200817134 九、發明說明： I發明所屬之技術領域】 本發明關於玻璃基板的端面研磨裝置及其端面研磨方 法，詳細而言，本發明關於一面對玻璃基板的研磨部供給 研磨液一面對玻璃基板的端面進行研磨的技術的改良。 ί先前技術】200817134 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to an end surface polishing apparatus for a glass substrate and an end surface polishing method thereof. In detail, the present invention relates to a polishing liquid facing a glass substrate facing a glass. The technique of polishing the end face of the substrate is improved. ίPrevious technology】
眾所周知，於製造液晶顯示器（liquid crystal display )、電漿顯示器（piasma出叩㈣）、電致發光顯示器 (electro luminescent display )及場發射顯示器（如1(1 emission display)等各種圖像顯示設備用玻璃基板時，基 本採用由1片平板玻璃（flat glass)製作多片破璃基板的 方法。而且，與此相應，.目前由玻璃製造商等所製造的平 板玻璃已向大型化發展。 、該等平板玻璃於製造工程最後階段，將玻璃基板切割 為矩形且規定尺寸後，藉由對其切割端面實施研磨處理 等，而獲得最終產品。 —作為對此種玻璃基板的端面進行研磨的方法，通常於 使旋轉f ；5 (lOtation gfinding wheel)接觸朗基板的端 面的狀態下，>使該旋轉磨石姉於㈣基板雜。此時， ，了防止破璃基板的研磨部出現過熱，或者為了減小摩 擦，通常對玻璃基板的研磨部周邊供給研磨液。然而，供 ==板的研磨部周邊的研磨液，會因研磨液的供給 的旋轉方向等原因，而飛錢到玻璃基板的 、 ¥致出現如下情況：上述飛濺的研磨液中所含的It is well known for the production of liquid crystal displays, plasma displays (piasma), electroluminescent displays, and field emission displays (such as 1 (1 emission display). In the case of a glass substrate, a method of producing a plurality of glass substrates from a single flat glass is basically employed, and accordingly, flat glass manufactured by a glass manufacturer or the like has been developed to a large size. In the final stage of the manufacturing process, the flat glass is cut into a rectangular shape and has a predetermined size, and then the end surface is obtained by performing a grinding treatment on the cut end surface. - As a method of grinding the end surface of the glass substrate, Usually, in a state where the rotation f; 5 (lOtation gfinding wheel) is in contact with the end surface of the slab, > the rotating whetstone is placed on the (4) substrate miscellaneous. At this time, the polishing portion of the glazing substrate is prevented from being overheated, or In order to reduce the friction, the polishing liquid is usually supplied to the periphery of the polishing portion of the glass substrate. However, the periphery of the polishing portion for the == plate is provided. The polishing liquid may fly to the glass substrate due to the direction of rotation of the supply of the polishing liquid, etc., resulting in the following situation:
200817134 _粉附著於玻雜板的表面上，從而使減基板的表面 又到污:因此：際十月況為，對此種玻璃基板的端面研 磨裝置實施如下所示的各種對策。 例如，下述專利文獻】中揭示有如下方法:將下方開 口的外罩（防鮮（dust eGver))被覆於玻璃基板的表面 上，使外罩的開放侧端部密著於破瑪基板的表面，並使該 外罩真空吸附於玻_板的表面上，於該狀態下對玻璃基 板的端面進行研磨。又，上述專歡獻〗中揭示有如下方 法來作為其它構成··於_玻璃基板表面的狀態下配設外 罩（遮蔽盤（Shield pan))，以使該外罩覆蓋玻璃基板的表 面，亚使供給至外勒部的水自外罩與綱基板的間隙流 出^卜侧。又，於下述專利文獻2中，亦揭示有相同構成， 亚提出、有如下方法··使自外罩（外殼（hQGd))與玻璃基板 的_流出的水朝向玻璃基板的端面流動，藉此將該流出 的水用作研磨液。 ® /然而’上述專利文獻1或專利文獻2所揭示的方法中， 必須配汉外罩、，以防止研磨粉附著於玻璃基板的表面上， 因此必須確保外罩的配設空間、及另外需要保持外罩的機 構2 ’從㈣致裝置過於大型化或複雜，1且亦相應導 至衣置成本上升。並且，近年來，以液晶顯示器用玻璃基 板為，表’因不斷推進各種玻璃基板之大型化發展，而導 ，覆盍玻絲板表面的外罩必須更加大型化，從而上述問 題尤為凸顯。因此，上述相關方法無法成為具有實用性的 對策。 '、 6200817134 _The powder adheres to the surface of the glass plate, so that the surface of the substrate is further stained. Therefore, in the case of October, the end face grinding device for the glass substrate is subjected to various measures as described below. For example, in the following patent document, there is disclosed a method in which a cover (air eGver) having an opening below is applied to a surface of a glass substrate, and an open end portion of the cover is adhered to a surface of the broken substrate. The cover was vacuum-adsorbed onto the surface of the glass plate, and the end surface of the glass substrate was polished in this state. Moreover, in the above-mentioned special offer, there is disclosed a method of providing a cover (Shield Pan) in a state in which the surface of the glass substrate is placed on the surface of the