TW200900463A - Curable resin composition for column spacer, column spacer, and liquid-crystal display element - Google Patents

Curable resin composition for column spacer, column spacer, and liquid-crystal display element Download PDF

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TW200900463A
TW200900463A TW97117074A TW97117074A TW200900463A TW 200900463 A TW200900463 A TW 200900463A TW 97117074 A TW97117074 A TW 97117074A TW 97117074 A TW97117074 A TW 97117074A TW 200900463 A TW200900463 A TW 200900463A
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compound
group
meth
resin composition
curable resin
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TW97117074A
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Chinese (zh)
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Tatsuya Matsukubo
Minoru Suezaki
Toru Takahashi
Yoshio Nishimura
Sayaka Kobayashi
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Sekisui Chemical Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • C08F290/061Polyesters; Polycarbonates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08Processes
    • C08G18/0804Manufacture of polymers containing ionic or ionogenic groups
    • C08G18/0819Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups
    • C08G18/0823Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups containing carboxylate salt groups or groups forming them
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/671Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/673Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing two or more acrylate or alkylacrylate ester groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04Polyurethanes
    • C09J175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09J175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Liquid Crystal (AREA)

Abstract

A curable resin composition for column spacers which has excellent develop ability and can form a column spacer which is not abraded by rubbing in a step in producing a liquid-crystal display element. Also provided are: a column spacer formed from the curable resin composition for column spacers; and a liquid-crystal display element. The curable resin composition for column spacers comprises: a urethane (meth) acryl ate compound having car boxy groups in the molecule and having a functionality of 6 or higher; and a photo initiator.

Description

200900463 九、發明說明: 【發明所屬之技術領域】 。本發明係關於一種柱狀間隔物用硬化性樹脂組成物, ::、成一有優異之顯影性,且不會由於液晶顯示元件之 ^過寿王中的摩擦處理而被刮削之柱狀間隔物。又,亦關 於-種使用該柱狀間隔物用硬化性樹脂組成物而成之柱狀 間隔物、以及液晶顯示元件。 【先前技術】 般而言,液晶顯示元件具備用以冑2片玻璃基板之 間隙維持為固定之間隔物,其等之外包括透明電極或偏光 反以及用以使液晶物質配向之配向層等而構成。現在主要 ,用粒子徑為數陣左右的微粒子間隔物作為間隔物。但 :二於先前之液晶顯示元件之製造方法中,因於玻璃基板 上微粒子間隔物係以隨機散布’導致有時於像素部内也有 配置微粒子間隔物。若於傻音 俅常。ρ内有微粒子間隔物,則因200900463 IX. Description of the invention: [Technical field to which the invention pertains]. The present invention relates to a curable resin composition for a columnar spacer, :: a columnar spacer which has excellent developability and is not scraped by a rubbing treatment in a liquid crystal display element. . Further, it is also a columnar spacer in which a curable resin composition for a columnar spacer is used, and a liquid crystal display element. [Prior Art] Generally, a liquid crystal display element includes a spacer for maintaining a gap between two glass substrates, and the like includes a transparent electrode or a polarized light, and an alignment layer for aligning the liquid crystal material. Composition. Now, mainly, a particle spacer having a particle diameter of several arrays is used as a spacer. However, in the prior art method of manufacturing a liquid crystal display device, a fine particle spacer may be disposed in the pixel portion due to random scattering of the fine particle spacers on the glass substrate. If the silly sound is abnormal. There are microparticle spacers in ρ, because

間隔物周邊的液晶配向的I 0蒼亂而導致漏光而使圖像的對比 又降低等,使圖像品質降低的問題。對此,正在研究各種 不使微粒子間隔物配置於像素部之微粒子間隔物的配置方 法,但是任一方法均操作煩雜且欠缺實用性。 又’近年來為了提高液晶顯示元件之生產性,提出了 滴下式注入法(One Drop削τ_η〇ι〇π,_法卜該 Π係於玻璃基板之液晶封入面上,滴下預定量之液晶, ^另^鬼液晶面板用基板於真空下可維持預定之單元間隙 下對向、黏合,藉此製造液晶顯示元件的方法。藉 200900463 由该方法,與先前之方法相比,即使液晶顯示 〇〇 丨丁八面積 化,單元間隙狹小化,液晶之封入亦容易,因此認為八後 〇DF法將成為液晶顯示元件之製造方法的主流。 然而’若於ODF法中使用微粒子間隔物,則會有於液 晶滴下時或者於對向基板黏合時散布之微粒子間隔物隨著 液晶之流動而流動,基板上之微粒子間隔物的分布會變得 不均勻之問題產生。若微粒子間隔物之分布變得不均勻, , 則會產生於液晶單位之單元間隙產生偏差,於液晶顯示產 生色斑之問題。 對於上述問題,提出於液晶基板上藉由光微影法 (ph〇t〇lUh〇graphy)之方法形成用以保持均勻單元間隙之凸 型圖案之柱狀間隔物,來取代先前之微粒子間隔物,並逐 漸得以實用化(例如專利文獻丨、專利文獻2等)。若使 用該柱狀間隔物,則可解決於像素部内配置間隔物之問 題,或於ODF法中產生間隔物不均之問題。 使用形成有該柱狀間隔物之基板來製造液晶顯示元件 時’通常於柱狀間隔物上進一步形成用以限制液晶之配向 的配向臈之後,必需對該配向膜實施摩擦處理。 然而,先前之柱狀間隔物,由於曝光時之光硬化反應 或後烘烤時之熱反應條件,#時於摩擦處理日寺表面會被到 削,使得柱狀間隔物之高度產生#I _ ;又/生王偈差而使早兀間隙變得不 均勻,從而導致所製造之液晶顯示元件的顯示品質降低。 (專利文獻1)曰本專利特開2〇〇1 — 91954號公報 (專利文獻2)日本專利特開2〇〇1 — 1597〇7號公報 6 200900463 【發明内容】The problem that the image quality is lowered is caused by the disordered I 0 in the liquid crystal alignment around the spacer, causing light leakage and lowering the contrast of the image. On the other hand, various methods of arranging the fine particle spacers in which the fine particle spacers are not disposed in the pixel portion have been studied, but any of the methods is complicated to operate and lacks practicality. In recent years, in order to improve the productivity of liquid crystal display devices, a drop-injection method (One Drop-cut τ_η〇ι〇π, which is attached to a liquid crystal sealing surface of a glass substrate, and a predetermined amount of liquid crystal is dropped, is proposed. ^The method for manufacturing a liquid crystal display element by maintaining a predetermined cell gap under a vacuum under the vacuum of the substrate of the ghost liquid crystal panel. By the method of 200900463, even if the liquid crystal display is compared with the previous method The area of Kenting is eight, the cell gap is narrow, and the sealing of liquid crystal is easy. Therefore, it is considered that the 〇F 法 method will become the mainstream of the manufacturing method of liquid crystal display elements. However, if microparticle spacers are used in the ODF method, there will be When the liquid crystal is dropped or the fine particle spacer dispersed when the opposite substrate is bonded flows with the flow of the liquid crystal, the distribution of the fine particle spacer on the substrate becomes uneven. If the distribution of the fine particle spacer becomes non-uniform Evenly, it will cause a deviation in the cell gap of the liquid crystal unit, which causes a problem of color spots on the liquid crystal display. On the liquid crystal substrate, a columnar spacer for maintaining a uniform pattern of a uniform cell gap is formed by a method of photolithography to replace the previous microparticle spacer, and is gradually put into practical use. (For example, Patent Document No. 2, Patent Document 2, etc.) If the columnar spacer is used, the problem of disposing a spacer in the pixel portion or the problem of spacer unevenness in the ODF method can be solved. When the liquid crystal display element is manufactured by the substrate of the spacer, the alignment film is usually formed on the column spacer to restrict the alignment of the liquid crystal, and the alignment film must be subjected to a rubbing treatment. However, the prior column spacer, Due to the photohardening reaction during exposure or the thermal reaction conditions during post-baking, the surface of the temple will be cut by the rubbing treatment, so that the height of the column spacers produces #I _; The early 兀 gap becomes uneven, and the display quality of the liquid crystal display element to be manufactured is lowered. (Patent Document 1) Japanese Patent Laid-Open Publication No. Hei 2 No. Hei 91-95954 (Patent Document 2) Japanese Patent Japanese Patent Publication No. 2〇〇1—1597〇7 6 200900463 [Summary of the Invention]

(1)(1)

(2)(2)

A1表示自炫二醇化合物、聚氧化烯二醇化合物、或者 聚己内酯二醇化合物去除2個羥基後之殘基,X表示自二 異氰酸酯化合物去除2個異氰酸酯基後之殘基,a2表示自 含羧基之二醇化合物去除2個羥基與1個缓基後之殘基, B表示自含環氧基之不飽和化合物去除環氧基後之殘基, R·表示自具有經基之(曱基)丙烯酸酯化合物去除經基後之 殘基,m係1〜5 0之自然數。 7 200900463 A3一ΟA1 represents a residue obtained by removing two hydroxyl groups from a polyglycol compound, a polyoxyalkylene glycol compound, or a polycaprolactone diol compound, and X represents a residue obtained by removing two isocyanate groups from a diisocyanate compound, and a2 represents Residues after removal of two hydroxyl groups and one slow base from a diol compound containing a carboxyl group, B represents a residue after removal of an epoxy group from an unsaturated compound containing an epoxy group, and R· represents a radical having a mercapto group ( The sulfhydryl compound removes the residue after the base, and m is a natural number of 1 to 50. 7 200900463 A3

C —-Ν—β*—Μ -—C 一 ΟX- II I I. II f^|*—Β·"Μ II I ι Ο Η ΗC —-Ν—β*—Μ——C— ΟX- II I I. II f^|*—Β·"Μ II I ι Ο Η Η

Α3係表示自3官能以上且具有羥基之(甲基)丙烯酸酯 化合物去除羥基後之殘基,Β1表示自二異氰酸酯化合物去 除2個異氰酸酯基後之殘基,X表示自烷二醇化合物、聚 氧化烯二醇化合物、或者聚己内酯二醇化合物(其分子内包 含羧基或者分子内不含羧基)去除2個羥基後之殘基(其 中’分子内包含羧基,且包含1個以上之自烷二醇化合物、 聚氧化烯二醇化合物、或者聚己内酯二醇化合物去除2個 备基後之殘基),η係自然數。 特別是,可對使用如上所述之本發明之柱狀間隔物用 硬化性樹脂組成物而成之柱狀間隔物賦予優異之柔軟性與 車乂四之壓縮回復特性,因此上述分子内具有羧基之6官能 以上之(甲基)丙烯酸胺基甲酸酯化合物較佳為於分子内具 有自變性己内醋、變性氧化乙烯以及變性氧化丙烯所構成 之群中選擇的至少一種變性結構。 再者,於本說明書中,所謂變性己内酯,係表示於(甲 基)丙烯酸醋化合物之來自醇之部位與(甲基)丙烯酿基之 導入己内醋之開環體或者開環聚合物。又,所謂變:氧二 乙烯,係表示於(甲基)丙稀酸酯化合物之 (甲基)丙稀醯基之間導入氧化乙烯片段。進而 Η立與 氧化丙稀,係表示於(甲基)丙稀酸S旨化合來斤謂變性 G ^物之來自醇之部 8 200900463 位與(甲基)丙烯醯基之間導入氧化丙烯片段。 又上述刀子内具有羧基之6官能以上之(甲基)丙烯 酸胺基甲酸醋化合物亦可藉由以下之方法製造。 上述分子内具有羧基之6官能以上之(甲基)丙烯酸胺 基甲酸酯化合物可藉由如下之方法獲得:使具有叛基與2 個以上經基之化合物,與分子内具有2個以上異氛酸酉旨基 之化合物反應,進而加成含有乙稀性不飽和基之經基化合 物的方法’或者使上述化合物總括混合而使其等反應之方 法。 又,上述分子内具有羧基之6官能以上之(曱基)丙烯 酸胺基曱酸酯化合物亦可藉由如下之方法獲得:使含有羧 基之二醇化合物與二異氰酸酯化合物反應,進而加成含有 乙烯性不飽和基之羥基化合物的方法,或者使上述化合物 總括混合而使其等反應之方法。 其中’較佳為使具有羧基與2個以上羥基之化合物, y與分子内具有2個以上異氰酸酯基之化合物反應,進而加 成含有乙烯性不飽和基之羥基化合物所獲得的化合物,尤 佳為使含有羧基之二醇化合物(E1)、與二異氰酸酯化合 物(E2 )反應,進而加成含有乙烯基性不飽和基之羥基化 合物所獲得的化合物。 上述分子内具有羧基之6官能以上之(甲基)丙烯酸胺 基曱酸醋化合物’具體而言,可於使含有缓基之二醇化合 物(E1 )與二異氰酸酯化合物(E2 )通常以1 : 2之莫耳 比反應而獲得之化合物(E3 )上’加成含有乙烯性不飽和 9 200900463 基之羥基化合物(E4 )而獲得。 作為上述含有羧基之二醇化合物(E1),可適宜使用 分子量為500以下者。若分子量超出該範圍,則有時會存 在於反應溶劑中之溶解性降低而使其與上述二異氰酸酯化 合物(E2 )之反應性降低之現象。 作為上述分子量為500以下之含有羧基之二酵化合物 (E 1 )並無特別限定,具體而言’例如可列舉酒石酸、二 , 經甲基乙酸、雙(4-羥苯基)乙酸、2,2-雙(羥甲基)丙酸、2,2- 雙(經乙基)丙酸、2,2-雙(羥丙基)丙酸、2,2-雙(羥甲基)丁 酸、4,4-雙(對羥苯基)戊酸、2,4-二羥基苯曱酸、3,5-二羥 基苯曱酸、尿黑酸等。其中可適宜使用2,2_雙(羥甲基)丁 酉文、2,2-雙(羥曱基)丙酸、2,2-雙(羥乙基)丙酸、2,2-雙(羥 丙基)丙酸。 作為上述二異氰酸酯化合物(E2 ),可適宜使用分子 !為300以下者。若分子量超出該範圍,則有時會存在與 上述含有叛基之二醇化合物(E1 )之反應性降低之現 作為上述分子量為300以下之二異氰酸酯化合物(E2 ) 並热特別之限定,具體而言,例如可列舉六亞甲基二異氰 酸酯、七亞甲基二異氰酸酯、2,2_二曱基庚烷二異氰 酸醋、八亞曱基二異氰酸酯、2,5_二甲基己烷-丨,6_二異氰 酸酯、2,2,4-三甲基戊烷-;ι,5_二異氰酸酯、九亞曱基二異 氰酸酯、2,2,4-三曱基己烷二異氰酸酯、十亞甲基二異氰酸 酯、十一亞甲基二異氰酸酯、十二亞甲基二異氰酸酯、十 —亞甲基二異氰酸酯、十五亞曱基二異氰酸酯、丁烯二異 10 200900463 氰酸酯、1,3-丁二烯-1,4_二異氰酸酯 〇虱酸_酝2- 丁炔二異氰酸酯、Α3 represents a residue obtained by removing a hydroxyl group from a trifunctional or higher (meth) acrylate compound having a hydroxyl group, Β1 represents a residue obtained by removing two isocyanate groups from a diisocyanate compound, and X represents an alkanediol compound, and a poly An alkylene oxide diol compound or a polycaprolactone diol compound (having a carboxyl group in the molecule or a carboxyl group in the molecule), wherein the residue after removing two hydroxyl groups (wherein the molecule contains a carboxyl group and contains one or more The alkanediol compound, the polyoxyalkylene glycol compound, or the polycaprolactone diol compound removes the residue after the two bases, and the η is a natural number. In particular, the columnar spacer obtained by using the curable resin composition for a columnar spacer of the present invention as described above can provide excellent flexibility and compression recovery characteristics of the ruthenium. Therefore, the molecule has a carboxyl group. The 6-functional or higher (meth)acrylic acid urethane compound is preferably at least one denatured structure selected from the group consisting of denatured caprolactone, denatured ethylene oxide, and denatured propylene oxide in the molecule. Further, in the present specification, the term "denatured caprolactone" means a ring-opening or ring-opening polymerization of a portion of an (meth)acrylic acid vinegar compound derived from an alcohol and a (meth)acrylic acid group. Things. Further, the term "oxydiethylene" means that an ethylene oxide fragment is introduced between the (meth) propyl group of the (meth) acrylate compound. Further, the propylene oxide is represented by the (meth)acrylic acid S, and the propylene oxide fragment is introduced between the 200900463 and the (meth) propylene sulfhydryl group. . Further, a 6-functional or higher (meth)acrylic acid urethane carboxylic acid compound having a carboxyl group in the above-mentioned knife can also be produced by the following method. The 6-functional or higher (meth)acrylic acid urethane compound having a carboxyl group in the above molecule can be obtained by a method in which a compound having a thiol group and two or more thio groups and two or more molecules in the molecule are obtained. A method of reacting a compound of a sulfonic acid group to form a base compound containing an ethylenically unsaturated group, or a method of uniformly mixing the above compounds and reacting them. Further, the 6-functional or higher (fluorenyl) acrylamide phthalate compound having a carboxyl group in the molecule can also be obtained by reacting a diol compound having a carboxyl group with a diisocyanate compound, and further adding ethylene. A method of treating a hydroxy compound of a group, or a method of mixing the above compounds and reacting them. Among them, 'a compound obtained by reacting a compound having a carboxyl group and two or more hydroxyl groups, y with a compound having two or more isocyanate groups in the molecule, and further adding a hydroxy compound having an ethylenically unsaturated group is preferable. A compound obtained by reacting a diol compound (E1) having a carboxyl group with a diisocyanate compound (E2) and further adding a hydroxy compound containing a vinyl unsaturated group. The above-mentioned 6-functional or higher (meth)acrylic acid amino phthalic acid vinegar compound having a carboxyl group in the molecule can be specifically such that the diol compound (E1) containing a slow group and the diisocyanate compound (E2) are usually 1: The compound (E3) obtained by the molar reaction of 2 is obtained by adding an hydroxy compound (E4) containing an ethylenically unsaturated 9 200900463 group. As the carboxyl group-containing diol compound (E1), those having a molecular weight of 500 or less can be suitably used. When the molecular weight is outside the range, the solubility in the reaction solvent may be lowered to lower the reactivity with the diisocyanate compound (E2). The dicarboxylic acid compound (E 1 ) having a carboxyl group having a molecular weight of 500 or less is not particularly limited, and specific examples thereof include tartaric acid, dimethylacetic acid, bis(4-hydroxyphenyl)acetic acid, and 2, 2-bis(hydroxymethyl)propionic acid, 2,2-bis(ethyl)propionic acid, 2,2-bis(hydroxypropyl)propionic acid, 2,2-bis(hydroxymethyl)butyric acid, 4,4-bis(p-hydroxyphenyl)pentanoic acid, 2,4-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, homogentic acid, and the like. Among them, 2,2-bis(hydroxymethyl)butanthene, 2,2-bis(hydroxyindenyl)propionic acid, 2,2-bis(hydroxyethyl)propionic acid, 2,2-bis(hydroxyl) can be suitably used. Propyl) propionic acid. As the diisocyanate compound (E2), a molecule of 300 or less can be suitably used. When the molecular weight is outside the range, the reactivity with the above-mentioned diol-containing diol compound (E1) may be reduced, and the diisocyanate compound (E2) having a molecular weight of 300 or less may be specifically limited. For example, hexamethylene diisocyanate, heptamethylene diisocyanate, 2,2-didecyl heptane diisocyanate, octadecyl diisocyanate, 2,5-dimethylhexane can be cited. -丨,6_diisocyanate, 2,2,4-trimethylpentane-; i,5-diisocyanate, nona-nonyldiisocyanate, 2,2,4-trimethylhexyl diisocyanate, ten Methylene diisocyanate, undecyl diisocyanate, dodecamethylene diisocyanate, decamethyl diisocyanate, fifteen-decyl diisocyanate, butene diiso-10 200900463 cyanate, 1, 3-butadiene-1,4-diisocyanate decanoic acid 酝2-butyne diisocyanate,

