL材料或電洞輸送材料等塗佈液’以塗饰成既定 圖案形狀。另外’塗佈裝置係可制諸如有機EL材料、電^ 97125545 200911389 輸送材料料數觀佈細贿㈣,町祕_代表性之 有機EL材料細為塗佈液的情況為例進行說明。 首先、、圖1及圖2,針對塗佈裝置的整體構造進行說明。 圖1所示細錄置1G鮮之俯《。叫)所示 係塗佈裝置10從上·觀相賴,旧(b)料係塗佈裝置 10從側面朝Y軸正方向所觀看到的圖。此外,圖2所示係塗 佈裝置1G的各部位、與控制部間之連接關係圖。 再者,如圖2所示,塗佈裝置1G係具備有控制部7。控制Further, when the present invention is provided by the application of the application, the nozzle storage device can be applied to a coating device that applies a coating liquid to the substrate by discharging the coating liquid from the nozzle, and the coating device can be applied. The nozzles coated with the scent are stored in an efficient use of the cleaning solution. The above description of the present invention, as well as other objects, ships, miscellaneous, and effects, will be more apparent from the following detailed description. [Embodiment] 第 (1st Embodiment) (1) Structure of a coating apparatus Hereinafter, the nozzle storage I will be described with respect to the present invention. ^1 Embodiment The Wei nozzle storage device constitutes a coating device (which is used for manufacturing an EL (electr luminescence) display device). The coating device stores a substrate on which the substrate is placed, and a coating liquid such as an organic EL material or a hole transporting material is discharged from the nozzle to be painted in a predetermined pattern shape. Further, the coating apparatus can be exemplified by, for example, an organic EL material, an electric material, a fine material (4), and a representative organic EL material as a coating liquid. First, FIG. 1 and FIG. 2 will explain the overall structure of the coating apparatus. Figure 1 shows a detailed record of 1G fresh. The coating apparatus 10 shown in the drawing is viewed from the top, and the old (b) coating apparatus 10 is viewed from the side in the positive direction of the Y-axis. Further, Fig. 2 is a view showing a connection relationship between each part of the coating apparatus 1G and the control unit. Furthermore, as shown in FIG. 2, the coating apparatus 1G is equipped with the control part 7. control

如圖1所示’塗佈裝置10係具備有··噴嘴單元!、噴嘴移 動機構2、保管部3aA3b、受液部处及礼、平台5、及平台 移動機構6。以下,在未制區分2個保管部加與時便簡 稱為「保管部3」,在未特別民八9 & r 将另2個受液部4R與4L時便簡 稱為「受液部4」。 部7電性連接於喷嘴單元卜噴嘴移動輸、平台移動機構 6、洗淨液供應部8、絲#部移動機構9。 如圖!所示’在平Μ餘有塗佈處獨㈣基板W。在基 板W朝X軸方向平行制隔形成有複數條溝槽。本塗佈裝置 ίο利用對該溝槽吐出有機EL材料,而將有機el材料流入於 =曹中。另外,雖未圖示,在平台5上設置加熱機構、吸附機 構。加熱機構係將經塗佈有機EL材料的基板w在平台5上施 行預熱處理用。吸附機構係將基板Wd及附於平台5上並固定用。 平台移動機構6將連接於平台5下側。具體而言,平台疋移動 97125545 8 200911389 備有:旋轉部61、平行移動平台62、導轨承接部 、九構件64。導軌構件64係依通過喷嘴移動機構2下 朝圖1所示Υ軸方向延設固定。導軌承接部 在導轨構件64场狀^,設錄導韻㈣上。平= 動平口 62係固設於導轨承接部⑽的上面。平行移動 =來自内部顿未__動力可朝沿 ^ 移動。旋轉部61係固設於平行移動平台62的 ° 61透過來自内部馬達(未圖示)的驅動力、 :車:、為:心進行轉動。上述平台5固設於旋轉部Μ上面。: 二=可广平台移動機構6朝γ軸方向平心 工Α轴為中心進行旋轉(參照圖1(a)所示之箭頭)。另外 平口移動機構6的動作由控制部7進行控制。 1. W移動機構2係具有朝χ轴方向(平 置面的平行方向)延伸的滑執21,並依可 1载 從喷嘴中吐嘴移動機構2。嘴嘴單元丨係利用 ^ φ ^ ^而對基板施行塗佈的塗佈機構,例如且有 •X有機EL材料塗佈液的3個喷幻 嗔 早二的各嘴嘴1H3依將塗佈液吐出的方向二As shown in Fig. 1, the coating device 10 is equipped with a nozzle unit! The nozzle moving mechanism 2, the storage unit 3aA3b, the liquid receiving portion, the ceremony, the platform 5, and the platform moving mechanism 6. In the following, when the two storage units are not added, they are simply referred to as "storage unit 3". When the other two liquid receiving units 4R and 4L are not used, the liquid receiving unit 4 is simply referred to as the liquid receiving unit 4. "." The portion 7 is electrically connected to the nozzle unit, the nozzle movement transmission, the stage moving mechanism 6, the cleaning liquid supply unit 8, and the wire # portion moving mechanism 9. As shown! As shown in the figure, there is a coating (only) substrate W. A plurality of grooves are formed in parallel with the substrate W in the X-axis direction. The coating device ίο uses the organic EL material to be ejected into the groove, and the organic EL material flows into the Caozhong. Further, although not shown, a heating mechanism and an adsorption mechanism are provided on the stage 5. In the heating mechanism, the substrate w coated with the organic EL material is subjected to preheat treatment on the stage 5. The adsorption mechanism is used to attach and attach the substrate Wd to the stage 5. The platform moving mechanism 6 will be connected to the underside of the platform 5. Specifically, the platform 疋 moving 97125545 8 200911389 is provided with a rotating portion 61, a parallel moving platform 62, a rail receiving portion, and a nine member 64. The rail member 64 is extended and fixed in the z-axis direction shown in Fig. 1 by the nozzle moving mechanism 2. The guide rail receiving portion is provided on the guide rail member 64 field, and the guide rhyme (4) is set. Flat = movable flat 62 is fixed on the upper surface of the rail receiving portion (10). Parallel movement = from the internal __ power can move towards ^. The rotating portion 61 is fixed to the 61 of the parallel moving platform 62 and transmits the driving force from the internal motor (not shown). The platform 5 is fixed to the upper portion of the rotating portion. : 2 = wide platform moving mechanism 6 rotates in the center of the γ-axis direction. The workpiece axis rotates (see the arrow shown in Fig. 1(a)). Further, the operation of the flat moving mechanism 6 is controlled by the control unit 7. 1. The W moving mechanism 2 has a slide 21 extending in the z-axis direction (parallel direction of the flat surface), and the nozzle moving mechanism 2 is supported by the nozzle. The mouthpiece unit is a coating mechanism that applies a coating to the substrate by using ^φ^^, for example, three nozzles of the X-ray organic EL material coating liquid, each nozzle 1H3 according to the coating liquid Spit direction 2

之方式被配置於噴嘴單Μ的下側。 D B 抽方向上配置於顧錯開的位置處。、嘴『13在¥ 係在Μ方向上,相隔在基板;5 ’各喷嘴1卜^ 上所形成溝槽3列份長度吖 97125545 200911389 軸方向的長度)之間隔配置。噴嘴單元工的移動、 ㈣的有機虹材料吐出,由控制部7進行控制。^ 滑軌21係在X軸方向上構成較長於基板W ’噴嘴單元i係 可在#方向上’於較基板w寬度更寬 照圖_示噴嘴移動幅度)。即,當噴嘴單元】係從 =端闕噴料元1的各倾1W3依橫 跨基板W的方式進杆銘叙 八 飞進订移動。所以’藉㈣嘴單元1從滑執21The method is disposed on the lower side of the nozzle unit. The D B is arranged in the direction of the pumping. The mouth "13" is placed in the Μ direction, spaced apart from the substrate; the gaps formed in the 5' nozzles 1 are formed at intervals of 列 97125545 200911389 length in the axial direction). The movement of the nozzle unit and the discharge of the organic rainbow material of (4) are controlled by the control unit 7. ^ The slide rail 21 is formed longer in the X-axis direction than the substrate W'. The nozzle unit i can be wider in the # direction than the width of the substrate w. That is, when the nozzle unit is in the manner of traversing the substrate W from the tilting of the substrate W of the opposite end of the jetting unit 1, the eight-flying advance movement is performed. So 'borrowing (four) mouth unit 1 from slippery 21

的,朝另-端移動,便可在x軸方向上,從基板w的一端朝 另^施仃有機EL材料的塗佈。但,在喷嘴單元丨從滑軌21 $而移動至另-端的期間,若從各噴嘴m中吐出有機 EL材料’則不僅基板w被有舰材料塗佈,就連基板w外側 亦會受有機EL材料的吐出。所以,在基板w的外侧便基於承 接所吐出塗佈液之目的下’設置有受液部4與保管部3。受液 P ”保& 4 3係較噴嘴的移動幅度(參照圖咐》設置於更 靠内側。 们又液。p 4在X軸方向上被配置於基板w的二側。受液部 4^係具備有··上段部41R、連結部微、及下段部微。上段 部仙係形成上面具有隙縫權的箱狀形狀,該隙縫碰係沿 X軸方向延伸。上段部仙係配置成從各噴嘴1卜a所。土出的 =布液通過隙縫。在上段部41R的底面最低位置處設置有排出 ⑼《·路(未圖不)’由上段部41R内所承接的塗佈液從該排出流路 排出於下段部43R中。其中,從噴嘴m所吐出的塗佈液在 97125545 200911389 n'j 土出後雖保持液柱狀_(塗佈液成直線棒狀的狀態),但隨距 吐出位置的距離拉長而滴化’甚至霧化(較液滴化更細微狀 態)。所以’本實施形態中,在塗佈液成液滴化•霧化之前, .便利用上段部41R將塗佈液回收。此外,即使在上段部仙内 出現塗佈液霧化’因為上段部41R具有隙缝碰,因而可防止 已霧化的塗佈液朝上段部41R的外部飛揚。 再者,下段部43R係利用連結部42R連結於上段部41R。下 〔 段部431^係上面開口的箱狀形狀。下段部4服係將從上段部 41R的排出流路所排出塗佈液進行时,同時將無法由上段部 41R回收的塗佈液回收。例如從上段部仙與基板w間的間隙 朝下部洩漏的塗佈液,便由下段部43R回收。另外,在下段部 43R的底面最低位置處設置有排出流路(未圖示),經回收於下 段部43R内的塗佈液從該排出流路排出於外部。 另外’受液部4L具有與受液部4R相同構造。即,受液部By moving toward the other end, the coating of the organic EL material can be applied from one end of the substrate w to the other in the x-axis direction. However, when the nozzle unit 移动 moves from the slide rail 21 $ to the other end, if the organic EL material is ejected from each nozzle m, not only the substrate w is coated with the ship material, but also the outer side of the substrate w is subject to organic Spit of EL material. Therefore, the liquid receiving portion 4 and the storage portion 3 are provided on the outer side of the substrate w for the purpose of receiving the discharge liquid. The liquid receiving liquid P & 4 3 is disposed on the inner side of the nozzle (see FIG. 移动). The liquid is further disposed. The p 4 is disposed on both sides of the substrate w in the X-axis direction. The liquid receiving portion 4 The upper part 41R, the connecting part is micro, and the lower part is slightly. The upper part is formed in a box-like shape having a slit right, and the slit is extended in the X-axis direction. The upper part is configured to be Each of the nozzles 1 is a. The liquid discharged from the soil passes through the slit. The lowest position of the bottom surface of the upper portion 41R is provided with a discharge (9) "· (not shown) from the coating liquid received in the upper portion 41R. The discharge flow path is discharged to the lower stage portion 43R. The coating liquid discharged from the nozzle m remains in the liquid column shape after the soil is discharged from the 97125545 200911389 n'j (the coating liquid is in a straight rod shape), but The distance from the discharge position is elongated and dripped and even atomized (more finely dropletized state). Therefore, in the present embodiment, before the coating liquid is dropletized and atomized, it is convenient to use the upper portion. 41R recovers the coating liquid. In addition, even if the coating liquid is sprayed in the upper section, it is because of the upper section. 41R has a slit collision, so that the atomized coating liquid can be prevented from flying toward the outside of the upper portion 41R. Further, the lower portion 43R is coupled to the upper portion 41R by the connecting portion 42R. The lower portion 4 is configured to collect the coating liquid that cannot be recovered by the upper portion 41R while discharging the coating liquid from the discharge flow path of the upper portion 41R. For example, from the upper portion and the substrate w The coating liquid leaking toward the lower portion is recovered by the lower portion 43R. Further, a discharge flow path (not shown) is provided at the lowest position of the bottom surface of the lower portion 43R, and the coating liquid recovered in the lower portion 43R is discharged from the lower portion 43R. The discharge flow path is discharged to the outside. Further, the liquid receiving portion 4L has the same structure as the liquid receiving portion 4R.

U 4L的上段部411係相當於受液部4R的上段部41R,受液部4L 的下段部43L係相當於受液部4R的下段部43R。受液部礼除 X軸方向上的長度不同於受液部4R之外’其餘均具有與受液 部4R相同的功能。 保管部3係在塗佈裝置1〇停止中(未施行塗佈的期間),為 使各喷嘴11〜13前端不致乾燥而保管各喷嘴u〜13。即,在塗 佈裝置10停止中,各噴嘴1M3配置於保管部3的上方,保 管部3將用以對各喷嘴π〜13施行洗淨用的洗淨液,供應於噴 97125545 11 200911389 嘴1M3的各前端。另外 溶液的情況,係含有知,洗淨液在例如塗躲含有機溶劑之 純溶劑)。具體而言, a合劑的 使用甲笨。 4液的溶劑為甲苯’則洗淨液便可 保管部3以基板w兔士 马中心配置於受液部4L的外側。另冰 為能完全承接從各噴嘴 另外, 貝角11〜13所吐出的塗佈液’最好在俘总卹 ( 3與受液部礼配置二者成無間練態。保管部伴^ 移動機搆!彻財向㈣樹綱。科’=Γ中 僅圖示保管部3的部合播、皮二a 刀構k而已,就保管部3的詳細 如 圖3與目4獅。 ^係如 再者,本實施形態係使用2個保管部如與北。2個保管部 3a與3b配合洗甲對象的塗佈液種類而分開使用。即,保管部 3 a係例如在將吐出水系電洞輸送材料的喷嘴保管/洗淨時使 用’而保官部3b係例如當將吐出溶劑系有機EL材料的嘴嘴保 〇管/洗淨時制。各保管部3a及3b係可在γ軸方向上進行移 動,藉由在Υ軸方向上進行移動,而配置成任一保管部位於各 喷嘴11〜13吐出口正下方位置(從嘴嘴所吐出塗佈液能碰觸到 的位置)。另外’圖1所示係使用保管部如時的配置。如本實 施形態,藉由設置複數保管部,便可輕易地因應複數種塗佈液。 圖3所示係保管部3構造之立體示意圖。此外,圖4所示係 保管部3的Α-Α,剖視圖。另外,因為保管部%與保管部% 係相同構造,因而在圖3與圖4中,只將保管部如與保管部 97125545 12 200911389 牝中一者表示為保管部3。如圖3 口所不,保官部3係具備有: 液回收部30、突起構件31〜33、供庫 37〜39。 %愿配& 34〜36、及儲存機構 液回收部30係用以將從各噴嘴叫㈣吐出的吐出液㈤佈 液)、或從突起構件3卜33所供應的洗淨液進行回收的構件。 液回收部3G係具有傾斜底面的箱狀形狀。底面具有沿X轴方 向延伸的平坦部分。在該底面的最下方位置處設有未圖示排出 口’在底面上所附著的塗佈液及洗淨液,便通過傾斜底面 該排出口排出。 《 另外,雖未圖示,在液回收部30的下方,亦可設置具有與 受液部4L的下段部43L同樣功能的構件、即,將從液回” 3〇所排出的塗佈液進行时,並將無法由液回收部3〇回收的 塗佈液進行回收用的構件。該構件係具有底面的箱狀形狀,在 該底面的最低位置處設有排出流路。藉此,經回收於該構件内 ()的塗佈液便從該排出流路排出於外部。此外,在其他的實施形 態中’亦可將受液部4L的下段部43L設為朝χ轴負方=漸 變大’將液回收部3〇下方由下段部43L覆蓋。 -在液回收部30白勺底面設有3個突起構件3卜33。3個突起構 •件3卜33對應於3個嗜嘴η〜13,並將對應的各嘴嘴分別加以 保管。即’突起構件31對應於喷嘴Η,突起構件&對^ 喷嘴12,突起構件33係對應於噴嘴13。此外,各噴嘴 的各吐出口高度(在Z軸方向上的位置)相同,3個突起構件 97125545 13 200911389 31〜33的上面3la〜Μη y· 7 h 在Z軸方向上的位置相同。3個突起構 件31〜33係沿X軸方士士砝# 傅 釉方向大致配置成1列,與喷嘴1M3同樣, 在Y軸方向上稍微錯開配置。 突起構件31係具有在絲時財嘴向配置的上面 匕卜在上面3ia設有供應口。雖後有詳述,在保管時, 因:ί、應,口供應洗淨液,*在噴嘴11前端上附著洗淨液。The upper portion 411 of the U 4L corresponds to the upper portion 41R of the liquid receiving portion 4R, and the lower portion 43L of the liquid receiving portion 4L corresponds to the lower portion 43R of the liquid receiving portion 4R. The liquid receiving portion is detached from the liquid receiving portion 4R except that the length in the X-axis direction is different from that of the liquid receiving portion 4R. In the storage unit 3, the nozzles 1 to 13 are stopped (the period in which the coating is not applied), and the nozzles u to 13 are stored so that the tips of the nozzles 11 to 13 are not dried. In other words, when the coating device 10 is stopped, each of the nozzles 1M3 is disposed above the storage unit 3, and the storage unit 3 supplies a cleaning liquid for cleaning the nozzles π to 13 to be supplied to the nozzle 9725545 11 200911389, the mouth 1M3. Each front end. Further, in the case of a solution, it is known that the cleaning liquid is, for example, a pure solvent which is coated with an organic solvent. Specifically, the use of a mixture is stupid. The solvent of the liquid 4 is toluene', and the cleaning liquid can be disposed in the storage unit 3 outside the liquid receiving portion 4L with the substrate w and the rabbit center. In addition, it is possible to completely support the coating liquid which is discharged from each nozzle, and the smear angles 11 to 13 are preferably in the sneakers. !,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, In the present embodiment, the two storage units are used separately from the north. The two storage units 3a and 3b are used in combination with the type of the coating liquid to be used for the nail washing. That is, the storage unit 3a is, for example, a discharge water hole. In the nozzle storage/cleaning of the material, the warranty unit 3b is used, for example, when the solvent-based organic EL material is discharged, and the storage unit 3a and 3b are arranged in the γ-axis direction. By moving in the direction of the x-axis, the storage unit is disposed at a position immediately below the discharge port of each of the nozzles 11 to 13 (a position at which the coating liquid can be ejected from the nozzle). As shown in Fig. 1, the storage unit is arranged as needed. As in the present embodiment, it is easy to provide a plurality of storage units. Fig. 3 is a perspective view showing the structure of the storage unit 3. Fig. 4 is a cross-sectional view showing the storage unit 3, and the storage unit % and the storage unit % have the same structure. Therefore, in FIG. 3 and FIG. 4, only one of the storage units and the storage unit 97125545 12 200911389 is shown as the storage unit 3. As shown in Fig. 3, the security department 3 is provided with a liquid recovery unit 30. The protrusion members 31 to 33 and the reservoirs 37 to 39. The % distribution & 34 to 36, and the storage mechanism liquid recovery unit 30 are for discharging the discharge liquid (five) from the nozzles (four) or from the protrusions. A member for recovering the cleaning liquid supplied from the member 3b. The liquid recovery part 3G has a box shape having an inclined bottom surface. The bottom surface has a flat portion extending in the X-axis direction. At the lowermost position of the bottom surface, a coating liquid and a cleaning liquid which are attached to the bottom surface (not shown) are provided, and are discharged through the inclined bottom surface. Further, although not shown, a member having the same function as the lower portion 43L of the liquid receiving portion 4L, that is, the coating liquid discharged from the liquid back "3" may be provided below the liquid recovery portion 30. At this time, the coating liquid that cannot be recovered by the liquid recovery unit 3 is collected. The member has a box shape with a bottom surface, and a discharge flow path is provided at the lowest position of the bottom surface. The coating liquid in the member () is discharged from the discharge flow path to the outside. In other embodiments, the lower portion 43L of the liquid receiving portion 4L may be set to the negative side of the yaw axis = the gradation is large. The lower portion of the liquid recovery unit 3 is covered by the lower portion 43L. - Three projection members 3 are provided on the bottom surface of the liquid recovery portion 30. The three projections 3 and 33 correspond to the three mouths η~ 13. The corresponding nozzles are separately stored. That is, the protrusion member 31 corresponds to the nozzle Η, the protrusion member & the nozzle 12, and the protrusion member 33 corresponds to the nozzle 13. Further, the discharge height of each nozzle (Position in the Z-axis direction) is the same, 3 protruding members 97125545 13 200911389 31 The upper surface 33a of the 33 is the same position in the Z-axis direction. The three projection members 31 to 33 are arranged substantially in a row along the X-axis square 士士# Fu glaze direction, similarly to the nozzle 1M3, in the Y The projection member 31 has a slightly staggered arrangement. The projection member 31 has a supply port on the upper surface of the yoke when the wire is placed on the wire. Although it is described in detail later, during storage, the kou, the supply is washed. The cleaning solution* is attached to the front end of the nozzle 11.

Hg 34係從供應洗淨液的供應源(未圖示)起連通至突 (構件31的供細。當從供應源供統淨液時,洗淨液便通 過该供應配管34供應至供應口。 、再者供應配官34連接於儲存機構37。另外,® 3中,在 =圖式4觀看之目的下’僅表示儲存機構糾9的其中— /刀而已’亚省略儲存機構巾所含有的儲存槽構造。本實施形 心、中攸供應配管34中分支出儲存機構37的配管,因而當洗 淨液從供麵供輕,齡對供細健洗賴,同時亦對儲 子機構37 (、應洗淨液。儲存機構37係位於較突起構件μ的 上面—31a更菲上方處之可儲存洗淨液的構造。具體而言,如圖 4戶:不’儲存機構37係具有配置於較突起構件w的上面^ 更罪上方處的儲麵37a。另外,本實施形態巾,儲存機構打 係具備有:從供應配管34分支出的配管、與其所連接的儲存 槽⑽’但在其他的實卿態巾,亦可構成未設㈣存槽37a 的構以°即’儲存機構37若在較突起構件31的上面3la更靠 上方可儲存洗淨液下,亦可僅由從供應配管%分支出的配管 97125545 200911389 構成。 以上就突起構件31的相關造進行說明,而突起構件32及 33的構造亦均與突起構件31相同。即,突起構件32及33係 具有保管時分別與喷嘴12及13相對向配置之上面孤及 33=。此外’於上面孤及咖分別各設有i個供應口。供應 配官35係從上述供應源連通至上面咖的供應口,供應配管 36係攸上返供應源起連通至上面咖的供應口。此外,於供 應配管35連通儲存機構38,於供應配管%連通儲 . 儲存機⑽與39分別位於較各突起構件32及 及咖更靠上方處,並可儲存洗淨液,具體而言,具有配置1 較該上面32a及33a更靠上方處的儲存槽。此外,圖洗 淨液供應部8,係由在供應配管34〜36分別設置的栗等, 依照控制部7的指令從供應源進行洗淨液的供應。 再者,如上述,保管部3透過保管部移動機構9可朝 ^行平行f動。本實施職中,保管部3騎執行塗伸動作 才液回收部30的底面在各噴嘴仏以的正下方位置户 在保管暢佈裝置10停止運轉時),各突起構件^的上 ::咖便移動至與各自對應喷嘴_的吐出口相對向之 另外’本實劇彡射,絲部3祕於㈣ 者之塗佈液施行洗淨之目的下使用。即,在嘴嘴1 所附 攸其所吐出的塗佈液附著於吐出σ附近,因而保管部 97125545 ^ 15 200911389 將從各突起構件3卜33的各供應口所湧出的洗淨液喷向各喷 嘴11〜13,可對各喷嘴1M3施行洗淨。 (2)塗佈裝置的塗佈動作 其次,針對依如上述構成的塗佈裝置1〇之動作進行說明。 ’ 首先,針對塗佈裝置的塗佈動作概要進行說明。塗^裝置 10的塗佈處理對象基板W,係利用未圖示搬送機器人等搬二於 塗佈裝置1〇中,而載置於平台5上。基板w係依在其上所形 ( 成的複數條溝槽平行於X軸方向的方式載置。另外,搬入於塗 佈裝置10巾的基板w已形成有陽極及電洞輸送層。 、 當經搬入於塗佈裝置10中的基板w被固定於平台5時,# 制部7使平台_嘴單元_至初餘置。频而言^ 制部7使平台5依每個基板_至預定初始位置,同時使喷 嘴單元1移動至滑執2卜端。另外,平台5的初始位SiHg 34 is connected to the supply from the supply source (not shown) for supplying the cleaning liquid (the supply of the member 31 is fine. When the cleaning liquid is supplied from the supply source, the cleaning liquid is supplied to the supply port through the supply pipe 34. Further, the supply officer 34 is connected to the storage mechanism 37. In addition, in the case of Fig. 4, in the case of Fig. 4, it is only indicated that the storage mechanism is corrected by 9 - the knife is already included. In the present embodiment, the centering and the middle supply pipe 34 branch out of the storage mechanism 37, so that when the cleaning liquid is supplied from the surface, the age is clean and the storage mechanism 37 is also provided. (The cleaning solution 37. The storage mechanism 37 is located on the upper surface of the protruding member μ - 31a. The structure of the cleaning liquid can be stored above the phenanthrene. Specifically, as shown in Fig. 4: no storage mechanism 37 has a configuration In the upper surface of the projecting member w, the storage surface 37a at the upper portion of the projecting member w is further provided. The storage mechanism of the present embodiment includes a pipe branched from the supply pipe 34 and a storage tank (10)' connected thereto. Other real-purpose towels can also constitute a structure without (4) storage slots 37a. The storage mechanism 37 may be configured to store the cleaning liquid above the upper surface 3la of the protruding member 31, or may be constituted only by the piping 97125545 200911389 branched from the supply pipe %. The above-described construction of the protruding member 31 is performed. Note that the structures of the projecting members 32 and 33 are also the same as those of the projecting member 31. That is, the projecting members 32 and 33 have an upper surface 33 opposite to the nozzles 12 and 13 respectively during storage. There are one supply ports for each of the coffee companies. The supply company 35 is connected from the above supply source to the supply port of the top coffee, and the supply pipe 36 is connected to the supply source to connect to the supply port of the top coffee. The piping 35 is connected to the storage mechanism 38, and is connected to the supply piping. The storage machines (10) and 39 are located above the protruding members 32 and the coffee, respectively, and can store the cleaning liquid. Specifically, the storage unit 1 has a configuration 1 In addition, the cleaning liquid supply unit 8 is provided with a cleaning liquid from a supply source in accordance with a command from the control unit 7 by a pump or the like provided in each of the supply pipes 34 to 36. supply Further, as described above, the storage unit 3 can be moved in parallel by the storage unit moving mechanism 9. In the present embodiment, the storage unit 3 rides the execution surface of the liquid recovery unit 30 in the respective nozzles. In the lower position, when the storage device 10 stops operating, the upper part of each of the protruding members ^: the coffee moves to the opposite side of the corresponding nozzle _, and the silk portion 3 is secreted. (4) The coating liquid of the person is used for the purpose of washing. That is, the coating liquid which is attached to the nozzle 1 is attached to the vicinity of the discharge σ, and thus the storage portion 97125545^15 200911389 will be from the respective protruding members 3 The washing liquid poured out from each of the supply ports of 33 is sprayed to the respective nozzles 11 to 13, and the nozzles 1M3 can be washed. (2) Coating operation of the coating device Next, the operation of the coating device 1 configured as described above will be described. First, an outline of the coating operation of the coating device will be described. The coating target substrate W of the coating device 10 is placed on the stage 5 by being carried in the coating device 1 by a transfer robot or the like (not shown). The substrate w is placed thereon (the plurality of grooves are placed in parallel with the X-axis direction. Further, the substrate w loaded into the coating device 10 has an anode and a hole transport layer formed thereon. When the substrate w loaded in the coating apparatus 10 is fixed to the stage 5, the #7 section 7 causes the stage_mouth unit_ to be initially placed. The frequency section 7 causes the stage 5 to be predetermined for each substrate_to The initial position simultaneously moves the nozzle unit 1 to the slider 2. In addition, the initial position Si of the platform 5

UU

St:〜13中最靠Y轴正方向侧的噴嘴 的溝槽正上方之位置處。如上述,當平:5=軸正方向側 ^ * 田十σ 5與噴嘴單元1配置 、°置時’控制部7朗始進行塗佈動作。 在塗佈動作中,首先,控 機構6進行控制,使喷嘴單元)_早心及平台移動 作。即,控制部7對二=機構6開始進行動 …蝴均動、與平台 科的土出。錯此,以後便重複進行嘴嘴單元 97125545 卞 16 200911389 轴方向上的移動 方向上的移動動作(第丨動作)、與平台5在γ 動作(第2動作)。 Γ'St: The position of the nozzle which is the most positive of the nozzle on the positive side of the Y-axis. As described above, when the flat: 5 = the positive side of the axis ^ * The field 10 σ 5 and the nozzle unit 1 are arranged, and the ° is set, the control unit 7 starts the coating operation. In the coating operation, first, the control mechanism 6 performs control to move the nozzle unit _ early heart and the platform. In other words, the control unit 7 starts the moving of the second and the lowering mechanisms 6 and the grounding of the platform. In this case, the nozzle unit 97125545 卞 16 200911389 moves in the direction of movement in the axial direction (the third motion) and the gamma motion (the second motion) in the platform 5 is repeated. Γ'

