TW200844267A - Sn-plated copper alloy material for printed board terminal - Google Patents

Sn-plated copper alloy material for printed board terminal Download PDF

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Publication number
TW200844267A
TW200844267A TW097109796A TW97109796A TW200844267A TW 200844267 A TW200844267 A TW 200844267A TW 097109796 A TW097109796 A TW 097109796A TW 97109796 A TW97109796 A TW 97109796A TW 200844267 A TW200844267 A TW 200844267A
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solder
copper alloy
mass
substrate
alloy material
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TW097109796A
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Chinese (zh)
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TWI374950B (en
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Takaaki Hatano
Kenji Koike
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Nippon Mining Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/04Alloys based on copper with zinc as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3447Lead-in-hole components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10613Details of electrical connections of non-printed components, e.g. special leads
    • H05K2201/10742Details of leads
    • H05K2201/10886Other details
    • H05K2201/10909Materials of terminal, e.g. of leads or electrodes of components

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Non-Insulated Conductors (AREA)
  • Conductive Materials (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

An Sn-plated copper alloy material comprising, by mass, 2 to 12% Zn, 0.1 to 1.0% Sn, optionally 0.005 to 0.5%, in total, at least one member selected from among Ni, Mg, Fe, P, Mn, Co, Be, Ti, Cr, Zr, Al and Ag, and the balance copper and unavoidable impurities. The Sn-plated copper alloy material has a thermal conductivity of 150 to 260 W/(m K) and a micro Vickers hardness of 120 to 215 and has its surface covered with a pure Sn phase of 0.1 to 2.0 μm average thickness. Further, there is disclosed a printed board terminal being a pin-shaped member of 0.2 to 1.0 mm in thickness (t) of its part mounted on the board and 0.9t to 2.0tmm in width (w) of its part mounted on the board obtained by press working of the above alloy material so that the base material of the copper alloy material is exposed at a press fractured surface, thereby excelling in solder mountability. Thus, there is provided an Sn-plated copper alloy material that even when plating is performed prior to press working, excellent mountability is attained, and provided a printed board terminal obtained by working of the material.

Description

200844267 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種可較佳地作為插入印刷基板之貫通 孔(through hole)内且經由熔流(dip_fl〇w )步驟而由無鉛 焊料所構裝之印刷基板端子材料的鍍錫之銅合金材、以及 由該鍍錫之銅合金材製成之印刷基板端子。 【先前技術】200844267 IX. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a lead-through solder that can be preferably inserted into a through hole of a printed substrate and passed through a melt-flow process. A tinned copper alloy material of the printed circuit board terminal material and a printed circuit board terminal made of the tinned copper alloy material. [Prior Art]

汽車之電子控制單元中内設有印刷基板’且印刷基板 安裝有下壓端子(以下稱作基板端子)(參照圖。 族下壓端子之一端透過具有下壓端子之線束(wh harness )而連接於外部之電子機器等。 —印刷基板端子,插入至印刷基板之貫通孔内,且藉由 貝知助¥劑(flux )塗佈、預熱、熔焊(❿胃)、 冷卻、清洗之步驟而焊接構裝於印刷基板。 先别,作為基板端子用之材料,係使用黃銅(C2600 j者C2680)之鑛錫條。亦即,對寬度為則〜_ _之 ^銅寬:畐材以連續生產線進行鑛錫,且分割成較細的條。 I ; 藉由連、、男加壓而衝壓成接腳,將接腳插入樹脂之外 ::h〇Using)而作為連接器。然而,該步驟中所製造之基 板知子的加壓斷裂面上並未附著鍍錫。 日士你田年纟自地球%保之觀點出發’將端子構裝於基板 日寸使用之嬋料,自杏义A printed circuit board is provided in the electronic control unit of the automobile, and a push-down terminal (hereinafter referred to as a substrate terminal) is mounted on the printed circuit board (refer to the figure. One end of the family pressing terminal is connected through a wh harness having a pressing terminal. External electronic equipment, etc. - Printed substrate terminals, inserted into the through holes of the printed circuit board, and coated, preheated, welded (stomached), cooled, and cleaned by Flux The solder is mounted on the printed circuit board. First, as the material for the substrate terminal, a tin bar of brass (C2600 j C2680) is used. That is, the width is _ _ _ ^ copper width: coffin The ore is processed in a continuous production line and divided into thinner strips. I; is punched into a pin by a joint, a male pressurization, and the pin is inserted outside the resin: h〇Using) as a connector. However, tin plating was not adhered to the press fracture surface of the substrate of the substrate produced in this step. Nisshin, you are in the field of the earth, and you have built the terminal on the substrate.

