200828485 九、發明說明： 【發明所屬之技術領域】 本發明係關於LCD(液晶顯示裝置）PDP(電漿顯示器）等之 FPD(平面面板顯示器）用玻璃基板、光罩用玻璃基板、印 刷基板、半導體基板等之基板處理裝置。 •【先前技術】 以往，一面搬送基板，一面將各種處理液供應至基板， 藉以對基板施行特定之處理之基板處理裝置為一般所知 (Ί 悉’近年來，為謀求處理之迅速化、高品質化，一面將基 板之姿勢由水平姿勢變換成傾斜姿勢，或其反向適宜地變 換，一面施行處理之基板處理裝置逐漸普及。 在此種之基板處理裝置中，裝備有在搬送中用來變換姿 勢之裝置（姿勢變換裝置），例如在專利文獻丨中，揭示利用 上升銷頂起傾斜姿勢之基板而將其保持水平，由其下侧用 機器人手支撐該基板而向下游側搬送之裝置。又，在專利 文獻2中，揭示在搬送基板用之滾筒輸送機預先設置水平 I 搬送之部分與傾斜搬送之部分，在水平搬送之部分中，預 先將其終端部分構成可藉汽缸驅動而變換姿勢，藉以一面 - 將基板由水平姿勢變換成傾斜姿勢，一面加以搬送之裝 . 置。 [專利文獻1]日本特開2005-217020號公報 [專利文獻2]曰本特開平ueuio號公報 【發明内容】 [發明所欲解決之問題] 123027.doc 200828485 但’在專利文獻1揭示之裝置中，姿勢變換後，基板藉 由機器人手支撐後至上升銷完全下降以前，也不能將次一 基板搬入該姿勢變換位置，故基板之處理之進行速度有受 到此姿勢變換動作控制之傾向。尤其，在大型之基板中， 姿勢變換時之高低差較大，相對地，上升銷之升降需要時 間，故上述傾向較強，在生產率之提高上成為負面要因之 一。在專利文獻2揭示之裝置方面，姿勢變換後之基板完 全被搬送至下游側後，在滾筒輸送機（水平搬送之終端部 份）復位至原來狀態以前，也不能將次一基板搬入該終端 部份，故情況與專利文獻1之問題相同。 本發明係鑑於上述情況而完成者，其目的在於可一面搬 送基板’ 一面在其途中變換基板姿勢而進行處理之基板處 理褒置之生產率。 [解決問題之技術手段] 為解決上述問題，本發明之姿勢變換裝置係介裝於以第 1安勢搬送基板之上游側搬送機構與以異於第1姿勢之第2 姿勢搬送基板之下游側搬送機構之間，將藉由上游側搬送 機構搬送來之基板之第丨姿勢變換成第2姿勢而向下游侧搬 送機構搬送者，且包含：基板收容機構，其係具備有對於 基板之搬送方向並排排列，分別可收容基板之第1、第2收 谷部；姿勢變換機構，其係將前述第1、第2收容部之姿勢 分別切換成可接受藉由上游側搬送機構搬送來之基板之第 1姿勢與可對下游側搬送機構搬出基板之第2姿勢；及變位 機構，其係在前述第1收容部對應於與上游側搬送機構之 123027.doc 200828485 基板收付位置，且第2收容部對應於與下游側搬送機構之 基板收付位置之第1位置與在和此等相反之位置配置各收 容部之第2位置之間使前述基板收容機構變位；前述姿勢 變換機構係在由前述基板收容機構之第2位置向第1位置之 變位中，將第1收容部切換成第丨姿勢，將第2收容部切換 成第2姿勢，在由前述基板收容機構之第丨位置向第2位置 之變位中，將第1收容部切換成第2姿勢，將第2收容部切 換成第1姿勢者（請求項1)。 依據此裝置，基板收容機構可交互被切換至各位置，並 可在此切換動作中切換各收容部之姿勢。藉此，在基板收 容機構位於第1位置時，可將由上游側搬送來之基板搬入 第1收容部。另一方面，與此接受並行地，可將先收容於 第2收容部之基板由該第2收容部向下游側搬出，且同樣 地’在基板收容機構位於第2位置時，可將由上游側搬送 來之基板搬入第2收容部。另一方面，與此並行地，可將 先收谷於第1收谷部之基板由該第1收容部向下游側搬出。 也就是說，可並行地施行由上游側搬送來之基板之搬入姿 勢變換裝置及由該裝置向下游側搬出基板。 在此裝置中，前述基板收容機構也可在水平方向並排設 有第1、第2收容部，但從空間效率（佔用面積之削減）之觀 點而言，最好前述基板收容機構係在上下方向並排設有第 1、第2收谷部，變位機構係使此基板收容機構升降變位者 (請求項2)。 又，在此構成中，最好前述第丨姿勢及第2姿勢係一方為 123027.doc 200828485 水平姿勢，他方為傾斜；前述姿勢變換機構係配置於前述 收谷部之與基板搬送方向正交之方向之中央部分，且使前 述收谷部在與基板搬送方向平行地延伸之樞軸周圍擺動， 藉此將前述收容部切換成前述第丨姿勢與第2姿勢（請求項 3)。 、 依據此姿勢變換機構之構成，如在實施型態中所說明， 可在上下方向將姿勢變換裝置構成小型。 另一方面，本發明之基板搬運裝置之特徵在於包含：以 第1姿勢搬送基板之上游側搬送機構、以異於第丨姿勢之第 2姿勢搬送基板之下游侧搬送機構、及介裝於此等兩搬送 機構之間而將藉由上游側搬送機構搬送來之基板之第 勢變換成藉由下游側搬送機構搬送用之第2姿勢之姿勢變 換裝置，前述姿勢變換裴置係如請求項丨至3中任一項之姿 勢變換裝置（請求項4)。 依據此基板搬運裝置，可並行地施行由上游側搬送來之 基板之搬入於姿勢變換裝置、及由該裝置向下游側之基板 之搬出，故可避免基板之搬送在姿勢變換裝置之部份 滯。 又，下游側搬送機構也可具有由下側托起被收容於姿勢 變換裝置之第2姿勢之基板而取出之手臂之機器人（請求項 5)。作為下游側搬送機構，既可為滾筒輸送機等，也可如 斤丁採用具備手臂之機器人時，可使在下游侧之基 板搬送更為圓滑。 [發明之效果] 123027.doc 200828485 依據本發明之姿勢變換裝置及裝備有此裝置之基板搬運 裝置，由於可同時施行對姿勢變換裝置之基板搬入及由該 裝置向下游側之基板搬出，故可更順利地施行伴同姿勢變 換之基板搬運。因此，依據裝備有此種姿勢變換裝置之基 板處理裝置專，可避免基板處理之進行受到基板之姿勢變 換動作限制之缺失，其結果，可提高生產率。 【實施方式】 姿么利用圖式說明有關本發明之實施型態。 圖1係模式地表示裝備有本發明之姿勢變換裝置之基板 處理裝置（適用本發明之基板搬運裝置之基板處理裝置）。 本圖所示之基板處理裝置丨係一面搬送矩形之LCD用玻 璃基板s(以下僅稱為基板s)，一面對其表面連續逐次施行 洗淨•抗蝕劑塗佈•曝光•顯影等之處理，如同圖所示， 包含有索弓丨器部2、洗淨部4、抗蝕劑塗佈部6、曝光部8、 顯影部10、烘烤部12等（以下，必要時稱為各處理部 4 12)而’構成一面將由配置於前述索引器部2之匣c取 出之基板逐次交付於各處理部4〜12，施行特定之處理後， 最後收納於索引器部2之原來的匣c中。 在索引器部2中，配備有具有支撐基板8用之平面視1;字 型（或梳形）手臂之水平多關節型之機器人尺丨，利用此機器 人R1施行匣C、洗淨部4及烘烤部12之間之基板s之搬送（接 受與交付）。又，在各處理部4〜12之間，也配備有與上述 機器人R1同樣之水平多關節型之機器、R2〜R4，利用此等 機器人R2〜R4施行在各處理部4〜12之間之基板§之搬送。 123027.doc -10- 200828485 又，在洗淨部4、抗蝕劑塗佈部6、顯影部1〇及烘烤部 12，設有互相劃分之複數處理室，基板s可一面在此等處 理室間藉由滾筒輸送機等搬送，一面被施以特定之處理。 圖2係概略地表示在此基板處理裝置1中適用本發明之部 伤之洗淨部4之構成。 洗淨部4具有由索引器部2接受基板S，並將其姿勢由水 平姿勢變換成傾斜姿勢之基板接受室（省略圖示）、對基板 S施以各種洗淨處理之數種洗淨室* a、使洗淨處理後之基 板S乾燥之乾燥室4b及使乾燥處理後之基板s之姿勢由傾斜 姿勢回復（變換）成水平姿勢之姿勢變換室4c。 在基板接受室中，配備有接受由索引器部2搬送來之基 板S而將其搬送至洗淨室4a之滚筒輸送機、及切換此輸送 機之姿勢之切換機構。此切換機構雖省略圖示，但構成可 在以水平姿勢支撐基板s之水平狀態與以傾斜姿勢（向與搬 送方向正交之方向傾斜之姿勢）支撐基板S之傾斜狀態之間 切換前述輸送機之姿勢。也就是說，在水平狀態之滾筒輸 送機接受機器人R1搬送來之基板S後，將此滾筒輸送機切 換成傾斜狀態，即可將基板s由水平姿勢變換成傾斜姿勢 而搬送至洗淨室4 a。 在各洗淨室4a ’設有接受由基板接受室搬送來之基板S 而以傾斜姿勢搬送之滾筒輸送機14、及對此滚筒輸送機14 所搬送之基板S施行特定之洗淨處理之洗淨工具。又，在 圖不之洗淨室4a ’夾著滚筒輸送機1 5而在其上下兩側配備 喷霧器型之供液喷嘴20作為前述洗淨工具，藉此，構成可 123027.doc 200828485 對基板s之上面及下面，喷附洗淨液，以洗淨搬送中之基 板s。又’洗淨工具並不限定於圖示之洗淨工具，可依照 基板大小及洗淨液之種類等配備最適合之洗淨工具。 在乾燥室4b ’設有接受由洗淨室4a搬送來之基板s而以 傾斜姿勢加以搬送之滾筒輸送機丨5、及配備於此滚筒輸送 機1 5之上下兩側之供氣喷嘴2丨，可對搬送中之基板s，由 前述供氣噴嘴21喷附高壓空〔氣而除去洗淨液，藉此使基板 S乾燥。 s 在姿勢變換室4c，配備有接受由乾燥室4b搬送來之基板 S ’將其姿勢由傾斜姿勢回復成水平姿勢而交付下游侧之 機器人R2之姿勢變換裝置3〇。此姿勢變換裝置3〇在變換基 板S之姿勢之點上，在功能上雖與前述基板接受室之變換 機構共通’但為了更圓滑地將洗淨處理後之基板S搬送至 其次之製程’採用如下之構成。 圖3係表示姿勢變換裝置3〇之正面圖（圖2之πΐ-ΙΙΙ線箭視 圖）。如本圖所示，姿勢變換裝置30具有收容由乾燥室仆 搬送來之基板S用之基板收容單元4〇(相當於本發明之基板 收容機構）。 在此基板收容單元40，設有上下二段之收容部4〇A、 40B(稱為）。此等收容部4〇a、40B均由排列於基板搬送方 向之滾筒輸送機構成複數之搬送滾筒46。 各收谷部40A、40B係構成可分別切換其姿勢，在此姿 勢切換之同時，如上所述，可將基板S之姿勢由傾斜姿勢 變換成水平姿勢。詳言之，各收容部4〇A、40B之框42係 123027.doc -12- 200828485 經由平行地向基板搬送方向延伸之樞軸44連結於基板收容 單元40之框34,藉此，可擺動自如地將各收容部4〇a、 40B支樓於基板收容單元40。而，將分別固定於基板收容 單元40(框34)之汽缸49之桿前端連接於各收容部4〇a、 40B。依照對汽缸49之空氣之給排切換，使各收容部 ' 4〇A、4〇B分別在樞軸44周圍擺動，個別地切換成傾斜狀 態（以傾斜狀態支撐基板8之狀態；相當於本發明之第i姿 勢）與水平狀態（以水平狀態支撐基板3之狀態；相當於本 ( 發明之第2姿勢）。又，同圖中符號48係由側方支撐基板s 之側支撐滾筒。 基板收容單元40係構成可對裝置框32升降，並可藉由馬 達36所驅動。詳言之，在裝置框32，設有向上下方向延伸 之固定執（省略圖示）、及與此固定執平行地延伸而藉由馬 達36旋轉驅動之滾珠螺釘軸38，在前述固定執升降自如地 女衣基板收谷單元40，並在設於於單元4〇之圖外之螺帽部 I 伤螺&插入刖述滾珠螺釘軸3 8。而，藉前述馬達3 6正反轉 驅動滾珠螺釘軸38時，可在前述第}收容部4〇A排列於乾燥 至4b之滾疴輸送機15 ’且第2收容部4〇b配置於可對機器人 R2施行基板收付之區域内之第H立置（圖2中附上符號？1而 以實線表示之位置）、與第2收容部4〇B排列於乾燥室仆之 滾筒輸送機15，且第！收容部4〇A配置於可對機器人&2施 行基板收付之區域内之第2位置（圖2中附上符號p2而以假 想線表示之位置）之間，使基板收容單元40移動。 又’在本實施型態中，各收容部40A、40B之框42、樞 123027.doc -13- 200828485 轴44及汽缸49等相當於本發明之姿勢變換機構，上述固定 軌滾珠螺釘軸38及馬達36等相當於本發明之變位機構。 ，、人主要以由洗淨部4至抗蝕劑塗佈部6之基板s之搬 送動作為中心，與其作用同時說明有關此基板處理裝置i 之動作。 在此基板處理裝置丨中，係藉由收納被處理基板$之匣c 載置於索引器部2時開始執行處理動作。首先，機器人幻 移動至與ϋ C對向之位置，用手臂取出以水平姿勢多段收 納於匣C中之基板S。而，將該基板s送至洗淨部4之基板接 受室而載置於滾筒輸送機上。 如此將基板s搬入基板接受室時，基板接受室之滾筒輸 送機藉切換機構之作用而由水平狀態變換成傾斜狀態，藉 此，將基板S由水平姿勢變換成傾斜姿勢。此姿勢變換完 畢時’滾筒輸送機起動而開始基板s之搬送，基板s會以保 持傾斜姿勢不變地由基板接受室被搬送至相鄰之洗淨室 4a ’再經過相鄰之另一洗淨室4a後，被搬送至乾燥室4b， 藉此’對基板S逐次施行洗淨處理與乾燥處理。 乾燥處理完畢之基板S再被搬送至姿勢變換室4c，於 此’被姿勢變換裝置30由傾斜姿勢復原為原來之水平姿 勢。 詳加說明時，首先，在基板S被搬送至姿勢變換室钧之 前’基板收容單元40即已被設定為可接受基板S之狀態。 具體而言，基板收容單元40被設定於第1位置或第2位置中 之一方位置（在此，以被設定於第1位置（圖2之二點短劃線 123027.doc -14· 200828485 所丁之位置）之h形進行說明），再將基板收容單元糾之2個 收合口P 40A 40B中排列於乾燥室#之滾筒輸送機之一 方（在此為第1收容部40八）設定於傾斜狀態。且將第^收容 部40B設定於水平狀態。 、，而，藉由滾筒輸送機15之作動，將基板“乾燥室缝 迖至姿勢麦換至4c，藉以將基板s搬入前述第1收容部 4GA。