具體而言,首先,第!動作係從喷嘴單元i的各嗔嘴^ 卜吐出紅色有_材料,同日讀嘴單元1從職21-端朝 另一端移動。另外’如上述,各噴嘴11训在Y軸方向上相 隔基板w上卿錢_3翁長肪財向的紐)間隔配 置。所以,在第1次的第1動作中,便逐次跳躍2列間隔每次 就3列份溝槽施行塗佈。藉此,對基板W上所形成的溝槽結束 3列份塗佈。接著,第2動作係使平台5在γ軸正方向上依基 板W上所形成溝槽的9列份長度間隔進行間距饋進。之後,藉 由錢施行第1動作與第2動作,對基板W每次施行3列錄 佈。精此’便在基板wjl將有機EL材料塗佈成條紋狀。 在截^對基板W的有效區域(形财溝槽的區域)塗佈有機 EL材料前’均施行第1動作與第2動作。另外,在此時,雖 相關X軸方向上除基板?有效區域以外的其餘部分,亦施行有 機EL材料的塗佈,但在除有效區域以外的區域中所塗佈的有 機EL材料’係利用後述的去除處理施行去除。依照上述,便 結束對1片基板w的塗佈動作。 ,另二’結束塗佈裝置10之塗佈處理的基板w,*未圖示搬 运機益人從塗佈裝置1Q中搬出。對於所搬出的基板W,在基 板W上除有政區域以外的其他區域中所塗佈的有機EL材料被 去除。去除處理只要為可將基板W上的有機EL材料去除之方 97125545 17 200911389 法,則任何方法均可’例如可為利用雷射磨損將有機乩材料 =除的方法’亦可為預先在絲區域上黏貼遮蓋膠帶的方法。 • 織嘴已結束去除處理的基板w施行乾燥處理(烘烤處理)。 由上’便對紅色有機EL材料結束塗佈、乾燥處理。然後,對 基板W’與紅色的情況相同,針對綠色與藍色的有機EL材料 施行塗佈、乾燥處理。即,依序施行:綠色有機EL材料的塗 佈處理、將已塗佈綠色有機EL材料施行乾燥處理、藍色有機 〇 虹材料的塗佈處理、及將已塗佈藍色有機EL材料施行乾 理。如此針對紅色、、綠色及M色有機EL材料施行塗佈、乾燥 處理,藉此形成有機EL顯示裝置的發光層。更進一步,對已 形成發光層的基板,藉由透過例如真空蒸鑛法在發光層上形成 陰極電極,而可製得有機EL顯示裝置。 (3)待機狀態的塗佈裝置之動作 塗佈裝置10在未施行上述塗佈動作時(裝置未運轉時)處於 ϋ 待機狀態。該待機狀態中,噴嘴單元丨退離至既定位置,:噴 嘴1Μ3在接觸到洗淨液的狀態下保管著。以下,針對從運轉 狀態轉成待機狀態的動作、及從待機狀態轉成運轉狀態的動 進行說明。 圖5所示係從運轉狀態轉成待機狀態、及從待機狀態轉成運 轉狀態相關之塗佈裝置10的動作流程之流程圖。在圖5所示 之流程圖,表示在對施行塗佈動作中的塗佈裝置1〇發出運 停止指示後之塗佈裝置10動作。 97125545 18 200911389 首先,在步驟Si中,控制部7 汾 的嗔嘴單元W μ s t 吏在1佈處理時會進行移動 V止。另外,喷嘴單元〗停止於 二端t位於佯瞢#q ^+ 、賀嘴移動機構2 靜而▲ 方的一端(圖1⑷所示左側一端)。承 具體而吕,啥嘴留项^更 相關f^於各喷嘴、與所㈣各突起構 相=轴方向上位置為相同之位置處。此處,該位置, 單元1提靜鮮制部7藉由對嘴嘴 :抓》,使各料11〜13的塗佈驗出停止。 仲制p_3中’ _ 7藉由對保管部移動_提 = 而切換保管部3的位置。具體而言,控制部 依使液回收部30底面位於各噴嘴叫3正下方 ' 3,移動成各突起構件㈣位於各喷嘴n〜13正下方位置= ^驟S3的下—個步驟S4中,藉由控制部7對洗淨液供應 #8提供控難令,而從供應驗由各供應配管,將洗淨液供 Ο 麻各突起構件3卜33的供應口。此時,洗淨液供應部8係將 洗淨液供應成各突起構件31〜33的上面31a〜咖上,裝盛洗淨 =的知度。以下’以突起構件31為例,針對步驟&的詳細内 容進行說明。另外,以下’就3個突起構件31〜33中的突起構 件31為例進行說明,而關於其他的突起構件32與μ亦與突 起構件31相同。 圖6所示係保管時,經供應洗淨液後的保管部3之狀態圖。 另外,圖6中,就3個突起構件31〜33中雖僅圖示對突起構件 31供應洗淨㈣狀態,但洗淨液的狀態在其他的狄構件犯 97125545 19 200911389 與33均成與圖6 _狀態。_所示,在步㈣中,利用 L共應部8供應洗淨液,使突起構件31的上面31a上裝 、尹液L即§依從上面…的供應口中湧出既定量洗淨 Γ方式供應洗淨液,則洗淨液便由表面張力對上面31a成突 出狀態(裝盛狀態)。在步驟S4中,洗淨液供應部8供應洗淨 液直到在突_件31的上面3U墙有嶋L狀態為 ^當達_狀_,便停止供應L言,洗淨液供應部 么應足以使上面31a上裝盛有洗淨液狀H之量的洗淨液 t便停止供應。另外,雜應量過多,便因表面張力導致半 球面狀裝盛之狀態崩潰,從上面31a多少會有洗淨液會溢出於 Μ絲,目而洗淨液供應部8最好依不會使裝盛狀 < ^的€度進仃洗⑦液的供應。如上述,根據本實施形態, :中並無必要㈣供應洗淨液,因而可減少所消耗的 洗淨液量,可效率佳地使用洗淨液。Specifically, first, the first! The action is to discharge the red material from the nozzles of the nozzle unit i, and the nozzle unit 1 moves from the 21st end to the other end on the same day. Further, as described above, each of the nozzles 11 is arranged to be spaced apart from each other on the substrate w in the Y-axis direction. Therefore, in the first operation of the first time, the two rows of grooves are sequentially applied to each of the two rows of grooves. Thereby, the groove formed on the substrate W is coated in three stages. Next, in the second operation, the stage 5 is pitch-fed in the positive direction of the γ-axis in accordance with the interval of 9 rows of the grooves formed on the substrate W. Thereafter, the first operation and the second operation are performed by the money, and the substrate W is recorded in three rows at a time. In this case, the organic EL material is applied in a stripe shape on the substrate wjl. The first operation and the second operation are performed before the organic EL material is applied to the effective region (the region of the shaped groove) of the substrate W. In addition, at this time, in addition to the substrate in the X-axis direction? The coating of the organic EL material is also applied to the remaining portion other than the effective region, but the organic EL material applied in the region other than the effective region is removed by the removal treatment described later. According to the above, the coating operation for one substrate w is completed. The other two "ends the substrate w of the coating process of the coating device 10, * the unmanned transporter is removed from the coating device 1Q. With respect to the substrate W that has been carried out, the organic EL material applied in the region other than the political region on the substrate W is removed. The removal treatment may be any method that can remove the organic EL material on the substrate W by the method 97125545 17 200911389, and any method can be 'for example, the method of using the laser abrasion to remove the organic germanium material=may be a pre-wire area The method of attaching the cover tape. • The substrate w whose end of the process has been removed is subjected to a drying process (baking process). From the top, the red organic EL material is coated and dried. Then, the substrate W' is coated and dried with respect to the green and blue organic EL materials in the same manner as in the case of red. That is, the coating treatment of the green organic EL material, the drying treatment of the applied green organic EL material, the coating treatment of the blue organic enamel material, and the application of the applied blue organic EL material are carried out in sequence. Reason. Thus, the red, green, and M-color organic EL materials were coated and dried to form a light-emitting layer of the organic EL display device. Further, an organic EL display device can be obtained by forming a cathode electrode on a light-emitting layer by, for example, a vacuum evaporation method on a substrate on which a light-emitting layer has been formed. (3) Operation of the coating device in the standby state The coating device 10 is in the standby state when the coating operation is not performed (when the device is not operating). In this standby state, the nozzle unit 丨 is retracted to a predetermined position, and the nozzle 1Μ3 is stored in contact with the washing liquid. Hereinafter, an operation from the operation state to the standby state and an operation from the standby state to the operation state will be described. Fig. 5 is a flow chart showing the flow of the operation of the coating device 10 in the transition from the operating state to the standby state and from the standby state to the operating state. The flow chart shown in Fig. 5 shows the operation of the coating device 10 after the application of the stop device to the coating device 1 in the application operation. 97125545 18 200911389 First, in step Si, the nozzle unit W μ s t 控制 of the control unit 7 会 is moved by the V-stop. Further, the nozzle unit is stopped at the end of the two ends t located at 佯瞢#q ^+ and the moving mouth of the moving nozzle 2 is stationary (the left end shown in Fig. 1 (4)). According to the specificity, the mouth of the mouth is more related to the nozzles, and the positions of the protrusions in the (4) direction are the same positions in the axial direction. Here, at this position, the unit 1 lifts the fresh portion 7 to stop the coating of the respective materials 11 to 13 by the nozzles. In the intermediate system p_3, the position of the storage unit 3 is switched by moving the storage unit. Specifically, the control unit moves in such a manner that the bottom surface of the liquid recovery unit 30 is located immediately below each nozzle 3, and moves so that each of the projection members (4) is located immediately below each of the nozzles n to 13 = step S4. The control unit 7 supplies a control command to the cleaning liquid supply #8, and supplies the cleaning liquid to the supply port of each of the projection members 33 from the supply pipes. At this time, the cleaning liquid supply unit 8 supplies the cleaning liquid to the upper surface 31a to the coffee of each of the protruding members 31 to 33, and stores the degree of cleaning. Hereinafter, the details of the steps & will be described by taking the protruding member 31 as an example. In the following description, the protruding members 31 of the three protruding members 31 to 33 will be described as an example, and the other protruding members 32 and μ are also the same as the protruding members 31. Fig. 6 is a view showing the state of the storage unit 3 after the supply of the cleaning liquid at the time of storage. In addition, in FIG. 6, although the state in which the washing member (4) is supplied to the protrusion member 31 in the three protrusion members 31 to 33 is shown, the state of the cleaning liquid is in the same manner as in other members. 97125545 19 200911389 and 33 6 _ status. _, in the step (4), the cleaning solution is supplied by the L co-receiving portion 8, and the upper surface 31a of the protruding member 31 is mounted on the upper surface 31a of the protruding member 31, and the yin liquid L, which is compliant with the upper surface, is supplied with a predetermined amount of cleaning 供应. In the case of the cleaning liquid, the washing liquid is in a state of being protruded from the upper surface 31a by the surface tension (loaded state). In step S4, the cleaning liquid supply unit 8 supplies the cleaning liquid until the 3L state of the upper 3U wall of the protrusion 31 is ___, and the supply is stopped, and the cleaning liquid supply unit should It is sufficient to stop the supply of the cleaning liquid t containing the amount of the washing liquid H on the upper surface 31a. In addition, if the amount of the miscellaneous amount is too large, the state of the hemispherical surface is collapsed due to the surface tension, and from the above 31a, the cleaning liquid may overflow the silk, and the cleaning liquid supply unit 8 preferably does not The supply of scented < ^ is the supply of 7 liquids. As described above, according to the present embodiment, it is not necessary to supply (4) the cleaning liquid, so that the amount of the washing liquid consumed can be reduced, and the cleaning liquid can be used efficiently.

Si S4巾’當進行洗淨液供應之際,洗淨液不僅 的供應口,亦供應至儲存機構π。然後,如 儲以Γ ’當突起構件Μ的上面…Μ盛洗淨^ L時,在 ^機 洗淨液成為儲存至較上面加更靠上方位置為 諸存槽咖内的高度為止)的狀態^^ =^構37内的洗淨液壓力、與上面仏上的洗淨液L 所承又表面張力_平衡而(依^度與大小)裝盛。 ’在步㈣之下—步驟w,藉由控制部 97125545 20 200911389 7對保管部移動機構9提供控制指令,使保管部3朝上方移動。 保管部3依各突起構件31〜33的上面318〜33&與各自對應的各 噴嘴11〜13之吐出口分別隔開既定間隔而相對向之方式進行 移動。該既定間隔係預設,具體而言,係在各突起構件3卜犯 的上面31a〜33a上所裝盛的洗淨液至少能接觸到各嘴嘴1卜u 下面的間隔。換言之,既定間隔設定為較小於上面如〜咖上 所裝盛洗淨液的高度。另外,裝盛洗淨液的高度及大小,除依 ('存於洗淨液種類、突起構件材質(使用PTFE(聚四氟乙稀)等) 之外,尚亦依存於供應口大小、儲存機構的配管粗度等。 另外’本實施形態中,因為在保管時(後述洗料亦同)各喷Si S4 towel' When the supply of the cleaning liquid is supplied, the supply port of the cleaning liquid is supplied to the storage mechanism π. Then, if it is stored in the top of the raised member Μ Μ 洗 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^^ =^ The pressure of the cleaning liquid in the structure 37 and the surface tension _ on the upper surface of the cleaning liquid L are balanced and (according to the degree and size). Under step (4) - step w, the control unit 97125545 20 200911389 7 provides a control command to the storage unit moving mechanism 9 to move the storage unit 3 upward. The storage unit 3 moves relative to the discharge ports of the respective nozzles 11 to 13 corresponding to the upper surfaces 318 to 33 of the respective projecting members 31 to 33 at predetermined intervals. The predetermined interval is preset, and specifically, the cleaning liquid contained in the upper surfaces 31a to 33a of the respective projecting members 3 can at least contact the intervals below the nozzles. In other words, the predetermined interval is set to be smaller than the height of the washing liquid contained above. In addition, depending on the type and type of the cleaning liquid (using PTFE (polytetrafluoroethylene), etc.), the height and size of the washing liquid are also dependent on the size and storage of the supply port. The piping thickness of the mechanism, etc. In addition, in the present embodiment, each of the sprays is used during storage (the same applies to washing materials described later).

結果導致在塗佈動作中無法蔣涂饮、^ .As a result, it is impossible to apply milk in the coating action.

