TW200843127A - Solar cell with flat contact area and manufacturing process of the same - Google Patents
Solar cell with flat contact area and manufacturing process of the same Download PDFInfo
- Publication number
- TW200843127A TW200843127A TW96114527A TW96114527A TW200843127A TW 200843127 A TW200843127 A TW 200843127A TW 96114527 A TW96114527 A TW 96114527A TW 96114527 A TW96114527 A TW 96114527A TW 200843127 A TW200843127 A TW 200843127A
- Authority
- TW
- Taiwan
- Prior art keywords
- solar
- substrate
- solar cell
- type semiconductor
- semiconductor layer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 89
- 239000004065 semiconductor Substances 0.000 claims abstract description 46
- 238000005530 etching Methods 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 49
- 239000000463 material Substances 0.000 claims description 5
- 238000007650 screen-printing Methods 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 4
- 230000000873 masking effect Effects 0.000 claims description 4
- 239000004744 fabric Substances 0.000 claims description 2
- 241001122767 Theaceae Species 0.000 claims 1
- VPWFPZBFBFHIIL-UHFFFAOYSA-L disodium 4-[(4-methyl-2-sulfophenyl)diazenyl]-3-oxidonaphthalene-2-carboxylate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC(C)=CC=C1N=NC1=C(O)C(C([O-])=O)=CC2=CC=CC=C12 VPWFPZBFBFHIIL-UHFFFAOYSA-L 0.000 claims 1
- 239000004922 lacquer Substances 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 claims 1
- 230000007547 defect Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 241000255925 Diptera Species 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96114527A TW200843127A (en) | 2007-04-25 | 2007-04-25 | Solar cell with flat contact area and manufacturing process of the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96114527A TW200843127A (en) | 2007-04-25 | 2007-04-25 | Solar cell with flat contact area and manufacturing process of the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200843127A true TW200843127A (en) | 2008-11-01 |
| TWI329932B TWI329932B (enExample) | 2010-09-01 |
Family
ID=44822225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96114527A TW200843127A (en) | 2007-04-25 | 2007-04-25 | Solar cell with flat contact area and manufacturing process of the same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200843127A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI497738B (zh) * | 2010-06-30 | 2015-08-21 | Taiwan Semiconductor Mfg Co Ltd | 光伏電池以及半導體元件的製作方法 |
-
2007
- 2007-04-25 TW TW96114527A patent/TW200843127A/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI497738B (zh) * | 2010-06-30 | 2015-08-21 | Taiwan Semiconductor Mfg Co Ltd | 光伏電池以及半導體元件的製作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI329932B (enExample) | 2010-09-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |