TW200809977A - Nitrogen enriched cooling air module for UV curing system - Google Patents

Nitrogen enriched cooling air module for UV curing system Download PDF

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TW200809977A
TW200809977A TW096123136A TW96123136A TW200809977A TW 200809977 A TW200809977 A TW 200809977A TW 096123136 A TW096123136 A TW 096123136A TW 96123136 A TW96123136 A TW 96123136A TW 200809977 A TW200809977 A TW 200809977A
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Taiwan
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fluid
flow
nitrogen
ozone
hardening
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TW096123136A
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Chinese (zh)
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Dustin W Ho
Juan Carlos Rocha-Alvarez
Bois Dale R Du
Scott A Hendrickson
Sanjeev Baluja
Ndanka O Mukuti
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Applied Materials Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67109Apparatus for thermal treatment mainly by convection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

A re-circulating cooling system can be used with a curing system in order to reduce the exhaust requirements for the system. Further, using a cooling fluid such as nitrogen reduces the production of ozone and the sealing requirements for the system. A simple heat exchanger can be used betweenreture and supply reservoirs in order to remove heat added to the re-circulating fluid during circulation past the curing radiation source. The nitrogen can come from a nitrogen source, or from a membrane or other device operable to split feed gas into its molecular components to provide a source of gas rich in nitrogen. An ozone destruction unit can be used with such a cooling system to reduce the amount of ozone to acceptable levels, and to minimize consumption of the nitrogen. A catalyst can be used to deplete the ozone that does not get consumed during the reaction.

Description

200809977 九、發明說明: 【發明所屬之技術領域】 富含氮之冷卻氣 本發明係關於用於紫外線硬化系統的 體模組。 【先前技術】 諸如氧化石夕(S i Ο x )、石炭化石夕(ς · , )和锼摻雜的氧化 石夕(SiOCx )膜的材料發現廣泛應用於半導體, 中。在半導體基板上形成該含矽 $ 内的化學氣相沈積(CVD )製程200809977 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a body module for use in an ultraviolet curing system. [Prior Art] Materials such as oxidized stone (S i Ο x ), Carboniferous fossil (ς · , ), and antimony-doped oxidized stone oxide (SiOCx ) films have been found to be widely used in semiconductors. Forming a chemical vapor deposition (CVD) process within the 矽 $ on a semiconductor substrate

件的製造 膜的一種方法爲通過腔室 、。例如,在矽供應源和氧 供應源之間的化學反應可能導致㈤ 子双固相氧化矽在設置在 CVD腔室内的半導體基板頂部上 1上的沈積。在另一實施例 中,碳化矽和碳摻雜的氧化矽膜可 J田包括至少一種si_C鍵 的有機矽烷源的CVD反應形成。 水通常爲該有機矽烷化合物的CVD反應的副産物^這 樣,水可以以水氣形式物理吸附到膜中或者以si_〇H化學 鍵結合到所沈積膜中。水結合的這些形式的任意一種通常 都是不期望的。因此,不期望的化學鍵和化合物(諸如水) 較佳爲從所沈積的含碳膜中去除。同樣,在一些特定的 CVD製程中,需要去除犧牲材料(由在CVD期間用以增 加孔隙度的成孔劑(porogen )引起)的熱不穩定的或者不 安定的有機部分。 一種用於解決該問題的公知方法爲傳統的熱退火。來 自該退火的能量以有序膜的更加穩定的鍵屬性替代不穩定 6 200809977 的、不期望的化學鐽,從而增加膜密度。傳統的熱退火步 驟一般具有相對長的持續時間(例如,通常爲3 0分鐘至2 個小時),因此消耗了非常多的處理時間並滅幔了總製造過 程。 解決這些問題的另一方法爲利用紫外線(UV )輻射以 有助於CVD生産的膜(諸如氧化矽、碳化矽和碳掺雜的氧 化石夕膜)的後處理。例如,美國專利n 〇 · 6,5 6 6,2 7 8和 6,614,181’都爲應用材料公司的並在此引入其全部内容作 爲參考’描述了用於CVD碳摻雜的氧化矽膜的後處理的 UV光的使用。用於硬化和密實cvd膜的UV輻射的使用 可以降低單獨晶圓的總熱預算並加速製造過程。多個各種 U V硬化糸統已經發展,其可以有效用於硬4 fc»沈積在基板 上的膜。其中一個實施例在2006年5月9曰申請的題目爲 “High Efficiency UV Curing System” 的美國申請 N〇 : 11/124,90 8中進行了描述,其受讓給應用材料並在此引 入其全部内容作爲參考。 因爲用於硬化的UV源隨著時間會累積熱,其負面影 響正在處理的元件並縮短UV源自身的壽命,所以需要冷 卻這些存在的UV和其他硬化源,並且冷卻電子構件和各 種其他部件。典型地,使用開環系統,諸如在第i圖中所 示的裝置100,其中鼓風機106用於將環境空氣導入uv 源的末端(諸如用於導引U V輻射到處理(硬化)腔室i 〇4 的UV燈模組102)中。排氣口 108設置在UV源的另一端, 使得熱風從燈模組引出,從而從模組1 02去除熱。對該方 200809977 法存在各種不利方面。 一個不利方面是熱風必須排出系統外,増加總 的排氣裝置的成本和複雜性。另一不利方面是使用 氣導致大量乳氣沒漏進入燈柄组和/或硬化腔室。氧 在限制了在系統能操作處UV光譜中的波長,原因 低的波長(例如,低於200nm )趨於被氧氣玫收。 可能通過增加硬化系統的密封要求在一定程度上減 是其再次增加了硬化系統的成本和複雜性。 另一問題是在系統中的任意氧氣對UV奪昌射的 系統中産生少量的臭氧。該臭氧導致系統中致氣的 另外,對於存在於系統中的臭氧量有嚴格的要求, 處理期間臭氧的連續産生會導致不期望的臭氧程度 須檢測並解決後才能繼續處理)。 由於這些和其他缺失的原因,儘管有各種硬化 技術的發展,但是在該重要的技術領域中其他的改 持續尋找。 【發明内容】 根據本發明的各種實施方式提供在UV硬化系 置中用於再循環流體的系統和方法,諸如通過利用 冷卻系統或者閉環冷卻系統(closed-loop eo〇ling CLCS )。該再循環能減少硬化系統的排氣和密封需 循環流體(諸如氮)的使用還能減少系統中臭氧的 並可以允許在較低波長時操作硬化系統。該再循環 處理線 環境空 氣的存 在於較 該效果 輕,但 暴露在 消耗。 並且在 (其必 腔室和 善仍將 統或裝 再循環 system, 求。再 産生, 還能提 8 200809977 供在再循環流體中的臭氧密度的減少。One method of making a film is through a chamber. For example, a chemical reaction between the helium supply source and the oxygen supply source may result in deposition of (5) sub-solid phase ruthenium oxide on top of the semiconductor substrate disposed within the CVD chamber. In another embodiment, the tantalum carbide and carbon doped ruthenium oxide film can be formed by a CVD reaction of an organic decane source comprising at least one si_C bond. Water is usually a by-product of the CVD reaction of the organodecane compound. Thus, water can be physically adsorbed into the film in the form of water vapor or chemically bonded to the deposited film by si_〇H. Any of these forms of water binding is generally undesirable. Therefore, undesired chemical bonds and compounds such as water are preferably removed from the deposited carbon-containing film. Also, in some specific CVD processes, it is desirable to remove the thermally unstable or unstable organic portions of the sacrificial material (caused by the porogen used to increase porosity during CVD). One known method for solving this problem is conventional thermal annealing. The energy from this annealing replaces the undesired chemical enthalpy of the unstable 6 200809977 with the more stable bond properties of the ordered film, thereby increasing the film density. Conventional thermal annealing steps typically have a relatively long duration (e.g., typically 30 minutes to 2 hours), thus consuming a significant amount of processing time and eliminating the overall manufacturing process. Another method to solve these problems is post-treatment of films (such as yttria, tantalum carbide, and carbon-doped oxide oxide films) that utilize ultraviolet (UV) radiation to facilitate CVD production. For example, U.S. Patent Nos. 6, 5 6 6, 2, 7 8 and 6,614, 181, both of which are incorporated herein by reference in their entireties in- Use of UV light. The use of UV radiation for hardened and dense cvd films can reduce the overall thermal budget of individual wafers and speed up the manufacturing process. A variety of U V hardening systems have been developed which can be effectively used for hard 4 fc» films deposited on substrates. One of the embodiments is described in U.S. Application Serial No. 11/124,90, filed on May 19, 2006, which is incorporated herein by reference in its entirety, assigned to All contents are for reference. Since the UV source used for hardening accumulates heat over time, which negatively affects the component being processed and shortens the life of the UV source itself, it is desirable to cool these existing UV and other hardening sources and to cool the electronic components and various other components. Typically, an open loop system, such as the apparatus 100 shown in Figure i, is used, wherein the blower 106 is used to direct ambient air into the end of the uv source (such as for directing UV radiation to the process (hardening) chamber i 〇 4 of the UV lamp module 102). An exhaust port 108 is provided at the other end of the UV source such that hot air is drawn from the lamp module to remove heat from the module 102. There are various disadvantages to the party's 200809977 law. One downside is that the hot air must drain out of the system, adding to the cost and complexity of the total exhaust. Another disadvantage is that the use of gas causes a large amount of milk to leak into the lamp holder group and/or the hardening chamber. Oxygen limits the wavelength in the UV spectrum at which the system can operate, because low wavelengths (e.g., below 200 nm) tend to be trapped by oxygen. It is possible to reduce the sealing requirements of the hardening system to a certain extent, which again increases the cost and complexity of the hardening system. Another problem is that a small amount of ozone is produced in the system in which any oxygen in the system is exposed to UV. The ozone causes gas in the system. In addition, there is a strict requirement for the amount of ozone present in the system. The continuous generation of ozone during the treatment may result in an undesired degree of ozone to be detected and solved before continuing to be processed). Due to these and other missing reasons, despite the development of various hardening techniques, other changes in this important technical field continue to be sought. SUMMARY OF THE INVENTION Systems and methods for recirculating fluids in a UV hardening system are provided in accordance with various embodiments of the present invention, such as by utilizing a cooling system or a closed-loop eo〇ling CLCS. This recirculation can reduce the venting of the hardening system and seal the use of circulating fluids such as nitrogen, as well as reduce ozone in the system and can allow the hardening system to be operated at lower wavelengths. The recirculation line has a lighter ambient air, but is exposed to consumption. And in the case that it must still be recirculated or recirculated, it can be re-produced. It can also be used to reduce the density of ozone in the recirculating fluid.

