TW200806092A - Atmospheric-pressure low-temperature plasma generator - Google Patents

Atmospheric-pressure low-temperature plasma generator Download PDF

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TW200806092A
TW200806092A TW95124485A TW95124485A TW200806092A TW 200806092 A TW200806092 A TW 200806092A TW 95124485 A TW95124485 A TW 95124485A TW 95124485 A TW95124485 A TW 95124485A TW 200806092 A TW200806092 A TW 200806092A
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electrode plate
atmospheric pressure
pressure low
temperature plasma
plasma generating
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TW95124485A
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Chinese (zh)
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TWI336602B (en
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Che-Hsin Lin
Wei-Ren Shu
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Univ Nat Sun Yat Sen
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Abstract

An atmospheric-pressure, low-temperature plasma apparatus comprises a chamber, a first electrode plate and a second electrode plate. The chamber provides a plasma passage, which has an input terminal and an output terminal. A reaction gas is introduced from the input terminal, and the first electrode plate and the second electrode plate are mounted at the output terminal. Each of the first electrode plate and the second electrode plate are formed with a plurality of microholes, and a plasma-generating space is formed between the first electrode plate and the second electrode plate. An intermediate or high frequency current is injected into the first electrode plate and the second electrode plate for facilitating a reaction performed by the reaction gas in the plasma-generating space. According the plasma can be discharged from the microholes of the second electrode plate.

Description

200806092 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種常壓低溫電漿產 士 關於在二電極板上各形成數個微孔,分-彳寸別X 鄰接及通人錢麵電流,錢在_=二電極板相互 常壓低溫賴產线置。 ι ^低溫電漿之 【先前技術】 「電漿(plasma)」係一種氣體原 八 穩態物種,其具反應活性且可應用於刀子、離子或介 :晶圓或_基板#)的表面改質或表 =^件(如 解離成帶電電子、中子及離子,• 將氣體分子 1續撞擊另—氣體分子再形成其他電二=電電子會繼 能連續發生連鎖反應,進而產生_ ^此 溫或真空環境下才能產生。以真空带將:用"水必須在高 乃係利用真空環境使氣體分子增“ς碰二,產生原理 通入直流两電壓,使反應室裡之万里I,此時再 反應後達崩潰狀態而生成電聚。l般而i目碰撞’形成連鎖 點為必須保持真空狀態下方能使電“‘二電裝之缺 許多待加工之妓備也較昂貴。再者, 發物質而不耐b 或含有水氣及溶劑等易揮 ,截至目雨為止,真空電漿產 ,中操作。因此 工業製程上,僅少部 無元全適用於各種 C:\Linda\PK Pat\PK10I09. 貝本科技產業在製程上得200806092 IX. Description of the Invention: [Technical Field] The present invention relates to an atmospheric pressure low-temperature plasma product in which a plurality of micropores are formed on a two-electrode plate, and the sub-adjacent and adjacent human face are formed. The current, the money in the _= two-electrode plate is placed under normal pressure and low temperature. ι ^Low-temperature plasma [Prior Art] "plasma" is a gas-like octapole species that is reactive and can be applied to the surface modification of knives, ions or media: wafers or substrates. Quality or table = ^ (such as dissociation into charged electrons, neutrons and ions, • gas molecules 1 continue to impact another gas molecules and then form other electricity two = electricity electrons will continue to chain reaction, resulting in _ ^ It can be produced in a warm or vacuum environment. The vacuum belt will: use " water must be used in the high-environment system to increase the gas molecules by the vacuum environment, and the principle of generating two voltages into the DC, so that the reaction chamber is thousands of miles, I When the reaction is re-reacted, it will reach a collapse state and generate electropolymerization. l The i-collision will form a chain point. It must be kept under vacuum to make electricity. , the material is not resistant to b or contains water vapor and solvent, etc., as of the rain, vacuum plasma production, medium operation. Therefore, only a few parts of the industrial process are applicable to all kinds of C:\Linda\PK Pat \PK10I09. Beben technology industry in the process Got up

9. doc J 200806092 以購置及應用。 習用電漿產生裝置,如L· Bardos等人在2004年的 研究所述〔L· Bardos,H· Barankova,L.E. Gustavsson,D.G. Teer aNew microwave and Hollow Cathode Hybrid Plasma Sources^ Surface and Coatings Technology 177-178 (2004) P-651-656〕,其提出一種微波及中空陰極複合電漿產生 源,以改良1985年所開發出來的微波電漿產生裝置,但 其基本上仍需先對一反應區進行抽真空程序,再導入氣體 ,故仍舊存在上述抽真空之相關技術問題。 另一習用電漿產生裝置,如H· Barankova等人在2004 年的研究所述(H· Barankova,L. Bardos “New Hybrid Source of Cold Atmospheric Plasma55 Surface and Coatings ]Technology 177-178 (2004) ρ·688-692〕,其提出一種低溫 大氣電漿產生源,雖然該裝置已不需要抽真空,然而卻是 使甩脈衝直流高電壓,雖然脈衝直流高電壓可達到產生電 漿的效果,但脈衝直流高電壓要使氣體轉化為離子態所需 電壓值卻高達數百至上千伏特,因此存在高耗能及容易產 生高溫的問題。9. doc J 200806092 for purchase and application. Conventional plasma generating devices, as described by L. Bardos et al. in 2004 [L. Bardos, H. Barankova, LE Gustavsson, DG Teer a New microwave and Hollow Cathode Hybrid Plasma Sources^ Surface and Coatings Technology 177-178 (2004) P-651-656], which proposes a microwave and hollow cathode composite plasma generating source to improve the microwave plasma generating device developed in 1985, but basically still needs to pump a reaction zone first. The vacuum program, after introducing the gas, still has the technical problems associated with the above vacuuming. Another conventional plasma generating device, as described by H. Barankova et al. in 2004 (H. Barankova, L. Bardos "New Hybrid Source of Cold Atmospheric Plasma 55 Surface and Coatings" Technology 177-178 (2004) ρ · 688-692], which proposes a low-temperature atmospheric plasma generating source. Although the device does not need to be evacuated, it is a pulsed DC high voltage, although the pulsed DC high voltage can achieve the effect of generating plasma, but the pulse The high voltage of DC requires a voltage value of hundreds to thousands of volts to convert the gas into an ionic state, so there is a problem of high energy consumption and high temperature.