甲苯二異氰酸S旨、異佛、I 氰酸酯、1,4-苯二甲基二異氰 土一” 兵氰馼S曰、4,4,-二苯基甲烷二異 氰酸醋、萘二異氰酸酿、六亞甲基二異氰酸醋或二苯基曱 烷二異氰酸醋之1化物等中’可適宜使用六亞甲基二 異氰酸S旨、異佛酮二異氰酸§旨、甲苯二異氰酸画旨。 ;上(化口物(E3 )上加成含有乙烯性不飽和基之經 基化合物(E4 )之前,亦w你# & # _ 別亦可使其與多疋醇或者多元醇及二 異氰酸酯化合⑯(Ε2)反應而延長分子鏈。 曰作為上述多元醇,較佳為分子^ 5〇〇 α上者。若分子 里脫離該祀圍’則有時會存在柱狀間隔物之柔軟性降低之 現象。更佳之分子量為5〇〇〜1〇〇〇〇,進而更佳之 5〇〇〜4000。 馬 作為上述多元醇並無特別之限定,具體而言,例如可 :舉:聚醚系多元醇、聚g旨系多元醇、聚碳酸酯系多元醇、 —氧烷111·生雙酚系二醇、丙烯酸系多元醇、聚丁二烯系多 八醇聚浠k系多π醇等。進而可列舉使i,6_己二醇等低 醇與異佛_二異氰酸酷等聚異氰酸g旨以α : n( 广 上之整數)之莫耳比反應而獲得之胺基甲酸酯系二 酉子° 為上述3有乙烯性不飽和基之經基化合物(e4 ) 無特別之PP中 . 疋’例如可列舉(甲基)丙烯酸-2-羥乙酯、(甲義 L丙基鄰苯二曱酸酯、丙三醇二(曱基)丙缚 11 200900463 酸酯、2-羥基_3_丙烯醯氧基丙基(甲基)丙烯酸酯、季戊四 醇三丙烯酸酯、二季戊四醇五丙烯酸酯等。其中,可適宜 使用(曱基)丙烯酸-2-羥乙酯、(曱基)丙烯酸-2-羥丙酯、季 戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯。 為製備上述分子内具有叛基之6官能以上之(甲基)丙 烯酸胺基甲酸酯化合物,首先使上述含有羧基之二醇化合 物(E1)與上述二異氰酸酯化合物(E2)反應而獲得化合 物(E3 )。該反應可使用公知之反應方法’例如於乙酸乙 醋、甲乙酮等溶劑中,於溶劑之沸點以下(較佳為6〇〜8〇 C)之溫度下使其反應即可。又,如上所述,藉由使上述 含有羧基之二醇化合物(E1)與二異氰酸酯化合物(E2) 之反應莫耳比為1:2左右,可於兩末端加成異氰酸酯, 可使後述之多元醇之加成或者含有乙烯性不飽和基之羥基 化合物之加成效率良好地進行。 繼而,視需要於化合物(E3)中添加上述多元醇,並 此時為用以促 v 於上述溶劑之彿點以下的溫度下進行反應 進反應,較有利的是添加二月桂酸二丁基錫等公知之觸 媒。觸媒係使用相對於上述多元醇〇〇1〜〇1重量%左右, 於60〜8〇t:下使其反應3〜1〇小時左右。 物(E3)與上述多元醇之反應莫耳比為冷 藉由使上述化合 :召-1 (冷為2 以上之整幻A右,可於兩末端加成異氰酸醋,而根據其 反應莫耳比,其後視需要進而與二異氰酸酯化合物(Μ ) 反應,則可使後述之含有7说卜也 &心3百乙烯性不飽和基之羥基化合物 (E4)之加成效率良好地進行。 12 200900463 進而,將含有乙烯性不飽和基之羥基化合物(E4 )加 入系内使其反應,藉由於殘存二異氰酸酯基之含有率成為 0· 1〜0.5重量%左右之時間點使反應結束,而可獲得分子 内具有羧基之ό官能以上之(甲基)丙烯酸胺基曱酸醋化合 物。 本發明之柱狀間隔物用硬化性樹脂組成物含有光反應 起始劑。 作為上述光反應起始劑並無特別之限定,例如可列舉 安息香(benzion)、二苯基酮、二苯乙二酮、噻噸酮 (thioxanthone)以及其等之衍生物等先前公知之光反應起始 劑。具體而言,例如可列舉安息香曱醚、安息香乙醚、安 息香異丁醚、米其勒酮(Michler,s ket〇ne)、[4_(曱苯基硫基) 苯基]苯基甲酮、2,2-二曱氧基-1,2-二苯基乙烷_丨_酮、卜羥 基-環己基-苯基-酮、2-羥基-2-曱基-i_苯基-丙烷_丨_酮、卜 [4-(2-羥基乙氧基)-苯基]_2_羥基_2_甲基_丨_丙烷酮、甲 基-1(4-曱硫基)苯基-2-嗎琳代丙烧酮、2_苄基_2_二甲胺 基-1-(4_嗎啉代苯基)_ 丁烷_丨_酮、雙(2,4,6_三甲基苯甲醯 基)-苯基膦氧化物、雙(2,6-二甲氧基苯甲醯基)_2,4,4-三甲 基-苯甲基膦氧化物、2,4,6-三曱基苯甲醯基_二苯基_膦氧 化物、2,4 -二乙基嗟嘲|同、2 -氯嗟嘴嗣等。 又,例如可適宜使用2-(4-甲基苄基)_2_(二甲胺基)_卜 (4-嗎啉代苯基)丁烷酮、2_(4_乙基苄基)_2_(二甲胺基)_ 1-(4-嗎啉代苯基)丁烷酮、2-(4-異丙基苄基)_2_(二甲胺 基)-1-(4-嗎啉代苯基)丁烷-1_酮等,作為其等之市售品,例 13 200900463 如可列舉「IRGACURE 369」、「IRGACURE 379」(CibaToluene diisocyanate S, isophor, I cyanate, 1,4- phenyldimethyl diisocyanate - 1 Benzene cyanide S 曰, 4,4,-diphenylmethane diisocyanate In the case of naphthalene diisocyanate, hexamethylene diisocyanate or diphenyldecane diisocyanate, etc., it is suitable to use hexamethylene diisocyanate. Ketone diisocyanate §, toluene diisocyanate. On the top (the compound (E3) is added to the base compound (E4) containing an ethylenically unsaturated group, it is also #### _ Do not react with polyhydric alcohol or polyol and diisocyanate compound 16 (Ε2) to extend the molecular chain. 曰 As the above polyol, preferably the molecule ^ 5 〇〇 α. If the molecule is detached from the molecule In the case of 祀 ', there is a case where the flexibility of the column spacer is lowered. The molecular weight is preferably 5 〇〇 1 to 1 〇〇〇〇, and more preferably 5 〇〇 to 4000. The horse is not particularly useful as the above polyol. Specific examples thereof include, for example, a polyether polyol, a polyg-based polyol, a polycarbonate polyol, a oxane 111, a raw bisphenol glycol, and a propylene. The polyhydric alcohol, the polybutadiene-based polyhexanol polyfluorene k-based poly-π-alcohol, etc., and further, a poly-isocyanate such as a low alcohol such as i,6-hexanediol or isophora-diisocyanate is used. A urethane dimer obtained by a molar ratio reaction of α: n (integral integer) is a trans group compound (e4) having an ethylenically unsaturated group as described above.疋', for example, 2-hydroxyethyl (meth)acrylate, (yiyi L propyl phthalate, glycerol bis(indenyl) propyl 11 200900463 acid ester, 2-hydroxy group _ 3_acryloxypropyl (meth) acrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, etc. Among them, 2-hydroxyethyl (meth) acrylate and (mercapto) acrylate may be suitably used. 2-hydroxypropyl ester, pentaerythritol triacrylate, dipentaerythritol pentaacrylate. In order to prepare a 6-functional (meth)acrylic acid urethane compound having a reductive group in the above molecule, the above-mentioned carboxyl group-containing diol is first used. The compound (E1) is reacted with the above diisocyanate compound (E2) to obtain a compound (E3). By using a known reaction method, for example, in a solvent such as ethyl acetate or methyl ethyl ketone, the reaction may be carried out at a temperature below the boiling point of the solvent (preferably 6 〇 to 8 〇 C). Further, as described above, The reaction molar ratio of the carboxyl group-containing diol compound (E1) to the diisocyanate compound (E2) is about 1:2, and an isocyanate can be added to both ends to add or contain a vinyl group to be described later. The addition efficiency of the hydroxy compound of the unsaturated group proceeds favorably. Then, the above polyol is added to the compound (E3) as needed, and at this time, the reaction is carried out at a temperature lower than the point of the solvent. In the reaction, it is advantageous to add a known catalyst such as dibutyltin dilaurate. The catalyst is used in an amount of about 1% by weight to about 1% by weight based on the above polyol, and is reacted for about 3 to 1 hour at 60 to 8 Torr. The reaction molar ratio of the substance (E3) to the above polyol is cold by the above-mentioned compound: call-1 (cold is 2 or more of the illusion A right, the isocyanate can be added at both ends, and according to the reaction When the molar ratio is further reacted with the diisocyanate compound (Μ), the addition of the hydroxy compound (E4) containing the 7-tetraethylene ethylenically unsaturated group described later can be efficiently performed. 12 200900463 Further, a hydroxy compound (E4) containing an ethylenically unsaturated group is added to the system to cause a reaction, and the reaction is terminated by the time point of the residual diisocyanate group being about 0.1 to 0.5% by weight. Further, a (meth)acrylic acid amino phthalic acid vinegar compound having a ruthenium functional group or more having a carboxyl group in the molecule can be obtained. The curable resin composition for a columnar spacer of the present invention contains a photoreaction initiator. The starting agent is not particularly limited, and examples thereof include previously known photoreactive initiators such as benzion, diphenylketone, diphenylethylenedione, thioxanthone, and the like. In terms of Examples include benzoin ether, benzoin ethyl ether, benzoin isobutyl ether, michlerone (Michler, sketne), [4_(phenylphenylthio)phenyl]phenyl ketone, 2,2-di曱oxy-1,2-diphenylethane-fluorenone, hydroxy-cyclohexyl-phenyl-one, 2-hydroxy-2-indolyl-i-phenyl-propane-indole-ketone, [4-(2-Hydroxyethoxy)-phenyl]_2-hydroxy-2-methyl-oxime-propanone, methyl-1(4-indolyl)phenyl-2-morphin-propanone Ketone, 2-benzyl-2-diamino-1-(4-morpholinophenyl)-butane-indole-ketone, bis(2,4,6-trimethylbenzylidene)- Phenylphosphine oxide, bis(2,6-dimethoxybenzylidene)_2,4,4-trimethyl-benzylphosphine oxide, 2,4,6-trimercaptobenzamide _-diphenyl-phosphine oxide, 2,4-diethyl oxime | the same, 2-chloropyrrole, etc. Further, for example, 2-(4-methylbenzyl)_2_(dimethyl Amino)-(4-morpholinophenyl)butanone, 2-(4-ethylbenzyl)_2-(dimethylamino)-1-(4-morpholinophenyl)butanone, 2-(4-isopropylbenzyl)_2-(dimethylamino)-1-(4-morpholinophenyl)butane-1-one, etc. Sales, Example 13 200900463 For example, "IRGACURE 369" and "IRGACURE 379" (Ciba