此處,在上面加心上裝盛狀態的洗淨液L蒸發。所以 思叶間的經過,上面31a~33a 然後,若所裝盛洗淨液L的 假設未設置補充洗淨液的手段,則隨時間的 所裝盛的洗淨液L量便逐漸減少。铁銘^ 97125545 200911389 里較少於某置(儲存機構37〜39的洗淨液液面高度較低於某位 置)時,喷嘴的吐出口便不會接觸到洗淨液。依此,若未設置 補充洗淨液的手段,便有無法將喷嘴依碰觸到洗淨液的狀態進 行保管之問題。為解決此問題,在第丨實施形態中,便採取設 置儲存機構37〜39的構造。即,在第1實施形態中,因為在儲 存機構37〜39中儲存洗淨液至較上面31a〜33a更靠上方位置 處,因而當在上面31a〜33a上裝盛的洗淨液l減少時,則透過 Γ)儲存機構37〜39内的洗淨液壓力,將洗淨液補充至各突起構件 31 33的供應口。所以,第1實施形態中,即便洗淨液蒸發, 上面31a〜33a上仍可維持裝盛狀態,相較於未設置儲存機構的 情況下,可更長時間保管喷嘴。 明重返參照圖5的說明,在步驟%的下一步驟π中,控制 邛7將判疋疋否有從使用者指示塗佈裝置運轉。當有運轉 指示的情況,控制部7便執行後述步驟S7的動作。另一方面, G當無運轉指示的情況,控制部7便再度執行步驟S6的動作, 直到有運轉指示為止,均依既定時間間隔重複執行步驟s6的 動作。即’控制部7待機至有運轉指示為止,若有運轉指示, 便執行步驟S7的動作。 . 务有運轉塗佈衣置1〇的指示時,便藉由執行步驟S7與S8 々動作使k佈震置1〇從待機狀態轉成運轉狀態。即,在步 驟中控制4 7對保管部移動機構9提供控制指令,藉此 將保管部3重返下方位置(執行步驟S5前的位置)。藉此,因 97125545 22 200911389 =部3移動至距喷嘴η〜13相當遠的位置處,因而在塗佈 ί理中峡噴嘴11〜13進行移動,喷嘴11〜13與保管部3仍不 會相碰撞。接荖,j牛賴;ςρ 士 控制部7對保管部移Μ構 U工術日令,藉此切換保管部3的位置。具體而古,控制 =Γ:'33位於嗔嘴1W3正下方的保管部3依 : 喷嘴1Μ3正下方處的方式進行移 ,部3巾塗佈液發钱鱗況。截至== 仏的塗佈裝置10動作’由以上的步驟S1〜S8結束。妙以 的動作後,塗佈裝置10可再度開始進行塗佈處理。 =述’根據第丨實施形態,在喷嘴u〜13進行保 置_ 狀能 5 f在面3ia〜33a上成為洗淨液裝盛 ο 各喷嘴11〜13的吐出口接觸到洗淨液狀態 用同時不需要經常供應洗淨液,因而可效率佳地使 _ 更進一步’根據第1實施形態,藉由設置儲存機構 u用儲存機構37〜39中所儲存的洗淨液、與在上面 :::面上:期洗淨液間之揚昇差,便可物 長_雜 上。藉此,便可在上面^〜咖上將洗淨液 、、日維持裝盛狀態’可更長時間保管各噴嘴u〜i3。 :外,上述保管部3係可在將各喷嘴1W3進行洗淨之 97125545 用。具體而言,當執行洗淨動作時,控制部7首先執行與 23 200911389 ( 上述步驟si~S3相同之動作。接著,控制部?對洗淨液供庫部 8提供控織令,祕對洗淨液供應部8執行洗淨液供應1 此,洗淨液供應部8便從保管部3的各突起構件3卜33之㈣、 口中湧出洗淨液。糾,她㈣作巾不_保管時,瘦你 應洗淨液。接著,控制部7執行與上述步驟仍相同之動作: 藉此,保管部3的各突起構件31〜犯之上面31a〜33a,被配置 於與各喷嘴1卜13的吐出口相對向位置處,噴嘴U的吐出口 成接觸到洗淨㈣狀態。絲,各料u〜l3由洗淨液進行洗 淨。另外,在洗淨時,從各麵構件3卜33的供應口所湧出的 洗淨液,從各突_件3卜33流人於如收㈣的底面,並 錄回收部3G的排出π排出。洗淨㈣—定魏定時間, 藉此結束喷嘴的洗淨。在結束噴嘴的洗淨後,控制部7便執^ 上述步驟S7與S8的動作’藉此可執行塗佈動作。另外,洗: 處理係可在塗佈裝置1G進行—天作_始前或結束後: 施’亦可在每顿既以錄板結錢做理 * 可依蚊時關隔實施。此外,洗淨處理亦可配合由彳H手、 動對控制部7提出指示之後才開始實施,亦可依照既定條件由 控制部7自動開始實施。如上述’根據本實施形態,可使用保 官部3執行噴嘴的洗淨與保管等二項動作。 (第2實施形態) 接著’針對第2實卿態㈣魏料置進行訓。上述第 1實施形態巾,在從賴狀態制運轉狀鱗、聽束喷嘴洗 97125545 24 200911389 〜13上有洗淨液殘留附著的可能性。因此, 設置將各噴嘴^殘留的洗淨# 置從供库態中,作為將洗淨液紐料段,係設 〜中抽m㈣洗淨灿 使用上述儲存_37〜39實 仏更進步’猎由 置的構造簡易化。以下 心,針,實施形態的態的差異謝 連=:Γ第2實施形態的塗佈裳置各部位、與控制部間之 連接咖。料,8所爾2__絲部3之構 ^剖視圖。圖8所示係對應於圖4所示Η,剖視圖。圖8係 待機狀悲下的保管部3狀態。另外,圖7與圖8中,針對與圖 2及圖4為相同㈣成要件,便賦予與圖2及圖4相同的元件 符號’並省略詳細說明。 如圖7所示’第2實郷態中,塗佈裝置(喷嘴保管裝置) 〇更進一步具備有洗淨液抽吸部m。此外,如圖8所示,保管 部3的儲存機構37係具有抽吸配管挪的構造。洗淨液抽吸 部m係由抽取泵等構成,而其動作係由控制部7控制。抽吸 配管37b係將儲存槽37a與洗淨液抽吸部ι〇ι相連接。另外, 除上述外’其餘的第2實施形態之塗佈裝置構造,均與容 施形態相同。 〃 Λ 接著’針對第2實施形態的塗 施形態中亦與第1實施形態相同 佈裝置動作進行說明。第2 ,當從運轉狀態轉成待機狀 實 態 97125545 25 200911389 時,便執行圖5所示步驟S1〜S5的動作。利用步驟幻,的動 作,保管部3的狀態便成為圖8所示狀態。在保管時,將依該 狀態進行各喷嘴11〜13的保管。 再者,第2實施形_動作,係當從待機狀態轉成運轉狀態 時’就各喷嘴11〜13上所附著的洗淨液由洗淨液抽吸部如進 行抽吸之處’ Μ於第1實施形態。若舉圖8為例進行說明, 在圖8所稍機絲下,若由❹者指示運轉,彳_洗淨液 抽吸部101抽吸各儲存機構37的洗淨液。藉此,在上面仙 上裝盛的洗淨液(_㈣嘴11上的洗淨液)L便被抽吸往供 f 口而回收。另外,在上述中,雖以3個突起構件31〜33中之 大起構件31為例進行說明,但是相關其餘的突起構件π及 I3均執行與突起構件31相同之動作。如上述,在第2實施形 。中可將在各噴嘴11〜13上所朗的洗淨料過洗淨液抽吸 部101而去除。 具體而言,在51 5所示轉S6的败結果騎定之後,控 制部7對洗淨液抽吸部1G1提供控制齡,岐絲液抽吸部 从丁才吸動作。即’洗淨液抽吸部101經由儲存機構37〜39 從各供應配管34〜36中抽吸洗淨液。藉此,各上面31a〜33a上 的洗淨液便叫至各供細。在第2實施縣巾,在利用洗淨 液抽吸部如施行抽簡频,便執行步㈣的動作。 U液抽料1G1㈤抽吸動作,係在洗淨處理結束 亦;再度開始進仃塗佈動作之前執行。即,在洗淨處理中, 97125545 26 200911389 若洗淨液湧出預設的既定時間,洗淨液供應部8便 的供應。然後,洗淨液抽_ m執行時“二= 作。藉由軸吸動作,錢料,可從各突起 :: 應口中抽吸在各喷嘴u〜l3上 1〜犯的供 將在各喷嘴11〜13上所附著“、’淨液’在洗淨時便可 後,控制部7執行上述步驟作經以上的抽吸動作 動作。 ㈣及S8的動作’藉此可進行塗佈 如弟2貫施形態中,因為可利用洗淨液 各τ"〜13上所附著的洗淨液去除,因而當執行二二 時’在各喷嘴Μ上便不會殘留洗淨液。再广, 2 :施形態,利用洗淨液抽吸部m執行抽吸用的二: 機構貫現。即,不需要另外設置執行抽吸用的西^因而 可將塗佈裝置的構造化。 心因而 (弟3實施形態)Here, the cleaning liquid L that has been centered on the top is evaporated. Therefore, the passage between the leaves, the above 31a to 33a, then, if the washing liquid L is not assumed to be provided with a means for replenishing the washing liquid, the amount of the washing liquid L that is filled with time is gradually reduced. When Tie Ming ^ 97125545 200911389 is less than a certain place (the liquid level of the washing liquid in the storage mechanism 37 to 39 is lower than a certain position), the discharge port of the nozzle will not come into contact with the washing liquid. Accordingly, if the means for replenishing the cleaning liquid is not provided, there is a problem that the nozzle cannot be stored while being in contact with the cleaning liquid. In order to solve this problem, in the third embodiment, the configuration in which the storage mechanisms 37 to 39 are provided is adopted. In other words, in the first embodiment, since the cleaning liquid is stored in the storage mechanisms 37 to 39 to a position higher than the upper surfaces 31a to 33a, when the cleaning liquid 1 contained on the upper surfaces 31a to 33a is reduced, Then, the cleaning liquid is supplied to the supply port of each of the protruding members 31 33 through the pressure of the cleaning liquid in the storage mechanisms 37 to 39. Therefore, in the first embodiment, even if the cleaning liquid evaporates, the upper surface 31a to 33a can maintain the loaded state, and the nozzle can be stored for a longer period of time than when the storage mechanism is not provided. Referring to the description of Fig. 5, in the next step π of step %, the control unit 7 will judge whether or not the coating apparatus is operated from the user. When there is an operation instruction, the control unit 7 executes the operation of step S7 described later. On the other hand, if there is no operation instruction, the control unit 7 performs the operation of step S6 again, and repeats the operation of step s6 at predetermined time intervals until there is an operation instruction. That is, the control unit 7 waits until there is an operation instruction, and if there is an operation instruction, the operation of step S7 is executed. When the instruction to operate the coating device is set to 1 turn, the k-cloth is set to 1 〇 by performing steps S7 and S8 々 to change from the standby state to the operating state. That is, in the step, the control 47 supplies a control command to the storage unit moving mechanism 9, thereby returning the storage unit 3 to the lower position (the position before the step S5 is executed). Thereby, since the 97125545 22 200911389 = part 3 is moved to a position far from the nozzles η to 13, the coatings 11 to 13 are moved in the coating, and the nozzles 11 to 13 and the storage unit 3 are still not in phase. collision. Then, the control unit 7 shifts the U-engineering day to the storage unit, thereby switching the position of the storage unit 3. Specifically, control = Γ: '33 The storage unit 3 located immediately below the mouth 1W3 moves in such a manner that the nozzle 1Μ3 is directly below, and the part 3 towel coating liquid pays the scale. The operation of the coating device 10 up to == ’ is completed by the above steps S1 to S8. After the operation, the coating device 10 can start the coating process again. In the second embodiment, the nozzles u to 13 are held in the nozzles 1-3 to 33a, and the discharge ports are placed on the surfaces 3ia to 33a. The discharge ports of the nozzles 11 to 13 are in contact with the state of the cleaning liquid. At the same time, it is not necessary to supply the cleaning liquid frequently, and it is possible to further improve the cleaning liquid stored in the storage mechanisms 37 to 39 by the storage mechanism u according to the first embodiment. : Face: The rise and fall between the washing liquids can make the length of the material _ miscellaneous. As a result, the cleaning liquid can be stored on the top surface of the coffee container, and the nozzles u to i3 can be stored for a longer period of time. In addition, the storage unit 3 can be used for washing 97105545 of each nozzle 1W3. Specifically, when the cleaning operation is performed, the control unit 7 first performs the same operation as 23 200911389 (the above steps si to S3. Next, the control unit provides a control knitting order to the cleaning liquid supply unit 8, and the secret washing is performed. The cleaning liquid supply unit 8 executes the cleaning liquid supply 1 , and the cleaning liquid supply unit 8 flushes the cleaning liquid from the (four) and the mouth of each of the protruding members 3 of the storage unit 3. Correction, she (4) is not used for storage. Then, the control unit 7 performs the same operation as the above-described steps: Thereby, the respective protruding members 31 to 31a to 33a of the storage unit 3 are disposed in correspondence with the respective nozzles 1 The discharge port of the nozzle U is in contact with the discharge position (four) state. The wire, each of the materials u to l3 is washed by the cleaning liquid, and at the time of washing, from the surface member 3 The washing liquid from the supply port is discharged from the bottom of each of the three parts of the body, and is discharged from the bottom of the collection unit (4), and is discharged from the discharge unit 3G. Washing (4) - setting the Weiding time, thereby ending the nozzle After the washing of the nozzle is completed, the control unit 7 performs the above-described operations of steps S7 and S8. In addition, the washing: the treatment system can be carried out before or after the day of the coating device 1G: the application can also be carried out at the time of each meal, and the separation can be carried out. The cleaning process may be started after the instruction is given by the H-hand or the movement control unit 7, and may be automatically started by the control unit 7 in accordance with the predetermined conditions. As described above, the warranty department may be used according to the present embodiment. (3) The second operation is performed in the second embodiment (the second embodiment). Listening to the nozzle nozzle wash 97125545 24 200911389 ~13 There is a possibility of residual adhesion of the cleaning liquid. Therefore, it is set to remove the residual # of each nozzle ^ from the supply state, as the cleaning liquid ~ 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Swing the connection between the various parts and the control department. Material, 8 Seoul 2__ silk Fig. 8 is a cross-sectional view corresponding to Fig. 4. Fig. 8 is a state of the storage unit 3 in a standby state. In addition, in Fig. 7 and Fig. 8, for Fig. 2 and Fig. 4 In the second embodiment, the coating device (nozzle storage device) is further provided with the same reference numerals as in FIG. 2 and FIG. 4, and the detailed description is omitted. In addition, as shown in Fig. 8, the storage mechanism 37 of the storage unit 3 has a structure in which the suction pipe is moved. The cleaning liquid suction unit m is constituted by an extraction pump or the like, and its operation system is The control unit 7 controls the suction pipe 37b to connect the storage tank 37a to the cleaning liquid suction unit ι〇. In addition, the coating apparatus structure of the second embodiment other than the above is the same as the configuration. 〃 Λ Next, the operation of the second embodiment will be described in the same manner as in the first embodiment. Second, when the operation state is changed to the standby state 97125545 25 200911389, the operations of steps S1 to S5 shown in Fig. 5 are executed. The state of the storage unit 3 is in the state shown in Fig. 8 by the action of the step illusion. At the time of storage, the storage of the nozzles 11 to 13 is performed in this state. In addition, in the second embodiment, when the operation state is changed from the standby state to the operation state, the "cleaning liquid adhered to each of the nozzles 11 to 13 is sucked by the cleaning liquid suction portion". The first embodiment. Referring to Fig. 8 as an example, the cleaning solution of each storage mechanism 37 is sucked by the 彳-cleaning liquid suction unit 101 under the slight machine wire of Fig. 8 when the operation is instructed by the latter. Thereby, the washing liquid (the washing liquid on the _ (four) mouth 11) L which is filled in the above is sucked to the mouth of the f and recovered. In the above description, the large rising member 31 of the three protruding members 31 to 33 will be described as an example. However, the remaining protruding members π and I3 perform the same operations as those of the protruding member 31. As described above, it is formed in the second embodiment. In this case, the cleaning material which has been discharged from each of the nozzles 11 to 13 can be removed by the cleaning liquid suction unit 101. Specifically, after the result of the defeat of S6 shown in 5:5, the control unit 7 supplies the control liquid to the cleaning liquid suction unit 1G1, and the silk liquid suction unit is sucked. In other words, the cleaning liquid suction unit 101 suctions the cleaning liquid from the supply pipes 34 to 36 via the storage mechanisms 37 to 39. Thereby, the washing liquid on each of the upper surfaces 31a to 33a is called to be thinned. In the second embodiment of the county towel, the operation of step (4) is performed by performing the pumping and tapping using the cleaning liquid suction unit. U liquid pumping 1G1 (five) pumping action is performed at the end of the washing process; it is executed before the sputum coating operation is resumed. That is, in the washing process, 97125545 26 200911389 If the washing liquid is poured out for a predetermined predetermined time, the washing liquid supply unit 8 is supplied. Then, the washing liquid is pumped _ m when performing "two = do. By means of the axial suction action, the money material can be sucked from each protrusion:: The mouth should be sucked in each nozzle u~l3 1~ guilty of the supply will be in each nozzle When the "cleaning liquid" attached to 11 to 13 is ready for washing, the control unit 7 executes the above-described steps to perform the above-described suction operation. (4) and the operation of S8, in which the application can be carried out in the form of a second application, since the cleaning liquid attached to each of the τ"~13 can be removed by the cleaning liquid, so when the second and second are performed, The cleaning solution will not remain on the crucible. Further, 2: in the form of application, the second suction is performed by the cleaning liquid suction unit m: the mechanism is displayed. That is, it is not necessary to separately provide the west for performing suction, and thus the structure of the coating device can be made. Heart thus (different 3 implementation)