此搬入結束時，藉馬達％之作用，將基板收容單元 、40之位置由前述第1位置切換成第2位置（圖1之實線所示之 ί， 位置），並在此位置切換動作中，藉汽缸49之作用將第1收 谷部40Α由傾斜狀態變換成水平狀態，將第2收容部4〇β由 水平狀態變換成傾斜狀態。藉此，將第i收容部4〇Α之基板 s之安勢由傾斜姿勢變換成水平姿勢。又，第2收容部4〇Β 成為傾斜狀態而排列於乾燥室仆之滚筒輸送機15，完成次 一基板S之接受準備。 基板收容單元40之位置切換完成時，藉配置於洗淨部4 、 與抗蝕劑塗佈部6間之機器人R2，由第1收容部40Α以水平 姿勢取出基板S。具體而言，如圖3之二點短劃線所示，將 機器人R2之手臂50插入第1收容部40Α之搬送滾筒46間之 ’ 間隙，藉此手臂5〇由下側托起基板S，即可將基板S由姿勢 .變換裝置30(洗淨部4)取出而藉此機器人R2將其搬送至其 次之抗#劑塗佈部6。 又，如此在第1收容部40Α中施行基板S之搬出之期間， 在乾燥室4b完成乾燥處理之後續之基板s也與上述同樣地 會被搬入他方側之第2收容部40B。也就是說，可並行地施 123027.doc -15- 200828485 行由姿勢變換室4c之基板s之搬出動作、與對姿勢變換室 4c之基板S之搬入動作。 如此由第1收容部40A之基板S之搬出及對第2收容部40B 之後續基板S之搬入完成時，基板收容單元4〇會由第2位置 被切換至第1位置，並在此切換動作中，切換各收容部 40A、40B之姿勢，藉此，進行收容於第2收容部4〇b之基 板S之姿勢變換、與收容於第1收容部4〇a之基板之接受準 備。而’基板收容單元40被設定於第2位置時，並行地施 行利用機器人R2之由第2收容部40B之基板S取出、及對第 1收容部4〇A之後續基板S之搬入。 又’機器人R2係構成可在一定範圍内升降，在由各收容 部40A、40B取出基板S之際，如圖2所示，將前述手臂5〇 配置於對應於各收容部40A、40B之高度位置，也就是 δ兒’在基板收谷早元4 0設定於第1位置之狀態下，將手臂 50配置於對應於弟1收容部4〇α之高位置，又，在設定於第 2位置之狀態下，將手臂50配置於對應於第2收容部4〇β之 南位置。藉此’可由如上述變位之兩收容部4〇a、40Β毫 無障礙地施行基板S之取出。 如此，完成由第2收容部40B之基板S之搬出、與對第“文 容部40A之後續基板s之搬入時，其後，與上述同樣，一面 交互切換基板收容單元40之位置，變換由乾燥室仆搬送之 基板S之姿勢而將其搬送至抗蝕劑塗佈部6。 如以上所述，在此基板處理裝置丨中，一面以傾斜姿勢 搬送基板S，一面在洗淨部4中實施洗淨•乾燥處理後，將 123027.doc -16· 200828485 基板s之姿勢變換水平姿勢後，搬送至抗蝕劑塗佈部6，但 如以上所述，在此基板處理裝置1中，可並行地施行對姿 勢變換室4c(姿勢變換裝置30)之基板s之搬入（接受）與由姿 勢變換室4c向抗蝕劑塗佈部6之基板s之搬出（交付），故可 由伴同姿勢變換之洗淨部4圓滑地施行對抗蝕劑塗佈部6之 基板S之搬送。 因此，與在基板之姿勢變換後至姿勢變換裝置被復位為 止之較長期間，不能將後續之基板S搬入姿勢變換室之以 往之此種裝置相比，可有效地避免基板8之處理之進行速 度受到姿勢變換動作控制之缺失，其結果，可提高基板處 理裝置1之生產率。 又’上述基板處理裝置1或姿勢變換裝置3 〇及含該裝置 3〇之基板搬送裝置係本發明之實施型態之例示，而其具體 的構成可在不脫離本發明之要旨之範圍内適宜地加以變 更。例如，也可採用如以下之構成。 (1)對姿勢變換裝置30，也可如圖4所示，進一步串聯地 配置基板交付裝置60。此基板交付裝置6〇係使被姿勢變換 裝置3 0變換姿勢後之基板s之高度位置恢復至原來之高度 位置（由乾燥室4b搬入至姿勢變換室4c之際之基板s之高度 位置；以下稱基準高度位置）而交付給機器人R2。此基板 父付裝置60雖未詳加圖示，但設有在上下二段具有基板8 之收谷部70A、70B之可升降之基板收容單元7〇，各收容 部70A、70B(稱為第1收容部70A、第2收容部70B)除了僅 以水平姿勢收容基板S之點以外，呈現與前述姿勢變換裝 123027.doc • 17 - 200828485 置30同一構成。而，藉使基板收容單元7〇與姿勢變換裝置 3 0之基板收容單元4〇成一體地升降，而構成可由對應之收 容部70A、70B接受被收容於基板收容單元4〇之各收容部 40A、40B之姿勢變換後（水平姿勢）之基板s而交付至機器 人R2。 說明具體的動作時，首先，在姿勢變換裝置3〇之基板收 容單元40被設定於第！位置之狀態下，將基板s搬入該第J 收容部40A。接著，使基板收容單元4〇由第1位置移動（上 升）至第2位置而由基準高度位置托起基板s，並與此連動 地使姿勢變換裝置60之基板收容單元70上升。而，在此位 置切換完成時，由基板收容單元40之第1收容部4〇a將基板 S搬送至基板收容單元6〇之第1收容部7〇A，在此搬送完成 時，姿勢変換装置30之基板収容單元40由第2位置移動（下 降）至第1位置，並與此連動而使姿勢変換装置6〇之基板収 容單元70下降，藉此使基板S回到基準高度位置。如此完 成位置之切換時，收容於基板收容單元7〇之第1收容部7〇A 之基板S在基準高度位置藉由機器人R2取出。又，關於被 由基板收容單元40之第2收容部40B接受之基板s，除了上 升與下降相反以外，也依據上述動作回到基準高度位置。 如此，依據使基板S回到與姿勢變換前之高度位置相同 之咼度位置之構成，由於可在一定之高度位置（即基準高 度位置）施行對機器人R2之基板S之交付，故無必要依照收 容基板S之收容部40A、40B切換機器人R2之高度，相對 地’可減輕機器人R2之控制負擔。 123027.doc •18- 200828485 (2)實施型態之姿勢變換裝置3Q如上所述，雖採用將收 容部4〇A、4〇B設成上下二段之構成，但例如如圖5所示， 也可將收容部40A、40B配置成左右二列，也就是說，在 與基板搬送方向正交之方向配置成橫向排列，構成使基板 收容單元40可沿著向水平方向延伸之固定執45移動。如 此，依據使基板收容單元40沿著向水平方向移動之構成， 具有可使妥勢變換裝置3 0在上下方向小型化之優點。但， 若考慮姿勢變換裝置30之空間效率（佔有地板面積之削 減），則以上述實施型態之構成較為有利，故採用何種構 成，只要依據基板處理裝置1之具體的構成及可設置之空 間加以決定即可。 又，在此種圖5所示之構成之情形，也可並設有使因姿 勢變換裝置30之姿勢變換而向水平方向偏移之基板s之位 置回到原來位置（由乾餘室4b搬入姿勢變換室4c之際之基 板S之位置）用之依據上述例（2)之基板交付裝置。 ί) (3)在實施型態之姿勢變換裝置3〇中，如圖3所示，雖將 各收容部40 A、40B支撐成可在該等之中央部份擺動，但 例如’也可構成將各收容部40 A、40B支撐成可在其一端 (圖3中之左端）擺動。即，只要能將收容部40A、40B切換 成水平狀態與傾斜狀態，其具體的構成並不受實施型態之 限制。但，如實施型態一般，採用使各收容部40A、40B 可在該等之中央部份（基板S之中央部份）擺動之構成時， 即使在同一斜度下，與如上述般將各收容部40A、40B支 撐成可在其一端擺動之構成相比，對支點（樞轴44)之收容 123027.doc -19- 200828485 部40A、40B之上下方向之變位量（高低差）也較小。因此， 相對地，汽缸49之驅動行程也可以較短，在使姿勢變換裝 置30在上下方向小型化上較為有利。 ⑷在上述實施型態中，雖說明有關在對基板S連續施行 洗淨•抗蝕劑塗佈•曝光•顯影等之處理之基板處理裝置】 中，將本發明之姿勢變換裝置（含該裝置之基板搬送裝置） 適用於其洗淨部4之部份之例，但當然本發明也可適用於 洗淨部4以外之各處理部6〜12。 又’在上述實施型態中，雖說明有關設置滾筒輸送機 (滾筒輸送機15)作為對姿勢變換裝置搬入基板之上游侧搬 送機構，另一方面，設置水平多關節型之機器人（機器人 R2)作為搬送姿勢變換裝置之基板之下游侧搬送機構之情 形為例而說明本發明之適用情形，但本發明也可適用於設 置水平多關節型機器人作為上游側搬送機構，另一方面， 設置滾筒輸送機作為下游側搬送機構之情形，其適用並不 文上游側及下游側搬送機構之構成所限制。 又，在上述實施型態中，雖將以傾斜姿勢搬送來之基板 變換成水平姿勢而搬送至下游側之情形為例，說明有關本 發明之適用之情形，但本發明當然也可適用於與此相反之 情形’也就是說’將以水平姿勢搬送來之基板變換成傾斜 妥勢而搬送至下游側之情形。就更一般性之論點而言，可 使用於配合在互異之第1姿勢與第2姿勢之間之姿勢變換之 基板之搬送。 【圖式簡單說明】 123027.doc -20- 200828485 圖1係表示適用本發明之基板處理裝置之平面模式圖。 圖2係表示洗淨部（洗淨室、乾燥室及姿勢變換室）之構 成之模式的剖面圖。 圖3係表示設於洗淨部（姿勢變換室）之姿勢變換裝置之 構成之正面圖（圖2之III-III線箭視圖）。 • 圖4係表示在姿勢變換室進一步配備基板收付裝置之例 • 之洗淨部模式的側面圖。 圖5係表示姿勢變換裝置之另一構成之正面圖（對應於圖 Ο 3之圖）。 【主要元件符號說明】 1 基板處理裝置 2 索引器部 4 洗淨部 4a 洗淨室 4b 乾燥室 4c 姿勢變換室 6 抗钱劑塗佈部 8 曝光部 10 顯影部 12 烘烤部 30 姿勢變換裝置 40 基板收容單元 40A 第1收容部 40B 第2收容部 123027.doc 200828485 c 匣 R1 〜R4 機器 S 基板 人 ϋ 123027.doc •22-[Technical Field] The present invention relates to a glass substrate for a FPD (flat panel display) such as an LCD (Liquid Crystal Display) PDP (plasma display), a glass substrate for a photomask, and a printed circuit board. A substrate processing apparatus such as a semiconductor substrate. • [Prior Art] Conventionally, a substrate processing apparatus that performs various processing on a substrate while the substrate is being conveyed is generally known (in recent years, in order to speed up processing and high processing) In the substrate processing apparatus that performs the processing while changing the posture of the substrate from the horizontal posture to the inclined posture, or the reverse direction is appropriately changed, the substrate processing apparatus is equipped for use in transportation. For example, in the patent document, a device for changing a posture (a posture conversion device) discloses a device that holds a substrate in an inclined posture by a rising pin and holds it horizontally, and supports the substrate by a robot hand on the lower side and transports the substrate to the downstream side. Further, Patent Document 2 discloses that a portion of the horizontal conveyor I is transported in advance and a portion that is inclinedly transported in the roller conveyor for transporting the substrate, and in the horizontal transport portion, the terminal portion is configured to be driven by the cylinder in advance. Posture, one side - the substrate is changed from a horizontal position to a tilted position, and the device is transported. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2005-217020 [Patent Document 2] Japanese Patent Application Laid-Open No. ueuio No. Publication No. [0271] doc 200828485 However, it is disclosed in Patent Document 1. In the device, after the posture is changed, the substrate cannot be moved into the posture changing position until the rising pin is completely lowered by the robot hand, so that the processing speed of the substrate tends to be controlled by the posture changing operation. In particular, in a large-sized substrate, the height difference at the time of posture change is large, and it takes time to raise and lower the rising pin. Therefore, the above tendency is strong, and it is one of the negative factors in productivity improvement. Patent Document 2 discloses In the device, after the substrate after the posture change is completely transported to the downstream side, the second substrate cannot be carried into the terminal portion until the roller conveyor (the terminal portion of the horizontal transport) is returned to the original state, so the situation and the patent The problem of Document 1 is the same. The present invention has been made in view of the above circumstances, and its object is to transfer the substrate while carrying it. The productivity of the substrate processing apparatus that performs the processing by changing the substrate posture. [Technical means for solving the problem] In order to solve the above problems, the posture changing device of the present invention is interposed to the upstream side conveying mechanism of the first ampo. The second posture of the substrate transported by the upstream transport mechanism is converted to the second posture and transferred to the downstream transport mechanism, and includes the second transport mechanism that is different from the first posture. The substrate accommodating mechanism includes first and second valley portions for arranging the substrates in a direction in which the substrates are transported, and a posture changing mechanism for switching the postures of the first and second housing portions The first posture of the substrate conveyed by the upstream transport mechanism and the second posture for transporting the substrate to the downstream transport mechanism, and the displacement mechanism for transporting the first storage unit to the upstream side 123027.doc 200828485 The substrate receiving and dispensing position, and the second housing portion corresponds to the first position of the substrate receiving and dispensing position of the downstream side conveying mechanism, and is opposite thereto Displacement between the second position of each of the accommodating portions to position the substrate accommodating mechanism; and the posture changing mechanism switches the first accommodating portion to a position shifted from the second position of the substrate accommodating mechanism to the first position In the second posture, the second housing portion is switched to the second posture, and the first housing portion is switched to the second posture in the displacement from the second position of the substrate housing mechanism to the second position, and the second housing portion is replaced. Switch to the first pose (request item 1). According to this device, the substrate housing mechanism can be alternately switched to each position, and the posture of each housing portion can be switched in this switching operation. Thereby, when the substrate accommodating mechanism is located at the first position, the substrate transported by the upstream side can be carried into the first accommodating portion. On the other hand, in parallel with the acceptance, the substrate that is first accommodated in the second housing portion can be carried out from the second housing portion to the downstream side, and similarly, when the substrate housing mechanism is in the second position, the upstream side can be The transferred substrate is carried into the second housing portion. On the other hand, in parallel with this, the substrate which is first collected in the first valley portion can be carried out from the first housing portion to the downstream side. In other words, the loading posture changing device of the substrate conveyed from the upstream side can be performed in parallel, and the substrate can be carried out to the downstream side by the device. In the device, the substrate accommodating mechanism may have the first and second accommodating portions arranged in the horizontal direction. However, from the viewpoint of space efficiency (reduction in area), it is preferable that the substrate accommodating mechanism is in the vertical direction. The first and second valley portions are arranged side by side, and the displacement mechanism is such that the substrate housing mechanism is moved up and down (request item 2). Further, in this configuration, it is preferable that one of the second posture and the second posture is a 123027.doc 200828485 horizontal posture, and the other is inclined; and the posture changing mechanism is disposed in the valley portion orthogonal to the substrate conveying direction. In the central portion of the direction, the valley portion is swung around a pivot extending in parallel with the substrate transport direction, thereby switching the housing portion to the second posture and the second posture (request item 3). According to the configuration of the posture changing mechanism, as described in the embodiment, the posture changing device can be made small in the vertical direction. On the other hand, the substrate transfer device of the