TW200801780A - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
TW200801780A
TW200801780A TW096116311A TW96116311A TW200801780A TW 200801780 A TW200801780 A TW 200801780A TW 096116311 A TW096116311 A TW 096116311A TW 96116311 A TW96116311 A TW 96116311A TW 200801780 A TW200801780 A TW 200801780A
Authority
TW
Taiwan
Prior art keywords
article
article support
support
device manufacturing
lithographic apparatus
Prior art date
Application number
TW096116311A
Other languages
English (en)
Other versions
TWI347489B (en
Inventor
Erik Roelof Loopstra
Joost Jeroen Ottens
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200801780A publication Critical patent/TW200801780A/zh
Application granted granted Critical
Publication of TWI347489B publication Critical patent/TWI347489B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096116311A 2006-05-15 2007-05-08 Article support for a lithographic apparatus and immersion lithographic apparatus TWI347489B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/433,767 US7593096B2 (en) 2006-05-15 2006-05-15 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
TW200801780A true TW200801780A (en) 2008-01-01
TWI347489B TWI347489B (en) 2011-08-21

Family

ID=38131934

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096116311A TWI347489B (en) 2006-05-15 2007-05-08 Article support for a lithographic apparatus and immersion lithographic apparatus

Country Status (7)

Country Link
US (1) US7593096B2 (zh)
EP (1) EP1857881A1 (zh)
JP (2) JP4756004B2 (zh)
KR (3) KR100886186B1 (zh)
CN (1) CN101075097B (zh)
SG (1) SG137779A1 (zh)
TW (1) TWI347489B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008192643A (ja) * 2007-01-31 2008-08-21 Tokyo Electron Ltd 基板処理装置
NL2003638A (en) * 2008-12-03 2010-06-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4184188A (en) * 1978-01-16 1980-01-15 Veeco Instruments Inc. Substrate clamping technique in IC fabrication processes
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
JP2987838B2 (ja) * 1988-12-27 1999-12-06 松下電器産業株式会社 基板冷却装置
JPH0395918A (ja) * 1989-09-08 1991-04-22 Canon Inc 基板保持装置
US5203401A (en) * 1990-06-29 1993-04-20 Digital Equipment Corporation Wet micro-channel wafer chuck and cooling method
JP3106499B2 (ja) * 1990-11-30 2000-11-06 株式会社ニコン 露光装置
JPH04271108A (ja) * 1991-02-27 1992-09-28 Fujitsu Ltd 露光装置
US5088006A (en) * 1991-04-25 1992-02-11 International Business Machines Corporation Liquid film interface cooling system for semiconductor wafer processing
US5539609A (en) * 1992-12-02 1996-07-23 Applied Materials, Inc. Electrostatic chuck usable in high density plasma
US5350479A (en) * 1992-12-02 1994-09-27 Applied Materials, Inc. Electrostatic chuck for high power plasma processing
US5474614A (en) * 1994-06-10 1995-12-12 Texas Instruments Incorporated Method and apparatus for releasing a semiconductor wafer from an electrostatic clamp
JPH09270457A (ja) * 1996-03-29 1997-10-14 Nippon Steel Corp 露光装置
TW439094B (en) * 1998-02-16 2001-06-07 Komatsu Co Ltd Apparatus for controlling temperature of substrate
JPH11307513A (ja) * 1998-04-20 1999-11-05 Sony Corp 絶縁体基板対応プラズマ処理装置
JP3448737B2 (ja) * 2000-05-25 2003-09-22 住友重機械工業株式会社 ウエハーチャック用冷却板及びウエハーチャック
JP3834466B2 (ja) * 2000-10-30 2006-10-18 株式会社日立製作所 半導体製造装置の制御方法
US6628503B2 (en) 2001-03-13 2003-09-30 Nikon Corporation Gas cooled electrostatic pin chuck for vacuum applications
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
KR100532322B1 (ko) * 2003-06-04 2005-11-29 삼성전자주식회사 웨이퍼 베이킹 플레이트의 냉각 장치
EP1530088B1 (en) 2003-11-05 2007-08-08 ASML Netherlands B.V. Lithographic apparatus
DE602004032100D1 (de) * 2003-11-05 2011-05-19 Asml Netherlands Bv Lithographischer Apparat und Vorrichtungs-Halteverfahren
US8749762B2 (en) * 2004-05-11 2014-06-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4390629B2 (ja) * 2004-06-01 2009-12-24 Ｎｅｃエレクトロニクス株式会社 静電吸着装置およびプラズマ処理装置
US7161663B2 (en) * 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
US7196768B2 (en) 2004-10-26 2007-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
SG137779A1 (en) 2007-12-28
US7593096B2 (en) 2009-09-22
CN101075097B (zh) 2011-05-11
JP2010212720A (ja) 2010-09-24
TWI347489B (en) 2011-08-21
CN101075097A (zh) 2007-11-21
JP4756004B2 (ja) 2011-08-24
KR100906438B1 (ko) 2009-07-09
KR20070110793A (ko) 2007-11-20
JP2007318120A (ja) 2007-12-06
US20070263201A1 (en) 2007-11-15
KR20080109691A (ko) 2008-12-17
KR20080071534A (ko) 2008-08-04
KR100886186B1 (ko) 2009-02-27
JP4756101B2 (ja) 2011-08-24
EP1857881A1 (en) 2007-11-21

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