Cu ; ^先則之Sn_Pb焊料轉變為Sn-Ag系、Sn- ,θ S 系Sn_Bl系等無鉛焊料。就先前之Sn-Pb 奸料而言,gp插Η丄广、 疋0堅斷裂面上未附著有鍍錫之黃銅端 5 200844267 : 子,亦可順利地進行焊接構裝。然而,因Sn_Pb焊料被益 : 料料取代,故而,會經常發生基底為黃鋼之加mm 排斥谭料而使焊料無法沾附於貫通孔内之構裝問題。 纟原因在於,自端子受塵後直至構裝於基板為止之期 • 間内,基底為黃銅之加壓斷裂面受氧化而於斷裂面表面生 成有富含zn之氧化膜。一般而言,所生成之富含zn之氧 化膜較穩定,故而即便浸潰於助焊劑中溶解後仍會殘留, φ 與焊料之潤濕性較差從而對焊料具有排斥性。因先前之 )Sn Pb知料具有共晶成分,故而,對於流焊溫度(約) 而言,熔點為187°C算極低。因此,即便存在富含Zn之氧 化朕,若使用Sn-Pb焊料,貫通孔内亦會良好地沾附焊料。 另一方面’因無鉛焊料之熔點為22(rc左右較高,故而, 於富含Zn之氧化膜上被排斥,而無法充分地沾附(參照 非專利文獻1 )。 作為上述構裝不良之對策,係採用不對於壓製加工前 φ 之頁銅覓幅材’而是對於壓製加工之後之接腳進行鑛錫之 〇 步驟之方式(以下,稱作後鍍敷步驟)。亦即,係將黃銅 寬幅材分割為細條之後,藉由連續加壓而衝壓成接腳,之 後’以連續生產線實施鍍錫之步驟。此時,因加壓斷裂面 被鑛錫覆蓋’故而,可避免富含Zn之氧化膜排斥焊料之 問題。然而,因對細條實施鍍錫,故而,與對寬幅材進行 鍍敷之先前之步驟(以下,稱作前鍍敷步驟)相比,鍍敷 之生產效率極差,且其製造成本極高。 作為基板端子相關之上述以外的動向而言,正趨於端 6 200844267 子剖面積之小型化與高㈣構裝。結果,#有電流流動時 之焦耳熱所引起之端子溫度的上升會增加。作為溫度上升 之對策,㈣的是使用黄欠熱性亦即料率較高之材料。 以上,係以汽車之電子控制單元之印刷基板為例進行 了說明,但對於此外之印刷基板而言亦相同。 [非專利文獻1]末次蕙一郎:細說無鉛焊接技術,工業 調查會(2004 ) pl52 ^ 【發明内容】 ) 本發明之課題在於,提供一種使用無鉛焊料時之構裝 性優異的印刷基板端子及其原料。進一步具體而言,係^ 於提供一種於前鍍敷步驟中即使以低成本製造亦可獲得充 刀之構I性、且同時具備良好之焊料潤濕性、電氣特性、 強度以及弓曲加工性的鍍錫之銅合金材,以及對該材料加 工而得之具有良好之構裝性的印刷基板端子。 本發明者等人,藉由減少黃銅中之Zn之量,且添加 • 少量之Sn而調整製造條件,進而實施適當條件之鍍錫, '〕目而開發出同時具備良好之焊料潤濕性、冑氣特性、強度 以及%、曲加工性之材料,其可較佳地用作基板端子材料。 亦即’本發明提供下述銅合金材。 (1 ) 一種印刷基板端子用鍍錫之銅合金材,其係含有 2〜12質量%之Zn以及(^〜1〇質量%之Sn、而其餘部分 為銅以及不可避免之雜質所構成,其特徵在於:具有15〇 〜26〇 W/(m’K)之熱導率以及12〇〜215之微維克氏硬度 (micro v1Cker’s hardness),且表面由平均厚度為(^〜二』 7 200844267 μιη之純Sn相所覆蓋著。 (2) -種印刷基板端子用鑛錫之銅合金材 2〜12質量%之〜以及―質量…,含;:叶為 0.005 〜0.5 質量 %iNi、Mg、Fe、p、Mn、c〇、B^^、 ::、Ai以及Α§中之—種以上,而其餘部分為銅以及 =避免之雜質所構成’其特徵在於:具有Η。〜26〇 :·Κ)之熱導率…20〜215之微維克氏硬度,且表面 由平均厚度為0.1〜2.0 μηι之純Sn相所覆蓋著。 ⑴-種印刷基板端子,其特徵在於:係由上述⑴ 〜(2)之鍍錫銅合金條壓製加工而成、且於加壓斷裂面 露出銅合金母材之接腳狀構㈣;基板構裝部之厚度(^) 為0.2〜基板構裝部之寬度(w)為〇 (w/t = 〇·9〜2.0 ) 〇 · ⑷如上述〇)所述之印刷基板端子,其暴露於相 對濕f85%、溫度阶之環境氣氛下24小時之後,以2_ 之誠浸潰於25(TC之無錯焊料内1G秒,此時加壓斷裂面 上附著有焊料之部分的面積相對於浸潰於焊料中之部分的 面積而言超過105%。 刀 精此,可以低成本提供一種可較佳地作為插入印刷基 板之貫通孔内且經過流動步驟而藉由無錯焊料構裝之印二 配線基板端子之材料的鍍錫之銅合金材,以及由該材料製 造之構裝性優異的印刷基板端子。 /衣 【實施方式】 (1)合金之特性 8 200844267 - 本發明之銅合金之熱導率為150〜 260 w/(mK)。若熱 ..導率超過260 W/(m.K),則當對基板進行焊料構裝時,焊 料經由端子所散發之熱量會增大,而使焊料無法充分地沾 附於貫通孔。另一方面,若熱導率未達15〇 w/(mK),則 鈿子上有電流流動時之溫度上升幅度變大,而無法使用作 為中、大電流用連接器。 本發明之銅合金之微維克氏硬度(以下,稱作硬度) φ 為n〇〜215。當硬度未達120時,則作為基板端子之強度 ) 胃不足,且會產生當插拔母連接器時端子變形等問題。若 硬度超過21 5,則彎曲加工時會產生斷裂。 (2)合金成分 本發明之銅合金,係以Zll及Sll作為基本成分,藉由 兩種元素之作用而發揮特性。Zri之濃度範圍為2〜12質量 %,Sri之濃度範圍為〇」〜1〇質量0/〇。 若Zn未達2%,則硬度會不足,且根據Sn之濃度, φ 熱導率會超過260 W/(m.K)。若Zn超過12%,則氧化膜之 〕成分中會富集Zn ’焊料無法填充於貫通孔内導致構裝性較 差,而且熱導率會未達15〇 W/(m.K)。Cu; ^ First, the Sn_Pb solder is converted into a lead-free solder such as Sn-Ag system, Sn-, θ S system Sn_Bl system. In the case of the previous Sn-Pb spoilage, the gp-inserted, 疋0-hard fracture surface does not have a tinned brass end 5 200844267 : sub-, can also be successfully welded. However, since the Sn_Pb solder is benefited by the material: the material is often replaced, and the substrate is often made of yellow steel and mm is repelled to prevent the solder from adhering to the through hole. The reason is that the pressure fracture surface of the base is oxidized from the surface after the terminal is subjected to dust until the substrate is mounted on the substrate, and an oxide film rich in zn is formed on the surface of the fracture surface. In general, the resulting zn-rich oxide film is relatively stable, so that it remains after being dissolved in the flux, and the wettability of φ and the solder is poor to be repellent to the solder. Since the Sn Pb material has a eutectic composition, the melting point of 187 ° C is extremely low for the soldering temperature (about). Therefore, even if Zn-rich cerium oxide is present, if Sn-Pb solder is used, the solder is well adhered in the through hole. On the other hand, the melting point of the lead-free solder is 22 (the rc is relatively high, so it is repelled on the Zn-rich oxide film and cannot be sufficiently adhered (see Non-Patent Document 1). The countermeasure is to use a method in which the ruthenium sheet of the φ before the press processing is performed, but the step of performing the tin ore on the pin after the press processing (hereinafter, referred to as a post-plating step). After the brass wide web is divided into thin strips, it is stamped into pins by continuous pressurization, and then the step of tin plating is performed on a continuous production line. At this time, since the pressurized fracture surface is covered with mineral tin, it is possible to avoid enrichment. The Zn-containing oxide film repels the problem of the solder. However, since the thin strip is tin-plated, the plating is produced in comparison with the previous step of plating the wide web (hereinafter, referred to as the front plating step). The efficiency is extremely poor, and the manufacturing cost is extremely high. As the direction other than the above-mentioned substrate terminal, the miniaturization and high (four) configuration of the end surface area of the end of 200844 are approaching. As a result, #joules with current flow Caused by heat The increase in the temperature of the terminal is increased. As a countermeasure against temperature rise, (4) is a material that uses yellow heat, that is, a material with a high material rate. The above description is based on the printed circuit board of the electronic control unit of the automobile, but The same applies to the printed circuit board. [Non-Patent Document 1] The last time, Ichiro Ichiro: The lead-free soldering technique, the Industrial Survey (2004) pl52 ^ [Invention] The object of the present invention is to provide a structure using lead-free solder. Printed substrate terminals and their raw materials with excellent mountability. More specifically, it is possible to provide a structure of a filling knife even at a low cost in the pre-plating step, and at the same time, having good solder wettability, electrical properties, strength, and bowing workability. A tin-plated copper alloy material, and a printed circuit board terminal having a good mountability for processing the material. The inventors of the present invention have developed a good solder wettability by reducing the amount of Zn in the brass, adding a small amount of Sn, adjusting the manufacturing conditions, and performing tin plating under appropriate conditions. A material having a hermetic property, strength, and %, and a workability, which can be preferably used as a substrate terminal material. That is, the present invention provides the following copper alloy material. (1) A tin-plated copper alloy material for a printed circuit board terminal, which comprises 2 to 12% by mass of Zn and (^ to 1% by mass of Sn, and the balance being copper and unavoidable impurities, It is characterized by a thermal conductivity of 15 〇 to 26 〇 W/(m'K) and a micro v1 Cker's hardness of 12 〇 to 215, and the surface has an average thickness of (^~2) 7 200844267 The pure Sn phase of μιη is covered by (2) - 2 to 12% by mass of the copper alloy material of the tin-plated terminal for the printed circuit board, and the "mass..."; the leaf is 0.005 to 0.5 mass% iNi, Mg, Fe, p, Mn, c〇, B^^, ::, Ai, and Α§ are all of the above, while the rest are composed of copper and = impurities avoided. 'Characteristics are: Η.~26〇: · Κ) thermal conductivity ... 20 to 215 micro Vickers hardness, and the surface is covered by a pure Sn phase with an average thickness of 0.1 ~ 2.0 μηι. (1) - a printed substrate terminal, characterized by: (1) The tin-plated copper alloy strip of ~(2) is pressed and processed, and the pin-shaped structure of the copper alloy base material is exposed on the pressure fracture surface (4); The thickness (^) of the substrate assembly portion is 0.2 to the width (w) of the substrate assembly portion is 〇 (w / t = 〇 · 9 to 2.0) 〇 · (4) The printed circuit board terminal as described in the above) is exposed After 24 hours in an ambient atmosphere with a relative humidity of f85% and temperature, it was immersed in 25% of the TC-free solder for 1G seconds, at which time the area of the portion on which the solder was adhered on the pressure fracture surface was relative to The area of the portion immersed in the solder exceeds 105%. The knife can provide a low-cost printing which can be preferably inserted into the through hole of the printed substrate and passed through the flow step by the error-free solder. A tin-plated copper alloy material of a material of the second wiring board terminal, and a printed circuit board terminal excellent in the structure of the material manufactured by the material. / [Embodiment] (1) Characteristics of the alloy 8 200844267 - Copper alloy of the present invention The thermal conductivity is 150 to 260 w/(mK). If the thermal conductivity exceeds 260 W/(mK), the amount of heat dissipated by the solder through the terminals increases when the substrate is solder-mounted. The solder does not adhere enough to the through hole. On the other hand, if the thermal conductivity is less than 15〇w/(mK When the current flows on the dice, the temperature rise is large, and the connector for medium and large current cannot be used. The micro Vickers hardness (hereinafter, referred to as hardness) of the copper alloy of the present invention is φ. 〇~215. When the hardness is less than 120, the strength of the substrate terminal is insufficient, and there is a problem that the terminal is deformed when the female connector is inserted or removed. If the hardness exceeds 21 5, cracking occurs during bending. (2) Alloy component The copper alloy of the present invention has Zll and S11 as essential components and exhibits characteristics by the action of two elements. The concentration of Zri ranges from 2 to 12% by mass, and the concentration range of Sri is 〇"~1" mass 0/〇. If Zn is less than 2%, the hardness will be insufficient, and depending on the concentration of Sn, the thermal conductivity of φ will exceed 260 W/(m.K). When Zn exceeds 12%, the Zn'-rich solder is not filled in the through-holes of the oxide film, resulting in poor mountability and a thermal conductivity of less than 15 〇 W/(m.K).