Specialty Chemicals 公司製)等。 進而例如可列舉:寡[2-羥基-2-曱基-l-[4-(l-甲基乙烯 基)苯基]丙烯酮]、“[‘[心苯甲醯基苯基磺胺基)苯基]_2_曱 基-2-(4-甲苯基亞磺醯基)丙烷-丨_酮、2,4_二乙基噻噸酮、 異丙基°塞°頓酮、二苯基-(2,4,6-三曱基苯甲醯基)膦氧化物、 4-苯曱酿基-4’-甲基二苯基硫化物、苯曱醯甲酸曱酯、4_苯 基二苯基_、乙基-4-(二甲胺基)苯甲酸酯、苄基二曱基縮 酮、2-經基-2-曱基-i_苯基-丨_丙酮、羥基環己基苯基酮、2_ 甲基-1-[4-(甲硫基)_苯基]_2_嗎啉代丙烷-丨_酮、曱基_2-苯 甲酸基苯甲酸酯、4-曱基二苯基酮、2,2'-雙-(2-氯苯基)_ 4,5,4,5_四苯基_2'1^-<1,2’>聯'1米〇坐、(4,4'-雙(二乙基胺基) 二苯基酮、2,2’-雙(〇-700苯基)-4,4’,5,5|-四苯基-1,2,-聯咪 唾等、1-[9-乙基-6-苯曱醯基咔唑-3-基]-辛烷小嗣月亏_ 〇-乙酸酯、1-[9-乙基-6-(2-甲基苯曱醯基)-9·Η·-咔唑·3-基 , 乙烷_丨-酮肟-〇-苯甲酸酯、1-[9-乙基-6-(2-甲基苯甲醯基)_ 9.H.-咔唑-3-基]-乙烷_1_酮肟.〇_乙酸酯、乙基_6_(1,3,5_ 三甲基苯甲醯基)-9.H.-咔唑-3-基]-乙烷-1-酮肟_〇_苯曱酸 酯、1-[9-正丁基-6-(2-乙基苯甲醯基)-9.H·-咔唑-3-基]-乙烷 -1 -酮肟-0-苯曱酸酯等。其中可適宜使用ΐ-[9·乙基_6_(2 曱基本曱醢基)-9.H·-0卡唾-3 -基]-乙烧-1-酮月亏·〇·乙酸酉旨等 肟酯化合物’作為如此之肟酯化合物之市售品,例如可列 舉「IRGACURE OXE02」(Ciba Specialty Chemicals 公司 製)等。 14 200900463 其等光反應起始劑可單獨使用,亦可併用2種以上D 於本發明之柱狀間隔物用硬化性樹脂組成物中,作為 上述光反應起始劑之含量並無特別之限定,相對於上述分 子内具有羧基之6官能以上之(曱基)丙烯酸胺基甲酸酯化 合物100重量份,較佳之下限為〇1重量份,較佳之上限 為50重畺份。若上述光反應起始劑之含量未滿重量份, 則本發明之柱狀間隔物用硬化性樹脂組成物的光硬化會變 得不充分,而變得難以由顯影獲得圖案。若上述光反應起 始劑之含量超過50重量份,則顯影時之殘逢會變顯=。 上述光反應起始劑之含量的更佳之下限為丨重量份,更佳 之上限為25重量份。 組成物亦可含有用 。藉由與該反應助 可&兩光照射時 本發明之柱狀間隔物用硬化性樹脂 以減輕氧所造成之反應障礙的反應助劑 劑’特別是與奪氫型光反應起始劑併用 之硬化速度。 胺系 作為上述反應助劑並無特別之限定,例如 e rfc 』列舉 反應助劑、膦系反應助劑、磺酸系反應助劑等。 限定,例如可列舉 、對二甲胺基苯甲 作為上述胺系反應助劑並無特別之 正丁胺、二正丁胺、三乙胺、三乙四胺 酸乙酯、對二甲胺基苯甲酸異戊酯等。 例如可列舉 例如可列 作為上述膦系反應助劑並無特別之限定 三正丁基膦等。 作為上述績酸系反應助劑並無特別之限定 舉-s-苄基異硫脲_對曱苯磺酸等。 15 200900463 其4反應助劑可單獨使用,亦可併用2種以上。 如上所述’本發明之柱狀間隔物用硬化性樹脂組成物 中,可使用上述分子内具有羧基之6官能以上之(甲基)丙 烯酸胺基甲酸酯化合物作為上述鹼溶性高分子化合物(實 施形態2)、單體成分(實施形態1 )之任一者,於以下 對將上述分子内具有羧基之6官能以上之(甲基)丙烯酸胺 基甲酸酯化合物用作單體成分之實施形態丨加以詳細敍 述° 於貫施形態1之柱狀間隔物用硬化性樹脂組成物中, 上述分子内具有羧基之6官能以上之(甲基)丙烯酸胺基甲 酸醋化合物的分子量較佳為1〇〇〇〜5〇〇〇左右,上述分子 内具有羧基之6官能以上之(甲基)丙烯酸胺基甲酸酯化合 物的酸值較佳為5〜50 mgKOH/g。若上述分子内具有羧基 之6官能以上之(曱基)丙烯酸胺基甲酸酯化合物的分子量 為1000〜5000,則可確保充分之耐摩擦性,且難以產生顯 影殘留。上述分子内具有羧基之6官能以上之(曱基)丙烯 酸胺基曱酸酯化合物之分子量的更佳之下限為2〇〇〇,更佳 之上限為4500。 又,於實施形態1之柱狀間隔物用硬化性樹脂組成物 中,如上所述,除上述分子内具有羧基之6官能以上之(曱 基)丙烯酸胺基甲酸酯化合物之外,較佳為併用進行了自變 性己内酯、變性氧化乙烯以及變性氧化丙烯所構成之群中 選擇的至少一種變性之多官能(曱基)丙烯酸酯化合物(以 下,亦稱為變性多官能(曱基)丙烯酸酯化合物)作為單體 16 200900463 成分。 如上所述,脸l 將如此之變性多官能(甲基)丙烯酸酯化合 物併用作單體成分$ # 刀之貫施形態1的柱狀間隔物用硬化性樹 脂組成物,所得之h 4 + 柱狀間隔物係成為具有優異之柔軟性及 較:之壓縮回復特性者。使用如此之柱狀間隔物而製造之 液B曰顯不7L件’可同時抑止加熱時之液晶膨脹所造成之「重 力不良」&低溫時液晶收縮所造成之「低溫發泡」。 再者所明上述「重力不良」,係指於液晶顯示元件之 使用中’液晶單位内之液晶受到加熱而膨脹,而將單元間 隙擠寬時,使得柱狀間隔物自基板上隆起,而柱狀間隔物 無法保持之體積程度的液晶向下方流動,由此於顯示面板 之上半面及下半面產生色斑之現象。X,所謂上述「低溫 發泡」’係指於低溫時液晶單位内之液晶產生體積收縮, 仗而造成液晶單位内之内壓急劇降低而產生氣泡之現象。 上述變性多官能(甲基)丙烯酸酯係己内酯所變性後之 多官能(曱基)丙烯酸酯化合物之情形時,該多官能(曱基)丙 烯酸酯化合物並無特別之限定,例如可列舉將三羥曱基丙 烷二(甲基)丙烯酸酯、三羥曱基乙烷二(曱基)丙烯酸酯、季 戊四醇二(曱基)丙烯酸醋、二(三羥甲基丙烷)二(曱基)丙烯 酸酯、二季戊四醇二(甲基)丙烯酸酯等2官能(甲基)丙稀酸 酯化合物加以己内酯變性所得之化合物,或者將季戊四醇 三(甲基)丙烯酸酯、季戊四醇三(曱基)丙烯酸酯、二(三羥 甲基丙烷)三(甲基)丙烯酸酯、二季戊四醇四(曱基)丙烯酸 酯、二季戊四醇五(甲基)丙烯酸酯等3官能以上之(曱基)丙 17 200900463 烯酸酯化合物加以己内酯變性所得之化合物等。其中,將 3官能以上之(^基)丙烯酸醋化合物加以己内酯變性所得 二匕合物,其聚合反應之進行迅速,且容易使曝光敏感度 提尚,因此特佳。 其等變性多官能(甲基)丙烯酸酯可單獨使用,亦 用2種以上。 作為上述變性多官能(甲基)丙烯酸g旨之變性己内醋的 變性度並無特別之限定’成為基質之多官能(甲基)丙烯酸 酯化合物的官能基數為n之情形時,相對於多官能(甲基 丙烯酸醋化合物i莫耳,較佳之下限為〇 5n莫耳,較佳: 上限為5η莫耳。若上述變性多官能(子基)丙缔酸醋之^性 己内酯的變性度未滿〇_5η莫耳,則將實施形態】之柱狀間 隔物用硬化性樹脂組成物用於柱狀間隔物用途之情形時, 有時會存在製造之柱狀間隔物的柔軟性變得不充‘之現 象。若上述變性多官能(甲基)丙烯酸醋之變性己内酸的變 =超過5η莫耳,則製造柱狀間隔物時,有時會存在曝 k之反應性降低’製造之柱狀間隔物的圖案化變困難之 現象。上述變性多官能(甲基)丙稀酸醋 的 性度之更佳之下限為ln莫耳,更佳之上限心:。的變 作為將上述多官能(甲基)丙烯酸醋化合物加以己内醋 變性之具體方法並無特别 P — θ w Μ“人列可列舉:使多元醇 '、 應,5成變性己内酯醇之後,使其盥(甲Α、而 浠酸進行醋化反應的方法;使(甲基)丙婦酸與己㈣反土库), 合成變性己内醋(甲基)内烯酸之後,使其與醇進行能反 200900463 應之方法’·以及使(甲基)丙烯酸、己内酯以及多元醇進行 總括反應之方法等。 又’上述變性多官能(甲基)丙烯酸酯化合物係經氧化 乙烯變性以及/或者氧化丙烯變性後之多官能(甲基)丙烯酸 酯化合物之情形時,該多官能(曱基)丙烯酸酯化合物並無 特別之限定,例如可列舉將上述之3宫能以上之(甲基)丙 烯酸醋化合物進行氧化乙烯變性以及/或者氧化丙烯變^生而 獲得之化合物等。其中,以於季戊四醇三(甲基)丙烯酸酯、 —(三羥曱基丙烷)三(甲基)丙烯酸酯、二季戊四醇三(甲基) 丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、或者二季戊土四 醇五(甲基)丙烯酸酯上被加成羧基之化合物來作為變性氧 化乙稀以及/或者變性氧化丙烯較佳。 作為上述多官能(甲基)丙烯酸酯之變性氧化乙烯以及/ 或者變性氧化丙烯的變性度並無特別之限定,於成為基質 2多官能(甲基)丙烯酸酯化合物的官能基數為n之情形 日寸,相對於多官能(曱基)丙烯酸酯化合物i莫耳,較佳之 下限為0·5η莫耳’較佳之上限為15n莫耳。若上述多官能 (社甲基)丙烯酸醋之變性氧化乙烯以及/或者變性氧化丙稀的 遣性度未滿0.5η莫耳,則有時會存在製造之柱狀間隔物的 柔軟性變得不充分之現象。若上述多官能(甲基)丙烯酸酿 之變性氧化乙烯以及/或者變性氧化丙烯的變性度超過"η 莫耳,則有時於鹼性顯影液中之親合性會變高,且容易引 '由膨脹造成之解析度降低。上述多官能(甲基)丙烯酸_ 之變性氡化乙烯以及/或者變性氧化丙烯的變性度之更佳之 19 200900463 下限為3n莫耳,更佳之上限為10η莫耳。 …作為將上述多官能(甲基)丙婦酸g旨化合物變性氧化乙 ㈣及/或者變性氧化㈣之具體方法並無特別之限定,例 :可列舉:使多元醇與氧化乙婦以及/或者氧化丙稀反應, &成變性魏乙烯以及/或者變性氧化丙烯醇之後,使該變 性氧化乙烯以及/或者變性氧化丙烯醇與(甲基)丙稀酸進行 酉旨化反應之方法;使(甲基)丙稀酸與氧化乙烯以及/或者氧 化丙烯反應’合成變性氧化乙烯以及/或者變性氧化丙稀(甲 基)丙稀酸之後,使其與醇類進行S旨化反應之方法;使(甲 基)丙烯酸、氧化乙烯以及/或者氧化丙稀、以及多元醇進 行總括反應之方法等。 於實施形態1之柱狀間隔物用硬化性樹脂組成物中, 上述變性多官能(甲基)丙烯酸酯化合物之配合量並無特別 之限定,較佳之下限為i 0重量%,較佳之上限為重量 %。若上述變性多官能(甲基)丙烯酸酯化合物之配合量= 滿10重量。/。,則可能存在有損製造之柱狀間隔物的柔軟性 以及較咼之壓縮回復特性之情形。若上述變性多官能(曱基) 丙烯酸酯化合物之配合量超過80重量%,則有可能存在由 於摩擦處理而使柱狀間隔物被刮削之現象。上述變性多官 能(甲基)丙烯酸酯化合物之配合量之更佳之下限為15重量 % ’更佳之上限為70重量%。 本發明之柱狀間隔物用硬化性樹脂組成物,較佳為除 上述分子内具有羧基之6官能以上之胺基曱酸酯(甲基)丙 稀酸酯化合物以及上述光反應起始劑以外,亦含有驗溶性 20 200900463 高分子化合物。 上述驗溶性高分子化合物,作為抗餘劑顯影㈣“ devel〇pment),通常係對於驗顯影中之驗性顯影液具有溶 解性者。作為上述鹼溶性高分子化合物並無特別限定,較 佳為於分子鏈巾含錢H酸酐、或者賴鹽,而具 :可溶解於氫氧化舒、氫氧化納、碳酸納、氫氧化四甲銨 等之水溶液中的溶解性之高分子化合物。 作為如此之鹼溶性高分子化合物並無特別之限定,例 士可列舉含有羧基之單官能不飽和化合物與具有不飽和雙 鍵之單官能化合物共聚合而成之共聚物等驗溶性含有幾基 之高分子化合物。 作為上述含有羧基之單官能不飽和化合物並無特別之 限定’例如可列舉丙烯酸、甲基丙烯酸等。Specialty Chemicals Co., Ltd.). Further, for example, oligo[2-hydroxy-2-indolyl-l-[4-(1-methylvinyl)phenyl]propenone], "['[pendrazyl phenylsulfonyl)) Phenyl]_2-mercapto-2-(4-tolylsulfinyl)propane-fluorenone, 2,4-diethylthioxanthone, isopropyl sestonone, diphenyl- (2,4,6-trimercaptobenzylidene)phosphine oxide, 4-benzoquinone-4'-methyldiphenyl sulfide, phenyl phthalate, 4-phenyldiphenyl Base, ethyl-4-(dimethylamino)benzoate, benzyldidecyl ketal, 2-yl-2-yl-i-phenyl-indole-acetone, hydroxycyclohexylbenzene Ketone, 2-methyl-1-[4-(methylthio)-phenyl]_2-morpholinopropane-indole-ketone, mercapto-2-benzoic benzoate, 4-mercaptoyl Phenyl ketone, 2,2'-bis-(2-chlorophenyl)_ 4,5,4,5_tetraphenyl_2'1^-<1,2'> , (4,4'-bis(diethylamino)diphenyl ketone, 2,2'-bis(〇-700 phenyl)-4,4',5,5|-tetraphenyl-1, 2,-Limi, etc., 1-[9-ethyl-6-phenylhydrazin-3-oxa]-octane, small 嗣 _ 〇-acetate, 1-[9-ethyl -6-(2-methylphenylindenyl)-9·Η·-carbazole·3-based , ethane_丨-ketooxime-oxime-benzoate, 1-[9-ethyl-6-(2-methylbenzhydryl)-9.H.-carbazol-3-yl]- Ethyl_1_ketooxime.〇-acetate, ethyl_6_(1,3,5-trimethylbenzylidene)-9.H.-carbazol-3-yl]-ethane-1 -ketooxime_〇_benzoate, 1-[9-n-butyl-6-(2-ethylbenzylidene)-9.H--oxazol-3-yl]-ethane-1 - ketooxime-0-benzoate, etc. Among them, ΐ-[9·ethyl_6_(2 曱 basic fluorenyl)-9.H·-0 carbazhen-3-yl]-ethene can be suitably used. The oxime ester compound of the ketone of the ketone is a commercially available product of the above-mentioned oxime ester compound, and examples thereof include "IRGACURE OXE02" (manufactured by Ciba Specialty Chemicals Co., Ltd.), etc. 14 200900463 The initiator may be used singly or in combination with two or more kinds of D in the curable resin composition for columnar spacers of the present invention, and the content of the photoreaction initiator is not particularly limited. 100 parts by weight of a 6-functional or higher (fluorenyl) urethane urethane compound having a carboxyl group, preferably a lower limit of 〇1 part by weight, preferably an upper limit of 50 parts by weight. When the content of the photoreactive initiator is less than the weight, the photocuring of the curable resin composition for the column spacer of the present invention may become insufficient, and it becomes difficult to obtain a pattern by development. When the content of the agent exceeds 50 parts by weight, the residue at the time of development becomes becomes =. A more preferred lower limit of the content of the above photoreaction initiator is 丨 by weight, and more preferably, the upper limit is 25 parts by weight. The composition may also be used. The reaction auxiliary agent for reducing the reaction disorder caused by oxygen in the columnar spacer of the present invention by the reaction and the light irradiation can be used in combination with the hydrogen abstraction photoreaction initiator. Hardening speed. The amine-based reaction aid is not particularly limited. For example, e rfc exemplifies a reaction aid, a phosphine-based reaction aid, and a sulfonic acid-based reaction aid. For example, dimethylaminobenzoic acid is exemplified as the above-mentioned amine-based reaction assistant, and there is no particular n-butylamine, di-n-butylamine, triethylamine, ethyltriethylammonate or p-dimethylamino. Isoamyl benzoate and the like. For example, it may be mentioned that the above-mentioned phosphine-based reaction assistant is not particularly limited to tri-n-butylphosphine. The above-mentioned acid-based reaction auxiliary agent is not particularly limited to -s-benzylisothiourea-p-toluenesulfonic acid or the like. 15 200900463 The 4 reaction auxiliaries may be used singly or in combination of two or more. In the curable resin composition for a columnar spacer of the present invention, a 6-functional or higher (meth)acrylic acid urethane compound having a carboxyl group in the molecule may be used as the alkali-soluble polymer compound ( In the second embodiment, the monomer component (the first embodiment) is used as a monomer component by using a 6-functional or higher (meth)acrylic acid urethane compound having a carboxyl group in the molecule. In the case of the curable resin composition for a columnar spacer of the first embodiment, the molecular weight of the (meth)acrylic acid amide carboxylic acid compound having a carboxyl group of 6 or more in the molecule is preferably 1 The acid value of the 6-functional or higher (meth)acrylic acid urethane compound having a carboxyl group in the above molecule is preferably from 5 to 50 mgKOH/g. When the molecular weight of the 6-functional or higher (fluorenyl) urethane urethane compound having a carboxyl group in the molecule is from 1,000 to 5,000, sufficient abrasion resistance can be ensured, and development of the residue is less likely to occur. A more preferred lower limit of the molecular weight of the (functional) (fluorenyl) acrylamide phthalate compound having a carboxyl group in the above molecule is 2 Å, and a more preferred upper limit is 4,500. Further, in the curable resin composition for a columnar spacer according to the first embodiment, as described above, in addition to the above-described (nonyl) urethane urethane compound having a carboxyl group in the molecule, it is preferred. At least one denatured polyfunctional (mercapto) acrylate compound selected from the group consisting of self-denatured caprolactone, denatured ethylene oxide, and denatured propylene oxide (hereinafter, also referred to as denatured polyfunctional (fluorenyl) group) Acrylate compound) as a monomer 16 200900463 component. As described above, the face 1 has such a denatured polyfunctional (meth) acrylate compound and is used as a monomer component. The curable resin composition for the column spacer of the form 1 is obtained, and the obtained h 4 + column is obtained. The spacers are those having excellent flexibility and compression recovery characteristics. The liquid B produced by using such a columnar spacer does not show a 7L piece', and at the same time, it can suppress the "heavy gravity" caused by the liquid crystal expansion during heating & "low temperature foaming" caused by liquid crystal shrinkage at a low temperature. In addition, the above-mentioned "gravity failure" means that the liquid crystal in the liquid crystal unit is heated and expanded during use of the liquid crystal display element, and when the cell gap is widened, the column spacer is raised from the substrate, and the column is raised. The liquid crystal which is incapable of maintaining the volume of the spacer flows downward, thereby causing a phenomenon of color spots on the upper half surface and the lower half surface of the display panel. X, the above-mentioned "low-temperature foaming" means a phenomenon in which the liquid crystal in the liquid crystal unit shrinks at a low temperature, and the internal pressure in the liquid crystal unit is rapidly lowered to cause bubbles. In the case of the polyfunctional (fluorenyl) acrylate compound obtained by denaturation of the above-mentioned denatured polyfunctional (meth) acrylate caprolactone, the polyfunctional (fluorenyl) acrylate compound is not particularly limited, and for example, Trihydromethane propane di(meth) acrylate, trishydroxy ethane bis(indenyl) acrylate, pentaerythritol bis(indenyl) acrylate vine, bis(trimethylolpropane) bis(indenyl) a compound obtained by denaturation of a bifunctional (meth) acrylate compound such as acrylate or dipentaerythritol di(meth)acrylate with caprolactone, or pentaerythritol tri(meth)acrylate or pentaerythritol tris(fluorenyl) Trifunctional or higher (fluorenyl)propene 17 such as acrylate, bis(trimethylolpropane)tri(meth)acrylate, dipentaerythritol tetrakis(meth)acrylate, dipentaerythritol penta(meth)acrylate, 200900463 A compound obtained by denaturation of a caprolactone compound or the like. Among them, a di- chelate obtained by denaturation of a trifunctional or higher hydroxy acrylate compound with caprolactone has a rapid polymerization reaction and is easy to improve the exposure sensitivity, which is particularly preferable. The denatured polyfunctional (meth) acrylate may be used singly or in combination of two or more. The degree of denaturation of the denatured caprolactone as the denatured polyfunctional (meth)acrylic acid g is not particularly limited. When the number of functional groups of the polyfunctional (meth)acrylate compound to be a matrix is n, it is relatively large. Functional (methacrylic acid vinegar compound i mole, preferably lower limit is 〇5n mole, preferably: upper limit is 5η mol. If denaturation of the above-mentioned denatured polyfunctional (subunit) propionic acid vinegar When the degree of use of the columnar spacer for the columnar spacer is used in the case of a column spacer, the flexibility of the column spacer to be produced may be changed. If the change of the denatured caprolactone of the above-mentioned denatured polyfunctional (meth)acrylic acid vine is more than 5 η mol, when the columnar spacer is produced, the reactivity of the exposed k may be lowered. The patterning of the columnar spacers produced is difficult. The lower limit of the properties of the above-mentioned denatured polyfunctional (meth)acrylic acid vinegar is ln Mo, and the upper limit of the upper limit is better. Functional (meth)acrylic acid vinegar compound The specific method of internal vinegar denaturation does not have a special P - θ w Μ "People can list: make the polyol', should, after the 50 is denatured into the caprolactone, the hydrazine (mercapto, and citric acid is vinegarized) The method of making (meth)propanol and hexyl (tetra) anti-soil), synthesizing denatured caprolactic acid (methyl)-enic acid, and then reacting it with alcohol to perform the method of '200900463' A method in which an acrylic acid, a caprolactone, and a polyhydric alcohol are subjected to an overall reaction, etc. Further, the above-mentioned denatured polyfunctional (meth) acrylate compound is a polyfunctional (meth)acrylic acid which is denatured by ethylene oxide and/or denatured with propylene oxide. In the case of an ester compound, the polyfunctional (fluorenyl) acrylate compound is not particularly limited, and examples thereof include oxidative ethylene denaturation and/or propylene oxide conversion of the above-mentioned (meth)acrylic acid vinegar compound. a compound obtained by birth, etc., wherein pentaerythritol tri(meth)acrylate, (trishydroxypropylpropane) tri(meth)acrylate, dipentaerythritol tri(meth)acrylate Preferably, dipentaerythritol tetra(meth)acrylate or a compound in which a carboxyl group is added to dipentaerythritol penta (meth) acrylate is used as the denatured ethylene oxide and/or denatured propylene oxide. The degree of denaturation of the ethylene oxide and/or the modified propylene oxide of the methyl acrylate is not particularly limited, and the number of functional groups of the polyfunctional (meth) acrylate compound of the matrix 2 is n, which is relatively large. The functional (fluorenyl) acrylate compound i mole, preferably has a lower limit of 0.5 η mol. The upper limit is preferably 15 n mol. If the above polyfunctional (meth) acrylate vinegar is denatured with ethylene oxide and/or denatured oxidation When the degree of propylene is less than 0.5 η, the flexibility of the column spacer to be produced may be insufficient. If the above-mentioned polyfunctional (meth)acrylic acid is degenerated, ethylene oxide and/or When the degree of denaturation of the modified propylene oxide exceeds "η mol, the affinity in the alkaline developing solution may become high, and the resolution due to swelling may be easily lowered. More preferably, the polyfunctional (meth)acrylic acid-modified denatured ethylene and/or denatured propylene oxide has a degree of denaturation 19 200900463 The lower limit is 3 n mol, and the upper limit is more preferably 10 n mol. The specific method of denaturing the above-mentioned polyfunctional (meth) acetoacetate g compound (4) and/or denaturing and oxidizing (4) is not particularly limited, and examples thereof include a polyol and an oxidized woman and/or a method for oxidizing propylene, & denatured vinylidene and/or denatured oxypropylene alcohol, and then subjecting the denatured ethylene oxide and/or denatured oxypropylene alcohol to (meth)acrylic acid; a method in which a methyl group of acrylic acid is reacted with ethylene oxide and/or propylene oxide to synthesize a denatured ethylene oxide and/or a denatured propylene oxide (meth)acrylic acid, and then react with an alcohol; A method of collectively reacting (meth)acrylic acid, ethylene oxide, and/or propylene oxide, and a polyol. In the curable resin composition for a columnar spacer according to the first embodiment, the amount of the denatured polyfunctional (meth) acrylate compound is not particularly limited, and a preferred lower limit is i 0 wt%, and a preferred upper limit is weight%. If the amount of the above-mentioned denatured polyfunctional (meth) acrylate compound is = 10% by weight. /. There may be cases where the flexibility of the column spacer to be manufactured and the compression recovery characteristics of the crucible are impaired. When the amount of the above-mentioned denatured polyfunctional (fluorenyl) acrylate compound exceeds 80% by weight, there is a possibility that the columnar spacer is scraped by the rubbing treatment. A more preferred lower limit of the amount of the above-mentioned denatured polyfunctional (meth) acrylate compound is 15% by weight'. The upper limit is more preferably 70% by weight. The curable resin composition for a columnar spacer of the present invention is preferably an amino phthalate (meth) acrylate compound having a hexafunctional or higher functional group having a carboxyl group in the molecule, and the photoreactive initiator. It also contains a test compound 20 200900463 polymer compound. The above-mentioned alkali-soluble polymer compound is not particularly limited as the above-mentioned alkali-soluble polymer compound, and the above-mentioned alkali-soluble polymer compound is preferably used as an anti-residue agent for developing (4) "devel". The molecular chain towel contains a H-acid anhydride or a lysine salt, and has a soluble polymer compound which can be dissolved in an aqueous solution of hydrazine hydroxide, sodium hydroxide, sodium carbonate or tetramethylammonium hydroxide. The alkali-soluble polymer compound is not particularly limited, and examples thereof include copolymers obtained by copolymerizing a monofunctional unsaturated compound having a carboxyl group and a monofunctional compound having an unsaturated double bond, and the like. The monofunctional unsaturated compound containing a carboxyl group is not particularly limited, and examples thereof include acrylic acid, methacrylic acid, and the like.