glass substrate so that the cover covers the surface of the glass substrate. The water supplied to the outer portion flows out from the gap between the outer cover and the outer substrate. Further, in the following Patent Document 2, the same configuration is also disclosed, and a method is described in which the water flowing out from the outer cover (the outer casing (hQGd)) and the glass substrate is caused to flow toward the end surface of the glass substrate. This effluent water was used as a slurry. ® / However, in the method disclosed in Patent Document 1 or Patent Document 2, it is necessary to provide a Han cover to prevent the abrasive powder from adhering to the surface of the glass substrate. Therefore, it is necessary to secure the space for the cover and to additionally maintain the cover. The mechanism 2 'from (four) causes the device to be too large or complicated, and 1 also leads to an increase in the cost of clothing. In addition, in recent years, the glass substrate for liquid crystal displays has been developed because of the large-scale development of various glass substrates, and the outer cover of the surface of the glass substrate has to be enlarged. Therefore, the above related methods cannot be a practical countermeasure. ', 6
200817134 ZJOJjpu ，此’料有—種錢制上料罩，便可防止因研 磨畚使玻璃基板表面受到污染的對策。 下逑專利文獻3中揭示有如下方法：於較實施 面研磨的破璃基板研磨部更偏辆基板的搬運 嘴二搬運方向上隔開間隔的方式配設著水喷 嘴及工乳貝鳴，上述水喷嘴生成沿著 ==向，動的水流’上述空氣喷= :其：山：動的空氧流，藉此’當利用水流清洗附著於玻 离基板W的研磨粉後，可利用空氣流將該清洗水排出至 玻喊板外侧。又，專利文獻3中亦揭示有如下方法：另 外配設空氣噴嘴，生成沿著玻璃基板的表面自玻璃基板内 側朝向研磨部流動的空氣流。 曰一再者，下述專利文獻4關於玻璃基板的研磨裝置，並 柄不了如下内谷·藉由形成在離_施錢基板研磨的研 磨部的位置上的水簾（Water curtain)，形成沿著玻璃基板 表面流向玻璃基板端部側（研磨部侧）的水流，並藉由該 水流，使以大致與朗基板表面正交的方式仙的研磨液 排出至玻璃基板的端部之外，藉此防止研磨液中所含的 磨粉附著於玻璃基板表面上。 I專利文獻1】日本專利特開平10_6195號公報 ί專利文獻2】曰本專利特開平〗〇_58293號公報 I專利文獻3】曰本專利特開2〇〇6·26766公報 【專利文獻4】日本專利特開平ιμ26794〇號公報 [發明所欲解決的問題] 200817134 然而，當利用旋轉磨石等研戶 進行研磨時，飛濺的研磨她基板的端面 璃基板表面高速飛濺，此B士二、研讀大多會沿著玻 表面接觸，使玻璃基板=產地與玻璃基板 研磨粉本身雖可藉由事後清洗玻璃 士 * —於因研磨粉而使破璃基板表面上產生 耠痕Η月科，則無法實質去除該傷痕。尤立 璃基板為代表的要求表面具有高光滑度的玻i曰 ^ σ於上所34的傷痕易於成為致命性缺陷，不择導致 產品=降低:而且亦會導致作為次品而被處理致 曰此’於對玻璃基板的端面進行研磨的情形時，重要 ^t才，，研磨粉而使玻璃基板表面產生傷^的 / 況是針對上述觀點尚未採取任何對策。 美^上述專利文獻3、4中，目的均為防止研磨粉對玻璃 f =面的污染，而針對該研磨粉使玻璃基板表面產生傷 ^的狀況並未加以任何考慮。詳細而言，上述專利文獻1 ^丁的方法中’於t玻璃基板研磨部更偏玻璃基板的搬運 j下游侧三藉由沿著玻璃基板的表面而形成的水流與空 ，使附著於玻璃基板表面的研磨粉排出至破璃基板的 為邛之外，因此，自破璃基板研磨部飛濺的研磨液中所含 ，研磨秦’會於沿著玻璃基板表面的方向上急遽流動的同 ¥、’附著於玻璃基板的表面上，此時，附著的研磨粉在由 ^與空氣流排出的階段，有可能已使玻璃基板表面產生 饴痕又，如上述專利文獻3所揭示般，即便朝向玻璃基 200817134200817134 ZJOJjpu, this kind of material has a kind of money to make the material cover, which can prevent the surface of the glass substrate from being contaminated by grinding. Patent Document 3 discloses a method in which a water nozzle and a working milk beep are disposed so as to be spaced apart from each other in a direction in which the substrate is conveyed in the direction in which the glass substrate is polished. The water nozzle generates a flow along the == direction, the moving water 'the above air spray=: it: the mountain: the moving oxygen flow, whereby the air flow can be utilized after cleaning the abrasive powder attached to the glass substrate W by the water flow The washing water is discharged to the outside of the glass plate. Further, Patent Document 3 discloses a method in which an air nozzle is additionally provided to generate an air flow that flows from the inner side of the glass substrate toward the polishing portion along the surface of the glass substrate. As described above, Patent Document 4 discloses a polishing apparatus for a glass substrate, and the following inner valley is formed by a water curtain formed at a position of a polishing portion that is polished from the substrate. The surface of the glass substrate flows to the end of the glass substrate (the side of the polishing portion), and the polishing liquid is discharged to the end of