另一習用電漿產生裝置,如Andreas ScMtze等人在 1998 年的研究所述〔Andreas ScMtze,James Y. Jeong, Steven Ε· Babayan,Jaeyoung Park,Gary S· Selwyn,and Robert F. Hicks uThe Atmospheric-Pressure Plasma Jet: A Review and Comparison to Other Plasma Sources55 IEEE TRANSACTIONS ON PLASMA SCIENCE,VOL· 26, NO· 6, C:\Linda\P8 Pat\PK10109. doc —7 —Another conventional plasma generating device, as described by Andreas ScMtze et al. in 1998 [Andreas ScMtze, James Y. Jeong, Steven Ε Babayan, Jaeyoung Park, Gary S. Selwyn, and Robert F. Hicks u The Atmospheric -Pressure Plasma Jet: A Review and Comparison to Other Plasma Sources55 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL· 26, NO· 6, C:\Linda\P8 Pat\PK10109. doc —7 —

06/07/05/11:47 AN 200806092 • DECEMBER (1998)〕,其比較近幾年的各類型大氣電漿 裝置’並提出其自行構思的新型電漿喷嘴,其中電將尸 (Plasma Torch)、電暈放電(Corona Discharge)及介電 電(Dielectric Barrier Discharge)等設計都是使用直流^電 壓來產生電漿。然而,由電漿焰方式產生的電漿溫度 ,並不適用於一般不耐高溫的待加工樣本;由電暈放電= 式產生的電漿雖然利用降低電流的方式來降低耗能及=度 _ ,但由於構造上的限制,使得電漿產生時為不均勻的絲狀 放電;以及,由介電層放電方式產生的電漿在電壓改良上 比上述兩種方式更好,但其所需的電壓亦高,且產生的電 漿卻不均勻,故只能適用於處理對加工品質要求較低之待 加工樣本。此外,介電/層放電之電漿產生器由於會在兩介 ,包層間產生大里靜電,因此並不適用於精密之電子原件應 用。再者,由Andreas ScMtze自行構思的新型電漿喷嘴 雖已能在常壓、常溫及低電壓之條件下產生電裝,但其整 _ 體構造仍祕_,且存在❹水冷裝4之構造及操^ 雜等問題。 其他相關習用電漿產生裝置,如中華民國公告第 366^677號「電漿產生裝置及利用其之電子源」、第4947〇8 號用以產生感應麵合電漿之射頻功率源」、第 ' 號「用於在大氣壓下產生低溫電漿的裝置」、第Μ264037 • 號「噴頭」、第Μ285165號「電漿產生裝置㈠」、第 Μ285166唬「電漿產生裝置(二)」,及公開第200400781 號大氣私漿產生器」等發明及新型專利,其包含同樣具 200806092 =上述相關技術缺點。在上述專利中,該第胸 =-電漿喷頭,其係由内而外包含—喷嘴峰體、一喷 嗝外錐體及一金屬質蓋體,兮哈、 HD體及喷嘴外錐體之 曰j成-反應工間。在該電漿喷頭之管體内部,該反應空 間係沿其管體方向形成之狹長漸縮環狀㈣。當—反應氣 :流入該反應空間之前段時,該喷嘴峰體及該喷^外 錐體之官壁間立即開始反應形成電装。然而,在該反應空06/07/05/11:47 AN 200806092 • DECEMBER (1998)], which compares various types of atmospheric plasma devices in recent years and proposes its own new plasma nozzles, among which Plasma Torch Designs such as Corona Discharge and Dielectric Barrier Discharge use DC voltage to generate plasma. However, the plasma temperature generated by the plasma flame method is not suitable for the sample to be processed which is generally not resistant to high temperature; the plasma generated by the corona discharge type uses the method of reducing the current to reduce the energy consumption and the degree _ However, due to structural limitations, the plasma is generated as a non-uniform filament discharge; and the plasma generated by the dielectric layer discharge method is better in voltage improvement than the above two methods, but it is required The voltage is also high, and the generated plasma is not uniform, so it can only be used to process samples to be processed that have lower processing quality requirements. In addition, the dielectric/layer discharge plasma generator is not suitable for precision electronic original applications because it generates large static electricity between the two layers and the cladding. Furthermore, the new plasma nozzles conceived by Andreas ScMtze have been able to produce electrical equipment under normal pressure, normal temperature and low voltage conditions, but their overall structure is still secret, and there is a structure of water-cooled cooling 4 and Exercise, etc. Other related conventional plasma generating devices, such as the Republic of China Announcement No. 366^677, "The Plasma Generation Device and the Electron Source Using the Same", No. 4947-8, the RF power source for generating the inductive surface-effect plasma", No. '"A device for generating low-temperature plasma under atmospheric pressure", No. 264037 No. "Nozzle", No. 285165 "Plastic generating device (I)", No. 285166" "Plastic generating device (II)", and Inventions and novel patents such as the publication No. 200400781 atmospheric private pulp generator, which include the same technical defects of 200806092 = the above related art. In the above patent, the thoracic =-plasma nozzle comprises a nozzle peak body, a squirt outer cone and a metal cover body, a hip hop, an HD body and a nozzle outer cone. Then j into a reaction room. Inside the tube of the plasma spray head, the reaction space is formed in a narrow and tapered loop shape (four) along the direction of the tube body. When the reaction gas: flows into the reaction space, the reaction between the nozzle peak body and the official wall of the outer cone forms an electrical installation. However, in the reaction empty