present invention includes: an upstream transfer mechanism that transports the substrate in the first posture, a downstream transfer mechanism that transports the substrate in a second posture different from the second posture, and a medium The posture conversion device that converts the first potential of the substrate transported by the upstream transport mechanism into the second posture for transport by the downstream transport mechanism between the two transport mechanisms, the posture change device is as requested. The posture changing device of any one of 3 (request item 4). According to the substrate transfer device, the substrate transferred from the upstream side can be carried into the posture changing device and the substrate can be carried out to the downstream side by the substrate, so that the substrate can be prevented from being transported to the posture changing device. . Further, the downstream side transport mechanism may have a robot that has the arm that is housed in the second posture of the posture changing device and is taken out by the lower side (request item 5). As the downstream side conveying mechanism, a roller conveyor or the like may be used, and when a robot having an arm is used, the substrate on the downstream side can be conveyed more smoothly. [Effects of the Invention] 123027.doc 200828485 The posture changing device and the substrate transfer device equipped with the same according to the present invention can simultaneously carry out the substrate loading of the posture changing device and carry out the substrate to the downstream side of the device. The substrate conveyance with the posture change is performed more smoothly. Therefore, according to the substrate processing apparatus equipped with such a posture changing device, it is possible to prevent the substrate processing from being limited by the posture changing operation of the substrate, and as a result, the productivity can be improved. [Embodiment] The posture of the present invention will be described with reference to the drawings. Fig. 1 is a view schematically showing a substrate processing apparatus (a substrate processing apparatus to which the substrate transfer apparatus of the present invention is applied) equipped with the posture changing device of the present invention. In the substrate processing apparatus shown in the figure, a rectangular glass substrate s for LCD (hereinafter simply referred to as a substrate s) is conveyed, and the surface thereof is successively subjected to cleaning, resist coating, exposure, development, and the like. As shown in the figure, the treatment includes a cable slinger portion 2, a cleaning portion 4, a resist application portion 6, an exposure portion 8, a developing portion 10, a baking portion 12, and the like (hereinafter, if necessary, The processing unit 4 12) is configured to sequentially transfer the substrates taken out from the 索引c disposed in the indexer unit 2 to the processing units 4 to 12, perform specific processing, and finally store the original 索引 in the indexer unit 2. c. The indexer unit 2 is provided with a horizontal multi-joint robotic ruler having a plan view 1 and a font (or comb-shaped) arm for supporting the substrate 8, and the robot R1 is used to perform the 匣C, the cleaning unit 4, and Transfer (acceptance and delivery) of the substrate s between the baking sections 12. Further, between the processing units 4 to 12, a horizontal multi-joint type device R2 to R4 similar to the above-described robot R1 are provided, and the robots R2 to R4 are interposed between the processing units 4 to 12 by these robots R2 to R4. The substrate is transported by §. 123027.doc -10- 200828485 Further, the cleaning unit 4, the resist coating unit 6, the developing unit 1 and the baking unit 12 are provided with a plurality of processing chambers which are divided into each other, and the substrate s can be processed there. The room is transported by a roller conveyor or the like, and a specific process is applied. Fig. 2 is a view schematically showing the configuration of the cleaning unit 4 to which the partial damage of the present invention is applied to the substrate processing apparatus 1. The cleaning unit 4 includes a substrate receiving chamber (not shown) that receives the substrate S by the indexer unit 2 and converts the posture from the horizontal posture to the inclined posture, and several kinds of cleaning chambers that apply various washing treatments to the substrate S. * a. The drying chamber 4b for drying the substrate S after the cleaning process and the posture changing chamber 4c for returning (converting) the posture of the substrate s after the drying process into a horizontal posture by the tilting posture. In the substrate receiving chamber, a roller conveyor that receives the substrate S conveyed by the indexer unit 2 and transports it to the cleaning chamber 4a, and a switching mechanism that switches the posture of the conveyor are provided. Although not shown, the switching mechanism is configured to switch the conveyor between the horizontal state in which the substrate s is supported in the horizontal posture and the inclined state in which the substrate S is supported in the inclined posture (the posture inclined in the direction orthogonal to the conveyance direction). The posture. In other words, after the roller conveyor in the horizontal state receives the substrate S conveyed by the robot R1, the roller conveyor is switched to the inclined state, and the substrate s can be transferred from the horizontal posture to the inclined posture and transported to the washing chamber 4 a. Each of the washing chambers 4a' is provided with a roll conveyor 14 that receives the substrate S conveyed by the substrate receiving chamber and is conveyed in an inclined posture, and a washing process for performing a specific washing process on the substrate S conveyed by the roller conveyor 14. Net tool. Further, a sprayer type liquid supply nozzle 20 is provided on the upper and lower sides of the cleaning chamber 4a' with the roller conveyor 15 as the cleaning tool, whereby the composition can be 123027.doc 200828485. The cleaning liquid is sprayed on the upper surface and the lower surface of the substrate s to wash the substrate s during transportation. Further, the cleaning tool is not limited to the cleaning tool shown in the drawings, and the most suitable cleaning tool can be provided depending on the size of the substrate and the type of the cleaning liquid. The drying chamber 4b' is provided with a roller conveyor 丨5 that receives the substrate s conveyed by the cleaning chamber 4a and is conveyed in an inclined posture, and a supply nozzle 2 that is disposed on the upper and lower sides of the roller conveyor 15. The substrate S can be dried by spraying a high-pressure air (gas) on the substrate s during transportation by removing the cleaning liquid from the air supply nozzle 21. s The posture changing chamber 4c is provided with a posture converting device 3 that receives the robot R2 that has been transported by the drying chamber 4b and returns the posture to the horizontal posture from the inclined posture to the robot R2 on the downstream side. The posture changing device 3 is functionally shared with the conversion mechanism of the substrate receiving chamber at the point of changing the posture of the substrate S. However, in order to smoothly convey the substrate S after the cleaning process to the next process, The following composition. Fig. 3 is a front view showing the posture changing device 3 (Fig. 2 π ΐ - ΙΙΙ line arrow view). As shown in the figure, the posture changing device 30 has a substrate housing unit 4 (corresponding to the substrate housing mechanism of the present invention) for housing the substrate S transported by the drying chamber. In the substrate housing unit 40, the upper and lower housing portions 4A, 40B (referred to as) are provided. Each of the accommodating portions 4A and 40B is constituted by a plurality of transport rollers 46 which are arranged in the substrate transport direction. Each of the valley portions 40A and 40B is configured to be switchable between the postures, and the posture of the substrate S can be changed from the tilt posture to the horizontal posture as described above. In detail, the frame 42 of each of the accommodating portions 4A, 40B is 123027.doc -12-200828485, and is connected to the frame 34 of the substrate housing unit 40 via a pivot 44 extending in parallel to the substrate conveying direction, thereby being swingable Each of the housing portions 4A and 40B is detachably attached to the substrate housing unit 40. Further, the rod ends of the cylinders 49 fixed to the substrate housing unit 40 (frame 34) are connected to the respective housing portions 4a, 40B. In accordance with the switching of the air to the cylinder 49, the respective housing portions '4〇A, 4〇B are swung around the pivot 44, and are individually switched to the inclined state (the state in which the substrate 8 is supported in an inclined state; The first position of the invention and the horizontal state (the state in which the substrate 3 is supported in a horizontal state; corresponds to the present invention (the second posture of the invention). Further, the reference numeral 48 in the same figure supports the roller from the side of the side supporting substrate s. The storage unit 40 is configured to be movable up and down to the device frame 32, and can be driven by the motor 36. In detail, the device frame 32 is provided with a fixed extension (not shown) extending in the up-down direction, and fixedly attached thereto. The ball screw shaft 38, which is extended in parallel and driven by the motor 36, is detachably attached to the female clothing substrate receiving unit 40, and is attached to the nut portion I of the unit 4〇. The ball screw shaft 38 is inserted and described. When the ball screw shaft 38 is driven in the forward and reverse directions by the motor 36, the first housing portion 4A can be arranged in the tumble conveyor 15' which is dried to 4b. The second housing portion 4〇b is disposed on the base of the robot R2 The H-thstand in the area where the board is received and paid (the position indicated by the solid line in FIG. 2 is attached), and the second housing portion 4B is arranged in the drying chamber of the drying machine, and the first The accommodating portion 4A is disposed between the second position (the position indicated by the symbol p2 in FIG. 2) in the region where the substrate can be received and received by the robot & 2, and the substrate housing unit 40 is moved. Further, in the present embodiment, the frame 42 of each of the accommodating portions 40A and 40B, the pivot 123027.doc -13 - 200828485, the shaft 44, the cylinder 49, and the like correspond to the posture changing mechanism of the present invention, and the fixed rail ball screw shaft 38 is provided. The motor 36 and the like correspond to the displacement mechanism of the present invention. The person mainly focuses on the substrate s from the cleaning unit 4 to the resist application unit 6 and acts on the substrate processing apparatus i. In the substrate processing apparatus, the