the glass substrate so as to be substantially perpendicular to the surface of the substrate. The abrasive contained in the polishing liquid is prevented from adhering to the surface of the glass substrate. [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open No. PCT No. 26794A No. 200817134 However, when grinding with a grindstone or the like, the surface of the glass substrate of the substrate on which the splash is polished is splashed at a high speed, and this is a study. Most of them will contact along the surface of the glass, so that the glass substrate = the place of origin and the glass substrate grinding powder itself can be cleaned by the after-sales of the glass - because of the grinding powder, the keloid is produced on the surface of the glass substrate. Remove the scar. The Uri glass substrate is a representative of the surface with a high smoothness. The flaws on the upper surface 34 are prone to fatal defects, and the product is not reduced: it also causes the product to be treated as a defective product. In the case where the end surface of the glass substrate is polished, it is important that the powder is ground and the surface of the glass substrate is damaged. In view of the above, no countermeasure has been taken. In the above-mentioned Patent Documents 3 and 4, the purpose is to prevent contamination of the glass f = surface by the polishing powder, and there is no consideration in the case where the polishing powder causes damage to the surface of the glass substrate. Specifically, in the method of the above-mentioned Patent Document 1 'the glass substrate polishing portion is further biased to the glass substrate, the downstream side of the glass substrate 3 is attached to the glass substrate by the flow of water and the space formed along the surface of the glass substrate. Since the polishing powder on the surface is discharged to the outside of the glass substrate, the polishing liquid splashed from the polishing portion of the glass substrate, and the polishing powder will flow in the direction along the surface of the glass substrate. 'Adhering to the surface of the glass substrate, at this time, the adhered abrasive powder may have a scar on the surface of the glass substrate at the stage of being discharged from the air flow, as disclosed in the above Patent Document 3, even if it is oriented toward the glass Base 200817134
\J 板的研磨部另外形成空氣流，亦難以可靠地阻斷研磨液中 所含的研磨粉沿著玻璃基板流動，從而依然有可能^研磨 ^而使玻璃基板表面產生傷痕。 另外，上述專利文獻4揭示的方法中，由.於使以與玻 . 璃基板表，大致正交的方式而喷出的研磨液，與由水簾所 形成且沿著破璃基板表面流動的水流接觸，因此，有可能 使研磨液於沿著玻璃基板表面的方向上加逮流動。並且， φ 虽出現如上所述狀況時，研磨液中所含的研磨粉會與破璃 基板表面摩擦而猛烈地接觸，從而使破璃基板表ςΐ產 傷痕。 I發明内容】 本發明的技術性課題在於，可靠地抑制 的研磨液中所含的研磨粉而使玻璃基板表面產生傷痕的狀 況。 用以解決上述課題而發明的本發明第2裝置是包括研 磨單元與研磨液供給單元的破璃基板的端面研磨裝置，上 ， 述研磨單元一面相對於玻縣板移動一面對玻璃基板的端 2進彳Τ研磨，上料餘供給杨對_基板的研磨部周 故供给研磨液’其特f支在於包括噴水單元，該喷水單元於 利用上述研磨單元來對破璃基板的端面進行研磨時嗔水， i阻斷飛_研舰巾所含的研磨粉沿著賴基板表面流 • 動。 士根據上述衣置，藉由噴水單元喷出的水，來阻斷研磨 %氣顧研磨液巾所含的研磨粉沿著玻璃基板表面流動。 200817134 亦即’研磨粉沿著玻璃基板表面的移 — :=:水研二= 介於研磨粉與麵基板的表面之間;液體充/分 玻璃基板的表面__率本身得以降低’。、研磨粉與 又用以解決上述課題而發明的本發明第2 ====元，基板的端面研= 板的端面進行研磨，上破璃基 ^部周邊供給研磨液，其特徵在^ ^肖基板=研 广a # p制玻每基板表面上產生傷痕的狀況。又，含研 面之間，從而亦可使研磨粉與破璃基板表面== 10 200817134 ZDOJ^pn 身得以降低。 於上述裝置中’較好的是，上述喷水單元以如T古4 構成，即，以傾嵙助处占丄 、貝夂早70以如下方式 部進竹水。 破璃基板内侧朝向玻璃基板的端 速度二 噴水單元噴出的水而降低了移動 的端部之=】二2的研磨液）順利排出至破璃基板 =壯奴而使破蝴反的表面保持清潔狀態。 形成水簾以置中’較好岐，上述喷水單元所噴出的水 單元液中所含的研磨粉與喷水 抑制因研磨粉而使麵基㈣表面魅傷痕了祕 基板==為Γ的是，上述研磨單元由以與玻璃 於破璃基板的研磨部中，與娜 上述㈣磨石的移動方向相反。 可於it來’即便須研磨的玻璃基板的板厚十分薄，亦 例如職it糊且可靠地進行懒等研磨。具體而言’ 用eD_曰旋轉磨石的研磨面為剖面圓弧狀的凹部，利 轉磨石來對破璃基板的端面實施侧角（T0Und 方式;|；H、，較好的是，上述研磨液供給單元以如下 基_::周:的束區域侧朝向玻璃 门达貝出研磨液，且上述噴水單元以重點的 11 200817134 ^3t>jDpu 對坡墦基板的木研磨區域進行喷水的方式構成。 研磨液因具有防止玻璃基板出現過熱、或者減小摩擦 的功Sb，故較理想的是將該研磨液準確地供給至玻璃基板 ，研磨部，如上所述，當配置著旋轉磨石.的情形時（&其 是使旋轉磨石的研磨面為剖面圓弧狀凹部的情形時），可藉 由自玻璃基板的研磨結束區域侧朝肖玻璃j板的研磨部周 邊噴出研磨液，而將研磨液準確地供給至玻璃基板的研磨 邛中。