U !實其突實::=鑛裝置進行說"。上述第 淨液,因蒸發導致儲存機構‘上裝盛的洗 少,結果若所錯存的洗淨液量 液量逐漸減 液液面高度在某高度町),上^ =⑽存機射的洗淨 (通常,若儲存機構上便不展盛洗淨液 在上面31a〜33a上便不農盛 以 ' =⑹度,則 ::無設置儲存機構的〜,雖二二= 200911389 若經某程度的時間後,便無法保管喷嘴。第3實施形態中,檢 測儲存機構37〜39中所儲存的洗淨液量,在上面31a〜33a上不 裝盛洗淨液前,便再度供應洗淨液。藉此,便可消除保管噴嘴 之時間限制。以下,就以與第i實施形態的差異處為中心,針 對第3實施形態的詳細内容進行說明。 圖9所示係第3實施形態的塗佈裝置各部位、與控制部間之 連接關係圖。另外,圖9中,針對與圖2相同構成要件賦予圖U! Really sharp:: = mine device says ". In the above-mentioned cleaning liquid, the storage mechanism is less washed by evaporation, and as a result, if the amount of the cleaning liquid that is erroneously decreased, the liquid level is gradually reduced to a certain height, and the upper part is (=) Washing (usually, if the storage mechanism does not show the washing liquid on the above 31a~33a, it will not be used for '=(6) degrees, then:: No storage mechanism is set~, although two or two = 200911389 After a certain period of time, the nozzle cannot be stored. In the third embodiment, the amount of the cleaning liquid stored in the storage mechanisms 37 to 39 is detected, and the cleaning is again supplied before the cleaning liquid is placed on the upper surfaces 31a to 33a. In this way, the time limit of the storage nozzle can be eliminated. The details of the third embodiment will be described below with respect to the difference from the i-th embodiment. A diagram showing the connection relationship between each part of the coating apparatus and the control unit. In addition, in FIG. 9, the same components are attached to FIG.

2相同的元件符號,並省略詳細朗。如圖9所示,第3實施 形態中’塗佈裝置(喷嘴保管裝置)係更進—步具備有液量檢測 邛102液里檢測部1〇2係設置於各儲存機構耵〜即中,並檢 測各儲存機構37〜39的液量。具體而言,檢_存機構π】 中所儲存的洗較量已達某既定知下(儲存機構巾的洗淨液 夜面门度已達某w度以下)。由液量檢剛部⑽所進行的檢測 結果’通知給控制部7。即,若檢測儲存機構3卜39中所儲存 的任-洗淨液量已達預設蚊量以下,液量檢測部⑽便對控 制部7進行通知。 圖10所示係第3實施形態的塗佈裝置動作流程之流程圖。 另外’圖10中,針對進行娜所示步驟為相_的步驟, 便賦予與圖5相_步驟職,並省略詳細說明。 ==施形態亦與第i實施形態相同,當從運轉狀態轉成待 機狀態時,執行步驟S1〜S5的動作。 F第3實施形態中,在步驟 後’執行步驟SU的動作。即,在步驟S11中,控制部7 97125545 28 200911389 ^定是料度供狀料。該期定频射奴 罝檢測部102發出内容為杜—, 有攸液 m ,存機構37,中賴存的任 液罝已達預設既定量以下的n 谷 洗净 ,± 的通知。若從液量檢測部102有笋出 上述通知時,控制部7便 t出 ςΐ9沾叙说 更爿疋為再度供應洗淨液,便執行步驟 的動作°另-方面’當無從液量檢測部 時,控制部7便判定為不 丈通知 的動作。 而再度供應洗淨液,而執行步驟S6 、步驟S12中,藉由批制Λγ7。 令,便淨祕應部8提供控制指 :、度對洗淨液供應部δ供應洗淨液。在步驟S12中所供 μ洗#液之供應!可為預設量。利用該步驟犯 構 37〜39中所儲存的洗淨 存枝構 喑喈祕$ μ 里日夕於上歧^,而可繼續進行 乂驟幻2之後’執行步驟S6的動作。 第3心㈣中’步驟%的動作亦與第1實施形態相同。 即匕制4 7判疋是否有從使用者指示運轉塗佈裝置,當有運 )轉指科,便執行後述步驟S7的動作。另—方面,當無運轉 才曰作L制部7便再度執行步驟sn的動作。所以,控制部 7係在截至有運轉指示之前’均依既定時關隔重複施行步驟 S1U的動作’視需要施行步驟犯的動作。即,控制部7 係截至有運轉指示之前均呈待機狀態,同時當判斷為必需再度 供應洗淨液時(步驟su中為「YEs」),便再度供應洗淨液: 另外乂驟S7與S8的動作與第!實施形態相同。 依如上述,根據第3實施形態,檢測已無法進行喷嘴保管的 97125545 29 200911389 情況(即,儲存機構37〜39巾所館存的洗淨液量已達既定量以 下),並配合所檢_的情料度供m夜。減,在供應 源的洗淨液尚未耗盡的前提下,均可持續進行嘴嘴的保管。根 據第3實施形態,即使長期間(例如丨曰)保管噴嘴時,上面^ 的洗淨液仍不會消失。 另外,上述第3實施形態中,並無設置第2實施形態所示的 洗淨液抽吸手段,但是在第3實施形態中亦可設置該洗淨液抽 吸手段。藉此,與第2實施形態相同,可以簡易的構造將各喷 嘴11〜13上所附著的洗淨液去除。 再者,上述第3實施形態中,亦可另外設置對儲存機構3厂39 再度供應洗淨_配管(管路)。圖η所示係第3實施形態變 化例的保管部3之構造圖。如圖U所示,第3實施形態變化 例係在供應配管34和儲存機構37的分支部分、與供應源間設 置閥103。此外,設置將閥103和供應源間之供應配管、與儲 ^存槽37&相連接的再供應配管耵c。另外,閥103的開閉係利 用控制部7進行控制。另外,圖u中僅表示突起構件31相關 構造而已,但相關其他的突起構件32及33,亦與圖n同樣 設置閥與再供應配管。 7 目11所示變化例中,當在上述步驟S4中供應洗淨液時,便 利用控制部7將_ 1〇3開放。所以,從供應源所供應的洗淨液 便通過供應配管34而供應至突起構件31的供應口。另一方 面,當在上述步驟S12中再度供應洗淨液時,便由控制部7將 97125545 30 200911389 闕103關閉。所以,從供應源所供應的洗淨液經由再供應㈣ 37c供應至儲存槽37a。如上述,當在保管時再度供應洗^ 時,亦可從供應源、將洗淨液直接供應至儲存槽咖。另外, 上述中,僅就突起構件31的相_作進行說明,但其他的^ 起構件32及33之動作,亦均與突起構件31的相_作= (第4實施形態)2 the same component symbol, and the detailed description is omitted. As shown in Fig. 9, in the third embodiment, the "application device (nozzle storage device) further includes a liquid amount detecting port 102. The liquid detecting portion 1 2 is provided in each of the storage mechanisms. The amount of liquid in each of the storage mechanisms 37 to 39 is detected. Specifically, the amount of washing stored in the inspection mechanism π is up to a certain level (the night surface of the cleaning agent of the storage mechanism has reached a certain degree or less). The detection result ' performed by the liquid amount measuring unit (10) is notified to the control unit 7. That is, if the amount of the any-washing liquid stored in the storage means 3 is less than the preset amount of mosquitoes, the liquid amount detecting unit (10) notifies the control unit 7. Fig. 10 is a flow chart showing the operation flow of the coating apparatus of the third embodiment. In addition, in FIG. 10, the step of performing the phase shown in FIG. 10 is given to the step of FIG. 5, and the detailed description is omitted. The == mode is also the same as that of the i-th embodiment, and when the operation state is changed to the standby state, the operations of steps S1 to S5 are executed. In the third embodiment of the F, the operation of the step SU is performed after the step. That is, in step S11, the control unit 7 97125545 28 200911389 is determined to be a feed. In this period, the fixed-frequency slave detection unit 102 issues a notification that the contents are Du-, the sputum m, and the storage mechanism 37, and any liquid sputum remaining in the sputum has reached the preset n-valley cleaning, ±. When the above-described notification is made from the liquid amount detecting unit 102, the control unit 7 performs the operation of the step by re-sending the cleaning liquid, and the other steps are performed. The control unit 7 determines that the notification is not performed. On the other hand, the cleaning liquid is supplied again, and in steps S6 and S12, Λ7 is batch-produced. In the case of the cleaning solution supply unit δ, the cleaning liquid is supplied to the cleaning liquid supply unit δ. The supply of μ washing liquid supplied in step S12! Can be a preset amount. By using the steps of the steps 37 to 39, the cleaning and storage structure is stored in the upper and lower portions, and the operation of step S6 is performed. The operation of the step % in the third heart (four) is also the same as in the first embodiment. In other words, it is determined whether or not the operation of the coating device is instructed by the user, and when the operation is performed, the operation of step S7 described later is executed. On the other hand, when there is no operation, the operation of step Sn is performed again. Therefore, the control unit 7 performs the operation of repeating the execution of the step S1U at the same time as before the operation instruction. In other words, the control unit 7 is in the standby state until the operation instruction is issued, and when it is determined that it is necessary to supply the cleaning liquid again ("YEs" in the step su), the cleaning liquid is again supplied: Further steps S7 and S8 The action and the first! The embodiment is the same. As described above, according to the third embodiment, the case of 97125545 29 200911389 in which the nozzle storage is impossible is detected (that is, the amount of the cleaning liquid stored in the storage mechanism 37 to 39 is less than the predetermined amount), and the inspection is performed _ The situation is for m night. Under the premise that the supply of the cleaning solution has not been exhausted, the mouth can be kept safely. According to the third embodiment, even when the nozzle is stored for a long period of time (for example, 丨曰), the cleaning liquid of the upper surface does not disappear. Further, in the third embodiment, the cleaning liquid suction means shown in the second embodiment is not provided. However, the cleaning liquid suction means may be provided in the third embodiment. As a result, in the same manner as in the second embodiment, the cleaning liquid adhering to each of the nozzles 11 to 13 can be removed with a simple structure. Further, in the third embodiment, the storage unit 3 can be additionally supplied with the cleaning_pipe (pipe). Fig. n is a structural diagram showing the storage unit 3 of the third embodiment. As shown in Fig. U, in the third embodiment, a valve 103 is provided between the branch portion of the supply pipe 34 and the storage mechanism 37 and the supply source. Further, a supply pipe 阀c that connects the supply pipe between the valve 103 and the supply source and the storage tank 37& is provided. Further, the opening and closing of the valve 103 is controlled by the control unit 7. Further, in Fig. u, only the structure of the protruding member 31 is shown. However, the other protruding members 32 and 33 are also provided with a valve and a resupply pipe in the same manner as in Fig. n. In the modification shown in Fig. 11, when the cleaning liquid is supplied in the above step S4, the control unit 7 opens _1〇3. Therefore, the washing liquid supplied from the supply source is supplied to the supply port of the projecting member 31 through the supply pipe 34. On the other hand, when the cleaning liquid is again supplied in the above-described step S12, the control unit 7 closes 97125545 30 200911389 阙103. Therefore, the washing liquid supplied from the supply source is supplied to the storage tank 37a via the resupply (four) 37c. As described above, when the washing is again supplied during storage, the washing liquid can be directly supplied from the supply source to the storage tank. Further, in the above description, only the phase of the protrusion member 31 will be described, but the operation of the other members 32 and 33 is also the same as that of the protrusion member 31 (the fourth embodiment).

接著’針對第4實施形態的喷嘴保管裝置進行說明。第*實 施形態巾,塗佈裝置(喷嘴鮮裝£)除上述対_管動作之 外,更執行噴嘴的洗淨動作。以下,就與第2實麵態的差異 處為中心,針對第4實施形態的詳細内容進行說明。 、 第4實施形態的塗佈裝置構造,除保管部(更特定而古係 指保管部的突起構件)之外,其餘均與第2實_態的嘴嘴保 管裝置相同構造。以下’參照圖12及圖13,針對保管部的構 造進行說明。 U 圖12所示係第4實施形態的保管部構造之立體圖。另外, 第4實施形態中,與第2實施形態的保管部3&與保管部牝同 樣地,塗佈裝置具備有2個保管部,因為2個保管部為相同的 構造,因而在圖12中便表圖示2個保管部中之其中一者為保 管部110。如圖12所示,保管部11〇係具備有:液回收部加、 突起構件111〜113、供應配管34〜36 '及儲存機構37〜39。另 外,在圖12及圖13中,就與圖3相同的構成要件便賦予與圖 3相同的元件符號,並省略詳細說明。 97125545 31 200911389 如圖12所示,第4實施形態中, 各突起構件11M13的形Next, the nozzle storage device according to the fourth embodiment will be described. In the fourth embodiment, the coating device (nozzle fresh) is subjected to the cleaning operation of the nozzle in addition to the above-described 対_tube operation. Hereinafter, the details of the fourth embodiment will be described centering on the difference from the second real surface state. The coating apparatus structure of the fourth embodiment has the same structure as the nozzle holder of the second real state except for the storage unit (more specifically, the projection member of the storage unit). Hereinafter, the configuration of the storage unit will be described with reference to Figs. 12 and 13 . U Fig. 12 is a perspective view showing the structure of the storage unit in the fourth embodiment. In the fourth embodiment, similarly to the storage unit 3& and the storage unit 第 of the second embodiment, the application device includes two storage units, and since the two storage units have the same structure, in FIG. One of the two storage units is shown in the storage unit 110. As shown in FIG. 12, the storage unit 11 includes a liquid recovery unit, projection members 111 to 113, supply pipes 34 to 36', and storage mechanisms 37 to 39. It is to be noted that the same components as those in Fig. 3 are denoted by the same reference numerals as those in Fig. 3, and the detailed description thereof will be omitted. 97125545 31 200911389 As shown in FIG. 12, in the fourth embodiment, the shape of each protruding member 11M13

為例’針對突起構件的構造進行說明。As an example, the structure of the protruding member will be described.

