TW200834131A - Apparatus and method for manufacturing display device and ink-jet supply apparatuS - Google Patents

Apparatus and method for manufacturing display device and ink-jet supply apparatuS

Info

Publication number
TW200834131A
TW200834131A TW096146037A TW96146037A TW200834131A TW 200834131 A TW200834131 A TW 200834131A TW 096146037 A TW096146037 A TW 096146037A TW 96146037 A TW96146037 A TW 96146037A TW 200834131 A TW200834131 A TW 200834131A
Authority
TW
Taiwan
Prior art keywords
ink
display device
convex part
concave
convex
Prior art date
Application number
TW096146037A
Other languages
English (en)
Chinese (zh)
Inventor
Ryo Ikuta
Yasutsugu Tsuruoka
Koji Takeishi
Takashi Miyamoto
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW200834131A publication Critical patent/TW200834131A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1275—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by other printing techniques, e.g. letterpress printing, intaglio printing, lithographic printing, offset printing

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
TW096146037A 2006-12-11 2007-12-04 Apparatus and method for manufacturing display device and ink-jet supply apparatuS TW200834131A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006333653A JP5031348B2 (ja) 2006-12-11 2006-12-11 表示装置の製造方法

Publications (1)

Publication Number Publication Date
TW200834131A true TW200834131A (en) 2008-08-16

Family

ID=39516745

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096146037A TW200834131A (en) 2006-12-11 2007-12-04 Apparatus and method for manufacturing display device and ink-jet supply apparatuS

Country Status (4)

Country Link
JP (1) JP5031348B2 (enrdf_load_stackoverflow)
KR (1) KR20080053896A (enrdf_load_stackoverflow)
CN (1) CN100593747C (enrdf_load_stackoverflow)
TW (1) TW200834131A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114573240B (zh) * 2022-02-24 2024-03-01 西安中易建科技有限公司 前板玻璃及其制备方法、光伏组件及光伏幕墙
CN115044905B (zh) * 2022-07-19 2024-11-22 枣阳新和化工有限公司 一种阴极双组份电泳漆镀膜工艺

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2819245B2 (ja) * 1994-10-19 1998-10-30 大日本印刷株式会社 カラーフィルターの修正方法

Also Published As

Publication number Publication date
JP2008145780A (ja) 2008-06-26
KR20080053896A (ko) 2008-06-16
CN100593747C (zh) 2010-03-10
JP5031348B2 (ja) 2012-09-19
CN101201501A (zh) 2008-06-18

Similar Documents

Publication Publication Date Title
TW200630760A (en) Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
TW200644075A (en) Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus background of the invention
TW200721278A (en) Forming method for film pattern, device, electro-optical apparatus, electronic apparatus, and manufacturing method for active matrix substrate
TW200704532A (en) Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus
ATE524837T1 (de) Verfahren zur herstellung eines lichtemittierenden bauelements
WO2008042079A3 (en) Method to form a pattern of functional material on a substrate
TW200505311A (en) Pattern formation method and pattern formation apparatus, method for manufacturing device, electro-optical device, electronic device, and method for manufacturing active matrix substrate
WO2004107422A3 (en) Plating apparatus and plating method
JP2010512261A5 (enrdf_load_stackoverflow)
TW200741341A (en) Resist composition, method for forming resist pattern using the same, array substrate fabricated using the same and method of fabricating the array substrate
WO2005118160A3 (en) Droplet dispensing in imprint lithography
TW200618303A (en) Thin film etching method and method of fabricating liquid crystal display device using the same
ATE484609T1 (de) Verfahren zur herstellung einer funktionsschicht
GB2432257B8 (en) A method of forming nano patterns, thin film transistor using the patterns, and liquid crystal display device having the thin film transistor
WO2009001935A1 (ja) 薄膜形成方法、有機エレクトロルミネッセンス素子の製造方法、半導体素子の製造方法及び光学素子の製造方法
WO2009035007A1 (ja) バナジウム酸化物薄膜パターン及びその作製方法
TW200642833A (en) Polyimide film, polyimide metal laminate using the same and manufacturing method thereof
TW200626246A (en) Method for spraying particulates and device used for it
TW200709942A (en) Method for forming film pattern, and method for manufacturing device, electro-optical device, electronic apparatus and active matrix substrate
TW200641443A (en) Film formation method, electro-optical device manufacturing method, and electronic apparatus
DE502007001637D1 (de) Prägefolieneinrichtung
TW200834131A (en) Apparatus and method for manufacturing display device and ink-jet supply apparatuS
WO2007073852A3 (de) Reinigungseinrichtung an einer prägevorrichtung
TW200631679A (en) Method and device for treating substrates and corresponding nozzle unit
TW200618699A (en) Thin-film pattern forming method, semiconductor device, electro-optic device, and electronic apparatus