此時’所供給的研磨液由於旋轉磨石的旋轉方向（於 玻肖基板的研座#，與玻璃基板相對於旋轉磨石的移動方 2相反的方向）的原因，會猛烈地飛濺到玻 的 =域T因此丄可藉由自喷水單元重點對該未研磨$ 7而可罪地抑制因研磨液中所含的研磨粉使玻璃 基板衣面上產生傷痕。 用以解決上述課題而發明的本發明第丨方法， 將研磨液供給至麵基_研磨㈣邊，-面使研磨單元 基板移動，以對玻璃基板端面進行研磨的玻璃 面研磨方法，其舰在於，於藉由上述研磨單元 板的端面進行研磨時噴水，以阻斷細研 中所㈣研磨粉沿著麵基板的表面流動。 事項果可達到與上述相關第1裝置所揭示的 h二：二解決上述課題而發明的本發明的第2方法， 二1=二给;=板的研磨部周邊，-面使該 离基板㈣，輯錢基板的端面進行 12 200817134 研磨的玻璃基板的端面研磨妓，其魏在於， 元對Ϊ璃基板的端面進行研磨時，對含研“ί 磨私~者破祸基板表面的移動速度.降低。.. 研 根據如此方法，可達到與上述相關第2裝置 事項相同的作用效果。 斤知不的 [發明效果]The polishing portion of the \J plate additionally forms an air flow, and it is also difficult to reliably block the flow of the abrasive powder contained in the polishing liquid along the glass substrate, so that it is still possible to cause scratches on the surface of the glass substrate. Further, in the method disclosed in the above Patent Document 4, the polishing liquid which is ejected so as to be substantially orthogonal to the glass substrate table is formed by the water curtain and flows along the surface of the glass substrate. The water flow contacts, and therefore, it is possible to cause the slurry to flow in a direction along the surface of the glass substrate. Further, when φ occurs as described above, the polishing powder contained in the polishing liquid rubs against the surface of the glass substrate and is in violent contact, so that the surface of the glass substrate is scratched. The present invention has a technical object to prevent scratches on the surface of a glass substrate by reliably suppressing the polishing powder contained in the polishing liquid. The second device of the present invention, which is invented to solve the above problems, is an end surface polishing device including a polishing unit and a polishing liquid supply unit, wherein the polishing unit moves toward the end of the glass substrate with respect to the glass plate. 2, the grinding is performed, and the supply of the remaining material is supplied to the polishing portion of the substrate, and the polishing liquid is supplied to the polishing unit. The water jet unit includes a water spray unit that grinds the end surface of the glass substrate by the polishing unit. When the water is drowning, i blocks the fly. The abrasive powder contained in the ship's towel flows along the surface of the substrate. According to the above-mentioned clothes, the water sprayed by the water spray unit blocks the grinding. The abrasive powder contained in the polishing liquid towel flows along the surface of the glass substrate. 200817134 That is, the movement of the abrasive powder along the surface of the glass substrate is: ==: Shuiyan 2 = between the abrasive powder and the surface of the surface substrate; the surface of the liquid charging/distributing glass substrate is reduced by itself. The polishing powder and the second ==== element of the present invention which is invented to solve the above problems, the end surface of the substrate is ground, the end surface of the plate is polished, and the polishing liquid is supplied to the periphery of the glass substrate. Xiao Substrate = Research on the surface of each substrate on the surface of the glass. Moreover, between the grinding surfaces and the surface of the glass substrate, the surface of the grinding powder and the glass substrate can be reduced. In the above apparatus, it is preferable that the above-mentioned water spray unit is constituted by, for example, Tugu 4, that is, the bamboo water is partially introduced in the following manner by the dumping aid. The inner side of the glass substrate is directed toward the end of the glass substrate, the water sprayed from the water spray unit, and the moving end portion is reduced. The liquid of the second side is smoothly discharged to the broken glass substrate. The surface of the broken glass is kept clean. status. Forming a water curtain to