作為上述具有不飽和雙鍵之單官能化合物,並無特別 之限定,例如可列舉:(曱基)丙烯酸曱酯、(甲基)丙烯酸乙 酉曰、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(曱基)丙烯酸 乙基己酯、(甲基)丙稀酸羥乙酯、(曱基)丙烯酸環己酯、 (甲基)丙烯酸-2-曱基環己酯、(甲基)丙烯酸二環戊基氧基 乙酉旨、(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊酯、(甲 基)丙烯酸苄酯等(甲基)丙烯酸酯系單體。 又’上述鹼溶性含有羧基之高分子化合物亦可含有由 芳香族乙烯系單體、氰乙烯化合物、不飽和二羧酸酐、經 芳香族取代之順丁烯二醯亞胺、經烷基取代之順丁烯二醯 亞胺等所構成之成分。 21 200900463 作為上述芳香族乙烯系單體並無特別之 列舉笼^除 疋’例如可 歹“本乙烯u基苯乙烯、對甲基苯 等。 1 β虱本乙烯 例如可列舉 例如可列 乍為上述亂乙稀化合物並無特別之限定 丙烯腈、曱基丙烯腈等。 作為上述不飽和二羧酸酐並無特別之限定 舉順丁烯二酸酐等。 / 作為上述經芳香族取代之順丁烯二醯亞胺並益特別之 限定’例如可列舉苯基順n亞胺1基順丁稀二酿 亞胺、萘基順丁烯二醯亞胺、鄰氣苯基順丁烯二醯亞胺等。 ^作為上述經烷基取代之順丁烯二醯亞胺並無特別之限 丨如可列舉曱基順丁烯二醯亞胺、乙基順丁烯二醯亞 胺丙基順丁烯二醯亞胺、異丙基順丁烯二醯亞胺等。 呈進而,上述鹼溶性含有羧基之高分子化合物亦可含有 八有羥基之單官能不飽和化合物,以達成抑止顯影時之溶 解性等目的。 乍為上述具有說基之早官能不飽和化合物並無特別之 例如’作為於分子内具有1個經基之單體,例如可 列舉丙烯酸-2-羥乙酯、曱基丙烯酸_2_羥乙酯、丙烯酸_2_ 、’ 知甲基丙浠酸輕丙酯、丙烯酸-4-經丁酯、甲基丙 稀酸-4-經丁酯等。 上述驗溶性含有羧基之高分子化合物中,作為來自含 有羧基之單官能不飽和化合物之成分的比並無特別之限 定軚佳之下限為10重量%,較佳之上限為4〇重量0/〇。 22 200900463 若來自含有羧基之單官能不飽和化合物之成分的比未滿1〇 重量% ’則有時會變得難以賦予鹼溶性。若來自含有叛基 之單官能不飽和化合物之成分的比超過4 0重量%,則有時 顯影時之膨脹會顯著而變得難以形成圖案。來自含有緩基 之官能不飽和物之成分的比之更佳下限為1 5重量%,更佳 之上限為30重量%。 作為使上述含有羧基之單官能不飽和化合物與具有不 飽和雙鍵之單官能化合物共聚合之方法’並無特別之限 定’例如可列舉使用自由基聚合起始劑以及視需要使用分 子量調節劑,藉由整體聚合、溶液聚合、懸浮聚合、分散 聚合、乳化聚合等先前公知之方法進行聚合的方法。其中, 以溶液聚合較佳。 八 , 作為藉由溶液聚合法製造上述驗溶性含有竣夷之古八 子化合物之情形時的溶劑,例如列舉 ° 茲相上 j幻举知肪族醇類、賽珞 ' ··.、卡必醇類、酯類、醚類、酮類、呈 劑等。 ,、有極性之有機溶 作為上述脂肪族醇類並無特別之限 醇、乙醇、異丙醇、二醇等。 ’例如可列舉甲 作為上述賽珞蘇類並無特別之限定, 蘇、丁基賽路蘇等。 例如可列舉赛珞 作為上述卡必醇類並無特別之限定, 醇、丁基卡必醇等。 丨如可列舉卡必 作為上述酯類並無特別之限定,例如。 蘇、乙酸卡必醇、丙:醇單甲⑽乙酸s旨等。可列舉乙酸赛珞 23 200900463 例如可列舉二乙二醇 例如可列舉環己酮、 作為上述醚類並無特別之限定 二甲醚、或者四氫呋喃等環狀醚等 作為上述酮類並無特別之限定 甲基乙基酮、甲基異丁基g同等。 可列舉二甲基亞石風、二甲基甲醯胺等。.”、特別之限定,例如 又,作為藉由懸浮聚合、分散 系分散聚合製造上述共聚物之二:化二合等非水 苯、曱苯、己院、環己燒等液狀煙,或::他= 吏用 溶劑等。 ”他非極性有機 =…述驗溶性含有羧基之高分子化合物時使用 自由基聚合起始劑並無特別之限定,例如可 物、偶氮起始劑等先前公知之自由基聚合起始劑。 又,作為上述分子量調節劑並無特別之限定’例如可 条-甲基苯乙烯二聚物、硫醇系鏈轉移劑等。 τ 又,作為上述驗溶性高分子化合物,特別是於支鍵上 具有岬基)丙婦基㈣基之驗溶性(甲基)丙烯酸系共聚物 (A1 )較佳。 作為於支鏈上具有(甲基)丙烯基與羧基之鹼溶性(甲基) 丙烯酸系共聚力(A1 ),例如,具有由至少具有酸性官能 基之構成單位與具有羥基之構成單位所構成之主鏈,且含 有自由基1 &性基之異亂酸醋化合物經由該異氰酸酯化合 物之異氰酸酯基而與上述酸性官能基之至少一部分醯胺鍵 結以及/或者與上述羥基之至少一部分胺基甲酸酯鍵結的聚 24 200900463 合物(A1 — 1 )較佳。 上述I &物(A1 - 1 ),藉由調節含有自由基聚合性 基之異氰酸酯化合物的加入量以使當量比(nc〇/〇h)成 為1.0以上’可將自由基聚合性基之支鍵以較高之比率導 入至上述鹼溶性南分子化合物中,可提高上述鹼溶性高分 子化合物之敏感度。又’可將具有酸性官能基之構成單位 的含量調節至適宜之比例,可自由地調節鹼溶性(顯影 性)。 於上述聚合物(A1 — i)中,較佳為將異氰酸酯基之 =量比(NCO/OH)調節至,且使具有經基之構成 早位的含有比例為加入量14莫耳%以上。藉由將異氰酸酯 基之上述當量比(NCO/OH)調節為υ以上,可提高異氰 酸S旨基之導入率,同時使具有經基之構成單位的加入量成 為 莫耳/°以上,藉此可增加異氰酸酯基反應之部分,因 此可於上述鹼溶性高分子化合物中導入非常多之量的自由 :基聚合性基之支鏈,獲得特別高之敏感度。 作為上述含有自由基聚合性基之異氰酸酯化合物的加 入量並無特別之限定,異氰酸醋基之當量比(nc〇/〇h) 的較佳之上限為2.0。若上述當量比(nc〇/〇h)超過2 〇, =會於述驗溶性高分子化合物中殘存有大量之未反應之 3有自由基聚合性基之異氰醆酯化合物,使上述鹼溶性高 分子化合物之物性降低。 、上述具有酸性官能基之構成單位係有助於鹼顯影性之 成分,其含有比例並無特別之限冑,可根據上述驗溶性高 25 200900463 分子化合物所要求之鹼溶性的程度適宜調整。作為用以將 上述具有酸性官能基之構成單位導入至聚合物之主鏈中的 單體,可列舉具有含有雙鍵之基與酸性官能基的化合物。 作為上述酸性官能基並無特別之限定,通常係鲮基, 若為有助於鹼顯影性之成分則亦可為羧基以外之基。 其中,作為上述具有酸性宫能基之構成單位,較佳為 下述通式(5)所表示之構成單位。The monofunctional compound having an unsaturated double bond is not particularly limited, and examples thereof include (decyl) decyl acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and (methyl). Butyl acrylate, ethylhexyl (meth) acrylate, hydroxyethyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-mercaptocyclohexyl (meth) acrylate, (A) (meth)acrylate monomer such as dicyclopentyloxyethyl acrylate, isodecyl (meth)acrylate, dicyclopentanyl (meth)acrylate or benzyl (meth)acrylate. Further, the above-mentioned alkali-soluble carboxyl group-containing polymer compound may further contain an aromatic vinyl monomer, a cyanoethylene compound, an unsaturated dicarboxylic anhydride, an aromatic substituted maleimide, and an alkyl group. a component composed of maleimide or the like. 21 200900463 The aromatic vinyl monomer is not particularly enumerated, for example, "the present vinyl styrene styrene, p-methyl benzene, etc. 1 虱 虱 乙烯 乙烯 例如 例如 例如 例如 1 1 The above-mentioned random ethylene compound is not particularly limited to acrylonitrile or mercapto acrylonitrile. The unsaturated dicarboxylic acid anhydride is not particularly limited to maleic anhydride or the like. / As the above-mentioned aromatic-substituted maleene The bis-imine is particularly limited to exemplified by phenyl cis n-imine 1 - cis-butyl iodide, naphthyl-n-butylene imine, ortho-phenyl butyl succinimide The above-mentioned alkyl-substituted maleimide is not particularly limited, and examples thereof include mercapto-butyleneimine and ethyl-butyleneimine-propyl-butene. Further, the alkali-soluble carboxyl group-containing polymer compound may further contain a hydroxy group-containing monofunctional unsaturated compound to achieve solubility inhibition during development. Etc. The material is not particularly specific, for example, as a monomer having one radical in the molecule, and examples thereof include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, acrylic acid _2 _, and Light propyl citrate, 4-butyl butyl acrylate, methyl butyl 4- butyl acrylate, etc. The above-mentioned polymer compound containing a carboxyl group is used as a component derived from a monofunctional unsaturated compound containing a carboxyl group. The lower limit is not particularly limited. The lower limit is 10% by weight, and the upper limit is preferably 4% by weight. 2009 22 200900463 If the ratio of the component derived from the monofunctional unsaturated compound containing a carboxyl group is less than 1% by weight, then In some cases, it becomes difficult to provide alkali solubility. When the ratio of the component derived from the monofunctional unsaturated compound containing a thiol group exceeds 40% by weight, the expansion during development may be remarkable and it may become difficult to form a pattern. A lower limit of the ratio of the component of the functional unsaturated component is preferably 15% by weight, and more preferably 30% by weight. The monofunctional unsaturated compound having a carboxyl group is copolymerized with a monofunctional compound having an unsaturated double bond. The method of the present invention is not particularly limited, and examples thereof include a radical polymerization initiator and, if necessary, a molecular weight modifier, by a conventionally known method such as bulk polymerization, solution polymerization, suspension polymerization, dispersion polymerization, emulsion polymerization, or the like. A method of polymerization, wherein solution polymerization is preferred. VIII. As a solvent in the case of producing the above-mentioned test-solvent-containing octahedron compound by a solution polymerization method, for example, a pseudo-alcohol Class, celluloid '··., carbitol, esters, ethers, ketones, agents, etc.., polar organic solvents as the above aliphatic alcohols are not particularly limited to alcohol, ethanol, and For example, A is not particularly limited as the above-mentioned celluloid, and it is not particularly limited, and it is exemplified by the use of celluloid as the carbitol. Alcohol, butyl carbitol, and the like. For example, the card may be exemplified as the above-mentioned esters, and is not particularly limited, for example. Sodium, acetic acid carbitol, and propylene: alcohol monomethyl (10) acetic acid s. The ketone acetate is not particularly limited as the above-mentioned ketones, and the ketones are not particularly limited as the above-mentioned ethers, and dimethyl ether or a cyclic ether such as tetrahydrofuran is not particularly limited. Methyl ethyl ketone and methyl isobutyl g are equivalent. Examples thereof include dimethyl sapite and dimethylformamide. In particular, for example, the above-mentioned copolymer is produced by suspension polymerization or dispersion-based dispersion polymerization; liquid smoke such as non-aqueous benzene, anthracene, hexene or cyclohexene, etc., or ::He = 溶剂using a solvent, etc. ” He is non-polar organic=...There is no particular limitation on the use of a radical polymerization initiator in the case of a polymer compound having a carboxyl group, for example, an object, an azo initiator, etc. A free radical polymerization initiator is known. Further, the molecular weight modifier is not particularly limited, for example, a strip-methylstyrene dimer or a mercaptan chain transfer agent. Further, the test-soluble (meth)acrylic copolymer (A1) having a mercapto group (IV) group as the above-mentioned test polymer compound, particularly a branch group, is preferable. The alkali-soluble (meth)acrylic copolymerization force (A1) having a (meth)acryl group and a carboxyl group in a branched chain, for example, has a constituent unit having at least an acidic functional group and a constituent unit having a hydroxyl group. a main chain, and a heterocyclic acid vinegar compound containing a radical 1 & group, is bonded to at least a portion of the above-described acidic functional group via an isocyanate group of the isocyanate compound and/or at least a part of the amine group of the above hydroxyl group The acid-bonded poly 24 200900463 compound (A1 - 1 ) is preferred. In the above I & (A1 - 1 ), the amount of the radical polymerizable group-containing isocyanate compound is adjusted so that the equivalent ratio (nc〇 / 〇h) becomes 1.0 or more. The bond is introduced into the alkali-soluble southern molecular compound at a relatively high ratio to improve the sensitivity of the alkali-soluble polymer compound. Further, the content of the constituent unit having an acidic functional group can be adjusted to a suitable ratio, and the alkali solubility (developability) can be freely adjusted. In the above polymer (A1 - i), it is preferred to adjust the ratio of the isocyanate group (NCO / OH) to a content ratio of 14 mol% or more of the content of the late group. By adjusting the above equivalent ratio (NCO/OH) of the isocyanate group to ytterbium or more, the introduction ratio of the isocyanate S group can be increased, and the amount of the constituent unit having the radical group can be made mol/° or more. This can increase the portion of the isocyanate group reaction, so that a very large amount of free radicals can be introduced into the above alkali-soluble polymer compound to obtain a particularly high sensitivity. The amount of the isocyanate compound containing the radical polymerizable group is not particularly limited, and a preferred upper limit of the equivalent ratio of the isocyanato group (nc〇/〇h) is 2.0. When the above-mentioned equivalent ratio (nc〇/〇h) exceeds 2 〇, = a large amount of unreacted 3 isocyanate compound having a radical polymerizable group remains in the soluble polymer compound, and the alkali solubility is made. The physical properties of the polymer compound are lowered. Further, the constituent unit having an acidic functional group is a component which contributes to alkali developability, and the content thereof is not particularly limited, and can be appropriately adjusted according to the degree of alkali solubility required for the molecular compound described above. The monomer for introducing the structural unit having an acidic functional group into the main chain of the polymer includes a compound having a double bond group and an acidic functional group. The acidic functional group is not particularly limited, and is usually a fluorenyl group, and may be a group other than a carboxyl group as a component which contributes to alkali developability. In particular, the constituent unit having the acidic ruthenium group is preferably a constituent unit represented by the following formula (5).

RR

0H (5) R係氫原 上述通式(5)以及後述之其他式中含有之 子或者曱基。 作為用以導入上述通式(5 )夕堪# 飞之構成早位的單體並無特 別之限定,例如可列舉丙烯酸、曱基丙烯酸等。 作為上述具有羥基之構成單 ………、 稱成皁位並無特別之限定,較佳 為下述通式(6)所表不之構成單位。0H (5) R-based hydrogenogen The above formula (5) and a subunit or a mercapto group contained in another formula described later. The monomer to be introduced into the early form of the composition of the above formula (5) is not particularly limited, and examples thereof include acrylic acid and mercaptoacrylic acid. The composition having the hydroxyl group is not particularly limited, and is preferably a constituent unit represented by the following formula (6).

(β) 26 200900463 上述通式(6 甲 氏興上述通式(5)之R相同,Ri 表不碳數為2〜4之伸烷基。作為上 乙基、伸丙基、伸丁基等。 例如可列舉伸 又,作為用以導入上述通式(6 ) 煃忐„ ^ 44 ^ y, )構成早位的單體並 ‘、、、特別之限疋Μ列如可列舉丙烯酸_2_羥乙酯 -2-'M 7 ^ ux ^ τ 基丙烯酸 &乙I曰、丙烯酸_2_羥丙_、甲基丙烯酸-羥 烯酸-4-羥丁酯、甲基丙烯酸_4_羥丁酯等。 -曰 上述聚合物(A1— D之主鍵含有具 通式⑸等構成單位、具有之、…〇 ^ ^基之 仇如、 基之通式(6 )等構成單位 …、必需共聚合成分,亦可含有其 於上述聚合物之主鏈中,亦可含有呈;=分。例如, 單位以及/了 3有具有方香族碳環之構成 平位以及/或者具有酯基之構成單位。 ::為上述具有芳香族碳環之構成單位並無特別之限 例如較佳為下述通式⑺所表示之構成單位。(β) 26 200900463 The above formula (6 is the same as R of the above formula (5), and Ri represents an alkylene group having a carbon number of 2 to 4. As an ethyl group, a propyl group, a butyl group, etc. For example, it can be cited as a monomer for introducing the above-mentioned general formula (6) 煃忐 „ ^ 44 ^ y, ), and is particularly limited to, for example, acrylic acid_2_ Hydroxyethyl ester-2-'M 7 ^ ux ^ τ-based acrylic acid & E I oxime, acrylic acid _2 hydroxypropyl _, methacrylic acid hydroxy acid 4-hydroxybutyl ester, methacrylic acid _ 4 _ hydroxy Butyl ester, etc. - The above-mentioned polymer (the primary bond of A1 - D contains a constituent unit having the general formula (5), has a composition such as a 仇^^ base, a basic formula (6), etc. The polymer component may also be contained in the main chain of the above polymer, or may be contained in the group of ==. For example, the unit and/or 3 have a constituent unit having a square aromatic carbocyclic ring and/or have an ester group. The composition unit having the aromatic carbocyclic ring is not particularly limited, and is preferably a constituent unit represented by the following formula (7).

(7) 表亍^通式⑺中,述通式⑴之R相同,& 等Γ方香族石炭環。作為如此之R2,例如可列舉苯基、蔡基 別之:二導入上述通式(7)之構成單位的單體並無特 芳香族戸亦“可列舉本乙烯基苯乙烯等,又,其 衣亦可經氯、漠等齒素原子1基、乙基等炫基, 27 200900463 胺基、二烷基胺基等胺基 等取代。 氰基、羧基、磺酸基 碟酸基 作為用以使上述具有酯基之構成 狀單體並無特別之限定,例如可列舉具有含=合物主 與酯基之化合物,以下述通表 鍵之基 佳。 Λ 18)所“之構成單位較(7) Table 亍^ In the general formula (7), R of the general formula (1) is the same, & Examples of the R2 include, for example, a phenyl group and a hexyl group. The monomer to which the constituent unit of the above formula (7) is introduced is not particularly aromatic, and the vinyl styrene may be mentioned. The clothes may also be substituted with a cyclyl group such as chlorine or a dentate atom, an ethyl group or the like, an amine group such as an amine group or a dialkylamino group, and the like, and a cyano group, a carboxyl group or a sulfonic acid group. The monomer having a constituent group having an ester group is not particularly limited, and examples thereof include a compound having a main group and an ester group, and the group having the following pass bond is preferred. Λ 18)

(8)(8)

於上述通式⑴中’ R與上述通式(5)之r相同, 表不炫基或者芳㈣。作為如此之R3,例如可㈣碳數 為1〜12之烷基,节基、苯乙基等芳烷基。 作為用以導人上述通式(8)之構成單位的單體並益特 別之限定,例如可列舉(甲基)丙烯酸甲_、(甲基)丙稀酸乙 酯、(f基)丙賴丁醋、(甲基)丙稀酸_2_乙基己醋、(甲幻 丙烯酸苯醋、(f基)丙烯酸環己醋、(甲基)丙稀酸二環戍醋土、 (甲基)丙稀酸二環戊基氧基乙酯、(甲基)丙稀酸異获醋、(甲 基)丙烯酸节@旨、(甲基)丙稀酸苯乙醋等(甲基)丙稀酸之酯 類。 於由上述各構成單位構成之主鏈中,含有自由基聚合 性基之異氰酸酯化合物經由該異氰酸酯化合物之異氰酸酯 28 200900463 基而與上述酸性官能莫# 5 /丨、 , 之至广部分酿胺鍵結以及/或者與 述羥基之至V—部分胺基甲酸醋鍵結,形成 性基之支鏈。 田!象合 域含有自由基聚合性基之異氰酸s旨化合物並 之限定,例如較佳為下述通式( 基烧基異氰酸酿。 )所不之(甲基)丙烯醯氧 OCN~R4·In the above formula (1), 'R is the same as r of the above formula (5), and is not a leuco group or a aryl group (d). As such R3, for example, (iv) an alkyl group having a carbon number of 1 to 12, an aralkyl group such as a benzyl group or a phenethyl group may be mentioned. The monomer to be used as a constituent unit of the above formula (8) is particularly limited, and examples thereof include methyl (meth)acrylate, ethyl (meth)acrylate, and (f). Butyl vinegar, (meth)acrylic acid _2_ethyl hexanoic acid, (methacrylic acid phenyl vinegar, (f-) hexahexyl acrylate, (methyl) acrylic acid bicyclic vinegar, (methyl ) Dicyclopentyloxyethyl acrylate, (meth)acrylic acid vinegar, (meth)acrylic acid section, (meth)acrylic acid, phenylethyl vinegar, etc. (meth) propylene In the main chain composed of the above-mentioned respective constituent units, the isocyanate compound containing a radical polymerizable group is bonded to the above-mentioned acidic functional molybdenum via the isocyanate 28 200900 463 base of the isocyanate compound. Partially enamined and/or bonded to the V-partic acid carboxylic acid sulphate to form a branch of the forming group. The field is an isocyanate compound containing a radical polymerizable group. The definition is, for example, preferably a formula of the following formula (radical isocyanic acid) or not (meth) propylene oxime OCN~R 4·