processing operation is started when the substrate to be processed is placed on the indexer unit 2. First, the robot moves to the position opposite to the ϋ C, and the robot moves to the position opposite to the ϋ C. The arm is taken out in a plurality of stages in a horizontal posture and stored in the substrate S in the crucible C. The substrate s is sent to the substrate receiving chamber of the cleaning unit 4 and placed on the roller conveyor. When the substrate s is carried into the substrate receiving chamber, the roller conveyor of the substrate receiving chamber is horizontally operated by the switching mechanism. The substrate S is converted into a tilted state, whereby the substrate S is converted from the horizontal posture to the inclined posture. When the posture is changed, the roller conveyor is started to start the transfer of the substrate s, and the substrate s is held by the substrate receiving chamber while maintaining the inclined posture. After being transported to the adjacent washing chamber 4a' and passing through the adjacent washing chamber 4a, it is transported to the drying chamber 4b, whereby the substrate S is successively subjected to a washing treatment and a drying process. The substrate S is again transported to the posture changing chamber 4c, and the posture changing device 30 is restored to the original horizontal posture by the tilt posture. In the detailed description, first, the substrate storage unit 40 is set to the state in which the substrate S is acceptable before the substrate S is transported to the posture changing chamber. Specifically, the substrate storage unit 40 is set to one of the first position or the second position (here, it is set to the first position (the two-dot dash of FIG. 2 is 123027.doc -14·200828485) In the case of the h-shaped position of the Ding position), one of the two transfer ports P 40A to 40B which is arranged in the drying chamber # is placed in the drying chamber # (here, the first housing portion 40) Tilted state. Further, the first housing portion 40B is set to a horizontal state. By the operation of the roller conveyor 15, the substrate "drying chamber is sewn to the posture Mai to 4c, whereby the substrate s is carried into the first housing portion 4GA. At the end of the loading, the motor% is used. The position of the substrate housing unit 40 is switched from the first position to the second position (the position shown by the solid line in FIG. 1), and in the position switching operation, the first valley is used by the action of the cylinder 49. The portion 40 is converted from the inclined state to the horizontal state, and the second housing portion 4〇β is changed from the horizontal state to the tilted state. Thereby, the ampoule of the substrate s of the i-th housing portion 4 is converted from the tilt posture to the horizontal posture. Further, the second housing portion 4 is placed in a tilting state and arranged in the drying chamber of the roller conveyor 15 to complete the preparation of the next substrate S. When the position of the substrate housing unit 40 is switched, the cleaning portion is disposed in the cleaning portion. 4. The robot R2 between the resist application unit 6 and the first housing unit 40 取出 takes out the substrate S in a horizontal posture. Specifically, as shown by the dashed line in FIG. 3, the arm of the robot R2 50 Inserted between the transfer drums 46 of the first housing portion 40' With the arm 5, the substrate S is lifted from the lower side, and the substrate S can be taken out by the posture/conversion device 30 (cleaning portion 4), whereby the robot R2 transports it to the next anti-drug coating portion. 6. When the substrate S is carried out in the first accommodating portion 40A, the substrate s which is subsequently dried in the drying chamber 4b is carried into the second accommodating portion 40B on the other side in the same manner as described above. In other words, the carry-out operation of the substrate s of the posture changing chamber 4c and the loading operation of the substrate S of the posture changing chamber 4c can be performed in parallel. Thus, the substrate S of the first housing portion 40A When the loading and the loading of the subsequent substrate S of the second accommodating portion 40B are completed, the substrate accommodating unit 4 is switched from the second position to the first position, and in the switching operation, the accommodating portions 40A and 40B are switched. In this manner, the posture of the substrate S accommodated in the second housing portion 4b is changed and the preparation for receiving the substrate stored in the first housing portion 4a is performed. The substrate housing unit 40 is set to the second position. At the same time, the base of the second housing portion 40B using the robot R2 is performed in parallel. S is taken out and the subsequent substrate S of the first accommodating portion 4A is moved in. The robot R2 is configured to be movable up and down within a certain range, and when the substrate S is taken out from each of the accommodating portions 40A and 40B, as shown in Fig. 2 It is to be noted that the arm 5 is disposed at a height position corresponding to each of the accommodating portions 40A and 40B, that is, δ' is placed in the first position in the case where the substrate is received at the first position 40, and the arm 50 is disposed corresponding to In the state where the accommodating portion 4 〇 α is high, the arm 50 is placed at a position corresponding to the second accommodating portion 4 〇 β in the state of being set to the second position. The two