Sn具有促進壓延時之加工硬化之作用。若未達 0.1%,則硬度會不足,且根據Zn濃度,熱導率會超過26〇 W/(m’K)。若Sn超過ΐ·〇%,則熱導率會未達15〇 。 本發明合金中,為了改善合金之強度、耐熱性、耐應 力缓和性等,可添加合計為0.005〜0.5質量❻/❶之Ni、Mg、 Fe、P、Μη、Co、Be、Ti、Cr、Zr、A1 以及 Ag 中之一種 9 200844267 以上。但是,因追加合金元素會導致熱導率下降、彎曲加 工性下降等,故而對此須要考慮周到。 (3)合金之鍍錫 、;本發明之銅合金,於加壓衝壓之前實施鍍錫。通 常而言,該鍍錫係按照以下步驟製造,gp,於連續鑛敷生 f線上’經脫脂以及酸洗(piekle)之後,藉由電鐘法而形成 =敷層’繼而’藉由電鑛法而形成鑛錫層,最後實施 回知處理而使鍍錫層熔化。 作為基底鍍敷,-般而言係Cu基底職 :::Γ高要求之用途中有時可實…底錄敷,: 對耐錢有更高要求之用途中有時可實施Cu/Ni雙声 :又敷:此處’所謂Cu/Ni雙層基底鑛敷係指,按照N::底 又文、Cu基底鍍敷、鍍錫之順序進行電鏡之後進行回焊處 ,回焊之後的鍍敷皮膜層之構成係自表面起為^ 相、Cu-Sn相、Ni相以及母材。 關於該回焊技術之詳細内容,於曰本專利特開平6 ==號公報、特開·3_293187號公報、特開2qq4_6_ 5虎么報等中有所揭示。 右鍍錫之厚度過薄,則鍍敷部位之焊料潤㈣會下 二:法/占附於貫通孔。另-方面,若鍍錫之厚度過厚, 戸=㈣。本發明中適當之鑛錫之厚度係純^相之平均 厚度為0.1〜2.0 μηι。 =,無論基底鍍敷之種類(亦包括不進行基底㈣ …以及有無回焊處理,只要將純Sn相之平均厚度 200844267 周正為〇· 1〜2 ·〇 μηι,便可構成本發明,且發揮其效 (4 )端子之形狀 、 由本發明之鍍錫之銅合金材壓製加工 、1可列舉圖1 (a)所示之接腳狀構件。該端子之用 於基板構裝之部分(基板構裝部)的厚度(mm))設 *Sn has the effect of promoting work hardening of the pressurization. If it is less than 0.1%, the hardness will be insufficient, and depending on the Zn concentration, the thermal conductivity will exceed 26 〇 W / (m'K). If Sn exceeds ΐ·〇%, the thermal conductivity will be less than 15〇. In the alloy of the present invention, in order to improve the strength, heat resistance, stress relaxation resistance, and the like of the alloy, Ni, Mg, Fe, P, Μ, Co, Be, Ti, Cr may be added in a total amount of 0.005 to 0.5 mass ❻/❶. One of Zr, A1 and Ag 9 200844267 and above. However, since the addition of alloying elements causes a decrease in thermal conductivity and a decrease in bending workability, it is necessary to consider this. (3) Tin plating of an alloy; the copper alloy of the present invention is tin-plated prior to press stamping. In general, the tin plating is produced according to the following steps, gp, after degreasing and pickling on the continuous mineral f-line, by the electric clock method to form = coating layer and then by electro-mine The method forms a tin-plated layer, and finally performs a process of knowing to melt the tin-plated layer. As a base plating, it is generally a Cu-based substrate::: It is sometimes used in applications where high demand is required... The bottom is applied, and Cu/Ni double can be implemented in applications where there is a higher demand for money resistance. Acoustic: Reapply: Here, the so-called Cu/Ni double-layer base mineral deposit refers to the reflowing after electron microscopy in the order of N:: bottom, Cu substrate plating, tin plating, and plating after reflow. The composition of the coating layer is a phase, a Cu-Sn phase, a Ni phase, and a base material from the surface. The details of the reflow technique are disclosed in Japanese Patent Laid-Open No. Hei-6 ==, U.S. Patent No. 3,293,187, and No. 2qq4_6_5. If the thickness of the right tin plating is too thin, the soldering of the plating part (4) will be the next: the method / is attached to the through hole. On the other hand, if the thickness of tin plating is too thick, 戸 = (4). The thickness of the appropriate tin in the present invention is an average thickness of 0.1 to 2.0 μηι. =, regardless of the type of substrate plating (including the absence of substrate (4) ... and the presence or absence of reflow treatment, as long as the average thickness of pure Sn phase 200844267 is positive 〇 1~2 · 〇μηι, can constitute the present invention, and play The shape of the terminal (4) is pressed by the tin-plated copper alloy material of the present invention, and the pin-shaped member shown in Fig. 1(a) is exemplified. The portion of the terminal for the substrate assembly (substrate structure) Thickness (mm) of the mounting part) *