0 R5 -C=CH, (9) 者甲其:)中、…伸燒基、R6表示氫原子或 :甲基。又,通式⑴之(甲基)丙婦醢氧基燒基異氛酸醋 ’較佳為(曱基)丙烯醯基經由碳數為2〜 氛酸醋基(_NC〇)鍵結者。具體可列舉2-丙軸氧 異處、2-甲基丙烯醯基乙基異氰酸酯等。:: 述2-甲基丙烯醯基乙基異 ·' 和電工公司製造之「karenzMOI」等市售°°例如可列舉昭 由如此之構成單位所構成之上述聚合物 酸性宫能基之通式(5)等之構成單位、二由具: 式(6)寺之構成單位構成,進而可視 含 芳香族碳環之通式(7)等之構成單位== :料:人:者其他構成單位為主鏈之聚合物 原料5物),繼而使其與含有自由基聚 酸酯化合物而獲得。 ®基之異貳 作為用以製造上述原料聚合物之聚合用溶劑,較佳為 29 200900463 :具有經基、胺基等活性氫之溶劑’例 等鱗類,二乙二醇二甲醚 j…夫南 基乙基_等二醇醚類,甲基謇技:%—乙…乙二醇甲 者而_ 土賽珞穌乙酸酯等賽珞蘇酯類或 者丙—醇單甲醚乙酸酯、乙 芳香族烴類、酮類1類等。氧基丁0日4,亦可使用 a w1&上述原料聚合物之聚合起始劑並無特別 用先前公知之自由基聚合起始劑,例如可列 :二:物(腈系偶氮系聚合起始劑)、非腈系偶 ::物(非腈系偶氮系聚合起始劑)、有機過氧化物(過 礼化物系聚合起始劑)' 過氧化氫等。 作為上述腈系偶氮化合物並無特別之限定,例如可列 舉偶氮雙異丁腈、2,2,·偶氮雙_(2,4_二甲基戍猜)、2,2,_ 偶氮雙-(4-甲氧基_2,4_二甲基戊腈)等。 作為上述非腈系偶氮化合物並無特別之限定例如可 列舉二甲基_2,2,-偶氮雙(2_曱基丙酸醋)、2,2,-偶氮雙(2,4,4_ 三曱基戊烷)等。 ,, 作為上述有機過氧化物並無特別之限定,例如可列舉 過氧異丁酸第三己酯、過氧異丁酸第三丁酯、3,5,$_三甲其 己醯基過氧化物、辛醯基過氧化物、月桂醯過氧化物、硬 脂醯基過氧化物、^,3,3-四曱基丁基過氧基_2_乙基己酸 醋、琥拍醯過氧化物、2,5-二曱基-2,5-二(2-乙基己酿基過 氧基)己烷、1-環己基-1-甲基乙基過氧基_2_乙基己酸醋、 第三己基過氧基2-乙基己酸酯、4-曱基苯甲醯基過氧化物、 苯甲醯基過氧化物、1,1,·雙_(第三丁基過氧基)環己貌等。 200900463 使用過氧化物作為上述自由基聚合起始劑之情形時,亦可 將其與還原劑組合而使用為氧化還原型聚合起始劑。 於上述原料聚合物之製造中,亦可使用分子量調節劑 以調節重量平均分子量。 作為上述分子量調節劑並無特別之限定,例如可列舉 *化浼煌類分子量調節劑、硫醇類分子量調節劑、黃原酸 酉旨類分子量調節劑、E品油烯(terpin〇lene)、^甲基苯乙 烯二聚物等。 作為上述函化烷烴類分子量調節劑並無特別之限定, 例如可列舉二氯甲烷、四溴化石炭等。 作為上述硫醇類分子量調節劑並無特別之限定,例如 可列舉正己硫醇、正辛硫醇、 社* 千瓜私正十—硫醇、第三(十二硫醇)、 k 基乙酸(thi〇glyc〇Uicacid)等。 :述黃原酸酿類分子量調節劑並無特別之限定,例如 了列舉—硫化二子基普历龄_ 等。 、’、i曰、二硫化二異丙基黃原酸酯 上述原料聚合物可传益招1 & & 一種。 ⑯了係無規共聚物以及歲段共聚物之任 於製造無規共聚物之情來车 〜⑷Φ t , 例如可將由上述通式⑺ U)中所不之各單體、以及 於8〇〜II(r(:nu ㈣所構成之調配组成物, i i υ u t,皿度條件下,以2〜 劑之聚合楕中,使复孰作.. 小時滴加至放入有溶 使其熟化,藉此使其聚合。 具有上述通式(5)〜 之聚笨乙稀換算重量平構成單位的原料聚合物 里十均刀子置(以下僅稱為「重量平均 31 200900463 分子$」或者「Mw」)之較佳下限為5〇〇〇,較佳上限為 5萬,酸值之較佳下限為5 mgK〇H/g,較佳上限為 mgKOH/g,羥基值之較佳下限為5 mgK〇H/g,較佳上限為 100 mgKOH/g。 上述原料?炎合物與含有自由基聚合性基之異氛酸醋化 合物之反應,係、可將含有自由基聚合性基之異氰酸醋化合 物’於少1觸媒之存在下,一次全部投入至原料聚合物之 溶液中持續反應-定時間,或者每次少量滴加至其中進 行。 ^述觸媒並無特別之限定,例如可列舉二月桂酸二丁 基錫等,^,可視需要使用對甲氧絲、氫_、萘胺、第 —丁基兒余酚、2,3-二-第三丁基_對甲酚等聚合抑制劑。 上述含有自由基聚合性基之異氰酸醋化合物,對於上 述原料聚合物中之酿古Ab _ 1 S此基經由異氰酸酯而醯胺鍵结。 例如,與上述通式⑴之構成單位形成下述通式(1〇) 所表示之構成單位。 札另一方面,上述含有自由基聚合性基之異氰酸醋化合 匕,對於原料聚合物中之經基,經由異氰酸g旨而胺基甲酸 酉曰鍵結。例如,斑μ .+' 1 Η $ 肖上切式⑷之構成單位,進行加成 反應而藉由胺基曱酸酯鏟沾 鍵、、·。進行鍵結,形成下述通式(1 〇 ) 之構成單位所表示之構成單位。 32 2009004630 R5 -C=CH, (9) In the case of :), ..., the base is extended, and R6 represents a hydrogen atom or a methyl group. Further, the (meth) propyl anthraquinone acetoacetate of the formula (1) is preferably a (mercapto)propenyl group bonded via a carbon number of 2 to an oleic acid group (_NC〇). Specific examples thereof include 2-propane oxygen dislocation, 2-methylpropenylethyl isocyanate, and the like. :: 2-methyl propylene sulfhydryl ethyl ketone and the commercially available "kaenz MOI" manufactured by the Electric Co., Ltd., for example, the general formula of the above-mentioned polymer acidic ruthenium group formed by such a constituent unit (5) The constituent unit of the class, and the second component: The constituent unit of the temple (6), and the constituent unit of the general formula (7) containing the aromatic carbon ring; =: material: person: other constituent units The polymer raw material 5 as the main chain) is then obtained by containing a radical polyacrylate compound. The base is used as a solvent for the polymerization of the above-mentioned base polymer, preferably 29 200900463: a solvent having an active hydrogen such as a base or an amine group, and the like, a diethylene glycol dimethyl ether j... Funanyl ethyl _ diol ethers, methyl oxime: % - B ... ethylene glycol A and _ tercene acetate or other cyanosyl ester or propyl alcohol monomethyl ether acetate Ester, ethyl aromatic hydrocarbons, ketones, and the like. Oxybutene 0, 4, may also use a w1 & the polymerization initiator of the above raw material polymer is not particularly used in the conventionally known radical polymerization initiator, for example, can be listed: two: (nitrile azo polymerization) Initiator), non-nitrile couple:: (non-nitrile azo polymerization initiator), organic peroxide (polymerization initiator), hydrogen peroxide, and the like. The nitrile azo compound is not particularly limited, and examples thereof include azobisisobutyronitrile, 2,2, azobis(2,4-dimethyl 戍 guess), and 2,2, _ couple. Nitrogen bis-(4-methoxy-2,4-dimethylvaleronitrile) and the like. The non-nitrile azo compound is not particularly limited, and examples thereof include dimethyl 2,2,-azobis(2-mercaptopropionic acid vinegar) and 2,2,-azobis (2,4). , 4_ tridecylpentane) and the like. The organic peroxide is not particularly limited, and examples thereof include third hexyl peroxyisobutyrate, tert-butyl peroxyisobutyrate, and 3,5, $_trimethylhexanyl peroxy peroxide. , octyl peroxide, laurel peroxide, stearyl peroxide, ^, 3,3-tetradecyl butylperoxy-2-ethylhexanoic acid vinegar, acridine peroxide , 2,5-dimercapto-2,5-di(2-ethylhexylperoxy)hexane, 1-cyclohexyl-1-methylethylperoxy-2-ethylhexanoic acid Vinegar, third hexylperoxy 2-ethylhexanoate, 4-mercaptobenzamide peroxide, benzammonium peroxide, 1,1,·bis-(t-butylperoxy Base) ring and so on. 200900463 When a peroxide is used as the radical polymerization initiator, it may be used in combination with a reducing agent to be a redox type polymerization initiator. In the production of the above raw material polymer, a molecular weight modifier may also be used to adjust the weight average molecular weight. The molecular weight modifier is not particularly limited, and examples thereof include a sulfonate-based molecular weight modifier, a thiol-based molecular weight modifier, a xanthate-based molecular weight modifier, and an E-pinene (terpin). ^ Methyl styrene dimer, etc. The functionalized alkane-based molecular weight modifier is not particularly limited, and examples thereof include dichloromethane and tetrabromocarbonized carbon. The thiol-based molecular weight modifier is not particularly limited, and examples thereof include n-hexyl mercaptan, n-octyl mercaptan, saponin, sulphur, sulphur, sulphur, and ketone. Thi〇glyc〇Uicacid) and so on. The term "treaturic acid-based molecular weight modifier" is not particularly limited, and examples thereof include - sulfurized di-subunits. , ', i 曰, diisopropyl xanthogen disulfide The above raw material polymer can be transferred to 1 && 16 is a random copolymer and a copolymer of the age of the copolymer to produce a random copolymer to the car ~ (4) Φ t, for example, the monomer of the above formula (7) U), and 8 〇 ~ II (r(: nu (4)) The compound composition, ii υ ut, under the condition of the dish, in the polymerization enthalpy of 2~ agent, make the retanning process. The above-mentioned general formula (5) to the above-mentioned polystyrene-equivalent conversion weight flat constituent unit of the raw material polymer in the ten-knife set (hereinafter referred to as "weight average 31 200900463 molecular $" or "Mw" The preferred lower limit is 5 〇〇〇, the preferred upper limit is 50,000, the preferred lower limit of the acid value is 5 mg K 〇 H / g, the preferred upper limit is mg KOH / g, and the preferred lower limit of the hydroxyl value is 5 mg K 〇 The upper limit of H/g is preferably 100 mgKOH/g. The reaction of the above-mentioned raw material, the inflammatory compound, and the acetoacetic acid compound containing a radical polymerizable group, isocyanic acid vinegar containing a radical polymerizable group The compound 'in the presence of less 1 catalyst, all of which is once added to the solution of the base polymer for a continuous reaction - for a fixed time, or A small amount is added dropwise thereto. The catalyst is not particularly limited, and examples thereof include dibutyltin dilaurate, etc., and if necessary, p-methoxysilane, hydrogen _, naphthylamine, and butyl butyl can be used. a polymerization inhibitor such as phenol or 2,3-di-t-butyl-p-cresol. The above isocyanate compound containing a radical polymerizable group, and the base of the above-mentioned base polymer Ab _ 1 S For example, a constituent unit represented by the following formula (1〇) is formed in the unit of the above formula (1). On the other hand, the above-mentioned isocyanate vinegar containing a radical polymerizable group The compound hydrazine is bonded to the meso group in the base polymer via hydrazine amide and isocyanate. For example, the formation unit of the plaque μ.+' 1 Η $ xiao upper cut (4) is subjected to an addition reaction. On the other hand, the amine phthalate smashes the bond, and the bond is formed to form a constituent unit represented by the constituent unit of the following general formula (1 〇). 32 200900463

R h2—〇 ^01 c=o I 0i1 oI I 0—C—*"NH·-R4—q- (1 1) 0 c—c=ch2 如此而獲付之聚合物具有如下之分子結構:具有酸性 官能基之上述通式(5)等之構成單位、具有經基之上述 通式(6)等之構成單位、於具有酸性官能基之構成單位 中導入有自由基聚合性基之上述通式(ig)等之構成單位、 於具有經基之上述通式(6)之構成單位中導入有自由基 聚合性基之上述通式(η)等之構成單位以任意之順序連 結而成之分子結構。R h2—〇^01 c=o I 0i1 oI I 0—C—*"NH·-R4—q- (1 1) 0 c—c=ch2 The polymer thus obtained has the following molecular structure: a constituent unit of the above formula (5) having an acidic functional group, a constituent unit having the above-described formula (6), and the like, and a radical polymerizable group introduced into a constituent unit having an acidic functional group a constituent unit of the formula (ig) or the like, and a constituent unit of the above formula (η) in which a radical polymerizable group is introduced into a constituent unit of the above formula (6) having a radical group is bonded in an arbitrary order. Molecular Structure.