同)配置姐淨時與喷嘴n的下面(設置吐出口之—面)Ua相 對向。此外’在上面Ilia設有供應口 ρ 將藉由從供應口進行洗淨液的供應, 到洗淨液。 σ。後有詳述,在洗淨時 而使噴嘴11的前端碰觸 再者’犬起構件111係具有圓柱狀外形,上面llla則呈略In the same way, when the sister net is configured, it is opposite to the lower side of the nozzle n (the surface of the discharge port is provided) Ua. In addition, the supply port ρ is provided on Ilia above, and the cleaning liquid is supplied from the supply port to the cleaning liquid. σ. As will be described later in detail, the front end of the nozzle 11 is touched during washing. Further, the dog-inducing member 111 has a cylindrical outer shape, and the upper llla is slightly

其中’突起構件m❸前端直徑係較小於嗔嘴u的前端直經。 即,上面Ilia的直徑φ 1係較小於噴嘴丨丨的下面11&直徑办 2。例如2個直徑的比係設定為φ丨:φ 2=3 : 5,具體而言,當 上面111a的直徑φ 1係φΐ=3[刪]時,便將喷嘴η的下面11& 直徑¢2設為φ2=5[πιιη]。此外,突起構件ηι係在上面nia 的周圍設有朝外周逐漸降低的傾斜面mb。藉由設為具有傾 斜面mb的形狀,突起構件lu便可縮小上面Ula的直徑, 同時可確保整體突起構件111的粗度,和確保強度。 上述就突起構件111的相關構造進行說明,而突起構件112 與113的構成亦與圖13所示突起構件1U的構造相同。即, 突起構件112與113具有洗淨時分別與噴嘴12及13相對向配 97125545 32 200911389 置的上面ma及113a。在上面收及⑽上分別各設置1 個供應口。此外,突起構件】彳 綺112係在上面112a的·設有朝 外周逐漸降低的傾斜面112b,突起構件m係在上面U3a的 周圍設有朝外周逐漸降低的傾斜面U3b。 其次,針對第4實卿態的塗騎置(喷嘴保管裝置)之動作 關於塗佈動作及保管時的動作,第4實施形態的動 的動作相同。第4實施形態中,塗佈裝置除 塗佈動作及喷嘴的保管動作之外,尚施行將喷嘴洗淨的動作。 以下,參關14 ’針對洗淨動作進行說明。 圖14所示係第4實施形態的洗淨動作流程之流程圖。另外, 利⑽佈裝置進行-天作業開始前或 ’、°母-人對既定片數基板施行塗佈處理結束後 便實施’亦可依既定時間間隔實施。此外,洗淨處 作業者手動對控制部7指示之後才者 ' 件由控制部7自動開始實施。”、…、可依照既定條 ’首先在步驟⑵中,控制部7係使塗佈處理時進 订移動的育嘴單元i停止。進 2二端中,在保管部κ 在育嘴移動機構 端)停止。更具體而V,:置一端(圖1(a)所示靠左側- /、。,喷嘴單元1停止於各嘴嘴、與所料庵 各犬起構件在X軸方向上位 ' /、、- 係喷嘴單元!的退離位置。接著,在置^此處,該位置 ϋ ϊ 步驟微中,控制部了對 早叫供控制指令,使由各喷嘴丨1询進行的塗驗 97125545 33 200911389 吐出停止。 广驟S22的下-步驟S23中,控制部7對保管部移動 美供控制指令,而切換保管部11〇的位置。具體而言 部7係使液回收部30的底面位於各喷嘴ιΐ ΐ3正下方= 的保管部UG依各突起構件U1〜U3位於各噴嘴ιΐ ΐ3正下: 位置處之方式進行移動。 的下-步㈣中,控制部7對洗淨液供應部8 料控制指令,峨供應源經由各供應配f對各突起構件 1H13的供應π供應洗淨液。圖15所示係執行步驟沿 動作時之突起構件⑴。另外,圖15係圖12所示保管部㈦ 的B-B,剖視圖。以下,以突起構件m為例,針對步驟跑 的=細内容進行刻。另外,τ面以3麵起構件ιη〜ιΐ3中 之突起構件111為例進行說明,但其 H3亦均與突起構件⑴相同。 構件112及 如圖15所示,從供應源對突起構件in的供應口供應洗淨 液’峨供應π中_洗淨液。此時,洗淨液供應部8係依湧 出洗淨液L至達距上面llla既定高度h為止的方式,控制所 供應的洗淨液流量。另外,所㈣洗淨液的高度h依存於突起 構件與噴嘴的㈣、洗淨_類、供應口大小、供應流量等。 此處’將突起構件的材質設為PTFE(聚四氟乙烯),將喷嘴的 材質設為聚酿亞胺,將洗淨液設為有機溶劑(f苯等),將供應 孔徑設為2[mm] ’將供應錢設為1G~25[ml/min]。本實施 97125545 34 200911389 形悲中,因為必需依洗淨 淨液的供應量進行控制,因 適度南度為止的方式,對洗 調整供應量的流量調整㈣部8最好具備有可微 斜面⑽再流落於、夜魏應明細洗淨液流過傾 的排出口排出。' _的底面’然後從底面上所設置 重返參照圖14的說明,在步驟⑽的下 制部7對保管部移動機椹 驟25中,控 朝±方菸S Μ、控制指令,藉此使保管部110 朝方移動。Ρ,保管部11〇係依各突起構件⑴〜⑴的上面 ⑽分別與各自對應的各噴嘴之吐出口隔開既定 間隔d而相對向方式進行移動。圖16所示係執行2=二 動作時之突起構件1U。W 丁少辦乂5的 ^ R R, m ,圖16係圖12所示保管部11〇 的β-Β剖視圖。以下,以空如 的,肉六, 起構件111為例,針對步驟S25 的砰細内谷進仃說明。另外 中之突起構件⑴為例進::_16:就3個突咖 及113亦與突起構件lu相同。 仵… 在步驟奶中,突起構件lu的上面im係依與喷嘴“的 吐出口分別隔開既定間隔“相對向方式進行移動。該既定間 隔d係預=具體而言,如圖16所示,係在上面⑴&上㈣ 出的洗淨液L接觸到喷嘴n 11下面11a的間隔。即,既定間隔 d係依較小於上面llla上所湧出洗淨液l的高度匕之方式進 行設定。例如當洗淨液係有機溶劑(例如甲苯),將突起構件 m的上面ma直徑φ1設為3_,將供細的孔徑設為 97125545 35 200911389 ㈣嘴11的下面lla直徑φ2設為5[mm],將洗淨液 的供應量設為2G[ml/mln]情況時,可知最好將既定間隔d役 為㈣.5[咖]。即’可知如上述設定各條件,上面 上·出的洗淨液L便將接觸到喷的下面山, 地將喷嘴11洗淨。 r' 再者,本實施形態中’上Φ111&的直徑Φ1係較小於喷嘴 11的下面11a直徑Φ2。所以,洗淨液僅附著於喷嘴u的下 面⑴’從供應口中渴出的洗淨液L並不會附著於噴嘴u的 側面。 藉由以上步驟S25的動作,保管部11〇的各突起構件 之上面111a〜113a ’便被配置在與各喷嘴u〜13的吐出口相對 向之位置處,各喷嘴1卜13的吐出口成為接觸到洗淨液的狀態 (圖16)。藉此,便可利用洗淨液將各喷嘴11〜13洗淨。另外, 本實施形態中,在洗淨時,因為各喷嘴u〜13與各突起構件 ϋ 111〜113並無接觸’因而藉由各喷嘴1W3與各突起構件 111〜113的接觸’便不會出現各噴嘴u〜13發生位置偏移情 形。即,可防止因各喷嘴叫3發生位置偏移,結果導致在塗 佈動作中無法將塗佈液塗佈於正確位置處的情況發生。另外, 洗=㈣供應係從開始洗淨起(從步驟S25的動作結束開始) 持續預定的既定時間。然後,執行步驟S26的動作。 重返圖14的說日月,在步驟S25的下一步驟跳巾,控制部 7對洗淨液供應部8提供控制指令,便停止從供應源供應洗淨 97125545 36 200911389 液。^進-步,在接著的步驟S27中,藉由對洗淨液抽吸部 提供㈣指令’而使洗淨_吸部1Q1開始洗淨液的抽 吸。藉此’經由儲存機構37〜39對各突起構件m〜113的供應 口附近之洗淨液進行抽吸,將供應σ附近的洗淨液去除。即, 大起構件111〜11;3之上面llla〜U3a上的洗淨液及各喷嘴 ^上所附著的洗淨液被抽吸去除。另外,如上述,本實施 中□為僅在各喷嘴u〜13的下面有附著有洗淨液,因而 連嘴嘴丨1的__著有洗淨液的情況下,可輕易 4地執订抽吸動作。洗淨液抽吸部101經預定的既定時間 動作後’便結束抽吸動作。在以上的步7之 執行步驟S28的動作。 文 令在I:二控制⑽ ^ ^ 返口於下方位置(執行步驟S25前的位置)Wherein the diameter of the front end of the projection member m is smaller than the front end of the nozzle u. That is, the diameter φ 1 of the above Ilia is smaller than the lower 11& diameter of the nozzle 办 2 . For example, the ratio of the two diameters is set to φ 丨: φ 2 = 3 : 5, specifically, when the diameter φ 1 of the upper surface 111a is φ ΐ = 3 [deleted], the lower surface 11 & diameter ¢ 2 of the nozzle η Set to φ2=5[πιιη]. Further, the protruding member ηι is provided with an inclined surface mb which gradually decreases toward the outer circumference around the upper nia. By setting the shape having the inclined surface mb, the protruding member lu can reduce the diameter of the upper Ula while ensuring the thickness of the entire protruding member 111 and ensuring the strength. The above-described configuration of the protruding member 111 will be described, and the configuration of the protruding members 112 and 113 is also the same as that of the protruding member 1U shown in Fig. 13. That is, the projecting members 112 and 113 have upper faces ma and 113a which are disposed opposite to the nozzles 12 and 13 and are provided with 97125545 32 200911389, respectively. Set one supply port on each of the above (10). Further, the projecting member 彳 112 is provided with an inclined surface 112b which is gradually lowered toward the outer periphery of the upper surface 112a, and the protruding member m is provided with an inclined surface U3b which gradually decreases toward the outer periphery around the upper surface U3a. Next, the operation of the coating device (nozzle storage device) in the fourth embodiment is the same as the operation in the fourth embodiment. In the fourth embodiment, the coating device performs an operation of washing the nozzle in addition to the coating operation and the storage operation of the nozzle. Hereinafter, the reference 14 ’ will be described for the cleaning operation. Fig. 14 is a flow chart showing the flow of the cleaning operation of the fourth embodiment. Further, the device can be carried out at a predetermined time interval before the start of the day-to-day operation or after the mother-person performs the coating process on the predetermined number of substrates. Further, the operator at the washing station manually instructs the control unit 7 to automatically start the operation by the control unit 7. ", can be in accordance with the predetermined article." First, in the step (2), the control unit 7 stops the nozzle unit i that is moving during the coating process. In the second end, the storage unit κ is on the side of the nipple moving mechanism. Stop. More specifically, V: set one end (Fig. 1 (a) is shown on the left side - /,., the nozzle unit 1 stops at each mouth, and the member of the dog is positioned in the X-axis direction. ,, - The retreat position of the nozzle unit! Then, at the position where the position is ϋ ϊ, the control unit calls the control command early, so that the test is performed by each nozzle 9711. In the next step S23 of the step S22, the control unit 7 shifts the US control command to the storage unit, and switches the position of the storage unit 11A. Specifically, the unit 7 places the bottom surface of the liquid recovery unit 30. The storage unit UG that is directly below the respective nozzles ΐ3 is moved so that the respective projection members U1 to U3 are positioned at the position immediately below the respective nozzles ΐ3: In the next step (4), the control unit 7 supplies the cleaning liquid supply unit 8 Material control command, 峨 supply source supply π supply to each protruding member 1H13 via each supply arrangement f Fig. 15 shows a projection member (1) when the step is performed. Fig. 15 is a cross-sectional view taken along line BB of the storage unit (7) shown in Fig. 12. Hereinafter, the projection member m is taken as an example, and the step is performed. Further, the τ plane is described by taking the projection member 111 of the member ιη to ι 3 on three sides as an example, but the H3 is also the same as the projection member (1). The member 112 and the supply source pair are as shown in Fig. 15 The supply port of the protrusion member in is supplied with the cleaning liquid '峨 supply π medium_washing liquid. At this time, the cleaning liquid supply unit 8 controls the station in such a manner that the cleaning liquid L is discharged to a predetermined height h from the upper surface llla. (4) The height h of the cleaning solution depends on (4) of the protruding member and the nozzle, the cleaning type, the size of the supply port, the supply flow rate, etc. Here, the material of the protruding member is set to PTFE. (polytetrafluoroethylene), the material of the nozzle is made of acrylonitrile, the cleaning liquid is made into an organic solvent (f benzene, etc.), and the supply pore size is set to 2 [mm] 'The supply money is set to 1G to 25 [ml/min]. This implementation is 97125545 34 200911389 in the form of sadness, because it must be washed The supply is controlled, and the flow adjustment for the wash adjustment supply (4) is preferably provided with a micro-bevel (10) re-flowing, and the night Wei should be able to flow through the dumping outlet. The bottom surface of the '__ is returned from the bottom surface and then returned to the description with reference to Fig. 14. In the lower part 7 of the step (10), in the storage unit moving machine step 25, the control is directed to ± square smoke S Μ, control command, Thereby, the storage unit 110 is moved to the side. The storage unit 11 moves relative to the discharge port of each nozzle corresponding to each of the protrusions (1) to (1) by a predetermined interval d. Fig. 16 shows the projecting member 1U when the 2 = two action is performed. W R R, m of Fig. 16 is a β-Β cross-sectional view of the storage unit 11〇 shown in Fig. 12. Hereinafter, the empty member, the meat six, and the member 111 will be described as an example, and the description will be given for the step S25. In addition, the protrusion member (1) in the middle is an example:: _16: The three protrusions and 113 are also the same as the protrusion member lu.仵... In the step milk, the upper surface of the protruding member lu is moved in a relative manner by a predetermined interval from the discharge port of the nozzle. In the predetermined interval d, specifically, as shown in Fig. 16, the cleaning liquid L discharged from the upper (1) & (4) contacts the interval 11a of the nozzle n 11 . That is, the predetermined interval d is set in such a manner that it is smaller than the height 匕 of the cleaning liquid l which is ejected from the upper surface 11la. For example, when the cleaning liquid is an organic solvent (for example, toluene), the upper surface ma diameter φ1 of the protruding member m is set to 3 mm, and the fine opening diameter is set to 97125545 35 200911389. (4) The lower surface 11a of the nozzle 11 has a diameter φ2 of 5 [mm]. When the supply amount of the cleaning liquid is 2G [ml/mln], it is understood that it is preferable to set the predetermined interval to (4).5 [Caf]. In other words, it is understood that the above-described conditions are set, and the cleaning liquid L that has been discharged from above is brought into contact with the lower mountain of the spray, and the nozzle 11 is washed. r' Further, in the present embodiment, the diameter Φ1 of the upper Φ111 & is smaller than the diameter Φ2 of the lower surface 11a of the nozzle 11. Therefore, the cleaning liquid adheres only to the lower surface (1) of the nozzle u and the cleaning liquid L which is thirsty from the supply port does not adhere to the side surface of the nozzle u. By the operation of the above step S25, the upper surfaces 111a to 113a' of the respective projection members of the storage portion 11 are placed at positions facing the discharge ports of the respective nozzles u to 13, and the discharge ports of the respective nozzles 1 and 13 are Contact with the state of the cleaning solution (Figure 16). Thereby, each of the nozzles 11 to 13 can be washed with the cleaning liquid. Further, in the present embodiment, since the nozzles u to 13 are not in contact with the respective projecting members 111 to 113 at the time of cleaning, the contact between the respective nozzles 1W3 and the respective projecting members 111 to 113 does not occur. Each of the nozzles u to 13 is displaced. In other words, it is possible to prevent the positional shift of each nozzle 3, and as a result, it is impossible to apply the coating liquid to the correct position during the coating operation. Further, the washing = (four) supply system continues from the start of the washing (starting from the end of the operation of step S25) for a predetermined predetermined time. Then, the action of step S26 is performed. Returning to the day and month of Fig. 14, the control unit 7 supplies a control command to the cleaning liquid supply unit 8 at the next step of step S25, and stops supplying the liquid 97125545 36 200911389 from the supply source. In the next step S27, the cleaning_suction portion 1Q1 starts the suction of the cleaning liquid by supplying the (four) command to the cleaning liquid suction unit. Thereby, the cleaning liquid in the vicinity of the supply port of each of the protruding members m to 113 is sucked by the storage mechanisms 37 to 39, and the cleaning liquid near the supply σ is removed. That is, the cleaning liquid on the upper surfaces 11la to U3a of the rising members 111 to 11; 3 and the cleaning liquid adhered to the respective nozzles are sucked and removed. Further, as described above, in the present embodiment, the cleaning liquid is adhered only to the lower surface of each of the nozzles u to 13. Therefore, even when the cleaning liquid is attached to the nozzle 丨1, the cleaning can be easily performed four times. Suction action. When the cleaning liquid suction unit 101 is operated for a predetermined predetermined time, the suction operation is terminated. In the above step 7, the action of step S28 is performed. The command is at I: two control (10) ^ ^ returning to the lower position (performing the position before step S25)