為Y·2〜i.O mm。當t未達0·2 mm時,則端子上有電流流 動時的溫度上升幅度變大,而無法使用作為中、大電流用 連接器。而且,當插拔母連接器時等端子會變形。超 2 !·〇 mm時,則加壓斷裂面(銅合金母材露出)之面積 會變得過大,使焊料無法沾附於貫通孔。 構裝部之寬度(w (mm))設為〇·9 t〜2〇 t。當w未 達〇·9 t時,未附著鍍錫之部分(加壓斷裂面)之面^,相 1於附著有鍍錫之部分(壓延面)的面積會變得過大,使 焊料無法沾附於貫通孔。 當w超過2.0 t時,未附著有鍍錫之部分(加壓斷裂 面i之面積相對於附著有鍍錫之部分(壓延面)的面積因 2吊地小,故而,即使是黃銅之前鍍敷材焊料亦會沾附於 貝通孔。此情況即不需要本發明之構成以及效果。 (5 )端子之焊料潤濕性 使焊料穩定且良好地沾附於貫通孔的條件,係將下述 經過熟化(aging)處理之端子,以2 mm之深度浸潰於無 釔焊料心中10秒’此時加壓斷裂面上之焊料潤濕面積率 (s )超過105%,較好的是為i 1〇%以上。 S ( %)=(附著有焊料之部分之面積)/ (浸潰於焊 200844267 料中之部分之面積)Xi〇〇 s超過100%係指 方。焊料潤濕性剩M y、、㈣4位位於焊料浸潰線之更上 ^ 之條件如下所示。 .熟化:暴露於相對 小時 Μ度85 c之環境下24It is Y·2~i.O mm. When t is less than 0·2 mm, the temperature rise of the current flowing through the terminal becomes large, and the connector for medium and large current cannot be used. Moreover, the terminals are deformed when the female connector is inserted or removed. When the temperature exceeds 2 !·〇 mm, the area of the pressure fracture surface (the copper alloy base material is exposed) becomes too large, so that the solder cannot adhere to the through hole. The width (w (mm)) of the configuration portion is set to 〇·9 t to 2 〇 t. When w is less than 〇·9 t, the surface of the tinned portion (pressurized fracture surface) is not attached, and the area of the phase 1 where the tin plating is applied (rolled surface) becomes too large, so that the solder is not wet. Attached to the through hole. When w exceeds 2.0 t, the tin-plated portion is not attached (the area of the pressurized fracture surface i is smaller than the area to which the tin-plated portion (rolled surface) is attached, so even if it is plated before brass The solder of the dressing is also adhered to the beacon hole. In this case, the constitution and effect of the present invention are not required. (5) The solder wettability of the terminal stabilizes the solder and adheres well to the through hole. The terminal subjected to aging treatment is immersed in the core of the flawless solder at a depth of 2 mm for 10 seconds. At this time, the solder wet area ratio (s) on the pressure fracture surface exceeds 105%, preferably i 1〇% or more S ( %) = (area of the part to which the solder is attached) / (area of the part which is immersed in the solder 200844267) Xi 〇〇s exceeds 100% means the solder wettability The conditions for the M y, (4) 4 positions on the solder dipping line are as follows: . Maturing: Exposure to an environment with a relative hourly humidity of 85 c 24

•助焊劑 ULF-300R 田村製作所股份有限公司製造 商品名 #• Flux ULF-300R Manufactured by Tamura Manufacturing Co., Ltd. Product Name #

mass%Ag~ 〇·5 mass°/DCii (千住金 •焊料組成·· Sn〜3e() 屬工業股份有限公司製进 •焊料溫度:25〇。(3 .焊料浸潰深度: •焊料浸潰時間: 若銅合金之特性 上述之本發明之條件 [實施例] 2 mm 10秒 、成分及鍍錫條件以及端子形狀滿足 ’則S會超過1〇5%。 使用兩頻感應爐,於内徑為60 mm、深度為200 mm 之石墨坩堝中溶解2 kg之電氣銅。將溶浴表面以木炭片覆 盖之後’添加Zn以及Sn。將溶浴溫度調整為1200°C之後, & /合’合〉主入至金屬模具中,製成寬度為60 mm、厚度為30 mm之每錠。將鑄錠以85〇它加熱3小時,且實施熱壓延直 至厚度達到8 mm為止。對於熱壓延板表面之氧化垢利用 研磨機進行研磨之後,依序進行冷壓延、再結晶退火、冷 壓延之步驟,而使厚度達到t ( mm )。 再結晶退火之過程中,將材料置於大氣中以400°C加 12 200844267 熱30分鐘。而且,為了除去因退火而生成之氧化膜,先 使用10質量%硫酸一!質量%過氧化氫溶液進行酸洗,然 後使用# 1200研磨紙進行機械研磨。最終之冷屡延之過程 中,改變壓延加工度(R)。此處,R由下式定義。 R (%) = (tG —t) /tGxio〇 (t。:壓延前之厚度,t :壓 延後之厚度) 繼而,對於該銅合金材實施多種厚度之鍍錫Mass%Ag~ 〇·5 mass°/DCii (Thousands of gold • Solder composition·· Sn~3e() is manufactured by Industrial Co., Ltd. • Solder temperature: 25 〇. (3. Solder immersion depth: • Solder immersion Time: If the characteristics of the copper alloy described above are the conditions of the present invention [Example] 2 mm 10 seconds, composition and tin plating conditions, and terminal shape satisfying ' then S will exceed 1〇5%. Use a two-frequency induction furnace at the inner diameter Dissolve 2 kg of electrical copper in a graphite crucible of 60 mm and a depth of 200 mm. After the bath surface is covered with charcoal flakes, add Zn and Sn. After adjusting the bath temperature to 1200 °C, & The main part is made into a metal mold to make each ingot with a width of 60 mm and a thickness of 30 mm. The ingot is heated at 85 Torr for 3 hours and hot rolled until the thickness reaches 8 mm. After the oxidized scale on the surface of the slab is ground by a grinder, the steps of cold rolling, recrystallization annealing, and cold rolling are sequentially performed to obtain a thickness of t (mm). During the recrystallization annealing, the material is placed in the atmosphere. Add 400 °C to 12 200844267 heat for 30 minutes. Also, in order to remove the cause The oxide film formed by annealing is first acid-washed with 10% by mass of sulfuric acid-!% by mass hydrogen peroxide solution, and then mechanically ground using #1200 grinding paper. The final cold rolling process is changed, and the calendering degree is changed (R Here, R is defined by the following formula: R (%) = (tG - t) / tGxio 〇 (t.: thickness before rolling, t: thickness after rolling) Then, various thicknesses are applied to the copper alloy material Tin plating

(1)於鹼性水溶液中將試料作為陰極且以如下條件進 行電解脫脂。 •電流密度:3 A/dm2 .脫脂劑:YUKEN工業(股)禦侔 食挪「 P105(1) The sample was used as a cathode in an alkaline aqueous solution and electrolytic degreasing was carried out under the following conditions. • Current density: 3 A/dm2. Degreaser: YUKEN Industrial Co., Ltd.