在一個實施方式中,用於對包括UV燈琢和硬化腔室 的UV硬化系統提供冷卻的系統包括可用以包含一流體量 的供應容器。流動産生裝置,諸如鼓風機,可以導引來自 供應容器的流體流經過UV燈源,使得流體流可以去除來 自UV燈源的熱能。連接到硬化腔室的循環管路可以接收 經加熱的流體流並導引經加熱的流體流至循環容器。沿著 流路設置在循環容器和供應容器之間的熱交換器可以去除 來自經加熱的流體流的熱能,其中可以導引流體流返回至 供應容器中以再循環爲冷卻流體。流體可以是任何適當的 液體或者氣體,諸如氮氣或富氮氣體。氣體分離模組可以 使用以容納一饋入空氣流並分離出饋入空氣的至少一種成 分以産生供應容器的流體源。氣體分離模組可以包括氣體 分離膜,例如,可以容納饋入空氣體流並産生氮氣流。 在一個實施方式中,空氣模組設置用於產生輻射型硬 化裝置的再循環冷卻流體流。模組包含可用以容納並包含 一流體量的供應容器。流動産生裝置可以導引來自供應容 器的流體流至輻射型硬化裝置,流體流可用以從硬化裝置 去除熱能。返回容器可以容納退出輻射型硬化裝置的經加 熱的流體流。模組還可包括沿著一流體路徑設置在返回容 器和供應容器之間的熱交換器。熱交換器可以去除來自經 加熱的流體流的熱能並導引流體流返回至供應容器中。 在一個實施方式中,冷卻UV硬化系統的方法包括導 引來自供應容器的冷卻流體流經過UV燈源,流體流可用 9In one embodiment, a system for providing cooling to a UV hardening system comprising a UV lamp housing and a hardening chamber includes a supply container that can be used to contain a quantity of fluid. A flow generating device, such as a blower, can direct fluid flow from the supply vessel through the UV light source such that the fluid flow can remove thermal energy from the UV light source. A circulation line connected to the hardening chamber can receive the heated fluid stream and direct the heated fluid stream to the circulation vessel. The heat exchanger disposed between the circulation vessel and the supply vessel along the flow path can remove thermal energy from the heated fluid stream, wherein the fluid stream can be directed back to the supply vessel for recycling to the cooling fluid. The fluid can be any suitable liquid or gas, such as nitrogen or a nitrogen rich gas. The gas separation module can be used to accommodate a feed air stream and separate at least one component of the feed air to produce a fluid source for the supply vessel. The gas separation module can include a gas separation membrane that, for example, can accommodate a feed air stream and produce a nitrogen stream. In one embodiment, the air module is configured to generate a flow of recirculating cooling fluid for the radiant stiffening device. The module contains a supply container that can be used to contain and contain a quantity of fluid. The flow generating device can direct fluid flow from the supply container to the radiation hardening device, and the fluid flow can be used to remove thermal energy from the hardening device. The return container can accommodate the heated fluid stream exiting the radiation hardening device. The module can also include a heat exchanger disposed between the return container and the supply container along a fluid path. The heat exchanger can remove thermal energy from the heated fluid stream and direct the fluid stream back into the supply vessel. In one embodiment, a method of cooling a UV hardening system includes directing a flow of cooling fluid from a supply vessel through a source of UV light, the fluid flow being available.

200809977 以去除來自UV燈源的熱能。經加熱的冷卻流體 腔室導引至返回容器’並且從經加熱的冷卻流體 能。然後,去除熱的冷卻流體導引返回至供應容 中冷卻流體可用以再循環經過UV燈源。 在一個實施方式中,用於減少在UV硬化系 存在的系統包括:用於包含一流體量的供應容器 以導引來自供應容器的流體流經過UV燈源的流 置,使得流體流可以去除來自UV燈源的熱能。 化腔室的第一輸送渠道可以容納經加熱的流體流 加熱的流體流至臭氧破壞單元。臭氧破壞單元可 加熱的流體流並減少其中所包含的臭氧的濃度。 臭氧破壞單元和供應容器之間連接的第二輸送渠 引減少臭氧的流體流返回至供應容器中。臭氧破 以包括催化劑,其經選擇以引起與經加熱的流 應,其分解在流體中所包含的任意臭氧的至少一 化劑可以爲分解臭氧的任意適當催化劑,1 Mn〇2/CuO,Mn〇2/CuO/Al2〇3、活性炭、Pd/Mn〇2、 矽鋁、Μη02基的催化劑和貴金屬pt/pd催化劑。 以球狀形式包含於臭氧破壞裝置中,或者可以爲 壞裝置中在蜂窩(honeycomb)和輻射裝置其中 塗層形式。 在一個實施方式中,用於減少UV硬化工具 在的臭乳破壤襄置包括一箱體(housing),該箱 納退出硬化工具的流體流的入口,和用於輸出再 流從硬化 流去除熱 器中,其 統中臭氧 ,和可用 動産生裝 連接到硬 並導引經 以容納經 然後,在 道可以導 壞單元可 體流的反 部分。催 f如選自 Pd/Mn02/ 催化劑可 在臭氧破 之一上的 中臭氧存 體具有容 循環通過 10200809977 to remove heat from UV light sources. The heated cooling fluid chamber is directed to the return vessel' and from the heated cooling fluid. The hot cooling fluid is then directed back to the supply volume and the cooling fluid can be used to recirculate through the UV light source. In one embodiment, a system for reducing the presence of a UV hardening system includes: a supply container for containing a quantity of fluid to direct flow of fluid from the supply container through a source of UV light such that fluid flow can be removed from The thermal energy of the UV light source. The first delivery channel of the chamber can accommodate the heated fluid stream heated to the ozone destruction unit. The ozone destruction unit heats the fluid stream and reduces the concentration of ozone contained therein. A second transport conduit connecting the ozone destruction unit and the supply vessel directs the ozone-reducing fluid stream back into the supply vessel. The ozone is broken to include a catalyst selected to cause a flow with the heated stream, and at least one of the agents which decomposes any ozone contained in the fluid may be any suitable catalyst for decomposing ozone, 1 Mn〇2/CuO, Mn. 〇2/CuO/Al2〇3, activated carbon, Pd/Mn〇2, yttrium aluminum, Μη02 based catalyst and noble metal pt/pd catalyst. It is contained in the ozone destruction device in the form of a sphere, or it may be in the form of a coating in a honeycomb (honeycomb) and a radiation device. In one embodiment, the scumming device for reducing the UV hardening tool comprises a housing that exits the fluid flow inlet of the hardening tool and is used for output reflow to remove from the hardening stream In the heat exchanger, the ozone in the system is connected to the hard-acting device and connected to the hard portion to accommodate the passage, and then the channel can guide the reverse portion of the unit body flow. f f, such as selected from Pd/Mn02/catalyst, can be used in the ozone depletion of a medium ozone tank.

200809977 硬化工具的減少臭氧的流體流的出口。在箱體中流動 配置以導引箱體中所容納的流體流,流動路柽具有一 和形狀使得流體流動對於給定的流速具有在流動路徑 所選停留時間。催化劑放置在流動路徑表面上,或者 動路徑中,使得在流動路徑中的流體流與催化劑接觸 的停留時間。選擇催化劑以引起與流體流的反應,其 在流體中包含的任何臭氧的至少一部分,因而産生了 箱體輸出並再循環返回至硬化系統中之減少臭氧的流 輸出。流動路徑可以例如爲輻射體(radiator )或者蜂 形式。 在一個實施方式中,減少在UV硬化工具中臭氧 的方法包括容納退出UV硬化工具的經加熱的流體流 著具有一長度和形狀的流動路徑導引經加熱的流體流 得流體流對於給定的流速在流動路徑中具有所選的停 間。流動路徑具有放置在其表面上的催化劑,或者包 其中,其中在流動路徑中的流體流與催化劑接觸選定 留時間。選擇催化劑以引起與流體流的反應’其分解 體中所包含的任何臭氧的至少一部分。然後,減少臭 流體流從流動路徑導引返回至UV硬化工具,其中流 可以通過UV硬化工具再循環。 對於本領域的普通技術人員,根據本發明中所包 說明和附圖,本發明的其他實施方式是顯而易見的。 【實施方式】 路徑 長度 中的 在流 選定 分解 將從 體流 窩的 存在 。沿 ,使 留時 含在 的停 在流 氧的 體流 含的 11 200809977200809977 The outlet of the ozone-reducing fluid stream of the hardening tool. Flow is configured in the tank to direct fluid flow contained in the tank, the flow path having a shape such that the fluid flow has a selected residence time in the flow path for a given flow rate. The catalyst is placed on the surface of the flow path, or in the moving path, the residence time of the fluid flow in the flow path in contact with the catalyst. The catalyst is selected to cause a reaction with the fluid stream that contains at least a portion of any ozone contained in the fluid, thereby producing a tank output and recycling back to the ozone-reducing stream output in the hardening system. The flow path can be, for example, in the form of a radiator or a bee. In one embodiment, a method of reducing ozone in a UV hardening tool includes accommodating a heated fluid exiting the UV hardening tool, flowing a flow path having a length and shape, directing the heated fluid flow, for a given flow The flow rate has a selected stop in the flow path. The flow path has a catalyst disposed on its surface, or a package wherein the fluid flow in the flow path contacts the catalyst for a selected residence time. The catalyst is selected to cause a reaction with the fluid stream&apos; at least a portion of any ozone contained in the decomposition body. The reduced odor fluid stream is then directed back from the flow path to the UV hardening tool, where the flow can be recirculated by the UV hardening tool. Other embodiments of the invention will be apparent to those skilled in the <RTIgt; [Embodiment] In the path length, the flow is selected to decompose from the body cavity. Along with the flow of oxygen in the flow of oxygen contained in the flow 11 200809977