housing portions 4〇a, 40Β perform the removal of the substrate S without any trouble. When the loading of the substrate S by the second housing portion 40B and the loading of the subsequent substrate s of the "memory portion 40A" are completed, the position of the substrate storage unit 40 is alternately switched in the same manner as described above. The position of the substrate S transported by the drying chamber is transferred to the resist application unit 6. As described above, in the substrate processing apparatus, the substrate S is conveyed in an inclined posture while being in the cleaning unit 4. After the cleaning and drying treatment is performed, the posture of the 123027.doc -16·200828485 substrate s is horizontally shifted and then transferred to the resist application unit 6. However, as described above, in the substrate processing apparatus 1, The loading (receiving) of the substrate s in the posture changing chamber 4c (posture converting device 30) and the loading (delivery) of the substrate s from the posture changing chamber 4c to the resist applying unit 6 are performed in parallel, so that the accompanying posture can be changed. The cleaning unit 4 smoothly transfers the substrate S to the resist application unit 6. Therefore, the subsequent substrate S cannot be moved into the posture for a long period of time after the posture change of the substrate and the posture conversion device is reset. Transformation room Compared with such a device, it is possible to effectively prevent the speed of the processing of the substrate 8 from being lost by the posture changing operation control, and as a result, the productivity of the substrate processing apparatus 1 can be improved. Further, the substrate processing apparatus 1 or the posture changing device 3 The substrate transport apparatus including the apparatus 3 is exemplified as the embodiment of the present invention, and the specific configuration thereof can be appropriately changed without departing from the gist of the present invention. For example, the following may be employed. (1) The posture conversion device 30 may further arrange the substrate delivery device 60 in series as shown in Fig. 4. The substrate delivery device 6 is configured to change the height of the substrate s after being changed in posture by the posture conversion device 30. The position is restored to the original height position (the height position of the substrate s when the drying chamber 4b is moved to the posture changing chamber 4c; hereinafter referred to as the reference height position) and is delivered to the robot R2. The substrate parenting device 60 is not shown in detail. However, the substrate storage unit 7A having the bottom and bottom portions 70A and 70B of the substrate 8 in the upper and lower stages is provided, and each of the housing portions 70A and 70B (referred to as a first housing portion 70A, The accommodating portion 70B) is configured in the same manner as the above-described posture changing device 123027.doc • 17 - 200828485 30 except for the point that the substrate S is accommodated only in the horizontal posture. However, the substrate accommodating unit 7 〇 and the posture changing device 3 0 The substrate accommodating unit 4 is integrally lifted and lowered, and is configured to be delivered by the corresponding accommodating portions 70A and 70B to receive the substrate s (positioned in the horizontal posture) of the accommodating portions 40A and 40B accommodated in the substrate accommodating unit 4A. In the case of the specific operation, the substrate s is carried into the J-accommodating portion 40A in a state where the substrate storage unit 40 of the posture changing device 3 is set to the first position. Then, the substrate storage unit 4 is moved (upward) from the first position to the second position, and the substrate s is lifted from the reference height position, and the substrate storage unit 70 of the posture changing device 60 is raised in conjunction therewith. When the position switching is completed, the substrate S is transported to the first housing portion 7A of the substrate housing unit 6 by the first housing portion 4A of the substrate housing unit 40, and the posture switching device is completed when the transfer is completed. The substrate storage unit 40 of 30 is moved (dropped) from the second position to the first position, and the substrate storage unit 70 of the posture changing device 6 is lowered in conjunction with this, whereby the substrate S is returned to the reference height position. When the position is switched, the substrate S accommodated in the first housing portion 7A of the substrate housing unit 7 is taken out by the robot R2 at the reference height position. Further, the substrate s received by the second accommodating portion 40B of the substrate accommodating unit 40 is returned to the reference height position in accordance with the above operation, in addition to the rise and fall. In this way, according to the configuration in which the substrate S is returned to the same position as the height position before the posture change, since the delivery of the substrate S to the robot R2 can be performed at a certain height position (ie, the reference height position), it is not necessary to follow The accommodating portions 40A and 40B accommodating the substrate S switch the height of the robot R2, and relatively reduce the control load of the robot R2. 