SG137779A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG137779A1 SG137779A1 SG200703444-0A SG2007034440A SG137779A1 SG 137779 A1 SG137779 A1 SG 137779A1 SG 2007034440 A SG2007034440 A SG 2007034440A SG 137779 A1 SG137779 A1 SG 137779A1
- Authority
- SG
- Singapore
- Prior art keywords
- article
- article support
- support
- device manufacturing
- lithographic apparatus
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/433,767 US7593096B2 (en) | 2006-05-15 | 2006-05-15 | Lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG137779A1 true SG137779A1 (en) | 2007-12-28 |
Family
ID=38131934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200703444-0A SG137779A1 (en) | 2006-05-15 | 2007-05-11 | Lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US7593096B2 (zh) |
EP (1) | EP1857881A1 (zh) |
JP (2) | JP4756004B2 (zh) |
KR (3) | KR100886186B1 (zh) |
CN (1) | CN101075097B (zh) |
SG (1) | SG137779A1 (zh) |
TW (1) | TWI347489B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008192643A (ja) * | 2007-01-31 | 2008-08-21 | Tokyo Electron Ltd | 基板処理装置 |
NL2003638A (en) | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4184188A (en) * | 1978-01-16 | 1980-01-15 | Veeco Instruments Inc. | Substrate clamping technique in IC fabrication processes |
US4509852A (en) * | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
JP2987838B2 (ja) * | 1988-12-27 | 1999-12-06 | 松下電器産業株式会社 | 基板冷却装置 |
JPH0395918A (ja) * | 1989-09-08 | 1991-04-22 | Canon Inc | 基板保持装置 |
US5203401A (en) * | 1990-06-29 | 1993-04-20 | Digital Equipment Corporation | Wet micro-channel wafer chuck and cooling method |
JP3106499B2 (ja) * | 1990-11-30 | 2000-11-06 | 株式会社ニコン | 露光装置 |
JPH04271108A (ja) * | 1991-02-27 | 1992-09-28 | Fujitsu Ltd | 露光装置 |
US5088006A (en) * | 1991-04-25 | 1992-02-11 | International Business Machines Corporation | Liquid film interface cooling system for semiconductor wafer processing |
US5539609A (en) * | 1992-12-02 | 1996-07-23 | Applied Materials, Inc. | Electrostatic chuck usable in high density plasma |
US5350479A (en) * | 1992-12-02 | 1994-09-27 | Applied Materials, Inc. | Electrostatic chuck for high power plasma processing |
US5474614A (en) * | 1994-06-10 | 1995-12-12 | Texas Instruments Incorporated | Method and apparatus for releasing a semiconductor wafer from an electrostatic clamp |
JPH09270457A (ja) * | 1996-03-29 | 1997-10-14 | Nippon Steel Corp | 露光装置 |
TW439094B (en) * | 1998-02-16 | 2001-06-07 | Komatsu Co Ltd | Apparatus for controlling temperature of substrate |
JPH11307513A (ja) * | 1998-04-20 | 1999-11-05 | Sony Corp | 絶縁体基板対応プラズマ処理装置 |
JP3448737B2 (ja) * | 2000-05-25 | 2003-09-22 | 住友重機械工業株式会社 | ウエハーチャック用冷却板及びウエハーチャック |
JP3834466B2 (ja) * | 2000-10-30 | 2006-10-18 | 株式会社日立製作所 | 半導体製造装置の制御方法 |
US6628503B2 (en) * | 2001-03-13 | 2003-09-30 | Nikon Corporation | Gas cooled electrostatic pin chuck for vacuum applications |
US7025498B2 (en) * | 2003-05-30 | 2006-04-11 | Asml Holding N.V. | System and method of measuring thermal expansion |
KR100532322B1 (ko) * | 2003-06-04 | 2005-11-29 | 삼성전자주식회사 | 웨이퍼 베이킹 플레이트의 냉각 장치 |
EP1530089B1 (en) * | 2003-11-05 | 2011-04-06 | ASML Netherlands B.V. | Lithographic apparatus and method for clamping an article |
DE602004008009T2 (de) | 2003-11-05 | 2008-04-30 | Asml Netherlands B.V. | Lithographischer Apparat |
US8749762B2 (en) * | 2004-05-11 | 2014-06-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4390629B2 (ja) * | 2004-06-01 | 2009-12-24 | Necエレクトロニクス株式会社 | 静電吸着装置およびプラズマ処理装置 |
US7161663B2 (en) * | 2004-07-22 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus |
US7196768B2 (en) * | 2004-10-26 | 2007-03-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2006
- 2006-05-15 US US11/433,767 patent/US7593096B2/en active Active
-
2007
- 2007-05-01 EP EP07107271A patent/EP1857881A1/en not_active Withdrawn
- 2007-05-08 TW TW096116311A patent/TWI347489B/zh active
- 2007-05-08 JP JP2007122960A patent/JP4756004B2/ja active Active
- 2007-05-11 SG SG200703444-0A patent/SG137779A1/en unknown
- 2007-05-14 KR KR1020070046486A patent/KR100886186B1/ko active IP Right Grant
- 2007-05-14 CN CN2007101025326A patent/CN101075097B/zh active Active
-
2008
- 2008-07-02 KR KR1020080064028A patent/KR100906438B1/ko not_active IP Right Cessation
- 2008-10-28 KR KR1020080105784A patent/KR20080109691A/ko not_active Application Discontinuation
-
2010
- 2010-05-10 JP JP2010108258A patent/JP4756101B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7593096B2 (en) | 2009-09-22 |
EP1857881A1 (en) | 2007-11-21 |
KR20080071534A (ko) | 2008-08-04 |
JP2010212720A (ja) | 2010-09-24 |
JP4756004B2 (ja) | 2011-08-24 |
US20070263201A1 (en) | 2007-11-15 |
CN101075097B (zh) | 2011-05-11 |
JP4756101B2 (ja) | 2011-08-24 |
CN101075097A (zh) | 2007-11-21 |
KR20080109691A (ko) | 2008-12-17 |
KR100906438B1 (ko) | 2009-07-09 |
JP2007318120A (ja) | 2007-12-06 |
TWI347489B (en) | 2011-08-21 |
KR100886186B1 (ko) | 2009-02-27 |
KR20070110793A (ko) | 2007-11-20 |
TW200801780A (en) | 2008-01-01 |
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