示、狀」衣造,商標r PAKUNA 」’脫脂劑濃度:40g/L’溫度:抓,時間:川秒 •電流密度:3 A/dm2。 (2)使用1〇質量%之硫酸水溶液進行酸洗Display, shape, clothing, trademark r PAKUNA ” degreaser concentration: 40g / L 'temperature: scratch, time: Chuan seconds • Current density: 3 A / dm2. (2) Pickling with a 1% by mass aqueous solution of sulfuric acid

基底 (3 )以如下條件實施厚度為0.3 以及Cu/Ni雙層基底之情形)。The substrate (3) was subjected to a thickness of 0.3 and a Cu/Ni double-layer substrate under the following conditions.

Km之Ni基底鍍敷(Ni •鍵敷浴組成··硫酸鎳250 g/L、Ni plating of Km (Ni • bond bath composition · nickel sulfate 250 g / L,

g/L 氯化鎳45 g/L、棚酸30 •鍍敷浴溫度:50°C •電流密度:5 A/dm2 (4 )以如下條件實施厚度為〇g/L Nickel chloride 45 g/L, shed acid 30 • Plating bath temperature: 50 ° C • Current density: 5 A/dm 2 (4 ) The thickness is 以 as follows

门* — Km之Cu之基底鍍Door* — Km Cu plating

Cu基底以及Cu/沁雙層基底之情形)。Cu substrate and the case of Cu/沁 double-layer substrate).

•鍍敷浴組成··硫酸銅2〇〇 /L• Plating bath composition · · Copper sulfate 2 〇〇 / L

δ 埽酸60 g/L •锻敷浴溫度:2 5 13 200844267 •電流密度:5 A/dm2 (5 )以如下條件實施鍍錫。 酴石頁酸268 g/L、界δ 埽 acid 60 g / L • Forging bath temperature: 2 5 13 200844267 • Current density: 5 A / dm2 (5) Tin plating was carried out under the following conditions. Vermiculite 268 g/L, boundary

•鍍敷浴組成:氧化亞錫41 g/L、 面活性劑5 g/L •鍍敷浴溫度:50。(: 琶k岔度· 9 A/dm2 糟由電沈積時間來改變鍍錫厚度。• Plating bath composition: stannous oxide 41 g / L, surfactant 5 g / L • plating bath temperature: 50. (: 琶k岔··9 A/dm2 The thickness of the tin plating is changed by the electrodeposition time.