C 處。猎此,因為絲部110移動至距 ) 置處,因而在涂蚀♦丄 肖U充刀離開的位 中’即使喷嘴11〜13進行移動,噴嘴 部==0仍不:相碰撞。接著在步_中,控制 位置。且體^機構9提供控難令,便切換保管部11 〇的 =古、體而s ’控制部7使突_件m〜113位於喷嘴u〜n 位置處的保管部11〇依液、' 11〜13正下方位晋 、. 邛別的底面位於嘴嘴 使從喷嘴11〜13中;佈:移動糟此,在塗佈處理中’即 液發生飛濺情形。塗制在保管部110中塗佈 、的冼,尹動作依以上的步驟S21〜S29 97125545 37 200911389 佈裝置便再度開始進行塗佈 之動作而結束。經洗淨動作後,塗 處理。 如上述 ,根據本實施縣,塗佈裝題㈣訂面接觸洗淨 液而施行洗淨。依此,在抽__,因為只要將喷嘴下面所 附者的洗糾去除(滅)便可,_她於就射嘴側面亦有 洗淨液附著的情況下,可輕易且確實地執行抽吸動作。即,可 利用洗淨確實地財嘴上所_軌淨液去除。 /者,本實施形態中,上面的直徑01較小於喷嘴的下面直 U2目而’即使上述既定間_當地小,從供應口所湧出 的洗淨液亦不會附著於噴嘴側面上。另-方面,步驟S27中的 洗淨液抽吸動作係供細與嘴嘴間之距離越靠近,則抽吸效果 越大根據本實施形態,因為使供應卩射嘴間之距離相靠近 以充刀知仃抽吸,目而依該彻由,亦可確實地執行抽吸動作。 另外第4實㈣態中,針對如第2實施形態,在塗佈裝置 具備有洗淨祕畴1Q1的情況下,㈣裝置(喷嘴保管裳置) 所執行的洗淨動作進行說明,即使在如第丨與第3實施形態的 塗佈裂置般塗佈裝置並無設置洗淨液抽吸部m的情況,塗佈 裝置亦可執行洗淨動作。科,崎況,㈣裝置亦可不執行 圖^所不步驟S27(略過步驟沿7),而在步驟挪後便執行步 驟 S28。 (突起構件之變化例) 八人’參照圖17〜圖20 ’針對上述第4實施形態的突起構件 97125545 38 200911389 變化例之構造進行說明。另外,圖17〜圖20中,雖以塗佈裝 置中所設置3個突起構件中的丨個突起構件構造為例表示,但 關於其他2個突起構件亦與圖示之突起構件為相同構造。 圖17及圖18所示係上述實施形態變化例的突起構件之構造 圖。圖17及圖18中’突起構件121的上面121a直徑係較大 於喷嘴11的下面lla直徑。另外,本變化例中,上面12la所 设置的供應口孔徑係較小於噴嘴u的下面Ua直徑。本變化 例中’當上述間隔d過小時,如圖18所示,洗淨液L亦接觸 到噴嘴11的侧面。所以,在洗淨時,上面121a與下面lla的 間隔d ’被設定為從上面121a上所設置供應口中渴出的洗淨 液L僅接觸到下面1 ia的距離。此處,由供應口戶斤湧出的洗淨 液L «水平面(χγ面的平行面)切斷時喊面形狀為略圓形, 上述間k d亦可设定為例如大於距上自i2ia的距離y (在該 離d處的水平面之洗淨液[截面直徑,小於下面Ua的直 徑)。如上述,亦可將突起構件121的上面121a直徑,設為較 ;噴鳥11的下面ila直徑’此情況下’亦藉由將上述間隔 d δ又為適當間隔,可在喷嘴11的側面上不會附著洗淨液之情 形下施行洗淨。 圖19與81 20戶斤示係其他變化例的突起構件構造圖。圖19 中大起構件131的上面131a係呈凹型曲面。此外,圖2〇中, 構件141的上面丨41a係凸型曲面。另外,圖μ及圖 中犬起構件131的上面131a直徑係較大於喷嘴η的下面 97125545 39 200911389 lla直徑’突起構件141的上面141a直徑係較大於喷嘴u的 下面11a直徑。此外,在上面131a或141a上所設置的供應口 孔徑’係較小於噴嘴11的下面lla直徑。如圖19及圖2〇所 示’突起構件的上面亦可非平面’而為曲面。圖19及圖2〇所 示變化例中’在洗淨時,上面131a或141a的供應口、與喷嘴 11的下面lla間之間隔d,與圖17及圖18所示變化例相同, 設定為從上面131a或141a上所設置供應口湧出的洗淨液[僅 Γ'' 接觸到下面lla的距離。例如,上述間隔d亦可設定為上面 131a或141a距供應口的距離d’(在該距離d’處的水平面之洗 淨液L截面直徑,小於下面lla的直徑)。此外,如圖2〇所示, 當突起構件141的上面141a為凸型曲面時’在上面mia上所 裝盛的洗淨液L高度,係較小於將突起構件的上面設為平面的 情況。所以,因為上述間隔d變為更小,因而從供應口中抽吸 洗淨液L時的抽吸效果將變為更大。另外,如上述第4實施形 ij 態,即使突起構件U1的上面Hla直徑較小於喷嘴n的下面 lla直任時,仍可將该上面形成曲面。藉此亦可獲得與 上述實施形態相同的效果。 (其他的變化例) 另外’上述第卜第4實施形態中’在對各喷嘴施行 洗淨之際,藉由使保管部3(或110)進行移動,而使各突起構 件3卜33(或m〜113)的上面31a〜33a(或1Ua〜ll3a),配置於 與各喷嘴11〜13相對向之位置處。此處,就其他的實施形態, 97125545 40 200911389 各突起構件31〜33(或ln + 、飞11M13)對各贺嘴u〜13相對移動即 二:亦可取代使保^部3(或UQ)移動,改為使各噴嘴11〜⑶喷 K 1)進行移動,亦可使保f部3(或⑽及各喷嘴 11〜13(噴嘴單元1)雙料進行移動。 再者上述第卜第4實施形態中,塗佈裂置由3個喷嘴1卜13 施行塗佈液的塗佈,保管部3具有對應於各喷嘴u〜13的3個 突起構件31〜33(或叫⑽。此處,在其他的實施形態中, () 喷鳴個數亦可設置任何數支。 上述實施形態中就本發明喷嘴保管裝置與塗佈裝置形成-體構造的情況為例進行說明,但喷嘴保管裝置亦可構成塗佈裝 置之外的其他構件。此外,上述實施形態係就塗佈液為以有機 EL材料、電洞輸送材料為塗佈液的有機此顯示裝置之製造裝 置(塗佈裝置)為-例進行說明’本發明的喷嘴保管裝置亦可利 用於其他的塗佈裂置。例如對於將阻劑液、s〇G(Spin ^㈣ G液、或製造PDP(電襞顯示面板)時所使用的螢光材料等塗佈的 裝置’均可利用本噴嘴保管裝置。此外,為使液晶彩色顯示器 進行彩色顯示’將製造液晶單元内構成之彩色濾光片時所使用 的顏色材料,加以塗佈之裝置亦可利用本喷嘴保管裝置。 再者,當塗佈裝置基於喷嘴洗淨目的構成時,塗佈裝置亦可 為如下述構造。即,塗佈裝置(喷嘴洗淨裝置)亦可具備有:突 起構件、洗淨液供應手段、及移動手段。突起構件上面設有供 應口。洗淨液供應手段係依洗淨液湧出於突起構件上面上之方 97125545 41 200911389 供細供應洗淨液。㈣手段係依使噴嘴訂面、 ’依既定間隔相對向之方式,使噴嘴或突起構件 八、—者移動。此外,移動手段係依使在突起構件的上 面上诱出的洗淨液僅闕射嘴下面之方式,設定既定間隔。 本發明在效率佳地個保管職體而絲対等目的下,可 利用為例如為製造有機虹顯示裝置時所使用的塗佈裝置。 、上針對本發明進行詳細說明,惟前述說明中的所有事項 句僅為柄㈣例不而已,並非限定本發明的範圍。在不脫離 本發明範圍之前提下,當然可進行各種改良、變化。 【圖式簡單說明】 圖1(a)及(b)為塗佈裝置1〇的構造俯視圖及前視圖。 圖2為塗佈裝置1〇的各部位、與控制部間之連接關係圖。 圖3為保管部3的構造立體示意圖。 圖4為保管部3的A-A,剖視圖。 圖5為相關從運轉狀態轉成待機狀態、及從待機狀態轉成連 轉狀態的塗佈裝置動作流程之流程圖。 圖6為保管時,經供應洗淨液後的保管部3之狀態圖。 圖7為第2實施形態的塗佈裝置各部位、與控制部間之速换 關係圖。 圖8為第2實施形態的保管部3之構造剖視圖。 圖9為第3實施形態的塗佈裝置各部位、與控制部間之速接 關係圖。 97125545 42 200911389 圖10為第3實施形態的塗佈裝置動作流程之流程圖。 圖11為第3實施形態變化例的保管部3之構造圖。 圖12為保管部110的構造立體示意圖。 圖13為圖12所示突起構件111及喷嘴11圖。 圖14為第4實施形態之塗佈裝置的洗淨動作流程之流程圖。 圖15為在施行步驟S24動作之時點下的突起構件111圖。 圖16為在施行步驟S25動作之時點下的突起構件111圖。 圖17為第4實施形態變化例的突起構件之構造圖。 圖18為第4實施形態變化例的突起構件之構造圖。 圖19為另一變化例的突起構件之構造圖。 圖20為另一變化例的突起構件之構造圖。 【主要元件符號說明】 1 喷嘴單元 2 喷嘴移動機構 3、 3a ' 3b 保管部 4、 4R ' 4L 受液部 5 平台 6 平台移動機構 7 控制部 8 洗淨液供應部 9 保管部移動機構 10 塗佈裝置 97125545 200911389 11-13 喷嘴 11a 下面 21 滑軌 30 液回收部 突起構件 上面 31 〜33、m、112、113、m、m、141 31a、32a、33a、Ilia、112a、113a、121a、131a、141a 34-36 供應配管 37〜39 儲存機構 37a 儲存槽 37b 抽吸配管 37c 再供應配管 41R 上段部 42R 連結部 43L、43R 下段部 〇 44R 61 62 63 64 隙縫 旋轉部 平行移動平台 導執承接部 導軌構件 101 洗淨液抽吸部 102 液量檢測部 103 閥 97125545 44 200911389 傾斜面 lllb、112b、113b L 洗淨液 W 基板 c. 97125545 45C. This is because the wire portion 110 is moved to the position where it is placed, so that even if the nozzles 11 to 13 move while the nozzles 11 to 13 are moved, the nozzle portion = 0 does not: collide. Then in step _, control the position. When the body mechanism 9 provides a control difficulty, the storage unit 11 switches the storage unit 11 and the control unit 7 causes the storage unit 11 at the position of the nozzles u to n to be in the liquid, ' 11~13 is in the lower position, and the bottom surface is located in the nozzle to make it from the nozzles 11 to 13; the cloth: the movement is bad, and the liquid is splashed during the coating process. The coating is applied to the storage unit 110, and the operation is terminated by the above steps S21 to S29 97125545 37 200911389. After the washing action, apply the treatment. As described above, according to the present embodiment, the coating surface (4) is contacted with the cleaning liquid to be washed. According to this, in the pumping __, because only the cleaning of the nozzle attached to the nozzle can be removed (deactivated), _ she can easily and surely perform the pumping in the case where the washing liquid is attached to the side of the nozzle. Suction action. That is, it can be removed by using the cleansing liquid. In the present embodiment, the upper diameter 01 is smaller than the lower surface of the nozzle, and the cleaning liquid which is ejected from the supply port does not adhere to the nozzle side surface even if the predetermined interval is small. On the other hand, the cleaning liquid suction operation in step S27 is such that the closer the distance between the fine and the nozzle is, the larger the suction effect is. According to the present embodiment, the distance between the supply nozzles is made close to each other. The knife knows how to pump, and the purpose is to perform the pumping action. In the fourth (fourth) state, in the second embodiment, when the coating device includes the cleaning domain 1Q1, the cleaning operation performed by the device (the nozzle storage device) is described, even if In the coating-spreading coating apparatus of the third embodiment and the third embodiment, the cleaning liquid suction unit m is not provided, and the coating apparatus can perform the cleaning operation. Section, subsidiary, (4) The device may not be executed. Step S27 (step 7 is skipped), and step S28 is performed after the step is moved. (Variation of the protrusion member) The structure of the variation of the protrusion member 97125545 38 200911389 of the above-described fourth embodiment will be described with reference to Figs. 17 to 20'. Further, in Fig. 17 to Fig. 20, the structure of the one of the three protruding members provided in the coating device is shown as an example, but the other two protruding members have the same structure as the protruding member shown. Fig. 17 and Fig. 18 are views showing the structure of a projection member according to a modification of the above embodiment. The upper surface 121a of the projection member 121 in Figs. 17 and 18 has a diameter larger than the diameter of the lower surface 11a of the nozzle 11. Further, in the present modification, the supply port aperture provided in the upper surface 12a is smaller than the Ua diameter of the lower surface of the nozzle u. In the present modification, when the interval d is too small, as shown in Fig. 18, the cleaning liquid L also comes into contact with the side surface of the nozzle 11. Therefore, at the time of washing, the interval d' between the upper surface 121a and the lower surface 11a is set such that the washing liquid L which is thirsty from the supply port provided on the upper surface 121a contacts only the distance of 1 ia below. Here, the shape of the shouting surface is slightly rounded when the washing liquid L «water level (parallel surface of the χγ plane) is discharged from the supply port, and the above kd may be set to be, for example, larger than the distance from the i2ia. y (washing liquid at the horizontal plane from the d [section diameter, smaller than the diameter of Ua below). As described above, the diameter of the upper surface 121a of the protruding member 121 may be set to be smaller; the lower diameter ila diameter 'in this case' of the bird 11 may also be on the side of the nozzle 11 by appropriately spacing the above-mentioned spacing d δ Washing is carried out without attaching the cleaning solution. 19 and 81 are structural diagrams of the protruding members of other variations of the system. The upper surface 131a of the large lifting member 131 in Fig. 19 has a concave curved surface. Further, in Fig. 2A, the upper surface 41a of the member 141 is a convex curved surface. Further, the upper surface 131a of the cantilever member 131 in Fig. 5 and the figure is larger in diameter than the lower surface of the nozzle η. 97125545 39 200911389 lla The diameter of the upper surface 141a of the protrusion member 141 is larger than the diameter of the lower surface 11a of the nozzle u. Further, the supply port aperture ' provided on the upper surface 131a or 141a is smaller than the diameter of the lower surface 11a of the nozzle 11. As shown in Figs. 19 and 2B, the upper surface of the projecting member may be a non-planar surface and may be a curved surface. In the modification shown in Fig. 19 and Fig. 2', during the cleaning, the interval d between the supply port of the upper surface 131a or 141a and the lower surface 11a of the nozzle 11 is set to be the same as the modification shown in Figs. 17 and 18, and is set to The cleaning liquid from the supply port provided on the upper 131a or 141a [only Γ'' touches the distance of the lower lla. For example, the interval d may be set to a distance d' from the supply port of the upper surface 131a or 141a (the cross-sectional diameter of the cleaning liquid L at the horizontal plane at the distance d' is smaller than the diameter of the lower 11a). Further, as shown in FIG. 2A, when the upper surface 141a of the protruding member 141 is a convex curved surface, the height of the cleaning liquid L held on the upper mia is smaller than the case where the upper surface of the protruding member is flat. . Therefore, since the above-described interval d becomes smaller, the suction effect when the washing liquid L is sucked from the supply port becomes larger. Further, as in the fourth embodiment of the above-described ij state, even if the upper surface H1 of the projection member U1 is smaller than the lower surface 11a of the nozzle n, the upper surface can be formed into a curved surface. Thereby, the same effects as those of the above embodiment can be obtained. (Other changes) In the above-described fourth embodiment, when the nozzles are cleaned, the storage unit 3 (or 110) is moved to move the respective protruding members 3 (or The upper surfaces 31a to 33a (or 1Ua to 11a) of m to 113) are disposed at positions facing the respective nozzles 11 to 13. Here, in other embodiments, 97125545 40 200911389 each of the protruding members 31 to 33 (or ln + , fly 11M13) is relatively moved to each of the mouthpieces u~13, that is, it can also be substituted for the protection section 3 (or UQ). In the movement, the nozzles 11 to (3) are sprayed K1), and the retaining portion 3 (or (10) and the nozzles 11 to 13 (nozzle unit 1) are moved in both directions. In the form, the coating is applied by applying the coating liquid to the three nozzles 1 and 13 , and the storage unit 3 has three protruding members 31 to 33 corresponding to the respective nozzles u to 13 (or (10). Here, In other embodiments, the number of the squealing sounds may be set to any number. In the above embodiment, the case where the nozzle storage device and the coating device of the present invention form a body structure will be described as an example, but the nozzle storage device may be used. In addition, in the above-described embodiment, the coating liquid is an organic EL material or a hole transporting material as a coating liquid, and the manufacturing apparatus (coating apparatus) of the organic display device is an example. Description of the Invention The nozzle storage device of the present invention can also be used for other coating splitting. For example, the nozzle storage device can be used for a device that applies a resist liquid, s〇G (Spin G liquid, or a fluorescent material used in the production of a PDP (Electronic Display Panel). The liquid crystal color display is displayed in color. The device for applying the color material used for manufacturing the color filter formed in the liquid crystal cell can also be used in the nozzle storage device. Further, when the coating device is washed based on the nozzle In the case of the configuration, the coating device may have a structure as follows: The coating device (nozzle cleaning device) may include a protruding member, a cleaning liquid supply means, and a moving means. The protruding member is provided with a supply port. The cleaning liquid supply means that the cleaning liquid is supplied from the upper surface of the protruding member to the upper surface of the protruding member 97125545 41 200911389 for supplying the cleaning liquid. (4) The means is to make the nozzle ordering surface, "according to the predetermined interval, so that the nozzle or The projecting member 8 is moved. Further, the moving means sets the predetermined interval so that the washing liquid sucked on the upper surface of the projecting member is only below the nozzle. For the purpose of storing a job, etc., it is possible to use, for example, a coating device used in the manufacture of an organic rainbow display device. The present invention will be described in detail, but all the matters in the above description are only handles. (4) The present invention is not limited to the scope of the present invention, and various modifications and changes can be made without departing from the scope of the invention. [Fig. 1 (a) and (b) are coating apparatus 1 Fig. 2 is a perspective view showing the connection between each part of the coating apparatus 1 and the control unit. Fig. 3 is a perspective view showing the structure of the storage unit 3. Fig. 4 is a cross-sectional view of the storage unit 3 taken along line AA. Fig. 5 is a flow chart showing the flow of the operation of the coating device in the transition from the operating state to the standby state and from the standby state to the connected state. Fig. 6 is a view showing a state of the storage unit 3 after the supply of the cleaning liquid during storage. Fig. 7 is a view showing a quick-change relationship between each part of the coating apparatus and the control unit according to the second embodiment. Fig. 8 is a cross-sectional view showing the structure of the storage unit 3 according to the second embodiment. Fig. 9 is a view showing a quick-disconnection relationship between each part of the coating apparatus and the control unit according to the third embodiment. 97125545 42 200911389 Fig. 10 is a flow chart showing the operation flow of the coating device of the third embodiment. Fig. 11 is a structural diagram of a storage unit 3 according to a modification of the third embodiment. FIG. 12 is a schematic perspective view showing the structure of the storage unit 110. Fig. 13 is a view showing the projecting member 111 and the nozzle 11 shown in Fig. 12. Fig. 14 is a flow chart showing the flow of the washing operation of the coating device of the fourth embodiment. Fig. 15 is a view showing the projection member 111 at the time of performing the operation of step S24. Fig. 16 is a view showing the projection member 111 at the time of performing the operation of step S25. Fig. 17 is a structural view showing a projection member according to a modification of the fourth embodiment. Fig. 18 is a structural view showing a projection member according to a modification of the fourth embodiment. Fig. 19 is a configuration diagram of a protruding member of another modification. Fig. 20 is a configuration diagram of a protruding member of another modification. [Description of main component symbols] 1 nozzle unit 2 nozzle moving mechanism 3, 3a ' 3b storage unit 4, 4R ' 4L liquid receiving unit 5 platform 6 platform moving mechanism 7 control unit 8 cleaning liquid supply unit 9 storage unit moving mechanism 10 Cloth device 97125545 200911389 11-13 Nozzle 11a Lower 21 Slide rail 30 Liquid recovery portion Projection member upper surface 31 to 33, m, 112, 113, m, m, 141 31a, 32a, 33a, Ilia, 112a, 113a, 121a, 131a 141a 34-36 Supply piping 37 to 39 Storage mechanism 37a Storage tank 37b Suction piping 37c Resupply piping 41R Upper section 42R Connecting section 43L, 43R Lower section 〇44R 61 62 63 64 Slot rotation part parallel movement platform guide receiving part Rail member 101 Cleaning liquid suction portion 102 Liquid amount detecting portion 103 Valve 97125545 44 200911389 Inclined surface 111b, 112b, 113b L Cleaning liquid W Substrate c. 97125545 45