根據本發明的各種實施方式的系統和方法可以克服在 現有硬化和其他利用輻射的應用中的前述及其它缺失。在 -個實施方式中,硬化模組用於冷卻輻射源(例如,UV 燈)’冷卻模組可用以再循環冷卻流體(例如,氮氣)通過 源,以減少生產線或製造工具的排氣系統上的負載。與空 氣流導引至系統中相比較,所選流體的再循環也可以減少 和/或消除系統使用者的密封要求,原因在於所選冷卻流體 /¾漏到系統中的量相對於水蒸氣和饋入空氣較不重要,例 如’其可以包括較高程度的氧氣。模組可以使用利用冷卻 水(諸如製程水或其他適宜的液體)的簡單熱交換器以從 再循環流體去除熱。冷卻模組可以利用至少一種同轴式鼓 風機(或在其他流體驅動裝置),以産生並導引流體(諸如 加壓氣體)到輻射源的高速流動,例如,其可以在UV燈 模組中包括磁控管和uv燈泡。在一個實施方式中,純氮 氣和/或富氮空氣用作再循環流體以減少冷卻系統内部臭 氧的形成。純氮氣的使用還可以減少被再循環流體中的氧 氣吸收的UV輻射量(特別在小於200nm的波長處),從 而增加UV密度或者到輸出到暴露於uv輻射的工件的輻 照/催化劑可以在再循環系統内部使用以去除任何殘留: 臭氧。在一個實施方式中,臭氧破壞單元嵌入或者以其他 方式集成到再循環系統中以減少# g Θ ~ \〆臭氧篁,以及淨化氮 (purge nitrogen )的相應消耗,例払 ^ ^ 列如。通過輻射源加埶 回流體,使得對於催化劑不需要外抑&amp; * …&lt; r #熱輸入以達到高臭羞 破壞效率。 天乳 12The systems and methods in accordance with various embodiments of the present invention can overcome the aforementioned and other deficiencies in existing hardening and other applications that utilize radiation. In one embodiment, the hardening module is used to cool a radiation source (eg, a UV lamp) 'a cooling module can be used to recirculate a cooling fluid (eg, nitrogen) through the source to reduce the line or manufacturing tool on the exhaust system. Load. The recirculation of the selected fluid can also reduce and/or eliminate the sealing requirements of the system user as compared to the introduction of the air stream into the system, since the selected cooling fluid / 3⁄4 leaks into the system relative to the water vapor and Feeding air is less important, such as 'it can include a higher degree of oxygen. The module can use a simple heat exchanger that utilizes cooling water, such as process water or other suitable liquid, to remove heat from the recirculating fluid. The cooling module can utilize at least one coaxial blower (or other fluid drive) to generate and direct high velocity flow of fluid (such as pressurized gas) to the radiation source, for example, which can be included in the UV lamp module. Magnetron and uv bulbs. In one embodiment, pure nitrogen and/or nitrogen-enriched air is used as a recycle fluid to reduce the formation of ozone within the cooling system. The use of pure nitrogen can also reduce the amount of UV radiation absorbed by the oxygen in the recycled fluid (especially at wavelengths less than 200 nm), thereby increasing the UV density or the irradiation/catalyst to the workpiece exposed to the uv radiation can be The recycling system is used internally to remove any residue: ozone. In one embodiment, the ozone destruction unit is embedded or otherwise integrated into the recirculation system to reduce the corresponding consumption of #g Θ 〆 〆 以及 and purge nitrogen, as exemplified by ^ ^. The fluid is entangled by the radiation source so that no external heat suppression is required for the catalyst to achieve high smear destruction efficiency. Ten Milk 12

200809977 第2圖示出了根據本發明的一個實施方武可以 包括集成的再循環氡體冷卻系統的示例性硬化系統 特別的硬化系統包括—對燈模組2〇2、2〇4,备個燈 以包括磁控管和UV燈(Hg燈泡)以提供UV硬化 UV輻射。每個燈模組2〇2、204導引UV輻射到各 腔室206、208,或者部分處理腔室,如在本領域中 以上所討論的,每個都可以用於各個工件(諸如丰 圓)的UV硬化。每個燈模組具有用於監控各個燈 部的壓力和溫度的壓力感測器222、226和溫度 224、228。這些感測器可以用於調整導引通過燈模 卻流體流(諸如氮氣),和/或藉由調整流過熱交換 的冷卻流體量調整再循環流體的溫度,如以下所述 在該實施方式中的每個燈模組202、204具有所 各個鼓風機2 1 0、2 1 2並且可用以導引冷卻流體可控 各個模組中。鼓風機可以爲可用以産生和/或導引冷 流動到各個模組的中任何適當的裝置,諸如鼓風機 産生每個腔室約1400CFM的冷卻流體。還應該理解 每個模組或腔室都具有一個鼓風機,原因在於,例 的鼓風機可用於提供相繼分叉和導引到分離的模爹 室中的流動。 鼓風機2 1 0、2 1 2可以導引來自冷卻流體供應( 應室214或者其他(典型爲正壓)流體源)的冷卻 供應室214可以接收淨化氣體流,諸如純氮或氮氣 體,以替換由於在冷卻或者再循環製程期間洩漏或 使用的 200 〇 模組可 應用的 個處理 已知及 導體晶 模組内 感測器 組的冷 器 218 〇 設置的 流動到 卻流體 可用以 不需要 如單一 技和/腔 諸如供 流體。 增強氣 者消耗 13 200809977200809977 Figure 2 illustrates an exemplary hardening system that may include an integrated recirculating cartridge cooling system in accordance with an embodiment of the present invention. The particular hardening system includes - for the lamp modules 2〇2, 2〇4, The lamp is comprised of a magnetron and a UV lamp (Hg bulb) to provide UV hardened UV radiation. Each of the lamp modules 2, 2, 204 directs UV radiation to each of the chambers 206, 208, or a portion of the processing chamber, as discussed above in the art, each of which can be used for each workpiece (such as abundance ) UV hardening. Each lamp module has pressure sensors 222, 226 and temperatures 224, 228 for monitoring the pressure and temperature of the various lamps. These sensors can be used to adjust the flow of fluid through the lamp mode (such as nitrogen), and/or adjust the temperature of the recirculating fluid by adjusting the amount of cooling fluid exchanged by the flow of heat, as described below in this embodiment. Each of the lamp modules 202, 204 has a respective blower 2 1 0, 2 1 2 and can be used to guide the cooling fluid to be controllable in each module. The blower can be any suitable device that can be used to generate and/or direct cold flow to the various modules, such as a blower that produces about 1400 CFM of cooling fluid per chamber. It should also be understood that each module or chamber has a blower because the blower of the example can be used to provide flow for successive diverging and directing into separate mold chambers. The blower 2 1 0, 2 1 2 can direct the cooling supply chamber 214 from the cooling fluid supply (should 214 or other (typically positive pressure) fluid source) to receive a purge gas stream, such as a pure nitrogen or nitrogen gas, to replace The process that can be applied due to the 200 〇 module that is leaked or used during the cooling or recycling process is known and the flow of the 218 〇 感 感 感 感 感 导体 导体 导体 导体 导体 却 却 却 却 却 却 却 却 却 218 Techniques and / chambers such as fluids. Enhance gas consumption 13 200809977