ΟΟ

〕 (6)作為回焊處理,將試料插入溫度設為* 熱爐中10秒鐘,進行水冷。 加 對於所得之銅合金鍍錫條進行如下之特性評估。 (a)鍍敷厚度之測定 藉由電解式膜厚計(電解剥離法),測定純sn相之 尽度。使帛R-50之電解液。若藉由電解液尺,進行電解, 則對鍍錫層進行電解㈣Cu_Sn合金層露出時停止電解, 此處之I置之顯示值則成為純鍍錫層之厚度。 (B )熱導率 利用jigaku股份有限公司製造之熱導率測定裝置 851〇藉由雷射閃光法求出熱導率。於溫度為乃。。、環 境為真空之條件下進行測定。 (C )微維克氏硬度 利用明石製作所製造之商品名為「微維克氏硬度測試 儀MVK-E型」,在相對於壓延方向之平行剖面求出由 JISZ2244所規定之維克氏硬度(HV0.5)。 龜而,藉由衝壓加工,自銅合金鍍锡條中取出寬度為 200844267 (mm)、長度為30mm之接腳,進杆 厂n、 選订如下之特性評估。 L D)焊料潤濕性 ’ 測定L=…將熟化後之試料浸潰於無-焊料中, 裂面上焊料之潤濕面積率( 時判定為良好。 J田S超過105% (E)基板構裝測試 取/=r5t、85%進行24小時熟化後之試料,使用連 SR:衣” Γ:'有限公司製造之桌上型喷流焊接裝置 劑及無錯焊料構…^二中所使用之相同的助焊 聊,基板板;。基板材質為玻璃環氧樹脂 *板板U】_6_,銅簿焊底面(μ直徑為φ2〇 二,貝通孔徑為接腳之寬度w之+ 〇2職以内。塗佈助 Ϊ基板之下表面接觸⑨25°。〇之烊料噴流,觀 ^ ^貝通孔剖^ #焊料潤濕且擴展於底面表面時 …。’虽僅到達貫通孔中途時記作χ (參照圖^ )。 (F)通電時之溫度上升 :嶋於母端子’以12 V之電壓、3。A之直流 mi二”?時’將熱電偶焊接於端子上並測定 ’皿又 1。當溫度上升量為30°c以下時記作〇,告超 過30〇C時記作X 〇 田心 之W彎’曲測試。彎曲半徑係 使用光學藏微鏡以4 0 0倍之 裂,當無斷裂產生時記作0, (G)彎曲加工性 實施JISH3110中所規定 板厚值。對於彎曲後之試料, 倍率觀察彎曲部之剖面有無斷 15 200844267 當有斷裂產生時記作X。再者,將深度超過10 μχη之龜裂 視為斷裂。 (實施例1 ) 利用表1說明合金成分以及最終壓延加工度對於熱導 率、硬度、端子性能之影響。對於整個試料進行0.3 μπι之 Cu基底鍍敷之後,實施1.0 μπι之鐘錫。表1中之試料於 回焊之後的純Sn相的厚度為0.6士0.2 μπι。而且,端子之 尺寸為 t = 0·64 mm、w = 0.64 mm。 16 200844267 •η ·3 【1<】 ―曲加工性 (〇 / X) 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 Ο 〇 〇 〇 〇 〇 〇 〇 〇 〇 通電時溫度上升 (〇 / X) 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 O O 〇 〇 〇 〇 〇 〇 〇 〇 基板構裝性 (〇 / X) 〇 〇 〇 〇 0 〇 〇 〇 〇 〇 O 〇 〇 〇 〇 〇 〇 〇 〇 〇 焊料潤濕面積率 (%) cn f ( 1 ( v〇 〇〇 Ύ" < oo !—H p-H oo r-H f < cn CN (N <N m 2 tn (N 1—t 1 t VO CN T—H m (N i-H m (N r-H 00 CN 1—^ 硬度 On m r—^ On r—^ oo m r—( 2 Ό r—< r-H « r—I 00 »〇 l〇 m »n O VO T—H ?; S r-H VO r-H o VD r-H 熱導率 (W/(m*K)) 258 210 240 230 206 ro VO Vi 212 189 CN ON f-H 〇 r-H r-H 〇\ r—1 i—H r- OO VO T—^ m v〇 wn w^> l · <N 丨1 < σ\ 1—^ 最終壓延加工度 (%) 其他添加元素 (質量%) 1 1 1 1 1 1 1 1 1 1 1 1 1 1 > 1 1 1 国 Ο 0.18Ni Sn (質量%) 0.23 0.68 0.17 0.30 0.54 0.94 0.18 0.49 0.30 0.67 0.30 1 0.45 0.58 0.18 0.31 0.50 0.24 0.12 0.30 0.31 Zn ( 質量0/〇) (N CN CN o G\ (N CN (ri 00 cn — ON o MD o OS o oo o OO Γ—^ oo f-H Os OO Os 1L5 Ο 00 as No.. r—^ (N m 寸 00 o\ o 1—( CN m 2 »n 1—4 r-H OO ΟΝ 5 200844267(6) As a reflow process, the sample insertion temperature was set to * in a hot furnace for 10 seconds, and water cooling was performed. The following characteristics were evaluated for the obtained copper alloy tin bar. (a) Measurement of plating thickness The purity of the pure sn phase was measured by an electrolytic film thickness meter (electrolytic peeling method). Make the electrolyte of R-50. When electrolysis is performed by the electrolytic solution, the tin plating layer is electrolyzed. (4) When the Cu_Sn alloy layer is exposed, electrolysis is stopped, and the display value of I is set to the thickness of the pure tin plating layer. (B) Thermal conductivity The thermal conductivity was determined by a laser flash method using a thermal conductivity measuring device 851 manufactured by Jigaku Co., Ltd. The temperature is yes. . The environment is measured under vacuum conditions. (C) Micro Vickers hardness is obtained by the Akashi Seisakusho Co., Ltd. under the trade name "Micro Vickers hardness tester MVK-E type", and the Vickers hardness specified by JIS Z2244 is obtained in parallel sections with respect to the rolling direction ( HV0.5). In the case of the turtle, the pins with a width of 200844267 (mm) and a length of 30 mm were taken out from the copper alloy tin bar, and the characteristics of the following were evaluated. LD) Solder wettability 'Measurement L =... The matured sample was immersed in the non-solder, and the wetted area ratio of the solder on the cracked surface was judged to be good. J Field S exceeded 105% (E) Substrate structure The test was taken with /=r5t, 85% for 24 hours of aging, and the use of SR: clothing: Γ: 'The desktop type jet welding device made by Co., Ltd. and the error-free solder structure... The same soldering chat, substrate board; substrate material is glass epoxy * board U] _6_, copper book bottom surface (μ diameter is φ2 〇 two, Betong aperture is the width of the pin w + 〇 2 positions The inner surface of the coated auxiliary substrate is in contact with 925°. The jet of the crucible is sprayed, and the surface of the crucible is wetted and spread on the surface of the bottom surface. χ (Refer to Fig. ^). (F) Temperature rise during energization: 嶋 When the female terminal 'voltage is 12 V, 3. A DC 二 2'? When the thermocouple is soldered to the terminal and the measurement 1. When the temperature rise is less than 30 °c, it is recorded as 〇, and when it exceeds 30 〇C, it is recorded as the X-turned W-curve test. The bending radius is The optical micromirror is cracked by 400 times, and when it is not broken, it is recorded as 0. (G) The bending workability is carried out by the thickness value specified in JISH3110. For the sample after bending, the section of the curved portion is observed to be unbroken. 15 200844267 When there is a fracture, it is recorded as X. Further, cracks with a depth of more than 10 μχη are regarded as fractures. (Example 1) The alloy composition and final calendering degree are described in Table 1 for thermal conductivity, hardness, and terminal. Effect of performance: After the 0.3 μm Cu substrate plating was applied to the entire sample, 1.0 μm of tin tin was applied. The thickness of the pure Sn phase after reflowing in the sample of Table 1 was 0.6 ± 0.2 μm. It is t = 0·64 mm, w = 0.64 mm. 16 200844267 •η ·3 [1<] ―Flexibility (〇/ X) 〇〇〇〇〇〇〇〇〇〇Ο 〇〇〇〇〇〇〇温度 Temperature rises when energized (〇 / X) 〇〇〇〇〇〇〇〇〇〇 OO 〇〇〇〇〇〇〇〇 Substrate mountability (〇 / X) 〇〇〇〇0 〇〇〇〇〇O Weld welding Wetting area ratio (%) cn f ( 1 ( v 〇〇〇Ύ "< oo ! - H pH oo rH f < cn CN (N < N m 2 tn (N 1 - t 1 t VO CN T —H m (N iH m (N rH 00 CN 1—^ Hardness On mr—^ On r—^ oo mr—( 2 Ό r—< rH « r—I 00 »〇l〇m »n O VO T —H ?; S rH VO rH o VD rH Thermal conductivity (W/(m*K)) 258 210 240 230 206 ro VO Vi 212 189 CN ON fH 〇rH rH 〇\ r—1 i—H r- OO VO T—^ mv〇wn w^> l · <N 丨1 < σ\ 1—^ Final calendering degree (%) Other added elements (% by mass) 1 1 1 1 1 1 1 1 1 1 1 1 1 1 > 1 1 1 National Ο 0.18Ni Sn (% by mass) 0.23 0.68 0.17 0.30 0.54 0.94 0.18 0.49 0.30 0.67 0.30 1 0.45 0.58 0.18 0.31 0.50 0.24 0.12 0.30 0.31 Zn (mass 0/〇) (N CN CN o G\ (N CN (ri 00 cn — ON o MD o OS o oo o OO Γ—^ oo fH Os OO Os 1L5 Ο 00 as No.. r—^ (N m inch 00 o\ o 1—( CN m 2 »n 1—4 rH OO ΟΝ 5 200844267

〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 X X 〇 〇 X 〇 〇 〇 〇 〇 〇 〇 〇 X 〇 X 〇 〇 〇 X CN l—H (N r -H ,< OO T—t P < On r 'i r—t cn (N 1—t s r·^ t-H »〇 o\ r—i f-H (N CSJ 1—t σ\ i—( OO 1—4 r—4 (N m Ό 1 < $ i—H OO r i JQ v〇 r-H 00 T-H ON VO r»H CJs 〇〇 v-H 00 ϊ—M CN os ι—Η s 1—< On 〇 (N CN 1-"^ m OO g <N 00 VO s 1—< m OO (N v〇 »〇 <N 吞 r-H ON 1—ί »n 污 沄 0.05Ti s o g 〇 O.lOFe G S ON o 0.04Zr,O.lCr 0.04Be,0.02C〇 0.08A1 1 t 1 1 1 1 1 G\ (N 〇 o (N o ON f—( o O <〇 Os o CN 〇 o cn d ο s 〇 t—H (N 〇 s i—H r-H m o ο 〇 d o OO o o wS tri r—< irv ON H OO 00 l〇 r^"< cn in (N m — OO f*4 Os ο cn r—( CN CN (N m (N (N (N 00 CM ON CN r—< ΓΟ m m cn m £ w 200844267 於Zn為2〜12%、Sn為0.1〜1·〇質量%且選擇適當之 最終壓延加工度的Ν0·1〜28中,熱導率位於150〜260 W/(m.K)之範圍内,硬度位於12〇〜215之範圍内,且對端 子進行加工後之燁料潤濕性以及基板構裝性良好,通電時 之溫度上升為標準之3〇t以下,彎曲加工中無斷裂。 比幸乂例No.29中,因Zn濃度未滿2¾,因此,熱導率 超過260 W/(m.K)而導致焊料潤濕面積率成為1〇5%以下,〇〇〇〇〇〇〇〇〇〇〇〇〇X 〇〇〇〇〇〇〇〇〇〇〇XX 〇〇X 〇〇〇〇〇〇〇〇X 〇X 〇〇〇X CN l—H (N r -H , < OO T - t P < On r 'ir - t cn (N 1 - tsr · ^ tH » 〇 o \ r - i fH (N CSJ 1 - t σ \ i - ( OO 1 - 4 r—4 (N m Ό 1 < $ i—H OO ri JQ v〇rH 00 TH ON VO r»H CJs 〇〇vH 00 ϊ—M CN os ι—Η s 1—< On 〇(N CN 1-"^ m OO g <N 00 VO s 1—< m OO (N v〇»〇<N swallowing rH ON 1—ί »n contamination 0.05Ti sog 〇O.lOFe GS ON o 0.04Zr, O.lCr 0.04Be, 0.02C〇0.08A1 1 t 1 1 1 1 1 G\ (N ONo (N o ON f—( o O <〇Os o CN 〇o cn d ο s 〇t —H (N —si—H rH mo ο 〇do OO oo wS tri r—< irv ON H OO 00 l〇r^"< cn in (N m — OO f*4 Os ο cn r—( CN CN(N m (N (N 00 CM ON CN r-< ΓΟ mm cn m £ w 200844267 Zn is 2 to 12%, Sn is 0.1 to 1·〇% by mass and the appropriate final calendering process is selected In Ν0·1~28, the thermal conductivity is in the range of 150~260 W/(mK), the hardness is in the range of 12〇~215, and the wettability of the material after processing the terminal and the substrate structure The temperature is good, the temperature rises when the power is turned on to the standard of 3 〇t or less, and there is no break during the bending process. In the case of No. 29, the Zn concentration is less than 23⁄4, so the thermal conductivity exceeds 260 W/(mK). And the solder wettability area ratio is less than 1〇5%,