center "better", the abrasive powder contained in the water unit liquid sprayed by the water spray unit and the water spray inhibit the surface of the surface base (4) from being damaged by the abrasive powder. That is, the polishing unit is opposite to the moving direction of the (four) grindstone in the polishing portion with the glass on the glass substrate. It is possible to use the glass substrate to be polished even if the thickness of the glass substrate to be polished is very thin, for example, it is easy to grind and lazy. Specifically, the surface to be polished by the eD_曰 is a concave portion having an arcuate cross section, and the grinding wheel is used to perform the side angle on the end surface of the glass substrate (T0Und method; |; H, preferably, The polishing liquid supply unit sprays the polishing liquid toward the glass door with the beam region side of the following base::, and the water spray unit sprays the wood polishing region of the rocking substrate with the key 11 200817134 ^3t>jDpu Since the polishing liquid has a function Sb for preventing overheating of the glass substrate or reducing friction, it is preferable to accurately supply the polishing liquid to the glass substrate, and the polishing portion, as described above, is provided with a rotary grinding machine. In the case of the stone (& when the polishing surface of the rotating grindstone is a concave-shaped arc-shaped concave portion), the polishing can be performed from the polishing end region side of the glass substrate toward the periphery of the polishing portion of the glass plate Liquid, and the slurry is accurately supplied to the polishing crucible of the glass substrate. At this time, the supplied polishing liquid rotates in the direction of the grindstone (in the glass of the glass substrate, and the glass substrate relative to the rotating grindstone) Mobile party The reason for the 2 opposite directions) will violently splash into the glass = domain T. Therefore, it is possible to suppress the glass powder contained in the polishing liquid by the self-spraying unit focusing on the unmilled $7. A flaw is formed on the surface of the substrate. The third method of the present invention, which is invented to solve the above problems, supplies the polishing liquid to the surface of the surface of the substrate (the fourth side), and the surface of the polishing unit is moved to polish the end surface of the glass substrate. The surface polishing method is characterized in that water is sprayed by polishing the end surface of the polishing unit plate to block the flow of the polishing powder along the surface of the surface substrate in the fine grinding process. The second method of the present invention, which is the second method of the invention, solves the above problems, and the second method is 1-2; the periphery of the polishing portion of the plate, the surface of the substrate (4), and the end surface of the substrate are 12 200817134. The end surface of the glass substrate is polished, and the reason is that when the end surface of the glass substrate is polished, the moving speed of the surface of the substrate is reduced. The research is based on such a method. achieve The same as the matters related to the second device effects. Pounds without the known [Effect of the Invention]