而丟失的任意氣體。供應室214還可以具有至少一個氣體 感測器,諸如用於監控再循環流體中氧氣程度的氧氣感測 器220。鼓風機可以導引冷卻流體通過燈模紙202、204到 各個硬化腔室206、208中,然後經加熱的流體可以通過再 循環線路230、232導引到用於接收經加熱的流體的返回室 216或者其他腔室或容器中。熱交換器218可以放置在返 回時2 1 6和供應室2 1 4之間,或者至少沿著在返回室和供 應室之間的流動路徑,使得在流體導引返回到燈模組之前 可以從再循環流體去除熱。 在一個實施方式中,硬化系統爲由一個或多個UV模 組組成的UV硬化系統,一個或多個UV模組包括但不限 於由微波、RF和/或DC能源激勵的UV燈。UV源可以設 計或者選擇以迎合特定UV光譜分佈需求,以執行硬化和 腔室清洗,其通過使用在腔室空腔内部相同陣列内的一 個、兩個或更多不同類型的UV燈(例如,低壓Hg、中等 壓力Hg、高壓Hg等)達到。腔室空腔可用以在真空下支 撐熱基座,其中在硬化製程期間可以放置工件(諸如矽晶 圓)以接收UV能量。 足量的冷卻流體導引到燈模組中以變涼磁控管和UV 燈。對於示例性雙掃描源(d u a 1 s w e e p i n g s o u r c e,D S S ) UV腔室’每個腔室需要約i4〇〇cfm的冷卻空氣,對於具 有3個DSS Nanocure UV腔室(Nanocure UV腔室可以從 CA,Santa Clara的應用材料有限公司購買)的一個 Producer SE系統需要4200CFM的冷卻空氣。這對於設備 14 200809977 排氣系統可能是非常兩的負何’以及;又有再赠環裝置可能 增加消費者製造設備容量° 在第3(a)圖和第3(b)圖中示出的一個實施方式中, 再循環冷卻空氣裝置300包括一對同軸式线風機308、 310。返回的熱空氣從返回導管312(和任意窝要的延伸導 管3 1 4 )接收到返回容器3 0 2中,然後在返回到供應容器 3 04之前通過水冷熱交換器3〇6冷卻。補給氣體流用於補 償再循·環裝置中的任意洩漏。以上所述的球(pellet )或者 蜂窩形催化劑3 1 6在此可以放置在返回容器3 02中,但是 在至少部分實施方式中,爲了方便將其放置在延伸導管 314 中。 第4(a)圖和第4(b)圖示出了可以在該冷卻空氣裝 置中使用的示例性鼓風機400。鼓風機400包括可旋轉風 扇402,其可用以導引冷卻各個UV燈模組的流體的適當 流動,諸如至少7 ’’水位表強制空氣的流動〇所示的鼓風機 包括連接器406和液體密封零件408,以及標示牌412和 震盪阻尼材料410。可以看出,連接點4〇4位於旋轉風扇 週邊附近等距離處,以平衡鼓風機並減少裝置中的震盪。 該鼓風機可以是,例如可從Kent,Ohio的AMETEK⑬And any gas that is lost. Supply chamber 214 may also have at least one gas sensor, such as oxygen sensor 220 for monitoring the degree of oxygen in the recirculating fluid. The blower can direct cooling fluid through the lamp mold papers 202, 204 into the respective hardening chambers 206, 208, and then the heated fluid can be directed through the recirculation lines 230, 232 to the return chamber 216 for receiving the heated fluid. Or in other chambers or containers. The heat exchanger 218 can be placed between the return time 216 and the supply chamber 2 14 or at least along the flow path between the return chamber and the supply chamber so that the fluid guide can be returned before returning to the lamp module The recirculating fluid removes heat. In one embodiment, the hardening system is a UV hardening system comprised of one or more UV modules, one or more UV modules including, but not limited to, UV lamps that are energized by microwave, RF, and/or DC energy sources. The UV source can be designed or selected to cater for specific UV spectral distribution requirements to perform hardening and chamber cleaning by using one, two or more different types of UV lamps within the same array inside the chamber cavity (eg, Low pressure Hg, medium pressure Hg, high pressure Hg, etc. are achieved. The chamber cavity can be used to support the thermal susceptor under vacuum, wherein a workpiece, such as a twine, can be placed during the hardening process to receive UV energy. A sufficient amount of cooling fluid is directed into the lamp module to cool the magnetron and the UV lamp. For an exemplary dual scan source (DSS) UV chamber 'each chamber requires approximately i4 〇〇 cfm of cooling air for 3 DSS Nanocure UV chambers (Nanocure UV chambers are available from CA, Santa A Producer SE system purchased by Clara Applied Materials Ltd. requires 4200 CFM of cooling air. This may be very much for the equipment 14 200809977 exhaust system and; and there is a rebate ring device that may increase the capacity of the consumer manufacturing equipment. ° shown in Figures 3(a) and 3(b) In one embodiment, the recirculating cooling air device 300 includes a pair of coaxial line fans 308, 310. The returned hot air is received from the return conduit 312 (and any desired extension conduit 3 1 4) into the return vessel 312 and then cooled by the water-cooled heat exchanger 3〇6 before returning to the supply vessel 404. The makeup gas stream is used to compensate for any leakage in the recirculation loop device. The pellet or honeycomb catalyst 316 described above may be placed therein in the return vessel 302, but in at least some embodiments, it is placed in the extension conduit 314 for convenience. Figures 4(a) and 4(b) illustrate an exemplary blower 400 that can be used in the cooling air unit. The blower 400 includes a rotatable fan 402 that can be used to direct the proper flow of fluid to cool the various UV lamp modules, such as at least a 7'' water level gauge forced air flow. The illustrated blower includes a connector 406 and a liquid sealing component 408. And the nameplate 412 and the oscillating damping material 410. It can be seen that the connection point 4〇4 is located equidistantly near the periphery of the rotating fan to balance the blower and reduce oscillations in the device. The blower can be, for example, AMETEK13 available from Kent, Ohio.

Technical &amp; Industrial Pr〇ducts 購買的 amE:TEK® Rotron 041-402000 模型 ° 一個重要的問題是臭氧在再循環中的積累將超過 0SHA或其他應用標準。根據一個實施方式的再循環系統 使用純氮作爲補給氣體以減輕該問題。淨化氮氣可以去除 15 200809977 和/或減少再循環裝置中的氧氣濃度至 上, T』私u衣又王小於約i %。氧感測 器可以集成到再循環系統中以監控再循 爾¥氣符内部的氧氣 濃度,以保δ且氣氣的適當淨化。 如上=,氮或氮增強氣體的流動可巧利地用作再 循環冷,體:由於諸如浪漏或吸收的因b需要穩定的 氮源以補充冷卻系統中的供應。在本 ^ ^ 月織中衆所周知的, 由於提供純氮流可台t;祕士 Aβ &gt; 了此增加成本和糸統唆雜性,冷卻流體系 統可能結合能生淹g旦备七备祕&amp;友Μ 王産足篁亂或亂增強乳體的氮 裝 置。一種該裝置&amp;人时壯苗 ^ ^ 置爲含膜裝置,可用以從輪人到管狀膜末端 、:孔’二氮氣流,例如。該膜5〇〇在第5圖中示出, :狀^ Z(其還將包含—定程度的水蒸氣)送入到 :、胳 端部。當空氣通過膜,大量氧氣(和其他元 素)將通過鹿:辟 、壁,使得通過管狀膜輸出端的空氣基本爲氮 氣,或者座於、 5 到官狀膜的饋入空氣相比,至少具有顯著 增加的部分ft A ’、 虱虱。一個示例性膜系統用於通過傳輸壓縮空 氣經過一走办 ^ ^ A心纖維、半導體膜而分離空氣爲其成分氣 體膜將二氣分爲兩個流束,其中一個流束基本爲氮。另 _ _ JLj ^ 匕έ氣氣、二氧化碳和其他微量氣體。數百萬纖維, 約爲人類頭髮的尺寸,可以捆紮爲單一模組。這提供有效 産生大里的高氮純度産物流束的非常大的膜表面面積。該 膜系統的一個實施例爲可從CA·的Innovative Gas Systems (IGS )購得的MG Generon® 6500氮膜。該裝置可以確保 適當置的氮氣,諸如約250升/分鐘,可用於注入到系統中。 第6圖示出了根據本發明的一個實施方式的具有控制 16 200809977 和冷卻的整體U V硬化系統6 0 0。可以看出、可以通過使 用系統控制器602而控制和/或監控總體系統。系統控制器 可以爲已知或在産業中用於接收指示各種元件的情況和/ 或系統參數的信號並産生控制信號的硬體和/或軟體任意 適當的結合,以控制並調整各種元件和/或參教。在一個實 施例中’控制器採用具有多種信號輸入和輸出的個人電月g 的形式,計算機具有監控和控制系統的各種邹分的指示的 入π 。Technical &amp; Industrial Pr〇ducts Purchased amE: TEK® Rotron 041-402000 Model ° An important issue is that ozone build-up in recirculation will exceed 0SHA or other application standards. The recirculation system according to one embodiment uses pure nitrogen as a supplemental gas to alleviate this problem. Purification of nitrogen can remove 15 200809977 and / or reduce the oxygen concentration in the recirculation device to the top, T "private" is less than about i%. The oxygen sensor can be integrated into the recirculation system to monitor the oxygen concentration inside the recirculation valve to maintain delta and proper purge of the gas. As above =, the flow of nitrogen or nitrogen enhancing gas can be used as a recirculating cold, body: due to the need for a stable nitrogen source such as a leak or absorption to supplement the supply in the cooling system. As is well known in this ^ ^ woven, due to the provision of pure nitrogen flow can be t; the secret Aβ &gt; this increased cost and the complexity of the system, the cooling fluid system may combine the energy to flood the preparations &amp; Friends Μ King produces a nitrogen device that is messy or chaotically enhanced. A device &amp; a human seedling is placed as a membrane-containing device and can be used from the wheel to the end of the tubular membrane, the orifice, and the nitrogen stream, for example. The film 5 is shown in Fig. 5, and the shape (which will also contain a certain degree of water vapor) is sent to the end of the :. As the air passes through the membrane, a large amount of oxygen (and other elements) will pass through the deer: the wall, so that the air passing through the output of the tubular membrane is essentially nitrogen, or at least 5, compared to the feed air to the official membrane, at least significant The added part is ft A ', 虱虱. An exemplary membrane system is used to separate two gases into two streams, one of which is substantially nitrogen, by transporting compressed air through a separate core fiber, semiconductor film, and separating air into its constituent gas film. Another _ _ JLj ^ 匕έ gas, carbon dioxide and other trace gases. Millions of fibers, about the size of human hair, can be bundled into a single module. This provides a very large membrane surface area effective to produce a large nitrogen high purity product stream. One example of such a membrane system is the MG Generon® 6500 nitrogen membrane available from Innovative Gas Systems (IGS) of CA. The device ensures that proper nitrogen, such as about 250 liters per minute, can be used to inject into the system. Figure 6 shows an overall U V hardening system 600 with control 16 200809977 and cooling in accordance with one embodiment of the present invention. It can be seen that the overall system can be controlled and/or monitored by using system controller 602. The system controller can be any suitable combination of hardware and/or software known or used in the industry to receive signals indicative of conditions and/or system parameters of various components and to generate control signals to control and adjust various components and/or Or teach. In one embodiment the 'controller' takes the form of a personal electrical month g with a variety of signal inputs and outputs, and the computer has an indication of the various points of the monitoring and control system.

在第6圖中的系統控制器602示出以聯繫多種元件(諸 如鼓風機(用於監控和/或空氣風扇速度)和燈模組(用於 監控和控制系統中輻射的産生))。系統控制器還可與各g 其他感測器和監控裝置聯繫,如在別處所討綸以及在本領 域已知的監控系統情形。例如,系統控制器602與氮産生 器604聯繫。如上所述,氮産生器接受饋入空氣流並分離 組成的空氣,導致導引到供應容器中的氮氣流。系統控制 器602可以接收信號(諸如來自氮監控器的指示導引到氮 容器中的氮濃度的監控信號)。如果來自氮産生器或者其他 氮源的流量不充足,則系統監控器可以産生控制信號,指 示氮産生器或源以增加氮到系統中的流量。如果系統控制 器通知氮含量低於氮閾值,諸如可能儲存在系統的資料健 存裝置608中,然後系統控制器可以産生警報信號指示氮 産生器不能適當運行,並可以要求維修(諸如催化劑的更 換)。系統控制器可以將該警報信號傳送給適當的裝置(諸 如向系統操作員警報的警報器)。在該實施例中,信號傳送 17 200809977 給使用者介面裝置606 (諸如個人電腦或夺無線 PDA,其允許系統的使用者或者操作員知道氮産生 注意)。使用者介面還可以允許使用者或操作員觀察 控的參數和系統的元件,並可以允許使用者或者操 整或控制系統操作的各種設置和參數,如本領域中 知的。 如同對於本領域的普通技術人員是顯而易見的The system controller 602 in Figure 6 is shown to communicate various components such as a blower (for monitoring and/or air fan speed) and a light module (for monitoring and controlling the generation of radiation in the system). The system controller can also be used to communicate with other sensors and monitoring devices, such as those found elsewhere and in monitoring systems known in the art. For example, system controller 602 is in communication with nitrogen generator 604. As described above, the nitrogen generator receives the feed air stream and separates the constituent air, resulting in a flow of nitrogen directed into the supply vessel. System controller 602 can receive a signal (such as a monitoring signal from the nitrogen monitor indicating the concentration of nitrogen directed into the nitrogen container). If the flow from the nitrogen generator or other nitrogen source is insufficient, the system monitor can generate a control signal that indicates the nitrogen generator or source to increase the flow of nitrogen into the system. If the system controller informs that the nitrogen content is below the nitrogen threshold, such as may be stored in the system's data storage device 608, then the system controller may generate an alarm signal indicating that the nitrogen generator is not functioning properly and may require repair (such as catalyst replacement) ). The system controller can communicate the alert signal to an appropriate device (such as an alarm that alerts the system operator). In this embodiment, the signal transmission 17 200809977 is given to the user interface device 606 (such as a personal computer or a wireless PDA that allows the user or operator of the system to know the nitrogen generating attention). The user interface may also allow the user or operator to observe the parameters of the control and the components of the system, and may allow the user to either manipulate or control various settings and parameters of the system operation, as is known in the art. As will be apparent to those of ordinary skill in the art

接收來自適當的感測器的信號,系統控制器可以監 系統的各個方面(諸如流速、壓力、溫度、氣體成 等)’並可以向操作者和/或控制成分發出警報以調 或執行所高要的維修。例如,系統控制器可以通過 、、充瓜控机速’並可以回應該流速調整鼓風機的速度 此處的說明和逢壤 . A , _ ^遷4,對於本發明的普通技術人員, 制器、使用者介而心吹丄,^ i面和資料儲存裝置的各種其他使用 是顯而易見的。Receiving signals from appropriate sensors, the system controller can monitor various aspects of the system (such as flow rate, pressure, temperature, gas, etc.) and can alert the operator and/or control component to adjust or execute the high Required repairs. For example, the system controller can control the speed of the air conditioner, and can adjust the speed of the air blower to the flow rate, and the description here and the soil. A, _ ^ move 4, for the ordinary person skilled in the art, Various other uses of the user and the data storage device are obvious.

第7圖示出 uv硬化系統的 供應,到供應容器 了根·據本發明的一個實施方式的用 示例性方法700。在該方法中,淨化 702。如上所述,這可以爲純氮或 氣體’例如,ν 以及可以由適當的裝置(諸如成分分 置)産生。氮氣經由至少一個鼓風機導引到至少一 組中704 氣體經過燈模組和各個硬化腔室706,並 至進入到返回答、苦么μ w &amp;道系統7 0 8,從而從燈模組和硬化 除熱。熱氮 礼等入到返回容器7丨〇,然後經過熱交換 、中熱從返回氣體去除),並傳送回至供應容器4 使能的 器需要 各種監 作員調 衆所周 ,通過 控總體 分程度 整參數 冷卻系 。根據 系統控 和應用 於冷卻 氮氣源 者富氣 離膜裝 個燈模 退出腔 腔室去 器712 ,714 〇 18Fig. 7 shows the supply of the uv hardening system to the supply container. The exemplary method 700 according to one embodiment of the present invention. In this method, 702 is purified. As noted above, this can be pure nitrogen or a gas 'e.g., ν and can be produced by a suitable device, such as a component separation. Nitrogen is directed via at least one blower to at least one of the 704 gases passing through the lamp module and each of the hardening chambers 706, and upon entering the returning, bitter, and ww system 7 0 8, thereby from the lamp module and Hardened to remove heat. The hot nitrogen ritual enters the return container 7丨〇, and then passes through the heat exchange, the heat is removed from the return gas), and is sent back to the supply container. 4 The enabled device requires various supervisors to adjust the audience. Degree of overall parameter cooling system. According to the system control and application to the cooling nitrogen source, the rich gas is separated from the membrane and the lamp module is exited from the chamber chamber 712, 714 〇 18

k2( cm6/( k3 ( 1/s) 200809977 如果硬化製程繼續 7 1 6,然後通過各個鼓風機再 體通過燈模組和處理腔室。否則,循環製程終止 如上所述,再循環冷卻系統沒有密封。這樣 空氣(典型爲包含20.9%的氧氣)可能洩漏,或 到再循環系統中❹氧氣的存在可能經由UV拿屬射 臭氧的形成,諸如通過以下本領域所知的方轾式 於從氧物質形成及破壞大氣臭氧: 〇2 + hv — 20 ki ( 1/s )K2( cm6/( k3 ( 1/s) 200809977 If the hardening process continues 716, then pass through the lamp module and the processing chamber through each blower. Otherwise, the cycle process is terminated as described above, the recirculating cooling system is not sealed Such air (typically containing 20.9% oxygen) may leak, or the presence of helium oxygen into the recirculation system may be due to the formation of ozone by UV radiation, such as by oxygen species from the following known in the art. Forming and destroying atmospheric ozone: 〇2 + hv — 20 ki ( 1/s )

Ο + 02 + Μ ^ 〇3 + M 〇3 + hv-&gt;0 + 〇2 k4( cm3/(《 其中〇是氧原子,〇2是氧分子,〇3是臭氧 疋紫外輻射光子,以及M是可以吸收在第二輻射 第二氧原子形成的臭氧)中釋放的能量的任何非 以穩疋臭氧Μ不疋氧或氮。如果M不吸收過剩 氧不是非常穩定的分子,並趨於分解回〇和。 通過k 1......k 4給出。 爲了與規則(諸如電流OSHA規則)一致, 種uv冷卻系統中保持臭氧密度低於約〇 〇8ppm 其可以需要減少或破壞在系統中産生的臭氧。臭 元可以附加到冷卻系統以控制在系統中循環的臭 一個實施方式中,臭氧破壞單元利用催化劑反應 氧,原因在於將不消粍活性成分。另外,不需要 催化劑反應之額外的熱(能量),諸如通過以下方 次導引氣 718 〇 ,少量的 者回流, 導致少量 給出的用 &gt; 子 2^)) &gt; 子1s1 )) 分子,hv (從氧和 輻射物質 能量,臭 速度常數 需要在各 。然後, 氧破壞單 氧量。在 以減少臭 對於這些 程式給出 19 200809977 的: 03 + Μ — M-0 + 〇2 03 + M-0 — Μ + 2〇2 可以看出,這些反應的最終結果是簡單的非活性物質 (已經存在)和氧氣。Ο + 02 + Μ ^ 〇3 + M 〇3 + hv-&gt;0 + 〇2 k4( cm3/(" where 〇 is an oxygen atom, 〇2 is an oxygen molecule, 〇3 is an ozone 疋 ultraviolet radiation photon, and M Any non-stabilizing ozone that can absorb the energy released in the second radiation of the second oxygen atom). If M does not absorb excess oxygen, it is not a very stable molecule and tends to decompose back. 〇和. Given by k 1...k 4. In order to be consistent with rules (such as current OSHA rules), the uv cooling system maintains an ozone density below about ppm8 ppm which may need to be reduced or destroyed in the system. The ozone generated in the ozone system can be attached to the cooling system to control the odor circulating in the system. The ozone destruction unit utilizes the catalyst to react oxygen because the active ingredient will not be eliminated. In addition, no additional reaction of the catalyst is required. Heat (energy), such as by introducing the gas 718 通过 by the following method, a small amount of reflux, resulting in a small amount of giving &gt; sub 2^)) &gt; sub 1s1 )) molecule, hv (from oxygen and radioactive energy , the stinky speed constant needs to be Then, oxygen destroys the amount of monooxygen. In order to reduce the odor for these programs given 19 200809977: 03 + Μ — M-0 + 〇 2 03 + M-0 — Μ + 2〇2 It can be seen that these reactions The end result is a simple inactive substance (already present) and oxygen.

在一個實施方式中的臭氧破壞單元包含低溫氧化催化 劑,諸如Carulite® (揮發性有機化合物破壞催化劑,可從 IL的Peru的Carus Chemical Company購買並且已爲其註 冊商標)、PremAir® (臭氧破壞催化劑,可從NI的Iselin 的Engelhard Corporation購買並且爲其已註冊商標)、活 性炭、Mn〇2/CuO,Mn〇2/CuO/Al2〇3、Pd/Mn〇2 或 Pd/Mn〇2/ 矽鋁。催化劑可以爲小球尺寸,例如,或者可以爲塗覆在 高表面面積媒質(諸如蜂窩、輻射器等)上的膜。 臭氧破壞單元8 02可以與任意適當的冷卻和/或再循 環系統(諸如在第8圖中示出的示例性UV硬化和再循環 冷卻系統800 ) —起使用。在該系統中,臭氧破壞單元802 示出爲沿著返回線路設置,其中熱氣體從硬化腔室傳到臭 氧破壞單元802的至少一個入口 804中,與單元802中的 催化劑8 0 8反應,然後退出待返回至氣體供應的單元的至 少一個出口 8〇6,這裏爲氮供應容器。如在該實施例中所 示,在氮氣流達到臭氧破壞單元之前,返回線路結合到單 一返回線路中,諸如通過使用回吸閥8 2 6以確保從一個硬 化腔室返回的氣體不會因為組合流而污染另一腔室。在另 一實施方式中,分離的返回線路可能每個都直接輸入到臭 20The ozone destruction unit in one embodiment comprises a low temperature oxidation catalyst such as Carulite® (a volatile organic compound destruction catalyst available from Carus Chemical Company of Peru, IL and registered trademark), PremAir® (Ozone Destruction Catalyst, Available from Engelhard Corporation of Iselin, NI, and registered trademarks thereof, activated carbon, Mn〇2/CuO, Mn〇2/CuO/Al2〇3, Pd/Mn〇2 or Pd/Mn〇2/yttrium aluminum. The catalyst may be of a pellet size, for example, or may be a membrane coated on a high surface area medium such as a honeycomb, radiator, or the like. The ozone destruction unit 802 can be used with any suitable cooling and/or recirculation system, such as the exemplary UV hardening and recirculating cooling system 800 shown in FIG. In this system, ozone destruction unit 802 is shown disposed along a return line in which hot gases are passed from the hardening chamber to at least one inlet 804 of ozone destruction unit 802, reacting with catalyst 800 in unit 802, and then At least one outlet 8〇6 of the unit to be returned to the gas supply, here a nitrogen supply container, is withdrawn. As shown in this embodiment, the return line is incorporated into a single return line before the nitrogen flow reaches the ozone destruction unit, such as by using a back suction valve 8 2 6 to ensure that the gas returning from a hardened chamber is not combined Flowing and contaminating another chamber. In another embodiment, separate return lines may each be directly input to the stinky 20

200809977 氧破壞單元。另外’儘管單一輸出線路在臭氧破壞單 間示出,應該理解可以使用多個輸出線路,以及每個 線路及其它該變化的一個臭氧破壞單元。 臭氧破壞單元802可以包括,或者連接到其上, 以監控冷卻系統中臭氧程度的臭氧感測器8 1 0。感測器 和臭氧破壞單元可以與系統控制器820聯繫,系統控 820可以接受來自臭氧感測器的信號並回應該信號監 氧程度。控制器可以監控臭氧程度,並可以監控其他 (諸如催化劑的剩餘壽命),以及當臭氧程度達到或者 不能接受的程度時,或者當催化劑需要改變或補充時 産生警報。警報可以傳送至使用者介面822 (諸如個 腦或者本領域中已知或者所用的用於通知使用者或者 者關於系統資訊的其他介面機構或裝置)°系統控制丨 或使用者介面可以與資料儲存裝置824 (諸如與系統 資訊的資料庫,譬如標準催化劑壽命和最大臭氧閾值 繫。 單元802還可以包括除了或者替代催化劑的介質 器。介質過濾器可以用於從再循環氣流中去除任意不 的顆粒。過濾器可以爲在本領域中已知或者用於該目 任何適當過濾器。.應該理解介質過濾器還可以包含於 化劑破壞單元分離的單元中。 第9圖示出了可以用於諸如第8圖中示出的系統 臭氧破壞單元900的透視圖。在該單元900中,催化齊 包含於包括入口 906和出口 908的箱體902中。包括 元之 返回 可用 810 制器 控臭 方面 接近 可以 人電 操作 器和/ 相關 )聯 過濾 期望 的的 從催 中的 J 904 一定 21 200809977 量臭氧的返回氣流輸入到單元900中,其中惟化劑引起以 上討論的反應’使得在該氣流中存在的臭氧量減少。然後 從出口 908傳出的氣體可以包括基本減少量的臭氧,以及 可包括氧氣和/或其他反應的副産物。 儘管催化劑示出爲在圖中的箱體内部自由流動的材 料,應該理解催化劑可以本領域已知或已用的任何適當方 式(諸如塗覆氣體經過的通道道、路徑或網路),以控制氣 流和在該單元中反應的程度。例如,諸如P r e m A i r⑧的催化200809977 Oxygen destruction unit. In addition, although a single output line is shown in the ozone destruction cell, it should be understood that multiple output lines can be used, as well as one ozone destruction unit per line and other such variations. The ozone destruction unit 802 can include, or be coupled to, an ozone sensor 820 that monitors the degree of ozone in the cooling system. The sensor and ozone destruction unit can be coupled to a system controller 820 that can accept signals from the ozone sensor and respond to the signal to monitor oxygen levels. The controller can monitor the degree of ozone and can monitor other (such as the remaining life of the catalyst), as well as when the level of ozone is reached or unacceptable, or when the catalyst needs to be changed or supplemented to generate an alarm. The alert can be transmitted to the user interface 822 (such as a brain or other interface mechanism or device known or used in the art for notifying the user or about system information). System control or user interface can be stored with data. Apparatus 824 (such as a database with system information, such as standard catalyst life and maximum ozone threshold. Unit 802 may also include a mediator in addition to or in place of the catalyst. The media filter may be used to remove any particles from the recycle gas stream. The filter may be any suitable filter known in the art or used for this purpose. It should be understood that the media filter may also be included in the unit in which the chemical destruction unit is separated. Figure 9 shows that it may be used for such as A perspective view of the system ozone destruction unit 900 shown in Fig. 8. In the unit 900, the catalyst is contained in a tank 902 including an inlet 906 and an outlet 908. The return of the unit is 810. Can be human electric operator and / related) to filter the desired J 904 from the reminder must be 21 200809977 It is returned to the stream input unit 900, but wherein the agent causes a reaction in the discussion on "such that the amount of ozone present in the gas stream is reduced. The gas emanating from outlet 908 can then include a substantially reduced amount of ozone, as well as by-products that can include oxygen and/or other reactions. Although the catalyst is shown as a free flowing material within the housing of the Figure, it should be understood that the catalyst can be controlled in any suitable manner known or used in the art, such as passageways, paths or networks through which the coating gas passes. The degree of gas flow and reaction in the unit. For example, catalysis such as P r e m A i r8

劑可以塗覆在氣體在該單元中流經的輻射器的内表面上。 第10圖示出了臭氧轉化百分比與PremAir®塗覆的輻射器 執行的空間速度(xl〇〇〇/hr)函數關係的曲缴圖1〇〇〇,其 中破壞效率在5 ft/sec流量以及75°C時確定爲約85%。第 11圖示出了在臭氧破壞單元中對於PremAir®塗覆的蜂窩 的臭氧轉化的曲線圖11〇〇,其中蜂窩單元爲具有5/8,,厚 度和45°C的1/8’’單元,具有約〇·1 ’’wg/層的壓降。 第1 2圖示出了另一圖表1 2 0 0,其繪出秒制的停留時 間與兆比率的臭氧濃度的相對關係。對於該圖表,在6,, 管道中具有350CFM冷卻空氣流,以及20·9%的氧氣程度 和65 °C的空氣溫度。可以看出,需要至少〇·〇4秒的停留 時間以得到0·08ρρπχ以下的臭氧程度。第!3圖示出了具 有最佳配合線路的資料的圖表1300,其中示出爲在〇〇4 和〇·〇45秒之間得到〇.〇8ppm值,使得〇 〇45或 〜尺食的任 何停留時間在該系統中足以降低氣體中的臭氧量至 、 上Μ上所 述的所需程度。對於其他臭氧程度,可以調整流逮和/咬路 22 200809977 徑長度以相應地增加或減少停留時間。 溫度還可以對臭氧破壞或消除所需的必要停留或接觸 時間有影響。表1示出了各種製程所需的停留時間和溫度。 表1.臭氧破壞的接觸時間和溫度的比較 熱破壞 貴金屬 pt/pd催 化劑 MnO 2基催化劑 溫度,°c &gt; 300 50-75 22 停留時 3 3 0.36-0.72 間,粆The agent may be applied to the inner surface of the radiator through which the gas flows in the unit. Figure 10 shows a plot of ozone conversion as a function of space velocity (xl 〇〇〇 / hr) performed by a PremAir® coated radiator, with a failure efficiency at 5 ft/sec flow and It was determined to be about 85% at 75 °C. Figure 11 shows a graph of ozone conversion for PremAir® coated honeycombs in an ozone destruction unit, where the honeycomb unit is a 1/8' unit with 5/8, thickness and 45 °C , with a pressure drop of about 〇 1 ''wg / layer. Figure 12 shows another graph 1 2 0 0 which plots the relative relationship between the residence time of the second system and the ozone concentration of the mega ratio. For this chart, in 6, the pipeline has a 350 CFM cooling air flow, and a 20.9% oxygen level and a 65 ° C air temperature. It can be seen that a residence time of at least 〇·〇 of 4 seconds is required to obtain an ozone level of 0·08 ρρπχ or less. The first! Figure 3 shows a chart 1300 of the data with the best fit line, shown as a 〇.〇8ppm value between 〇〇4 and 〇·〇 45 seconds, so that any 〇〇45 or ~ 食食 any stay The time in the system is sufficient to reduce the amount of ozone in the gas to the extent required on the upper jaw. For other levels of ozone, the flow catch and/or bite 22 200809977 can be adjusted to increase or decrease the dwell time accordingly. Temperature can also have an effect on the necessary residence or contact time required for ozone destruction or elimination. Table 1 shows the residence time and temperature required for various processes. Table 1. Comparison of contact time and temperature for ozone destruction Thermal damage Precious metal pt/pd catalyst MnO 2 based catalyst Temperature, °c &gt; 300 50-75 22 When staying 3 3 0.36-0.72, 粆