作為上述鹼溶性高分子化合物之禾A 添加置並無特別之限 定’相對於上述分子内具有羧基之6官沾 ^ g此以上之(甲基)丙 烯酸胺基甲酸酯化合物1 〇 〇重量份,輕 议住之下限為20重 量份’較佳之上限為400重量份。若 上述鹼溶性高分子化 合物之添加量未滿20重量份,則有時μ a $ 月才猎由添加上述鹼溶 33 200900463 性高分子化合物而獲得之效果會變得不充分,且於顯影步 驟產生圖案流動。若上述驗溶性高分子化合物之添加量超 過400重量份,則有時會產生顯影殘留。上述驗溶性高分 子化合物之添加量的更佳之下限為25重量份,更佳之上 限為300重量份。 本發明之柱狀間隔物用硬化性樹脂組成物較佳為進而 含有具有2個以上嵌段異氰酸酯基之化合物。上述具有2 個以上錢異氰酸S旨基之化合物,發揮作為熱交聯劑之作 用,藉由含有如此之具有2個以上嵌段異氰酸g旨基之化合 物可賦予本發明之柱狀間隔物用硬化性樹脂組成物熱硬 化性。 、 作為上述具有2個以上嵌段異氰酸酯基之化合物並無 特別之限定’例如可列舉將甲苯:異氰酸§旨、4,4_二苯基 甲燒一 /、氰馱知、一甲苯二異氰酸酯、六亞甲基二異氰酸 醋、異佛酮二異氰酸醋、亞甲基雙(4_環己基異氰酸醋)、 三甲基六亞甲基二異氰酸酯、以及其等之寡酯所構成多官 能異氰酸酯’ ϋ由活性亞甲基系、肟系、内醯胺系、醇系 等阻斷劑化合物嵌段化而獲得者等。其等具有2個以上嵌 段異氰酸酿基之化合物可單獨使用,亦可併用2種以上。 又,作為如此之具有2個以上嵌段異氰酸酯基之化合 物中市售者,例如可列舉Duranate ΐ7Β_6〇ρχ、 E-4〇2-B80T (以上由旭化成化學公司製造)等。 本發明之柱狀間隔物用硬化性樹脂組成物中含有上述 具有2個以上嵌段異氰酸酯基之化合物之情形時,作為其 34 200900463 含量並無特別之限定,較佳之下限為〇 〇1重量%,較佳之 上限為50重罝%。若上述具有2個以上嵌段異氰酸酯基之 化合物的含量未滿〇·〇1重量%,則有時會存在本發明之柱 狀間隔物用硬化性樹脂組成物不能充分熱硬化之現象。若 上:具有2個以上嵌段異氰酸酯基之化合物的含量超過5〇 重量%、,則有時所得之硬化物的交聯度會變得過高而不能 滿足後述之彈性特性。上述具有2個以上嵌段異氰酸醋基 化口物的s里之更佳之下限為〇 〇5重量份,更佳之上限 為20重量份。 本發明之柱狀間隔物用硬化性樹脂组成物亦可藉由用 以調整黏度之稀釋劑進行稀釋。 作為上述稀釋劑’考慮與本發明之柱狀間隔物用硬化 性樹脂組成物之相溶性、塗佈方法、乾燥時之膜均勻性、 乾燥效率等而加以選擇即可’並無特別之限定,於使用旋 式塗佈機&縫塗佈機塗佈本發明之柱狀間隔物用硬化 性樹脂組成物之情形時,例如較佳為甲基賽路蘇、乙基賽 路穌、乙基賽路蘇乙酸酿、二乙二醇二甲喊、丙二醇單乙 醚乙馱酗、異丙醇等有機溶劑。其等稀釋劑可單獨使用, 亦可併用2種以上。 人本發明之柱狀間隔物用硬化性樹脂組成物亦可視需要 有用以提冋與基板之黏著性的矽烷偶合劑等先前公知之 添加劑。 八本發明之柱狀間隔物用石更化性樹脂組成4勿含有上述之 内/、有羧基之6官能以上之(甲基)丙烯酸胺基曱酸酯 35 200900463 化合物,因此可製造具有不會由於液晶顯示元件之製造過 程中的摩擦處理而使表面被刮削的耐摩擦性之柱狀間隔 物。 再者’於本說明書中’所謂硬化物係表示藉由光照射 (以及加熱)而使本發明之柱狀間隔物用硬化性樹腊組成 物大致完全硬化時的硬化物。使其大致完全硬化之條件至 少照射50 mJ/cm2之紫外線’進而於加熱之情形時,以2〇〇 〜25〇C之溫度施加20分鐘左右之熱處理,藉此可使其基 本完全硬化。 如此之本發明之柱狀間隔物用硬化性樹脂組成物,藉 由光照射(以及加熱)使其硬化時的硬化物於25 〇c下之丨5% 壓縮時的彈性係數之較佳下限為0·2 Gpa,較佳上限為10 GPa。若於25 C下之15%壓縮時的彈性係數未滿〇_2 GPa, 則過軟,而使用本發明之柱狀間隔物用硬化性樹脂組成物 而成的柱狀間隔物有時會難以保持單元間隙。若於25。〇下 之15%壓縮時的彈性係數超過i〇 Gpa,則過硬,而存在 於站α使用本發明之柱狀間隔物用硬化性樹脂組成物的基 板時有時會刺入彩色濾光片層,且不能獲得回復時所必需 之充刀的彈性變形之現象。於25。(:下之1 5%壓縮時的彈性 係數的更佳下限為0.3 GPa,更佳上限為0·9 GPa,進而更 偟之下限為0.5 GPa,進而更佳之上限為0.7 GPa 又本發明之柱狀間隔物用硬化性樹脂組成物’藉由 ^ gg r 、 、、以及加熱)使其硬化時的硬化物於2 5 °C下之15 % ,宿寺之回復率之較佳下限為60%。若於25°C下1 5%壓縮 36 200900463 時之回復率未滿60%,則所得之液晶顯示元件之基板間的 柱狀間隔物回復力有時會過弱,而不能獲得充分之重力不 良抑制效果。 再者’於本說明書中,所謂ΐ5%ι縮係表示進行塵縮 以使柱狀間隔物之高度的變形率成為15%。 、’ 作為製造本發明之柱狀間隔物用硬化性樹脂組成物的 方法並無特別之限定,例如可列舉利用先前公知之方法混 合上述各種樹脂或添加劑等的方法。 龜而,就使用本發明之柱狀間隔物用硬化性樹脂組成 物而製造柱狀間隔物之方法加以說明。 於使用本發明之柱狀間隔物用硬化性樹脂组成物製造 柱狀間隔物之情形時,首先將本發明之柱狀間隔物用硬化 性树脂組成物塗佈於基板上使其成為預定之厚度而形成被 膜。 作為上述塗佈方法並無特別之限定,例如可列舉旋塗、 狹縫&旋塗、狹縫塗佈、噴塗、浸塗、棒塗等先前公知之 塗佈法。 繼而,於形成之被膜上,經由所形成之既定圖案之遮 罩來照射紫外線等活性光線。藉此,於光照射部,使本發 明之柱狀間隔物用硬化性樹脂組成物中含有之鹼溶性高^ 子化合物與光反應起始劑反應而進行光硬化。 作為上述活性光線之照射量並無特別之限定,於紫外 線之情形時較佳為50 mj/cm2以上。若上述活性光線之照 射量未滿50 ,則有時於光硬化不充分下而繼續,進 37 200900463 行鹼處理時會不能形成溶解至曝光部之圖案。 繼而,將光硬化後之光硬化物驗顯影而於基板上製造 由本發明之柱狀間隔物用硬化性樹脂組成物之光硬化物所 構成之預定圖案的柱狀間隔物。 本發明之柱狀間隔物用硬化性樹脂組成物含有上述分 子内具有羧基之6官能以上之(曱基)丙烯酸胺基甲酸酯化 合物,因此顯影性良好,又,所製造之柱狀間隔物成為耐 摩擦性優異者。進而含有上述之變性多官能(甲基)丙烯酸 酯化合物之情形時,本發明之柱狀間隔物用硬化性樹脂組 成物,其硬化物具有自壓縮變形之高回復性,且於形成預 定之圖案時幾乎不生成殘渣,且可形成解析度優異之分明 圖案之柱狀間隔物。 本發明之柱狀間隔物用硬化性樹脂組成物含有具有2 個以上嵌段異氰酸酯基之化合物之情形時,進而對顯影處 理後之圖案化之光硬化物進行加熱,藉此使含有之驗溶性 高分子化合物與具有2個以上嵌段異氰酸酯基之化合物反 應。 作為上述加熱之條件,考慮上述圖案之大小或厚度等 適宜決定即可,較佳為至少20(rc、2〇分鐘以上。 使用本發明之柱狀間隔物用硬化性樹脂組成物形成之 柱狀間隔物亦係本發明之一。 +本發明之柱狀間隔物,以使其高度較單元間隙高若干, 可藉由ODF法等先前公知之方法進行製造,藉此可獲得不 產生低溫發泡且有效地抑止重力不良所造成之色斑的產生 38 200900463 之液晶顯示元件。 使用本發明之柱狀間隔物用硬化性樹脂組成物、或者 本發明之柱狀間隔物而成之液晶顯示元件亦係本發明之 — 〇 根據本發明,可提供一種柱狀間隔物用硬化性樹脂組 成物,其可开》成具有優異之顯影性,且不會由於液晶顯示 元件之製造過程中的摩擦處理而被刮削之柱狀間隔物。 又,可提供使用該柱狀間隔物用硬化性樹脂組成物而成之 柱狀間隔物、以及液晶顯示元件。 【實施方式】 以下列舉實施例對本發明加以更詳細之說明,但本發 明並不僅限定於其等實施例。 (具有羧基之多官能(甲基)丙烯酸胺基甲酸酯化合物 (樣品A)之製作) 於裝備有攪拌器、溫度計、冷卻管以及空氣導入管之 1 〇 反應容器中,總括加入三甲基六亞甲基二異氰酸酯84〇 \ g(4 moO 、二經甲基丁酸148 g(l mol)、聚己内g旨多 凡醇(重量平均分子量為2000 ) 2000 g ( 1 mol )、變性氧 化乙烯雙酚A (分子量為324) 324 g ( 1 mol)、二季戊四 醇五丙烯酸酯1048 g ( 2 mol )、二月桂酸二丁基錫5 g, 於氮氣環境氣氛下,於60°C下使其反應5小時,獲得具有 幾基之多官能甲基丙烯酸胺基甲酸酯化合物(樣品A )。 樣品A之酸值為13 mgKOH/g,重量平均分子量為4400, 官能數為10。 39 200900463 ♦ (具有叛基之多官能(甲基)丙烯酸胺基甲酸酯化合物 (樣品B〜I )之製作) 除如表1所不調整各成分之量以外,其餘以與樣品A 相同之方式製作樣品B〜卜樣品B〜j之酸值、重量平岣 分子量以及官能數示於表1中。 二 (未具有羧基之多官能(甲基)丙烯酸胺基曱酸酯化合 物之製備) " 使用曰本化藥公司製造之「DPHA-40H」(重量平岣 分子量為7000、官能數為1〇)。 - (多官能(曱基)丙稀酸酯化合物之製作) 將變性己内酯季戊四醇三丙烯酸酯(使〖莫耳季戊四 醇與8莫耳之己内自旨反應,進而以3莫耳丙稀酸進行略 化反應而生成之化合物)2〇重量份(16·8 mm〇l)、作為 酸酐之琥^白酸酐i_98重量份(16 8腿〇1)、作為聚合抑 制劑之氳醌0.01重量份、以及作為溶劑之丙二醇單甲醚乙 ; 酸醋(PGMEA) 2(3重量份加人至燒瓶中,-面吹入氮氣 —面進行加熱。 繼而,將琥轴酸酐完全溶化,添加作為觸媒之三乙胺 0.02重里份之後,於氮氣環境氣氛下,於油浴下使 其反應6小時,然後放置冷卻至室溫,獲得羧酸加成變性 己内酯季戊四醇三丙烯酸酯(A_SA_TMM)。 (驗溶性高分子化合物之製作) 於具有攪拌裝置、滴液漏斗、冷凝器、溫度計、導氣 管之燒瓶中,稱取丙二醇單甲醚乙酸醋(pGMEA) 145重 40 200900463 置份,一面進行氮氣替換一面進行攪拌,升溫至。 繼而,於甲基丙烯酸苄酯30重量份(〇185 m〇1)、 曱土 1稀酸23.3重罝份(0.271 m〇1 )、甲基丙稀酸異癸醋 35重量份(〇·161 以及具有三環癸燒骨架之單甲基丙 稀酸醋(日立化成公司製造、PA_513M) 17重量份(〇 〇〇8 mol )所構成之單體混合物中,添加第三丁基過氧化氫(日 油公司製造、perbutyl 〇) 7·6重量份(相對於單體混合物 100重置份為4 5重量份)。將其自滴液漏斗以2小時滴 加至燒瓶中,進而於120。〇下繼續攪拌2小時進行熟化。 繼而,將燒瓶内替換為空氣,於甲基丙烯酸縮水甘油 酯15.6重量份(〇.11〇 m〇1、羧基之41%)中於熟化中投 入三(二甲胺甲基)酚(DMP-30) 0.9重量份以及氫醌〇 145 重1份,於1201下繼續反應6小時後使反應結束,獲得 鹼溶性高分子化合物。對所得之鹼溶性高分子化合物進行 取樣’藉由凝膠滲透層析法(GPC )測定分子量,重量平 均分子量為13000 ’固體成分酸值為9〇。 (實施例1〜14、比較例1〜3 ) (1 )柱狀間隔物用硬化性樹脂組成物之製作 調整各成分之量使其成為表2所示之比率,製備桎狀 間隔物用硬化性樹脂組成物。 再者,表2中之各略稱如下所述。 DPHA-40H :多官能丙烯酸胺基甲酸酯(無羧基,重 量平均分子量為7000、官能數為1〇)(日本化藥公司製 造) 41 200900463 1-907 : IRGACURE 907 ( Ciba Specialty Chemicals 公 司製) 17B-60PX:嵌段異氰酸酯(旭化成化學公司製造) EDM :二乙二醇甲基乙基醚(東邦化學公司製造) (2 )柱狀間隔物之製作 於150 mmxl50 mm之ITO玻璃基板上,藉由旋塗塗 佈所得之柱狀間隔物用硬化性樹脂組成物,於8 〇 〇C下乾燥 2分鐘而獲得塗膜。於所得之塗膜上,經由6 見方之點 圖像光罩照射1 50 mj/cm2之紫外線之後,以〇.丨1%之τμαη (氫氧化四甲基敍)溶液顯影8〇秒,再以純水清洗3〇秒 後形成柱狀間隔物之圖案。其後,以2301進行3〇分鐘之 烘培處理,製作柱狀間隔物。所得之柱狀間隔物的底面積 為 100 μπι2、高度為 3 μΓη。 <評價> 對貫施例1〜1 4以及比較例1〜3中所得之柱狀間隔物 用硬化性樹脂組成物、以及柱狀間隔物進行以下評價。結 果如表2所示。 再者,比較例2中,因顯影性差不能形成圖案,所以 並未進行黏著性與耐摩擦性之評價。 (顯影液白濁性評價) 抓取進行顯影後之顯影液,進行白濁性之目視觀察與 以動態光政射光度計(internati〇nal business公司製造、 NICOMP.3 80ZLS) $行粒度測$,按照以下之標準進行評 價。 42 200900463 〇 :以目視評價透明、平均粒子徑未滿ι〇〇μηι △:以目視評價«白濁、平均粒子徑未滿5〇〇μηι X:以目視評價為白濁、平均粒子徑為500 μιη以上 (密合性評價) 藉由光學顯微鏡觀察圖案是否消失,藉由以下之標準 進行評價。 〇:未觀察到間隔物圖案消失。 X:觀察到間隔物圖案消失。 (顯影性評價) 藉由光予顯彳放鏡觀察有無顯影殘逢,藉由以下之標準 進行評價。 〇:間隔物圖案良好、無顯影殘渣之狀態 X.可確認顯影殘渣,或者產生顯像殘留之狀態 (耐摩擦性評價) 以设置有棉配向布(rubbing ci〇th)之摩擦處理機(川口 湖精密公司製造、sp_360 ),於輥轉速780 rpm (直徑80 mm 0 )、平台速度60 mm/sec、壓入量0.7 mm之條件下, 對形成了柱狀間隔物之基板,以配向布圖樣沿圖樣順向進 行1次摩擦處理,利用SEM ( 6〇〇〇倍)對該基板進行表面 到削觀察,藉由以下之基準進行評價。 〇:完全無表面刮削。 X :確認刮削。 43The addition of the above-mentioned alkali-soluble polymer compound is not particularly limited to that of the above-mentioned (meth)acrylic acid urethane compound having a carboxyl group in the above molecule. The lower limit of the light weight is 20 parts by weight, and the upper limit is preferably 400 parts by weight. When the amount of the alkali-soluble polymer compound added is less than 20 parts by weight, the effect obtained by adding the above-mentioned alkali-soluble 33 200900463 polymer compound may be insufficient for μ a $ month, and the development step may be insufficient. Produce a pattern flow. When the amount of the above-mentioned test polymer compound added exceeds 400 parts by weight, development residue may occur. A more preferred lower limit of the amount of the above-mentioned test-soluble polymer compound to be added is 25 parts by weight, more preferably 300 parts by weight. The curable resin composition for a columnar spacer of the present invention preferably further contains a compound having two or more blocked isocyanate groups. The above-mentioned compound having two or more isocyanic acid S groups functions as a thermal crosslinking agent, and can be imparted to the columnar shape of the present invention by containing a compound having two or more blocked isocyanate groups. The hardener resin composition for a spacer is thermosetting. The compound having two or more blocked isocyanate groups is not particularly limited, and examples thereof include toluene: isocyanate, 4,4-diphenylmethylsulfonate/, cyanide, and toluene. Isocyanate, hexamethylene diisocyanate, isophorone diisocyanate, methylene bis(4-cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, and the like A polyfunctional isocyanate composed of an oligoester is obtained by blocking a blocker compound such as an active methylene group, an anthraquinone system, an intrinsic amine system or an alcohol system. The compound having two or more blocked isocyanic acid groups may be used singly or in combination of two or more. In addition, as a commercially available compound having two or more blocked isocyanate groups, for example, Duranate ΐ7Β_6〇ρχ, E-4〇2-B80T (above, manufactured by Asahi Kasei Chemicals Co., Ltd.), and the like can be mentioned. When the above-mentioned compound having two or more blocked isocyanate groups is contained in the curable resin composition for a columnar spacer of the present invention, the content of 34 200900463 is not particularly limited, and a preferred lower limit is 〇〇1% by weight. The upper limit is preferably 50% by weight. When the content of the compound having two or more blocked isocyanate groups is less than 重量1% by weight, the curable resin composition for columnar spacers of the present invention may not be sufficiently thermally cured. When the content of the compound having two or more blocked isocyanate groups exceeds 5% by weight, the degree of crosslinking of the obtained cured product may become too high to satisfy the elastic properties described later. A more preferred lower limit of s of the above-mentioned two or more blocked isocyanato sulfonate is 〇 5 parts by weight, more preferably 20 parts by weight. The curable resin composition for columnar spacers of the present invention can also be diluted by a diluent for adjusting the viscosity. The diluent is not particularly limited as long as it is selected in consideration of the compatibility with the curable resin composition for a columnar spacer of the present invention, the coating method, the film uniformity during drying, the drying efficiency, and the like. In the case where the curable resin composition for columnar spacers of the present invention is applied by a spin coater & slit coater, for example, methyl stilbene, ethyl celesta, ethyl is preferable. An organic solvent such as cyproterone, diethylene glycol, propylene glycol monoethyl ether, isopropanol or the like. These diluents may be used singly or in combination of two or more. A conventionally known additive such as a decane coupling agent for improving the adhesion to a substrate may be used as the curable resin composition for a columnar spacer of the present invention. The columnar spacer of the present invention is composed of a stone-reducing resin. 4 The compound of the (meth)acrylic acid amide phthalate 35 200900463 having the above-mentioned / and having a carboxyl group is not contained, so that it can be manufactured without A columnar spacer that is rubbed against the surface due to the rubbing treatment in the manufacturing process of the liquid crystal display element. In the present specification, the term "hardened material" means a cured product when the columnar spacer of the present invention is substantially completely cured by light irradiation (and heating). The condition of making it substantially completely hardened is to irradiate at least 50 mJ/cm2 of ultraviolet rays. Further, in the case of heating, heat treatment is applied at a temperature of 2 Torr to 25 Torr C for about 20 minutes, whereby the film can be completely cured. The preferred lower limit of the elastic modulus of the hardened resin composition for a columnar spacer of the present invention when it is hardened by light irradiation (and heating) at 25 〇c is 5%. 0·2 Gpa, the upper limit is 10 GPa. If the elastic modulus at 15% compression at 25 C is less than G2 GPa, it is too soft, and the columnar spacer formed using the curable resin composition for columnar spacers of the present invention may be difficult. Keep the cell gap. If at 25. When the elastic modulus at the time of 15% compression of the underarm is more than i〇Gpa, it is too hard, and when the substrate α is used as the substrate of the curable resin composition for columnar spacers of the present invention, the color filter layer may be pierced. And the phenomenon of elastic deformation of the filling knife necessary for the reply cannot be obtained. At 25. (The lower limit of the elastic coefficient of the lower 1 5% compression is 0.3 GPa, the upper limit is preferably 0.99 GPa, and the lower limit of the further enthalpy is 0.5 GPa, and the upper limit is further preferably 0.7 GPa. The hardened resin composition of the spacers is cured by 15% at 25 ° C by ^ gg r , , and heating, and the preferred lower limit of the recovery rate of the temple is 60%. . If the recovery rate is less than 60% at 15 °C at 30 °C, the columnar spacer recovery force between the substrates of the obtained liquid crystal display element may be too weak to obtain sufficient gravity failure. Inhibitory effect. Further, in the present specification, the 5% 5% shrinkage means that dust shrinkage is performed so that the deformation rate of the height of the columnar spacer becomes 15%. The method of producing the curable resin composition for a columnar spacer of the present invention is not particularly limited, and examples thereof include a method of mixing the above various resins or additives by a conventionally known method. In the case of a turtle, a method of producing a columnar spacer using a curable resin composition for a columnar spacer of the present invention will be described. When a columnar spacer is produced using the curable resin composition for a columnar spacer of the present invention, first, the columnar spacer of the present invention is applied onto a substrate with a curable resin composition to have a predetermined thickness. The film is formed. The coating method is not particularly limited, and examples thereof include a conventionally known coating method such as spin coating, slit & spin coating, slit coating, spray coating, dip coating, and bar coating. Then, on the formed film, active light rays such as ultraviolet rays are irradiated through the mask of the predetermined pattern formed. By this, the columnar spacer of the present invention is reacted with a photoreactive initiator in a curable resin composition in the light-irradiating portion to perform photocuring. The amount of the active light to be irradiated is not particularly limited, and is preferably 50 mj/cm 2 or more in the case of ultraviolet rays. If the amount of the active light is less than 50, the photohardening may be insufficient, and the pattern may be dissolved in the exposed portion when the alkali treatment is performed. Then, a photo-cured material after photohardening is developed to produce a columnar spacer of a predetermined pattern composed of a photocured material of a curable resin composition for a columnar spacer of the present invention. The curable resin composition for a columnar spacer of the present invention contains a 6-functional or higher (fluorenyl) urethane urethane compound having a carboxyl group in the molecule, and thus has good developability and a columnar spacer produced. It is excellent in abrasion resistance. In the case of the above-mentioned denatured polyfunctional (meth) acrylate compound, the curable resin composition for columnar spacers of the present invention has a high recovery property from compression deformation and forms a predetermined pattern. At the time of the formation, a residue is hardly formed, and a columnar spacer of a sharp pattern having excellent resolution can be formed. In the case where the curable resin composition for a columnar spacer of the present invention contains a compound having two or more blocked isocyanate groups, the patterned photocured material after the development treatment is further heated to thereby contain the test solution. The polymer compound is reacted with a compound having two or more blocked isocyanate groups. The condition of the above-mentioned heating may be appropriately determined in consideration of the size, the thickness, and the like of the above-mentioned pattern, and is preferably at least 20 (rc, 2 Å or more. The columnar shape formed of the curable resin composition for the columnar spacer of the present invention is used. The spacer is also one of the present invention. + The column spacer of the present invention has a height higher than that of the cell gap, and can be produced by a previously known method such as ODF method, whereby low-temperature foaming can be obtained. And effectively suppressing the generation of stains caused by gravity failure. 38 Liquid crystal display element of 200900463. The liquid crystal display element using the curable resin composition for columnar spacers of the present invention or the column spacer of the present invention is also According to the present invention, it is possible to provide a curable resin composition for a columnar spacer which can be developed to have excellent developability without being subjected to rubbing treatment in the manufacturing process of the liquid crystal display element. Further, a columnar spacer obtained by using the curable resin composition for the columnar spacer and a liquid crystal display element can be provided. [Embodiment] Hereinafter, the present invention will be described in more detail, but the present invention is not limited to the examples thereof. (Polyfunctional (meth)acrylic acid urethane compound having a carboxyl group (Sample A) Manufacture) In a 1 〇 reaction vessel equipped with a stirrer, thermometer, cooling tube and air inlet tube, add trimethylhexamethylene diisocyanate 84 〇 \ g (4 moO, dimethylglycolate 148 g) (l mol), polyhexanol g-polyol (weight average molecular weight 2000) 2000 g (1 mol), denatured oxyethylene bisphenol A (molecular weight 324) 324 g (1 mol), dipentaerythritol pentaacrylate 1048 g ( 2 mol ) and 5 g of dibutyltin dilaurate were reacted at 60 ° C for 5 hours under a nitrogen atmosphere to obtain a polyfunctional methacrylate urethane compound (sample) A) The acid value of sample A is 13 mgKOH/g, the weight average molecular weight is 4400, and the number of functional groups is 10. 39 200900463 ♦ (Reactive poly(meth) acrylate urethane compound (sample B~) I) Production) Except as shown in Table 1 The acid value, the weight of the bismuth molecular weight, and the functional number of the sample B to the sample B to j were prepared in the same manner as in the sample A except that the amount of each component was shown in Table 1. (Multifunctional having no carboxyl group (A) (Preparation of acrylamide phthalate compound) " "DPHA-40H" manufactured by Sakamoto Chemical Co., Ltd. (weight 岣 岣 7000, functional number 1 〇) - (Multifunctional (曱) Production of acrylate compound) Derivatized caprolactone pentaerythritol triacrylate (a compound formed by reacting molyl pentaerythritol with 8 mol of the reaction and further abbreviating reaction with 3 mol of acrylic acid) 2 parts by weight (16·8 mm〇l), succinic anhydride i_98 parts by weight of anhydride (16 8 legs 〇1), 0.01 parts by weight as a polymerization inhibitor, and propylene glycol monomethyl as a solvent Ethyl ether; vinegar (PGMEA) 2 (3 parts by weight of the addition to the flask, - surface blowing nitrogen gas - heating. Then, the succinic anhydride was completely dissolved, and 0.02 parts by weight of triethylamine as a catalyst was added, and then reacted in an oil bath under a nitrogen atmosphere for 6 hours, and then left to cool to room temperature to obtain a carboxylic acid addition. Denatured caprolactone pentaerythritol triacrylate (A_SA_TMM). (Preparation of a polymerizable polymer compound) In a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and an air tube, propylene glycol monomethyl ether acetate vinegar (pGMEA) 145 weight 40 200900463 was weighed and nitrogen was supplied. Mix one side and stir until warmed up. Then, 30 parts by weight of benzyl methacrylate (〇185 m〇1), bauxite 1 dilute acid 23.3 parts by weight (0.271 m〇1), and methyl methacrylate isophthalic acid vinegar 35 parts by weight (〇·161 And a monomer mixture composed of 17 parts by weight (〇〇〇8 mol) of a monomethyl acrylate vinegar (manufactured by Hitachi Chemical Co., Ltd., PA_513M) having a tricyclic smoldering skeleton, and a third butyl hydroperoxide ( Manufactured by Nippon Oil Co., Ltd., 7.6 parts by weight (45 parts by weight relative to the monomer mixture 100), which was added dropwise from the dropping funnel to the flask over 2 hours, and further at 120. Stirring was continued for 2 hours for aging. Then, the inside of the flask was replaced with air, and three (dimethyl) was added to the ripening in 15.6 parts by weight of glycidyl methacrylate (〇.11〇m〇1, 41% of carboxyl groups). 0.9 parts by weight of aminomethyl)phenol (DMP-30) and 1 part by weight of hydroquinone 145, and the reaction was continued for 6 hours at 1201, and the reaction was completed to obtain an alkali-soluble polymer compound. The obtained alkali-soluble polymer compound was subjected to the reaction. Sampling' Determination of molecular weight by gel permeation chromatography (GPC), weight average The amount of each component is 13,000'. The acid value of the solid component is 9 Å. (Examples 1 to 14 and Comparative Examples 1 to 3) (1) Preparation of a curable resin composition for a columnar spacer The ratio shown in 2 is used to prepare a curable resin composition for a ruthenium spacer. Further, each of Table 2 is abbreviated as follows. DPHA-40H: polyfunctional urethane amide (no carboxyl group, weight average) The molecular weight is 7,000 and the number of functional groups is 1〇) (manufactured by Nippon Kayaku Co., Ltd.) 41 200900463 1-907 : IRGACURE 907 (manufactured by Ciba Specialty Chemicals Co., Ltd.) 17B-60PX: Block isocyanate (as manufactured by Asahi Kasei Chemicals Co., Ltd.) EDM: Diethylene Alcohol methyl ethyl ether (manufactured by Toho Chemical Co., Ltd.) (2) A columnar spacer was formed on a 150 mm x 150 mm ITO glass substrate, and the resulting columnar spacer was cured by spin coating. The film was dried by drying at 8 ° C for 2 minutes. On the obtained coating film, after irradiating ultraviolet rays of 150 mj/cm 2 through a 6-square dot image mask, 丨.丨1% of τμαη (hydrogen) The oxidized tetramethyl sulphate solution is developed for 8 sec seconds and then purified with pure water. After 3 seconds, a pattern of columnar spacers was formed, and thereafter, a columnar spacer was formed by baking for 2 minutes at 2301. The columnar spacer obtained had a bottom area of 100 μm and a height of 3 μΓ. <Evaluation> The curable resin composition for columnar spacers obtained in each of Examples 1 to 14 and Comparative Examples 1 to 3 and the columnar spacer were evaluated as follows. The results are shown in Table 2. Further, in Comparative Example 2, since the pattern could not be formed due to poor developability, evaluation of adhesiveness and abrasion resistance was not performed. (Evaluation of white turbidity of developing solution) Grab the developing solution after development, and perform visual observation of white turbidity and dynamic particle luminometer (manufactured by Internati〇nal Business Co., Ltd., NICOMP.3 80ZLS). The criteria are evaluated. 42 200900463 〇: Visually evaluated for transparency, average particle diameter is less than ι〇〇μηι △: visual evaluation «white turbidity, average particle diameter less than 5〇〇μηι X: visually evaluated as white turbidity, average particle diameter is 500 μm or more (Adhesion evaluation) Whether or not the pattern disappeared by an optical microscope was used, and evaluation was performed by the following criteria. 〇: No disappearance of the spacer pattern was observed. X: The spacer pattern disappeared. (Evaluation of developability) The presence or absence of development residuals was observed by light exposure, and evaluated by the following criteria. 〇: a state in which the spacer pattern is good and there is no development residue. X. The development residue can be confirmed, or the state in which the development remains (the evaluation of the abrasion resistance) is provided. The friction treatment machine (Kawaguchi) provided with a cotton alignment cloth (rubbing ci〇th) Manufactured by Lake Precision Co., sp_360), with a roller speed of 780 rpm (diameter 80 mm 0 ), a platform speed of 60 mm/sec, and a press-in amount of 0.7 mm, the substrate on which the column spacers are formed, with the alignment pattern The rubbing treatment was performed once in the direction along the pattern, and the substrate was subjected to surface-to-sharp observation by SEM (6 〇〇〇), and evaluated by the following criteria. 〇: No surface scraping at all. X : Confirm scraping. 43