從而亦導致焊料構裝性惡化。而且,亦有可能因硬度未滿 1 2 0而導致插拔於連接器時端子變形。 比較例Νο·30中,Sn濃度未滿〇1%,放而硬度未滿 120,於插拔於連接器時可能會導致端子變形。 比較例No.31中,Zn濃度超過12%,故而氧化膜組成 中田木Zn,結果導致焊料潤濕面積率成為i 以下,從 而亦導致焊料構裝性惡化。而且,熱導率未滿15〇 W/(m.K) ’且通電時之溫度上升超過標準之。 比幸乂例No ·3 2中,sn濃度超過! ·〇%,故而熱導率未 滿150 W/(m’K) ’且通電時之溫度上升超過標準之“它。 比車乂例Νο·33巾,因最終壓延加工度過低而導致硬度 未滿120,於插拔於連接器時可能會導致端子變形。 比較例Ν 〇 · 3 4中,田吳{々咸、 . 口取〜壓延加工度過高而導致硬度 超過215 ’且彎曲加工中產生斷裂。 比較例Ν 〇 · 3 5中你〇廿^ ▲ 係以更鋼為例。焊料潤濕面積率未滿 80%,加壓斷裂面排斥焊M^ t 卜坪枓而可看到黃銅母材露出之部分。 無法對基板進行構裝。而i,、s❼士 向且,通電時之溫度上升亦大大超 19 200844267 過標準之30°C。 (實施例2) 、 木件對端子淮;. 濕性以及基板構裝性的影響。 ^ 母材之成分為Cu— 8 〇。/2 個試与 U/〇Z" 3%Sn 4°%,熱導率輪,叫硬度為:; 尺寸為 t=〇·80 mm、wu〇 mm。 工後之焊料潤 而言,銅合金 壓延加工度為 而且,端子之This also leads to deterioration of solder build-up. Moreover, there is a possibility that the terminal is deformed when the connector is inserted or removed due to the hardness of less than 120. In the comparative example Νο·30, the Sn concentration is less than %1%, and the hardness is less than 120, which may cause the terminal to be deformed when inserted or removed from the connector. In Comparative Example No. 31, since the Zn concentration was more than 12%, the oxide film composition was tianzhu Zn, and as a result, the solder wettability area ratio was i or less, and the solder moldability was deteriorated. Moreover, the thermal conductivity is less than 15 〇 W / (m. K) ' and the temperature rises when the power is turned on exceeds the standard. In the case of No. 3 2, the concentration of sn exceeds! ·〇%, so the thermal conductivity is less than 150 W/(m'K)' and the temperature rises when the power is turned on exceeds the standard "it. It is harder than the final calendering process due to the lower rolling process." If it is less than 120, it may cause deformation of the terminal when it is plugged or unplugged. Comparative Example 〇 3 · 3 4, Tian Wu {々 salty, . Porting ~ Calendering processing is too high, resulting in hardness exceeding 215 ' and bending A fracture occurs in the middle. Comparative Example 〇 3· 3 5 〇廿 〇廿 ^ ▲ Take the steel as an example. The solder wetted area ratio is less than 80%, and the pressure fracture surface is repelled by M^t 卜 ping. The exposed part of the brass base material. The substrate cannot be assembled. The temperature rise of the i, s gentleman, and the power supply is also greatly higher than the temperature of 30 ° C. 2008. The standard is 30 ° C. (Example 2) Terminal Huai;. Humidity and influence of substrate structure. ^ The composition of the base material is Cu-8 〇./2 tests and U/〇Z" 3%Sn 4°%, thermal conductivity wheel, called hardness :; The size is t=〇·80 mm, wu〇mm. For the solder run after work, the copper alloy has a degree of calendering and the terminal

Νο·36〜44中表示,當實施0·3 μιη之Cu基底鑛敷時, 藉由改變Sn之電沈積厚度來改變回焊之後的純Sri相之平 20 200844267 均厚度。於純Sn相夫! Λ 滿0·1 μπι之Νο·36中,焊料構 惡化。於純Sn相為〇 , 衣性 舜U·1 μπι以上之ν〇·37〜44中,灌々 良好之焊料潤濕性以乃押糾 幾件了 料構裝性。但是,於純^ 過2.0 μπι之Νο·44 Φ 从 相超 τ,純Sn相具有不必要之厚度囡 經濟。 /又_而不 Νο·45 〜46 矣+每 #不具知0·3 μχη之Ni以及0·3 μιη夕 的雙層基底鍛敷之愔 Cu 形,Νο·47〜48表示實施〇·3 基底鍍敷之情形,No 4Q — — 、 川 •〜5 0表示未實施基底鑛敷之愔 對於该專情況而言,葬 夕 精由使回焊之後的純Sn相之平土 度達到0.1 μηι以上,目丨丨叮说_ 丁习厚 、J可獲侍良好之焊料潤濕性以 構裝性。 于料 (實施例3) 利用表3說明端子形狀對端子進行加工後之焊料 性、基板構裝性、通電時之溫度上升的影響。整個試料中:、 銅合金母材之成分》Cu_2 7%Zn_G16%Sn,最終壓延加 工度為60%’熱導率為247 w/(m.K),硬度為145。而且,口 實施〇·3陶之Cu基底鍍敷之後,再實施1〇 _之鑛錫: 表3中,試料於回焊之後的純Sn相之厚度為g.6±〇2㈣。 21 200844267 [表3]Νο·36~44 indicates that when the Cu-based mineral deposit of 0·3 μηη is applied, the thickness of the pure Sri phase after reflow is changed by changing the electrodeposited thickness of Sn. Yu Chun Sn Xiangfu!焊料 In the case of 0·1 μπιΝο·36, the solder structure deteriorates. In the pure Sn phase, 衣 37 37 37 · · · · · · · 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 37 良好 良好 良好 良好 良好 良好 良好 良好 良好 良好However, in pure ^ over 2.0 μπι Νο·44 Φ from phase super τ, the pure Sn phase has an unnecessary thickness 囡 economy. / _ _ Ν · · 45 45 45 45 45 45 45 45 46 每 每 每 · · 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 每 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 3 In the case of plating, No 4Q — — , Chuan • ~ 50 indicates that the base mineral is not applied. For this special case, the level of pure Sn phase after reflow is 0.1 μηι or more. , witnessed _ Ding Xihou, J can get good solder wettability to the structure. (Example 3) The influence of the solder shape after the terminal shape was processed on the terminal, the substrate mountability, and the temperature rise at the time of energization were described using Table 3. In the whole sample: the composition of the copper alloy base material, Cu_2 7% Zn_G16%Sn, the final calendering degree of 60%' thermal conductivity was 247 w/(m.K), and the hardness was 145. Further, after the Cu substrate plating of 〇·3 Tao was carried out, the tin of 1 〇 _ was further applied: In Table 3, the thickness of the pure Sn phase after the reflow of the sample was g.6±〇2 (four). 21 200844267 [Table 3]