123027.doc • 18-200828485 (2) As described above, the posture changing device 3Q of the embodiment has the configuration in which the housing portions 4A and 4B are arranged in the upper and lower stages, but as shown in FIG. The accommodating portions 40A and 40B may be arranged in two rows on the left and right, that is, in a direction orthogonal to the substrate transport direction, and arranged in the horizontal direction, so that the substrate accommodating unit 40 can be moved along the fixed direction extending in the horizontal direction. . Thus, the configuration in which the substrate housing unit 40 is moved in the horizontal direction is advantageous in that the power conversion device 30 can be downsized in the vertical direction. However, considering the space efficiency of the posture changing device 30 (occupying the reduction in the floor area), it is advantageous to adopt the configuration of the above-described embodiment. Therefore, any configuration is adopted depending on the specific configuration and configurable of the substrate processing apparatus 1. Space can be decided. Further, in the case of the configuration shown in Fig. 5, the position of the substrate s which is shifted in the horizontal direction by the posture change of the posture changing device 30 may be provided in the same position (returned from the dry space 4b). The position of the substrate S at the time of the posture changing chamber 4c is used in accordance with the substrate delivery device of the above example (2). (3) In the posture changing device 3 of the embodiment, as shown in Fig. 3, each of the accommodating portions 40A, 40B is supported so as to be swingable at the central portion, but for example, "may also be constructed Each of the housing portions 40 A, 40B is supported to be swingable at one end thereof (left end in Fig. 3). That is, as long as the accommodating portions 40A and 40B can be switched between the horizontal state and the inclined state, the specific configuration is not limited to the embodiment. However, in the embodiment, when the accommodating portions 40A and 40B can be swung in the central portion (the central portion of the substrate S), even at the same slope, each will be as described above. The accommodating portions 40A and 40B are supported so as to be swingable at one end thereof, and the displacement amount (height difference) of the upper and lower directions of the 123027.doc -19-200828485 portions 40A and 40B of the fulcrum (pivot 44) is also compared. small. Therefore, the driving stroke of the cylinder 49 can be made relatively short, and it is advantageous to reduce the size of the posture changing device 30 in the vertical direction. (4) In the above embodiment, the substrate conversion device of the present invention (including the device) is described in the substrate processing apparatus for continuously performing the processes of cleaning, resist coating, exposure, development, and the like on the substrate S. The substrate transfer device is applied to a portion of the cleaning unit 4, but the present invention is also applicable to the respective processing units 6 to 12 other than the cleaning unit 4. In the above-described embodiment, the roller conveyor (roller conveyor 15) is provided as an upstream side conveying mechanism for loading the substrate into the posture changing device, and a horizontal articulated robot (robot R2) is provided. The case where the present invention is applied as a case of the downstream side transport mechanism of the substrate of the transport posture changing device will be described as an example. However, the present invention is also applicable to the provision of the horizontal articulated robot as the upstream side transport mechanism, and on the other hand, the drum transport is provided. In the case of the machine as the downstream side conveying mechanism, the application is not limited to the configuration of the upstream side and the downstream side conveying mechanism. Further, in the above-described embodiment, the case where the substrate conveyed in the inclined posture is converted into the horizontal posture and transported to the downstream side is taken as an example, and the case where the present invention is applied will be described. However, the present invention is of course applicable to In contrast, the case where the substrate conveyed in the horizontal posture is converted into a tilted posture and conveyed to the downstream side. In a more general case, it can be used to carry out substrate transfer in a posture change between the first posture and the second posture which are different from each other. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a substrate processing apparatus to which the present invention is applied. Fig. 2 is a cross-sectional view showing a configuration of a cleaning portion (a washing chamber, a drying chamber, and a posture changing chamber). Fig. 3 is a front view showing the configuration of the posture changing device provided in the washing portion (posture changing chamber) (the arrow view of the line III-III in Fig. 2). Fig. 4 is a side view showing a cleaning unit mode in which the substrate changing device is further provided in the posture changing chamber. Fig. 5 is a front view showing another configuration of the posture changing device (corresponding to Fig. 3). [Description of main components] 1 substrate processing apparatus 2 indexer unit 4 cleaning unit 4a cleaning chamber 4b drying chamber 4c posture changing chamber 6 anti-money application unit 8 exposure unit 10 developing unit 12 baking unit 30 posture changing device 40 Substrate storage unit 40A First housing portion 40B Second housing portion 123027.doc 200828485 c 匣R1 to R4 Machine S Substrate ϋ123027.doc •22-