間之祕過早產生㈣,該賴射能絲仙該電㈣ 碩之聽已經與内部之管壁發生反應而耗損,如此不作會 =電漿有效率及浪#反應氣體,而且亦可能縮短該 电漿贺頭之使用*命。此外,在上述專利中之第i2術9 號揭示-對電極板,-放電間隙,以及電物㈣於 在大氣壓下產生低溫電漿,該專_為氣體流動方向乃與 電極垂直’因《㈣該賴產线置之高_暴露於外 部’造成使用上可能發生跳火或觸電之危險。再者,該裝 置所產生之電漿範圍甚小,因此不具有實用價值。 基於上述原因,其確實有必要進一步改良上述習用 電漿產生裝置。 有鏗於此,本發明改良上述之缺點,其係在一中空 本體之-端固設二電極板,該二電極板上各形成數個微孔 ,並相互鄰接形成一電漿產生間隙。在作動時,由一中空 本體之另一端導入一反應氣體,並對該二電極板施加中高 頻交流電,以便該電漿產生間隙在常壓下快速且穩定的產 生低/3^龟漿,並由該一電極板之一的微孔均勻導出該低 C:\Linda\PKPat\PK1010adoc ~ 9—— 200806092 =^水°由於電漿之產生在於該裝置之出口端產生,因此 二,體之密度最高魏亦最高,此外,本裝置完全不暴 ^间[书極於裝置外側,因此可以確保操作安全。藉此, 本發明確實能提升電漿有效利用率、節省反應氣體用量、 提局放電效率、簡化電漿產生裝置,並降低製造、購置、 作雜及耗#之成本。再者,由於該低溫電漿可應用 =各種不耐熱之待加场件進行表面改f,或進行不时 • _之生物樣本處理,故本發明亦可相對增廣適用範圍及 減少樣本處理程序。 【發明内容】 本發明之主要目的係提供一種常壓低溫電漿產生裝 置,其係在二電極板上各形成數個微孔,並使該二電極板 、相互鄰接形成一電漿產生間隙,以便在常壓下產生低溫電 漿,使得本發明具有簡化電漿產生裝置、增加操作安全性 及增廣適用範圍之功效。 φ 本發明之次要目的係提供一種常壓低溫電襞產生裝 置,其係對該一電極板施加中高頻交流電,且該電漿產生 間隙之間距極小,且電極布置乃平行於待處理表面,並於 該裝置最前端產生電漿以最短距離及最大面積之方式利用 該裝置所產生之電漿,使得本發明具有提升電漿有效利用 - 率、節省反應氣體用量、提高放電效率、提高工件處理效 . 能、加大電漿產生面積及減少耗能之功效。 本發明之另一目的係提供一種常壓低溫電漿產生裝 置,其構造簡單有利於微型化整體構造或一電裝之輸出端 C:\Linde\PK Pat\PS10109. docThe secret of the premature generation (4), the Lai can be the electric power of the silk (4) The sound of the sound has been depleted with the internal wall, so do not work = plasma efficiency and wave # reaction gas, and may also shorten The use of plasma head is * life. In addition, in the above patent, the i2th No. 9 reveals that the counter electrode plate, the discharge gap, and the electric substance (4) generate low temperature plasma at atmospheric pressure, and the specific flow direction of the gas is perpendicular to the electrode 'by (4) The high production line _ exposure to the outside 'causes the risk of flashover or electric shock. Moreover, the range of plasma produced by the device is very small and therefore has no practical value. For the above reasons, it is indeed necessary to further improve the above conventional plasma generating apparatus. In view of the above, the present invention improves the above-mentioned disadvantages by fixing two electrode plates at the end of a hollow body, each of which forms a plurality of micropores, and adjacent to each other to form a plasma generating gap. At the time of actuation, a reactive gas is introduced from the other end of a hollow body, and a medium-high frequency alternating current is applied to the two electrode plates, so that the plasma generating gap rapidly and stably generates a low/3^ slurry under normal pressure, and The low C:\Linda\PKPat\PK1010adoc~9-200806092=^water° is uniformly derived from the micropores of one of the electrode plates. Since the plasma is generated at the outlet end of the device, the density of the body is The highest Wei is also the highest. In addition, the device is completely violent. [The book is extremely outside the device, so it can ensure safe operation. Thereby, the invention can effectively improve the effective utilization rate of the plasma, save the amount of the reaction gas, improve the discharge efficiency, simplify the plasma generating device, and reduce the cost of manufacturing, purchasing, mixing and consumption. Furthermore, since the low-temperature plasma can be applied to various surface heat-resistant fields to be subjected to surface modification, or biological samples are processed from time to time, the present invention can also relatively broaden the scope of application and reduce the sample processing procedure. SUMMARY OF THE INVENTION The main object of the present invention is to provide an atmospheric pressure low-temperature plasma generating device, which is formed on the two electrode plates to form a plurality of micropores, and the two electrode plates are adjacent to each other to form a plasma to generate a gap. In order to produce low temperature plasma under normal pressure, the invention has the advantages of simplifying the plasma generating device, increasing the safety of operation and widening the applicable range. φ The secondary object of the present invention is to provide an atmospheric pressure low-temperature electric power generating device which applies medium-high frequency alternating current to the electrode plate, and the plasma generating gap is extremely small, and the electrode arrangement is parallel to the surface to be treated. The plasma generated by the device is generated at the foremost end of the device by the shortest distance and the largest area, so that the invention has the advantages of improving the effective utilization rate of the plasma, saving the amount of the reaction gas, improving the discharge efficiency, and improving the workpiece processing. Effectiveness, increase the area of plasma generation and reduce energy consumption. Another object of the present invention is to provide an atmospheric pressure low-temperature plasma generating device which is simple in structure and is advantageous for miniaturizing the entire structure or the output end of an electric device C:\Linde\PK Pat\PS10109. doc

06/07/05/11:47 AN —10 — 200806092 ,以供處理小尺寸之待加工樣本,使得本發明具有增廣 用範圍之功效 曰 根據本發明之常壓低溫電漿產生裝置,其包含— 空本體、一第一電極板及一第二電極板。該中空本雕 部形成一氣體通道,該氣體通道具有一輪入端及一輪出沪 。該輸入端用以導入一反應氣體,該輸出端用以固設該二 -及第二電極板。該第-及第二電極板各形成數個^弟06/07/05/11:47 AN -10 - 200806092, for processing small-sized samples to be processed, so that the present invention has the effect of augmenting the range, the atmospheric-pressure low-temperature plasma generating device according to the present invention, which comprises — an empty body, a first electrode plate and a second electrode plate. The hollow engraving portion forms a gas passage having a round end and a round out of Shanghai. The input end is for introducing a reactive gas, and the output end is for fixing the two-and second electrode plates. The first and second electrode plates each form a plurality of brothers

且相互鄰接形成一電漿產生間隙。該第一及第_ 汉罘一電極板用 以通入一中高頻交流電,以促使該電漿產生間隙内之反應 氣體轉化成一低温電漿,進而由該第二電極板之微孔導 〇 在本發明之一較佳實施例中,該常壓低溫電漿產生 裝置係包含一中空本體、一第一電極板及一第二電極板, 並搭配使用一反應氣體源及一中高頻交流電源。該中空本 體之内部形成一氣體通道,且該氣體通道具有一輪入端及 一輸出端。該輸入端連通至該反應氣體源,以將至少一反 應氣體導入該氣體通道。該輸出端設有一第一固定部及一 第二固定部,以供分別固定該第一及第二電極板。該第一 及第二固定部之間具有高度差,使該第一電極板及第二電 極板之間形成一電漿產生間隙,該電漿產生間隙經由該第 一電極板之微孔連通於該氣體通道。該第一及第二電極板 各形成數個微孔。該中高頻電源具有二導線,其分別電性 連接至該第一及第二電極板,以供應一中高頻交流電,進 而促使該電漿產生間隙内之反應氣體轉化成一低溫電漿, C:\Linda\PS Pat\PK10109.doc ——11 一 06/07/05/11:47 Α» 200806092 進而由该第二電極板之微孔導出至外部。 【實施方式】 為讓本發明之上述及其他目的、特徵及優點能更明 顯易懂’下文特舉本發明之較佳實施例,並配合所附圖式 ’作洋細說明如下: 请麥照第1及2圖所示,本發明第一實施例之常壓 低溫電漿產生裝置係包含-巾空本體1、-第-電極板2 及一第一電極板3,其搭配使用一反應氣體源4及一中高 =父流電源5。該反應氣體源4提供一反應氣體導入該中 工本體1内,該電源5供應一中高頻交流電至該第一電極 板2及第二電極板3。藉此,使通過該第一電極板2及第 一電極板3之間的反應氣體轉化成一低溫電漿,以供應用 於各種待加工物件之表面改質或表面清潔殺菌之用途。 與&quot;請再參照第1及2圖所示,更詳言之,本發明第— 貝也例之中空本體1係包含一外筒體11、一内筒體12及 一間隔件13。該外筒體11係由導電材料製成,例如選擇 取材自銅、銘或不鏽鋼等金屬或合金之材料。該内筒體12 絕緣材料製成,例如選擇取材自塑膠、酚醛樹脂(俗 稱包木)或陶瓷等非金屬材料。該外筒體11及内筒體12 具有相對應之形狀,例如中空之圓柱形、三角柱形、錐形 或角錐形等,因此該内筒體12可對應適當套狀該外筒 體11内,該外筒體11内部形成一氣體通道1〇,該内筒 體12係用以阻隔該第一電極板2及外筒體n。該氣體通 遏10具有一輸入端101及一輸出端102。該外筒體n在 C:\Linda\PK 吆 doc 一 12 —And adjacent to each other to form a plasma generating gap. The first and the first electrode plates are configured to pass a medium-high frequency alternating current to cause the reaction gas in the plasma generating gap to be converted into a low temperature plasma, and the micropores of the second electrode plate are guided by In a preferred embodiment of the present invention, the atmospheric pressure low-temperature plasma generating device comprises a hollow body, a first electrode plate and a second electrode plate, and is combined with a reactive gas source and a medium-high frequency alternating current power source. The inside of the hollow body forms a gas passage, and the gas passage has a wheel end and an output end. The input is coupled to the source of reactive gas to direct at least one reaction gas to the gas passage. The output end is provided with a first fixing portion and a second fixing portion for respectively fixing the first and second electrode plates. The height difference between the first and second fixing portions is such that a plasma gap is formed between the first electrode plate and the second electrode plate, and the plasma generating gap is communicated through the micro holes of the first electrode plate. The gas passage. The first and second electrode plates each form a plurality of micropores. The medium-high frequency power source has two wires electrically connected to the first and second electrode plates respectively to supply a medium-high frequency alternating current, thereby causing the reaction gas in the gap generated by the plasma to be converted into a low temperature plasma, C:\ Linda\PS Pat\PK10109.doc - 11 - 06/07/05/11:47 Α» 200806092 Further, the micropores of the second electrode plate are led out to the outside. The above and other objects, features and advantages of the present invention will become more <RTIgt; As shown in FIGS. 1 and 2, the atmospheric pressure low-temperature plasma generating apparatus according to the first embodiment of the present invention comprises a towel body 1, a first electrode plate 2 and a first electrode plate 3, which are used in combination with a reactive gas. Source 4 and a medium high = parent flow power supply 5. The reaction gas source 4 supplies a reaction gas into the main body 1, and the power source 5 supplies a medium-high frequency alternating current to the first electrode plate 2 and the second electrode plate 3. Thereby, the reaction gas passing between the first electrode plate 2 and the first electrode plate 3 is converted into a low temperature plasma to supply the surface modification or surface cleaning sterilization for various articles to be processed. Referring again to Figures 1 and 2, in more detail, the hollow body 1 of the present invention includes an outer cylinder 11, an inner cylinder 12 and a spacer 13. The outer cylinder 11 is made of a conductive material, for example, a material selected from a metal or an alloy such as copper, iron or stainless steel. The inner cylinder 12 is made of an insulating material, for example, selected from non-metallic materials such as plastic, phenolic resin (commonly known as bakelite) or ceramic. The outer cylinder 11 and the inner cylinder 12 have corresponding shapes, such as a hollow cylindrical shape, a triangular prism shape, a conical shape or a pyramid shape, and the like, so that the inner cylinder body 12 can correspond to the outer sleeve body 11 in a proper sleeve shape. A gas passage 1 is formed inside the outer cylinder 11, and the inner cylinder 12 is for blocking the first electrode plate 2 and the outer cylinder n. The gas suppression 10 has an input terminal 101 and an output terminal 102. The outer cylinder n is at C:\Linda\PK 吆 doc 12

06/07/05/11:47 AM 200806092 該輪入端101侧係形成呈封閉狀,並開設有一進氣口 m 及一導線入口 112,該導線入口 112較佳具有絕緣套體(未 標示)。該外筒體11在該輸出端102側係形成呈開放狀, 並具有一端面113。該間隔件13亦由上述絕緣材料製成 且係呈環狀,其套設於該内筒體12之輪出端102侧,以 間隔該第一電極板2及第二電極板3。 請參照第1、2及3圖所示,本發明第一實施例之第 一電極板2及第二電極板3係由導電材料製成,例如選擇 取材自銅、叙或不鐵鋼等金屬或合金之材料。該第一電極 板2及第二電極板3係呈薄板狀,且各自開設形成數個微 孔21及31,該微孔可形成陣列。本發明並未對該二電極 板2及3與該微孔陣列之尺寸、密度及數量加以限制,但 其主要取決於該外筒體η及内筒體12之尺寸與該電漿產 生I置之預设用途。再者,在該中空管體i之延伸方向上 ,該微孔21及31較佳係相互形成錯位排列關係,但亦可 選擇形成對位排列_。在組裝時,該第—電極板2係固 定於該内Μ體12内之間隔件13靠近該輸人端繼的一端 面(未標不,即第一固定部)上,而談第二電極板3則固定 於該外同體11 #稍輪出端·的端面113(即第二固定 部)處。此% ’該間隔件13用以隔開該第—電極板2及第 二電極板3,並在該第2及第二電極板3之間形 成-電聚產生間隙100。該電漿產生間隙刚之間距較佳 係等於或小於1公分(cm)。 請再麥照第1及2圖所示,本發明第一實施例之反 C:\Linda\PK fttSPKlCIOadoc06/07/05/11:47 AM 200806092 The side of the wheel end 101 is formed in a closed shape, and has an air inlet m and a wire inlet 112. The wire inlet 112 preferably has an insulating sleeve (not labeled). . The outer cylinder 11 is open on the side of the output end 102 and has an end surface 113. The spacer 13 is also made of the above-mentioned insulating material and has an annular shape, and is sleeved on the side of the rounded end 102 of the inner cylinder 12 to space the first electrode plate 2 and the second electrode plate 3. Referring to Figures 1, 2 and 3, the first electrode plate 2 and the second electrode plate 3 of the first embodiment of the present invention are made of a conductive material, for example, metal selected from copper, Syrian or non-ferrous steel. Or alloy material. The first electrode plate 2 and the second electrode plate 3 are in the form of a thin plate, and each of the plurality of micro holes 21 and 31 is formed to form an array. The present invention does not limit the size, density and number of the two electrode plates 2 and 3 and the microwell array, but mainly depends on the size of the outer cylinder η and the inner cylinder 12 and the plasma generation. The default use. Further, in the extending direction of the hollow tube body i, the micropores 21 and 31 are preferably arranged in a staggered arrangement relationship with each other, but an alignment arrangement _ may also be selected. When assembled, the first electrode plate 2 is fixed in the inner body 12, and the spacer 13 is adjacent to an end surface of the input end (not labeled, that is, the first fixing portion), and the second electrode is The plate 3 is fixed to the end surface 113 (i.e., the second fixing portion) of the outer same body 11 # slight wheel end. The spacers 13 are used to separate the first electrode plate 2 and the second electrode plate 3, and form a gap 100 between the second and second electrode plates 3. The plasma generation gap is preferably equal to or less than 1 cm (cm). Please refer to the first embodiment of the present invention as shown in Figures 1 and 2, the reverse C:\Linda\PK fttSPKlCIOadoc

〇Π/07/05/Μ:47 AM 13〜 200806092 . 職體源4係選自各種_氣體之儲存瓶敍生裝置等, 其係經由一管路41連通至該外筒體u之進氣口)u、,ρ 便將至少-種反應氣體導入該外筒體u之氣體通道 。本發明絲_反減狀伽_或錢加以限制, 但其主要餘決於待加讀狀表面改冑絲。該反雇5 體通常可選自氦氣、氧氣、氫氣、氮氣、氯氣或其混3 體,另亦可直接選自大氣氣體。 、 • ▲請再參照第1及2圖所示,本發明第-實施例之中 高頻交流電源5係設有一第一導線51及一第二導線52。 該第一導線51穿過該外筒體U之導線入口 112,並電性 至該第-電極板2。該第二導線52電性連接至=外 筒體11之適當位置,同時該外筒體u與第二電極板3利 用適當結合構造形成電性連制係,例如翻焊接結合層 、螺絲、卡扣構造或轉地等方法連接。藉此,該第一^ 線51及第二導線52可用以供應一中高頻交流電至該第一 φ 電極板2及第二電極板3。該中高頻交流電之電壓係可等 於或低於200伏锊(V),而其功率可等於或低於1〇〇瓦特(w) 。通常,該第二導線52較佳係設計做為—接地端。 請參照第2及4圖所示,當使用本發明第一實施例 之常壓低溫電漿產生裝置時,操作人員係可在丨大氣壓之 • 常壓下將一待加工物件ό或6,置於該中空本體1之下方, ' 且該巾空本體1之輸出端1G2較佳與該待加ji物件6或6, 保持等於或小於1公分之距離,例如G 65公分。當該待 力Π工物件6或6’係選自塑膠基板時,例如選自聚曱基丙稀 C:\Linda\PK Pat\PK10lD9.doc — 14 —〇Π/07/05/Μ:47 AM 13~ 200806092 . The source 4 is selected from various _ gas storage bottle regenerative devices, etc., which are connected to the intake of the outer cylinder u via a line 41. The mouths u, ρ introduce at least one kind of reaction gas into the gas passage of the outer cylinder u. The wire _ degraction gamma or money of the present invention is limited, but it mainly depends on the surface to be added. The anti-employment 5 body may be generally selected from the group consisting of helium, oxygen, hydrogen, nitrogen, chlorine or a mixture thereof, and may be directly selected from atmospheric gases. ▲Please refer to FIGS. 1 and 2 again. In the first embodiment of the present invention, the high frequency AC power source 5 is provided with a first wire 51 and a second wire 52. The first wire 51 passes through the wire inlet 112 of the outer cylinder U and is electrically connected to the first electrode plate 2. The second wire 52 is electrically connected to the appropriate position of the outer cylinder 11, and the outer cylinder u and the second electrode plate 3 are electrically connected by a suitable joint structure, such as a welded joint layer, a screw, and a card. Connect the buckle structure or the grounding method. Thereby, the first wire 51 and the second wire 52 can be used to supply a medium-high frequency alternating current to the first φ electrode plate 2 and the second electrode plate 3. The medium-high frequency alternating current voltage may be equal to or lower than 200 volts (V), and its power may be equal to or lower than 1 watt (w). Generally, the second wire 52 is preferably designed as a grounding terminal. Referring to Figures 2 and 4, when the atmospheric pressure low-temperature plasma generating apparatus of the first embodiment of the present invention is used, the operator can set a workpiece to be processed or placed under atmospheric pressure at atmospheric pressure. Below the hollow body 1, 'and the output end 1G2 of the empty body 1 is preferably kept at a distance equal to or less than 1 cm from the object 6 or 6 to be added, for example, G 65 cm. When the to-be-worked object 6 or 6' is selected from a plastic substrate, for example, selected from the group consisting of polyacrylonitrile C:\Linda\PK Pat\PK10lD9.doc — 14 —

06/07/05/11:47 AH 200806092 酸甲酯(poly_methylmetliacrylate,PMMA,俗稱有機玻璃 或壓克力)、聚苯乙稀(p〇lyStyrene,PS)、聚碳酸酯 (polycarbonate ’ PC)或聚對苯二曱酸乙二醇酉旨(p〇lyethylene terephthalate,PET)等,則該電源5係可選擇提供200V及 20W至30W之中高頻交流電,而該反應氣體源4可選擇 提供氦氣或氦/氧混合氣體(混合比約5〇 :〗),其總用量僅 需約5公升/分鐘(L/min)。亦即,若選用氦/氧混合氣體, Φ 則氧氣之用量僅需100毫升/分鐘(mL/min)。 請再參照第2及4圖所示,在該中空本體1内,該 氣體通道10係經由該第一電極板2之微孔21連通至該電 漿產生間隙100,使得由該進氣口 ln導入之反應氣體能 依預定流速(5公升/分鐘)不斷的進入該電漿產生間隙1〇〇 此時,由於該電漿產生間隙1〇〇之間距(〇·65公分)甚小 ,因此使得該第一電極板2及第二電極板3的中高頻交流 電得以橫跨該電漿產生間隙100並來回震盪,該反應氣體 ❿ 时到巾高頻交流電的衝擊,進而發生帛潰並由分子態轉 化成為離子態’進而產生一低溫電襞。最後,該低溫電聚 由該第二電極板3之微孔31導出該輸_ 1〇2,以供應 用於對該待加工物件6或6,的一結合面6〇或6〇,進行表 面改質的動作。此時,由於該低溫電聚產生後立即經由該 - 微孔&gt;31導出至外部’因此該電滎不致在該電聚產生間隙 -1(^停留過久時間’故相對降低電漿與第-電極板2或第 一迅極板3發生不當反應的機率,進而相對提升電漿的有 效利用率及降低反應氣體用量。特別是,由於本發明係在 C:Uinda\Pi PatNPKIOiM. doc 一 15——06/07/05/11:47 AH 200806092 Methyl ester (poly_methylmetliacrylate, PMMA, commonly known as plexiglass or acrylic), polystyrene (PS), polycarbonate (PC) or poly For p〇lyethylene terephthalate (PET), etc., the power source 5 can select between 200V and 20W to 30W medium and high frequency alternating current, and the reaction gas source 4 can optionally provide helium or The helium/oxygen mixed gas (mixing ratio of about 5::), the total amount of which is only about 5 liters per minute (L/min). That is, if a helium/oxygen mixed gas is used, Φ is only required to be used in an amount of 100 ml/min (mL/min). Referring to FIGS. 2 and 4 again, in the hollow body 1, the gas passage 10 is communicated to the plasma generating gap 100 via the micro holes 21 of the first electrode plate 2, so that the air inlet ln is The introduced reaction gas can continuously enter the plasma generation gap according to a predetermined flow rate (5 liters/min). At this time, since the gap between the plasma generation gaps (〇·65 cm) is very small, The medium-high frequency alternating current of the first electrode plate 2 and the second electrode plate 3 can oscillate across the plasma generating gap 100 and oscillate back and forth, and the reaction gas rushes to the high frequency alternating current of the towel, thereby causing collapse and molecular state. It is converted into an ionic state, which in turn produces a low temperature electricity. Finally, the low-temperature electropolymer is led out from the micropores 31 of the second electrode plate 3 to supply a surface for the object to be processed 6 or 6, a surface of 6〇 or 6〇, for surface The modified action. At this time, since the low-temperature electropolymer is immediately released to the outside via the -micropores>31, the electric enthalpy does not cause a gap-1 in the electropolymerization (the temperature stays for a long time), so the plasma is relatively lowered. - the probability of improper reaction of the electrode plate 2 or the first plate 3, thereby increasing the effective utilization of the plasma and reducing the amount of reaction gas. In particular, since the present invention is at C: Uinda\Pi PatNPKIOiM. doc-15 ——

06/07/05/11:47 AM 200806092 製成的轉Π 因此翻於處理各種不耐熱材質 过1^ 或6,,故能相對增廣適用範圍。 二4弟4圖所示,不論本發 ^ 件6或6之結合面6〇或6(), 人 ,改善該結合面6。或60,之親水性或結合 ΪΓ戈f6r待加工物件6或6,可下列方式對該結^ =:::==之— 千JC對該、、,„5面60或6〇,進行清洗, Γ接在該結合面60或6°,滴上-滴去離二 …接知角里測儀測量水滴之接觸角為21.5度。至於未 ^打表面改質之對照組,其結合面之水滴接觸角則為60 又三上述檢測方式顯示該待加工物件6或6,可藉由本發明 之電漿產生裝置所產生之f壓低溫賴大幅活化該結合面 60或60的表面吕能基’並提升其親水性或結合性等表面 ^質。因此’當該待加工物件6或6,係選自生物晶片之塑 膠基板% #由本發明之常壓低溫電漿處理,將能連帶大 幅提升該生物晶片之塑膠基板後續進行相互熱壓結合之結 合強度。 請參照第5及6圖所示,其揭示本發明第二實施例 之常壓低溫電漿產生裝置。滅於第-實闕,第二實施 例同樣包含-中空本體!、一第一電極板2及一第二電極 板i_該中工本體^係選自單—中空筒體,其形狀可選 自圓柱开y、二角柱形、錐形或角錐形等’且係由絕緣材料 C:\Unda\PK PMAPKlDlOa doc 200806092 ^ 製成,例如選擇取材自塑膠、酚醛樹脂(俗稱電木)或陶瓷 等非金屬材料。該中空本體1之内部形成一氣體通道10 。該氣體通道10具有一輸入端101及一輸出端102。該 中空本體1在該輸入端101侧係形成呈封閉狀,並開設有 一進氣口 103及一導線入口 104。該中空本體丨在該輸出 端102側係形成呈開放狀,並具有一肩部1〇5(即第一固定 部)及一環槽1〇6(即第二固定部),該肩部105及環槽1〇6 ⑩ 之間具有高度差。 睛再參照第5及6圖所示,本發明第二實施例之第 一電極板2及第二電極板3同樣由導電材料製成,且各自 設有微孔21及31,該微孔21及31亦依需求選擇形成錯 位的陣列或對位的陣列之排列關係。該第一電極板2係可 固設於該中空本體1之肩部1〇5(即第一固定部)上。該第 二電極板3之周緣係朝該中空本體1彎折延伸形成一凸緣 32。該第二電極板3之凸緣32嵌設固定於該中空本體1 響 之環槽i〇6(即第二固定部)内。該第一電極板2及第二電 極板3之間亦形成一電漿產生間隙1〇〇。再者,該反應氣 體源4之管道41係經由該中空本體1之進氣口 1〇3導入 至少一反應氣體。該電源5之第一導線51經由該中空本 體1之導線入口 104進入該氣體通道10並施加該中高頻 ♦ 交流電至該第一電極板2,而該第二導線52直接由外部 ▲ 連接於該第二電極板3,以施加該交流電至該第二電極板 3 °藉此,本發明第二實施例不但可產生常壓低溫電漿, 且亦可提供不同之組裝方式,以進一步增加組裝設計寬裕 C:\Linda\PK Pat\P£10109.doc06/07/05/11:47 AM 200806092 The resulting switch is turned over to handle various heat-resistant materials over 1^ or 6, so it can be relatively widened. As shown in Fig. 4 and Fig. 4, regardless of the joint surface 6〇 or 6() of the present invention, the bonding surface 6 is improved. Or 60, the hydrophilicity or the combination of the object 6 or 6 to be processed, can be cleaned in the following manner by ^ =:::== - thousand JC, ,, „5 faces 60 or 6〇, cleaning Γ 在 该 该 该 该 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 60 The contact angle of the water droplets is 60 and the above detection means that the object to be processed 6 or 6 can be activated by the f-pressure of the plasma generating device of the present invention to substantially activate the surface of the bonding surface 60 or 60 and enhance The hydrophilicity or the bonding property, etc., so that when the object to be processed 6 or 6 is selected from the plastic substrate of the biochip, the treatment by the atmospheric pressure low temperature plasma of the present invention will greatly enhance the biochip. The plastic substrate is subsequently bonded to each other by thermocompression bonding. Referring to Figures 5 and 6, the atmospheric pressure low-temperature plasma generating apparatus of the second embodiment of the present invention is disclosed. The example also includes a hollow body!, a first electrode plate 2 and a second electrode plate i_ The working body is selected from a single-hollow cylinder, and its shape may be selected from the group consisting of a cylindrical open y, a double-column, a cone or a pyramid, and is made of an insulating material C:\Unda\PK PMAPKlDlOa doc 200806092^. For example, a non-metallic material such as plastic, phenolic resin (commonly known as bakelite) or ceramic is selected. The inside of the hollow body 1 forms a gas passage 10. The gas passage 10 has an input end 101 and an output end 102. The hollow body 1 is formed in a closed shape on the side of the input end 101, and defines an air inlet 103 and a wire inlet 104. The hollow body 形成 is open on the side of the output end 102 and has a shoulder 1〇5 (ie, the first fixing portion) and a ring groove 1〇6 (ie, the second fixing portion), and the shoulder portion 105 and the ring groove 1〇6 10 have a height difference. The eye is further referred to the fifth and sixth figures, The first electrode plate 2 and the second electrode plate 3 of the second embodiment of the invention are also made of a conductive material, and are respectively provided with micro holes 21 and 31, and the micro holes 21 and 31 are also selected to form a misaligned array or pair according to requirements. Arrangement relationship of the array of bits. The first electrode plate 2 can be fixed to the hollow body The shoulder portion of the first electrode plate 3 is bent toward the hollow body 1 to form a flange 32. The flange 32 of the second electrode plate 3 is embedded. It is fixed in the ring groove i〇6 (ie, the second fixing portion) of the hollow body 1. A plasma gap is formed between the first electrode plate 2 and the second electrode plate 3. The conduit 41 of the reactive gas source 4 introduces at least one reactive gas through the inlet port 1〇3 of the hollow body 1. The first wire 51 of the power source 5 enters the gas passage 10 via the wire inlet 104 of the hollow body 1. And applying the medium high frequency ♦ alternating current to the first electrode plate 2, and the second wire 52 is directly connected to the second electrode plate 3 by the external ▲ to apply the alternating current to the second electrode plate 3°, thereby The second embodiment of the invention can not only generate atmospheric pressure low temperature plasma, but also provide different assembly methods to further increase the assembly design allowance C:\Linda\PK Pat\P£10109.doc

—17 — 06/07/05/11:47 AM 200806092 度並簡化整體構造。 如上所述’相較於各種習用常壓低溫電漿產生裝置 無法產生常壓低溫電漿,或雖可產生常壓低溫電漿,但卻 具有構造複雜或電漿有效利用率低落等缺點,第2圖之本 發明藉由在該中空本體〗之輸出端102固設該第一電極板 2及第二電極板3,該二電極板2及3上各形成數個該微 孔21及31,並相互鄰接,成該電漿產生間隙。在作 • 動時,由該中空本體1之4入端101導入至少—反應氣體 ,並對該二電極板2及3施加中高頻交流電,以便該電漿 產生間隙在常壓下快速且穩定的產生—低溫電裝,使 該低溫電漿由該第二電極板3之微孔31導出,以供對該 园待加工物件6或6’進行表面改質H本發㈣實能提 升電漿有效利用率、節省反應氣體用量、增加操作安全性 、提高放電效率、簡化電漿產生裝置,並降低製造、講置 、,操作、維修及耗能之成本。再者,由於該低溫電裝具有 • ⑽和低溫躲,故可應麟對各種不耐熱之待加工物件 6或6’進行表面改質,因此本發明亦可姉增廣適用範圍 及減少樣本處理程序。另外,由於本發明之構造簡單,故 有利於微型化整體構造或該輸出端1〇2之尺寸(例如縮小 至毫米級或微米級尺寸)’以供處理小尺寸之待加工樣本6 - 或6(例如生物晶片之塑膠基板),故亦能相對增廣適 ^ ° 雖然本發明已湘上述較佳實施觸示,然其並非 錄林购,任何熟胃此技藝者,林麟本發明之 C:Uinda\PK Pat\PK10109.doc—17 — 06/07/05/11:47 AM 200806092 degrees and simplify the overall construction. As described above, compared with various conventional atmospheric pressure low-temperature plasma generating devices, it is impossible to produce normal-pressure low-temperature plasma, or it can produce atmospheric pressure low-temperature plasma, but has the disadvantages of complicated structure or low effective utilization rate of plasma. In the present invention, the first electrode plate 2 and the second electrode plate 3 are fixed on the output end 102 of the hollow body, and the plurality of micro holes 21 and 31 are formed on the two electrode plates 2 and 3, respectively. Adjacent to each other, the plasma creates a gap. At the time of operation, at least the reaction gas is introduced from the inlet end 101 of the hollow body 1, and a medium-high frequency alternating current is applied to the two electrode plates 2 and 3, so that the plasma gap is fast and stable under normal pressure. Producing a low-temperature electrical device, such that the low-temperature plasma is led out from the micropores 31 of the second electrode plate 3 for surface modification of the object to be processed 6 or 6' (H). Utilization, saving reaction gas usage, increasing operational safety, increasing discharge efficiency, simplifying plasma generation devices, and reducing manufacturing, placement, operation, maintenance, and energy costs. Furthermore, since the low-temperature electric device has (10) and low temperature hiding, it is possible to surface-modify various heat-resistant objects to be processed 6 or 6', so that the invention can also broaden the scope of application and reduce sample processing. program. In addition, since the structure of the present invention is simple, it is advantageous to miniaturize the overall structure or the size of the output end 1 2 (for example, down to the millimeter or micron size) for processing a small sample to be processed 6 - or 6 (For example, the plastic substrate of biochip), it can also be relatively wide-ranging. Although the invention has been touched by the above-mentioned preferred implementation, it is not recorded by Lin, and any skilled person in this stomach, Lin Lin, C of the invention :Uinda\PK Pat\PK10109.doc

06/07/05/11:47 AX 200806092 精神和範圍之内,當可作各種更動與修改,因此本發明之 保護範圍當視後附之申請專利範圍所界定者為準。06/07/05/11:47 AX 200806092 The scope of protection of the present invention is subject to the definition of the scope of the appended patent application.

__

C:\Linda\H Pat\PS10109.doc —19 — 06/07/05/11:47 ΑΧ 200806092 【圖式簡單說明】 第1圖:本發明第一實施例之常壓低溫電漿產生裝置 之分解剖視圖。 第1 2圖:本發明第一實施例之常壓低溫電漿產生裝置 之組合剖視圖。 苐3圖:本發明第一實施例之第一及第二電極板之俯 視圖。C:\Linda\H Pat\PS10109.doc —19 — 06/07/05/11:47 ΑΧ 200806092 [Simplified description of the drawings] FIG. 1 : The atmospheric pressure low-temperature plasma generating apparatus of the first embodiment of the present invention Sub-anatomical view. Fig. 2 is a sectional view showing the combination of the atmospheric pressure low-temperature plasma generating apparatus of the first embodiment of the present invention. Fig. 3 is a plan view showing the first and second electrode plates of the first embodiment of the present invention.

第4圖·本發明第一實施例之常壓低溫電漿產生裝置 之使用示意圖。 第5圖·本發明第二實施例之常壓低溫電漿產生裝置 之分解剖視圖。 第6圖··本發明第二實施例之常壓低溫電漿產生裝置 之組合剖視圖。 【主要元件符號說明】 10 氣體通道 101輸入端 103進氣口 105肩部 11 外筒體 112導線入口 12内筒體 2 第一電極板 3 第二電極板Fig. 4 is a schematic view showing the use of the atmospheric pressure low-temperature plasma generating apparatus of the first embodiment of the present invention. Fig. 5 is an exploded sectional view showing the atmospheric pressure low-temperature plasma generating apparatus of the second embodiment of the present invention. Fig. 6 is a sectional view showing the combination of the atmospheric pressure low-temperature plasma generating apparatus of the second embodiment of the present invention. [Main component symbol description] 10 Gas passage 101 Input end 103 Air inlet 105 shoulder 11 Outer cylinder 112 Wire inlet 12 Inner cylinder 2 First electrode plate 3 Second electrode plate

C:\Unda\ra PBt\PK10109.d〇cC:\Unda\ra PBt\PK10109.d〇c

06/07/05/11:47 AM —20 — 1 中空本體 2 1〇〇電漿產生間隙 102輪出端 104導線入口 106環槽 ill進氣口 113端面 13間隔件 21微孔 200806092 31 微孔 32 凸緣 4 反應氣體源 41 管路 5 電源 51 第一導線 52 第二導線 6 待加工物件 60 結合面 6, 待加工物件 60, 結合面06/07/05/11:47 AM —20 — 1 Hollow body 2 1 〇〇 plasma generation gap 102 wheel end 104 wire inlet 106 ring groove ill air inlet 113 end face 13 spacer 21 micro hole 200806092 31 micro hole 32 Flange 4 Reactive gas source 41 Piping 5 Power supply 51 First conductor 52 Second conductor 6 Object to be machined 60 Bonding surface 6, Object to be machined 60, Bonding surface

06/07/05/11:47 AM06/07/05/11:47 AM

Claims (1)