於將t設為0.2〜】n ^ 〜6〇 ·0^η、w 設為 〇.9t 〜2.0t 之 n〇.51 中’獲得了良好之卜曰 ^ 之蛑料潤濕性,基板構裝性亦良好, 且通^寸之溫度上升為標準以下。 起、、”:t滿〇.2職之版61中’可能導致通電時容易引 =升-且插拔連接器時蠕子亦可能會變形。於^ 構裝性惡化。 w潤濕性較發明例更差,焊料 於W未滿〇 9 t 例更差,且焊t ·〜65中,焊料潤濕性較發明 I坪枓構裝性惡化。In the case of setting t to 0.2~]n^~6〇·0^η, w is set to 9.9t to 2.0t, n〇.51 'gets good wetness, substrate structure The suitability is also good, and the temperature rises below the standard. Starting, ":t full 〇.2 job version 61" may lead to easy to lead up when power is on - and the creeper may be deformed when the connector is plugged in. The structure is deteriorated. w Wetting The invention is even worse, the solder is worse than the case where the solder is not full, and the solder wettability is deteriorated compared with the invention.

於W超過2_〇 t之N 6〜67中,雖然獲得了良好之 22 200844267 焊料潤濕性以及基板構裝性 , 七丄 ’但是就該端子尺+ & ^ 使為黃銅之前鍍敷材亦能翱4 八丁而5,即 I * 運行基板構裝,因此^ ^ 本發明來改善其焊料構裝性。 u此热須利用 【圖式簡單說明】 衣’進行評估之判斷標準的模式圖 【主要元件符號說明】In the case of N 6 to 67 in which W exceeds 2_〇t, although a good 22 200844267 solder wettability and substrate mountability are obtained, the seven-inch 'but the terminal ruler + & ^ is made of brass before plating The material can also be used to improve the solder buildability of the substrate structure. u This heat must be used [Picture of the simple description] The pattern of the evaluation criteria for the evaluation of the clothing [Main component symbol description]

23twenty three

Claims (1)

200844267 十、申請專利範圍: 1 · 一種印刷基板端子用鍍 〜12質量%之Zn以及〇.1〜1 銅以及不可避免之雜質所構成 錫之銅合金材,其係含有2 ·〇質量%之Sn,其餘部分為 ’其特徵在於: 以及120〜215之微 2·〇 μπχ之純Sn相所 具有150〜260 W/(m.K)之熱導率 維克氏硬度,表面由平均厚度為〇」〜 覆蓋著。 2. 一種印刷基板端子用鍍錫之銅合 i200844267 X. Patent application scope: 1 · A printed copper plate alloy consisting of Zn of 12% by mass of Zn and 〇.1~1 copper and unavoidable impurities, which contains 2·〇% by mass Sn, the rest is 'characterized by: and 120 to 215 micro 2·〇μπχ pure Sn phase has a thermal conductivity of 150 to 260 W / (mK) Vickers hardness, the surface has an average thickness of 〇" ~ Covered. 2. Tinned copper for printed circuit board terminals 〜12質一以及。·Μ•。質量%之二且=計2 為 _5〜〇·5 質量 %之 Ni、Mg、Fe、Ρ、Mn、co、Be、Ti、 Zr A1以及Ag中之一種以上,其餘部分為銅以及不 可避免之雜質所構成,其特徵在於: 12 0〜21 5之微 μπι之純Sn相 具有150〜260 W/(m.K)之熱導率以及 維克氏硬度,且表面由平均厚度為〇1〜2 〇 所覆蓋著。 …3 一種印刷基板料,其特徵在於u申請專利範 圍二1項或第2項之錢錫之銅合金材壓製加卫而成、於加 【断裂面上路出銅合金母材之接腳狀構件者; —基板構裝部之厚度⑴為W〜1.G _,基板構裝部 之寬度(w)為0.9 t〜2.0 tmm。 4.如申請專利範㈣3項之印刷基板端子,其暴心 相對濕度85%、溫度抑之環境氣氛下叫、時之後,以2_ 之深度浸潰於25(TC之無鉛焊料内1〇秒,此時加壓斷裂面 上附著有焊料之部分的面積相對於浸潰於焊料中之部‘的 24 200844267 面積超過105%。 十一、圖式: 如次頁~12 quality one as well. ·Μ•. 2% by mass and = 2 is _5~〇·5 mass% of Ni, Mg, Fe, Ρ, Mn, co, Be, Ti, Zr A1 and Ag, and the rest is copper and inevitable The impurity is composed of: 12 0~21 5 micro-μπι pure Sn phase has a thermal conductivity of 150~260 W/(mK) and Vickers hardness, and the surface has an average thickness of 〇1~2 Covered with cockroaches. ...3 A printed substrate material characterized by the fact that the copper alloy material of the tin tin of the second or the second item of the patent application is pressed and reinforced, and the joint member of the copper alloy base material on the fracture surface is added. The thickness (1) of the substrate assembly portion is W1 to 1.G _, and the width (w) of the substrate assembly portion is 0.9 t to 2.0 tmm. 4. If the printed circuit board terminal of the patent application (4) 3 is applied, the violent relative humidity is 85%, the temperature is suppressed, and the ambient atmosphere is called, and then immersed in 25 (TC lead-free solder for 1 sec. At this time, the area of the portion on which the solder is adhered on the press fracture surface is more than 105% with respect to the area of 24 200844267 impregnated in the solder. XI. Schema: 2525
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JP4444245B2 (en) * 2005-07-15 2010-03-31 日鉱金属株式会社 Cu-Zn-Sn alloy for electrical and electronic equipment
JP4820228B2 (en) * 2005-07-22 2011-11-24 Jx日鉱日石金属株式会社 Cu-Zn-Sn alloy strips with excellent heat-resistant peelability for Sn plating and Sn plating strips thereof
JP4247256B2 (en) * 2005-08-24 2009-04-02 日鉱金属株式会社 Cu-Zn-Sn alloy tin-plated strip
JP4538424B2 (en) * 2006-03-29 2010-09-08 日鉱金属株式会社 Cu-Zn-Sn alloy tin-plated strip

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