對於表1中的資料,DSS熱交換器與19’’X35’’的橫截 面一起使用,具有1400CFM的總流量。線性速度爲约 5 ft/sec以及對於傳統催化劑,厚度爲&gt; 2ft。 許多其他催化劑可以用於減少冷卻流體中的臭氧量。 例如,活性炭可以用於分解在富氮氣體中的臭氧。不幸地 是,活性炭在該製程中消耗,使得需要活性炭的經常供應。 另外,使用局限於臭4、潘办 、乳展度相當低地應用。使用活性炭還 會存在火災危險,特为丨m 认卜 對於較高臭氧濃度或者臭氧由濃縮 的氧源産生。典型地 、 ’活性炭在水處理中使用以去除額外 的臭氧,以及可以產每 ^ a 王一氧化碳和二氧化碳副産物。該製 程還可能通過流到系絲 、、九中的臭氧反應産生顆粒。活性炭反 應可以爲以下的方程式· 〇3 + C — C〇 + 〇3 + CO — c〇2 . 〇 23 200809977 已經提出的其他催化劑包括 Carulite®^溫氧化催化 劑(Mn02/Cu0),以及在臭氧製造中的Carulite®200催化 劑(Μ η Ο 2 / C u 07 A12 〇 3 )。For the data in Table 1, the DSS heat exchanger was used with a cross section of 19''X35'' with a total flow of 1400 CFM. The linear velocity is about 5 ft/sec and for conventional catalysts, the thickness is &gt; 2 ft. Many other catalysts can be used to reduce the amount of ozone in the cooling fluid. For example, activated carbon can be used to decompose ozone in a nitrogen-rich gas. Unfortunately, activated carbon is consumed in the process, requiring frequent supply of activated carbon. In addition, the use is limited to the application of the odor 4, Pan, and the degree of milk spread. The use of activated carbon also presents a fire hazard, especially for high ozone concentrations or for ozone to be produced by concentrated oxygen sources. Typically, 'activated carbon is used in water treatment to remove additional ozone, and can produce per-carbon monoxide and carbon dioxide by-products. The process may also produce particles by reacting ozone into the filaments and ninth. The activated carbon reaction can be the following equation: 〇3 + C - C〇 + 〇3 + CO - c〇2 . 〇23 200809977 Other catalysts have been proposed including Carulite® temperature oxidation catalyst (Mn02/Cu0), and in ozone production. Carulite® 200 catalyst (Μ η Ο 2 / C u 07 A12 〇 3 ).

第1 4圖示出根據本發明的一個實施方式可以使用的 臭氧消除的方法1400的步驟。在該方法中’導引富氮氣體 流通過UV硬化工具,以從工具去除熱1 402。熱流導引到 臭氧破壞單元1 404。該流沿著在該單元中催化劑塗覆的通 道導引,以在該單元中具有最小停留時間14〇6。由於氣體 沿著通道通過,催化劑引起氣流中的反應’從減少該氣體 中臭氧量1 408。在臭氧量減少到或者低於所需程度後,氣 流導引出單元1 4 1 0。然後導引臭氧減少的氣流通過熱交換 器,以從氣流去除額外的熱1 4 1 2。然後冷卻的氣流通過 UV硬化工具導引回1 4 1 4。應該理解這些步驟的說明和次 序僅僅爲示例性的,根據再洗包含的說明和建議其他變化 對於本領域的普通技術人員是顯而易見的。 因此,說明書和附圖應該看作僅爲示意性的,而不是 限制意義。然而,在那裏可以做出各種修改和變化而不脫 離如以下所述的申請專利範圍的較寬精神和範圍,這些是 顯而易見的。 【圖式簡單說明】 根據本發明的各種實施方式將參照附圖進行描述,其 中: 第1圖示出了用於硬化裝置的習知技術冷卻系統; 24 200809977 第2圖示出了根據本發明的一個實施方式可以使用的 UV硬化裝置和冷卻系統; 第3 ( a )和(b )圖分別示出了根據本發明的一個實 施方式可以使用的冷卻模組的前視圖和側視圖; 第4 ( a )和4 ( b )圖分別示出了根據本發明的一個實 施方式可以使用的鼓風機裝置的俯視圖和側視圖; 第5圖示出了根據本發明的一個實施方式可以使用的 氣體分離膜;Figure 14 illustrates the steps of a method 1400 of ozone depletion that may be used in accordance with an embodiment of the present invention. In this method, the nitrogen-enriched gas stream is directed through a UV hardening tool to remove heat 1 402 from the tool. The heat flow is directed to ozone destruction unit 1 404. The stream is directed along the channels coated by the catalyst in the unit to have a minimum residence time of 14 〇 6 in the unit. As the gas passes along the passage, the catalyst causes a reaction in the gas stream' from reducing the amount of ozone in the gas to 1 408. After the amount of ozone is reduced to or below the desired level, the air flow directs the unit 1 4 1 0. The ozone-reduced gas stream is then directed through a heat exchanger to remove additional heat from the gas stream 1 4 1 2 . The cooled air stream is then directed back to 1 4 1 4 by a UV hardening tool. It is to be understood that the description and order of the steps are merely exemplary, and other variations will be apparent to those of ordinary skill in the art in light of the description. Accordingly, the specification and drawings are to be regarded as illustrative only However, it will be apparent that various modifications and changes can be made therein without departing from the broader spirit and scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Various embodiments according to the present invention will be described with reference to the accompanying drawings in which: FIG. 1 shows a prior art cooling system for a hardening device; 24 200809977 FIG. 2 shows a One embodiment may use a UV hardening device and a cooling system; Figures 3(a) and (b) respectively show front and side views of a cooling module that may be used in accordance with an embodiment of the present invention; (a) and 4(b) respectively show a top view and a side view of a blower device that can be used in accordance with an embodiment of the present invention; and FIG. 5 shows a gas separation membrane that can be used in accordance with an embodiment of the present invention. ;

第6圖示出了根據本發明的一個實施方式可以使用的 硬化系統; 第7圖示出了根據本發明的一個實施方式可以使用的 方法的步驟; 第8圖示出了根據本發明的一個實施方式可以使用的 硬化和冷卻系統; 第9圖示出了根據本發明的一個實施方式可以使用的 臭氧破壞單元; 第1 0圖示出了根據本發明的一個實施方式可以使用 的臭氧破壞單元的結果; 第11圖示出了根據本發明的一個實施方式可以使用 的臭氧破壞單元的結果; 第1 2圖示出了根據本發明的一個實施方式可以使用 的臭氧破壞單元的結果; 第1 3圖示出了根據本發明的一個實施方式可以使用 的臭氧破壞單元的結果;以及 25 200809977 第1 4圖示出了根據本發明的一個實施方式可以使用 的方法的步驟。Figure 6 shows a hardening system that can be used in accordance with one embodiment of the present invention; Figure 7 shows the steps of a method that can be used in accordance with one embodiment of the present invention; and Figure 8 shows a Embodiments may use a hardening and cooling system; Figure 9 illustrates an ozone destruction unit that may be used in accordance with one embodiment of the present invention; Figure 10 illustrates an ozone destruction unit that may be used in accordance with an embodiment of the present invention. Results of Figure 11 show the results of an ozone destruction unit that can be used in accordance with one embodiment of the present invention; Figure 12 shows the results of an ozone destruction unit that can be used in accordance with one embodiment of the present invention; 3 illustrates the results of an ozone destruction unit that may be used in accordance with an embodiment of the present invention; and 25 200809977 Figure 14 shows the steps of a method that may be used in accordance with an embodiment of the present invention.

【主要元件符號說明】 100 開環系統 104 硬化腔室 108 排氣口 202、204 燈模組 210 ' 212 鼓風機 216 返回室 220 氧氣感測器 224、228 溫度感測器 300 再循環冷卻空氣裝置 304 供應容器 3 0 8、3 1 0 鼓風機 314 延伸導管 400 鼓風機 404 連接點 408 液體密封零件 500 管狀膜 602 系統控制器 606 使用者介面 102 UV燈模組 106 鼓風機 200 硬化系統 206、208 處理腔室 214 供應室 218 熱交換器 222、226 壓力感測器 230、232 再循環線路 302 返回容器 306 水冷熱交換器 312 返回導管 316 催化劑 402 可旋轉風扇 406 連接器 410 震盪陴尼材料 600 UV硬化系統 604 氮産生器 608 資料儲存裝置 700 用於冷卻UV硬化系統的方法 702 淨化氮氣體源供應至供應容器 26 200809977 704 從供應容器將氮氣流導引到至少一個燈4莫組中 706 使氮氣流通過燈模組和各個硬化腔室 708 從腔室將熱氮氣導引到返回管道系統中 710 將返回的熱氮氣導入到返回容器中 7 1 2 使返回容器中的熱氮氣通過熱交換器以+除熱 714 將冷卻的返回氮氣傳送回至供應容器中 716 繼續硬化處理? 7 1 8 終止循環製程[Main component symbol description] 100 Open loop system 104 Hardening chamber 108 Exhaust port 202, 204 Lamp module 210 ' 212 Blower 216 Return chamber 220 Oxygen sensor 224, 228 Temperature sensor 300 Recirculating cooling air device 304 Supply container 3 0 8 , 3 1 0 blower 314 extension conduit 400 blower 404 connection point 408 liquid sealing part 500 tubular film 602 system controller 606 user interface 102 UV lamp module 106 blower 200 hardening system 206, 208 processing chamber 214 Supply chamber 218 heat exchanger 222, 226 pressure sensor 230, 232 recirculation line 302 return container 306 water-cooled heat exchanger 312 return conduit 316 catalyst 402 rotatable fan 406 connector 410 turbulent Muni material 600 UV hardening system 604 nitrogen Generator 608 Data Storage Device 700 Method 702 for Cooling a UV Hardening System Purifying a Nitrogen Gas Source Supply to a Supply Container 26 200809977 704 Directing a flow of nitrogen from a supply container to at least one of the lamps 4 706 to pass a stream of nitrogen through the lamp mode The set and each of the hardening chambers 708 direct hot nitrogen from the chamber into the return piping system 710 will return Hot nitrogen gas introduced into the vessel 712 returns to return so that the container through a heat exchanger to heat the nitrogen heat removal + 714 returns the cooled nitrogen gas transferred back to the supply container 716 continues to hardening treatment? 7 1 8 Terminating the cycle process

