TW200815941A - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

Info

Publication number
TW200815941A
TW200815941A TW096123989A TW96123989A TW200815941A TW 200815941 A TW200815941 A TW 200815941A TW 096123989 A TW096123989 A TW 096123989A TW 96123989 A TW96123989 A TW 96123989A TW 200815941 A TW200815941 A TW 200815941A
Authority
TW
Taiwan
Prior art keywords
polarized light
phase difference
light
optical system
illumination
Prior art date
Application number
TW096123989A
Other languages
English (en)
Chinese (zh)
Inventor
Kenichiro Mori
Akihiro Yamada
Noboru Osaka
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200815941A publication Critical patent/TW200815941A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096123989A 2006-07-03 2007-07-02 Exposure apparatus TW200815941A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006183851A JP2008016516A (ja) 2006-07-03 2006-07-03 露光装置

Publications (1)

Publication Number Publication Date
TW200815941A true TW200815941A (en) 2008-04-01

Family

ID=39073278

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096123989A TW200815941A (en) 2006-07-03 2007-07-02 Exposure apparatus

Country Status (4)

Country Link
US (1) US7602474B2 (https=)
JP (1) JP2008016516A (https=)
KR (1) KR100847634B1 (https=)
TW (1) TW200815941A (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007042047A1 (de) * 2006-09-06 2008-03-27 Carl Zeiss Smt Ag Teilsystem einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
TW200938957A (en) * 2008-03-05 2009-09-16 Nanya Technology Corp Feedback system and feedback method for controlling power ratio of light source
WO2009152867A1 (en) 2008-06-20 2009-12-23 Carl Zeiss Smt Ag Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method
US8325417B1 (en) * 2008-09-23 2012-12-04 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for producing an annular far-field patterned beam(s)
JP2010097986A (ja) * 2008-10-14 2010-04-30 Nikon Corp 投影光学系、露光装置、及びデバイス製造方法
JP2012004465A (ja) * 2010-06-19 2012-01-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP6084507B2 (ja) * 2012-04-16 2017-02-22 Hoya株式会社 マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法
US8957374B2 (en) * 2012-09-28 2015-02-17 Corning Incorporated Systems and methods for measuring birefringence in glass and glass-ceramics
JP5839076B2 (ja) * 2014-04-25 2016-01-06 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
CN116909107B (zh) * 2023-07-25 2024-03-01 上海图双精密装备有限公司 一种光刻设备照明用光源系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3803991A (en) * 1972-05-22 1974-04-16 H Leader Method of inserting liners in bags
US5677757A (en) 1994-03-29 1997-10-14 Nikon Corporation Projection exposure apparatus
JP2000277413A (ja) * 1999-03-24 2000-10-06 Canon Inc 露光量制御方法、露光装置およびデバイス製造方法
JP3710321B2 (ja) * 1999-04-01 2005-10-26 キヤノン株式会社 露光量制御方法、露光装置およびデバイス製造方法
JP4521896B2 (ja) * 1999-06-08 2010-08-11 キヤノン株式会社 照明装置、投影露光装置及びデバイス製造方法
KR100338932B1 (ko) * 1999-10-28 2002-05-30 박종섭 웨이퍼 노광 장치
JP4289755B2 (ja) 2000-02-24 2009-07-01 キヤノン株式会社 露光量制御方法、デバイス製造方法および露光装置
JP4545874B2 (ja) * 2000-04-03 2010-09-15 キヤノン株式会社 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法
JP2003133216A (ja) 2001-10-26 2003-05-09 Canon Inc 露光方法及び露光装置
JP2003297729A (ja) 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
TW200412617A (en) 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method

Also Published As

Publication number Publication date
KR100847634B1 (ko) 2008-07-21
JP2008016516A (ja) 2008-01-24
US7602474B2 (en) 2009-10-13
US20080123055A1 (en) 2008-05-29
KR20080003727A (ko) 2008-01-08

Similar Documents

Publication Publication Date Title
TWI573175B (zh) 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TW200815941A (en) Exposure apparatus
TW201812431A (zh) 光學單元
JP2006005319A (ja) 照明光学系及び方法、露光装置及びデバイス製造方法
CN1690861B (zh) 照明光学系、曝光装置、及器件制造方法
JP4095376B2 (ja) 露光装置及び方法、並びに、デバイス製造方法
KR20060039925A (ko) 조명 광학 장치, 노광 장치 및 노광 방법
US7525639B2 (en) Exposure apparatus and method, and device manufacturing method using the same
US7057708B2 (en) Projection optical system, exposure apparatus and device fabrication method
JPH06244082A (ja) 投影露光装置
US8576378B2 (en) Illumination optical system, exposure apparatus, and device manufacturing method
US20090040497A1 (en) Exposure apparatus, adjusting method, exposure method, and device fabrication method
US20060197933A1 (en) Exposure apparatus
US20050237502A1 (en) Exposure apparatus
JP2008270502A (ja) 露光装置、露光方法およびデバイス製造方法
JP2008182112A (ja) 露光装置及びデバイス製造方法
JP2010141091A (ja) 偏光制御ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2007287885A (ja) 照明光学装置、露光装置、およびデバイス製造方法
JP3438730B2 (ja) 走査型露光装置、その走査型露光装置を用いるデバイス製造方法
WO2014077404A1 (ja) 照明光学系及び照明方法、並びに露光方法及び装置
HK1130091B (en) Exposure device of projector, exposure method and device manufacturing method