根據如上所述的本發明，藉由噴水單元喷出的水 研磨時飛藏的研磨液中所含的研磨粉沿著玻璃基板表 移動速度降低，因此，即便於研磨粉與_基板表面接觸 的情形時，亦能可靠地抑制麵基板表面產生傷痕的。 ί實施方式】 以下，參照圖式對本發明的實施形態加以說明。 首先，依據圖1所示的概略平面圖，就本發明一實施 形態的玻璃基板的端面研磨裝置的整體構成加以說明 者，於本實施形態中，玻璃基板為液晶顯示器用玻璃基板。 、，如圖1所示，上述端面研磨装置1構成為如下:於水 平方向（該圖中朝右方向）上，藉由上游侧搬運單元2Α 以水平狀態搬運玻璃基板3，並且於搬運方向的下游侧藉 由與玻璃基板3鄰接的轉動單元2Χ使玻璃基板3水平轉 動90。，於搬運方向的更下游侧，於上述水平方向上藉由 與玻璃基板3鄰接的下游側搬運單元2Β來搬運水平^動 後的破璃基板3。再者，上游侧搌運單元2Α與下游侧搬運 單元2Β具備實質相同的構成，因此以下描述中，對上游 13 200817134 侧搬運單元2A加以具體說明，並省略對According to the invention as described above, the polishing powder contained in the polishing liquid accumulated by the water sprayed by the water spray unit is reduced in speed along the surface of the glass substrate, and therefore, even if the abrasive powder is in contact with the surface of the substrate In the case of the case, it is also possible to reliably suppress the occurrence of scratches on the surface of the surface substrate.实施 Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings. First, the overall configuration of the end surface polishing apparatus for a glass substrate according to an embodiment of the present invention will be described with reference to the schematic plan view shown in Fig. 1. In the present embodiment, the glass substrate is a glass substrate for liquid crystal display. As shown in FIG. 1, the end surface polishing apparatus 1 is configured such that the glass substrate 3 is conveyed in a horizontal state by the upstream side transport unit 2 in the horizontal direction (the right direction in the drawing), and is in the conveyance direction. The downstream side is horizontally rotated 90 by the rotating unit 2 邻接 adjacent to the glass substrate 3. Further, on the downstream side in the conveyance direction, the horizontally-transparent glass substrate 3 is conveyed by the downstream conveyance unit 2A adjacent to the glass substrate 3 in the horizontal direction. Further, since the upstream side transport unit 2A and the downstream side transport unit 2A have substantially the same configuration, in the following description, the upstream 13 200817134 side transport unit 2A will be specifically described, and the description will be omitted.
2B的具體說明。 』澉建早7L 上游側搬運單元2A .以如下方式構成， 例如真空韻猶_練3進行定 t搬= 璃基板3。進而，於已定位於上述上_搬運單元 狀態下所搬運的玻璃基板3的左右兩側方（盈搬運方2 交的方向的兩侧方），配設著作為研磨單元的—對旋轉磨石 4。亚且，自研磨液供給單元6將研磨液（例如，^ 供給至叉到各旋轉磨石4研磨的破璃基板3的研磨 周邊。 石σ 的 詳細而言，上述旋轉磨石4以與破璃基板3表面正六 的軸為中心進行旋轉的方式而構成，其旋轉方向於 ^ 板3的研磨部5中，與玻璃基板3的搬運方向為相反方二 (自搬運方向的下游侧朝向上游側的方向）。再者，雖未 不，但於本實施形態中旋轉磨石4的外周面（研磨面）^ 剖面近似圓弧狀的凹部，可對玻璃基板3的端面^行一二 倒圓角。 一k ▲又’上述研磨液供給單元6以如下方式構成，即，自 玻璃基板3的搬運方向的較旋轉磨石4之更偏下遊側（玻 璃基板3的研磨結束區域側），向旋轉磨石4與破^基板3 的研磨部5即將接觸的研磨面，與玻璃基板表 ^ 地喷出研磨液7。如此-來，可糊地將研磨液7 玻璃基板3的研磨部5中，從而穩定地進行破5离基板= 面研磨。 14 200817134 另3面’以上述方式供給至破璃基板3的研磨 7，以含研磨粉的狀態， ㈣ 磨部^邊朝向其内侧中央部，大致沿著玻璃基二= 基板3的兩端部分別配設喷水單元δ，自軸水單元 3玻^^^3^?㈣水，秘噴水單元8前端與破璃基板 間形成水簾9。詳細而言，該水簾9沿著與研戶液 7 :所3的研磨粉沿著玻璃基板3表面的流動方向交^ ^向（_中是與玻璃基板3側邊大致平行的方向）上带 :斷飛_研磨液7中所含的研磨粉沿著玻璃基 7 Φ ί八Γ动。如此一來’自研磨部5周邊飛賤的研磨液 的研磨粉沿著玻縣板3表_流動藉由水簾9 ::二!：，研磨粉沿著破璃基板3表面的移動速度， =磨，“研磨粉的研磨液7)與水簾9接觸後降低。 2 ’即便研磨液7中所含的研磨粉到達玻喊板3的表 匕研磨粉亦不會與破璃基板3表面猛烈地接觸，因 j可罪地抑制玻璃基板3表面產生傷痕的狀況。又，含 :磨粉的飛濺的研磨液7會因與水簾9 (自喷水單元δ喷 Ϊ = 1接觸而得到稀釋’其結果為，使液體充分介於研 士璃基板3的表面之間，因此亦可使研磨粉與玻璃 基板.3衣面_的鱗本轉 元8噴出的水的水量設為例如4〜6升/分將由料早 =’於本實卿態巾，水簾9藉由自賴基板3内 側上方向玻璃基板3端部傾斜向下進行噴水而形成。因 15 200817134 ^yoj^pir 端部之^彻粉的研顏7較佳地翻至_基板3白 3表面的縣藉由水簾9崎低了沿著玻璃基相 度，因此可將玻璃基板3的表面保_ 水簾7 而言，/藉由麟玻璃基板3的端部形成 部的有效面成於液晶顯示器用破璃基板的中央 又，：中且將該有效面保持為清潔狀態。 Φ (玻璃其Si 以使旋轉磨石4的上游側區域 端部少式，使水簾9與朗基板3的 面正二二订地形成。其原因在於，因與破璃基板3的表 面乂的軸為中心進行旋轉的上 液7大多飛濺於玻璃基板的上游倒舌4，而使研磨 (未研磨區域）供給水 域，故重點對該區域 再者，本發明可進行如下所示的各種變形。 側配亡述形態中’僅對於破璃基板3的上表面 、…口又貝水早兀8者加以說明，然而亦可 ^ 基板3的下表面側配設噴水單元。 ；玻埚 又，上述實施形態中，就以與破璃 端 平:的方式形成水簾9的情形加以了說明，然 所不，亦可使水簾9a以與玻璃基板3的倒邊 令 減的方式而形成。如此-來，水簾9a藉由於复寬 ^以一絲度的技對_基板3的端部噴水卿=方= 此’可抑制玻璃基板3於搌運路徑上的不 一"， 穩定的狀態搬運玻璃基板3。 : 攸而能以 16 200817134 又於上地貝知形態中，對如下情況加以了說明：一 面搬運玻璃基定配設於玻璃基板搬連路 徑侧方的研磨單元（旋轉磨石4)對玻璃基板3的端面進 打研t _柯_翔定_基㈣餘下，沿著須 對，每基板進行研磨的端部移動研磨單S，或者使玻璃基 =研ί料兩者伽對移動。當減方式移動研磨單元 ’以使研磨液供給單元與供水單元兩 强可ΐ研磨f70一併移動的方式而構成。進而，亦可沿著 :::的玻喊？的端部’使多個旋轉磨石相鄰接而構成 Jt70靖形時，較好的是，於各㈣磨石的對應 位置^ L設研綠供給單元減水單元。 基板：面:ίί= 九態中，以研磨液晶顯示器用玻璃 端面研磨裝】=ΓΓ明，而本發明的玻璃基板的 二磨面具有高光滑度的玻^ 射顧_ 用於电漿顯示器、電致發光顯示器及場笋 為種圖力!顯示設備用的玻璃基板咖^ 玻璃=知功能元件親以形成薄膜·材而使用的 【圖式簡單說明】 置的==林發明實施職的_基㈣端面研磨f 置的整體構成的概略平面圖。 4衣 圖。圖2疋表示上述端面研磨裝置主要部分的概略立體 17 200817134 圖3是表示上述端面研磨裝置變形例的概略立體圖。 :【主要元件符號說明】 1 :端面研磨裝置 …2Λ「上游側搬運單元......... …...... 