200806092 十、申睛專利範圍: 一種常壓低溫電漿產生裝置,其包含: 氣體通道具 入〜反應氣 一=空本體,其内部形成一氣體通道,該 有了輸入端及一輸出端,該輸入端用以 體; ' 第笔極板,其固設於該中空本體之於 形成數個微孔; 之輪出端側,且200806092 X. Applicable Patent Range: An atmospheric pressure low-temperature plasma generating device, comprising: a gas passage with a reaction gas = an empty body, a gas passage formed therein, the input end and an output end, the The input end is for the body; the first pen plate is fixed on the hollow body to form a plurality of micro holes; 及 弟 $極板,其固設於該中空本體之於 形成數個微孔’該第二電極板鄰接於該二板且 間,其係形成在該第-及第二電極板之 司2中:^由=—電極板之微孔連通於該氣體通道; !八午該弟一及弟二電極板用以通入一電源,以使該 電漿f生間隙内之反應氣體轉化成-低溫電漿,進^ 由該第二電極板之微孔導出。 2、 依申請專魏㈣1項所述之常壓低溫電漿產生裝置 ,其中該中空本體之輸出端設有一第一固定部及一第 一固定部,以供分別固定該第一及第二電極板,該第 一及第二固定部之間具有高度差,使該第一電極板及 第二電極板之間形成該電漿產生間隙。 3、 依申請專利範圍第1項所述之常壓低溫電漿產生裝置 ’其中該中空本體係包含一導電之外筒體及一絕緣之 内筒體’該内筒體套設於該外筒體内。 4、 依申請專利範圍第3項所述之常壓低溫電漿產生裝置 C:\Linda\PK PSat\PK10I09. doc —22 一 06/07/05/11:47 AM 200806092 • ,其中該外筒體在該輸入端側係設有一進氣口,以導 入該反應氣體。 鲁 5、 依申請專利範圍第3項所述之常壓低溫電漿產生裝置 ’其中該外筒體在該輸入端側係設有一導線入口,以 供一第一導線連接至該第一電極板。 6、 依申請專利範圍第3項所述之常壓低溫電漿產生裝置 ’其中該外筒體在該輪出端側係形成呈開放狀,並具 φ 有一端面,以供固設該第二電極板。 7、 依申請專利範圍第6項所述之常壓低溫電漿產生裝置 ’其中另包含一第二導線,其連接於該外筒體。 8依申明專利範圍第3項所述之常壓低溫電襞產生裝置 _ ,其中該中空本體另包含一間隔件,其套設在該内筒 _ 體内,該間隔件具有一端面,以供固設該第一電極板 ,並用以間隔該第一及第二電極板。 9依申睛專利範圍第丨項所述之常壓低溫電漿產生裝置 • Y其中該第一及第二電極板之微孔係形成陣列且相互 形成錯位排列。 10依申吻專利範圍第!項所述之常壓低溫電裝產生裝置 /其中該第-及第二電極板之微孔係形成_且相互 形成對位排列。 依申明專利範圍第i項所述之常壓低溫電裝產生裝置 ^ 巾射空本體係—絕_體,其在該輸入端側係 Γ 導線人σ ’以供—第-導線連接至該第一電極 06/07/05/11:47 AM 200806092 12、 依申請專利範圍第1項所述之常壓低溫電槳產生裝置 ,其中該中空本體係一絕緣筒體,其在該輸入端侧係 設有一進氣口,以導入該反應氣體。 13、 依申請專利範圍第1項所述之常壓低溫電漿產生裝置 ,其中該中空本體在該輸出端側係形成呈開放狀,並 具有一肩部,以固設該第一電極板。 14、 依申請專利範園第13項所述之常壓低溫電漿產生裝置 ,其中該中空本體在該輸出端側另具有一環槽,以固 設該第二電極板,且該肩部轉槽之間具有高曰度差。 15 ME固設於該中空本體緣讀延伸形成—凸緣’以 16、 依申請專利範圍f二 ,其中另包含一第_,、处之常壓低溫電漿產生裝置 板與該電源之間。‘線其電性連接於該第二電極 17、 依中請專利範圍。 ,其中該電源係提供—由^之常壓低溫電漿產生裝置 中向步員交流電。 C:\Linda\PS Pat\PK10l09. doc 0G/07/05/H:47 AM 24 —a second plate, which is fixed to the hollow body to form a plurality of micropores. The second electrode plate is adjacent to the second plate and is formed in the first and second electrode plates. :^ by = - the micropores of the electrode plate are connected to the gas passage; ! The eight-day and the second electrode plates are used to pass a power source to convert the reaction gas in the plasma gap into a low temperature The plasma is introduced into the micropores of the second electrode plate. 2. The atmospheric pressure low-temperature plasma generating device according to the application of the above-mentioned application (4), wherein the output end of the hollow body is provided with a first fixing portion and a first fixing portion for respectively fixing the first and second electrodes The plate has a height difference between the first and second fixing portions to form a gap between the first electrode plate and the second electrode plate. 3. The atmospheric pressure low-temperature plasma generating device according to the first aspect of the patent application, wherein the hollow system comprises a conductive outer cylinder and an inner insulating cylinder, wherein the inner cylinder is sleeved on the outer cylinder in vivo. 4. The atmospheric pressure low-temperature plasma generating device according to item 3 of the patent application scope C:\Linda\PK PSat\PK10I09. doc —22 a 06/07/05/11:47 AM 200806092 • , wherein the outer cylinder The body is provided with an air inlet on the input end side to introduce the reaction gas. 5. The atmospheric pressure low-temperature plasma generating device of claim 3, wherein the outer cylinder is provided with a wire inlet on the input end side for connecting a first wire to the first electrode plate . 6. The atmospheric pressure low-temperature plasma generating device according to claim 3, wherein the outer cylinder is formed in an open shape at the side of the wheel end, and has an end surface φ for fixing the second Electrode plate. 7. The atmospheric pressure low-temperature plasma generating apparatus according to claim 6 of the patent application, wherein the second embodiment further comprises a second wire connected to the outer cylinder. The atmospheric pressure low-temperature electric power generating device according to the third aspect of the invention, wherein the hollow body further comprises a spacer sleeve disposed in the inner cylinder body, the spacer member has an end surface for The first electrode plate is fixed and used to space the first and second electrode plates. [9] The atmospheric pressure low-temperature plasma generating apparatus according to the above-mentioned item of the present invention, wherein the micropores of the first and second electrode plates are arrayed and arranged in a staggered arrangement with each other. 10 according to the application of the patent range! The atmospheric-pressure low-temperature electric device for generating the apparatus / wherein the micropores of the first and second electrode plates are formed _ and are aligned with each other. According to the invention, the atmospheric pressure low-temperature electrical equipment generating device is in accordance with the invention, and the system is connected to the first side, and the first conductor is connected to the first The present invention relates to an atmospheric pressure low-temperature electric paddle generating device according to claim 1, wherein the hollow body system is an insulating cylinder which is on the side of the input end. An air inlet is provided to introduce the reaction gas. 13. The atmospheric pressure low-temperature plasma generating apparatus according to claim 1, wherein the hollow body is formed in an open shape on the output end side and has a shoulder to fix the first electrode plate. 14. The atmospheric pressure low-temperature plasma generating device according to claim 13, wherein the hollow body further has a ring groove on the output end side to fix the second electrode plate, and the shoulder groove There is a high degree of difference between the two. 15 ME is fixed to the hollow body edge to form an extension-flange', according to the patent application scope f2, which further comprises a first, between the atmospheric pressure low temperature plasma generating device plate and the power source. ‘The wire is electrically connected to the second electrode 17, and the scope of the patent is claimed. Wherein the power source is provided by the alternating current to the stepper in the atmospheric pressure low temperature plasma generating device. C:\Linda\PS Pat\PK10l09. doc 0G/07/05/H:47 AM 24 —
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