TW200835817A - Electroplating apparatus capable of carrying out electroplating onto local area of workpiece and its method - Google Patents
Electroplating apparatus capable of carrying out electroplating onto local area of workpiece and its method Download PDFInfo
- Publication number
- TW200835817A TW200835817A TW96106111A TW96106111A TW200835817A TW 200835817 A TW200835817 A TW 200835817A TW 96106111 A TW96106111 A TW 96106111A TW 96106111 A TW96106111 A TW 96106111A TW 200835817 A TW200835817 A TW 200835817A
- Authority
- TW
- Taiwan
- Prior art keywords
- workpiece
- unit
- plating
- electroplating
- anode
- Prior art date
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- Electroplating Methods And Accessories (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96106111A TW200835817A (en) | 2007-02-16 | 2007-02-16 | Electroplating apparatus capable of carrying out electroplating onto local area of workpiece and its method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96106111A TW200835817A (en) | 2007-02-16 | 2007-02-16 | Electroplating apparatus capable of carrying out electroplating onto local area of workpiece and its method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200835817A true TW200835817A (en) | 2008-09-01 |
| TWI333987B TWI333987B (enExample) | 2010-12-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96106111A TW200835817A (en) | 2007-02-16 | 2007-02-16 | Electroplating apparatus capable of carrying out electroplating onto local area of workpiece and its method |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200835817A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111032925A (zh) * | 2017-09-07 | 2020-04-17 | 盛美半导体设备(上海)股份有限公司 | 电镀夹盘 |
| TWI791785B (zh) * | 2019-03-06 | 2023-02-11 | 大陸商盛美半導體設備(上海)股份有限公司 | 電鍍夾盤 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105350038B (zh) * | 2014-08-22 | 2017-11-07 | 王元谷 | 局部电镀装置及局部电镀方法 |
-
2007
- 2007-02-16 TW TW96106111A patent/TW200835817A/zh not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111032925A (zh) * | 2017-09-07 | 2020-04-17 | 盛美半导体设备(上海)股份有限公司 | 电镀夹盘 |
| US11469134B2 (en) | 2017-09-07 | 2022-10-11 | Acm Research (Shanghai) Inc. | Plating chuck |
| TWI791785B (zh) * | 2019-03-06 | 2023-02-11 | 大陸商盛美半導體設備(上海)股份有限公司 | 電鍍夾盤 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI333987B (enExample) | 2010-12-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |