TW200801210A - Arc evaporation source and vacuum evaporation system - Google Patents
Arc evaporation source and vacuum evaporation systemInfo
- Publication number
- TW200801210A TW200801210A TW095122919A TW95122919A TW200801210A TW 200801210 A TW200801210 A TW 200801210A TW 095122919 A TW095122919 A TW 095122919A TW 95122919 A TW95122919 A TW 95122919A TW 200801210 A TW200801210 A TW 200801210A
- Authority
- TW
- Taiwan
- Prior art keywords
- evaporation
- arc
- vacuum
- cathode
- electrodes
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2006/312489 WO2007148396A1 (ja) | 2006-06-22 | 2006-06-22 | アーク蒸発源および真空蒸着装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200801210A true TW200801210A (en) | 2008-01-01 |
Family
ID=38833148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095122919A TW200801210A (en) | 2006-06-22 | 2006-06-26 | Arc evaporation source and vacuum evaporation system |
Country Status (5)
Country | Link |
---|---|
US (1) | US20090057144A1 (zh) |
EP (1) | EP2031085A1 (zh) |
CN (1) | CN101448969A (zh) |
TW (1) | TW200801210A (zh) |
WO (1) | WO2007148396A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116794337A (zh) | 2013-03-15 | 2023-09-22 | 雅培制药有限公司 | 具有竖直布置的圆盘传送带的自动化诊断分析仪及相关方法 |
CN105745546B (zh) | 2013-03-15 | 2017-10-13 | 雅培制药有限公司 | 具有后面可进入轨道系统的自动化诊断分析仪及相关方法 |
CN104362064B (zh) * | 2014-11-21 | 2016-08-17 | 厦门福纳新材料科技有限公司 | 一种真空电弧放电的电极结构 |
CN110284109B (zh) * | 2019-05-16 | 2021-09-21 | 兰州空间技术物理研究所 | 径向等离子体射流脉冲真空电弧蒸发源及薄膜沉积装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3465205A (en) * | 1968-02-12 | 1969-09-02 | Gen Electric | Vacuum gap devices with metal ionizable species evolving trigger assemblies |
JP2718731B2 (ja) * | 1988-12-21 | 1998-02-25 | 株式会社神戸製鋼所 | 真空アーク蒸着装置及び真空アーク蒸着方法 |
WO1992019789A1 (en) * | 1991-04-29 | 1992-11-12 | Nauchno-Proizvodstvennoe Predpriyatie 'novatekh' | Electric arc evaporator of metals |
JP2002069664A (ja) | 2000-08-28 | 2002-03-08 | Hiroshi Takigawa | プラズマ加工方法及びプラズマ加工装置 |
-
2006
- 2006-06-22 WO PCT/JP2006/312489 patent/WO2007148396A1/ja active Application Filing
- 2006-06-22 US US12/281,583 patent/US20090057144A1/en not_active Abandoned
- 2006-06-22 EP EP06767147A patent/EP2031085A1/en not_active Withdrawn
- 2006-06-22 CN CNA2006800547002A patent/CN101448969A/zh active Pending
- 2006-06-26 TW TW095122919A patent/TW200801210A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US20090057144A1 (en) | 2009-03-05 |
EP2031085A1 (en) | 2009-03-04 |
WO2007148396A1 (ja) | 2007-12-27 |
CN101448969A (zh) | 2009-06-03 |
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