200900463 〔<ΝΪ 比較例3 § *r> yr\ v-» fS 〇 〇 〇 X 比較例2 Ό v~> *n (N X 1 X I 比較例1 1 tn 1 255 〇 〇 〇 X 實施例14 〇 in 255 〇 〇 〇 〇 實施例13 g 〇 w-j 255 〇 〇 〇 〇 實施例12 〇 g W-i 255 〇 〇 〇 〇 實施例11 § 255 〇 〇 〇 〇 實施例10 § i- 255 〇 〇 〇 〇 實施例9 § VI ! 255 〇 〇 〇 〇 實施例8 〇 〇 */*» 255 〇 Ο 〇 〇 實施例7 〇 >T) m 255 〇 0 〇 〇 實施例6 〇 V} IT) V) <N 〇 〇 〇 〇 實施例5 g 〇 yr\ r^r 〇 〇 〇 Ο 實施例4 § u-> 255 o 〇 〇 〇 實施例3 § <n iN 〇 〇 〇 〇 實施例2 S 1 1 255 〇 〇 〇 〇 實施例1 § 255 〇 〇 〇 〇 樣品A 樣品B 樣品C 樣品D 樣品E 樣品F 樣品G 樣品Η 樣品I DPHA-40H 審Q 1 ί 恕鹅 效 Θ Μ ^ : 1 A-SA-TMM σ\ 17B-60PX EDM 顯影液白濁性 密合性 顯影性 对摩擦性 1 f 兩i ®: i 韶&- | t i α谘 Jpa 袭 光聚合起始劑 嵌段異氰酸酯 溶劑 評價 200900463 上之可剎用妯 根據本發明,可提供一種柱狀間隔物用硬化性樹脂組 成物S可形成具有優異之顯影性,且並不會由於液晶顯 不元件之製造過程中的摩擦處理而被刮削之柱狀間隔物。 又’可提供一種使用該柱狀間隔物用硬化性樹脂組成物而 成之枝狀間隔物以及液晶顯示元件。 [圖式簡單說明】 無 【主要元件符號說明】 無 46200900463 [<ΝΪComparative Example 3 § *r> yr\ v-» fS 〇〇〇X Comparative Example 2 Ό v~> *n (NX 1 XI Comparative Example 1 1 tn 1 255 〇〇〇X Example 14 〇in 255 〇〇〇〇Example 13 g 〇wj 255 〇〇〇〇Example 12 〇g Wi 255 〇〇〇〇Example 11 § 255 〇〇〇〇Example 10 § i- 255 〇〇〇〇Implementation Example 9 § VI ! 255 〇〇〇〇 Example 8 〇〇*/*» 255 〇Ο 〇〇 Example 7 〇>T) m 255 〇0 〇〇Example 6 〇V} IT) V) < N 〇〇〇〇 Example 5 g 〇yr\ r^r 实施 Example 4 § u-> 255 o 〇〇〇 Example 3 § <n iN 〇〇〇〇 Example 2 S 1 1 255 〇〇〇〇Example 1 § 255 〇〇〇〇 Sample A Sample B Sample C Sample D Sample E Sample F Sample G Sample Η Sample I DPHA-40H验Q 1 ί 鹅 鹅 Μ ^ : 1 A-SA-TMM σ\ 17B-60PX EDM developer white turbidity adhesion developability to friction 1 f two i ®: i 韶&- | ti α Jpa Photopolymerization Initiator Block Isocyanate Solvent Evaluation 200900463 The use of the curable resin composition S for column spacers can be formed to have excellent developability without being A columnar spacer that is scraped by rubbing treatment in the manufacturing process of the liquid crystal display element. Further, a dendritic spacer and a liquid crystal display element using the curable resin composition for a columnar spacer can be provided. [Simple description of the diagram] None [Key component symbol description] None 46

Claims (1)

200900463 十、申請專利範圍: 1 ·種柱狀間隔物用硬化性樹脂組成物,其特徵在於: 含有於分子内具有羧基之6官能以上之(甲基)丙烯酸胺基 甲酸酯化合物、以及光反應起始劑。 2. 如申凊專利範圍第1項之柱狀間隔物用硬化性樹脂 組成物’其進一步含有鹼溶性高分子化合物。 3. 如申凊專利範圍第1項或第2項之柱狀間隔物用硬 化性樹脂組成物,其進一步含有選自由變性己内酯、變性 氧化乙烯以及變性氧化丙浠所構成群中至少一種之變性多 官能(甲基)丙烯酸酯化合物。 4. 如申請專利範圍第丄項、帛2項或第3項之柱狀間 隔物用硬化性樹脂組成物,其進一步含有具有2個以上嵌 段異氰酸酯基之化合物。 ^ ^柱狀間隔物’其特徵在於:使用申請專利範圍 第1項帛2項、第3項或第4項之柱狀間隔物用硬化性 樹脂組成物而構成。 々6.種液晶顯示元件,其特徵在於:使用申請專利範 '貞第2項、第3項或第4項之柱狀間隔物用硬化 性树月曰組成物,或去φ 士主查# 、 /者申叫專利乾圍第5項之柱狀間隔物而 構成。 十一、圖式: 益 47200900463 X. Patent application scope: 1) A curable resin composition for a columnar spacer, characterized by containing a 6-functional or higher (meth)acrylic acid urethane compound having a carboxyl group in a molecule, and light Reaction initiator. 2. The curable resin composition for columnar spacers according to the first aspect of the invention is further characterized in that it further contains an alkali-soluble polymer compound. 3. The curable resin composition for columnar spacers according to claim 1 or 2, further comprising at least one selected from the group consisting of denatured caprolactone, denatured ethylene oxide, and denatured oxidized propylene oxide. Denatured polyfunctional (meth) acrylate compounds. 4. The curable resin composition for columnar spacers of claim 2, 2 or 3, further comprising a compound having two or more blocked isocyanate groups. ^ Column spacers are characterized in that the columnar spacers of the first, second, third or fourth aspects of the application are made of a curable resin composition. 々6. A liquid crystal display element characterized in that the composition of the columnar spacer of the second, third or fourth aspect of the patent application is used for the composition of the hardening tree, or to the φ 士主查# / / The patent is called the column spacer of the fifth paragraph of the patent. XI. Schema: Benefit 47
TW97117074A 2007-05-11 2008-05-09 Curable resin composition for column spacer, column spacer, and liquid-crystal display element TW200900463A (en)

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JP5319132B2 (en) * 2008-02-06 2013-10-16 太陽ホールディングス株式会社 Photocurable / thermosetting resin composition and cured product thereof
JP5328175B2 (en) * 2008-02-25 2013-10-30 富士フイルム株式会社 Photosensitive resin composition, photospacer and method for producing the same, display device substrate and display device
JP5395552B2 (en) * 2009-07-28 2014-01-22 京セラケミカル株式会社 Photosensitive thermosetting resin composition and flexible printed wiring board
JP5663868B2 (en) * 2009-12-11 2015-02-04 三菱エンジニアリングプラスチックス株式会社 Laminated body
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JP5668417B2 (en) * 2010-11-05 2015-02-12 三菱化学株式会社 Active energy ray-curable composition
JP2012203355A (en) * 2011-03-28 2012-10-22 Fujifilm Corp Photosensitive composition, photosensitive laminate, permanent pattern forming method, and printed circuit board
JP5892799B2 (en) * 2012-02-03 2016-03-23 新中村化学工業株式会社 Urethane (meth) acrylate that forms a cured product having elongation and excellent scratch resistance, and a photocurable resin composition containing the same
TW201522533A (en) * 2013-11-15 2015-06-16 Fujifilm Corp Curable composition, method for producing cured film, cured film and display device

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JP3467488B2 (en) * 2001-03-31 2003-11-17 アダムス テクノロジー カンパニー リミテッド Resist composition for column spacer of liquid crystal display device
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