800 UV硬化和再循環冷卻系統 802 臭氧破壞單元 804 入口 806 出口 808 催化劑 810 臭氧感測器 820 系統控制器 822 使用者介面 824 資料健存裝置 826 回吸閥 900 臭氧破壞單元 902 箱體 9 04 催化劑 906 入口 908 出口 1000 臭氧轉化百分比與PremAir®塗覆的輻射器執行的 27 200809977 空間速度(xl〇〇〇/hr )函數關係的曲線圖 1100 在臭氧破壞單元中對於PremAir®塗覆的蜂窩的臭 氧轉化的曲線圖 1200 秒制的停留時間與兆比率的臭氧濃度的相對關係 1300 具有最佳配合線路的資料的圖表 1400 臭氧消除的方法 1402 富氮氣體流導引通過UV硬化工具,以從工具去除 .熱800 UV hardening and recirculating cooling system 802 ozone destruction unit 804 inlet 806 outlet 808 catalyst 810 ozone sensor 820 system controller 822 user interface 824 data storage device 826 suckback valve 900 ozone destruction unit 902 tank 9 04 catalyst 906 Entrance 908 Outlet 1000 Ozone conversion percentage versus the performance of the PremAir® coated radiator 27 200809977 Space velocity (xl 〇〇〇 / hr ) 1100 ozone in the ozone destruction unit for PremAir ® coated honeycomb Transformed graph 1200-second dwell time vs. mega-ratio ozone concentration 1300 Chart with best fit line data 1400 Ozone Elimination Method 1402 Nitrogen-rich gas stream guide through UV hardening tool to remove from tool .heat

1404 熱流導引到臭氧破壞單元 1406 熱流沿著在單元中催化劑塗覆的通道導引,以具有 最小停留時間 1408 催化劑在氣流中引起反應,從而減少氣體中臭氧量 1410 在臭氧量減少到或者低於所需程度後,氣流導引出 單元 1412 導引氣流通過熱交換器,以從氣流去除熱能 1414 氣流導引回氣體供應以被再導引經過工具 281404 Heat flow directed to ozone destruction unit 1406 The heat flow is directed along the catalyst coated channels in the unit to have a minimum residence time of 1408. The catalyst causes a reaction in the gas stream, thereby reducing the amount of ozone in the gas 1410. The amount of ozone is reduced to or low. After the desired level, the airflow directing unit 1412 directs the airflow through the heat exchanger to remove thermal energy from the airflow 1414. The airflow is directed back to the gas supply for being redirected through the tool 28.

Claims (1)

200809977 十、申請專利範圍·· 1、一種對包括UV燈源和硬化腔室的一 UV硬化系 冷卻的系統,包括: 一供應容器,可用以包含一流體量; 一流動産生裝置,可用以導引來自該供應容 體流經過所述UV燈源,所述流體流可用以從所述 源去除熱能; 一返回管路,連接到所述硬化腔室並可用以 加熱的流體流並導引經加熱的流體流; 一返回容器,連接到所述返回管路並可用以 過所述返回管路導引的經加熱的流體流;以及 一熱交換器,沿著一流動路徑設置在所述返 和所述供應容器之間,並且可用以從所述經加熱的 去除熱能,其中導引所述流體流返回到所述供應容 2、 如申請專利範圍第1項所述的系統,其中: 所述流體是氮氣和富氮氣體的其中之一。 3、 如申請專利範圍第1項所述的系統,進一步包括 一氣體分離模組,可用以容納一饋入空氣流 出所述饋入空氣的至少一種成分以産生所述供應容 體源。 洗提供 器的流 UV燈 容納經 容納通 回容器 流體流 並分離 器的流 29 200809977 4、如申請專利範圍第3項所述的系統,其中: 所述氣體分離模組包括一氣體分離膜。 5、如申請專利範圍第1項所述的系統,其中: 所述熱交換器是一水冷卻熱交換器。 6、如申請專利範圍第1項所述的系統,其中:200809977 X. Patent Application Range 1. A system for cooling a UV curing system comprising a UV light source and a hardening chamber, comprising: a supply container for containing a fluid amount; and a flow generating device for guiding Flowing from the supply volume through the UV light source, the fluid flow can be used to remove thermal energy from the source; a return line connected to the hardened chamber and operable to heat the fluid stream and direct the flow a heated fluid stream; a return vessel coupled to the return line and operable to pass the heated fluid stream directed through the return line; and a heat exchanger disposed along the flow path at the return And the supply container, and can be used to remove thermal energy from the heating, wherein the fluid flow is directed back to the supply capacity, as in the system of claim 1, wherein: The fluid is one of nitrogen and nitrogen-rich gas. 3. The system of claim 1, further comprising a gas separation module operable to receive a feed air to flow out of at least one component of the feed air to produce the supply volume source. The streamer of the rinsing device is configured to contain a stream of fluid that is circulated to the vessel and is separated from the separator. The system of claim 3, wherein: the gas separation module comprises a gas separation membrane. 5. The system of claim 1, wherein: the heat exchanger is a water-cooled heat exchanger. 6. The system of claim 1, wherein: 多個流動産生裝置可用以導引來自所述供應容器的 流體流經過多個UV燈源。 7、如申請專利範圍第1項所述的系統,其中: 所述流動産生裝置是一循環鼓風機。 8、一種用於提供一再循環冷卻流體流至一輻射型硬化裝置 的空氣模組,包括: 一供應容器,可用以容納並包含一流體量; 一流動産生裝置,可用以導引來自所述供應容器的 流體流到輻射型硬化裝置,所述流體流可用以從所述硬化 裝置去除熱能; 一返回容器,可用以容納退出所述輻射型硬化裝置 的經加熱的流體流;以及 一熱交換器,沿著一流動路徑設置在所述返回容器 和所述供應容器之間,所述熱交換器可用以從所述經加熱 30 200809977 的流體流去除所述熱能,並導引所述流體流返回到所述供 應容器中。 9、如申請專利範圍第8項所述的空氣模組,其中: 所述流體是氮氣和富氮氣體的其中之一。A plurality of flow generating devices can be used to direct fluid flow from the supply container through a plurality of UV light sources. 7. The system of claim 1, wherein: the flow generating device is a circulating blower. 8. An air module for providing a recirculating cooling fluid stream to a radiation type hardening device, comprising: a supply container operable to contain and contain a quantity of fluid; a flow generating device operable to direct from said supply The fluid of the container flows to the radiation hardening device, the fluid flow can be used to remove thermal energy from the hardening device; a return container can be used to accommodate the heated fluid flow exiting the radiation hardening device; and a heat exchanger Provided along a flow path between the return vessel and the supply vessel, the heat exchanger being operable to remove the thermal energy from the fluid stream heated 30 200809977 and direct the fluid stream back Go to the supply container. 9. The air module of claim 8, wherein: the fluid is one of nitrogen and a nitrogen-enriched gas. 1 0、如申請專利範圍第8項所述的空氣模組,進一步包括: 一氣體分離模組,可用以容納一饋入空氣流並分離 出所述饋入空氣的至少一種成分以産生所述供應容器的流 體源。 Π、如申請專利範圍第1 〇項所述的空氣模組,其中: 所述氣體分離模組包括一氣體分離膜^ 1 2、如申請專利範圍第8項所述的空氣模組,其中: 所述供應容器可用以容納來自純氮氣源的流體量。 13、 如申請專利範圍第8項所述的空氣模組,其中: 所述熱交換器是一水冷卻熱交換器。 14、 如申請專利範圍第8項所述的空氣模組,其中: 多個流動産生裝置可用以導引來自所述供應容器的 流體流到所述硬化裝置的多個部分。 31 200809977 15、如申請專利範圍第8頊所述的空氣模組,其中: 戶斤述流動産生裝置是/循環鼓風機。 i 6、〆糗冷卻包括uv燈源和硬化腔室的一 U V硬化系統 的方法,包括: 導引來自一供應容器的冷卻流體流經過所述uv燈 源,所述流體流可用以從所遂uv燈源去除熱能; 導引來自所述硬化腔室的經加熱的冷卻流體流參 返回容器; 從所述經加熱的冷卻流體去除熱能;以及 β JiL 0- ^ 導引所述去除熱的冷卻流體流返回裏所述’、# •托UV燈源° 中,其中所述冷卻流體可用以再循環經過戶斤7 •後一步包括 1 7、如申請專利範圍第1 6項所述的方法,進 *十、、衣° 在所述供應容器中容納來自流體源的所^ μ a /步包拉 流雜 方fk所述 膜裝置傳送一饋入空氣流以處玉 1 8、如申請專利範圍第1 7項所述的方法,進 〇 通過 19、如申請專利範圍第1 6項所述的方法,其碱 β邀和富氮氣# 導引冷卻流體流係包括導引選自由氣; 構成的群組的冷卻流體流。 32 200809977 20、如申請專利範圍第16項所述的方法,進一步包括: 循環水經過所述熱交換器以從所述熱交換器去除 熱0 33The air module of claim 8, further comprising: a gas separation module operable to receive a feed air stream and separate at least one component of the feed air to generate the The fluid source that supplies the container. The air module of claim 1, wherein: the gas separation module comprises a gas separation membrane, and the air module of claim 8 is as follows: The supply container can be used to hold the amount of fluid from a source of pure nitrogen. 13. The air module of claim 8, wherein: the heat exchanger is a water-cooled heat exchanger. 14. The air module of claim 8, wherein: the plurality of flow generating devices are operable to direct fluid flow from the supply container to portions of the hardening device. 31 200809977 15. The air module of claim 8, wherein: the flow generating device is a/circulating blower. i. A method of cooling a UV curing system comprising a uv light source and a hardening chamber, comprising: directing a flow of cooling fluid from a supply container through the uv light source, the fluid flow being available to The uv light source removes thermal energy; directing the heated cooling fluid stream from the hardening chamber back to the vessel; removing thermal energy from the heated cooling fluid; and β JiL 0-^ directing the heat removal cooling The fluid stream returns to the ', #•托 UV lamp source °, wherein the cooling fluid can be used to recycle through the household 7 • The latter step includes 17. The method described in claim 16 of the patent scope, In the supply container, the membrane device containing the fluid source from the fluid source, the membrane device, transmits a feed air stream to the jade, as claimed in the patent application. The method of claim 17, wherein the method of claim 17, wherein the alkali β invites and enriches the nitrogen gas to guide the cooling fluid flow system comprises guiding the gas from the gas; Group of cooling fluid flows. The method of claim 16, further comprising: circulating water passing through the heat exchanger to remove heat from the heat exchanger.
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