Claims (1)

200911389 七、申請專利範圍: ^一種喷魏料置,储從㈣口射方吐出㈣液 鳥進仃保官用的噴嘴保管裝置;其具備有: 噴 :件,置於設置供應—述喷嘴仏 供應配官,從供應洗淨液的供應_輕上述供應口 . =液供解段,以上駭起構㈣上面上裝财洗淨液之 。且上述财機顧存有洗淨液之錢κ,從上 應源供應洗淨液。 疋供 2.如申μ專利朗第1項之噴嘴保管裝置,其中,更具備 有.經由上述儲存機構從上述供應配管抽吸洗淨液的洗淨液抽 吸手段。 3·如申μ專利1_第1項之喷嘴保管裝置,其中,更進-步 具備有·檢耻频麵構_存軌淨驗量之檢測手段; θ、、爭夜供應手&根據由上述檢測手段所檢測到的液 里,從上述供應源中供應洗淨液。 •如申力專利㈣第1項之噴嘴保管裝置,其中,更具備 為使上述嘴訂面與上述突起構件上面依既定間隔相對 向’而使上述噴嘴與上述突起構件之至少—者移動的移動手 97125545 46 200911389 二當將上述噴嘴洗淨時,以洗淨㈣出於 上遠犬起構件上面上的方式,朝上述供應口供應洗淨液; 上述移動手段當將上述噴嘴洗㈣,依和於上述突起構件 間=的洗賴僅接_上射訂岐对,設定上述既定 5·如申物咖第4狀喷嘴保料置,其中,上述突起 構件上面的直麵較小於上述喷嘴下面的直徑。 6. 如申請專概圍第4或5項之嘴嘴保管裝置,其中,更且 備有:從上述供細抽吸洗淨液的洗淨液抽吸手段。,、 7. 如申請專利範圍第4項之喷嘴保料置,其中,上述突起 構件在上述上面周圍具有_向外周㈣低的傾斜面。 8·如申請專利範圍第!項之喷嘴保管裳置,其中,上述吐出 液係有機EL材料或電洞輸送材料; t 上述洗淨液含有與在上耻出液所含溶劑為相 同的溶劑。 9.種塗佈裝置,係賤有如巾請專賴1項之 管裝置; 藉 由從上述噴嘴對基板吐出塗佈液, 而對該基板施行塗佈 97125545 47200911389 VII. Scope of application for patents: ^A type of sprayed material, which is stored from (4) the mouth of the mouth. (4) The nozzle storage device used by the liquid bird to enter the sergeant; it has: spray: placed, set to supply - the nozzle 仏Supply of the official, from the supply of cleaning liquid supply _ light above the supply port. = liquid supply solution section, above the 骇 构 (4) above the loading of the cleaning liquid. In addition, the above-mentioned financial machine has the money κ of the cleaning liquid, and the cleaning liquid is supplied from the upper source. 2. The nozzle storage device according to the first aspect of the invention, further comprising: a cleaning liquid suction means for sucking the cleaning liquid from the supply pipe via the storage means. 3. The nozzle storage device of claim 1 of the patent No. 1 of the first embodiment, wherein the detection means for detecting the net inspection of the shame frequency surface structure is further provided; θ, the supply of the night supply & The cleaning liquid is supplied from the supply source in the liquid detected by the detecting means. The nozzle storage device according to the first aspect of the invention, wherein the nozzle retaining surface moves at least at a predetermined interval between the nozzle facing surface and the projection member, and moves at least the nozzle and the protruding member. Hand 97125545 46 200911389 2. When the nozzle is washed, the cleaning solution is supplied to the supply port in a manner of cleaning (4) on the upper surface of the upper and lower canine members; the above moving means washes the nozzle (4), and Between the above-mentioned protruding members, the cleaning is only connected to the upper-spotting pair, and the predetermined 5th, such as the fourth-nozzle nozzle holding material, is set, wherein the upper surface of the protruding member is smaller than the nozzle diameter of. 6. In the case of the nozzle storage device of the fourth or fifth aspect of the application, the cleaning means for sucking the cleaning liquid from the above-mentioned fine suction liquid is further provided. 7. The nozzle holding material of claim 4, wherein the protruding member has an inclined surface that is low toward the outer circumference (four) around the upper surface. 8. If you apply for a patent scope! The nozzle is stored in the nozzle, wherein the discharge liquid is an organic EL material or a hole transporting material; and the cleaning liquid contains the same solvent as the solvent contained in the upper sputum liquid. 9. A coating device, such as a tube, which is dedicated to a tube device; a coating solution is applied to the substrate from the nozzle to coat the substrate. 97125545 47
TW097125545A 2007-08-17 2008-07-07 Nozzle keeping device and coating device TW200911389A (en)

Applications Claiming Priority (2)

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JP2007213040A JP5002369B2 (en) 2007-08-17 2007-08-17 Nozzle storage device and coating device
JP2007213041A JP5226984B2 (en) 2007-08-17 2007-08-17 Nozzle cleaning device and coating device

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TW200911389A true TW200911389A (en) 2009-03-16
TWI348397B TWI348397B (en) 2011-09-11

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Publication number Priority date Publication date Assignee Title
JP3223677B2 (en) * 1993-11-30 2001-10-29 株式会社スリーボンド Nozzle hardening prevention device
JP2000343020A (en) 1999-06-02 2000-12-12 Toppan Printing Co Ltd Method for preventing drying of coating head slit tip part and device therefor
JP4451175B2 (en) 2004-03-19 2010-04-14 大日本スクリーン製造株式会社 Nozzle cleaning apparatus and substrate processing apparatus
JP4573645B2 (en) * 2004-12-27 2010-11-04 大日本スクリーン製造株式会社 Coating device

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