2B :下游侧搬運單元 2X :轉動單元 3:玻璃基板 4:旋轉磨石 5 :研磨部 6:研磨液供給單元 7 :研磨液 8:喷水單元 9 :水簾 18Specific description of 2B.澉 早 早 7L upstream transport unit 2A. It is configured as follows. For example, vacuum rhyme _ _ 3 performs fixed t loading = glass substrate 3. Further, in the left and right sides of the glass substrate 3 that has been transported in the state of the above-described upper transport unit (the both sides in the direction in which the surplus transporter 2 intersects), a pair of rotating grindstones that are written as polishing units are disposed. 4. Further, the polishing liquid supply unit 6 supplies the polishing liquid (for example, to the polishing periphery of the glass substrate 3 which is polished to the respective rotating grindstones 4. In detail, the above-mentioned rotating grinding stone 4 is broken. The axis of the glass substrate 3 is rotated about the center of the sixth axis, and the direction of rotation is opposite to the direction in which the glass substrate 3 is conveyed in the polishing portion 5 of the plate 3 (from the downstream side in the conveyance direction toward the upstream side) In addition, in the present embodiment, the outer peripheral surface (polishing surface) of the rotating grindstone 4 has a substantially arc-shaped concave portion, and the end surface of the glass substrate 3 can be rounded one or two. In the above-described polishing liquid supply unit 6, the polishing liquid supply unit 6 is configured such that the downstream side of the rotating grindstone 4 in the conveyance direction of the glass substrate 3 (the polishing end region side of the glass substrate 3) is The polishing surface which is to be brought into contact with the polishing portion 5 of the rotating grindstone 4 and the substrate 3 is ejected from the glass substrate. Thus, the polishing liquid 7 can be paste-polished. Medium, thus stably breaking the substrate from the substrate = surface grinding. 14 200817134 The other three surfaces 'the polishing 7 supplied to the glass substrate 3 in the above manner is in a state containing the abrasive powder, and (4) the grinding portion is directed toward the inner center portion thereof, substantially along the glass base 2 = both ends of the substrate 3 A water spray unit δ is provided, and a water curtain 9 is formed between the front end of the secret water spray unit 8 and the broken glass substrate. In detail, the water curtain 9 is along with the researcher. Liquid 7: The polishing powder of the third layer is placed along the flow direction of the surface of the glass substrate 3 (the direction in which the film substrate 3 is substantially parallel to the side of the glass substrate 3): the breakage _ the polishing contained in the polishing liquid 7 The powder is swayed along the glass base 7 Φ ί. As a result, the grinding powder of the grinding liquid from the periphery of the grinding section 5 along the glass plate 3 table _ flow by the water curtain 9 :: two!:, grinding The moving speed of the powder along the surface of the glass substrate 3, = grinding, "the polishing liquid 7 of the abrasive powder" is lowered after contact with the water curtain 9. 2 'Even if the polishing powder contained in the polishing liquid 7 reaches the table of the glass plate 3 The 匕 abrasive powder does not violently contact the surface of the glass substrate 3, and it is sinful to suppress the occurrence of scratches on the surface of the glass substrate 3. Further, the fly contains: The polishing liquid 7 is diluted with the water curtain 9 (contacting the water spray unit δ squirt = 1), and as a result, the liquid is sufficiently interposed between the surfaces of the glass substrate 3, so that the abrasive powder can also be used. The amount of water ejected from the scale of the glass substrate .3, the surface of the slab, is set to, for example, 4 to 6 liters/min. The upper end of the glass substrate 3 is formed by spraying water obliquely downward. The film 7 of the end of the film is preferably turned over to the county of the white surface of the substrate 3 by the water curtain 9 Since the surface of the glass substrate 3 is protected by the glass base, the effective surface of the end portion forming portion of the lining glass substrate 3 can be formed on the glass substrate for liquid crystal display. The center is again, and the effective surface is kept clean. Φ (the glass has Si such that the end portion of the upstream side region of the rotating grindstone 4 is small, and the surface of the water curtain 9 and the slab substrate 3 is formed in a two-two order. The reason is that the surface of the glass substrate 3 is defective. The upper liquid 7 that rotates around the axis mostly splashes on the upstream tongue 4 of the glass substrate, and the polishing (unpolished area) is supplied to the water area. Therefore, the present invention can perform various deformations as shown below. In the case of the side-detailed description, only the upper surface of the glass substrate 3, the mouth of the glass substrate, and the water-repellent layer 8 are described. However, the water-spraying unit may be disposed on the lower surface side of the substrate 3. In the above embodiment, the case where the water curtain 9 is formed so as to be flat with the glass end is described. However, the water curtain 9a may be formed so as to be reduced from the falling edge of the glass substrate 3. In this way, the water curtain 9a is stabilized by the width of the slab by the width of the slab 3. The end of the substrate 3 is sprayed with water = square = this can suppress the unevenness of the glass substrate 3 on the transport path. Carrying the glass substrate 3: 攸 攸 可 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 16 In the case where the glass unit is placed on the side of the glass substrate transfer path, the polishing unit (rotary grindstone 4) is placed on the end surface of the glass substrate 3, and the remaining surface is drilled. Along the whisker, the grinding end of each substrate moves the grinding single S, or the glass base = grinding material is moved in pairs. When the grinding unit is moved in a subtractive manner, the polishing liquid supply unit and the water supply unit are both strong. ΐThe grinding f70 is configured to move together. Further, when a plurality of rotating grindstones are adjacent to each other to form a Jt70 shape along the end portion of the glass of the:::, preferably, each of the four (4) Corresponding position of the grindstone ^ L Set the green supply unit water reducing unit. Substrate: Surface: ίί = In the nine-state, the glass end face grinding device for grinding liquid crystal display] = ΓΓ明, and the two-surface of the glass substrate of the present invention has Highly smooth glass ^ _ for plasma display, electroluminescent display and field shoots for the picture force! Glass substrate for display equipment ^ Glass = know functional components to form a film and material used [ Simple description of the schema] Set == Lin invention Fig. 2A shows a schematic perspective view of a main part of the end surface polishing apparatus. Fig. 2 is a schematic perspective view showing a modification of the end surface polishing apparatus. : [Description of main component symbols] 1 : End surface grinding device... 2" "Upstream side conveying unit............... 2B: Downstream side conveying unit 2X: Rotating unit 3: Glass substrate 4 : Rotary grindstone 5 : Grinding portion 6 : Grinding liquid supply unit 7 : Grinding liquid 8 : Water sprinkling unit 9 : Water curtain 18